A film-coated article, and a method for preparing and using the same

Abstract

This disclosure relates to a coated article, its preparation method, and its application. The coated article comprises a first film layer, a glass layer, and a second film layer stacked sequentially. The first film layer is an optical thin film layer; the second film layer is a transparent coating layer. The stress of the optical thin film layer and the stress of the transparent coating layer are respectively set as tensile stress or compressive stress. The transparent coating layer of this coated article can offset at least part of the deformation of the glass layer caused by the stress of the optical thin film layer, further improving the strength and impact resistance of the glass. Furthermore, the preparation process is simple, requires no material transfer, and has a high product yield. Simultaneously, it does not interfere with or affect the optical properties of the optical thin film layer, thus having wider applicability.

Description

Technical Field

[0001] This disclosure relates to the field of materials processing technology, specifically to a coated product and its preparation method and application. Background Technology

[0002] Glass, due to its excellent light transmission, mechanical properties, and chemical stability, is widely used in the electronics, construction, and optics industries. To meet further demands for the appearance and performance of glass products, decorative or functional films are often vacuum-deposited or sputtered onto the glass surface. However, these films often contain significant internal stress, causing the glass substrate to warp or twist, greatly reducing the impact resistance of the glass products.

[0003] Currently, a sublayer is mainly placed between the glass and the functional or decorative film layer as a buffer layer, using organic materials as the buffer coating. However, this method suffers from drawbacks such as insufficient adhesion to the glass, poor durability and weather resistance, and susceptibility to cracking and yellowing. Furthermore, the buffer layer is relatively thick, which more or less affects the light transmittance of the glass product. Using small-molecule siloxanes and siloxane-terminated organic materials as buffer layers results in a lower yield due to the buffer layer coating process, and requires two separate pieces of equipment: buffer layer coating equipment and vacuum coating equipment, making the process more complex.

[0004] Therefore, the strength and impact resistance of existing glass products still need to be further improved. Summary of the Invention

[0005] The purpose of this disclosure is to provide a coated product, its preparation method and application. The transparent coating layer of the coated product can offset at least part of the deformation of the glass layer caused by the internal stress of the optical thin film layer, thereby further improving the strength and impact resistance of the glass layer. At the same time, it does not interfere with or affect the optical properties of the optical thin film layer, and has a wider range of adaptability. Moreover, the preparation process is simple, no material transfer is required, and the product yield is high.

[0006] To achieve the above objectives, the first aspect of this disclosure provides a coated article comprising a first film layer, a glass layer, and a second film layer stacked sequentially; the first film layer is an optical thin film layer; the second film layer is a transparent coating layer; the stress of the optical thin film layer and the stress of the transparent coating layer are respectively set to tensile stress or compressive stress.

[0007] Optionally, the first film layer includes at least a plurality of stacked optical thin film sublayers;

[0008] Each of the aforementioned optical thin film sublayers is independently one of Nb2O5 layer, Al2O3 layer, TiO2 layer, SiO2 layer, NiO layer, Ta2O5 layer, Y2O3 layer, and ZrO2 layer; the first film layer includes at least two types of optical thin film sublayers; the number of the optical thin film sublayers is any integer from 3 to 30;

[0009] The thickness of the first film layer is 50-2000 nm, preferably 100-1500 nm.

[0010] Alternatively, the thickness T2 of the second film layer can be calculated according to the following formula: T2=A×T Nb2O5 +B×T Al2O3 +C×T TiO2 +D×T SiO2 +E×T NiO +F×T Ta2O5 +G×T Y2O3 +H×T ZrO2 ;

[0011] T Nb2O5 T represents the total thickness of all Nb₂O₅ layers. Al2O3 T represents the total thickness of all Al2O3 layers. TiO2 T represents the total thickness of all TiO2 layers. SiO2 T represents the total thickness of all SiO2 layers. NiO T is the total thickness of all NiO layers. Ta2O5 T represents the total thickness of all Ta2O5 layers. Y2O3 T is the total thickness of all Y2O3 layers. ZrO2 The total thickness of all ZrO2 layers;

[0012] A is any value between 0.3 and 0.9, B is any value between 0.1 and 0.6, C is any value between 0.3 and 0.9, D is any value between 0.2 and 0.8, E is any value between 0.1 and 0.5, F is any value between 0.2 and 0.8, G is any value between 0.1 and 0.5, and H is any value between 0.2 and 0.8; preferably, A is 0.67, B is 0.33, C is 0.67, D is 0.5, E is 0.25, F is 0.5, G is 0.25, and H is 0.5.

[0013] Optionally, the thickness ratio of the second film layer to the first film layer is 0.4 to 0.9:1.

[0014] Optionally, the second film layer is a film layer formed by a mixed film material containing three or more compounds selected from SiO2, SiO, YbF3 and LaF3; the refractive index of each compound in the mixed film material is between 1.50 and 1.55.

[0015] Optionally, the second film layer is a film layer formed from a mixture of SiO2, SiO, YbF3 and LaF3.

[0016] Optionally, the second film layer contains 1-15% SiO2, 10-30% SiO, 30-50% YbF3, and 30-50% LaF3 by mass; preferably, the second film layer material contains 5-10% SiO2, 15-25% SiO, 35-45% YbF3, and 30-40% LaF3 by mass.

[0017] Optionally, the glass layer is any one of soda-lime glass, high-alumina glass, fully tempered glass, semi-tempered glass, and heat-strengthened glass.

[0018] A second aspect of this disclosure provides a method for preparing the coated article described in the first aspect of this disclosure, the method comprising depositing a first film layer on a first surface of a glass layer to obtain a first film layer coated on the glass layer; and subsequently depositing a second film layer on a second surface of the glass layer to obtain a coated article;

[0019] Alternatively, the method may include depositing a second film layer on a first surface of the glass layer to obtain a second film layer covering the glass layer; subsequently depositing a first film layer on a second surface of the glass layer to obtain a coated article.

[0020] Optionally, the first film layer and the second film layer are formed by electron beam evaporation.

[0021] This third aspect of the disclosure provides the use of coated articles comprising the first aspect of the disclosure in the housings of electronic devices, automotive glass, architectural glass, or optical instruments.

[0022] Optionally, the electronic device is selected from one or more of smartphones, tablets, smart TVs, smart wearable devices, portable computers, or desktop computers; the optical instrument is selected from one or more of magnifying glasses, microscopes, telescopes, polarizing filters, or industrial cameras.

[0023] Through the above technical solution, this disclosure deposits a transparent coating layer with the same stress characteristics as the optical thin film layer on another surface of the glass layer. The transparent coating layer can offset at least part of the deformation of the glass layer caused by the internal stress of the optical thin film layer, further improving the strength and impact resistance of the glass layer; at the same time, it will not interfere with or affect the optical properties of the optical thin film layer, has a wider range of adaptability, and the preparation process is simple.

[0024] Other features and advantages of this disclosure will be described in detail in the following detailed description section. Attached Figure Description

[0025] The accompanying drawings are provided to further illustrate the present disclosure and form part of the specification. They are used together with the following detailed description to explain the present disclosure, but do not constitute a limitation thereof. In the drawings:

[0026] Figure 1 This is a surface view of the glass covered with the first film layer in Embodiment 1 of this disclosure.

[0027] Figure 2 This is a surface view of the glass covered with the first film layer and the second film layer in Embodiment 1 of this disclosure. Detailed Implementation

[0028] The specific embodiments of this disclosure will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit this disclosure.

[0029] The first aspect of this disclosure provides a coated article comprising a first film layer, a glass layer, and a second film layer stacked sequentially; the first film layer is an optical thin film layer; the second film layer is a transparent coating layer; the stress of the optical thin film layer and the stress of the transparent coating layer are respectively set as tensile stress, or the stress of the optical thin film layer and the stress of the transparent coating layer are respectively set as compressive stress.

[0030] The coated articles provided in this disclosure have a transparent coating layer that can offset at least part of the deformation of the glass layer caused by the internal stress of the optical thin film layer, thereby further improving the strength and impact resistance of the glass layer; at the same time, it does not interfere with or affect the optical properties of the optical thin film layer, and has a wider range of adaptability.

[0031] According to one embodiment of the present disclosure, the first film layer includes a plurality of stacked optical thin film sublayers; in some specific embodiments, the number of optical thin film sublayers is any integer from 3 to 30.

[0032] According to this disclosure, the term "optical thin film" is known in the art and refers to a type of optical medium material that propagates light beams through an interface, such as one or more of high-reflection films, anti-reflection films, light-filtering films, color-filtering films, anti-reflection films, light-concentrating films, diffusion films, and polarizing films. In one specific embodiment, each of the optical thin film sub-layers is composed of a compound; preferably, each of the optical thin film sub-layers constituting the first film layer is independently one of Nb2O5, Al2O3, TiO2, SiO2, NiO, Ta2O5, Y2O3, and ZrO2, more preferably one of Nb2O5, Al2O3, TiO2, SiO2, and NiO; further preferably, the first film layer includes at least two types of optical thin film sub-layers; as is well known to those skilled in the art, each optical thin film sub-layer is formed of a compound, and any two adjacent optical thin film sub-layers have different refractive indices, which will not be elaborated here.

[0033] According to this disclosure, the meaning of transparent coating layer is also known in the art, such as PVD coating layer and / or CVD coating layer, preferably PVD coating layer; this disclosure does not limit the light transmittance of transparent coating layer.

[0034] According to one embodiment of the present disclosure, the second film layer is formed from three or more compounds selected from SiO2, SiO, YbF3 and LaF3.

[0035] In a more preferred embodiment, the second film layer is formed using a mixture of SiO2, SiO, YbF3, and LaF3 as the film material; that is, the second film layer is a single-layer film formed from the mixture. In the above embodiments, it can be ensured that the transparent coating layer has the same stress characteristics as the optical thin film layer, and that the transparent coating layer can better counteract the deformation of the glass layer caused by the stress of the optical thin film layer.

[0036] Further, in the second film layer, the mass fraction of SiO2 is 1-15%, the mass fraction of SiO is 10-30%, the mass fraction of YbF3 is 30-50%, and the mass fraction of LaF3 is 30-50%; more preferably, the mass fraction of SiO2 is 5-10%, the mass fraction of SiO is 15-25%, the mass fraction of YbF3 is 35-45%, and the mass fraction of LaF3 is 30-40%. In the above embodiments, the transparent coating layer can have the same stress characteristics as the optical thin film layer, better offsetting the glass layer deformation caused by the stress of the optical thin film layer, while ensuring better adhesion between the transparent coating layer and the glass layer.

[0037] According to this disclosure, the refractive index of each compound in the mixed film material is between 1.50 and 1.55. In the above embodiments, the transparent coating layer can avoid affecting the optical properties of the optical thin film layer, thus giving the transparent coating layer wider adaptability.

[0038] According to this disclosure, the thickness of the first film layer is 50-2000 nm, preferably 200-1500 nm. In embodiments of this disclosure, the first film layer includes multiple stacked optical thin film sublayers, and the thickness of each optical thin film sublayer is not specifically limited. For example, the thickness of the optical thin film sublayer formed by TiO2 can be 10 nm, 30 nm, or 50 nm.

[0039] According to this disclosure, the thickness T2 of the second film layer is calculated using the following formula: T2=A×T Nb2O5 +B×T Al2O3 +C×T TiO2 +D×T SiO2 +E×T NiO +F×T Ta2O5 +G×T Y2O3 +H×T ZrO2 ;T Nb2O5 For the thickness of all Nb2O5 layers, T Al2O3 For the thickness of all Al2O3 layers, T TiO2 For the thickness of all TiO2 layers, T SiO2 For the thickness of all SiO2 layers, T NiO For the thickness of all NiO layers, T Ta2O5 T represents the total thickness of all Ta2O5 layers. Y2O3 T is the total thickness of all Y2O3 layers. ZrO2 The total thickness of all ZrO2 layers;

[0040] The values ​​of A, B, and H are all arbitrary values ​​between 0.3 and 0.9, preferably between 0.5 and 0.7. The values ​​of B, B, and C are all arbitrary values ​​between 0.1 and 0.6, preferably between 0.2 and 0.4. The values ​​of C, D, E, and H are all arbitrary values ​​between 0.2 and 0.8, preferably between 0.4 and 0.65. The values ​​of A, B, and C are all arbitrary values ​​between 0.1 and 0.5, preferably between 0.2 and 0.35. The values ​​of F, G, and H are all arbitrary values ​​between 0.2 and 0.8, preferably between 0.4 and 0.65. In the above embodiments, it is possible to ensure that the transparent coating layer can better counteract the deformation caused by the stress of the optical thin film layer. It is understandable that when the first film layer does not include any of the following layers: Nb₂O₅, Al₂O₃, TiO₂, SiO₂, NiO, Ta₂O₅, Y₂O₃, and ZrO₂, the corresponding coefficients A, B, C, D, E, F, G, and H can be zero; and T Nb2O5 T Al2O3 T TiO2 T SiO2 T NiO T Ta2O5 T Y2O3 and T ZrO2 The units are the same. At the same time, the thickness of the second film layer may be non-integer when calculating. When designing the thickness, it can be rounded to the nearest integer.

[0041] In a further embodiment, A is 0.67, B is 0.33, C is 0.67, D is 0.5, and E is 0.25. In the above preferred embodiments, it can be ensured that the transparent coating layer can better counteract the deformation of the glass layer caused by the stress of the optical thin film layer.

[0042] According to this disclosure, the thickness ratio of the second film layer to the first film layer is 0.4 to 0.9:1. In a further embodiment, the thickness ratio of the second film layer to the first film layer is 0.5 to 0.8:1. In the above embodiments, it can be ensured that the transparent coating layer has the same stress characteristics as the optical thin film layer, so that the transparent coating layer can better counteract the deformation of the glass layer caused by the stress of the optical thin film layer.

[0043] According to this disclosure, the glass layer is any one of soda-lime glass, high-alumina glass, fully tempered glass, semi-tempered glass, and heat-strengthened glass.

[0044] A second aspect of this disclosure provides a method for preparing the coated article described in the first aspect of this disclosure, wherein the method includes depositing a first film layer on a first surface of a glass layer to obtain a first film layer coated on the glass layer; and subsequently depositing a second film layer on a second surface of the glass layer to obtain a coated article.

[0045] Alternatively, the method includes depositing a second film layer on a first surface of the glass layer to obtain a second film layer covering the glass layer; subsequently, depositing a first film layer on a second surface of the glass layer to obtain a coated article. The method disclosed herein allows the transparent coating layer and the optical thin film layer to be located on opposite sides of the glass layer, without interfering with or affecting the optical properties of the optical thin film layer, thus offering wider applicability.

[0046] According to one embodiment of this disclosure, the first film layer and the second film layer are formed by electron beam evaporation. In the above embodiment, the second film layer is prepared using the same method as the first film layer and is completed using the same equipment. The process is simple, and no material transfer is required during the actual mass production of the product, further improving the yield of glass products.

[0047] There are no particular limitations on the equipment and operating conditions of the electron beam evaporation method. In a further embodiment, the method for preparing the first film layer may include: rotating the crucible to the position of the monolayer film material, and depositing a monolayer film on the pretreated glass layer under the conditions of a vacuum degree of 0.005 to 0.015 Pa, a current of 120 mA to 240 mA, an oxygen flow rate of 0 to 100 sccm, and a deposition temperature of 30 to 150 °C. After the film thickness reaches the designed thickness of the monolayer, the crucible is rotated to continue the deposition of multiple monolayer films until the deposition of the first film layer is completed, thereby obtaining the first film layer covering the glass layer. The method for preparing the second film layer may include: rotating the crucible to the position of the mixed film material, and depositing a film on the pretreated glass layer under the conditions of a vacuum degree of 0.005-0.015 Pa, a current of 120 mA-240 mA, an oxygen flow rate of 0-100 sccm, and a deposition temperature of 30-150°C. After the film thickness reaches the designed thickness of the second film layer, the deposition of the second film layer is completed, resulting in a second film layer covering the glass layer. In a further embodiment, the deposition conditions are preferably: a vacuum degree of 0.007-0.012 Pa, a current of 150 mA-200 mA, an oxygen flow rate of 0-80 sccm, and a deposition temperature of 50-110°C.

[0048] In a further embodiment, the pretreatment includes vacuuming the glass layer. When the vacuum level is below 0.003 Pa, the vacuuming is completed, followed by ion cleaning. The ion source is turned on, and the glass layer surface is ion cleaned under the conditions of argon flow rate of 40-100 sccm, temperature of 30-120℃, and vacuum level of 0.005-0.012 Pa for 5-50 min. More preferably, the argon flow rate is 60-80 sccm, temperature is 50-100℃, vacuum level is 0.006-0.01 Pa, and cleaning time is 15-40 min.

[0049] This third aspect of the disclosure provides the use of the coated articles described in the first aspect of the disclosure in the housings of electronic devices, automotive glass, architectural glass, or optical instruments. The electronic devices may be, for example, smartphones, tablets, smart TVs, smart wearable devices, or portable computers, or desktop computers; the optical instruments may be, for example, magnifying glasses, microscopes, telescopes, polarizing filters, or industrial cameras.

[0050] The present disclosure will be further illustrated by the following examples, but the present disclosure is not limited thereto.

[0051] In the following embodiments of this disclosure, the electron beam coating machine is an instrument of model 2700 from Korea Union Vacuum Corporation; the laser coaxial displacement meter is an instrument of model P015 from Keyence Corporation; and the falling ball impact tester is an instrument of model H018G209 from BYD Corporation.

[0052] Unless otherwise specified, the chemical reagents used in the following examples and comparative examples are commercially available products.

[0053] Example 1

[0054] The glass layer used in this embodiment for surface shape testing is Schott AG D263T glass with dimensions of 70*70*0.21mm; the glass layer used for drop ball testing is high-alumina glass with dimensions of 78*164mm; a first film layer is prepared first: the thickness of the first film layer is 207nm; the transparent coating layer and the optical thin film layer in this embodiment are respectively set to tensile stress.

[0055] S1: Place the original glass sheet on the fixture of the electron beam coating machine and perform vacuuming. When the vacuum level drops below 0.003 Pa, the vacuuming process is complete.

[0056] S2: Turn on the ion source and introduce argon gas to a flow rate of 80 sccm. Perform ion cleaning on the first surface of the original glass substrate under the conditions of vacuum degree of 0.008 Pa and temperature of 70℃. The cleaning time is 30 min. After cleaning, turn off the argon gas.

[0057] S3: Rotate the crucible to the position of the first optical thin film sublayer TiO2 film material, turn on the electron gun power supply, adjust the current to 180mA, slowly increase the oxygen flow rate to 30sccm, and deposit the film under the conditions of deposition temperature of 50℃ and vacuum degree of 0.01Pa until the film thickness reaches the design thickness of 12nm for the first optical thin film sublayer, and the deposition of the first optical thin film sublayer is completed.

[0058] Then, rotate the crucible to the position of the second optical thin film sublayer SiO2 film material, turn on the electron gun power supply, adjust the current to 180mA, slowly increase the oxygen flow rate to 50sccm, and deposit the film under the conditions of deposition temperature of 50℃ and vacuum degree of 0.01Pa until the film thickness reaches the designed thickness of 30nm for the second optical thin film sublayer, thus completing the deposition of the second optical thin film sublayer.

[0059] The crucible was then rotated to the position of the TiO2 film material for the third optical thin film sublayer, and deposition was carried out according to the deposition conditions of the first optical thin film sublayer until the film thickness was measured to reach the designed thickness of 90nm for the third optical thin film sublayer, thus completing the deposition of the third optical thin film layer.

[0060] The crucible was then rotated to the position of the fourth optical thin film sublayer SiO2 film material, and deposition was carried out according to the deposition conditions of the second optical thin film sublayer until the film thickness reached the designed thickness of 50nm for the fourth optical thin film sublayer, thus completing the deposition of the fourth optical thin film sublayer.

[0061] The crucible was then rotated to the position of the TiO2 film material for the fifth optical thin film sublayer, and deposition was carried out under the same conditions as the first optical thin film sublayer until the film thickness reached the designed thickness of 15nm for the fifth optical thin film sublayer, thus completing the deposition of the fifth optical thin film sublayer.

[0062] The crucible was then rotated to the position of the SiO2 film material for the sixth optical thin film sublayer, and deposition was carried out according to the deposition conditions of the second optical thin film sublayer until the film thickness reached the designed thickness of 10nm for the sixth optical thin film sublayer, thus completing the deposition of the sixth optical thin film sublayer.

[0063] S4: Turn off the electron gun, stop the gas supply, stop the rotating frame, close the gas path, seal the working chamber, and remove the glass layer covered with the first film after the temperature drops below 35°C.

[0064] Preparation of the second film layer: The film material of the second film layer is: by mass fraction, 10% SiO2, 20% SiO, 40% YbF3 and 30% LaF3; the refractive index of SiO2 is 1.45, the refractive index of SiO is 1.55, the refractive index of YbF3 is 1.51, the refractive index of LaF3 is 1.58, and the thickness of the second film layer T2 = 0.67×(12+90+15)+0.5×(30+50+10) = 123nm;

[0065] S1: Place the original glass sheet on the fixture of the electron beam coating machine and perform vacuuming. When the vacuum level drops below 0.003 Pa, the vacuuming process is complete.

[0066] S2: Turn on the ion source and introduce argon gas to a flow rate of 80 sccm. Perform ion cleaning on the second surface of the original glass substrate under the conditions of vacuum degree of 0.008 Pa and temperature of 70℃. The cleaning time is 30 min. After cleaning, turn off the argon gas.

[0067] S3: Rotate the crucible to the position of the second film layer mixing material, turn on the electron gun power supply, adjust the current to 180mA, slowly increase the oxygen flow rate to 30sccm, and deposit the film under the conditions of deposition temperature of 50℃ and vacuum degree of 0.01Pa until the film thickness detection reaches the design thickness of 123nm of the second film layer, and the deposition of the second film layer is completed.

[0068] S4: Turn off the electron gun, stop the gas supply, stop the rotating frame, close the gas path, seal the working chamber, and remove the glass layer covered with the first and second films after the temperature drops below 35°C.

[0069] Example 2

[0070] The preparation method of this embodiment is the same as that of Example 1, except that the thickness design of the second film layer is different, T2=0.4×(12+90+15)+0.6×(30+50+10)=100.8nm.

[0071] Example 3

[0072] The preparation method of this embodiment is the same as that of Example 1, except that the thickness of the second film layer is not designed according to the formula, T2=12+90+15+30+50+10=207nm.

[0073] Example 4

[0074] The preparation method of this embodiment is the same as that of Example 1, except that the film material of the second film layer is a mixed film material formed by a mixture of 20% SiO2, 5% SiO, 55% YbF3 and 20% LaF3 by mass fraction.

[0075] Example 5

[0076] The preparation method of this embodiment is the same as that of Example 1, except that the film material of the second film layer is a mixed film material formed by a mixture of 20% SiO2 and 80% LaF3 by mass fraction.

[0077] Comparative Example 1

[0078] The glass layer used in this comparative example is the same as that in Example 1. A buffer layer of approximately 1 μm is first deposited on the first surface of the glass layer using a precision drop-coating device. The buffer layer, by weight, consists of 50% polyester-modified silicone resin, 20% ethyl acetate, 28.4% 3-methoxy-3-methyl-1-butanol, 1% methyl nylonate, 0.1% acrylic leveling agent, and 0.5% acrylic adhesion promoter. Then, an optical thin film layer is deposited on the buffer layer, which is the same as the first film layer deposited in Example 1. The polyester-modified silicone resin in this comparative example is prepared by adding 30 wt% polyester resin, 15 wt% KH560 silane coupling agent, 50 wt% silicone resin, and 5 wt% benzenesulfonic acid to a reactor; heating at 100°C for 1 hour, then raising the temperature to 130°C and heating for another hour; finally cooling to room temperature and adding organic solvent to adjust the content to 60 wt%. Polyester resin is obtained by mixing 40wt% diacid and 60wt% diol, heating to 100℃, and carrying out a condensation reaction under argon protection.

[0079] Comparative Example 2

[0080] The preparation method is the same as in Example 1, except that the second film is a mixture of Si3N4, M1, and H4; the refractive index of Si3N4 is 2.06, and M1 is Al2O3 and Pr6O. 11 The mixture is composed of M1 and H4, which has a refractive index of 1.71 and H4 is a mixture of La2O3 and TiO2 with a refractive index of 2.1. In this embodiment, the optical thin film layer is set to tensile stress and the transparent coating layer is set to compressive stress.

[0081] Test Example 1

[0082] The deformation of glass layers coated with a first film, glass layers coated with a first film and a second film, and glass layers coated with a buffer layer prepared in Examples 1-5 and Comparative Example 2, respectively, was measured using a laser coaxial displacement meter.

[0083] Take 14*14 points on the glass surface and measure the longitudinal height of the glass. Plot the data to obtain the profile of the glass curvature (e.g., ...). Figure 1 This is a surface view of the glass coated with the first film layer in Example 1. Figure 2(This is a surface view of the glass covered with the first and second film layers in Example 1). The difference between the highest and lowest points of the contour is recorded as the deformation bending value. In Examples 1-5 and Comparative Example 2, Z1 is the deformation bending value of the glass layer covered with the first film layer, and Z2 is the deformation bending value of the glass layer covered with the first and second film layers. In Comparative Example 1, Z1 is the deformation bending value when the optical thin film layer is directly deposited on the glass layer without a buffer layer, and Z2 is the deformation bending value after the buffer layer is added. The test results are shown in Table 1.

[0084] Table 1

[0085] Z1 / μm Z2 / μm Example 1 269.4 104.2 Example 2 257.3 113.6 Example 3 264.9 227.3 Example 4 271.6 162.8 Example 5 267.2 201.7 Comparative Example 1 261.3 143.6 Comparative Example 2 265.8 321.5

[0086] According to Table 1, a comparison between the examples and the comparative examples shows that the coated product prepared in this disclosure greatly alleviates the curvature of the glass layer, and the second film layer partially offsets the deformation of the glass layer caused by the stress of the first film layer, further improving the strength of the glass layer.

[0087] Test Example 2

[0088] Impact resistance tests were conducted on the coated products and glass layers prepared in Examples 1-5 and Comparative Examples 1-2. The first film layer of the glass layer was placed face down and fixed to a falling ball test fixture. A steel ball with a mass of 32g ± 1g and a diameter of 20mm was used for free fall impact test. Different heights were selected for testing the glass surface. Four fixed points were tested on each glass surface. The test height was increased sequentially. Each point was hit 5 times. The test ended when the glass broke. The height of the steel ball was recorded. After 5 tests, the average height of the steel ball crack was taken. In Examples 1-5 and Comparative Example 2, H1 is the falling ball impact height of the glass layer with the first film layer, and H2 is the falling ball impact height of the glass layer with the first film layer and the second film layer. In Comparative Example 1, H1 is the falling ball impact height when the optical thin film layer is directly deposited on the glass layer without a buffer layer, and H2 is the falling ball impact height value after the buffer layer is deposited. The test results are shown in Table 1.

[0089] Table 2

[0090] H1 / cm H2 / cm Example 1 31 53 Example 2 31 51 Example 3 31 34 Example 4 31 41 Example 5 31 37 Comparative Example 1 31 43 Comparative Example 2 31 27

[0091] According to Table 2, a comparison between the examples and the comparative examples shows that the coated products prepared in this disclosure further improve the strength and impact resistance of the glass layer.

[0092] Based on the deformation and bending results and impact resistance results of each glass layer, it can be seen that the coated product of this disclosure can better improve the strength and impact resistance of the glass layer. The second film layer can partially offset the deformation of the glass layer caused by the stress of the first film layer. Comparison of Example 3 with Example 1, Example 4 with Example 1, Example 5 with Example 1, and Comparative Example 2 with Example 1 shows that, under the preferred film composition, proportion, and thickness calculation formula range of this disclosure, the second film layer has a better effect in offsetting the deformation of the glass layer caused by the stress of the first film layer, further improving the strength and impact resistance of the glass layer.

[0093] As can be seen from the comparison between Example 1 and Comparative Example 1, this disclosure, by depositing a transparent coating layer with the same stress characteristics as the optical thin film layer on the other surface of the glass layer, partially offsets the deformation of the glass layer caused by the stress of the optical thin film layer. Moreover, the deformation offsetting effect of the embodiment of this disclosure is better than that of Comparative Example 1, while not affecting the optical performance of the optical thin film layer, further improving the strength and impact resistance of the glass layer. On the other hand, the preparation process is simple, it is not easy to introduce impurities, and no material transfer process is required in actual mass production, resulting in a high product yield.

[0094] The preferred embodiments of this disclosure have been described in detail above with reference to the accompanying drawings. However, this disclosure is not limited to the specific details of the above embodiments. Within the scope of the technical concept of this disclosure, various simple modifications can be made to the technical solutions of this disclosure, and these simple modifications all fall within the protection scope of this disclosure.

[0095] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, this disclosure will not describe the various possible combinations separately.

[0096] Furthermore, various different embodiments of this disclosure can be combined in any way, as long as they do not violate the spirit of this disclosure, they should also be regarded as the content disclosed in this disclosure.

Claims

1. A coated product, characterized in that, It includes a first film layer, a glass layer, and a second film layer stacked sequentially; the first film layer is an optical thin film layer; the second film layer is a transparent coating layer; the stress of the optical thin film layer and the stress of the transparent coating layer are respectively set as tensile stress or compressive stress. The second film layer is formed from a mixed film material containing three or more compounds selected from SiO2, SiO, YbF3 and LaF3.

2. The coated article according to claim 1, wherein, The first film layer includes multiple stacked optical thin film sublayers; Each of the aforementioned optical thin film sublayers is independently one of Nb2O5 layer, Al2O3 layer, TiO2 layer, SiO2 layer, NiO layer, Ta2O5 layer, Y2O3 layer, and ZrO2 layer; the first film layer includes at least two types of optical thin film sublayers; the number of the optical thin film sublayers is any integer from 3 to 30; The thickness of the first film layer is 50-2000 nm.

3. The coated article according to claim 2, wherein, The thickness of the first film layer is 100-1500 nm.

4. The coated article according to claim 2, wherein, The thickness T2 of the second film layer is calculated using the following formula: T2 = A × T Nb2O5 +B×T Al2O3 +C×T TiO2 +D×T SiO2 +E×T NiO +F×T Ta2O5 +G×T Y2O3 +H×T ZrO2 ; T Nb2O5 T represents the total thickness of all Nb₂O₅ layers. Al2O3 T represents the total thickness of all Al2O3 layers. TiO2 T represents the total thickness of all TiO2 layers. SiO2 T represents the total thickness of all SiO2 layers. NiO T is the total thickness of all NiO layers. Ta2O5 T represents the total thickness of all Ta2O5 layers. Y2O3 T is the total thickness of all Y2O3 layers. ZrO2 The total thickness of all ZrO2 layers; A is any value between 0.3 and 0.9, B is any value between 0.1 and 0.6, C is any value between 0.3 and 0.9, D is any value between 0.2 and 0.8, E is any value between 0.1 and 0.5; F is any value between 0.2 and 0.8, G is any value between 0.1 and 0.5, and H is any value between 0.2 and 0.

8.

5. The coated article according to claim 4, wherein, A is 0.67, B is 0.33, C is 0.67, D is 0.5, E is 0.25, F is 0.5, G is 0.25, and H is 0.

5.

6. The coated article according to claim 1, wherein, The thickness ratio of the second film layer to the first film layer is 0.4~0.9:

1.

7. The coated article according to claim 1, wherein, The second film is a film formed by a mixture of SiO2, SiO, YbF3 and LaF3.

8. The coated article according to claim 7, wherein, The second film layer contains 1-15% SiO2, 10-30% SiO, 30-50% YbF3, and 30-50% LaF3 by mass.

9. The coated article according to claim 8, wherein, The second film layer contains 5-10% SiO2, 15-25% SiO, 35-45% YbF3, and 30-40% LaF3 by mass.

10. The coated article according to claim 1, wherein, The glass layer is any one of soda-lime glass, high-alumina glass, fully tempered glass, semi-tempered glass, and heat-strengthened glass.

11. A method for preparing any one of the coated articles according to claims 1 to 10, wherein, The method includes depositing a first film layer on a first surface of a glass layer to obtain a first film layer covering the glass layer; and then depositing a second film layer on a second surface of the glass layer to obtain a coated article. Alternatively, the method includes depositing a second film layer on the first surface of the glass layer to obtain a second film layer covering the glass layer; Subsequently, a first film layer is deposited on the second surface of the glass layer to obtain a coated product.

12. The method according to claim 11, wherein, The first film layer and the second film layer are formed by electron beam evaporation.

13. The use of the coated article according to any one of claims 1 to 10 in the housing of electronic devices, automotive glass, architectural glass or optical instruments.

14. In the application according to claim 13, the electronic device is selected from one or more of a smartphone, tablet computer, smart TV, smart wearable device, portable computer or desktop computer; the optical instrument is selected from one or more of a magnifying glass, microscope, telescope, polarizing filter or industrial camera.

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