Workpiece loading apparatus for sputter and ion plating

By employing insulating components and optimized connection methods in the workpiece clamping device, the stability and safety issues of the device were resolved, ensuring the reliability and safety of the sputtering and ion plating processes and guaranteeing the efficient preparation of thin films.

CN117488264BActive Publication Date: 2026-02-03SHANGHAI INST OF TECH
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Patent Information

Application Number
CN202311504686.3
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-11-13
Publication Date
2026-02-03
Estimated Expiration
2043-11-13

AI Technical Summary

Technical Problem

Existing workpiece clamping devices suffer from poor stability, easy wear, easy short circuits, and insufficient safety during sputtering and ion plating processes, failing to guarantee the reliability and safety of thin film preparation.

Method used

Insulating components are used to connect the various parts insulated ways. The connection method and structural design of bearing housing, bearing, and pinion prevent dry friction between the gear and the conductive bearing seat. The rotational motion is transmitted by driving the rotating support table through the drive shaft, thus avoiding friction and short circuit.

Benefits of technology

This achieves an insulated connection between the workpiece and the coating cavity, preventing short circuits, improving the stability and safety of the device, and ensuring the reliability and safety of thin film preparation.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application relates to a workpiece loading device for sputtering and ion plating, which comprises a driving assembly, a transmission assembly and a support assembly supporting the former two, the driving assembly comprises a driving shaft, a driving key connected with the driving shaft and a rotary support table, a first insulating gasket is arranged between the driving shaft and the rotary support table, a first insulating sleeve is arranged on the driving shaft, the support assembly comprises a support ring, an axial rotary upper base and a bearing conductive seat, a second insulating sleeve is arranged on the axial rotary upper base, a second insulating gasket is arranged between the axial rotary upper base and the bearing conductive seat, and a third insulating sleeve and a third insulating gasket are arranged between a sun gear in the transmission assembly and the support ring. The workpiece loading device for sputtering and ion plating prevents short circuit through the arrangement of three groups of insulating components, prevents the friction between the gear and the bearing conductive seat through the additional bearing, and thus guarantees the safety, reliability and stability of film preparation.
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Description

Technical Field

[0001] This invention relates to the field of physical vapor deposition coating, and more specifically to a workpiece loading device for sputtering and ion plating. Background Technology

[0002] Physical vapor deposition (PVD) is a material preparation technique that uses high vacuum as a prerequisite to vaporize solid or liquid raw materials into particles or partially ionize them into ions. These particles then migrate to the material surface under low pressure to form functional thin films. PVD techniques include vacuum evaporation, sputtering, and ion plating. Vacuum evaporation is performed in a vacuum container (gas pressure 10... -2 In evaporation coating (below Pa), the raw material is heated. Upon reaching a suitable temperature, the raw material begins to evaporate and vaporize, forming a vapor stream that directly travels to the substrate surface and solidifies into a film. Sputtering coating utilizes glow discharge or ion source-generated energetic particles to bombard the target material. Through the transfer of particle momentum, atoms or other particles are ejected from the target material, and the workpiece surface is covered by the sputtered particles, forming a coating. Ion plating places the workpiece under vacuum. Arc discharge on the cathode target generates high temperatures, causing the surface material of the target to vaporize and evaporate into atoms. When these atoms enter the plasma field between the target and the substrate, they are ionized by charged ions. Under the influence of the electric field, these charged ions deposit on the substrate surface to form a film.

[0003] Currently, vacuum evaporation is often used for depositing decorative films due to its simple process and low film adhesion strength. Compared with vacuum evaporation, sputtering and ion plating processes are relatively complex, but the deposited films have higher adhesion strength and hardness. Therefore, sputtering and ion plating are mostly used to deposit hard films with special functions, such as binary and multi-component hard films like TiN, CrN, BN, TiAlN, CrAlN, TiAlSiN, and TiAlBN. These hard films, when applied to the surfaces of metal and non-metal forming tools and molds, can not only extend the service life of the tools and molds but also improve the surface forming quality of the workpiece.

[0004] Unlike vacuum evaporation, sputtering and ion plating require a bias electric field to be applied between the thin film deposition source (target) and the workpiece. This field provides the driving force for ions to move towards the workpiece surface, thereby improving the adhesion between the thin film and the workpiece surface, altering the thin film structure, and enhancing the thin film performance. Therefore, in sputtering and ion plating processes, a workpiece clamping device is needed to provide a bias electric field to the workpiece. Simultaneously, the coating chamber must be insulated from the workpiece. In actual thin film deposition, the coating chamber is connected to the positive terminal of the power supply and is also grounded. The workpiece is connected to the negative terminal of the power supply via the clamping device.

[0005] The prior art (CN105586577B) discloses a PVD flexible worktable, in which the upper turntable (3) has a through hole in the middle, and the drive rod (1) passes through the through hole and is interference-fitted with the large gear (5). Although the drive rod (1) can drive the large gear (5) to rotate, there is no support device at its lower end. Under external driving rotation, the transmission is prone to shaking and has poor stability. Moreover, as shown in the attached figure, the large gear (5) is placed on the inner surface of the upper turntable (3). During the rotation of the large gear (5), there will be severe friction and wear between the large gear (5) and the upper turntable (3), which is unreasonable in structural design. Similarly, the small gear (6) is also placed on the inner surface of the upper turntable (3). The small gear (6) has no fixed rotation axis, and it is prone to axial movement during rotation, which will also cause severe wear. In addition, the flexible worktable does not have insulating parts, and all parts are conductive. If the workpiece is energized, the worktable is connected to the physical vapor deposition coating cavity and the drive motor, which can easily cause a short circuit, making it impossible for the physical vapor deposition coating process to proceed. Moreover, the clamping rod (8) passes through the cover plate (7) and is connected to the pinion (6). The clamping rod (8) is connected to the pinion (6) through the torsion spring (12). When the tool or other workpiece is clamped on the clamping rod (8), the clamping rod (8) cannot guarantee that it will not tilt, which will further cause one side of the pinion (6) to tilt. The upper part of the upper turntable (3) will tilt as a whole, which will not guarantee the safe preparation of the coating. Summary of the Invention

[0006] To address the technical problems existing in the prior art, the present invention provides a workpiece loading device for sputtering and ion plating to achieve the preparation of functional thin films while ensuring the safety, reliability and stability of the thin film preparation.

[0007] To achieve the above objectives, the technical solution of the present invention is as follows:

[0008] A workpiece loading device for sputtering and ion plating includes a drive assembly, a transmission assembly, and a support assembly. The drive assembly and the transmission assembly are supported by the support assembly. The drive assembly includes a drive key, a drive shaft, and a rotating support table. The drive key is fixedly connected to the drive shaft. A first insulating gasket is provided between the drive shaft and the rotating support table. A first insulating sleeve is provided on the drive shaft. The support assembly includes a support ring, an axially rotating upper base, and a bearing conductive seat. A second insulating sleeve is provided on the axially rotating upper base. A second insulating gasket is provided between the axially rotating upper base and the bearing conductive seat. The transmission assembly includes a sun gear disposed on the support ring. A third insulating sleeve and a third insulating gasket are provided between the sun gear and the support ring.

[0009] As a preferred technical solution, the drive key is fixedly connected to the drive shaft through the drive keyway and the fixing bolt, and the drive shaft is fixedly connected to the rotating support table through the first fastening bolt passing through the first insulating gasket and the first insulating sleeve.

[0010] As a preferred technical solution, the support assembly includes a support column, and the rotating support platform is fixed on the support column and connected to the bearing conductive seat by a second fastening bolt.

[0011] As a preferred technical solution, the support assembly also includes a sliding seat and a base. The base is connected to the sliding seat by a third fastening bolt. The base is provided with a support ring and an axially rotating lower base. The support ring and the axially rotating lower base are connected to the base by a fourth fastening bolt. A first bearing is provided inside the support ring. A bearing ball, an axially rotating upper base and a bearing conductive seat are arranged sequentially above the axially rotating lower base. The axially rotating upper base and the bearing conductive seat are connected by a fifth fastening bolt passing through the second insulating sleeve and the second insulating gasket.

[0012] As a preferred technical solution, the support assembly also includes a bearing housing and a support rod. The bearing housing is fixed in the hole of the conductive bearing seat by threads. A second bearing is provided in the bearing housing. The support rod is connected to the rotating support table by threads. An upper cover plate is provided above the support rod. The upper cover plate is connected to the support rod by a sixth fastening bolt.

[0013] As a preferred technical solution, the transmission assembly includes a transmission barrel, planetary gears, a sun gear, and a transmission rod. The sun gear is connected to the support ring by a seventh fastening bolt passing through the third insulating sleeve and the third insulating gasket. The transmission barrel is fixedly connected to the second bearing. The planetary gears are connected to the transmission barrel. The transmission rod is connected to the transmission barrel. The transmission rod is connected to the upper cover plate by a fixing sleeve.

[0014] As a preferred technical solution, a keyway is provided at the bottom of the transmission rod, and a key matching the keyway is provided inside the transmission barrel. The transmission rod and the transmission barrel are connected by the keyway and the key.

[0015] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0016] (1) The workpiece loading device for sputtering and ion plating of the present invention can ensure the insulating connection between the coated workpiece and the coating cavity and the drive motor by insulating components, thereby realizing the preparation of sputtering and ion plating physical vapor deposition coatings.

[0017] (2) The workpiece loading device for sputtering and ion plating of the present invention, through the connection method and structural design of bearing seat, bearing and pinion, can prevent dry friction between the gear and the bearing conductive seat, and the structural design is reasonable.

[0018] (3) The workpiece loading device for sputtering and ion plating of the present invention drives a rotating support table through a drive shaft. The rotating support table transmits the rotational motion to the bearing conductive seat, and then the planetary gears generate rotational motion through the sun gear, thereby realizing the rotation of the transmission rod and avoiding friction between the sun gear and the bearing conductive seat. Attached Figure Description

[0019] Figure 1 This is an isometric view of a workpiece loading device for sputtering and ion plating according to the present invention;

[0020] Figure 2 This is an exploded view of a drive assembly in a workpiece loading device for sputtering and ion plating according to the present invention.

[0021] Figure 3 This is an exploded view of a support assembly in a workpiece loading device for sputtering and ion plating according to the present invention.

[0022] Figure 4 This is an exploded view of a transmission component in a workpiece loading device for sputtering and ion plating according to the present invention.

[0023] Figure 5 This is a schematic diagram of a conductive support in a workpiece loading device for sputtering and ion plating according to the present invention.

[0024] Figure 6 This is a schematic diagram of a transmission barrel in a workpiece loading device for sputtering and ion plating according to the present invention.

[0025] Figure 7 This is a schematic diagram of an axially rotating upper base in a workpiece loading device for sputtering and ion plating according to the present invention.

[0026] Figure 8 This is a schematic diagram of an axially rotating lower base in a workpiece loading device for sputtering and ion plating according to the present invention.

[0027] Figure 9 This is a schematic diagram of a planetary gear in a workpiece loading device for sputtering and ion plating according to the present invention;

[0028] Figure 10 This is a schematic diagram illustrating how a transmission rod in a workpiece loading device for sputtering and ion plating according to the present invention clamps a high-speed steel saw blade to be coated.

[0029] In the diagram: 11. Drive key; 12. Drive shaft; 13. Rotary support platform; 21. Transmission barrel; 22. Planetary gear; 23. Sun gear; 24. Transmission rod; 31. Sliding seat; 32. Base; 33. Support ring; 34. First bearing; 35. Lower base for axial rotation; 36. Bearing ball; 37. Upper base for axial rotation; 38. Bearing conductive seat; 39. Support column; 310. Bearing seat; 311. Second bearing; 312. Support rod; 313. Upper cover plate; 314. Fixing sleeve; 41. Second insulating gasket; 42. Second insulating sleeve; 43. Third insulating gasket; 44. Third insulating sleeve; 45. First insulating gasket; 46. First insulating sleeve. Detailed Implementation

[0030] The technical solution of the present invention will be further described below with reference to specific embodiments:

[0031] like Figure 1 As shown, a workpiece loading device for sputtering and ion plating includes a drive assembly for driving the overall rotation of the device, a transmission assembly for driving the partial rotation of the device, and a support assembly for supporting the drive assembly and the transmission assembly. The drive assembly, transmission assembly and support assembly are insulated from each other by three sets of insulating gaskets and insulating sleeves, thereby preventing short circuits.

[0032] like Figure 2 As shown, the drive assembly includes a drive key 11 for rotating at both ends, a drive shaft 12 for transmitting torque, and a rotating support platform 13 for bearing and transmission. The drive key 11 is disposed in a drive key 11 groove below the drive shaft 12. A through hole is provided in the center of the drive key 11, and a threaded hole is provided in the drive key 11 groove. A fixing bolt passes through the through hole in the center of the drive key 11 and engages with the threaded hole in the drive key 11 groove to fix the drive key 11 to the drive shaft 12. The drive shaft 12 is connected to the rotating support platform 13 through a first bearing 34. A first insulating gasket 45 is provided between the drive shaft 12 and the rotating support platform 13. A first insulating sleeve 46 is provided on the drive shaft 12, and the first insulating sleeve 46 passes through the through hole on the end face of the drive shaft 12. The drive shaft 12 and the rotating support platform 13 are fixedly connected by a first fastening bolt passing through the first insulating gasket 45 and the first insulating sleeve 46.

[0033] like Figure 3 and Figure 5As shown, the support assembly includes a support column 39, a support ring 33, and a conductive bearing seat 38. The rotating support platform 13 is fixed to the support column 39 and connected to the conductive bearing seat 38 via a second fastening bolt. The support assembly also includes a sliding seat 31 and a base 32. The base 32 is connected to the sliding seat 31 via a third fastening bolt. The base 32 is provided with the support ring 33 and an axially rotating lower base 35. The support ring 33 and the axially rotating lower base 35 are connected to the base 32 via a fourth fastening bolt. A first bearing 34 is provided inside the support ring 33. Figure 8 As shown, a bearing ball 36, an axially rotating upper base 37, and a bearing conductive seat 38 are sequentially arranged above the axially rotating lower base 35. Figure 7 As shown, the axially rotating upper base 37 is provided with a second insulating sleeve 42, and a second insulating gasket 41 is provided between the axially rotating upper base 37 and the bearing conductive seat 38. The axially rotating upper base 37 and the bearing conductive seat 38 are connected by a fifth fastening bolt passing through the second insulating sleeve 42 and the second insulating gasket 41.

[0034] The support assembly also includes a bearing housing 310 and a support rod 312. The bearing housing 310 is fixed in the hole of the conductive support 38 by threads. A second bearing 311 is provided in the bearing housing 310. The support rod 312 is connected to the rotating support table 13 by threads. An upper cover plate 313 is provided above the support rod 312. The upper cover plate 313 is connected to the support rod 312 by a sixth fastening bolt.

[0035] like Figure 4 As shown, the transmission assembly includes a transmission barrel 21, planetary gears 22, a transmission rod 24, and a sun gear 23 mounted on a support ring 33. The sun gear 23 is connected to the support ring 33 by a seventh fastening bolt passing through the third insulating sleeve 44 and the third insulating gasket 43. The transmission barrel 21 is fixedly connected to the second bearing 311. Figure 9 As shown, planetary gear 22 is connected to transmission barrel 21, and a keyway is provided at the bottom of transmission rod 24, as shown. Figure 6 As shown, the transmission barrel 21 is equipped with a key that matches the keyway. The transmission rod 24 is connected to the transmission barrel 21 via the keyway and the key. The transmission rod 24 is connected to the upper cover plate 313 via a fixing sleeve 314. The connection between the fixing sleeve 314 and the transmission rod 24 and the upper cover plate 313 is a clearance fit.

[0036] The working principle of this device is as follows:

[0037] During operation, the drive key 11 is connected to an external power source, and the carrier conductive base 38 is connected to the bias power supply through a brush.

[0038] First, an external power source causes the drive key 11 to rotate around the center, and the drive key 11 transmits the rotational motion to the drive shaft 12, thereby driving the rotating support table 13 to rotate.

[0039] The rotating support platform 13 transmits the rotational motion to the bearing conductive base 38 through the support column 39;

[0040] The axially rotating upper base 37 of the lower part of the conductive base 38 rotates simultaneously with the conductive base 38, the bearing ball 36 rolls, and the axially rotating lower base 35 remains fixed.

[0041] The conductive base 38 drives the support column 39, bearing seat 310 and second bearing 311 to rotate. Since the sun gear 23 is fixed, the planet gear 22 meshing with the sun gear 23 rotates. The planet gear 22 drives the transmission barrel 21 to rotate.

[0042] The transmission barrel 21 drives the transmission rod 24 to rotate via a key;

[0043] The bias power supply slides in contact with the outer ring of the bearing conductive seat 38 via brushes. The second insulating gasket 41 and the second insulating sleeve 42 insulate the bearing conductive seat 38 from the axially rotating upper base 37. The third insulating gasket 43 and the third insulating sleeve 44 insulate the sun gear 23 from the support ring 33. The first insulating gasket 45 and the first insulating sleeve 46 insulate the rotating support platform 13 from the drive shaft 12. During the coating preparation process, this avoids communication between the coated workpiece and the coating cavity and drive device, enabling coating preparation and ensuring the safety of the coating operation.

[0044] like Figure 10 As shown, the high-speed steel saw blades to be coated are clamped: the center hole of the high-speed steel saw blade passes through the drive rod 24, and a perforated shim is placed between every two high-speed steel saw blades to ensure that both sides of the saw blade can be coated with a thin film. Each drive rod 24 can clamp multiple saw blades, resulting in a larger clamping capacity and higher production efficiency. During the film coating process, the drive rod 24 rotates uniformly, which in turn drives the saw blade to rotate uniformly, enabling uniform coating of the thin film on the saw blade surface.

[0045] This embodiment is merely a further explanation of the present invention and is not intended to limit the present invention. Those skilled in the art can make non-inventive modifications to this embodiment as needed after reading this specification, but such modifications are protected by patent law as long as they are within the scope of the claims of the present invention.

Claims

1. A workpiece loading device for sputtering and ion plating, characterized in that, The system includes a drive assembly, a transmission assembly, and a support assembly. The drive assembly and the transmission assembly are supported by the support assembly. The drive assembly includes a drive key, a drive shaft, and a rotating support platform. The drive key is fixedly connected to the drive shaft via a drive keyway and a fixing bolt. A first insulating gasket is provided between the drive shaft and the rotating support platform. A first insulating sleeve is provided on the drive shaft. The drive shaft and the rotating support platform are fixedly connected by a first fastening bolt passing through the first insulating gasket and the first insulating sleeve. An external power source causes the drive key to rotate around the center. The drive key transmits the rotational motion to the drive shaft, thereby driving the rotating support platform to rotate. The support assembly includes a support ring, an axially rotating upper base, and a bearing conductive seat. The bearing conductive seat is connected to a bias power supply via a brush. A second insulating sleeve is provided on the axially rotating upper base. A second insulating gasket is provided between the axially rotating upper base and the bearing conductive seat. The transmission assembly includes a sun gear disposed on the support ring. A third insulating sleeve and a third insulating gasket are provided between the sun gear and the support ring. The support assembly also includes a bearing housing and a support rod. The bearing housing is fixed in the hole of the bearing conductive seat by threads. A second bearing is provided in the bearing housing. The support rod is connected to the rotating support table by threads. An upper cover plate is provided above the support rod. The upper cover plate is connected to the support rod by a sixth fastening bolt. The transmission assembly includes a transmission barrel, planetary gears, a sun gear, and a transmission rod. The sun gear is connected to the support ring by a seventh fastening bolt passing through a third insulating sleeve and a third insulating gasket. The transmission barrel is fixedly connected to the second bearing. The planetary gears are connected to the transmission barrel. The transmission rod is connected to the transmission barrel. The transmission rod is connected to the upper cover plate by a fixing sleeve.

2. The workpiece loading device for sputtering and ion plating according to claim 1, characterized in that, The support assembly includes a support column, and the rotating support platform is fixed on the support column and connected to the bearing conductive seat by a second fastening bolt.

3. A workpiece loading device for sputtering and ion plating according to claim 1, characterized in that, The support assembly further includes a sliding seat and a base. The base is connected to the sliding seat by a third fastening bolt. The base is provided with a support ring and an axially rotating lower base. The support ring and the axially rotating lower base are connected to the base by a fourth fastening bolt. A first bearing is provided inside the support ring. A bearing ball, an axially rotating upper base, and a bearing conductive seat are arranged sequentially above the axially rotating lower base. The axially rotating upper base and the bearing conductive seat are connected by a fifth fastening bolt passing through a second insulating sleeve and a second insulating gasket.

4. A workpiece loading device for sputtering and ion plating according to claim 1, characterized in that, The bottom of the transmission rod is provided with a keyway, and the transmission barrel is provided with a key that matches the keyway. The transmission rod and the transmission barrel are connected by the keyway and the key.

Citation Information

Patent Citations

  • A flexible rotary table for preparing PVD coatings on cutting tools

    CN105586577B

  • Multifunctional composite sputtering platform for preparing DLC (Diamond Like Carbon) film

    CN116334543A