Mask pre-alignment device and wafer exposure equipment

Abstract

The present application relates to the technical field of photolithography exposure equipment, and specifically discloses a mask pre-alignment device and a wafer exposure device, including a first sliding assembly and a second sliding assembly; the first sliding assembly is provided with two first clamping members, and the second sliding assembly is provided with two second clamping members; the first clamping member can move along a first direction on the first sliding assembly, and the second clamping member can move along a second direction on the second sliding assembly, and the first direction intersects with the second direction; the middle of the area enclosed by the first clamping member and the second clamping member has a reference plane that coincides with the mask after calibration, the two first clamping members are located on both sides of the mask along the second direction, and the two second clamping members are located on both sides of the mask along the first direction. The present application can calibrate the position of the mask, effectively reduce the deflection of the mask, and is conducive to improving the positioning accuracy of the mask on the mask stage.

Description

Technical Field

[0001] The present application relates to the technical field of photolithography exposure equipment, and in particular to a mask pre-alignment device and a wafer exposure equipment. Background Art

[0002] Masks, also known as photolithography masks or photomasks, are precision components used in the photolithography process in the manufacture of microelectronics and integrated optoelectronics. Masks are very sensitive to particles or contaminants, so they are placed in special mask boxes during storage. Only during the exposure process are they taken out of the mask box by a robot and placed on the mask stage for exposure. Traditional lithography machines generally take the mask out of the mask storage library directly and place it on the mask stage for coarse and fine alignment. Since the displacement of the coarse and fine alignment moving mechanisms on the mask stage is small, and the mask is likely to have a large deflection in the mask box or during the transfer process of the robot, once the deflection is large, it will cause the coarse alignment process of the mask stage to fail to complete the adjustment of the mask deflection position, thereby affecting the fine alignment and exposure. Summary of the invention

[0003] The purpose of the present application is to provide a mask pre-alignment device and a wafer exposure device, which can calibrate the position of the mask, effectively reduce the deflection of the mask, and help improve the positioning accuracy of the mask on the mask stage.

[0004] This application adopts the following technical solutions:

[0005] In the first aspect, an embodiment of the present application provides a mask pre-alignment device, comprising a first sliding component and a second sliding component; two first clamps are provided on the first sliding component, and two second clamps are provided on the second sliding component; the two first clamps can approach or move away from each other along a first direction on the first sliding component, and the two second clamps can approach or move away from each other along a second direction on the second sliding component, and the first direction intersects the second direction perpendicularly; the middle part of the area enclosed by the two first clamps and the two second clamps has a reference plane that coincides with the mask after calibration, the two first clamps are located on both sides of the mask along the second direction, and the two second clamps are located on both sides of the mask along the first direction; the first clamps and the second clamps are driven to move and push the mask to coincide with the reference plane.

[0006] As an optional implementation, a clamping wheel set suitable for abutting against a side edge of the mask is provided on the first clamping member and / or the second clamping member, and a rotation axis of the clamping wheel set intersects with a horizontal plane where the mask is located.

[0007] As an optional implementation, the clamping wheel set includes one or at least two clamping wheels located on the same side, and the at least two clamping wheels are arranged at intervals along the side of the mask.

[0008] As an optional embodiment, it also includes a horizontally arranged mask support platform, on which a plurality of support structures arranged at intervals are arranged, and an air nozzle is provided on the support structure, and the air nozzle is connected to the air pump device through an air pipe; the air nozzle can form a thrust to balance the gravity of the mask by blowing air toward the mask, so that the mask is suspended and a gap is formed between the mask and the support structure; the air nozzle can form a negative pressure suction force acting on the mask by sucking air, so that the mask is in contact with the support structure.

[0009] As an optional embodiment, the first sliding assembly includes two first sliding rails, and the two first clamping members are respectively slidably installed on the two first sliding rails; the second sliding assembly includes two second sliding rails, and the two second clamping members are respectively slidably installed on the second sliding rails; the two first sliding rails and the two second sliding rails form a cross structure.

[0010] As an optional embodiment, the first slide rail and the second slide rail are respectively provided with a driving component, and the driving component on the first slide rail can drive the first clamping member on the first slide rail to approach or move away from the reference plane; the driving component on the second slide rail can drive the second clamping member on the second slide rail to approach or move away from the reference plane.

[0011] As an optional embodiment, the driving assembly includes a telescopic cylinder and a return spring, wherein the telescopic cylinder can drive the first clamping member / the second clamping member to approach or move away from the reference plane, and the return spring can stretch to form a traction force to return the first clamping member / the second clamping member to its original position.

[0012] As an optional embodiment, it also includes a position adjustment member arranged at one end of the first slide rail away from the reference plane, and the position adjustment member can abut against the first clamping member and move in the extension direction of the first slide rail to change the maximum distance between the first clamping member and the center of the reference plane; and / or, it also includes a position adjustment member arranged at one end of the second slide rail away from the reference plane, and the position adjustment member can abut against the second clamping member and move in the extension direction of the second slide rail to change the maximum distance between the second clamping member and the center of the reference plane.

[0013] As an optional embodiment, it also includes a support base, and the first slide rail is provided with a position adjustment groove extending along the first direction, and a bolt connector connected to the support base is passed through the position adjustment groove; and / or, the second slide rail is provided with a position adjustment groove extending along the second direction, and a bolt connector connected to the support base is passed through the position adjustment groove.

[0014] As an optional implementation, it further comprises a protective shell, wherein a temporary storage location for storing the mask is arranged inside the protective shell.

[0015] In the second aspect, an embodiment of the present application also provides a wafer exposure device, including a mask storage library, a mask stage, a gripping mechanism and the above-mentioned mask pre-alignment device; the gripping mechanism can place the mask placed in the mask storage library on the mask pre-alignment device, and the gripping mechanism can place the pre-positioned mask on the mask stage.

[0016] As an optional implementation, the gripping mechanism can place the mask on the mask stage onto the mask pre-alignment device.

[0017] The beneficial effects of the embodiments of the present application include:

[0018] The mask pre-alignment device provided in the embodiment of the present application includes a first sliding component and a second sliding component; two first clamping members are provided on the first sliding component, and two second clamping members are provided on the second sliding component; the first clamping member of the embodiment of the present application can move along the first direction on the first sliding component, and the second clamping member can move along the second direction on the second sliding component, and the first direction intersects with the second direction; the middle part of the enclosed area of ​​the first clamping member and the second clamping member of the embodiment of the present application has a reference plane that coincides with the mask after calibration, and the two first clamping members of the embodiment of the present application are located on both sides of the mask along the second direction, and the two second clamping members are located on both sides of the mask along the first direction; the first clamping member and the second clamping member are driven to move and push the mask to coincide with the reference plane. The prior art is to directly place the mask on the mask stage and perform position calibration through the mask stage. Since the adjustment range of the mask stage that can be provided by the prior art is limited, once the offset of the mask is too large, it is difficult for the mask stage to perform high-precision position adjustment. The embodiment of the present application can greatly reduce the offset of the mask plate through pre-adjustment, which is beneficial to improving the high-precision positioning of the mask plate on the mask stage.

[0019] The embodiment of the present application also provides a wafer exposure device, including a mask storage library, a mask stage, a gripping mechanism, and the above-mentioned mask pre-alignment device; the gripping mechanism of the embodiment of the present application can place the mask placed in the mask storage library on the mask pre-alignment device, and the gripping mechanism can place the pre-positioned mask on the mask stage. The embodiment of the present application can calibrate the position of the mask through the mask pre-alignment device, effectively reduce the offset of the mask, and facilitate the mask stage to implement high-precision positioning after the gripping mechanism places the mask on the mask stage, so the embodiment of the present application can effectively improve the lithography accuracy. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0021] Figure 1 This is one of the structural schematic diagrams of the mask pre-alignment device according to an embodiment of the present application.

[0022] Figure 2 This is the second structural schematic diagram of the mask pre-alignment device according to an embodiment of the present application.

[0023] Figure 3 This is one of the schematic diagrams of mask position calibration according to an embodiment of the present application.

[0024] Figure 4 This is the second schematic diagram of the mask position calibration according to the embodiment of the present application.

[0025] Figure 5 This is the third schematic diagram of the mask position calibration according to the embodiment of the present application.

[0026] Figure 6 This is the third structural schematic diagram of the mask pre-alignment device according to an embodiment of the present application.

[0027] Figure 7 This is one of the schematic diagrams of the outer shell of the mask pre-alignment device according to an embodiment of the present application.

[0028] Figure 8 This is the second schematic diagram of the outer shell of the mask pre-alignment device according to the embodiment of the present application.

[0029] Icons: 100-first sliding assembly; 101-second sliding assembly; 102-first clamping member; 103-second clamping member; 104-first direction; 105-second direction; 106-reference plane; 107-clamping wheel; 108-supporting structure; 110-first slide rail; 111-second slide rail; 112-telescopic cylinder; 113-reset spring; 114-position adjustment member; 115-support base; 116-position adjustment groove; 117-bolt connector; 118-protective shell; 119-temporary storage position; 120-access port; 121-notch; 122-control compartment; 123-exhaust fan. DETAILED DESCRIPTION

[0030] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations.

[0031] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the present application for which protection is sought, but merely represents selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present application.

[0032] It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in the subsequent drawings. In addition, the terms "first", "second", "third", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0033] In the description of this application, it should also be noted that, unless otherwise clearly specified and limited, the terms "set", "install", "connect", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0034] Traditional lithography machines generally take the mask out of the mask storage library directly and place it on the mask stage for coarse and fine alignment. Since the displacement of the coarse and fine alignment moving mechanisms on the mask stage is small, and the mask is likely to have a large deflection in the mask box or during the robot transfer process, once the deflection is large, the coarse alignment process of the mask stage will not be able to complete the adjustment of the mask deflection position, thereby affecting the fine alignment and exposure.

[0035] In order to solve the above technical problems, an embodiment of the present application provides a mask pre-alignment device and a wafer exposure equipment.

[0036] Reference Figure 1 , Figure 2 as well as Figure 5As shown, the embodiment of the present application provides a mask pre-alignment device, including a first sliding component 100 and a second sliding component 101; the first sliding component 100 is provided with two first clamping members 102, and the second sliding component 101 is provided with two second clamping members 103; the two first clamping members 102 can approach or move away from each other along a first direction 104 on the first sliding component 100, and the two second clamping members 103 can approach or move away from each other along a second direction 105 on the second sliding component 101, and the first direction 104 intersects with the second direction 105. The intersection of the first direction 104 and the second direction 105 described here is essentially used to indicate that the first sliding component 100 and the second sliding component 101 intersect. The sliding directions of the two first clamping members 102 and the two second clamping members 103 are arranged to intersect; the middle part of the area enclosed by the two first clamping members 102 and the two second clamping members 103 has a reference plane 106 that coincides with the mask after calibration, the two first clamping members 102 are located on both sides of the mask along the second direction 105, and the two second clamping members 103 are located on both sides of the mask along the first direction 104; the first clamping member 102 and the second clamping member 103 are driven to move and push the mask to coincide with the reference plane 106, and the position of the reference plane 106 is the reference position set by the pre-alignment of the mask, and the mask is clamped toward the center by the clamping members at this position, and then the mask is adjusted to coincide with the reference plane 106, and the reference position is adjusted during the assembly process of the device.

[0037] It should be noted that the first sliding assembly 100 and the second sliding assembly 101 in the embodiment of the present application can be two sliding rails intersecting with each other, or three sliding rails or four sliding rails arranged in a cross shape. Those skilled in the art can set them as needed, and no special limitation is made here. When there are three sliding rails, one sliding rail extends along the first direction 104, and the other two sliding rails are respectively arranged on both sides of the first direction 104. Regardless of how many sliding rails are set, the sliding rails arranged along the first direction 104 are arranged vertically with the sliding rails arranged along the second direction 105, and the center of the intersection of the sliding rails in the first direction 104 and the second direction 105 coincides with the center of the reference plane 106.

[0038] It should be noted that the first direction 104 intersects with the second direction 105 , and the angle between them can be set by those skilled in the art according to the specific shape of the mask.

[0039] Preferably, when the mask is a rectangular plate, the first direction 104 and the second direction 105 are perpendicular to each other, that is, the first direction 104 and the second direction 105 are perpendicular to each other.

[0040] It should be noted that the first clamping member 102 can move on the first sliding assembly 100, and when the first clamping member 102 abuts against the mask, it can push the mask to move. Similarly, the second clamping member 103 can also push the mask to move. Under the encirclement of the two groups of first clamping members 102 and the two groups of second clamping members 103, the mask will move toward the reference plane 106. Among them, the edge of the mask with a larger offset will first abut against the clamping member. It should be noted that after each group of clamping members moves to a predetermined position, it stops moving to prevent excessive pushing of the mask. Ensure that the corresponding two groups of first clamping members 102 and the corresponding two groups of second clamping members 103 can accurately position the mask.

[0041] It should be noted that, compared with the positioning range of the mask stage, the first clamping member 102 and the second clamping member 103 of the embodiment of the present application have a larger movement distance, which facilitates the position calibration of the mask in a larger range.

[0042] In addition, the distance between the first clamping member 102 and the second clamping member 103 and the center can be adjusted according to the accuracy of the gripping mechanism. If the transfer accuracy of the gripping mechanism is poor, the first clamping member 102 and the second clamping member 103 can be preset with a larger pre-alignment space. If the accuracy of the gripping mechanism is good and the offset of the mask is small, the first clamping member 102 and the second clamping member 103 can be preset with a smaller pre-alignment space. The pre-alignment space mentioned here refers to the space between the maximum position and the minimum position of the clamping member being driven, that is, Figures 3 to 5 The space between the two dashed boxes.

[0043] The mask pre-alignment device provided in the embodiment of the present application includes a first sliding component 100 and a second sliding component 101; two first clamping members 102 are provided on the first sliding component 100, and two second clamping members 103 are provided on the second sliding component 101; the two first clamping members 102 in the embodiment of the present application are suitable for moving along a first direction 104 on the first sliding component 100, and the two second clamping members 103 are suitable for moving along a second direction 105 on the second sliding component 101, and the first direction 104 intersects with the second direction 105; the middle part of the area enclosed by the two first clamping members 102 and the two second clamping members 103 in the embodiment of the present application has a reference plane 106 that coincides with the mask after calibration, the two first clamping members 102 in the embodiment of the present application are located on both sides of the mask along the second direction 105, and the two second clamping members 103 are located on both sides of the mask along the first direction 104; the first clamping members 102 and the second clamping members 103 are driven to move and push the mask to coincide with the reference plane 106. The prior art is to directly place the mask on the mask stage and perform position calibration through the mask stage. Since the adjustment range of the mask stage provided by the prior art is limited, once the offset of the mask is too large, it is difficult for the mask stage to perform high-precision position adjustment. The embodiment of the present application can greatly reduce the offset of the mask through pre-alignment adjustment, which is conducive to improving the high-precision positioning of the mask on the mask stage, and saves the position adjustment time of the rough alignment at the mask stage, which can greatly improve the alignment efficiency.

[0044] Reference Figure 1 and Figure 2 As shown, as an optional embodiment, a clamping wheel set suitable for abutting against the side of the mask is provided on the first clamping member 102 and / or the second clamping member 103, and the rotation axis of the clamping wheel set intersects with the horizontal plane where the mask is located.

[0045] Preferably, the first clamping member 102 and the second clamping member 103 are provided with clamping wheel groups capable of abutting against the side edges of the mask, and the rotation axis of the clamping wheel groups is perpendicular to the plane where the mask is located.

[0046] It should be noted that, in the embodiment of the present application, the first clamping member 102 and the second clamping member 103 can achieve adaptive adjustment with the contact surface of the side edge of the mask through the provision of the clamping wheel set.

[0047] Taking the first clamping member 102 as an example, after the first clamping member 102 abuts against the side of the mask, the first clamping member 102 continues to move, and the mask deflects and self-adjusts due to the abutment of the side in suspension, and at this time, the side of the mask will slide with the clamping wheel set. The embodiment of the present application converts sliding friction into rolling friction through the setting of the clamping wheel set, which not only makes the deflection adjustment of the mask smoother, but also protects the side of the mask to prevent excessive wear of the side of the mask.

[0048] Preferably, the clamping wheel set includes at least two clamping wheels 107 located on the same side, and the at least two clamping wheels 107 are arranged at intervals along the side of the mask. The embodiment of the present application can greatly improve the accuracy of position calibration by providing multiple clamping wheels 107.

[0049] Exemplarily, the clamping wheel set includes two clamping wheels 107, and the two clamping wheels 107 are arranged at intervals along the side of the mask. In the embodiment of the present application, a total of eight clamping wheels 107 can enclose the reference plane 106 into a rectangle. The size of the reference plane 106 is consistent with the size of the mask and the edges overlap. The mask can be overlapped with the reference plane 106 by enclosing the eight clamping wheels 107.

[0050] Preferably, one side of the mask has two clamping wheels 107, and the other three sides each have a clamping wheel 107. The embodiment of the present application realizes the positioning of the mask by four clamping wheels 107, wherein two corresponding sides each have a clamping wheel 107, so that the fork plate can take and place the mask from the opposite side or the adjacent two sides of the two clamping wheels 107, thereby realizing the avoidance design of the structure. In addition, the embodiment of the present application uses fewer clamping wheels 107, which can also effectively reduce the equipment cost.

[0051] It should be noted that, as a preference, the mask is taken and placed only from one side, that is, the side opposite to the two clamping wheels 107. Figure 2 In the perspective shown, there are two clamping wheels 107 on the upper right side and one clamping wheel 107 on the lower left side, and the lower left side is defined as the pick-and-place side. Figure 7 , Figure 8 As shown, a corresponding access opening 120 is opened on the protection shell 118 .

[0052] As an optional embodiment, a flexible sleeve capable of contacting the side of the mask is sleeved on the circumference of the clamping wheel 107. Sleeving the flexible sleeve on the clamping wheel 107 can not only improve the clamping effect of the mask, but also reduce the wear or damage to the side of the mask, and has a certain flexible protection effect.

[0053] It should be noted that the flexible sleeve is made of plastic and silicone rubber for industrial rollers. The compression amount of the flexible sleeve should be less than 0.5mm when it is pressed to prevent the position accuracy of the mask from being reduced due to excessive elasticity of the flexible sleeve.

[0054] Of course, since the size of the clamping wheel of the device is not large, in a preferred embodiment, there is no need to set a flexible sleeve on the clamping wheel, and the clamping wheel 107 is directly made into an integrated structure, and the selected materials include plastic for industrial rollers, silicone rubber, etc.

[0055] Reference Figure 2As shown, as an optional embodiment, it also includes a horizontally arranged mask support platform, on which a plurality of spaced support structures 108 are arranged. It also includes an air nozzle, which is connected to the air pump device through an air pipe. The air nozzle can form a thrust to balance the gravity of the mask by blowing air to the mask above, so that a gap is formed between the mask and the support structure 108 and the mask is in a suspended state; the air nozzle can form a negative pressure suction force acting on the back of the mask by sucking air, so that the mask and the support structure 108 are in contact. In addition, the air nozzle can be fixedly arranged at the upper end of the support structure 108 to support the mask.

[0056] It should be noted that, refer to Figure 2 As shown, the mask support platform is provided with notches 121 around it, and the notches 121 are provided corresponding to the first clamping member 102 and the second clamping member 103, so that the first clamping member 102 and the second clamping member 103 do not interfere with the mask support platform during the clamping movement.

[0057] It should be noted that the air nozzle can be directly set on the supporting structure 108 or on the mask supporting platform. Technicians in this field can set it according to needs. As long as it can achieve blowing or adsorption and fixation of the mask, the specific setting method or position is not limited.

[0058] The air nozzle of the embodiment of the present application is connected to an air pump device, and blowing or exhausting air is achieved through the air pump device.

[0059] In the embodiment of the present application, the mask is suspended by blowing air, which can avoid friction between the mask and the supporting structure 108 during the centering process of the pre-alignment adjustment, reduce the friction force on the mask, improve the flexibility during the clamping and positioning process, and avoid wear on the mask. In the embodiment of the present application, after the position of the mask is adjusted, the blowing is stopped, and the mask falls downward on the supporting structure 108 under the action of its own gravity, and the lower surface of the mask contacts the end of the air nozzle, and then the air nozzle starts to evacuate air to vacuum adsorb the mask. Therefore, the present application realizes negative pressure fixation by evacuating air, so that the mask can be stably maintained in the aligned position, and even if the first clamp 102 and the second clamp 103 are removed, the mask can be prevented from shifting, and has strong posture stability.

[0060] The size of the gap between the mask and the supporting structure 108 can be selected by those skilled in the art as needed. It should be noted that the maximum gap between the mask and the supporting structure 108 does not exceed the axial dimension of the clamping wheel 107 to prevent the clamping wheel 107 from being unable to clamp the mask.

[0061] It should be noted that the vertical height of the support structure 108 is slightly greater than the vertical dimension (ie, thickness) of the fork plate for grabbing the mask, so that the fork plate does not structurally interfere with the mask support platform when grabbing the mask on the mask support platform.

[0062] The specific location and number of the supporting structure 108 in the embodiment of the present application can be selected by those skilled in the art according to needs, and there is no special limitation on this.

[0063] For example, there are four supporting structures 108 , which support the four corners of the mask respectively. The number and specific location of the air nozzles can be set by those skilled in the art as needed, so that a floating gap can be formed between the mask and the supporting structure 108 .

[0064] It should be noted that the embodiment of the present application can improve the centering and alignment effect of pre-alignment by generating a suspension gap. The present application sets the clamping wheel to rotate and makes the mask plate in a suspended state when clamping and centering, so as to maximize the sensitivity of the mask plate position adjustment, and then when the clamping wheels in four directions move toward the middle and clamp and center, the mask plate can be quickly adjusted to the centering and alignment position, that is, consistent with the preset pre-alignment position.

[0065] Better, refer to Figure 6 As shown, the first sliding assembly 100 includes two first sliding rails 110, and two first clamping members 102 are respectively slidably installed on the two first sliding rails 110; the second sliding assembly 101 includes two second sliding rails 111, and two second clamping members 103 are respectively slidably installed on the second sliding rails 111; the two first sliding rails 110 and the two second sliding rails 111 form a cross structure.

[0066] Among them, the first slide rail 110 and the second slide rail 111 are respectively provided with driving components. The driving component on the first slide rail 110 can drive the first clamping member 102 to approach or move away from the reference plane 106 on the first slide rail 110; the driving component on the second slide rail 111 can drive the second clamping member 103 to approach or move away from the reference plane 106 on the second slide rail 111.

[0067] It should be noted that the driving component can be a linear motor or other linear driving module.

[0068] Reference Figure 6 As shown, as an optional embodiment, the driving assembly includes a telescopic cylinder 112 and a reset spring 113. The telescopic cylinder 112 can drive the first clamping member 102 / the second clamping member 103 to approach or move away from the reference plane 106, and the reset spring 113 can stretch to form a traction force to reset the first clamping member 102 / the second clamping member 103.

[0069] Exemplarily, the telescopic cylinder 112 can drive the first clamping member 102 to approach the reference plane 106, and the return spring 113 can be stretched to form a traction force that causes the first clamping member 102 to move away from the reference plane 106. The telescopic cylinder 112 can drive the second clamping member 103 to approach the reference plane 106, and the return spring 113 can be stretched to form a traction force that causes the second clamping member 103 to move away from the reference plane 106.

[0070] Exemplarily, the telescopic cylinder 112 can drive the first clamping member 102 away from the reference plane 106, and the return spring 113 can be stretched to form a traction force that makes the first clamping member 102 approach the reference plane 106. The telescopic cylinder 112 can drive the second clamping member 103 away from the reference plane 106, and the return spring 113 can be stretched to form a traction force that makes the second clamping member 103 approach the reference plane 106.

[0071] It should be noted that, refer to Figure 3 , Figure 4 as well as Figure 5 As shown in the figure, when the mask is placed on the mask support platform and the mask has not been positioned, the airflow ejected by the air nozzle has a supporting effect on the mask. That is, after the fork plate puts the mask in, the mask does not contact the supporting end surface of the air nozzle, but is suspended above the mask support platform under the action of the upward airflow, and the magnitude of the air flotation force is based on the width range and height range defined by the clamping wheels 107 in four directions of the mask. Then, the embodiment of the present application starts to execute the action, the telescopic cylinder 112 releases the gas filled therein, and under the pulling force of the reset spring 113, the clamping wheels 107 in four directions move toward the center along the slide rail, and the limit point of the clamping wheels 107 moving toward the center is the adjusted reference plane 106, that is, in the process of the clamping wheels 107 in four directions moving from the expanded position to the center, one or more of the clamping wheels 107 first touches the side with the largest deviation from the center point, and at the same time, the clamping wheels 107 continue to shrink and move toward the center and push the side to move toward the center, and under the joint adjustment of the other clamping wheels 107 from the other three directions, when the clamping plates in the four directions all move toward the center to the maximum limit position, the mask is adjusted to the preset center position and straightened, and the pre-alignment position is reached at this time, so that the mask coincides with the reference plane 106.

[0072] Reference Figure 6As shown, as an optional embodiment, it also includes a position adjustment member 114 arranged at the end of the first slide rail 110 away from the reference plane 106, and the position adjustment member 114 can abut against the first clamping member 102 and move in the extension direction of the first slide rail 110 to change the maximum distance between the first clamping member 102 and the center of the reference plane 106; and / or, it also includes a position adjustment member 114 arranged at the end of the second slide rail 111 away from the reference plane 106, and the position adjustment member 114 can abut against the second clamping member 103 and move in the extension direction of the second slide rail 111 to change the maximum distance between the second clamping member 103 and the center of the reference plane 106.

[0073] The present application can adjust the distance between the first clamping member 102 and the second clamping member 103 and the center of the reference plane 106 through the setting of the position adjustment member 114. It should be noted that the limit distance specifically includes the maximum distance and the minimum distance between the first clamping member 102 and the second clamping member 103 and the center of the reference plane 106.

[0074] The position adjusting member 114 may be an adjusting bolt, or a limiting protrusion or the like, and those skilled in the art may select the structure according to their needs.

[0075] Reference Figure 6 As shown, as an optional embodiment, it also includes a support base 115, a position adjustment groove 116 extending along the first direction 104 is provided on the first slide rail 110, and a bolt connector 117 connected to the support base 115 is passed through the position adjustment groove 116; and / or, a position adjustment groove 116 extending along the second direction 105 is provided on the second slide rail 111, and a bolt connector 117 connected to the support base 115 is passed through the position adjustment groove 116.

[0076] The embodiment of the present application can change the moving range of the clamping wheel 107 by adjusting the positions of the first slide rail 110 and the second slide rail 111, so that the user can obtain a suitable calibration space according to the size of the mask plate, and it is also convenient to adjust the clamping space where the reference plane 106 is located during assembly.

[0077] In one embodiment, a protective shell 118 is further included. The protective shell 118 is encapsulated into a cubic structure and surrounds all components. The protective shell 118 can protect the entire device. A pick-up and drop-out port 120 is provided at the mask position. The plate fork puts the mask into the pre-alignment device or takes out the pre-aligned mask through the pick-up and drop-out port 120.

[0078] In other embodiments, the pre-alignment mechanism may be provided in more than two groups in the longitudinal direction or the transverse direction to perform pre-alignment of more than two masks.

[0079] See also Figure 7 The pre-alignment mechanism also includes a temporary storage position 119, which is arranged at the lower side of the pre-alignment position. A support plate is arranged at the pre-alignment position, and a support portion is arranged above the support plate. The support portion is arranged at the four corners of the mask to support the mask. The temporary storage position 119 is mainly used to store the mask to be pre-aligned or to be transported out from the mask table or mask storage, so as to facilitate temporary or long-term storage of the mask. Setting the temporary storage position 119 can not only improve the work efficiency of the pre-alignment work, but also meet the temporary storage needs of the mask, providing greater convenience for the transportation of the mask.

[0080] See also Figure 8 A control compartment 122 is also provided below the pre-alignment device, and the control compartment 122 is used to store control components and related electrical components, etc. A heat exhaust fan 123 is provided on one side of the control compartment 122 to discharge the heat generated in the control compartment 122 during operation.

[0081] An embodiment of the present application also provides a wafer exposure device, including a mask storage library, a mask stage, a gripping mechanism and the above-mentioned mask pre-alignment device; the gripping mechanism of the embodiment of the present application can place the mask placed in the mask storage library on the mask pre-alignment device, and the gripping mechanism can place the pre-positioned mask on the mask stage.

[0082] The embodiment of the present application can calibrate the position of the mask through the mask pre-alignment device, effectively reduce the offset of the mask, and facilitate the high-precision positioning of the mask stage after the gripping mechanism places the mask on the mask stage. Therefore, the embodiment of the present application can effectively improve the mask alignment efficiency and lithography accuracy.

[0083] As an optional implementation, the gripping mechanism can place the mask on the mask stage onto the mask pre-alignment device.

[0084] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A mask pre-alignment device, characterized in that: The invention comprises a first sliding component (100) and a second sliding component (101); the first sliding component (100) is provided with two first clamping members (102), and the second sliding component (101) is provided with two second clamping members (103); the two first clamping members (102) are suitable for moving closer to or farther from each other along a first direction (104) on the first sliding component (100), and the two second clamping members (103) are suitable for moving closer to or farther from each other along a second direction (105) on the second sliding component (101); the first direction (104) The first clamping members (102) and the second clamping members (103) intersect perpendicularly with the second direction (105); the middle of the area enclosed by the two first clamping members (102) and the two second clamping members (103) has a reference plane (106) that coincides with the mask after calibration; the two first clamping members (102) are located on both sides of the mask along the second direction (105); the two second clamping members (103) are located on both sides of the mask along the first direction (104); the first clamping members (102) and the second clamping members (103) are driven to move and push the mask to coincide with the reference plane (106); The mask pre-alignment device also includes a horizontally arranged mask support platform, on which a plurality of support structures (108) are arranged at intervals; it also includes an air nozzle, an air pump device, and an air pipe connecting the air nozzle and the air pump device; the air nozzle can form a thrust to balance the gravity of the mask by blowing air toward the mask, so that the mask is suspended and a gap is formed between the mask and the support structure (108); the air nozzle can form a negative pressure suction force acting on the mask by sucking air, so that the mask and the support structure (108) are in contact.

2. The mask pre-alignment device according to claim 1, characterized in that: The first clamping member (102) and / or the second clamping member (103) is provided with a clamping wheel group suitable for abutting against the side edge of the mask, and the rotation axis of the clamping wheel group intersects with the horizontal plane where the mask is located.

3. The mask pre-alignment device according to claim 2, characterized in that: The clamping wheel set comprises one or at least two clamping wheels (107) located on the same side, and the at least two clamping wheels (107) are arranged at intervals along the side edge of the mask.

4. The mask pre-alignment device according to any one of claims 1 to 3, characterized in that: The first sliding assembly (100) comprises two first sliding rails (110), and the two first clamping members (102) are respectively slidably mounted on the two first sliding rails (110); the second sliding assembly (101) comprises two second sliding rails (111), and the two second clamping members (103) are respectively slidably mounted on the second sliding rails (111); the two first sliding rails (110) and the two second sliding rails (111) form a cross-shaped structure.

5. The mask pre-alignment device according to claim 4, characterized in that: The first slide rail (110) and the second slide rail (111) are respectively provided with driving components. The driving component on the first slide rail (110) can drive the first clamping member (102) on the first slide rail (110) to approach or move away from the reference surface (106); the driving component on the second slide rail (111) can drive the second clamping member (103) on the second slide rail (111) to approach or move away from the reference surface (106).

6. The mask pre-alignment device according to claim 5, characterized in that: The driving assembly comprises a telescopic cylinder (112) and a return spring (113); the telescopic cylinder (112) can drive the first clamping member (102) / the second clamping member (103) to approach or move away from the reference plane (106); and the return spring (113) can stretch to form a traction force that causes the first clamping member (102) / the second clamping member (103) to return to its original position.

7. The mask pre-alignment device according to claim 4, characterized in that: The invention also includes a position adjustment member (114) arranged at one end of the first slide rail (110) away from the reference plane (106), wherein the position adjustment member (114) can abut against the first clamping member (102) and move in the extension direction of the first slide rail (110) to change the maximum distance between the first clamping member (102) and the center of the reference plane (106); and / or, the invention also includes a position adjustment member (114) arranged at one end of the second slide rail (111) away from the reference plane (106), wherein the position adjustment member (114) can abut against the second clamping member (103) and move in the extension direction of the second slide rail (111) to change the maximum distance between the second clamping member (103) and the center of the reference plane (106).

8. The mask pre-alignment device according to claim 4, characterized in that: The invention also comprises a support base (115), wherein the first slide rail (110) is provided with a position adjustment groove (116) extending along the first direction (104), and a bolt connection piece (117) connected to the support base (115) is passed through the position adjustment groove (116); and / or, the second slide rail (111) is provided with a position adjustment groove (116) extending along the second direction (105), and a bolt connection piece (117) connected to the support base (115) is passed through the position adjustment groove (116).

9. The mask pre-alignment device according to any one of claims 1 to 3, characterized in that: It also comprises a protective shell (118), wherein a temporary storage location (119) for storing a mask is arranged inside the protective shell (118).

10. A wafer exposure device, characterized in that: It comprises a mask storage library, a mask stage, a gripping mechanism and the mask pre-alignment device according to any one of claims 1 to 9; the gripping mechanism can place the mask placed in the mask storage library on the mask pre-alignment device, and the gripping mechanism is suitable for placing the pre-positioned mask on the mask stage; the gripping mechanism can place the mask on the mask stage on the mask pre-alignment device.

Images