A water replenishing device for a glass substrate cleaning machine
By incorporating a filter chamber, filter wall, and water flow acceleration module into the water replenishment device of the glass substrate cleaning machine, combined with a baffle plate and liquid storage structure, gentle and efficient filtration of the cleaning solution is achieved, solving the problem of cleaning solution backflow and contamination, and improving the cleaning effect and equipment operation stability.
Patent Information
- Application Number
- CN202311689185.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-08
- Publication Date
- 2025-11-18
- Estimated Expiration
- 2043-12-08
AI Technical Summary
In existing glass substrate cleaning machine water replenishment devices, there is a problem of contamination caused by the backflow of cleaning fluid.
Design a water replenishment device for a glass substrate cleaning machine. By setting up a filter chamber and filter wall below the cleaning tank, and using a water flow speed-increasing module to change the difference in water flow speed for gentle filtration, combined with a baffle plate, water supply pipe and liquid storage structure, a self-priming structure is achieved, avoiding filter screen clogging and secondary pollution caused by high-speed water pumping.
It achieves efficient filtration of the cleaning fluid, avoids filter clogging, reduces energy consumption, improves cleaning efficiency and cleaning effect, and prevents the cleaning fluid from flowing back and scratching the glass substrate.
Smart Images

Figure CN117798160B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of glass processing equipment technology, specifically to a water replenishment device for a glass substrate cleaning machine. Background Technology
[0002] A glass substrate cleaning machine is a specialized piece of equipment used to clean the surface of glass substrates. It is commonly used in industries such as semiconductor manufacturing and display production. This cleaning machine employs advanced cleaning technologies, such as spraying, ultrasonic cleaning, or chemical cleaning, to remove surface dirt, grease, dust, and other impurities. It ensures a clean, dust-free substrate surface, contributing to improved production quality and process stability, thus playing a crucial role in high-precision and high-quality manufacturing processes. The water replenishment device of a glass substrate cleaning machine is designed to ensure a stable water supply during the cleaning process. Typically, the water replenishment device is installed below the glass substrate cleaning module and includes a water tank, water pump, piping system, and control unit. Its working principle involves the water pump drawing the necessary water from the water tank and delivering it through pipes to the cleaning machine's nozzles or spray system, ensuring a sufficient water supply throughout the cleaning process. This device maintains a stable water level, ensuring effective cleaning and maintaining the normal operation of the equipment.
[0003] For example, the glass substrate cleaning machine proposed in Chinese patent CN215587425U includes a cleaning tank and a conveying device. The cleaning tank has an output port for conveying the glass substrate to the next station. A water-blocking brush is connected to the output port to prevent the cleaning fluid from flowing out of the cleaning tank. The cleaning tank also includes a level detection device for detecting changes in the cleaning fluid level, a controller, and a water replenishment device. The controller controls the water replenishment device to replenish the cleaning fluid to maintain the cleaning fluid level at a preset position based on the signal fed back from the level detection device. This glass substrate cleaning machine has some problems. The cleaning fluid used to clean the glass substrate usually carries residual waste generated during cleaning. When the cleaning fluid containing waste flows back into the cleaning tank, it contaminates the cleaning tank. Subsequent use of the cleaning fluid may cause scratches on the glass substrate. Therefore, it is necessary to design a water replenishment device for the glass substrate cleaning machine that can filter the cleaning fluid flowing back into the cleaning tank, remove residues, and improve the cleaning efficiency of the glass substrate cleaning machine. Summary of the Invention
[0004] (a) Technical problems to be solved
[0005] To address the shortcomings of existing technologies, this invention provides a water replenishment device for a glass substrate cleaning machine, which has the advantages of gentle filtration of the returned cleaning solution and high-efficiency filtration. This solves the problem that when cleaning solution containing residual waste is returned to the cleaning tank, it will contaminate the cleaning tank, and when the cleaning solution is reused, it may cause scratches on the glass substrate.
[0006] (II) Technical Solution
[0007] To achieve the aforementioned objectives of gentle filtration and efficient filtration of the cleaning solution, the present invention provides the following technical solution: a water replenishment device for a glass substrate cleaning machine, comprising a cleaning tank, the cleaning tank being positioned directly below the drain outlet of the glass substrate cleaning machine, a filter chamber for recovering the cleaning solution being positioned at the center of the cleaning tank, a filter wall for filtering the cleaning solution being positioned around the filter chamber, a water flow acceleration module for increasing the water flow velocity between the cleaning tank and the filter wall being positioned between the cleaning tank and the filter wall, the bottom of the water flow acceleration module being mounted on the cleaning tank, the water flow acceleration module moving along the direction of the filter wall, and a drive module for driving the movement of the water flow acceleration module being positioned on the bottom surface of the cleaning tank.
[0008] Preferably, the water flow acceleration module includes a baffle plate, a fixing block, and a belt structure. The belt structure is rotatably installed on the bottom inner side of the cleaning tank and extends out from the bottom of the cleaning tank to connect to the drive module. The connection between the belt structure and the cleaning tank is waterproof. The fixing block, which moves synchronously with the belt structure, is fixedly installed on the belt structure. The upper end of the fixing block is provided with a baffle plate that blocks the water flow between the filter wall of the cleaning tank.
[0009] Preferably, the water baffle is trapezoidal in shape.
[0010] Preferably, a water supply pipe is fixedly installed at the center of the baffle plate. The water supply pipe is rotatably installed on the top of the fixed block. A water intake port is provided at the bottom of the water supply pipe, and a water spray hole is provided at the top of the water supply pipe. The rotation of the water supply pipe causes the cleaning liquid in the water spray hole to be thrown out by centrifugal force, which generates suction force on the remaining cleaning liquid inside the water supply pipe to form a self-priming structure. A funnel-like structure for guiding the backflow of cleaning liquid is fixedly installed on the top surface of the filter wall. The opening area of the top of the funnel-like structure is greater than or equal to the opening area of the cleaning pool. A liquid storage structure is provided on the outer side of the bottom of the funnel-like structure. The water spray hole of the water supply pipe is located in the liquid storage structure, and the cleaning liquid thrown out by the water spray hole is collected in the liquid storage structure.
[0011] Preferably, a rotating structure penetrating the end face of the liquid storage structure is provided, the rotating structure and the liquid storage structure are connected by a waterproof sliding connection, and a fixing hole for fixing the water supply pipe is opened on the rotating structure.
[0012] Preferably, a water supply pipe is fixedly installed inside the fixing hole, and the vertical height of the spray hole is higher than the inner bottom surface of the liquid storage structure.
[0013] Preferably, the outer wall of the liquid storage structure is provided with an outlet for discharging cleaning fluid.
[0014] Preferably, the drive module is a pulley drive module.
[0015] (III) Beneficial Effects
[0016] Compared with the prior art, the present invention provides a water replenishment device for a glass substrate cleaning machine, which has the following beneficial effects:
[0017] 1. The water replenishment device of this glass substrate cleaning machine, through the combined use of a cleaning tank structure, a filter wall structure, and a water flow acceleration module, achieves filtration of the cleaning liquid by changing the flow rate of the cleaning liquid between the cleaning tank and the filter chamber through the water flow acceleration module, thereby generating a liquid pressure difference. Compared with the traditional water pump extraction filtration method, this filtration method is gentler and avoids the filter screen clogging problem that may occur when the water pump extracts the cleaning tank at high speed. In addition, since the filtration area of the filter wall is much larger than the filtration area extracted by the water pump, this device has higher filtration efficiency.
[0018] 2. This water replenishment device for a glass substrate cleaning machine, through the combined use of a water supply pipe structure, a baffle plate structure, a spray hole structure, and a liquid storage structure, differs from traditional technical structures. The baffle plate rotates due to the impact of water flow, causing the cleaning fluid in the spray holes to be sprayed outwards due to centrifugal force, while continuously drawing cleaning fluid from the water supply pipe and the cleaning tank. This self-priming structure requires no other driving structure during operation; it only needs a velocity difference in the surrounding water flow to operate. The water supply pipe transports the cleaning fluid to the higher liquid storage structure, reducing the power required for subsequent water pump extraction. Compared to traditional equipment that relies entirely on water pumps to extract the cleaning fluid, this structure is simpler, easier to maintain, and effectively reduces energy consumption.
[0019] 3. The water replenishment device of this glass substrate cleaning machine, through the combined use of a drive module and a baffle structure, achieves stratified flow of the cleaning liquid in the cleaning tank by changing the shape of the baffle structure, compared to traditional technical structures. When the baffle is set to a trapezoidal shape with the bottom surface facing upwards, the top cleaning liquid has a higher flow rate, while the bottom cleaning liquid has a lower flow rate. This prevents the filtered waste at the bottom of the filter chamber from being affected by the low-speed water flow between the filter walls of the cleaning tank, allowing it to settle and avoiding turbidity caused by excessive flow at the bottom. When the trapezoidal shape is set to a downwards, the top cleaning liquid has a lower flow rate, while the bottom cleaning liquid has a higher flow rate. This helps to clean impurities and dirt at the bottom of the tank, improving the bottom cleaning effect, especially when dealing with stubborn waste or sediment. At the same time, by increasing the bottom flow rate, the circulation of the cleaning liquid is promoted, which helps to better mix and distribute the chemical components or cleaning agents in the cleaning liquid, thereby enhancing the cleaning effect.
[0020] 4. The water replenishment device of this glass substrate cleaning machine, through the combined use of a funnel-like structure and a liquid storage structure, compared with the traditional technical structure, can help the cleaning liquid to quickly flow back into the filter chamber, avoiding the situation where unfiltered cleaning liquid flows into the cleaning tank and causes secondary pollution of the cleaning tank, while effectively collecting and discharging the cleaning liquid. Attached Figure Description
[0021] Figure 1 This is a top three-dimensional structural diagram of the water replenishment device for a glass substrate cleaning machine according to the present invention.
[0022] Figure 2 This is a three-dimensional bottom view of the water replenishment device for a glass substrate cleaning machine according to the present invention;
[0023] Figure 3 This is a top view of the water replenishment device structure of a glass substrate cleaning machine according to the present invention;
[0024] Figure 4 This is a cross-sectional view of the water replenishment device structure of a glass substrate cleaning machine according to the present invention;
[0025] Figure 5 This is a cross-sectional view of the structure of the water replenishment device of the glass substrate cleaning machine of the present invention with the trapezoidal lower bottom surface of the baffle plate facing upwards in Embodiment 2;
[0026] Figure 6 This is a cross-sectional view of the structure of the water replenishment device of the glass substrate cleaning machine of the present invention with the lower bottom surface of the trapezoidal baffle facing downwards in Embodiment 2;
[0027] Figure 7 This is a three-dimensional structural diagram of the water replenishment device of a glass substrate cleaning machine according to Embodiment 3 of the present invention when the funnel-like structure is not installed;
[0028] Figure 8 This is a cross-sectional view of a third embodiment of a water replenishment device for a glass substrate cleaning machine according to the present invention;
[0029] Figure 9 This is a three-dimensional structural schematic diagram of a water replenishment device for a glass substrate cleaning machine according to a third embodiment of the present invention.
[0030] In the diagram: 1-cleaning tank, 2-filter chamber, 3-filter wall, 4-water flow acceleration module, 41-baffle plate, 42-fixed block, 43-belt structure, 44-water supply pipe, 45-water suction port, 46-spray hole, 5-drive module, 6-funnel-like structure, 7-liquid storage structure, 8-rotary structure, 9-liquid outlet. Detailed Implementation
[0031] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0032] Example 1
[0033] Please see Figure 1-4 A water replenishment device for a glass substrate cleaning machine includes a cleaning tank 1, which is located directly below the drain outlet of the glass substrate cleaning machine. A filter chamber 2 for recovering cleaning fluid is located at the center of the cleaning tank 1. A filter wall 3 for filtering the cleaning fluid is arranged around the filter chamber 2. A water flow acceleration module 4, which increases the water flow velocity between the cleaning tank 1 and the filter wall 3, is installed between the cleaning tank 1 and the filter wall 3. The bottom of the water flow acceleration module 4 is mounted on the cleaning tank 1, and the water flow acceleration module 4 moves along the direction of the filter wall 3. Figure 3 As shown by the arrow path, a drive module 5 is installed on the bottom surface of the cleaning tank 1 to drive the water flow acceleration module 4. The drive module 5 uses a pulley drive or other belt drive drive module. When the water flow acceleration module 4 increases the water flow speed between the cleaning tank 1 and the filter wall 3, the cleaning pressure between the cleaning tank 1 and the filter wall 3 decreases, while the cleaning tank 1 in the filter chamber 2 is in a static or slowly flowing state. The cleaning pressure in the filter chamber 2 is higher than the cleaning pressure between the cleaning tank 1 and the filter wall 3. At this time, the cleaning fluid will flow from the high-pressure filter chamber 2 to the low-pressure area between the cleaning tank 1 and the filter wall 3. When the cleaning fluid in the filter chamber 2 passes through the filter wall 3, the filter wall 3 will filter the cleaning waste contained in the cleaning fluid. This filtration method is more gentle and avoids the filter screen clogging problem that may occur when the water pump draws the cleaning tank 1 at high speed. In addition, since the filtration area of the filter wall 3 is much larger than the filtration area drawn by the water pump, this device has higher filtration efficiency.
[0034] Please see Figure 4 The water flow acceleration module 4 includes a baffle plate 41, a fixing block 42, and a belt structure 43. The belt structure 43 is rotatably mounted on the bottom inner side of the cleaning tank 1 and extends out from the bottom of the cleaning tank 1 to connect to the drive module 5. The connection between the belt structure 43 and the cleaning tank 1 is waterproof, which reduces water leakage when the belt structure 43 moves at the bottom of the cleaning tank 1. The fixing block 42, which moves synchronously with the belt structure 43, is fixedly mounted on the belt structure 43. The upper end of the fixing block 42 is provided with a baffle plate 41 that blocks the water flow between the filter wall 3 of the cleaning tank 1. The baffle plate 41 is made of corrosion-resistant and wear-resistant materials, such as stainless steel or special polymers. When the drive module 5 drives the belt structure 43 and the baffle plate 41 and fixing block 42 to move as a whole, such as... Figure 3 As shown, Figure 3The direction of the middle arrow indicates the movement path of the water flow acceleration module 4. The baffle plate 41 will disturb the water flow between the filter walls 3 of the cleaning tank 1, thereby increasing the flow velocity of the water flow between the filter walls 3 of the cleaning tank 1, thus realizing the pressure change of the water flow in the cleaning tank 1.
[0035] Example 2
[0036] Please see Figure 1-2 A water replenishment device for a glass substrate cleaning machine includes a cleaning tank 1, which is located directly below the drain outlet of the glass substrate cleaning machine. A filter chamber 2 for recovering cleaning fluid is located at the center of the cleaning tank 1. A filter wall 3 for filtering the cleaning fluid is arranged around the filter chamber 2. A water flow acceleration module 4, which increases the water flow velocity between the cleaning tank 1 and the filter wall 3, is installed between the cleaning tank 1 and the filter wall 3. The bottom of the water flow acceleration module 4 is mounted on the cleaning tank 1, and the water flow acceleration module 4 moves along the direction of the filter wall 3. Figure 3 As shown by the arrow path, a drive module 5 is installed on the bottom surface of the cleaning tank 1 to drive the water flow acceleration module 4. The drive module 5 uses a pulley drive or other belt drive drive module. When the water flow acceleration module 4 increases the water flow speed between the cleaning tank 1 and the filter wall 3, the cleaning pressure between the cleaning tank 1 and the filter wall 3 decreases, while the cleaning tank 1 in the filter chamber 2 is in a static or slowly flowing state. The cleaning pressure in the filter chamber 2 is higher than the cleaning pressure between the cleaning tank 1 and the filter wall 3. At this time, the cleaning fluid will flow from the high-pressure filter chamber 2 to the low-pressure area between the cleaning tank 1 and the filter wall 3. When the cleaning fluid in the filter chamber 2 passes through the filter wall 3, the filter wall 3 will filter the cleaning waste contained in the cleaning fluid. This filtration method is more gentle and avoids the filter screen clogging problem that may occur when the water pump draws the cleaning tank 1 at high speed. In addition, since the filtration area of the filter wall 3 is much larger than the filtration area drawn by the water pump, this device has higher filtration efficiency.
[0037] Please see Figure 3 The water flow acceleration module 4 includes a baffle plate 41, a fixing block 42, and a belt structure 43. The belt structure 43 is rotatably mounted on the bottom inner side of the cleaning tank 1 and extends out from the bottom of the cleaning tank 1 to connect to the drive module 5. The connection between the belt structure 43 and the cleaning tank 1 is waterproof, which reduces water leakage when the belt structure 43 moves at the bottom of the cleaning tank 1. The fixing block 42, which moves synchronously with the belt structure 43, is fixedly mounted on the belt structure 43. The upper end of the fixing block 42 is provided with a baffle plate 41 that blocks the water flow between the filter wall 3 of the cleaning tank 1. The baffle plate 41 is made of corrosion-resistant and wear-resistant materials, such as stainless steel or special polymers. When the drive module 5 drives the belt structure 43 and the baffle plate 41 and fixing block 42 to move as a whole, such as... Figure 3 As shown, Figure 3The direction of the middle arrow indicates the movement path of the water flow acceleration module 4. The baffle plate 41 will disturb the water flow between the filter walls 3 of the cleaning tank 1, thereby increasing the flow velocity of the water flow between the filter walls 3 of the cleaning tank 1, thus realizing the pressure change of the water flow in the cleaning tank 1.
[0038] Please see Figure 5-6 The baffle plate 41 is trapezoidal in shape. This trapezoidal structure allows the water flow velocity between the filter walls 3 and the cleaning tank 1 to be graded vertically. When the baffle plate 41 is trapezoidal with its bottom surface facing upwards, as... Figure 5 As shown, the top cleaning fluid experiences a larger thrust, while the bottom cleaning fluid experiences a smaller thrust. At this point, the top cleaning fluid has a higher flow velocity, while the bottom cleaning fluid has a lower flow velocity. This prevents the filter waste at the bottom of filter chamber 2 from being affected by the low-speed water flow between the filter walls 3 of the washing tank, allowing it to settle and avoid turbidity caused by excessively fast flow velocity at the bottom of filter chamber 2. When the trapezoidal bottom surface is facing downwards, as... Figure 6 As shown, the top cleaning fluid experiences a smaller thrust, while the bottom cleaning fluid experiences a larger thrust. At this time, the top cleaning fluid has a lower flow rate, while the bottom cleaning fluid has a higher flow rate, which helps to clean impurities and dirt at the bottom of tank 1 and improves the bottom cleaning effect, especially when dealing with more stubborn waste or sediment. At the same time, by increasing the bottom flow rate, the circulation of the cleaning fluid is promoted, which helps to better mix and distribute the chemical components or cleaning agents in the cleaning fluid, thereby enhancing the cleaning effect.
[0039] Example 3
[0040] Please see Figure 1-2 A water replenishment device for a glass substrate cleaning machine includes a cleaning tank 1, which is located directly below the drain outlet of the glass substrate cleaning machine. A filter chamber 2 for recovering cleaning fluid is located at the center of the cleaning tank 1. A filter wall 3 for filtering the cleaning fluid is arranged around the filter chamber 2. A water flow acceleration module 4, which increases the water flow velocity between the cleaning tank 1 and the filter wall 3, is installed between the cleaning tank 1 and the filter wall 3. The bottom of the water flow acceleration module 4 is mounted on the cleaning tank 1, and the water flow acceleration module 4 moves along the direction of the filter wall 3. Figure 3As shown by the arrow path, a drive module 5 is installed on the bottom surface of the cleaning tank 1 to drive the water flow acceleration module 4. The drive module 5 uses a pulley drive or other belt drive drive module. When the water flow acceleration module 4 increases the water flow speed between the cleaning tank 1 and the filter wall 3, the cleaning pressure between the cleaning tank 1 and the filter wall 3 decreases, while the cleaning tank 1 in the filter chamber 2 is in a static or slowly flowing state. The cleaning pressure in the filter chamber 2 is higher than the cleaning pressure between the cleaning tank 1 and the filter wall 3. At this time, the cleaning fluid will flow from the high-pressure filter chamber 2 to the low-pressure area between the cleaning tank 1 and the filter wall 3. When the cleaning fluid in the filter chamber 2 passes through the filter wall 3, the filter wall 3 will filter the cleaning waste contained in the cleaning fluid. This filtration method is more gentle and avoids the filter screen clogging problem that may occur when the water pump draws the cleaning tank 1 at high speed. In addition, since the filtration area of the filter wall 3 is much larger than the filtration area drawn by the water pump, this device has higher filtration efficiency.
[0041] Please see Figure 3 The water flow acceleration module 4 includes a baffle plate 41, a fixing block 42, and a belt structure 43. The belt structure 43 is rotatably mounted on the bottom inner side of the cleaning tank 1 and extends out from the bottom of the cleaning tank 1 to connect to the drive module 5. The connection between the belt structure 43 and the cleaning tank 1 is waterproof, which reduces water leakage when the belt structure 43 moves at the bottom of the cleaning tank 1. The fixing block 42, which moves synchronously with the belt structure 43, is fixedly mounted on the belt structure 43. The upper end of the fixing block 42 is provided with a baffle plate 41 that blocks the water flow between the filter wall 3 of the cleaning tank 1. The baffle plate 41 is made of corrosion-resistant and wear-resistant materials, such as stainless steel or special polymers. When the drive module 5 drives the belt structure 43 and the baffle plate 41 and fixing block 42 to move as a whole, such as... Figure 3 As shown, Figure 3 The direction of the middle arrow indicates the movement path of the water flow acceleration module 4. The baffle plate 41 will disturb the water flow between the filter walls 3 of the cleaning tank 1, thereby increasing the flow velocity of the water flow between the filter walls 3 of the cleaning tank 1, thus realizing the pressure change of the water flow in the cleaning tank 1.
[0042] Please see Figure 7-9A water supply pipe 44 is fixedly installed at the center of the baffle plate 41. The water supply pipe 44 is rotatably mounted on the top of the fixed block 42. A water inlet 45 is provided at the bottom of the water supply pipe 44, and a spray hole 46 is provided at the top of the water supply pipe 44. When the drive module 5 drives the fixed block 42 to move, the baffle plate 41 will also rotate due to the action of the cleaning fluid. The rotation of the baffle plate 41 will drive the water supply pipe 44 and the spray hole 46 above to rotate, causing the cleaning fluid in the spray hole 46 to be thrown out by centrifugal force. After the cleaning fluid is sprayed out of the spray hole 46, it will also generate suction on the remaining cleaning fluid in the water supply pipe 44, and draw the cleaning fluid from the water inlet 45 at the bottom to form a self-priming structure. This self-priming structure does not require other drive modules 5 during operation; it only needs a difference in the flow rate of the surrounding water to operate. The water supply pipe 44 transports the cleaning fluid to the higher liquid storage structure 7, which can reduce The power of the subsequent water pump to extract the cleaning fluid is simpler and easier to maintain compared to traditional equipment that relies entirely on water pumps to extract the cleaning fluid, effectively reducing energy consumption. A funnel-like structure 6 is fixedly installed on the top surface of the filter wall 3 to guide the return of the cleaning fluid. The opening area of the top of the funnel-like structure 6 is greater than or equal to the opening area of the cleaning tank 1. The funnel-like structure 6 can help the cleaning fluid return to the filter chamber 2 more quickly and can also prevent the cleaning fluid flowing out of the glass substrate cleaning agent drain from directly into the area between the cleaning tank 1 and the filter wall 3. A liquid storage structure 7 is provided on the outer side of the bottom of the funnel-like structure 6. The spray hole 46 of the water supply pipe 44 is located in the liquid storage structure 7. The cleaning fluid thrown out by the spray hole 46 is collected in the liquid storage structure 7. The liquid storage structure 7 can better collect the filtered cleaning fluid and prevent the filtered cleaning fluid from being secondary polluted in the cleaning tank 1. A rotating structure 8 is provided on the end face of the liquid storage structure 7, penetrating the end face of the liquid storage structure 7. The rotating structure 8 and the liquid storage structure 7 are connected by a waterproof sliding connection, which can prevent leakage during the movement of the rotating structure 8 and the liquid storage structure 7. A fixing hole is opened on the rotating structure 8 to fix the water supply pipe 44. The water supply pipe 44 is fixedly installed in the fixing hole. The vertical height of the water spray hole 46 is higher than the inner bottom end face of the liquid storage structure 7. An outlet 9 for discharging cleaning fluid is opened on the outer wall of the liquid storage structure 7.
[0043] Working principle: First, the water replenishment device is installed at the designated position on the glass substrate cleaning machine. The cleaning tank 1 is located directly below the drain outlet of the glass substrate cleaning machine. When the cleaning liquid containing impurities produced by the glass substrate cleaning machine flows out, the cleaning liquid containing impurities first enters the filter chamber 2. The drive module 5 drives the water flow acceleration module 4 along... Figure 3The movement along the path indicated by the middle arrow increases the water flow velocity between the cleaning tank 1 and the filter wall 3, thus reducing the cleaning pressure between them. Meanwhile, the cleaning tank 1 in the filter chamber 2 is in a static or slow-flowing state. At this time, the cleaning pressure in the filter chamber 2 is higher than that between the cleaning tank 1 and the filter wall 3. The cleaning fluid will flow from the high-pressure filter chamber 2 to the low-pressure area between the cleaning tank 1 and the filter wall 3. A filter wall 3 is installed between the cleaning tank 1 and the filter chamber 2. When the cleaning fluid in the filter chamber 2 passes through the filter wall 3, the filter wall 3 will filter out the cleaning waste contained in the cleaning fluid.
[0044] As the drive module 5 drives the fixed block 42 to move, the baffle plate 41 will also rotate due to the action of the cleaning fluid. The rotation of the baffle plate 41 will drive the water pipe 44 and the spray hole 46 above to rotate, causing the cleaning fluid in the spray hole 46 to be thrown out by centrifugal force. After the spray hole 46 sprays out the cleaning fluid, it will also generate suction force on the remaining cleaning fluid in the water pipe 44, and draw the cleaning fluid from the suction port 45 at the bottom to form a self-priming structure. This self-priming structure does not require other drive modules 5 when working, and only requires the water flow around the baffle plate 41 to have a flow rate difference to operate.
[0045] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.
[0046] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A water replenishment device for a glass substrate cleaning machine, comprising a cleaning tank (1), characterized in that: The cleaning tank (1) is located directly below the drain outlet of the glass substrate cleaning machine. A filter chamber (2) for recovering cleaning liquid is located in the center of the cleaning tank (1). A filter wall (3) for filtering cleaning liquid is located around the filter chamber (2). A water flow speed-increasing module (4) for increasing the water flow speed between the cleaning tank (1) and the filter wall (3) is located between the cleaning tank (1) and the filter wall (3). The bottom of the water flow speed-increasing module (4) is installed on the cleaning tank (1). The water flow speed-increasing module (4) moves along the direction of the filter wall (3). A drive module (5) for driving the water flow speed-increasing module (4) is located on the bottom surface of the cleaning tank (1). The water flow speed-up module (4) includes a baffle plate (41), a fixing block (42), and a belt structure (43). The belt structure (43) is rotatably installed on the bottom of the inner side of the cleaning tank (1) and extends out from the bottom of the cleaning tank (1) to connect to the drive module (5). The connection between the belt structure (43) and the cleaning tank (1) is waterproof. The fixing block (42) that moves synchronously with the belt structure (43) is fixedly installed on the belt structure (43). The upper end of the fixing block (42) is provided with a baffle plate (41) that blocks the water flow between the filter wall (3) of the cleaning tank (1). A water supply pipe (44) is fixedly installed at the center of the baffle plate (41). The water supply pipe (44) is rotatably installed on the top of the fixed block (42). A water inlet (45) is provided at the bottom of the water supply pipe (44). A spray hole (46) is provided at the top of the water supply pipe (44). The rotation of the water supply pipe (44) causes the cleaning liquid in the spray hole (46) to generate centrifugal force and be thrown out. It generates suction force on the remaining cleaning liquid inside the water supply pipe (44) to form a self-suction structure. A funnel-like structure (6) for guiding the return of cleaning liquid is fixedly installed on the top surface of the filter wall (3). The opening area of the top of the funnel-like structure (6) is greater than or equal to the opening area of the cleaning pool (1). A liquid storage structure (7) is provided on the outer side of the bottom of the funnel-like structure (6). The spray hole (46) of the water supply pipe (44) is located in the liquid storage structure (7). The cleaning liquid thrown out by the spray hole (46) is collected in the liquid storage structure (7).
2. The water replenishment device for a glass substrate cleaning machine according to claim 1, characterized in that: The water baffle (41) is trapezoidal in shape.
3. The water replenishment device for a glass substrate cleaning machine according to claim 1, characterized in that: The liquid storage structure (7) is provided with a rotating structure (8) that penetrates the end face of the liquid storage structure (7). The rotating structure (8) and the liquid storage structure (7) are connected by a waterproof sliding connection. The rotating structure (8) has a fixing hole for fixing the water supply pipe (44).
4. The water replenishment device for a glass substrate cleaning machine according to claim 3, characterized in that: The water supply pipe (44) is fixedly installed in the fixing hole, and the vertical height of the spray hole (46) is higher than the bottom surface of the inner side of the liquid storage structure (7).
5. The water replenishment device for a glass substrate cleaning machine according to claim 3, characterized in that: The outer wall of the liquid storage structure (7) is provided with an outlet (9) for discharging cleaning liquid.
6. The water replenishment device for a glass substrate cleaning machine according to claim 1, characterized in that: The drive module (5) uses a pulley drive module.
Citation Information
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