Mask plate cleaning device and mask plate cleaning method

Abstract

The present invention discloses a mask cleaning device and a mask cleaning method, wherein the mask cleaning device includes a cleaning component, a transmission component and an adjustment component; the cleaning component is used to clean the mask; the transmission component is used to connect the mask and drive the to-be-cleaned area of ​​the mask to move to the cleaning component, and drive at least part of the clean area of ​​the mask to move into the working area; the adjustment component is connected to the transmission component or the mask to drive the mask in the working area to move to the desired working position. The mask cleaning device and the mask cleaning method of the present invention are used to realize automatic cleaning of the mask and improve the cleaning efficiency of the mask.

Description

Technical Field

[0001] The present invention relates to the technical field of mask plate cleaning, and in particular to a mask plate cleaning device and a mask plate cleaning method. Background Art

[0002] In the preparation process of perovskite stacked solar cells, it is necessary to coat the crystalline silicon with a perovskite liquid film. When coating crystalline silicon, one of the existing technical solutions is to place a mask plate on at least one side of the crystalline silicon. The coating head coats the crystalline silicon from the mask plate to the crystalline silicon so as to fully coat the surface of the crystalline silicon. Each time a piece of crystalline silicon is coated with the coating head, there will be coated perovskite slurry on the mask plate. Therefore, after coating a piece of crystalline silicon, the mask plate needs to be cleaned, and the cleaned mask plate can participate in the coating operation of the next piece of crystalline silicon.

[0003] The existing method of cleaning the mask plate is to manually remove the coated mask plate, then clean the mask plate, and then manually place the mask plate after cleaning. When batch coating is performed, the mask plate needs to be removed and cleaned after each piece of silicon wafer is coated. However, the manual placement and cleaning method is inefficient and has gradually become unsuitable for existing production needs. Summary of the invention

[0004] The object of the present invention is to provide a mask plate cleaning device and a mask plate cleaning method, which are used to realize automatic cleaning of the mask plate and improve the cleaning efficiency of the mask plate.

[0005] The purpose of the present invention is achieved by the following technical solutions:

[0006] A mask cleaning device, comprising:

[0007] A cleaning component, used for cleaning the mask plate;

[0008] A transmission assembly, used for connecting the mask plate, and for driving the to-be-cleaned area of ​​the mask plate to move to the cleaning assembly, and for driving at least part of the clean area of ​​the mask plate to move into the working area;

[0009] The adjusting component is connected to the transmission component or the mask plate to drive the mask plate in the working area to move to a desired working position.

[0010] Preferably, the transmission assembly is used to drive the mask plate to move cyclically along a closed path; the mask plate is an annular flexible belt structure.

[0011] Preferably, the cleaning assembly is provided with a plurality of cleaning members along the closed path, and the transmission assembly is used for driving the area to be cleaned of the mask plate to pass through the plurality of cleaning members in sequence, and to be cleaned by the plurality of cleaning members in sequence.

[0012] Preferably, the transmission assembly further comprises an origin detection member, the mask plate is preset with an origin identification portion, and when the mask plate is located at a predetermined position, the origin identification portion is coupled with the origin detection member.

[0013] Preferably, the transmission assembly includes a plurality of transmission members and at least one first driving member, the transmission members are used to abut and support the mask plate, the plurality of transmission members are arranged at intervals along the closed path, and the first driving member is connected to at least one transmission member and drives at least one of the transmission members to move, so as to drive the mask plate connected to the transmission member to move.

[0014] Preferably, it also includes a tensioning assembly, which includes a tensioning member and a second driving member connected to the tensioning member; the tensioning member and the plurality of transmission members are arranged at intervals along a closed path, and the tensioning member and the plurality of transmission members are used together to abut the mask plate so that the mask plate is tensioned and fixed along the closed path; the second driving member is used to drive the tensioning member to move in a direction perpendicular to the mask plate to adjust the tensioning force applied by the tensioning member to the mask plate.

[0015] Preferably, the tensioning member is a tensioning wheel, the transmission member is a transmission wheel, and the first driving member drives the transmission member connected to the first driving member to rotate, so as to drive the mask plate to move.

[0016] Preferably, the transmission assembly further comprises an auxiliary wheel, which is arranged on one side of the transmission member connected to the first driving member, and the auxiliary wheel is used to clamp the mask plate together with the transmission member.

[0017] Preferably, the transmission assembly includes a first transmission group, the first transmission group is used to support the mask plate located in the working area, the adjustment assembly is connected to the first transmission group, and is used to drive the first transmission group to move, so as to drive the mask plate located in the working area to move to a desired working position.

[0018] Preferably, the first transmission group includes at least two transmission members, and the adjustment assembly is respectively connected to multiple transmission members in the first transmission group, and drives the multiple transmission members in the first transmission group to move synchronously along the Y-axis and / or the Z-axis; the length direction of the working area of ​​the mask plate is parallel to the X-axis, and the X-axis, Y-axis and Z-axis are perpendicular to each other.

[0019] Preferably, the adjustment assembly includes a Z-axis drive assembly and a Y-axis drive assembly;

[0020] The Y-axis driving assembly is connected to the transmission member in the first transmission group, and is used to drive the transmission member in the first transmission group to move synchronously along the Y-axis; the Y-axis driving assembly is installed on the Z-axis driving assembly, and the Z-axis driving assembly is used to drive the Y-axis driving assembly and the transmission member connected to the Y-axis driving assembly to move synchronously along the Z-axis;

[0021] Or, the Z-axis driving assembly is connected to the transmission member in the first transmission group, and is used to drive the transmission member in the first transmission group to move synchronously along the Z-axis; the Z-axis driving assembly is installed on the Y-axis driving assembly, and the Y-axis driving assembly is used to drive the Z-axis driving assembly and the transmission member connected to the Z-axis driving assembly to move synchronously along the Y-axis.

[0022] Preferably, the Y-axis driving assembly includes a support and a Y-axis driving member for driving the support to move along the Y-axis, and the Z-axis driving assembly includes a lifting plate and a Z-axis driving member for driving the lifting plate to move along the Z-axis;

[0023] When the Y-axis driving assembly is connected to the transmission member in the first transmission group, the support is connected to the transmission member in the first transmission group, and the Y-axis driving member is installed on the lifting plate;

[0024] When the Z-axis driving assembly is connected to the transmission member in the first transmission group, the lifting plate is connected to the transmission member in the first transmission group, and the Z-axis driving member is installed on the support.

[0025] Preferably, a support table is further included, the working position is located on the upper surface of the support table, and the support table is provided with a fixing unit, and the fixing unit is used to fix the mask plate located in the working area to the working position.

[0026] Preferably, the fixing unit comprises one or more adsorption holes extending to the working position, and a negative pressure supply member connected to the adsorption holes, wherein the negative pressure supply member is used to generate negative pressure in the adsorption holes to adsorb the mask plate located in the working area.

[0027] A method for cleaning a mask plate, wherein after the mask plate is installed on a transmission assembly and participates in a coating operation, at least a portion of the mask plate forms an area to be cleaned, and the method for cleaning the mask plate comprises:

[0028] Driving the area to be cleaned of the mask plate to the cleaning assembly for cleaning;

[0029] Control the transmission assembly to drive the clean area of ​​the mask plate to move into the working area;

[0030] The control and adjustment component drives the mask plate located in the workstation area to move to the working position.

[0031] Preferably, the mask plate is an annular belt structure, and the mask plate with the annular belt structure is sleeved on a transmission component, and the transmission component drives the mask plate to move cyclically along a closed path.

[0032] Preferably, the transmission assembly comprises a first transmission group, the first transmission group is used to support the mask plate located in the working area, and the mask plate located in the working area forms a to-be-cleaned area after the coating operation;

[0033] Driving the area to be cleaned of the mask plate to the cleaning assembly for cleaning, specifically includes: the adjustment assembly drives the first transmission group away from the working position, so that the area to be cleaned of the mask plate is away from the working position; the transmission assembly drives the area to be cleaned of the mask plate to move to the cleaning assembly; the cleaning assembly cleans the area to be cleaned of the mask plate, so that the area to be cleaned of the mask plate forms a clean area;

[0034] Controlling the adjustment component to drive the mask plate in the workstation area to move to the working position specifically includes: the adjustment component drives the first transmission group to approach the working position and moves the mask plate in the workstation area to the working position.

[0035] Preferably, it also includes:

[0036] The mask plate is tensioned by a tensioning member, and the tensioning force applied by the tensioning member to the mask plate is correspondingly adjusted when performing the above steps.

[0037] Compared with the prior art, the beneficial effects of the present invention include at least:

[0038] The present invention uses a transmission component to move the area to be cleaned of the mask plate to the cleaning component for cleaning, thereby realizing automatic cleaning of the mask plate and improving the cleaning efficiency of the mask plate; and, the transmission component replaces the step of manual taking, and an adjustment device is used to adjust the position of the mask plate, which can replace the step of manual placement of the mask plate, realizing fully automatic cleaning and placement, effectively improving the cleaning efficiency of the mask plate and improving the coating efficiency of crystalline silicon. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] Figure 1 is a schematic structural diagram of a mask cleaning device in an embodiment of the present invention when connected to a mask;

[0040] Figure 2 yes Figure 1 Enlarged view of part A in the middle;

[0041] Figure 3 is a partial structural schematic diagram of a mask cleaning device in an embodiment of the present invention when connected to a mask;

[0042] Figure 4is another partial structural schematic diagram of the mask cleaning device of the embodiment of the present invention when it is connected to the mask;

[0043] Figure 5 is another partial structural schematic diagram of the mask cleaning device of the embodiment of the present invention when it is connected to the mask;

[0044] Figure 6 is a partial cross-sectional view of a mask cleaning device according to an embodiment of the present invention when connected to a mask;

[0045] Figure 7 It is a schematic structural diagram of a support platform according to an embodiment of the present invention.

[0046] In the figure: 1. support table; 11. upper surface; 12. fixing unit; 13. adsorption hole; 2. cleaning component; 21. cleaning member; 3. transmission component; 31. transmission member; 32. first driving member; 33. auxiliary wheel; 34. first transmission group; 35. auxiliary driving member; 36. origin detection member; 4. adjustment component; 41. Y-axis driving component; 411. support; 412. Y-axis driving member; 42. Z-axis driving component; 421. lifting plate; 422. Z-axis driving member; 5. tensioning component; 51. tensioning member; 52. second driving member; 100. mask plate; 101. origin identification part. DETAILED DESCRIPTION

[0047] Example embodiments will now be described more fully with reference to the accompanying drawings. However, example embodiments can be implemented in a variety of forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided to make the present invention more comprehensive and complete and to fully convey the concepts of example embodiments to those skilled in the art. The same reference numerals in the figures represent the same or similar structures, and thus their repeated description will be omitted.

[0048] The words expressing positions and directions described in the present invention are all explained with reference to the accompanying drawings as examples, but they can be changed as needed, and all such changes are included in the protection scope of the present invention.

[0049] like Figure 1 As shown, the present invention provides a mask plate cleaning device for cleaning a mask plate 100. After the mask plate 100 is installed in the working position, it can be used for coating with crystalline silicon. The working position of the mask plate 100 can be located on one side or the periphery of the crystalline silicon, and the distance between the mask plate 100 and the crystalline silicon is within 0.5 mm.

[0050] Specifically, before the coating head coats the crystalline silicon, the coating head first pre-coats on the mask plate 100, and then moves step by step to coat the crystalline silicon. The coating head coats the uneven perovskite slurry on the mask plate 100 to ensure the uniformity of the perovskite slurry on the crystalline silicon, and also ensures the continuity of the coating by the coating head. The portion of the mask plate 100 located on one side or the periphery of the crystalline silicon will be covered by the perovskite slurry when the perovskite slurry is pre-coated. The portion of the mask plate 100 covered by the perovskite slurry forms the area to be cleaned of the mask plate 100. The mask plate cleaning device is used to clean the area to be cleaned of the mask plate 100 to remove the perovskite slurry on the area to be cleaned of the mask plate 100, so that the area to be cleaned of the mask plate 100 forms a clean area, and the formed clean area can be used to participate in the next coating operation of the crystalline silicon.

[0051] Reference Figure 1 The mask cleaning device includes a cleaning component 2, a transmission component 3 and an adjustment component 4, and may also include a tensioning component 5 and a support platform 1.

[0052] Reference Figure 7 The support platform 1 can be used to support the mask plate 100 and the crystalline silicon. Specifically, the working position of the mask plate 100 and the installation position of the crystalline silicon are both located on the upper surface 11 of the support platform 1. When the crystalline silicon needs to be coated, the crystalline silicon and the mask plate 100 located in the working area are placed on the upper surface 11 of the support platform 1. It should be noted that the crystalline silicon can also be supported by other independent support structures.

[0053] In order to facilitate the fixing of the mask plate 100, the support table 1 may be provided with a fixing unit 12, which is used to fix the mask plate 100 located in the working area to the working position. Specifically, the fixing unit 12 includes one or more adsorption holes 13 extending to the working position of the mask plate 100, and a negative pressure supply member (not shown) connected to the adsorption holes 13. The negative pressure supply member is used to generate negative pressure in the adsorption holes 13. When the mask plate 100 located in the working area moves to its working position, the mask plate 100 located in the working area will cover the adsorption holes 13. At this time, the negative pressure supply member operates to generate negative pressure in the adsorption holes 13 and adsorb and fix the mask plate 100, so that the mask plate 100 located in the working area is fixed in the working position. When the crystalline silicon coating is completed, the negative pressure supply member stops, the negative pressure at the adsorption holes 13 disappears, and the fixation of the mask plate 100 can be released. Among them, the negative pressure supply member can be a vacuum pump, a vacuum generator and other devices.

[0054] The transmission assembly 3 is used to connect the mask plate 100, and to drive the area to be cleaned of the mask plate 100 to move to the cleaning assembly 2, and to drive at least part of the clean area of ​​the mask plate 100 to move into the working area. The working area of ​​the mask plate 100 is the part of the mask plate 100 that is used to be set on one side or the periphery of the crystalline silicon. The mask plate 100 located in the working area can be moved to the working position to maintain a spacing of less than 0.5 mm with the crystalline silicon. The transmission assembly 3 can specifically drive the mask plate 100 to move cyclically along a closed path, and the mask plate 100 can be set as an annular flexible belt structure, and the closed path can pass through the cleaning assembly 2.

[0055] Reference Figure 3 and Figure 5 , the transmission assembly 3 may include a plurality of transmission members 31 arranged at intervals along the closed path and at least one first driving member 32. The plurality of transmission members 31 may respectively abut against the mask plate 100, for example, the outer walls of the plurality of transmission members 31 respectively abut against the mask plate 100, and are used to support the mask plate 100, so that the extension path of the mask plate 100 is the same or similar to the closed path. At least part of the plurality of transmission members 31 is used to form a first transmission group 34, and the first transmission group 34 is used to support the mask plate 100 located in the working area. For example, two transmission members 31 of the plurality of transmission members 31 are used to form the first transmission group 34, and the two transmission members 31 used to form the first transmission member 31 are arranged adjacent to the support platform 1, and the mask plate 100 located in the working area is arranged between the two transmission members 31, and the two transmission members 31 support the mask plate 100 located on both sides of the working area, thereby supporting the mask plate 100 located in the working area.

[0056] The first driving member 32 can be connected to at least one transmission member 31 and used to drive the at least one transmission member 31 to move. When the transmission member 31 moves under the drive of the first driving member 32, the transmission member 31 will drive the mask plate 100 abutting against it to move cyclically along a closed path. Therefore, under the drive of the transmission component 3, the area to be cleaned of the mask plate 100 can be moved to the cleaning component 2 for cleaning, and a clean area can be formed after the cleaning of the area to be cleaned of the mask plate 100 is completed, and the clean area can be returned to the working area of ​​the mask plate 100 under the drive of the transmission component 3 to participate in the next crystalline silicon coating operation.

[0057] Reference Figure 3In this embodiment, the first driving member 32 can be set as one, and the first driving member 32 is connected to a transmission member 31 and used to drive the transmission member 31 to move. The mask plate 100 moves cyclically along the closed path under the drive of the transmission member 31 connected to the first driving member 32. In other embodiments, the first driving member 32 can also be connected to multiple transmission members 31 and used to drive the multiple transmission members 31 to move, and the multiple transmission members 31 are used together to drive the mask plate 100 to move cyclically along the closed path; or, multiple first driving members 32 can be set, and each first driving member 32 can be connected to one or more transmission members 31 respectively, so that multiple transmission members 31 connected to the first driving member 32 are used together to drive the mask plate 100 to move cyclically along the closed path.

[0058] The transmission member 31 may be a transmission wheel, and the first driving member 32 may be a servo motor. The first driving member 32 is used to drive the transmission member 31 connected thereto to rotate. The transmission member 31 connected to the first driving member 32 may serve as a driving wheel to drive the mask plate 100 to move. The transmission member 31 not connected to the first driving member 32 may serve as a driven wheel to support the mask plate 100, and enable the mask plate 100 to cyclically move along a closed path.

[0059] Reference Figure 4 In order to improve the driving effect when the transmission member 31 drives the mask plate 100 to move, the transmission assembly 3 may also be provided with an auxiliary assembly, and the auxiliary assembly may include an auxiliary wheel 33 and an auxiliary driving member 35. The auxiliary wheel 33 is arranged on one side of the transmission member 31 connected to the first driving member 32, and the auxiliary wheel 33 is used to be arranged on the opposite sides of the mask plate 100 with the transmission member 31, and to clamp the mask plate 100 together. By pressing the mask plate 100 against the transmission member 31 connected to the first driving member 32 through the auxiliary wheel 33, the friction between the mask plate 100 and the transmission member 31 connected to the first driving member 32 can be increased, so that when the transmission member 31 moves under the drive of the first driving member 32, a better driving effect can be produced on the mask plate 100. The auxiliary driving member 35 can be connected to the auxiliary wheel 33 and used to drive the auxiliary wheel 33 to press against the mask plate 100 to increase the friction between the mask plate 100 and the transmission member 31. Alternatively, the auxiliary driving member 35 can also drive the auxiliary wheel 33 away from the mask plate 100 to facilitate operations such as replacing the mask plate 100. In addition, by adjusting the driving force applied by the auxiliary driving member 35 to the auxiliary wheel 33, the clamping force applied by the auxiliary wheel 33 to the mask plate 100 can also be adjusted, thereby achieving the adjustment of the friction between the mask plate 100 and the transmission member 31.

[0060] Reference Figure 2In order to facilitate the detection of the position of the mask plate 100, the transmission component 3 may also include an origin detection member 36, and the mask plate 100 may be pre-set with an origin identification portion 101. When the origin detection member 36 is coupled with the origin identification portion 101, the mask plate 100 is in a predetermined position, and at this time, the clean area of ​​the mask plate 100 for participating in the coating operation is located in the working area of ​​the mask plate 100. When the transmission component 3 drives the mask plate 100 to move cyclically along a closed path, the origin identification portion 101 of the mask plate 100 will move relative to the origin detection member 36. After the mask plate 100 moves cyclically for a certain distance, the origin identification portion 101 can be coupled with the origin detection member 36 again, which indicates that the mask plate 100 has reached the predetermined position again. By setting the origin detection member 36 and the origin identification portion 101, the position of the mask plate 100 can be detected to ensure that the mask plate 100 can be located at the predetermined position after each cycle, thereby improving the position accuracy of the mask plate 100. The origin detection member 36 may specifically be a micro photoelectric switch, which emits a detection beam and can detect whether the detection beam is blocked. The origin identification portion 101 may be a through hole opened on the mask plate 100. When the origin detection member 36 is coupled with the origin identification portion 101, the detection beam of the origin detection member 36 passes through the origin identification portion 101, and the mask plate 100 is in its original position. When the origin detection member 36 deviates from the origin identification portion 101, the detection beam of the origin detection member 36 will be blocked by the physical part of the mask plate 100, and the mask plate 100 is not in its original position.

[0061] It should be pointed out that when the mask plate 100 uses the same part as the working section to participate in the coating operation of crystalline silicon, the origin identification part 101 is set to one, and the predetermined position of the mask plate 100 is also one, that is, when the working section is located in the working area of ​​the mask plate 100, the mask plate 100 reaches the predetermined position. At this time, when the origin identification part 101 is coupled with the origin detection part 36, the working section is located in the working area of ​​the mask plate 100. When multiple parts in the mask plate 100 form multiple working sections, multiple origin identification parts 101 can be set, and the predetermined position of the mask plate 100 can be multiple, and when each working section is located in the working area of ​​the mask plate 100, the mask plate 100 reaches a predetermined position. At this time, when each origin identification part 101 is coupled with the origin detection part 36, one working section is located in the working area of ​​the mask plate 100.

[0062] Reference Figure 6, the cleaning assembly 2 is used to clean the mask plate 100. The cleaning assembly 2 may include a plurality of cleaning members 21 arranged in sequence along a closed path. When the mask plate 100 moves cyclically along the closed path, the area to be cleaned of the mask plate 100 will pass through the plurality of cleaning members 21 in sequence and be cleaned by the plurality of cleaning members 21, so that the area to be cleaned of the mask plate 100 can form a clean area. Among them, the cleaning member 21 may be a scraper abutting against the mask plate 100, and when the area to be cleaned of the mask plate 100 passes through the scraper, the scraper may scrape off the perovskite slurry on the area to be cleaned. In addition, the cleaning member 21 may also be other cleaning devices, such as a nozzle, which may spray a cleaning liquid or dry air onto the mask plate 100. Some of the plurality of cleaning members 21 may be scrapers, some may be nozzles, or all may be scrapers and all may be nozzles. The mask plate 100 is driven to move cyclically by the transmission component 3 , and the mask plate 100 passing through the cleaning component 2 can be automatically cleaned without manual intervention, thereby effectively improving the cleaning efficiency of the mask plate 100 .

[0063] Reference Figure 3 , the tensioning assembly 5 may include a tensioning member 51 and a second driving member 52 connected to the tensioning member 51. The tensioning member 51 is used to tension the mask plate 100. The tensioning member 51 and the plurality of transmission members 31 are arranged at intervals along the closed path, and the tensioning member 51 and the plurality of transmission members 31 are used together to abut the mask plate 100 so that the mask plate 100 is tensioned and fixed along the closed path. The second driving member 52 is used to drive the tensioning member 51 to move in a direction perpendicular to the mask plate 100, so as to adjust the tensioning force applied by the tensioning member 51 to the mask plate 100 to cope with different working conditions. Among them, the second driving member 52 can be specifically a slide cylinder, and the tensioning member 51 can be specifically a tensioning wheel.

[0064] The adjustment component 4 can be connected to the transmission component 3 to drive the transmission component 3 to move, so that the mask plate 100 installed on the transmission component 3 can be moved to the working position. Alternatively, the adjustment component 4 can also be connected to the mask plate 100 and used to directly drive the mask plate 100 to move, so that the mask plate 100 can be moved to the working position, for example, so that the mask plate 100 is close to the crystalline silicon and flush with the upper surface of the crystalline silicon.

[0065] During the coating process, the perovskite slurry will flow into the gap between the mask plate 100 and the crystalline silicon, and will affect the coating uniformity of the perovskite slurry on the crystalline silicon. The larger the gap between the mask plate and the crystalline silicon, the lower the uniformity of the perovskite slurry coated on the crystalline silicon. The existing method of manually placing the mask plate 100 cannot control the size of the gap between the mask plate 100 and the crystalline silicon, and the gap between the mask plate 100 and the crystalline silicon is usually larger, for example, about 5 mm. The present application uses an adjustment component 4 to adjust the position of the mask plate 100 so that the mask plate 100 can be located in the working position and maintain a small gap with the crystalline silicon, that is, a gap of less than 0.5 mm, thereby improving the uniformity of the perovskite slurry coated on the surface of the crystalline silicon and ensuring that the crystalline silicon is fully coated with perovskite.

[0066] In this embodiment, the adjustment component 4 is connected to the transmission component 3, and specifically can be connected to the first transmission group 34 in the transmission component 3. The adjustment component 4 drives the first transmission group 34 to move, so as to drive the mask plate 100 located in the working area to move to the desired working position, and the desired working position is, for example, a position close to the crystalline silicon and flush with the upper surface of the crystalline silicon. When the first transmission group 34 includes a plurality of transmission members 31, the adjustment component 4 can be connected to the plurality of transmission members 31 respectively, and can drive a plurality of transmission members 31 in the first transmission member 31 to move synchronously along the Y-axis and / or the Z-axis. Among them, the Y-axis and the Z-axis are directions perpendicular to the length direction of the working area of ​​the mask plate 100, for example, the length direction of the working area of ​​the mask plate 100 is parallel to the X-axis, and the X-axis, the Y-axis and the Z-axis are perpendicular to each other.

[0067] Reference Figure 5 , the adjustment component 4 may include a Y-axis drive component 41 and a Z-axis drive component 42. The Y-axis drive component 41 is used to drive the first transmission group 34 to move along the Y-axis, and the Z-axis drive component 42 is used to drive the first transmission group 34 to move along the Z-axis. Specifically, the Y-axis drive component 41 can be connected to the transmission member 31 in the first transmission group 34, and is used to drive the transmission member 31 in the first transmission group 34 to move along the Y-axis. When the first transmission group 34 includes a plurality of transmission members 31, a plurality of Y-axis drive components 41 can be provided, and the plurality of Y-axis drive components 41 are connected to the plurality of transmission members 31 in the first transmission group 34 in a one-to-one correspondence, and the plurality of Y-axis drive components 41 can synchronously drive the corresponding plurality of transmission members 31, so that the plurality of transmission members 31 can synchronously move along the Y-axis. The Y-axis drive component 41 can be installed on the Z-axis drive component 42, so that the Z-axis drive component 42 can drive the Y-axis drive component 41 and the first transmission group 34 installed on the Y-axis drive component 41 to move along the Z-axis. When multiple Y-axis drive assemblies 41 are provided, the multiple Y-axis drive assemblies 41 can be installed on the same Z-axis drive assembly 42, so that the Z-axis drive assembly 42 can drive the multiple Y-axis drive assemblies 41 and the multiple transmission members 31 installed on the multiple Y-axis drive assemblies 41 to move synchronously along the Z-axis.

[0068] In addition, the first transmission group 34 may be installed on the Z-axis drive assembly 42, and the Z-axis drive assembly 42 is used to drive the first transmission group 34 to move along the Z-axis. Specifically, the Z-axis drive assembly 42 may be connected to the transmission member 31 in the first transmission group 34, and is used to drive the transmission member 31 in the first transmission group 34 to move along the Z-axis. When the first transmission group 34 includes multiple transmission members 31, the multiple transmission members 31 in the first transmission group 34 may be installed on the same Z-axis drive assembly 42, and the Z-axis drive assembly 42 drives the multiple transmission members 31 to move synchronously along the Z-axis; or, multiple Z-axis drive assemblies 42 may be provided, and the multiple Z-axis drive assemblies 42 are connected to the multiple transmission members 31 in the first transmission group 34 in a one-to-one correspondence, and the multiple Z-axis drive assemblies 42 may synchronously drive the corresponding multiple transmission members 31, so that the multiple transmission members 31 move synchronously along the Z-axis. The Z-axis driving assembly 42 can be installed on the Y-axis driving assembly 41, so that the Y-axis driving assembly 41 can drive the Z-axis driving assembly 42 and the multiple transmission members 31 installed on the Z-axis driving assembly 42 to move along the Y-axis. When multiple Z-axis driving assemblies 42 are provided, multiple Z-axis driving assemblies 42 can be installed on the same Y-axis driving assembly 41, so that the Y-axis driving assembly 41 can drive multiple Z-axis driving assemblies 42 and multiple transmission members 31 installed on multiple Z-axis driving assemblies 42 to move synchronously along the Y-axis.

[0069] The Y-axis driving assembly 41 may specifically include a support 411 and a Y-axis driving member 412 for driving the support 411 to move along the Y-axis. The Z-axis driving assembly 42 or the transmission member 31 in the first transmission group 34 may be installed on the support 411, so that the Y-axis driving assembly 41 may drive the Z-axis driving assembly 42 or the transmission member 31 in the first transmission group 34 to move along the Y-axis. The Z-axis driving assembly 42 specifically includes a lifting plate 421 and a Z-axis driving member 422 for driving the lifting plate 421 to move along the Z-axis. The Y-axis driving assembly 41 or the transmission member 31 in the first transmission group 34 may be installed on the lifting plate 421, so that the Z-axis driving assembly 42 may drive the Y-axis driving assembly 41 or the transmission member 31 in the first transmission group 34 to move along the Z-axis. For example, when the Y-axis driving assembly 41 is connected to the transmission member 31 in the first transmission group 34, the transmission member 31 in the first transmission group 34 is mounted on the support 411, and the Y-axis driving assembly 41 is mounted on the lifting plate 421, specifically, the Y-axis driving member 412 is mounted on the lifting plate 421. When the Z-axis driving assembly 42 is connected to the transmission member 31 in the first transmission group 34, the transmission member 31 in the first transmission group 34 is mounted on the lifting plate 421, and the Z-axis driving assembly 42 is mounted on the support 411, specifically, the Z-axis driving member 422 is mounted on the support 411.

[0070] It should be pointed out that the shape of the above-mentioned closed path can change under different working conditions. As the tensioning member 51 and the first transmission group 34 move, the shape of the closed path formed by the tensioning member 51 and the multiple transmission members 31 can also change, and the mask plate 100 with the same or similar shape to the closed path can also change accordingly.

[0071] The present invention also provides a method for cleaning a mask plate, the mask plate 100 can be the same as the mask plate 100 to be cleaned by the above-mentioned mask plate cleaning device, and the cleaning method can be applied to the above-mentioned mask plate cleaning device. The cleaning method includes the following steps S01 to S03, and can also include step S04.

[0072] Step S01: driving the area to be cleaned of the mask plate 100 to move to the cleaning assembly 2 for cleaning;

[0073] Step S02: Control the transmission assembly 3 to drive the clean area of ​​the mask plate 100 to move into the working area;

[0074] Step S03: controlling the adjustment component 4 to drive the mask plate 100 located in the workstation area to move to the working position.

[0075] Step S04: tensioning the mask plate 100 using the tensioning member 51 , and adjusting the tensioning force applied by the tensioning member 51 to the mask plate 100 accordingly when performing the above steps.

[0076] It should be noted that step S01, step S02, step S03, and step S04 may be performed simultaneously or sequentially, and may also be adjusted as needed.

[0077] Step S01 may specifically include: the adjustment component 4 drives the first transmission group 34 for supporting the area to be cleaned of the mask plate 100 away from the working position of the mask plate 100, so that the area to be cleaned of the mask plate 100 is away from the working position, and then the transmission component 3 drives the mask plate 100 to move along the closed path to the cleaning component 2, and is automatically cleaned by the cleaning component 2, so that the area to be cleaned of the mask plate 100 is cleaned to form a clean area.

[0078] In step S02, when the mask plate 100 uses the same part as a working section to participate in the coating operation of crystalline silicon, when the clean area of ​​the mask plate 100 moves into the working area of ​​the mask plate 100, the mask plate 100 may move for a cycle and move to the initial position again, and the clean area of ​​the mask plate 100 may be the part of the area to be cleaned after being cleaned by the cleaning component 2. When multiple parts of the mask plate 100 form multiple working sections, the transmission component 3 may drive the working section adjacent to the working area into the working area, and drive the area to be cleaned in the working area to move toward the cleaning component 2, and the clean area of ​​the mask plate 100 may be a working section that does not participate in the coating operation, or a working section that is cleaned by the cleaning component 2 and does not participate in the coating operation again.

[0079] Step S03 may specifically include: the adjustment component 4 drives the first transmission group 34 for supporting the to-be-cleaned area of ​​the mask plate 100 to approach the working position of the mask plate 100, so that the working area of ​​the mask plate 100 moves to the working position, and fixes the working area of ​​the mask plate 100 by the fixing unit 12.

[0080] In step S04, the tensioning member 51 is used to keep the mask plate 100 in a tensioned state. When the mask plate 100 needs to perform different steps from step S01 to step S03, the mask plate 100 is in different working conditions, and the tensioning force applied by the tensioning member 51 to the mask plate 100 can be adjusted to suit different working conditions. Specifically, when the adjustment component 4 drives the first transmission group 34 to move, the first transmission group 34 may move in a direction away from the mask plate 100. At this time, the tensioning member 51 moves toward the mask plate 100 and increases the tensioning force applied to the mask plate 100 to keep the mask plate 100 in a tensioned state, and the mask plate 100 can maintain contact with the first transmission group 34; in addition, when the first transmission group 34 moves in a direction toward the mask plate 100, the tensioning member 51 moves in a direction away from the mask plate 100 and reduces the tensioning force applied to the mask plate 100 to avoid excessive tension of the mask plate 100.

[0081] Although the embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations on the present invention. A person skilled in the art may change, modify, substitute and modify the above embodiments within the scope of the invention without departing from the principles and purpose of the present invention. All such changes should fall within the scope of protection of the claims of the present invention.

Claims

1. A mask cleaning device, wherein: The mask plate is applied to the pre-coating of the perovskite slurry, and is characterized in that the mask plate cleaning device comprises: A cleaning component, used for cleaning the mask plate; A transmission assembly is used to connect the mask plate, and to drive the to-be-cleaned area of ​​the mask plate to move to the cleaning assembly, and to drive at least part of the clean area of ​​the mask plate to move into the working area; the transmission assembly is used to drive the mask plate to move cyclically along a closed path, and the transmission assembly includes a plurality of transmission members; the transmission assembly includes a first transmission group, the first transmission group includes at least two of the transmission members, and the first transmission group is used to support the mask plate located in the working area; an adjustment component connected to the first transmission group and used to drive the first transmission group to move, so as to drive the mask plate located in the working area to move to a desired working position and drive the mask plate located in the working area away from the working position; wherein the adjustment component is respectively connected to a plurality of transmission members in the first transmission group, and drives the plurality of transmission members in the first transmission group to move synchronously along the Y-axis and / or the Z-axis; the length direction of the working area of ​​the mask plate is parallel to the X-axis, and the X-axis, the Y-axis and the Z-axis are perpendicular to each other; The tensioning assembly comprises a tensioning member and a second driving member connected to the tensioning member; the tensioning member and the plurality of transmission members are arranged at intervals along a closed path, and the tensioning member and the plurality of transmission members are used together to abut against a mask plate so that the mask plate is tensioned and fixed along the closed path; the second driving member is used to drive the tensioning member to move in a direction perpendicular to the mask plate so as to adjust the tensioning force applied by the tensioning member to the mask plate.

2. The mask cleaning device according to claim 1, characterized in that: The mask plate is an annular flexible belt structure.

3. The mask cleaning device according to claim 2, characterized in that: The cleaning assembly is provided with a plurality of cleaning members along the closed path, and the transmission assembly is used to drive the area to be cleaned of the mask plate to pass through the plurality of cleaning members in sequence, and to be cleaned by the plurality of cleaning members in sequence.

4. The mask cleaning device according to claim 2, characterized in that: The transmission assembly further comprises an origin detection member, and the mask plate is preset with an origin identification portion. When the mask plate is located at a predetermined position, the origin identification portion is coupled with the origin detection member.

5. The mask cleaning device according to claim 2, characterized in that: The transmission assembly also includes at least one first driving member, which is used to abut and support the mask plate. A plurality of transmission members are arranged at intervals along the closed path. The first driving member is connected to at least one transmission member and drives at least one of the transmission members to move, so as to drive the mask plate connected to the transmission member to move.

6. The mask cleaning device according to claim 5, characterized in that: The tensioning member is a tensioning wheel, the transmission member is a transmission wheel, and the first driving member drives the transmission member connected to the first driving member to rotate, so as to drive the mask plate to move.

7. The mask cleaning device according to claim 5, characterized in that: The transmission assembly further includes an auxiliary wheel, which is disposed on one side of the transmission member connected to the first driving member, and is used to clamp the mask plate together with the transmission member.

8. The mask cleaning device according to claim 1, characterized in that: The adjustment assembly includes a Z-axis drive assembly and a Y-axis drive assembly; The Y-axis driving assembly is connected to the transmission member in the first transmission group, and is used to drive the transmission member in the first transmission group to move synchronously along the Y-axis; the Y-axis driving assembly is installed on the Z-axis driving assembly, and the Z-axis driving assembly is used to drive the Y-axis driving assembly and the transmission member connected to the Y-axis driving assembly to move synchronously along the Z-axis; Or, the Z-axis driving assembly is connected to the transmission member in the first transmission group, and is used to drive the transmission member in the first transmission group to move synchronously along the Z-axis; the Z-axis driving assembly is installed on the Y-axis driving assembly, and the Y-axis driving assembly is used to drive the Z-axis driving assembly and the transmission member connected to the Z-axis driving assembly to move synchronously along the Y-axis.

9. The mask cleaning device according to claim 8, characterized in that: The Y-axis driving assembly includes a support and a Y-axis driving member for driving the support to move along the Y-axis, and the Z-axis driving assembly includes a lifting plate and a Z-axis driving member for driving the lifting plate to move along the Z-axis; When the Y-axis driving assembly is connected to the transmission member in the first transmission group, the support is connected to the transmission member in the first transmission group, and the Y-axis driving member is installed on the lifting plate; When the Z-axis driving assembly is connected to the transmission member in the first transmission group, the lifting plate is connected to the transmission member in the first transmission group, and the Z-axis driving member is installed on the support.

10. The mask cleaning device according to claim 1, characterized in that: It also includes a support platform, the working position is located on the upper surface of the support platform, and the support platform is provided with a fixing unit, and the fixing unit is used to fix the mask plate located in the working area to the working position.

11. The mask cleaning device according to claim 10, characterized in that: The fixing unit includes one or more adsorption holes extending to the working position, and a negative pressure supply member connected to the adsorption holes, wherein the negative pressure supply member is used to generate negative pressure in the adsorption holes to adsorb the mask plate in the working area.

12. A method for cleaning a mask plate, wherein after the mask plate is mounted on a transmission assembly and participates in a coating operation, at least a portion of the mask plate forms a to-be-cleaned area, characterized in that: The mask cleaning method is applied to the mask cleaning device according to any one of claims 1 to 11, and the mask cleaning method comprises: Driving the to-be-cleaned area of ​​the mask plate to the cleaning assembly for cleaning; Control the transmission assembly to drive the clean area of ​​the mask plate to move into the working area; The control and adjustment component drives the mask plate located in the workstation area to move to the working position.

13. The method for cleaning the mask plate according to claim 12, characterized in that: The mask plate is an annular belt structure. The mask plate with the annular belt structure is sleeved on the transmission component. The transmission component drives the mask plate to move cyclically along a closed path.

14. The method for cleaning the mask plate according to claim 13, characterized in that: The transmission assembly includes a first transmission group, the first transmission group is used to support the mask plate located in the working area, and the mask plate located in the working area forms a to-be-cleaned area after the coating operation; Driving the area to be cleaned of the mask plate to the cleaning assembly for cleaning, specifically includes: the adjustment assembly drives the first transmission group away from the working position, so that the area to be cleaned of the mask plate is away from the working position; the transmission assembly drives the area to be cleaned of the mask plate to move to the cleaning assembly; the cleaning assembly cleans the area to be cleaned of the mask plate, so that the area to be cleaned of the mask plate forms a clean area; Controlling the adjustment component to drive the mask plate in the workstation area to move to the working position specifically includes: the adjustment component drives the first transmission group to approach the working position and moves the mask plate in the workstation area to the working position.

15. The method for cleaning the mask plate according to claim 14, characterized in that: Also includes: The mask plate is tensioned by a tensioning member, and the tensioning force applied by the tensioning member to the mask plate is correspondingly adjusted when performing the above steps.

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