A high-throughput preparation device for thin film material samples

Abstract

The present invention provides a high-throughput preparation device for thin film material samples, comprising: a shell, a material release device, a base, a fixed mask plate and a movable mask plate; the material release device is arranged in the inner cavity of the shell to release gaseous atoms of the deposition material into the inner cavity, the base has a receiving surface located in the inner cavity; the fixed mask plate is fixedly connected to the receiving surface, a deposition hole with an axis and the receiving surface is arranged on the fixed mask plate, the movable mask plate body is attached to the surface of the fixed mask plate facing away from the base, a flow hole corresponding to the deposition hole is arranged on the movable mask plate, and the gaseous atoms in the inner cavity can enter the deposition hole through the flow hole and be deposited on the deposition surface in the deposition hole. It not only has a simple structure and low manufacturing cost, but also meets the requirements of miniaturized design, and also has the advantage of being easy to operate.

Description

Technical Field

[0001] The present invention relates to the technical fields of high-precision thermoelectric material patterning design and preparation in micro-nano devices such as thin-film thermoelectric devices, and in particular to a high-throughput preparation device for thin-film material samples. Background Art

[0002] Among the methods for rapid screening of thin film materials, high-throughput preparation methods based on the multi-element discrete mask method can obtain high-throughput thin film samples with a large span of micro-region composition, greatly improving the efficiency of material discovery and optimization. Most of the high-throughput preparation systems based on the multi-element discrete mask method reported so far cannot rotate the mask and the sample stage synchronously during the thin film deposition process. Therefore, it is necessary to use post-processing methods such as annealing after the deposition process to promote the uniform diffusion of elements in the micro-region to obtain a uniform sample micro-region, and the experimental steps are complicated. The few high-throughput preparation systems that do not require post-processing often introduce complex mask switching and alignment systems, and require the customization of large-scale dedicated vapor deposition equipment. The equipment is large in size, high in cost, and complex to operate, which limits the application of high-throughput screening methods. Summary of the invention

[0003] The purpose of the present invention is to provide a high-throughput preparation device for thin film material samples, which not only has a simple structure and low production cost, but also realizes the requirements of miniaturized design and is easy to operate.

[0004] To achieve the above object, the technical solution adopted by the present invention is:

[0005] A high-throughput preparation device for thin film material samples, comprising: a housing, a material release device, a base, a fixed mask plate and a movable mask plate;

[0006] The material release device is arranged in the inner cavity of the shell, and is used to release gaseous atoms of the deposition material into the inner cavity, and the base has a receiving surface located in the inner cavity;

[0007] The fixed mask plate is fixedly connected to the receiving surface, and a deposition hole is arranged on the fixed mask plate. The movable mask plate body is attached to the surface of the fixed mask plate facing away from the base, and a flow hole corresponding to the deposition hole is arranged on the movable mask plate. The gas phase atoms in the inner cavity can enter the deposition hole through the flow hole and be deposited on the deposition surface in the deposition hole.

[0008] Preferably, it also includes a driving mechanism;

[0009] The flow holes include a first flow hole, a second flow hole, ... an Nth flow hole, wherein N is an integer greater than 2;

[0010] The driving mechanism is in driving connection with the movable mask plate, and is used to drive the movable mask plate to switch between any two positions of a first position, a second position, ... an Nth position relative to the fixed mask plate on the surface of the fixed mask plate;

[0011] When the movable mask is located at a first position, the first flow hole corresponds to the deposition hole, when the movable mask is located at a second position, the second flow hole corresponds to the deposition hole, ... when the movable mask is located at an Nth position, the Nth flow hole corresponds to the deposition hole.

[0012] Preferably, the number of the deposition holes is more than two;

[0013] The number of the first flow holes is more than two and less than the number of the deposition holes, and when the movable mask is located at the first position, the more than two first flow holes correspond one-to-one to the same number of the deposition holes respectively;

[0014] The number of the second flow holes is more than two and less than the number of the deposition holes, and when the movable mask is located at the second position, the more than two second flow holes correspond one-to-one to the same number of the deposition holes respectively;

[0015] …

[0016] The number of the Nth flow holes is more than two and less than the number of the deposition holes. When the movable mask is located at the Nth position, the more than two Nth flow holes correspond one-to-one to the same number of the deposition holes.

[0017] Preferably, the driving mechanism comprises: a power device, a driving wheel and a bearing tray;

[0018] The power device is in driving connection with the driving wheel, and the supporting tray is fixedly connected with the driving wheel;

[0019] The receiving plate is in a circular ring shape, and two end faces of the receiving plate perpendicular to the axial direction are respectively a first end face facing the fixed mask plate and a second end face facing the driving wheel, and the movable mask plate is clamped on the first end face.

[0020] Preferably, the movable mask plate is circular and has a snap-fitting protrusion on the edge, and a circular accommodating groove is provided on the first end face, the axis of which coincides with the axis of the supporting tray and matches the movable mask plate, and a snap-fitting groove is provided on the inner wall of the accommodating groove. The movable mask plate is arranged in the accommodating groove and snap-fitted in the snap-fitting groove through the snap-fitting protrusion.

[0021] Preferably, it further comprises a first connecting component;

[0022] The first connecting component includes a first connecting portion, a second connecting portion and a clamping portion which are fixedly connected in sequence, the first connecting portion is detachably connected to the driving wheel, the second connecting portion passes through the supporting tray, and the clamping portion is clamped in the clamping slot.

[0023] Preferably, it also includes a slip ring, a positioning plate and a second connecting component;

[0024] The slip ring has an inner hole matching the shape of the bearing tray, and is sleeved on the bearing tray through the inner hole. The positioning plate is in a circular shape. The positioning plate is located on the side of the bearing tray facing away from the fixed mask plate, and the axis thereof coincides with the axis of the bearing tray. The slip ring and the positioning plate are both connected to the fixed mask plate through the second connecting component.

[0025] The positioning plate has a positioning end surface facing the second end surface, a first ratchet tooth is provided on the positioning end surface, and a second ratchet tooth is provided on the second end surface, the first ratchet tooth interacts with the second ratchet tooth to allow the bearing plate to rotate relative to the positioning plate in a first direction and prevent the bearing plate from rotating in a second direction opposite to the first direction.

[0026] Preferably, the first ratchet tooth has a first inclined surface forming an acute angle with the positioning end surface and a first vertical surface perpendicular to the positioning end surface, and the second ratchet tooth has a second inclined surface forming an acute angle with the second end surface and a second vertical surface perpendicular to the positioning end surface;

[0027] When the tray is rotated in a first direction, the first inclined surface abuts against the second inclined surface; when the tray is rotated in a second direction, the first vertical surface abuts against the second vertical surface.

[0028] Preferably, the number of the first ratchet teeth is more than two, and the more than two first ratchet teeth are evenly arranged along the circumference of the positioning plate, and the number of the second ratchet teeth is equal to the number of the first ratchet teeth and corresponds one to one.

[0029] Preferably, the second connecting component comprises a threaded fastener and an elastic component;

[0030] The elastic component has a first through hole, the positioning plate is provided with a second through hole, the slip ring is provided with a third through hole, and the fixed mask plate is provided with a fourth through hole. The threaded fastener passes through the first through hole, the second through hole, the third through hole and the fourth through hole in sequence to connect the elastic component, the positioning plate, the slip ring and the fixed mask plate together in sequence.

[0031] Beneficial effects of the present invention:

[0032] (1) The high-throughput preparation device for thin film material samples of the present invention adopts the fixed mask plate to be fixedly connected to the receiving surface, the fixed mask plate is provided with a deposition hole, the movable mask plate body is attached to the surface of the fixed mask plate facing away from the base, and the movable mask plate is provided with a flow hole that can correspond to the deposition hole. The gas phase atoms of the deposition material in the inner cavity can enter the deposition hole through the flow hole and be deposited on the deposition surface in the deposition hole. The technical solution is not only simple in structure and low in manufacturing cost, but also meets the requirements of miniaturization design and has the advantage of easy operation. In addition, the present invention has good portability and can also be applied to high-throughput preparation methods of physical vapor deposition equipment such as electron beam evaporation and thermal evaporation; it can also be used independently and applied to high-throughput preparation by methods such as screen printing and spraying.

[0033] (2) The high-throughput preparation device for thin film material samples described in the present invention can achieve high-throughput preparation of materials by directly installing it on the existing thin film deposition equipment without increasing the volume of the equipment. The traditional preparation system requires the customization of a new thin film deposition equipment according to the functional requirements of the mask template switching, which is more expensive and has a longer equipment production cycle. The high-throughput preparation device of the present invention can be produced and put into use through simple machining, with low cost and short production cycle. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1 It is a schematic structural diagram of an embodiment of a high-throughput preparation device for thin film material samples of the present invention;

[0035] Figure 2 for Figure 1 Schematic diagram of a fixed mask plate in FIG.

[0036] Figure 3 for Figure 1 Schematic diagram of the active mask plate in FIG.

[0037] Figure 4 for Figure 1 A cross-sectional schematic diagram of a support tray in FIG.

[0038] Figure 5 for Figure 4 A top view of

[0039] Figure 6 for Figure 1 A magnified schematic diagram of the middle part;

[0040] Figure 7 for Figure 1 Schematic diagram of the connection state of the positioning plate, slip ring and fixed mask plate;

[0041] Figure 8 for Figure 1 Schematic diagram of the cross section of the positioning plate in.

[0042] In the figure: 1-shell; 2-material release device; 3-base; 4-fixed mask plate; 5-movable mask plate; 6-inner cavity; 7-deposition hole; 8-flow hole; 9-driving mechanism; 10-first flow hole; 11-second flow hole; 12-power device; 13-driving wheel; 14-supporting tray; 15-first end face; 16-second end face; 17-clamping protrusion; 18-accommodating groove; 19-clamping groove; 20-first connecting component; 21-second A connecting portion; 22-a second connecting portion; 23-a clamping portion; 24-a slip ring; 25-a positioning plate; 26-a second connecting component; 27-a positioning end face; 28-a first ratchet; 29-a second ratchet; 30-a first inclined surface; 31-a first vertical surface; 32-a second inclined surface; 33-a second vertical surface; 34-a threaded fastener; 35-an elastic component; 36-a first through hole; 37-a second through hole; 38-a third through hole; 39-a fourth through hole; 40-an inner hole. DETAILED DESCRIPTION

[0043] In order to make the purpose, technical solution and advantages of the present invention more clear, the high-throughput preparation device of the thin film material sample of the present invention is further described in detail below in conjunction with the drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention and are not used to limit the present invention.

[0044] like Figure 1 , 2 As shown in Figure 3, a high-throughput preparation device for thin film material samples includes: a shell 1, a material release device 2, a base 3, a fixed mask plate 4 and a movable mask plate 5. The material release device 2 is arranged in the inner cavity 6 of the shell 1 to release the gaseous atoms of the deposition material into the inner cavity 6. The base 3 has a receiving surface located in the inner cavity 6 (as shown in the figure). The fixed mask plate 4 is fixedly connected to the receiving surface, and a deposition hole 7 is arranged on the fixed mask plate 4. The movable mask plate 5 is attached to the surface of the fixed mask plate 4 facing away from the base 3. A flow hole 8 corresponding to the deposition hole 7 is arranged on the movable mask plate 5. The gaseous atoms of the deposition material in the inner cavity 6 can enter the deposition hole 7 through the flow hole 8 and be deposited on the deposition surface in the deposition hole 7. With such a technical solution, compared with the prior art, there is no need to customize a special vapor deposition equipment. It is not only simple in structure and low in manufacturing cost, but also meets the requirements of miniaturized design, and also has the advantage of easy operation. In actual operation, the inner cavity 6 of the housing 1 is in a vacuum state, and the material releasing device 2 can release gaseous atoms of the deposition material into the inner cavity 6 by using an ion rapid evaporation method.

[0045] Furthermore, if Figure 1 , 3As shown, the invention also includes a driving mechanism 9, and the flow holes 8 include a first flow hole 10, a second flow hole 11, ... an Nth flow hole, wherein N is an integer greater than 2. The driving mechanism is in driving connection with the movable mask plate 5, and is used to drive the movable mask plate 5 to switch between any two positions of the first position, the second position, ... the Nth position relative to the fixed mask plate 4 on the surface of the fixed mask plate 4. When the movable mask plate 5 is located at the first position, the first flow hole 10 corresponds to the deposition hole 7, when the movable mask plate 5 is located at the second position, the second flow hole 11 corresponds to the deposition hole 7, ... when the movable mask plate 5 is located at the Nth position, the Nth flow hole corresponds to the deposition hole 7. It should be noted that in actual work, the number of material release devices 2 can be multiple, so that gaseous atoms of deposition materials with different components can be released through each material release device 2 alone or in combination with several material release devices. For example, when the first flow hole 10 corresponds to the deposition hole 7, the gaseous atoms of the first deposition material can be deposited on the receiving surface through the deposition hole 7 to obtain the first sample, and when the second flow hole 11 corresponds to the deposition hole 7, the gaseous atoms of the second deposition material can be deposited on the receiving surface through the deposition hole 7 to obtain the second sample, ... When the Nth flow hole corresponds to the deposition hole 7, the gaseous atoms of the Nth deposition material can be deposited on the receiving surface through the deposition hole 7 to obtain the Nth sample. This makes it easy to compare and screen thin film samples with different components.

[0046] Preferably, Figure 2 , 3 As shown, the number of deposition holes 7 is more than two; the number of first flow holes 10 is more than two and less than the number of deposition holes 7, and when the movable mask plate 5 is in the first position, the two or more first flow holes 10 correspond one-to-one with the same number of deposition holes 7; the number of second flow holes 11 is more than two and less than the number of deposition holes 7, and when the movable mask plate 5 is in the second position, the two or more second flow holes 11 correspond one-to-one with the same number of deposition holes 7; ... The number of Nth flow holes is more than two and less than the number of deposition holes 7, and when the movable mask plate 5 is in the Nth position, the two or more Nth flow holes correspond one-to-one with the same number of deposition holes 7. In this way, thin film samples of different components can form different patterns. In this way, it is possible to screen thin film samples for specific application scenarios.

[0047] In actual production, Figure 1 , 6 As shown, the driving mechanism 9 includes: a power device 12, a driving wheel 13 and a tray 14. The power device 12 is connected to the driving wheel 13 by transmission (the connection between the two can be a belt drive, but is not limited to this), and the tray 14 is fixedly connected to the driving wheel 13. Figure 4 , 5As shown, the tray 14 is annular, and the two end faces of the tray 14 perpendicular to the axial direction are respectively a first end face 15 facing the fixed mask plate 4 and a second end face 16 facing the driving wheel 13, and the movable mask plate 5 is clamped on the first end face 15. Specifically, as Figure 3 As shown, the movable mask plate 5 is circular, and has a snap-on protrusion 17 on the edge. A circular receiving groove 18 is provided on the first end face 15, whose axis coincides with the axis of the receiving tray 14 and matches the movable mask plate 5. A snap-on groove 19 is provided on the inner wall of the receiving groove 18. The movable mask plate 5 is arranged in the receiving groove 18 and is snap-on in the snap-on groove 19 through the snap-on protrusion 17. In this way, the relative stability between the movable mask plate 5 and the receiving tray 14 can be ensured, and then the receiving tray 14 can effectively drive the movable mask plate 5 to rotate, avoiding relative displacement between the two. It should be noted that when the movable mask plate 5 is arranged in the receiving groove 18, the surface of the movable mask plate 5 facing the fixed mask plate 4 is in the same plane as the first end face, or protrudes from the receiving groove 18, and cannot be sunken in the receiving groove 18.

[0048] As an implementation method, Figure 6 As shown, it also includes a first connecting member 20. The first connecting member 20 includes a first connecting portion 21, a second connecting portion 22 and a clamping portion 23 that are fixedly connected in sequence. The first connecting portion 21 is detachably connected to the driving wheel 13, the second connecting portion 22 passes through the tray 14, and the clamping portion 23 is clamped in the clamping slot 19. The first connecting portion 21 can be fixed to the driving wheel by screws. In this way, the relative fixation between the driving wheel 13 and the tray 14 can be achieved, and it is also convenient to disassemble or install the two. In actual production, the first connecting portion 21, the second connecting portion 22 and the clamping portion 23 can be fixedly connected in sequence by welding, or can be made in one piece by bending. Specifically, the number of the clamping slots 19 is at least two, and at least two clamping slots 19 are evenly arranged along the circumference of the accommodating groove 18. The number of the clamping protrusions 17 is equal to the number of the clamping slots 19, and they correspond one to one. The number of the first connecting members 20 is equal to the number of the clamping slots 19, and they correspond one to one.

[0049] Furthermore, if Figure 1 , 7 As shown, it also includes a slip ring 24, a positioning plate 25 and a second connecting component 26. The slip ring 24 has an inner hole 40 that matches the shape of the tray 14, and is sleeved on the tray 14 through the inner hole 40. The positioning plate 25 is in a circular shape. The positioning plate 25 is located on the side of the tray 14 that is away from the fixed mask plate 4 and its axis coincides with the axis of the tray 14. The slip ring 24 and the positioning plate 25 are both connected to the fixed mask plate 4 through the second connecting component 26. Figure 8As shown, the positioning plate 25 has a positioning end surface 27 facing the second end surface 16, and a first ratchet tooth 28 is provided on the positioning end surface 27. Figure 4 As shown, there is a second ratchet 29 on the second end face 16, and the first ratchet 28 interacts with the second ratchet 29 to allow the tray to rotate relative to the positioning plate 25 in the first direction and prevent the tray 14 from rotating in the second direction opposite to the first direction. In this way, the movable mask plate 5 can be rotated relative to the fixed mask plate 4 by rotating the tray in the first direction relative to the tray 14. At the same time, when the base 3 drives the tray 14 to rotate in the first direction through the fixed mask plate 4 and the positioning plate 25 in turn, the tray 14 is prevented from rotating in the second direction relative to the positioning plate 25, thereby ensuring the stability of the movable mask plate 5 and the fixed mask plate 4 corresponding to each other. In actual production, the number of the first ratchet 28 is more than two, and the more than two first ratchet teeth 28 are evenly arranged along the circumference of the positioning plate 25. The number of the second ratchet teeth 29 is equal to the number of the first ratchet teeth 28 and corresponds one to one.

[0050] Specifically, Figure 8 As shown, the first ratchet tooth 28 has a first inclined surface 30 forming an acute angle with the positioning end surface 27 and a first vertical surface 31 perpendicular to the positioning end surface 27. Figure 4 As shown, the second ratchet 29 has a second inclined surface 32 that forms an acute angle with the second end surface 16 and a second vertical surface 33 that is perpendicular to the positioning end surface 27; when the tray 14 rotates in the first direction, the first inclined surface 30 abuts against the second inclined surface 32, and when the tray 14 rotates in the second direction, the first vertical surface 31 abuts against the second vertical surface 33. In this way, when the tray 14 rotates in the first direction, the first inclined surface 30 can slide relative to the second inclined surface 32, thereby realizing the rotation of the tray 14 relative to the positioning plate 24. Further, as Figure 7 As shown, the second connecting member 26 includes a threaded fastener 34 and an elastic member 35. The elastic member 35 has a first through hole 36, a second through hole 37 is provided on the positioning plate 25, a third through hole 38 is provided on the slip ring 24, and a fourth through hole 39 is provided on the fixed mask plate 4. The threaded fastener 341 passes through the first through hole 36, the second through hole 37, the third through hole 38 and the fourth through hole 39 in sequence, so as to connect the elastic member 35, the positioning plate 25, the slip ring 24 and the fixed mask plate 4 in sequence. In this way, when the first inclined surface 30 slides relative to the second inclined surface 32, the interaction between the two can drive the positioning plate 25 to compress the elastic member 35 and move in a direction away from the bearing plate 14. When the first inclined surface 30 passes over the second inclined surface 32, the positioning plate 25 moves in a direction close to the bearing plate 14 under the elastic force of the elastic member 35, so that the first ratchet 28 and the second ratchet 29 re-engage.

[0051] During specific production, the number of second through holes 37 is at least two, and at least two second through holes 37 are evenly arranged along the circumference of the positioning plate 25. The number of third through holes 38 is equal to the number of second through holes 37 and corresponds one to one. The number of fourth through holes 39 is equal to the number of third through holes 38 and corresponds one to one. The number of elastic components 35 is equal to the number of second through holes 37 and corresponds one to one. The number of threaded fasteners is equal to the number of elastic components 35 and corresponds one to one.

[0052] The above-mentioned embodiments only express several implementation methods of the present invention, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the scope of the patent of the present invention. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, which all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the attached claims.

Claims

1. A high-throughput preparation device for thin film material samples, characterized in that: include: A housing (1), a material release device (2), a base (3), a fixed mask plate (4) and a movable mask plate (5); The material release device (2) is arranged in the inner cavity (6) of the shell (1) and is used to release gas-phase atoms of the deposition material into the inner cavity (6); the base (3) has a receiving surface located in the inner cavity (6); The fixed mask plate (4) is fixedly connected to the receiving surface, a deposition hole (7) is provided on the fixed mask plate (4), the movable mask plate (5) is attached to a surface of the fixed mask plate (4) facing away from the base (3), a flow hole (8) corresponding to the deposition hole (7) is provided on the movable mask plate (5), and gas phase atoms in the inner cavity (6) can enter the deposition hole (7) through the flow hole (8) and be deposited on the deposition surface in the deposition hole (7); Also includes a driving mechanism (9); The flow holes (8) include a first flow hole (10), a second flow hole (11), ... an Nth flow hole, wherein N is an integer greater than 2; The driving mechanism (9) is in driving connection with the movable mask plate (5) and is used for driving the movable mask plate (5) to switch between any two positions of a first position, a second position, ... an Nth position relative to the fixed mask plate (4) on the surface of the fixed mask plate (4); When the movable mask plate (5) is located at a first position, the first flow hole (10) corresponds to the deposition hole (7); when the movable mask plate (5) is located at a second position, the second flow hole (11) corresponds to the deposition hole (7); ... when the movable mask plate (5) is located at an Nth position, the Nth flow hole corresponds to the deposition hole (7); The driving mechanism (9) comprises: a power device (12), a driving wheel (13) and a supporting tray (14); The power device (12) is drivingly connected to the driving wheel (13), and the supporting tray (14) is fixedly connected to the driving wheel (13); The support plate (14) is annular, and the two end faces of the support plate (14) perpendicular to the axial direction are respectively a first end face (15) facing the fixed mask plate (4) and a second end face (16) facing the driving wheel (13), and the movable mask plate (5) is clamped on the first end face (15); The movable mask plate (5) is circular and has a snap-fitting protrusion (17) on its edge; a circular ring-shaped receiving groove (18) is provided on the first end surface (15), the axis of which coincides with the axis of the receiving tray (14) and matches the movable mask plate (5); a snap-fitting groove (19) is provided on the inner wall of the receiving groove (18); the movable mask plate (5) is arranged in the receiving groove (18) and snap-fitted into the snap-fitting groove (19) via the snap-fitting protrusion (17); Also includes a first connecting member (20); The first connecting component (20) comprises a first connecting portion (21), a second connecting portion (22) and a clamping portion (23) which are fixedly connected in sequence, the first connecting portion (21) being detachably connected to the driving wheel (13), the second connecting portion (22) passing through the supporting tray (14), and the clamping portion (23) being clamped in the clamping slot (19); It also includes a slip ring (24), a positioning plate (25) and a second connecting component (26); The slip ring (24) has an inner hole (40) matching the shape of the support tray (14), and is sleeved on the support tray (14) through the inner hole (40); the positioning plate (25) is in the shape of a circular ring; the positioning plate (25) is located on a side of the support tray (14) facing away from the fixed mask plate (4) and its axis coincides with the axis of the support tray (14); the slip ring (24) and the positioning plate (25) are both connected to the fixed mask plate (4) via the second connecting component (26); The positioning plate (25) has a positioning end surface (27) facing the second end surface (16), a first ratchet tooth (28) is provided on the positioning end surface (27), and a second ratchet tooth (29) is provided on the second end surface (16), the first ratchet tooth (28) and the second ratchet tooth (29) interacting with each other to allow the support plate (14) to rotate relative to the positioning plate (25) in a first direction and to prevent the support plate (14) from rotating in a second direction opposite to the first direction.

2. The high-throughput preparation device for thin film material samples according to claim 1, characterized in that: The number of the deposition holes (7) is more than two; The number of the first flow holes (10) is more than two and less than the number of the deposition holes (7), and when the movable mask plate (5) is located at the first position, the more than two first flow holes (10) correspond one-to-one to the same number of the deposition holes (7); The number of the second flow holes (11) is more than two and less than the number of the deposition holes (7), and when the movable mask plate (5) is located at the second position, the more than two second flow holes (11) correspond one-to-one to the same number of the deposition holes (7); … The number of the Nth flow holes is more than two and less than the number of the deposition holes (7); when the movable mask plate (5) is located at the Nth position, the more than two Nth flow holes correspond one-to-one to the same number of the deposition holes (7).

3. The high-throughput preparation device for thin film material samples according to claim 1, characterized in that: The first ratchet tooth (28) has a first inclined surface (30) forming an acute angle with the positioning end surface (27) and a first vertical surface (31) perpendicular to the positioning end surface (27); the second ratchet tooth (29) has a second inclined surface (32) forming an acute angle with the second end surface (16) and a second vertical surface (33) perpendicular to the positioning end surface (27); When the support tray (14) rotates along a first direction, the first inclined surface (30) abuts against the second inclined surface (32); when the support tray (14) rotates along a second direction, the first vertical surface (31) abuts against the second vertical surface (33).

4. The high-throughput preparation device for thin film material samples according to claim 3, characterized in that: The number of the first ratchet teeth (28) is more than two, and the more than two first ratchet teeth (28) are evenly arranged along the circumference of the positioning plate (25), and the number of the second ratchet teeth (29) is equal to the number of the first ratchet teeth (28), and corresponds one to one.

5. The high-throughput preparation device for thin film material samples according to claim 3, characterized in that: The second connecting component comprises a threaded fastener (34) and an elastic component (35); The elastic component (35) has a first through hole (36), the positioning disk (25) is provided with a second through hole (37), the slip ring (24) is provided with a third through hole (38), and the fixed mask plate (4) is provided with a fourth through hole (39); the threaded fastener (34) passes through the first through hole (36), the second through hole (37), the third through hole (38), and the fourth through hole (39) in sequence, so as to connect the elastic component (35), the positioning disk (25), the slip ring (24), and the fixed mask plate (4) together in sequence.

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