A vertical dual-chamber hot wire CVD system and its use method

Abstract

The present invention discloses a vertical dual-chamber hot-wire CVD system and its use method, relating to the technical field of chemical deposition coating equipment. The sample chamber has a pretreatment chamber. The process chamber has a process chamber, which is connected to the pretreatment chamber. A plurality of drive rollers are arranged at the bottom of the pretreatment chamber and the process chamber. A gate valve is inserted into the side of the sample chamber near the process chamber to isolate the pretreatment chamber from the process chamber. The gate valve is also used to connect the pretreatment chamber and the process chamber when the gate valve is removed. The sample cart is located on the drive rollers and moves along the drive rollers between the pretreatment chamber and the process chamber. The sample cart has an installation chamber for mounting a substrate. The hot wire is located in the installation chamber when the sample cart moves into the process chamber, and the substrate is located on one side or both sides of the hot wire. An air inlet line is arranged at the top of the process chamber and is used to introduce a mixed gas. An exhaust system is used for vacuuming and is connected to the bottom of the pretreatment chamber and the process chamber. The present invention is used for substrate coating.

Description

Technical Field

[0001] The present invention relates to the technical field of chemical deposition coating equipment, and in particular to a vertical double-chamber hot wire CVD system and a method for using the same. Background Art

[0002] Chemical vapor deposition (CVD) is the most widely used technology in the semiconductor industry for depositing a variety of materials. A mixture of gases is introduced into a reaction chamber, where a chemical reaction occurs under the action of a heated filament, forming the desired thin film on the substrate surface. CVD technology is widely used for depositing a variety of different film types due to its wide film formation range and excellent reproducibility.

[0003] Currently, chemical vapor deposition (CVD) typically uses a single process chamber. The substrate is placed in the chamber, and then vacuum-coated for coating. However, because both the vacuuming and the reaction take place within the same chamber, when the chamber is opened and the substrate is placed, impurities enter the chamber during the air flow and are deposited on the substrate surface, reducing the purity of the film. Summary of the Invention

[0004] An embodiment of the present invention provides a vertical dual-chamber hot-wire CVD system and a method for using the same, which solves the problem of reduced purity of substrate coating caused by air entering the process chamber by adding a sample injection chamber.

[0005] To achieve the above objectives, the embodiments of the present invention adopt the following technical solutions:

[0006] In one aspect, embodiments of the present invention provide a vertical dual-chamber hot-filament CVD system for coating substrates. The dual-chamber hot-filament CVD system includes an inlet chamber, a process chamber, several drive rollers, a gate valve, a sample cart, hot filaments, an air inlet line, and an exhaust system. The inlet chamber includes a pretreatment chamber. The process chamber includes a process chamber that communicates with the pretreatment chamber. Several drive rollers are located at the bottom of the pretreatment chamber and the process chamber. The gate valve is inserted into the side of the inlet chamber near the process chamber to isolate the pretreatment chamber from the process chamber. It also connects the pretreatment chamber and the process chamber when the gate valve is removed. The sample cart rests on the drive rollers and moves along the drive rollers between the pretreatment chamber and the process chamber. The sample cart has a mounting chamber with two parallel, opposing mounting surfaces for mounting substrates. Several hot filaments, spaced evenly apart and coplanar, are located within the process chamber. When the sample cart moves into the process chamber, the hot filaments are positioned within the mounting chamber, with the substrate positioned on one or both sides of the hot filaments.

[0007] In this case, the substrate can be mounted on the mounting surface of the sample cart, and then the sample cart is moved from the pretreatment chamber to the process chamber by the transmission roller. The pretreatment chamber and the process chamber can be evacuated by the exhaust system. The pretreatment chamber and the process chamber can be connected or isolated by the plug valve. The hot wire can heat the mixed gas discharged from the air inlet pipe and the air outlet to form a film on the substrate. In this way, the substrate can be heated and vacuumed in the pretreatment chamber and then transported to the process chamber. No outside air is introduced into the process chamber, so the cleanliness is higher, and as a result, the purity of the film formed on the substrate surface is higher.

[0008] Furthermore, the plug-in valve includes a shell, two parallel connecting plates, two cold water plates and a cylinder, wherein the shell is located at the upper part of the injection chamber and is vertically connected to the top wall of the injection chamber. A portion of the two parallel connecting plates extends into the two opposite front and rear side walls of the pretreatment chamber and is connected to the pretreatment chamber, and the other portion extends into the shell and is connected to the side walls of the shell. The two cold water plates are vertically arranged between the two connecting plates and are slidably connected to the connecting plates. A cold water chamber is provided in the cold water plate, and a coolant is passed into the cold water chamber. The cylinder has a cylinder rod, which is hinged to the inner walls of the two cold water plates. The cylinder is used to push the two cold water plates into the pretreatment chamber so that the cold water plates abut against the side of the process chamber close to the pretreatment chamber to achieve sealing; the cylinder is also used to pull the two cold water plates out of the shell, thereby achieving communication between the pretreatment chamber and the process chamber.

[0009] Furthermore, the gate valve includes a plurality of slide rods, one end of which is connected to the side wall of the cold water plate. Two rows of parallel slide grooves are formed on the side of the connecting plate near the cold water plate. Each row of slide grooves includes a first groove and a second groove spaced apart, and the first groove and the second groove are arranged in a straight line.

[0010] Among them, the other end of one part of the sliding rod is located in the first groove and slides along the first groove, and the other end of the other part of the sliding rod is located in the second groove and slides along the second groove, thereby realizing the sliding connection between the cold water plate and the connecting plate.

[0011] Furthermore, the second groove is located in the pre-processing chamber. An end of the first groove close to the second groove and an end of the second groove away from the first groove both have an outwardly bent extension groove.

[0012] Furthermore, the dual-chamber hot-wire CVD system also includes a bracket, two protrusions, and two stopper assemblies. The bracket is located at the bottom of the sample chamber and process chamber and is connected to each other, supporting the sample chamber and process chamber. The two protrusions are located at the left and right ends of the outer bottom wall of the sample cart and are connected to the cart. The two stopper assemblies are located below the sample chamber and process chamber, respectively, and are connected to the bracket. The stopper assembly is configured to stop the drive roller when it abuts one of the protrusions.

[0013] Furthermore, the limiter assembly includes a telescopic rod, a first photoelectric switch, and a second photoelectric switch. The telescopic rod includes a connecting rod, a sleeve, a spring, and a roller. The sleeve is mounted on the connecting rod, and the spring is mounted on the connecting rod and positioned within the sleeve, with the spring abutting against the sleeve and the connecting rod. The roller is located on the end of the connecting rod closest to the sample vehicle. The first photoelectric switch is connected to the bracket and has a first emitter. The second photoelectric switch is connected to the bracket and is located on the side of the first photoelectric switch away from the drive roller. The second photoelectric switch has a second emitter. The side of the protrusion closest to the first photoelectric switch has a deceleration ramp and a stop plane connected to the deceleration ramp. When the roller slides onto the deceleration ramp, the end of the connecting rod away from the roller blocks the first emitter, causing the drive roller to decelerate. When the roller slides onto the stop plane, the end of the connecting rod away from the roller blocks the second emitter, causing the drive roller to stop.

[0014] Furthermore, the sample vehicle includes a bottom plate, two parallel and spaced-apart side plates, and two parallel and spaced-apart sample plates. The bottom plate is located on a transmission roller. The two parallel and spaced-apart side plates are respectively disposed at both ends of the bottom plate and are vertically connected to the side of the bottom plate away from the transmission roller. The two parallel and spaced-apart sample plates are disposed between the two side plates, with the sample plates' surfaces being parallel to the side plates' surfaces. The sample plates are connected to the side plates, and the space between the two sample plates serves as a mounting cavity. The sample plate's surface away from the side plates serves as a mounting surface for mounting a substrate.

[0015] Furthermore, the side walls of the sample feeding chamber and the process chamber both have gap interlayers, and the double-chamber hot wire CVD system also includes a water cooling system, which includes a cooling water tank and a water pipe, wherein the water pipe is connected to the cooling water tank, and the inlet of the water pipe is connected to the gap interlayer at the bottom of the sample feeding chamber and the process chamber, as well as the water cooling plate; the outlet of the water pipe is connected to the gap interlayer at the top of the sample feeding chamber and the process chamber, as well as the water cooling plate.

[0016] Furthermore, the dual-chamber hot-filament CVD system also includes two parallel fixed plates, two first conductive posts, and two second conductive posts. The hot filament is disposed between the two fixed plates, with its ends connected to the two fixed plates. The two first conductive posts are connected to the ends of one of the fixed plates, respectively. The two second conductive posts are connected to the ends of the other fixed plate, respectively. Opposite-polarity electrodes are connected to the first and second conductive posts.

[0017] On the other hand, an embodiment of the present invention further provides a method for using the vertical dual-chamber hot-filament CVD system, comprising the following steps:

[0018] Open the injection chamber, fix the substrate in the installation chamber of the sample cart, close the injection chamber, evacuate the pretreatment chamber to a vacuum degree of 0.1 Pa ~ 0.9 Pa, and heat the pretreatment chamber to 150 ° C ~ 250 ° C;

[0019] Open the gate valve, control the sample cart to move from the pretreatment chamber to the process chamber, close the gate valve, energize the hot wire to heat the substrate to 800℃~1200℃, and introduce mixed gas into the air inlet pipe to start coating;

[0020] After the coating is completed, the process chamber is cooled to 150℃~250℃, the gate valve is opened, the sample cart is moved into the pretreatment chamber, the gate valve is closed, and the substrate is taken out after the pretreatment chamber cools to room temperature. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 A rear view of a vertical dual-chamber hot-wire CVD system provided in an embodiment of the present invention;

[0022] Figure 2 A front view of a vertical dual-chamber hot-wire CVD system provided by an embodiment of the present invention;

[0023] Figure 3 The embodiment of the present invention provides Figure 2 A partial cross-sectional view of the sample chamber with the sample cart in FIG;

[0024] Figure 4 The embodiment of the present invention provides Figure 3 Schematic diagram of the sample car in ;

[0025] Figure 5 The embodiment of the present invention provides Figure 2 A partial cross-sectional view of the process chamber with a sample cart;

[0026] Figure 6 The embodiment of the present invention provides Figure 5 Schematic diagram of the hot wire assembly;

[0027] Figure 7 The embodiment of the present invention provides Figure 2 Schematic diagram of the gate valve in FIG;

[0028] Figure 8 The embodiment of the present invention provides Figure 7 A partial cross-sectional view of

[0029] Figure 9 The embodiment of the present invention provides Figure 7 Schematic diagram of the connection plate in;

[0030] Figure 10A partial cross-sectional schematic diagram of the connection between the injection chamber and the process chamber provided in an embodiment of the present invention;

[0031] Figure 11 The embodiment of the present invention provides Figure 10 Schematic diagram of the rubber strip in ;

[0032] Figure 12 A diagram showing the position relationship of the limiting assembly provided in an embodiment of the present invention within a vertical dual-chamber hot-wire CVD system;

[0033] Figure 13 The embodiment of the present invention provides Figure 12 Schematic diagram of the cross-section of the limit assembly;

[0034] Figure 14 A schematic diagram of the positional relationship between a limiting assembly, a sample injection chamber, and a process chamber provided in an embodiment of the present invention;

[0035] Figure 15 A schematic diagram of the positional relationship between another limiting assembly, the injection chamber, and the process chamber provided in an embodiment of the present invention;

[0036] Figure 16 A schematic cross-sectional view of a portion of the connection between the cold water plate and the rubber strip provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0037] The embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0038] In the description of the present invention, it should be understood that the terms "center", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention.

[0039] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the quantity of the technical features being referred to. Thus, a feature specified as "first" or "second" may explicitly or implicitly include one or more of such features. In the description of the present invention, unless otherwise specified, "plurality" means two or more.

[0040] In the description of the present invention, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they may refer to fixed, detachable, or integral connections; mechanical or electrical connections; direct or indirect connections through an intermediate medium; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on the specific circumstances.

[0041] CVD (Chemical Vapor Deposition) refers to the process of introducing vapor of gaseous reactants or liquid reactants containing the elements that constitute the thin film and other gases required for the reaction into the reaction chamber, causing a chemical reaction on the substrate surface to form a thin film.

[0042] The embodiment of the present invention provides a vertical dual-chamber hot wire CVD system 100 for substrate coating, such as Figure 1 As shown, the vertical dual-chamber hot wire CVD system 100 may include an injection chamber 101, a process chamber 102, a plug-in valve 103 and an exhaust system 104. The injection chamber 101 has a pretreatment chamber. The process chamber 102 has a process chamber, which is connected to the pretreatment chamber. The plug-in valve 103 is used to be inserted on the side of the injection chamber 101 close to the process chamber 102 to isolate the pretreatment chamber from the process chamber. It is also used to connect the pretreatment chamber and the process chamber when the plug-in valve 103 is pulled out. The exhaust system 104 is used for vacuuming and is connected to the bottom of the pretreatment chamber and the process chamber.

[0043] In this case, if Figure 1 As shown, the pretreatment chamber and the process chamber can be vacuumed by the exhaust system 104. The pretreatment chamber and the process chamber can be connected or isolated by the plug valve 103. After the substrate is heated and vacuumed in the pretreatment chamber, it can be transported to the process chamber. No outside air is introduced into the process chamber, so that the cleanliness is higher. As a result, the purity of the film formed on the surface of the substrate is higher. The exhaust system 104 can perform vacuum treatment. For example, in some embodiments of the present application, the exhaust system 104 may include a first mechanical pump 1041 and a second mechanical pump 1042, wherein the first mechanical pump 1041 is connected to the pretreatment chamber for vacuuming the pretreatment chamber. The second mechanical pump 1042 is connected to the process chamber for vacuuming the process chamber.

[0044] In order to prevent the temperature in the injection chamber 101 and the process chamber 102 from being too high, in some embodiments of the present application, the side walls of the injection chamber 101 and the process chamber 102 are provided with a gap interlayer, which means that the side walls of the injection chamber 101 and the process chamber 102 are double-layer structures with a gap between the double-layer structures, and the gap can allow water to flow. Figure 1 As shown, the double-chamber hot-filament CVD system also includes a water cooling system, which includes a cooling water tank 105 and a water pipe 106, wherein the water pipe 106 is connected to the cooling water tank 105, and the inlet of the water pipe 106 is connected to the gap between the bottom of the sample injection chamber 101 and the process chamber 102, as well as the water cooling plate (the structure in the plug valve 103, Figure 1 The outlet of the water pipe 106 is connected to the gap between the top of the sample injection chamber 101 and the process chamber 102, as well as the water cooling plate.

[0045] In this case, if Figure 1 As shown, there is a circulating water pump in the cooling water tank 105. The working principle is that the cold water stored in the water tank is sucked into the circulation system by the circulating water pump, passes through the equipment part to be cooled, and after playing a cooling role, flows out water with a higher temperature, and then cools down through the water circulation radiator and the cooling fan, and re-enters a new circulation. The cold water enters the bottom gap interlayer of the sampling chamber 101 and the process chamber 102 through the water pipe 106, thereby flowing in the gap interlayer so as to cool the sampling chamber 101 and the process chamber 102, and then flows out into the cooling water tank 105 by the gap interlayer at the top of the sampling chamber 101 and the process chamber 102, thereby forming a cycle. The cooling water can also flow into the cold water plate through the water pipe 106 to cool the cold water plate. Of course, in some other embodiments of the present application, other components can also be connected by the water pipe 106, and the present application will no longer list them one by one.

[0046] like Figure 2 As shown, in some embodiments of the present application, the vertical dual-chamber hot wire CVD system 100 may further include a power supply 107, through which the hot wire 1114 in the process chamber 102 can be electrically heated. Figure 2 As shown, a door 1011 is provided at the sample injection chamber 101 for sealing the sample injection chamber 101 , and a handle 1012 is provided on the outside of the door 1011 for a user to open or close the door 1011 through the handle 1012 .

[0047] like Figure 3As shown, it is a partial cross-sectional view of the sample cart 108 in the sampling chamber 101. It can be seen that the sample cart 108 is in the pretreatment chamber of the sampling chamber 101. Several transmission rollers 109 are arranged at the bottom of the pretreatment chamber. The transmission rollers 109 are used to allow the sample cart 108 to move in the pretreatment chamber. A chain is used to connect the multiple transmission rollers 109 at the bottom of the sampling chamber 101 or the process chamber 102, and a motor 110 is coaxially connected to one of the transmission rollers 109 for transmission, thereby driving the chain to rotate, and then driving other related transmission rollers 109 to rotate. Ultimately, multiple transmission rollers 109 are achieved to rotate synchronously. The two motors 110 at the bottom of the sampling chamber 101 and the process chamber 102 can rotate synchronously, so that the sample cart 108 can move smoothly in the left and right chambers.

[0048] It should be noted that, in some embodiments of the present application, multiple infrared radiation heaters ( Figure 3 (not shown). This infrared radiation heater is located at the top of the pretreatment chamber and is used to heat the chamber. During the production process, the infrared radiation heater heats the chamber to a certain temperature, making the temperature inside the chamber relatively uniform and stable. This ensures the initial ambient temperature of the substrate during the coating process, which helps ensure process stability.

[0049] The structure of the sample vehicle 108 mentioned above is described below with examples, for example, in some embodiments of the present application. Figure 4 As shown, the sample vehicle 108 may include a bottom plate 1081, two parallel and spaced side plates 1082, and two parallel and spaced sample plates 1083. The bottom plate 1081 is located on the transmission roller 109. The two parallel and spaced side plates 1082 are respectively arranged at both ends of the bottom plate 1081 and are vertically connected to the side of the bottom plate 1081 away from the transmission roller 109. The two parallel and spaced sample plates 1083 are arranged between the two side plates 1082, and the plate surfaces of the sample plates 1083 are parallel to the plate surfaces of the side plates 1082. The sample plates 1083 are connected to the side plates 1082, and the space between the two sample plates 1083 serves as a mounting cavity 1084. The plate surface of the sample plate 1083 away from the side plate 1082 serves as a mounting surface 10831 for mounting a substrate.

[0050] In this case, the bottom plate 1081 can slide along the transmission roller 109, and the two parallel side plates 1082 can form a U-shaped cavity with the bottom plate 1081, thereby forming a U-shaped bracket 114. The two parallel sample plates 1083 in the U-shaped cavity can be fixed to the side plates 1082 through the keel, so that the two parallel side plates 1082 are parallel to the two parallel sample plates 1083. The mounting surface 10831 on the side wall of the mounting cavity 1084 between the two sample plates 1083 can be used to mount a substrate, and the substrate can be connected to the mounting surface 10831. This application does not limit the method of fixing the substrate. The two sample plates 1083 can be molybdenum plates with high temperature resistance. A graphite plate can be set on the outside of the molybdenum plate. The graphite plate can provide a certain degree of thermal insulation for the heating of the hot wire 1114 when it is between the sample plates 1083, thereby reducing heat loss and being used to fix the molybdenum plate.

[0051] In some embodiments of the present application, the dual-chamber hot wire CVD system may further include: Figure 5 The hot wire assembly 111 shown, Figure 5 This is a partial cross-sectional view of the sample cart 108 moving into the process chamber 102. Several drive rollers 109 are also installed at the bottom of the process chamber 102, so that the sample cart 108 can move within the pre-treatment chamber and the process chamber. In this case, the hot wire assembly 111 is located between the two sample plates 1083 in the sample cart 108, so that the substrate mounted on the mounting surface 10831 can face Figure 6 One side of the hot wire 1114. Figure 6 As shown, the hot wire assembly 111 may include two parallel fixed plates 1111, two first conductive posts 1112, and two second conductive posts 1113. A hot wire 1114 is disposed between the two fixed plates 1111, with its ends connected to the two fixed plates 1111. The two first conductive posts 1112 are connected to the ends of one of the fixed plates 1111, respectively. The two second conductive posts 1113 are connected to the ends of the other fixed plate 1111, respectively. Opposite-polarity electrodes are connected to the first and second conductive posts 1112 and 1113.

[0052] In this case, combined Figure 5 and Figure 6As shown, the two fixed plates 1111 can be energized through the first conductive column 1112 and the second conductive column 1113, so that the hot wire 1114 fixed between the two fixed plates 1111 generates heat. For example, the first conductive column 1112 can be the positive pole, and the second conductive column 1113 is the negative pole. If the first conductive column 1112 is the negative pole, then the second conductive column 1113 is the positive pole. This application does not limit the positive and negative poles of the first conductive column 1112 and the second conductive column 1113, as long as the first conductive column 1112 and the second conductive column 1113 are opposite electrodes. Figure 1 The positive and negative electrodes of the power supply 107 are connected to the first conductive column 1112 and the second conductive column 1113 respectively, so that the hot wire 1114 in the process chamber 102 can be powered and heated, thereby radiating heat to the substrates on both sides.

[0053] In some embodiments of the present application, the dual-chamber hot wire CVD system may further include: Figure 5 The air inlet pipe 112 shown is installed at the top of the process chamber and is located at the top of the hot wire 111. The air inlet pipe 112 is provided with a plurality of air outlets facing the substrate. The air inlet pipe 112 is used to introduce a mixed gas (such as methane and hydrogen) to spray toward the substrate.

[0054] Combine Figures 3 to 5 As shown, the sample cart 108 is positioned on a drive roller 109 and moves along the drive roller 109 between the pretreatment chamber and the process chamber. The sample cart 108 has a mounting cavity 1084, which has two parallel, opposing mounting surfaces 10831 for mounting a substrate. Several equally spaced, coplanar hot wires 1114 are disposed within the process chamber. When the sample cart 108 is moved into the process chamber, the hot wires 1114 are positioned within the mounting cavity 1084, with the substrate positioned on one or both sides of the hot wires 1114. An air inlet line 112 is disposed at the top of the process chamber.

[0055] In this case, the user can mount the substrate on the mounting surface 10831 of the sample cart 108, and then move the sample cart 108 from the pre-treatment chamber to the process chamber via the driving roller 109. The hot wire 1114 can heat the mixed gas discharged from the gas outlet of the gas inlet pipe 112 to form a film on the substrate.

[0056] Since the pretreatment chamber and the process chamber are connected and can be used for the sample cart 108 to pass through, a gate valve 103 is required between the pretreatment chamber and the process chamber to connect the two chambers or isolate them. The gate valve 103 mentioned above is described below with examples. For example, in some embodiments of the present application, Figure 7As shown, the gate valve 103 may include a housing 1031, two parallel connection plates 1032, two cold water plates 1033 and a cylinder 1034, wherein the gate valve 103 may include a housing 1031, two parallel connection plates 1032, two cold water plates 1033 and a cylinder 1034. Figure 1 As shown, the shell 1031 is located at the upper part of the sample injection chamber 101 and is vertically connected to the top wall of the sample injection chamber 101. Two parallel connecting plates 1032 are partially extended into the two opposite side walls of the pretreatment chamber and connected to the pretreatment chamber, and the other part extends into the shell 1031 and is connected to the side wall of the shell 1031. Two cold water plates 1033 are vertically arranged between the two connecting plates 1032 and are slidably connected to the connecting plates 1032. The cold water plates 1033 have a cold water cavity inside, and the cold water cavity is filled with cooling liquid. Figure 8 As shown, the cylinder 1034 has a cylinder rod, which is hinged to the inner walls of the two cold water plates 1033 through a driving plate. The cylinder 1034 is used to push the two cold water plates 1033 into the pretreatment chamber so that the cold water plates 1033 abut against the side of the process chamber close to the pretreatment chamber to achieve sealing; the cylinder 1034 is also used to pull the two cold water plates 1033 out of the shell 1031, thereby achieving communication between the pretreatment chamber and the process chamber.

[0057] In this way, the housing 1031 of the gate valve 103 can be fixed to the top of the injection chamber 101, and the housing 1031 can be connected to the pretreatment chamber in the injection chamber 101. Two parallel connecting plates 1032 are arranged so that one portion extends into the pretreatment chamber and the other portion extends into the housing 1031. The cold water plate 1033, which is vertically connected to the connecting plates 1032, can slide along the connecting plates 1032 into the housing 1031, thereby connecting the pretreatment chamber and the process chamber. The cold water plate 1033 can also slide into the pretreatment chamber, thereby isolating the pretreatment chamber and the process chamber, thereby achieving a sealing of the process chamber.

[0058] The sliding connection between the cold water plate 1033 and the connecting plate 1032 is described below by way of example. For example, in some embodiments of the present application, the gate valve 103 may further include a plurality of sliding rods, one end of which is connected to the side wall of the cold water plate 1033. Figure 9 As shown, two rows of parallel grooves are provided on one side of the connecting plate 1032 close to the cold water plate 1033 , and each row of grooves includes a first groove 10321 and a second groove 10322 that are spaced apart, and the first groove 10321 and the second groove 10322 are arranged in a straight line.

[0059] Among them, the other end of one part of the sliding rod is located in the first groove 10321 and slides along the first groove 10321, and the other end of the other part of the sliding rod is located in the second groove 10322 and slides along the second groove 10322, thereby realizing the sliding connection between the cold water plate 1033 and the connecting plate 1032.

[0060] In this case, the sliding connection between the sliding rod and the first groove 10321 and the second groove 10322 enables sliding between the cold water plate 1033 and the connecting plate 1032. When the upper sliding rod slides into the lowest position of the first groove 10321 and the lower sliding rod slides into the lowest position of the second groove 10322, the cold water plate 1033 is inside the pretreatment chamber. When the upper sliding rod slides into the highest position of the first groove 10321 and the lower sliding rod slides into the highest position of the second groove 10322, the cold water plate 1033 is outside the pretreatment chamber, that is, the cold water plate 1033 is inside the housing 1031.

[0061] In order to make the cold water plate 1033 seal the process chamber more tightly, in some embodiments of the present application, a circle of rubber strips 113 can be set on the side of the process chamber close to the pre-treatment chamber, and the rubber strips 113 can abut against the outer edge of the cold water plate 1033. In order to make the abutment more tight. The second groove 10322 is located in the pre-treatment chamber, such as Figure 9 As shown, the end of the first groove 10321 close to the second groove 10322 and the end of the second groove 10322 away from the first groove 10321 both have an outward-bending extension groove. When the cold water plate 1033 slides into the pretreatment chamber, the uppermost sliding rod will slide into the extension groove below the first groove 10321 (it should be noted that the extension groove can be a straight groove extending outward to form an obtuse angle with the first groove 10321, or it can be an arc-shaped groove. This application does not limit this. As long as the extension groove is a groove extending outward and close to the bottom, it falls within the scope of protection. Similarly, the above-mentioned extension groove will not be repeated), and the lowermost sliding rod will slide into the extension groove below the second groove 10322, so that the two cold water plates 1033 are separated. The oblique force generated by the extension groove is separated to both sides, thereby generating a horizontal force. In this way, Figure 10 As shown, the cold water plate 1033 on the right side will move to the right, thereby abutting against the rubber strip 113 (as shown in FIG. Figure 11 As shown, the shape of the rubber strip 113 can fit the outer edge of the cold water plate 1033), and the abutting force is exerted on the rubber strip 113, so that the left side of the process chamber is sealed more tightly.

[0062] In order to prevent the sample cart 108 from colliding with the sample chamber 101 and the process chamber 102 when moving left and right, thereby affecting normal use, in some embodiments of the present application, the dual-chamber hot wire CVD system may further include the following: Figure 12The bracket 114, two protrusions 115, and two limit assemblies 116 are shown. The bracket 114 is disposed at the bottom of the sample chamber 101 and the process chamber 102 and is connected thereto. The bracket 114 is used to support the sample chamber 101 and the process chamber 102. The two protrusions 115 are respectively disposed at the left and right ends of the outer bottom wall of the sample cart 108 and are connected to the sample cart 108. The two limit assemblies 116 are respectively disposed below the sample chamber 101 and the process chamber 102 and are connected to the bracket 114. The limit assemblies 116 are used to control the transmission roller 109 to stop rotating when abutting against one of the protrusions 115.

[0063] In this way, if Figure 12 As shown, the sample chamber 101 and the process chamber 102 can be supported by the bracket 114. The two limit assemblies 116 and the protrusion 115 cooperate to control the rotation or stop of the transmission roller 109. When the protrusion 115 at the bottom of the moving sample cart 108 abuts against the limit assemblies 116, the mechanical signal can be converted into an electrical signal and transmitted to the electronic control system. The electronic control system then issues a control command to control the transmission roller 109 to stop rotating, thereby stopping the rotation of the sample cart 108. The user can also control the rotation of the transmission roller 109 through the electronic control system.

[0064] The above-mentioned limiting component 116 is described below with examples. For example, in some embodiments of the present application, Figure 13 As shown, the limiting assembly 116 may include a telescopic rod 1161, a first photoelectric switch 1162 and a second photoelectric switch 1163. The telescopic rod 1161 includes a connecting rod 11611, a sleeve 11612, a spring 11613 and a roller 11614. The sleeve 11612 is sleeved outside the connecting rod 11611, and the spring 11613 is sleeved outside the connecting rod 11611 and located inside the sleeve 11612. The spring 11613 abuts against the sleeve 11612 and the connecting rod 11611. The roller 11614 is arranged at one end of the connecting rod 11611 close to the sample cart 108. The first photoelectric switch 1162 is connected to the bracket 114, and the first photoelectric switch 1162 has a first emitter. The second photoelectric switch 1163 is connected to the bracket 114 and is located on the side of the first photoelectric switch 1162 away from the transmission roller 109. The second photoelectric switch 1163 also has a second emitter. Combined Figure 14 As shown, the side of the protrusion 115 close to the first photoelectric switch 1162 has a deceleration slope and a stop plane connected to the deceleration slope. When the roller 11614 slides onto the deceleration slope, the end of the connecting rod 11611 away from the roller 11614 blocks the first emitter (such as Figure 14 When the roller 11614 slides onto the stop plane, the end of the connecting rod 11611 away from the roller 11614 blocks the second launcher (such as Figure 15right side), and controls the transmission roller 109 to stop rotating.

[0065] So, for example, Figure 13-14 As shown, when the sample cart 108 moves from left to right, when the sample cart 108 is close to the right side of the process chamber, the roller 11614 connected to the connecting rod 11611 begins to climb the deceleration slope of the bump 115. At this time, the connecting rod 11611 is subjected to a downward compression force, and the spring 11613 gives the compression rod an upward force. As the connecting rod 11611 moves downward, it blocks the first photoelectric switch 1162, thereby triggering the first photoelectric switch 1162 to send a signal, and then the electronic control system issues a corresponding control instruction. Figure 15 As shown on the right side, when roller 11614 continues to climb to the stop plane at the highest point of bump 115, connecting rod 11611 blocks second photoelectric switch 1163, causing it to emit a corresponding signal, which in turn triggers the electronic control system to issue a corresponding control command, causing drive roller 109 to stop. When the user controls drive roller 109 to move leftward through the electronic control system, roller 11614 gradually moves away from the stop plane and deceleration ramp, at which point spring 11613 gradually recovers its deformation. The same process occurs when sample cart 108 moves to the pretreatment chamber on the left, and will not be further described here.

[0066] The following examples illustrate the first photoelectric switch 1162 and the second photoelectric switch 1163 mentioned above. In some embodiments of the present application, both the first photoelectric switch 1162 and the second photoelectric switch 1163 are photoelectric switches (photoelectric sensors), short for photoelectric proximity switches. They detect the presence of an object by blocking or reflecting an emitted light beam by the detected object (i.e., the end of the connecting rod 11611 away from the roller 11614 in this application). A synchronous circuit activates the circuit and detects the presence of the object. Objects are not limited to metal; any object that reflects (or blocks) light can be detected. The photoelectric switch converts input current into an optical signal at the transmitter (the first or second transmitter in this application). The receiver then detects the target object based on the intensity or presence of the received light.

[0067] It should be noted that, in other embodiments of the present application, Figure 16 As shown, the cross-sectional view of the rubber strip 113 can be a trapezoidal structure, and the cold water plate 1033 can have a trapezoidal groove matching the shape of the rubber strip 113 on the side close to the rubber strip 113. In this way, when the cold water plate 1033 abuts against the rubber strip 113, the contact area increases, and in this case, the sealing is better.

[0068] In order to more clearly illustrate the technical solution of the present application, in some embodiments of the present application, the present invention may further provide a method for using the vertical dual-chamber hot-filament CVD system 100, comprising the following steps:

[0069] Open the sample injection chamber 101, fix the substrate in the mounting cavity 1084 of the sample cart 108, close the sample injection chamber 101, evacuate the pretreatment chamber to a vacuum degree of 0.1 Pa to 0.9 Pa, and heat the pretreatment chamber to a temperature between 150°C and 250°C.

[0070] Open the gate valve 103, control the sample cart 108 to move from the pretreatment chamber to the process chamber, close the gate valve 103, energize the hot wire 1114 to heat the substrate to 800°C~1200°C, and introduce the mixed gas into the air inlet pipe 112 to start the coating process;

[0071] After the coating is completed, the process chamber is cooled to 150°C~250°C, the gate valve 103 is opened, the sample cart 108 is moved into the pretreatment chamber, the gate valve 103 is closed, and the substrate is taken out after the pretreatment chamber cools to room temperature.

[0072] In the description of this specification, specific features, structures, materials or characteristics may be combined in an appropriate manner in any one or more embodiments or examples.

[0073] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any modifications or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be based on the scope of protection of the claims.

Claims

1. A vertical dual-chamber hot wire CVD system for substrate coating, characterized in that: The vertical dual-chamber hot wire CVD system includes: an injection chamber having a pretreatment chamber; A process chamber having a process cavity, wherein the process cavity is connected to the pretreatment cavity; A plurality of transmission rollers are arranged at the bottom of the pretreatment chamber and the process chamber; a gate valve, which is inserted into the side of the injection chamber close to the process chamber to isolate the pretreatment chamber from the process chamber; and is also used to connect the pretreatment chamber and the process chamber when the gate valve is pulled out; A sample cart is located on the transmission roller and moves along the transmission roller between the pretreatment chamber and the process chamber; the sample cart has a mounting cavity, the mounting cavity has two parallel and opposite mounting surfaces, and the mounting surfaces are used to mount a substrate; A plurality of hot wires arranged at equal intervals and located in the same plane are arranged in the process chamber, wherein the hot wires are arranged in the mounting chamber when the sample vehicle moves into the process chamber, and the substrate is located on one side or both sides of the hot wires; The gate valve comprises: The housing is located above the injection chamber and vertically connected to the top wall of the injection chamber; Two parallel connecting plates, one portion of which extends into the front and rear opposite side walls of the pre-treatment chamber and is connected to the pre-treatment chamber, and the other portion of which extends into the shell and is connected to the side walls of the shell; Two cold water plates are vertically arranged between the two connecting plates and are slidably connected to the connecting plates. The cold water plates have cold water cavities therein, and coolant is introduced into the cold water cavities. a cylinder having a cylinder rod hingedly connected to the inner walls of the two cold water plates, the cylinder being used to push the two cold water plates into the pretreatment chamber so that the cold water plates abut against the side of the process chamber close to the pretreatment chamber to achieve sealing; the cylinder is also used to pull the two cold water plates out of the housing to achieve communication between the pretreatment chamber and the process chamber; The side walls of the sample injection chamber and the process chamber both have a gap interlayer, and the vertical dual-chamber hot wire CVD system further includes: The water cooling system includes a cooling water tank and a water pipe, wherein the water pipe is connected to the cooling water tank, the inlet of the water pipe is connected to the gap interlayer at the bottom of the sample inlet chamber and the process chamber, and the water cooling plate; the outlet of the water pipe is connected to the gap interlayer at the top of the sample inlet chamber and the process chamber, and the water cooling plate.

2. The vertical dual-chamber hot-wire CVD system according to claim 1, characterized in that: The gate valve further comprises a plurality of slide rods, one end of each slide rod being connected to the side wall of the cold water plate; Two rows of parallel chutes are provided on one side of the connecting plate close to the cold water plate, each row of chutes includes a first groove and a second groove arranged at intervals, and the first groove and the second groove are arranged in a straight line; Among them, the other end of one part of the sliding rod is located in the first groove and slides along the first groove, and the other end of the other part of the sliding rod is located in the second groove and slides along the second groove, thereby realizing the sliding connection between the cold water plate and the connecting plate.

3. The vertical dual-chamber hot-wire CVD system according to claim 2, characterized in that: The second groove is located in the pretreatment chamber; An end of the first groove close to the second groove and an end of the second groove away from the first groove both have an outwardly bent extension groove.

4. The vertical dual-chamber hot-wire CVD system according to any one of claims 1 to 3, characterized in that: The vertical dual-chamber hot wire CVD system also includes: A bracket is provided at the bottom of the sample injection chamber and the process chamber and is connected to each other, and the bracket is used to support the sample injection chamber and the process chamber; Two protrusions are respectively provided at the left and right ends of the outer bottom wall of the sample vehicle and are connected to the sample vehicle; Two limiting components are respectively arranged below the sample injection chamber and the process chamber, and are connected to the bracket; Wherein, the limiting component is used to control the transmission roller to stop rotating when it abuts against one of the protrusions.

5. The vertical dual-chamber hot-wire CVD system according to claim 4, characterized in that: The limiting component includes: The telescopic rod includes a connecting rod, a sleeve, a spring, and a roller. The sleeve is sleeved outside the connecting rod, the spring is sleeved outside the connecting rod and located inside the sleeve, and the spring abuts against the sleeve and the connecting rod. The roller is provided at one end of the connecting rod close to the sample vehicle. a first photoelectric switch connected to the bracket, wherein the first photoelectric switch has a first emitter; a second photoelectric switch connected to the bracket and located on a side of the first photoelectric switch away from the transmission roller, the second photoelectric switch having a second emitter; The side of the protrusion close to the first photoelectric switch has a deceleration slope and a stop plane connected to the deceleration slope; When the roller slides onto the deceleration slope, the end of the connecting rod away from the roller blocks the first launcher and controls the transmission roller to decelerate; when the roller slides onto the stop plane, the end of the connecting rod away from the roller blocks the second launcher and controls the transmission roller to stop rotating.

6. The vertical dual-chamber hot-wire CVD system according to any one of claims 1 to 3, characterized in that: The sample vehicle includes: a bottom plate, located on the transmission roller; Two parallel and spaced-apart side plates are respectively arranged at both ends of the bottom plate and vertically connected to a side of the bottom plate away from the transmission roller; Two parallel and spaced sample plates are disposed between the two side plates, the plate surfaces of the sample plates are parallel to the plate surfaces of the side plates, the sample plates are connected to the side plates, and the space between the two sample plates serves as the mounting cavity; The plate surface of the sample plate away from the side plate serves as the mounting surface for mounting a substrate.

7. The vertical dual-chamber hot-wire CVD system according to any one of claims 1 to 3, characterized in that: The vertical dual-chamber hot wire CVD system also includes: Two fixed plates are arranged in parallel, the hot wire is arranged between the two fixed plates, and the two ends of the hot wire are respectively connected to the two fixed plates; Two first conductive posts are respectively connected to two ends of one of the fixed plates; Two second conductive pillars are respectively connected to two ends of another fixed plate; The first conductive column and the second conductive column are connected to opposite-polarity electrodes.

8. A method for using the vertical dual-chamber hot-wire CVD system according to any one of claims 1 to 7, characterized in that: The following steps are involved: Open the injection chamber, fix the substrate in the installation chamber of the sample cart, close the injection chamber, evacuate the pretreatment chamber to a vacuum degree of 0.1 Pa ~ 0.9 Pa, and heat the pretreatment chamber to 150 ° C ~ 250 ° C; Open the gate valve, control the sample cart to move from the pretreatment chamber to the process chamber, close the gate valve, energize the hot wire to heat the substrate to 800℃~1200℃, and introduce mixed gas into the air inlet pipe to start coating; After the coating is completed, the process chamber is cooled to 150℃~250℃, the gate valve is opened, the sample cart is moved into the pretreatment chamber, the gate valve is closed, and the substrate is taken out after the pretreatment chamber cools to room temperature.

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