Insulating reflective strip and its application

Abstract

The present invention provides insulating reflective striping and its applications. The insulating reflective striping comprises, from top to bottom, a reflective coating, a substrate layer, and an adhesive layer stacked sequentially, or alternatively, a reflective substrate layer and an adhesive layer. The raw materials used to prepare both the reflective coating and the reflective substrate layer contain a reflective filler, the reflective filler comprising any one or a combination of at least two of titanium oxide, barium sulfate, pearlescent powder, zinc oxide, zirconium oxide, talc, a cycloolefin copolymer, or a 4-methylpentene polymer. The insulating reflective striping of the present invention has a good reflective effect while avoiding the shortcomings of reflective strips with a metal reflective layer.

Description

[0001] This application claims priority to patent application number 202310742968.0 (the filing date of the prior application is June 21, 2023, and the name of the invention is "An Insulating Reflective Strip and Its Application"). Technical Field

[0002] The invention belongs to the technical field of solar cells and relates to an insulating reflective strip and application thereof. Background Art

[0003] In existing crystalline silicon photovoltaic cell modules, there will be certain gaps between the edges of the cells and between the cells and the frames, which wastes the utilization rate of light. In order to further improve the output power, single-glass single-sided modules will try to increase the light reflectivity of the backplane or back film, or use white packaging film with the backplane. Single-glass double-sided modules will print a white grid on the transparent backplane. Double-glass double-sided modules will stick reflective strips between the cell spacing or coat white glaze on the back glass. Double-glass single-sided modules will directly use white film on the back. Existing reflective strips are all made by applying a coating on an organic film substrate to form a micro-shape with favorable optical reflection, and then sputtering or evaporating a metal reflective layer on this micro-shape to achieve the optimal maximization of reflectivity and light utilization, thereby improving light utilization and increasing power output. Generally, the reflective strip with a metal reflective layer has a power output 2 to 3W higher (or higher) than the method of coating white glaze on glass, but the reflective strip with a metal reflective layer has the following disadvantages: 1) Because of the metal layer and the conductive surface, it cannot be pasted between the four sides of the frame and the solar cell to ensure the edge is far away, which also loses a lot of light; 2) Because the metal reflective layer (usually aluminum) is easily oxidized and darkened, it cannot be used for packaging in the form of bifacial power generation with a transparent backplane on the back. In this case, the reflective coating can only be printed on the transparent backplane, and the light reflecting ability is not as good as the reflective strip with a metal reflective layer; 3) Because of the metal reflective layer, it has a negative impact on PID (Potential Induced Degradation) of the potential photovoltaic panel assembly induced potential decay; 4) Because of the directional reflection caused by the geometric optical shape, there is a light pollution problem in the city.

[0004] However, the method of coating glass with white glaze has the following disadvantages: 1) the reflectivity is not as good as that of reflective strips with a metal reflective layer; 2) because the white glaze needs to be sintered at a high temperature, it affects the tempering effect of the glass and causes an increase in the breakage rate.

[0005] The existing grid backplane has a white grid coating printed on the gaps corresponding to the backplane, which has the following disadvantages: 1) The printing process mostly adopts screen printing or gravure printing, which has low printing efficiency and high cost; 2) The printed coating has poor appearance and low reflectivity, and has limited gain to the component.

[0006] Under the above background, it is necessary to develop a reflective strip that can avoid the above shortcomings and ensure the reflection gain, and at the same time its reflection effect is not weaker than the reflective effect of the reflective strip with a metal reflective layer. Therefore, the present invention provides an insulating reflective strip. Summary of the Invention

[0007] In view of the deficiencies in the prior art, the present invention aims to provide an insulating reflective strip and its application, and in particular to provide an insulating reflective strip for use in gaps between photovoltaic module cells.

[0008] In order to achieve the purpose of the invention, the present invention adopts the following technical solutions:

[0009] In a first aspect, the present invention provides an insulating reflective strip, wherein the insulating reflective strip comprises, from top to bottom, a reflective coating layer, a base material layer, and an adhesive layer stacked in sequence, or the insulating reflective strip comprises, from top to bottom, a reflective base material layer and an adhesive layer;

[0010] The raw materials for preparing the reflective coating and the reflective substrate layer both contain reflective fillers, and the reflective fillers include any one or a combination of at least two of titanium oxide, barium sulfate, pearl powder, zinc oxide, zirconium oxide, talc, cycloolefin copolymer (COC) or 4-methylpentene polymer (TPX).

[0011] In the reflective strips provided by the present invention, both the reflective coating and the reflective substrate are insulating reflective layers, eliminating the use of metal or conductive reflective layers. This insulating reflective strip offers superior reflective performance while avoiding the drawbacks of reflective strips with metal reflective layers (the inherent conductive metal layer of metal reflective strips can easily cause internal short circuits).

[0012] Figure 1 This is a light path diagram when the insulating reflective strip of the present invention is used in the gap between solar cells.

[0013] It should be noted that, in all references to “the insulating reflective strip including from top to bottom” in the present invention, “upper” refers to the side of the insulating reflective strip facing the sunlight during use, and “lower” has the opposite meaning to “upper”.

[0014] Preferably, the thickness of the reflective coating is 5 to 150 μm, for example, 5 μm, 10 μm, 20 μm, 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, 110 μm, 120 μm, 130 μm, 140 μm or 150 μm, etc., preferably 5 to 50 μm.

[0015] Preferably, the thickness of the substrate layer is 5 to 200 μm, for example, 5 μm, 10 μm, 20 μm, 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, 110 μm, 120 μm, 130 μm, 140 μm, 150 μm, 160 μm, 170 μm, 180 μm, 190 μm or 200 μm, etc., preferably 10 to 50 μm.

[0016] Preferably, the thickness of the adhesive layer is 10 to 300 μm, for example, 10 μm, 20 μm, 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, 110 μm, 120 μm, 130 μm, 140 μm, 150 μm, 160 μm, 170 μm, 180 μm, 190 μm, 200 μm, 210 μm, 220 μm, 230 μm, 240 μm, 250 μm, 260 μm, 270 μm, 280 μm, 290 μm or 300 μm, etc., preferably 30 to 150 μm. It should be noted that the adhesive layer here refers to both the adhesive layer in the structure where "the insulating reflective strip comprises a reflective coating layer, a base material layer and an adhesive layer stacked in sequence from top to bottom" and the adhesive layer in the structure where "the insulating reflective strip comprises a reflective base material layer and an adhesive layer from top to bottom", that is, the thickness range of the adhesive layer in the two structures is the same.

[0017] Preferably, the raw materials for preparing the reflective coating further include coating resin.

[0018] Preferably, in the reflective coating, the amount of reflective filler added is 5% to 60% of the amount of coating resin added, for example, 5%, 10%, 15%, 20%, 25%, 30%, 35%, 40%, 45%, 50%, 55% or 60%, etc.

[0019] Preferably, the coating resin includes any one of acrylic resin, epoxy resin, polyester resin, fluorocarbon resin, silicone resin, rubber or polyolefin resin or a combination of at least two thereof, and is not limited to thermoplastic resin, thermosetting resin, photocurable resin, thermosetting resin is not limited to free radical system curing, hydroxy isocyanate system curing, epoxy system curing, moisture curing, light curing, electron beam curing, microwave curing, etc.

[0020] Preferably, the material of the substrate layer can be but not limited to: (1) PET, (2) various fluorine films: such as PVDF, PVF, ETFE film, etc., (3) polyolefin films: such as PE, ultra-high molecular weight PE, PP film, etc., (4) nylon film, (5) PC film, etc.

[0021] Preferably, the material of the adhesive layer includes but is not limited to: (1) EVA, (2) POE, (3) PVB, (4) TPU, (5) reactive hot melt adhesive: such as SEBS, acrylic hot melt adhesive, PUR silicone or a mixture of several resins. It should be noted that the adhesive layer here refers to both the adhesive layer in the structure "the insulating reflective strip includes a reflective coating layer, a substrate layer and an adhesive layer stacked in sequence from top to bottom" and the adhesive layer in the structure "the insulating reflective strip includes a reflective substrate layer and an adhesive layer from top to bottom", that is, the selection range of the material of the adhesive layer in the two structures is the same.

[0022] Preferably, the upper surface of the reflective coating is provided with a plurality of prism structures. The provision of such prism structures can improve the reflective efficiency of the reflective coating. In the present invention, "plurality of prism structures" refers to at least two prism structures. This term has the same meaning as that used elsewhere and is not further described.

[0023] In the present invention, the prismatic structure on the upper surface of the reflective coating can be produced by forming first and then curing, curing first and then forming, or directly by thermoplastic molding. The prismatic structure can be formed by die stamping, laser engraving, mechanical engraving, direct chemical reaction molding, or by forming the surface morphology based on the filler shape.

[0024] Preferably, the multiple prism structures are distributed in sequence, and the height of the prism structure is 5-500μm, for example, 5μm, 10μm, 50μm, 100μm, 200μm, 300μm, 400μm or 500μm, etc. The angle between the longitudinal extension line of each prism structure and the longitudinal extension line of the insulating reflective strip is 0° to 90°, for example, 0°, 30°, 60° or 90°, etc. The top angle of the prism structure is 90° to 150°, for example, 90°, 120° or 150°, etc.

[0025] Preferably, a reflective deposition layer is provided on the upper surface of the prism structure.

[0026] Preferably, the thickness of the reflective deposited layer is 1-30 μm, for example, 1 μm, 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, or 30 μm. That is, the reflective deposited layer is a thin layer deposited on the upper surface of the prismatic structure of the reflective coating. Compared to depositing the reflective deposited layer directly on the smooth upper surface of the reflective coating (i.e., in this case, the upper surface of the reflective coating has no prismatic structure), depositing the reflective deposited layer on the upper surface of the prismatic structure can make the insulating reflective strip have a higher reflective efficiency. The reflective deposited layer can be obtained by vacuum sputtering, atomic deposition (ALD), evaporation, plasma deposition (PECVD), CVD, and other methods.

[0027] Preferably, the raw material for preparing the reflective deposition layer includes reflective filler.

[0028] Preferably, the reflective filler includes any one of titanium oxide, barium sulfate, calcium carbonate, pearl powder, zinc oxide, zirconium oxide or talc, or a combination of at least two of them.

[0029] Preferably, a primer layer is provided between the substrate layer and the adhesive layer. The primer layer not only increases the adhesive force between the substrate layer and the adhesive layer, but also protects the substrate from being damaged by ultraviolet rays.

[0030] Preferably, the thickness of the primer layer is 1 to 15 μm, for example, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, 10 μm, 11 μm, 12 μm, 13 μm, 14 μm, 15 μm, etc., preferably 1 to 5 μm.

[0031] Preferably, the raw materials for preparing the primer layer include coating resin.

[0032] Preferably, the coating resin includes silicone resin, fluorocarbon resin, acrylic resin, polyurethane resin, epoxy resin, unsaturated rubber, vinyl resin or modifications and mixtures of the above resins.

[0033] Preferably, the raw materials for preparing the primer layer further include fillers.

[0034] Preferably, the filler includes any one of titanium dioxide, aluminum oxide, zirconium oxide, silicon dioxide, pearl powder or calcium oxide, or a combination of at least two thereof.

[0035] Preferably, in the primer layer, the amount of filler added is 1 to 60% of the amount of coating resin added, for example, 1%, 3%, 5%, 8%, 10%, 15%, 20%, 25%, 30%, 35%, 40%, 45%, 50%, 55%, 60%, etc.

[0036] Preferably, the thickness of the reflective substrate layer is 5 to 200 μm, for example, 5 μm, 10 μm, 20 μm, 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, 110 μm, 120 μm, 130 μm, 140 μm, 150 μm, 160 μm, 170 μm, 180 μm, 190 μm or 200 μm, etc., preferably 10 to 100 μm.

[0037] Preferably, the raw materials for preparing the reflective substrate layer also include a base resin.

[0038] Preferably, in the reflective substrate layer, the amount of reflective filler added is 1-40% of the amount of matrix resin added, for example, 1%, 3%, 5%, 10%, 15%, 20%, 25%, 30%, 35%, 40%, etc.

[0039] Preferably, the matrix resin may be, but is not limited to, PET, PVDF, PVF, ETFE, PE, ultra-high molecular weight PE, PP, PBT, PS, PMMA, nylon, or PC. When the reflective filler is COC or TPX, the principle of foaming phase separation reflection is used, and microphase separation of COC or TPX and the matrix resin such as PET is generated to form an interstitial phase separation layer, thereby improving the reflectivity.

[0040] Preferably, the upper surface of the reflective substrate layer is provided with a plurality of prismatic structures. The provision of the prismatic structures can improve the reflective efficiency of the reflective substrate layer. Methods for forming the prismatic structures on the upper surface of the reflective substrate layer include, but are not limited to, mold embossing, laser engraving, mechanical engraving, direct chemical reaction molding, and surface morphology formation by filler shape.

[0041] Preferably, the multiple prism structures are distributed in sequence, and the height of the prism structure is 5-500μm, for example, 5μm, 10μm, 50μm, 100μm, 200μm, 300μm, 400μm or 500μm, etc. The angle between the longitudinal extension line of each prism structure and the longitudinal extension line of the insulating reflective strip is 0° to 90°, for example, 0°, 30°, 60° or 90°, etc. The top angle of the prism structure is 90° to 150°, for example, 90°, 120° or 150°, etc.

[0042] Preferably, a reflective deposition layer is provided on the upper surface of the prism structure.

[0043] Preferably, the thickness of the reflective deposition layer is 1-30 μm, for example, 1 μm, 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, or 30 μm. That is, the reflective deposition layer is a thin layer deposited on the upper surface of the prismatic structure of the reflective substrate layer. Compared to depositing the reflective deposition layer directly on the smooth upper surface of the reflective substrate layer (i.e., in this case, the upper surface of the reflective substrate layer does not have a prismatic structure), depositing the reflective deposition layer on the upper surface of the prismatic structure can make the insulating reflective strip have a higher reflective efficiency. The reflective deposition layer can be obtained by vacuum sputtering, atomic deposition (ALD), evaporation, plasma deposition (PECVD), CVD, and other methods.

[0044] Preferably, the raw material for preparing the reflective deposition layer includes reflective filler.

[0045] Preferably, the reflective filler includes any one of titanium oxide, barium sulfate, calcium carbonate, pearl powder, zinc oxide, zirconium oxide or talc, or a combination of at least two of them.

[0046] Preferably, a primer layer is provided between the reflective substrate layer and the adhesive layer. The primer layer not only increases the adhesive strength between the two, but also protects the substrate from being damaged by ultraviolet rays.

[0047] Preferably, the thickness of the primer layer is 1 to 15 μm, for example, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, 10 μm, 11 μm, 12 μm, 13 μm, 14 μm, 15 μm, etc., preferably 1 to 5 μm.

[0048] Preferably, the raw materials for preparing the primer layer include coating resin.

[0049] Preferably, the coating resin includes silicone resin, fluorocarbon resin, acrylic resin, polyurethane resin, epoxy resin, unsaturated rubber, vinyl resin or modifications and mixtures of the above resins.

[0050] Preferably, the raw materials for preparing the primer layer further include fillers.

[0051] Preferably, the filler includes any one of titanium dioxide, aluminum oxide, zirconium oxide, silicon dioxide, pearl powder or calcium oxide, or a combination of at least two thereof.

[0052] Preferably, in the primer layer, the amount of filler added is 1 to 60% of the amount of coating resin added, for example, 1%, 3%, 5%, 8%, 10%, 15%, 20%, 25%, 30%, 35%, 40%, 45%, 50%, 55%, 60%, etc.

[0053] Preferably, the reflective substrate layer is further provided with a primer layer on the side away from the adhesive layer. Specifically, the primer layer is provided on the side of the reflective substrate layer away from the adhesive layer and may or may not have a prismatic structure. If a reflective deposition layer is present, the primer layer is provided between the reflective substrate layer and the reflective deposition layer, forming a prismatic structure overall. This primer layer can enhance adhesion and further improve the reflectivity of the reflective strip.

[0054] Preferably, the thickness of the primer layer is 1 to 15 μm, for example, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, 10 μm, 11 μm, 12 μm, 13 μm, 14 μm, 15 μm, etc., preferably 1 to 5 μm.

[0055] Preferably, the raw materials for preparing the primer layer include coating resin and filler.

[0056] Preferably, the coating resin includes silicone resin, fluorocarbon resin, acrylic resin, polyurethane resin, epoxy resin, unsaturated rubber, vinyl resin or modifications and mixtures of the above resins.

[0057] Preferably, the filler includes any one of titanium dioxide, aluminum oxide, zirconium oxide, silicon dioxide, pearl powder or calcium oxide, or a combination of at least two thereof.

[0058] Preferably, in the base coat, the amount of filler added is 1 to 60% of the amount of the coating resin added, for example, 1%, 3%, 5%, 8%, 10%, 15%, 20%, 25%, 30%, 35%, 40%, 45%, 50%, 55%, 60%, etc. The present invention does not impose any specific restrictions on the preparation method of the reflective strip, and the reflective strip can be prepared by conventional methods in the art.

[0059] In a second aspect, the present invention provides an application of the insulating reflective strip as described in the first aspect in the gaps between photovoltaic module cells.

[0060] Compared with the prior art, the present invention has the following beneficial effects:

[0061] The insulating reflective strip of the present invention can reflect sunlight from the gaps between the light-transmitting cells back onto the cells to increase power generation, while also avoiding the risk of internal short circuits in the components that may be caused by the metal layer of conventional metal reflective strips. BRIEF DESCRIPTION OF THE DRAWINGS

[0062] Figure 1 This is a light path diagram when the insulating reflective strip of the present invention is applied to the gap between solar cells;

[0063] Among them, 1-front glass; 2-back glass; 3-battery cell; 4-insulating reflective strip; 5-incident light; 6-reflected light.

[0064] Figure 2 A schematic structural diagram of the insulating reflective strip provided in Example 1;

[0065] Among them, 1-reflective coating, 2-base material layer, 3-adhesive layer.

[0066] Figure 3 A schematic structural diagram of the insulating reflective strip provided in Example 4;

[0067] Among them, 1-reflective coating, 2-substrate layer, 3-adhesive layer, 4-prism structure.

[0068] Figure 4 A schematic structural diagram of the insulating reflective strip provided in Example 5;

[0069] Among them, 1-reflective coating, 2-substrate layer, 3-adhesive layer, 4-reflective deposition layer.

[0070] Figure 5 A schematic structural diagram of the insulating reflective strip provided in Example 8;

[0071] Among them, 1-reflective substrate layer, 2-adhesive layer.

[0072] Figure 6 A schematic structural diagram of the insulating reflective strip provided in Example 11;

[0073] Among them, 1-reflective substrate layer, 2-adhesive layer, 3-prism structure.

[0074] Figure 7 A schematic structural diagram of the insulating reflective strip provided in Example 12;

[0075] Among them, 1 is a reflective substrate layer, 2 is an adhesive layer, and 3 is a reflective deposition layer. DETAILED DESCRIPTION

[0076] The technical solution of the present invention is further described below by way of specific embodiments. It should be understood by those skilled in the art that the embodiments are merely to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0077] The raw materials used in the examples and comparative examples of the present invention are as follows:

[0078] Acrylic resin: brand 73332-S-60 (Changxing Chemical);

[0079] Epoxy resin: brand 128E (Nan Ya);

[0080] Polyester resin: brand NL387-6 (Shanghai Kangming Chemical);

[0081] PET: brand NYS220P (Zhejiang Nanyang Technology);

[0082] EVA: The brand is Saiwu EVA;

[0083] POE: The brand is Saiwu POE.

[0084] Example 1

[0085] In this embodiment, an insulating reflective strip is provided. The insulating reflective strip comprises a reflective coating layer, a base material layer and an adhesive layer stacked in sequence from top to bottom. Figure 2 As shown;

[0086] The thickness of the reflective coating is 20 μm, and the raw materials for preparation include reflective filler (titanium oxide) and coating resin (acrylic resin), and the amount of reflective filler added accounts for 30% of the amount of coating resin added;

[0087] The thickness of the substrate layer is 100 μm and the material is PET;

[0088] The thickness of the adhesive layer is 150 μm and the material is EVA.

[0089] Example 2

[0090] In this embodiment, an insulating reflective strip is provided, which comprises a reflective coating layer, a base material layer and an adhesive layer stacked in sequence from top to bottom;

[0091] The thickness of the reflective coating is 5 μm, and the raw materials for preparation include reflective filler (titanium oxide) and coating resin (epoxy resin), and the amount of reflective filler added accounts for 10% of the amount of coating resin added;

[0092] The thickness of the substrate layer is 50 μm and the material is PET;

[0093] The thickness of the adhesive layer is 10 μm and the material is POE.

[0094] Example 3

[0095] In this embodiment, an insulating reflective strip is provided, which comprises a reflective coating layer, a base material layer and an adhesive layer stacked in sequence from top to bottom;

[0096] The thickness of the reflective coating is 30 μm, and the raw materials for its preparation include reflective filler (titanium oxide) and coating resin (polyester resin), and the amount of reflective filler added accounts for 60% of the amount of coating resin added;

[0097] The thickness of the substrate layer is 200 μm and the material is PET;

[0098] The thickness of the adhesive layer is 300 μm and the material is EVA.

[0099] Example 4

[0100] The only difference between this embodiment and embodiment 1 is that the structure of the insulating reflective strip is slightly different. Specifically, a plurality of prism structures are provided on the upper surface of the reflective coating, and the plurality of prism structures are distributed in sequence (the schematic diagram of the structure is shown in FIG. Figure 3 As shown), the height of the prism structure is 10 μm, the angle between the longitudinal extension line of each prism structure and the longitudinal extension line of the insulating reflective strip is 90°, and the top angle of the prism structure is 120°.

[0101] Example 5

[0102] The difference between this embodiment and embodiment 4 is that the structure of the insulating reflective strip is slightly different. Specifically, a reflective deposition layer is provided on the upper surface of the prism structure (its structural diagram is shown in FIG. Figure 4 As shown), the thickness of the reflective deposition layer is 10 μm, and the raw material for preparing the reflective filler (barium sulfate).

[0103] Example 6

[0104] The only difference between this embodiment and embodiment 5 is that the thickness of the reflective deposition layer is 20 μm.

[0105] Example 7

[0106] The only difference between this embodiment and embodiment 5 is that the thickness of the reflective deposition layer is 5 μm.

[0107] Example 8

[0108] In this embodiment, an insulating reflective strip is provided. The insulating reflective strip comprises a reflective substrate layer and an adhesive layer from top to bottom. The structural diagram thereof is shown in FIG. Figure 5 As shown;

[0109] The thickness of the reflective substrate layer is 100 μm, and the raw materials for preparation include reflective filler (barium sulfate) and base resin (PET), and the amount of reflective filler added accounts for 10% of the amount of base resin added;

[0110] The thickness of the adhesive layer is 150 μm and the material is EVA.

[0111] Example 9

[0112] In this embodiment, an insulating reflective strip is provided, which comprises a reflective substrate layer and an adhesive layer from top to bottom;

[0113] The thickness of the reflective substrate layer is 200 μm, and the raw materials for preparation include reflective filler (barium sulfate) and base resin (PET), and the amount of reflective filler added accounts for 10% of the amount of base resin added;

[0114] The thickness of the adhesive layer is 50 μm and the material is POE.

[0115] Example 10

[0116] In this embodiment, an insulating reflective strip is provided, which comprises a reflective substrate layer and an adhesive layer from top to bottom;

[0117] The thickness of the reflective substrate layer is 200 μm, and the raw materials for preparation include reflective filler (barium sulfate) and base resin (PET), and the amount of reflective filler added accounts for 5% of the amount of base resin added;

[0118] The thickness of the adhesive layer is 300 μm and the material is EVA.

[0119] Example 11

[0120] The only difference between this embodiment and embodiment 8 is that the structure of the insulating reflective strip is slightly different. Specifically, a plurality of prism structures are provided on the upper surface of the reflective substrate layer. The plurality of prism structures are distributed in sequence (the schematic diagram of the structure is shown in FIG. Figure 6 As shown), the height of the prism structure is 15 μm, the angle between the longitudinal extension line of each prism structure and the longitudinal extension line of the insulating reflective strip is 90°, and the top angle of the prism structure is 110°.

[0121] Example 12

[0122] The only difference between this embodiment and embodiment 11 is that the structure of the insulating reflective strip is slightly different. Specifically, a reflective deposition layer is provided on the upper surface of the prism structure (its structural diagram is shown in FIG. Figure 7 As shown), the thickness of the reflective deposition layer is 10 μm, and the raw material for preparing the reflective filler (barium sulfate).

[0123] Example 13

[0124] The only difference between this embodiment and embodiment 12 is that the thickness of the reflective deposition layer is 5 μm.

[0125] Example 14

[0126] The only difference between this embodiment and embodiment 12 is that the thickness of the reflective deposition layer is 20 μm.

[0127] Example 15

[0128] The only difference between this embodiment and embodiment 1 is that the structure of the insulating reflective strip is slightly different. Specifically, a reflective deposition layer is provided on the upper surface of the reflective coating. The thickness of the reflective deposition layer is 10 μm and the raw material for preparing the reflective filler (barium sulfate).

[0129] Example 16

[0130] The only difference between this embodiment and embodiment 8 is that the structure of the insulating reflective strip is slightly different. Specifically, a reflective deposition layer is provided on the upper surface of the reflective substrate layer. The thickness of the reflective deposition layer is 10 μm and the raw material for preparing the reflective filler (barium sulfate).

[0131] Example 17

[0132] The only difference between this embodiment and embodiment 5 is that a primer layer is provided between the substrate layer and the adhesive layer. The primer layer has a thickness of 3 μm and is made of acrylic resin.

[0133] Example 18

[0134] The only difference between this embodiment and embodiment 12 is that a primer layer is provided between the reflective substrate layer and the adhesive layer. The primer layer has a thickness of 5 μm and is made of epoxy resin.

[0135] Example 19

[0136] The only difference between this embodiment and Example 12 is that a primer layer is provided between the reflective substrate layer and the reflective deposition layer. The primer layer has an overall prismatic structure and a thickness of 10 μm. The raw materials for its preparation are epoxy resin and pearlescent powder, wherein the amount of pearlescent powder added accounts for 10% of the amount of epoxy resin added.

[0137] Comparative Example 1

[0138] The only difference between this comparative example and Example 1 is that the reflective filler is replaced with an equal amount of glass powder.

[0139] Comparative Example 2

[0140] The only difference between this comparative example and Example 8 is that the reflective filler is replaced by an equal amount of carbon black.

[0141] The performance test of the insulating reflective strips provided in Examples 1-19 and Comparative Examples 1-2 was conducted using the following test methods:

[0142] (1) The reflectivity test method refers to the IEC-62805-2 test standard;

[0143] (2) The test method for coating adhesion is based on the ASTM D3359-09 tape method for measuring adhesion.

[0144] (3) The damp heat aging test method refers to the test method for damp heat aging at 85°C and 85% RH in GB / T 31034-2014 for insulating backsheets for crystalline silicon solar cell modules. The experimental conditions are 85°C and 85% relative humidity for 2000 hours. Foster EVA lamination is used to test the yellowing ΔE of the backsheet after aging.

[0145] (4) The UV aging test method refers to GB / T 31034-2014 Test method for ultraviolet aging of insulating backsheets for crystalline silicon solar cell modules. The irradiation energy is 300KWh, and the yellowing △b of the backsheet after aging is tested.

[0146] The performance test results are shown in Table 1.

[0147] Table 1

[0148]

[0149]

[0150] As can be seen from Table 1, the insulating reflective strips provided by the embodiments of the present invention all have a relatively high reflectivity (91.3%-97.5%), and the color difference ΔE after damp heat aging and the yellowing Δb after UV aging both meet the requirements.

[0151] Compared with Example 1, the reflectivity of the insulating reflective strip provided in Comparative Example 1 is greatly reduced; compared with Example 8, the reflectivity of the insulating reflective strip provided in Comparative Example 2 is greatly reduced.

[0152] The applicant declares that the present invention uses the above-described embodiments to illustrate the insulating reflective strip and its applications. However, the present invention is not limited to the above-described embodiments, which does not necessarily mean that the present invention must rely on the above-described embodiments in order to be implemented. Those skilled in the art should understand that any improvements to the present invention, equivalent replacements for the raw materials used, additions of auxiliary components, and selection of specific methods, etc., fall within the scope of protection and disclosure of the present invention.

Claims

1. An insulating reflective strip, characterized in that: The insulating reflective strip comprises a reflective coating, a base material layer, and an adhesive layer stacked in sequence from top to bottom; a plurality of prism structures are provided on the upper surface of the reflective coating; a reflective deposition layer is provided on the upper surface of the prism structure; a primer layer is further provided between the base material layer and the adhesive layer; the reflective deposition layer is prepared from barium sulfate; Alternatively, the insulating reflective strip comprises, from top to bottom, a reflective substrate layer and an adhesive layer; the upper surface of the reflective substrate layer is provided with a plurality of prism structures; the upper surface of the prism structures is provided with a reflective deposition layer; a primer layer having an overall prism structure is further provided on a side of the reflective substrate layer away from the adhesive layer, i.e., between the reflective substrate layer and the reflective deposition layer; the reflective deposition layer is prepared from barium sulfate; The raw materials for preparing the reflective coating and the reflective substrate layer both contain reflective fillers, and the reflective fillers include any one or a combination of at least two of titanium oxide, barium sulfate, pearl powder, zinc oxide, zirconium oxide, talc, cycloolefin copolymers or 4-methylpentene polymers.

2. The insulating reflective strip according to claim 1, characterized in that: The thickness of the reflective coating is 5 to 150 μm.

3. The insulating reflective strip according to claim 2, characterized in that: The thickness of the reflective coating is 5 to 50 μm.

4. The insulating reflective strip according to claim 1, characterized in that: The thickness of the substrate layer is 5 to 200 μm.

5. The insulating reflective strip according to claim 4, characterized in that: The thickness of the substrate layer is 10 to 50 μm.

6. The insulating reflective strip according to claim 1, characterized in that: The thickness of the adhesive layer is 10 to 300 μm.

7. The insulating reflective strip according to claim 6, characterized in that: The thickness of the adhesive layer is 30 to 150 μm.

8. The insulating reflective strip according to claim 1, characterized in that: The raw materials for preparing the reflective coating also include coating resin.

9. The insulating reflective strip according to claim 8, characterized in that: In the reflective coating, the amount of reflective filler added accounts for 5 to 60% of the amount of coating resin added.

10. The insulating reflective strip according to claim 8, characterized in that: The coating resin includes any one of acrylic resin, epoxy resin, polyester resin, fluorocarbon resin, silicone resin, rubber or polyolefin resin, or a combination of at least two of them.

11. The insulating reflective strip according to claim 1, characterized in that: The multiple prism structures arranged on the upper surface of the reflective coating are distributed in sequence, the height of the prism structure is 5-500μm, the angle between the longitudinal extension line of each prism structure and the longitudinal extension line of the insulating reflective strip is 0° to 90°, and the top angle of the prism structure is 90° to 150°.

12. The insulating reflective strip according to claim 1, wherein: The thickness of the reflective deposition layer on the upper surface of the prism structure of the reflective coating is 1-30 μm.

13. The insulating reflective strip according to claim 1, characterized in that: The thickness of the primer layer between the substrate layer and the adhesive layer is 1 to 15 μm.

14. The insulating reflective strip according to claim 13, wherein: The thickness of the primer layer between the substrate layer and the adhesive layer is 1 to 5 μm.

15. The insulating reflective strip according to claim 1, characterized in that: The raw materials for preparing the primer layer between the substrate layer and the adhesive layer include coating resin.

16. The insulating reflective strip according to claim 15, characterized in that: The raw materials for preparing the primer layer also include fillers.

17. The insulating reflective strip according to claim 16, wherein: In the primer layer, the amount of filler added is 1 to 60% of the amount of coating resin added.

18. The insulating reflective strip according to claim 1, characterized in that: The thickness of the reflective substrate layer is 5 to 200 μm.

19. The insulating reflective strip according to claim 18, wherein: The thickness of the reflective substrate layer is 10 to 100 μm.

20. The insulating reflective strip according to claim 1, wherein: The raw materials for preparing the reflective substrate layer also include a base resin.

21. The insulating reflective strip according to claim 20, characterized in that: In the reflective substrate layer, the amount of the reflective filler added is 1 to 40% of the amount of the matrix resin added.

22. The insulating reflective strip according to claim 1, characterized in that: The multiple prism structures arranged on the upper surface of the reflective substrate layer are distributed in sequence, the height of the prism structure is 5-500μm, the angle between the longitudinal extension line of each prism structure and the longitudinal extension line of the insulating reflective strip is 0° to 90°, and the top angle of the prism structure is 90° to 150°.

23. The insulating reflective strip according to claim 1, characterized in that: The thickness of the reflective deposition layer on the upper surface of the prism structure of the reflective substrate layer is 1-30 μm.

24. The insulating reflective strip according to claim 1, characterized in that: The thickness of the primer layer between the reflective substrate layer and the reflective deposition layer is 1 to 15 μm.

25. The insulating reflective strip according to claim 24, characterized in that: The thickness of the primer layer between the reflective substrate layer and the reflective deposition layer is 1 to 5 μm.

26. The insulating reflective strip according to claim 1, characterized in that: The raw materials for preparing the primer layer between the reflective substrate layer and the reflective deposition layer include coating resin.

27. The insulating reflective strip according to claim 26, wherein: The raw materials for preparing the primer layer also include fillers.

28. The insulating reflective strip according to claim 27, wherein: In the primer layer, the amount of filler added is 1 to 60% of the amount of coating resin added.

29. Use of the insulating reflective strip according to any one of claims 1 to 28 in the gaps between photovoltaic module cells.

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