Magnetron sputtering target follow-up coating method, storage medium and equipment for curved glass coating

Abstract

The present invention discloses a magnetron sputtering target material following coating method, storage medium and device for coating curved glass. A. Obtain a coating calibration curve of the curved glass to be coated, with n discrete reference points marked along the curve; B. Determine each reference point a i The corresponding sputtering reference state T i , T i Refers to: reference point a i The normal line at the target intersects the vertical moving path of the target at P i Point, P i Point to reference point a i The distance is exactly equal to the preset target base distance D p ; C. Before the curved glass actually moves to state T1, control the target to move vertically to point P1 and face the first reference point a1; D. Execute D1 until the curved glass is coated: D1. Once it is detected that the curved glass actually moves to state T i , according to the moving speed of the curved glass, P i+1 , P i The position change between the reference point a i+1 and reference point a i The angle change between the corresponding normal lines controls the target from P i Move to point P i+1 At point and from the reference point a i Rotate to face the reference point a i+1 .

Description

Technical Field

[0001] The present invention relates to the technical field of glass coating, and in particular to a magnetron sputtering target material follow-up coating method, storage medium and equipment for curved glass coating. Background Art

[0002] Many industrial products require glass with a film layer coated on the surface. Most of the industry uses magnetron sputtering equipment to coat the glass. The traditional glass coating method usually keeps the target material fixed, and then moves the glass over the target material at a uniform speed. During the movement of the glass, the target material sputters particles onto the glass under the action of the magnetic field, thereby achieving coating. Glass can be divided into flat glass and curved glass according to its surface shape, and the above coating method is mainly suitable for flat glass. If the above coating method is used to coat the curved glass, due to the different distances between each position of the curved glass and the target material, the position closer to the target material will receive more particles, resulting in the corresponding part of the glass The film layer is too thick, while the position farther from the target material receives fewer particles, resulting in the corresponding part of the glass. The film layer is thinner, which causes uneven coating of the curved glass. In response to this problem, some technicians in the industry have proposed some coating schemes for curved glass. For example, patent document CN114990507A provides a magnetron sputtering coating device for curved substrates. As Figure 1 , 2As shown, the device is provided with a curved surface fixture 401 corresponding to the curved surface shape of the photovoltaic curved glass to be coated. The surface of the photovoltaic curved glass to be coated is wavy, so the upper surface of the curved surface fixture 401 is made into a wavy shape corresponding to the curved surface shape of the photovoltaic curved glass. A wavy toothed belt arranged along the wavy surface of the glass is arranged on the side of the upper surface of the curved surface fixture 401. A sputtering target 3 is arranged above the curved surface fixture 401. The sputtering target 3 is connected to the rotating disk 404 by transmission. The upper end of the rotating rod 403 is hinged at a non-center position of the rotating disk 404, and the lower end is engaged with the wavy toothed belt on the side of the curved surface fixture 401 through the abutment rod 402. The curved surface fixture 401 is located on the conveyor belt 2 and driven by it. When coating is required, the photovoltaic curved glass is placed on the curved tooling 401, and then the conveyor belt 2 drives the curved tooling 401 and the photovoltaic curved glass to move forward along the conveyor belt 2, and the photovoltaic curved glass will move directly under the sputtering target 3. During this process, the abutment rod 402 and the rotating rod 403 are moved up and down by the wave-shaped toothed belt of the curved tooling 401, thereby pulling the rotating disk 404 to reciprocate around its center of circle, and the sputtering target 3 will perform reciprocating deflection motion synchronously with the rotating disk 404, whereby the sputtering target 3 can follow the changes in the peaks and troughs of the photovoltaic curved glass and deflect accordingly, thereby changing the particle sputtering direction according to the changes in the peaks and troughs of the curved glass, so that the particle sputtering direction is kept as perpendicular to the coating surface as possible (that is, the particles are ejected / sputtered in the normal direction), so that the particles are sputtered evenly. However, the coating device provided in the patent document can only be applied to curved glass corresponding to the curved surface of the curved tooling 401, and cannot be applied to curved glass with other curved surfaces. Summary of the invention

[0003] The technical objective to be achieved by the present invention is to provide a magnetron sputtering target following coating method for curved glass controlled by a computer program, a computer-readable storage medium storing a computer program for implementing the method when executed, and a magnetron sputtering device including the computer storage medium. The method can achieve relatively uniform coating of curved glass and is suitable for curved glass with different curves.

[0004] In order to achieve the above technical objectives, the present invention provides a method for magnetron sputtering target following coating of curved glass by computer program control, comprising the following steps performed in sequence:

[0005] A. Obtaining a coating calibration curve of the curved glass to be coated, wherein the coating calibration curve is determined according to the curved surface shape of the curved glass to be coated, and n discrete reference points are marked in sequence from front to back along the coating calibration curve;

[0006] B. Use the coating calibration curve to simulate the curved glass, let the coating calibration curve move along the preset moving coating trajectory to perform moving coating simulation, and determine the reference points a during the movement of the coating calibration curve.i The corresponding sputtering reference state T i , where 1≤i≤n, the sputtering reference state T i Meaning: reference point a of the coating calibration curve i The normal line at the target intersects the vertical moving path of the target at P i Point, P i Point to reference point a i The distance is exactly equal to the preset target base distance D p ;

[0007] C. Before the curved glass actually moves to the sputtering reference state T1 corresponding to the first reference point a1, the target is controlled to move vertically to point P1 and face the first reference point a1 of the coating calibration curve of the simulated curved glass in the sputtering reference state T1;

[0008] D. Perform the following step D1 until the curved glass is coated:

[0009] D1. Once it is detected that the curved glass actually moves to the sputtering reference state T i , according to the moving speed of the curved glass and the next reference point a i+1 The reference point a that is currently facing the target i The corresponding intersection points P i+1 , P i The position change between the two and the next reference point a i+1 and reference point a i The angle change between the corresponding normal lines controls the target from P i Move to point P i+1 Point and facing the simulated sputtering reference state T i The i-th reference point a of the coating calibration curve of the curved glass i Rotate to face the simulated sputtering reference state T i+1 The i+1th reference point a of the coating calibration curve of the curved glass i+1 .

[0010] Further, in step D, according to the moving speed of the curved glass, the distance S that the curved glass needs to move from the sputtering reference state T1 corresponding to the reference point a1 currently facing the target to the sputtering reference state T2 corresponding to the next reference point a2, and the next reference point a i+1 The reference point a that is currently facing the target i The corresponding intersection points P i+1 , P i The position change between P and i Move to point P i+1The moving speed at the point P is used to control the target material from P to i Move to point P i+1 Point.

[0011] Further, in step D, according to the moving speed of the curved glass, the distance S that the curved glass needs to move from the sputtering reference state T1 corresponding to the reference point a1 currently facing the target to the sputtering reference state T2 corresponding to the next reference point a2, and the next reference point a i+1 and reference point a i The angle change between the corresponding normal lines is used to determine the target material from facing the simulated sputtering reference state T i The i-th reference point a of the coating calibration curve of the curved glass i Rotate to face the simulated sputtering reference state T i+1 The i+1th reference point a of the coating calibration curve of the curved glass i+1 The rotation speed of the target is controlled to rotate from the simulated sputtering reference state T i The i-th reference point a of the coating calibration curve of the curved glass i Rotate to face the simulated sputtering reference state T i+1 The i+1th reference point a of the coating calibration curve of the curved glass i+1 .

[0012] Furthermore, the method includes step A0 performed before step A. Along the horizontal forward movement trajectory of the curved glass to be coated, the coordinates of a group of position points of the curved glass are detected, each position point in a group is located in the same vertical plane, and each position point is smoothly connected according to the coordinates of each position point to obtain the coating calibration curve, and the position points in a group are used as the reference points of the coating calibration curve.

[0013] Furthermore, in step A0, the coordinates of a group of position points on the vertical plane where the center line of the curved glass is located are specifically detected.

[0014] Furthermore, step A0 specifically detects the coordinates of multiple groups of position points, which are respectively located in multiple vertical planes, calculates the average coordinates of the coordinates of the multiple groups of position points, and smoothly connects the points corresponding to each average coordinate to form the coating calibration curve, and uses the points corresponding to each average coordinate as the reference point of the coating calibration curve.

[0015] Furthermore, the plurality of vertical planes are vertical planes where the quadrants of the curved glass are located.

[0016] The present invention also provides a computer-readable storage medium on which an executable computer program is stored. When the computer program is executed, the magnetron sputtering target follow-up coating method as described above can be implemented.

[0017] The present invention also provides a magnetron sputtering device, including a cathode substrate for loading sputtering targets, a controller and a driving device for driving the cathode substrate to move, the controller is electrically connected to the driving device; including the computer-readable storage medium as described above, the controller can execute the computer program in the computer-readable storage medium to implement the magnetron sputtering target following coating method as described above.

[0018] Furthermore, it includes a photoelectric distance measuring sensor, which is electrically connected to the controller.

[0019] In the magnetron sputtering target follow-up coating method, first, step A obtains the coating calibration curve of the curved glass to be coated, and then step B determines each reference point a of the coating calibration curve. i The corresponding sputtering reference state T i Then, step C is performed to move the target material to point P1 corresponding to the sputtering reference state T1 in advance and face the first reference point a1 of the coating calibration curve of the simulated curved glass in the sputtering reference state T1, and then the following step D1 is performed until the curved glass is coated. Once it is detected that the curved glass actually moves to the sputtering reference state T1, i , according to the actual moving speed of the curved glass and the next reference point a i+1 The reference point a that is currently facing the target i The corresponding intersection points P i+1 , P i The position change between the two and the next reference point a i+1 and reference point a i The angle change between the corresponding normal lines controls the target from P i Move to point P i+1 Point and facing the simulated sputtering reference state T i The i-th reference point a of the coating calibration curve of the curved glass i Rotate to face the simulated sputtering reference state T i+1 The i+1th reference point a of the coating calibration curve of the curved glass i+1 In this way, when the curved glass is moved from the reference point a i Move to base point a i+1 When the target material is just from P i Move to point P i+1 Point and facing the simulated sputtering reference state T i The i-th reference point a of the coating calibration curve of the curved glassi Rotate to face the simulated sputtering reference state T i+1 The i+1th reference point a of the coating calibration curve of the curved glass i+1 During the entire coating process of the curved glass, the curved glass moves successively to the positions corresponding to each reference point a. i The corresponding sputtering reference state T i , the target material moves synchronously to each sputtering reference state T i The corresponding P i point, so that the target and each coating point i on the curved glass (the coating point i corresponds to the reference point a of the coating calibration curve i ) is kept at the preset target-substrate distance D p , and the target material is synchronously rotated to each coating point i on the curved glass, so that the target material remains facing each coating point i on the curved glass, thereby making the coating of the curved glass more uniform; in addition, the method controls the movement of the target substrate according to the coating calibration curve of the curved glass to be coated. If the curved surface of the curved glass to be coated is different, then the coating calibration curve can be replaced accordingly, which can be applicable to curved glasses with different curvatures. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a structural schematic diagram of a curved substrate magnetron sputtering coating device in the prior art.

[0021] Figure 2 yes Figure 1 Enlarged schematic diagram of point A.

[0022] Figure 3 It is a schematic diagram comparing the curved glass surface and the coating calibration curve.

[0023] Figure 4 It is a schematic diagram of the sputtering reference states corresponding to the multiple reference points of the coating calibration curve in the process of using the coating calibration curve to perform mobile coating simulation.

[0024] Figure 5 It is a schematic diagram of multiple reference points of the target material facing the coating calibration curve.

[0025] Figure 6 It is a flow chart of the magnetron sputtering target following coating method. DETAILED DESCRIPTION

[0026] The present invention is further described in detail below in conjunction with specific implementation methods.

[0027] The magnetron sputtering device of this embodiment includes a cathode substrate and a sputtering target material mounted on the cathode substrate. The magnetron sputtering device also includes a controller, a photoelectric distance sensor, and a driving device for driving the cathode substrate to move, and the controller is electrically connected to the driving device and the photoelectric distance sensor. The magnetron sputtering device also includes a computer readable storage medium, and the controller can execute a computer program in the computer readable storage medium to achieve the following Figure 6 The magnetron sputtering target material follows the coating method. The following is a specific example to illustrate the implementation process of this method.

[0028] Before starting coating, the controller of the magnetron sputtering equipment must first obtain the coating calibration curve of the curved glass to be coated. Specifically, the curved glass is placed horizontally, the photoelectric distance sensor is located directly below the curved glass, and the curved surface to be coated of the curved glass faces the photoelectric distance sensor. The photoelectric distance sensor is located on the vertical plane where the center line of the curved glass is located. Then, the curved glass is moved horizontally from one side above the photoelectric distance sensor to the other side along the moving coating trajectory at a uniform speed. During the movement, the photoelectric distance sensor takes points at fixed time intervals to measure the distance between the photoelectric distance sensor and the corresponding position point on the center line of the curved glass and transmits it to the controller. While the photoelectric distance sensor takes points, the controller records the distance value of the curved glass moving over the photoelectric distance sensor. The controller uses the distance value of the curved glass moving over the top of the photoelectric distance sensor as the X coordinate value and the distance measured by the photoelectric distance sensor as the Y coordinate value, thereby forming the coordinates of a position point of the curved glass detected by the photoelectric distance sensor. According to the coordinates of each position point of the curved glass detected by the photoelectric distance sensor, each position point is smoothly connected to obtain a coating calibration curve of the curved glass, and the position point detected by the photoelectric distance sensor is used as a reference point of the coating calibration curve.

[0029] This embodiment directly uses the center line of the curved glass in the same direction as the moving coating track as the coating calibration curve. Considering that some curved glass has curvature changes not only on the moving coating track but also in the direction perpendicular to the moving coating track, directly using the center line of the curved glass in the same direction as the moving coating track as the coating calibration curve does not take into account the influence of the curvature change of the curved glass in the direction perpendicular to the moving coating track on the coating. Therefore, preferably, other embodiments can be changed to move the coating track along the curved glass, take three curves in the direction perpendicular to the moving coating track, and obtain the final coating calibration curve based on the above. The specific process is as follows:

[0030] The magnetron sputtering device includes three photoelectric distance measuring sensors arranged side by side. The three photoelectric sensors are located below the curved glass and are respectively located on the vertical plane where the four-dividing lines of the curved glass in the direction perpendicular to the moving coating track are located (the four-dividing lines are shown in FIG. Figure 3The three horizontal dotted lines on the curved surface of the curved glass shown in the upper middle part) are then moved horizontally and at a uniform speed from one side above the three photoelectric distance measuring sensors to the other side along the moving coating track. During the movement, the three photoelectric distance measuring sensors respectively take points at fixed time intervals to measure the distance between the photoelectric distance measuring sensor and the corresponding position points on the corresponding bisector of the curved glass and transmit them to the controller. While the photoelectric distance measuring sensor takes points, the controller records the distance value of the curved glass passing directly above the photoelectric distance measuring sensor. The controller uses the distance value of the curved glass passing directly above the photoelectric distance measuring sensor as the X-coordinate value, and the distances measured by the three photoelectric distance measuring sensors as the Y-coordinate values, thereby forming the coordinates of the three position points of the curved glass detected by the three photoelectric distance measuring sensors. Each position point detected by a photoelectric distance measuring sensor is taken as a group of position points to obtain the coordinates of three groups of position points. The controller calculates the average coordinates of the coordinates of the three groups of position points, as shown in Figure 3 As shown in the upper middle, the first set of position points is a 11 、a 21 、a 31 ……a n1 , the second set of position points is a 12 、a 22 、a 32 ……a n2 , the third set of position points is a 13 、a 23 、a 33 ……a n3 Calculating the average coordinates of the three sets of position points is to calculate the average coordinates of the corresponding position points in the three sets of position points. For example, calculating a 11 、a 12 、a 13 The average coordinates of the three positions are taken as the coordinates of the first position point a1 of the coating calibration curve. 21 、a 22 、a 23 The average coordinates of the three position points are taken as the coordinates of the first position point a2 of the coating calibration curve. By analogy, all the position points a1, a2, a3, ... a of the coating calibration curve can be calculated. n The coordinates of these points a1, a2, a3...a n coordinates, and these position points are smoothly connected to form a coating calibration curve (i.e. Figure 3 The curve shown in the middle and lower part) and the position points a1, a2, a3...a n As the reference point of the coating calibration curve.

[0031] After the controller of the magnetron sputtering equipment obtains the coating calibration curve of the curved glass to be coated (that is, the Figure 6 Step A) in the above example, execute Figure 6 Step B in the above method uses the coating calibration curve to simulate the curved glass, moves the coating calibration curve along the preset moving coating trajectory to perform moving coating simulation, and determines the reference points a during the movement of the coating calibration curve. i The corresponding sputtering reference state T i , where 1≤i≤n. The sputtering reference state T i Meaning: reference point a of the coating calibration curve i The normal line at the target intersects the vertical moving path of the target at P i Point, P i Point to reference point a i The distance is exactly equal to the preset target base distance D p .like Figure 4 As shown in (I), the coating calibration curve moves to the reference state T1 corresponding to the reference point a1. At this time, the normal line n1 at the reference point a1 of the coating calibration curve intersects with the vertical moving path of the target B at point P1. The distance from point P1 to the reference point a1 is exactly equal to the preset target-substrate distance D. p .like Figure 4 As shown in (II), the coating calibration curve moves to the reference state T2 corresponding to the reference point a2. At this time, the normal line n2 at the reference point a2 of the coating calibration curve intersects with the vertical moving path of the target B at point P2. The distance from point P2 to the reference point a2 is exactly equal to the preset target-substrate distance D. p .like Figure 4 As shown in (III), the coating calibration curve moves to the reference point a (n-1) The corresponding reference state T (n-1) At this time, the coating calibration curve reference point a (n-1) Normal at n (n-1) The vertical moving path of the target material B intersects at P (n-1) Point, P (n-1) Point to reference point a (n-1) The distance is exactly equal to the preset target-base distance D p The controller determines each reference point a in turn during the process of moving the coating calibration curve to simulate the coating. i The sputtering reference state T i After confirming, you can start coating the curved glass. The coating process is as follows:

[0032] like Figure 5 As shown, the ○ in the figure is the target material, is a cathode substrate on which a target material is mounted. Before the curved glass is actually moved to the sputtering reference state T1 corresponding to the first reference point a1, the controller of the magnetron sputtering equipment Figure 5As shown in (I), the target is controlled to move vertically to point P1 and face the first reference point a1 of the coating calibration curve of the simulated curved glass in the sputtering reference state T1. Figure 5 As shown in (I), the midpoint of the cathode substrate where the target B is located is located at point P1, that is, the target has moved to point P1; the cathode substrate where the target B is located is rotated to a normal line n1 perpendicular to the reference point a1 of the coating calibration curve and parallel to the tangent line of the reference point a1 of the coating calibration curve, that is, the target is facing the first reference point a1 of the coating calibration curve of the simulated curved glass in the sputtering reference state T1. The controller measures the moving distance of the curved glass through the moving speed and moving time of the curved glass. Once it is detected that the curved glass has actually moved to the sputtering reference state T1, it: on the one hand, changes the moving speed V of the curved glass to q , the distance S that the curved glass needs to move from the sputtering reference state T1 corresponding to the reference point a1 currently facing the target to the sputtering reference state T2 corresponding to the next reference point a2, and the position change H between the intersection points P2 and P1 corresponding to the next reference point a2 and the reference point a1 currently facing the target, respectively, are substituted into the following formula: S / V q =H / V b1 Calculate the target moving speed V b1 , so the moving speed V b1 To control the target to move from point P1 to point P2; on the other hand, the moving speed V of the curved glass q , the distance S that the curved glass needs to move from the sputtering reference state T1 corresponding to the reference point a1 currently facing the target to the sputtering reference state T2 corresponding to the next reference point a2, and the angle change W between the normal lines corresponding to the next reference point a2 and the reference point a1, are substituted into the following formula: S / V q =W / V b2 The target rotation speed V is calculated b2 , so the rotation speed V b2 To control the rotation from the first reference point a1 of the coating calibration curve facing the simulated curved glass in the sputtering reference state T1 to the second reference point a2 of the coating calibration curve facing the simulated curved glass in the sputtering reference state T2. Figure 5 As shown in (II), the midpoint of the cathode substrate where the target is located is located at point P2, that is, the target has moved to point P2, and the cathode substrate where the target is located is perpendicular to the normal line at the second reference point a2 of the coating calibration curve, and parallel to the tangent line at the second reference point a2 of the coating calibration curve, that is, the target has rotated to face the second reference point a2 of the coating calibration curve of the simulated curved glass in the sputtering reference state T2. Once the controller detects that the curved glass has moved to the sputtering reference state T2, it: on the one hand, increases the moving speed V of the curved glass to q, the distance S that the curved glass needs to move from the sputtering reference state T2 corresponding to the reference point a2 currently facing the target to the sputtering reference state T3 corresponding to the next reference point a3, and the position change H between the intersection points P3 and P2 corresponding to the next reference point a3 and the reference point a2 currently facing the target, respectively, are substituted into the following formula: S / V q =H / V b1 Calculate the target moving speed V b1 , so the moving speed V b1 To control the target to move from point P2 to point P3; on the other hand, the moving speed of the curved glass V q , the distance S that the curved glass needs to move from the sputtering reference state T2 corresponding to the reference point a2 currently facing the target to the sputtering reference state T3 corresponding to the next reference point a3, and the angle change W between the normal lines corresponding to the next reference point a3 and the reference point a1, are substituted into the following formula: S / V q =W / V b2 The target rotation speed V is calculated b2 , so the rotation speed V b2 To control the rotation from the second reference point a2 of the coating calibration curve facing the simulated curved glass in the sputtering reference state T2 to the third reference point a3 of the coating calibration curve facing the simulated curved glass in the sputtering reference state T3, and so on, until the curved glass is completely coated. For the convenience of readers' understanding, Figure 5 (III) shows the curved glass moving to the sputtering reference state T (n-1) The state of the target material at the time, such as Figure 5 (III) shows that the target is located at P (n-1) And facing the simulated sputtering reference state T (n-1) The (n-1)th reference point a of the coating calibration curve of the curved glass (n-1) It can be seen that during the entire coating process of the curved glass, the curved glass moves successively to the positions corresponding to each reference point a. i The corresponding sputtering reference state T i , the target material moves synchronously to each sputtering reference state T i The corresponding P i point, so that the distance between the target and the corresponding position on the curved glass to be coated is maintained at the preset target-substrate distance D p , and the target material is synchronously rotated to the corresponding position on the curved glass to be coated, so that the target material is kept facing all parts of the curved glass, so that the coating of the curved glass is more uniform. In addition, this embodiment controls the movement of the target substrate according to the coating calibration curve of the curved glass to be coated. If the curved surface of the curved glass to be coated is different, then the coating calibration curve can be replaced accordingly, which can be applied to curved glass with different surfaces.

[0033] The above is only an implementation method of the invention, and does not limit the scope of patent protection. Those skilled in the art can make non-substantial changes or substitutions based on the invention, which still fall within the scope of patent protection.

Claims

1. A magnetron sputtering target following coating method for curved glass coating controlled by computer program, characterized in that: It includes the following steps which are performed in sequence: A. Obtaining a coating calibration curve of the curved glass to be coated, wherein the coating calibration curve is determined according to the curved surface shape of the curved glass to be coated, and n discrete reference points are marked in sequence from front to back along the coating calibration curve; B. Use the coating calibration curve to simulate the curved glass, let the coating calibration curve move along the preset moving coating trajectory to perform moving coating simulation, and determine the reference points a during the movement of the coating calibration curve. i The corresponding sputtering reference state T i , where 1≤i≤n, the sputtering reference state T i Meaning: reference point a of the coating calibration curve i The normal line at the target intersects the vertical moving path of the target at P i Point, P i Point to reference point a i The distance is exactly equal to the preset target base distance D p ; C. Before the curved glass actually moves to the sputtering reference state T1 corresponding to the first reference point a1, the target is controlled to move vertically to point P1 and face the first reference point a1 of the coating calibration curve of the simulated curved glass in the sputtering reference state T1; D. Perform the following step D1 until the curved glass is coated: D1. Once it is detected that the curved glass actually moves to the sputtering reference state T i , according to the moving speed of the curved glass and the next reference point a i+1 The reference point a that is currently facing the target i The corresponding intersection points P i+1 , P i The position change between the two and the next reference point a i+1 and reference point a i The angle change between the corresponding normal lines controls the target from P i Move to point P i+1 Point and facing the simulated sputtering reference state T i The i-th reference point a of the coating calibration curve of the curved glass i Rotate to face the simulated sputtering reference state T i+1 The i+1th reference point a of the coating calibration curve of the curved glass i+1 .

2. The magnetron sputtering target follow-up coating method according to claim 1, characterized in that: In step D, according to the moving speed of the curved glass, the distance S that the curved glass needs to move from the sputtering reference state T1 corresponding to the reference point a1 currently facing the target to the sputtering reference state T2 corresponding to the next reference point a2, and the next reference point a i+1 The reference point a that is currently facing the target i The corresponding intersection points P i+1 , P i The position change between P and i Move to point P i+1 The moving speed at the point P is used to control the target material from P to i Move to point P i+1 Point.

3. The magnetron sputtering target follow-up coating method according to claim 1, characterized in that: In step D, according to the moving speed of the curved glass, the distance S that the curved glass needs to move from the sputtering reference state T1 corresponding to the reference point a1 currently facing the target to the sputtering reference state T2 corresponding to the next reference point a2, and the next reference point a i+1 and reference point a i The angle change between the corresponding normal lines is used to determine the target material from facing the simulated sputtering reference state T i The i-th reference point a of the coating calibration curve of the curved glass i Rotate to face the simulated sputtering reference state T i+1 The i+1th reference point a of the coating calibration curve of the curved glass i+1 The rotation speed of the target is specifically controlled by the rotation speed as described above from facing the simulated sputtering reference state T i The i-th reference point a of the coating calibration curve of the curved glass i Rotate to face the simulated sputtering reference state T i+1 The i+1th reference point a of the coating calibration curve of the curved glass i+1 .

4. The magnetron sputtering target follow-up coating method according to claim 1, characterized in that: The method includes step A0 performed before step A. Detecting the coordinates of a group of position points of the curved glass along the horizontal forward movement trajectory when the curved glass is to be coated, wherein each position point in a group is located in the same vertical plane, and smoothly connecting each position point according to the coordinates of each position point to obtain the coating calibration curve, and using the position points in a group as the reference points of the coating calibration curve.

5. The magnetron sputtering target follow-up coating method according to claim 4, characterized in that: In step A0, the coordinates of a group of position points on the vertical plane where the center line of the curved glass is located are specifically detected.

6. The magnetron sputtering target follow-up coating method according to claim 4, characterized in that: Step A0 specifically detects the coordinates of multiple groups of position points, which are respectively located in multiple vertical planes, calculates the average coordinates of the coordinates of the multiple groups of position points, and smoothly connects the points corresponding to each average coordinate to form the coating calibration curve, using the points corresponding to each average coordinate as the reference points of the coating calibration curve.

7. The magnetron sputtering target follow-up coating method according to claim 6, characterized in that: The multiple vertical planes are vertical planes where the quadrants of the curved glass are located.

8. A computer-readable storage medium having an executable computer program stored thereon, characterized in that: When the computer program is executed, the magnetron sputtering target follow-up coating method as described in any one of claims 1 to 7 can be implemented.

9. A magnetron sputtering device, comprising a cathode substrate for loading a sputtering target, characterized in that: It includes a controller and a driving device for driving the cathode substrate to move, and the controller is electrically connected to the driving device; The computer-readable storage medium as claimed in claim 8 is included, and the controller can execute the computer program in the computer-readable storage medium to implement the magnetron sputtering target follow-up coating method as claimed in any one of claims 1 to 7.

10. The magnetron sputtering device according to claim 9, characterized in that: The device comprises a photoelectric distance measuring sensor which is electrically connected to a controller.

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