A glass cover, a display module, an electronic device, and a method.

Abstract

This application provides a glass cover, a display module, an electronic device, and a method. The glass cover includes: optical glass, and an anti-reflective layer disposed on at least one side of the optical glass. The anti-reflective layer has a multi-layer structure; the layer furthest from the optical glass in the multi-layer structure is a silicon oxynitride layer. The silicon oxynitride layer has high hardness, which can improve the wear resistance and scratch resistance of the glass cover surface. Furthermore, by adjusting the mass percentage of nitrogen and oxygen elements in the silicon oxynitride layer, the refractive index of the silicon oxynitride layer can be effectively controlled, so that the anti-reflective layer can have a low reflectivity, effectively reducing the light reflected into the human eye, thereby achieving excellent eye protection.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a glass cover, display module, electronic device and method. Background Technology

[0002] The glass cover includes optical glass and a functional film layer disposed on one side of the optical glass. The functional film layer includes at least one of an anti-glare layer, an anti-reflective layer, and an anti-fingerprint layer. When the functional film layer includes an anti-reflective layer, the anti-reflective layer is generally a multi-layer structure, and the film layer furthest from the optical glass in the multi-layer structure (i.e., the surface film layer) is a silicon nitride layer or a silicon oxide layer. Although the silicon nitride layer has high hardness, when the silicon nitride layer is used as the surface film layer of the anti-reflective layer, the glass cover cannot have a low reflectivity, and therefore cannot achieve a good eye protection effect. When the silicon oxide layer is used as the surface film layer of the anti-reflective layer, the glass cover cannot have high hardness, and its wear resistance and scratch resistance are poor. Summary of the Invention

[0003] This application provides a glass cover, a display module, an electronic device, and a method, which not only have high hardness, good wear resistance and scratch resistance, but also achieve excellent eye protection.

[0004] In a first aspect, embodiments of this application provide a glass cover plate, comprising: optical glass, and an anti-reflective layer disposed on at least one side of the optical glass, the anti-reflective layer having a multi-layer structure; the film layer furthest from the optical glass in the multi-layer structure is a silicon oxynitride layer. The silicon oxynitride layer has high hardness, which can improve the wear resistance and scratch resistance of the glass cover plate surface; furthermore, by adjusting the mass percentage of nitrogen and oxygen elements in the silicon oxynitride layer, the refractive index of the silicon oxynitride layer can be effectively controlled, allowing the anti-reflective layer to have a low reflectivity, effectively reducing light reflected into the human eye, thereby achieving excellent eye protection. It should be understood that in this application, the multi-layer structure and the anti-reflective layer refer to the same structure and are interchangeable.

[0005] For example, the thickness of the silicon oxynitride layer can be set to be greater than 0 and not greater than 300 nm. Further, the thickness of the silicon oxynitride layer can be set to 90 nm-120 nm, such as, but not limited to, 90 nm, 100 nm, 102 nm, 104 nm, 106 nm, 108 nm, 110 nm, 120 nm, etc. The specific thickness can be set according to actual needs and is not specifically limited here. For example, the greater the thickness of the silicon oxynitride layer, the greater the hardness of the antireflective layer. Therefore, the thickness of the silicon oxynitride layer can be adjusted according to the hardness requirements to meet the needs of different application scenarios. However, when the thickness of the silicon oxynitride layer is greater than 300 nm, it will lead to an increase in the reflectivity of the glass cover, which will increase discomfort to the human eye. Therefore, setting the thickness of the silicon oxynitride layer within an appropriate range can give the glass cover good wear resistance and scratch resistance, and also provide eye protection.

[0006] For example, the multilayer structure further includes: at least one first oxide layer and at least one second oxide layer, wherein the refractive index of the first oxide layer is greater than that of the second oxide layer; when at least two first oxide layers are provided and at least one second oxide layer is provided, or when multiple first and second oxide layers are provided, the first oxide layer and the second oxide layer are alternately provided; the refractive index of the first oxide layer is greater than that of the silicon oxynitride layer, and the silicon oxynitride layer is in contact with one of the first oxide layers. Thus, the multilayer structure formed by alternating high-refractive-index and low-refractive-index film layers can effectively reduce the reflectivity of light incident on the surface of the antireflection layer and increase the transmittance of the antireflection layer. This not only improves the light transmittance of the glass cover and thus the display effect when applied to a display module, but also avoids damage to the human eye, improves viewing comfort, and achieves a better eye protection effect. It should be understood that the reflectivity of the multilayer structure can be adjusted by combining film layers with different refractive indices in the multilayer structure. Furthermore, by adjusting the number and thickness of the first and second oxide layers, the appearance color of the antireflective layer can be adjusted. This allows the antireflective layer to display different colors to meet the needs of various application scenarios. For example, in the Lab color space, the appearance color of the glass cover can be determined by -2.5 ≤ a ≤ 2.5 and -8 ≤ b ≤ 2. Here, L represents brightness, a represents red-green (positive values ​​represent red, negative values ​​represent green), and b represents yellow-blue (positive values ​​represent yellow, negative values ​​represent blue). In this case, the glass cover can present a colorless, bluish appearance. When applied to a display module, this glass cover can give the display surface a good integrated black effect and a clear, non-black effect, conveying a sense of sophistication.

[0007] When there is one first oxide layer and one second oxide layer, the resulting multilayer structure consists of a second oxide layer, a first oxide layer, and a silicon oxynitride layer stacked sequentially, forming a multilayer structure with low-refractive-index, high-refractive-index, and low-refractive-index film layers. Alternatively, when there are two first oxide layers and two second oxide layers, the resulting multilayer structure consists of a second oxide layer, a first oxide layer, a second oxide layer, a first oxide layer, and a silicon oxynitride layer stacked sequentially, forming a multilayer structure with low-refractive-index, high-refractive-index, low-refractive-index, high-refractive-index, and low-refractive-index film layers. Or, when there are two first oxide layers and one second oxide layer, the resulting multilayer structure consists of a first oxide layer, a second oxide layer, a first oxide layer, and a silicon oxynitride layer stacked sequentially, forming a multilayer structure with high-refractive-index, low-refractive-index, high-refractive-index, and low-refractive-index film layers. Alternatively, when there are three first oxide layers and two second oxide layers, the resulting multilayer structure is: a first oxide layer, a second oxide layer, a first oxide layer, a second oxide layer, a first oxide layer, and a silicon oxynitride layer stacked sequentially, thus forming a multilayer structure with high refractive index layers, low refractive index layers, high refractive index layers, low refractive index layers, high refractive index layers, and low refractive index layers. Of course, the number of first and second oxide layers is not limited to those mentioned in the examples above; other numbers can be used depending on actual needs, and no specific limitation is made here. Furthermore, when the second oxide layer is the closest layer to the optical glass in the multilayer structure, the number of first and second oxide layers can be the same; when the first oxide layer is the closest layer to the optical glass, the number of first oxide layers is always one more than the number of second oxide layers.

[0008] Furthermore, the material for the first oxide layer can include titanium tin oxide or silicon nitride, or other materials with high refractive indexes, which can be specifically selected according to actual needs. The material for the second oxide layer can include silicon oxide or other materials with low refractive indexes, which can be specifically selected according to actual needs. When the first oxide layer is made of titanium tin oxide and the second oxide layer is made of silicon oxide, and there are three first oxide layers and two second oxide layers, the multilayer structure can include: a titanium tin oxide layer, a silicon oxide layer, a titanium tin oxide layer, a silicon oxide layer, a titanium tin oxide layer, and a silicon nitride layer stacked sequentially along the direction from the optical glass to the silicon nitride layer. The titanium tin oxide layer has very good adhesion to the optical glass, allowing it to adhere firmly to the surface of the optical glass, reducing the risk of detachment and improving the stability of the glass cover. Moreover, there is only one oxide of tin, namely tin dioxide, and only one oxide of titanium, namely titanium dioxide. Therefore, the titanium tin oxide layer has high stability, effectively avoiding the problem of reduced adhesion due to material instability, thereby further improving the stability of the glass cover. It should be understood that tin dioxide exhibits significant absorption in short wavelengths such as 450nm-300nm. Therefore, doping tin dioxide with a certain proportion of titanium dioxide to form a tin oxide titanium layer can improve the situation of large short-wave absorption, thereby effectively improving the transmittance of the antireflection layer.

[0009] Furthermore, when the layers in the multilayer structure are sequentially configured as follows, along the direction from the optical glass to the antireflection layer: first oxide layer, second oxide layer, first oxide layer, second oxide layer, first oxide layer, and silicon oxynitride layer, the thickness of the first first oxide layer can be set to 5nm-15nm, the thickness of the first second oxide layer can be set to 40nm-50nm, the thickness of the second first oxide layer can be set to 30nm-40nm, the thickness of the second second oxide layer can be set to 50nm-60nm, and the thickness of the silicon oxynitride layer can be set to 90nm-120nm. The specific settings can be adjusted according to actual needs and are not specifically limited here.

[0010] For example, the optical glass includes a bonding surface and a non-bonded surface facing each other. The glass cover may also include an anti-fingerprint layer, which is disposed on the non-bonded surface. When an anti-reflective layer is provided on the non-bonded surface, the anti-reflective layer is disposed between the anti-fingerprint layer and the optical glass. That is, an anti-reflective layer and an anti-fingerprint layer are sequentially stacked on the non-bonded surface of the optical glass, and compared with the anti-reflective layer, the anti-fingerprint layer is farther away from the optical glass, while the anti-reflective layer is closer to the optical glass. An anti-reflective layer may or may not be provided on the bonding surface of the optical glass, depending on actual needs, and is not specifically limited here. At this point, the layer closest to the anti-fingerprint layer in the antireflective layer is the silicon oxynitride layer, and the anti-fingerprint layer is formed on the surface of the silicon oxynitride layer. The surface of the silicon oxynitride layer generally contains Si-OH groups. When the material used to make the anti-fingerprint layer contains -Si-OH groups, Si-OH can undergo dehydration condensation with the -Si-OH groups to form -Si-O-Si-, which enables chemical bonding between the silicon oxynitride layer and the anti-fingerprint layer. This increases the bonding strength between the antireflective layer and the anti-fingerprint layer, prevents the anti-fingerprint layer from falling off, and thus improves the stability and reliability of the glass cover.

[0011] Furthermore, the water droplet contact angle on the side surface of the glass cover with the anti-fingerprint layer can be greater than 110°, giving the surface of the glass cover a large water droplet contact angle, which in turn gives the surface of the glass cover hydrophobic and oleophobic properties, and can also effectively improve the wear resistance and scratch resistance of the glass cover.

[0012] For example, the surface of the optical glass facing the anti-reflective layer is rough. Taking the non-bonded surface of the glass cover plate with an anti-reflective layer as an example, the non-bonded surface is rough, meaning it has an uneven microstructure or crystalline particles, making it not a smooth surface. The roughness of the non-bonded surface is increased by the microstructure or crystalline particles. It is worth noting that the microstructure or crystalline particles of the non-bonded surface can play a role in anti-glare. Therefore, the microstructure or crystalline particles can be regarded as an anti-glare layer. In other words, this situation can be understood as follows: no additional film layer for achieving anti-glare effect is set on the non-bonded surface of the optical glass. Instead, the non-bonded surface is specially treated and a special structure is used as an anti-glare layer. That is, the anti-glare layer is part of the optical glass. Therefore, this kind of optical glass with a special surface structure can also be called AG glass, that is, optical glass with anti-glare function. Thus, this type of anti-glare layer has good performance in terms of wear resistance, weather resistance, and film bonding strength.

[0013] Furthermore, after an anti-reflective layer is formed on the uneven, non-bonded surface of the optical glass, the side of the glass cover plate with the anti-reflective layer will also be an uneven, rough surface, and the roughness of this surface will be slightly different from that of the non-bonded surface.

[0014] When the layer furthest from the optical glass in a multilayer structure is a silicon oxynitride layer, tests have shown that the refractive index of the silicon oxynitride layer can be approximately 1.51%, and the reflectivity of the glass cover can be no more than 5.5%. This can effectively reduce the light reflected into the human eye, thereby achieving an effective eye protection effect and improving user comfort.

[0015] Secondly, embodiments of this application also provide a method for manufacturing a glass cover plate. This method is used to manufacture a glass cover plate as described in the first aspect and any embodiment thereof. The method may include: forming an anti-reflective layer on at least one side of an optical glass; wherein the anti-reflective layer has a multi-layer structure, and the film layer furthest from the optical glass in the multi-layer structure is a silicon oxynitride layer. Thus, the manufactured glass cover plate not only has high hardness, good wear resistance, and scratch resistance, but also achieves a good eye protection effect.

[0016] For example, taking the case where three first oxide layers and two second oxide layers are provided, forming an antireflection layer may specifically include: forming a first oxide layer on at least one surface of the optical glass; forming a second oxide layer on top of the first oxide layer, wherein the refractive index of the first oxide layer is greater than that of the second oxide layer; forming a first oxide layer on top of the second oxide layer; forming a second oxide layer on top of the first oxide layer; forming a first oxide layer on top of the second oxide layer; forming a silicon oxynitride layer on top of the first oxide layer; each first oxide layer, each second oxide layer, and the silicon oxynitride layer constitute the antireflection layer. Of course, when there are two, four, or more first oxide layers and one, three, or more second oxide layers, the fabrication process of the antireflection layer is similar to the above process, only requiring adaptive deletion or addition of relevant steps according to the number of first and second oxide layers, which will not be detailed here. Alternatively, when the number of first and second oxide layers is the same, the fabrication process of the antireflection layer is also similar to the above process, only requiring adaptive deletion or addition of relevant steps according to the number of first and second oxide layers, which will not be detailed here. The materials used to fabricate the first oxide layers can be the same or different, and the materials used to fabricate the second oxide layers can also be the same or different. The materials used to fabricate the first oxide layers can include, but are not limited to, materials with high refractive indices such as titanium tin oxide or silicon nitride, while the materials used to fabricate the second oxide layers can include, but are not limited to, materials with low refractive indices such as silicon oxide. Furthermore, each layer in the antireflection layer can be fabricated using, but is not limited to, magnetron sputtering. Of course, other methods known to those skilled in the art can also be used, and no specific limitations are made here.

[0017] For example, the manufacturing method may further include: etching at least one surface of the optical glass before forming the anti-reflection layer, such that the etched surface is roughened, wherein when the side surface of the optical glass on which the anti-reflection layer is formed is roughened, the anti-reflection layer is formed on the roughened surface. This allows an anti-glare layer to be formed on the surface of the optical glass, achieving the purpose of anti-glare.

[0018] The process of manufacturing the anti-glare layer may include: cleaning the optical glass; forming a protective layer on one side of the optical glass, wherein the material of the protective layer may be, but is not limited to, ink; selecting a neutral cleaning agent and performing ultrasonic cleaning; frosting and chemical polishing on the other side of the optical glass, wherein the chemical polishing may be, but is not limited to, using a low concentration of hydrofluoric acid; selecting a neutral cleaning agent and performing a second ultrasonic cleaning to remove impurities and form crystalline particles.

[0019] Thus, on the one hand, the protective layer can prevent damage to the surface during subsequent chemical polishing; on the other hand, since strong acidic and alkaline cleaning solutions can damage the protective layer, using a neutral cleaning solution can avoid damage to the protective layer, thereby improving the protective effect of the protective layer; furthermore, using low-concentration hydrofluoric acid can reduce the pressure on wastewater treatment and reduce the risk of environmental pollution.

[0020] For example, the manufacturing method may further include: after forming the anti-reflective layer, and when the anti-reflective layer is disposed on the non-bonded surface of the optical glass, forming an anti-fingerprint layer on the silicon oxynitride layer located on the non-bonded surface, thereby enabling the glass cover to have an anti-fingerprint function.

[0021] When forming the anti-fingerprint layer, any feasible method known to those skilled in the art can be used, such as, but not limited to, spraying or vapor deposition processes, and is not limited herein.

[0022] Taking the spraying process as an example, the silicon oxynitride layer can be pretreated before spraying. This pretreatment can include polishing and plasma cleaning. Polishing removes loosely bonded silica from the silicon oxynitride layer surface, increasing the adhesion between the anti-fingerprint layer and the silicon oxynitride layer. Plasma cleaning removes oil and other impurities from the silicon oxynitride layer surface, also increasing adhesion. The tools and conditions used for polishing, as well as the conditions for plasma cleaning, can be adjusted according to actual needs and are not specifically limited here. The spraying process can include: spraying the coating solution onto the silicon oxynitride layer; then, using, but not limited to, a tunnel oven, curing and allowing it to stand at 120℃-180℃ to solidify the coating solution into a film; finally, cleaning the film surface.

[0023] Therefore, using a spray coating process to create an anti-fingerprint layer has the following advantages: First, it not only significantly shortens the production time and increases capacity, but also improves the adhesion between the anti-fingerprint layer and the silicon oxynitride layer, preventing peeling. Second, the spray coating process allows for lower film concentrations, achieving coating effects exceeding those of vapor deposition, and is simpler, more operable, and less costly. Third, temperatures exceeding 180℃ cause chemical bond breakage, accelerating film aging and affecting film formation, while a curing temperature of 120℃-180℃ avoids chemical bond breakage, thus improving film formation. Fourthly, the use of a tunnel furnace during heat treatment effectively removes excess surface moisture, resulting in better adhesion between the anti-fingerprint layer and the silicon oxynitride layer. Simultaneously, at high temperatures, the Si-OH groups on the silicon oxynitride layer surface rapidly undergo dehydration condensation with the -Si-OH groups in the coating solution upon contact with the solution, quickly forming a cross-linked network containing -Si-O-Si- groups. This achieves chemical bonding between the silicon oxynitride layer and the anti-fingerprint layer, increasing the adhesion of the anti-fingerprint layer to the silicon oxynitride layer surface. Fifthly, when the coating solution is a fluoropolymer with active hydroxyl groups at the ends, the fluoropolymer at one end has extremely low surface energy, causing water droplets to shrink into beads, exhibiting hydrophobic and oleophobic properties. This allows the side of the glass cover with the anti-fingerprint layer to have a larger water droplet contact angle.

[0024] It should be understood that since the principle of the glass cover plate produced by this manufacturing method is similar to that of the aforementioned glass cover plate, the implementation and technical effects of this manufacturing method can be found in the aforementioned implementation and technical effects of the glass cover plate, and the repeated parts will not be repeated.

[0025] Thirdly, embodiments of this application also provide a display module, which may include: a display component and a glass cover as described in the first aspect and any of the embodiments described above, the glass cover being disposed on the display surface of the display component. Based on the glass cover having high hardness, good wear resistance, scratch resistance, and achieving good eye protection, the display module also has high hardness, good wear resistance, scratch resistance, and achieves good eye protection.

[0026] For example, the appearance color of the display surface of the display module is in the Lab color space, where -3≤a≤3 and -12≤b≤1. In this case, the appearance color of the display surface is black, resulting in a better overall black effect and a more sophisticated look when the screen is off, thus enhancing the user experience. Furthermore, the maximum color change between two adjacent test areas can be set to ≤1.5, and the maximum color change between any two test areas can be set to ≤3. This ensures better optical consistency of the display surface, especially in terms of color uniformity when the screen is off, thereby improving the display effect. It should be understood that when testing the color displayed on the display surface, the testing equipment can be used at any location on the display surface, and the area sampled during testing is the test area.

[0027] For example, the reflectivity of the display surface of the display module is no more than 2.5%, which can effectively reduce the light reflected into the human eye, thereby achieving an effective eye protection effect.

[0028] It should be understood that since the principle by which this display module solves the problem is similar to that of the aforementioned glass cover plate, the implementation and technical effects of this display module can be found in the implementation and technical effects of the aforementioned glass cover plate, and the repetitions will not be repeated.

[0029] Fourthly, embodiments of this application also provide an electronic device, which may include: a frame, and a display module as described in the second aspect and any of the embodiments described above, wherein the display module is fixed to the frame. Based on the display module having high hardness, good wear resistance, scratch resistance, and achieving good eye protection, the electronic device also has high hardness, good wear resistance, scratch resistance, and achieves good eye protection.

[0030] It should be understood that since the principle by which this electronic device solves the problem is similar to that of the aforementioned display module, the implementation and technical effects of this electronic device can be found in the implementation and technical effects of the aforementioned display module, and the repetitions will not be repeated. Attached Figure Description

[0031] Figure 1 This is a schematic diagram of the structure of the electronic device provided in the embodiments of this application;

[0032] Figure 2 This is a schematic diagram of the structure of a glass cover provided in an embodiment of this application;

[0033] Figure 3 This is a schematic diagram of another glass cover provided in an embodiment of this application;

[0034] Figure 4 This is a schematic diagram of the structure of another glass cover provided in an embodiment of this application;

[0035] Figure 5 A microscopic morphology diagram of the first surface of the optical glass provided in an embodiment of this application;

[0036] Figure 6 A schematic diagram illustrating the manufacturing process of an optical glass according to an embodiment of this application;

[0037] Figure 7 A schematic diagram illustrating the manufacturing process of another type of optical glass provided in an embodiment of this application;

[0038] Figure 8 A schematic diagram illustrating the manufacturing process of yet another type of optical glass provided in this application embodiment;

[0039] Figure 9 This is a photograph taken after friction during a stylus drawing test in Example 1;

[0040] Figure 10 This is a photograph taken after friction during the metal scribing test in Example 1. Detailed Implementation

[0041] To make the objectives, technical solutions, and advantages of this application clearer, the application will now be described in further detail with reference to the accompanying drawings.

[0042] It should be noted that the same reference numerals in the accompanying drawings of this application denote the same or similar structures, and therefore repeated descriptions of them will be omitted. Terms expressing position and direction described in this application are illustrative based on the accompanying drawings, but may be modified as needed, and all such modifications are included within the scope of protection of this application. The accompanying drawings of this application are for illustrating relative positional relationships only and do not represent actual scale.

[0043] To facilitate understanding of the technical solutions provided in the embodiments of this application, the application scenarios will be explained first below.

[0044] The technical solutions provided in this application can be widely applied in various electronic devices, which may include various terminal devices. These terminal devices may include, but are not limited to, smartphones, smart TVs, smart TV set-top boxes, smartwatches, personal computers (PCs), wearable devices, smart broadband, in-vehicle displays, smart door locks, tablets, and any other devices with display functions; they are not listed here.

[0045] Figure 1 An exemplary schematic diagram of an electronic device is shown, with reference to Figure 1As shown, the electronic device includes a frame 100 and a display module 200. The frame 100 is used to fix the display module 200, so that the display module 200 is fixed on the frame 100. The display module 200 includes a display component 210 and a glass cover 220. The glass cover 220 is disposed on the display surface of the display component 210, that is, the glass cover 220 covers the display component 210. The glass cover 220 can be used to prevent external damage to the display component 210 and can play a protective role for the display component 210. The screen displayed on the display component 210 can also be seen through the glass cover 220 so that the user can view it.

[0046] The display component can be a liquid crystal display (LCD) component based on liquid crystal display technology. In this case, the LCD component includes: an array substrate and a counter substrate placed opposite each other, a liquid crystal layer disposed between the array substrate and the counter substrate, and a polarizer disposed on the surface of the counter substrate facing away from the array substrate. The array substrate has pixel electrodes and a common electrode. The voltage applied to the pixel electrodes and the voltage applied to the common electrode can drive the liquid crystal molecules in the liquid crystal layer to rotate, allowing light to pass through the liquid crystal molecules. Furthermore, a color filter can be disposed in the counter substrate to enable the LCD component to display color images. It should be understood that the common electrode can be disposed not only in the array substrate but also in the counter substrate; the specific placement depends on actual needs and is not specifically limited here.

[0047] Alternatively, the display component can be an OLED display component based on OLED (Organic Light-Emitting Diode) technology. In this case, the OLED display component includes: connected pixel circuits and light-emitting units. The light-emitting units include: an anode, a light-emitting layer, and a cathode. The anode is connected to the pixel circuit, and the pixel circuit can provide a certain voltage to the anode. With a certain voltage also provided in the cathode, the light-emitting layer can be excited to emit light, thereby realizing the display function. The specific type of display component can be selected according to actual needs and is not specifically limited here.

[0048] The glass cover includes optical glass and a functional film layer disposed on one side of the optical glass. The functional film layer includes at least one of an anti-glare layer, an anti-reflective layer, and an anti-fingerprint layer. When the functional film layer includes an anti-reflective layer, the anti-reflective layer is generally a multi-layer structure, and the film layer furthest from the optical glass in the multi-layer structure (i.e., the surface film layer) is a silicon nitride layer or a silicon oxide layer. Although the silicon nitride layer has high hardness, when the silicon nitride layer is used as the surface film layer of the anti-reflective layer, the glass cover cannot have a low reflectivity, and therefore cannot achieve a good eye protection effect. When the silicon oxide layer is used as the surface film layer of the anti-reflective layer, the glass cover cannot have high hardness, and its wear resistance and scratch resistance are poor.

[0049] Therefore, this application provides a glass cover plate, which includes: optical glass and an anti-reflective layer disposed on at least one side of the optical glass. The anti-reflective layer has a multi-layer structure; the film layer furthest from the optical glass in the multi-layer structure is a silicon oxynitride layer. The silicon oxynitride layer has high hardness, which can improve the wear resistance and scratch resistance of the glass cover plate surface; and, by adjusting the mass percentage of nitrogen and oxygen elements in the silicon oxynitride layer, the refractive index of the silicon oxynitride layer can be effectively controlled, so that the anti-reflective layer can have a low reflectivity, effectively reducing the light reflected into the human eye, thereby achieving excellent eye protection.

[0050] The following will provide a detailed description with reference to specific embodiments.

[0051] Figure 2 An exemplary schematic diagram of a glass cover plate provided in an embodiment of this application is shown below. See also: Figure 2 As shown, the glass cover may include optical glass 10 and an anti-reflective layer 20. The optical glass 10 has a bonding surface b2 and a non-bonding surface b1 facing each other. When the glass cover is applied to a display module, the bonding surface b2 can be considered as the surface of the optical glass 10 facing the display component, and the non-bonding surface b1 can be considered as the surface of the optical glass 10 facing away from the display component. Furthermore, the anti-reflective layer 20 is provided on at least one of the bonding surface b2 and the non-bonding surface b1; for example, as... Figure 2 As shown in (a), the bonding surface b2 is provided with an anti-reflective layer 20, but the non-bonding surface b1 is not provided with an anti-reflective layer 20; or, as ... Figure 2 As shown in (c), the non-adhesive surface b1 has an anti-reflective layer 20, but the adhesive surface b2 does not have an anti-reflective layer 20; or, as ... Figure 2 As shown in (b) above, both the bonding surface b2 and the non-bonding surface b1 are provided with an anti-reflective layer 20. The specific configuration can be adjusted according to actual needs and is not limited here. It should be understood that, for the sake of simplicity... Figure 2 The complexity of (a) and (b) in the diagram is so... Figure 2 The specific membrane structure included in the antireflection layer 20 is not shown in (a) and (b), but Figure 2 The specific membrane structure of the antireflection layer 20 shown in (c) can be applied to Figure 2 The anti-reflective layer 20 in (a) and (b), of course, Figure 2 The specific membrane structure of the antireflection layer 20 shown in (d) can also be applied to Figure 2 Anti-reflection layer 20 in (a) and (b). That is to say, Figure 2 The specific film structure included in the antireflection layer 20 in (a) can be as follows: Figure 2 The antireflective layer 20 in (c) is shown or as shown Figure 2 As shown in (d) of the anti-reflection layer 20, Figure 2 The specific film structure included in the antireflection layer 20 in (b) can be as follows: Figure 2 The antireflective layer 20 in (c) is shown or as shown Figure 2 The anti-reflection layer 20 in (d) is shown.

[0052] Tests revealed that when the silicon oxynitride layer 23 is the layer furthest from the optical glass 10 in the multilayer structure, its refractive index can be approximately 1.51%, and the reflectivity of the glass cover can be no greater than 5.5%. This effectively reduces the amount of light reflected into the human eye, thus achieving effective eye protection and improving user comfort. Furthermore, when this glass cover is applied to a display module, the reflectivity of the display surface of the display module is no greater than 2.5%, effectively reducing the amount of light reflected into the human eye and achieving effective eye protection.

[0053] See also Figure 2 As shown, the multilayer structure may further include: at least one first oxide layer 21 and at least one second oxide layer 22, wherein the refractive index of the first oxide layer 21 is greater than the refractive index of the second oxide layer 22; when at least two first oxide layers 21 are provided and at least one second oxide layer 22 is provided, or when multiple first oxide layers 21 and multiple second oxide layers 22 are provided, the first oxide layer 21 and the second oxide layer 22 are alternately provided; the refractive index of the first oxide layer 21 is greater than the refractive index of the silicon oxynitride layer 23, and the silicon oxynitride layer 23 is in contact with one of the first oxide layers 21.

[0054] In some cases, when there is one first oxide layer 21 and one second oxide layer 22 (not shown in the diagram), the resulting multilayer structure consists of a second oxide layer 22, a first oxide layer 21, and a silicon oxynitride layer 23 stacked sequentially, forming a multilayer structure with low-refractive-index, high-refractive-index, and low-refractive-index layers. Alternatively, when there are two first oxide layers 21 and two second oxide layers 22 (not shown in the diagram), the resulting multilayer structure consists of a second oxide layer 22, a first oxide layer 21, a second oxide layer 22, a first oxide layer 21, and a silicon oxynitride layer 23 stacked sequentially, forming a multilayer structure with low-refractive-index, high-refractive-index, low-refractive-index, high-refractive-index, and low-refractive-index layers. Alternatively, when there are two first oxide layers 21 and one second oxide layer 22, as shown in the diagram... Figure 2 As shown in (c), the multilayer structure formed is as follows: a first oxide layer 21, a second oxide layer 22, a first oxide layer 21, and a silicon oxynitride layer 23 are stacked sequentially, thus forming a high-refractive-index film layer, a low-refractive-index film layer, a high-refractive-index film layer, and a low-refractive-index film layer arrangement in the multilayer structure. Alternatively, when there are three first oxide layers 21 and two second oxide layers 22, as shown in (c), the multilayer structure is formed as follows. Figure 2 As shown in (d), the multilayer structure formed is as follows: a first oxide layer 21, a second oxide layer 22, a first oxide layer 21, a second oxide layer 22, a first oxide layer 21, and a silicon oxynitride layer 23 are stacked sequentially, thus forming a high refractive index film layer, a low refractive index film layer, a high refractive index film layer, a low refractive index film layer, a high refractive index film layer, and a low refractive index film layer in the multilayer structure. Of course, the number of the first oxide layer and the second oxide layer is not limited to the number mentioned in the example above, and can be other numbers set according to actual needs, which are not specifically limited here. Furthermore, when the second oxide layer 22 is the film layer closest to the optical glass 10 in the multilayer structure, the number of the first oxide layer 21 and the second oxide layer 22 can be the same. When the first oxide layer 21 is the film layer closest to the optical glass 10 in the multilayer structure, the number of the first oxide layer 21 is always the number of the second oxide layer 22 plus one.

[0055] Along the direction from the optical glass 10 to the anti-reflection layer 20, such as Figure 2 In the F1 direction shown, when the layers in the multilayer structure are sequentially configured as: first oxide layer 21, second oxide layer 22, first oxide layer 21, second oxide layer 22, first oxide layer 21, and silicon oxynitride layer 23, the thickness of the first first oxide layer can be set to 5nm-15nm, the thickness of the first second oxide layer can be set to 40nm-50nm, the thickness of the second first oxide layer can be set to 30nm-40nm, the thickness of the second second oxide layer can be set to 50nm-60nm, and the thickness of the silicon oxynitride layer 23 can be set to be greater than 0 and not greater than 300nm. Furthermore, the thickness of the silicon oxynitride layer 23 can be set to 90nm-120nm, such as, but not limited to, 90nm, 100nm, 102nm, 104nm, 106nm, 108nm, 110nm, 120nm, etc. The specific thickness can be set according to actual needs and is not specifically limited here. For example, the greater the thickness of the silicon oxynitride layer 23, the greater the hardness of the antireflective layer 20. Therefore, the thickness of the silicon oxynitride layer 23 can be adjusted according to the hardness requirements to meet the needs of different application scenarios. However, when the thickness of the silicon oxynitride layer 23 is greater than 300nm, it will lead to an increase in the reflectivity of the glass cover, which will increase discomfort to the human eye. Therefore, setting the thickness of the silicon oxynitride layer 23 within a suitable range can not only make the glass cover have good wear resistance and scratch resistance, but also have the effect of protecting the eyes.

[0056] It should be understood that when multiple first oxide layers 21 and multiple second oxide layers 22 are provided in the multilayer structure, the thickness of each first oxide layer 21 increases sequentially along the direction from the optical glass 10 to the antireflection layer 20, and the thickness difference between two adjacent first oxide layers 21 can be set to 10nm-20nm. Similarly, the thickness of each second oxide layer 22 also increases sequentially, and the thickness difference between two adjacent second oxide layers 22 can also be set to 10nm-20nm.

[0057] In this way, the multilayer structure formed consists of alternating layers with high refractive index and low refractive index. This effectively reduces the reflectivity of light incident on the surface of the antireflection layer 20 and increases the transmittance of the antireflection layer 20. This not only improves the light transmittance of the glass cover and thus the display effect when applied to the display module, but also avoids damage to the human eye, improves the comfort of human eyes when viewing, and achieves a better eye protection effect.

[0058] Furthermore, by adjusting the number of layers of the first oxide layer 21 and the second oxide layer 22, as well as their thicknesses, the appearance color of the antireflection layer 20 can be adjusted. This allows the antireflection layer 20 to display different appearance colors according to actual application requirements, meeting the needs of different application scenarios. For example, in the Lab color space, the appearance color of the glass cover is -2.5≤a≤2.5, -8≤b≤2. Here, L represents brightness, a represents red-green (positive values ​​represent red, negative values ​​represent green), and b represents yellow-blue (positive values ​​represent yellow, negative values ​​represent blue). In this case, the glass cover can present a colorless, bluish appearance. When this glass cover is applied to a display module, it can give the display surface a good integrated black effect and a clear, high-end look.

[0059] Furthermore, when this glass cover is applied to the display module, if the Lab color space is used to represent the appearance color of the display surface of the display module, then in the Lab color space, -3≤a≤3, -12≤b≤1. In this case, the appearance color of the display surface of the display module is black, allowing the display surface to have a better integrated black effect and a more sophisticated look when the screen is off, thus improving the user experience. Moreover, the maximum color change between two adjacent test areas can be set to ≤1.5, and the maximum color change between any two test areas can be set to ≤3. This allows the display surface of the display module to have better optical consistency, especially better uniformity of appearance color when the screen is off, thereby improving the display effect of the display module. It should be understood that when testing the color presented by the display surface of the display module, the testing equipment can be used at any position on the display surface, and the area sampled on the display surface during testing is the test area. When the test area is circular, its diameter can be, but is not limited to, 3mm.

[0060] For example, the material used to fabricate the first oxide layer 21 may include titanium tin oxide or silicon nitride, or other materials with a high refractive index, and can be specifically chosen according to actual needs. The material used to fabricate the second oxide layer 22 may include silicon oxide or other materials with a low refractive index, and can be specifically chosen according to actual needs.

[0061] For example, when the first oxide layer 21 is made of titanium tin oxide and the second oxide layer 22 is made of silicon oxide, and there are three first oxide layers 21 and two second oxide layers 22, the multilayer structure can be specifically configured as follows: along the direction from the optical glass 10 to the silicon oxynitride layer 23, a titanium tin oxide layer, a silicon oxide layer, a titanium tin oxide layer, a silicon oxide layer, a titanium tin oxide layer, and a silicon oxynitride layer 23 are stacked sequentially. In this case, the antireflective layer 20 can have a Mohs hardness greater than 6, a Vickers hardness greater than 800, and a pencil hardness greater than 9H, exhibiting high hardness. The titanium tin oxide layer has excellent adhesion to the optical glass 10, allowing it to firmly adhere to the surface of the optical glass 10, reducing the risk of detachment and improving the stability of the glass cover. Furthermore, there is only one oxide of tin, namely tin dioxide, and only one oxide of titanium, namely titanium dioxide. Therefore, the titanium tin oxide layer has high stability, effectively avoiding the problem of reduced adhesion due to material instability, thereby further improving the stability of the glass cover. It should be understood that tin dioxide has significant absorption in short wavelengths such as 450nm-300nm. Therefore, doping tin dioxide with a certain proportion of titanium dioxide to form a tin oxide titanium layer can improve the situation of large short-wave absorption, thereby effectively improving the transmittance of the antireflection layer 20.

[0062] For example, when the material of the first oxide layer 21 is silicon nitride and the material of the second oxide layer 22 is silicon oxide, and the first oxide layer 21 is set to three and the second oxide layer 22 is set to two, the multilayer structure can be specifically as follows: silicon nitride layer, silicon oxide layer, silicon nitride layer, silicon oxide layer, silicon nitride layer, and silicon oxynitride layer 23 are stacked in sequence.

[0063] Figure 3 An exemplary schematic diagram of another glass cover plate provided in an embodiment of this application is shown. See also... Figure 3 As shown, the structure of the glass cover in this embodiment is the same as that in the previous embodiments. Figure 2 The glass cover plates described are basically similar in structure, except that the non-adhesive surface b1 is also provided with an anti-fingerprint layer 30. For example, see... Figure 3 As shown, the glass cover may also include an anti-fingerprint layer 30, which is disposed on the non-adhesive surface b1. Furthermore, when an anti-reflective layer 20 is provided on the non-adhesive surface b1, the anti-reflective layer 20 is disposed between the anti-fingerprint layer 30 and the optical glass 10. That is, the anti-reflective layer 20 and the anti-fingerprint layer 30 are sequentially stacked on the non-adhesive surface b1 of the optical glass 10, and compared to the anti-reflective layer 20, the anti-fingerprint layer 30 is farther from the optical glass 10, while the anti-reflective layer 20 is closer to the optical glass 10. On the adhesive surface b2 of the optical glass 10, an anti-reflective layer 20 (not shown) may be provided, or it may be absent (e.g., ...). Figure 3 As shown in the figure, the specific settings can be configured according to actual needs, and are not specifically limited here. It should be understood that when the anti-reflective layer 20 is not provided on the non-adhesive surface b1, the non-adhesive surface b1 will also be provided with the anti-fingerprint layer 30. In other words, in this embodiment, the structure of the glass cover to be protected includes: the adhesive surface b2 is provided with the anti-reflective layer 20 and the non-adhesive surface b1 is provided with the anti-fingerprint layer 30; or the adhesive surface b2 is a smooth surface and the non-adhesive surface b1 is provided with the anti-reflective layer 20 and the anti-fingerprint layer 30 in sequence; or the adhesive surface b2 is provided with the anti-reflective layer 20 and the non-adhesive surface b1 is provided with the anti-reflective layer 20 and the anti-fingerprint layer 30 in sequence.

[0064] At this point, the layer closest to the anti-fingerprint layer 30 in the antireflective layer 20 is the silicon oxynitride layer 23, and the anti-fingerprint layer 30 is formed on the surface of the silicon oxynitride layer 23. The surface of the silicon oxynitride layer 23 generally contains Si-OH groups. When the material used to make the anti-fingerprint layer 30 contains -Si-OH groups, Si-OH can undergo dehydration condensation with the -Si-OH groups to form -Si-O-Si-, thereby achieving chemical bonding between the silicon oxynitride layer 23 and the anti-fingerprint layer 30. This increases the bonding strength between the antireflective layer 20 and the anti-fingerprint layer 30, prevents the anti-fingerprint layer 30 from falling off, and thus improves the stability and reliability of the glass cover.

[0065] Furthermore, the water droplet contact angle on the side surface of the glass cover where the anti-fingerprint layer 30 is provided can be greater than 110°, which gives the surface of the glass cover a large water droplet contact angle, thereby giving the surface of the glass cover a hydrophobic and oleophobic function, and can also effectively improve the wear resistance and scratch resistance of the glass cover.

[0066] It should be understood that the structure of the glass cover plate described in this embodiment is different from that in the previous embodiments. Figure 2 The similarities in the structure of the glass cover plates described above can be found in the relevant descriptions in the foregoing embodiments; repeated details will not be repeated here.

[0067] Figure 4 An exemplary schematic diagram of another glass cover plate provided in an embodiment of this application is shown. See also... Figure 4 As shown, the structure of the glass cover in this embodiment is the same as that in the previous embodiments. Figure 2 or Figure 3 The glass cover plates described are basically similar in structure, except that they also include an anti-glare layer. For example, see... Figure 4 As shown, the surface of the optical glass 10 facing the antireflective layer 20 is rough. Taking the non-adhesive surface b1 of the glass cover as an example where the antireflective layer 20 is provided, the non-adhesive surface b1 is a rough surface. In other words, the non-adhesive surface b1 has an uneven microstructure or crystalline particles, making it not a smooth surface. The roughness of the non-adhesive surface b1 is increased by the microstructure or crystalline particles. The surface morphology of the non-adhesive surface b1 can be as follows: Figure 5 As shown in the figure, it is clear that the non-bonded surface b1 is a rough surface. It is worth noting that the microstructure or crystalline particles of the non-bonded surface b1 can serve an anti-glare function. Therefore, the microstructure or crystalline particles can be considered as an anti-glare layer. In other words, this situation can be understood as follows: no additional anti-glare film is set on the non-bonded surface b1 of the optical glass 10; instead, the non-bonded surface b1 is specially treated and uses a special structure to serve as an anti-glare layer. That is, the anti-glare layer is part of the optical glass 10. Therefore, this type of optical glass 10 with a special surface structure can also be called AG glass, that is, optical glass 10 with anti-glare function. Thus, this type of anti-glare layer exhibits good performance in terms of wear resistance, weather resistance, and film adhesion. Furthermore, after the anti-reflection layer 20 is formed on the uneven non-adhesive surface b1 in the optical glass 10, the surface on the side of the glass cover where the anti-reflection layer 20 is provided will also be an uneven rough surface, and the roughness of this surface will be slightly different from that of the non-adhesive surface b1.

[0068] Alternatively, for example, the anti-glare layer can be a structure independent of the optical glass 10, that is, an additional anti-glare layer is provided on the non-adhesive surface b1 of the optical glass 10, and the anti-glare layer is disposed between the optical glass 10 and the anti-reflective layer 20. In this case, the anti-glare layer can be made of a material that has good adhesion to the first oxide layer and has stable composition, thereby improving the stability of the glass cover.

[0069] Of course, if the bonding surface b2 in the glass cover is provided with an anti-reflective layer 20 (not shown in the diagram), the bonding surface b2 can also be set as a rough surface. That is, the microstructure or crystalline particles of the bonding surface b2 can also play a certain role in preventing glare. Furthermore, even if the bonding surface b2 in the glass cover is not provided with an anti-reflective layer 20, the bonding surface b2 can be set as a rough surface or a smooth surface, depending on the actual needs, and is not limited here.

[0070] In other words, in this embodiment, the structure of the glass cover to be protected includes: an anti-glare layer and an anti-reflective layer 20 on the bonding surface, and an anti-glare layer on the non-bonding surface; or, the bonding surface is a smooth surface or has an anti-glare layer, and the non-bonding surface is sequentially provided with an anti-glare layer and an anti-reflective layer 20; or, the bonding surface is sequentially provided with an anti-glare layer and an anti-reflective layer 20, and the non-bonding surface is sequentially provided with an anti-glare layer and an anti-reflective layer 20; or, the bonding surface is provided with an anti-glare layer and an anti-reflective layer 20, and the non-bonding surface is provided with an anti-fingerprint layer 30 or sequentially provided with an anti-glare layer and an anti-fingerprint layer 30; or, the bonding surface is a smooth surface or has an anti-glare layer, and the non-bonding surface is sequentially provided with an anti-glare layer, an anti-reflective layer 20, and an anti-fingerprint layer 30; or, the bonding surface is sequentially provided with an anti-glare layer and an anti-reflective layer 20, and the non-bonding surface is sequentially provided with an anti-glare layer, an anti-reflective layer 20, and an anti-fingerprint layer 30.

[0071] It should be understood that the structure of the glass cover plate described in this embodiment can be the same as that in the foregoing embodiments. Figure 2 Based on the glass cover plate described above, the optical glass 10 has an anti-glare layer and an anti-glare layer 20 on the surface where the anti-reflection layer 20 is provided, while the optical glass 10 without the anti-glare layer 20 may or may not have an anti-glare layer on the surface; or, the structure of the glass cover plate described in this embodiment can be that of the aforementioned embodiment. Figure 3 Based on the glass cover described above, the optical glass 10 at this time has an anti-glare layer, an anti-reflective layer 20, and an anti-fingerprint layer 30 on the non-bonded surface b1, as shown below. Figure 4 As shown, the bonding surface b2 may have several variations, such as: having an anti-glare layer and an anti-reflective layer 20, not having an anti-glare layer and an anti-reflective layer 20, or only having an anti-glare layer. Furthermore, the structure of the glass cover plate described in this embodiment is similar to that in the aforementioned embodiments. Figure 2 and Figure 3 The similarities in the structure of the glass cover plates described above can be found in the relevant descriptions in the foregoing embodiments; repeated details will not be repeated here.

[0072] Figure 6 A schematic diagram illustrating an embodiment of the manufacturing method of a glass cover provided in this application is shown below. Figure 6 As shown, the fabrication method may include: forming an antireflective layer on at least one side surface of the optical glass; wherein the antireflective layer is a multilayer structure, and the film layer furthest from the optical glass in the multilayer structure is a silicon oxynitride layer.

[0073] For example, taking a case where three first oxide layers and two second oxide layers are provided, the process of forming an antireflection layer can specifically include: step 6.1.1, as follows... Figure 6 As shown in (a), a first oxide layer is formed on at least one surface of the optical glass; step 6.1.2, as... Figure 6 As shown in (b) above, a second oxide layer is formed on top of the first oxide layer, and the refractive index of the first oxide layer is greater than that of the second oxide layer; Step 6.1.3, as... Figure 6 As shown in (c), a first oxide layer is formed on top of the second oxide layer; step 6.1.4, as... Figure 6 As shown in (d) in the diagram, a second oxide layer is formed on top of the first oxide layer; step 6.1.5, as... Figure 6 As shown in (e), a first oxide layer is formed on top of the second oxide layer; step 6.1.6, as... Figure 6 As shown in (f), a silicon oxynitride layer is formed on top of the first oxide layer; wherein each of the first oxide layer, each of the second oxide layer, and the silicon oxynitride layer constitutes an antireflection layer. It should be understood that... Figure 6 The example given is based on the anti-reflective layer being placed on one side of the optical glass.

[0074] Of course, when there are two, four, or more first oxide layers and one, three, or more second oxide layers, the process of fabricating the antireflective layer is similar to that described in steps 6.1.1 to 6.1.6 above. Only the relevant steps need to be appropriately reduced or added according to the number of first and second oxide layers, which will not be detailed here. Alternatively, when the number of first and second oxide layers is the same, the process of fabricating the antireflective layer is also similar to that described in steps 6.1.1 to 6.1.6 above. Only the relevant steps need to be appropriately reduced or added according to the number of first and second oxide layers, which will not be detailed here.

[0075] The materials used to fabricate the first oxide layers can be the same or different, and the materials used to fabricate the second oxide layers can also be the same or different. The materials used to fabricate the first oxide layers can include, but are not limited to, materials with high refractive indices such as titanium tin oxide or silicon nitride, while the materials used to fabricate the second oxide layers can include, but are not limited to, materials with low refractive indices such as silicon oxide. For example, when all the first oxide layers are made of titanium tin oxide and all the second oxide layers are made of silicon oxide, and there are three first oxide layers and two second oxide layers, the antireflective layer formation process includes: sequentially forming a titanium tin oxide layer, a silicon oxide layer, another titanium tin oxide layer, another silicon oxide layer, another titanium tin oxide layer, and a silicon oxynitride layer on the surface of the optical glass.

[0076] Furthermore, when forming each layer in the antireflection layer, any feasible method known to those skilled in the art can be used, such as, but not limited to, magnetron sputtering, and is not limited herein. For example, taking magnetron sputtering as an example, when the material for each first oxide layer is titanium tin oxide and the material for each second oxide layer is silicon oxide, and when there are three first oxide layers and two second oxide layers, the formation parameters for each titanium tin oxide layer include: the vacuum degree of the cavity ≤ 3 × 10⁻⁶. -6 During the torr process, 40 sccm of argon and 300 sccm of oxygen are introduced. Three pairs of rotating cathodes are set up, each pair equipped with a 99.99% pure tin target and a 99.99% pure titanium target. The rotating cathode power is 7 kW-13 kW, and the moving speed of the target to be sputtered is 0.6 m / min-0.8 m / min. The corresponding chemical formula is: Sn + Ti + xO → SnTiO X The formation parameters for each silicon oxide layer include: cavity vacuum degree ≤ 3 × 10⁻⁶. -6 During the torr process, 40 sccm of argon and 250 sccm of oxygen are introduced. Two pairs of rotating cathodes are used, each pair equipped with two silicon targets of 99.99% purity. The rotating cathode power is 9 kW-15 kW, and the moving speed of the target to be sputtered is 0.6 m / min-0.8 m / min. The corresponding chemical formula is: Si + 2O → SiO2. The formation parameters of the silicon oxynitride layer include: vacuum degree of the cavity ≤ 3 × 10⁻⁶ m / s². -6 During the torr process, nitrogen gas at 400 sccm and oxygen gas at 70 sccm are introduced. Six pairs of rotating cathodes are set up, each pair containing a silicon target with a purity of 99.99%. The rotating cathode power is 12 kW-18 kW, and the moving speed of the target to be sputtered is 0.6 m / min-0.8 m / min. The corresponding chemical formula is: xSi + vO2 + yN2 → Si X N 2y O 2V .

[0077] Figure 7 A schematic diagram illustrating another method for manufacturing a glass cover plate according to an embodiment of this application is shown, see below. Figure 7 As shown, the manufacturing method in this embodiment is the same as that in the previous embodiments. Figure 6 The production methods described are basically similar, with the following differences: Step s1 is added after step 6.1.6 in the aforementioned embodiments, where step s1 is as follows: Figure 7 As shown in (b), after the anti-reflective layer is formed, and when the anti-reflective layer is disposed on the non-bonded surface of the optical glass, an anti-fingerprint layer is formed on the silicon oxynitride layer located on the non-bonded surface. Wherein, Figure 7 (a) can be considered as a structure produced according to the process described in steps 6.1.1 to 6.1.6 of the foregoing embodiments.

[0078] For example, when forming the anti-fingerprint layer, any feasible method known to those skilled in the art can be used, such as, but not limited to, spraying or vapor deposition processes, etc., and is not limited thereto.

[0079] Taking the spraying process as an example, the silicon oxynitride layer can be pre-treated before spraying. This pre-treatment can include polishing and plasma cleaning. Polishing removes loosely bonded silica from the silicon oxynitride layer surface, increasing the adhesion between the anti-fingerprint layer and the silicon oxynitride layer. Plasma cleaning removes oil and other impurities from the silicon oxynitride layer surface, also increasing adhesion. The tools and conditions used for polishing, as well as the conditions for plasma cleaning, can be set according to actual needs and are not specifically limited here. For example, during polishing, a pneumatic polisher can be used with polishing fluid to polish the silicon oxynitride layer. During plasma cleaning, a power of 600W-2000W is used, the flow rate of dry air is 2L / min-6L / min, and the conveying speed of the object to be cleaned is 1m / min, ensuring that the water droplet contact angle on the treated surface is less than 10°.

[0080] The specific process of spraying may include: spraying the coating solution onto the silicon oxynitride layer; then, using, but not limited to, a tunnel oven, curing and allowing the coating solution to solidify into a film at 120℃-180℃; and finally, cleaning the film surface. The spraying conditions include: a spray gun oscillation speed of 1.2m / s-2m / s, a spray flow rate of 1g / s-2g / s, and a total spray volume of 75g / m³. 2 -79g / m 2The concentration of the coating solution can be, but is not limited to, 0.4 wt%, and the settling time can be, but is not limited to, no less than 2 hours. Of course, the spraying conditions, the concentration of the coating solution, and the settling time are not limited to these; other conditions can be set according to actual needs, which are not specifically limited here.

[0081] Therefore, using a spray coating process to create an anti-fingerprint layer has the following advantages: First, it not only significantly shortens the production time and increases capacity, but also improves the adhesion between the anti-fingerprint layer and the silicon oxynitride layer, preventing peeling. Second, the spray coating process allows for lower film concentrations, achieving coating effects exceeding those of vapor deposition, and is simpler, more operable, and less costly. Third, temperatures exceeding 180℃ cause chemical bond breakage, accelerating film aging and affecting film formation, while a curing temperature of 120℃-180℃ avoids chemical bond breakage, thus improving film formation. Fourthly, the use of a tunnel furnace during heat treatment effectively removes excess surface moisture, resulting in better adhesion between the anti-fingerprint layer and the silicon oxynitride layer. Simultaneously, at high temperatures, the Si-OH groups on the silicon oxynitride layer surface rapidly undergo dehydration condensation with the -Si-OH groups in the coating solution upon contact with the solution, quickly forming a cross-linked network containing -Si-O-Si- groups. This achieves chemical bonding between the silicon oxynitride layer and the anti-fingerprint layer, increasing the adhesion of the anti-fingerprint layer to the silicon oxynitride layer surface. Fifthly, when the coating solution is a fluoropolymer with active hydroxyl groups at the ends, the fluoropolymer at one end has extremely low surface energy, causing water droplets to shrink into beads, exhibiting hydrophobic and oleophobic properties. This allows the side of the glass cover with the anti-fingerprint layer to have a larger water droplet contact angle.

[0082] Figure 8 A schematic diagram illustrating another method for manufacturing a glass cover plate according to an embodiment of this application is shown, see below. Figure 8 As shown, the manufacturing method in this embodiment is the same as that in the previous embodiments. Figure 6 or Figure 7 The production methods described are basically similar, with the following differences: Step s2 is added before step 6.1.1 above, where step s2 is as follows: Figure 8 As shown in (a), at least one surface of the optical glass is etched to give the etched surface an uneven microstructure, thereby making the surface rough; if the side surface of the optical glass to which the anti-reflection layer is formed is rough, the anti-reflection layer is formed on the rough surface of the optical glass. Figure 8 The antireflective layer shown in (b) can be fabricated using the process described in steps 6.1.1 to 6.1.6 of the foregoing embodiments. If the fabrication method in this embodiment follows the procedures described in the foregoing embodiments... Figure 7Based on the manufacturing method described, the glass cover also includes an anti-fingerprint layer, and Figure 8 The anti-fingerprint layer shown in (c) can be manufactured using the process described in step s1 of the foregoing embodiments, and will not be repeated here. Alternatively, if the manufacturing method in this embodiment is based on the process described in the foregoing embodiments... Figure 6 When the manufacturing method described is used as a basis, the anti-fingerprint layer is not included in the glass cover.

[0083] The specific implementation process of step s2 may include: cleaning the optical glass; forming a protective layer on one side of the optical glass surface, wherein the material of the protective layer may be, but is not limited to, ink; selecting a neutral cleaning agent and performing a first ultrasonic cleaning; performing frosting and chemical polishing on the other side of the optical glass surface, wherein the chemical polishing may be, but is not limited to, using a low concentration of hydrofluoric acid; selecting a neutral cleaning agent and performing a second ultrasonic cleaning to remove impurities and form crystalline particles. The conditions for each ultrasonic cleaning and chemical polishing treatment can be set according to actual needs and are not specifically limited here. For example, in the first ultrasonic cleaning, the mass percentage concentration of the neutral cleaning agent may be, but is not limited to, 3.5%, the cleaning time may be, but is not limited to, 200s, and the cleaning temperature may be, but is not limited to, 70±5℃. In the second ultrasonic cleaning, the mass percentage concentration of the neutral cleaning agent may be, but is not limited to, 4%, the cleaning time may be, but is not limited to, 240s, and the cleaning temperature may be, but is not limited to, 65℃. During chemical polishing, the concentration of hydrofluoric acid may be, but is not limited to, 2.5 wt%, the temperature during chemical polishing may be, but is not limited to, 30 ± 3 °C, and the time during chemical polishing may be, but is not limited to, 4 ± 1 min.

[0084] Thus, on the one hand, the protective layer can prevent damage to the surface during subsequent chemical polishing; on the other hand, since strong acidic and alkaline cleaning solutions can damage the protective layer, using a neutral cleaning solution can avoid damage to the protective layer, thereby improving the protective effect of the protective layer; furthermore, using low-concentration hydrofluoric acid can reduce the pressure on wastewater treatment and reduce the risk of environmental pollution.

[0085] It should be understood that the manufacturing method described in this embodiment is different from that in the foregoing embodiments. Figure 6 or Figure 7 For similarities in the production methods described above, please refer to the relevant descriptions in the foregoing embodiments; repeated details will not be repeated here.

[0086] The performance of the glass cover is described below based on specific embodiments.

[0087] I. Introduction to each embodiment:

[0088] Example 1: The manufacturing process of AG glass includes: Step 1.1, cleaning the optical glass, and then forming an ink layer on one side of the optical glass surface. Step 1.2, using a neutral cleaning solution, ultrasonically cleaning the optical glass treated in Step 1.1; wherein the mass percentage concentration of the neutral cleaning agent may be, but is not limited to, 3.5%, the cleaning time may be, but is not limited to, 200s, and the cleaning temperature may be, but is not limited to, 70±5℃. Step 1.3, using an anti-glare process agent, electronic etching powder, frosting treatment is performed on the side of the optical glass without the ink layer; the frosting treatment time is 75s, and the frosting treatment temperature is 32℃. Step 1.4, chemically polishing treatment is performed on the optical glass treated in Step 1.3; the polishing conditions include: the concentration of hydrofluoric acid used is 2.5wt%, the chemical polishing time is 4min, and the chemical polishing temperature is 32℃. Step 1.5: The optical glass treated in Step 1.4 is ultrasonically cleaned using a neutral cleaning solution. This causes crystalline particles to form on the surface of the optical glass without the protective layer, creating an uneven surface structure. The neutral cleaning agent's mass percentage concentration can be, but is not limited to, 4%, the cleaning time can be, but is not limited to, 240 seconds, and the cleaning temperature can be, but is not limited to, 65°C. Step 1.6: The ink layer is removed, resulting in AG glass. The uneven microstructure on the AG glass surface serves to prevent glare.

[0089] The fabrication process of the antireflective layer includes: Step 2.1, using magnetron sputtering technology, with a cavity vacuum degree ≤3×10 - 6 During the torr process, 40 sccm of argon and 300 sccm of oxygen are introduced. Three pairs of rotating cathodes are set up, each pair equipped with a 99.99% pure tin target and a 99.99% pure titanium target. The moving speed of the target to be sputtered is 0.7 m / min, and the rotating cathode power is adjusted to 10 kW. A first tin-titanium oxide layer with a thickness of approximately 10 nm is deposited on the microstructured surface of the AG glass. Step 2.2 employs magnetron sputtering technology, with a cavity vacuum degree ≤3 × 10⁻⁶. -6 During the torr process, 40 sccm of argon and 250 sccm of oxygen are introduced. Two pairs of rotating cathodes are set up, each pair equipped with two silicon targets with a purity of 99.99%. The moving speed of the target to be sputtered is 0.7 m / min, and the power of the rotating cathodes is adjusted to 12 kW. A first silicon oxide layer with a thickness of approximately 42 nm is deposited on the surface of the first tin-titanium oxide layer. Step 2.3 uses magnetron sputtering technology, and the vacuum degree of the cavity is ≤3×10⁻⁶. -6During the torr process, 40 sccm of argon and 300 sccm of oxygen are introduced. Three pairs of rotating cathodes are set up, each pair equipped with a 99.99% pure tin target and a 99.99% pure titanium target. The moving speed of the target to be sputtered is 0.7 m / min, and the rotating cathode power is adjusted to 10 kW. A second tin-titanium oxide layer with a thickness of approximately 33 nm is deposited on the surface of the first silicon oxide layer. Step 2.4 employs magnetron sputtering technology, with the vacuum degree of the cavity ≤3×10⁻⁶. -6 During the torr process, 40 sccm of argon and 250 sccm of oxygen are introduced. Two pairs of rotating cathodes are set up, each pair equipped with two silicon targets with a purity of 99.99%. The moving speed of the target to be sputtered is 0.7 m / min, and the power of the rotating cathodes is adjusted to 12 kW. A second silicon oxide layer with a thickness of approximately 58 nm is deposited on the surface of the second tin-titanium oxide layer. Step 2.5 employs magnetron sputtering technology, with the vacuum degree of the cavity ≤3×10⁻⁶. -6 During the torr process, 40 sccm of argon and 300 sccm of oxygen are introduced. Three pairs of rotating cathodes are set up, each pair equipped with a 99.99% pure tin target and a 99.99% pure titanium target. The moving speed of the target to be sputtered is 0.7 m / min, and the rotating cathode power is adjusted to 10 kW. A third tin-titanium oxide layer with a thickness of approximately 42 nm is deposited on the surface of the second silicon oxide layer. Step 2.6 employs magnetron sputtering technology, with the vacuum degree of the cavity ≤3×10⁻⁶. -6 During the torr process, nitrogen gas at 400 sccm and oxygen gas at 70 sccm are introduced. Six pairs of rotating cathodes are set up, each pair of rotating cathodes is equipped with a silicon target with a purity of 99.99%, the moving speed of the target to be sputtered is 0.7 m / min, and the power of the rotating cathodes is adjusted to 17 kW. A silicon oxynitride layer with a thickness of approximately 100 nm is deposited on the surface of the third tin-titanium oxide layer. Thus, the multilayer structure composed of the first tin-titanium oxide layer, the first silicon oxide layer, the second tin-titanium oxide layer, the second silicon oxide layer, the third tin-titanium oxide layer, and the silicon oxynitride layer constitutes the antireflection layer.

[0090] The fabrication process of the anti-fingerprint layer includes: Step 3.1, using a pneumatic polisher dipped in polishing fluid to polish the surface of the anti-reflective layer to remove loosely bonded silica molecules. Step 3.2, performing plasma cleaning on the optical glass treated in Step 3.1, with cleaning conditions including: cleaning power of 700W, air flow rate of 2.5L / min, ensuring that the water droplet contact angle on the surface is less than 10°. Step 3.3, using dry compressed air, spraying the coating solution onto the surface of the silicon oxynitride layer, with a spray gun oscillation speed of 1.25m / s, a spray flow rate of 1.5g / s, and a total spray volume of 75g / m³. 2The effective component of the coating solution is a fluoropolymer with active hydroxyl groups at the ends. The concentration of the coating solution is 0.4 wt%, and the standing time is not less than 2 hours. Then, curing treatment and standing treatment are performed in sequence. Step 3.4: The optical glass after the treatment in step 3.4 is cleaned so that the water droplet contact angle on its surface is greater than 115°.

[0091] Therefore, the glass cover plate manufactured in Example 1 can be as follows: Figure 4 The structure shown is only in Figure 4 The specific film structure in the antireflection layer 20 is not shown in the figure.

[0092] Example 2: The differences between Example 2 and Example 1 include: the frosting time is 80s, and the frosting temperature is 35℃; the hydrofluoric acid concentration is 3wt%, the chemical polishing time is 2min, and the chemical polishing temperature is 35℃; the rotating cathode power for fabricating the tin-titanium oxide layer is 12kW, the rotating cathode power for fabricating the silicon oxide layer is 9kW, and the rotating cathode power for fabricating the silicon oxynitride layer is 16kW; the plasma cleaning power is 800W, the spray gun oscillation speed is 1.4m / s, the spray flow rate is 1.6g / s, and the total spray volume is 80g / m³. 2 Therefore, the glass cover plate manufactured in Example 2 can be used as follows: Figure 4 The structure shown.

[0093] Example 3: The differences between Example 2 and Example 1 mentioned above include: the frosting temperature is 28℃; the hydrofluoric acid concentration is 2wt%, the chemical polishing time is 3min, and the chemical polishing temperature is 28℃; the rotating cathode power for fabricating the tin-titanium oxide layer is 11kW, the rotating cathode power for fabricating the silicon oxide layer is 10kW, and the rotating cathode power for fabricating the silicon oxynitride layer is 16kW; the plasma cleaning power is 1000W, the air flow rate is 3L / min, the spray gun oscillation speed is 1.6m / s, the spray flow rate is 1.7g / s, and the total spray volume is 85g / m³. 2 Therefore, the glass cover plate manufactured in Example 2 can be used as follows: Figure 4 The structure shown.

[0094] Example 4: The differences between Example 2 and Example 1 mentioned above include: the frosting time is 65s, the frosting temperature is 30℃; the hydrofluoric acid concentration is 1.5wt%, the chemical polishing time is 3min, and the chemical polishing temperature is 30℃; the rotating cathode power for fabricating the silicon oxide layer is 10kW, and the rotating cathode power for fabricating the silicon oxynitride layer is 14kW; the plasma cleaning power is 1200W, the air flow rate is 4L / min, the spray gun oscillation speed is 1.8m / s, the spray flow rate is 1.8g / s, and the total spray volume is 89g / m³. 2Therefore, the glass cover plate manufactured in Example 2 can be used as follows: Figure 4 The structure shown.

[0095] Example 5: The differences between Example 2 and Example 1 mentioned above include: the frosting treatment time is 65s; the hydrofluoric acid concentration is 3wt%; the chemical polishing time is 3min; the rotating cathode power for fabricating the tin-titanium oxide layer is 12kW; the rotating cathode power for fabricating the silicon oxide layer is 13kW; the rotating cathode power for fabricating the silicon oxynitride layer is 13kW; the plasma cleaning power is 1500W; the air flow rate is 4L / min; the spray gun oscillation speed is 1.8m / s; the spray flow rate is 1.8g / s; and the total spray volume is 89g / m³. 2 Therefore, the glass cover plate manufactured in Example 2 can be used as follows: Figure 4 The structure shown.

[0096] Example 6: The difference between Example 6 and Example 1 is that steps 1.1 to 1.6 are not performed on the optical glass; instead, an anti-reflective layer and an anti-fingerprint layer are formed directly on one side surface of the optical glass. Therefore, the glass cover plate produced in Example 6 can be used as follows: Figure 3 The structure shown.

[0097] Example 7: The difference between Example 7 and Example 2 is that steps 1.1 to 1.6 are not performed on the optical glass; instead, an anti-reflective layer and an anti-fingerprint layer are formed directly on one side surface of the optical glass. Therefore, the glass cover plate manufactured in Example 7 can be produced as follows: Figure 3 The structure shown.

[0098] Example 8: The difference between Example 8 and Example 3 is that steps 1.1 to 1.6 are not performed on the optical glass; instead, an anti-reflective layer and an anti-fingerprint layer are formed directly on one side surface of the optical glass. Therefore, the glass cover plate manufactured in Example 8 can be produced as follows: Figure 3 The structure shown.

[0099] Example 9: The difference between Example 9 and Example 4 is that steps 1.1 to 1.6 are not performed on the optical glass; instead, an anti-reflective layer and an anti-fingerprint layer are formed directly on one side surface of the optical glass. Therefore, the glass cover plate manufactured in Example 9 can be produced as follows: Figure 3 The structure shown.

[0100] Example 10: The difference between Example 10 and Example 5 is that steps 1.1 to 1.6 are not performed on the optical glass; instead, an anti-reflective layer and an anti-fingerprint layer are formed directly on one side surface of the optical glass. Therefore, the glass cover plate manufactured in Example 10 can be produced as follows: Figure 3 The structure shown.

[0101] II. Introduction to the performance of the glass cover plate:

[0102] Surface roughness test and haze test of AG glass: The specific test results are shown in Table 1 below.

[0103] Table 1

[0104] Surface roughness / nm Haze / % Example 1 165 26 Example 2 175 29 Example 3 162 25 Example 4 125 18 Example 5 178 30

[0105] The test results in Table 1 confirm that AG glass obtained through etching has good surface roughness, which provides a good anti-glare effect. Furthermore, the degree of haze reflects the light transmittance of the AG glass; higher haze means lower light transmittance, and vice versa. The AG glass in this application has low haze, allowing it to have high light transmittance. When applied to display modules, it can effectively transmit the light emitted by the display components, improving the display effect of the display module.

[0106] Tape peel test:

[0107] The specific testing method included: using a cross-cutting tool, 1mm*1mm squares were cut into the surface of the glass cover plate containing the film layer, and 100 such squares were made. The glass cover plate was then boiled in water for a period of time. Next, adhesive tape with a width of at least 2cm and a peel strength of at least 2.74N / cm was firmly adhered to the surface of the glass cover plate with the cut squares. The cover plate was then quickly and vertically pulled up to check for film detachment. Specific test data are shown in Table 2 below.

[0108] Table 2

[0109]

[0110] The test results given in Table 2 show that no film delamination was observed in Examples 1 to 5, indicating that the bonding force between the various film layers in the glass cover is good, which makes the glass cover have very high stability and reliability.

[0111] Abrasion resistance test:

[0112] 1. Eraser head friction test: The test method includes rubbing the surface of the glass cover plate with an anti-fingerprint layer 3600 times using an eraser head with a pressure of 9.8N. The water droplet contact angle of the rubbed surface is measured before and after rubbing. The specific test results are shown in Table 3 below, where the data in the table represent the water droplet contact angle data in degrees.

[0113] Table 3

[0114] Before friction After friction Example 6 120.1 110.5 Example 7 120.7 111.3 Example 8 118.7 110.8 Example 9 120.9 111.7 Example 10 120.1 112.6

[0115] In Examples 6 to 10, the anti-reflective layer and the anti-fingerprint layer are directly applied to the smooth surface of the optical glass. Therefore, the surface of the glass cover with the anti-fingerprint layer can also be considered a relatively smooth surface. Thus, the rubbing test with an eraser head can effectively reflect the wear resistance and scratch resistance of the glass cover surface. The test data in Table 3 shows that before rubbing, the water droplet contact angle on the surface of the glass cover with the anti-fingerprint layer was approximately 120°, and after rubbing, it was approximately 110°, with minimal change. This indicates that using a silicon oxynitride layer as the surface film of the anti-reflective layer can effectively improve the wear resistance and scratch resistance of the glass cover.

[0116] 2. Steel wool friction test: The test method includes using steel wool with a pressure of 9.8N and a grinding head of 1cm*1cm, bonded with two layers, to rub the surface of the glass cover plate with an anti-fingerprint layer for 10,000 times. The water droplet contact angle of the rubbed surface is measured before and after friction. The specific test results are shown in Table 4 below, where the data in the table represent the water droplet contact angle data, in degrees.

[0117] Table 4

[0118] Before friction After friction Example 6 120.1 103.5 Example 7 120.7 106.4 Example 8 118.7 105.2 Example 9 120.9 104.2 Example 10 120.1 102.2

[0119] In Examples 6 to 10, the steel wool friction test can also effectively reflect the wear resistance and scratch resistance of the glass cover surface. The test data in Table 4 shows that before friction, the water droplet contact angle on the side of the glass cover with the anti-fingerprint layer was approximately 120°, and after friction, it was approximately 100°, with little change. This indicates that using a silicon oxynitride layer as the surface film of the anti-reflective layer can effectively improve the wear resistance and scratch resistance of the glass cover.

[0120] 3. Stylus drawing test: The test method includes rubbing the surface of the glass cover with the anti-fingerprint layer 5000 times with a stylus, and testing whether there are any marks on the surface after rubbing. Specific test results are shown in Table 5 below. Figure 9 A photograph of the glass cover plate in Example 1 after rubbing is shown.

[0121] Table 5

[0122] Are there any marks on the surface after rubbing? Example 1 no Example 2 no Example 3 no Example 4 no Example 5 no

[0123] In Examples 1 to 5, the anti-reflective layer and the anti-fingerprint layer are applied to the rough surface of the AG glass. Therefore, the surface of the glass cover with the anti-fingerprint layer can also be considered a rough surface. Thus, the stylus pen scratch test can effectively reflect the wear resistance and scratch resistance of the glass cover surface. (From Table 5 and...) Figure 9The test data provided shows that in Examples 1 to 5, no marks appeared on the surface of the glass cover after rubbing; Figure 9 No marks appeared in the area shown within the dashed box 1 after the scribing test. This indicates that the glass cover plates in Examples 1 to 5 have very good wear resistance and scratch resistance, and further demonstrates that using a silicon oxynitride layer as the surface film layer of the antireflective layer can effectively improve the wear resistance and scratch resistance of the glass cover plate.

[0124] 4. Metal scratch test: The test method includes rubbing the surface of the glass cover with the anti-fingerprint layer 10 times with 250g of metal, and testing whether a mark appears on the surface after rubbing. Specific test results are shown in Table 6 below. Figure 10 A photograph of the glass cover plate in Example 1 after rubbing is shown.

[0125] Table 6

[0126] Are there any marks on the surface after rubbing? Example 1 no Example 2 no Example 3 no Example 4 no Example 5 no

[0127] In Examples 1 to 5, the metal wire test can also effectively reflect the abrasion resistance and scratch resistance of the glass cover surface. (See Table 6 and...) Figure 10 The test data provided shows that in Examples 1 to 5, no marks appeared on the surface of the glass cover after rubbing; Figure 10 No marks appeared in the area shown within the dashed box 2 after the scribing test. This indicates that the glass cover plates in Examples 1 to 5 have very good wear resistance and scratch resistance, and further demonstrates that using a silicon oxynitride layer as the surface film layer of the antireflective coating can effectively improve the wear resistance and scratch resistance of the glass cover plate.

[0128] Obviously, those skilled in the art can make various modifications and variations to the embodiments of this application without departing from the spirit and scope of the embodiments of this application. Therefore, if these modifications and variations to the embodiments of this application fall within the scope of the claims of this application and their equivalents, this application also intends to include these modifications and variations.

Claims

1. A glass cover plate, characterized in that, include: Optical glass, and an anti-reflective layer disposed on at least one side of the optical glass, wherein the side of the optical glass facing the anti-reflective layer has a rough surface, and the anti-reflective layer has a multi-layer structure; The multilayer structure includes multiple first oxide layers, multiple second oxide layers, and a silicon oxynitride layer. The silicon oxynitride layer is the film layer furthest from the optical glass, and one of the multiple second oxide layers is the film layer closest to the optical glass. The multiple first oxide layers and the multiple second oxide layers are alternately arranged, and the refractive index of the first oxide layer is greater than that of the second oxide layer. The first oxide layer is silicon nitride, and the second oxide layer is silicon oxide. The reflectivity of the glass cover is no greater than 5.5%. In the multilayer structure, the silicon oxynitride layer is in contact with the first oxide layer, such that the refractive indices of each layer of the multilayer structure, from closest to farthest from the optical glass, are in the following order: low-high-low-high-...-low-high-low. This results in the outermost silicon oxynitride layer having a lower refractive index than the next outermost film layer, thus utilizing both the refractive index and hardness characteristics of the silicon oxynitride layer. The refractive index of the silicon oxynitride layer is 1.51%. The color of the glass cover plate in the Lab color space is -2.5≤a≤2.5, -8≤b≤2. The optical glass includes a bonding surface and a non-bonded surface facing each other. The non-bonded surface is provided with the anti-reflective layer. The glass cover also includes an anti-fingerprint layer. The anti-reflective layer is disposed between the anti-fingerprint layer and the optical glass. A -Si-O-Si- chemical bond is formed between the silicon oxynitride layer and the anti-fingerprint layer.

2. The glass cover plate as described in claim 1, characterized in that, The thickness of the silicon oxynitride layer is greater than 0 and not greater than 300 nm.

3. The glass cover plate as described in claim 2, characterized in that, The thickness of the silicon oxynitride layer is 90nm-120nm.

4. The glass cover plate as described in any one of claims 1-3, characterized in that, Along the direction from the optical glass to the antireflective layer, the thickness of each of the first oxide layers gradually increases, and / or the thickness of each of the second oxide layers also gradually increases.

5. The glass cover plate as described in any one of claims 1-3, characterized in that, The thickness difference between two adjacent first oxide layers is 10nm-20nm, and / or the thickness difference between two adjacent second oxide layers is 10nm-20nm.

6. The glass cover plate according to any one of claims 1-3, characterized in that, The first oxide layer has two layers, and the second oxide layer has three layers.

7. The glass cover plate as described in claim 6, characterized in that, The antireflective layer comprises: a silicon oxide layer, a tin-titanium oxide layer, a silicon oxide layer, a tin-titanium oxide layer, a silicon oxide layer, a silicon oxide layer, and the silicon oxynitride layer, which are sequentially stacked along the direction from the optical glass to the silicon oxynitride layer.

8. The glass cover plate according to any one of claims 1-7, characterized in that, The water droplet contact angle on the side surface of the glass cover where the anti-fingerprint layer is provided is greater than 110°.

9. The glass cover plate according to any one of claims 1-8, characterized in that, The surface of the optical glass facing the antireflective layer is rough.

10. A display module, characterized in that, include: The display assembly and the glass cover as described in any one of claims 1-9, the glass cover being disposed above the display surface of the display assembly.

11. The display module as described in claim 10, characterized in that, The appearance color of the display surface of the display module is in the Lab color space, -3≤a≤3, -12≤b≤1.

12. The display module as described in claim 10 or 11, characterized in that, In the Lab color space, the maximum color change between any two test areas is ≤3, and the maximum color change between two adjacent test areas is ≤1.

5.

13. The display module as described in any one of claims 10-12, characterized in that, The reflectivity of the display surface of the display module is no greater than 2.5%.

14. An electronic device, characterized in that, include: The frame and the display module as described in any one of claims 10-13, wherein the display module is fixed to the frame.

15. A method for manufacturing a glass cover plate, characterized in that, include: An antireflective layer is formed on at least one side of an optical glass; wherein the antireflective layer is a multilayer structure, the multilayer structure including a plurality of first oxide layers, a plurality of second oxide layers and a silicon oxynitride layer, wherein the layer farthest from the optical glass in the multilayer structure is the silicon oxynitride layer, one of the plurality of second oxide layers is the layer closest to the optical glass, the plurality of first oxide layers and the plurality of second oxide layers are alternately arranged, and the refractive index of the first oxide layer is greater than the refractive index of the second oxide layer, the first oxide layer is silicon nitride, the second oxide layer is silicon oxide, and the reflectivity of the glass cover is not greater than 5.5%; the appearance color of the glass cover is in the Lab color space, -2.5≤a≤2.5, -8≤b≤2; In the multilayer structure, the silicon oxynitride layer is in contact with the first oxide layer, such that the refractive indices of each layer of the multilayer structure, from closest to farthest from the optical glass, are in the following order: low-high-low-high-...-low-high-low. This results in the outermost silicon oxynitride layer having a lower refractive index than the next outermost film layer, thus utilizing both the refractive index and hardness characteristics of the silicon oxynitride layer. The refractive index of the silicon oxynitride layer is 1.51%. The manufacturing method further includes: after forming the antireflective layer, and when the antireflective layer is disposed on the non-bonded surface of the optical glass, forming an anti-fingerprint layer on the silicon oxynitride layer located on the non-bonded surface; and forming a -Si-O-Si- chemical bond between the silicon oxynitride layer and the anti-fingerprint layer.

16. The manufacturing method as described in claim 15, characterized in that, Also includes: Before forming the antireflective layer, at least one surface of the optical glass is etched to make the etched surface rough. Wherein, when the side surface on which the antireflection layer is formed in the optical glass is the rough surface, the antireflection layer is formed on the rough surface.

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