Etching machine with spraying device

The etching machine with a rotatable sleeve and adjustable spray device addresses solvent splashing and corrosion issues, ensuring cleanliness and ease of maintenance, thereby improving operational efficiency and equipment lifespan.

CN118398528BActive Publication Date: 2024-12-24SHAOXING HUALI ELECTRONICS CO LTD
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Patent Information

Application Number
CN202410659749.0
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-05-27
Publication Date
2024-12-24
Estimated Expiration
2044-05-27

AI Technical Summary

Technical Problem

Existing etching machines face issues with chemical solvent splashing and corrosion due to fixed spray devices, leading to equipment cleanliness problems and reduced part lifespan, especially when handling wafers of different sizes.

Method used

An etching machine with a spray device featuring a rotatable sleeve, adjustable spray angle, and protective rings to contain solvent splashes, along with adjustable drainage for different chemical solutions, ensuring cleanliness and maintenance flexibility.

Benefits of technology

The solution effectively contains solvent splashes within the etching machine, maintains equipment cleanliness, and facilitates easy maintenance by adjusting the spray angle and drainage, enhancing the machine's operational efficiency and part longevity.

✦ Generated by Eureka AI based on patent content.

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Abstract

This invention provides an etching machine with a spraying device, relating to the field of etching machine technology. It includes an etching machine body and a laser radio frequency module. A base is fixedly installed at the bottom of the inner wall of the etching machine body. A sleeve is rotatably installed inside the base. A top plate is fixedly installed at the top of the sleeve. A gear ring is fixedly installed at the bottom of the sleeve. A protective ring is slidably installed on the surface of the base. By allowing a fixed block to move the protective ring upwards, the protective ring slides upwards along the surface of the base and simultaneously slides upwards at the top of a support plate. The fixed block pulls the top of a telescopic rod, causing the telescopic rod to extend upwards. The telescopic rod ensures the stability of the protective ring's movement. By pushing the protective ring upwards, the circuit board at the top of the base is limited and fixed. Simultaneously, the raised protective rings on both sides ensure that solvent does not splash onto the surface of the base during spraying, maintaining the cleanliness of the inside of the etching machine body.
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Description

Technical Field

[0001] The present invention belongs to the technical field of etching machines, and more specifically, particularly relates to an etching machine with a spraying device. Background Art

[0002] Etching is the process of removing unnecessary materials attached to the surface of the wafer by chemical or physical methods. The etching process sequence is after coating and photolithography. That is, a thin film of the material used to engrave the circuit is first deposited on the wafer, and then photoresist is deposited on it. Then, according to the circuit design of the mask, the wafer is photolithographically exposed to light. The photoresist stimulated by light is retained, and the material to be etched is exposed in other places. This step is called development.

[0003] 1. When etching the wafer, it is necessary to coat the wafer in advance and spray photoresist. After etching, the surface of the wafer needs to be dissolved and cleaned with chemical solvents. Different chemical solvents need to be sprayed. It is usually divided into two steps. There are many production processes. At the same time, the spray device is in a fixed position inside the equipment. When spraying wafers of different sizes, there are prone to dead corners in the spraying, which affects the subsequent etching process.

[0004] 2. When spraying the wafer, the chemical solvent is sprayed directly to the top of the wafer through the nozzle. The chemical solvent splashes downward and contacts the surface of the wafer. Since the chemical solvent splashes downward with a certain acceleration and contacts the surface of the wafer, it is easy to cause part of the chemical solvent to splash outward, leave the surface of the wafer, and remain inside the equipment, affecting the cleanliness of the equipment. At the same time, the chemical solvent contacts the parts inside the etcher, which is easy to corrode the parts and affect the service life of the parts. Summary of the invention

[0005] In order to solve the above technical problems, the present invention provides an etching machine with a spray device to solve the above problems.

[0006] An etcher with a spray device comprises an etcher body and a laser radio frequency module, a base is fixedly installed on the bottom end of the inner wall of the etcher body, a sleeve is rotatably installed inside the base, a top plate is fixedly installed on the top of the sleeve, a gear ring is fixedly installed on the bottom end of the sleeve, a protective ring is slidably installed on the surface of the base, two fixed blocks are fixedly installed on the surface of the protective ring, two telescopic rods are fixedly installed on the bottom end of each of the fixed blocks, fixed frames are fixedly installed on the two inner side walls of the etcher body, support plates are fixedly installed on the bottom ends of the fixed frames, connecting plates are rotatably installed on the side ends of each of the fixing frames, and a splashing module is fixedly installed on the top end of each of the connecting plates.

[0007] Preferably, two driving rods are fixedly installed inside the fixing frame, a first connecting seat is fixedly installed on the top of each driving rod, a first push rod is rotatably installed on the top of each first connecting seat, the side ends of the two first connecting seats are rotatably installed with the same second push rod, two connecting tubes are fixedly installed inside the fixing frame, and two fixing tubes are fixedly installed on the top of the support plate.

[0008] Preferably, an adjustment sleeve is slidably installed on the side end of each fixed tube, a pull rod is rotatably installed on the bottom end of each adjustment sleeve, a rotating plate is rotatably installed on the top end of each support plate, a directional sliding rod is slidably installed on the two side ends of each rotating plate, a reset rod is fixedly installed on the end of each directional sliding rod, a second connecting seat is rotatably installed on the top end of each reset rod, a third push rod is rotatably installed on the side end of each second connecting seat, a rack is rotatably installed on the end of each third push rod, and two drainage tubes are fixedly installed on the bottom end of the base.

[0009] Compared with the prior art, the present invention has the following beneficial effects:

[0010] In the present invention, by pushing the first push rod to deflect at the top end of the first connecting seat, the top end of the first push rod is rotatably connected to the bottom end of the connecting plate, and a thrust is applied to one side of the connecting plate to make the connecting plate rotate and deflect around the top end. The connecting plate drives the splash module to deflect toward the top end of the base. At the same time, by controlling the moving distance of the first connecting seat by controlling the driving rod, the spray angle of the splash module can be adjusted to increase the flexibility of use.

[0011] In the present invention, the fixed block drives the protective ring to move upward, the protective ring slides upward along the surface of the base and at the same time slides upward on the top of the support plate, the fixed block pulls the top of the telescopic rod to stretch the telescopic rod upward, the stability of the movement of the protective ring is ensured by the telescopic rod, and the protective ring is pushed upward to limit and fix the circuit crystal plate on the top of the base. At the same time, the raised protective rings on both sides ensure that the solvent will not splash out of the surface of the base during the spraying process, thereby ensuring the cleanliness of the inside of the etcher body.

[0012] In the present invention, the connecting tube and the fixed tube are interconnected, so that the splashing module sprays a cleaning solution on the surface of the circuit crystal board after etching to clean the surface of the circuit crystal board. At the same time, the cleaning solution flows toward the retention port through the groove at the top of the top plate and flows out from another drain port opened inside the base. When spraying different chemical solutions through the two drain ports, the closure of the drain ports is adjusted to allow different spray waste liquids to be recovered accordingly.

[0013] In the present invention, the circuit crystal plate is placed on the top of the base, and the driving rod is driven to extend and retract inside the fixed frame. The top of the driving rod drives the first connecting seat to slide vertically, and the top of the first connecting seat is rotatably connected to the end of the first push rod, which pushes the first push rod to deflect at the top of the first connecting seat. The top of the first push rod is rotatably connected to the bottom end of the connecting plate, and a thrust is applied to one side of the connecting plate to rotate and deflect the connecting plate around the top. The connecting plate drives the splashing module to deflect toward the top of the base, and the connecting plate can drive the splashing module to deflect toward the side end of the fixed frame for storage, thereby expanding the internal space and facilitating the later maintenance of the laser RF module.

[0014] In the present invention, the fixed shaft at the bottom end of the rotating plate is rotated in the forward direction to drive the rotating plate to deflect, and the two ends of the rotating plate move in opposite directions. The rotating plate drives the pull rod to move and deflect at the bottom end of the adjusting sleeve, so that the adjusting sleeve is allowed to slide on the side end of the fixed pipe to open the valve inside the adjusting sleeve. At the same time, the movement of the adjusting sleeve applies a force to the third push rod, so that the third push rod mobilizes the rack to slide horizontally. The third push rod drives the second connecting seat to rotate on the side end of the directional sliding rod to ensure that the third push rod slides closely against the outer side of the support plate. By pushing the rack to slide by the third push rod, not only the closing of the adjusting sleeve can be controlled, but also the rack can be controlled to drive the sleeve to rotate. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the structure of the etching machine body of the present invention;

[0016] Figure 2 It is a schematic diagram of the base structure of the present invention;

[0017] Figure 3 It is a schematic diagram of the structure of the protection ring of the present invention;

[0018] Figure 4 It is a schematic diagram of the structure of the fixing frame of the present invention;

[0019] Figure 5 It is a schematic diagram of the structure of the splash module of the present invention;

[0020] Figure 6 It is a schematic diagram of the structure of the adjustment sleeve of the present invention.

[0021] In the figure, the correspondence between the component names and the figure numbers is: 1. etcher body; 11. laser RF module; 12. base; 13. fixing frame; 14. support plate; 15. rack; 16. first push rod; 17. connecting plate; 18. splash module; 21. drainage tube; 22. gear ring; 23. sleeve; 24. top plate; 25. protective ring; 26. fixing block; 27. telescopic rod; 28. driving rod; 29. ​​first connecting seat; 31. second push rod; 32. connecting pipe; 33. fixing pipe; 34. adjusting sleeve; 35. pull rod; 36. rotating plate; 37. reset rod; 38. directional slide rod; 39. second connecting seat; 41. third push rod. DETAILED DESCRIPTION

[0022] The following embodiments of the present invention are described in further detail in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0023] See also Figure 1-Figure 6 The present invention provides an etcher with a spraying device, including an etcher body 1 and a laser radio frequency module 11. A base 12 is fixedly installed at the bottom end of the inner wall of the etcher body 1. A sleeve 23 is rotatably installed inside the base 12. The sleeve 23 drives a top plate 24 to rotate inside a groove at the top of the base 12, so that the groove at the top of the top plate 24 is aligned with the groove inside the base 12. A chemical solvent is output to the inside of a connecting tube 32 through a fixed tube 33, and the chemical solvent is sprayed onto the surface of a circuit crystal plate through a splashing module 18. The top of the sleeve 23 is fixed A top plate 24 is installed, a gear ring 22 is fixedly installed on the bottom end of the sleeve 23, a protective ring 25 is slidably installed on the surface of the base 12, two fixed blocks 26 are fixedly installed on the surface of the protective ring 25, and two telescopic rods 27 are fixedly installed on the bottom end of each fixed block 26. Fixed frames 13 are fixedly installed on the two inner side walls of the etcher body 1, and support plates 14 are fixedly installed on the bottom ends of the fixed frames 13. A connecting plate 17 is rotatably installed on the side ends of each fixing frame 13, and a splashing module 18 is fixedly installed on the top of each connecting plate 17.

[0024] Two driving rods 28 are fixedly installed inside the fixed frame 13, and a first connecting seat 29 is fixedly installed on the top of each driving rod 28. By continuing to push the first connecting seat 29, the first connecting seat 29 is moved upward, and the first connecting seat 29 drives the end of the second push rod 31 to slide upward, so that the second push rod 31 moves upward, and a pulling force is applied to the top of the fixed block 26, so that the fixed block 26 drives the protective ring 25 to move upward, and the protective ring 25 slides upward along the surface of the base 12 and slides upward on the top of the support plate 14 at the same time. The top of each first connecting seat 29 is rotatably installed with a first push rod 16, and the side ends of the two first connecting seats 29 are rotatably installed with the same second push rod 31. Two connecting pipes 32 are fixedly installed inside the fixed frame 13, and two fixed pipes 33 are fixedly installed on the top of the support plate 14.

[0025] The side end of each fixed tube 33 is slidably installed with an adjusting sleeve 34, and the bottom end of each adjusting sleeve 34 is rotatably installed with a pull rod 35. The top end of each support plate 14 is rotatably installed with a rotating plate 36, and the two side ends of each rotating plate 36 are slidably installed with a directional sliding rod 38, so that the directional sliding rod 38 slides on the side end of the rotating plate 36, and at the same time, the directional sliding rod 38 drives the two third push rods 41 to move in the opposite direction to reset, and the end of the third push rod 41 pulls the rack 15 to slide, and the rack 15 and the gear ring 22 rub against each other, causing the sleeve 23 to rotate in the opposite direction inside the base 12, and the top plate 24 drives the groove at the top to align with another discharge port inside the base 12, and the end of each directional sliding rod 38 is fixedly installed with a reset rod 37, and the top end of each reset rod 37 is rotatably installed with a second connecting seat 39, and the side end of each second connecting seat 39 is rotatably installed with a third push rod 41, and the end of each third push rod 41 is rotatably installed with a rack 15, and the bottom end of the base 12 is fixedly installed with two drainage tubes 21.

[0026] Working principle:

[0027] In the first step, the circuit crystal board is placed on the top of the base 12, and the driving rod 28 is driven to extend and retract inside the fixing frame 13. The top of the driving rod 28 drives the first connecting seat 29 to slide vertically. The top of the first connecting seat 29 is rotatably connected to the end of the first push rod 16, and the first push rod 16 is pushed to deflect at the top of the first connecting seat 29. The top of the first push rod 16 is rotatably connected to the bottom end of the connecting plate 17, and a thrust is applied to one side of the connecting plate 17 to rotate and deflect the connecting plate 17 around the top. The connecting plate 17 drives the splash module 18 to deflect toward the top of the base 12. At the same time, the moving distance of the first connecting seat 29 is controlled by controlling the driving rod 28, so that the spray of the splash module 18 can be controlled. The shower angle can be adjusted to increase the flexibility of use. By continuing to push the first connecting seat 29, the first connecting seat 29 is moved upward. The first connecting seat 29 drives the end of the second push rod 31 to slide upward, and the second push rod 31 is moved upward. A pulling force is applied to the top of the fixed block 26, so that the fixed block 26 drives the protective ring 25 to move upward. The protective ring 25 slides upward along the surface of the base 12 and slides upward on the top of the support plate 14. The fixed block 26 pulls the top of the telescopic rod 27 to stretch the telescopic rod 27 upward. The stability of the movement of the protective ring 25 is ensured by the telescopic rod 27. By pushing the protective ring 25 upward, the circuit crystal plate at the top of the base 12 is limited and fixed.

[0028] The swivel plate 36 is driven by a motor to rotate the fixed shaft at the bottom end of the rotating plate 36 in the positive direction, driving the rotating plate 36 to deflect, and the two ends of the rotating plate 36 move in opposite directions. The rotating plate 36 drives the pull rod 35 to move and deflect at the bottom end of the adjusting sleeve 34, allowing the adjusting sleeve 34 to slide on the side end of the fixed tube 33 to open the valve inside the adjusting sleeve 34. Conversely, the other support plate 14 moves in the opposite direction. At the same time, the movement of the adjusting sleeve 34 applies a force to the third push rod 41, allowing the third push rod 41 to mobilize the rack 15 to slide horizontally. The third push rod 41 drives the second connecting seat 39 to rotate on the side end of the directional slide rod 38 to ensure that the third push rod 41 slides close to the outer side of the support plate 14. At the same time, the directional slide rod 38 slides on the side end of the rotating plate 36. The directional slide rod 38 pulls the reset rod 37 to retract and retract, and the rack 15 is pushed to slide by the third push rod 41. The inner side of the rack 15 fits with the gear ring 22 to push the sleeve 23 The sleeve 23 rotates inside the base 12, and the top plate 24 rotates inside the groove at the top of the base 12, so that the groove at the top of the top plate 24 is aligned with the groove inside the base 12, and the chemical solvent is output to the inside of the connecting tube 32 through the fixed tube 33, and the chemical solvent is sprayed onto the surface of the circuit crystal plate through the splashing module 18, and a layer of photoresist is sprayed. Then, according to the circuit design of the mask plate, the circuit crystal plate is photoetched through the laser radio frequency module 11, and the photoresist stimulated by light is retained. The materials to be etched are exposed in other places to complete the etching operation. At the same time, when spraying the chemical solvent, the protective rings 25 with rising protrusions on both sides are used to ensure that the solvent will not splash out of the surface of the base 12 during the spraying process, thereby ensuring the cleanliness of the inside of the etcher body 1. At the same time, after the solvent flows on the surface of the circuit crystal plate, the solvent flows downward through the groove on the surface of the top plate 24, which is convenient for collecting and recycling the waste liquid generated by the spraying.

[0029] The second step is that when in use, after the laser radio frequency module 11 etches the circuit crystal plate on the top of the base 12, the rotating plate 36 is rotated in the opposite direction to rotate the rotating plate 36 in the opposite direction at the top of the support plate 14. The rotating plate 36 deflects and pushes the two pull rods 35 to move in the opposite direction to each other, and pushes the two adjustment sleeves 34 to move in the opposite direction to each other at the side ends of the rotating plate 36. One of the fixed tubes 33 is closed and the other fixed tube 33 is opened to close the pipeline for outputting the photoresist, and the cleaning solution is output to the inside of the connecting tube 32 through the other fixed tube 33. At the same time, the rotating plate 36 drives the reset rod 37 to move in the opposite direction, and the directional slide rod 38 slides on the side ends of the rotating plate 36. At the same time, the directional slide rod 38 drives the two third push rods 37 to move in the opposite direction. The rod 41 is reset by reverse movement, and the end of the third push rod 41 pulls the rack 15 to slide. The friction between the rack 15 and the gear ring 22 causes the sleeve 23 to rotate in the opposite direction inside the base 12, and the top plate 24 drives the groove at the top to align with another drain port inside the base 12. The connecting tube 32 and the fixed tube 33 are connected to each other, so that the splash module 18 sprays the cleaning solution on the surface of the circuit crystal board after etching to clean the surface of the circuit crystal board. At the same time, the cleaning solution flows through the groove at the top of the top plate 24 to the left and flows out of another drain port opened inside the base 12. When spraying different chemical solutions, the closure of the drain port is adjusted to allow different spray waste liquids to be recovered accordingly.

[0030] The embodiments of the present invention are given for the purpose of illustration and description, and are not intended to be exhaustive or to limit the invention to the disclosed forms. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments are selected and described in order to better illustrate the principles and practical applications of the present invention and to enable those of ordinary skill in the art to understand the present invention and thereby design various embodiments with various modifications suitable for specific uses.

Claims

1. An etcher with a spray device, comprising an etcher body (1) and a laser radio frequency module (11), characterized in that: A base (12) is fixedly mounted on the bottom end of the inner wall of the etching machine body (1), a sleeve (23) is rotatably mounted inside the base (12), a top plate (24) is fixedly mounted on the top of the sleeve (23), a gear ring (22) is fixedly mounted on the bottom end of the sleeve (23), a protective ring (25) is slidably mounted on the surface of the base (12), two fixed blocks (26) are fixedly mounted on the surface of the protective ring (25), two telescopic rods (27) are fixedly mounted on the bottom end of each of the fixed blocks (26), a fixing frame (13) is fixedly mounted on the two inner side walls of the etching machine body (1), a support plate (14) is fixedly mounted on the bottom end of each of the fixing frames (13), a connecting plate (17) is rotatably mounted on the side end of each of the fixing frames (13), and a splash module (18) is fixedly mounted on the top end of each of the connecting plates (17); The base (12) is provided with two grooves, the top of the top plate (24) is provided with a groove, the end of the telescopic rod (27) is fixedly connected to the top of the support plate (14), and a plurality of nozzles are installed inside the spray module (18); Two driving rods (28) are fixedly mounted inside the fixing frame (13), and a first connecting seat (29) is fixedly mounted on the top end of each driving rod (28); A first push rod (16) is rotatably mounted on the top of each of the first connecting seats (29); The side ends of the two first connecting seats (29) are both rotatably mounted with a same second push rod (31); The end of the second push rod (31) is rotatably connected to the top of the fixed block (26) to apply a pulling force to the fixed block (26).

2. An etching machine with a spray device as claimed in claim 1, characterized in that: Two connecting pipes (32) are fixedly installed inside the fixing frame (13), and two fixing pipes (33) are fixedly installed on the top of the supporting plate (14); Each connecting pipe (32) is connected to the fixing pipe (33) in a through-connection relationship.

3. An etching machine with a spray device as claimed in claim 2, characterized in that: An adjusting sleeve (34) is slidably mounted on the side end of each of the fixing tubes (33), and a pull rod (35) is rotatably mounted on the bottom end of each of the adjusting sleeves (34).

4. An etching machine with a spray device as claimed in claim 1, characterized in that: A rotating plate (36) is rotatably mounted on the top of each support plate (14), and directional sliding rods (38) are slidably mounted on the two side ends of each rotating plate (36); The rotating plate (36) rotates around a fixed axis in the middle section, and the end of the pull rod (35) is rotatably connected to the top end of the rotating plate (36).

5. An etching machine with a spray device as claimed in claim 4, characterized in that: A reset rod (37) is fixedly mounted on the end of each directional slide rod (38), and a second connecting seat (39) is rotatably mounted on the top of each reset rod (37); The end of the directional sliding rod (38) slides inside the rotating plate (36) and pulls the reset rod (37) to extend and retract.

6. An etching machine with a spray device as claimed in claim 5, characterized in that: A third push rod (41) is rotatably mounted on the side end of each second connecting seat (39), and a rack (15) is rotatably mounted on the end of each third push rod (41); The rack (15) slides horizontally inside the etching machine body (1), and the two racks (15) are symmetrically mounted to each other and fit with the surface of the gear ring (22).

7. An etching machine with a spray device as claimed in claim 1, characterized in that: Two drainage pipes (21) are fixedly mounted on the bottom end of the base (12).

Citation Information

Patent Citations

  • Wafer etching rotating mechanism

    CN112435953A

  • Plasma etching machine and etching method thereof

    CN112490107A