A beam-under-treatment device for electron beam irradiation wastewater and a sewage treatment process

By adopting open channel structure and catalyst synergistic action in electron beam sewage treatment, the problems of real-time monitoring and uneven flow rate in closed environments are solved, and efficient and uniform sewage treatment is achieved, reducing energy consumption and material costs.

CN115947407BActive Publication Date: 2025-01-07XIAMEN UNIV +1
View PDF 4 Cites 0 Cited by

Patent Information

Application Number
CN202211724718.6
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-12-30
Publication Date
2025-01-07
Estimated Expiration
2042-12-30

AI Technical Summary

Technical Problem

The existing electron beam sewage treatment methods are difficult to monitor the treatment effect in a closed environment in real time, and the uneven fluid distribution and flow rate lead to different purification effects, and high-energy radiation sources are not conducive to energy conservation and emission reduction.

Method used

Adopt open channel structure and electron beam radiation device, with water supply pipes and diverting grooves arranged through the top of the channel. The electron beam radiation device is located above the open channel, and catalysts and grooves are arranged in the open channel, which use gravity potential energy to convert into fluid kinetic energy, combining electron beams and The catalyst works synergistically for wastewater treatment.

Benefits of technology

Real-time monitoring of sewage treatment effects is achieved, treatment efficiency and uniformity is improved, energy consumption of electron beam accelerator is reduced, catalysts can be replaced quickly, sewage treatment effect is ensured, and energy consumption and material costs are reduced.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN115947407B_ABST
    Figure CN115947407B_ABST
Patent Text Reader

Abstract

The invention discloses an electron beam device for electron beam irradiation of wastewater and a sewage treatment process, comprising an open channel, a water delivery pipeline and an electron beam irradiation device, wherein the open channel has a channel top and a channel bottom, the channel top is higher than the channel bottom so that the open channel forms a certain inclination, the water delivery pipeline is arranged at the channel top, and the water outlet of the water delivery pipeline is connected to the channel top, the electron beam irradiation device is arranged above the open channel, and the electron beam irradiation device irradiates in the open channel; the invention adopts the open channel as a sewage treatment reaction device, which is separated from the closed space of a traditional electron beam irradiation chamber, so that the electron beam irradiation device is easy to install, which is conducive to observing the treatment effect so as to make adjustments in time; the lateral sewage flow rate of the open channel is consistent, which is convenient for the electron beam and the catalyst to react evenly.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The invention relates to the field of sewage treatment, in particular to an electron beam device for irradiating wastewater and a sewage treatment process. Background Art

[0002] As the demand for human production activities becomes increasingly rich, the pollutants in discharged sewage become more complex. Traditional sewage treatment methods have problems such as incomplete purification and low treatment efficiency. Electron beam sewage treatment methods have emerged as a new method of sewage treatment. Electron beam irradiation technology uses accelerated electron beams to bombard or irradiate the treated object, causing physical, chemical and biological reactions that are difficult to induce by conventional methods, thereby achieving the purpose of optimizing product quality, improving product performance, purifying substances, etc. Sewage treatment uses accelerated electron beams to irradiate sewage, causing pollutants in the water to decompose or degrade, harmful microorganisms to denature, etc., to achieve the purpose of disinfecting and purifying wastewater. Compared with traditional wastewater treatment methods, the advantage of electron beam irradiation technology is that it can treat difficult-to-degrade organic wastewater, antibiotic wastewater, and wastewater containing pathogenic bacteria.

[0003] Existing electron beam treatment of sewage is often carried out in a closed environment. For example, Chinese patent document CN114620798A discloses an electron beam water treatment system, which uses electron beams to contact air, so that O2 and H2O molecules in the air gain energy, generate free radical active factors, and then pass the air into the wastewater pool to purify the sewage; Chinese patent document CN 114763271 A discloses a sewage treatment device and system, which purifies the sewage in the water pipeline by setting an irradiation source on the water pipeline. In a closed environment, it is difficult to timely feedback the treatment of sewage. In the case of being unable to know the effect of sewage treatment, it is usually necessary to set a higher radiation source energy for a thorough reaction, which is not conducive to energy conservation and emission reduction. On the other hand, due to the uneven distribution and flow rate of the fluid in the pipeline, the purification effect achieved by setting a irradiation source on the pipeline to directly irradiate the sewage is different. Summary of the invention

[0004] In order to solve the above problems, the present invention provides a beam-under-treatment device for electron beam irradiation of wastewater and a sewage treatment method.

[0005] To achieve the above-mentioned purpose, the technical solution of the present invention is: a beam-under-treatment device for electron beam irradiation of wastewater, comprising an open channel, a water supply pipeline and an electron beam irradiation device, wherein the open channel has a channel top and a channel bottom, the channel top is higher than the channel bottom so that the open channel forms a certain inclination, the water supply pipeline is arranged at the channel top, and the water outlet of the water supply pipeline is connected to the channel top, the electron beam irradiation device is arranged above the open channel, and the electron beam irradiation device irradiates in the open channel.

[0006] The setting of the open channel is mainly based on structural considerations. The open structure of the open channel saves material costs and maintenance costs compared to the dark channel, and is more convenient to operate. Since the open channel has a certain inclination, after the sewage is introduced into the open channel through the water pipeline, its gravitational potential energy is converted into fluid kinetic energy, causing the sewage to flow slowly down the open channel and oxidize and decompose under the irradiation of the electron beam to achieve a purification effect. The reaction rate can be adjusted by changing the electron beam irradiation device, thereby monitoring the sewage treatment in real time.

[0007] There is no specific limitation on the location and installation method of the electron beam irradiation device, as long as the electron beam can be irradiated into the open channel.

[0008] As a further improvement, a diversion trough is provided at the top of the channel, the inlet of the diversion trough is connected to the outlet of the water delivery pipe, and the width of the diversion trough gradually increases from the inlet to the bottom of the channel. Since the diameter of the water delivery pipe is different from the width of the open channel, a diversion trough is provided between the outlet of the water delivery pipe and the top of the channel, so that the sewage entering the open channel from the water delivery pipe is more evenly dispersed in the channel, thereby improving the efficiency of sewage treatment.

[0009] Furthermore, the diversion trough is provided with a plurality of strip-shaped protrusions extending along the water flow direction. The protrusions are used to divert and guide the sewage at the top of the channel. Of course, the structure of the diversion trough is not limited to this, and other structures that can achieve equivalent effects can be used as substitutes.

[0010] As a further improvement, a catalyst is arranged in the open channel, and the catalyst is a catalyst having a synergistic effect with the electron beam.

[0011] Furthermore, at least one groove is provided in the open channel, and at least one flat plate is placed in the groove, and the thickness of the flat plate is equal to the depth of the groove, so that when the flat plate is placed in the groove, the upper surface of the flat plate is flush with the other parts of the open channel. The catalyst is provided on the upper surface of the flat plate, and the thickness of the catalyst is equal to the thickness of the water flow in the open channel. It should be noted that the width of the groove here should be greater than or equal to the width of the fluid in the channel, so that the fluid can fully contact the catalyst and the catalyst can play a role. The groove and the flat plate form a quick-release plate design. When the catalyst on the flat plate fails due to long-term use or the catalyst layer becomes thin, the flat plate can be quickly replaced to ensure the sewage treatment effect. The flat plate in the groove can be a whole piece, multiple pieces in a row, or multiple rows of multiple pieces.

[0012] In order to ensure that the sewage in the open channel fully reacts, the area of ​​the catalyst should be adjusted according to the inclination of the open channel. When the total area of ​​the catalyst is determined, one or more sections of the catalyst can be arranged to ensure the total reaction time of the sewage and the catalyst. In this scheme, since the catalyst is arranged on the upper surface of the flat plate, the area of ​​the catalyst is reflected as the area of ​​the upper surface of the flat plate. It should be noted that since the flow rate of sewage in the open channel gradually increases from top to bottom, when the reaction time of the catalyst and sewage is the same, the length of the flat plate at the lower position should be greater than the length of the flat plate at the higher position, so as to ensure that the catalyst can fully play its role.

[0013] Of course, the method of arranging the catalyst in the open channel is not limited to this, for example, the catalyst is directly coated in the open channel. The catalyst arranged in the open channel can be one or more types, and the corresponding catalyst is selected according to the type of sewage.

[0014] Furthermore, the catalyst is fixed on the upper surface of the plate by sintering. Of course, the method of fixing the catalyst on the upper surface of the plate is not limited to this.

[0015] Furthermore, the electron beam irradiation device irradiates at the catalyst arrangement location. The electron beam cooperates with the catalyst to treat the sewage, so that the pollutants in the water are decomposed or degraded, and harmful microorganisms are denatured, so as to achieve the purpose of disinfecting and purifying the wastewater.

[0016] Further improvement, the inclination of the open channel is 15-30°. The inclination of the open channel refers to the angle formed by the surface of the open channel and the horizontal plane. When the inclination is less than 15°, the flow rate of sewage in the open channel is relatively slow, and the kinetic energy converted from gravitational potential energy is not enough to make the sewage flow from the top of the channel to the bottom of the channel. When the inclination is greater than 30°, the flow rate of sewage in the open channel is too fast, and there may be a problem of insufficient reaction time leading to incomplete sewage purification.

[0017] As a further improvement, the width of the open channel gradually decreases from the top of the channel to the bottom of the channel, and the tapering angle is -1° to -5°. The tapering angle here refers to the angle at which the bottom of the channel deviates from the top of the channel. The purpose of setting the tapering structure is to make the liquid flow layer in the open channel maintain a uniform thickness and always submerge the catalyst, so as to make full use of the catalyst surface sites and ensure the sewage treatment effect.

[0018] The present invention also provides a sewage treatment process, including an electron beam sewage treatment process, wherein the electron beam sewage treatment process adopts the above-mentioned electron beam sewage treatment device for treatment, specifically introducing sewage into an open channel through a water pipeline, and the sewage is purified in the open channel and then discharged from the bottom of the channel.

[0019] In addition, when sewage is treated by this device, the sewage can be directly precipitated on the open channel. Since the open channel has a certain inclination, a suitable sewage flow rate can be obtained, so that physical pollutants are settled in a fixed descending section.

[0020] The technical solution provided by the present invention has the following beneficial effects:

[0021] 1. This scheme adopts open channel as sewage treatment reaction device, which is away from the closed space of traditional electron beam irradiation room, making the electron beam irradiation device easy to install and conducive to observing the treatment effect so as to make timely adjustments; the horizontal sewage flow rate of the open channel is consistent, which facilitates the uniform reaction of the electron beam and the catalyst.

[0022] 2. Unlike traditional electron beam devices, there is no need for additional fluid kinetic energy to accelerate the reaction and discharge. Instead, the gravitational potential energy of the sewage is converted into kinetic energy through an open channel, which enhances the fluidity of the treatment process, is conducive to continuous operation, energy reduction and efficiency improvement.

[0023] 3. Different from the previous electron beam treatment of sewage which simply uses high-energy electron beams, catalysts are placed in the open channel. The catalysts cooperate with the electron beam reaction to reduce the energy consumption of the electron accelerator and the electron beam density.

[0024] 4. The grooves and flat plates set in the open channel form a quick-release plate structure, so that the catalyst in the open channel can be replaced in time to ensure the sewage treatment effect and facilitate maintenance. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 It is a schematic diagram of the structure of an embodiment of the present invention;

[0026] Figure 2 It is a schematic diagram of an exploded view of an embodiment of the present invention. DETAILED DESCRIPTION

[0027] The present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0028] In the description of the present invention, it should be noted that the terms "up", "down", "left", "right", "top", "bottom", "side", "center", "vertical", "horizontal", "inside" and "outside" etc. indicating directions or positional relationships are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation on the present invention.

[0029] Figure 1As shown, a beam-under-irradiation device for electron beam irradiation of wastewater includes an open channel 1, a water pipe 2 and an electron beam irradiation device (not shown). The open channel 1 is an open structure, including a channel top and a channel bottom, and the channel top is higher than the channel bottom to form a certain inclination. The water pipe 2 is arranged at the channel top, and the water outlet of the water pipe 2 is connected to the channel top. The electron beam irradiation device is arranged above the open channel 1, and the electron beam irradiation device irradiates in the open channel 1.

[0030] In this embodiment, the width of the open channel 1 gradually decreases from the channel top to the channel bottom, the tapering angle is -1° to -5°, and the inclination of the open channel is 15-30°.

[0031] In this embodiment, a diversion trough 11 is provided on the top of the channel, the inlet of the diversion trough 11 is connected to the outlet of the water delivery pipe 2, and the width of the diversion trough 11 gradually increases from the inlet to the channel bottom.

[0032] Specifically, a plurality of strip-shaped protrusions 12 extending along the water flow direction are provided in the diversion groove 11 .

[0033] In this embodiment, a catalyst 3 is arranged in the open channel 1, and the electron beam irradiation device irradiates where the catalyst 3 is arranged.

[0034] Specifically, Figure 2 As shown, a groove 13 is provided in the open channel 1, and a flat plate 14 is placed in the groove 13. The thickness of the flat plate 14 is equal to the depth of the groove 13. The catalyst 3 is fixed to the upper surface of the flat plate 14 by sintering, and the thickness of the catalyst 3 is equal to the thickness of the water flow in the open channel 1.

[0035] A sewage treatment process, including an electron beam sewage treatment process, wherein the electron beam sewage treatment process adopts the above-mentioned electron beam sewage treatment device for treatment, specifically, sewage is introduced into an open channel 1 through a water pipe 2, and the sewage flows through a catalyst 3 and an electron beam irradiation area in the open channel 1. Under the action of the electron beam flow, the sewage is irradiated and decomposed to generate strong oxidizing substances (such as OH, H2O2, 02 - These oxidizing substances interact with pollutants and bacteria in the water to achieve the purpose of oxidation decomposition and disinfection, and the sewage is discharged from the bottom of the channel after purification. In this process, since the open channel 1 is designed to be open, the monitoring personnel can observe the treatment of sewage in the open channel 1 at any time, so as to adjust the electron beam irradiation density and the area of ​​the catalyst 3 in the open channel 1 to achieve the best sewage treatment effect.

[0036] Although the present invention has been specifically shown and described in conjunction with the preferred embodiments, it should be understood by those skilled in the art that various changes may be made to the present invention in form and details without departing from the spirit and scope of the present invention as defined by the appended claims, all of which are within the scope of protection of the present invention.

Claims

1. A beam-under-irradiation device for electron beam irradiation of wastewater, characterized in that: It comprises an open channel, a water pipeline and an electron beam irradiation device, wherein the open channel has a channel top and a channel bottom, the channel top is higher than the channel bottom so that the open channel forms a certain inclination, the water pipeline is arranged at the channel top, the water outlet of the water pipeline is connected to the channel top, and the electron beam irradiation device is arranged above the open channel, and the electron beam irradiation device irradiates in the open channel; A catalyst is arranged in the open channel, and the catalyst is a catalyst having a synergistic effect with the electron beam; At least one groove is provided in the open channel, at least one flat plate is placed in the groove, the catalyst is provided on the upper surface of the flat plate, the groove and the flat plate provided in the open channel form a quick-release plate structure, so that the catalyst in the open channel can be replaced in time to ensure the sewage treatment effect.

2. The electron beam irradiation device for wastewater according to claim 1, characterized in that: A diversion trough is provided on the top of the channel, the inlet of the diversion trough is connected to the water outlet of the water delivery pipeline, and the width of the diversion trough gradually increases from the inlet to the channel bottom.

3. The electron beam irradiation device for wastewater according to claim 2, characterized in that: A plurality of strip-shaped protrusions extending along the water flow direction are arranged in the diversion groove.

4. The electron beam irradiation device for wastewater according to claim 1, characterized in that: The thickness of the plate is equal to the depth of the groove, and the thickness of the catalyst is equal to the thickness of the water flow in the open channel.

5. The electron beam irradiation device for wastewater according to claim 4, characterized in that: The catalyst is fixed on the upper surface of the flat plate by sintering.

6. The electron beam irradiation device for wastewater according to claim 1, characterized in that: The electron beam irradiation device irradiates at the catalyst arrangement.

7. The electron beam irradiation device for wastewater according to claim 1, characterized in that: The inclination of the open channel is 15-30°.

8. The electron beam irradiation device for wastewater according to any one of claims 1 to 7, characterized in that: The width of the open channel gradually decreases from the channel top to the channel bottom, and the tapering angle is -1° to -5°.

9. A sewage treatment process, characterized in that: The invention comprises an electron beam wastewater treatment process, wherein the electron beam wastewater treatment process adopts the under-beam device for electron beam irradiation wastewater as described in any one of claims 1 to 8 for treatment, specifically, the wastewater is introduced into an open channel through a water pipeline, and the wastewater is purified in the open channel and then discharged from the bottom of the channel.

Citation Information

Patent Citations

  • Electron beam water treatment system

    CN114620798A

  • Sewage treatment device and system

    CN114763271A

  • Method and device for treating refractory industrial wastewater through electron beam irradiation

    CN113480060A

  • Catalyst loading device for degrading macromolecular organic compound through electron beam irradiation

    CN114345386A