Feed and fill system and method of cleaning the same, computer readable storage medium

Abstract

A feed and fill system and a cleaning method thereof, and a computer readable storage medium. The feed and fill system includes a pre-treatment device and a fill device, and a flow regulating valve connected between the pre-treatment device and the fill device. The cleaning method of the feed and fill system includes cleaning the flow regulating valve, and cleaning the flow regulating valve includes introducing a cleaning gas to the feed and fill system, the flow regulating valve being located in a flow path of the cleaning gas, and repeatedly opening and closing the flow regulating valve to clean the flow regulating valve with the cleaning gas.

Description

Technical Field

[0001] At least one embodiment of this disclosure relates to a cleaning method for a feeding and filling system, a feeding and filling system, and a computer-readable storage medium. Background Technology

[0002] Currently, trade between countries and regions is very frequent, and various products typically require packaging for storage, transportation, and sale. For example, food products such as milk, beverages, vegetable purees, and broth need to be sealed in various containers, including boxes and bags. The packaging process often utilizes feeding and filling systems to fill these containers. When the packaged product is food, it is essential to ensure the cleanliness and hygiene of all components within the feeding and filling system to meet national hygiene standards. Summary of the Invention

[0003] According to embodiments of this disclosure, a cleaning method for a feeding and filling system is provided. The feeding and filling system includes: a pretreatment device and a filling device, and a flow regulating valve connected between the pretreatment device and the filling device. The cleaning method for the feeding and filling system includes: cleaning the flow regulating valve; and cleaning the flow regulating valve includes: introducing a cleaning gas into the feeding and filling system, the flow regulating valve being located in the flow path of the cleaning gas; and repeatedly opening and closing the flow regulating valve to clean the flow regulating valve using the cleaning gas.

[0004] For example, the cleaning gas is high-temperature water vapor with a temperature greater than 100 degrees Celsius; and the cleaning method includes: introducing high-temperature water vapor into the feeding and filling system to form a vapor barrier, the vapor barrier being located in the downstream space of the flow control valve and passing through the flow control valve in a manner intersecting the opening and closing direction of the flow control valve, the vapor barrier isolating the pretreatment equipment and the filling equipment from each other; and repeatedly opening and closing the flow control valve to clean the flow control valve using the high-temperature water vapor.

[0005] For example, the temperature of the high-temperature water vapor is greater than or equal to 130 degrees Celsius.

[0006] For example, the feeding and filling system includes a first pipeline, which is connected to the pretreatment equipment at a first location. The flow regulating valve is located at the first location, and opening the flow regulating valve connects the pretreatment equipment to the first pipeline. The formation of the vapor barrier includes introducing the high-temperature steam into the first pipeline to form the vapor barrier in the first pipeline.

[0007] For example, the flow regulating valve is switched in a first direction; the first pipeline extends in a second direction such that the vapor barrier is arranged in the second direction, which is substantially perpendicular to the first direction; and relative to the ground, the second direction is horizontal and the first direction is vertical.

[0008] For example, the feeding and filling system includes: a gas supply device for providing the high-temperature steam; the first pipeline has a first end and a second end, the first end of the first pipeline is connected to the filling device, the second end of the first pipeline is connected to the gas supply device, and the first position of the first pipeline is located between the first end and the second end of the first pipeline; the feeding and filling system further includes a first valve and a second valve, the first valve is disposed at the first end of the first pipeline, and when the first valve is opened, the first pipeline is connected to the filling device; the second valve is disposed at the second end of the first pipeline, and when the second valve is opened, the first pipeline is connected to the gas supply device; and the formation of the steam barrier in the first pipeline includes: closing the flow regulating valve and the first valve and opening the second valve to form the steam barrier in the first pipeline.

[0009] For example, the feeding and filling system further includes: a third valve connected to the first pipeline, opening the third valve to connect the first pipeline to the outside; and the formation of the vapor barrier in the first pipeline includes: closing the flow regulating valve, the first valve and the third valve and opening the second valve to form the vapor barrier in the first pipeline, after which the third valve is opened and closed at least once at a specific time interval.

[0010] For example, the feeding and filling system also includes a temperature sensor for measuring the temperature of the high-temperature steam in the first pipeline; and determines the specific time period based on the temperature of the high-temperature steam measured by the temperature sensor, wherein the third valve is opened and closed at least once when the temperature of the high-temperature steam measured by the temperature sensor is lower than a preset value.

[0011] For example, the third valve is connected to the first pipeline at a second location on the first pipeline; and in the second direction, the second location is located between the first end of the first pipeline and the first location.

[0012] For example, the feeding and filling system further includes a fourth valve and a fifth valve, the fifth valve being connected between the gas supply equipment and the fourth valve, the fourth valve being connected between the first pipeline and the third valve, and the fourth valve also being connected between the third valve and the fifth valve; the third valve, the fourth valve, and the fifth valve are configured such that the fourth valve is open and the fifth valve is closed, allowing high-temperature steam in the first pipeline to reach the third valve through the fourth valve; the third valve, the fourth valve, and the fifth valve are further configured such that the fifth valve is open and the fourth valve is closed, allowing high-temperature steam supplied by the gas supply equipment to reach the third valve through the fifth valve to form a first auxiliary steam barrier, the first auxiliary steam barrier being located in the downstream space of the fourth valve and passing through the fourth valve in a manner intersecting the opening and closing direction of the fourth valve; and forming the steam barrier in the first pipeline further includes: opening the fourth valve and closing the fifth valve.

[0013] For example, the feeding and filling system further includes a sixth valve and a seventh valve, the sixth valve being connected between the gas supply device and the second valve; the second valve, the sixth valve, and the seventh valve are configured such that the second valve is open, the sixth valve is open, and the seventh valve is closed, allowing the high-temperature steam supplied by the gas supply device to reach the second valve through the sixth valve and enter the first pipeline through the second valve; the second valve, the sixth valve, and the seventh valve are also configured such that the sixth valve is open, the second valve is closed, allowing the high-temperature steam supplied by the gas supply device to form a second auxiliary steam barrier, the second auxiliary steam barrier being located in the post-valve space of the second valve and passing through the second valve in a manner intersecting the opening and closing direction of the second valve, the seventh valve being used to control the second auxiliary steam barrier to communicate with the outside; and forming the steam barrier in the first pipeline further includes closing the seventh valve.

[0014] For example, after the vapor barrier is formed, the gas pressure in the first pipeline is less than or equal to 100 mbar.

[0015] For example, the cleaning method according to an embodiment of this disclosure further includes: stopping the supply of high-temperature water vapor to the feeding and filling system after a first time period of continuous supply of the high-temperature water vapor to the feeding and filling system, wherein the repeated switching of the flow regulating valve is performed before or after stopping the supply of the high-temperature water vapor to the feeding and filling system.

[0016] For example, the first time period is less than or equal to 15 minutes.

[0017] For example, the pretreatment equipment is used to pretreat the raw material to be filled, and the filling equipment is used to fill the raw material into a container; the method further includes: before introducing the cleaning gas, stopping the feeding and filling system, and venting the raw material located in the pretreatment equipment, between the pretreatment equipment and the filling equipment, and in the filling equipment.

[0018] For example, the cleaning method according to embodiments of this disclosure further includes: cleaning the pretreatment equipment using a liquid cleaning flow formed by a liquid cleaning medium; the cleaning of the flow regulating valve includes: repeatedly opening and closing the flow regulating valve to clean the flow regulating valve using the liquid cleaning flow.

[0019] For example, the filling equipment is used to fill raw materials into containers, the filling equipment including a raw material tank for holding the raw materials; the method further includes: adding at least one gaseous medium to a liquid cleaning medium to form a gas-liquid mixed cleaning flow, and using the gas-liquid mixed cleaning flow to clean the raw material tank.

[0020] For example, the raw material tank has a preset liquid level line; cleaning the raw material tank using the gas-liquid mixed cleaning flow includes: introducing the liquid cleaning medium into the raw material tank so that the liquid level of the liquid cleaning medium reaches or is close to the liquid level line, and then adding the gas medium to the liquid cleaning medium.

[0021] For example, the cleaning method according to embodiments of this disclosure further includes: cleaning the pretreatment equipment and cleaning the filling equipment, wherein cleaning the flow regulating valve is performed simultaneously with cleaning the pretreatment equipment and cleaning the filling equipment.

[0022] For example, the same cleaning medium is used to clean the pretreatment equipment, the pretreatment equipment, and the filling equipment.

[0023] According to embodiments of this disclosure, a feeding and filling system is also provided, comprising: a processor; a memory including one or more computer program modules; wherein the one or more computer program modules are stored in the memory and configured to be executed by the processor, the one or more computer program modules including instructions for implementing the cleaning method as described above.

[0024] According to embodiments of this disclosure, a computer-readable storage medium is also provided for storing non-transitory computer-readable instructions that, when executed by a computer, enable the cleaning method described above. Attached Figure Description

[0025] To more clearly illustrate the technical solutions of the embodiments of this disclosure, the accompanying drawings of the embodiments will be briefly described below. Obviously, the drawings described below only relate to some embodiments of this disclosure and are not intended to limit this disclosure.

[0026] Figure 1 This is a schematic diagram of the layout of the feeding and filling system according to an embodiment of the present disclosure, with clean gas introduced into the first pipeline. Figure 1 ;

[0027] Figure 2 This is a schematic diagram of the layout of the feeding and filling system according to an embodiment of the present disclosure, with clean gas introduced into the first pipeline. Figure 2 ;

[0028] Figure 3 This is a schematic diagram of the layout of the feeding and filling system according to an embodiment of the present disclosure in the filling operation state;

[0029] Figure 4 This is a schematic diagram of a raw material tank for holding raw materials in a filling device of a feeding and filling system according to an embodiment of the present disclosure;

[0030] Figure 5 This is a schematic diagram of the framework of a feeding and filling system according to an embodiment of the present disclosure. Figure 1 ;

[0031] Figure 6 This is a schematic diagram of the framework of a feeding and filling system according to an embodiment of the present disclosure. Figure 2 ;

[0032] Figure 7 This is a schematic diagram of a computer-readable storage medium according to an embodiment of the present disclosure. Detailed Implementation

[0033] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. Based on the described embodiments of this disclosure, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this disclosure.

[0034] Unless otherwise defined, the technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure pertains. The terms “first,” “second,” and similar terms used in this patent application specification and claims do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as “comprising” or “including” mean that the element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects. Terms such as “inner,” “outer,” “upper,” and “lower” are used only to indicate relative positional relationships, which may change accordingly when the absolute position of the described object changes.

[0035] The accompanying drawings in this disclosure are not drawn to scale, and the specific dimensions and quantity of each structure can be determined according to actual needs. The drawings described in this disclosure are only schematic diagrams.

[0036] The feeding and filling system includes pre-processing equipment and filling equipment, as well as a flow control valve connecting the two. The flow control valve acts as the connection point between the pre-processing and filling equipment; when the valve is open, the two systems are connected, allowing raw materials from the pre-processing equipment to enter the filling equipment, and the flow rate of raw materials entering the filling equipment can be regulated by adjusting the valve's opening degree; when the valve is closed, the two systems are disconnected, preventing raw materials from entering the filling equipment. In food filling systems, to meet national hygiene standards, it is essential to ensure the cleanliness and hygiene of all components, including the flow control valve. However, cleaning the flow control valve has always been a challenge. On one hand, one cleaning mode exists where the flow control valve is closed, and the pre-processing and filling equipment are cleaned separately. In this mode, the flow control valve is a blind spot, essentially impossible to clean. On the other hand, raw materials from the pretreatment equipment must pass through the flow control valve before entering the filling equipment. Residue and accumulation of raw materials can easily occur at the valve seat and / or valve head of the flow control valve, which greatly increases the difficulty of cleaning the flow control valve.

[0037] According to embodiments of this disclosure, a method for cleaning a feeding and filling system is provided. Figure 1 This is a schematic diagram of the layout of the feeding and filling system according to an embodiment of the present disclosure, with clean gas introduced into the first pipeline. Figure 1 See also Figure 1A feeding and filling system according to an embodiment of the present disclosure includes a pretreatment device 100 and a filling device 200, and a flow control valve (FDV) connected between the pretreatment device 100 and the filling device 200. A cleaning method for the feeding and filling system according to an embodiment of the present disclosure includes cleaning the flow control valve (FDV). Cleaning the flow control valve (FDV) includes: introducing a cleaning gas into the feeding and filling system, with the flow control valve (FDV) located in the flow path of the cleaning gas; and repeatedly opening and closing the flow control valve (FDV) to clean it using the cleaning gas. According to an embodiment of the present disclosure, the cleaning method for the feeding and filling system includes a dedicated step of cleaning the flow control valve (FDV), avoiding the problem of the flow control valve (FDV) becoming a cleaning blind spot. According to embodiments of this disclosure, clean gas is introduced into the feeding and filling system, and the flow path of the clean gas passes through the flow control valve FDV. When the flow control valve FDV is opened, the clean gas rushes into the flow control valve FDV and flushes it, which can wash away the raw materials remaining and accumulated at the valve seat and / or valve head of the flow control valve. By repeatedly opening and closing the flow control valve FDV, the clean gas repeatedly rushes into the flow control valve FDV and repeatedly flushes it, which can wash away all the raw materials remaining and accumulated at the valve seat and / or valve head of the flow control valve, thus achieving excellent cleaning effect on the flow control valve FDV.

[0038] For example, according to embodiments of this disclosure, the pretreatment equipment 100 is used to pretreat the raw materials to be filled in order to prepare raw materials that meet the filling requirements. It can be a single unit or a combination of multiple units. For example, see... Figure 1 The pretreatment equipment 100 includes an ultra-high temperature (UHT) treatment device 110 for sterilizing the raw materials at high temperatures. See, for example... Figure 1 The pretreatment equipment 100 also includes a first feeding device 131 for providing a first raw material, a second feeding device 132 for providing a second raw material, and a mixing device 120 for mixing the first and second raw materials. The mixed raw material obtained by the mixing device 120 is subjected to high-temperature sterilization treatment by the high-temperature treatment device 110 to become a raw material that meets the filling requirements. For example, the first raw material as described above is a first liquid raw material, and the second raw material as described above is a second liquid raw material, the viscosity of the second liquid raw material is higher than the viscosity of the first liquid raw material. For example, the second liquid raw material contains particulate matter, such as fruit granules, oat granules, chewy cassava balls, etc.

[0039] For example, according to an embodiment of this disclosure, the filling equipment 200 is used to fill raw materials into containers. For example, the filling equipment includes a raw material tank 210 for holding the raw materials (see...). Figure 4The raw material drum 210 includes an inlet 213 and an outlet 212. The raw material enters the raw material drum 210 through the inlet 213 and leaves the raw material drum 210 through the outlet 212 to enter the container. For example, there can be multiple outlets 212 to simultaneously fill the raw material into multiple containers.

[0040] For example, according to an embodiment of this disclosure, the flow control valve FDV is a communication port between the pretreatment device 100 and the filling device 200; when the flow control valve FDV is open, the pretreatment device 100 and the filling device 200 are connected, and the raw material provided by the pretreatment device 100 can enter the filling device 200, and the flow rate of the raw material entering the filling device 200 can be adjusted by adjusting the opening degree of the flow control valve FDV; when the flow control valve FDV is closed, the pretreatment device 100 and the filling device 200 are not connected, and the raw material provided by the pretreatment device 100 cannot enter the filling device 200. For example, the flow control valve FDV is a single-seat valve.

[0041] For example, according to embodiments of this disclosure, "the flow control valve FDV is located in the flow path of the clean gas" means that the clean gas flows through the location of the flow control valve FDV and directly contacts at least a portion of the flow control valve FDV; therefore, once the flow control valve FDV opens, the clean gas will directly flow into the flow control valve FDV. For example, the flow control valve FDV includes a valve seat and a movable valve head. The valve seat has a valve port, and the opening and closing direction of the flow control valve FDV is the same as the movement direction of the movable valve head. When the valve head moves in the positive direction of the opening and closing direction, the valve head moves away from the valve seat, the valve port of the valve seat is opened, and the flow control valve FDV opens; when the valve head moves in the negative direction of the opening and closing direction, the valve head inserts into the valve seat, the valve port of the valve seat is closed, and the flow control valve FDV closes. For example, the clean gas flows through the flow control valve in a manner intersecting with the opening and closing direction of the flow control valve FDV; further, for example, the clean gas flows through the flow control valve in a manner perpendicular to the opening and closing direction of the flow control valve FDV. For example, the clean gas flows through the flow control valve FDV in a manner parallel to the opening and closing direction of the flow control valve FDV. Specifically... Figure 1 As an example, the flow path of the clean gas is indicated by FD1, and the clean gas passes through the flow control valve FDV in a manner perpendicular to the opening and closing direction of the flow control valve FDV.

[0042] For example, according to embodiments of this disclosure, the cleaning gas can be any gas that meets food safety standards; embodiments of this disclosure do not limit the type of cleaning gas.

[0043] For example, repeatedly opening and closing a flow control valve (FDV) means that the FDV is opened and closed two or more times. The specific number of times the FDV is opened and closed can be selected according to the actual situation, and this disclosure does not impose any limitations on this. For example, the FDV may be opened and closed 10 times. For example, for each opening and closing of the FDV, the opening duration may be a few seconds, while the closing duration may be more than ten seconds; for example, the opening duration may be 5 seconds, while the closing duration may be 10 seconds.

[0044] For example, see continue. Figure 1 According to an embodiment of this disclosure, the cleaning gas is high-temperature water vapor, and the temperature of the high-temperature water vapor is greater than 100 degrees Celsius. The cleaning method according to an embodiment of this disclosure includes: introducing high-temperature water vapor into the feeding and filling system to form a vapor barrier SB0, the vapor barrier SB0 being located in the downstream space of the flow control valve FDV and passing through the flow control valve FDV in a manner intersecting the opening and closing direction of the flow control valve FDV, the vapor barrier SB0 isolating the pretreatment equipment 100 and the filling equipment 200 from each other; and repeatedly opening and closing the flow control valve FDV to clean the flow control valve FDV using high-temperature water vapor.

[0045] On the one hand, high-temperature steam is convenient and economical to obtain, has a sterilization function, and is environmentally friendly and easy to discharge. Therefore, the embodiments of this disclosure preferably use high-temperature steam as a cleaning gas.

[0046] On the other hand, it is desirable to effectively isolate the pretreatment equipment 100 and the filling equipment 200 when not performing filling operations (especially when the bacterial state of the pretreatment equipment 100 and the bacterial state of the filling equipment 200 are different from each other) so that they do not adversely affect each other. To meet this requirement, simply closing the flow control valve FDV is not enough, because due to factors such as processing errors and / or vibration disturbances, even when the flow control valve FDV is closed, there may occasionally be a small gap between the valve head and the valve seat. Moreover, according to the embodiments of this disclosure, the flow control valve FDV needs to be repeatedly opened and closed, which makes it even more difficult to meet the above-mentioned requirement of isolating the pretreatment equipment 100 and the filling equipment 200. For example, when not performing filling operations, the feeding and filling system often exists in a state where the pretreatment equipment 100 is sterile while the filling equipment 200 is contaminated. In this state, simply closing the flow control valve FDV cannot completely guarantee that bacteria from the filling equipment 200 will not enter the pretreatment equipment 100. Therefore, a measure is needed to effectively isolate the pretreatment equipment 100 and the filling equipment 200 to ensure the sterility of the pretreatment equipment 100. According to an embodiment of this disclosure, when not performing filling operations, high-temperature steam is introduced into the feeding and filling system to form a steam barrier SB0. The steam barrier SB0 is located in the space downstream of the flow control valve FDV and passes through the flow control valve FDV in a manner intersecting the opening and closing direction of the flow control valve FDV. This allows the steam barrier SB0 to effectively isolate the pretreatment equipment 100 and the filling equipment 200 from each other, preventing them from adversely affecting each other. In the case where the pretreatment equipment 100 is in a sterile state while the filling equipment 200 is in a contaminated state, due to the presence of the vapor barrier SB0, bacteria in the filling equipment 200 cannot pass through the vapor barrier SB0, and therefore cannot enter the pretreatment equipment 100. Because of the presence of the vapor barrier SB0, even if a small gap occasionally appears between the valve head and valve seat when the flow control valve FDV is closed, or if the flow control valve FDV is repeatedly opened and closed for cleaning purposes, the air entering the pretreatment equipment 100 will be high-temperature steam, which will not affect the sterile state of the pretreatment equipment 100. For example, once the filling operation is completed, this embodiment introduces high-temperature steam to form the vapor barrier as described above, thus isolating the pretreatment equipment 100 and the filling equipment 200. For example, the space after the flow control valve FDV refers to the space located on the side of the valve head of the flow control valve FDV furthest from the valve port.

[0047] On the other hand, according to the embodiments of this disclosure, high-temperature water vapor used as a cleaning gas is cleverly used to form a vapor barrier SB0, so that the pretreatment equipment 100 and the filling equipment 200 can be isolated even during the cleaning of the flow control valve FDV; from another perspective, according to the embodiments of this disclosure, the high-temperature water vapor forming the vapor barrier SB0 is cleverly used as the cleaning gas for cleaning the flow control valve FDV, thereby eliminating the need to provide a dedicated cleaning gas for cleaning the flow control valve FDV.

[0048] For example, according to an embodiment of this disclosure, the temperature of the high-temperature steam is greater than or equal to 130 degrees Celsius; in this case, the flow control valve FDV can be sterilized more effectively while cleaning it, and the temperature of the steam barrier SB0 is higher, which will more effectively isolate the pretreatment equipment 100 and the filling equipment 200. For example, according to an embodiment of this disclosure, the temperature of the high-temperature steam is greater than or equal to 140 degrees Celsius.

[0049] For example, see continue. Figure 1 According to an embodiment of this disclosure, the feeding and filling system includes a first pipeline 300. The first pipeline 300 is connected to the pretreatment device 100 at a first position P1. A flow regulating valve FDV is located at the first position P1. Opening the flow regulating valve FDV connects the pretreatment device 100 to the first pipeline 300 (in other words, closing the flow regulating valve FDV disconnects the pretreatment device 100 from the first pipeline 300). The formation of the vapor barrier SB0 as described above includes: introducing high-temperature steam into the first pipeline 300 to form the vapor barrier SB0 within the first pipeline 300. In this way, due to the confinement effect of the first pipeline 300 on the gas, the vapor barrier SB0 as described above can be formed more easily, allowing the vapor barrier SB0 to be located in the space downstream of the flow regulating valve FDV to isolate the pretreatment device 100 and the filling device 200. It should be noted that... Figure 1 And the following Figure 2 For ease of illustration, the vapor barrier SB0 is drawn wider than the first pipeline 300; however, in reality, the vapor barrier SB0 fills the first pipeline 300 and is constrained by the first pipeline 300.

[0050] For example, see continue. Figure 1According to an embodiment of this disclosure, the flow control valve FDV is switched in a first direction D1; the first pipeline 300 extends along a second direction D2 such that a vapor barrier SB0 is positioned along the second direction D2, which is substantially perpendicular to the first direction D1; and relative to the ground, the second direction D2 is horizontal, while the first direction D1 is vertical. The flow control valve FDV is switched in the first direction D1, and the vapor barrier SB0 is positioned along the second direction D2, such that the vapor barrier SB0 passes through the flow control valve FDV perpendicular to its switching direction. Once the flow control valve FDV is opened, the high-temperature steam forming the vapor barrier SB0 rapidly enters the flow control valve FDV and scours it. The horizontal orientation of the second direction D2 and the vertical orientation of the first direction D1 relative to the ground result in better uniformity of the vapor barrier SB0, more stably separating the pretreatment equipment 100 and the filling equipment 200. Vapor has the inherent property of rising upwards; if the second direction D2 is vertical, the amount of gas above will be greater than the amount of gas below, which makes the uniformity of the vapor barrier SB0 worse.

[0051] For example, see continue. Figure 1 According to an embodiment of this disclosure, the feeding and filling system includes: a gas supply device 400 for providing high-temperature steam; a first pipeline 300 having a first end 300E1 and a second end 300E2, the first end 300E1 of the first pipeline 300 being connected to a filling device 200, the second end 300E2 of the first pipeline 300 being connected to the gas supply device 400, and a first position P1 of the first pipeline 300 being located between the first end 300E1 and the second end 300E2 of the first pipeline 300; the feeding and filling system further includes a first valve V1 and a second valve V2, the first valve V1 being disposed at the first end 300E1 of the first pipeline 300, the second end 300E2 being disposed at the first end 300E1 of the first pipeline 300, the third end 300E2 ... fourth end 300E2 being disposed at the first end 300E1 of the first pipeline 300, the fifth end 300E2 being disposed at the first end 300E1 of the first pipeline 300, the sixth end 300E2 being disposed at the first end 300E1 of the first pipeline 300, the sixth end 30 When valve V1 is open, the first pipeline 300 is connected to the filling equipment 200 (in other words, when valve V1 is closed, the first pipeline 300 is not connected to the filling equipment 200). A second valve V2 is located at the second end 300E2 of the first pipeline 300. When valve V2 is open, the first pipeline 300 is connected to the gas supply equipment 400 (in other words, when valve V2 is closed, the first pipeline 300 is not connected to the gas supply equipment 400). Forming a vapor barrier SB0 in the first pipeline 300 includes closing the flow control valve FDV and the first valve V1 and opening the second valve V2 to form a vapor barrier SB0 in the first pipeline 300. This forms the vapor barrier SB0 as described above. For example, the first valve V1 is a normally open valve; therefore, whether the pretreatment equipment 100 is connected to the filling equipment 200 is controlled solely by the flow control valve FDV. The first valve V1 is only closed when it is necessary to form a vapor barrier SB0.

[0052] For example, see Figure 1According to an embodiment of this disclosure, the feeding and filling system further includes: a third valve V3 connected to the first pipeline 300; opening the third valve V3 connects the first pipeline 300 to the outside (in other words, closing the third valve V3 disconnects the first pipeline 300 from the outside); forming a vapor barrier SB0 in the first pipeline 300 includes: closing the flow regulating valve FDV, the first valve V1, and the third valve V3, and opening the second valve V2 to form a vapor barrier SB0 in the first pipeline 300, after which the third valve V3 is opened and closed at least once at specific time intervals. High-temperature steam is introduced into the first pipeline 300 to form the vapor barrier SB0; in this case, if the high-temperature steam stagnates in the first pipeline 300 and does not flow, the high-temperature steam will cool down due to heat exchange and produce condensate in the first pipeline 300. At this time, the effectiveness of the pretreatment equipment 100 and the filling equipment 200 in isolating the vapor barrier SB0 will be affected by the cooling of the high-temperature steam. Therefore, according to the embodiments of this disclosure, the third valve V3 is opened and closed at least once at specific time intervals. Since the third valve V3 is open, the first pipeline 300 is connected to the outside, promoting the flow of high-temperature steam, so that the steam barrier SB0 formed by the high-temperature steam can maintain the desired high temperature (e.g., greater than or equal to 130 degrees Celsius). For example, the number of times the third valve V3 is opened and closed, and the duration of the third valve being open each time, can be flexibly selected according to actual conditions, as long as it promotes the flow of high-temperature steam so that the steam barrier SB0 can maintain the desired high temperature.

[0053] For example, see continue. Figure 1 According to an embodiment of this disclosure, the feeding and filling system further includes a temperature sensor 500 for measuring the temperature of high-temperature water vapor in the first pipeline 300; a specific time period as described above is determined based on the temperature of the high-temperature water vapor measured by the temperature sensor 500, wherein when the temperature of the high-temperature water vapor measured by the temperature sensor 500 is lower than a preset value, the third valve V3 is opened and closed at least once. For example, the preset value is 100 degrees Celsius; further, for example, the preset value is 130 degrees Celsius; further, for example, the preset value is 140 degrees Celsius. It should be noted that... Figure 1 This is merely a schematic diagram of the layout of the feeding and filling system. In the actual feeding and filling system, the length of the first pipeline 300 is very short, and the distance between the flow regulating valve FDV, the first valve V1, the second valve V2, and the third valve V3 is very small, making it inconvenient to install the temperature sensor 500. Therefore, according to the embodiment of this disclosure, the temperature sensor 500 is placed on the second pipeline 600 between the gas supply device 400 and the second valve V2. In the actual feeding and filling system, the temperature sensor 500 is located very close to the first pipeline 300, so the temperature it measures can be used as the temperature of the high-temperature water vapor in the first pipeline 300.

[0054] For example, see continue. Figure 1 According to an embodiment of this disclosure, a third valve V3 is connected to the first pipeline 300 at a second position P2; in the second direction D2, the second position P2 is located between the first end 300E1 of the first pipeline 300 and the first position P1. In this way, the second position P2 is located at the end of the vapor barrier SB0 in the second direction D2, which facilitates maintaining a high and uniform temperature of the vapor barrier SB0 by opening and closing the third valve V3.

[0055] Figure 2 This is a schematic diagram of the layout of the feeding and filling system according to an embodiment of the present disclosure, with clean gas in the first pipeline. Figure 2 ;exist Figure 2 In the diagram, the path of the high-temperature water vapor used as the cleaning gas is indicated by FD1. Figure 3 This is a schematic diagram of the layout of the feeding and filling system according to an embodiment of the present disclosure in the filling operation state; Figure 3 In this process, the path of the raw materials from the pretreatment equipment 100 into the filling equipment is indicated by FD2. See also Figure 2 and Figure 3 According to an embodiment of this disclosure, the feeding and filling system further includes a fourth valve V4 and a fifth valve V5. The fifth valve V5 is connected between the gas supply device 400 and the fourth valve V4. The fourth valve V4 is connected between the first pipeline 300 and the third valve V3, and the fourth valve V4 is also connected between the third valve V3 and the fifth valve V5. The third valve V3, the fourth valve V4, and the fifth valve V5 are configured such that the fourth valve V4 is open and the fifth valve V5 is closed, allowing high-temperature steam in the first pipeline 300 to reach the third valve V3 through the fourth valve V4. See [link to previous section]. Figure 2 The third valve V3, fourth valve V4, and fifth valve V5 are further configured such that the fifth valve V5 is open and the fourth valve V4 is closed, allowing the high-temperature steam supplied by the gas supply equipment 400 to reach the third valve V3 through the fifth valve V5 to form a first auxiliary steam barrier SB1. The first auxiliary steam barrier SB1 is located in the post-valve space of the fourth valve V4 and passes through the fourth valve V4 in a manner intersecting (e.g., perpendicular) to the opening and closing direction of the fourth valve V4. See [link to relevant documentation]. Figure 3 Furthermore, forming a vapor barrier SB0 in the first pipeline 300 also includes: opening the fourth valve V4 and closing the fifth valve V5, see [link to previous section]. Figure 2 As mentioned above, the third valve V3 is installed to connect the first pipeline 300 to the outside, promoting the flow of high-temperature steam and ensuring that the steam barrier SB0 formed by the high-temperature steam maintains the desired high temperature; in Figure 1In the process, the third valve V3 is directly connected to the first pipeline 300. During filling, the flow regulating valve FDV is open, the first valve V1 is open, the second valve V2 is closed, and the third valve V3 is closed. Although the third valve V3 is closed, due to processing errors and / or vibration disturbances, small gaps may occasionally appear between the valve head and seat of the third valve V3, causing undesirable communication between the first pipeline 300 and the outside during filling, contaminating the raw material in the first pipeline 300. According to an embodiment of this disclosure, a fourth valve V4 and a fifth valve V5 are provided, so that the third valve V3 is not directly connected to the first pipeline 300; Figure 2 As shown, with high-temperature steam introduced into the first pipeline 300, the fourth valve V4 is open and the fifth valve V5 is closed. The high-temperature steam in the first pipeline 300 reaches the third valve V3 through the fourth valve V4. At this time, by opening and closing the third valve V3 at least once at specific time intervals, the steam barrier SB0 can be maintained at the desired high temperature. Figure 3 In the filling operation state shown, the fifth valve V5 is open and the fourth valve V4 is closed. High-temperature steam supplied by the gas supply equipment 400 reaches the third valve V3 through the fifth valve V5 to form a first auxiliary steam barrier SB1. The first auxiliary steam barrier SB1 is located in the post-valve space of the fourth valve V4 and passes through the fourth valve V4 in a manner intersecting the opening and closing direction of the fourth valve V4. In this way, during the filling operation state, the first pipeline 300 can be isolated from the outside through the first auxiliary steam barrier SB1, preventing contamination of the raw materials in the first pipeline 300. To maintain the first auxiliary steam barrier SB1 at the desired high temperature (e.g., greater than or equal to 130 degrees Celsius), the third valve V3 can be opened and closed at least once at characteristic time intervals, depending on the actual situation. For example, the opening and closing direction of the fourth valve V4 is the direction of movement of the movable valve head of the fourth valve V4. For example, the post-valve space of the fourth valve V4 is the side of the valve head of the fourth valve V4 away from the valve port. For example, the fifth valve V5, the fourth valve V4, and the third valve V3 are located on the same pipeline.

[0056] For example, see continue. Figure 2 and Figure 3 According to an embodiment of this disclosure, the feeding and filling system further includes a sixth valve V6 and a seventh valve V7. The sixth valve V6 is connected between the gas supply device 400 and the second valve V2. The second valve V2, the sixth valve V6, and the seventh valve V7 are configured such that the second valve V2 is open, the sixth valve V6 is open, and the seventh valve V7 is closed. The high-temperature steam provided by the gas supply device 400 reaches the second valve V2 through the sixth valve V6 and enters the first pipeline 300 through the second valve V2. See [link to previous section] Figure 2The second valve V2, the sixth valve V6, and the seventh valve V7 are further configured such that: the sixth valve V6 is open, the second valve V2 is closed, and the high-temperature steam supplied by the gas supply equipment 400 forms a second auxiliary steam barrier SB2. The second auxiliary steam barrier SB2 is located in the space downstream of the second valve V2 and passes through the second valve V2 in a manner intersecting the opening and closing direction of the second valve V2. The seventh valve V7 is used to control the connection between the second auxiliary steam barrier SB2 and the outside. See [link to relevant documentation]. Figure 3 Furthermore, forming a vapor barrier SB0 in the first pipeline 300 also includes: closing the seventh valve V7, see [link / reference]. Figure 2 During the filling process, the flow control valve FDV is open, the first valve V1 is open, the second valve V2 is closed, and the third valve V3 is closed. Although the second valve V2 is closed, due to processing errors and / or vibration disturbances, small gaps may occasionally appear between the valve head and seat of the second valve V2, causing undesirable communication between the first pipeline 300 and the outside during filling, contaminating the raw material in the first pipeline 300. According to an embodiment of this disclosure, a sixth valve V6 and a seventh valve V7 are provided; in Figure 2 As shown, with high-temperature steam introduced into the first pipeline 300, the second valve V2 is open, the sixth valve V6 is open, and the seventh valve V7 is closed. The high-temperature steam supplied by the gas supply equipment 400 reaches the second valve V2 through the sixth valve V6 and enters the first pipeline 300 through the second valve V2, forming a steam barrier SB0. Figure 3 In the filling operation state shown, the sixth valve V6 is open and the second valve V2 is closed. High-temperature steam supplied by the gas supply equipment 400 forms a second auxiliary steam barrier SB2. The second auxiliary steam barrier SB2 is located in the space downstream of the second valve V2 and passes through the second valve V2 in an manner intersecting the opening and closing direction of the second valve V2. In this way, during the filling operation state, the second auxiliary steam barrier SB2 can isolate the first pipeline 300 from the outside, preventing contamination of the raw materials in the first pipeline 300. The seventh valve V7 is used to control the connection between the second auxiliary steam barrier SB2 and the outside. To maintain the second auxiliary steam barrier SB2 at the desired high temperature (e.g., greater than or equal to 130 degrees Celsius), the seventh valve V7 can be opened and closed at least once at characteristic time intervals, depending on the actual situation. For example, the opening and closing direction of the second valve V2 is the direction of movement of the movable valve head of the second valve V2. For example, the space downstream of the second valve V2 is the space on the side of the valve head of the second valve V2 away from the valve opening. For example, the second valve V2, the sixth valve V6, and the seventh valve V7 are located on the same pipeline.

[0057] For example, according to an embodiment of this disclosure, after the vapor barrier SB0 is formed, the gas pressure in the first line 300 is less than or equal to 100 mbar. Within this pressure range, it can be ensured that repeated switching of the flow control valve FDV does not pose a safety risk.

[0058] For example, according to an embodiment of this disclosure, after a first period of continuous high-temperature steam is introduced into the feeding and filling system, the introduction of high-temperature steam into the feeding and filling system is stopped. The flow control valve FDV is repeatedly opened and closed before or after the cessation of the introduction of high-temperature steam into the feeding and filling system. If high-temperature steam is continuously introduced, the raw material remaining at the flow control valve FDV may be charred and adhere to the flow control valve FDV, making it difficult to remove. Therefore, according to an embodiment of this disclosure, stopping the introduction of high-temperature steam into the feeding and filling system after a first period of continuous high-temperature steam can avoid the aforementioned problem. Whether the flow control valve FDV is repeatedly opened and closed before or after the cessation of the introduction of high-temperature steam into the feeding and filling system can be selected according to the actual situation. It should be noted that after the cessation of the introduction of high-temperature steam into the feeding and filling system, since the first pipeline 300 is still filled with high-temperature steam, the flow control valve FDV can still be cleaned using high-temperature steam by repeatedly opening and closing the flow control valve FDV. For example, after cleaning the flow control valve FDV, high-temperature steam is introduced into the feeding and filling system again to form a steam barrier SB0, which effectively isolates the pretreatment equipment 100 and the filling equipment 200 from each other.

[0059] For example, according to an embodiment of this disclosure, the first time period is less than or equal to 15 minutes. This ensures that the raw material remaining at the flow control valve FDV will not be charred and stick to the flow control valve FDV.

[0060] For example, according to an embodiment of this disclosure, the pretreatment device 100 is used to pretreat the raw materials to be filled, and the filling device 200 is used to fill the raw materials into containers; the cleaning method for the feeding and filling system further includes: before introducing gas, stopping the feeding and filling system, and emptying the raw materials located in the pretreatment device 100, between the pretreatment device 100 and the filling device 200, and in the filling device 200. This reduces the difficulty of cleaning the entire filling and feeding system.

[0061] For example, the cleaning method according to embodiments of this disclosure further includes: cleaning the pretreatment device 100 using a liquid cleaning flow formed by a liquid cleaning medium; and cleaning the flow control valve FDV includes: repeatedly opening and closing the flow control valve FDV to clean the flow control valve FDV using a liquid cleaning flow. In this case, the cleaning flow of the pretreatment device 100 can be used to clean the flow control valve FDV.

[0062] Figure 4 This is a schematic diagram of a raw material tank for holding raw materials in a filling device within a feeding and filling system according to an embodiment of the present disclosure. For example, according to an embodiment of the present disclosure, the filling device 200 is used to fill raw materials into containers, and the filling device 200 includes a raw material tank 210 for holding the raw materials, such as... Figure 4 As shown; the cleaning method of the feeding and filling system according to an embodiment of this disclosure further includes: adding at least one gaseous medium to the liquid cleaning medium to form a gas-liquid mixed cleaning flow, and using the gas-liquid mixed cleaning flow to clean the raw material tank 210. By adding at least one gaseous medium to the liquid cleaning medium, turbulence can be formed, which powerfully washes the raw material tank 210 and improves the cleaning effect of the raw material tank 210.

[0063] For example, see Figure 4 The raw material tank 210 has a preset liquid level line 211. Cleaning the raw material tank 210 using a gas-liquid mixed cleaning flow includes: introducing a liquid cleaning medium into the raw material tank so that the liquid level of the cleaning medium reaches or is close to the liquid level line 210, and then adding a gaseous medium to the liquid cleaning medium. Generally, a ring of raw material residue will accumulate at or near the liquid level line 210. According to the embodiments of this disclosure, adding a gaseous medium to the liquid cleaning medium after the liquid level reaches or is close to the liquid level line 210 can effectively clean and remove the raw material residue as described above. For example, the liquid level of the cleaning medium being close to the liquid level line 210 means that the distance between the liquid level of the cleaning medium and the liquid level line 210 does not exceed 10% of the height of the raw material tank 210, or even more than 5%, and even less than 3%.

[0064] For example, according to embodiments of this disclosure, the cleaning method for the feeding and filling system further includes: a pre-treatment cleaning device 100 and a cleaning filling device 200, wherein the cleaning of the flow regulating valve FDV is performed simultaneously with the cleaning of the pre-treatment cleaning device 100 and the cleaning of the filling device 200. In this case, not only is the problem of the flow regulating valve FDV becoming a cleaning blind spot avoided, but the cleaning efficiency of the entire system is also higher, although the requirements for the coordination of various systems in the entire system are increased.

[0065] For example, in the cleaning method of the feeding and filling system according to embodiments of the present disclosure, the same cleaning medium is used to clean the pretreatment equipment 100, the pretreatment equipment 100, and the filling equipment 200. In this case, the cleaning efficiency is further improved, but the requirements for the coordination of various devices in the entire system are further increased.

[0066] According to embodiments of this disclosure, a feeding and filling system is also provided. Figure 5 This is a schematic diagram of the framework of a feeding and filling system according to an embodiment of the present disclosure. Figure 1 See also Figure 5 The feeding and filling system 700 according to an embodiment of the present disclosure includes: a processor 710; and a memory 720, including one or more computer program modules; wherein the one or more computer program modules are stored in the memory 720 and configured to be executed by the processor 710, and the one or more computer program modules include instructions for implementing the control method of the feeding and filling system as described above. The working principle and technical effects of the feeding and filling system according to the embodiments of the present disclosure can be referred to the feeding and filling system and its control method according to the embodiments of the present disclosure as described above, and will not be repeated here.

[0067] For example, memory 720 is used to store non-transitory computer-readable instructions (e.g., one or more computer program modules). Processor 710 is used to execute the non-transitory computer-readable instructions, which, when executed by processor 710, can perform one or more steps in the control method of the feeding and filling system described above. Memory 720 and processor 710 can be interconnected via a bus system and / or other forms of connection mechanism (not shown).

[0068] For example, processor 710 can be a central processing unit (CPU), a graphics processing unit (GPU), or other form of processing unit with data processing and / or program execution capabilities. For instance, the CPU can be an x86 or ARM architecture. Processor 710 can be a general-purpose processor or a dedicated processor, capable of controlling other components in the feeding and filling system 700 to perform desired functions.

[0069] For example, memory 720 may include any combination of one or more computer program products, which may include various forms of computer-readable storage media, such as volatile memory and / or non-volatile memory. Volatile memory may include, for example, random access memory (RAM) and / or cache memory. Non-volatile memory may include, for example, read-only memory (ROM), hard disk, erasable programmable read-only memory (EPROM), portable compact disc read-only memory (CD-ROM), USB memory, flash memory, etc. One or more computer program modules may be stored on the computer-readable storage medium, and processor 710 may run one or more computer program modules to implement various functions of the feeding and filling system 700. Various application programs and various data, as well as various data used and / or generated by the application programs, may also be stored in the computer-readable storage medium.

[0070] Figure 6 This is a schematic diagram of the framework of a feeding and filling system according to an embodiment of the present disclosure. Figure 2 See also Figure 6 The feeding and filling system 800 is, for example, suitable for implementing the control method of the feeding and filling system provided in the embodiments of this disclosure. The feeding and filling system 800 may be a terminal device, etc. It should be noted that the feeding and filling system 800 shown in FIG. 7 is merely an example and does not impose any limitation on the functionality and scope of use of the embodiments of this disclosure.

[0071] like Figure 6 As shown, the feeding and filling system 800 may include a processing device (e.g., a central processing unit, a graphics processor, etc.) 810, which can perform various appropriate actions and processes according to a program stored in a read-only memory (ROM) 820 or a program loaded from a storage device 880 into a random access memory (RAM) 830. The RAM 830 also stores various programs and data required for the operation of the feeding and filling system 800. The processing device 810, ROM 820, and RAM 830 are interconnected via a bus 840. An input / output (I / O) interface 850 is also connected to the bus 840.

[0072] Typically, the following devices can be connected to I / O interface 850: input devices 860 including, for example, touchscreens, touchpads, keyboards, mice, cameras, microphones, accelerometers, gyroscopes, etc.; output devices 870 including, for example, liquid crystal displays (LCDs), speakers, vibrators, etc.; storage devices 880 including, for example, magnetic tapes, hard disks, etc.; and communication devices 890. Communication device 890 allows the feeding and filling system 800 to communicate wirelessly or wiredly with other devices to exchange data. Although Figure 6 A feeding and filling system 800 with various devices is shown, but it should be understood that it is not required to implement or have all of the devices shown, and the feeding and filling system 800 may alternatively be implemented or have more or fewer devices.

[0073] For example, according to embodiments of this disclosure, the control method for the feeding and filling system described above can be implemented as a computer software program. For instance, embodiments of this disclosure include a computer program product comprising a computer program carried on a non-transitory computer-readable medium, the computer program including program code for executing the control method for the feeding and filling system described above. In such embodiments, the computer program can be downloaded and installed from a network via a communication device 890, or installed from a storage device 880, or installed from a ROM 820. When the computer program is executed by the processing device 810, the functions defined in the filling control method provided by embodiments of this disclosure can be implemented.

[0074] According to embodiments of this disclosure, a computer-readable storage medium is also provided. Figure 7This is a schematic diagram of a computer-readable storage medium according to an embodiment of the present disclosure. See also: Figure 7 The computer-readable storage medium 900 provided in this embodiment is used to store non-transitory computer-readable instructions 910. When the non-transitory computer-readable instructions 910 are executed by a computer, the control method of the above-described feeding and filling system can be implemented. The working principle and technical effects of the computer-readable storage medium 900 can be referred to the feeding and filling system and its control method as described above, and will not be repeated here. For example, the storage medium 900 can be applied in the above-described feeding and filling system 700. For example, the storage medium 900 can be... Figure 5 The memory 720 in the feeding and filling system 700 shown.

[0075] For example, storage medium 900 may include a memory card of a smartphone, a storage component of a tablet computer, a hard disk of a personal computer, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM), portable compact disc read-only memory (CD-ROM), flash memory, or any combination of the above storage media, or other suitable storage media.

[0076] The above are merely exemplary embodiments of this disclosure and are not intended to limit the scope of protection of this disclosure, which is determined by the appended claims.

Claims

1. A method of cleaning a supply and fill system, the supply and fill system comprising: A pre-treatment device and a filling device, and a flow regulating valve connected between the pre-treatment device and the filling device, wherein The cleaning method of the feed and filling system includes: cleaning the flow regulating valve; and Cleaning the flow regulating valve includes: introducing a cleaning gas into the feed and filling system, the flow regulating valve being located in a flow path of the cleaning gas; and repeatedly opening and closing the flow regulating valve to clean the flow regulating valve with the cleaning gas, Wherein, the flow regulating valve includes a valve seat and a movable valve head, the opening and closing direction of the flow regulating valve is the movement direction of the movable valve head, the cleaning gas flows through the flow regulating valve in a direction intersecting the opening and closing direction of the flow regulating valve.

2. The cleaning method of claim 1, wherein The cleaning gas is high-temperature water vapor, the temperature of the high-temperature water vapor is greater than 100 degrees Celsius; And The cleaning method includes: introducing high-temperature water vapor into the feed and filling system to form a vapor barrier, the vapor barrier is located in a valve back space of the flow regulating valve and passes through the flow regulating valve in a direction intersecting the opening and closing direction of the flow regulating valve, the vapor barrier isolates the pre-treatment device and the filling device from each other; and repeatedly opening and closing the flow regulating valve to clean the flow regulating valve with the high-temperature water vapor.

3. The cleaning method of claim 2, wherein The temperature of the high-temperature water vapor is greater than or equal to 130 degrees Celsius.

4. The cleaning method of claim 2, wherein The feed and filling system includes a first pipeline, the first pipeline is connected with the pre-treatment device at a first position of the first pipeline, the flow regulating valve is arranged at the first position, and the pre-treatment device is in communication with the first pipeline when the flow regulating valve is opened; And The forming of the vapor barrier includes: introducing the high-temperature water vapor into the first pipeline to form the vapor barrier in the first pipeline.

5. The cleaning method of claim 4, wherein The opening and closing direction of the flow regulating valve is a first direction; The first pipeline extends in a second direction so that the vapor barrier is arranged in the second direction, the second direction is substantially perpendicular to the first direction; And The second direction is a horizontal direction and the first direction is a vertical direction relative to the ground.

6. The cleaning method of claim 4, wherein The feed and filling system includes a gas supply device for providing the high-temperature water vapor; The first pipeline has a first end and a second end, the first end of the first pipeline is connected with the filling device, the second end of the first pipeline is connected with the gas supply device, and the first position of the first pipeline is located between the first end and the second end of the first pipeline; ​ The feed and fill system further comprises a first valve disposed at a first end of the first line, the first valve being open to allow the first line to communicate with the filling device, and a second valve disposed at a second end of the first line, the second valve being open to allow the first line to communicate with the gas supply device; and The forming the vapor barrier in the first line comprises closing the flow regulating valve and the first valve and opening the second valve to form the vapor barrier in the first line.

7. The cleaning method of claim 6, wherein The feed and fill system further comprises a third valve connected to the first line, the third valve being open to allow the first line to communicate with an outside; and The forming the vapor barrier in the first line comprises closing the flow regulating valve, the first valve and the third valve and opening the second valve to form the vapor barrier in the first line, and then the third valve is opened and closed at least once at intervals of a certain time period.

8. The cleaning method of claim 7, wherein The feed and fill system further comprises a temperature sensor for measuring the temperature of the high-temperature water vapor in the first line; and The certain time period is determined according to the temperature of the high-temperature water vapor measured by the temperature sensor, wherein the third valve is opened and closed at least once when the temperature of the high-temperature water vapor measured by the temperature sensor is lower than a preset value.

9. The cleaning method of claim 7, wherein The third valve is connected to the first line at a second position of the first line; and The first line extends in a second direction, in which the second position is located between the first end of the first line and the first position.

10. The cleaning method of claim 7, wherein The feed and fill system further comprises a fourth valve and a fifth valve, the fifth valve being connected between the gas supply device and the fourth valve, the fourth valve being connected between the first line and the third valve, and the fourth valve being further connected between the third valve and the fifth valve; The third valve, the fourth valve and the fifth valve are configured such that the fourth valve is open, the fifth valve is closed, and the high-temperature water vapor in the first line passes through the fourth valve to reach the third valve; The third valve, the fourth valve and the fifth valve are further configured such that the fifth valve is open and the fourth valve is closed, the high-temperature water vapor provided by the gas supply device passes through the fifth valve to reach the third valve to form a first auxiliary vapor barrier, the first auxiliary vapor barrier is located in a valve space behind the fourth valve and passes through the fourth valve in a direction intersecting with the opening and closing direction of the fourth valve; and The forming the vapor barrier in the first line further comprises opening the fourth valve and closing the fifth valve.

11. The cleaning method of claim 8, wherein ​ The feed and filling system further comprises a sixth valve and a seventh valve, the sixth valve is connected between the gas supply device and the second valve; The second valve, the sixth valve and the seventh valve are configured to: the second valve is opened, the sixth valve is opened, the seventh valve is closed, and the high-temperature water vapor provided by the gas supply device passes through the sixth valve to the second valve and enters the first pipeline through the second valve; The second valve, the sixth valve and the seventh valve are further configured to: the sixth valve is opened, the second valve is closed, the high-temperature water vapor provided by the gas supply device forms a second auxiliary vapor barrier, the second auxiliary vapor barrier is located in the valve space of the second valve and passes through the second valve in a direction intersecting with the opening and closing direction of the second valve, and the seventh valve is used to control the second auxiliary vapor barrier to communicate with the outside; and Forming the vapor barrier in the first pipeline further comprises: closing the seventh valve.

12. The cleaning method of claim 2, wherein, The feed and filling system comprises a first pipeline, and the pressure in the first pipeline is less than or equal to 100 mbar after the vapor barrier is formed.

13. The cleaning method of claim 2, further comprising: stopping the high-temperature water vapor from being supplied to the feed and filling system after the high-temperature water vapor is supplied to the feed and filling system for a first time period, wherein, The repeatedly opening and closing the flow regulating valve is performed before or after the stopping the high-temperature water vapor from being supplied to the feed and filling system.

14. The cleaning method of claim 13, wherein, The first time period is less than or equal to 15 minutes.

15. The cleaning method of any one of claims 1-14, wherein, The pre-treatment device is used to pre-treat raw materials to be filled into containers, and the filling device is used to fill the raw materials into the containers; The method further comprises: stopping the feed and filling system before the cleaning gas is supplied, and emptying the raw materials located in the pre-treatment device, between the pre-treatment device and the filling device, and in the filling device.

16. The cleaning method of any one of claims 1-14, further comprising: cleaning the pre-treatment device with a liquid cleaning flow formed by a liquid cleaning medium; The cleaning the flow regulating valve comprises: repeatedly opening and closing the flow regulating valve to clean the flow regulating valve with the liquid cleaning flow.

17. The cleaning method of any one of claims 1-14, wherein, The filling device is used to fill raw materials into containers, and the filling device comprises a raw material barrel containing the raw materials; The method further comprises: adding at least one gaseous medium to a liquid cleaning medium to form a gas-liquid mixed cleaning flow, and cleaning the raw material barrel with the gas-liquid mixed cleaning flow.

18. The cleaning method of claim 17, wherein, The raw material barrel has a preset liquid level line; Cleaning the raw material barrel with the gas-liquid mixed cleaning flow comprises: The liquid cleaning medium is admitted to the feed tank so that the liquid level of the liquid cleaning medium reaches or approaches the liquid level line, after which the gaseous medium is added to the liquid cleaning medium.

19. The cleaning method of any one of claims 1-14, further comprising: The pre-treatment equipment is cleaned and the filling equipment is cleaned, wherein, The flow regulating valve is cleaned simultaneously with the cleaning of the pre-treatment equipment and the filling equipment.

20. The cleaning method of claim 19, wherein, The flow regulating valve, the pre-treatment equipment and the filling equipment are cleaned with the same cleaning medium.

21. A feed and fill system comprising: a processor; a memory including one or more computer program modules; wherein the one or more computer program modules are stored in the memory and configured to be executed by the processor, the one or more computer program modules including instructions for implementing the method of any one of claims 1-20.

22. A computer-readable storage medium storing non-transitory computer-readable instructions that, when executed by a computer, implement the method of any one of claims 1-20.

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