A simple structure of metal electron backscattering diffraction sample vibration polishing equipment

Abstract

The application provides a vibration polishing machine for preparing a metal electron backscattering diffraction sample, and belongs to the technical fields of mechanical polishing and metallographic preparation. The vibration polishing machine has a T-shaped vibration disc, an upper part of the vibration disc is connected with a polishing disc through a plurality of bolts and is arranged on a step in a base, and a lower part of the vibration disc is a rectangular plate-shaped structure with reinforcing ribs and is connected with a vibration motor through a plurality of bolts, and a rotating axis of the vibration motor is parallel to a central axis of the upper part of the vibration disc. Meanwhile, two sets of spring mounting seats are arranged at symmetrical positions of the lower part of the vibration disc, and the spring mounting seats are connected with spring mounting seats on the base through two tensile springs and bolts. The vibration polishing machine has the advantages of high polishing quality, simple structure, low cost, and convenient maintenance, and can obtain a metallographic sample without a micro-deformation layer.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of mechanical polishing and metallographic preparation, and particularly relates to a vibration polishing machine for preparing a metal electron backscattering diffraction sample with a small / no micro-deformation layer. BACKGROUND

[0002] Backscattering electron diffraction technology (EBSD) is a technology for calibrating a sample crystal sample by using a diffraction electron beam. When used in cooperation with a scanning electron microscope (SEM), the EBSD technology can simultaneously obtain microscopic crystal structure and orientation information of a sample and macroscopic statistical information. At present, the EBSD technology has become a very effective means for studying the deformation, recovery and recrystallization process of a material, and has developed into a new method in the aspect of microstructure analysis.

[0003] However, the EBSD has a high requirement for the surface quality of a sample: the surface roughness needs to be low, there needs to be no oxidation and no burn, and the thickness of a micro-deformation layer needs to be reduced as much as possible, otherwise it will be quite difficult to calibrate a phase and even completely impossible to obtain the Kikuchi diffraction information of the surface of the sample. Common EBSD sample preparation methods include electrolytic polishing, argon ion polishing and vibration polishing. The electrolytic polishing has a relatively mature process for steel, aluminum alloy and the like, but it is difficult to configure a suitable electrolyte to realize the simultaneous polishing of various phases due to the difference in electrochemical potential between components of a multi-phase metal. The argon ion polishing has a good effect but requires a high device and is expensive, which is difficult to be applied on a large scale. The vibration polishing has good universality and high sample preparation efficiency, and is expected to be applied on a large scale, so many developed countries have researched the mechanism of the vibration polishing machine and have put forward some semi-automatic or automatic vibration polishing devices. However, the imported vibration polishing machines are expensive, complex in structure and high in maintenance cost, which are not convenient for popularization and application. However, due to the obvious advantages and wide application of the vibration polishing machine, the development of a domestic vibration polishing machine has important significance for improving the low efficiency and low resolution of metallographic sample preparation in China.

[0004] Although the patent CN109822429B proposes a scheme of a vibration polishing machine for preparing a metal electron backscattering diffraction sample, the device structure is not compact enough, which is difficult to popularize in a laboratory. Meanwhile, the device is difficult to limit the excitation force in the vertical direction, the utilization efficiency of the vibration source is not high, the flatness of the polished surface is uncontrollable, and no specific embodiment is given, so the principle needs to be further improved and the scheme needs to be further optimized. SUMMARY

[0005] The present invention aims to provide a vibration polishing machine for preparing metal electron backscatter diffraction samples, which has high polishing quality and can obtain metallographic samples without a small deformation layer. It also has a simple structure, low cost, easy maintenance, no open moving parts, good safety, and is suitable for laboratory conditions EBSD sample preparation.

[0006] The present invention provides a vibration polishing machine for preparing metal electron backscatter diffraction samples, which is characterized by comprising a base 5, a vibration plate 6, a vibration motor 4, a limit spring 7, a polishing plate 2, an amplitude adjustment cover 3, and a dustproof limit cover 1.

[0007] The vibration plate 6 is a T-shaped structure. The upper part of the vibration plate 6 is a circular structure with several evenly distributed threaded holes connected to the polishing plate via bolts. The lower part of the vibration plate 6 is a square plate structure with reinforcing ribs, which is firmly connected to the vibration motor 4 via multiple bolts. When the vibration motor 4 is installed, the rotation axis of the motor is parallel to the central axis of the upper part of the vibration plate. At the same time, two sets of spring mounting seats are symmetrically arranged on the lower part of the vibration plate 6, which are connected to the spring mounting seats on the base via two sets of limit springs 7.

[0008] The base 5 is a hollow base having an open end and a bottom end; the open end is provided with an inner step that cooperates with the circular structure of the upper portion of the vibration plate 6. After assembly, the lower portion of the vibration plate 6 is located within the hollow structure of the base 5; the upper portion of the vibration plate 6 rests on the step at the open end of the base 5, and the radius of the upper portion of the vibration plate 6 is smaller than the radius of the open end of the base 5. The horizontal height of the upper portion of the vibration plate 6 is greater than the horizontal height of the open end of the base 5.

[0009] The polishing plate 2 is a dish-shaped structure, with several evenly distributed semicircular or circular limiting holes on the outer edge. The specifications of the limiting holes match the threaded holes on the upper part of the vibration plate, and are rigidly connected to the vibration plate 6 by bolt assembly.

[0010] The amplitude adjustment gland 3 is a hollow cylindrical structure with several threaded holes on the side wall. The diameter of the upper hollow part is smaller than the diameter of the lower hollow part, but the outer diameters of the upper and lower parts are equal; the diameter of the upper hollow part of the amplitude adjustment gland 3 is larger than the diameter of the polishing disk 2 but smaller than the diameter of the upper part of the vibration disk 6. The middle part of the amplitude adjustment gland 3 is provided with an internal thread of a certain length, and the internal thread of the amplitude adjustment gland 3 can cooperate with the thread involved on the outer wall of the base 5; a guide limiting belt of a certain length is provided on the lower side of the interior of the amplitude adjustment gland 3, whose diameter is slightly larger than the minor diameter of the internal thread, and the threaded holes on the side wall of the amplitude adjustment gland 3 are opened in the area of ​​this guide limiting belt;

[0011] The internal thread of the amplitude adjustment cover 3 cooperates with the base 5 to adjust the height and pressing force between the inner end surface of the amplitude adjustment cover 3 and the upper surface of the vibration plate 6, thereby limiting the vertical amplitude of the vibration plate 6;

[0012] A guide limiter strip of a certain length is provided at the lower part of the internal thread of the amplitude adjustment gland 3, which is used as a thread guide when the amplitude adjustment gland 3 is installed in conjunction with the base 5, thereby reducing the difficulty of installation;

[0013] Several holes designed on the side wall of the amplitude adjustment cover 3 are located in the guide limit zone below the internal thread, which are used to fix the relative position between the amplitude adjustment cover 3 and the base 5, ensuring that the amplitude adjustment cover 3 will not loosen due to the vibration of the body after the amplitude is adjusted, thereby achieving stable control of the amplitude;

[0014] A limiting groove is provided at the upper end of the amplitude adjustment pressure cover 3 for cooperating with the dustproof limiting cover 1 .

[0015] Preferably, the base 5 is a barrel-shaped structure, and an inner step is provided at the open end to cooperate with the circular structure of the upper part of the vibration plate 6. After assembly, the lower part of the vibration plate 6 is located in the barrel-shaped structure of the base 5;

[0016] The outer side of the upper end of the base 5 is provided with a thread, and the base 5 is connected to the amplitude adjustment cover 3 through the thread provided on the outer side of the upper end thereof. Two sets of spring mounting seats are symmetrically provided inside, and a through hole is left on the lower end surface of the base.

[0017] Preferably, the vibration disk 6 is a T-shaped structure, and the whole is made of corrosion-resistant materials such as stainless steel. The upper part is a circular structure, and 6 threaded holes 62 are evenly distributed on the upper end surface. It is rigidly connected to the polishing disk 2 using bolts. The diameter D61 of the upper part of the vibration disk 6 is slightly smaller than the diameter D52 of the inner step 52 of the upper part of the base 5. When it is concentrically installed on the inner step 52 of the base 5, a certain horizontal gap δ3 is left between it and the inner step wall of the base 5 to ensure the vibration margin of the vibration disk in the horizontal direction. The thickness H62 of the upper part of the vibration disk 6 is slightly larger than the height H52 of the inner step 52 of the base 5. After concentric installation, the height is δ4, which is used to ensure that the amplitude adjustment cover 3 can completely press the vibration disk 6 when needed. The vertical amplitude of the vibration disk 6 is adjusted by the amplitude adjustment cover 3 to the vibration disk 6. The degree of compression is adjusted; the lower part of the vibration disk 6 is a square plate structure with reinforcing ribs, which is rigidly connected to the vibration motor 4 by multiple bolts, and the rotation axis of the vibration motor 4 is parallel to the central axis of the upper part of the vibration disk 6, ensuring that the exciting torque M is mainly on the horizontal plane. At the same time, two groups of spring mounting seats 61 are provided to limit the vibration disk 6 during operation, so that the vibration disk 6 can fit well with the base 5 and does not cause a nodule in the power cord due to excessive rotation angle. The distance H61 between the spring mounting seat 61 and the lower end face of the upper part of the vibration disk 6 is less than the distance H51 between the step 52 on the upper part of the base 5 and the internal spring mounting seat 51, so that the limit spring 7 gives the vibration disk 6 a certain downward pulling force during assembly to achieve a good fit with the base 5.

[0018] When the vibration disc 6 is used, first, the vibration disc 6 and the vibration motor 4 are connected by using bolts, and the power supply line is led out of the base 5 from the appropriate position, then the vibration disc 6 and the base 5 are connected by using the limiting spring 7, and the fit of the vibration disc 6 and the base 5 is checked, and the tension of the limiting spring 7 is adjusted to ensure good fit during work.

[0019] As preferred, the base 5 is a barrel-shaped structure, the upper end is provided with an inner step 52 for positioning and limiting the vibration disc 6, the outer side of the upper end is provided with a certain length of thread 53 to realize the connection and locking with the amplitude adjustment gland 3, two spring mounting seats 51 are arranged inside, and the height H51 of the distance from the inner step end face of the base 5 is greater than the distance H61 of the distance from the upper lower end face of the spring mounting seat 61 on the vibration disc 6, and the limiting spring 7 is matched to apply a limiting force with a downward component to the vibration disc 6, to ensure good fit of the vibration disc 6 and the base 5, the width of the inner step 52 of the base is determined by two sizes of D51 and D52, and the width should be greater than 10 mm to ensure that the vibration disc 6 has enough part to be placed in the step 52 during work, the wall thickness of the upper side of the step is determined by the relative size of D53 and D52, and the wall thickness should be greater than 5 mm to ensure that the vibration disc 6 has enough rigidity to limit the throwing out of the polishing disc when the vibration disc 6 shakes too much, to prevent accidents.

[0020] The vibration motor 4 is a waterproof vibration motor with a fixed base, which is connected with the lower part of the square plate-shaped structure of the vibration disc by bolts. Due to high utilization rate of vibration source, a model with smaller power and compact structure can be selected to reduce equipment energy consumption and heat dissipation burden.

[0021] As preferred, the polishing disc 2 is a dish-shaped structure, the outer cylindrical surface has uniformly distributed semicircular limiting holes, the hole center position is concentric with the threaded hole on the upper surface of the vibration disc 6, but the diameter is slightly larger, and the polishing disc 2 is connected with the vibration disc 6 by bolt assembly, so that the polishing disc 2 can be replaced according to different samples and the cleaning difficulty of the polishing disc 2 is reduced, the sum of the external diameter D21 of the polishing disc 2, the hole center distance D23 of the semicircular limiting hole and the diameter of the bolt is less than the inner hole diameter D31 of the amplitude adjustment gland 3, the distance between the polishing disc 2 and the inner hole edge of the amplitude adjustment gland 3 is δ2 when the polishing disc 2 and the amplitude adjustment gland 3 are concentrically assembled, and δ2> δ3, which prevents the polishing disc 2 from swinging too much and causing accidents without interfering with the normal work of the polishing disc 2. The inner diameter D22 of the polishing disc 2 is slightly larger than the size (200 mm) of the common polishing cloth 8, and the inner wall of the polishing disc 2 has a certain height H22 to accommodate the polishing cloth 8 and the polishing liquid with a liquid surface of at least 3 mm high, to avoid the polishing liquid from overflowing the polishing disc during work. The overall height H21 of the polishing disc 2 is less than the height H12 of the inner partition plate of the dustproof limiting cover 1 and has a sufficient height allowance to accommodate the bolt head.

[0022] As preferred, the amplitude adjustment gland 3 is a ring structure with holes, which is made of common steel such as 45 steel, has two steps inside but the same outer diameter. The upper end face has a hole with a size D31 slightly larger than the outer diameter D21 of the polishing disc 3, and the distance between the hole edge and the polishing disc 2 is δ2 when they are concentrically assembled, and δ2>δ3, which prevents the polishing disc 2 from swinging too much without interfering with the normal operation of the polishing disc 2; the outer side of the upper end face is processed with a certain depth of limiting groove 34 for accommodating the lower edge 11 of the dustproof limiting cover 1, and the size of the groove is slightly larger than the wall thickness of the dustproof limiting cover 1, and the groove is concentric with the hole, which can ensure that the dustproof limiting cover 1 does not slip off when working; the inner side of the upper end face is processed with a screw thread 32 of appropriate length, and the screw thread parameters are the same as those of the outer side screw thread 53 on the upper end face of the base 5, and can be completely tightened, and the vertical distance between the vibration disc 6 and the amplitude adjustment gland 3 is adjusted by adjusting the tightening degree, and then the vertical vibration amplitude of the vibration disc 6 is adjusted, and four through threaded holes 31 are arranged below the screw thread 32, and the relative distance between the amplitude adjustment gland 3 and the vibration disc 6 is fixed by screwing in the bolts.

[0023] The limiting spring is a symmetrical and uniformly distributed tension spring, and the two ends are respectively connected with the spring mounting seat of the lower part of the vibration disc and the spring mounting seat on the base through bolts; the number of springs is equal to the number of symmetrical spring mounting seats arranged on the lower part of the vibration disc 6.

[0024] As preferred, the upper hollow part, the lower hollow part and the limiting groove of the amplitude adjustment gland 2 are concentrically designed.

[0025] The limiting groove has a certain depth for cooperation with the dustproof limiting cover, and the lower part of the gland is matched with the base through a thread.

[0026] The dustproof limiting cover is a single-layer barrel structure with a partition, and the wall thickness is slightly smaller than the width of the limiting groove of the amplitude adjustment gland, which can be inserted into the upper limiting groove of the amplitude adjustment gland and matched with it, and the inner part has a hole partition structure with a proper height.

[0027] As preferably, dustproof limiting cover 1 is the barrel type structure with inner partition 12, use transparent and soft material such as organic glass to make, wall thickness is slightly smaller than the limiting groove 34 width of amplitude adjustment gland 3 upper end face, dustproof limiting cover 1 inside has perforated partition 12, partition height H12 is less than common sample minimum height (10mm) from bottom surface, cut-off inner hole diameter D11 is less than polishing cloth 8 diameter, inner hole is δ5 from polishing disc 2 inner wall, greater than 5mm, top cover is higher than common sample maximum height (50mm) from polishing disc 2 upper surface height. Dustproof limiting cover 1 can not only prevent impurities such as dust from falling into polishing disc 2 when using, avoid contaminating polishing fluid, can also limit sample to move only in the hole of partition 12, avoid sample 9 and polishing disc 2 side direct contact and cause polishing fluid to suck out polishing disc 2 and lose polishing fluid and pollute equipment because of capillary action, in addition, owing to being made of transparent material, be conducive to real-time observation of polishing situation, be convenient to timely correct polishing parameters.

[0028] Compared with the prior art, the vibration polishing machine for preparing metal electron backscatter diffraction samples of the present invention has the following characteristics and advantages:

[0029] The vibration polishing machine for preparing metal electron backscatter diffraction samples of the present invention has a simple and compact structure, is easy to maintain, can operate stably for a long time, realizes unattended automatic vibration polishing of samples, is easy to operate and has low cost; the polishing quality is high, and a smooth, fresh surface without a micro-deformation layer can be obtained for backscattered electron diffraction experiments, which cannot be or is difficult to obtain using manual or mechanical polishing.

[0030] The features and advantages of the present invention will become more apparent after reading the detailed description of the present invention in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without paying any creative work results.

[0032] Figure 1 Exploded view of a vibration polishing machine for preparing metal electron backscatter diffraction samples according to an embodiment of the present invention

[0033] Figure 2 A vertical cross-sectional view and a schematic diagram of a partial structure of a vibration polishing machine for preparing metal electron backscatter diffraction samples according to an embodiment of the present invention

[0034] Figure 3 Schematic diagram of force analysis of a vibration polishing machine for preparing metal electron backscatter diffraction samples according to an embodiment of the present invention

[0035] Figure 4 Three-view and axonometric view of dustproof limit cover (1) for preparing metal electron backscattering diffraction sample by vibration polisher of the embodiment of the present application

[0036] Figure 5 Three-view and axonometric view of amplitude adjustment gland (3) for preparing metal electron backscattering diffraction sample by vibration polisher of the embodiment of the present application

[0037] Figure 6 Three-view and axonometric view of polishing disc (2) for preparing metal electron backscattering diffraction sample by vibration polisher of the embodiment of the present application

[0038] Figure 7 Three-view and axonometric view of base (5) for preparing metal electron backscattering diffraction sample by vibration polisher of the embodiment of the present application

[0039] Figure 8 Three-view and axonometric view of vibration disc (6) for preparing metal electron backscattering diffraction sample by vibration polisher of the embodiment of the present application

[0040] Figure 9 BC diagram, IPF diagram and calibration rate summary table obtained by using vibration polisher for preparing metal electron backscattering diffraction sample of the embodiment of the present application to prepare 30CrMnSiNi2A sample.

[0041] wherein,

[0042] 1 is dustproof limit cover, 11 is lower edge of dustproof limit cover, 12 is inner partition plate carried by dustproof limit cover;

[0043] 2 is polishing disc, 21 is limit hole,

[0044] 3 is amplitude adjustment gland, 31 is through threaded hole, 32 is thread on inner side of upper end face of amplitude adjustment gland, 33 is guide limit belt, 34 is limit groove;

[0045] 4 is vibration motor;

[0046] 5 is base, 51 is spring mounting seat, 52 is inner step, 53 is base thread;

[0047] 6 is vibration disc, 61 is spring mounting seat, 62 is threaded hole;

[0048] 7 is limit spring,

[0049] 8 is polishing cloth,

[0050] 9 is sample to be polished. DETAILED DESCRIPTION

[0051] As Figures 1 to 8 The embodiment provides a vibration polishing machine for preparing a metal electron backscattering diffraction sample, which comprises a dustproof limiting cover 1, a polishing disc 2, an amplitude adjusting gland 3, a vibration motor 4, a base 5, a vibration disc 6 and a limiting spring 7.

[0052] The vibration disc 6 is in a T-shaped structure and is made of a corrosion-resistant material such as stainless steel. The upper part of the vibration disc 6 is in a circular structure and is uniformly provided with six threaded holes 62. The vibration disc 6 is rigidly connected with the polishing disc 2 by using bolts to cooperate with the outer edge holes 21 of the polishing disc 2 through the threaded holes 62. The diameter D61 of the upper part of the vibration disc 6 is slightly smaller than the diameter D52 of the inner step 52 of the base 5, and the vibration disc 6 is concentrically installed in the inner step 52 of the base 5 and leaves a certain horizontal gap δ3 between the inner step wall of the base 5 to ensure the vibration allowance of the vibration disc in the horizontal direction. The thickness H62 of the upper part of the vibration disc 6 is slightly greater than the height H52 of the inner step 52 of the base 5, and the height of the vibration disc 6 after concentric installation is δ4, which is used to ensure that the amplitude adjusting gland 3 can completely press the vibration disc 6 when needed. The amplitude of the vibration disc 6 in the vertical direction is adjusted by the pressing degree of the amplitude adjusting gland 3 on the vibration disc 6. The lower part of the vibration disc 6 is in a square plate structure with reinforcing ribs, and is rigidly connected with the vibration motor 4 through a plurality of bolts. The rotation axis of the vibration motor 4 is parallel to the central axis of the upper part of the vibration disc 6, which ensures that the exciting torque M is mainly in the horizontal plane. Two groups of spring mounting seats 61 are arranged to limit the vibration disc 6 during operation, so that the vibration disc 6 can be well attached to the base 5 and the power cord is not knotted due to too large rotation angle. The distance H61 from the lower end surface of the upper part of the vibration disc 6 to the spring mounting seat 61 is less than the distance H51 between the upper part step 52 and the inner spring mounting seat 51 of the base 5, so that the limiting spring 7 gives a certain downward pulling force to the vibration disc 6 during assembly to realize good attachment to the base 5.

[0053] When the vibration disc 6 is used, the vibration disc 6 and the vibration motor 4 are connected by using bolts, the power cord is led out of the base from the appropriate position, the vibration disc 6 and the base 5 are connected by using the limiting spring 7, and the attachment of the vibration disc 6 to the base 5 is checked. The tension of the limiting spring 7 is adjusted to ensure good attachment during work.

[0054] The base 5 is a barrel-shaped structure, which is made of common steel such as 45 steel, and has an inner step 52 arranged at the upper end for positioning and limiting the vibration disc 6, a threaded hole 53 arranged at the outer side of the upper end for connecting and locking the amplitude adjusting gland 3, and two spring mounting seats 51 arranged inside, and the height H51 of the distance between the spring mounting seat 51 and the end surface of the inner step 52 of the base 5 is greater than the distance H61 of the distance between the spring mounting seat 61 on the vibration disc 6 and the lower end surface of the upper part of the vibration disc 6, and the limiting spring 7 is matched to apply a limiting force with a downward component to the vibration disc 6, so as to ensure that the vibration disc 6 is well attached to the base 5, the width of the inner step 52 of the base is determined by two sizes of D51 and D52, and the width should be greater than 10 mm to ensure that the vibration disc 6 has enough part to be placed in the step 52 during work, and the wall thickness of the upper side of the step is determined by the relative size of D53 and D52, and the wall thickness should be greater than 5 mm to ensure that the vibration disc 6 has enough rigidity to limit the throwing out of the polishing disc when the vibration disc 6 shakes too much, so as to prevent accidents.

[0055] The vibration motor 4 is a waterproof type with a fixed base, which is connected to the lower part of the vibration disc 6 through bolt assembly, and since the utilization rate of the vibration source is high, a type with smaller power and compact structure can be selected to reduce energy consumption and heat dissipation burden.

[0056] The polishing disc 2 is a dish-shaped structure, which is made of corrosion-resistant material such as 304 stainless steel. The outer cylindrical surface has six evenly distributed semicircular or circular limiting holes, the hole center position is concentric with the six threaded holes on the upper surface of the vibration disc 6, but the diameter is slightly larger, and the polishing disc 2 is connected with the vibration disc 6 through bolt assembly, so that the polishing disc 2 can be replaced according to different samples and the cleaning difficulty of the polishing disc 2 is reduced, the sum of the outer diameter D21 of the polishing disc 2, the hole center distance D23 of the limiting hole and the bolt diameter is less than the inner hole diameter D31 of the amplitude adjusting gland 3, the distance between the polishing disc 2 and the inner hole edge of the amplitude adjusting gland 3 is δ2 when the polishing disc 2 and the amplitude adjusting gland 3 are concentrically assembled, and δ2> δ3, which prevents the polishing disc 2 from swinging too much and causing accidents without interfering with the normal work of the polishing disc 2. The inner diameter D22 of the polishing disc 2 is slightly larger than the size (200 mm) of the common polishing cloth 8, and the inner wall of the polishing disc 2 has a certain height H22 to accommodate the polishing cloth 8 and the polishing liquid with a liquid level of at least 3 mm high, so as to avoid the overflow of the polishing liquid during the working process. The overall height H21 of the polishing disc 2 is less than the height H12 of the inner partition plate of the dustproof limiting cover 1 and has a sufficient height allowance to accommodate the bolt head.

[0057] The polishing cloth 8 is an EBSD vibration polishing damping cloth with adhesive backing, which is bonded to the polishing disc 3 through the adhesive backing, and is used with silica suspension polishing agent.

[0058] The limiting spring 7 is two groups of symmetrically distributed tension springs, the two ends are fixed with the spring mounting seat 61 on the lower part of the vibration disc 6 and the spring mounting seat 51 on the base 5 by bolts respectively, the spring mounting length is slightly larger than the free length, and since the spring mounting seat on the base 5 is closer to the bottom surface of the base 5 than the spring mounting seat on the lower part of the vibration disc 6, the limiting spring 7 can be ensured to have a certain tension after installation to realize the vertical constraint of the vibration disc, in addition, the limiting spring 7 is symmetrically installed, and when the vibration disc 6 rotates due to vibration, it can provide a reverse rotation torque to limit the rotation angle from being too large.

[0059] The amplitude adjustment gland 3 is a ring structure with a hole, which is processed from ordinary steel such as 45 steel, and has two steps inside but the same outer diameter. The upper end face has a hole, the hole size D31 is slightly larger than the outer diameter D21 of the polishing disc 3, and when the hole is concentrically assembled with the outer edge of the polishing disc 2, the distance between the inner hole and the outer edge of the polishing disc 2 is δ2, and δ2> δ3, which prevents the polishing disc 2 from swinging too much without interfering with the normal operation of the polishing disc 2; the outer side of the upper end face is processed with a certain depth of limiting groove 34 for accommodating the lower edge 11 of the dustproof limiting cover 1, the groove size is slightly larger than the wall thickness of the dustproof limiting cover 1, and the groove is concentric with the hole, which can ensure that the dustproof limiting cover 1 does not slip off during work; the inner side of the upper end face is processed with a proper length of thread 32, the thread parameters are the same as the thread parameters on the outer side of the upper end face of the base 5, and the thread can be completely tightened, the vertical distance between the vibration disc 6 and the amplitude adjustment gland 3 is adjusted by adjusting the tightening degree, and then the vertical vibration amplitude of the vibration disc 6 is adjusted, and four through threaded holes 31 are arranged below the thread 32, and the relative distance between the amplitude adjustment gland 3 and the vibration disc 6 is fixed by screwing in the bolts.

[0060] The dustproof limiting cover 1 is a barrel type structure with an inner partition plate 12, which is made of transparent and soft material such as organic glass, and the wall thickness is slightly smaller than the width of the limiting groove 34 on the upper end face of the amplitude adjustment gland 3, the dustproof limiting cover 1 has a hole partition plate 12 inside, the height H12 of the partition plate from the bottom surface is less than the minimum height (10mm) of the common sample, the inner hole diameter D11 is less than the diameter of the polishing cloth 8, the inner hole distance from the inner wall of the polishing disc 2 is δ5, which is greater than 5mm, and the top cover is higher than the maximum height (50mm) of the common sample from the upper surface of the polishing disc 2. When the dustproof limiting cover 1 is used, not only can it prevent dust and other impurities from falling into the polishing disc 2, but also can prevent the polishing liquid from being contaminated, and can limit the movement of the sample in the hole of the partition plate 12, so as to avoid the direct contact between the sample 9 and the side surface of the polishing disc 2, which causes the polishing liquid to be sucked out of the polishing disc 2 due to capillary action, resulting in loss of polishing liquid and pollution of the equipment, in addition, since the transparent material is used, it is beneficial to real-time observation of the polishing situation, and it is convenient to correct the polishing parameters in time.

[0061] The vibrating polisher for preparing metal electron backscatter diffraction samples in this embodiment operates according to the following principles: Upon powering on, the vibrating motor 4 generates a high-frequency excitation torque M, which, through a rigid connection, drives the vibrating plate 6 and polishing plate 2 to simultaneously oscillate in a circular motion. When the vibrating plate 6 rotates past a certain angle, the limit spring 7 provides a pair of diagonal downward forces F2, restricting further rotation of the vibrating plate 6 and ensuring its contact with the step 52 within the base 5, causing it to oscillate in a high-frequency circular motion at an equilibrium position. This results in high-frequency relative motion between the polishing plate 2 and the surface to be polished of the sample 9. With the assistance of the polishing fluid and polishing cloth 8, the lower surface of the sample 9 is polished. The excitation torque M causes the sample to revolve around the center of the polishing plate 2. Simultaneously, due to the varying distances between various points on the sample 9 and the center of the polishing plate 2, a resultant force F1 is generated, causing the sample 9 to rotate. Ultimately, the sample 9 rotates while simultaneously revolving, improving the utilization of the abrasive on the polishing plate 2, while reducing the directionality of the cutting marks on the surface of the sample 9 and ensuring surface uniformity. In addition, since the polishing disc 2 and the base 5 are in direct contact and sliding and are both made of metal, the heat during the polishing process can be transferred out in time to avoid overburning of the sample 9 and overheating of the vibration motor 4, and can work stably and uninterruptedly for a long time.

[0062] The actual sample preparation test of 30CrMnSiNi2A steel material was carried out. The sample was first prepared using an automatic polishing machine according to the standard metallographic sample preparation process. The grinding and polishing order was 400 mesh, 800 mesh, 1500 mesh, and 2000 mesh sandpaper, and polished with 10μm and 3.5μm diamond polishing liquid. Then, the sample 9 was thoroughly cleaned and placed on a vibration polishing machine. A polymer damping polishing cloth was used with a 0.05μm silica suspension. The vibration motor 4 was set to a speed of 3600r / min and a power of 12W. After polishing for 24 hours, the EBSD equipment was used to view the results. The test software was AZtec, and the area was 156*156μm. 2 The step size is 1.8μm, the total time is 9min 45s, the scanning speed is 0.02408351s / pt, the phases selected are Fe with FCC and BCC structures, the total calibration rate is 73.71%, which basically meets the requirements of conventional testing. Further optimization of the process will hopefully achieve better results.

[0063] The vibration polishing machine for preparing metal electron backscatter diffraction samples of the present invention has a simple and compact structure, is easy to maintain, can run stably for a long time, is easy to operate and has low cost, and can realize unattended automatic vibration polishing of samples; it has high polishing quality and can obtain a smooth, fresh surface without a micro-deformation layer for backscattered electron diffraction experiments, which is impossible or difficult to obtain using manual or mechanical polishing.

[0064] Of course, the above description is not a limitation of the present invention, and the present invention is not limited to the above examples. Changes, modifications, additions or substitutions made by technicians in this technical field within the essential scope of the present invention should also fall within the scope of protection of the present invention.

Claims

1. A vibration polishing machine for preparing metal electron backscatter diffraction samples, characterized in that: It comprises a base (5), a vibration plate (6), a vibration motor (4), a limit spring (7), a polishing plate (2), an amplitude adjustment cover (3), and a dustproof limit cover (1); The vibration disk (6) is a T-shaped structure. The upper part of the vibration disk (6) is a circular structure with several evenly distributed threaded holes connected to the polishing disk via bolts. The lower part of the vibration disk (6) is a square plate structure with reinforcing ribs, which is firmly connected to the vibration motor (4) via multiple bolts. When the vibration motor (4) is installed, the rotation axis of the motor is parallel to the central axis of the upper part of the vibration disk. At the same time, two groups of spring mounting seats are symmetrically arranged on the lower part of the vibration disk (6), and are connected to the spring mounting seats on the base via two groups of limit springs (7). The base (5) is a hollow base having an open end and a bottom end; the open end is provided with an inner step that cooperates with the circular structure of the upper portion of the vibration disk (6); after assembly, the lower portion of the vibration disk (6) is located in the hollow structure of the base (5); the upper portion of the vibration disk (6) rests on the inner step of the open end of the base (5), and the radius of the upper portion of the vibration disk (6) is smaller than the radius of the open end of the base (5); the horizontal height of the upper portion of the vibration disk (6) is greater than the horizontal height of the open end of the base (5); The polishing disc (2) is a dish-shaped structure, and is provided with a plurality of evenly distributed semicircular or circular limiting holes on its outer edge. The specifications of the limiting holes match the threaded holes on the upper part of the vibration disc (6), and are rigidly connected to the vibration disc (6) by bolt assembly. The amplitude adjustment cover (3) is a hollow columnar structure with a plurality of threaded holes on the side wall, the diameter of the upper hollow part of the amplitude adjustment cover (3) is smaller than the diameter of the lower hollow part, but the outer diameters of the upper and lower parts are equal; the diameter of the upper hollow part of the amplitude adjustment cover (3) is larger than the diameter of the polishing disc (2) but smaller than the diameter of the upper part of the vibration disc (6); the middle part of the amplitude adjustment cover (3) is provided with an internal thread of a certain length, and the internal thread of the amplitude adjustment cover (3) can be matched with the thread on the outer wall of the base (5); the lower side of the interior of the amplitude adjustment cover (3) is provided with a guide limiting belt, the diameter of which is larger than the minor diameter of the internal thread, and the threaded holes on the side wall of the amplitude adjustment cover (3) are opened in the area of ​​this guide limiting belt; The internal thread of the amplitude adjustment cover (3) cooperates with the base (5) to adjust the height and pressing force between the inner end surface of the amplitude adjustment cover (3) and the upper surface of the vibration plate (6), thereby limiting the vertical amplitude of the vibration plate (6); A guide limit strip is provided at the lower portion of the internal thread of the amplitude adjustment cover (3), which is used for thread guide when the amplitude adjustment cover (3) and the base (5) are installed together, thereby reducing the difficulty of installation; Several threaded holes designed on the side wall of the amplitude adjustment cover (3) are located in the guide limit zone below the internal thread and are used to fix the relative position between the amplitude adjustment cover (3) and the base (5), ensuring that the amplitude adjustment cover (3) will not become loose due to the vibration of the machine body after the amplitude is adjusted, thereby achieving stable control of the amplitude; The upper end of the amplitude adjustment pressure cover (3) is provided with a limiting groove for cooperating with the dustproof limiting cover (1).

2. The vibration polishing machine for preparing metal electron backscatter diffraction samples according to claim 1, characterized in that: The base (5) is a barrel-shaped structure, and an inner step is provided at the open end to cooperate with the circular structure of the upper part of the vibration plate (6). After assembly, the lower part of the vibration plate (6) is located in the barrel-shaped structure of the base (5); The outer side of the upper end of the base (5) is provided with a thread, and the base (5) is connected to the amplitude adjustment cover (3) through the thread provided on the outer side of the upper end thereof. Two groups of spring mounting seats are symmetrically provided inside, and a through hole is left on the lower end surface of the base.

3. The vibration polishing machine for preparing metal electron backscatter diffraction samples according to claim 1, characterized in that: The upper end surface of the vibration disk (6) is uniformly distributed with threaded holes (62), and bolts are used to cooperate with the outer edge holes (21) of the polishing disk (2) through the threaded holes (62) to realize the rigid connection between the vibration disk (6) and the polishing disk (2). The diameter D61 of the upper part of the vibration disk (6) is smaller than the diameter D52 of the inner step (52) of the upper part of the base 5. When it is concentrically installed on the inner step (52) of the base (5), a certain horizontal gap δ3 is left between it and the inner step wall of the base (5); to ensure the vibration margin of the vibration disk in the horizontal direction, the thickness H62 of the upper part of the vibration disk (6) is greater than the height H52 of the inner step (52) of the base (5). After concentric installation, the height is δ4, which is used to ensure that the amplitude adjustment cover (3) can completely press the vibration disk (6) when needed. The vibration disk ( 6) The amplitude in the vertical direction is adjusted by the amplitude adjustment cover (3) to adjust the degree of compression of the vibration disk (6); the lower part of the vibration disk (6) is a square plate structure with reinforcing ribs, and is rigidly connected to the vibration motor (4) by a plurality of bolts, and the rotation axis of the vibration motor (4) is parallel to the central axis of the upper part of the vibration disk (6), and two groups of spring mounting seats (61) are provided to limit the vibration disk (6) during operation, and the distance H61 between the spring mounting seat (61) and the lower end surface of the upper part of the vibration disk (6) is smaller than the distance H51 between the upper step (52) of the base (5) and the internal spring mounting seat (51), so that the limit spring (7) gives the vibration disk (6) a certain downward pulling force during assembly to achieve fit with the base (5).

4. The vibration polishing machine for preparing metal electron backscatter diffraction samples according to claim 1, characterized in that: When the vibration plate (6) is used, the vibration plate (6) and the vibration motor (4) are first connected with bolts, and the power line is led out of the base. Then, the vibration plate (6) and the base (5) are connected with the limit spring (7), and the fitting condition of the vibration plate (6) and the base (5) is checked.

5. The vibration polishing machine for preparing metal electron backscatter diffraction samples according to claim 1, characterized in that: The base (5) is a barrel-shaped structure, and an inner step (52) is provided at the upper end for accommodating and limiting the vibration disk (6). A thread (53) of a certain length is provided on the outer side of the upper end for connecting and locking with the amplitude adjustment cover (3). Two spring mounting seats (51) are provided inside, and the height H51 from the end face of the inner step of the base (5) is greater than the distance H61 from the spring mounting seat (61) on the vibration disk (6) to the upper lower end face of the vibration disk (6). The limiting spring (7) is used to apply a limiting force with a downward component to the vibration disk (6), and when working, a sufficient part of the vibration disk (6) rests on the step (52).

6. The vibration polishing machine for preparing metal electron backscatter diffraction samples according to claim 1, characterized in that: The vibration motor (4) is a waterproof vibration motor with a fixed base, and is connected to the square plate structure at the bottom of the vibration disk via bolts.

7. The vibration polishing machine for preparing metal electron backscatter diffraction samples according to claim 1, characterized in that: The limit spring (7) is a symmetrically distributed tension spring, with its two ends respectively connected to the spring mounting seat (61) at the lower part of the vibration plate (6) and the spring mounting seat (51) on the base (5); the number of the springs is equal to the number of the two groups of spring mounting seats (61) symmetrically arranged at the lower part of the vibration plate (6).

8. The vibration polishing machine for preparing metal electron backscatter diffraction samples according to claim 1, characterized in that: The upper hollow portion, the middle threaded portion (32), the lower guide limiting belt (33), the upper end surface limiting groove (34) and the outer diameter of the amplitude adjustment cover (3) are all designed to be concentric.

9. The vibration polishing machine for preparing metal electron backscatter diffraction samples according to claim 1, characterized in that: The limiting groove has a certain depth for cooperating with the dustproof limiting cover, and the lower part of the pressure cover cooperates with the base through threads.

10. The vibration polishing machine for preparing metal electron backscatter diffraction samples according to claim 1, characterized in that: The dustproof limit cover is a single-layer barrel-shaped structure with partitions. The wall thickness is slightly smaller than the width of the amplitude adjustment cover limit slot. It can be inserted into the upper limit slot of the amplitude adjustment cover to cooperate with it. There is a perforated partition structure at an appropriate height inside.

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