A gas transfer line system

Abstract

The present application relates to the technical field of semiconductor manufacturing, and more particularly to a gas transmission pipeline system. The present application provides a gas transmission pipeline system, which comprises a chemical source transmission pipeline, a chemical source purge pipeline and a connecting pipeline. The chemical source transmission pipeline comprises a chemical source input pipeline and a chemical source output pipeline. The chemical source input pipeline is connected to the chemical source purge pipeline in an on-off manner. The chemical source output pipeline is connected to the connecting pipeline in an on-off manner and is provided with at least one ALD valve. The chemical source purge pipeline is connected to the chemical source input pipeline, the chemical source output pipeline and the connecting pipeline in an on-off manner respectively. The chemical source output pipeline is provided with a nozzle. The nozzle is arranged at a position upstream of the at least one ALD valve. The gas transmission pipeline system provided by the present application can not only realize accurate control of the inflow amount of the chemical source, but also greatly improve the purge efficiency, reduce the process time and improve the yield.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor manufacturing, and more particularly to a gas transmission pipeline system. BACKGROUND

[0002] With the development of microelectronic and deep submicron chip technology, the size of devices and materials is required to be continuously reduced, and the aspect ratio in the device is continuously increased, so that the thickness of the used material is reduced to the order of several nanometers. ALD (Atomic layer deposition) is a method of plating substances on the surface of a substrate in the form of a single-atom film layer by layer. Compared with other deposition methods, ALD has excellent control ability over the composition and thickness of the thin film, and the prepared thin film has good conformality, high purity and uniformity, and therefore is favored in the field of semiconductor material preparation.

[0003] In thermal atomic layer deposition process, two or more chemical sources are alternately introduced into the reaction chamber for reaction. Since the wafer has entered the 5nm level or even lower, in order to better precisely control the amount of chemical source flowing into the chamber in each cycle, a high-efficiency flow limiting component needs to be added to the pipeline through which the chemical source enters the chamber, and an ALD valve with a faster response time is used to precisely control the time of the chemical source flowing into the chamber, so as to achieve the effect of precise control of the amount of chemical source flowing in.

[0004] However, the addition of a high-efficiency flow limiting component in the pipeline, although it can improve the control accuracy of the amount of chemical source entering the chamber, greatly reduces the efficiency of purging the pipeline, leading to the extension of the wafer processing cycle and the difficulty in improving the production capacity.

[0005] At the same time, since the chemical source pipeline is a through-cavity pipeline, when the machine needs to be opened each time, in addition to the hand valve on the chemical source cylinder, the ALD valve is the only valve body that isolates the atmosphere from the chemical source. Due to the limitation of the high-efficiency flow limiting component on the purging of the pipeline, the purging efficiency of the pipeline is reduced, causing the residual of the chemical source in the pipeline.

[0006] Therefore, in the case where the chemical source reacts strongly with air, the ALD valve has a high risk of failure.

[0007] Therefore, there is an urgent need for a gas transmission pipeline system that can precisely control the amount of chemical source flowing in on the one hand, and does not affect the purging efficiency of the pipeline on the other hand. SUMMARY

[0008] The purpose of the present application is to provide a gas transmission pipeline system to solve the problem of low efficiency caused by purging the pipeline under the precise control of the flow of the chemical source in the prior art.

[0009] In order to achieve the above object, the present application provides a gas transmission pipeline system, comprising a chemical source transmission pipeline, a chemical source purge pipeline and a connecting pipeline:

[0010] The chemical source transmission pipeline comprises a chemical source input pipeline and a chemical source output pipeline, and the chemical source input pipeline and the chemical source output pipeline are respectively connected with the input port and the output port of the chemical source in an on-off manner;

[0011] The chemical source input pipeline is connected with the chemical source purge pipeline in an on-off manner;

[0012] The chemical source output pipeline is connected with the connecting pipeline in an on-off manner and is provided with at least one ALD valve;

[0013] The chemical source purge pipeline is connected with the chemical source input pipeline, the chemical source output pipeline and the connecting pipeline in an on-off manner;

[0014] The connecting pipeline is connected with the reaction cavity and the gas distribution pipeline;

[0015] The chemical source output pipeline is provided with a nozzle;

[0016] The nozzle is arranged at a position upstream of the at least one ALD valve.

[0017] In an embodiment, the chemical source input pipeline is provided with at least one ALD valve and at least one manual valve;

[0018] The at least one ALD valve is arranged at a position upstream of the at least one manual valve.

[0019] In an embodiment, the chemical source output pipeline is provided with at least one manual valve;

[0020] The at least one manual valve is arranged at a position upstream of the at least one ALD valve.

[0021] In an embodiment, the chemical source purge pipeline is provided with at least one ALD valve;

[0022] The at least one ALD valve is arranged between the connection end of the chemical source purge pipeline and the chemical source input pipeline and the chemical source output pipeline.

[0023] In an embodiment, the connecting pipeline is provided with at least one pneumatic valve.

[0024] In order to achieve the above object, the present application provides a gas transmission pipeline system, comprising a chemical source transmission pipeline, a chemical source purge pipeline, a filling pipeline and a connecting pipeline:

[0025] The chemical source transmission pipeline comprises a chemical source input pipeline and a chemical source output pipeline, and the chemical source input pipeline and the chemical source output pipeline are respectively connected with the input port and the output port of the chemical source in an on-off manner.

[0026] The chemical source input pipeline is connected with the chemical source purge pipeline in an on-off manner.

[0027] The chemical source output pipeline is connected with the connecting pipeline in an on-off manner and is provided with at least one ALD valve.

[0028] The chemical source purge pipeline is connected with the chemical source input pipeline, the chemical source output pipeline and the connecting pipeline in an on-off manner.

[0029] The connecting pipeline is connected with the reaction cavity and the gas distribution pipeline.

[0030] The filling pipeline is connected with the connecting pipeline and the gas distribution pipeline.

[0031] The filling pipeline and the connecting pipeline are respectively provided with interlocking valves at the connection positions.

[0032] In an embodiment, the chemical source input pipeline is provided with at least one ALD valve and at least one manual valve.

[0033] The at least one ALD valve is arranged at a position upstream of the at least one manual valve.

[0034] In an embodiment, the chemical source output pipeline is provided with at least one manual valve.

[0035] The at least one manual valve is arranged at a position upstream of the at least one ALD valve.

[0036] In an embodiment, the chemical source purge pipeline is provided with at least one ALD valve.

[0037] The at least one ALD valve is arranged between the connection ends of the chemical source purge pipeline and the chemical source input pipeline and the chemical source output pipeline.

[0038] In an embodiment, the connecting pipeline is provided with a spray port.

[0039] The spray port is arranged at a position downstream of the interlocking valve of the connecting pipeline.

[0040] In an embodiment, the interlocking valve is an interlocking pneumatic valve or a two-position three-way valve.

[0041] In an embodiment, the filling pipeline is provided with a first interlocking valve at the connection position, and the connecting pipeline is provided with a second interlocking valve at the connection position.

[0042] During the process, the first interlock valve is closed and the second interlock valve is opened;

[0043] During the first-stage purging process, the first interlock valve is closed and the second interlock valve is opened;

[0044] During the second-stage purging process, the first interlock valve is opened and the second interlock valve is closed;

[0045] During the chamber opening process, the first interlock valve is opened and the second interlock valve is closed.

[0046] The gas transmission pipeline system provided by the application has the following beneficial effects:

[0047] 1) By reasonably setting the orifice position or adding a filling pipeline, the ALD valve combined with the orifice realizes precise control of the inflow amount of the chemical source without affecting the purging efficiency;

[0048] 2) A pneumatic valve is added downstream of the ALD valve, and the atmospheric air is isolated by closing the pneumatic valve before the chamber is opened to protect the ALD valve and reduce the failure risk. BRIEF DESCRIPTION OF DRAWINGS

[0049] The above and other features, properties, and advantages of the application will become more apparent by the following description with reference to the drawings and embodiments, in which the same reference numerals are used throughout to denote the same features, and wherein:

[0050] Figure 1 A principle block diagram of a gas transmission pipeline system according to embodiment 1 of the application is disclosed;

[0051] Figure 2 A principle block diagram of a gas transmission pipeline system according to embodiment 2 of the application is disclosed.

[0052] The meanings of the reference numerals in the drawings are as follows:

[0053] 100 chemical source purging pipeline;

[0054] 210 chemical source input pipeline;

[0055] 211 ALD valve;

[0056] 212 manual valve;

[0057] 220 chemical source output pipeline;

[0058] 221 ALD valve;

[0059] 222 manual valve;

[0060] 223 orifice;

[0061] 300 connecting pipeline;

[0062] 301 pneumatic valve;

[0063] 302 second interlock valve;

[0064] 303 nozzle;

[0065] 400 filling line;

[0066] 402 first interlock valve;

[0067] 500 chemical source. DETAILED DESCRIPTION

[0068] In order to make the objects, technical solutions and advantages of the present application clearer, the present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and not intended to limit the present application.

[0069] In the description of the present application, the description of the terms "one embodiment", "some embodiments", "an example", "a specific example", or "some examples" means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present application, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0070] Embodiment 1

[0071] Figure 1 A schematic diagram of a gas delivery line system according to embodiment 1 of the present application is disclosed, as shown in a gas delivery line system comprising a chemical source delivery line, a chemical source purge line 100 and a connecting line 300: Figure 1

[0072] The chemical source delivery line comprises a chemical source input line 210 and a chemical source output line 220, which are respectively connectable to an input port and an output port of a chemical source 500.

[0073] The chemical source purge line 100 is respectively connectable to the chemical source input line 210, the chemical source output line 220 and the connecting line 300.

[0074] The connecting line 300 is respectively connected to a reaction chamber and a gas distribution line.

[0075] In this embodiment, the chemical source 500 is a liquid source, trimethylaluminum (TMA). ​

[0076] The chemical source input pipeline 210 can be connected to the chemical source purging pipeline 100 in a switchable manner. It is equipped with an ALD valve 211 and a manual valve 212. The ALD valve 211 is located upstream of the manual valve 212. Here, the upstream position refers to the upstream relative position in the direction of airflow (arrow direction) in the pipeline. That is, the manual valve 212 is closer to the chemical source 500 than the ALD valve 211.

[0077] The chemical source output pipeline 220 can be connected to the connecting pipeline 300 in a switchable manner. It is equipped with an ALD valve 221 and a manual valve 222. The manual valve 222 is located upstream of the ALD valve 221. Here, upstream position refers to the upstream relative position in the direction of airflow (arrow direction) in the pipeline. That is, the manual valve 222 is closer to the chemical source 500 than the ALD valve 221.

[0078] Furthermore, the chemical source purge line 100 is equipped with an ALD valve 101, which is located between the two connection ends of the chemical source purge line 100 and the chemical source input line 210 and the chemical source output line 220.

[0079] exist Figure 1 In the embodiment shown, in order to accurately control the gas flow rate of the chemical source 500, the chemical source output pipeline 220 is provided with an orifice 223. At the same time, in order to avoid the main flow direction of the purging gas of the chemical source purging pipeline 100, the orifice 223 is located upstream of the ALD valve 221.

[0080] Furthermore, the nozzle 223 is positioned between the ALD valve 221 and the manual valve 222, avoiding the direction of the purge gas flow. This allows for efficient and precise flow restriction of the chemical source inflow while also avoiding the direction of the purge gas flow, thus solving the problem of reduced purge efficiency in the pipeline after flow restriction.

[0081] The technical solution in Example 1 achieves precise control of the flow rate of the chemical source into the cavity by reasonably setting the position of the nozzle, without affecting the purging efficiency.

[0082] Furthermore, the ALD valve is protected by adding a pneumatic valve before the cavity pipeline. Specifically, the connecting pipeline 300 is provided with at least one pneumatic valve 301, which is downstream of ALD valve 221 and ALD valve 101.

[0083] A pneumatic valve 301 is added downstream of the ALD valve to protect it. By closing the pneumatic valve 301 before opening the chamber, the reaction possibility of residual chemical source in the pipeline and air in the atmosphere is greatly reduced, and the technical effect of reducing the failure risk of the ALD valve is realized.

[0084] Embodiment 2

[0085] Compared with embodiment 1, embodiment 2 also uses an orifice, but the installation position is changed, and a refill purge line 400 is added for efficient purging. The other structures are the same as those of embodiment 1.

[0086] Figure 2 The principle block diagram of the gas transmission pipeline system according to embodiment 2 of the present application is disclosed, as shown in Figure 2 The gas transmission pipeline system includes a chemical source transmission pipeline, a chemical source purge pipeline 100, a connecting pipeline 300 and a refill purge line 400.

[0087] The chemical source transmission pipeline includes a chemical source input pipeline 210 and a chemical source output pipeline 220, and the chemical source input pipeline 210 and the chemical source output pipeline 220 are respectively connected to the input port and the output port of the chemical source 500 in an on-off manner.

[0088] The chemical source purge pipeline 100 is connected to the chemical source input pipeline 210, the chemical source output pipeline 220 and the connecting pipeline 300 in an on-off manner.

[0089] The connecting pipeline 300 is connected to the reaction chamber and the gas distribution pipeline.

[0090] The chemical source input pipeline 210 is connected to the chemical source purge pipeline 100 in an on-off manner, and is provided with an ALD valve 211 and a manual valve 212. The ALD valve 211 is arranged at an upstream position of the manual valve 212. Here, the upstream position refers to the upstream relative position in the gas flow direction (arrow direction) in the pipeline, that is, the manual valve 212 is closer to the chemical source 500 than the ALD valve 211.

[0091] The chemical source output pipeline 220 is connected to the connecting pipeline 300 in an on-off manner, and is provided with an ALD valve 221 and a manual valve 222. The manual valve 222 is arranged at an upstream position of the ALD valve 221. Here, the upstream position refers to the upstream relative position in the gas flow direction (arrow direction) in the pipeline, that is, the manual valve 222 is closer to the chemical source 500 than the ALD valve 221.

[0092] Further, the chemical source purge line 100 is provided with an ALD valve 101, which is arranged between the two connection ends of the chemical source purge line 100 and the chemical source input line 210 and the chemical source output line 220.

[0093] In Figure 2 In the illustrated embodiment, in order to precisely control the gas flow of the chemical source 500, the connection line 300 is provided with an orifice 303.

[0094] The orifice 303 is arranged downstream of the second interlock valve 302 of the connection line 300.

[0095] Meanwhile, in order to improve the purging efficiency, a refill purge line 400 is added between the orifice 303 and the ALD valve 101 and the ALD valve 221 (in the liquid tank) for high-efficiency purging, and an interlock valve is added at the connection to control the gas flow direction.

[0096] More specifically, the refill purge line 400 is connected to the connection line 300 and the gas distribution line, respectively.

[0097] The refill purge line 400 and the connection line 300 are respectively provided with interlock valves at the connection.

[0098] The refill purge line 400 is provided with a first interlock valve 402 at the connection, and the connection line 300 is provided with a second interlock valve 302 at the connection.

[0099] Further, the first interlock valve 402 and the second interlock valve 302 can be interlocked pneumatic valves or 2-position 3-way pneumatic valves.

[0100] Thus, the refill purge line 400 can be used for high-efficiency purging, and the orifice 303 can be used for precise control of the flow of the chemical source into the chamber through the ALD valve.

[0101] In addition, the interlocked pneumatic valves or 2-position 3-way pneumatic valves can also effectively protect the ALD valve when the machine needs to be opened.

[0102] In Figure 2 In the illustrated embodiment, the opening and closing sequence of the interlock valves is as follows:

[0103] During the process, the first interlock valve 402 is closed, and the second interlock valve 302 is opened.

[0104] During the first-stage purging process, the first interlock valve 402 is closed, and the second interlock valve 302 is opened.

[0105] In the second-stage purging process, the first interlock valve 402 is opened, and the second interlock valve 302 is closed.

[0106] In the opening process, the first interlock valve 402 is opened, and the second interlock valve 302 is closed.

[0107] In the technical solution of the embodiment 2, the interlock valve is used to change the flow direction of the gas in the pipeline flexibly. When the process is performed on the machine, the filling pipeline 400 is closed, and the chemical source 500 enters the reaction cavity through the connecting pipeline limited by the orifice 303. When the whole pipeline needs to be purged, the connecting pipeline 300 is purged for a short time (in the first-stage purging process), and then the filling pipeline 400 is switched to in the second-stage purging process to purify the chemical source transmission pipeline and the chemical source purging pipeline 100 related to the ALD valve. When the cavity needs to be opened, the second interlock valve 302 is closed, and the first interlock valve 402 is opened to protect the ALD valve.

[0108] The gas transmission pipeline system provided by the application has the following beneficial effects.

[0109] 1) The ALD valve is combined with the orifice to realize the precise control of the inflow of the chemical source by reasonably setting the position of the orifice or adding the filling pipeline, which greatly improves the purging efficiency, reduces the process time, and improves the yield.

[0110] 2) The protection pneumatic valve is added downstream of the ALD valve. Before the cavity is opened, the pneumatic valve is closed to isolate the atmosphere and protect the ALD valve, thereby reducing the failure risk.

[0111] Although the above methods are illustrated and described as a series of actions for the purpose of simplifying the explanation, it should be understood and appreciated that the methods are not limited by the order of the actions, because according to one or more embodiments, some actions can occur in different orders and / or concurrently with other actions illustrated and described herein or not illustrated and described herein but can be understood by those skilled in the art.

[0112] As shown in the present application and claims, unless the context clearly indicates otherwise, the words “one”, “an”, “a”, and / or “the” do not refer to the singular, but can also include the plural. Generally, the terms “comprise” and “include” only indicate the inclusion of the steps and elements explicitly identified, and these steps and elements do not constitute an exclusive list, and the method or device can also include other steps or elements.

[0113] In the description of the present application, it should be noted that the terms "upper", "lower", "front", "back", "left", "right", "vertical", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings based on the orientation or positional relationship, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application.

[0114] In the present application, unless otherwise explicitly specified and limited, "on" or "under" of a first feature to a second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, "on", "above" and "over" of the first feature to the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the first feature is higher in horizontal height than the second feature. "Under", "below" and "under" of the first feature to the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the first feature is lower in horizontal height than the second feature.

[0115] In the description of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be directly connected, or indirectly connected through an intermediate medium, or it can be connected inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0116] The above embodiments are provided to those skilled in the art to implement or use the present application, and those skilled in the art can make various modifications or changes to the above embodiments without departing from the inventive concept of the present application, therefore the protection scope of the present application is not limited by the above embodiments, but should be the maximum scope of the innovative features mentioned in the claims.

Claims

1. A gas transfer line system, characterized by, The chemical source transmission pipeline, the chemical source purge pipeline and the connecting pipeline are provided. The chemical source transmission pipeline comprises a chemical source input pipeline and a chemical source output pipeline, and the chemical source input pipeline and the chemical source output pipeline are respectively connected with the input port and the output port of the chemical source in an on-off manner. The chemical source input pipeline is connected with the chemical source purge pipeline in an on-off manner. The chemical source output pipeline is connected with the connecting pipeline in an on-off manner and is provided with at least one ALD valve. The chemical source purge pipeline is connected with the chemical source input pipeline, the chemical source output pipeline and the connecting pipeline in an on-off manner. The connecting pipeline is connected with the reaction cavity and the gas distribution pipeline. The chemical source output pipeline is provided with a nozzle. The nozzle is arranged at an upstream position of the at least one ALD valve.

2. The gas transfer line system of claim 1, wherein, The chemical source input pipeline is provided with at least one ALD valve and at least one manual valve. The at least one ALD valve is arranged at an upstream position of the at least one manual valve.

3. The gas transfer line system of claim 1, wherein, The chemical source output pipeline is provided with at least one manual valve. The at least one manual valve is arranged at an upstream position of the at least one ALD valve.

4. The gas transfer line system of claim 1, wherein, The chemical source purge pipeline is provided with at least one ALD valve. The at least one ALD valve is arranged between the connection end of the chemical source purge pipeline and the chemical source input pipeline and the chemical source output pipeline.

5. The gas transfer line system of claim 1, wherein, The connecting pipeline is provided with at least one pneumatic valve.

6. A gas transfer line system characterized by, The chemical source transmission pipeline, the chemical source purge pipeline, the filling pipeline and the connecting pipeline are provided. The chemical source transmission pipeline comprises a chemical source input pipeline and a chemical source output pipeline, and the chemical source input pipeline and the chemical source output pipeline are respectively connected with the input port and the output port of the chemical source in an on-off manner. The chemical source input pipeline is connected with the chemical source purge pipeline in an on-off manner. The chemical source output pipeline is connected with the connecting pipeline in an on-off manner and is provided with at least one ALD valve. The chemical source purge pipeline is connected with the chemical source input pipeline, the chemical source output pipeline and the connecting pipeline in an on-off manner. The connecting pipeline is connected with the reaction cavity and the gas distribution pipeline. The filling pipeline is connected with the connecting pipeline and the gas distribution pipeline. The filling pipeline and the connecting pipeline are respectively provided with interlocking valves at the connection positions. The connecting pipeline is provided with a nozzle. The nozzle is arranged at a downstream position of the interlocking valve of the connecting pipeline.

7. The gas transfer line system of claim 6, wherein, The chemical source input pipeline is provided with at least one ALD valve and at least one manual valve. The at least one ALD valve is arranged at an upstream position of the at least one manual valve.

8. The gas transfer line system of claim 6, wherein, The chemical source output pipeline is provided with at least one manual valve. The at least one manual valve is arranged at an upstream position of the at least one ALD valve.

9. The gas transfer line system of claim 6, wherein, The chemical source purge pipeline is provided with at least one ALD valve. The at least one ALD valve is arranged between the connection end of the chemical source purge pipeline and the chemical source input pipeline and the chemical source output pipeline.

10. The gas transfer line system of claim 6, wherein, The interlocking valve is an interlocking pneumatic valve or a two-position three-way valve.

11. The gas transfer line system of claim 6, wherein, The filling pipeline is provided with a first interlocking valve at the connection position, and the connecting pipeline is provided with a second interlocking valve at the connection position. During the process, the first interlocking valve is closed, and the second interlocking valve is opened. During the first purge, the first interlock valve is closed and the second interlock valve is open; During the second purge, the first interlock valve is open and the second interlock valve is closed; During the opening of the chamber, the first interlock valve is open and the second interlock valve is closed.

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