Asymmetric adsorption and adsorption compensation device for mask transmission

Abstract

An asymmetric adsorption and adsorption compensation device for mask transmission includes a connecting base plate, an asymmetric adsorption device and an adsorption compensation device. The asymmetric adsorption device is relatively arranged on the upper and lower sides of the connecting base plate, and the adsorption compensation device is relatively arranged in the middle position of the left and right sides of the connecting base plate. The asymmetric adsorption device is provided with a first adsorption hole, and the adsorption compensation device is provided with a second adsorption hole. The first adsorption holes on the asymmetric adsorption devices on the upper and lower sides of the connecting base plate are asymmetrically distributed along the center line of the connecting base plate. A first vacuum channel connected to the first adsorption hole is provided in the asymmetric adsorption device, and the adsorption compensation device is provided with a second vacuum channel connected to the second adsorption hole. The present invention structurally changes the adsorption method during the mask transmission process. The force points of the mask are asymmetric during the adsorption process, which reduces the deformation of the mask during the transmission process, reduces the damage to the mask, and improves the transmission accuracy.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor processing, in particular to an asymmetric adsorption and adsorption compensation device for mask transmission. Background Art

[0002] A photolithography device is a device that exposes the pattern on a mask onto a silicon wafer or glass substrate. Mask transfer is mainly responsible for transferring the mask to the mask stage for exposure.

[0003] The mask is also called MASK, and is called Reticle in the IC industry. Its Chinese names include photomask and chrome plate. The mask mainly serves as a carrier of graphic information and transfers the graphic to the exposed product (silicon wafer, conductive glass, copper foil, etc.) through the exposure process, thereby realizing the transfer of the graphic. The mask is mainly composed of a substrate and an opaque light-shielding film. The substrate is usually high-purity quartz glass or transparent resin with low reflectivity and low thermal expansion coefficient. The light-shielding film is mainly divided into hard light-shielding film and latex. The material of the hard light-shielding film is mainly chromium. The latex has low hardness and is easy to absorb dust. The application of masks is very extensive, and masks are required in fields involving photolithography.

[0004] Since the hardness of the mask substrate material and the latex light-shielding film are relatively low, during the mask transmission process, the adsorption negative pressure generated by the mask transmission robot will cause the mask to deform to a certain extent, resulting in insufficient mask flatness or even damage to the mask, thereby affecting the subsequent mask transmission accuracy and exposure, and ultimately affecting the lithography accuracy. Summary of the Invention

[0005] The purpose of the present invention is to overcome the deficiencies of the prior art and provide an asymmetric adsorption and adsorption compensation device for mask transmission to solve the problems raised in the above technical background.

[0006] The object of the present invention is achieved through the following technical solutions:

[0007] An asymmetric adsorption and adsorption compensation device for mask transmission includes a connecting base plate, an asymmetric adsorption device and an adsorption compensation device, wherein the asymmetric adsorption device is relatively arranged on the upper and lower sides of the connecting base plate, and the adsorption compensation device is relatively arranged in the middle position of the left and right sides of the connecting base plate. The asymmetric adsorption device is provided with a first adsorption hole, and the adsorption compensation device is provided with a second adsorption hole. The first adsorption holes provided on the asymmetric adsorption devices on the upper and lower sides of the connecting base plate are asymmetrically distributed along the center line of the connecting base plate. A first vacuum channel connected to the first adsorption hole is provided in the asymmetric adsorption device, and the adsorption compensation device is provided with a second vacuum channel connected to the second adsorption hole.

[0008] The above invention further includes a mask transfer robot, which is provided with an upper gas valve body and a gas collection block. The upper gas valve body is used to generate negative pressure, and the gas collection block is connected to the upper gas valve body, the first vacuum channel and the second vacuum channel through pipelines.

[0009] In the above invention content, further, the asymmetric adsorption device includes four asymmetric adsorption devices, and the four asymmetric adsorption devices are arranged on the upper and lower sides of the connecting base in a pairwise manner, and the adsorption compensation device includes two adsorption compensation devices, and the two adsorption compensation devices are arranged in a relative manner in the middle position of the left and right sides of the connecting base, and the second adsorption holes on the two adsorption compensation devices are symmetrically arranged along the center line of the connecting base.

[0010] In the above invention content, further, the first adsorption holes on the two asymmetric adsorption devices located on the upper side of the connecting bottom plate among the four asymmetric adsorption devices are respectively arranged at the leftmost and rightmost sides of the two asymmetric adsorption devices, and the first adsorption holes on the two asymmetric adsorption devices located on the lower side of the connecting bottom plate among the four asymmetric adsorption devices are respectively arranged at the middle position and the rightmost side of the two asymmetric adsorption devices.

[0011] In the above invention, further, gaskets are provided on the upper surfaces of the first adsorption hole and the second adsorption hole.

[0012] In the above invention, further, the gasket is made of PEEK material.

[0013] In the above invention, further, the connecting base plate is provided with bolt holes for fixing the connecting base plate to the mask transfer robot.

[0014] The beneficial effects of the present invention are:

[0015] The present invention structurally changes the adsorption mode during the mask transmission process, and the force points of the mask during adsorption are asymmetric, thereby reducing the deformation of the mask during transmission, reducing the damage to the mask, and improving the transmission accuracy. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a structural schematic diagram of the present invention;

[0017] Figure 2 This is a partial enlarged view of the asymmetric adsorption device of the present invention;

[0018] Figure 3 This is a partial enlarged view of the adsorption compensation device of the present invention;

[0019] Figure 4 It is a structural schematic diagram of the mask transfer robot of the present invention;

[0020] Figure 5 This is a structural diagram of the mask transfer robot when adsorbing the mask in this embodiment;

[0021] Figure 6 For the present invention Figure 5 Bottom view of

[0022] Figure 7 This is a deformation cloud diagram of a symmetrical adsorption mask in an experimental example of the present invention without using adsorption compensation;

[0023] Figure 8 This is a deformation cloud diagram of the asymmetric adsorption mask in the experimental example of the present invention without using adsorption compensation;

[0024] Figure 9 This is a deformation cloud diagram of a symmetrical adsorption mask using adsorption compensation in an experimental example of the present invention;

[0025] Figure 10 This is a deformation cloud diagram of an asymmetric adsorption mask using adsorption compensation in an experimental example of the present invention.

[0026] In the figure, 1-mask transfer robot, 2-mask, 3-asymmetric adsorption device, 4-adsorption compensation device, 5-gasket, 6-connecting base plate, 7-bolt hole, 8-upper gas valve body, 9-gas collection block, 10-first adsorption hole, 11-second adsorption hole. DETAILED DESCRIPTION

[0027] The following describes the embodiments of the present invention through specific examples. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments. The details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention. It should be noted that the following embodiments and features in the embodiments can be combined with each other unless they conflict.

[0028] It should be noted that the illustrations provided in the following embodiments are merely schematic illustrations of the basic concept of the present invention. Therefore, the illustrations only show components related to the present invention and are not drawn according to the number, shape, and size of components in actual implementation. In actual implementation, the type, quantity, and proportion of each component may be changed arbitrarily, and the component layout may also be more complex.

[0029] Example 1:

[0030] An asymmetric adsorption and adsorption compensation device for mask transmission, please refer to the attached Figure 1 -Attached Figure 4As shown, it includes a connecting base plate 6, an asymmetric adsorption device 3 and an adsorption compensation device 4, the asymmetric adsorption device 3 is relatively arranged on the upper and lower sides of the connecting base plate 6, and the adsorption compensation device 4 is relatively arranged in the middle position of the left and right sides of the connecting base plate 6, the asymmetric adsorption device 3 is provided with a first adsorption hole 10, and the adsorption compensation device 4 is provided with a second adsorption hole 11. The first adsorption holes 10 on the asymmetric adsorption device 3 on the upper and lower sides of the connecting base plate 6 are asymmetrically distributed along the center line of the connecting base plate 6, the asymmetric adsorption device 3 is provided with a first vacuum channel (not shown in the figure) connected to the first adsorption hole 10, and the adsorption compensation device 4 is provided with a second vacuum channel (not shown in the figure) connected to the second adsorption hole 11.

[0031] Furthermore, it also includes a mask transfer robot 1 for grabbing the mask 2, and the connecting base plate 6 is provided with a bolt hole 7 for fixing the connecting base plate 6 on the mask transfer robot 1. The mask transfer robot 1 is provided with an upper air valve body 8 and a gas collection block 9. The upper air valve 8 is used to generate negative pressure. The gas collection block 9 is connected to the upper air valve body 8, the first vacuum channel (not shown in the figure) and the second vacuum channel (not shown in the figure) through pipes. Specifically, the upper air valve 8 generates negative pressure, and then the gas collection block 9 generates negative pressure in the first adsorption hole 10 and the second adsorption hole 11 on the asymmetric adsorption device 3 and the adsorption compensation device 4, so that the mask 2 is adsorbed on the surface of the first adsorption hole 10 and the second adsorption hole 11.

[0032] In the above embodiment, as a preferred embodiment, please continue to refer to the attached Figure 1 -Attached Figure 3 As shown, the asymmetric adsorption device 3 includes four asymmetric adsorption devices, which are arranged in pairs on the upper and lower sides of the connecting base plate 6. The first adsorption holes 10 on the two asymmetric adsorption devices 3 located on the upper side of the connecting base plate 6 of the four asymmetric adsorption devices 3 are respectively arranged at the leftmost and rightmost sides of the two asymmetric adsorption devices 3, and the first adsorption holes 10 on the two asymmetric adsorption devices 3 located on the lower side of the four asymmetric adsorption devices 3 are respectively arranged in the middle and rightmost positions of the two asymmetric adsorption devices 3. The adsorption compensation device 4 includes two adsorption compensation devices, which are arranged in a relative manner in the middle positions on the left and right sides of the connecting base plate 6, and the second adsorption holes 11 on the two adsorption compensation devices 4 are symmetrically arranged along the center line of the connecting base plate 6.

[0033] Working process: When the invention is in use, the connecting base plate 6 is fixed to the mask transfer robot 1 for transferring and grabbing the mask 2 through the bolt holes 7. When the mask transfer robot 1 is operated to grab the mask 2, the upper air valve 8 generates negative pressure, and then the gas collection block 9 generates negative pressure in the first adsorption holes 10 and the second adsorption holes 11 on the asymmetric adsorption device 3 and the adsorption compensation device 4, so that the mask 2 is adsorbed on the surface of the first adsorption holes 10 and the second adsorption holes 11, thereby completing the grabbing and transfer of the mask 2. Due to the multiple first adsorption holes 10 on the multiple asymmetric adsorption devices 3, the pressure of the first adsorption holes 10 and the second adsorption holes 11 is increased, and the pressure of the first adsorption holes 10 and the second adsorption holes 11 is increased. It is asymmetrically distributed along the center line of the connecting base plate 6, so the first adsorption hole 10 generates an asymmetric negative pressure on the surface of the mask 2, which reduces the deformation of the mask 2 during the transmission process, reduces the damage to the mask, and improves the transmission accuracy. Secondly, the negative pressure generated by the second adsorption hole 11 compensates for the deformation caused by the asymmetric adsorption device 3 adsorbing the mask 2, further reducing the damage to the mask 2. Finally, the upper surfaces of the first adsorption hole 10 and the second adsorption hole 12 are both provided with a gasket 5, which can make the mask 2 more tightly adsorbed on the one hand, and reduce the scratches on the mask 2 on the other hand.

[0034] Experimental example:

[0035] A comparative simulation experiment was conducted on different adsorption methods for transporting mask 2, using ANSYS-WORKBENCH as the simulation software. Mask 2 was 5 inches (5 inches * 5 inches * 0.09 inches) in size and made of quartz glass with the following material properties: elastic modulus 55 GPa, shear modulus 1.96 GPa, Poisson's ratio 0.25, and density 2.65 g / cm³. The asymmetric adsorption device 3 and adsorption compensation device 4 were made of duralumin alloy with the following material properties: elastic modulus 70 GPa, shear modulus 26.5 GPa, Poisson's ratio 0.3, and density 2.7 g / cm³. The gasket 5 was made of PEEK with the following material properties: elastic modulus 3.8 GPa, density 1.329 g / cm³, and Poisson's ratio 0.4. The negative pressure applied to mask 2 was set to -0.6 MPa.

[0036] When the adsorption compensation device 4 is not used to compensate for the deformation of the mask 2, please refer to the attached Figure 7 and attached Figure 8 It can be seen from the cloud diagram that when the same adsorption negative pressure is applied, the deformation range of the asymmetric adsorption mask 2 is significantly smaller than the deformation range of the symmetric adsorption mask 2. When the adsorption compensation device 4 is used to further compensate for the deformation of the mask 2, refer to the attached Figure 9 and attached Figure 10As shown, when the same adsorption negative pressure is applied, after adopting the adsorption compensation device, the deformation range of the symmetrically adsorbed mask is significantly smaller than the deformation range of the symmetrically adsorbed mask without the adsorption compensation device, and after adopting the adsorption compensation device, the deformation range of the asymmetrically adsorbed mask is also significantly smaller than the deformation range of the asymmetrically adsorbed mask without the adsorption compensation device. Only three corners of the asymmetrically adsorbed mask 2 using the adsorption compensation device are slightly deformed, which proves that after adopting the adsorption compensation device 4 and the asymmetric adsorption device 3, the deformation of the mask 2 during the transmission process can be greatly reduced, thereby reducing the damage to the mask 2.

[0037] The above-described embodiments merely represent specific implementations of the present invention. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the present invention. It should be noted that a person skilled in the art would be able to make numerous variations and improvements without departing from the spirit of the present invention, and all such variations and improvements fall within the scope of protection of the present invention.

Claims

1. An asymmetric adsorption and adsorption compensation device for mask transmission, characterized in that: The device comprises a connecting base plate, an asymmetric adsorption device, and an adsorption compensation device, wherein the asymmetric adsorption device is relatively arranged on the upper and lower sides of the connecting base plate, and the adsorption compensation device is relatively arranged in the middle position between the left and right sides of the connecting base plate. The asymmetric adsorption device is provided with a first adsorption hole, and the adsorption compensation device is provided with a second adsorption hole. The first adsorption holes provided on the asymmetric adsorption devices on the upper and lower sides of the connecting base plate are asymmetrically distributed along the center line of the connecting base plate. The asymmetric adsorption device includes four asymmetric adsorption devices, which are arranged in pairs on the upper and lower sides of the connecting base plate. The adsorption compensation device includes two adsorption compensation devices, which are arranged in a relative manner in the middle positions of the left and right sides of the connecting base plate, and the second adsorption holes on the two adsorption compensation devices are symmetrically arranged along the center line of the connecting base plate. The first adsorption holes on the two asymmetric adsorption devices located on the upper side of the connecting base plate among the four asymmetric adsorption devices are respectively arranged at the leftmost and rightmost sides of the two asymmetric adsorption devices. The first adsorption holes on the two asymmetric adsorption devices located on the lower side of the connecting base plate among the four asymmetric adsorption devices are respectively arranged at the middle position and the rightmost side of the two asymmetric adsorption devices. The asymmetric adsorption device is provided with a first vacuum channel communicated with the first adsorption hole, and the adsorption compensation device is provided with a second vacuum channel communicated with the second adsorption hole.

2. The asymmetric adsorption and adsorption compensation device for mask transmission according to claim 1, characterized in that: It also includes a mask transfer robot, which is provided with an upper gas valve body and a gas collection block. The upper gas valve body is used to generate negative pressure, and the gas collection block is connected to the upper gas valve body, the first vacuum channel and the second vacuum channel through pipelines.

3. The asymmetric adsorption and adsorption compensation device for mask transmission according to claim 2, characterized in that: Gaskets are provided on the upper surfaces of the first adsorption hole and the second adsorption hole.

4. The asymmetric adsorption and adsorption compensation device for mask transmission according to claim 3, characterized in that: The gasket is made of PEEK material.

5. The asymmetric adsorption and adsorption compensation device for mask transmission according to claim 2, characterized in that: The connecting base plate is provided with bolt holes for fixing the connecting base plate on the mask transmission robot.

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