Film coating device and film coating method

Abstract

The present application relates to the field of semiconductor technology, and in particular to a coating device and a coating method. After a target plasma jet generated by a plasma generator is filtered by a magnetic filter to produce electrically neutral particle clusters, negatively charged electrons are adsorbed by a first electrode plate of a deflection channel, and negatively charged particle clusters that collide with the third electrode plate due to inertia are adsorbed by a third electrode plate directly opposite to the outlet of the deflection channel. Positively charged ions are deflected and accelerated by a fourth electrode plate located on one side above the outlet of the deflection channel to be injected into a coating chamber to coat a workpiece to be plated. Since the ions deposited on the surface of the workpiece to be plated are all positively charged (the influence of particle clusters on the coating is avoided), the coating quality is improved.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to a coating device and a coating method. Background Art

[0002] Arc ion plating technology is widely used due to its obvious advantages such as high ionization rate, strong film-base bonding, and fast deposition rate. Its working process is: arc discharge is generated on the surface of the cathode arc source, the target material is evaporated and ionized to form plasma, and the target plasma is deposited on the surface of the plated workpiece through transportation and guidance to form a thin film. During the target evaporation process, due to the presence of the cathode arc spot, local energy accumulation will occur on the target surface, resulting in the ejection of electrically neutral particle clusters on the target surface. The size is much larger than ions (generally at the μm level), and even larger than the thickness of some films with high precision requirements. These particle clusters follow the plasma to deposit on the surface of the workpiece, forming granular pollution in the film, so these particle clusters are also called "large particles".

[0003] In the prior art, the methods for limiting large particles are mainly divided into two categories: one is to structurally modify the cathode to limit the generation of large particles from the source. Based on the generation mechanism of large particles, the cathode magnetic field and discharge parameters are adjusted to speed up the movement of the cathode arc spot and shorten the local residence time, thereby reducing the size and number of large particles generated; the other is to perform special treatment on the transport process, guide and screen during the plasma transport process, and limit the number of large particles. Based on the principle that the magnetic field has a strong ability to bind electrons in the plasma and that the Larmor radius of charged particles in the magnetic field depends on the charge-to-mass ratio, magnetic filtering components and baffles are added between the cathode and the workpiece, and the direction of electrons is guided by a magnetic field with a certain shape (usually a deflection angle of 45°, 60°, 90°, etc.), and the Coulomb force between electrons and ions attracts the ions to the direction of electron movement to achieve plasma deflection. The magnetic filtering component 16 of the prior art is as follows: Figure 1As shown, arc discharge is generated on the surface of the cathode arc source 10, which evaporates and ionizes the target material to form large particles 11, ions 12, electrons 13, etc. A third electromagnetic coil 15 is arranged around the magnetic filter component 16, so as to form a magnetic field in the magnetic filter component 16. Since the large particles 11 are basically uncharged or carry a small amount of negative charge (here, it means that their charge-to-mass ratio is small), the movement in the magnetic filter component 16 is almost unaffected, and the original movement direction is maintained. Finally, they collide with the inner wall of the magnetic filter component 16, deposit on the inner wall of the magnetic filter component 16 and are filtered out, thereby limiting the number of large particles on the surface of the workpiece (i.e., the first substrate 14). However, many small-sized large particles (diameter 0.1 μm and below) will also be deflected by the magnetic field, and will still be deposited on the surface of the first substrate 14 along with the ion 12 flow, resulting in the film quality being affected. Because these large particles are not strictly neutral, the electrons 13 in the plasma will charge them, causing the large particles to carry a small amount of negative charge, but the amount of charge is very small compared to their mass (some literature shows that large particles of carbon targets carry about -10 -16 C electric charge). This magnetic filtering technology is more effective for particles with larger sizes. When the particle size is large, the deflection of the magnetic field on it can be ignored. It is considered that it moves along the original direction and finally collides with the magnetic filtering component 16 and is deposited on the inner wall of the magnetic filtering component 16; however, when the size is reduced to a certain extent, this deflection cannot be ignored. Many smaller particles will be deflected and move along the direction of the magnetic flux line together with the ion flow to the first substrate 14. This is also the reason why the magnetic filtering device of the prior art has limited filtering effect on large particles.

[0004] There is currently no effective technical solution to the above problems. Summary of the invention

[0005] The purpose of the present application is to provide a coating device and a coating method, which aims to solve the problem that the existing filtering equipment has limited filtering effect on large particles. The coating device of the present application can avoid the influence of particle clusters generated during the coating process on the coating, thereby improving the coating quality.

[0006] The present application provides a coating device, comprising: a plasma generator, a coating chamber, and a filtering channel connected between the plasma generator and the coating chamber;

[0007] The filtering channel comprises a magnetic filter and a screening tube connected in sequence from bottom to top, the plasma generator is arranged at the lower end of the magnetic filter, the plasma generator is used to generate a target plasma jet and inject it into the magnetic filter, and the magnetic filter is used to send the target plasma jet into the screening tube and filter the electrically neutral particle clusters in the target plasma jet;

[0008] A first electrode plate and a second electrode plate are arranged in parallel and opposite to each other in the screening tube, the first electrode plate and the second electrode plate are electrically connected to the positive and negative poles of a first power supply respectively, the first electrode plate and the second electrode plate extend in the up-down direction, and a deflection channel for the target plasma jet to pass through is formed between the first electrode plate and the second electrode plate; a third electrode plate is arranged above the deflection channel and opposite to the outlet of the deflection channel, the third electrode plate is used to adsorb negatively charged particle clusters; a fourth electrode plate is arranged on one side above the deflection channel, the fourth electrode plate is used to deflect and accelerate positively charged ions to be sprayed into the coating chamber from the outlet at the upper end of the screening tube.

[0009] The coating equipment provided by the present application filters the target plasma jet generated by the plasma generator to produce electrically neutral particle clusters through a magnetic filter, and then the negatively charged electrons are adsorbed by the first electrode plate of the deflection channel, and the negatively charged particle clusters that collide with the third electrode plate due to inertia are adsorbed by the third electrode plate directly opposite the outlet of the deflection channel, thereby achieving the effect of eliminating the influence of the particle clusters on the coating quality, and the fourth electrode plate located on the side above the outlet of the deflection channel deflects the positively charged ions and accelerates them to be injected into the coating chamber to coat the workpiece to be plated. Since the ions deposited on the surface of the workpiece to be plated are all positively charged (avoiding the influence of the particle clusters on the coating), the coating quality is improved.

[0010] Optionally, the magnetic filter includes a compression tube that gradually contracts from bottom to top and a first electromagnetic coil wound outside the compression tube, wherein the magnetic field of the first electromagnetic coil in the compression tube gradually increases from bottom to top; a second electromagnetic coil is wound outside the screening tube.

[0011] Since the movement of electrically neutral particle clusters in the magnetic field is almost unaffected and maintains the original direction of movement, the compression tube is gradually contracted from bottom to top, further increasing the probability of the electrically neutral particle clusters colliding with the inner wall of the compression tube, thereby eliminating most of the electrically neutral particle clusters in the compression tube.

[0012] Optionally, the upper outlet of the screening tube is arranged on a side close to the second electrode plate, and the fourth electrode plate is arranged on a side close to the first electrode plate.

[0013] Optionally, the inner diameter of the upper outlet of the screening tube gradually increases in a direction pointing toward the coating chamber to form a trumpet-shaped structure.

[0014] By setting the upper outlet of the screening tube to be a trumpet-shaped structure, it is helpful to reduce the diffusion and condensation of a part of positively charged ions on the inner wall surface of the screening tube, thereby improving the efficiency of coating.

[0015] Optionally, the spacing between the first electrode plate and the second electrode plate is 80mm-120mm, the lengths of the first electrode plate and the second electrode plate in the up and down directions are both 150mm-200mm, and the potential difference between the first electrode plate and the second electrode plate is 2.5V-5V.

[0016] Optionally, the fourth electrode plate is swingably connected to the screening tube via a deflection device, and the deflection device is used to drive the fourth electrode plate to swing up and down to adjust the inclination angle of the fourth electrode plate.

[0017] Optionally, the deflection device includes a first motor, a crankshaft and a rocker arm, the output end of the first motor is connected to the crankshaft, one end of the rocker arm is hinged to the screening tube, the other end of the rocker arm is fixedly connected to the fourth electrode plate, the crankshaft and the rocker arm are connected by a connecting rod, and the connecting rod can slide relative to the rocker arm, and the connecting rod can rotate relative to the crankshaft, and the first motor is used to drive the crankshaft to rotate so that the rocker arm swings up and down, thereby driving the fourth electrode plate to deflect.

[0018] Optionally, the coating chamber includes a turntable, a second motor and a plurality of substrate racks, wherein the plurality of substrate racks are evenly arranged around a center line of the turntable, the second motor is used to drive the turntable to rotate, the substrate rack is conductive and connected to a negative pole of a second power supply, and the substrate rack is used to place a plurality of workpieces to be plated.

[0019] Optionally, the coating chamber further comprises a heater, which is arranged between the substrate rack and the inner wall of the coating chamber, and is used to heat the workpiece to be plated. The coating chamber is also provided with an exhaust hole, and the exhaust hole is used to connect to an external vacuum device.

[0020] In a second aspect, the present application provides a coating method, the method comprising:

[0021] After filtering the target plasma jet generated by the plasma generator to produce electrically neutral particle clusters with a magnetic filter, the target plasma jet is passed through a deflection channel to filter out negatively charged electrons, a third electrode plate facing the outlet of the deflection channel is used to absorb the negatively charged particle clusters that collide with the third electrode plate due to inertia, and a fourth electrode plate located on one side above the outlet of the deflection channel is used to deflect and accelerate the positively charged ions to be injected into a coating chamber to coat the workpiece to be coated;

[0022] The deflection channel is surrounded by a first electrode plate and a second electrode plate which are arranged parallel to each other and face each other, and the first electrode plate and the second electrode plate are electrically connected to the positive and negative electrodes of a first power source respectively.

[0023] Beneficial Effects

[0024] The present application provides a coating device, which uses a magnetic filter to filter the target plasma jet generated by a plasma generator to produce electrically neutral particle clusters, and then uses the first electrode plate of the deflection channel to adsorb negatively charged electrons, and uses the third electrode plate directly opposite the outlet of the deflection channel to adsorb negatively charged particle clusters that collide with the third electrode plate due to inertia, thereby achieving the effect of eliminating the influence of the particle clusters on the coating quality; and uses the fourth electrode plate located on the side above the outlet of the deflection channel to deflect and accelerate the positively charged ions to be injected into the coating chamber to coat the workpiece to be plated. Since the ions deposited on the surface of the workpiece to be plated are all positively charged (avoiding the influence of the particle clusters on the coating), the coating quality is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 It is a structural schematic diagram of the filtering equipment in the prior art.

[0026] Figure 2 This is a schematic diagram of the structure of the coating equipment provided in this application.

[0027] Figure 3 for Figure 2 A is an enlarged schematic diagram.

[0028] Description of reference numerals: 10, cathode arc source; 11, large particles; 12, ions; 13, electrons; 14, first substrate; 15, third electromagnetic coil; 16, magnetic filter component; 100, plasma generator; 101, first groove housing; 102, arc-starting needle; 103, target material; 104, cooling water device; 105, first arc source coil; 106, second arc source coil; 200, coating chamber; 201, turntable; 202, second motor; 203, substrate rack; 204, workpiece to be plated; 206, heater; 2061, sliding resistor; 207, exhaust hole; 208, vacuum device; 300, magnetic filter; 301, first electromagnetic coil; 302, second electromagnetic coil; 303, resistor; 304, compression tube; 305, arc limiting ring; 400, screening tube; 401, first electrode plate; 402, second electrode plate; 404, first motor; 405, crankshaft; 406, rocker arm; 407, connecting rod; 500, third electrode plate; 600, fourth electrode plate. DETAILED DESCRIPTION

[0029] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application claimed for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the present application.

[0030] It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. At the same time, in the description of this application, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0031] Please refer to Figure 2-Figure 3 , Figure 2 It is a structural schematic diagram of a coating device in an embodiment of the present application, which aims to solve the problem that existing filtering equipment has limited filtering effect on large particles. The coating device of the present application can avoid the influence of particle clusters generated during the coating process on the coating, thereby improving the coating quality.

[0032] The present application provides a coating device, comprising: a plasma generator 100, a coating chamber 200, and a filtering channel connected between the plasma generator 100 and the coating chamber 200;

[0033] The filtration channel includes a magnetic filter 300 and a screening tube 400 which are sequentially connected from bottom to top. The plasma generator 100 is arranged at the lower end of the magnetic filter 300. The plasma generator 100 is used to generate a target plasma jet and inject it into the magnetic filter 300. The magnetic filter 300 is used to send the target plasma jet into the screening tube 400 and filter the electrically neutral particle clusters in the target plasma jet.

[0034] A first electrode plate 401 and a second electrode plate 402 are arranged in parallel and opposite to each other in the screening tube 400. The first electrode plate 401 and the second electrode plate 402 are electrically connected to the positive and negative electrodes of a first power supply respectively. The first electrode plate 401 and the second electrode plate 402 extend in the up-down direction. A deflection channel for the target plasma jet to pass through is formed between the first electrode plate 401 and the second electrode plate 402. A third electrode plate 500 is arranged above the deflection channel and opposite to the outlet of the deflection channel. The third electrode plate 500 is used to adsorb negatively charged particle clusters. A fourth electrode plate 600 is arranged on one side above the deflection channel. The fourth electrode plate 600 is used to deflect and accelerate positively charged ions to be sprayed into the coating chamber 200 from the outlet at the upper end of the screening tube 400.

[0035] The up and down directions mentioned in this article are based on Figure 2 The direction shown is for more clearly describing the solution of the present application and does not represent the actual direction of the coating device when in use.

[0036] The third electrode plate 500 is electrically connected to the positive electrode of a third power source, and the fourth electrode plate 600 is electrically connected to the positive electrode of a fourth power source.

[0037] Specifically, Figure 2As shown, after the target plasma jet generated by the plasma generator 100 is filtered by the magnetic filter 300 to form electrically neutral particle clusters, the target plasma jet is sent to the deflection channel in the screening tube 400, and the first electrode plate 401 on one side of the deflection channel adsorbs negatively charged electrons in the target plasma jet to achieve the effect of filtering out negatively charged electrons, and the negatively charged particle clusters that collide with the third electrode plate 500 due to inertia are adsorbed by the third electrode plate 500 facing the outlet of the deflection channel. Since the negative charge carried by such a small-sized particle cluster is very weak, the negatively charged particle cluster will slightly deviate to the side of the first electrode plate 401, but affected by the speed of the target plasma jet, its inertial force is much greater than the adsorption force of the first electrode plate 401, and it will continue to move toward the outlet of the deflection channel. Therefore, the third electrode plate 500 facing the outlet of the deflection channel is used to absorb these negatively charged particle clusters, thereby achieving the effect of eliminating the influence of the particle clusters on the coating quality, and the positively charged ions are also affected by the inertial force and continue to move in the direction of the deflection channel outlet. When the positively charged ions move from the outlet of the deflection channel to the direction of the third electrode plate 500 facing the outlet of the deflection channel, the speed of the positively charged ions is reduced due to the repulsive force of the third electrode plate 500, and the positively charged ions are deflected and accelerated to be injected into the coating chamber 200 by the force of the fourth electrode plate 600 on the side above the outlet of the deflection channel to coat the workpiece 204. At this time, the ions deposited on the surface of the workpiece 204 are all positively charged (avoiding the influence of the particle clusters on the coating), thereby improving the coating quality.

[0038] The plasma generator 100 and the magnetic filter 300 may be both prior art. For example, the plasma generator 100 may be Figure 1 The cathode arc source 10 and the magnetic filter 300 shown in the figure can be Figure 1 The magnetic filter component 16 shown is not specifically limited herein.

[0039] In some embodiments, the magnetic filter 300 includes a compression tube 304 that gradually contracts from bottom to top and a first electromagnetic coil 301 wound outside the compression tube 304, and the magnetic field of the first electromagnetic coil 301 in the compression tube 304 gradually increases from bottom to top; a second electromagnetic coil 302 is wound outside the screening tube 400.

[0040] The magnetic fields generated by the first electromagnetic coil 301 and the second electromagnetic coil 302 are in the same direction and are directed toward the screening tube 400. The first electromagnetic coil 301 and the second electromagnetic coil 302 may be connected in series or may be independent of each other. In the present application, preferably, the first electromagnetic coil 301 and the second electromagnetic coil 302 are connected in series (e.g. Figure 2As shown), the starting end of the first electromagnetic coil 301 is electrically connected to the positive electrode of a fifth power supply, and the end of the second electromagnetic coil 302 is electrically connected to the negative electrode of a fifth power supply through a resistor 303.

[0041] The coil density of the first electromagnetic coil 301 gradually increases from bottom to top, thereby ensuring that the magnetic field strength in the compression tube 304 gradually increases from bottom to top.

[0042] Specifically, in the embodiment of the present application, the magnetic filter 300 is not limited to Figure 1 The magnetic filter component 16 shown, preferably, the magnetic filter 300 is as shown in Figure 2 As shown, since the radial distribution of the target plasma jet generated by the plasma generator 100 is relatively large, the gradually enhanced magnetic field in the compression tube 304 (the stronger the magnetic field, the more obvious the clamping effect) gradually clamps it into a beam state with a relatively small radial distribution. Since the movement of the electrically neutral particle clusters in the magnetic field is almost unaffected and the original movement direction is maintained, the compression tube 304 is gradually contracted from bottom to top, further increasing the probability of the electrically neutral particle clusters colliding with the inner wall of the compression tube 304, thereby eliminating most of the electrically neutral particle clusters in the compression tube 304; and by winding the second electromagnetic coil 302 outside the screening tube 400, it is ensured that the target plasma jet has a certain speed and continues to move toward the screening tube 400.

[0043] In some embodiments, the wall of the compression tube 304 is conductive and electrically connected to the positive electrode of an eighth power source.

[0044] Since some particle clusters are weakly negatively charged, the compression tube 304 can accelerate the adsorption of some negatively charged particle clusters, thereby improving the efficiency of eliminating particle clusters.

[0045] In some embodiments, an insulating component is provided between the compression tube 304 and the tube walls of the plasma generator 100 and the screening tube 400, and the insulating component is used to prevent electrical conduction between the compression tube 304 and the plasma generator 100 and the screening tube 400, wherein the insulating component is a prior art and is not specifically limited here.

[0046] In some embodiments, an insulating component may be further disposed between the screening tube 400 and the coating chamber 200 to further prevent the compression tube 304 from leaking electricity and causing the screening tube 400 to conduct electricity to the coating chamber 200 .

[0047] In some embodiments, the plasma generator 100 includes a first groove housing 101, an arc-starting needle 102, a target material 103, a cooling water device 104, a first arc source coil 105, and a second arc source coil 106. The first arc source coil 105 and the second arc source coil 106 are respectively arranged on the bottom outer wall and the peripheral surface of the first groove housing 101, the cooling water device is arranged at the bottom of the first groove housing 101, the target material 103 is arranged above the cooling water device, and the cooling water device is electrically connected to the negative electrode of a sixth power supply, and the arc-starting needle 102 is used to ignite the target material 103 to generate a target material plasma jet. By arranging the cooling water device below the target material 103, the temperature of the target material 103 is prevented from being locally too high, and the temperature of the target material 103 can be prevented from being directly transferred to the first groove housing 101, and the coupling magnetic field generated by the first arc source coil 105 and the second arc source coil 106 controls the movement direction of the target material plasma jet on the surface of the target material 103.

[0048] In some embodiments, the plasma generator 100 further includes an arc limiting ring 305, which is disposed above the target material 103 and is grounded (not shown in the figure). The arc limiting ring 305 (anode) is made of pure iron or other high temperature resistant and magnetically conductive materials, in order to attract magnetic flux lines and ensure that some electrons can be guided by the magnetic flux lines to reach the anode, thereby ensuring the stability of the cathode (target material 103) discharge.

[0049] In some embodiments, the upper outlet of the screening tube 400 is disposed on a side close to the second electrode plate 402 , and the fourth electrode plate 600 is disposed on a side close to the first electrode plate 401 .

[0050] Among them, the upper outlet of the screening tube 400 is set on a side close to the first electrode plate 401, and the fourth electrode plate 600 is set on a side close to the second electrode plate 402, which can also realize the deflection of positively charged ions and accelerate them to be sprayed into the coating chamber 200 from the outlet at the upper end of the screening tube 400. However, since the positively charged ions will be slightly moved toward the direction close to the second electrode by the force of the second electrode plate 402, the fourth electrode plate 600 needs to increase the power to make the positively charged ions deflected and accelerated to be sprayed into the coating chamber 200 from the outlet at the upper end of the screening tube 400; in the embodiment of the present application, preferably, the upper outlet of the screening tube 400 is set on a side close to the second electrode plate 402, and the fourth electrode plate 600 is set on a side close to the first electrode plate 401, such as Figure 2 As shown, it is beneficial to improve the working efficiency of the fourth electrode plate 600, and it is easier to make the positively charged ions turn to the upper outlet of the screening tube 400 without increasing the power of the fourth electrode plate 600, and it is easier to increase the movement speed of the positively charged ions.

[0051] In some embodiments, the inner diameter of the upper outlet of the screening tube 400 gradually increases in a direction pointing toward the coating chamber 200 to form a trumpet-shaped structure.

[0052] Specifically, Figure 2 As shown, by setting the upper outlet of the screening tube 400 to be a trumpet-shaped structure, it is helpful to reduce the diffusion and condensation of a part of positively charged ions on the inner wall surface of the screening tube 400, thereby improving the efficiency of coating.

[0053] In some embodiments, the spacing between the first electrode plate 401 and the second electrode plate 402 is 80mm-120mm, the lengths of the first electrode plate 401 and the second electrode plate 402 in the up and down directions are both 150mm-200mm, and the potential difference between the first electrode plate 401 and the second electrode plate 402 is 2.5V-5V.

[0054] Specifically, by setting specific parameters of the first electrode plate 401 and the second electrode plate 402 , the adsorption efficiency of the first electrode plate 401 for adsorbing negatively charged electrons can be improved.

[0055] In some embodiments, the fourth electrode plate 600 is swingably connected to the screening tube 400 via a deflection device, and the deflection device is used to drive the fourth electrode plate 600 to swing up and down to adjust the inclination angle of the fourth electrode plate 600 .

[0056] Specifically, Figure 2 As shown, by setting a deflection device, the inclination angle of the fourth electrode plate 600 is adjusted, and then the direction of the positively charged ion emission is adjusted. On the one hand, it can ensure that the positively charged ions can be smoothly ejected from the upper end outlet of the screening tube 400. On the other hand, the fourth electrode plate 600 can be continuously swung up and down during operation, so that the positively charged ions are more evenly distributed in the coating chamber 200, and the positively charged ions can be more evenly deposited on the surface of the plated workpiece 204.

[0057] In some embodiments, the deflection device includes a first motor 404, a crankshaft 405 and a rocker arm 406, the output end of the first motor 404 is connected to the crankshaft 405, one end of the rocker arm 406 is hinged to the screening tube 400, and the other end of the rocker arm 406 is fixedly connected to the fourth electrode plate 600. The crankshaft 405 and the rocker arm 406 are connected by a connecting rod 407, and the connecting rod 407 can slide relative to the rocker arm 406, and the connecting rod 407 can rotate relative to the crankshaft 405. The first motor 404 is used to drive the crankshaft 405 to rotate so that the rocker arm 406 swings up and down, thereby driving the fourth electrode plate 600 to deflect.

[0058] The deflection device is a prior art and is not specifically limited here. In the implementation of the present application, preferably, as Figure 2 and Figure 3As shown, by setting the specific structure of the deflection device, the inclination angle of the fourth electrode plate 600 can also be achieved, thereby changing the movement direction of the positively charged ions.

[0059] In some embodiments, the coating chamber 200 includes a turntable 201, a second motor 202 and a plurality of substrate racks 203, wherein the plurality of substrate racks 203 are evenly arranged around the center line of the turntable 201, the second motor 202 is used to drive the turntable 201 to rotate, the substrate rack 203 is conductive and connected to the negative pole of a second power supply, and the substrate rack 203 is used to place a plurality of workpieces 204 to be plated.

[0060] Specifically, by rotating the turntable 201, the uniformity of the coating on the workpiece 204 to be plated on the substrate rack 203 is improved.

[0061] In some embodiments, the coating chamber 200 further includes a heater 206 , which is disposed between the substrate rack 203 and the inner wall of the coating chamber 200 . The heater 206 is used to heat the workpiece 204 to be plated. The coating chamber 200 is also provided with an exhaust hole 207 , which is used to connect to an external vacuum device 208 .

[0062] Specifically, Figure 2 As shown, before coating, the workpiece 204 to be plated is baked and degassed by a heater 206, wherein one end of the heater 206 is electrically connected to the negative electrode of a seventh power supply, and the other end of the heater 206 is electrically connected to the positive electrode of the seventh power supply via a sliding resistor 2061. The temperature of the heater 206 can be adjusted by the sliding resistor 2061, and the vacuum degree of the coating chamber 200 can be made to reach the required vacuum degree by using an external vacuum device 208, and the gas adsorbed in the coating chamber 200 can be eliminated, thereby improving the coating quality.

[0063] As can be seen from the above, the coating equipment provided by the present application, after filtering the target plasma jet generated by the plasma generator 100 into electrically neutral particle clusters through the magnetic filter 300, allows the target plasma jet to pass through the deflection channel to filter out negatively charged electrons, and uses the third electrode plate 500 facing the outlet of the deflection channel to adsorb the negatively charged particle clusters that collide with the third electrode plate 500 due to inertia, and uses the fourth electrode plate 600 located on the side above the deflection channel outlet to deflect and accelerate the positively charged ions to be injected into the coating chamber 200 to coat the workpiece 204 to be plated. Since the ions deposited on the surface of the workpiece 204 to be plated are all positively charged ions (avoiding the influence of particle clusters on the coating), the coating quality is improved.

[0064] In a second aspect, the present application provides a coating method, the method comprising:

[0065] After the target plasma jet generated by the plasma generator 100 is filtered by the magnetic filter 300 to produce electrically neutral particle clusters, the target plasma jet is passed through the deflection channel to filter out negatively charged electrons, and the negatively charged particle clusters that collide with the third electrode plate 500 due to inertia are adsorbed by the third electrode plate 500, and the positively charged ions are deflected and accelerated by the fourth electrode plate 600 located on one side above the deflection channel outlet to be injected into the coating chamber 200 to coat the workpiece 204;

[0066] The deflection channel is surrounded by a first electrode plate 401 and a second electrode plate 402 which are arranged parallel to each other and face each other. The first electrode plate 401 and the second electrode plate 402 are electrically connected to the positive and negative electrodes of a first power source, respectively.

[0067] In some embodiments, the coating method is implemented based on the above coating equipment.

[0068] In some preferred embodiments, the steps of using a fourth electrode plate 600 located on one side above the outlet of the deflection channel to deflect and accelerate the positively charged ions to be injected into the coating chamber 200 to coat the workpiece 204 include:

[0069] The fourth electrode plate 600 is continuously swung up and down to change the emission angle of the positively charged ions, so that the positively charged ions are more evenly distributed in the coating chamber 200 .

[0070] like Figure 2As shown in the figure, the square in the filter channel represents the particle cluster, the circle represents the ion, and the triangle represents the electron. These three icons illustrate the process of the target plasma jet screening in the filter channel. Specifically, after the target plasma jet generated by the plasma generator 100 is filtered by the magnetic filter 300 to form electrically neutral particle clusters, the target plasma jet is sent to the deflection channel in the screening tube 400, and the first electrode plate 401 on one side of the deflection channel adsorbs the negatively charged electrons in the target plasma jet to achieve the effect of filtering out the negatively charged electrons, and the third electrode plate 500 facing the outlet of the deflection channel adsorbs the negatively charged particle clusters that collide with the third electrode plate 500 due to inertia. Since the negative charge carried by such a small-sized particle cluster is very weak, the negatively charged particle cluster will slightly deviate to the side of the first electrode plate 401, but affected by the speed of the target plasma jet, its inertial force is much greater than the adsorption force of the first electrode plate 401, and it will continue to move toward the deflection channel. The positively charged ions move in the direction of the deflection channel outlet, so the third electrode plate 500 facing the outlet of the deflection channel is used to absorb these negatively charged particle clusters, thereby achieving the effect of eliminating the particle clusters, and the positively charged ions are also affected by the inertial force and continue to move in the direction of the deflection channel outlet. When the positively charged ions move from the outlet of the deflection channel toward the third electrode plate 500 facing the outlet of the deflection channel, the speed of the positively charged ions is reduced due to the repulsive force of the third electrode plate 500, and under the action of the fourth electrode plate 600 on one side above the outlet of the deflection channel, the positively charged ions are turned and accelerated to be injected into the coating chamber 200 to coat the workpiece 204 to be plated. At this time, the ions deposited on the surface of the workpiece 204 to be plated are all positively charged ions (avoiding the influence of particle clusters on the coating), thereby improving the coating quality.

[0071] As can be seen from the above, the coating method provided by the present application uses a magnetic filter 300 to filter the target plasma jet generated by the plasma generator 100 into electrically neutral particle clusters, and then allows the target plasma jet to pass through a deflection channel to filter out negatively charged electrons, and uses a third electrode plate 500 facing the outlet of the deflection channel to adsorb negatively charged particle clusters that collide with the third electrode plate 500 due to inertia, and uses a fourth electrode plate 600 located on the side above the outlet of the deflection channel to deflect positively charged ions and accelerate them into the coating chamber 200 to coat the workpiece 204 to be plated. Since the ions deposited on the surface of the workpiece 204 to be plated are all positively charged ions (avoiding the influence of particle clusters on the coating), the coating quality is improved.

[0072] In the embodiments provided in the present application, it should be understood that the disclosed devices and methods can be implemented in other ways. The device embodiments described above are merely schematic. For example, the division of units is only a logical function division. There may be other division methods in actual implementation. For example, multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some communication interfaces, and the indirect coupling or communication connection of devices or units can be electrical, mechanical or other forms.

[0073] In addition, the units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0074] Furthermore, the functional modules in the various embodiments of the present application may be integrated together to form an independent part, or each module may exist independently, or two or more modules may be integrated to form an independent part.

[0075] In this document, relational terms such as first and second, etc. are used merely to distinguish one entity or operation from another entity or operation, but do not necessarily require or imply any such actual relationship or order between these entities or operations.

[0076] The above are only embodiments of the present application and are not intended to limit the scope of protection of the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the scope of protection of the present application.

Claims

1. A coating device, characterized in that: include: A plasma generator (100), a coating chamber (200), and a filtering channel connected between the plasma generator (100) and the coating chamber (200); The filtering channel comprises a magnetic filter (300) and a screening tube (400) connected in sequence from bottom to top, the plasma generator (100) being arranged at the lower end of the magnetic filter (300), the plasma generator (100) being used to generate a target material plasma jet and inject it into the magnetic filter (300), and the magnetic filter (300) being used to send the target material plasma jet into the screening tube (400) and filter electrically neutral particle clusters in the target material plasma jet; The screening tube (400) is provided with a first electrode plate (401) and a second electrode plate (402) which are arranged parallel to each other and face each other, the first electrode plate (401) and the second electrode plate (402) are respectively electrically connected to the positive and negative electrodes of a first power source, the first electrode plate (401) and the second electrode plate (402) are extended in the up-down direction, and a deflection channel for the target plasma jet to pass through is formed between the first electrode plate (401) and the second electrode plate (402); a third electrode plate (500) is provided above the deflection channel and facing the outlet of the deflection channel, and the third electrode plate (500) is used to adsorb negatively charged particle clusters; a fourth electrode plate (600) is provided on one side above the deflection channel, and the fourth electrode plate (600) is used to deflect and accelerate positively charged ions to be sprayed from the outlet at the upper end of the screening tube (400) into the coating chamber (200); The magnetic filter (300) comprises a compression tube (304) that gradually contracts from bottom to top and a first electromagnetic coil (301) wound outside the compression tube (304), wherein the magnetic field of the first electromagnetic coil (301) in the compression tube (304) gradually increases from bottom to top; a second electromagnetic coil (302) is wound outside the screening tube (400); The fourth electrode plate (600) is swingably connected to the screening tube (400) via a deflection device, and the deflection device is used to drive the fourth electrode plate (600) to swing up and down to adjust the inclination angle of the fourth electrode plate (600); The deflection device comprises a first motor (404), a crankshaft (405) and a swing rod (406); the output end of the first motor (404) is connected to the crankshaft (405); one end of the swing rod (406) is hinged to the screening tube (400); the other end of the swing rod (406) is fixedly connected to the fourth electrode plate (600); the crankshaft (405) and the swing rod (406) are connected via a connecting rod (407); the connecting rod (407) can slide relative to the swing rod (406); the connecting rod (407) can rotate relative to the crankshaft (405); the first motor (404) is used to drive the crankshaft (405) to rotate so that the swing rod (406) swings up and down, thereby driving the fourth electrode plate (600) to deflect.

2. The coating device according to claim 1, characterized in that: The upper outlet of the screening tube (400) is arranged on a side close to the second electrode plate (402), and the fourth electrode plate (600) is arranged on a side close to the first electrode plate (401).

3. The coating device according to claim 1, characterized in that: The inner diameter of the upper outlet of the screening tube (400) gradually increases in a direction pointing toward the coating chamber (200) to form a trumpet-shaped structure.

4. The coating device according to claim 1, characterized in that: The spacing between the first electrode plate (401) and the second electrode plate (402) is 80 mm-120 mm, the lengths of the first electrode plate (401) and the second electrode plate (402) in the up-down direction are both 150 mm-200 mm, and the potential difference between the first electrode plate (401) and the second electrode plate (402) is 2.5 V-5 V.

5. The coating device according to claim 1, characterized in that: The coating chamber (200) comprises a turntable (201), a second motor (202) and a plurality of substrate racks (203); the plurality of substrate racks (203) are evenly arranged around the center line of the turntable (201); the second motor (202) is used to drive the turntable (201) to rotate; the substrate rack (203) is conductive and connected to the negative pole of a second power source; and the substrate rack (203) is used to place a plurality of workpieces (204) to be plated.

6. The coating device according to claim 5, characterized in that: The coating chamber (200) further comprises a heater (206), wherein the heater (206) is arranged between the substrate rack (203) and the inner wall of the coating chamber (200), and the heater (206) is used to heat the plated workpiece (204). The coating chamber (200) is also provided with an exhaust hole (207), and the exhaust hole (207) is used to connect to an external vacuum device (208).

7. A coating method, characterized in that: The coating device according to any one of claims 1 to 6 comprises: After filtering the electrically neutral particle clusters of the target plasma jet generated by the plasma generator (100) with a magnetic filter (300), the target plasma jet is passed through a deflection channel to filter out negatively charged electrons, a third electrode plate (500) facing the outlet of the deflection channel is used to absorb the negatively charged particle clusters that collide with the third electrode plate (500) due to inertia, and a fourth electrode plate (600) located on one side above the outlet of the deflection channel is used to deflect positively charged ions and accelerate them to be injected into a coating chamber (200) to coat the workpiece (204); The deflection channel is surrounded by a first electrode plate (401) and a second electrode plate (402) which are arranged parallel to each other and face each other, and the first electrode plate (401) and the second electrode plate (402) are respectively electrically connected to the positive and negative electrodes of a first power source.

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