Supply arrangement, vacuum processing system and method of supplying to a mobile device in a vacuum processing system

Abstract

A supply arrangement (100) for supplying a movable device (10) in a vacuum processing system is described. The supply arrangement (100) comprises an articulated arm feedthrough system (105) for providing a supply line to the movable device (10). Additionally, the supply arrangement (100) comprises a force compensation unit (140) for compensating a moment of force (M) about a first axis of rotation (R1) of a first joint (131) arranged at a first end (101) of the articulated arm feedthrough system (105). The moment of force (M) is caused by a gravitational force of the articulated arm feedthrough system (105). Furthermore, a vacuum processing system and a method of supplying a movable device in a vacuum processing system are described.

Description

TECHNICAL FIELD

[0001] Embodiments of the present disclosure relate to a supply arrangement for supplying a movable device in a vacuum processing system. In particular, embodiments of the present disclosure relate to a supply arrangement having a feedthrough for a supply line for supplying a movable processing device, such as a deposition source. Further embodiments of the present disclosure relate to a method of supplying a movable device in a vacuum processing system. Yet further embodiments of the present disclosure relate to a vacuum processing system configured for producing optoelectronic devices, in particular organic light emitting diodes (OLEDs). BACKGROUND

[0002] Several methods are known for depositing a material on a substrate. For example, a substrate can be coated by using an evaporation process, such as a physical vapor deposition (PVD) process, a chemical vapor deposition (CVD) process, a sputtering process, a spray process, or the like. The process can be performed in a processing chamber of a deposition apparatus in which the substrate to be coated is located. A deposition material is provided in the processing chamber. A variety of materials, such as small molecules, metals, oxides, nitrides, and carbides, can be used for deposition on a substrate. In addition, other processes, such as etching, structuring, annealing, and the like, can be performed in the processing chamber.

[0003] The coated substrate can be used in several applications and in several technical fields. For example, applications are in the field of organic light emitting diode (OLED) panels. Further applications include insulating panels, microelectronic devices, such as semiconductor devices, substrates with TFTs, color filters, and the like.

[0004] Processing systems for display manufacturing typically include transportation systems for substrate carriers, mask carriers, and processing devices, e.g. deposition sources. For example, transportation systems for substrate carriers and or mask carriers can be used for transporting the respective carriers into and out of a processing chamber. Furthermore, transportation systems for processing devices, e.g. deposition sources, are typically used for transporting the processing devices along a substrate when processing the substrate, e.g. by emitting a material to be deposited on the substrate.

[0005] A constant problem in systems for substrate processing is the increasing demand for higher quality processing results. In this regard, a number of challenges arise in processing systems in which a medium and / or power has to be supplied to a movable device, e.g. a processing device, in particular under vacuum conditions.

[0006] In view of the above, there is a need to provide a supply arrangement, a vacuum processing system, and a method of supplying a movable device in a vacuum processing system, and the system and method are improved with respect to the prior art. SUMMARY

[0007] In view of the above, a supply arrangement for supplying a movable device in a vacuum processing system, a vacuum processing system and a method of supplying a movable device in a vacuum processing system according to the independent claims are provided. Further aspects, benefits and features of the present disclosure are apparent from the claims, the description and the accompanying drawings.

[0008] According to one aspect of the present disclosure, a supply arrangement for supplying a movable device in a vacuum processing system is provided. The supply arrangement comprises a jointed-arm feedthrough system for providing one or more supply lines to the movable device. Additionally, the supply arrangement comprises a force compensation unit for compensating a moment of force about a first axis of rotation of a first joint provided at a first end of the jointed-arm feedthrough system. The moment of force is caused by a gravitational force of the jointed-arm feedthrough system.

[0009] According to another aspect of the present disclosure, a vacuum processing system for processing a substrate is provided. The vacuum processing comprises a vacuum processing chamber, a movable device provided in the vacuum processing chamber, and a supply arrangement for supplying the movable device. A first end of the supply arrangement is fixed and a second end of the supply arrangement is connected to the movable device. The supply arrangement comprises a jointed-arm feedthrough system for providing one or more supply lines to the movable device. Additionally, the supply arrangement comprises a force compensation unit for compensating a moment of force about a first axis of rotation of a first joint provided at a first end of the jointed-arm feedthrough system. The moment of force is caused by a gravitational force of the jointed-arm feedthrough system.

[0010] According to another aspect of the present disclosure, a method of supplying a movable device in a vacuum processing system is provided. The method comprises providing one or more supply lines connected to the movable device by guiding the one or more supply lines through a jointed-arm feedthrough system of a supply arrangement. Further, the method comprises compensating a moment of force about a first axis of rotation of a first joint provided at a first end of the jointed-arm feedthrough system by using a force compensation unit. The moment of force is caused by a gravitational force of the jointed-arm feedthrough system.

[0011] Embodiments also relate to devices for performing the disclosed methods and comprise device portions for performing each described method aspect. These method aspects can be performed by means of hardware components, computers programmed with appropriate software, any combination of the two, or in any other manner. Furthermore, embodiments according to the present disclosure also relate to methods for operating the described devices. The methods for operating the described devices comprise method aspects for performing each function of the device. BRIEF DESCRIPTION OF DRAWINGS

[0012] For a more detailed understanding of the above-mentioned features of the present disclosure, reference can be made to the more particular description of the disclosure that is briefly summarized above. The accompanying drawings relate to embodiments of the present disclosure and are described in the following:

[0013] Figure 1 A schematic view of a supply arrangement according to embodiments described herein is shown;

[0014] Figure 2A A schematic side view of a supply arrangement according to embodiments described herein is shown in a retracted position;

[0015] Figure 2B A schematic side view of a supply arrangement according to embodiments described herein is shown in an extended position;

[0016] Figure 3 A schematic view of a supply arrangement according to further embodiments described herein is shown;

[0017] Figure 4 A schematic view of an exemplary embodiment of a force compensation unit comprising a tension system is shown;

[0018] Figure 5 A schematic view of an exemplary embodiment of a force compensation unit comprising a pressure system is shown;

[0019] Figure 6 A schematic partial view of a jointed arm feedthrough system comprising a supply line winding roller is shown;

[0020] Figure 7 A schematic view of a supply arrangement according to further embodiments described herein is shown;

[0021] Figure 8 A schematic side view of a vacuum handling system according to embodiments described herein is shown;

[0022] Figure 9 A schematic top view of a vacuum handling system according to further embodiments described herein is shown; and

[0023] Figure 10 A flowchart illustrating a method for supplying to a movable device in a vacuum processing system according to embodiments described herein is shown. DETAILED DESCRIPTION

[0024] Reference will now be made in detail embodiments of the present disclosure, one or more examples of which are illustrated in the figures. Within the following description of the figures, same reference numbers refer to same components. Only the differences with respect to the individual embodiments are described. Each example is provided by way of explanation of the present disclosure and is not meant as a restriction of the present disclosure. Further, features illustrated or described as part of one embodiment can be used on another embodiment or in combination with another embodiment to produce yet another embodiment. The description is intended to include such modifications and variations.

[0025] With exemplary reference to Figure 1 , a supply arrangement 100 for supplying to a movable device 10 in a vacuum processing system according to the present disclosure is described. According to embodiments, which can be combined with any other embodiments described herein, the supply arrangement 100 comprises an articulated arm feedthrough system 105. The articulated arm feedthrough system is configured for providing one or more supply lines to the movable device 10.

[0026] Further, the supply arrangement 100 comprises a force compensation unit 140 for compensating a moment M around a first axis of rotation R1 of a first joint 131 provided at a first end 101 of the articulated arm feedthrough system 105. The moment M around the first axis of rotation R1 of the first joint 131 is caused by a gravitational force F of the articulated arm feedthrough system 105. It is to be understood that the gravitational force F of the articulated arm feedthrough system 105 results from a weight of the articulated arm feedthrough system 105. Further, it is to be understood that the gravitational force F acts on a center of gravity of the articulated arm feedthrough system 105.

[0027] Hence, beneficially, a supply arrangement for supplying a movable device in a vacuum processing system is provided which is improved compared to the prior art. In particular, providing a force compensation unit as described herein connected to a first end of a joint-arm feedthrough system has the advantage that the movement of the second end of the joint-arm feedthrough system relative to the first end is smoother. In other words, providing a force compensation unit as described herein beneficially provides an improved smoothness of the movement of the joint-arm feedthrough system when extending and retracting. Hence, by employing a supply arrangement for a movable device, e.g. a deposition source, in a vacuum processing system, the movable device can be moved more smoothly compared to the prior art. In addition, providing a force compensation unit as described herein beneficially provides a reduction of disturbances, such as vibrations of the joint-arm feedthrough system, during movement. Hence, by employing a supply arrangement as described herein for supplying a movable device in a vacuum processing system, the quality of the processing result can be improved.

[0028] For example, in case the movable device is a deposition source, the improved smoothness of the movement of the deposition source has the advantage that more uniform and homogenous deposition and coating results can be obtained. Hence, better processing results and thus higher product quality, e.g. display devices such as OLEDs, can be obtained. In addition, by improving the smoothness of the movement of the movable device, vibrations and disturbances of the supply arrangement can be reduced. Hence, beneficially, less stress is induced on the links and connections of the elements forming the supply arrangement, such that the service life of the supply structure, in particular the life time of the seals and bearings, can be prolonged.

[0029] Before various embodiments of the present disclosure are described in further detail, some aspects regarding some terms and expressions used herein are explained.

[0030] In the present disclosure, a “supply arrangement for supplying a movable device in a vacuum processing system” can be understood as an arrangement configured for supplying a device which is moved within a vacuum environment of a vacuum processing system.

[0031] In the present disclosure, a “movable device” can be understood as a device which is moved during processing. For example, the movable device can be a processing device, e.g. a deposition source. Alternatively, the movable device can be any other movable device used in a vacuum processing system which requires a supply of media and / or power. In particular, the movable device 10 can be moved in a transport direction T as exemplarily indicated by the double arrow in Figure 1 In the present disclosure, a “supply arrangement for supplying a movable device in a vacuum processing system” can be understood as an arrangement configured for supplying a device which is moved within a vacuum environment of a vacuum processing system.

[0032] In the present disclosure, a "vacuum processing system" can be understood as a processing system configured for processing a substrate, in particular a large area substrate, under vacuum conditions. In particular, a "vacuum processing system" can be understood as a processing system having at least one deposition source for material deposition, in particular deposition of organic material, on a large area substrate, e.g. for OLED display manufacturing.

[0033] The term "vacuum" as used herein can be understood in the sense of a technical vacuum having a vacuum pressure of less than, for example, 10 mbar. Typically, the pressure in a vacuum chamber as described herein can be between 10 -5 mbar and about 10 -8 mbar, more typically between 10 -5 mbar and 10 -7 mbar, and even more typically between about 10 -6 mbar and about 10 -7 mbar.

[0034] In the present disclosure, the term "substrate" or "large area substrate" as used herein shall in particular encompass inflexible substrates, e.g. glass plates and metal plates. However, the present disclosure is not limited thereto and the term "substrate" can also encompass flexible substrates, such as a web or a foil. According to some embodiments, the substrate can be made of any material suitable for material deposition. For example, the substrate can be made of a material selected from the group consisting of glass (e.g. soda lime glass, borosilicate glass, etc.), metal, polymer, ceramic, compound material, carbon fiber material, mica or any other material or combination of materials which can be coated by a deposition process.

[0035] In the present disclosure, a "large area substrate" can be understood as a substrate having a main surface with an area of 0.5 m 2 or more, in particular 1 m 2 or more. In some embodiments, the large area substrate can be a Gen 4.5 (corresponding to about 0.67 m 2 substrate (0.73 m x 0.92 m)), a Gen 5 (corresponding to about 1.4 m 2 substrate (1.1 m x 1.3 m)), a Gen 7.5 (corresponding to about 4.29 m 2 substrate (1.95 m x 2.2 m)), a Gen 8.5 (corresponding to about 5.7 m 2 substrate (2.2 m x 2.5 m)) or even a Gen 10 (corresponding to about 8.7 m 2substrates (2.85 m x 3.05 m). Even higher generations, such as the 11th and 12th generation, and corresponding substrate areas can be implemented analogously. For example, for OLED display manufacturing, half size of substrates of the above generations, including the 6th generation, can be coated by evaporation of the equipment for evaporating the material. The half size of the generation substrates can result from some processes performed on full substrate size, and subsequent processes performed on the half of the previously processed substrate.

[0036] In the present disclosure, the "articulated arm feedthrough system" can be understood as a system having at least two arms connected to each other via a joint, wherein a feedthrough is provided between two ends of the system, i.e. from one end to the other end. Thus, the at least two arms and the joint are configured for providing the feedthrough. Thus, the "feedthrough system for one or more supply lines" can be understood as a system configured for providing a passage for the supply lines through the main components of the system, e.g. the at least two arms and the joint. In other words, the connection arm feedthrough is configured for guiding one or more supply lines from the environment of the vacuum chamber, e.g. through the wall of the vacuum chamber, to the movable device arranged within the vacuum chamber. Further, typically, the articulated arm feedthrough system is configured for providing atmospheric conditions inside the articulated arm feedthrough system. In other words, during operation, e.g. using the articulated arm feedthrough system in a vacuum processing chamber, atmospheric conditions are provided in the inner space of the articulated arm feedthrough system. Thus, it can be beneficial to provide one or more supply lines for supplying the movable device in the atmospheric environment inside the articulated arm feedthrough system. Thus, contamination of the vacuum side, i.e. the interior of the vacuum processing chamber in which the articulated arm feedthrough system is arranged, by friction of the raw material and the supply lines can be avoided. Further, "non-vacuum materials" can be used for the supply lines, whereby material costs can be reduced.

[0037] In the present disclosure, the "supply line" can be understood as a supply line configured for transmitting at least one of power, media and signals. Thus, the one or more supply lines can comprise one or more selected from the group consisting of: a supply line for electrical power supply; a supply line for compressible fluid, i.e. gas; a supply line for incompressible fluid, e.g. cooling liquid; a communication line, i.e. for transmitting signals and / or data; and other supply lines for supplying media or energy to the movable device. Thus, typically, the supply line comprises a cable and / or a tube and / or a hose.

[0038] In the present disclosure, a "force compensation unit" can be understood as a unit or device configured to provide a force compensation. In particular, the compensation unit is configured to provide a counter force with respect to the force to be compensated. Thus, a force compensation unit for compensating a moment of force can be understood as a unit configured to compensate a moment of force of a force about a turning point (e.g. an axis of a joint). In the present disclosure, the term "moment of force" is to be understood as a moment of force (or torque) of a force about a turning point is the force multiplied by the perpendicular distance from the turning point to the force.

[0039] In the present disclosure, the moment of force about the first rotational axis of the first joint M caused by the gravitational force of the articulated arm feedthrough system can also be referred to as gravitational moment.

[0040] Figure 2A A schematic side view of the supply arrangement according to embodiments described herein is shown in a retracted position, and Figure 2B A supply arrangement is shown in an extended position. In particular, Figure 2A and Figure 2B A situation is shown in which the articulated arm feedthrough system 105 has been moved from a first position xi to a second position x2 along a transport direction T. As Figure 2A and Figure 2B Exemplarily shown, generally, the articulated arm feedthrough system 105 comprises a first arm 110 and a second arm 120. The first arm 110 is connected with the second arm 120 via a second joint 132. In particular, as Figure 3 Exemplarily shown, the second end 112 of the first arm 110 is connected to the second joint 132 and the first end 121 of the second arm 120 is connected to the second joint 132. Thus, the second joint 132 is arranged between the first arm 110 and the second arm 120. The second joint 132 has a second rotational axis R2. Generally, the second rotational axis R2 is parallel to the first rotational axis R1 of the first joint 131. In particular, the first rotational axis R1 and the second rotational axis R2 can be horizontal.

[0041] From Figure 2A and Figure 2B It is to be understood that the inclination angle a between the first arm 110 and the second arm 120 increases, i.e. a2> ai, when the articulated arm feedthrough system 105 is extended (e.g. from the first position xi to the second position x2). In addition, it is to be understood that the gravitational moment M about the first rotational axis R1 of the first joint 131 increases, i.e. M2> Mi, when the articulated arm feedthrough system 105 is extended. Thus, it is to be understood that the force compensation unit 140 can be configured to compensate the variable moment of force M about the first rotational axis R1 of the first joint 131. For example, the first gravitational moment Mi can be compensated by a first compensation moment M 1C and the second gravitational moment M2may be compensated by a second compensation moment M 2C (M 2C > M 1C). In the present disclosure, the compensation torque M C may be understood as at least partially compensating the gravitational torque M. Typically, the compensation torque M C compensates at least 50% (M C >-0.5 x M), in particular at least 70% (M C >-0.7 x M), more particularly at least 90% (M C >-0.9 x M), or even 100% (M C =-M).

[0042] According to embodiments, which can be combined with any other embodiments described herein, the first arm 110 and the second arm 120 comprise an inner space providing a passage for the supply line. In other words, the first arm 110 and the second arm 120 are typically hollow such that a feedthrough for the supply line is provided. Thus, typically, the second joint 132 connecting the first arm 110 and the second arm 120 is configured for providing a passage for the supply line from the first arm to the second arm. The supply line 11 is schematically shown as a dashed line in Figure 3 .

[0043] According to embodiments, which can be combined with any other embodiments described herein, the articulated arm feedthrough system 105 comprises a connector device 150 for connecting the articulated arm feedthrough system 105 with the movable device 10, as Figure 3 schematically shown. The connector device 150 is connected via a third joint 133 to the second end 102 of the articulated arm feedthrough system 105, in particular to the second end 122 of the second arm 120. In particular, the third joint 133 has a third rotation axis R3. Typically, the third rotation axis R3 is parallel to the first rotation axis R1 and the second rotation axis R2. Thus, typically, the third rotation axis R3 is horizontal.

[0044] As Figure 3 schematically shown, according to embodiments, which can be combined with any other embodiments described herein, the first joint 131, the second joint 132 and the third joint 133 are part of the articulated arm feedthrough system 105. Thus, the first joint 131, the second joint 132 and the third joint 133 are typically configured for providing a passage for the supply line. In other words, the first joint 131, the second joint 132 and the third joint 133 are configured for providing a feedthrough for the supply line.

[0045] As Figure 4 schematically described with reference to Figure 5 , according to embodiments, which can be combined with any other embodiments described herein, the force compensation unit 140 comprises at least one force application device 143. In addition, typically, the force compensation unit 140 is connected via a lever arm element 145 to the first end 101 of the articulated arm feedthrough system 105, asFigure 4 and Figure 5 Shown exemplarily.

[0046] According to an embodiment, which can be combined with any other embodiment described herein, the force compensation unit 140 comprises a tensioning system 141 for force compensation, such as Figure 4 As shown exemplarily, the tension force system may be understood as a system for applying tension to compensate for the gravity moment M about the first rotation axis R1 of the first joint 131. The tension force may also be referred to as pulling force.

[0047] For example, the tension system 141 may include at least one force applying device 143. Typically, the at least one force applying device 143 is coupled to the first end 101 of the articulated arm feedthrough system 105, in particular the first end 111 of the first arm 110. In particular, as Figure 4 As shown exemplarily, at least one force applying device 143 is coupled to the first end 101 of the articulated arm feedthrough system 105 via a lever arm element 145. In particular, the lever arm element 145 may be symmetrical about the first rotation axis R1. According to an example, at least one force applying device 143 may be coupled to the lever arm element 145 via a rope 144. Figure 4 As shown exemplarily, the rope is typically guided on rollers 146, in particular guide rollers or deflection rollers. Alternatively, the at least one force application device 143 can be coupled to the lever arm element 145 via a rigid force transmitting element, such as a rod or bar (not explicitly shown).

[0048] It should be understood that according to an embodiment, which can be combined with any other embodiment described herein, the at least one force applying device 143 is configured to provide the compensation force Fc. In particular, the at least one force applying device 143 can be selected from the group consisting of: a mechanical force applying device, in particular a spring element; an electric force applying device, a hydraulic force applying device, and a pneumatic force applying device.

[0049] For example, reference Figure 5 According to an embodiment, which can be combined with any other embodiment described herein, the force compensation unit 140 includes a pressure system 142 for force compensation. The pressure system can be understood as a system configured to apply a compressive force to compensate for the gravity moment M about the first rotation axis R1 of the first joint 131.

[0050] like Figure 5 As shown exemplarily, the pressure system 142 generally includes at least one force application device 143 . Figure 5 An example is shown having two force applying devices 143. For example, the two force applying devices 143 may be arranged point-symmetrically with respect to the first rotation axis R1.

[0051] Similarly, as in the case of the tension system, in the case of the pressure system 142, the at least one force application device 143 can be coupled, e.g. via a lever arm element 145, with the first end 101 of the joint arm feedthrough system 105, in particular the first end 111 of the first arm 110. Typically, the lever arm element 145 is symmetrical with respect to the first rotation axis R1, as Figure 5 is exemplarily shown. According to examples, the at least one force application device 143 can be directly coupled to the lever arm element 145. Alternatively, the at least one force application device 143 can be coupled to the lever arm element 145 via a rigid force transmission element such as a rod or a bar (not explicitly shown). Further, as Figure 5 is shown, the force compensation unit 140 can comprise a counterweight 147 which can be beneficial in terms of force balancing.

[0052] is exemplarily shown. According to examples, the at least one force application device 143 can be directly coupled to the lever arm element 145. Alternatively, the at least one force application device 143 can be coupled to the lever arm element 145 via a rigid force transmission element such as a rod or a bar (not explicitly shown). Further, as Figure 6 is exemplarily shown. According to examples, the at least one force application device 143 can be directly coupled to the lever arm element 145. Alternatively, the at least one force application device 143 can be coupled to the lever arm element 145 via a rigid force transmission element such as a rod or a bar (not explicitly shown). Further, as

[0053] As Figure 6 is shown, the winding roller 160 can be a hollow cylinder, the winding roller 160 having an opening for feeding the one or more supply lines 11 into the hollow cylinder. From the interior of the hollow cylinder, the one or more supply lines 11 can be fed into the second arm 102 of the joint arm feedthrough system 105.

[0054] is exemplarily shown. According to examples, the at least one force application device 143 can be directly coupled to the lever arm element 145. Alternatively, the at least one force application device 143 can be coupled to the lever arm element 145 via a rigid force transmission element such as a rod or a bar (not explicitly shown). Further, asFigure 6 According to embodiments, which can be combined with any other embodiments described herein, the supply line winding roller 160 can comprise a tension relief fixture 161 for one or more supply lines 11. In particular, it is to be understood that the one or more supply lines 11 can be fixed to the tension relief fixture 161 such that a tension on the one or more supply lines 11 can be reduced or even avoided when the articulated arm feedthrough system is extended and retracted. In particular, the tension relief fixture 161 can be connected to an outer surface of the supply line winding roller 160. Thus, the tension relief fixture 161 can be part of the supply line winding roller 160. It is to be understood that the tension relief fixture 161 provided at the supply line winding roller 160 can serve as a carrier for the rotational movement of the one or more supply lines. In addition, as Figure 6 illustratively shown, a further tension relief fixture 162 can be provided. In particular, the further tension relief fixture 162 can be fixed to the separate compartment 165, e.g. at the connection of the first arm 110 and the separate compartment 165, to accommodate the supply line winding roller 160.

[0055] The further tension relief fixture 162 can be beneficial to prevent a tension of the one or more supply lines caused by gravity.

[0056] It is to be understood that according to embodiments, which can be combined with any other embodiments described herein, a tension relief fixture as illustratively described with reference to the Figure 6 second joint 132 can be provided at the first joint 131 and / or the third joint 133 with necessary modifications.

[0057] According to embodiments, which can be combined with any other embodiments described herein, the articulated arm feedthrough system 105 comprises a separate compartment 165 for accommodating the supply line winding roller 160, as Figure 6 illustratively shown. For example, the separate compartment 165 is generally provided at the second joint 132. Although not explicitly shown, it is to be understood that in case the supply line winding roller is provided at the first joint 131 and / or the third joint 133, a separate compartment for the respective supply line winding roller can be provided at the first joint 131 and / or the third joint 133.

[0058] illustratively with reference to Figure 7 According to embodiments, which can be combined with any other embodiments described herein, the articulated arm feedthrough system 105 is provided with a magnetic liquid rotary seal 170 at the rotary joint of the articulated arm feedthrough system 105. In particular, the first joint 131 and / or the second joint 132 and / or the third joint 133 can be provided with the magnetic liquid rotary seal 170. Providing the magnetic liquid rotary seal can be beneficial to reduce particles during movement of the articulated arm feedthrough system 105.

[0059] According to embodiments, which can be combined with any other embodiments described herein, the first arm 110 and / or the second arm 120 can consist of two or more arm elements, in particular elongated hollow arm elements such as tubes. Figure 7 An example is shown, in which the second arm 120 comprises three arm elements. As Figure 7 Exemplarily shown, the individual arm elements can be connected via bellows 175. In particular, the bellows 175 can be provided with a stiffening plate. Providing a bellows with a stiffening plate can be beneficial to compensate manufacturing and installation tolerances of the system perpendicular to the movement along the transport direction T, in particular by simultaneously transferring the gravitational force in the direction of movement to the force compensation unit.

[0060] Exemplarily referring to Figure 8 A vacuum processing system 200 according to the present disclosure is described. According to embodiments, which can be combined with any other embodiments described herein, the vacuum processing system 200 comprises a vacuum processing chamber and a movable device 10 arranged in the vacuum processing chamber 210. In particular, the vacuum processing chamber 210 is adapted to process a substrate as described herein. Further, the vacuum processing system 200 comprises a supply arrangement 100 for supplying the movable device 10.

[0061] A first end 101 of the supply arrangement 100 is stationary, in particular to a wall of the vacuum processing system 200, and a second end 102 of the supply arrangement 100 is connected to the movable device 10. The supply arrangement 100 comprises an articulated arm feedthrough system 105 for providing one or more supply lines to the movable device 10. Additionally, the supply arrangement 100 comprises a force compensation unit 140 for compensating a moment M around a first axis of rotation R1 of a first joint 131 arranged at the first end 101 of the articulated arm feedthrough system 105. The moment M is caused by a gravitational force of the articulated arm feedthrough system 105. It is to be understood that the supply arrangement 100 of the vacuum processing system 200 is generally a supply arrangement 100 according to any embodiment described herein.

[0062] Exemplarily referring to Figure 8 According to embodiments, which can be combined with any other embodiments described herein, the vacuum processing system 200 comprises a device 230 for non-contact transport of the movable device.

[0063] In the present disclosure, a "device for contactless transportation of a device" can be understood as a device configured for contactlessly transporting a movable device using magnetic levitation. The term "contactless" as used in the present disclosure can be understood in the sense that the weight of the device is not held by mechanical contact or mechanical force but by magnetic force. In particular, the device is held in a levitated or floating state using magnetic force instead of mechanical force. For example, the device for contactless transportation can be free of mechanical elements such as mechanical rails to support the weight of the device during transportation. In some embodiments, there is no mechanical contact between the movable device and the rest of the device at all during movement of the device.

[0064] The contactless transportation of the movable device according to the embodiments described herein is beneficial in that no particles are generated during transportation of the device due to mechanical contact between the movable device and components of the device for contactless transportation such as mechanical rails. Thus, particle generation can be minimized when using contactless transportation, thereby enabling a higher quality of processing results.

[0065] According to embodiments, which can be combined with any other embodiments described herein, the device for contactless transportation 230 comprises one or more active magnetic units 232 configured to provide a magnetic levitation force F L The magnetic transportation device 231 levitates the movable device 10. Typically, the magnetic levitation force F L The weight G of the movable device 10 can be at least partially counteracted. Typically, the magnetic transportation device 231 comprises one or more active magnetic units 232 and a magnetic guidance structure 233.

[0066] In the present disclosure, an "active magnetic unit" can be understood as a magnetic unit adapted to generate a magnetic field, in particular an adjustable magnetic field, to provide a corresponding magnetic levitation force acting on a device to be levitated and / or to be transported. For example, the adjustable magnetic field can be dynamically adjusted during operation of the device for contactless transportation. According to embodiments, which can be combined with any other embodiments described herein, the one or more active magnetic units are configured to generate a magnetic field to provide a magnetic levitation force extending along a vertical direction. In addition, the one or more active magnetic units can be configured to provide a magnetic force extending along a lateral direction, in particular along the transportation direction T, as exemplarily shown in Fig. 1. Figure 8 For example, the one or more active magnetic units can be or comprise an element selected from the group consisting of: an electromagnetic device; a solenoid; a coil; a superconducting magnet; or any combination thereof

[0067] Generally, the magnetic guiding structure 233 of the magnetic transportation arrangement 231 is configured and arranged such that an interaction between the adjustable magnetic field of the one or more active magnetic units 232 and the magnetic properties of the magnetic guiding structure 233 can be provided. Thus, a contactless levitation and / or transportation of the movable device can be provided by the magnetic interaction between the one or more active magnetic units 232 and the magnetic guiding structure 233.

[0068] It is to be understood that the magnetic guiding structure 233 is configured for a contactless guiding of the movement of the movable device. The magnetic guiding structure 233 can be a static guiding structure which can be statically arranged in the vacuum processing chamber 210. In particular, the magnetic guiding structure 233 can be made of a magnetic material, e.g. ferromagnetic, in particular ferromagnetic steel. Thus, the guiding structure can be or comprise a passive magnetic unit. The term “passive magnetic unit” is used herein to distinguish from the concept of an “active” magnetic unit or element. A passive magnetic unit or element can refer to a unit or element having a magnetism which is not actively controlled or adjusted. For example, a passive magnetic unit or element can be adapted to generate a magnetic field, e.g. a static magnetic field. A passive magnetic unit or element can not be configured for generating an adjustable magnetic field. Generally, a passive magnetic unit or element can be a permanent magnet or have permanent magnetic properties.

[0069] It is to be understood that the combination of the one or more active magnetic units 232 and the magnetic guiding structure 233 provides a drive system which is configured for a contactless movement of the movable device 10 in the transportation direction T. In particular, the one or more active magnetic units 232 and the magnetic guiding structure 233 can be configured to provide a linear electromagnetic motor.

[0070] According to embodiments which can be combined with any other embodiments described herein, the movable device 10 comprises a deposition source 215 for depositing a material on a substrate. For example, the deposition source 215 can comprise an evaporation crucible in fluid communication with a distribution assembly for providing an evaporation material to the substrate.

[0071] In particular, generally, the deposition source 215 can be mounted to a support 216. For example, the support 216 can be a source cart. As Figure 8 Exemplarily shown, the one or more active magnetic units 232 can be arranged at a bottom of the support 216 facing the magnetic guiding structure 233.

[0072] Figure 9 A schematic top view of a vacuum processing system according to further embodiments described herein is shown. Exemplarily reference is made to Figure 9 According to embodiments which can be combined with any other embodiments described herein, the force compensation unit 140 is arranged in an atmospheric compartment 220. In particular, the atmospheric compartment 220 is connected to an outer wall of a vacuum chamber of the vacuum processing system.

[0073] According to embodiments, which can be combined with any of the other embodiments described herein, the vacuum processing system 200 further comprises a substrate carrier 240 for carrying a substrate as described herein. In some implementations, a first track arrangement 241 is provided, which is configured for transporting the substrate carrier 240. Additionally, a second track arrangement 242 can be provided, which is configured for transporting a mask carrier 250.

[0074] Additionally, as Figure 9 Exemplarily shown, the vacuum processing system 200 can comprise at least one further chamber 211 having a transportation arrangement. The at least one further chamber 211 can be a rotation module, a transfer module or a combination thereof. As Figure 9 Exemplarily shown, a deposition source 215 can be provided in the vacuum processing chamber 210. The deposition source 215 can be provided on a track or linear guide 235. The linear guide 235 can be configured for a translational movement of the deposition source 215. Additionally, a driver for providing the translational movement of the deposition source 215 can be provided. In particular, a device 230 for non-contact transportation as described can be provided to move the deposition source 215.

[0075] Exemplarily referring to Figure 9 According to embodiments, which can be combined with any of the other embodiments described herein, the support 216, i.e. the source cart, supports the evaporation crucible 212 and the distribution assembly 213 provided above the evaporation crucible 212. Thus, the vapor generated in the evaporation crucible 212 can move upwards and out of one or more outlets of the distribution assembly. Thus, the distribution assembly is configured for providing the evaporated organic material, in particular the plume of evaporated source material, from the distribution assembly to the substrate.

[0076] As Figure 9 Exemplarily shown, the vacuum processing chamber 210 can have gate valves 217, via which the vacuum processing chamber can be connected to an adjacent further chamber 211, e.g. a transport module or an adjacent service module. In particular, the gate valves 217 allow for a vacuum tight connection to the adjacent further chamber and can be opened and closed to move a substrate and / or a mask into or out of the vacuum processing chamber.

[0077] Exemplarily referring to Figure 6According to embodiments which can be combined with any other embodiments described herein, two substrates, e.g. the first substrate 1A and the second substrate 1B, can be carried by respective substrate carriers 240. The respective substrate carriers are typically supported by respective transportation tracks, e.g. the first track arrangement 241. In addition, a mask carrier 250 can be provided. For example, the mask carrier can carry an edge exclusion mask or a shadow mask. The respective mask carrier is typically supported by respective transportation tracks, e.g. the second track arrangement 242. Figure 9 A first mask 2A corresponding to the first substrate 1A and a second mask 2B corresponding to the second substrate 1B are shown.

[0078] With exemplary reference to Figure 10 a block diagram, a method 300 of supplying in a vacuum processing system 200 to a movable device 10 is described according to the present disclosure. According to embodiments which can be combined with any other embodiments described herein, the method 300 comprises providing (indicated by block 310 in Figure 10 ) one or more supply lines connected to the movable device 10 by guiding the one or more supply lines through a joint-arm feedthrough system 105 of a supply arrangement 100. In addition, the method comprises compensating (indicated by block 320 in Figure 10 ) a moment M of force around a first axis of rotation R1 of a first joint 131 provided at a first end 101 of the joint-arm feedthrough system 105 by using a force compensation unit 140. The moment M is caused by a gravitational force of the joint-arm feedthrough system 105.

[0079] According to embodiments of the method 300 which can be combined with any other embodiments described herein, the supply arrangement employed in the method 300 is the supply arrangement 100 according to any embodiments described herein. In addition, it is to be understood that typically, the vacuum processing system 200 according to any embodiments described herein is used for the method 300 of supplying to the movable device 10.

[0080] While the foregoing is directed to implementations of the present disclosure, other and further implementations of the disclosure can be devised without departing from the basic scope thereof, and the scope of the present disclosure is determined by the claims that follow.

[0081] In particular, this written description uses examples to disclose the disclosure, including the best mode, and also to enable any person skilled in the art to practice the described subject matter, including making and using any devices or systems and performing any incorporated methods. Although specific embodiments have been disclosed herein, mutual combinations of features of the embodiments described above can be combined with each other. The scope of patent protection is defined by the claims, and other examples are contemplated within the scope of the claims, as long as the claims have structural elements that are not different from the literal language of the claims, or as long as the claims include equivalent structural elements that are not materially different from the literal language of the claims.

Claims

1. A supply arrangement (100) for supplying a movable device (10) in a vacuum processing system, comprising: - an articulated arm feedthrough system (105) for providing one or more supply lines to the movable device (10), and - a force compensation unit (140) for compensating a moment (M) about a first rotation axis (R1) of a first joint (131) arranged at a first end (101) of the articulated arm feedthrough system (105), the force compensation unit being configured to provide a reaction force to the moment relative to the force to be compensated, the moment (M) being caused by the weight of the articulated arm feedthrough system (105).

2. A supply arrangement (100) as claimed in claim 1, wherein the articulated arm feedthrough system (105) comprises a first arm (110) and a second arm (120), the first arm (110) and the second arm (120) being connected via a second joint (132) providing a second rotation axis (R2), the second rotation axis (R2) being parallel to the first rotation axis (R1).

3. A supply arrangement (100) as claimed in claim 2, wherein the articulated arm feedthrough system (105) comprises a connector device (150) for connecting the articulated arm feedthrough system (105) to the movable device (10), the connector device (150) being connected to the second end (102) of the articulated arm feedthrough system (105) via a third joint (133).

4. The supply arrangement of claim 3, wherein the third joint (133) provides a third rotation axis (R3) parallel to the first rotation axis (R1) and the second rotation axis (R2).

5. The supply arrangement (100) of claim 1, wherein the force compensation unit (140) comprises a pressure system for force compensation.

6. The supply arrangement (100) of claim 1, wherein the force compensation unit (140) comprises a tensioning system for force compensation.

7. The supply arrangement (100) according to any one of claims 1 to 6, wherein the force compensation unit (140) comprises at least one force applying device (143) selected from the group consisting of: a mechanical force applying device, an electric force applying device, a hydraulic force applying device and a pneumatic force applying device.

8. The supply arrangement (100) of any one of claims 1 to 6, wherein the force compensation unit (140) is connected to the first end (101) of the articulated arm feed-through system (105) via a lever arm element (145).

9. The supply arrangement (100) according to any one of claims 1 to 6, wherein the articulated arm feedthrough system (105) comprises a supply line winding roller (160), which is provided at a joint of the articulated arm feedthrough system (105).

10. The supply arrangement (100) of claim 9, wherein the supply line winding roller (160) comprises a tension relief fixture (161) for the one or more supply lines.

11. The supply arrangement (100) of claim 9, wherein the articulated arm feed-through system (105) includes a separate compartment (165) for housing the supply line winding roll (160).

12. The supply arrangement (100) according to any one of claims 1 to 6, wherein the articulated arm feedthrough system (105) is provided with a magnetic liquid rotary seal at a rotary joint of the articulated arm feedthrough system (105).

13. A vacuum processing system (200) for processing a substrate, comprising: - Vacuum processing chamber (210); - a movable device (10), the movable device (10) being arranged in the vacuum processing chamber (210); and a supply arrangement (100) for supplying the movable device (10), a first end (101) of the supply arrangement (100) being fixed and a second end (102) of the supply arrangement (100) being connected to the movable device (10), the supply arrangement (100) comprising: - an articulated arm feedthrough system (105) for providing one or more supply lines (11) to the movable device (10), and - a force compensation unit (140) for compensating a moment (M) about a first rotation axis (R1) of a first joint (131) arranged at the first end (101) of the articulated arm feedthrough system (105), the force compensation unit being configured to provide a reaction force to the moment relative to the force to be compensated, the moment (M) being caused by the weight of the articulated arm feedthrough system (105).

14. The vacuum processing system (200) of claim 13, wherein the force compensation unit (140) is disposed in an atmospheric compartment (220) connected to an outer wall of a vacuum chamber of the vacuum processing system.

15. The vacuum processing system (200) according to claim 13, further comprising a device for contactless transport (230) of the movable device (10).

16. A method (300) of supplying a movable device (10) in a vacuum processing system (200), the method comprising: - providing (310) connection to the one or more supply lines to the movable device (10) by guiding the one or more supply lines through an articulated arm feed-through system (105) of the supply arrangement (100), and - Compensating (320) a moment (M) about a first rotation axis (R1) of a first joint (131) provided at a first end (101) of the articulated arm feedthrough system (105) by using a force compensation unit (140), the force compensation unit being configured to provide a reaction force to the moment relative to the force to be compensated, the moment (M) being caused by the weight of the articulated arm feedthrough system (105).

17. The method (300) of claim 16, wherein the vacuum processing system (200) is a vacuum processing system (200) according to any one of claims 13 to 15.

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