Mask assembly

Abstract

This invention discloses a photomask assembly, belonging to the field of display technology. The photomask assembly includes: a support structure comprising multiple first support plates extending in a first direction and multiple second support plates extending in a second direction, wherein the first and second directions are perpendicular; each pair of adjacent first support plates is equally spaced, and each pair of adjacent second support plates is equally spaced, with the first and second support plates intersecting to form multiple support cavities of equal area; and a limiting structure extending in the second direction, comprising multiple vapor deposition openings, fixed to the support structure, wherein the fixing points of the limiting structure and the support structure are arranged around the perimeter of the vapor deposition openings, and the orthographic projection of one vapor deposition opening coincides with the central area of ​​the orthographic projection of a support cavity. This improves the precision of the vapor deposition openings, which is beneficial for narrow bezel designs of products.

Description

Technical Field

[0001] This invention belongs to the field of display technology, and specifically relates to a mask assembly. Background Technology

[0002] Organic light-emitting diodes (OLEDs) offer numerous advantages, including low power consumption, fast response speed, high resolution, thinner and lighter design, and wider viewing angles, making them the latest generation of display technology currently capable of mass production. The light-emitting layer of an OLED display device is primarily deposited onto the display substrate using a mask evaporation method. A metal mask, such as a fine metal mask (FMM), is placed in front of the display substrate as a shielding layer. During the evaporation process, a high-precision metal mask is required to ensure that the material is deposited precisely on the desired areas.

[0003] Currently, in order to shield metal photomasks, a support plate is installed at the bottom of the metal photomask to support the fine metal photomask template.

[0004] However, due to the uneven distribution of the solid material area during the tensioning of the support plate, uneven stress occurs, making it difficult to guarantee the accuracy of the opening in the area, which is not conducive to the narrow frame design of the product. Summary of the Invention

[0005] The purpose of this invention is to provide a mask assembly that can solve the problem that the opening accuracy of the area is difficult to guarantee due to uneven stress on the support plate of the mask during the stretching process.

[0006] In a first aspect, embodiments of the present invention provide a photomask assembly, the photomask assembly comprising:

[0007] A support structure, the support structure comprising a plurality of first support plates extending in a first direction and a plurality of second support plates extending in a second direction, wherein the first direction and the second direction are perpendicular;

[0008] The first support plates are equally spaced from each other, and the second support plates are equally spaced from each other. The first support plates and the second support plates intersect each other, so that the first support plates and the second support plates form a plurality of support cavities with equal areas.

[0009] A limiting structure is provided, which extends in a second direction and includes multiple vapor deposition openings. The limiting structure is fixed to the support structure, wherein the fixing points of the limiting structure and the support structure are arranged around the periphery of the vapor deposition openings, and the center area of ​​the orthographic projection of one vapor deposition opening and the center area of ​​the orthographic projection of the support cavity coincide.

[0010] Optionally, the limiting structure includes a clamping part and a limiting part;

[0011] The limiting part includes multiple limiting plates, each of which has the vapor deposition opening in the middle. The clamping part is located at both ends of the limiting part in the second direction and extends out from the edge of the support structure.

[0012] Optionally, each of the limiting plates includes a half-scale line on its periphery.

[0013] Optionally, the limiting plate is a square plate, and the vapor deposition opening is a circular opening, with the center of the vapor deposition opening coinciding with the center of the square plate.

[0014] Optionally, the area of ​​the orthographic projection of the region enclosed by the half-scaled lines is the first area, and the area of ​​the orthographic projection of the supporting cavity is the second area, wherein the first area is larger than the second area.

[0015] Optionally, the thickness of the limiting portion is less than or equal to 30 micrometers, and the thickness of the limiting portion is the dimension of the limiting portion in a third direction, wherein the third direction is perpendicular to both the first direction and the second direction.

[0016] Optionally, the first support plate and the limiting structure are welded together, and the second support plate and the limiting structure are welded together.

[0017] Optionally, the welding point between the first support plate and the limiting structure is located on the side of the junction between the first support plate and the limiting structure, and the welding point between the second support plate and the limiting structure is located on the side of the junction between the second support plate and the limiting structure.

[0018] Optionally, a welding through hole or a thickness reduction hole is provided at a first position of the first support plate, and the first position is the welding position between the first support plate and the limiting structure;

[0019] The second support plate has a welding through hole or a thickness reduction hole at a second position, which is the welding position between the second support plate and the limiting structure.

[0020] Optionally, after the limiting structure and the supporting structure are fixed, the clamping part and the limiting part are separated.

[0021] Optionally, the mask assembly further includes a fixing frame;

[0022] The first support plate is fixed to the fixed frame, and the second support plate is fixed to the fixed frame.

[0023] Optionally, the fixing frame includes a first fixing groove extending along the first direction and a second fixing groove extending along the second direction;

[0024] The end of the first support plate is fixed in the first fixing groove, the end of the second support plate is fixed in the second fixing groove, the first part of the limiting structure is connected to the first surface of the fixing frame, wherein the first part is the part of the limiting structure that is not connected to the first support plate and the second support plate, and the first surface is the surface of the fixing frame that is in the same plane as the groove of the first fixing groove.

[0025] Optionally, the dimension of the first support plate in the third direction is less than or equal to the distance between the opening of the first fixing groove and the bottom of the first fixing groove;

[0026] The dimension of the second support plate in the third direction is less than or equal to the distance between the opening of the second fixing groove and the bottom of the second fixing groove, wherein the third direction is perpendicular to both the first direction and the second direction.

[0027] The first support plate has a dimension of 10 micrometers or more in the third direction, and the second support plate has a dimension of 10 micrometers or more in the third direction.

[0028] Optionally, the dimension of the first support plate in the second direction is smaller than the dimension of the first fixing groove in the second direction, and the dimension of the second support plate in the first direction is smaller than the dimension of the second fixing groove in the first direction.

[0029] As can be seen from the above embodiments, in this embodiment of the invention, since the support structure includes multiple first support plates extending in a first direction and multiple second support plates extending in a second direction, with equal spacing between each pair of adjacent first support plates and between each pair of adjacent second support plates, multiple support cavities of equal area can be formed between the first and second support plates, allowing the limiting structure to be supported simultaneously in both the first and second directions. Furthermore, since the limiting structure extends in the second direction and includes multiple vapor deposition openings, the limiting structure is fixed to the support structure. The fixing points of the limiting structure and the support structure are arranged around the perimeter of the vapor deposition openings. The orthographic projection of one vapor deposition opening coincides with the central region of the orthographic projection of one support cavity. Therefore, each vapor deposition opening can maintain structural stability under the limiting effect of the limiting structure, while ensuring that each vapor deposition opening is supported by both the first and second support plates, meaning that one vapor deposition opening can be supported simultaneously by two adjacent first support plates and two adjacent second support plates. In this way, the limiting structure that limits the vapor deposition opening and the supporting structure that provides support are spatially separated, so that the supporting structure only provides support and the limiting structure only provides limitation. This avoids deformation of the limiting structure due to the large support requirements of the supporting structure, and thus avoids changes in the size of the vapor deposition opening due to deformation of the limiting structure. Therefore, the accuracy of the vapor deposition opening can be improved, which is beneficial for the narrow bezel design of the product. Attached Figure Description

[0030] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this disclosure. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0031] Figure 1 This is a schematic diagram of one of the structures of a mask assembly provided in an embodiment of the present invention;

[0032] Figure 2 This is a schematic diagram illustrating the assembly of a photomask assembly according to an embodiment of the present invention;

[0033] Figure 3 This is a second schematic diagram illustrating the structure of a mask assembly provided in an embodiment of the present invention.

[0034] Figure 4 This is one of the welding schematic diagrams showing the support structure and limiting structure included in a mask assembly provided in an embodiment of the present invention;

[0035] Figure 5This is a second welding schematic diagram illustrating the support structure and limiting structure included in a mask assembly provided in an embodiment of the present invention;

[0036] Figure 6 This is the third welding schematic diagram illustrating the support structure and limiting structure included in a mask assembly provided in an embodiment of the present invention;

[0037] Figure 7 This is a schematic diagram showing the structure of a first support plate included in a mask assembly provided by an embodiment of the present invention;

[0038] Figure 8 This is a schematic diagram showing the structure of a second support plate included in a mask assembly provided by an embodiment of the present invention;

[0039] Figure 9 This is a schematic diagram showing the limiting structure included in a mask assembly provided by an embodiment of the present invention;

[0040] Figure 10 This is a partial structural diagram of a fixing frame included in a mask assembly provided in an embodiment of the present invention;

[0041] Figure 11 This is a second partial structural diagram of a fixed frame included in a mask assembly provided in an embodiment of the present invention.

[0042] Figure label:

[0043] 1: Support structure; 2: Limiting structure; 3: Fixing frame; 4: Mask body; 11: First support plate; 12: Second support plate; 13: Support cavity; 21: Evaporation opening; 22: Clamping part; 23: Limiting part; 24: Half-etching line; 41: First fixing groove; 42: Second fixing groove; 111: Welding through hole; 112: Thickness reduction hole. Detailed Implementation

[0044] The technical solutions in some embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments provided by the present invention are within the scope of protection of the present invention.

[0045] Unless the context otherwise requires, throughout the specification and claims, the term "comprise" and its other forms, such as the third-person singular "comprises" and the present participle "comprising," are interpreted as open-ended and encompassing, meaning "including, but not limited to." In the description of the specification, terms such as "one embodiment," "some embodiments," "exemplary embodiments," "example," "specific example," or "some examples," etc., are intended to indicate that a particular feature, structure, material, or characteristic associated with that embodiment or example is included in at least one embodiment or example of the invention. The illustrative representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics mentioned may be included in any suitable manner in any one or more embodiments or examples.

[0046] Hereinafter, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of embodiments of the present invention, unless otherwise stated, "a plurality of" means two or more.

[0047] In describing some embodiments, the term "electrical connection" and its derivative expressions may be used. For example, the term "electrical connection" may be used in describing some embodiments to indicate that two or more components have direct physical or electrical contact with each other.

[0048] "A and / or B" includes the following three combinations: A only, B only, and a combination of A and B.

[0049] The use of “configured as” in this article implies an open and inclusive language that does not exclude the applicability to or configuration of devices to perform additional tasks or steps.

[0050] As used herein, “approximately” includes the values ​​stated and the average value within an acceptable range of deviation from the given values, wherein the acceptable range of deviation is determined by those skilled in the art taking into account the measurement under discussion and the error associated with the measurement of the given quantity (i.e., the limitations of the measurement system).

[0051] In this article, "same layer" refers to a layer structure formed using the same film deposition process to create a specific pattern, and then using the same photomask for a single patterning process. Depending on the specific pattern, the single patterning process may include multiple exposure, development, or etching processes, and the specific pattern in the resulting layer structure can be continuous or discontinuous, and these specific patterns may also be at different heights or have different thicknesses. Conversely, "different layers" refers to a layer structure formed using separate film deposition processes to create specific patterns, and then using separate photomasks for a patterning process. For example, "two-layer-different-layer configuration" means that two layer structures are formed separately under corresponding process steps (film deposition process and patterning process).

[0052] This document describes exemplary embodiments with reference to cross-sectional views and / or plan views, which are idealized exemplary drawings. In the drawings, the thickness of layers and regions is enlarged for clarity. Therefore, variations in shape relative to the drawings are contemplated due to, for example, manufacturing techniques and / or tolerances. Thus, exemplary embodiments should not be construed as limited to the shapes of the regions shown herein, but rather include shape deviations due to, for example, manufacturing processes. For example, etched regions shown as rectangular would typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to show the actual shapes of the regions of the device, nor are they intended to limit the scope of the exemplary embodiments.

[0053] This invention provides a mask assembly. Figure 1 This is a schematic diagram of one of the structures of a mask assembly provided in an embodiment of the present invention. Figure 2 This diagram illustrates an assembly of a photomask assembly according to an embodiment of the present invention. Figure 3 This is a second schematic diagram illustrating the structure of a mask assembly provided in an embodiment of the present invention, as shown below. Figure 1 , Figure 2 and Figure 3 As shown, the mask assembly includes:

[0054] The support structure 1 includes a plurality of first support plates 11 extending in a first direction and a plurality of second support plates 12 extending in a second direction, wherein the first direction and the second direction are perpendicular.

[0055] The first support plates 11 are equally spaced apart, and the second support plates 12 are equally spaced apart. The first support plates 11 and the second support plates 12 are intersected, so that the first support plates 11 and the second support plates 12 form a plurality of support cavities 13 with equal areas.

[0056] The limiting structure 2 extends in a second direction and includes multiple vapor deposition openings 21. The limiting structure 2 is fixed on the support structure 1. The fixing points of the limiting structure 2 and the support structure 1 are arranged around the periphery of the vapor deposition openings 21. The orthographic projection of one vapor deposition opening 21 coincides with the central region of the orthographic projection of one support cavity 13.

[0057] As can be seen from the above embodiments, in the embodiments of the present invention, since the support structure 1 includes a plurality of first support plates 11 extending in a first direction and a plurality of second support plates 12 extending in a second direction, and each pair of adjacent first support plates 11 is equally spaced and each pair of adjacent second support plates 12 is equally spaced, a plurality of support cavities 13 with equal areas can be formed between the first support plates 11 and the second support plates 12, so that the limiting structure 2 can be supported in both the first and second directions at the same time. Furthermore, since the limiting structure 2 extends in the second direction, the limiting structure 2 includes multiple vapor deposition openings 21. The limiting structure 2 is fixed on the support structure 1, and the fixing points of the limiting structure 2 and the support structure 1 are arranged around the periphery of the vapor deposition opening 21. The orthographic projection of one vapor deposition opening 21 coincides with the central region of the orthographic projection of one support cavity 13. Therefore, each vapor deposition opening 21 can maintain the stability of the structure under the limiting action of the limiting structure 2. At the same time, each vapor deposition opening 21 can be supported by the first support plate 11 and the second support plate 12 on all four sides. That is, one vapor deposition opening 21 can be supported by two adjacent first support plates 11 and two adjacent second support plates 12 at the same time. In this way, the limiting structure 2, which limits the vapor deposition opening 21, and the supporting structure 1, which provides support, are spatially separated. This allows the supporting structure 1 to only provide support and the limiting structure 2 to only provide limitation. This avoids deformation of the limiting structure 2 due to the large support requirements of the supporting structure 1, and thus avoids changes in the size of the vapor deposition opening 21 due to deformation of the limiting structure 2. As a result, the accuracy of the vapor deposition opening 21 can be improved, which is beneficial for the narrow bezel design of the product.

[0058] It should be noted that the first support plate 11 and the second support plate 12 included in the support structure 1 are both elongated plate-like structures. The first support plate 11 extends in a first direction, and the second support plate 12 extends in a second direction. When the first support plate 11 and the second support plate 12 are intersecting, multiple support cavities 13 of equal area can be formed between the first support plate 11 and the second support plate 12, that is, the first support plate 11 and the second support plate 12 form a grid-like frame structure. In addition, the number of first support plates 11 can be equal to the number of second support plates 12, or it can be different from the number of first support plates 11. The distance between each two adjacent first support plates 11 is the first distance, and the distance between each two adjacent second support plates 12 is the second distance. The first distance can be equal to the second distance, or it can be different from the second distance. The size of the first distance and the size of the second distance are determined according to the size of the limiting structure 2 and the area that the support structure 1 needs to support. This embodiment of the invention does not limit this. Among them, the first aspect is as follows: Figure 1 and Figure 3 The direction shown by X in the middle, the second direction is as follows Figure 3 The direction shown in Y.

[0059] The plane containing the first support plate 11 and the plane containing the second support plate 12 are located on the same plane. The first support plate 11 and the second support plate 12 can be connected by any method such as welding, snap-fitting, or riveting. For example, a first connecting groove can be formed on the first support plate 11, and a second connecting groove can be formed on the second support plate 12, allowing the first support plate 11 and the second support plate 12 to be welded at the first and second connecting grooves. The depth of the first and second connecting grooves is equal to the thickness of the first support plate 11, and the depth of the first and second connecting grooves is equal to the thickness of the second support plate 12. The thickness of the first support plate 11 is its dimension in a third direction, and the thickness of the second support plate 12 is its dimension in a third direction. The third direction is perpendicular to both the first and second directions.

[0060] The limiting structure 2, fixed to the support structure 1, is a long strip-shaped plate structure. Multiple vapor deposition openings 21 are linearly arranged along the second direction, with equal spacing between them. Each vapor deposition opening 21 can be circular, square, rhomboid, or of other shapes; this embodiment of the invention does not limit this. Each vapor deposition opening 21 is opposite to a pixel unit opening on the mask body 4. The shape of the vapor deposition opening 21 is determined based on the pixel unit opening on the mask body 4; this embodiment of the invention does not limit this.

[0061] It should be noted that, since the fixing points of the limiting structure 2 and the supporting structure 1 are arranged around the periphery of the vapor deposition opening 21, the center area of ​​the orthographic projection of one vapor deposition opening 21 and the orthographic projection of one supporting cavity 13 coincides. Therefore, it can be ensured that the bottom of one vapor deposition opening 21 is supported by two adjacent first supporting plates 11 and two adjacent second supporting plates 12, thereby ensuring the limiting effect of the supporting structure 1 on the periphery of the vapor deposition opening 21.

[0062] The following is a detailed description of the specific structures of the limiting structure 2 and the supporting structure 1 included in the mask assembly provided in this embodiment of the invention, as follows:

[0063] In some embodiments, such as Figure 3 and Figure 9 As shown, the limiting structure 2 includes a clamping part 22 and a limiting part 23; the limiting part 23 includes a plurality of limiting plates, each limiting plate having a vapor deposition opening 21 in the middle, the clamping part 22 being located at the two ends of the limiting part 23 in the second direction, and the clamping part 22 extending out from the edge of the supporting structure 1.

[0064] In this embodiment, the limiting plate is a square plate, and multiple limiting plates are arranged linearly along the second direction. Each pair of adjacent limiting plates is connected, forming a plate-like structure with the multiple phase plates connected together. Clamping portions 22 are located at both ends of the limiting portion 23. The ends of the clamping portions 22 have clamping grooves, allowing them to be clamped during the stretching of the mask assembly through the holes in the clamping portions 22, thus maintaining the stability of the entire limiting structure 2.

[0065] Each limiting plate has a vapor deposition opening 21 in its center, which is a welding through hole 111 structure formed in the center of each limiting plate. Furthermore, since the vapor deposition opening 21 is located in the center of the limiting plate, the limiting plate surrounds the vapor deposition opening 21 at the locations where it is formed. This allows each vapor deposition opening 21 to be limited by the limiting plate surrounding it, thus ensuring that the size of each vapor deposition opening 21 remains unchanged without altering the structure of the limiting portion 23.

[0066] Furthermore, each limiting plate includes a half-scale line 24 on its periphery. This makes the periphery of each limiting plate a half-scaled area, thereby reducing the weight of each limiting plate and thus reducing the overall weight of the limiting structure 2, reducing the pressure on the support structure 1. At the same time, the clamping part 22 and the limiting part 23 can be separated at the half-scale line 24.

[0067] It should be noted that the limiting plate can be a square plate, a rectangular plate, a rhomboid plate, or a plate structure of other shapes, and the embodiments of the present invention do not limit this.

[0068] Optionally, the limiting plate is a square plate, and the vapor deposition opening 21 is a circular opening, with the center of the circular opening 21 coinciding with the center of the square plate. This ensures that the area of ​​the limiting plate on the vapor deposition opening 21 is equal in all directions, thereby ensuring that the limiting effect of the limiting plate on the vapor deposition opening 21 is equal in all directions.

[0069] In some embodiments, the area of ​​the orthographic projection of the region enclosed by the half-scale line 24 is the first area, and the area of ​​the orthographic projection of the supporting cavity 13 is the second area, wherein the first area is larger than the second area.

[0070] In this embodiment, since the area of ​​the orthographic projection of the region enclosed by the half-scale line 24 is the first area and the area of ​​the orthographic projection of the supporting cavity 13 is the second area, the first area is larger than the second area. Therefore, it can be ensured that the bottom of a vapor deposition opening 21 is supported by two adjacent first support plates 11 and two adjacent second support plates 12, thereby ensuring the limiting effect of the support structure 1 on the surrounding area of ​​the vapor deposition opening 21.

[0071] Regarding the size requirements of the limiting structure 2, in some embodiments, the thickness of the limiting part 23 is less than or equal to 30 micrometers. The thickness of the limiting part 23 is the dimension of the limiting part 23 in a third direction, wherein the third direction is perpendicular to both the first and second directions. In this way, the overall weight of the limiting structure 2 can be kept at a certain level, reducing the pressure on the supporting structure 1 from the limiting part 23.

[0072] In some embodiments, the connection between the support structure 1 and the limiting structure 2 is achieved by welding the first support plate 11 to the limiting structure 2 and welding the second support plate 12 to the limiting structure 2. This welding of the first support plate 11 to the limiting structure 2 and the second support plate 12 to the limiting structure 2 creates a unified structure between the support structure 1 and the limiting structure 2, facilitating the limiting effect of the support structure 1 on the limiting structure 2.

[0073] It should be noted that if the welding point between the first support plate 11 and the limiting structure 2 is located on the contact surface between the first support plate 11 and the limiting structure 2, and the welding point between the second support plate 12 and the limiting structure 2 is located on the contact surface between the first support plate 11 and the limiting structure 2, then when the first support plate 11 and the limiting structure 2 are welded from the limiting plate toward the first support plate 11, weld slag will remain on the surface of the limiting structure 2 away from the first support plate 11. Similarly, when the second support plate 12 and the limiting structure 2 are welded from the limiting plate toward the second support plate 12, weld slag will remain on the surface of the limiting structure 2 away from the second support plate 12. Subsequently, when the mask body 4 is overlapped on the surface of the limiting structure 2 away from the support structure 1, the weld slag will scratch the mask body 4 or cause a gap between the mask body 4 and the limiting structure 2, resulting in poor contact between the mask body 4 and the limiting structure 2.

[0074] To avoid the above situation, the welding points of the support structure 1 and the limiting structure 2 can be made in the following ways, as detailed below:

[0075] In one possible implementation, such as Figure 4 As shown, the welding point of the first support plate 11 and the limiting structure 2 is located on the side of the junction of the first support plate 11 and the limiting structure 2, and the welding point of the second support plate 12 and the limiting structure 2 is located on the side of the junction of the second support plate 12 and the limiting structure 2.

[0076] It should be noted that, in this embodiment, since the welding point of the first support plate 11 and the limiting structure 2 is located on the side of the junction of the first support plate 11 and the limiting structure 2, the first support plate 11 and the limiting structure 2 can be welded from the direction of the first support plate 11 during welding, so that the weld slag produced during the welding of the first support plate 11 and the limiting structure 2 is located on the surface of the limiting structure 2 away from the mask body 4. Similarly, since the welding point of the second support plate 12 and the limiting structure 2 is located on the side of the junction of the second support plate 12 and the limiting structure 2, the second support plate 12 and the limiting structure 2 can be welded from the direction of the second support plate 12 during welding, so that the weld slag produced during the welding of the second support plate 12 and the limiting structure 2 is located on the surface of the limiting structure 2 away from the mask body 4. In this way, when the welding slag produced during the welding of the first support plate 11 and the limiting structure 2 is located on the surface of the limiting structure 2 away from the mask body 4, and the welding slag produced during the welding of the second support plate 12 and the limiting structure 2 is located on the surface of the limiting structure 2 away from the mask body 4, it is possible to avoid the welding slag scratching the mask body 4 when the mask body 4 overlaps on the surface of the limiting structure 2 away from the support structure 1. At the same time, it is possible to avoid the gap between the mask body 4 and the limiting structure 2, thus ensuring the overlap between the mask body 4 and the limiting structure 2.

[0077] In another possible implementation, such as Figure 5 and Figure 6 As shown, a welding through hole 111 or a thickness reduction hole 112 is provided at the first position of the first support plate 11, which is the welding position between the first support plate 11 and the limiting structure 2; a welding through hole 111 or a thickness reduction hole 112 is provided at the second position of the second support plate 12, which is the welding position between the second support plate 12 and the limiting structure 2.

[0078] In this embodiment, since the first support plate 11 has a welding through hole 111 or a thickness reduction hole 112 at a first position, which is the welding position between the first support plate 11 and the limiting structure 2, the first support plate 11 and the limiting structure 2 can be welded from the welding through hole 111 or the thickness reduction hole 112 toward the limiting structure 2 during welding. This results in the weld slag produced during the welding of the first support plate 11 and the limiting structure 2 being located on the surface of the limiting structure 2 away from the mask body 4. Similarly, since the second support plate 12 has a welding through hole 111 or a thickness reduction hole 112 at a second position, which is the welding position between the second support plate 12 and the limiting structure 2, the second support plate 12 and the limiting structure 2 can be welded from the welding through hole 111 or the thickness reduction hole 112 toward the limiting structure 2 during welding. This results in the weld slag produced during the welding of the second support plate 12 and the limiting structure 2 being located on the surface of the limiting structure 2 away from the mask body 4. In this way, when the welding slag produced during the welding of the first support plate 11 and the limiting structure 2 is located on the surface of the limiting structure 2 away from the mask body 4, and the welding slag produced during the welding of the second support plate 12 and the limiting structure 2 is located on the surface of the limiting structure 2 away from the mask body 4, it is possible to avoid the welding slag scratching the mask body 4 when the mask body 4 overlaps on the surface of the limiting structure 2 away from the support structure 1. At the same time, it is possible to avoid the gap between the mask body 4 and the limiting structure 2, thus ensuring the overlap between the mask body 4 and the limiting structure 2.

[0079] Furthermore, after the limiting structure 2 and the supporting structure 1 are fixed, the clamping part 22 and the limiting part 23 separate. In this way, if one or more limiting plates included in the limiting part 23 are damaged, it is convenient to repair or replace one or more damaged limiting plates, thereby reducing the maintenance cost of the limiting structure 2.

[0080] In some embodiments, such as Figure 2As shown, the mask assembly also includes a fixing frame 3, with a first support plate 11 fixed to the fixing frame 3 and a second support plate 12 fixed to the fixing frame 3. Thus, the fixing frame 3 ensures the stability of the positions of the first support plate 11 and the second support plate 12, and also provides support for them, further enhancing the support for the limiting structure 2.

[0081] Furthermore, such as Figure 10 and Figure 11 As shown, the fixed frame 3 includes a first fixed groove 41 extending along a first direction and a second fixed groove 42 extending along a second direction; the end of the first support plate 11 is fixed in the first fixed groove 41, the end of the second support plate 12 is fixed in the second fixed groove 42, and the first part of the limiting structure 2 is connected to the first surface of the fixed frame 3. The first part is the part of the limiting structure 2 that is not connected to the first support plate 11 and the second support plate 12, and the first surface is the surface of the fixed frame 3 that is in the same plane as the groove opening of the first fixed groove 41.

[0082] By fixing the first support plate 11 and the second support plate 12 on the fixed frame 3 through the above embodiments, on the one hand, the first support plate 11 can be limited by the first fixing groove 41, and the second support plate 12 can be limited by the second fixing groove 42. On the other hand, since the first part of the limiting structure 2 is connected to the first surface of the fixed frame 3, the first part is the part of the limiting structure 2 that is not connected to the first support plate 11 and the second support plate 12, and the first surface is the surface of the fixed frame 3 that is in the same plane as the groove of the first fixing groove, the limiting structure 2 can be supported by the fixed frame 3. This not only increases the supporting effect on the limiting structure 2, but also shares the pressure on the supporting structure 1.

[0083] Optionally, the dimension of the first support plate 11 in the third direction is less than or equal to the distance between the opening and the bottom of the first fixing groove 41; the dimension of the second support plate 12 in the third direction is less than or equal to the distance between the opening and the bottom of the second fixing groove 42, wherein the third direction is perpendicular to both the first and second directions; the dimension of the first support plate 11 in the third direction is greater than or equal to 10 micrometers, and the dimension of the second support plate 12 in the third direction is greater than or equal to 10 micrometers.

[0084] In this embodiment, since the dimension of the first support plate 11 in the third direction is less than or equal to the distance between the opening and bottom of the first fixing groove 41, and the dimension of the second support plate 12 in the third direction is less than or equal to the distance between the opening and bottom of the second fixing groove 42, the support surfaces of the first support plate 11, the second support plate 12, and the fixing frame 3 on the limiting structure 2 can be located on the same plane. This avoids the limiting structure 2 being tilted when the support surfaces of the first support plate 11, the second support plate 12, and the fixing frame 3 on the limiting structure 2 are on different planes. Therefore, the limiting structure 2 can be kept horizontally, which is beneficial to improving the stability of the mask plate overlap on the surface of the limiting structure 2.

[0085] Furthermore, the dimension of the first support plate 11 in the second direction is smaller than the dimension of the first fixing groove 41 in the second direction, and the dimension of the second support plate 12 in the first direction is smaller than the dimension of the second fixing groove 42 in the first direction.

[0086] It should be noted that the difference between the size of the first support plate 11 and the size of the first fixing groove 41 in the second direction is less than or equal to 0.5 mm, and the size of the second support plate 12 in the first direction is less than or equal to 0.5 mm. In this way, while ensuring the limiting effect of the first fixing groove 41 on the first support plate 11 and the limiting effect of the second fixing groove 42 on the second support plate 12, it is convenient for the second support plate 12 to be placed in the first fixing groove 41 and for the second fixing plate to be installed in the second fixing groove 42.

[0087] As can be seen from the above embodiments, in the embodiments of the present invention, since the support structure 1 includes a plurality of first support plates 11 extending in a first direction and a plurality of second support plates 12 extending in a second direction, and each pair of adjacent first support plates 11 is equally spaced and each pair of adjacent second support plates 12 is equally spaced, a plurality of support cavities 13 with equal areas can be formed between the first support plates 11 and the second support plates 12, so that the limiting structure 2 can be supported in both the first and second directions at the same time. Furthermore, since the limiting structure 2 extends in the second direction, the limiting structure 2 includes multiple vapor deposition openings 21. The limiting structure 2 is fixed on the support structure 1, and the fixing points of the limiting structure 2 and the support structure 1 are arranged around the periphery of the vapor deposition opening 21. The orthographic projection of one vapor deposition opening 21 coincides with the central region of the orthographic projection of one support cavity 13. Therefore, each vapor deposition opening 21 can maintain the stability of the structure under the limiting action of the limiting structure 2. At the same time, each vapor deposition opening 21 can be supported by the first support plate 11 and the second support plate 12 on all four sides. That is, one vapor deposition opening 21 can be supported by two adjacent first support plates 11 and two adjacent second support plates 12 at the same time. In this way, the limiting structure 2, which limits the vapor deposition opening 21, and the supporting structure 1, which provides support, are spatially separated. This allows the supporting structure 1 to only provide support and the limiting structure 2 to only provide limitation. This avoids deformation of the limiting structure 2 due to the large support requirements of the supporting structure 1, and thus avoids changes in the size of the vapor deposition opening 21 due to deformation of the limiting structure 2. As a result, the accuracy of the vapor deposition opening 21 can be improved, which is beneficial for the narrow bezel design of the product.

[0088] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0089] Although embodiments of the invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A mask assembly, characterized by, The mask assembly comprises: a support structure comprising a plurality of first support plates extending in a first direction and a plurality of second support plates extending in a second direction, wherein the first direction and the second direction are perpendicular; each of the first support plates is equidistantly arranged with each of the second support plates, and the first support plates and the second support plates are arranged to intersect each other to form a plurality of support cavities with equal areas between the first support plates and the second support plates; a limiting structure extending in the second direction, the limiting structure comprising a plurality of evaporation openings, the limiting structure being fixed on the support structure, wherein the fixing points of the limiting structure and the support structure are provided around the evaporation openings, the center area of the orthogonal projection of one evaporation opening and the orthogonal projection of one support cavity coincide; the limiting structure and the support structure are arranged to be separated in space, the support structure only plays a supporting role, and the limiting structure only plays a limiting role; the mask assembly further comprises a fixed frame; the first support plates are fixed on the fixed frame, and the second support plates are fixed on the fixed frame; the fixed frame comprises a first fixed groove extending in the first direction and a second fixed groove extending in the second direction; the end of the first support plate is fixed in the first fixed groove, the end of the second support plate is fixed in the second fixed groove, and the first part of the limiting structure is connected with the first surface of the fixed frame, wherein the first part is the part of the limiting structure not connected with the first support plate and the second support plate, and the first surface is the surface of the fixed frame in the same plane as the slot of the first fixed groove.

2. The mask assembly of claim 1, wherein, The limiting structure comprises a clamping portion and a limiting portion; the limiting portion comprises a plurality of limiting plates, the middle part of each limiting plate comprises the evaporation opening, the clamping portion is located on both ends of the limiting portion in the second direction, and the clamping portion protrudes from the edge of the support structure.

3. The mask assembly of claim 2, wherein, The circumferential side of each limiting plate comprises a half-etched line.

4. The mask assembly of claim 2, wherein, The limiting plate is a square plate, the evaporation opening is a circular opening, and the center of the circular opening and the center of the square plate coincide.

5. The mask assembly of claim 3, wherein, The area of the orthogonal projection of the area surrounded by the half-etched line is a first area, and the area of the orthogonal projection of the support cavity is a second area, and the first area is greater than the second area.

6. The mask assembly of claim 2, wherein, The thickness of the limiting portion is less than or equal to 30 microns, and the thickness of the limiting portion is the dimension of the limiting portion in the third direction, wherein the third direction is perpendicular to the first direction and the second direction.

7. The mask assembly of claim 1, wherein, The first support plate and the limiting structure are welded, and the second support plate and the limiting structure are welded.

8. The mask assembly of claim 7, wherein, The welding points of the first support plate and the limiting structure are located on the side of the intersection of the first support plate and the limiting structure, and the welding points of the second support plate and the limiting structure are located on the side of the intersection of the second support plate and the limiting structure.

9. The mask assembly of claim 7, wherein, The first support plate is provided with a welding through hole or a thickness-reduced hole at a first position, which is a welding position between the first support plate and the limiting structure; The second support plate is provided with a welding through hole or a thickness-reduced hole at a second position, which is a welding position between the second support plate and the limiting structure.

10. The mask assembly of claim 2, wherein, After the limiting structure and the support structure are fixed, the clamping part and the limiting part are separated.

11. The mask assembly of claim 1, wherein, The size of the first support plate in a third direction is less than or equal to the distance between the slot opening of the first fixed slot and the slot bottom of the first fixed slot; The size of the second support plate in a third direction is less than or equal to the distance between the slot opening of the second fixed slot and the slot bottom of the second fixed slot, wherein the third direction is perpendicular to the first direction and the second direction at the same time; The size of the first support plate in the third direction is greater than or equal to 10 microns, and the size of the second support plate in the third direction is greater than or equal to 10 microns.

12. The mask assembly of claim 1, wherein, The size of the first support plate in the second direction is less than the size of the first fixed slot in the second direction, and the size of the second support plate in the first direction is less than the size of the second fixed slot in the first direction.

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