A magnetron seal detection and processing technology

Abstract

The present invention discloses a magnetron seal detection and processing process, comprising the following steps: S1, performing vacuum detection on magnetron products, identifying and judging magnetron products with qualified vacuum and magnetron products with unqualified vacuum, and classifying them, scrapping magnetron products with unqualified vacuum, and performing step S2 on magnetron products with qualified vacuum; S2, magnetron product tail gas treatment step, connecting the magnetron product to the tail gas treatment power supply, and maintaining a certain power-on time, to promote the full absorption of tail gas inside the magnetron product. The present invention detects the vacuum inside the magnetron product by a pressurization method, and when the vacuum inside the magnetron is not enough, it can be directly scrapped, thereby achieving the process purpose of eliminating defective products, and does not occupy subsequent process resources; only when the vacuum inside the magnetron reaches the design standard, the process flow of the present invention can be completed, thereby improving the seal detection and processing efficiency of the magnetron.

Description

Technical Field

[0001] The invention relates to the technical field of magnetron production technology, in particular to a magnetron sealing detection processing technology. Background Art

[0002] Microwave ovens have become a common electrical appliance in people's daily lives, and their related technologies have been quite mature after years of development. Especially in recent years, with the improvement of people's living standards, people's demand for microwave ovens has also increased, which has also stimulated microwave oven manufacturers to carry out technological reforms to improve their production capacity. As the core component of microwave ovens, the efficiency and quality of the production and processing of magnetrons are the top priority of microwave oven production, which is directly related to the production capacity and quality of microwave oven production. Magnetrons are vacuum parts. The production process includes heat treatment, vacuum treatment and sealing to ensure the vacuum inside the magnetron. In actual production, after the magnetron is exhausted and sealed, it is necessary to conduct multiple process inspections and adjustments to make the magnetron products meet the product design standards. After the magnetron is sealed, there will still be a certain amount of residual gas inside it. If it is not handled in time, it is easy to affect the product quality of the magnetron. How to design the process treatment method after the magnetron is sealed during the production of magnetrons is of great significance to improving the quality of magnetron products. Summary of the invention

[0003] In view of the above problems, the present invention provides a magnetron seal detection and processing process. The technical solution of the present invention is:

[0004] A magnetron seal detection processing process, characterized in that it includes the following steps:

[0005] S1, performing vacuum degree detection on magnetron products, identifying and determining magnetron products with qualified vacuum degree and magnetron products with unqualified vacuum degree and classifying them, scrapping magnetron products with unqualified vacuum degree, and executing step S2 for magnetron products with qualified vacuum degree;

[0006] S2, the step of treating the exhaust gas of the magnetron product, connects the magnetron product to the exhaust gas treatment power supply and maintains the power supply for a certain period of time to promote the full absorption of the exhaust gas inside the magnetron product.

[0007] As a further illustration of the present invention, step S1 comprises the steps of:

[0008] S101, process treatment process, so that the magnetron filament produces different effects under different internal vacuum environments;

[0009] S102, a detection process, after the processing of step S101, the magnetron filament has different results, and the vacuum degree inside the magnetron is detected to see whether it reaches the design standard value.

[0010] Furthermore, in step S101, the vacuum degree inside the magnetron is detected by using a short-time high voltage method, including applying a short-time high voltage to the magnetron product to be detected, and the short-time high voltage is applied to two lead terminals of the magnetron.

[0011] Furthermore, the high voltage applied in step S101 is powered on for 1.5-2.5 seconds.

[0012] Furthermore, in the detection process of step S102, the magnetron after the process is detected by one or more of on-off detection, voltage detection, resistance detection and current detection.

[0013] Furthermore, in the on-off detection, if the magnetron and the detection power supply can form a path, the corresponding magnetron is classified as a magnetron product with qualified vacuum degree, and step S2 is continued; if the magnetron and the detection power supply cannot form a path, the corresponding magnetron is classified as a magnetron product with unqualified vacuum degree and is scrapped.

[0014] Furthermore, in the voltage detection, if the detected magnetron filament voltage is within the design range, the corresponding magnetron is classified as a magnetron product with qualified vacuum degree, and step S2 is continued; if the detected magnetron filament voltage is not within the design range, the corresponding magnetron is classified as a magnetron product with unqualified vacuum degree and is scrapped.

[0015] Furthermore, in the resistance detection, if the detected magnetron filament resistance is within the design range, the corresponding magnetron is classified as a magnetron product with qualified vacuum degree, and step S2 is continued; if the detected magnetron filament resistance is not within the design range, the corresponding magnetron is classified as a magnetron product with unqualified vacuum degree and is scrapped.

[0016] Furthermore, in the resistance detection, if the detected magnetron filament current is within the design range, the corresponding magnetron is classified as a magnetron product with qualified vacuum degree, and step S2 is continued; if the detected magnetron filament current is not within the design range, the corresponding magnetron is classified as a magnetron product with unqualified vacuum degree and is scrapped.

[0017] Furthermore, when executing step S2, the magnetron is inverted in a positioning hole on a work surface, and a movable electrode fixture is provided in the positioning hole and is connected to the lead terminal of the magnetron.

[0018] Beneficial effects of the present invention:

[0019] The invention detects the vacuum degree inside the magnetron product by a pressurization method. The specific detection principle is to apply a detection voltage to the magnetron, and the detection voltage is a high voltage. When the vacuum degree inside the magnetron is insufficient, the mixed gas will cause the cathode filament to discharge under the high voltage state and burn out, so that the detection circuit is disconnected to form an open circuit, and the magnetron product can be scrapped, thereby achieving the process purpose of eliminating defective products and not occupying subsequent process resources. Only when the vacuum degree inside the magnetron reaches the design standard, the short-term high voltage applied will not cause damage to the cathode filament, so that the detection circuit can still maintain the passage after detection, indicating that the vacuum degree inside the magnetron reaches the design standard, that is, the process flow of the invention can be completed, thereby improving the sealing detection and processing efficiency of the magnetron. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 This is a flow chart of an embodiment of the present invention;

[0021] Figure 2 This is a structural diagram of a magnetron high voltage detection device according to an embodiment of the present invention;

[0022] Figure 3 This is a structural diagram of a magnetron tail gas treatment device according to an embodiment of the present invention;

[0023] Figure 4 Schematic diagram of the internal structure of the electrode contact according to an embodiment of the present invention.

[0024] Figure numerals: workbench 1, positioning base 2, first cylindrical cavity 201, second cylindrical cavity 202, electrode contact 3, electrode contact 301, contact spring 302, indication module 4, positioning notch 5, cylinder 6, detection sensor 7, work table 8, control panel 9, display instrument 901, control button switch 902, positioning hole 10, fixed contact 11, movable contact 12, cam 13, protrusion 131, rotating handle 14, reset spring 15, spring 16. DETAILED DESCRIPTION

[0025] Example:

[0026] The following is a detailed description of the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments.

[0027] In the description of the present invention, it is necessary to understand that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0028] like Figure 1 As shown, the product targeted by the process method of the present invention is a magnetron product, specifically, it is a detection and processing process for the magnetron product after the internal vacuumization and sealing are completed. Specifically, the magnetron is composed of a cathode assembly, an anode tube assembly and an exhaust pipe assembly connected in sequence, the cathode end of the anode tube assembly is sealed by the cathode assembly, and the anode end of the anode tube assembly is sealed by the exhaust pipe assembly, so that a sealed vacuum chamber is formed inside the entire magnetron. In the actual production process, due to the limitations of the processing equipment's operating accuracy and the process method, not every magnetron product's internal vacuum chamber can reach a vacuum degree above the design standard value. In this way, the magnetron sealing detection and processing process of the present invention is mainly for magnetron detection and processing methods, and specifically includes the following steps:

[0029] S1, performing vacuum degree detection on magnetron products, identifying and determining magnetron products with qualified vacuum degree and magnetron products with unqualified vacuum degree and classifying them, scrapping magnetron products with unqualified vacuum degree, and executing step S2 for magnetron products with qualified vacuum degree;

[0030] S2, the step of treating the exhaust gas of the magnetron product, connects the magnetron product to the exhaust gas treatment power supply and maintains the power supply for a certain period of time to promote the full absorption of the exhaust gas inside the magnetron product.

[0031] In this embodiment, the pressure method is used to detect the vacuum degree inside the magnetron product. The specific detection principle is to apply a detection voltage to the magnetron. The detection voltage is a high voltage. When the vacuum degree inside the magnetron is not enough, the mixed gas will cause the cathode filament to discharge under the high voltage state and burn out, causing the detection circuit to be disconnected and open. Only when the vacuum degree inside the magnetron reaches the design standard, the short-term high voltage applied will not cause damage to the cathode filament. If the detection circuit can still maintain the passage after the detection, it means that the vacuum degree inside the magnetron has reached the design standard. The detection voltage applied for the secondary detection voltage can be a DC voltage or an AC voltage. In this way, the vacuum degree detection of this embodiment actually includes a process processing step and a detection step.

[0032] S101, a process step, applies a short-time high voltage to the magnetron product to be tested. The short-time high voltage is applied to the two lead terminals of the magnetron, so that the magnetron forms an electrical path, so that the magnetron filament produces different effects under different internal vacuum environments.

[0033] S102, detection process, after the processing of step S101, the magnetron filament forms several results, and the detection step can be used to detect whether the vacuum degree inside the magnetron reaches the design standard value. For example, when the vacuum degree inside the magnetron reaches the standard value, the filament does not change or only changes slightly after a short period of high voltage, and the result can be detected by conventional power-on detection or resistance detection; when the vacuum degree inside the magnetron does not reach the standard value, the filament will change significantly or even disconnect after a short period of high voltage, so the result can also be detected by conventional power-on detection or resistance detection. In this embodiment, the detection process adopts on-off detection, that is, after the magnetron product undergoes the process of step S101, a detection voltage is applied to the cathode lead of the magnetron product. If the magnetron product can form an electrical path at this time, it means that the internal vacuum degree of the magnetron product reaches the design standard value. On the contrary, if the magnetron product cannot form an electrical path at this time, it means that the internal vacuum degree of the magnetron product does not reach the design standard value, and the filament inside the magnetron has been burned in the process of step S101. The magnetron product can be scrapped, thereby achieving the process purpose of eliminating defective products and not occupying subsequent process resources. Or in some embodiments, the detection process can also be performed by resistance detection. When the filament resistance is detected to be normal, it indicates that the vacuum degree inside the magnetron reaches the design standard value. When the filament resistance is not detected or the filament resistance is detected to be abnormal, it indicates that the vacuum degree inside the magnetron does not meet the design standard value, and the magnetron product can be scrapped.

[0034] S2, magnetron tail gas treatment; after the magnetron is inverted into the positioning hole on the workbench and fixed, the movable electrode fixture in the positioning hole is connected to the lead terminal of the magnetron to ensure that the magnetron can be powered on during system operation; multiple magnetrons can be loaded at one time. After ensuring that each magnetron is loaded and fixed, the power module can be started for electric heat treatment to activate the getter inside the magnetron (usually an air-dried titanium powder mixture) to absorb the tail gas, thereby further improving the vacuum degree inside the magnetron.

[0035] To realize the above process, as shown in the attached Figure 2A magnetron high-voltage detection device shown is used for vacuum detection of a magnetron, and comprises a workbench 1, a positioning base 2, an electrode contact 3, a driving device, a detection power supply and an indication module 4; the positioning base 2 is installed on the workbench 1, and a positioning cavity for limiting and positioning the magnetron is provided on the positioning base 2, and the shape of the positioning cavity is adapted to the shape of the magnetron; the electrode contact is movably installed toward the positioning base 2, and the relative movement of the electrode contact and the positioning base 2 is driven by the driving device, and the electrode contact is provided with an electrode contact 301 for abutting against the power lead of the magnetron; the electrode contact and the indication module are electrically connected to the detection power supply.

[0036] As shown in the accompanying drawings, the positioning base 2 and the electrode contact of this embodiment form a vertical structure, that is, the electrode contact and the driving device are arranged above the positioning base 2, and the driving device drives the electrode contact to move up and down to approach or move away from the positioning base 2. In this embodiment, the positioning cavity of the positioning base 2 is adapted to the axial shape of the magnetron, specifically including a first cylindrical cavity 201 and a second cylindrical cavity 202, wherein the first cylindrical cavity 201 is adapted to the shape of the anode cylinder of the magnetron, and the second cylindrical cavity 202 is adapted to the shape of the exhaust pipe end of the magnetron. When the magnetron is embedded in the positioning cavity, the cathode assembly of the magnetron is exposed to the positioning base 2. When the electrode contact moves toward the positioning base 2, the electrode contact abuts against the cathode lead of the magnetron and the detection power is turned on, so that the above-mentioned magnetron vacuum degree detection can be performed.

[0037] Preferably, a positioning structure is provided on the positioning base 2 in the present embodiment, which is used to position the direction angle of the magnetron power lead. For example, the positioning structure in the present embodiment is a positioning notch 5 on the positioning base 2. During the placement of the magnetron, the direction angle of the magnetron power lead can be adjusted with reference to the positioning notch, so that the positive and negative poles of the electrode contacts can respectively and accurately abut against the terminals of the magnetron power lead, thereby avoiding short circuit and ensuring the safe operation of the equipment.

[0038] In some other embodiments, as shown in the accompanying drawings, the positioning base 2 and the electrode contact constitute a horizontal structure, that is, the electrode contact and the driving device are arranged at the rear of the positioning base 2, and the driving device drives the electrode contact to move forward and backward to approach or move away from the positioning base 2. The detection principle is the same as the detection principle of the vertical structure, which will not be repeated here. Different from the above embodiment, in order to facilitate the placement of the magnetron, in the horizontal structure, the positioning cavity of the positioning base 2 is adapted to the radial shape of the magnetron, specifically, to the overall shape of the magnetron, and the height of the positioning cavity can be set to about half of the radial height of the magnetron. When placed, half of the magnetron is embedded in the positioning cavity, forming the positioning and restriction of the magnetron. It is easy to understand that the power lead of the magnetron is exposed to the positioning base 2, and when the electrode contact moves toward the positioning base 2, the detection power is turned on when the electrode contact abuts against the cathode lead of the magnetron, and the above-mentioned magnetron vacuum degree detection can be performed.

[0039] In this embodiment, the upper side of the positioning base 2 can be used as a positioning structure, that is, during the placement of the magnetron, the direction of the magnetron power lead can be adjusted with reference to the upper side of the positioning base 2 so that it can be aligned with the electrode contact on the electrode contact.

[0040] As a component for driving the electrode contact to move, the driving device of the present invention is preferably driven by a cylinder 6 to reduce electrical connections and improve the safety of the equipment. In a preferred embodiment, the positioning base 2 in this embodiment is also provided with a grounding wire to ensure the effective grounding of the positioning base 2, thereby further ensuring the safe operation of the magnetron high-voltage detection device. In addition, by combining the positioning structure with the elastic structure of the electrode contact of this embodiment, a good connection between the magnetron power lead and the electrode contact can be achieved. As shown in the accompanying drawings, the electrode contact of this embodiment is provided with a contact spring 302 so that the electrode contact has a certain deformation amount, so that it is not easy to be damaged during the contact process with the magnetron power lead. It is easy to understand that the setting direction of the contact spring can be the axial direction or radial direction of the magnetron, both of which can meet the use needs.

[0041] On the other hand, in order to ensure the operational safety of the magnetron high-voltage detection device, referring to the accompanying drawings, in this embodiment, a detection sensor 7 is also provided on the workbench 1, and the detection sensor is arranged in front of the positioning base 2, specifically, it is used to detect whether someone is operating the positioning base 2. For example, in the process of placing the magnetron, the detection sensor can recognize the worker's hand signal, thereby limiting the connection of the detection power supply. At this time, even if the start button is pressed, the detection power supply will still not be connected. Only after the detection sensor recognizes that the hand has left the workbench 1 table will the pressurization detection action be performed, thereby avoiding the occurrence of electric shock accidents and ensuring safe production. It is easy to understand that the detection sensor is preferably an infrared counter-radiation sensor, which is arranged on both sides of the workbench 1. When the worker performs the loading and unloading operation of the magnetron, the detection signal of the infrared counter-radiation sensor is blocked so that it is detected by the infrared counter-radiation sensor, thereby feeding back the detection signal to limit the connection of the detection power supply, thereby achieving the above-mentioned effect of ensuring safety.

[0042] In the process of the present invention, see attached Figure 3 A magnetron exhaust gas treatment device shown in the figure includes a work surface 8, an electrode unit, a power module and a control panel 9; a plurality of positioning holes 10 for placing the magnetron are opened on the work surface; electrode contacts are arranged in the positioning holes of the electrode unit, the electrode contacts are electrically connected to the power module, and the electrical connection and disconnection between the electrode contacts and the power module is controlled by the control panel, and the electrode contacts are adapted to the power leads of the magnetron.

[0043] During the tail gas treatment process of step S2, the power lead end of the magnetron is placed in the positioning hole so that the power lead of each magnetron is in contact with the electrode contact in the positioning hole. After checking that each magnetron is assembled in place, the power module can be turned on through the control panel to connect the process power to the magnetron. It is easy to understand that the time for the magnetron to connect to the process power can be set and controlled through the control panel, so as to meet the process requirements of the magnetron electrothermal treatment. For example, in this embodiment, a display instrument 901 and a control button switch 902 are provided on the control panel. The display instrument can display the operating status of the magnetron tail gas treatment device, which is convenient for the process personnel to understand the process status in real time; the control button switch is used to start and control the operation of the magnetron tail gas treatment device. When the operation is abnormal, the power supply of the motor unit can be cut off in time, so as to conduct inspections in time, eliminate faults, and ensure the safe operation of the magnetron tail gas treatment device.

[0044] In order to improve the efficiency of the process, the working panel is provided with multiple positioning holes, such as multiple rows and columns as shown in the attached figure. The electrode contacts in each positioning hole are connected in parallel with the power module. In one process, the magnetrons with the same number of positioning holes as the working panel can be connected to perform electrothermal treatment synchronously, thereby improving the process efficiency of the magnetron tail gas treatment device. As shown in the attached figure, the positioning holes of this embodiment are recessed holes on the working panel, and the depth of the recessed holes is adapted to the height of the cathode side of the magnetron. Specifically, the depth of the recessed holes is equal to the sum of the height of the K-side tube protrusion of the magnetron plus the height of the K-side insulating ceramic; on the other hand, the shape of the recessed holes is adapted to the cathode side of the magnetron, so that the cathode side of the magnetron is inserted into the recessed holes to form an embedding effect, thereby playing a role in fixing the magnetron. The electrode contacts are arranged at the bottom of the positioning holes. When the magnetron is inserted into place, the power lead of the magnetron is located between a group of electrode contacts, so that the electrode contacts can clamp the power lead of the magnetron, and when the power module is connected, electricity can be taken for electrothermal treatment.

[0045] In this embodiment, the electrode contact includes a fixed contact 11 and a movable contact 12, and the movable contact is movably arranged on the facing surface of the fixed contact, that is, the movable contact can be close to or away from the fixed contact. In the non-working state of the magnetron exhaust gas treatment device, the movable contact is located at a position away from the fixed contact; while in the working state, the movable contact is located at a position close to the fixed contact to clamp the magnetron power lead between the two to achieve electrical connection between the magnetron and the power module. It is easy to understand that a drive component is provided to drive the movement of the movable contact. Referring to the accompanying drawings, the drive component in this embodiment includes a cam 13 and a rotating handle 14 connected to the cam. In actual application, when the magnetron exhaust gas treatment device is in a paused state, the electrode contact and the movable contact are in an open state, that is, the two contacts are relatively far apart, which is convenient for the magnetron to be placed; when working, the rotating handle is turned to make the electrode contact and the movable contact clamp the power lead of the magnetron to ensure good contact of the magnetron. Referring to the accompanying drawings, the two raised portions 131 of the cam abut against one side of the movable contact during the rotation process, thereby pushing the movable contact to move toward the fixed contact to achieve the above-mentioned clamping effect; the resetting of the movable contact can be achieved by the reset spring 15, and the movable contact automatically resets after the cam is released. Preferably, the raised portion includes an arc segment and a straight segment, and the movable contact moves by abutting against the arc segment during the rotation of the cam. When the locking position is reached, the straight segment abuts against the movable contact, increasing the contact area between the two and having a locking effect. Furthermore, in some embodiments, the movable contact or the fixed contact is set as an elastic contact. For example, the contact can be set in a retractable form by a spring 16, which can effectively ensure good contact between the electrode contact and the magnetron power lead while leaving a margin of activity between the electrode contacts, thereby increasing the service life of the device.

[0046] In this embodiment, please refer to the attached drawings, an insulating layer is provided between the working panel and the electrode unit to improve the insulation between the working panel and the power module and improve the safety of the equipment operation.

[0047] The above only describes the preferred embodiments of the present invention, which should not be construed as limiting the claims. The present invention is not limited to the above embodiments, and its specific structure is allowed to be changed. In short, all changes made within the protection scope of the independent claims of the present invention are within the protection scope of the present invention.

Claims

1. A magnetron seal detection process, characterized in that: The steps include: S1, performing vacuum degree detection on magnetron products, identifying and determining magnetron products with qualified vacuum degree and magnetron products with unqualified vacuum degree and classifying them, scrapping magnetron products with unqualified vacuum degree, and executing step S2 for magnetron products with qualified vacuum degree; S2, a step of treating tail gas of a magnetron product, connecting the magnetron product to a tail gas treatment power source and maintaining the power-on time for a certain period of time to promote full absorption of tail gas inside the magnetron product; The step S1 comprises the steps of: S101, a process step, wherein the process is to apply a short-time high voltage to the magnetron product to be tested, and the short-time high voltage is applied to two lead terminals of the magnetron, so that the magnetron filament remains unchanged under the short-time high voltage, and the resistance value changes abnormally or burns out; S102, a detection step, detecting different results of the magnetron filament after the processing in step S101, and determining whether the vacuum degree inside the magnetron reaches the design standard value; If the resistance value of the magnetron filament is detected to be unchanged or normal, the internal vacuum degree of the magnetron reaches the design standard value; If the magnetron filament is detected to be burnt out or the resistance value is abnormal, the internal vacuum degree of the magnetron does not reach the design standard value.

2. The magnetron seal detection process according to claim 1, characterized in that: The high voltage applied in step S101 is energized for 1.5-2.5 seconds.

3. The magnetron seal detection process according to claim 1, characterized in that: In the detection process of step S102, the magnetron after the process is detected by one or more of on-off detection, voltage detection, resistance detection and current detection.

4. The magnetron seal detection process according to claim 3, characterized in that: In the on-off detection, if the magnetron and the detection power supply can form a path, the corresponding magnetron is classified as a magnetron product with qualified vacuum degree, and step S2 is continued; if the magnetron and the detection power supply cannot form a path, the corresponding magnetron is classified as a magnetron product with unqualified vacuum degree and is scrapped.

5. The magnetron seal detection process according to claim 3, characterized in that: In the voltage detection, if the detected magnetron filament voltage is within the design range, the corresponding magnetron is classified as a magnetron product with qualified vacuum degree, and step S2 is continued; if the detected magnetron filament voltage is not within the design range, the corresponding magnetron is classified as a magnetron product with unqualified vacuum degree and is scrapped.

6. The magnetron seal detection process according to claim 3, characterized in that: In the resistance detection, if the detected magnetron filament resistance is within the design range, the corresponding magnetron is classified as a magnetron product with qualified vacuum degree, and step S2 is continued; if the detected magnetron filament resistance is not within the design range, the corresponding magnetron is classified as a magnetron product with unqualified vacuum degree and is scrapped.

7. The magnetron seal detection process according to claim 3, characterized in that: In the resistance detection, if the detected magnetron filament current is within the design range, the corresponding magnetron is classified as a magnetron product with qualified vacuum degree, and step S2 is continued; if the detected magnetron filament current is not within the design range, the corresponding magnetron is classified as a magnetron product with unqualified vacuum degree and is scrapped.

8. The magnetron seal detection process according to claim 1, characterized in that: When executing step S2, the magnetron is inverted in a positioning hole on a work surface, and a movable electrode fixture is provided in the positioning hole and is connected to the lead terminal of the magnetron.

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