A gas cup and gas manifold assembly

Abstract

The present invention relates to a gas supply cup (1) detachably provided in a fixed gas manifold structure (2) of an atomic layer deposition apparatus, and comprising: a cup bottom (10) including a gas supply passage (13) extending through the cup bottom (10) from a cup bottom outer surface (11) to a cup bottom inner surface (12) on the other side of the cup bottom (10); and a cup wall (20) surrounding the cup bottom (10) and extending laterally with respect to the cup bottom (10) in a direction away from the cup bottom (10) on the inner surface side of the cup bottom (10), such that the cup wall (20) and the cup bottom inner surface (12) form a gas supply space (30).

Description

TECHNICAL FIELD

[0001] The present invention relates to a gas cup and a gas manifold assembly. BACKGROUND

[0002] The present invention relates to an atomic layer deposition (ALD) apparatus, in which a thin film is grown on a substrate during atomic layer deposition by exposing the thin film surface to alternating gaseous precursors. When these gaseous precursors are exposed on the surface, they react and form a layer of thin film on the surface. The part where the thin film growth occurs needs to be frequently disassembled for cleaning. The thin film growth starts from a mixing point where the gases meet each other and mix. This point can be in a mixing tube, for example, or in some other part of the atomic layer deposition apparatus. This part, as well as any other parts from the mixing point to the pumping line, need to be disassembled for cleaning. These parts are often difficult to disassemble, and the entire apparatus has to be cooled down so that the operator can open the connections and get access to the parts that have been cleaned. The time required for slowly cooling and heating an apparatus of this size takes up production time. SUMMARY

[0003] The object of the present invention is to provide an easily accessible and dismountable mixing point, in which the gaseous precursors meet for the first time.

[0004] The object of the present invention is achieved by a gas cup and a gas manifold assembly, which are characterized as described in the present invention. Preferred embodiments of the invention are disclosed in the present invention.

[0005] The present invention is based on the idea of providing a dismountable and compact mixing component, in which the precursor gases meet for the first time, and which can be removed from the atomic layer deposition apparatus and replaced with a clean mixing component, in order to save process time and minimize the maintenance time of the atomic layer deposition apparatus.

[0006] The gas cup according to the present invention is dismountably arranged in a fixed gas manifold structure of the atomic layer deposition apparatus. The fixed gas manifold structure provides the atomic layer deposition apparatus with a gas channel from a gas source. The gas cup is arranged in connection with the fixed gas manifold structure before the reaction chamber to which the gas is supplied. The gas cup comprises a cup bottom and a cup wall. The cup bottom comprises a gas supply channel extending through the cup bottom from an outer surface of the cup bottom to an inner surface of the cup bottom on the other side; the cup wall extends laterally with respect to the cup bottom in a direction away from the cup bottom on the inner surface side of the cup bottom, so that the cup wall and the inner surface of the cup bottom form a gas supply space. The cup wall extends further in a direction away from the cup bottom at least partly on the outer surface side of the cup bottom, so that a flange is formed on the opposite side of the cup bottom from the gas supply space.

[0007] Preferably, the gas supply cup is a circumferential cup having a cylindrical outer surface. The flange can have other forms, or the cylindrical surface can not have a portion that provides an attachment structure to the fixed gas manifold structure.

[0008] According to the present invention, at least one of the gas supply passages is formed with a conical shape through the cup bottom, such that the gas supply passage has a smaller gas inlet on the outer surface of the cup bottom than a gas outlet on the inner surface of the cup bottom. Preferably, the gas supply passage with a conical shape is disposed at a middle portion or a center of the cup bottom.

[0009] According to the present invention, the flange includes an alignment portion disposed to connect to a corresponding portion in the fixed gas manifold structure to align the gas supply cup such that the gas supply passages are aligned with corresponding gas supply passages of the fixed gas manifold structure.

[0010] Preferably, the alignment portion is disposed on the flange as a protrusion to otherwise form a discontinuity on a symmetrical flange. Alternatively, the flange is asymmetrical and the alignment portion forms an alignment portion through which the gas supply cup is properly placed to the fixed gas manifold structure.

[0011] According to the present invention, the gas supply cup includes a gas homogenization surface disposed in the gas supply space and disposed at a distance from and at least partially parallel to the inner surface of the cup bottom to form a gas homogenization zone between the inner surface of the cup bottom and the gas homogenization surface.

[0012] Preferably, the gas homogenization surface is disposed at least partially opposite to the gas supply passages disposed in the cup bottom. The gas homogenization surface can be a plate connected to the cup wall or the cup bottom. The plate can take a circular arc form, providing a flow path for gas at the center of the gas supply cup. Alternatively, the plate can be disposed at the center of the gas supply space parallel to the cup bottom, providing a flow path for gas between the edge of the plate and the cup wall. Alternatively, the gas homogenization surface can provide a flow path for gas between the cup wall and the homogenization surface and at the center of the gas supply space.

[0013] According to the present invention, the gas homogenization surface includes passages from the gas homogenization zone through the homogenization surface to the gas supply space outside the gas homogenization zone to allow gas to flow from the gas supply passages through the gas homogenization zone to the gas supply space outside the gas homogenization zone. The passages on the gas homogenization surface provide a flow path for gas.

[0014] According to the present invention, the gas supply cup further comprises a gas mixing cone surface disposed in the gas supply space, the gas mixing cone surface being disposed at a distance from the cup bottom inner surface to form a gas mixing zone between the cup bottom inner surface and the gas mixing cone surface. The gas mixing cone surface can be connected to the cup bottom or the cup wall.

[0015] According to the present invention, the gas mixing cone surface is disposed in the gas supply space such that an apex of the gas mixing cone surface is at a furthest distance from the gas homogenization surface, and by disposing the gas mixing cone surface at a distance from the cup wall, a gas flow zone is provided between the gas mixing cone surface and the cup wall to provide a flow path from the gas mixing zone to the gas supply space outside the gas mixing zone. Alternatively, the gas mixing cone surface can comprise a hole at the top of the cone surface to provide a gas flow path from the gas mixing zone to the gas supply space outside the gas mixing zone.

[0016] According to the present invention, the gas supply cup further comprises a gas mixing cone surface disposed in the gas supply space, the gas mixing cone surface being disposed at a distance from the gas homogenization surface to form a gas mixing zone between the gas homogenization surface and the gas mixing cone surface. Alternatively or additionally, the gas mixing cone surface can be connected to the gas homogenization surface in addition to the cup wall and the cup bottom.

[0017] According to the present invention, the gas mixing cone surface is disposed in the gas supply space such that an apex of the gas mixing cone surface is at a furthest distance from the gas homogenization surface, and by disposing the gas mixing cone surface at a distance from the cup wall, a gas flow zone is provided between the gas mixing cone surface and the cup wall to provide a flow path from the gas mixing zone to the gas supply space outside the gas mixing zone.

[0018] According to an alternative embodiment of the present invention, the gas mixing cone surface is disposed in the gas supply space such that an apex of the gas mixing cone surface is at a closest distance from the gas homogenization surface, and by disposing the gas mixing cone surface at a distance from the cup wall, a gas flow zone is provided between the gas mixing cone surface and the cup wall to provide a flow path from the gas mixing zone to the gas supply space outside the gas mixing zone.

[0019] According to the present invention, the gas mixing cone surface can be replaced by a gas mixing concave surface or a gas mixing curved surface.

[0020] A gas manifold assembly of an atomic layer deposition apparatus according to the present invention comprises a gas manifold structure, a gas supply cup removably arranged in connection with the gas manifold structure, and a gas guide structure in connection with the gas manifold structure. The gas manifold structure is arranged in the atomic layer deposition apparatus as a fixed part of the atomic layer deposition apparatus. The gas manifold structure comprises gas supply channels extending from a gas source to a manifold surface. The gas supply cup has a cup bottom and comprises gas supply channels extending through the cup bottom from a cup bottom outer surface to a cup bottom inner surface on the other side of the cup bottom. The gas supply cup is removably arranged in connection with the gas manifold structure such that the cup bottom outer surface is arranged against the manifold surface and the gas supply channels of the gas supply cup are aligned with corresponding gas supply channels of the gas manifold structure to form a continuous gas supply channel. The gas guide structure extends between the gas manifold structure and a reaction chamber of the atomic layer deposition apparatus. The gas guide structure is arranged to guide gas from the gas source through the gas supply channels of the gas manifold structure and further through the gas supply channels of the gas supply cup to the reaction chamber of the atomic layer deposition apparatus.

[0021] According to the invention, the gas supply cup is positioned to the gas manifold structure by gravity and the gas supply channels of the gas supply cup are aligned with the gas supply channels of the gas manifold structure by alignment structures. The gas supply cup is placed in connection with the gas manifold structure and connected to the gas manifold structure by gravity without any other components. When the gas supply cup is removed for cleaning, it is only necessary to lift the gas supply cup from the gas manifold structure.

[0022] According to the invention, the alignment structures comprise alignment parts in the gas supply cup arranged in connection to corresponding parts in the fixed gas manifold structure to align the gas supply channels of the gas supply cup with corresponding gas supply channels of the gas manifold structure.

[0023] According to the invention, the alignment parts are arranged in connection with flanges of the gas supply cup.

[0024] According to the invention, the gas supply cup described in various embodiments can be used in a gas manifold assembly as described above.

[0025] An advantage of the invention is that film growth of the reaction precursor gas is limited to the easily accessible gas supply cup. The gas supply cup can be removed from the atomic layer deposition apparatus after each run. The gas supply cup is located on the fixed gas manifold structure and the position of the gas supply cup is locked such that the gas supply channels at the gas supply cup and at the gas manifold structure intersect each other. The locking of the gas supply cup is provided by the cup structure and / or the gas manifold structure without the need for additional components or locking parts.

[0026] It is an advantage of the present invention that, since the gas supply channel is provided in the cup bottom, the walls of the gas supply cup can be as thin as possible. This reduces the weight, which is advantageous since the gas supply cup can have a diameter of about 150-300 mm and a weight of about 10-20 kg.

[0027] The cup is positioned by gravity, so it can simply be removed by lifting it through the maintenance door of the atomic layer deposition apparatus.

[0028] The use of the gas supply cup of the present invention can solve an important cleaning problem, since cleaning can be performed without cooling the reactor of the atomic layer deposition apparatus. BRIEF DESCRIPTION OF DRAWINGS

[0029] The present invention will be described in detail with specific reference to the drawings, which show specific embodiments of the invention.

[0030] Figure 1 A gas supply cup according to the present invention is shown;

[0031] Figure 2 A bottom side of a gas supply cup according to the present invention is shown;

[0032] Figure 3 A gas manifold assembly according to the present invention is shown;

[0033] Figure 4 A fixed gas manifold structure of a gas manifold assembly according to the present invention is shown; and

[0034] Figure 5 A gas manifold assembly according to the present invention is shown. DETAILED DESCRIPTION

[0035] Figure 1 A gas supply cup 1 according to the present invention is shown, which comprises a cup bottom 10 and a cup wall 20 surrounding the cup bottom 10. The cup bottom 10 has a cup bottom outer surface 11 and a cup bottom inner surface 12, and a gas supply channel 13 extending through the cup bottom 10 from the cup bottom outer surface 11 to the cup bottom inner surface 12. The cup bottom outer surface 11 is surrounded by a flange 40 protruding from the cup bottom outer surface 11. The cup bottom outer surface 11 is shown using dashed lines, since the cup bottom outer surface 11 is not actually shown from this angle. Figure 1The cup wall 20 is shown as a flange 40 extending from the cup bottom outer surface 11, but the flange can also be provided on the cup bottom outer surface 11 such that the cup wall 20 and the flange 40 are separate without forming a continuous outer surface of the gas supply cup 1. The flange 40 forms a contact space together with the cup bottom outer surface 11 for the stationary gas manifold structure 2. The contact space 40a of the gas supply cup 1 is provided to accommodate the manifold base 22 of the stationary gas manifold structure 2, to which the gas supply cup 1 is connected by gravity. The manifold base 22 comprises a manifold surface 21 in contact with the cup bottom outer surface 11. Figure 1 The gas supply space 30 formed by the cup wall 20 and the cup bottom inner surface 12 is also shown. The gas supply space 30 forms a platform for the first encounter of the precursor gas supplied from the gas supply channels 13.

[0036] Figure 2 The bottom side of a gas supply cup 1 according to the present application is shown. The figure shows the cup bottom outer surface 11, which comprises gas inlets 13a leading to the gas supply channels 13. The cup wall 20 extends through the cup bottom 10 such that a flange 40 is formed around the cup bottom outer surface 11. The flange 40 comprises an alignment portion 41, which is provided to connect to a corresponding portion in the stationary gas manifold structure 2 to align the gas supply cup 1 such that the gas supply channels 13 are aligned with the corresponding gas supply channels of the stationary gas manifold structure 2. In Figure 2 The alignment portion 41 is in this embodiment shown as a protrusion from the flange 40 towards the contact space 40a. However, the alignment portion 41 can comprise another shape suitable for positioning the cup bottom outer surface 11 of the gas supply cup in the correct direction relative to the manifold surface 21 of the stationary gas manifold structure 2.

[0037] Figure 3 An embodiment is shown in which the gas supply space 30 is provided with a gas homogenization surface 31 and a gas mixing cone 33. The gas homogenization surface 31 is provided at a distance from and at least partly parallel to the cup bottom inner surface 12 to form a gas homogenization zone 32 between the cup bottom inner surface 12 and the gas homogenization surface 31. The gas homogenization surface 31 is provided at least partly opposite to the gas supply channels 13 or at least some of the gas supply channels 13. The form of the gas homogenization surface 31 can be of any type. Figure 3 An embodiment is shown in which the gas homogenization surface 31 is a plate, which is provided according to the cup wall 20 as a circumferential arc to keep the opening in the middle.

[0038] Figure 3A gas mixing cone 33 is also shown disposed in the gas supply space 30 such that the gas mixing cone 33 is connected to the plate forming the gas homogenisation surface 31. The gas mixing cone 33 is disposed at a distance from the gas homogenisation surface 31 to form a gas mixing zone 34 between the gas homogenisation surface 31 and the gas mixing cone 33. The gas mixing cone 33 has an apex 35 pointing towards the opening of the gas supply cup 1. The opening of the gas supply cup 1 is opposite the cup bottom inner surface 12 and is surrounded by the cup wall 20. When the gas homogenisation surface 31 is not present, the gas mixing cone 33 forms a gas mixing zone 34 between the cup bottom inner surface 11 and the gas mixing cone 33 or between the gas homogenisation surface 31 and the gas mixing cone 33.

[0039] In the gas homogenisation zone 32, the gas from the gas supply channel 13 is homogenised; in the gas mixing zone 36, the gas is mixed before flowing out of the gas supply cup 1. The mixing cone 33 and the cup wall 20 provide a flow path for the gas from the mixing zone 32 to the gas supply space 30 and further out of the gas supply cup 1. Thus, the gas mixing cone 33 is disposed at a distance from the cup wall 20 to provide a flow path from the gas mixing zone 34 to the gas supply space 30 outside the gas mixing zone 34.

[0040] Figure 3 A gas manifold assembly according to the present application is also shown, wherein the gas supply cup 1 is connected to the gas manifold structure 2 by gravity, meaning that there are no connecting parts connecting the gas supply cup 1 and the gas manifold structure 2 together. The gas supply cup 1 is disposed in the gas manifold structure 2 such that the cup bottom outer surface 11 is placed on the manifold surface 21 of the gas manifold structure 2. The gas supply channels 13 of the gas supply cup 1 are aligned with the corresponding gas supply channels 23 of the gas manifold structure 2 to form a continuous gas supply channel extending through the gas manifold structure 2 from a gas source (not shown in the figures) via the gas manifold surface 21 and the cup bottom outer surface 11 of the gas supply cup 1 to the gas supply channels 13 of the gas supply cup 1 and finally to the gas supply space 30 inside the cup wall 20 of the gas supply cup 1 to the reactor of an atomic layer deposition apparatus. The cup wall 20 is surrounded by the gas manifold structure 2 such that a space is provided between the cup wall 20 and the gas manifold structure 2. In the shown embodiment, the gas supply channels 13 are formed as a circular cone shape through the cup bottom 10 such that the gas inlet 13a of the gas supply channel 13 on the cup bottom outer surface 11 is smaller than the gas outlet 13b of the gas supply channel 13 on the cup bottom inner surface 12. Figure 3 In the shown embodiment, one of the gas supply channels 13 is formed as a circular cone shape through the cup bottom 10 such that the gas inlet 13a of the gas supply channel 13 on the cup bottom outer surface 11 is smaller than the gas outlet 13b of the gas supply channel 13 on the cup bottom inner surface 12. Figure 3It is further shown that the homogenization surface 31 is arranged in the gas supply space 30 such that the homogenization surface 31 forms a connection with the cup wall 20 and that a central portion of the gas supply space 30 remains open for the gas to flow from the homogenization zone 32 to the gas mixing zone 34, which is formed by the gas mixing cone surface 33. In this embodiment, the gas mixing cone surface 33 is connected to the homogenization surface 31 and the gas mixing cone surface 33 surrounds the open central portion of the homogenization surface 31 such that gas flowing through the opening enters the gas mixing cone surface 33.

[0041] Preferably, the thickness of the cup bottom 10 is at least three times the thickness of the cup wall 20. The advantage of the thick cup bottom 10 is that the precursor gas from the gas supply channel 13 forms a gas barrier flow, which prevents the film deposition from penetrating the gas supply channel 13 and thus no film deposition on the cup bottom outer surface 11.

[0042] Figure 3 It is further shown that the manifold base 22, which comprises the manifold surface 21, is arranged in contact with the cup bottom outer surface 11 such that the gas supply channel 13 of the gas supply cup 1 is aligned with the corresponding gas supply channel 23 of the gas manifold structure 2 to form a continuous gas supply channel.

[0043] Figure 4 It is shown that the stationary gas manifold structure 2 of the gas manifold assembly according to the present application, wherein the stationary gas manifold structure 2 further comprises a sealing flange 24 connected to the stationary gas manifold structure 2. The sealing flange 24 is arranged to form a coaxial opening between the outer wall of the gas supply cup 1 and the inner wall 24a of the sealing flange 24 together with the cup wall 20 of the gas supply cup 1. The coaxial opening is used to supply an inert gas to form a gas barrier against film growth outside the gas supply cup 1. This provides the further advantage that the gas supply cup 1 is the only component where film growth occurs for the first time with the precursor gas and can easily be removed from the atomic layer deposition apparatus.

[0044] Figure 4 It is further shown that the manifold surface 21 on which the gas supply cup 1 is placed such that the cup bottom outer surface 11 is placed against the manifold surface 21 such that the gas supply channel 3 of the gas supply cup 1 is aligned with the corresponding gas supply channel 23 of the gas manifold structure 2. Figure 4 It is further shown that the alignment portion 25 of the gas manifold structure 2 is arranged on the gas manifold base 22, which corresponds to the alignment portion 41 of the gas supply cup 1.

[0045] Figure 5A gas manifold assembly according to the present application is shown comprising a gas manifold structure 2 provided in an atomic layer deposition apparatus as a stationary part of the atomic layer deposition apparatus, a gas supply cup 1 provided in connection with the gas manifold structure 2, and a gas guiding structure 5 in connection with the gas manifold structure and extending to a reaction chamber 50 of the atomic layer deposition apparatus. The gas manifold structure 2 comprises gas supply channels 23 extending from a gas source to a manifold surface 21 and further to gas supply channels 13 of the gas supply cup 1 provided in a cup bottom 10, such that the gas supply channels 13 extend through the cup bottom 10. The gas supply cup 1 is detachably provided in connection with the gas manifold structure 2 such that an outer cup bottom surface 11 is provided to abut against and rest on the manifold surface 21. The gas supply channels 13 of the gas supply cup 1 are aligned with the corresponding gas supply channels 23 of the gas manifold structure 2 to form a continuous gas supply channel. The gas manifold assembly comprises a gas guiding structure 5 extending between the gas manifold structure 2 and the reaction chamber 50 of the atomic layer deposition apparatus to guide the gas from the gas supply cup to the reaction chamber. The gas supply cup 1 is provided within a sealing flange 24 of the gas manifold structure 2 and the sealing flange 24 is connected to the gas guiding structure 5.

[0046] The application has been described above in connection with the examples shown in the drawings. However, the application is by no means limited to the examples described above, but can vary within the scope of the claims.

Claims

1. A gas supply cup (1) of an atomic layer deposition apparatus, characterized in that The gas supply cup (1) is detachably arranged in a fixed gas manifold structure (2) of the atomic layer deposition apparatus, and the gas supply cup (1) comprises: a cup bottom (10) comprising gas supply passages (13) extending through the cup bottom (10) from a cup bottom outer surface (11) to a cup bottom inner surface (12) on the other side of the cup bottom (10); a cup wall (20) surrounding the cup bottom (10) and extending laterally relative to the cup bottom (10) in a direction away from the cup bottom (10) on the inner surface side of the cup bottom (10) such that the cup wall (20) and the cup bottom inner surface (12) form a gas supply space (30); the cup wall (20) further extends at least partially in a direction away from the cup bottom (10) on the outer surface side of the cup bottom (10) such that a flange (40) is formed on the opposite side of the cup bottom (10) from the gas supply space (30), and a gas mixing cone surface (33) arranged in the gas supply space (30), the gas mixing cone surface (33) being arranged at a distance from the cup bottom inner surface (12) to form a gas mixing zone (34) between the cup bottom inner surface (12) and the gas mixing cone surface (33).

2. The gas serving cup (1) according to claim 1, characterized in that At least one of the gas supply passages (13) forms a conical shape through the cup bottom (10) such that an inlet (13a) of the gas supply passage (13) on the cup bottom outer surface (11) is smaller than an outlet (13b) of the gas supply passage (13) on the cup bottom inner surface (12).

3. The gas serving cup (1) according to claim 1 or 2, characterized in that The flange (40) comprises an alignment portion (41) arranged to connect to a corresponding portion in the fixed gas manifold structure (2) to align the gas supply cup (1) such that the gas supply passages (13) are aligned with corresponding gas supply passages of the fixed gas manifold structure (2).

4. The gas serving cup (1) according to claim 1, characterized in that The gas supply cup (1) comprises a gas homogenization surface (31) arranged in the gas supply space (30), and the gas homogenization surface (31) is arranged at a distance from the cup bottom inner surface (12) and at least partially parallel to the cup bottom inner surface (12) to form a gas homogenization zone (32) between the cup bottom inner surface (12) and the gas homogenization surface (31).

5. The gas serving cup (1) according to claim 4, characterized in that The gas homogenization surface (31) comprises passages from the gas homogenization zone (32) through the gas homogenization surface (31) to the gas supply space (30) outside the gas homogenization zone (32) to allow gas flow from the gas supply passages (13) through the gas homogenization zone (32) to the gas supply space (30) outside the gas homogenization zone (32).

6. The gas serving cup (1) according to claim 1, characterized in that The gas mixing cone (33) is arranged in the gas supply space (30) such that an apex (35) of the gas mixing cone (33) is at a furthest distance from the cup bottom inner surface (12), and by arranging the gas mixing cone (33) at a distance from the cup wall (20), a gas flow zone (36) is provided between the gas mixing cone (33) and the cup wall (20) to provide a flow path from the gas mixing zone (34) to the gas supply space (30) outside the gas mixing zone (34).

7. The gas serving cup (1) according to claim 4 or 5, characterized in that The gas supply cup (1) further comprises a gas mixing cone (33) arranged in the gas supply space (30), the gas mixing cone (33) being arranged at a distance from the gas homogenization surface (31) to form a gas mixing zone (34) between the gas homogenization surface (31) and the gas mixing cone (33).

8. The gas serving cup (1) according to claim 7, characterized in that The gas mixing cone (33) is arranged in the gas supply space (30) such that an apex (35) of the gas mixing cone (33) is at a furthest distance from the gas homogenization surface (31), and by arranging the gas mixing cone (33) at a distance from the cup wall (20), a gas flow zone (36) is provided between the gas mixing cone (33) and the cup wall (20) to provide a flow path from the gas mixing zone (34) to the gas supply space (30) outside the gas mixing zone (34).

9. A gas manifold assembly of an atomic layer deposition apparatus, characterized by, The gas manifold assembly comprises: a fixed gas manifold structure (2) arranged in the atomic layer deposition apparatus as a fixed part of the atomic layer deposition apparatus, the fixed gas manifold structure (2) comprising gas supply passages (23) extending from a gas source to a manifold surface (21); a gas supply cup (1) having a cup bottom (10) and comprising a gas supply passage (13) extending through the cup bottom (10) from a cup bottom outer surface (11) to a cup bottom inner surface (12) on the other side of the cup bottom (10), the gas supply cup (1) being detachably arranged in connection with the fixed gas manifold structure (2) such that the cup bottom outer surface (11) is arranged against the manifold surface (21) and the gas supply passage (13) of the gas supply cup (1) is in alignment with a corresponding gas supply passage (23) of the fixed gas manifold structure (2) to form a continuous gas supply passage; and a gas guiding structure (5) in connection with the fixed gas manifold structure (2), the gas guiding structure (5) extending between the fixed gas manifold structure (2) and a reaction chamber of the atomic layer deposition apparatus, the gas guiding structure (5) being arranged to guide gas from the gas source through the gas supply passages (23) of the fixed gas manifold structure (2) and further through the gas supply passage (13) of the gas supply cup (1) up to the reaction chamber of the atomic layer deposition apparatus.

10. The gas manifold assembly of claim 9, wherein, The gas supply cup (1) is positioned to the fixed gas manifold structure (2) by gravity, and the gas supply channel (13) of the gas supply cup (1) is aligned with the gas supply channel (23) of the fixed gas manifold structure (2) by an alignment structure.

11. The gas manifold assembly of claim 10, wherein, The alignment structure comprises an alignment portion (41) in the gas supply cup (1) arranged to connect to a corresponding portion in the fixed gas manifold structure (2) to align the gas supply channel (13) of the gas supply cup (1) with the respective gas supply channel (23) of the fixed gas manifold structure (2).

12. The gas manifold assembly of claim 11, wherein, The alignment portion (41) is arranged to connect with a flange (40) of the gas supply cup (1).

13. The gas manifold assembly of claim 9, wherein, The gas supply cup (1) is according to any one of claims 1 to 8.

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