TFT liquid crystal glass platinum channel hot replacement method

Abstract

The application provides a TFT liquid crystal glass platinum channel hot replacement method, which comprises the following steps: firstly, emptying the glass liquid in the kiln and the platinum channel; secondly, keeping the kiln, normal position platinum channel and forming furnace in high-temperature operation; thirdly, replacing the platinum channel of the fault position by cooling; and finally, restoring normal production after the platinum channel of the fault position is reinstalled and heated to the target temperature. The local replacement of the platinum channel of the fault position avoids the cold repair replacement of the whole hot end equipment, reduces the fault recovery time, greatly reduces the fault recovery cost, reduces the cost of purchasing new equipment materials, and effectively guarantees the production and operation of the company.

Description

Technical Field

[0001] The invention belongs to the technical field of TFT liquid crystal glass manufacturing, and in particular relates to a platinum channel hot replacement method. Background Art

[0002] During the LCD glass manufacturing process, a platinum channel heats, clarifies, homogenizes, and cools the high-temperature molten glass pre-melted in furnace 1. This process adjusts the temperature and discharge volume required for the molding process, before flowing into the glass collection tank of molding furnace 8 for overflow molding. The platinum channel acts as a glass refining furnace, further processing and optimizing the molten glass. Based on process requirements, the platinum channel is divided into a heating section 2, a clarification section 3, a cooling section 4, a stirring section 5, a cooling section 6, and a feeding section 7. The platinum channel structure consists of two sections: the heating section 3 and the clarification section 3 are integrated, while the cooling section 4, the stirring section 5, the cooling section 6, and the feeding section 7 are also integrated. The two sections are connected by two platinum flanges. Due to the clarification process, the temperature in the heating and clarification areas of the channel can exceed 1640°C. Due to the high temperatures and erosion caused by the flow of molten glass, the service life of the platinum channel in these heating and clarification areas is the same as that of the entire platinum channel. The life of the platinum channel, in turn, affects the service life of the kiln and molding furnace.

[0003] At present, the service life of the platinum channel is shortened. The production line scrapping caused by failures in the heating and clarification areas accounts for 80% of the total production line scrapping. The investment cost of the TFT liquid crystal glass hot end equipment is high. The scrapping of the production line due to the failure of the platinum channel has a serious impact on production operations. At present, the entire hot end equipment is cooled to room temperature and then cold repaired. All hot end equipment is scrapped and new kilns, platinum channels, molding furnaces and other equipment are reinstalled. Since the failure of some areas of the platinum channel will cause the entire hot end line to be replaced as a whole, the cold repair cost is high, which has a serious impact on production operations, cost control and user protection. Summary of the Invention

[0004] The present invention aims to provide a method for hot replacement of the platinum channel of TFT liquid crystal glass, addressing the existing problem of platinum channel failure requiring the complete replacement of the hot end line. This method involves cooling the platinum channel at the faulty location. The molten glass in the kiln and platinum channel is maintained at high temperatures, while the kiln, platinum channels in the normal location, and the forming furnace are maintained. Once the faulty platinum channel is reinstalled, the temperature is raised to the target temperature and normal production resumes.

[0005] In order to achieve the above object, the present invention adopts the following technical solutions:

[0006] A method for hot replacement of a platinum channel of a TFT liquid crystal glass comprises the following steps:

[0007] Step 1: Stop feeding the furnace and drain the glass liquid in the furnace and platinum channel;

[0008] Step 2: Control the temperature of the kiln, the platinum channel in the normal position, and the molding furnace to the preset temperature respectively, and keep them warm at the preset temperature;

[0009] Step 3: Remove the platinum channel at the faulty part and install a new platinum channel at the faulty part;

[0010] Step 4: After heating the new platinum channel, connect it to the kiln and the platinum channel in the normal position;

[0011] Step 5: Perform secondary heating treatment on the new platinum channel;

[0012] Step 6: Add materials to the kiln and establish the liquid level. After the kiln, platinum channel and molding furnace return to normal production status according to the liquid level height, the hot replacement of the TFT LCD glass platinum channel is completed.

[0013] Furthermore, in step 2, the preset temperature of the kiln is 1500°C to 1550°C.

[0014] Furthermore, in step 2, the preset temperature of the platinum channel in the normal position is 1100° C. to 1200° C.

[0015] Furthermore, in step 2, the preset temperature of the molding furnace is 1050°C to 1150°C.

[0016] Furthermore, in step 2, the continuous heat preservation time continues until the hot replacement of the platinum channel of the TFT liquid crystal glass is completed.

[0017] Furthermore, in step 4, the one-time heating treatment specifically includes the following steps: the new platinum channel is heated to 1260°C to 1300°C.

[0018] Furthermore, in step 5, the secondary temperature raising treatment specifically includes the following steps: the new platinum channel starts from a temperature of 1260°C to 1300°C and is heated to 1550°C.

[0019] Furthermore, in step 6, the liquid level height satisfies a normal production state.

[0020] Furthermore, in step 4, the heating rate of the primary heating treatment is 8°C / Hr.

[0021] Furthermore, in step 5, the heating rate of the secondary heating treatment is 8°C / Hr.

[0022] Compared with the prior art, the present invention has the following beneficial effects:

[0023] The present invention provides a method for hot replacement of the platinum channel of a TFT liquid crystal glass. This method only involves partial replacement of the faulty part of the platinum channel, greatly reducing the cost of fault recovery. The kiln, the platinum channel in normal parts, and the forming furnace remain at high temperatures and do not require replacement, thereby reducing the cost of purchasing new equipment and materials. The present invention significantly reduces fault handling time, with a fault recovery time of approximately 50 days, compared to approximately 90 days for the conventional hot end line cold repair method. The present invention also significantly reduces on-site recovery workload, as only partial replacement of the platinum channel significantly reduces the workload and intensity of employee work.

[0024] Furthermore, the insulation temperature of the kiln of the present invention is selected to be 1500°C to 1550°C. At this temperature, the refractory material of the kiln is in the most stable state, which can prevent the refractory material from shrinking and cracking after cooling, and at the same time can reduce the heating amount and effectively control the cost.

[0025] Furthermore, the insulation temperature of the platinum channel in the normal position of the present invention is selected to be 1100°C to 1200°C. At this temperature, the platinum channel and the refractory material are in the most stable state, which can avoid the platinum channel from shrinking and tearing at low temperature and the refractory material from shrinking and cracking after cooling.

[0026] Furthermore, the insulation temperature of the forming furnace of the present invention is selected to be 1050° C. to 1150° C. At this temperature, the refractory material of the forming furnace is in a stable state.

[0027] Furthermore, the present invention performs a primary heating treatment and a secondary heating treatment on the new platinum channel. After the primary heating treatment, the expansion of the platinum ends, and the heating in the subsequent recovery process has no effect on the expansion of the platinum. After the secondary heating treatment, there is no glass liquid in the platinum channel, and the glass liquid cannot support the platinum. Excessive temperature will reduce the strength of the platinum and pose a hidden danger to the safety of the equipment. Therefore, the above-mentioned secondary heating treatment can ensure the fluidity of the glass liquid and the safety of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic diagram of the kiln, platinum channel, and forming furnace;

[0029] Among them, 1. Kiln; 2. Platinum channel heating section; 3. Platinum channel clarification section; 4. Platinum channel cooling section; 5. Platinum channel stirring section; 6. Platinum channel cooling section; 7. Platinum channel feeding section; 8. Molding furnace.

[0030] Figure 2 This is a graph of thermal expansion coefficients for fused and sintered mullite bricks, PtRh10, PtRh20, and HDZS-65. DETAILED DESCRIPTION

[0031] In order to enable those skilled in the art to better understand the solution of the present invention, the technical solution of the present invention will be further described in detail below with reference to the accompanying drawings. The content described is intended to explain the present invention rather than to limit it.

[0032] It should be noted that the terms "including" and "having" and any variations thereof in the description and claims of the present invention are intended to cover non-exclusive inclusions. For example, a process, method, system, product or apparatus comprising a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units that are not explicitly listed or are inherent to these processes, methods, products or apparatus.

[0033] A hot replacement repair method for the platinum channel of TFT liquid crystal glass, including the replacement process of the platinum channel at the faulty part and the process control requirements of the kiln, platinum channel and forming furnace during the replacement process, such as Figure 1 The kiln, platinum tunnel and forming furnace shown.

[0034] The existing kiln refractory material is made of electric melting and sintering mullite bricks, the platinum channel uses platinum-rhodium alloys of PtRh10 and PtRh20 respectively, and the forming furnace uses HDZS-65 refractory material.

[0035] A method for hot replacement and repair of a platinum channel of a TFT liquid crystal glass comprises the following steps:

[0036] Step 1: Stop charging the kiln and drain the glass liquid in the kiln and platinum channel;

[0037] Step 2: During and after the furnace glass liquid is vented, the furnace temperature is gradually lowered from the normal production process temperature to 1500℃~1550℃, and maintained at this temperature for a long time until the platinum channel is replaced in a hot state and the normal production process is restored. The long-term maintenance at 1500℃~1550℃ is mainly considered to be the most stable state of the furnace refractory at this temperature, which can avoid shrinkage and cracking of the refractory after cooling, while reducing the heating amount and effectively controlling costs;

[0038] Step 3: Remove the faulty part of the platinum channel and reinstall the platinum channel, related refractory materials and auxiliary facilities;

[0039] Step 4: The temperature of the normal part of the platinum channel is lowered from the normal production temperature to 1100℃~1200℃ until the hot replacement of the platinum channel is completed and the normal production process is restored. The temperature of 1100℃~1200℃ is maintained for a long time. The main consideration is that the platinum channel and refractory materials are in the most stable state at this temperature, which can avoid the platinum channel from shrinking and tearing at low temperature and the refractory materials from shrinking and cracking after cooling.

[0040] Step 5: During the replacement of the platinum channel, the forming furnace is lowered from the normal production temperature to 1050℃~1150℃ and maintained. This temperature requirement is mainly considered in consideration of the energy consumption of the equipment and the glass collection tank of the forming furnace. At this temperature, the refractory material is in a stable state until the hot replacement of the platinum channel is completed and the normal production process is restored;

[0041] Step 6: After the platinum channel at the faulty part is replaced, heat it up at a rate of 8°C / Hr. When the temperature reaches 1260°C-1300°C, connect the newly replaced platinum channel to the furnace and the insulated platinum channel. This temperature condition is mainly considered to ensure that the expansion of platinum at 1260°C-1300°C has ended, and the subsequent temperature increase of the recovery process has no effect on the expansion of platinum. After the connection is completed, continue to heat the newly replaced platinum channel at this rate until the temperature reaches 1550°C. This temperature is mainly considered to ensure the fluidity of the glass liquid and the safety of the equipment. Because there is no glass liquid in the platinum channel at this time, there is no glass liquid to support the platinum. Excessive temperature will reduce the strength of the platinum, posing a hidden danger to equipment safety.

[0042] Step 7: The kiln is installed with a feeding machine to start feeding and establish the liquid level. The kiln, platinum channel and molding furnace resume normal production processes according to the liquid level. The process recovery goal is to restore the liquid level and the kiln, platinum channel and molding furnace processes to their original positions at the same time, complete the hot replacement of the platinum channel and enter normal production status.

[0043] By using this method to partially replace the faulty platinum channel, production line recovery time was shortened to 50 days, capital investment for fault recovery was reduced by over 60%, and employee workload and intensity were significantly reduced. By maintaining appropriate insulation temperatures for the platinum channel and molding furnace in the normal area, the equipment in the normal area remained in good condition. After the fault was repaired, the entire platinum channel system continued to operate smoothly, product quality remained stable, and the platinum channel's service life met design requirements, effectively ensuring the company's production and operating cost control and a stable supply of products to customers.

[0044] The following detailed description is the description of the embodiments, and is intended to provide further detailed description of the present invention. Unless otherwise indicated, all technical terms adopted in the present invention have the same meaning as those generally understood by those skilled in the art of the application. The terms used in the present invention are only for describing specific embodiments, and are not intended to limit the exemplary embodiments according to the present invention.

[0045] Example 1

[0046] Step 1: Stop charging the kiln and drain the glass liquid in the kiln and platinum channel;

[0047] Step 2: During and after the furnace glass liquid is vented, the furnace temperature is gradually lowered from the normal production process temperature to 1500°C and maintained at this temperature for a long time until the platinum channel is replaced in a hot state and the normal production process is restored. The long-term maintenance at 1500°C is mainly due to the fact that the furnace refractory material is in the most stable state at this temperature, which prevents the refractory material from shrinking and cracking after cooling, while reducing the heating amount and effectively controlling costs;

[0048] Step 3: Remove the faulty part of the platinum channel and reinstall the platinum channel, related refractory materials and auxiliary facilities;

[0049] Step 4: The temperature of the normal part of the platinum channel is lowered from the normal production temperature to 1200℃ until the hot replacement of the platinum channel is completed and the normal production process is restored. The temperature of 1200℃ is maintained for a long time. The main consideration is that the platinum channel and refractory materials are in the most stable state at this temperature, which can avoid the platinum channel from shrinking and tearing at low temperature and the refractory materials from shrinking and cracking after cooling.

[0050] Step 5: During the replacement of the platinum channel, the forming furnace is lowered from the normal production temperature to 1150°C and maintained. This temperature requirement is mainly considered in consideration of the energy consumption of the equipment and the glass collection tank of the forming furnace. At this temperature, the refractory material is in a stable state until the hot replacement of the platinum channel is completed and the normal production process is restored;

[0051] Step 6: After the platinum channel at the faulty part is replaced, heat it up at a rate of 8°C / Hr. When the temperature reaches 1260°C, connect the newly replaced platinum channel to the furnace and the insulated platinum channel. This temperature condition is mainly considered to connect the platinum expansion at 1260°C, and the subsequent temperature increase of the recovery process will have no effect on the expansion of the platinum. After the connection is completed, continue to heat the newly replaced platinum channel at this rate until the temperature reaches 1550°C. This temperature is mainly considered to ensure the fluidity of the glass liquid and the safety of the equipment. Because there is no glass liquid in the platinum channel at this time, there is no glass liquid to support the platinum. Excessive temperature will reduce the strength of the platinum, posing a hidden danger to the safety of the equipment.

[0052] Step 7: The kiln is installed with a feeding machine to start feeding and establish the liquid level. The kiln, platinum channel and molding furnace resume normal production processes according to the liquid level. The process recovery goal is to restore the liquid level and the kiln, platinum channel and molding furnace processes to their original positions at the same time, complete the hot replacement of the platinum channel and enter normal production status.

[0053] Example 2

[0054] Step 1: Stop charging the kiln and drain the glass liquid in the kiln and platinum channel;

[0055] Step 2: During and after the furnace glass liquid is vented, the furnace temperature is gradually lowered from the normal production process temperature to 1525°C and maintained at this temperature for a long time until the platinum channel is replaced in a hot state and the normal production process is restored. The reason for maintaining the temperature at 1525°C for a long time is that the furnace refractory material is in the most stable state at this temperature, which prevents the refractory material from shrinking and cracking after cooling, while reducing the heating amount and effectively controlling costs.

[0056] Step 3: Remove the faulty part of the platinum channel and reinstall the platinum channel, related refractory materials and auxiliary facilities;

[0057] Step 4: The temperature of the normal part of the platinum channel is lowered from the normal production temperature to 1100°C until the hot replacement of the platinum channel is completed and the normal production process is restored. The temperature of 1100°C is maintained for a long time. The main consideration is that the platinum channel and refractory materials are in the most stable state at this temperature, which can avoid the platinum channel from shrinking and tearing at low temperature and the refractory materials from shrinking and cracking after cooling.

[0058] Step 5: During the replacement of the platinum channel, the forming furnace is lowered from the normal production temperature to 1050℃ and maintained. This temperature requirement is mainly considered in consideration of the energy consumption of the equipment and the glass collection tank of the forming furnace. At this temperature, the refractory material is in a stable state until the hot replacement of the platinum channel is completed and the normal production process is restored;

[0059] Step 6: After the platinum channel at the faulty part is replaced, the temperature is increased at a rate of 8°C / Hr. When the temperature reaches 1300°C, the newly replaced platinum channel is connected to the furnace and the platinum channel in the insulation state. This temperature condition is mainly considered to be connected because the expansion of platinum at 1300°C has ended, and the subsequent temperature increase of the recovery process has no effect on the expansion of platinum. After the connection is completed, the newly replaced platinum channel is heated at this rate until the temperature reaches 1550°C. This temperature is mainly considered to ensure the fluidity of the glass liquid and the safety of the equipment. Because there is no glass liquid in the platinum channel at this time, there is no glass liquid to support the platinum. Excessive temperature will reduce the strength of the platinum, posing a hidden danger to equipment safety.

[0060] Step 7: The kiln is installed with a feeding machine to start feeding and establish the liquid level. The kiln, platinum channel and molding furnace resume normal production processes according to the liquid level. The process recovery goal is to restore the liquid level and the kiln, platinum channel and molding furnace processes to their original positions at the same time, complete the hot replacement of the platinum channel and enter normal production status.

[0061] Example 3

[0062] Step 1: Stop charging the kiln and drain the glass liquid in the kiln and platinum channel;

[0063] Step 2: During and after the furnace glass liquid is vented, the furnace temperature is gradually lowered from the normal production process temperature to 1550°C and maintained at this temperature for a long time until the platinum channel is replaced in a hot state and the normal production process is restored. The reason for maintaining the temperature at 1550°C for a long time is that the furnace refractory material is in the most stable state at this temperature, which prevents the refractory material from shrinking and cracking after cooling, while reducing the heating amount and effectively controlling costs.

[0064] Step 3: Remove the faulty part of the platinum channel and reinstall the platinum channel, related refractory materials and auxiliary facilities;

[0065] Step 4: The temperature of the normal part of the platinum channel is lowered from the normal production temperature to 1150°C until the hot replacement of the platinum channel is completed and the normal production process is restored. The temperature of 1150°C is maintained for a long time. The main consideration is that the platinum channel and refractory materials are in the most stable state at this temperature, which can avoid the platinum channel from shrinking and tearing at low temperatures and the refractory materials from shrinking and cracking after cooling.

[0066] Step 5: During the replacement of the platinum channel, the forming furnace is lowered from the normal production temperature to 1100°C and maintained. This temperature requirement is mainly considered in consideration of the energy consumption of the equipment and the glass collection tank of the forming furnace. At this temperature, the refractory material is in a stable state until the hot replacement of the platinum channel is completed and the normal production process is restored;

[0067] Step 6: After the platinum channel at the faulty part is replaced, heat it up at a rate of 8°C / Hr. When the temperature reaches 1280°C, connect the newly replaced platinum channel to the furnace and the insulated platinum channel. This temperature condition is mainly considered to connect the platinum expansion at 1280°C, and the subsequent temperature increase of the recovery process will have no effect on the expansion of platinum. After the connection is completed, continue to heat the newly replaced platinum channel at this rate until the temperature reaches 1550°C. This temperature is mainly considered to ensure the fluidity of the glass liquid and the safety of the equipment. Because there is no glass liquid in the platinum channel at this time, there is no glass liquid to support the platinum. Excessive temperature will reduce the strength of the platinum, posing a hidden danger to equipment safety.

[0068] Step 7: The kiln is installed with a feeding machine to start feeding and establish the liquid level. The kiln, platinum channel and molding furnace resume normal production processes according to the liquid level. The process recovery goal is to restore the liquid level and the kiln, platinum channel and molding furnace processes to their original positions at the same time, complete the hot replacement of the platinum channel and enter normal production status.

[0069] It is known from common technical knowledge that the present invention may be implemented by other embodiments that do not deviate from its spirit or essential features. Therefore, the embodiments disclosed above are merely illustrative in all respects and are not intended to be exclusive. All modifications within the scope of the present invention or equivalent to the scope of the present invention are intended to be encompassed by the present invention.

Claims

1. A method for hot replacement of platinum channel of TFT liquid crystal glass, characterized in that: The following steps are involved: Step 1: Stop feeding the furnace and drain the glass liquid in the furnace and platinum channel; Step 2: Control the temperature of the kiln, the platinum channel in the normal position, and the molding furnace to the preset temperature respectively, and keep them warm at the preset temperature; Step 3: Remove the platinum channel at the faulty part and install a new platinum channel at the faulty part; Step 4: After heating the new platinum channel, connect it to the kiln and the platinum channel in the normal position; Step 5: Perform secondary heating treatment on the new platinum channel; Step 6: Add materials to the kiln and establish the liquid level. After the kiln, platinum channel and molding furnace return to normal production state according to the liquid level height, the hot replacement of the TFT LCD glass platinum channel is completed; In step 4, the primary heating treatment specifically includes the following steps: heating the new platinum channel to 1260° C. to 1300° C.; In step 5, the secondary heating treatment specifically includes the following steps: The new platinum channel starts at a temperature of 1260°C to 1300°C and rises to 1550°C.

2. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, characterized in that: In step 2, the preset temperature of the kiln is 1500°C~1550°C.

3. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, characterized in that: In step 2, the preset temperature of the platinum channel in the normal position is 1100° C. to 1200° C.

4. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, characterized in that: In step 2, the preset temperature of the molding furnace is 1050°C~1150°C.

5. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, characterized in that: In step 2, the continuous heat preservation time continues until the hot replacement of the platinum channel of the TFT liquid crystal glass is completed.

6. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, characterized in that: In step 6, the liquid level meets the normal production state.

7. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, characterized in that: In step 4, the heating rate of the primary heating treatment is 8°C / Hr.

8. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, characterized in that: In step 5, the heating rate of the secondary heating treatment is 8°C / Hr.

Images