Low-reflection anti-blue-light resin lens and preparation method thereof

Abstract

The application provides a low-reflection blue-light-proof resin lens and a preparation method thereof, which comprises a resin lens substrate, a hardening layer, a low-reflection blue-light-proof film layer and a waterproof layer; the substrate, the hardening layer and the low-reflection blue-light-proof layer are sequentially arranged, the hardening layer is located on the surface of the resin lens substrate, and the low-reflection layer is located on the surface of the hardening layer; and the low-reflection layer is composed of high-refractive-index material titanium dioxide and low-refractive-index material silicon-aluminum composite oxide and low-refractive-index magnesium-aluminum fluoride. Through adjustment of the structure of the low-reflection blue-light-proof film layer and appropriate process, the low-reflection lens with extremely low reflectivity (less than 0.1%) is obtained, and the resin lens has good high-temperature resistance and environmental resistance, and has good market application prospect.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of resin lens preparation, in particular to a low-reflection blue light-proof resin lens and a preparation method thereof. BACKGROUND

[0002] In recent years, optical resin lenses are in increasing demand in the domestic and foreign eyewear market. Compared with glass lenses, resin lenses have the advantages of light weight, good dyeing performance, and easy processing. Optical resin lenses with medium and high refractive indices are favored by users due to their unique advantages such as high light transmittance, ultraviolet protection, and ultra-thinness.

[0003] Generally speaking, in the lens industry, a lens with a refractive index of 1.60 or higher is considered to have a high refractive index, a refractive index of 1.56 is considered to have a medium refractive index, and a refractive index of less than 1.56 is considered to have a low refractive index. To meet the optical performance requirements of resin lenses, a film is usually coated on the surface of the resin lens to reduce light reflection and enhance light transmission, i.e., an optical anti-reflection film. In modern electronic industries and motor vehicle driving, the impact of residual reflected light is becoming increasingly sensitive, and it is urgently necessary to significantly reduce the anti-reflection level to meet such higher demands.

[0004] Blue light is divided into harmful blue light and beneficial blue light. Modern people cannot live without various electronic products, and the opportunities to contact blue light have increased dramatically. Mobile phone screens, LED lights, and computer screens all produce a large amount of blue light, which can harm people's eyes and skin, stimulate brown pigments, cause yellow spots and freckles on the skin, deepen the degree of myopia, and cause visual fatigue. Meanwhile, it is not conducive to normal sleep. Stronger blue light with shorter wavelengths can potentially harm the human body, while longer-wavelength blue light can make the lens more aesthetically pleasing, improve the clarity of the lens, and enhance the excitement of people at work. The national standard for blue light protection also treats harmful blue light and beneficial blue light differently. Blue light protection has become a common standard in the resin lens industry. SUMMARY

[0005] To meet the new consumer demand, the present application aims to provide an ultra-low reflection blue light-proof resin lens and a preparation method thereof, which realizes ultra-low reflection while meeting the blue light-proof standard, and improves the high-temperature resistance and durability of the resin lens by reducing stress. The average reflection level of the ultra-low reflection can be below 0.1%.

[0006] The present application is achieved by the following technical solutions:

[0007] The first aspect of the present application provides a low-reflection blue light-proof resin lens, comprising: a resin lens substrate, a hardening layer, and a low-reflection blue light-proof film layer; wherein the resin lens substrate, the hardening layer, and the ultra-low reflection blue light-proof film layer are arranged in sequence, the hardening layer is located on the surface of the resin lens substrate, and the ultra-low reflection blue light-proof film layer is located on the surface of the hardening layer.

[0008] Further, the super-low reflection anti-blue light resin lens further comprises a waterproof layer, which is located on the surface of the super-low reflection anti-blue light film layer;

[0009] Further, the UV cutoff wavelength of the resin lens substrate is 405-407 nm;

[0010] Further, the main component of the hardening layer is organic silicon;

[0011] Further, the low reflection anti-blue light layer comprises a silicon-aluminum composite oxide layer, a weakly absorbing titanium dioxide layer, a tin-doped indium oxide (ITO) layer, a magnesium-aluminum composite fluoride layer, and a silicon dioxide layer; further, the super-low reflection anti-blue light layer comprises three layers of silicon-aluminum composite oxide layer, three layers of weakly absorbing titanium dioxide layer, one layer of tin-doped indium oxide (ITO) layer, one layer of magnesium-aluminum composite fluoride layer, and one layer of silicon dioxide layer;

[0012] Further, the silicon-aluminum composite oxide layer is composed of SiO2 and Al2O3 composite material, and the mole fraction of SiO2 in the composite material is 70%-95%; further preferably, the mole fraction of SiO2 in the composite material is 92%;

[0013] Further, the weakly absorbing titanium dioxide layer is obtained by using Ti3O5 as raw material through evaporation process;

[0014] Further, the aluminum-magnesium composite fluoride layer is composed of MgF2 and AlF3 composite material, and the mole fraction of MgF2 in the composite material is 80%-95%; further preferably, the mole fraction of MgF2 in the composite material is 92%;

[0015] Further, the thickness of the hardening layer is 1-5 μm;

[0016] Further, the thickness of the super-low reflection anti-blue light film layer is 200-600 nm;

[0017] Further, the thickness of the waterproof layer is 4-20 nm;

[0018] Further, the average reflectivity of the super-low reflection anti-blue light resin lens is ≤0.1%;

[0019] Further, the peak reflectivity of the super-low reflection anti-blue light resin lens in the visible light band of 400-700 nm is ≤1.5%;

[0020] Further, the reflection light color coordinate H value of the super-low reflection anti-blue light resin lens is 285-305, and the C value is 9-20;

[0021] The second aspect of the application provides a preparation method of the super-low-reflection anti-blue-light resin high-temperature-resistant lens, comprising the following steps:

[0022] S1, preparing a hardening layer: forming a hardening layer on the surface of the resin lens substrate to obtain a resin lens containing the hardening layer;

[0023] S2, preparing a super-low-reflection anti-blue-light film layer: forming the super-low-reflection anti-blue-light film layer on the surface of the resin lens obtained in S1 to obtain a resin lens containing the super-low-reflection anti-blue-light film layer, specifically comprising:

[0024] S21, sequentially and alternately forming a silicon-aluminum composite oxide layer and a weak-absorption titanium dioxide layer on the surface of the resin lens obtained in step S1 to obtain a resin lens comprising three layers of the silicon-aluminum composite oxide layer and three layers of the weak-absorption titanium dioxide layer;

[0025] S22, forming a resin lens containing an ITO layer on the surface of the resin lens obtained in step S21;

[0026] S23, forming a resin lens containing a magnesium-aluminum composite fluoride layer on the surface of the resin lens obtained in step S22;

[0027] S24, forming a resin lens containing a silicon dioxide layer on the surface of the resin lens obtained in step S23;

[0028] S3, preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens containing the low-reflection anti-blue-light film layer obtained in step S2.

[0029] Advantages

[0030] 1. Obtaining a super-low-reflection effect: the film layer material adopts TiO2 material, which makes the bandwidth of the anti-reflection wider and the reflectivity lower. The magnesium-aluminum composite fluoride (refractive index at 500 nm is 1.37) is lower than the refractive index of SiO2 or silicon-aluminum composite oxide (refractive index at 500 nm is 1.49), which can significantly reduce the reflectivity when used in the back of the film system. And through the optimization design, the reflectivity is further reduced to below 0.1%, and the peak reflectivity of the main waveband of visible light is effectively controlled, the light transmission of the resin lens is improved, the interference of reflected light on the human eye is significantly reduced, and the super-low-reflection effect is obtained;

[0031] 2. Significantly Improved High-Temperature Resistance and Durability of Lenses: First, the use of magnesium-aluminum composite fluoride avoids the problem of easy cracking of magnesium fluoride films deposited at low temperatures, thus significantly improving the film's strength. Additionally, a certain proportion of aluminum fluoride content effectively prevents aluminum fluoride from deliquescing, thereby improving the film's environmental resistance. Second, the silicon-aluminum composite oxide layer effectively avoids the formation of long columnar structures by SiO2, leading to high stress in the film, maintaining the glassy structure of the film and improving its high-temperature resistance. Third, the use of weakly absorbing titanium dioxide effectively reduces the tendency of TiO2 films to crystallize, thus avoiding the defect of easy cracking of TiO2 films on resin lenses after crystallization. This keeps the film in an amorphous state, preventing the film from cracking due to crystallization, thereby improving the high-temperature and high-humidity resistance of the film and lens, and ultimately enhancing the product's durability.

[0032] 3. Improved Product Repeatability and Mass Production Capability: The weakly absorbing TiO2 film layer, prepared using specialized process parameters, maintains its oxidation rate level under certain conditions, thereby reducing process difficulty and effectively improving product repeatability and mass production capability. It also controls the blue light absorption rate of the weakly absorbing titanium dioxide layer to meet national blue light protection standards. Adding a SiO2 layer to the magnesium-aluminum composite fluoride effectively ensures the subsequent ultra-waterproof coating and durable waterproof effect. The film system exhibits a reflectance peak of 1–1.5% under blue-violet light, which improves film color consistency and facilitates mass production and market entry. Attached Figure Description

[0033] Figure 1 This is a schematic diagram of the layers of a low-reflection anti-blue light resin lens according to the present invention; the layers include: resin lens substrate 1, hardening layer 2, low-reflection anti-blue light film layer 3, and waterproof layer 4; wherein, the low-reflection anti-blue light film layer 3 comprises: silicon-aluminum composite oxide layer 3-1, weakly absorbing titanium dioxide layer 3-2, silicon-aluminum composite oxide layer 3-3, weakly absorbing titanium dioxide layer 3-4, silicon-aluminum composite oxide layer 3-5, weakly absorbing titanium dioxide layer 3-6, ITO layer 3-7, magnesium-aluminum composite fluoride layer 3-8, and silicon dioxide layer 3-9. Detailed Implementation

[0034] In one specific embodiment, the low-reflection blue light blocking film layer comprises three silicon-aluminum composite oxide layers, three weakly absorbing titanium dioxide layers, one tin-doped indium oxide (ITO) layer, one magnesium-aluminum composite fluoride layer, and one silicon dioxide layer. In the low-reflection blue light blocking film layer, the three silicon-aluminum composite oxide layers and the three weakly absorbing titanium dioxide layers are arranged alternately in sequence. The first silicon-aluminum composite oxide layer is located on the surface of the hardening layer, the seventh ITO layer is located on the surface of the sixth weakly absorbing titanium dioxide layer, the eighth magnesium-aluminum composite fluoride layer is located on the surface of the seventh ITO layer, and the ninth silicon dioxide layer is located on the surface of the eighth magnesium-aluminum composite fluoride layer.

[0035] Furthermore, in one specific embodiment, the thickness of each layer of the low-reflection blue light blocking film is:

[0036] The thickness of the first silicon-aluminum composite oxide layer is 20-200 nm, preferably 160-180 nm;

[0037] The thickness of the second weakly absorbing titanium dioxide layer is 10–40 nm, preferably 12–25 nm;

[0038] The thickness of the third silicon-aluminum composite oxide layer is 15–60 nm, preferably 20–30 nm;

[0039] The thickness of the fourth weakly absorbing titanium dioxide layer is 40–100 nm, preferably 70–95 nm;

[0040] The thickness of the fifth silicon-aluminum composite oxide layer is 5–40 nm, preferably 5–25 nm;

[0041] The thickness of the sixth weakly absorbing titanium dioxide layer is 8–40 nm, preferably 8–25 nm;

[0042] The thickness of the seventh ITO layer is 2–10 nm, preferably 5 nm;

[0043] The thickness of the eighth magnesium-aluminum composite fluoride layer is 60-100 nm, preferably 70-90 nm;

[0044] The thickness of the ninth silicon dioxide layer is 10–25 nm, preferably 10–15 nm;

[0045] In one specific embodiment, the step of preparing the hardening layer in S1 includes: immersing the ultrasonically cleaned resin lens substrate in an aqueous solution of hardening liquid with a mass percentage of 25-30%, at an immersion temperature of 10-20°C, immersing for 5 seconds, and then pulling out the solution at a speed of 1.0-3.0 mm / s. After drying at 70-90°C for 3 hours, the substrate is taken out and sent to a drying oven for drying and curing at a curing temperature of 100-150°C for 120-180 minutes, thereby obtaining a resin lens containing a hardening layer.

[0046] In one specific embodiment, the process of preparing the low-reflection blue light blocking film layer in step S2 includes:

[0047] In a vacuum coating machine, using a vacuum coating process, solid film materials such as silicon-aluminum composite oxide, titanium pentoxide, magnesium-aluminum composite oxide, silicon dioxide, and ITO are evaporated and then deposited on the surface of the resin lens obtained in step S1 through gas phase transport to form an anti-reflection layer. The specific steps include:

[0048] S21: A silicon-aluminum composite oxide layer and a weakly absorbing titanium dioxide layer are alternately formed on the surface of the resin lens obtained in step S1, thereby obtaining a resin lens including a silicon-aluminum composite oxide layer and a weakly absorbing titanium dioxide layer, specifically including:

[0049] S211: On the surface of the resin lens obtained in S1, the background vacuum degree is ≤3×10⁻⁶. -3 Under conditions of Pa, and a coating chamber temperature of 50–70°C, with ion source-assisted processing, the silicon-aluminum composite oxide is heated by a high-energy electron beam at a rate of [missing information]. The evaporated silicon-aluminum composite oxide is deposited in nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer. The ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 90-140V, anode current: 2.5-5A, auxiliary gas: O2, flow rate: 10-30sccm; preferably, the ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 110V, anode current: 3A, auxiliary gas: O2, flow rate: 15sccm.

[0050] S212: The background vacuum level on the surface of the resin lens obtained in S211 is ≤3×10⁻⁶. -3 Under conditions where Pa, the temperature inside the coating chamber is 50–70°C, and an ion source-assisted process is used, the titanium pentoxide is heated by a high-energy electron beam at a rate of [missing information]. Evaporated titanium pentoxide is deposited in nanoscale molecular form to obtain a resin lens containing a second weakly absorbing titanium dioxide layer. The ion source-assisted deposition process parameters are as follows: the ion source is a Hall source, the anode voltage is 110-140V, the anode current is 3-4A, and the auxiliary gases are Ar and O2, with flow rates of 5-7 sccm for argon and 7-12 sccm for oxygen, respectively. Preferably, the ion source-assisted deposition process parameters are as follows: the ion source is a Hall source, the anode voltage is 125V, the anode current is 3.5A, the flow rate of argon for the auxiliary gases is 6 sccm, and the flow rate of oxygen for the auxiliary gases is 9 sccm.

[0051] S213: Repeat steps S211 and S212 to alternately form the third silicon-aluminum composite oxide layer, the fourth weakly absorbing titanium dioxide layer, the fifth silicon-aluminum composite oxide layer, and the sixth weakly absorbing titanium dioxide layer, respectively, thus forming a resin lens including the third silicon-aluminum composite oxide layer, the fourth weakly absorbing titanium dioxide layer, the fifth silicon-aluminum composite oxide layer, and the sixth weakly absorbing titanium dioxide layer.

[0052] S22: On the surface of the resin lens obtained in S21, the background vacuum degree is ≤3×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 50–70°C, and ion source-assisted processing, ITO is heated by a high-energy electron beam at a rate of [missing information]. The evaporated ITO is deposited in nanoscale molecular form to obtain a resin lens containing an ITO layer. The ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 90-140V, anode current: 2.5-5A, auxiliary gas: O2, flow rate: 10-30sccm; preferably, the ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 110V, anode current: 3A, auxiliary gas: O2, flow rate: 15sccm.

[0053] S23: The background vacuum level on the surface of the resin lens obtained in S22 is ≤1×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 50–70°C, and ion source-assisted processing, a high-energy electron beam is used to heat magnesium-aluminum composite fluorides at a rate of [missing information]. The evaporated magnesium-aluminum composite fluoride is deposited in nanoscale molecular form to obtain a resin lens containing a magnesium-aluminum composite fluoride layer. The ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 110-150V, anode current: 3-5A, argon as the auxiliary gas, and flow rate: 5-15sccm. Preferably, the ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 130V, anode current: 4A, argon as the auxiliary gas, and flow rate: 10sccm.

[0054] S24: On the surface of the resin lens obtained in S23, the background vacuum degree is ≤2×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 50–70°C, and ion source-assisted processing, silicon dioxide is heated by a high-energy electron beam at a rate of [missing information]. Evaporated silica is deposited in nanoscale molecular form to obtain a resin lens containing a silica layer. The ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 100-130V, anode current: 2-4A, argon as the auxiliary gas, and flow rate: 5-15sccm. Preferably, the ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 110V, anode current: 3A, argon as the auxiliary gas, and flow rate: 8sccm.

[0055] In one specific embodiment, step S3: forming a waterproof layer on the surface of the resin lens obtained in S2 includes the following steps: on the lens surface obtained in step S24, a vacuum coating process is further applied, with a base vacuum degree ≤2×10 - 3 Under conditions where Pa and the temperature inside the coating chamber is 50–70°C, a high-energy electron beam is used to heat the material at a rate of [missing information]. The evaporated fluorinated waterproof material (preferably containing C) 12 F 27N-type waterproof material is deposited in nanoscale molecular form to obtain resin lenses with a waterproof layer.

[0056] In one specific embodiment, the silicon-aluminum composite oxide was developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd. The silicon-aluminum composite oxide layer is composed of SiO2 and Al2O3 composite materials, wherein SiO2 accounts for 70% to 95% of the molar fraction of the composite material. For specific models, please refer to the examples and comparative examples.

[0057] In one specific embodiment, the raw material for the weakly absorbing titanium dioxide layer, titanium pentoxide, was developed and produced by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., and its molecular formula (oxygen-to-titanium ratio) is Ti3O5.

[0058] In one specific embodiment, the magnesium-aluminum composite fluoride was developed and produced by Changzhou Zhanchi Optoelectronic Technology Co., Ltd. The magnesium-aluminum composite fluoride is composed of MgF2 and AlF3 composite materials, wherein MgF2 accounts for 80% to 95% of the molar fraction of the composite material. For specific models, please refer to the examples and comparative examples.

[0059] The resin lens substrate selected in this invention is a conventional lens in the art. The content of its UV powder is adjusted so that the UV cutoff wavelength is 405-407nm. The definition of UV cutoff wavelength refers to 5.4.2.4.4 of the optical resin lens standard QB / T 2506-2017.

[0060] For example, in one specific embodiment, a resin lens substrate of model MR-8 (refractive index 1.60) or MR-7 (refractive index 1.67) with a UV cutoff wavelength of 405-407nm is purchased from Mitsui Chemicals, Ltd., Japan, hereinafter referred to as "MR-8-UV405" or "MR-7-UV405"; or in another specific embodiment, a resin lens substrate with a refractive index of 1.56 and a UV cutoff wavelength of 405-407nm developed and produced by Jiangsu Vision New Materials Co., Ltd. is purchased, hereinafter referred to as "SK1.56-UV405". For the specific preparation method of the resin lens substrate, please refer to the patent of Vision Optics Co., Ltd.: CN201410245692.6.

[0061] This invention can use conventional hardening liquids. For example, in one specific embodiment, it selects Ito Optical Industry Co., Ltd.'s model Z117 or Z118 (hereinafter referred to as "Z117" or "Z118") hardening liquid; or in one specific embodiment, it selects Duen Optics (Changshu) Co., Ltd.'s model VH56 (hereinafter referred to as "VH56") hardening liquid. Using the above-mentioned hardening liquids to prepare the lens of this invention greatly improves the dense bonding between the film layers.

[0062] (I) Implementation Examples

[0063] Example 1

[0064] A low-reflection blue light blocking resin lens, comprising, in sequence: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117) / 2.6~3μm; and an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (where the molar percentage of SiO2 and Al2O3 is 92% SiO2:8% Al2O3; developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., material model SA56) / 174.3nm, a weakly absorbing titanium dioxide layer (obtained by evaporation of Ti3O5) 3-2 / 15.68nm, and a silicon-aluminum composite oxide layer 3-3 / 23.64nm (material... The following layers are described: 3-1 (material same as 3-1), 3-4 (material same as 3-2) / 84.82nm, 3-5 (material same as 3-1), 3-6 (material same as 3-2) / 13.87nm, 3-7 (ITO layer) / 5nm; 3-8 (MgF2 and AlF3 molar percentage: 92% MgF2: 8% AlF3; developed and produced by Changzhou Zhanchi Optoelectronic Technology Co., Ltd.) / 73.74nm; 3-9 (silicon oxide layer, material is SiO2) / 12nm, 4 (waterproof layer containing C...). 12 F 27 N waterproof material (10nm);

[0065] The method for preparing the resin lens includes the following steps:

[0066] S1: Fabrication of the hardening layer: The ultrasonically cleaned resin lens substrate is immersed in a 27% (by weight) hardening solution (model Z117) at a temperature of 15°C for 5 seconds, and then pulled out of the solution at a speed of 2.0 mm / s. After drying at 80°C for 3 hours, the substrate is removed and sent to a drying oven for drying and curing at a temperature of 120°C for 150 minutes, thus obtaining a resin lens with a hardening layer.

[0067] S2 Preparation of Low-Reflection Blue Light Protection Layer: In a vacuum coating machine, using a vacuum coating process, the solid film material is evaporated and then deposited onto the surface of the resin lens obtained in step S1 through gas phase transport to form a thin film, thus forming a low-reflection blue light protection layer. This specifically includes the following steps:

[0068] S21: Includes the following steps:

[0069] S211: On the surface of the resin lens obtained in S1, the background vacuum degree is ≤3×10⁻⁶. -3Under conditions of Pa, a coating chamber temperature of 60℃, and an ion source-assisted process, a high-energy electron beam is used to heat the silicon-aluminum composite oxide at a rate of [missing information]. The evaporated silicon-aluminum composite oxide was deposited in nanoscale molecular form to obtain a resin lens containing a first layer of silicon-aluminum composite oxide. The ion source-assisted deposition process parameters were: Hall source as ion source, anode voltage: 110V, anode current: 3A, auxiliary gas as O2, and flow rate of 15sccm.

[0070] S212: The background vacuum level on the surface of the resin lens obtained in S211 is ≤3×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 60℃, and ion source-assisted processing, titanium pentoxide is heated by a high-energy electron beam at a rate of [missing information]. Evaporated titanium pentoxide is deposited in nanoscale molecular form, and part of it is further oxidized during the evaporation process to obtain a resin lens containing a second weakly absorbing titanium dioxide layer; the ion source-assisted deposition process parameters are: ion source is a Hall source, anode voltage: 125V, anode current: 3.5A, argon flow rate of auxiliary gas is 6sccm, and oxygen flow rate is 9sccm.

[0071] S213: Repeat steps S211 and S212 to alternately form the third layer of silicon-aluminum composite oxide, the fourth layer of weakly absorbing titanium dioxide, the fifth layer of silicon-aluminum composite oxide, and the sixth layer of weakly absorbing titanium dioxide, thus forming a resin lens including the third layer of silicon-aluminum composite oxide, the fourth layer of weakly absorbing titanium dioxide, the fifth layer of silicon-aluminum composite oxide, and the sixth layer of weakly absorbing titanium dioxide.

[0072] S22: On the surface of the resin lens obtained in S21, the background vacuum degree is ≤3×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 60°C, and an ion source-assisted process, ITO is heated by a high-energy electron beam at a rate of [missing information]. The evaporated ITO was deposited in nanoscale molecular form to obtain a resin lens containing a seventh ITO layer; the ion source-assisted deposition process parameters were: Hall source as ion source, anode voltage: 110V, anode current: 3A, auxiliary gas as O2, and flow rate of 15sccm.

[0073] S23: The background vacuum level on the surface of the resin lens obtained in S22 is ≤1×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 50–70°C, and ion source-assisted processing, a high-energy electron beam is used to heat magnesium-aluminum composite fluorides at a rate of [missing information]. The evaporated magnesium-aluminum composite fluoride was deposited in nanoscale molecular form to obtain a resin lens containing a magnesium-aluminum composite fluoride layer; the ion source-assisted deposition process parameters were: Hall source as ion source, anode voltage: 130V, anode current: 4A, argon as auxiliary gas, and flow rate of 10sccm.

[0074] S24: On the surface of the resin lens obtained in S23, the background vacuum degree is ≤2×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 50–70°C, and ion source-assisted processing, silicon dioxide is heated by a high-energy electron beam at a rate of [missing information]. Evaporated silica is deposited in nanoscale molecular form to obtain a resin lens containing a silica layer; the ion source-assisted deposition process parameters are: ion source is a Hall source, anode voltage: 110V, anode current: 3A, auxiliary gas is argon, and the flow rate is 8sccm.

[0075] S3 Preparation of the waterproof layer: Forming a waterproof layer on the surface of the resin lens obtained in S24: On the surface of the lens obtained in step S2, a vacuum coating process is further applied, with a base vacuum degree ≤2×10 -3 Under conditions of Pa and a coating chamber temperature of 60°C, a high-energy electron beam is used to heat the material at a rate of [missing information]. The evaporated product containing C 12 F 27 The waterproof material of N is deposited in nanoscale molecular form on the surface of the resin lens obtained by S24, thus obtaining the lens.

[0076] Example 2

[0077] A low-reflection blue light blocking resin lens, comprising, in sequence: a resin lens substrate 1 (SK1.56-UV405); a hardening layer 2 (VH56) / 2.6~3μm; and an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (where the molar percentage of SiO2 and Al2O3 is 92% SiO2:8% Al2O3; developed and produced by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., material model SA56) / 174.6nm, a weakly absorbing titanium dioxide layer (obtained by evaporation of Ti3O5) 3-2 / 15.2nm, and a silicon-aluminum composite oxide layer 3-3 / 24.61nm (material same as...). 3-1) Weakly absorbing titanium dioxide layer 3-4 (material same as 3-2) / 89.58nm; silicon-aluminum composite oxide layer 3-5 / 12.67nm (material same as 3-1); weakly absorbing titanium dioxide layer 3-6 (material same as 3-2) / 10.84nm; ITO layer 3-7 / 5nm; magnesium-aluminum composite fluoride layer (where the molar percentage of MgF2 and AlF3 is 92% MgF2: 8% AlF3; developed and produced by Changzhou Zhanchi Optoelectronic Technology Co., Ltd.) 3-8 / 70.79nm; silicon oxide layer 3-9 (material is SiO2) / 12nm; waterproof layer 4 (using C... 12 F 27 N waterproof material (10nm);

[0078] The method for preparing the resin lens includes the following steps:

[0079] S1: Fabrication of the hardening layer: The ultrasonically cleaned resin lens substrate is immersed in a 30% (by weight) hardening liquid aqueous solution of type Z118 at a temperature of 15°C for 5 seconds, and then pulled out of the solution at a speed of 2.0 mm / s. After drying at 80°C for 3 hours, the substrate is removed and sent to a drying oven for drying and curing at a temperature of 120°C for 150 minutes, thus obtaining a resin lens with a hardening layer.

[0080] The remaining steps are the same as in Example 1.

[0081] Example 3

[0082] A low-reflection blue light blocking resin lens, comprising, in sequence: a resin lens substrate 1 (MR-7-UV405); a hardening layer 2 (Z118) / 2.6~3μm; and an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (where the molar percentage of SiO2 and Al2O3 is 92% SiO2:8% Al2O3; developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., material model SA56) / 175.7nm, a weakly absorbing titanium dioxide layer (obtained by evaporation of Ti3O5) 3-2 / 16.88nm, and a silicon-aluminum composite oxide layer 3-3 / 22.4nm (material same as...). 3-1) Weakly absorbing titanium dioxide layer 3-4 (material same as 3-2) / 75.68nm; silicon-aluminum composite oxide layer 3-5 / 10.3nm (material same as 3-1); weakly absorbing titanium dioxide layer 3-6 (material same as 3-2) / 19.09nm; ITO layer 3-7 / 5nm; magnesium-aluminum composite fluoride layer (where the molar percentage of MgF2 and AlF3 is 92% MgF2: 8% AlF3; developed and produced by Changzhou Zhanchi Optoelectronic Technology Co., Ltd.) 3-8 / 77.61nm; silicon oxide layer 3-9 (material is SiO2) / 12nm; waterproof layer 4 (using C... 12 F 27 N waterproof material (10nm);

[0083] The method for preparing the resin lens includes the following steps:

[0084] S1: Fabrication of the hardening layer: The ultrasonically cleaned resin lens substrate is immersed in a 27% (by weight) hardening liquid aqueous solution of type Z118 at a temperature of 15°C for 5 seconds, and then pulled out of the solution at a speed of 2.0 mm / s. After drying at 80°C for 3 hours, the substrate is removed and sent to a drying oven for drying and curing at a temperature of 120°C for 150 minutes, thus obtaining a resin lens with a hardening layer.

[0085] The remaining steps are the same as in Example 1.

[0086] Example 4

[0087] A low-reflection blue light blocking resin lens, comprising, in sequence: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117) / 1~2.6μm; and an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (where the molar percentage of SiO2 and Al2O3 is 92% SiO2:8% Al2O3; developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., material type SA56) / 174.3nm, a weakly absorbing titanium dioxide layer (obtained by evaporation of Ti3O5) 3-2 / 15.68nm, and a silicon-aluminum composite oxide layer 3-3 / 23.64nm (material... Same as 3-1), weakly absorbing titanium dioxide layer 3-4 (material same as 3-2) / 84.82nm, silicon-aluminum composite oxide layer 3-5 / 10nm (material same as 3-1), weakly absorbing titanium dioxide layer 3-6 (material same as 3-2) / 13.87nm, ITO layer 3-7 / 5nm; magnesium-aluminum composite fluoride layer (where the molar percentage of MgF2 and AlF3 is 85% MgF2:15% AlF3; developed and produced by Changzhou Zhanchi Optoelectronic Technology Co., Ltd.) 3-8 / 73.74nm; silicon oxide layer 3-9 (material is SiO2) / 12nm, waterproof layer 4 (using C... 12 F 27 N waterproof material (10nm); its preparation method is the same as in Example 1.

[0088] (II) Comparative Example

[0089] Comparative Example 1

[0090] A low-reflection, clear-background blue light blocking resin lens, comprising, in sequence: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117) / 2.6~3μm; and an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (where the molar percentage of SiO2 and Al2O3 is 92% SiO2:8% Al2O3; developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., material type SA56) / 24.6nm, and a titanium-niobium composite oxide layer 3-2 (where the molar percentage of TiO2 and Nb2O5 is 80% TiO2:20% Nb2O5). The product was developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., using the following materials: PTN28 / 18.8nm, silicon-aluminum composite oxide layer 3-3 / 31.34nm (same material as 3-1), titanium-niobium composite oxide layer 3-4 (same material as 3-2) / 51.32nm, silicon-aluminum composite oxide layer 3-5 / 10.41nm (same material as 3-1), titanium-niobium composite oxide layer 3-6 (same material as 3-2) / 34.38nm, ITO layer 3-7 / 5nm; silicon-aluminum composite oxide layer 3-8 / 92.63nm (same material as 3-1); waterproof layer 4 (using materials containing C). 12 F 27N waterproof material (10nm);

[0091] The method for preparing the resin lens includes the following steps:

[0092] S1: Fabrication of the hardening layer: The ultrasonically cleaned resin lens substrate is immersed in a 27% (by weight) hardening solution (model Z117) at a temperature of 15°C for 5 seconds, and then pulled out of the solution at a speed of 2.0 mm / s. After drying at 80°C for 3 hours, the substrate is removed and sent to a drying oven for drying and curing at a temperature of 120°C for 150 minutes, thus obtaining a resin lens with a hardening layer.

[0093] S2 Preparation of Low-Reflection Clear Base Color Anti-Blue Light Layer: In a vacuum coating machine, using a vacuum coating process, the solid film material is evaporated and then deposited onto the surface of the resin lens obtained in step S1 through gas phase transport to form a thin film, thus forming a low-reflection clear base color anti-blue light layer. This specifically includes the following steps:

[0094] S21: Includes the following steps:

[0095] S211: On the surface of the resin lens obtained in S1, the background vacuum degree is ≤3×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 60℃, and an ion source-assisted process, a high-energy electron beam is used to heat the silicon-aluminum composite oxide at a rate of [missing information]. The evaporated silicon-aluminum composite oxide is deposited in nanoscale molecular form to obtain a resin lens containing a first layer of silicon-aluminum composite oxide.

[0096] S212: The background vacuum level on the surface of the resin lens obtained in S211 is ≤3×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 60℃, and ion source-assisted processing, high-energy electron beam heating of titanium-niobium composite oxide is employed at a rate of [missing information]. Evaporated titanium-niobium composite oxide is deposited in nanoscale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer.

[0097] S213: Repeat steps S211 and S212 to alternately form the third layer of silicon-aluminum composite oxide, the fourth layer of titanium-niobium composite oxide, the fifth layer of silicon-aluminum composite oxide, and the sixth layer of titanium-niobium composite oxide, thus forming a resin lens including the third layer of silicon-aluminum composite oxide, the fourth layer of titanium-niobium composite oxide, the fifth layer of silicon-aluminum composite oxide, and the sixth layer of titanium-niobium composite oxide.

[0098] S22: On the surface of the resin lens obtained in S21, the background vacuum degree is ≤3×10⁻⁶. -3 Under conditions of Pa, a coating chamber temperature of 60°C, and an ion source-assisted process, ITO is heated by a high-energy electron beam at a rate of [missing information]. Evaporated ITO is deposited in nanoscale molecular form to obtain a resin lens containing a seventh ITO layer.

[0099] S23: On the surface of the resin lens obtained in S22, continue to use the vacuum coating process and repeat the process steps of S211 to form a resin lens containing the eighth silicon-aluminum composite oxide layer.

[0100] S3 Preparation of the waterproof layer: A waterproof layer is formed on the surface of the resin lens obtained in S23. On the lens surface obtained in step S2, a vacuum coating process is further applied, with a base vacuum degree ≤3×10⁻⁶. -3 Under conditions of Pa and a coating chamber temperature of 60°C, a high-energy electron beam is used to heat the material at a rate of [missing information]. The evaporated product containing C 12 F 27 The waterproof material of N is deposited in nanoscale molecular form on the surface of the resin lens obtained by S24, thus obtaining the lens.

[0101] Comparative Example 2

[0102] A low-reflection blue light blocking resin lens, comprising, in sequence: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117) / 2.6~3μm; and an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (where the molar percentage of SiO2 and Al2O3 is 92% SiO2:8% Al2O3; developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., material model SA56) / 174.3nm, a titanium dioxide layer (obtained by evaporation of Ti3O5) 3-2 / 15.68nm, and a silicon-aluminum composite oxide layer 3-3 / 23.64nm (… Materials same as 3-1), titanium dioxide layer 3-4 (material same as 3-2) / 84.82nm, silicon-aluminum composite oxide layer 3-5 / 10nm (material same as 3-1), titanium dioxide layer 3-6 (material same as 3-2) / 13.87nm, ITO layer 3-7 / 5nm; magnesium-aluminum composite fluoride layer (where the molar percentage of MgF2 and AlF3 is: 92% MgF2: 8% AlF3; commissioned to Changzhou Zhanchi Optoelectronic Technology Co., Ltd. for development and production) 3-8 / 73.74nm; silicon oxide layer 3-9 (material is SiO2) / 12nm, waterproof layer 4 (using C... 12 F 27 N waterproof material (10nm);

[0103] The preparation method differs from Example 1 in that the preparation processes of titanium dioxide layers 3-2, 3-4, and 3-4 are different. The preparation process of the titanium dioxide layer is as follows: on the surface of the resin lens obtained by the previous layer (silicon-aluminum composite oxide layer), the background vacuum degree is ≤3×10 -3Under conditions of Pa, a coating chamber temperature of 60℃, and ion source-assisted processing, titanium pentoxide is heated by a high-energy electron beam at a rate of [missing information]. Evaporated titanium pentoxide is deposited in nanoscale molecular form, and partial oxidation continues during the evaporation process to obtain a resin lens containing a titanium dioxide layer. The ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 125V, anode current: 3.5A, argon-free auxiliary gas flow rate, and oxygen flow rate: 16 sccm. The titanium dioxide layer prepared in this way has almost no absorption.

[0104] The preparation methods for other layers are the same as in Example 1.

[0105] Comparative Example 3

[0106] A low-reflection blue light blocking resin lens, comprising, in sequence: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117) / 2.6~3μm; and an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (where the molar percentage of SiO2 and Al2O3 is 92% SiO2:8% Al2O3; developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., material type SA56) / 174.3nm, and a weakly absorbing titanium dioxide layer (obtained by evaporation of Ti3O5) 3-2 / 15.68nm. 3-3 / 23.64nm silicon-aluminum composite oxide layer (material same as 3-1), 3-4 / 84.82nm weakly absorbing titanium dioxide layer (material same as 3-2), 3-5 / 10nm silicon-aluminum composite oxide layer (material same as 3-1), 3-6 / 13.87nm weakly absorbing titanium dioxide layer (material same as 3-2), ITO layer 3-7 / 5nm; magnesium fluoride layer (MgF2 purity above 99.9%) 3-8 / 73.74nm; silicon oxide layer 3-9 (material is SiO2) / 12nm; waterproof layer 4 (using C... 12 F 27 N waterproof material (10nm);

[0107] The preparation method is the same as in Example 1. The evaporation rate and ion source auxiliary parameters of the magnesium fluoride layer are also the same as those of the magnesium-aluminum composite fluoride in Example 1.

[0108] Comparative Example 4

[0109] A low-reflection blue light blocking resin lens, comprising, in sequence: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117) / 2.6~3μm; and an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (where the molar percentage of SiO2 and Al2O3 is 92% SiO2:8% Al2O3; developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., material type SA56) / 174.3nm, a weakly absorbing titanium dioxide layer (obtained by evaporation of Ti3O5) 3-2 / 15.68nm, and a silicon-aluminum composite oxide layer 3-3 / 23.64nm (material... Same as 3-1), weakly absorbing titanium dioxide layer 3-4 (material same as 3-2) / 84.82nm, silicon-aluminum composite oxide layer 3-5 / 10nm (material same as 3-1), weakly absorbing titanium dioxide layer 3-6 (material same as 3-2) / 13.87nm, ITO layer 3-7 / 5nm; magnesium-aluminum composite fluoride layer (where the molar percentage of MgF2 and AlF3 is 70% MgF2:30% AlF3; developed and produced by Changzhou Zhanchi Optoelectronic Technology Co., Ltd.) 3-8 / 73.74nm; silicon oxide layer 3-9 (material is SiO2) / 12nm, waterproof layer 4 (using C... 12 F 27 N waterproof material (10nm);

[0110] The preparation method is the same as in Example 1.

[0111] Comparative Example 5

[0112] A low-reflection blue light blocking resin lens, comprising, in sequence: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117) / 2.6~3μm; and an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (where the molar percentage of SiO2 and Al2O3 is 92% SiO2:8% Al2O3; developed and manufactured by Changzhou Zhanchi Optoelectronic Technology Co., Ltd., material type SA56) / 177.5nm, a weakly absorbing titanium dioxide layer (obtained by evaporation of Ti3O5) 3-2 / 15.47nm, and a silicon-aluminum composite oxide layer... Layer 3-3 / 24.37nm (material same as 3-1), weakly absorbing titanium dioxide layer 3-4 (material same as 3-2) / 85.29nm, silicon-aluminum composite oxide layer 3-5 / 9.5nm (material same as 3-1), weakly absorbing titanium dioxide layer 3-6 (material same as 3-2) / 13.7nm, ITO layer 3-7 / 5nm; calcium fluoride layer (purity above 99.9%; sintered by Changzhou Zhanchi Optoelectronic Technology Co., Ltd.) 3-8 / 72.59nm; silicon oxide layer 3-9 (material is SiO2) / 12nm, waterproof layer 4 (using C... 12 F 27 N waterproof material (10nm);

[0113] The preparation method is the same as in Example 1.

[0114] II. Experimental Examples

[0115] The membrane structures of Examples 1-4 and Comparative Examples 1-5 are shown in Table 1 below:

[0116] Table 1

[0117]

[0118]

[0119] The high-refractive-index TiO2 in Examples 1-4 and Comparative Examples 3-5 in Table 1 refers to weakly absorbing titanium dioxide layers prepared using a special ion source assisted process with Ar and O2, and their TiO2 oxidation degree is not sufficient. In contrast, the TiO2 layer in Comparative Example 2 is a non-absorbing titanium dioxide layer prepared using an O2 ion source assisted process, and its TiO2 oxidation degree is relatively more complete.

[0120] 1. Measure the lens's average reflectance, peak reflectance, blue light protection, and other optical effects.

[0121] The average reflectance, peak reflectance, and blue light protection effect of Examples 1-4 and Comparative Examples 1-5 were measured.

[0122] The average reflectance (average reflectance: refers to the visual average reflectance under C light (a light source with a color temperature of 6774K as defined in CIE), and the peak reflectance of visible light (refer to the highest reflectance of a single surface in the range of 400-700nm) of the lenses prepared in Examples 1-4 and Comparative Examples 1-5 were measured, and the measurement results are recorded in Table 2 below.

[0123] For the lenses prepared in Examples 1-4 and Comparative Examples 1-5, the arithmetic mean transmittance of the main harmful blue light (415-445nm) and beneficial blue light (445-475nm) was measured in accordance with the requirements of the new national standard for blue light protection QBT-38120-2019. The transmittance yellow index was also measured (the national standard requires that the average transmittance of harmful blue light 415-445nm be ≤80%, and the average transmittance of beneficial blue light 445-475nm be >80%). The measurement results are recorded in Table 2 below.

[0124] Table 2

[0125]

[0126]

[0127] 2. High temperature resistance, durability and high temperature adhesion tests

[0128] (1) High temperature resistance test:

[0129] After completing the samples (Examples 1-4 and Comparative Examples 1-5), their temperature resistance was tested after one week of storage. The test method for high-temperature resistance was based on Clause 5.8 of the National Standard for Temperature Resistance of Resin Lenses (GB 10810.4-2012): a baking test at 55°C for 30 minutes. After passing this test, the same method was used, increasing the baking temperature by 5°C for 30 minutes each time, until the lens exhibited failure phenomena such as film cracking or orange peel effect. The highest passing temperature was recorded, and the results are shown in Table 4 below.

[0130] (2) Durability test:

[0131] Based on the fundamental test method for constant temperature and high humidity in the optical industry (ISO 9022-2-2002 4.2.4 Damp heat), the testing was tightened by storing the lenses at 60°C and 95% humidity for 24 hours to check for obvious failure phenomena such as film cracking or orange peel. Three resin lenses were placed in different positions for each high temperature and high humidity test. The test results of Examples 1-4 and Comparative Examples 1-5 are recorded in Table 3 below.

[0132] (3) High-temperature adhesion test:

[0133] The adhesion test refers to the film adhesion test according to Clause 5.9 of the national standard GB10810.4~2012. The high-temperature film adhesion test refers to the test conducted by Wanxin Company according to Clause 5.9 of the national standard GB10810.4~2012, changing the boiling conditions to 75±2℃ for 60 minutes, while keeping other test methods the same. Adhesion and high-temperature adhesion test results: Grade A refers to no film peeling or peeling area less than 5%, Grade B refers to peeling area between 5% and 15%, and Grade C (unqualified) refers to peeling area significantly greater than 15%. To verify the product adhesion distribution, high-temperature adhesion tests were conducted at 5 different locations in the coating chamber. The test results of Examples 1-4 and Comparative Examples 1-5 are recorded in Table 3 below.

[0134] Table 3

[0135]

[0136] 3. Conclusion:

[0137] (1) Ultra-low reflectivity: Examples 1 to 4 all have low average visible light reflectivity of less than 0.1% and low peak reflectivity of 1.3 to 1.4%; while Comparative Example 1 does not achieve the above technical effect, that is, it does not achieve the effect of ultra-low reflectivity. This is directly related to the use of ultra-low refractive index materials in the examples.

[0138] (2) Examples 1-4 effectively blocked harmful blue light while maintaining high transmittance of beneficial blue light, meeting national blue light protection standards. However, Comparative Example 2 failed to meet national blue light protection standards in blocking harmful blue light. This is because the examples effectively controlled and achieved weak absorption of the TiO2 film through process control. Calculations showed that the absorption of the corresponding TiO2 film in the harmful blue light range was 0.8-1.2%. In contrast, the TiO2 film in Comparative Example 2 did not undergo a specific absorption control process, resulting in an absorption of less than 0.2% in the harmful blue light range. Consequently, the product could not effectively protect against harmful blue light and did not meet national blue light protection standards.

[0139] (3) Examples 1-4 showed significantly better performance than Comparative Examples 3, 4, and 5 in terms of temperature resistance, high-temperature adhesion, and high-temperature and high-humidity tests. This indicates that, under otherwise unchanged conditions, the high-temperature resistance, high-temperature adhesion, and durability of the ultra-low refractive index lens material using a certain proportion of magnesium-aluminum composite fluoride are better than those of common magnesium fluoride, effectively solving the high stress problem of magnesium fluoride film. When AlF3 increases to a certain extent, the problem of AlF3's hygroscopicity gradually becomes apparent, affecting the product's high-temperature and high-humidity resistance and high-temperature adhesion. Comparative Examples 3 and 5 show that commonly used optical materials MgF2 and CaF2 require the substrate to be heated to a high temperature for coating (250°C or higher). In resin lens coating, their environmental resistance is limited by the substrate's temperature resistance.

Claims

1. A low-reflection, blue-light blocking resin lens, characterized in that, include: The lens comprises a resin lens substrate, a hardening layer, and a low-reflection blue light blocking film; wherein the resin lens substrate, the hardening layer, and the low-reflection blue light blocking film are arranged sequentially, the hardening layer is located on the surface of the resin lens substrate, and the low-reflection blue light blocking film is located on the surface of the hardening layer; the low-reflection blue light blocking resin lens further comprises a waterproof layer, which is located on the surface of the low-reflection blue light blocking film. The UV cutoff wavelength of the resin lens substrate is 405~407nm; The main component of the hardening layer is organosilicon; the thickness of the hardening layer is 1~5 mm. μ m; The low-reflection blue light blocking film layer comprises three layers of silicon-aluminum composite oxide, three layers of weakly absorbing titanium dioxide, one layer of tin-doped indium oxide (ITO), one layer of magnesium-aluminum composite fluoride, and one layer of silicon dioxide. The thickness of the low-reflection blue light blocking film layer is 200-600 nm. The silicon-aluminum composite oxide layer is composed of SiO2 and Al2O3 composite materials, wherein SiO2 accounts for 70%-95% of the molar fraction of the composite material. The weakly absorbing titanium dioxide layer is obtained by evaporation process using Ti3O5 as raw material. The magnesium-aluminum composite fluoride layer is composed of MgF2 and AlF3 composite materials, wherein MgF2 accounts for 80%-95% of the molar fraction of the composite material. The thickness of each layer of the low-reflection blue light blocking film is: The thickness of the first silicon-aluminum composite oxide layer is 160–180 nm; The thickness of the second weakly absorbing titanium dioxide layer is 10~40nm; The thickness of the third silicon-aluminum composite oxide layer is 15~60nm; The thickness of the fourth weakly absorbing titanium dioxide layer is 40~100nm; The thickness of the fifth silicon-aluminum composite oxide layer is 5~40nm; The thickness of the sixth weakly absorbing titanium dioxide layer is 8~40nm; The thickness of the seventh ITO layer is 2~10nm; The thickness of the eighth magnesium-aluminum composite fluoride layer is 60~100nm; The thickness of the ninth silicon dioxide layer is 10~25nm.

2. The low-reflection anti-blue light resin lens according to claim 1, characterized in that, The average reflectivity of the low-reflectivity blue light blocking resin lens is ≤0.1%.

3. The low-reflection anti-blue light resin lens according to claim 1, characterized in that, The low-reflectivity blue light blocking resin lens has a peak reflectivity of ≤1.5% in the visible light band of 400~700nm.

4. The low-reflection anti-blue light resin lens according to claim 1, characterized in that, The reflected light color coordinates of the low-reflection anti-blue light resin lens are H-values ​​of 285~305 and C-values ​​of 9~20.

5. The low-reflection anti-blue light resin lens according to claim 1, characterized in that, In the low-reflection blue light blocking film layer, SiO2 accounts for 92% of the molar fraction of the silicon-aluminum composite oxide composite material.

6. The low-reflection anti-blue light resin lens according to claim 1, characterized in that, In the low-reflection blue light blocking film, MgF2 accounts for 92% of the molar fraction of the MgF2 and AlF3 composite material.

7. A method for preparing a high-temperature resistant low-reflection anti-blue light resin lens according to claims 1-6, characterized in that, Includes the following steps: The steps for preparing the hardening layer in S1 include: immersing the ultrasonically cleaned resin lens substrate in an aqueous solution of hardening liquid with a mass percentage of 25-30% at an immersion temperature of 10-20°C for 5 seconds, then pulling the solution out at a speed of 1.0-3.0 mm / s, drying it at 70-90°C for 3 hours, taking out the substrate and sending it to a drying oven for drying and curing at a curing temperature of 100-150°C for 120-180 minutes, thus obtaining a resin lens containing a hardening layer; Step S2, the process for preparing the low-reflection blue light blocking film, includes: In a vacuum coating machine, using a vacuum coating process, silicon-aluminum composite oxide, titanium pentoxide, magnesium-aluminum composite oxide, silicon dioxide, and ITO solid film materials are evaporated and then transported through the gas phase to deposit a thin film on the surface of the resin lens obtained in step S1, forming an anti-reflection layer. The specific steps include: S21: A silicon-aluminum composite oxide layer and a weakly absorbing titanium dioxide layer are alternately formed on the surface of the resin lens obtained in step S1, thereby obtaining a resin lens including a silicon-aluminum composite oxide layer and a weakly absorbing titanium dioxide layer, specifically including: S211: On the surface of the resin lens obtained in S1, the background vacuum degree is ≤3×10⁻⁶. -3 Under the conditions of Pa, and the temperature inside the coating chamber being 50~70℃, and with ion source-assisted deposition, the silicon-aluminum composite oxide is heated by a high-energy electron beam, and the evaporated silicon-aluminum composite oxide is deposited in nanoscale molecular form at a rate of 5~7 Å / S to obtain a resin lens containing a first layer of silicon-aluminum composite oxide. The ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 90~140V, anode current: 2.5~5A, auxiliary gas as O2, and flow rate of 10~30sccm. S212: The background vacuum level on the surface of the resin lens obtained in S211 is ≤3×10⁻⁶. -3 Under the conditions of Pa and a coating chamber temperature of 50~70℃, and with ion source-assisted deposition, the titanium pentoxide is heated by a high-energy electron beam and deposited in nanoscale molecular form at a rate of 2~4 Å / S to obtain a resin lens containing a second weakly absorbing titanium dioxide layer; the ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 110~140V, anode current: 3~4A, and auxiliary gases are Ar and O2, with flow rates of argon 5~7 sccm and oxygen 7~12 sccm, respectively. S213: Repeat steps S211 and S212 to alternately form the third silicon-aluminum composite oxide layer, the fourth weakly absorbing titanium dioxide layer, the fifth silicon-aluminum composite oxide layer, and the sixth weakly absorbing titanium dioxide layer, respectively, thus forming a resin lens including the third silicon-aluminum composite oxide layer, the fourth weakly absorbing titanium dioxide layer, the fifth silicon-aluminum composite oxide layer, and the sixth weakly absorbing titanium dioxide layer. S22: On the surface of the resin lens obtained in S21, the background vacuum degree is ≤3×10⁻⁶. -3 Under the conditions of Pa, and the temperature inside the coating chamber being 50~70℃, and with ion source-assisted deposition, ITO is heated by a high-energy electron beam and deposited in nanoscale molecular form at a rate of 1~3 Å / S to obtain a resin lens containing an ITO layer; the ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 90~140V, anode current: 2.5~5A, auxiliary gas as O2, and flow rate of 10~30sccm; S23: The background vacuum level on the surface of the resin lens obtained in S22 is ≤1×10⁻⁶. -3 Under the conditions of Pa, a coating chamber temperature of 50~70℃, and ion source-assisted deposition, a high-energy electron beam is used to heat magnesium-aluminum composite fluoride, and the evaporated magnesium-aluminum composite fluoride is deposited in nanoscale molecular form at a rate of 5~10 Å / S to obtain a resin lens containing a magnesium-aluminum composite fluoride layer; the ion source-assisted deposition process parameters are: Hall source as ion source, anode voltage: 110~150V, anode current: 3~5A, argon as auxiliary gas, and flow rate of 5~15sccm; S24: On the surface of the resin lens obtained in S23, the background vacuum degree is ≤2×10⁻⁶. -3 Under the conditions of Pa, and the temperature inside the coating chamber being 50~70℃, and with ion source-assisted deposition, silicon dioxide is heated by a high-energy electron beam at a rate of 4~8 Å / s to deposit the evaporated silicon dioxide in the form of nanoscale molecules, thereby obtaining a resin lens containing a silicon dioxide layer; the ion source-assisted deposition process parameters are: Hall source as the ion source, anode voltage: 100~130V, anode current: 2~4A, argon as the auxiliary gas, and a flow rate of 5~15 sccm; Step S3: Forming a waterproof layer on the resin lens surface obtained in S2 includes the following steps: On the lens surface obtained in step S24, a vacuum coating process is further applied, with a base vacuum degree ≤2×10 -3 Under conditions of Pa and a temperature of 50~70℃ inside the coating chamber, a high-energy electron beam is used to heat the material and deposit the evaporated fluorine-containing waterproof material in nanoscale molecular form at a rate of 5~7 Å / S to obtain a resin lens with a waterproof layer.

8. The method for preparing the low-reflection, blue-light-blocking, high-temperature-resistant resin lens according to claim 7, characterized in that, In S211, the ion source-assisted deposition process parameters are as follows: the ion source is a Hall source, the anode voltage is 110V, the anode current is 3A, the auxiliary gas is O2, and the flow rate is 15 sccm.

9. The method for preparing the low-reflection, blue-light-blocking, high-temperature-resistant resin lens according to claim 7, characterized in that, In S212, the ion source-assisted deposition process parameters are as follows: the ion source is a Hall source, the anode voltage is 125V, the anode current is 3.5A, the argon flow rate of the auxiliary gas is 6sccm, and the oxygen flow rate is 9sccm.

10. The method for preparing the low-reflection, blue-light-blocking, high-temperature-resistant resin lens according to claim 7, characterized in that, In S22, the ion source-assisted deposition process parameters are as follows: the ion source is a Hall source, the anode voltage is 110V, the anode current is 3A, the auxiliary gas is O2, and the flow rate is 15 sccm.

11. The method for preparing the low-reflection, blue-light-blocking, high-temperature-resistant resin lens according to claim 7, characterized in that, In S23, the ion source-assisted deposition process parameters are as follows: the ion source is a Hall source, the anode voltage is 130V, the anode current is 4A, the auxiliary gas is argon, and the flow rate is 10 sccm.

12. The method for preparing the low-reflection, blue-light-blocking, high-temperature-resistant resin lens according to claim 7, characterized in that, In S24, the ion source-assisted deposition process parameters are as follows: the ion source is a Hall source, the anode voltage is 110V, the anode current is 3A, the auxiliary gas is argon, and the flow rate is 8sccm.

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