A continuous coating equipment for fuel cell metal bipolar plate

Abstract

The application discloses a kind of fuel cell metal bipolar plate continuous coating equipment, comprising: multiple cavities, including sequentially arranged and sealed connection one feed cavity, one first process cavity, multiple second process cavities, and one discharge cavity;Transmission rail, pass in cavity, for the trolley and its loaded bipolar plate are sequentially transported between each cavity, cavity is equipped with trolley jacking and rotating device, for the trolley is jacked from transmission rail and makes trolley rotate;First process cavity and second process cavity are separately provided with source body installation interface, each cavity is separately provided with heating module, each cavity is connected vacuum system;First process cavity is used to clean bipolar plate, each second process cavity is used to sequentially coat one film layer on bipolar plate respectively.The application has simple structure, can improve productivity by continuous production, reduce production cost, and can mass-produce excellent performance fuel cell metal bipolar plate film.

Description

Technical Field

[0001] This invention relates to the field of vacuum coating technology, and more particularly to a continuous coating apparatus for metal bipolar plates of fuel cells. Background Technology

[0002] Currently, to reduce the contact resistance of fuel cell metal bipolar plates, a layer of amorphous carbon film (DLC film) or a noble metal film, along with certain trace doping elements, is typically deposited onto the surface of stainless steel fuel cell metal bipolar plates using magnetron sputtering. Existing metal bipolar plate coating is usually performed within the same chamber (single-unit equipment) in a stand-alone operating mode. Since multiple film layers generally need to be deposited on the surface of the metal bipolar plate, the preparation time between different film layers is relatively long, resulting in low output per unit time, thus leading to low production efficiency and high production costs.

[0003] Therefore, designing high-throughput, high-quality continuous coating equipment to improve coating efficiency and reduce production costs has become a key link in the industrialization process of the metal bipolar plate production chain. Summary of the Invention

[0004] The purpose of this invention is to overcome the above-mentioned defects in the prior art and provide a continuous coating equipment for metal bipolar plates of fuel cells.

[0005] To achieve the above objectives, the technical solution of the present invention is as follows:

[0006] A continuous coating apparatus for metal bipolar plates of fuel cells, comprising:

[0007] Multiple cavities, including a feeding cavity, a first process cavity, multiple second process cavities, and a discharging cavity arranged sequentially and sealed together;

[0008] A conveyor track is installed in the cavity to sequentially transport the rotating frame and its loaded bipolar plates between the cavities. The cavity is provided with a rotating frame lifting and rotating device to lift the rotating frame from the conveyor track and rotate the rotating frame.

[0009] The first process cavity and the second process cavity are respectively provided with source body mounting interfaces, each cavity is provided with a heating module, and each cavity is connected to a vacuum system;

[0010] The first process chamber is used to clean the bipolar plate, and each of the second process chambers is used to perform a film coating process on the bipolar plate in sequence.

[0011] Further, the first process cavity is provided with a first source body mounting interface, the first source body mounting interface is provided with a first source body, the first process cavity is used for pre-cleaning the bipolar plate in a rotating state on the rotating frame delivered by the feeding cavity through the first source body, the second process cavity is at least three, each second process cavity is provided with a second source body mounting interface, the second source body mounting interface is provided with a second source body, and each second process cavity is used for sequentially performing the first film layer, the second film layer and the third film layer plating process on the bipolar plate in a rotating state on the rotating frame delivered by the first process cavity through the second source body.

[0012] Further, the first process cavity is provided with a first source body mounting interface, the first source body mounting interface is provided with a first source body, the first process cavity is used for pre-cleaning the bipolar plate in a rotating state on the rotating frame delivered by the feeding cavity through the first source body, and for continuing the first film layer plating process on the cleaned bipolar plate through the first source body, the second process cavity is at least two, each second process cavity is provided with a second source body mounting interface, the second source body mounting interface is provided with a second source body, and each second process cavity is used for sequentially performing the second film layer and the third film layer plating process on the bipolar plate in a rotating state on the rotating frame delivered by the first process cavity through the second source body.

[0013] Further, the first film layer includes a pure metal film layer, the second film layer includes a compound film layer, and the third film layer includes an amorphous carbon film layer.

[0014] Further, the first source body includes an ion source, the second source body includes a magnetron sputtering source, a multi-arc source, a filtered arc source, an evaporation source, an ion source, an ion implantation source or an atomic deposition source.

[0015] Further, the source body mounting interface is arranged on the cavity side wall on the left and right sides of the conveying track in pairs.

[0016] Further, the vacuum system is provided with a molecular pump, and the molecular pump is arranged on the first process cavity and the second process cavity.

[0017] Further, the first process cavity and the second process cavity are provided with a cylindrical target mounting interface.

[0018] Further, the heating module includes an electric heater arranged on the inner wall of the cavity.

[0019] Further, the ion source includes an anode layer ion source, and a cathode cover is arranged on the cathode surface of the anode layer ion source.

[0020] The present application has the following advantages:

[0021] (1) According to the characteristics of the fuel cell metal bipolar plate plating process, the process is decomposed according to the plating requirements of various film layers, at least three independent process cavities are set up for plating different film layers, and a conveying track is used to convey the trolley and the bipolar plate loaded thereon. In this way, the plating preparation time between different film layers can be effectively reduced, the loading capacity in unit volume can be expanded, and the production efficiency can be greatly improved. Compared with the traditional vertical single furnace cavity equipment, the production efficiency can be greatly improved, and the stability of the pressure of each process cavity during plating can be maintained, avoiding the adverse effects on the plating quality caused by frequent opening and closing of the furnace door during the conversion of plating different film layers.

[0022] (2) The trolley and the bipolar plate loaded thereon are conveyed by setting a conveying track, and a trolley jacking and rotating device is set up to jack up the trolley from the conveying track and make the trolley in a rotating state for process, so that the overall structure is simplified and a continuous and stable coating can be obtained.

[0023] (3) By setting the source body mounting interface, the applicable plating film source body can be selected according to the plated film layer, effectively ensuring the stability and diversity of the working condition during plating, so as to obtain the best film layer quality and plating layer thickness uniformity.

[0024] (4) The plating equipment of the present application can produce high-performance fuel cell metal bipolar plate film in batches through continuous production, has high efficiency, can improve production capacity, reduce production cost, and can produce high-performance fuel cell metal bipolar plate film in batches. BRIEF DESCRIPTION OF DRAWINGS

[0025] Figure 1 is a structure schematic view of a fuel cell metal bipolar plate continuous plating equipment of a preferred embodiment of the present application;

[0026] Figure 2 is a structure schematic view of a process cavity of a preferred embodiment of the present application;

[0027] Figures 3-4 is a structure schematic view of a trolley jacking and rotating device of a preferred embodiment of the present application;

[0028] Figures 5-6 is a structure schematic view of an anode layer ion source of a preferred embodiment of the present application;

[0029] Figures 7-9 is a configuration state schematic view of a plating cavity of a preferred embodiment of the present application. DETAILED DESCRIPTION

[0030] In order to make the purposes, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative efforts belong to the scope of the present application. Unless otherwise defined, the technical terms or scientific terms used herein should be understood as the common meanings of the technical terms or scientific terms for those skilled in the art. The similar words such as "comprise" used herein mean that the elements or objects before the words cover the elements or objects listed after the words and their equivalents, and do not exclude other elements or objects.

[0031] The specific embodiments of the present application will be further described in detail below with reference to the accompanying drawings.

[0032] Please refer to Figure 1 , Figure 1 The structure schematic diagram of a fuel cell metal bipolar plate continuous coating equipment according to a preferred embodiment of the present application is shown in FIG. 1. As shown in FIG. 1, the fuel cell metal bipolar plate continuous coating equipment according to the present application comprises a plurality of cavities 15, a conveying track 17, a source body mounting interface 19, a heating module, a vacuum system and other main structural components arranged in sequence. Figure 1

[0033] Among them, the cavity 15 comprises a feeding cavity 14, a first process cavity 13, a plurality of second process cavities 12 and a discharging cavity 11 arranged in sequence and sealedly connected with each other.

[0034] The conveying track 17 is arranged in each cavity 15, and is used to sequentially convey the rotating frame and the fuel cell metal bipolar plate (not shown) loaded thereon, which needs to be coated, between the cavities 15.

[0035] The rotating frame lifting and rotating device is arranged in each cavity 15, and is used to lift the rotating frame from the conveying track 17 and rotate the rotating frame, so that the rotating frame is in a rotating state to receive cleaning treatment and perform coating process.

[0036] The heating module is arranged in each cavity 15. The heating module is used to heat the inside of the cavity 15, so that the bipolar plate entering the cavity 15 is at a temperature required by the process to receive cleaning treatment and perform coating.

[0037] The first process cavity 13 and the second process cavity 12 are respectively provided with the source body mounting interface 19. The source body mounting interface 19 is used to mount the source body required for cleaning treatment and coating.

[0038] ​Each cavity 15 is connected to a vacuum system. The vacuum system is used to vacuumize each cavity 15 to a pressure state required by the process.

[0039] The first process cavity 13 can be used to clean the bipolar plate, and can also be used to perform a plating process on the bipolar plate. Each second process cavity 12 is used to perform a plating process on the bipolar plate to form a film layer. The number of cavities 15 used for the plating process corresponds to the number of film layers to be plated. For example, when three film layers are to be plated on the bipolar plate, at least three cavities 15 are required.

[0040] Referring to Figure 1 In some embodiments, each cavity 15 can be arranged on a rack 18. The rack 18 can be a desktop frame structure. Each cavity 15 can have the same or similar shape to form a straight-line structure. At the inlet of the feeding cavity 14 and the outlet of the discharging cavity 11, a door rack 16, 10 can be arranged, including a feeding door rack 16 and a discharging door rack 10. The trolley can enter the feeding cavity 14 through the feeding door rack 16, and then sequentially pass through the first process cavity 13 and the second process cavity 12 to perform the process, and then be discharged by the discharging door rack 10 at the outlet of the discharging cavity 11.

[0041] A control cabinet and a control panel can be arranged on the feeding door rack 16 and / or the discharging door rack 10 to control the plating process.

[0042] In some embodiments, each cavity 15 can be arranged to have an internal chamber, for example, a rectangular shape, so as to form a chamber inlet and a chamber outlet at the front and back ends of each cavity 15. The chamber inlet of the feeding cavity 14 and the chamber outlet of the discharging cavity 11, and the chamber outlet and the chamber inlet of each adjacent cavity 15, can be closed by a rectangular first plug valve 21, so that each cavity 15 is connected in a sealed manner by the first plug valve 21, and the internal chamber of each cavity 15 can form an independent sealed space. When in the plating state, the first plug valve 21 can be lifted from the rack 18 to close the chamber outlet and the chamber inlet, and seal each cavity 15; when in the trolley transmission process, the first plug valve 21 can be lowered to retreat into the rack 18 to open the chamber outlet and the chamber inlet, so that the trolley carrying the bipolar plate can be transferred from one cavity 15 to another cavity 15.

[0043] The trolley can be a conventional vertical trolley (or a horizontal trolley).

[0044] Referring to Figure 2 Referring to Figure 1 , Figure 2A first process cavity 13 or a second process cavity 12 structure is shown. In some embodiments, the first process cavity 13 is one. The first process cavity 13 can be provided with a first source body mounting interface 191, which can be used to mount a first source body. The first process cavity 13 can be used to perform pre-plating cleaning on the bipolar plates in a rotating state on the turntable delivered by the feeding cavity 14 through the first source body. The second process cavity 12 is at least three. Each second process cavity 12 can be provided with a second source body mounting interface 192, which can be used to mount a second source body. Each second process cavity 12 can be used to perform plating processes of a first film layer, a second film layer and a third film layer on the bipolar plates in a rotating state on the turntable delivered by the first process cavity 13 through the second source body in sequence. That is, in this embodiment, the first process cavity 13 is only used for cleaning process before plating of the bipolar plates. The film layers of the first film layer, the second film layer and the third film layer are different from each other.

[0045] In other embodiments, the first process cavity 13 is one. The first process cavity 13 can be provided with a first source body mounting interface 191, which can be used to mount a first source body. The first process cavity 13 can be used to perform pre-plating cleaning on the bipolar plates in a rotating state on the turntable delivered by the feeding cavity 14 through the first source body, and to continue to perform plating process of the first film layer on the cleaned bipolar plates through the first source body. The second process cavity 12 is at least two. Each second process cavity 12 can be provided with a second source body mounting interface 192, which can be used to mount a second source body. Each second process cavity 12 can be used to perform plating processes of the second film layer and the third film layer on the bipolar plates in a rotating state on the turntable delivered by the first process cavity 13 through the second source body in sequence. That is, in this embodiment, the first process cavity 13 can be used not only for cleaning process before plating of the bipolar plates, but also for plating process of the first film layer of the bipolar plates. Thus, the cavities 15 that can be used for plating process are still three.

[0046] Further, for the plating needs of the fuel cell metal bipolar plates, the first film layer can include a pure metal film layer, the second film layer can include a compound film layer, and the third film layer can include an amorphous carbon film layer. Among them, the first film layer covers the surface of the bipolar plate as a bottom film layer; the second film layer covers the first film layer, and the third film layer covers the second film layer as a surface film layer, which can form a composite film layer with uniform quality on the surface of the bipolar plate and effectively reduce the contact resistance of the fuel cell metal bipolar plate.

[0047] In some embodiments, the first source body can include an ion source and the like. The ion source can be used to perform ion cleaning on the bipolar plates. For example, ion beam cleaning source, glow cleaning and the like can be used.

[0048] In some embodiments, the second source body can include a magnetron sputtering source, a multi-arc source, a filtered arc source, an evaporation source, an ion source, an ion implantation source, or an atomic deposition source, etc.

[0049] In some embodiments, the source body mounting interfaces 19 (first source body mounting interface 191, second source body mounting interface 192) can be arranged in pairs on the side walls of the transfer track 17 on the left and right sides of the chamber 15. According to process requirements, the source body mounting interfaces 19 arranged in pairs can be symmetrically mounted on the two side walls of the chamber 15. Alternatively, the source body mounting interfaces 19 can also be mounted in an asymmetric manner.

[0050] In some embodiments, the source body mounting interfaces 19 can be flange interfaces; the first source body and the second source body can be mounted and connected with the flange interfaces of the source body mounting interfaces 19 through flanges.

[0051] In some embodiments, the source body mounting interfaces 19 can be adjusted in position and angle on the first process chamber 13 and the second process chamber 12, and the mounting position and angle of the source body can be adjusted according to process requirements to adjust the direction and angle of the film source particles.

[0052] In some embodiments, the first process chamber 13 and the second process chamber 12 can also be provided with a process gas inlet and a gas exhaust port. Process gas can be introduced into the chamber of the process chamber 15 through the process gas inlet, and ion cleaning of the bipolar plate or bombardment of the target material for film deposition can be performed using ionized process gas. The chamber of the process chamber 15 can be depressurized through the gas exhaust port.

[0053] Please refer to Figure 1 and refer to Figure 2 In some embodiments, the vacuum system can be provided with a three-stage vacuum pumping system, including a first-stage vacuum system composed of a mechanical pump, a second-stage vacuum system composed of a Roots pump, and a third-stage vacuum system composed of a molecular pump 20. The mechanical pump, the Roots pump, and the molecular pump 20 are arranged on the first process chamber 13 and the second process chamber 12. The mechanical pump and the Roots pump can be arranged on the feed chamber 14 and the discharge chamber 11, and whether to configure the molecular pump 20 can be selected according to process requirements. The chamber 15 can be pumped to a first-stage vacuum by the mechanical pump, further pumped to a second-stage vacuum by the Roots pump, and finally pumped to a third-stage vacuum by the molecular pump 20. The first-stage vacuum needs to reach the operating vacuum condition of the Roots pump, the second-stage vacuum needs to be pumped to the operating vacuum condition of the molecular pump 20, and the molecular pump 20 needs to be pumped to the vacuum condition required for film formation.

[0054] In some embodiments, the molecular pump 20 can be arranged on the top of the first process chamber 13 and the second process chamber 12, and the communication with the chambers of the first process chamber 13 and the second process chamber 12 can be controlled by the second plug valve 23.

[0055] Referring to Figure 2 Referring to Figure 1 In some embodiments, the first process cavity 13 and the second process cavity 12 can be provided with cylindrical target mounting interfaces 24. The cylindrical target mounting interfaces 24 are provided in pairs on the left and right sides of the top of the first process cavity 13 and the second process cavity 12. The cylindrical targets can be mounted into the chambers of the first process cavity 13 and the second process cavity 12 through the cylindrical target mounting interfaces 24.

[0056] Further, the cylindrical target mounting interfaces 24 can be provided in one or more pairs to correspondingly mount one or more pairs of cylindrical targets according to process requirements, thereby improving the uniformity of the film deposition process.

[0057] In some embodiments, a biasing device can be configured on the film deposition apparatus. During film deposition, the biasing device can be turned on to perform film deposition according to process requirements.

[0058] Referring to Figure 2 In some embodiments, the heating module can include electric heaters 22 provided on the sidewalls on the left and right sides of the cavity 15. The electric heaters 22 can employ heating elements such as heating wires or heating rods. The electric heaters 22 can be used to heat the interior of the cavity 15 and the rotary frame and bipolar plates entering the cavity 15, so that the bipolar plates are at an appropriate temperature for film deposition, thereby further improving the film deposition quality.

[0059] Referring to Figures 2-4 In some embodiments, the conveying track 17 can be in a segmented independent control form, so that each segment of the conveying track 17 can independently advance, retreat, and stop, to accurately control the conveying state and position of the rotary frame. The conveying track 17 can employ a parallel roller structure. The parallel roller structure can include one driving roller and multiple passive rollers. The driving roller can be synchronously connected with the passive rollers through gears or chains. The driving roller can be rotationally connected with a first speed reducer 30 controlling the operation of the conveying track 17 through a bevel gear set 29; the first speed reducer 30 is rotationally connected with a first motor 31 driving the operation thereof. The first speed reducer 30 and the first motor 31 can be provided in a rack 18 below the cavity 15, and can pass through the bottom surface of the cavity 15 to be connected with the bevel gear set 29 in the cavity 15.

[0060] In some embodiments, a rotary lifting and rotating device is arranged in each cavity 15. The rotary lifting and rotating device can be provided with a second speed reducer 26 and a second motor 25 forming a rotary connection. The second speed reducer 26 and the second motor 25 are connected to the cylinder rod of a lifting cylinder 27. A rotary chuck 28 is arranged on the upper end of the rotary part of the second speed reducer 26, and is used to engage with the bottom of the rotary table to form a fit. When the rotary table is transported to the designated cavity 15 by the conveying track 17 and is positioned, the cylinder rod of the lifting cylinder 27 is raised, driving the second speed reducer 26 and the second motor 25 to rise, so that the rotary chuck 28 is inserted into the bottom of the rotary table to form a rotary fit, and the rotary table is lifted from the conveying track 17 to be separated from the conveying track 17. At this time, the second motor 25 can be driven to drive the second speed reducer 26 to operate, driving the rotary chuck 28 to rotate, so that the rotary table can be synchronously rotated, and the process can be carried out in rotation. After a process in a certain process cavity 15 is completed, the second motor 25 can be stopped, and the cylinder rod of the lifting cylinder 27 can be lowered to drive the second speed reducer 26 and the second motor 25 to descend, so that the rotary table is placed on the conveying track 17 again, and by continuing to descend, the rotary chuck 28 is separated from the bottom of the rotary table. At this time, the rotary table can be continuously transported to the next cavity 15 by the conveying track 17.

[0061] Please refer to Figures 5-6In some embodiments, the ion source can include an anode layer ion source 32. The anode layer ion source 32 can include cathodes 36, 33 and an anode (not shown). Among them, the cathodes 36, 33 can include an inner cathode 36 and an annular outer cathode 33 arranged around the inner cathode 36. Cathode covers 34, 35 can be provided on the surfaces of the inner cathode 36 and the outer cathode 33. The cathode covers 34, 35 are sheet-shaped and include a separate inner cathode cover 34 and an annular outer cathode cover 35. The inner cathode cover 34 and the outer cathode cover 35 have contours and sizes corresponding to the surfaces of the inner cathode 36 and the outer cathode 33, respectively. The inner cathode cover 34 and the outer cathode cover 35 can be installed on the surfaces of the inner cathode 36 and the outer cathode 33 by forming a resilient clamping between the elastic clamps 37 and the mounting holes provided on the surfaces of the inner cathode 36 and the outer cathode 33, completely covering the surfaces of the inner cathode 36 and the outer cathode 33, thereby protecting the surfaces of the inner cathode 36 and the outer cathode 33. The anode layer ion source 32 can be connected and installed with the source body mounting interface 19 on the cavity 15 through the flange 38, and the surfaces of the cathodes 36, 33 are arranged to face the inside of the cavity. By providing the cathode covers 34, 35, the deposition of amorphous carbon film layer particles onto the surfaces of the inner cathode 36 and the outer cathode 33 during the film coating process can be effectively avoided, thereby not affecting the discharge stability in the later stage, and not causing defects such as particles in the film layer to reduce the wear resistance and corrosion resistance. By using the installation structure of the elastic clamps 37, the cathode covers 34, 35 can be quickly replaced, thereby completely solving the maintenance cleanliness and efficiency of the cathodes 36, 33, improving the maintenance efficiency and improving the film layer quality. The cathode covers 34, 35 have contours corresponding to the surfaces of the cathodes 36, 33, and can be closely attached to the cathodes 36, 33, thereby completely avoiding contamination of the cathodes 36, 33, and achieving plug-and-play, quick replacement, time and labor saving.

[0062] The cathode covers 34, 35 can be made of non-magnetic materials, such as stainless steel or aluminum alloy.

[0063] Embodiment one

[0064] Please refer to Figure 7 , which shows a schematic diagram of a film coating equipment provided with six cavities 15. The six cavities 15 are numbered and distinguished as 1# to 6# in sequence. Among them, the 1# cavity 15 is the feeding cavity 14; the 2# cavity 15 is the first process cavity 13 for performing ion cleaning; the 3# cavity 15 to the 5# cavity 15 are three second process cavities 12 for sequentially performing coating of the first layer of film (first film layer), the second layer of film (second film layer) and the third layer of film (third film layer); and the 6# cavity 15 is the discharging cavity 11.

[0065] When the coating process is performed, the fuel cell metal bipolar plate is hung on multiple vertical turrets, and the turrets are placed on the conveying track 17 at intervals to be conveyed. The first turret loaded with the bipolar plate enters the 1# cavity 15, and after the first plug-in valve 21 is raised to close the 1# cavity 15, the vacuum system starts to pump. When the vacuum reaches the required value, the first turret continues to be transmitted to the 2# cavity 15 for ion cleaning. After cleaning, the first turret continues to be transmitted to the 3# cavity 15 to start coating the first layer of film. After the first layer of film is coated, the first turret continues to be transmitted to the 4# cavity 15 to coat the second layer of film. Then, the first turret continues to be transmitted to the 5# cavity 15 to coat the third layer of film. After the coating is completed, the first turret continues to be transmitted to the 6# cavity 15, and after the film quality is automatically detected and cooled, the first plug-in valve 21 is finally lowered to open the cavity outlet, and the turret carrying the coated bipolar plate is transmitted out of the 6# cavity 15. Thus, a coating cycle is completed.

[0066] In the above process, when the first turret is conveyed from the 1# cavity 15 into the 2# cavity 15, the 2# cavity 15 is closed, and the 1# cavity 15 is opened, the second turret is transmitted into the 1# cavity 15, and the vacuum system is pumped to the required value. When the first turret enters the 3# cavity 15, the second turret is conveyed into the 2# cavity 15, and at the same time, the third turret is conveyed into the 1# cavity 15. In this way, the 1# cavity 15 continuously enters new turrets according to the process rhythm. Similarly, the coated turrets are continuously transmitted out of the 6# cavity 15. In this way, one turret can be simultaneously conveyed into each of the six cavities 15, and the six turrets can be simultaneously processed in the six cavities 15 to form a continuous coating operation.

[0067] For example, for the fuel cell metal bipolar plate, a carbon coating (DLC film) needs to be coated on its surface. The above-mentioned coating equipment with six cavities 15 can be used, with the 1# cavity 15 as the feeding cavity 14, the 2# cavity 15 as the ion source, the 3# cavity 15 as the magnetron sputtering source body, the 4# cavity 15 as the magnetron sputtering source body, the 5# cavity 15 as the ion source, and the 6# cavity 15 as the discharging cavity 11. All source bodies are respectively assembled on the source body mounting interface 19 on the left and right sides of the cavity 15. The turret for hanging the workpiece can adopt a vertical turret (for example, the turret disclosed in CN217459580U). The turret rotates in the cavity 15 to coat the surface of the bipolar plate. The turret is sequentially conveyed through the 2#, 3#, 4#, and 5# process cavities 15 to complete the coating.

[0068] When the turntable carries the bipolar plate into the 1# cavity 15, the equipment starts to pump and heat to reach the required vacuum and temperature for the process. The turntable carries the bipolar plate into the 2# cavity 15 first, and then the ion beam cleaning is performed. After the cleaning, the bipolar plate enters the 3# cavity 15, and the first layer of pure metal film is plated on the surface of the bipolar plate by the magnetron sputtering source. Then, the bipolar plate enters the 4# cavity 15, and the second layer of compound film is plated by the magnetron sputtering. Then, the bipolar plate enters the 5# cavity 15, and the third layer of DLC carbon film is plated by the ion source. After the process in the 5# cavity 15 is completed, the bipolar plate is transferred into the 6# cavity 15, and then is transferred out, and the plating is completed. As can be seen, the use of three second process cavities 12 to perform a single film plating process can significantly reduce the plating preparation time between different film layers, increase the loading capacity in a unit volume, and greatly improve the production efficiency. Compared with the traditional vertical single furnace cavity equipment, the production efficiency can be greatly improved.

[0069] Example Two

[0070] Please refer to Figure 8 , which shows a schematic diagram of a plating equipment with nine cavities 15. The nine cavities 15 are numbered in order from 1# to 9# to distinguish them. Among them, the 1# cavity 15 is the feeding cavity 14; the 2# cavity 15 is the first process cavity 13, which is used for ion cleaning; the 3# cavity 15 to the 8# cavity 15 are six second process cavities 12, which are used for plating the first layer of film, the second layer of film and the third layer of film in turn; and the 9# cavity 15 is the discharging cavity 11. According to the process rhythm, among the six second process cavities 12, the 4# cavity 15 to the 7# cavity 15 are used to perform the plating process of the second layer of film. In this embodiment, the film layers that the bipolar plate needs to be plated are divided into three layers of pure metal film, compound film and DLC carbon film. After the first layer of pure metal film is plated in the 3# cavity 15, the bipolar plate can enter the 4#, 5#, 6# and 7# cavities 15 to perform the multi-step plating of the second layer of compound film. After the plating of the second layer of film is completed, the bipolar plate enters the 8# cavity 15 to plate the third layer of DLC carbon film, and then is transferred into the 9# cavity 15 and is transferred out. That is, according to the film layer structure and actual process requirements, the number of plating cavities 15 can be extended to match the process rhythm, so as to improve the utilization rate of a single cavity 15, thereby improving the efficiency.

[0071] Example Three

[0072] Please refer to Figure 9Fig. 1 shows a schematic view of a coating equipment with five cavities 15 according to a preferred embodiment of the present application. The five cavities 15 are distinguished by being numbered 1# to 5# in sequence. The 1# cavity 15 is the feeding cavity 14; the 2# cavity 15 is the first process cavity 13 for ion cleaning and coating of the first layer; the 3# cavity 15 to the 4# cavity 15 are two second process cavities 12 for coating of the second layer and the third layer in sequence; and the 5# cavity 15 is the discharging cavity 11. In this embodiment, the ion cleaning and the coating of the first layer are completed in the same 2# cavity 15. After the rotating frame carries the bipolar plate from the 1# cavity 15 into the 2# cavity 15, the ion cleaning is performed first, and then the coating of the first layer is performed; then the bipolar plate enters the 3# cavity 15 and the 4# cavity 15 in sequence to coat the second layer and the third layer, respectively; and after the coating is completed, the bipolar plate is transferred into the 5# cavity 15 and then discharged. That is, according to the actual process requirements, the number of coating cavities 15 can also be compressed by reusing the 2# cavity 15 (the first process cavity 13) for cleaning as a coating cavity 15 (the second process cavity 12), and three independent process cavities 15 are also formed for coating, which can meet the requirement for the number of the overall coating cavities 15 when three layers of coating layers are coated.

[0073] The above embodiment improves the production efficiency by increasing the furnace charging amount and reducing the coating preparation time, expands the furnace charging amount in unit volume, and greatly improves the production efficiency. Compared with the traditional vertical single furnace cavity equipment, the production efficiency can be greatly improved.

[0074] In summary, the coating equipment of the present application has a simple structure, high interchangeability between cavities, and can be used for different film layer processes. By reasonably configuring the number of process cavities according to the process rhythm, selecting the most suitable source for coating different film layers, and assisting with the rotatable rotating frame and providing stable process conditions such as pressure and temperature, high-quality coated products can be obtained, the efficiency is improved, and the comprehensive cost is reduced. The present application can not only be used for large-scale batch production, but also can meet various coating process requirements by configuring different numbers of cavities and different source bodies on the cavities, and is suitable for new product research and development.

[0075] Although the embodiments of the present application have been described in detail above, it is obvious to those skilled in the art that various modifications and changes can be made to these embodiments. However, it should be understood that such modifications and changes all fall within the scope and spirit of the present application described in the claims. Moreover, the present application described herein can have other embodiments, and can be implemented or realized in various ways.

Claims

1. A continuous coating equipment for metal bipolar plates of fuel cells, characterized in that, include: Multiple cavities, including a feeding cavity, a first process cavity, multiple second process cavities, and a discharging cavity arranged sequentially and sealed together; A conveyor track is installed in the cavity to sequentially transport the rotating frame and its loaded bipolar plates between the cavities. The cavity is provided with a rotating frame lifting and rotating device to lift the rotating frame from the conveyor track and rotate the rotating frame. The first process cavity and the second process cavity are respectively provided with source body mounting interfaces, each cavity is provided with a heating module, and each cavity is connected to a vacuum system; The first process chamber is used to clean the bipolar plate, and each of the second process chambers is used to perform a film coating process on the bipolar plate in sequence. The rotating frame lifting and rotating device includes a second reducer and a second motor that form a rotatable connection. The second reducer and the second motor are connected to the cylinder rod of the lifting cylinder. A rotating chuck is provided on the upper end of the rotating part of the second reducer. The rotating chuck is used to engage with the bottom of the rotating frame to form a fit. When the cylinder rod of the lifting cylinder rises, it drives the second reducer and the second motor to rise, so that the rotating chuck is inserted into the bottom of the rotating frame to form a rotatable fit. This lifts the rotating frame off the conveyor track and removes it from the conveyor track. The second reducer is driven by the second motor to rotate, thereby driving the rotating chuck to rotate synchronously, and the process is carried out during the rotation.

2. The continuous coating equipment for fuel cell metal bipolar plates according to claim 1, characterized in that, The first process chamber is provided with a first source body mounting interface, and a first source body is provided on the first source body mounting interface. The first process chamber is used to perform pre-coating cleaning on the bipolar plate that is rotating on the rotating frame conveyed by the feeding chamber through the first source body. There are at least three second process chambers, and each second process chamber is provided with a second source body mounting interface, and a second source body is provided on the second source body. Each second process chamber is used to perform a first film layer, a second film layer, and a third film layer coating process on the bipolar plate that is rotating on the rotating frame conveyed by the first process chamber through the second source body.

3. The continuous coating equipment for fuel cell metal bipolar plates according to claim 1, characterized in that, The first process chamber is provided with a first source body mounting interface, and a first source body is provided on the first source body mounting interface. The first process chamber is used to perform pre-coating cleaning on the bipolar plate that is rotating on the rotating frame conveyed by the feeding chamber through the first source body, and to continue the first film layer coating process on the cleaned bipolar plate through the first source body. There are at least two second process chambers, and each second process chamber is provided with a second source body mounting interface, and a second source body is provided on the second source body mounting interface. Each second process chamber is used to perform the second film layer and third film layer coating process sequentially on the bipolar plate that is rotating on the rotating frame conveyed by the first process chamber through the second source body.

4. The continuous coating equipment for fuel cell metal bipolar plates according to claim 2 or 3, characterized in that, The first film layer comprises a pure metal film layer, the second film layer comprises a compound film layer, and the third film layer comprises an amorphous carbon film layer.

5. The continuous coating equipment for fuel cell metal bipolar plates according to claim 2 or 3, characterized in that, The first source includes an ion source, and the second source includes a magnetron sputtering source, a multi-arc source, a filtered arc source, an evaporation source, an ion source, an ion implantation source, or an atomic deposition source.

6. The continuous coating equipment for fuel cell metal bipolar plates according to claim 1, characterized in that, The source body mounting interfaces are provided in pairs on the cavity sidewalls on the left and right sides of the conveying track.

7. The continuous coating equipment for fuel cell metal bipolar plates according to claim 1, characterized in that, The vacuum system is equipped with a molecular pump, which is located in the first process chamber and the second process chamber.

8. The continuous coating equipment for fuel cell metal bipolar plates according to claim 7, characterized in that, The first process cavity and the second process cavity are respectively provided with cylindrical target mounting interfaces.

9. The continuous coating equipment for fuel cell metal bipolar plates according to claim 1, characterized in that, The heating module includes an electric heater disposed on the inner wall of the cavity.

10. The continuous coating equipment for fuel cell metal bipolar plates according to claim 5, characterized in that, The ion source includes an anode layer ion source, and a cathode cover is provided on the cathode surface of the anode layer ion source.

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