Coating apparatus

Abstract

The present disclosure describes a coating apparatus including a clean box including a box body having an accommodation space, and a first air tunnel and a second air tunnel provided on the box body and communicating with the accommodation space, an air flow guiding mechanism including a blower for guiding air flow, an air inlet duct communicating with the accommodation space via the blower and the first air tunnel, an air outlet duct communicating with the accommodation space via the second air tunnel, a circulation duct communicating the air inlet duct and the air outlet duct, and a reagent content controller provided on a communication path of the circulation duct and the blower and configured to control a content of a vaporized reagent in air flow passing through the reagent content controller, a support mechanism and a supply mechanism provided within the accommodation space, the support mechanism for supporting a coating object, and the supply mechanism including a dispensing portion for dispensing a liquid reagent.

Description

Technical Field

[0001] This disclosure generally relates to a coating apparatus. Background Technology

[0002] Coating equipment is a low-cost device that can form a coating film on the surface of a substrate. It is commonly used in chip manufacturing, display manufacturing, solar cell manufacturing, and lithium battery manufacturing. Coating equipment typically uses methods such as slot coating, spin coating, or blade coating to coat a wet film onto the substrate surface. After the wet film dries, it forms a coating film or layer. Among them, coating equipment based on the slot coating principle can prepare coating films or layers with large areas (greater than 10 square meters), precise film thickness (down to 10 nm), and high film thickness consistency (up to ±1.5%).

[0003] Although improving the structure or process parameters of the equipment during the research and development process can effectively improve the quality of the coating or film, in the actual mass production process, in order to effectively reduce production costs and increase production capacity, the coating equipment inevitably needs to produce large-area coatings or films.

[0004] However, in the preparation of large-area coatings or films, especially for materials with easily volatile solvents, such as perovskite materials, the relatively long wet film coating time can lead to concentration differences between the initially coated wet film and the later coated wet film due to solvent evaporation. This can further cause molecular migration within the wet film, ultimately resulting in uneven coating or coating thickness. Furthermore, unevenly composed wet films may exhibit uneven composition during drying due to uneven crystallization. Therefore, a coating device is needed that can improve the uniformity of coating composition and the consistency of film thickness when preparing large-area coatings. Summary of the Invention

[0005] This disclosure is made in view of the above-mentioned state of the prior art, and its purpose is to provide a coating apparatus that can improve the uniformity of coating composition and the consistency of film thickness when preparing large-area coatings.

[0006] Therefore, this disclosure provides a coating device, including a clean chamber, an airflow guiding mechanism, a support mechanism, and a feeding mechanism. The clean chamber includes a housing with a receiving space, and a first air duct and a second air duct disposed on the housing and communicating with the receiving space. The airflow guiding mechanism includes a fan, an inlet pipe, an exhaust pipe, a circulation pipe, and a reagent content controller. Openable and closable valves are respectively provided in the inlet pipe, the exhaust pipe, and the circulation pipe. The fan guides the airflow. The inlet pipe communicates with the receiving space via the fan and the first air duct. The exhaust pipe communicates with the first air duct via the second air duct. The two wind tunnels are connected to the containing space. The circulation pipe is connected to the air inlet pipe and the exhaust pipe. The reagent content controller is located on the communication path between the circulation pipe and the fan and is configured to control the content of vaporized reagent in the airflow flowing through the reagent content controller. The support mechanism and the feeding mechanism are located in the containing space. The support mechanism is used to support the coating object. The feeding mechanism includes a dispensing part for dispensing liquid reagent. The dispensing part includes a shell having a chamber for containing liquid reagent and an outlet connected to the chamber for discharging liquid reagent. The outlet faces the support mechanism.

[0007] In this disclosure, the containment space of a cleanroom is filled with a vaporized reagent of a preset concentration. Under the atmosphere of the vaporized reagent, a feeding mechanism coats the liquid reagent onto the object being coated on a support mechanism. The atmosphere of the vaporized reagent effectively suppresses the evaporation of the coated liquid reagent, thereby reducing the possibility of uneven composition and inconsistent film thickness in wet films coated at different times, further improving the uniformity of coating composition and film thickness. Furthermore, the vaporized reagent circulates within the cleanroom, improving its utilization rate. Additionally, a reagent content controller ensures that the content or concentration of the vaporized reagent in the gas within the containment space is in dynamic equilibrium.

[0008] Additionally, in the coating equipment disclosed herein, optionally, before coating, the valves of the inlet pipe and the outlet pipe are closed and the valve of the circulation pipe is opened. The fan guides the gas in the containment space to circulate through the reagent content controller, so that the vaporized reagent contained in the gas in the containment space reaches a predetermined concentration. In this case, the containment space is temporarily closed, which facilitates the adjustment of the concentration of the vaporized reagent by the reagent content controller.

[0009] Furthermore, in the coating equipment disclosed herein, optionally, there are multiple first air tunnels and multiple fans, each connected to a specific first air tunnel. Thus, the first fans can guide air from outside the cleanroom through the first air tunnels into the containment space.

[0010] Additionally, the coating equipment disclosed herein may optionally include a first connecting pipe and a second connecting pipe arranged side by side. The two ends of the first connecting pipe are respectively connected to the two ends of the second connecting pipe. A connecting port connecting to the air inlet pipe is provided between the two ends of the first connecting pipe, and multiple connecting ports connecting to various fans are provided between the two ends of the second connecting pipe. In this configuration, the airflow entering the cleanroom from the air inlet pipe can pass through the first connecting pipe and then into the second connecting pipe, and then through multiple fans and multiple first air ducts into the containment space, reducing the possibility of dead zones in airflow circulation.

[0011] Additionally, in the coating equipment disclosed herein, optionally, the first connecting pipe or the second connecting pipe is also connected to the exhaust pipe, and an openable and closable valve is provided on the connection path between the first connecting pipe or the second connecting pipe and the exhaust pipe. Thus, the fan can guide airflow through the second wind tunnel, a portion of the exhaust pipe, the first connecting pipe, and / or the second connecting pipe to circulate within the cleanroom.

[0012] Additionally, in the coating equipment disclosed herein, optionally, during coating, the valve of the exhaust pipe is closed, and the valve located on the communication path between the first or second connecting pipe and the exhaust pipe is opened. This reduces the possibility of vaporized reagent spilling into the air and causing waste.

[0013] Additionally, the coating equipment disclosed herein may optionally include a transport mechanism disposed within the receiving space. This transport mechanism transports the coating object located outside the receiving space from the outside of the cleanroom to the support mechanism. An automatically controlled side door is located on the wall adjacent to the transport mechanism. The side door automatically opens when the coating object is being transported and automatically closes after transport, thereby improving the automation level of the coating equipment.

[0014] Additionally, in the coating equipment disclosed herein, optionally, the reagent content controller is located at the connection between the circulation pipe and the air inlet pipe. Thus, the reagent content controller can simultaneously adjust the content of the vaporized reagent within the containment space via the circulation pipe and / or the air inlet pipe.

[0015] Additionally, in the coating apparatus disclosed herein, optionally, the coating apparatus further includes a cooling mechanism for distributing a cooling medium, and the feeding mechanism further includes a storage tank connected to the dispensing section and storing liquid reagents. At least one of the support mechanism, the dispensing section, and the storage tank has a fluid cavity connected to the cooling mechanism. Thus, the temperature of the liquid reagent coated onto the object can be reduced by the cooling mechanism, suppressing the evaporation of the liquid reagent.

[0016] Furthermore, in the coating apparatus disclosed herein, optionally, the support mechanism is flat and has a predetermined width and length, the outlet is slit-shaped and its length direction is along the width direction of the support mechanism, the length of the outlet is not less than the predetermined width, and the drive mechanism drives the dispensing part to move horizontally along the length direction of the support mechanism. Thus, when dispensing liquid reagents, a coating with a specific pattern can be formed by the relative movement of the dispensing part and the support mechanism.

[0017] According to this disclosure, a coating apparatus can be provided that can improve the uniformity of coating composition and the consistency of film thickness when preparing large-area coatings. Attached Figure Description

[0018] This disclosure will now be explained in further detail by way of example only with reference to the accompanying drawings, in which:

[0019] Figure 1 This is a schematic diagram illustrating a coating apparatus according to an embodiment of the present disclosure.

[0020] Figure 2 This is a schematic diagram illustrating a cleanroom according to an embodiment of the present disclosure.

[0021] Figure 3 This is a schematic diagram illustrating the replenishment of gaseous reagent to the containment space by a reagent content controller before coating, according to an embodiment of this disclosure.

[0022] Figure 4 This is a schematic diagram illustrating the diversion of the circulation pipeline by the first connecting pipe and the second connecting pipe according to the embodiments of this disclosure.

[0023] Figure 5 This is a schematic diagram illustrating the replenishment of gas into the containment space via an air intake pipe according to an embodiment of the present disclosure.

[0024] Figure 6 This is a schematic diagram illustrating the movement of the dispensing section relative to the coating object from a first perspective according to an embodiment of this disclosure.

[0025] Figure 7 This is a schematic diagram illustrating the movement of the dispensing section relative to the coating object from a second perspective according to an embodiment of this disclosure.

[0026] Figure 8 This is a schematic diagram illustrating the cooling mechanism according to the embodiments of this disclosure for cooling liquid reagents. Detailed Implementation

[0027] Hereinafter, preferred embodiments of the present disclosure will be described in detail with reference to the accompanying drawings. In the following description, the same reference numerals are used for the same components, and repeated descriptions are omitted. Furthermore, the drawings are merely schematic diagrams, and the proportions of the components or the shapes of the components may differ from actual figures.

[0028] It should be noted that the terms "comprising" and "having" and any variations thereof in this disclosure, such as a process, method, system, product, or device that includes or has a series of steps or units, are not necessarily limited to those steps or units that are explicitly listed, but may include or have other steps or units that are not explicitly listed or that are inherent to such processes, methods, products, or devices.

[0029] Furthermore, the subheadings and similar terms used in the following description of this disclosure are not intended to limit the content or scope of this disclosure; they are merely intended to serve as reading prompts. Such subheadings should not be construed as dividing the content of the article, nor should the content under a subheading be limited to the scope of that subheading.

[0030] Embodiments of this disclosure relate to a coating apparatus. In some examples, the coating apparatus may also be referred to as a coating machine. The coating apparatus of this disclosure can be applied in the fields of chip manufacturing, display manufacturing, solar cell manufacturing, or lithium battery manufacturing, and is mainly used for producing large-area coatings or films. The coating apparatus of this disclosure is particularly suitable for scenarios where coatings or films are prepared using materials with easily volatile solvents, such as preparing perovskite thin films in solar cells using perovskite materials. The coating apparatus of this disclosure has advantages such as improving the uniformity of coating composition and improving the consistency of film thickness.

[0031] Figure 1 This is a schematic diagram showing the coating apparatus 10 according to an embodiment of the present disclosure. Figure 2 This is a schematic diagram showing the cleanroom 100 according to an embodiment of the present disclosure.

[0032] In some examples, the coating apparatus 10 may include a cleanroom 100, a support mechanism 110, and a feeding mechanism 120 (see [reference]). Figure 8 In some examples, the cleanroom 100 may include a housing 102 having a receiving space 101. In some examples, a support mechanism 110 and a feeding mechanism 120 may be disposed within the receiving space 101. In some examples, the support mechanism 110 may be used to support the coating object 130. In some examples, the feeding mechanism 120 may be used to coat the coating object 130 with a liquid reagent and form a coating film.

[0033] In some examples, the liquid reagent may include both a solute and a solvent. In some examples, the liquid reagent may be a perovskite solution. In some examples, when preparing large-area coatings, or when the aspect ratio of the prepared coating is large, the initially formed wet film may exhibit a concentration difference due to solvent evaporation and the difference in concentration between the subsequently formed wet film and the wet film. The presence of a concentration difference may cause molecular migration within the wet film, resulting in inconsistent coating thickness. Furthermore, solvent evaporation may cause the initially formed wet film to partially dry, leading to uneven coating composition. When the air contains gaseous solvent (vaporizing agent), the rate of solvent evaporation in the wet film formed by liquid reagent coating can be effectively suppressed. Therefore, introducing a vaporizing agent into the air can create a vaporizing agent atmosphere, thereby reducing the rate of solvent evaporation in the wet film.

[0034] In some examples, the concentration of the vaporized reagent in the air can theoretically be at its saturation concentration. This can significantly reduce the rate of solvent evaporation in the wet film. However, considering that when the concentration of the vaporized reagent in the air is at its saturation concentration, temperature fluctuations may cause liquid condensation, potentially leading to negative effects. Therefore, the concentration of the solvent gas in the air can be lower than its saturation concentration. Thus, in some examples, a vaporized reagent atmosphere of a preset concentration can be formed inside the containment space 101. The preset concentration may not exceed the saturation concentration of the vaporized reagent in the air.

[0035] In this disclosure, the containment space 101 of the clean chamber 100 is filled with a vaporized reagent of a preset concentration. Under the atmosphere of the vaporized reagent, the feeding mechanism 120 coats the liquid reagent onto the coating object 130 located on the support mechanism 110. The atmosphere of the vaporized reagent can effectively suppress the volatilization of the coated liquid reagent, thereby reducing the possibility of uneven composition and inconsistent film thickness of the wet film coated at different times, and further improving the uniformity of the coating composition and the consistency of the film thickness.

[0036] In some examples, the coating apparatus 100 may also include an airflow guiding mechanism 140. The airflow guiding mechanism 140 can be used to provide a stable vaporized reagent atmosphere for the containment space 101.

[0037] In some examples, the cleanroom enclosure 100 may have a first wind tunnel 103 and a second wind tunnel 104 communicating with the containment space 101. In some examples, the airflow guiding mechanism 140 communicates with the containment space 101 through the first wind tunnel 103 and the second wind tunnel 104. In some examples, the first wind tunnel 103 and the second wind tunnel 104 may be disposed on the enclosure 102.

[0038] In some examples, the airflow guiding mechanism 140 may include a fan 141, an inlet duct 142, an exhaust duct 143, a circulation duct 144, and a reagent content controller 145. In some examples, the fan 141 may be used to guide the airflow. In some examples, the inlet duct 142 may be connected to the containment space 101 via a first wind tunnel 103. In some examples, the exhaust duct 143 may be connected to the containment space 101 via a second wind tunnel 104. In some examples, the circulation duct 144 may be used to connect the inlet duct 142 and the exhaust duct 143. In some examples, the reagent content controller 145 may be configured to control the content of vaporized reagent in the airflow flowing through it. Thus, the reagent content controller 145 can maintain a dynamic equilibrium of the content or concentration of vaporized reagent in the gas within the containment space 101. Furthermore, the vaporized reagent can circulate within the cleanroom 100, improving its utilization rate.

[0039] In some examples, the reagent content controller 145 is used to regulate the content of the vaporized reagent inside the containment space 101. In some examples, the reagent content controller 145 can regulate the concentration of the vaporized reagent in the gas stream passing through it based on the principles of evaporation and condensation. In some examples, when the concentration of the vaporized reagent in the gas stream is low, the reagent content controller 145 can evaporate to replenish the vaporized reagent. When the concentration of the vaporized reagent in the gas stream is too high, the gas stream can undergo saturated condensation after passing through the reagent content controller 145, thereby reducing the concentration of the vaporized reagent in the gas stream.

[0040] In some examples, the reagent content controller 145 may be located on the communication path between the circulation pipe 144 and the fan 141. In some examples, the reagent content controller 145 may be located on the communication path between the air inlet pipe 142 and the fan 141. In some examples, the reagent content controller 145 may be located at the connection between the circulation pipe 144 and the air inlet pipe 142. Thus, the reagent content controller 145 can simultaneously regulate the content of the vaporized reagent inside the containing space 101 through the circulation pipe 144 and / or the air inlet pipe 142.

[0041] In some examples, the fan 141 may be located near the first wind tunnel 103. In some examples, the intake duct 142 may communicate with the housing space 101 via the fan 141 and the first wind tunnel 103. In some examples, the fan 141 may also include a filter assembly, such as an FFU. This allows for the filtration of impurities in the air or airflow.

[0042] In some examples, there may be multiple first wind tunnels 103. Correspondingly, there may be multiple fans 141, each connected to a different first wind tunnel 103. Thus, the first fans 141 can guide air from outside the cleanroom 100 through the first wind tunnels 103 into the containment space 101. This improves the airflow within the containment space 101 and reduces the possibility of dead zones.

[0043] In some examples, the airflow guiding mechanism 140 may also include a first connecting duct 146 and a second connecting duct 147 arranged side by side. In some examples, the first connecting duct 146 and the second connecting duct 147 serve to optimize the airflow direction.

[0044] In one example, the two ends of the first connecting pipe 146 are respectively connected to the two ends of the second connecting pipe 147. In some examples, a connecting port connecting to the air inlet pipe 142 is provided between the two ends of the first connecting pipe 146. Multiple connecting ports connecting to each fan 141 are provided between the two ends of the second connecting pipe 147. In this case, the airflow entering the clean chamber 100 from the air inlet pipe 142 can pass through the first connecting pipe 146 and then enter the second connecting pipe 147, and then enter the containment space 101 through multiple fans 141 and multiple first air tunnels 103, reducing the possibility of dead zones in airflow circulation.

[0045] In some examples, the first connecting pipe 146 or the second connecting pipe 147 is also connected to the exhaust pipe 143. Thus, the fan 141 can guide airflow through the second wind tunnel 104, a portion of the exhaust pipe 143, the first connecting pipe 146, and / or the second connecting pipe 147 to circulate within the cleanroom 100. In some examples, the connection of the first connecting pipe 146 or the second connecting pipe 147 to the exhaust pipe 143 can serve to divert airflow from the circulation pipe 144, providing an additional circulation path for a portion of the circulating airflow when the flow rate exceeds the operating limit of the circulation pipe 144. In some examples, the first connecting pipe 146 or the second connecting pipe 147 may not be connected to the exhaust pipe 143.

[0046] In some examples, openable and closable valves 20 may be provided in the intake pipe 142, exhaust pipe 143, and circulation pipe 144, respectively. In some examples, valve 20 may be part of the intake pipe 142, exhaust pipe 143, and circulation pipe 144. In some examples, the valve 20 provided in the intake pipe 142 may be referred to as valve 21. In some examples, the valve 20 provided in the exhaust pipe 143 may be referred to as valve 22. In some examples, the valve 20 provided in the circulation pipe 144 may be referred to as valve 23.

[0047] In some examples, valve 20 may also include valve 24. In some examples, an openable and closable valve 24 is provided on the connection path between the first connecting pipe 146 or the second connecting pipe 147 and the exhaust pipe 143. Thus, it is possible to determine whether the first connecting pipe 146 or the second connecting pipe 147 needs to be connected to the exhaust pipe 143 according to the actual situation.

[0048] Figure 3 This is a schematic diagram showing the replenishment of gaseous reagent to the containment space 101 by the reagent content controller 145 before coating, according to an embodiment of the present disclosure. Figure 4 This is a schematic diagram showing the diversion of the circulation pipe 144 by the first connecting pipe 146 and the second connecting pipe 147 according to the embodiments of this disclosure. Figure 5 This is a schematic diagram showing the replenishment of gas into the containment space 101 through the air intake pipe 142 according to an embodiment of the present disclosure.

[0049] In some examples, before coating, valve 21 of the inlet pipe 142 and valve 22 of the outlet pipe 143 can be closed, and valve 23 of the recirculation pipe 144 can be opened. The fan 141 guides the gas within the containment space 101 through the reagent content controller 145 to achieve a predetermined concentration of vaporized reagent within the gas in the containment space 101. In this case, the containment space 101 is temporarily closed, which facilitates the adjustment of the concentration of the vaporized reagent via the reagent content controller 145.

[0050] In some examples, when coating is being performed, valve 22 of exhaust duct 143 can be closed, and valve 24 located on the communication path between the first connecting duct 146 or the second connecting duct 147 and exhaust duct 143 can be opened. This reduces the possibility of vaporized reagent spilling into the air and causing waste.

[0051] In some examples, the coating apparatus 10 may include a transport mechanism 150. In some examples, the transport mechanism 150 may be disposed within the receiving space 101. In some examples, the transport mechanism 150 may transport the coating object 130 located outside the receiving space 101 to the support mechanism 110. This improves the automation level of the coating apparatus 10. In some examples, the transport mechanism 150 may transport the coating object 130 located on the support mechanism 110 to the outside of the receiving space 101.

[0052] In some examples, it is considered that gas exchange may occur between the interior of the containing space 101 and the exterior of the cleanroom 100 during the handling process. In some examples, the fan 141 can be controlled to ensure that the volume of gas entering the containing space 101 via the reagent content controller 145 is greater than the volume of gas that may exchange with the exterior of the cleanroom 100. This allows for continuous replenishment of leaked air, maintaining a dynamic equilibrium in the concentration of the vaporized reagent within the containing space 101.

[0053] In some examples, considering that the handling mechanism 150 needs to move repeatedly between the outside of the cleanroom 100 and the containing space 101, an automatically controlled side door can be opened on the wall adjacent to the handling mechanism 150. This side door automatically opens when the object to be coated is being handled and automatically closes after handling. This can, to some extent, reduce the amount of gas exchanged between the inside of the containing space 101 and the outside of the cleanroom 100.

[0054] Figure 6 This is a schematic diagram illustrating the movement of the dispensing unit 121 relative to the coating object 130 from a first perspective according to an embodiment of this disclosure. Figure 7 This is a schematic diagram showing the movement of the dispensing unit 121 relative to the coating object 130 from a second perspective according to an embodiment of this disclosure.

[0055] In some examples, the feeding mechanism 120 may include a dispensing section 121 for dispensing liquid reagents. In some examples, the dispensing section 121 may include a housing 1211 and a discharge port 1212. The housing 1211 is used to contain the liquid reagent. The discharge port 1212 is used to discharge the liquid reagent. In some examples, the housing 1211 may have a chamber for containing the liquid reagent. The discharge port 1212 may communicate with the chamber. In some examples, the discharge port 1212 may be configured to face the support mechanism 110.

[0056] In some examples, the feeding mechanism 120 may also include a storage tank 122 and a power system. The distribution unit 121 is in communication with the storage tank 122. In some examples, the storage tank 122 may be used to store liquid reagents. The power system can guide the liquid reagents in the storage tank 122 to the distribution unit 121.

[0057] In some examples, the support mechanism 110 may be flat. In some examples, the support mechanism 110 may have a predetermined width and a predetermined length. In some examples, the outlet 1212 may be slit-shaped. In some examples, the dispensing portion 121 may be configured such that the length direction of the outlet 1212 is along the width direction of the support mechanism 110. In some examples, the length of the outlet 1212 is not less than the predetermined width. In some examples, a drive mechanism drives the dispensing portion 121 to move horizontally along the length direction of the support mechanism 110. Thus, when dispensing liquid reagents, a coating with a specific pattern can be formed by the relative movement of the dispensing portion 121 and the support mechanism 110. In some examples, the support mechanism 110 may also be configured to move relative to the dispensing portion 121.

[0058] Figure 8 This is a schematic diagram illustrating the cooling mechanism according to the embodiments of this disclosure for cooling liquid reagents.

[0059] In some examples, the coating apparatus 10 may also include a cooling mechanism for discharging a cooling medium. In some examples, at least one of the support mechanism 110, the dispensing section 121, and the storage tank 122 has a fluid cavity 160 communicating with the cooling mechanism. Thus, the temperature of the liquid reagent coated onto the coating object 130 can be reduced by the cooling mechanism, suppressing the evaporation of the liquid reagent.

[0060] According to this disclosure, a coating apparatus 10 can be provided that can improve the uniformity of coating composition and the consistency of film thickness when preparing large-area coatings.

[0061] While the present disclosure has been specifically described above in conjunction with the accompanying drawings and examples, it is to be understood that the foregoing description does not limit the present disclosure in any way. Those skilled in the art can make modifications and variations to the present disclosure as needed without departing from its essential spirit and scope, and all such modifications and variations shall fall within the scope of the present disclosure.

Claims

1. A coating device, characterized in that, This includes a cleanroom, an airflow guiding mechanism, a support mechanism, and a feeding mechanism. The cleanroom enclosure includes a housing with a storage space, and a first air duct and a second air duct disposed on the housing and communicating with the storage space. The airflow guiding mechanism includes a fan, an inlet pipe, an exhaust pipe, a circulation pipe, a reagent content controller, and a first connecting pipe and a second connecting pipe arranged side by side and connected at both ends. Each of the inlet pipe, the exhaust pipe, and the circulation pipe has an openable / closable valve. The fan guides the airflow. The inlet pipe connects to the containing space via the fan and the first air duct. The exhaust pipe connects to the containing space via the second air duct. The circulation pipe connects the inlet pipe and the exhaust pipe. Multiple first air ducts and fans are located above the housing. The second air duct is located on the side below the housing. A connecting port connecting to the inlet pipe is located between the two ends of the first connecting pipe. Multiple connecting ports connecting to each fan are located between the two ends of the second connecting pipe. The reagent content controller is located on the connection path between the circulation pipe and the fan and is configured to control the content of vaporized reagent in the airflow passing through the reagent content controller based on the principles of evaporation and condensation. The support mechanism and the feeding mechanism are disposed within the accommodating space. The support mechanism is used to support the coating object. The feeding mechanism includes a dispensing part for dispensing liquid reagents. The dispensing part includes a housing having a chamber for containing liquid reagents and an outlet communicating with the chamber for discharging liquid reagents. The outlet faces the support mechanism.

2. The coating equipment according to claim 1, characterized in that, Before coating, the valves of the air inlet pipe and the air outlet pipe are closed and the valve of the circulation pipe is opened. The fan guides the gas in the containment space to circulate through the reagent content controller so that the gas in the containment space contains a predetermined concentration of vaporized reagent.

3. The coating equipment according to claim 1, characterized in that, The first connecting pipe or the second connecting pipe is also connected to the exhaust pipe, and an openable and closable valve is provided on the connection path between the first connecting pipe or the second connecting pipe and the exhaust pipe.

4. The coating equipment according to claim 3, characterized in that, During coating, the valve of the exhaust pipe is closed, and the valve located on the connection path between the first or second connecting pipe and the exhaust pipe is opened.

5. The coating equipment according to claim 1, characterized in that, It also includes a transport mechanism disposed within the receiving space, which transports the coating object located outside the receiving space to the support mechanism.

6. The coating equipment according to claim 1, characterized in that, The reagent content controller is located at the connection between the circulation pipe and the air inlet pipe.

7. The coating equipment according to claim 1, characterized in that, The coating equipment further includes a cooling mechanism for outputting a cooling medium, and the feeding mechanism further includes a storage tank connected to the dispensing section and storing liquid reagents. At least one of the support mechanism, the dispensing section, and the storage tank has a fluid cavity connected to the cooling mechanism.

8. The coating equipment according to claim 1, characterized in that, The support mechanism is flat and has a predetermined width and a predetermined length. The discharge port is slit-shaped and its length direction is along the width direction of the support mechanism. The length of the discharge port is not less than the predetermined width. The drive mechanism drives the distribution part to move horizontally along the length direction of the support mechanism.

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