A wafer detection device, wafer loading device, and wafer transfer device
By designing a horizontally extendable sensor and linkage mechanism, the problem of sensor collision with the wafer was solved, achieving stability and compactness of the device and ensuring the safety and accuracy of wafer inspection.
Patent Information
- Application Number
- CN202211279879.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2021-10-20
- Filing Date
- 2022-10-19
- Publication Date
- 2026-02-03
- Estimated Expiration
- 2042-10-19
AI Technical Summary
In existing wafer inspection devices, the sensors are mounted on the drive arm. The intersection of the rotation space and the wafer space can easily lead to collisions, causing damage to the wafer or wafer cassette.
A wafer inspection device was designed. The sensor achieves horizontal extension and retraction through a linkage mechanism. The moving direction of the driving component is perpendicular to the moving direction of the sensor light to avoid collision. The motion is converted into horizontal motion through the cooperation of the rotating arm and the swing arm, saving space.
This effectively avoids collisions between the sensor and the wafer or wafer cassette, improving the stability and compactness of the device and ensuring the safety and accuracy of the sensor during the detection process.
Smart Images

Figure CN115527899B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of semiconductor processing equipment technology, and in particular to a wafer inspection device, a wafer loading device, and a wafer transport device. Background Technology
[0002] With the development of China's semiconductor industry and the increasing automation of integrated circuit production, wafer loading devices are being used more and more widely in semiconductor processing. A wafer loading device is part of the loading equipment in semiconductor processing, used for handling and placing wafer pods (FOUPs) containing wafers, such as the automated wafer loading device disclosed in Chinese Patent Application No. 201611046688.2. In wafer loading devices, a wafer mapping device is typically installed to detect the position of wafers in the FOUP, using a pair of sensors to detect the number and status of wafers. Due to operational requirements, the sensor mapping device needs to be able to switch between two different working positions during operation.
[0003] Existing sensors are typically mounted on drive arms. For example, in Chinese patent application number 201922224671, a drive mechanism rotates two drive arms located on both sides of the wafer cassette to move closer to the wafer cassette for detection. However, the rotation space of the drive arms intersects with the space where the wafer is located, which can easily lead to collisions between the drive arms and the wafer, causing damage to the wafer or the wafer cassette. Summary of the Invention
[0004] To overcome the above-mentioned shortcomings, the present invention aims to provide a wafer inspection device in which the sensor (light-emitting port and light-receiving port) can be horizontally extended and retracted, avoiding collisions between the sensor and the wafer loading box or the wafer during the extension and retraction process. Furthermore, the moving direction of the driving component is perpendicular to the moving direction of the light emitted by the sensor, which greatly saves space and makes the overall structure more compact and stable.
[0005] To achieve the above objectives, the technical solution adopted by the present invention is: a wafer inspection device, comprising a frame, a linkage mechanism, and a pair of mounting arms, wherein a pair of sensors are mounted on the pair of mounting arms, and the linkage mechanism can drive the ends of the pair of mounting arms on which the sensors are mounted to reciprocate linearly in a first direction; wherein the linkage mechanism includes
[0006] A push rod that reciprocates linearly along the frame in a second direction;
[0007] A rotating arm, one end of which is hinged to the end of a push rod, and the other end of which is fixed to a pair of mounting arms, the pair of mounting arms being parallel to the rotating arm and located in the same plane;
[0008] The swing arm has one end hinged to the frame and the other end hinged to the end of the rotating arm near the mounting arm.
[0009] The beneficial effects of this invention are as follows: the rotation axes of the swing arm and the push rod move linearly along the first direction, driving the swing arm to swing. Since one end of the swing arm is hinged to the frame, the rotation axes of the two will not be displaced. The swing arm will rotate around the rotation axis of the swing arm and the frame, thereby driving the end of the mounting arm away from the swing arm to move along the first direction, while the sensor is installed at the end of the horizontally moving mounting arm. This ensures that the sensor always moves in the first direction.
[0010] Driven by a linkage mechanism, the two sensors maintain their height during insertion and withdrawal from the wafer loading cassette, thus avoiding the risk of collisions with the wafer or the cassette during these movements. Furthermore, because the drive push rod moves linearly in the second direction, the coordinated action of the rotating and swing arms ultimately propels the light rays emitted by the sensor at the end of the mounting arm to move linearly in the first direction, converting the second-direction motion into the first-direction motion. This significantly saves space in the first direction, making the overall structure more compact and stable.
[0011] Furthermore, the rotation axes of the rotating arm and push rod, the rotation axes of the rotating arm and swing arm, and the light rays from the sensor at the end of the mounting arm are parallel to each other and located in the same plane. The perpendicular distances from the rotation axes of the rotating arm and push rod to the rotation axes of the rotating arm and swing arm, the perpendicular distances from the light rays from the sensor at the end of the mounting arm to the rotation axes of the rotating arm and swing arm, and the perpendicular distances from the rotation axes of the swing arm and frame to the rotation axes of the rotating arm and swing arm are the same. From the side, the mounting arm and swing arm form a long rod, the length of which is twice the distance between the rotation axes of the two ends of the swing arm, and the rotation axes of the swing arm and rotating arm are the midpoint of this long rod.
[0012] The intersection of the rotation axes of the swing arm and push rod, the rotation axis of the swing arm and frame, and the extension of the light beam from the sensor at the end of the mounting arm on the same vertical plane forms a right triangle. The rotation axis of the swing arm and frame is the endpoint corresponding to the right angle of the right triangle, while the rotation axes of the swing arm and push rod and the light beam from the sensor at the end of the mounting arm are the two endpoints of the hypotenuse of the right triangle. Since the frame is fixed, the rotation axes of the swing arm and frame are also fixed, and the rotation axes will not produce displacement in the X horizontal direction or Y vertical direction. However, the rotation axes of the swing arm and push rod always reciprocate along the Y direction in a straight line under the push of the push rod, which ensures that the light beam from the sensor at the end of the mounting arm will only move in the X direction.
[0013] Furthermore, the rotation axes of the swing arm and push rod, and the rotation axes of the swing arm and frame are located in the same vertical plane along the second direction, so as to ensure that when the push rod moves in the second direction, the rotation axes of the swing arm and the frame are always located above the rotation axes of the swing arm and push rod, and the vertical distance between the two rotation axes extends along the second direction.
[0014] Furthermore, there are two swing arms, rotatably connected by a first shaft. The swing arm is sleeved on the first shaft and can rotate around it. Since there is a pair of mounting arms, the distance between them is greater than the diameter of the wafer. Therefore, two swing arms are provided to stably support and push the mounting arms.
[0015] Furthermore, the rotating arm is sleeved at the midpoint of the first shaft. The two swing arms are symmetrically arranged relative to the axis of the swing arm, so that the force applied to the two swing arms is uniform during the movement of the swing arm, thereby improving the stability of the entire linkage mechanism.
[0016] Furthermore, the frame includes two spaced-apart uprights extending along a second direction, and the swing arm is hinged to the uprights. The uprights and the swing arm are correspondingly arranged.
[0017] Furthermore, a second shaft corresponding to the swing arm is fixed on the upright, and the swing arm is sleeved on the second shaft and rotates along the second shaft. The axis of the second shaft is the rotation axis of the swing arm and the upright, and a rolling bearing is provided between the second shaft and the swing arm to reduce the frictional force when they rotate.
[0018] Furthermore, the frame is provided with a crossbar, and the rotating arm is provided with an upwardly extending boss. The boss is located on the side close to the rotation axis of the rotating arm and the push rod. When the push rod moves in the positive direction in the first direction, the boss can abut against the lower end face of the crossbar.
[0019] The cooperation between the crossbar and the boss limits the maximum distance the mounting arm extends relative to the upright in the first direction, i.e., the distance it moves forward in the first direction. Once the boss abuts against the crossbar, the crossbar can no longer move upwards, ensuring that the sensor's beam at the end of the mounting arm exits only towards the designated side. On the other hand, as the push rod moves upwards, it pushes the rotation axes of the swing arm and push rod into the horizontal plane containing the rotation axes of the swing arm and upright. If this is not limited by the surface contact between the boss and the crossbar, the swing arm and mounting arm will swing arbitrarily around the second axis, and the swing arm may even flip in the opposite direction while swinging along the upright, causing the sensor to fail to achieve stable detection.
[0020] Furthermore, the frame is provided with at least one stop, which is used to limit the distance that the mounting arm can move toward the frame in a first direction. When the push rod moves in the opposite direction in the first direction, the stop can abut against the swing arm.
[0021] The stop limits the maximum distance the mounting arm can retract relative to the upright in the second direction, i.e., the distance it can move in the negative direction of the second direction. When the push rod moves downward along the Y direction, it can cause the sensor's beam c at the end of the mounting arm to gradually move towards the upright along the X direction. However, if the axis of the second shaft passes through the sensor's beam c at the end of the mounting arm, i.e., when it is fully retracted, a dead point will be formed in the mechanism. At this time, the push rod's thrust on the rotating arm will have no horizontal component, which will cause the mounting arm to be unable to retract horizontally. Therefore, a stop is added. When the swing arm abuts against the stop, the push rod cannot move further downward, preventing the sensor's beam c from reaching the position that coincides with the axis of the second shaft.
[0022] Furthermore, the stop block is fitted with a cushioning pad, which is capable of elastic deformation. The cushioning effect of the cushioning pad can prevent screws from loosening due to mechanical impact, thereby avoiding affecting mechanical or optical accuracy. At the same time, it prevents the sensor from being damaged or having deviations in beam accuracy due to strong impact when the swing arm abuts against the stop block.
[0023] Furthermore, a third shaft is fixed to the end of the push rod, and the end of the rotating arm away from the mounting arm is sleeved on the third shaft and can rotate around the third shaft. A rolling bearing is provided between the third shaft and the rotating arm to reduce friction during rotation. The third shaft is parallel to the second shaft, and the axis of the third shaft is perpendicular to the axis of the push rod.
[0024] Furthermore, it also includes a mounting plate and a driving component, wherein the driving component is fixed to the mounting plate and can push the push rod to move linearly back and forth in the second direction. The specific type of the driving component is not limited, as long as it can drive the push rod to move back and forth in the second direction.
[0025] Furthermore, a connecting arm connects the pair of mounting arms, and the center of the connecting arm is fixedly connected to the rotating arm. The connecting arm and the mounting arm can be an integral structure or separate structures, fixed by screws. The connecting arm facilitates the connection between the mounting arm and the rotating arm.
[0026] Furthermore, the connecting arm can be integrally formed with the rotating arm or detachably connected to it. The key is to ensure that both mounting arms move synchronously with the rotating arm.
[0027] Furthermore, the mounting arm has a placement slot for placing the sensor, and the opposite surfaces of the pair of mounting arms also have slots that communicate with the placement slot. The sensor's transmitted light is emitted and received from the slots, and the slots are matched to the wafer thickness. The slots are designed to limit the size of the emitted and received light beams; therefore, the size of the slots is determined by the wafer thickness.
[0028] The present invention also discloses a wafer loading device, including a lifting drive and the aforementioned wafer inspection device. The mounting plate of the wafer inspection device is connected to the lifting drive, and the lifting drive can drive the wafer inspection device to reciprocate in a straight line in a second direction.
[0029] Once the wafer inspection unit reaches the inspection position, the linkage mechanism drives the mounting arms to extend into the wafer loading cassette. At this point, the mounting arms are positioned on either side of the bottommost wafer within the cassette, and a pair of sensors begin inspection. During inspection, the lifting drive unit moves the entire wafer inspection unit upwards along a second direction, inspecting all wafers in the cassette sequentially from bottom to top. After inspection, the mounting arms are positioned on either side of the topmost wafer within the cassette, and the linkage mechanism retracts the mounting arms from the cassette, completing the wafer inspection process.
[0030] The present invention also discloses a wafer transport device, including the above-mentioned wafer inspection device. Attached Figure Description
[0031] Figure 1 This is a three-dimensional structural schematic diagram of an embodiment of the present invention;
[0032] Figure 2 This is a schematic diagram of an embodiment of the present invention;
[0033] Figure 3 This is a schematic diagram of the linkage mechanism in one embodiment of the present invention;
[0034] Figure 4 This is a schematic diagram of the structure of the mounting arm and the connecting arm in one embodiment of the present invention;
[0035] Figure 5 This is a schematic diagram of the structure of the third axis in one embodiment of the present invention;
[0036] Figure 6 This is a schematic diagram of the structure of the second shaft in one embodiment of the present invention;
[0037] Figure 7 This is a schematic diagram of the structure of the stop block in one embodiment of the present invention.
[0038] In the picture:
[0039] 1. Upright pole; 2. Mounting arm; 21. Connecting arm; 3. Sensor; 4. Push rod; 5. Rotating arm; 51. Boss; 6. Swing arm; 7. First shaft; 8. Second shaft; 9. Crossbar; 10. Stop block; 101. Buffer pad; 11. Third shaft; 111. Rotating part; 112. Fixing part; 12. Mounting plate; 13. Drive component. Detailed Implementation
[0040] The preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art, thereby providing a clearer and more explicit definition of the scope of protection of the present invention.
[0041] See appendix Figure 1 and 2 As shown, a wafer inspection device of the present invention is used for wafer inspection. It includes a frame, a linkage mechanism and a pair of mounting arms 2. A pair of sensors 3 are mounted on the pair of mounting arms 2. The linkage mechanism can push the ends of the pair of mounting arms 2 with sensors 3 to reciprocate along a first direction (X direction in the figure) to push the pair of sensors 3 into or out of the wafer loading box.
[0042] In this embodiment, since the wafer cassette is placed horizontally and the opening on the wafer cassette is vertically positioned, the pair of mounting arms 2 always extend or retract in the horizontal direction, i.e., the first direction (X direction in the figure). The two mounting arms 2 are spaced apart and located on both sides of the wafer. Because the mounting arms 2 always extend or retract in the X direction under the drive of the linkage assembly, collisions between the mounting arms 2 and the wafer cassette or the wafer are avoided, effectively protecting the wafer.
[0043] See appendix Figure 2 As shown, the linkage mechanism includes a push rod 4, a rotating arm 5, and a swing arm 6. The push rod 4 can reciprocate linearly along the frame in a second direction, which is perpendicular to the first direction. Since the first direction is horizontal (X-direction in the figure), the second direction is vertical (Y-direction in the figure). One end of the rotating arm 5 is hinged to the end of the push rod 4, and the other end of the rotating arm 5 is hinged to the end of the swing arm 6. The other end of the swing arm 6 is hinged to the frame. A pair of mounting arms 2 are fixed to the ends of the rotating arm 5 away from the push rod 4, and the pair of mounting arms 2 are parallel to the rotating arm 5 and located in the same plane.
[0044] See appendix Figure 2 and 3 As shown, the rotation axis La of the swing arm 5 and the push rod 4 moves linearly along the Y direction, in the direction indicated by the hollow arrow in Figure 3. Since one end of the swing arm 6 is hinged to the frame, the rotation axis Ld of the swing arm 6 and the frame will not be displaced. The swing arm 6 will rotate around the rotation axis Ld of the swing arm 6 and the frame, thereby driving the end of the mounting arm 2 away from the swing arm 6 to move along the X direction, realizing the horizontal movement of the end of the mounting arm 2, that is... Figure 3 The direction is indicated by the solid arrow in the diagram. Sensor 3 is mounted at the end of the horizontally moving mounting arm 2, ensuring that sensor 3 always approaches and extends into the wafer cassette horizontally in the X direction. Driven by the linkage mechanism, this pair of sensors 3 does not change height during the insertion and withdrawal of the wafer cassette, thus avoiding the risk of collision between sensor 3 and mounting arm 2 and the wafer cassette during insertion and withdrawal.
[0045] On the other hand, since the push rod 4, which acts as the drive, moves linearly in the Y direction, and through the cooperation of the rotating arm 5 and the swing arm 6, the light beam Lc of the sensor 3 at the end of the mounting arm 2 is finally pushed to move linearly in the X direction. While satisfying the wafer inspection, the Y-direction movement is converted into the X-direction movement, which greatly saves space in the X direction and makes the overall structure more compact and stable.
[0046] In one embodiment, refer to Appendix Figure 3 As shown, the vertical distance from the rotation axis La of the rotating arm 5 and the push rod 4 to the rotation axis Lb of the rotating arm 5 and the swing arm 6, the vertical distance from the beam Lc of the sensor 3 at the end of the mounting arm 2 to the rotation axis Lb of the rotating arm 5 and the swing arm 6, and the vertical distance from the rotation axis Ld of the swing arm 6 and the frame to the rotation axis Lb of the rotating arm 5 and the swing arm 6 are the same.
[0047] The rotation axes La of the rotating arm 5 and the push rod 4, the rotation axis Lb of the rotating arm 5 and the swing arm 6, and the light rays Lc of the sensor 3 at the end of the mounting arm 2 are parallel to each other and located in the same plane. This ensures that the mounting arm 2 and the swing arm 6 form a long rod when viewed from the side. The length of the long rod is twice the distance between the rotation axes Ld and Lb at both ends of the swing arm 6, and the rotation axis Lb of the swing arm 6 and the rotating arm 5 is the midpoint of the long rod.
[0048] See appendix Figure 3 As shown, the intersection of the rotation axes La and Ld and the extension of the ray Lc from the sensor 3 at the end of the mounting arm 2 on the same vertical plane forms a right triangle. The rotation axis Ld is the endpoint corresponding to the right angle of the right triangle, while the rotation axes La of the rotating arm 5 and the push rod 4 and the ray Lc from the sensor 3 at the end of the mounting arm 2 are the two endpoints of the hypotenuse of the right triangle. Since the frame is fixed, the rotation axis Ld of the swing arm 6 and the frame is fixed, and the rotation axis Ld will not produce displacement in the X horizontal direction and Y vertical direction. However, the rotation axis La of the rotating arm 5 and the push rod 4 always moves back and forth along the Y direction in a straight line under the push of the push rod 4. Figure 3 (The direction of the hollow arrow in the image) ensures that the beam Lc emitted by the sensor 3 at the end of the mounting arm 2 will only move in the X direction. Figure 3 (The direction of the solid arrow in the middle).
[0049] In one embodiment, see Appendix Figure 2 As shown, since there is a pair of mounting arms 2, and the two mounting arms 2 need to be located on both sides of the wafer, a certain gap is left between the two mounting arms. In order to provide stable support and push for the mounting arms 2, a pair of swing arms 6 are also provided. The two swing arms 6 are rotatably connected by a first shaft 7, and the rotating arm 5 is sleeved on the first shaft 7 and can rotate around the shaft. The axis of the first shaft 7 is the rotation axis Lb of the rotating arm 5 and the swing arm 6.
[0050] See appendix Figure 2 As shown, a second shaft 8, corresponding to the swing arm 6, is fixed on the frame. A rolling bearing is sleeved on the second shaft 8, and the mounting arm 2 is sleeved on the corresponding rolling bearing to achieve the hinge connection between the swing arm 6 and the frame. The axis of the second shaft 8 is the rotation axis Ld between the swing arm 6 and the frame.
[0051] Rolling bearings are fixed to both swing arms 6, and both ends of the first shaft 7 are inserted into the rolling bearings. A rolling bearing is also installed between the rotating arm 5 and the first shaft 7. By connecting the two swing arms 6 with the first shaft 7, both swing arms 6 are simultaneously hinged to the rotating arm 5. This allows the swinging of one rotating arm 5 to drive the two swing arms 6 to swing synchronously, improving the stability of the linkage mechanism and providing more stable support for the mounting arm 2.
[0052] In one embodiment, see Appendix Figure 2 As shown, the rotating arm 5 is sleeved at the midpoint of the first shaft 7, that is, the two swing arms 6 are symmetrically arranged with respect to the axis of the swing arm 6, so that the swing arm 6 applies force evenly to the two rotating arms 5 during the movement, thereby improving the stability of the entire linkage mechanism.
[0053] In one embodiment, the frame includes two spaced-apart uprights 1 extending along the Y direction. Two swing arms 6 are respectively hinged to the two uprights 1, that is, two second shafts 8 are fixed to the two uprights 1.
[0054] See the attached diagram, see the attached diagram. Figure 6 As shown, the second shaft 8 includes a first column and a second column, both of which are cylindrical. The first and second columns have different diameters. The first column, with a larger diameter, is inserted into and fixedly connected to the upright 1 by a set screw. The rolling bearing is sleeved on the second column, which has a smaller diameter. By fixing itself to the upright 1 through the larger first column, the second shaft 8 can provide a more stable supporting force, thereby supporting the swing arm 6 that rotates around it.
[0055] See appendix Figure 2 and attached Figure 3As shown, the rotation axes La of push rod 4 and swing arm 5, and the rotation axes Ld of swing arm 6 and upright rod 1 are in the same vertical plane along the Y direction, and the rotation axes Ld of swing arm 6 and upright rod 1 are always located above the vertical plane along the Y direction of the rotation axes La of swing arm 6 and push rod 4.
[0056] In one embodiment, refer to Appendix Figure 2 As shown, a third shaft 11 is fixed to the end of the push rod 4, and one end of the rotating arm 5 is sleeved on the third shaft 11 and can rotate around the third shaft 11. A rolling bearing is provided between the third shaft 11 and the rotating arm 5. The hinge connection between the rotating arm 5 and the push rod 4 is achieved through the setting of the third shaft 11 and the rolling bearing. The axis of the third shaft 11 is the rotation axis La of the push rod 4 and the rotating arm 5.
[0057] The third shaft 11 is set parallel to the second shaft 8, and the axis of the third shaft 11 is perpendicular to the axis of the push rod 4.
[0058] In one embodiment, see Appendix Figure 5 As shown, the third shaft 11 includes a rotating part 111 and fixed parts 112 located on both sides of the rotating part 111. The rotating part 111 is cylindrical, and rolling bearings are sleeved on the rotating part 111. The fixed part 112 is provided with screw holes, and the fixed part 112 is fixedly connected to the push rod 4 by bolts passing through the screw holes. The push rod 4 is provided with grooves for the fixed part 112 to be inserted.
[0059] In one embodiment, to limit the distance the mounting arm 2 can move, see Appendix Figure 1 and 2 As shown, a crossbar 9 is provided between the two uprights 1, and the crossbar 9 is fixed above the uprights 1. An upwardly extending boss 51 is provided on the side of the rotating arm 5 near the third axis 11, that is, the boss 51 is provided on the side near the rotation axis La of the rotating arm 5 and the push rod 4. When the push rod 4 moves upward along Y, the boss 51 can abut against the lower end face of the crossbar 9 to limit the push rod 4 in the upward direction.
[0060] The cooperation between the crossbar 9 and the boss 51 limits the maximum distance that the mounting arm 2 can extend relative to the upright 1 in the X direction, i.e., the distance it can move in the positive X direction. When the boss 51 abuts against the crossbar 9, the crossbar 9 will be unable to move upwards further, ensuring that the sensor 3 at the end of the mounting arm 2 can only extend towards the designated side. On the other hand, when the push rod 4 moves upwards, it will push the rotation axis Lb of the swing arm 6 and the push rod 4 into the horizontal plane where the rotation axis Ld of the swing arm 6 and the upright 1 are located, i.e., the axes of the third axis 11 and the second axis 8 coincide. At this time, if the surface contact between the boss 51 and the crossbar 9 is not used for limiting, the swing arm 5 and the mounting arm 2 will swing arbitrarily around the axis of the second axis 8 as a whole, and there may even be a situation where the swing arm 6 flips in the opposite direction during the swing along the upright 1, which will cause the sensor 3 to fail to achieve stable detection.
[0061] In one embodiment, the boss 51 is integrally formed with the rotating arm 5. In another embodiment, the boss 51 may also be separate from the rotating arm 5, and the two are fixedly connected by a fastener.
[0062] In one embodiment, see Appendix Figure 1 and 2 As shown, at least one upright 1 is also provided with a stop 10, which can limit the maximum distance that the mounting arm 2 retracts relative to the upright 1 in the X direction, that is, the distance it moves in the negative X direction. When the push rod 4 moves downward in the Y direction, the stop 10 can abut against the swing arm 6.
[0063] When push rod 4 moves downward along the Y direction, it can drive the through-beam c of sensor 3 at the end of mounting arm 2 to gradually approach the upright rod 1 along the X direction. However, if the axis of the second shaft 8 passes through the through-beam c of sensor 3 at the end of mounting arm 2, that is, when it is fully retracted, a dead point will be formed in the mechanism. At this time, the pushing force of push rod 4 on rotating arm 5 will have no horizontal component, which will cause mounting arm 2 to be unable to extend horizontally. Therefore, a stop block 10 is added. When the swing arm 6 abuts against the stop block 10, push rod 4 cannot continue to move downward, preventing the through-beam Lc of sensor 3 from reaching the position that coincides with the axis (Ld) of the second shaft 8.
[0064] In this embodiment, two stops 10 are provided, located on the two uprights 1 respectively, to simultaneously limit the two swing arms 6 and improve the stability of limiting the swing arms 6.
[0065] In one embodiment, the stop 10 is fixed to the upright 1 by screws, as shown in the attached figure. Figure 7 As shown, a buffer pad 101, made of polyurethane, is also glued onto the stop 10. The buffer pad 101's cushioning effect prevents screws from loosening due to mechanical impact, thus avoiding affecting mechanical or optical accuracy. It also prevents the sensor 3 from being damaged or experiencing deviations in beam accuracy due to strong impact when the swing arm 6 contacts the stop 10.
[0066] In one embodiment, the stop block 10 is provided with a screw hole, and the stop block 10 is fixedly connected to the vertical rod by a bolt with a through screw. The stop block 10 is also provided with a placement groove, and the buffer pad 101 is embedded in the placement groove.
[0067] See appendix Figure 1 As shown, the wafer inspection device also includes a mounting plate 12 and a drive unit 13. The drive unit 13 is fixed on the mounting plate 12 and pushes the push rod 4 to reciprocate along the Y direction. The frame is fixed on the mounting plate 12.
[0068] The rotation axis La of the swing arm 6 and the push rod 4 is located on the same side of the mounting plate 12 as the rotation axis Ld of the swing arm 6 and the upright 1. The vertical distance from the rotation axis La of the swing arm 6 and the push rod 4 to the mounting plate 12 is the same as the vertical distance from the rotation axis Ld of the swing arm 6 and the upright 1 to the mounting plate 12. This ensures that the rotation axis La of the swing arm 6 and the push rod 4, and the rotation axis Ld of the swing arm 6 and the upright 1 are in the same vertical plane along the Y direction.
[0069] In one embodiment, the drive component 13 is a cylinder, and the telescopic shaft of the cylinder is fixedly connected to the end of the push rod 4 away from the rotating arm 5. To improve the stability of the push rod 4's movement, a guide rail can be fixed on the mounting plate 12, and a slider that can slide along the guide rail can be fixed on the push rod 4.
[0070] In another embodiment, the drive unit 13 includes a pneumatic slide table vertically mounted on the mounting plate 12. The pneumatic slide table includes a slide rail and a slider that can slide along the slide rail. A slide plate is fixed on the slider and can move up and down synchronously with the slider. The slide plate and the drag rod are fixedly connected. The pneumatic slide table pushes the slide plate to move up and down parallel in the vertical plane, thereby driving the drag rod to move up and down parallel in the vertical plane.
[0071] The drive unit 13 can also be an electric cylinder or an electric slide. The drive unit 13 only needs to be able to drive the push rod 4 to move back and forth in the Y direction.
[0072] In one embodiment, see Appendix Figure 2 and 4 As shown, a connecting arm 21 connects the two mounting arms 2, and the connecting arm 21 is fixedly connected to the rotating arm 5. The connecting arm 21 and the mounting arm 2 can be an integral structure or separate structures, and are fixed by screws.
[0073] The connecting arm 21 can be integrally formed with the rotating arm 5 or detachably connected to the rotating arm 5. The key is to ensure that the two mounting arms 2 move synchronously with the rotating arm 5.
[0074] In one embodiment, the rotating arm 5 is fixed at the midpoint of the connecting arm 21, that is, a pair of mounting arms 2 are axially symmetrically arranged with respect to the rotating arm 5. This symmetrical structure allows the rotating arm 5 to be subjected to uniform force, thereby improving the stability between the mounting arm 2 and the rotating arm 5.
[0075] The connecting arm 21 is fixed to the other end of the mounting arm 2 where the sensor 3 is mounted. The pair of mounting arms 2 have identical structures, and each mounting arm 2 has a placement slot for placing the sensor 3. The pair of sensors 3 are a transmitting sensor 3 and a receiving sensor 3, which detect the wafer by controlling the light transmission and reception between them.
[0076] See appendix Figure 4As shown, the two mounting arms 2 also have slots on their opposite sides that communicate with the placement groove. The transmitted light from the sensor 3 is emitted and received from these slots, and the slots are matched to the thickness of the wafer. The slots are designed to limit the size of the emitted and received light beams; therefore, the size of the slots is determined by the wafer thickness.
[0077] The linkage mechanism of this invention allows the end of the mounting arm 2, on which the through-beam sensor 3 is mounted, to extend into or retract from the wafer loading cassette along the X-axis, avoiding collisions with the wafer loading cassette and the wafer. When the wafer inspection device reaches the inspection position, the drive unit 13 drives the push rod 4 to move upward along the Y-axis. The push rod 4 drives the rotating arm 5 to swing until the protrusion on the rotating arm 5 abuts against the crossbar 9. Under the guidance of the swing arm 6, the rotating arm 5 pushes the mounting arm 2, which is fixedly connected to it, into the wafer loading cassette. Then, the entire wafer inspection device moves upward to complete the inspection of the wafer in the wafer loading cassette. After the inspection is completed, the drive unit 13 drives the push rod 4 to move downward along the Y-axis. The push rod 4 drives the rotating arm 5 to swing. Under the guidance of the swing arm 6, the rotating arm 5 pushes the mounting arm 2, which is fixedly connected to it, out of the wafer loading cassette and retracts to a position close to the frame until the swing arm 6 abuts against the stop block 10.
[0078] During this process, since the swing arm 6 forms a fixed point with the rotation axis Ld of the frame, while the rotation axis La of the rotating arm 5 and the push rod 4 always moves back and forth in a straight line along the Y direction under the push of the push rod 4, the long rod formed between the beam Lc of the sensor 3 at the end of the mounting arm 2 and the rotation axis La of the rotating arm 5 and the push rod 4 is the diameter of a circle, and the rotation axis Lb of the rotating arm 5 and the swing arm 6 is always the center of this circle. At the same time, the perpendicular distance from the rotation axis Ld of the swing arm 6 and the frame to the rotation axis Lb of the rotating arm 5 and the swing arm 6 is the radius of this circle. Such a right-angled triangular structure ensures that when the rotation axis La of the rotating arm 5 and the push rod 4 moves in the Y direction, the beam Lc of the sensor 3 at the end of the mounting arm 2 will only move in the X direction.
[0079] In one embodiment, the present invention also discloses a wafer loading device, including the above-mentioned wafer inspection device. The wafer loading device includes a lifting drive 13, the mounting plate 12 of the wafer inspection device is connected to the lifting drive 13, and the lifting drive 13 can drive the entire wafer inspection device to move linearly back and forth along a first direction (Y direction).
[0080] Once the wafer inspection device reaches the inspection position, the linkage mechanism drives the mounting arm 2 to extend into the wafer loading cassette. At this point, the mounting arm 2 is positioned on both sides of the lowest wafer in the wafer loading cassette, and a pair of sensors 3 begin inspection. During the inspection process, the lifting drive 13 drives the entire wafer inspection device to move upward along the Y-axis, inspecting all wafers in the wafer loading cassette sequentially from bottom to top. After inspection, the mounting arm 2 is positioned on both sides of the highest wafer in the wafer loading cassette, and the linkage mechanism drives the mounting arm 2 to exit the wafer loading cassette, completing the wafer inspection.
[0081] In one embodiment, the present invention also discloses a wafer transport device, including the wafer inspection device described above.
[0082] The above embodiments are only for illustrating the technical concept and features of the present invention. Their purpose is to enable those skilled in the art to understand the content of the present invention and implement it. They should not be used to limit the scope of protection of the present invention. All equivalent changes or modifications made in accordance with the spirit and essence of the present invention should be covered within the scope of protection of the present invention.
Claims
1. A wafer inspection device, characterized in that: The system includes a frame, a linkage mechanism, and a pair of mounting arms, each mounting arm carrying a pair of sensors. The two mounting arms are spaced apart and located on opposite sides of the wafer. The linkage mechanism enables the ends of the mounting arms with the sensors mounted to reciprocate linearly in a first direction. The linkage mechanism includes... A push rod, wherein the push rod moves linearly back and forth along the frame in a second direction perpendicular to the first direction; A rotating arm, one end of which is hinged to the end of a push rod, and the other end of which is fixed to a pair of mounting arms, the pair of mounting arms being parallel to the rotating arm and located in the same plane; A swing arm, one end of which is hinged to the frame and the other end of which is hinged to the end of the rotating arm near the mounting arm; The rotation axes of the rotating arm and push rod, the rotation axes of the rotating arm and swing arm, and the light rays from the sensor at the end of the mounting arm are parallel to each other and located in the same plane; the perpendicular distances from the rotation axes of the rotating arm and push rod to the rotation axes of the rotating arm and swing arm, the perpendicular distances from the light rays from the sensor at the end of the mounting arm to the rotation axes of the rotating arm and swing arm, and the perpendicular distances from the rotation axes of the swing arm and frame to the rotation axes of the rotating arm and swing arm are the same; Two swing arms are provided, and a first shaft is rotatably connected between the two swing arms. The swing arm is sleeved on the first shaft and can rotate around the first shaft. The frame includes two spaced uprights that extend along a second direction. The swing arms are hinged to the uprights. The frame is provided with a crossbar, and the rotating arm is provided with an upwardly extending boss. The boss is located on the side near the rotation axis of the rotating arm and the push rod. When the push rod moves in the first direction, the boss can abut against the lower end face of the crossbar. The frame is provided with at least one stop block, which is used to limit the distance that the mounting arm moves toward the frame in the first direction. When the push rod moves in the first direction in the opposite direction, the stop block can abut against the swing arm.
2. The wafer inspection device according to claim 1, characterized in that: The rotation axes of the rotating arm and push rod, and the rotation axes of the swing arm and frame are located in the same vertical plane along the second direction, and the rotation axes of the swing arm and frame are always located above the rotation axes of the rotating arm and push rod.
3. The wafer inspection apparatus according to claim 1, characterized in that: The rotating arm is fitted at the midpoint of the first shaft.
4. The wafer inspection device according to claim 1, characterized in that: A second shaft corresponding to the swing arm is fixed on the upright, and the swing arm is sleeved on the second shaft and rotates along the second shaft.
5. The wafer inspection apparatus according to claim 1, characterized in that: The stop block is coated with a buffer pad, which can undergo elastic deformation.
6. The wafer inspection apparatus according to claim 1, characterized in that: The end of the push rod is fixed with a third shaft, and the end of the rotating arm away from the mounting arm is sleeved on the third shaft and can rotate around the third shaft.
7. The wafer inspection apparatus according to any one of claims 1-6, characterized in that: It also includes a mounting plate and a drive unit, which is fixed to the mounting plate and can push the push rod to move linearly back and forth in the second direction.
8. The wafer inspection apparatus according to claim 1, characterized in that: A connecting arm is connected between the pair of mounting arms, and the center of the connecting arm is fixedly connected to the rotating arm.
9. The wafer inspection apparatus according to claim 8, characterized in that: The connecting arm and the mounting arm are integrally formed or detachably connected, and the connecting arm and the rotating arm are integrally formed or detachably connected.
10. The wafer inspection apparatus according to claim 1, characterized in that: The mounting arm has a placement slot for placing the sensor, and the opposite sides of the pair of mounting arms also have slots that communicate with the placement slot.
11. A wafer loading device, characterized in that: The device includes a lifting drive and a wafer inspection apparatus as described in any one of claims 1-10, wherein the mounting plate of the wafer inspection apparatus is connected to the lifting drive, and the lifting drive can drive the wafer inspection apparatus to reciprocate in a straight line in a second direction.
12. A wafer transfer device, characterized in that: Includes the wafer inspection device according to any one of claims 1-10.
Citation Information
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