Acid liquid heating cylinder for wafer etching

Abstract

An acid liquid heating cylinder for wafer etching, which comprises a liquid outlet fixing seat, a liquid inlet fixing seat, a shell, a sensor lead port, a power cord lead port, heat insulation cotton, a liquid inlet, a liquid outlet, a uniform flow plate, an expansion compression mechanism, an outer cylinder, an inner cylinder, a side plate, an electric heating film, a sensor and controller, a screw rod, a nut, an expansion shell, a multi-flap component, a cylinder and a conical ring, characterized in that: the two fixing seats and the shell jointly constitute a heater shell, the uniform flow plate, the outer cylinder, the inner cylinder and the side plate jointly constitute a quartz heating cylinder, the heating cylinder is installed in the heater shell, and the heat insulation cotton is filled between the two, and the electric heating film is tightly attached to the inner wall of the outer cylinder through the expansion compression mechanism. The present application can accurately measure and control the heating liquid temperature, improve the heating efficiency, avoid flow dead angles and local high temperature, and has the advantages of strong corrosion resistance, high cleanliness of chemicals required in the field of semiconductor wet processing, fast response and other heating requirements.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of chemical liquid heating, in particular to an acid liquid heating technology used in semiconductor processing, and more particularly to an acid liquid heating cylinder for wafer etching. BACKGROUND

[0002] Chemical liquid heating is an important link in many high-precision production processes. In the process of semiconductor wafer etching, the acid liquid used needs to be heated from room temperature to about 200 DEG C. The commonly used acid liquid heating cylinder for wafer etching mainly consists of a whole quartz cylinder and an electric heating film wrapped outside, and the liquid is fed into one end of the heating cylinder and discharged from the other end. The size of this kind of heater is large, and there is a low-speed flow area when the liquid flows in the heating cavity. Local high temperature is easy to occur in these low-speed areas, which leads to the fluctuation of the final liquid outlet temperature, affects the quality of wafer etching, and also shortens the service life of the heater. In the heater, the temperature of the heated liquid gradually rises from the liquid inlet to the liquid outlet, the temperature near the liquid inlet is low, and a high heating power is required to quickly heat the liquid; the temperature near the liquid outlet is high, close to the target temperature, and the heating power cannot be too large to prevent the final liquid temperature from being too high. The traditional acid liquid heating cylinder for wafer etching cannot realize the control of the heating power in different zones, which affects the heating efficiency. Therefore, it is necessary to develop a new type of acid liquid heating cylinder for wafer etching. SUMMARY

[0003] The purpose of the present application is to solve the problems of uneven heating temperature and difficult control of existing chemical liquid quartz heating cylinder, and to provide an acid liquid heating cylinder for wafer etching with uniform heating and high temperature control precision.

[0004] The technical scheme of the present application is:

[0005] The utility model relates to a kind of acid liquid heating cylinder for wafer etching, including outlet fixed seat 1, inlet fixed seat 2 and shell 3, outlet fixed seat 1 is equipped with sensor lead 4 and power cord lead 5, the both ends of shell 3 are installed on outlet fixed seat 1 and inlet fixed seat 2 respectively, it is characterized by: shell 3 is installed with outer tube 10, shell 3 and outer tube 10 are additionally installed with heat insulation cotton 6 for heat preservation;Outer tube 10 is additionally installed with side plate 12 in both ends, inlet 22 is installed on the side plate 12 in one end, outlet 7 is installed on the side plate 12 in the other end, and outer tube 10 and both ends of side plate 12 form a hollow barrel-shaped heating cavity, and outer heating film assembly consisting of several groups of heating films is additionally installed on the outer surface of outer tube 10;The inner surface of outer heating film assembly is attached with outer tube 10, and the outer surface is contacted with heat insulation cotton 6;Inner tube 11 is installed in outer tube 10, and at least two circular flow plates 8 are installed on inner tube 11, and the outer diameter of flow plate 8 is less than the inner diameter of outer tube 10;Inner heating film assembly consisting of several groups of heating films is installed in inner tube 11, and the inner heating film assembly is pressed on the inner wall of inner tube 11 by expansion compression mechanism 9;Sensor and controller 14 are installed in one end of outer tube 10 close to outlet 7, and the heating power of each heating assembly in outer heating film assembly and inner heating film assembly is automatically controlled by controller according to the temperature measured at outlet 7, so that the outlet temperature of outlet is kept in the set range.

[0006] The outer heating film assembly is composed of at least three sections, and the heating power of the outer heating film assembly closer to the inlet end is greater.

[0007] The inner side of the flow plate 8 in contact with the inner tube 11 is opened with a circle of rectangular openings for acid liquid, and a half circle of liquid passage holes is opened on the outer circle of the flow plate 8, and the position of the liquid passage hole is opposite to the position of the inlet or outlet.

[0008] The inner heating film assembly is composed of at least three sections, and the heating power of the inner heating film assembly closer to the inlet end is greater.

[0009] The expansion compression mechanism 9 is composed of a screw rod 15, a nut 16, an expansion shell 17, a multi-petal component 18, a cylinder 19 and a conical ring 20, the nut 16, the multi-petal component 18, the cylinder 19 and the conical ring 20 are all sleeved on the screw rod 15, the nut 16 is located at both ends of the screw rod 17, the multi-petal component 18 is composed of at least two petals, the two sides of the multi-petal component 18 are provided with inclined surfaces matched with a conical ring 20, and a cylinder 19 is placed in two adjacent conical rings 20 for transmitting thrust; the nut 16 at one end of the screw rod 15 is twisted, the conical ring 20 is pushed to move to the other end of the screw rod 15, the conical ring 20 pushes the multi-petal component 18 to move radially through the inclined surface, so that the expansion shell 17 is deformed, the expansion shell 17 tightly adheres the inner heating film assembly to the inner surface of the inner tube 11, so as to facilitate the heat of the inner heating film assembly to be transmitted to the inner wall of the inner tube and heat the acid liquid flowing through the outer wall of the inner tube.

[0010] The outer cylinder 10, the inner cylinder 11 and the side plate 12 together constitute a hollow annular heating cavity, which is installed in the shell 3, and the inner side of the shell 3 is attached with heat insulation cotton 6. The outer side of the outer cylinder 10 is attached with outer layer heating film which is composed of the first heating film near the inlet, the second heating film at the middle position of the outer layer and the third heating film 27 near the outlet; the two side plates are respectively provided with liquid inlet and liquid outlet; the two flow uniform plates are sleeved on the inner cylinder, which divides the hollow annular heating cavity into three sections along the axial direction, and a plurality of liquid passing holes are uniformly distributed on one half area of the flow uniform plate in the radial direction; when the flow uniform plate is installed, it should be ensured that the half area with the liquid passing holes is opposite to the liquid inlet / outlet on the outer side.

[0011] The outer layer heating film composed of the first heating film near the inlet, the second heating film at the middle position of the outer layer and the third heating film near the outlet and the inner layer heating film composed of the fourth heating film near the inlet, the fifth heating film at the middle position of the inner layer and the sixth heating film near the outlet can all realize heating with different power in different areas according to the division along the axial direction of the heating cylinder.

[0012] The details are as follows:

[0013] The acid liquid heating cylinder for wafer etching comprises a liquid outlet fixing seat 1, a liquid inlet fixing seat 2, an outer shell 3, a sensor lead port 4, a power cord lead port 5, heat insulation cotton 6, a liquid inlet 22, a liquid outlet 7, a flow equalizing plate 8, an expansion compression mechanism 9, an outer cylinder 10, an inner cylinder 11, a side plate 12, an inner layer near-inlet heating film 13, an inner layer middle position heating film 23, an inner layer near-outlet heating film 24, an outer layer near-inlet heating film 25, an outer layer middle position heating film 26, an outer layer near-outlet heating film 27, a sensor and controller 14, a screw rod 15, a nut 16, an expansion shell 17, a multi-petal component 18, a cylinder 19, and a conical ring 20. The outer shell 3 is installed between the liquid outlet fixing seat 1 and the liquid inlet fixing seat 2, and the three together constitute the outer surface of the acid liquid heating cylinder. The power sensor lead port 4 and the power cord lead port 5 are arranged on the liquid outlet fixing seat 1. The outer cylinder 10, the inner cylinder 11, and the side plate 12 together constitute a heating cavity, which is installed in the outer shell 3, and the heat insulation cotton 6 is attached to the inner side of the outer shell 3, and the outer layer near-inlet heating film 25, the outer layer middle position heating film 26, and the outer layer near-outlet heating film 27 constitute the outer layer heating film attached to the outer side of the outer cylinder 10, and the liquid inlet 22 and the liquid outlet 7 are respectively arranged on the two side plates 12 for the inflow and outflow of chemical liquid. The sensor and controller 14 are installed on the side plate 12 on the liquid outlet side. The heating cavity constituted by the outer cylinder 10, the inner cylinder 11, and the side plate 12 is a hollow cylindrical shape, which can improve the liquid flow rate in the cavity and the heat exchanger efficiency compared with the cylindrical cavity of the traditional heater. The flow equalizing plate 8 is sleeved on the inner cylinder 11. The outer diameter of the flow equalizing plate 8 is smaller than the inner diameter of the outer cylinder 10, the gap between the outer side of the flow equalizing plate 8 and the inner wall of the outer cylinder 10 is determined according to the liquid flow rate in the cavity, and the inner diameter of the flow equalizing plate 8 is the same as the outer wall diameter of the inner cylinder 11 so that the flow equalizing plate 8 can be fixed on the inner cylinder 11. Rectangular openings are arranged on the inner side of the flow equalizing plate 8 and uniformly distributed on the entire inner circle. A plurality of liquid passing holes are also arranged on the flow equalizing plate 8 and uniformly distributed in half of the flow equalizing plate 8. When the flow equalizing plate 8 is installed, the half with the liquid passing holes should be opposite to the liquid inlet / outlet on the outer side. Figure 5The existence of the flow equalizing plate 8 further improves the liquid flow rate in the heating cavity, reduces the flow dead zone, and makes the internal flow field more reasonable. Between the expansion compression mechanism 9 and the inner cylinder 11 is the inner layer heating film composed of the inner layer near the inlet heating film 13, the inner layer middle position heating film 23, and the inner layer near the outlet heating film 24. Both the outer layer heating film and the inner layer heating film can realize segmented power heating along the axial direction of the heating cylinder, and the heating power is high near the liquid inlet and low near the liquid outlet. The expansion compression mechanism 9 is located in the inner cylinder 11 and is composed of a screw rod 15, a nut 16, an expansion shell 17, a multi-petal component 18, a cylinder 19, and a conical ring 20. The nut 16, the multi-petal component 18, the cylinder 19, and the conical ring 20 are all sleeved on the screw rod 15. The expansion shell 17 is made of stainless steel, and the multi-petal component 18 is made of aluminum. The nut 16 is located at the two ends of the screw rod 17, and each side of the multi-petal component 18 has a conical ring 20, and the cylinder 19 is placed between two adjacent conical rings 20.

[0014] The beneficial effects of the present application are:

[0015] 1. The flow field in the heating cavity is improved, the flow dead zone is greatly reduced, and local high temperature of the liquid medicine is avoided (such as Figure 1 as shown).

[0016] 2. A new type of expansion compression mechanism is used to ensure the adhesion of the electric heating film to the quartz cylinder wall.

[0017] 3. Zoning heating is realized, different heating powers are used at different positions, and the heating efficiency is improved.

[0018] 4. The heating cavity capacity is reduced, the temperature rise is faster under the same power, and it is more energy-saving. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 is a comparison of the flow field distribution of the traditional quartz heating cylinder (left) and the flow field distribution of the quartz heating cylinder of the present application (right).

[0020] Figure 2 is a schematic diagram of the appearance of the heating cylinder of the present application.

[0021] Figure 3 is a schematic diagram of the internal structure of the heating cylinder of the present application.

[0022] Figure 4 is an exploded view of the overall structure of the heating cylinder of the present application.

[0023] Figure 5 is a schematic diagram of the flow equalizing plate structure of the present application.

[0024] Figure 6 is a schematic diagram of the internal structure of the expansion compression mechanism of the present application.

[0025] Figure: 1, liquid outlet fixed seat; 2, liquid inlet fixed seat; 3, shell; 4, sensor lead port; 5, power cord lead port; 6, thermal insulation cotton; 7, liquid outlet; 8, flow equalization plate; 9, expansion compression mechanism; 10, outer cylinder; 11, inner cylinder; 12, side plate; 13, inner layer near inlet heating film; 14, sensor and controller; 15, screw; 16, nut; 17, expansion shell; 18, multi-petal component; 19, cylinder; 20, conical ring; 21, flow dead zone; 22, liquid inlet; 23, inner layer middle position heating film; 24, inner layer near outlet heating film; 25, outer layer near inlet heating film; 26, outer layer middle position heating film; 27, outer layer near outlet heating film. DETAILED DESCRIPTION

[0026] The application will be further described in detail below in combination with the drawings and specific embodiments.

[0027] As Figures 1 to 5 shown.

[0028] An acid liquid heating cylinder for wafer etching, as Figure 4 shown, includes liquid outlet fixed seat 1, liquid inlet fixed seat 2, shell 3, sensor lead port 4, power cord lead port 5, thermal insulation cotton 6, liquid inlet 22, liquid outlet 7, flow equalization plate 8, expansion compression mechanism 9, outer cylinder 10, inner cylinder 11, side plate 12, inner layer near inlet heating film 13, inner layer middle position heating film 23, inner layer near outlet heating film 24, outer layer near inlet heating film 25, outer layer middle position heating film 26, outer layer near outlet heating film 27, sensor and controller 14, screw 15, nut 16, expansion shell 17, multi-petal component 18, cylinder 19, conical ring 20. As Figure 2 shown, the shell 3 is installed between the liquid outlet fixed seat 1 and the liquid inlet fixed seat 2, and the three together constitute the outer surface of the acid liquid heating cylinder. The power sensor lead port 4 and the power cord lead port 5 are arranged on the liquid outlet fixed seat 1. The outer cylinder 10, the inner cylinder 11 and the side plate 12 together constitute a heating cavity, which is installed in the shell 3, and the inside of the shell 3 is pasted with thermal insulation cotton 6, and the outside of the outer cylinder 10 is pasted with an outer layer heating film composed of the outer layer near inlet heating film 25, the outer layer middle position heating film 26 and the outer layer near outlet heating film 27, and the two side plates 12 are respectively provided with the liquid inlet 22 and the liquid outlet 7 for the inflow and outflow of chemical liquid. The sensor and controller 14 is installed on the side plate 12 on the liquid outlet side. The heating cavity constituted by the outer cylinder 10, the inner cylinder 11 and the side plate 12 is a hollow cylindrical shape, which can improve the liquid flow rate in the cavity and improve the heat exchange efficiency of the heater compared with the cylindrical cavity of the traditional heater. As Figure 3As shown, the flow equalizing plate 8 is sleeved on the inner cylinder 11. The outer diameter of the flow equalizing plate 8 is smaller than the inner diameter of the outer cylinder 10, and a gap is left between the flow equalizing plate 8 and the outer cylinder 10, the size of the gap is determined according to the flow rate of the liquid in the cavity; the inner diameter of the flow equalizing plate 8 is the same as the outer diameter of the inner cylinder 11, so that the flow equalizing plate 8 can be fixed on the inner cylinder 11. Rectangular openings are provided on the inner side of the flow equalizing plate 8, which are uniformly distributed on the entire inner ring. The flow equalizing plate 8 is also provided with a plurality of liquid passing holes, which are uniformly distributed in half of the flow equalizing plate 8. When installing the flow equalizing plate 8, it should be ensured that the half of the flow equalizing plate 8 provided with the liquid passing holes is opposite to the inlet / outlet liquid port on the outer side, as shown. Figure 5 As shown, the flow equalizing plate 8 is sleeved on the inner cylinder 11. The outer diameter of the flow equalizing plate 8 is smaller than the inner diameter of the outer cylinder 10, and a gap is left between the flow equalizing plate 8 and the outer cylinder 10, the size of the gap is determined according to the flow rate of the liquid in the cavity; the inner diameter of the flow equalizing plate 8 is the same as the outer diameter of the inner cylinder 11, so that the flow equalizing plate 8 can be fixed on the inner cylinder 11. Rectangular openings are provided on the inner side of the flow equalizing plate 8, which are uniformly distributed on the entire inner ring. The flow equalizing plate 8 is also provided with a plurality of liquid passing holes, which are uniformly distributed in half of the flow equalizing plate 8. When installing the flow equalizing plate 8, it should be ensured that the half of the flow equalizing plate 8 provided with the liquid passing holes is opposite to the inlet / outlet liquid port on the outer side, as shown. Figure 6 As shown, the expansion and compression mechanism 9 is located in the inner cylinder 11, which is composed of a screw rod 15, a nut 16, an expansion shell 17, a multi-limb part 18, a cylinder 19 and a conical ring 20. The nut 16, the multi-limb part 18, the cylinder 19 and the conical ring 20 are all sleeved on the screw rod 15. The expansion shell 17 is made of stainless steel, and the multi-limb part 18 is made of aluminum. The nut 16 is located at the two ends of the screw rod 17, and there is a conical ring 20 on each side of the multi-limb part 18. A cylinder 19 is placed between two adjacent conical rings 20 to transmit thrust. When a pre-tightening force is applied to the nuts 16 at both ends of the expansion and compression mechanism 9, the conical rings 20 adjacent to the nuts are subjected to an axial inward thrust, which can be transmitted to all conical rings 20 through the cylinder 19. The conical side wall of the conical ring 20 and the inclined expansion surface on the inner side of the multi-limb part 18 convert the thrust received by the conical ring 20 into an expansion force that drives the multi-limb part 18 to deform. The deformation of the multi-limb part 18 will drive the expansion shell 17 to move radially outward, so that the electric heating film located on the outer layer of the expansion and compression mechanism 9 can tightly adhere to the inner wall of the inner cylinder 11. When assembling the acid liquid heating cylinder, the nuts 16 on both sides of the expansion and compression mechanism 9 should be tightened first to ensure that the electric heating film is tightly adhered to the inner wall of the inner cylinder 11 by the compression force from the expansion and compression mechanism 9, and then the shell, the fixing seat and other parts are assembled. When using the acid liquid heating cylinder, the heated liquid is first introduced into the heating cylinder through the inlet 22 on the inlet fixing seat 2, and then the electric heating film is connected to start heating after the liquid flows out of the outlet 7 on the outlet fixing seat 1. The heating power is adjusted according to the target temperature.

[0029] The above merely describes a specific embodiment of the present application, but the protection scope of the present application is not limited thereto, and any deformation or substitution of the present application within the technical scope disclosed by the present application should be covered within the protection scope of the present application.

[0030] The part of the present application not involved is the same as the prior art or can be realized by using the prior art.

Claims

1. A kind of acid liquid heating cylinder for wafer etching, including outlet fixed seat (1), inlet fixed seat (2) and shell (3), sensor lead opening (4) and power cord lead opening (5) are equipped on outlet fixed seat (1), the both ends of shell (3) are installed on outlet fixed seat (1) and inlet fixed seat (2) respectively, it is characterized by: The shell (3) is provided with an outer cylinder (10), and the shell (3) and the outer cylinder (10) are provided with heat insulation cotton (6) for heat preservation; the outer cylinder (10) is provided with side plates (12) at both ends, the side plate (12) at one end is provided with a liquid inlet (22), and the side plate (12) at the other end is provided with a liquid outlet (7); the outer cylinder (10) and the side plates (12) at both ends form a hollow barrel-shaped heating cavity; the outer cylinder (10) is provided with an outer heating film assembly composed of a plurality of heating film groups; the inner surface of the outer heating film assembly is attached to the outer cylinder (10), and the outer surface is in contact with the heat insulation cotton (6); the outer cylinder (10) is provided with an inner cylinder (11), and the inner cylinder (11) is provided with at least two circular flow uniforming plates (8); the outer diameter of the flow uniforming plate (8) is smaller than the inner diameter of the outer cylinder (10); the inner cylinder (11) is provided with an inner heating film assembly composed of a plurality of heating film groups; the inner heating film assembly is pressed and attached to the inner cylinder wall through an expansion pressing mechanism (9); one end of the outer cylinder (10) close to the liquid outlet (7) is provided with a sensor and a controller (14); the controller automatically controls the heating power of each heating assembly in the outer heating film assembly and the inner heating film assembly according to the measured temperature at the liquid outlet (7), so that the liquid outlet temperature of the liquid outlet is kept within the set range; the expansion pressing mechanism (9) is composed of a screw rod (15), a nut (16), an expansion shell (17), a multi-petal component (18), a cylinder (19) and a conical ring (20); the nut (16), the multi-petal component (18), the cylinder (19) and the conical ring (20) are all sleeved on the screw rod (15); the nut (16) is located at both ends of the screw rod (15); the multi-petal component (18) is composed of at least two petals; both sides of the multi-petal component (18) are provided with inclined surfaces matched with a conical ring (20); a cylinder (19) is placed between two adjacent conical rings (20) for transmitting thrust; the nut (16) at one end of the screw rod (15) is twisted to push the conical ring (20) to move to the other end of the screw rod (15); the conical ring (20) pushes the multi-petal component (18) to move radially through the inclined surface, so that the expansion shell (17) is deformed; the expansion shell (17) tightly attaches the inner heating film assembly to the inner surface of the inner cylinder (11), so as to facilitate the heat of the inner heating film assembly to be transmitted to the inner wall of the inner cylinder and heat the acid liquid flowing through the outer wall of the inner cylinder; the outer cylinder (10), the inner cylinder (11) and the side plates (12) jointly form a hollow annular heating cavity, which is installed in the shell (3), and the inner side of the shell (3) is attached with heat insulation cotton (6); the outer side of the outer cylinder (10) is attached with outer layer heating films composed of first heating films near the liquid inlet, second heating films at the middle position of the outer layer and third heating films (27) near the liquid outlet; the two side plates are respectively provided with a liquid inlet and a liquid outlet; the two flow uniforming plates are sleeved on the inner cylinder, dividing the hollow annular heating cavity into three sections along the axial direction; a plurality of liquid passage holes are uniformly distributed on one half of the flow uniforming plate along the radial direction; when the flow uniforming plate is installed, it is ensured that the half with the liquid passage holes is opposite to the liquid inlet / outlet on the outer side.

2. The acid liquid heating cartridge for wafer etching according to claim 1, characterized by: The outer heating film assembly is composed of at least three sections, and the heating power of the outer heating film assembly closer to the liquid inlet end is greater.

3. The acid solution heating cartridge for wafer etching according to claim 1, characterized by: The inner side of the flow uniformizing plate (8) in contact with the inner cylinder (11) is provided with a circle of rectangular openings for the acid liquid to pass through, and the outer circle of the flow uniformizing plate (8) is provided with a half circle of liquid passing holes, and the position of the liquid passing holes is opposite to the position of the liquid inlet or the liquid outlet.

4. The acid liquid heating cartridge for wafer etching according to claim 1, characterized by: The inner heating film assembly is composed of at least three sections, and the heating power of the inner and outer heating film assembly closer to the liquid inlet end is greater.

5. The acid liquid heating cartridge for wafer etching according to claim 1, wherein: The outer layer heating film composed of the first heating film near the liquid inlet, the second heating film at the middle position of the outer layer and the third heating film near the liquid outlet and the inner layer heating film composed of the fourth heating film near the liquid inlet, the fifth heating film at the middle position of the inner layer and the sixth heating film near the liquid outlet can realize different regions with different powers along the axial direction of the heating cylinder.

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