A TC4 titanium alloy-based light-heat interface material, method and interface evaporator

By forming a micro-nano mesh array structure on the surface of TC4 titanium alloy, the problem of unreasonable pore size design and difficulty in recycling polymer materials in existing solar evaporators has been solved, achieving efficient seawater desalination and low-cost photothermal conversion.

CN118954675BActive Publication Date: 2026-01-27SHAANXI UNIV OF SCI & TECH
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Patent Information

Application Number
CN202411007455.6
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-07-25
Publication Date
2026-01-27
Estimated Expiration
2044-07-25

AI Technical Summary

Technical Problem

The unreasonable aperture design of existing solar evaporators leads to low evaporation efficiency, and the high cost and difficulty in recycling of polymer materials make it impossible to achieve efficient and low-cost seawater desalination.

Method used

Using TC4 titanium alloy as the photothermal interface material, a micro-nano mesh array structure is formed on its surface by nanosecond laser etching, which significantly increases the evaporation area. Combined with the water supply channel and the heat insulation layer, a highly efficient interface evaporator is formed.

Benefits of technology

It improves the photothermal conversion efficiency, realizes the continuity of the evaporation process and efficient freshwater acquisition, and reduces material costs and energy consumption.

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Abstract

The application provides a TC4 titanium alloy-based light-heat interface material and method and an interface evaporator. The TC4 titanium alloy has a micro-nano net array structure on the surface, and the micro-nano net array structure has protruding micro-cavities and recessed micro-grooves. The TC4 titanium alloy is used as raw material of the light-heat interface material, the raw material is easy to obtain and low in cost, the micro-nano net array structure is formed on the surface of the TC4 titanium alloy through laser etching, the evaporation surface area is significantly increased, the micro-protruding structure of the micro-nano net array structure on the surface can realize continuous supplement of the liquid to be evaporated, the continuity of the light-heat evaporation process is ensured, and the light-heat conversion efficiency is improved.
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Description

Technical Field

[0001] This invention belongs to the field of photothermal interface material and method based on TC4 titanium alloy and interface evaporator. Background Technology

[0002] In recent years, solar energy has been used as a driving force for seawater desalination at the interface between the evaporator and bulk water to obtain potable fresh water. Unlike traditional solar evaporation, which requires heating large amounts of water, solar-driven interfacial evaporation (SIE) can achieve thermal positioning with the help of photothermal materials, improving the utilization rate of solar energy. Therefore, SIE is widely regarded as an environmentally friendly and efficient method of seawater desalination.

[0003] Currently, SIE technology uses materials with high light absorption rates, such as metals, semiconductors, polymers, and carbon-based materials, as the top layer of light absorbers. In addition, foam materials are usually used at the bottom to support the floating of the light absorber and avoid direct contact between the evaporator and the bulk water, thereby reducing heat loss. The working principle of these solar evaporators is that the top light absorber receives sunlight and converts solar energy into heat energy. At the same time, seawater at the bottom is transported to the interface through the porous structure of the evaporator. The heat energy is used to realize the conversion of seawater into steam. The steam is condensed on the condenser wall and finally collected as fresh water. However, most current SIE structures have many problems, such as: (1) the evaporator aperture is too small, which cannot guarantee continuous and sufficient water vapor transport. When the evaporator aperture is too large, it will inevitably result in excessive water transport. This will result in excess water being heated, consuming too much energy, thereby reducing the photothermal conversion efficiency; (2) the cost of polymer SIE evaporators is too high and they are not easy to recycle after application. Therefore, for further practical applications, an integrated solar evaporator with high evaporation rate, simple manufacturing process, and durability deserves further research. Summary of the Invention

[0004] To address the problems existing in the prior art, this invention provides a TC4 titanium alloy-based photothermal interface material, method, and interface evaporator. TC4 titanium alloy is used as the raw material for the photothermal interface material, which is readily available and inexpensive. By laser etching a micro-nano mesh array structure on the surface of the TC4 titanium alloy, the evaporation surface area is significantly increased. The micro-convex structure of the micro-nano mesh array on the surface can achieve continuous replenishment of the liquid to be evaporated, ensuring the continuity of the photothermal evaporation process and thus improving the photothermal conversion efficiency.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a TC4 titanium alloy-based photothermal interface material, wherein the surface of the TC4 titanium alloy has a micro-nano mesh array structure, and the micro-nano mesh array structure has protruding microcavities and recessed microgrooves.

[0006] Furthermore, nanosecond laser etching was used to form a micro-nano mesh array structure on the surface of TC4 titanium alloy.

[0007] Furthermore, the laser etching is a two-stage etching process, with the specific parameters as follows:

[0008] First laser etching process: The laser beam is perpendicularly irradiated on the surface of TC4 titanium alloy, with a power of 100W, a scanning speed of 90mm / s~150mm / s, a line spacing of 0.05mm~0.15mm, a ring spacing of 0.01mm, a frequency of 30KHz, and a processing angle of 0°.

[0009] Second laser etching process: The laser beam is perpendicularly irradiated on the surface of TC4 titanium alloy with a power of 100W, a scanning speed of 90mm / s to 150mm / s, a line spacing of 0.05mm to 0.15mm, a ring spacing of 0.01mm, a frequency of 30KHz, and a processing angle of 90°.

[0010] This invention also provides a method for preparing a TC4 titanium alloy-based photothermal interface material, the specific steps of which are as follows:

[0011] S1 performs surface cleaning on TC4 titanium alloy;

[0012] S2 performs two nanosecond laser etchings on TC4 titanium alloy to obtain TC4 titanium alloy with a micro-nano mesh array structure on the surface, thus obtaining TC4 titanium alloy-based photothermal interface material.

[0013] Furthermore, in S1, the TC4 titanium alloy surface is cleaned using ultrasonic cleaning with acetone and ethanol solutions.

[0014] Furthermore, in S2, the specific parameters for the first laser etching process are as follows: the laser beam is perpendicularly irradiated on the TC4 titanium alloy surface, the power is 100W, the scanning speed is 90mm / s~150mm / s, the line spacing is 0.05mm~0.15mm, the ring spacing is 0.01mm, the frequency is 30KHz, and the processing angle is 0°.

[0015] Furthermore, in S2, the specific parameters for the second laser etching process are as follows: the laser beam is perpendicularly irradiated on the TC4 titanium alloy surface, the power is 100W, the scanning speed is 90mm / s~150mm / s, the line spacing is 0.05mm~0.15mm, the ring spacing is 0.01mm, the frequency is 30KHz, and the processing angle is changed to 90°.

[0016] The present invention also provides an interface evaporator, which uses the above-mentioned TC4 titanium alloy-based photothermal interface material or the TC4 titanium alloy-based photothermal interface material prepared by the above-mentioned preparation method as a light absorption layer.

[0017] Furthermore, the interface evaporator also includes a water supply channel and a heat insulation layer. The heat insulation layer is placed on the liquid to be evaporated, and the TC4 titanium alloy-based photothermal interface material is placed on the heat insulation layer with the surface of the micro-nano mesh array structure facing the sun. One end of the water supply channel is in contact with the liquid to be evaporated, and the other end is in contact with the surface of the micro-nano mesh array structure of the TC4 titanium alloy-based photothermal interface material.

[0018] Furthermore, the water supply channel is made of filter paper, and the heat insulation layer is made of sponge.

[0019] Compared with the prior art, the present invention has at least the following beneficial effects:

[0020] This invention provides a TC4 titanium alloy-based photothermal interface material. TC4 titanium alloy is used as the raw material for this material, as it is readily available and inexpensive. Furthermore, titanium is non-toxic and will not pollute the environment during application. Titanium is stable in many media and is not easily corroded. The TC4 titanium alloy surface has a micro / nano mesh array structure. The protruding microcavities and recessed microgrooves on this structure significantly increase the evaporation surface area. The protruding microcavities also allow for continuous replenishment of the liquid to be evaporated, ensuring the continuity of the photothermal evaporation process and thus improving the photothermal conversion efficiency.

[0021] This invention provides a method for preparing TC4 titanium alloy-based photothermal interface materials. After simply cleaning the TC4 titanium alloy, a micro-nano mesh array structure is prepared by etching the TC4 titanium alloy surface with a nanosecond laser. This is an efficient and easy-to-control method that can be prepared in one laser step.

[0022] This invention provides an interface evaporator that uses the aforementioned TC4 titanium alloy-based photothermal interface material as a light absorption layer. This light absorption layer solves the problem that the disordered pore structure of the unstructured capillary material in existing interface-type solar evaporators and its inherent limitations hinder evaporator optimization. The interface evaporator made of TC4 titanium alloy-based photothermal interface material combined with a water supply channel and a heat insulation layer confines water to the evaporator surface during evaporation, reducing heat radiation loss from the external environment. Moreover, the evaporator does not directly contact the water surface, further reducing heat convection loss between the device and the water body below, thereby improving the photothermal interface heat conversion capability. Finally, the micro-nano mesh array structure on the surface of the TC4 titanium alloy-based photothermal interface material significantly increases the light absorption area, thereby improving the photothermal conversion efficiency. Furthermore, the path formed by laser etching can serve as an effective water supply channel. By connecting the capillary force drive of the TC4 titanium alloy-based photothermal interface material through the water supply channel, continuous, pump-free liquid replenishment from the liquid source to the evaporation area can be achieved without additional energy consumption. In summary, the TC4 titanium alloy-based photothermal interface material used in this invention can effectively and efficiently obtain energy from ubiquitous solar energy and natural evaporation processes, while simultaneously achieving the goal of cleaning water. This provides a new approach to solving the problem of freshwater resource shortage. Attached Figure Description

[0023] Figure 1 Surface morphology of TC4 titanium alloy at different observation scales at a moving speed of 120 mm / s;

[0024] Figure 2 XRD patterns of TC4 titanium alloy and its surface after treatment at different transfer speeds;

[0025] Figure 3 Temperature change of the sample under one sun after laser treatment (movement speed 120 mm / s);

[0026] Figure 4 Water contact angle test image of TC4 surface after laser treatment;

[0027] Figure 5 Evaporation rate diagram of titanium alloy after laser processing at a moving speed of 120 mm / s. Detailed Implementation

[0028] The present invention will be further described below with reference to the accompanying drawings and specific embodiments.

[0029] This invention provides a laser-prepared TC4 titanium alloy-based photothermal interface material. The method involves laser etching the surface of the TC4 titanium alloy to form a micro / nano mesh array structure. This micro / nano mesh array structure has protruding microcavities and recessed microgrooves. The micro / nano mesh array structure on the TC4 titanium alloy surface significantly increases the light absorption area, thereby improving the photothermal conversion efficiency. Furthermore, through capillary force drive, continuous liquid replenishment from the liquid source to the evaporation zone can be achieved.

[0030] This invention provides a method for laser preparation of TC4 titanium alloy-based photothermal interface materials, the specific steps of which are as follows:

[0031] 1. First, purchase the required size sheet of TC4 titanium alloy (the size used in this experiment is 0.5*3*3mm). Then, use acetone and ethanol solution to ultrasonically clean the surface of the TC4 titanium alloy for 20 minutes.

[0032] 2. After air drying, the TC4 titanium alloy is subjected to single-sided laser etching. The processing parameters are set as follows: the laser beam is perpendicularly irradiated onto the TC4 titanium alloy surface, the power is 100W, the scanning speed is 90mm / s~150mm / s, the line spacing is 0.05mm~0.15mm, the ring spacing is 0.01mm, the frequency is 30KHz, and the processing angle is 0°. After adjusting all parameters, single-sided laser etching can be performed.

[0033] 3. A second etching process is performed. The laser beam is perpendicularly irradiated onto the titanium alloy surface at a power of 100W, a scanning speed of 90mm / s to 150mm / s, a line spacing of 0.05mm to 0.15mm, a ring spacing of 0.01mm, a frequency of 30kHz, and a processing angle of 90°. After adjusting all parameters, single-sided laser etching can be performed. This, combined with the previous step, completes the longitudinal and transverse scanning paths, forming a micro-nano mesh array structure and increasing the water supply path. The preparation method of this invention is simple, requiring only one laser operation.

[0034] An interfacial evaporator was prepared using the aforementioned TC4 titanium alloy-based photothermal interface material. The evaporator includes a water supply channel, a heat insulation layer, and the TC4 titanium alloy-based photothermal interface material. The TC4 titanium alloy-based photothermal interface material is placed on the heat insulation layer, with the side having a micro / nano mesh array structure facing the sun. Specifically, under sunlight, simulated seawater is placed in a beaker, and filter paper is used as the water supply channel to continuously replenish the liquid, ensuring continuous evaporation. A sponge, as the heat insulation layer, is placed on the simulated seawater. The aforementioned TC4 titanium alloy-based photothermal interface material is used as the light absorption layer. Through reasonable microstructure design of the TC4 titanium alloy surface, the light absorption area of ​​the light absorption layer is significantly enhanced. Furthermore, the capillary force effect of the micro / nano mesh array structure on the TC4 titanium alloy surface also facilitates continuous liquid replenishment.

[0035] Example 1

[0036] This invention provides a method for laser preparation of TC4 titanium alloy-based photothermal interface materials, the specific steps of which are as follows:

[0037] 1. First, purchase the required size sheet of TC4 titanium alloy (the size used in this experiment is 0.5*3*3mm). Then, use acetone and ethanol solution to ultrasonically clean the surface of the TC4 titanium alloy for 20 minutes.

[0038] 2. After air drying, the TC4 titanium alloy is subjected to single-sided laser etching. The processing parameters are set as follows: the laser beam is perpendicularly irradiated onto the TC4 titanium alloy surface, the power is 100W, the scanning speed is 90mm / s, the line spacing is 0.05mm, the ring spacing is 0.01mm, the frequency is 30KHz, and the processing angle is 0°. After adjusting all parameters, single-sided laser etching can be performed.

[0039] 3. A second etching process is performed. The laser beam is perpendicularly irradiated onto the titanium alloy surface with a power of 100W, a scanning speed of 90mm / s, a line spacing of 0.05mm, a ring spacing of 0.01mm, a frequency of 30kHz, and a processing angle of 90°. After adjusting all parameters, single-sided laser etching can be performed, working in conjunction with the previous step to complete the longitudinal and transverse scanning paths, forming a micro-nano mesh array structure, thus obtaining the TC4 titanium alloy-based photothermal interface material.

[0040] Example 2

[0041] This invention provides a method for laser preparation of TC4 titanium alloy-based photothermal interface materials, the specific steps of which are as follows:

[0042] 1. First, purchase the required size sheet of TC4 titanium alloy (the size used in this experiment is 0.5*3*3mm). Then, use acetone and ethanol solution to ultrasonically clean the surface of the TC4 titanium alloy for 20 minutes.

[0043] 2. After air drying, the TC4 titanium alloy is subjected to single-sided laser etching. The processing parameters are set as follows: the laser beam is perpendicularly irradiated onto the TC4 titanium alloy surface, the power is 100W, the scanning speed is 150mm / s, the line spacing is 0.15mm, the ring spacing is 0.01mm, the frequency is 30KHz, and the processing angle is 0°. After adjusting all parameters, single-sided laser etching can be performed.

[0044] 3. A second etching process is performed. The laser beam is perpendicularly irradiated onto the titanium alloy surface with a power of 100W, a scanning speed of 150mm / s, a line spacing of 0.15mm, a ring spacing of 0.01mm, a frequency of 30kHz, and a processing angle of 90°. After adjusting all parameters, single-sided laser etching can be performed, working in conjunction with the previous step to complete the longitudinal and transverse scanning paths, forming a micro-nano mesh array structure, and obtaining the TC4 titanium alloy-based photothermal interface material.

[0045] Example 3

[0046] This invention provides a method for laser preparation of TC4 titanium alloy-based photothermal interface materials, the specific steps of which are as follows:

[0047] 1. First, purchase the required size sheet of TC4 titanium alloy (the size used in this experiment is 0.5*3*3mm). Then, use acetone and ethanol solution to ultrasonically clean the surface of the TC4 titanium alloy for 20 minutes.

[0048] 2. After air drying, the TC4 titanium alloy is subjected to single-sided laser etching. The processing parameters are set as follows: the laser beam is perpendicularly irradiated onto the TC4 titanium alloy surface, the power is 100W, the scanning speed is 120mm / s, the line spacing is 0.1mm, the ring spacing is 0.01mm, the frequency is 30KHz, and the processing angle is 0°. After adjusting all parameters, single-sided laser etching can be performed.

[0049] 3. A second etching process is performed. The laser beam is perpendicularly irradiated onto the titanium alloy surface with a power of 100W, a scanning speed of 120mm / s, a line spacing of 0.1mm, a ring spacing of 0.01mm, a frequency of 30kHz, and a processing angle of 90°. After adjusting all parameters, single-sided laser etching can be performed, working in conjunction with the previous step to complete the longitudinal and transverse scanning paths, forming a micro-nano mesh array structure, thus obtaining the TC4 titanium alloy-based photothermal interface material.

[0050] The evaporation performance of TC4 titanium alloy-based photothermal interface material with a micro / nano mesh array structure was tested, as follows:

[0051] like Figure 1 As shown, the morphology of the untreated sample was observed using scanning electron microscopy (SEM), and the morphology images of the sample at different observation scales (500 μm, 200 μm, and 50 μm) at a moving speed of 120 mm / s were obtained. Figure 1 As shown in (a), without laser treatment, the surface of the titanium alloy sample has vertical stripes, which are structures left during the natural processing of the sample and can be observed with the naked eye. Figure 1 Images (b), (c), and (d) show the morphology of the samples at different scales. It can be observed that after laser treatment, the micro-nano mesh array structure on the sample surface possesses microcavities and microgrooves. This is because the laser etching creates paths on the sample surface, which, through the superposition of angle-changing effects, form this unique structure. This microcavity and microgroove structure significantly increases the light absorption area, thereby improving the photothermal conversion capability. Furthermore, the paths formed after laser etching can serve as effective water supply channels. Driven by the capillary force of the filter paper connecting the photothermal surface, continuous, pump-free liquid replenishment from the liquid source to the evaporation zone can be achieved without additional energy consumption.

[0052] Figure 2 The images show the XRD patterns of treated and untreated samples at different laser speeds (90 mm / s, 120 mm / s, and 150 mm / s, respectively). XRD analysis of the samples and the laser-treated sample surface, compared with PDF cards using Jade, revealed the highest agreement between Ti and Ti₂O, indicating that laser treatment only alters the sample surface structure and does not change its chemical composition.

[0053] like Figure 3 As shown, we tested the temperature change of the sample surface after 10 minutes of sun irradiation and after 5 minutes of cooling following the removal of the light source, repeating the test three times. The results show that the sample can heat up to 70℃ after 10 minutes of sun irradiation, exhibiting good light absorption. After 5 minutes of removing the light source, the temperature returns to its original level.

[0054] like Figure 4 As shown, the microstructure of the sample surface changed after laser etching. Contact angle tests on the material revealed that the sample surface had become hydrophilic.

[0055] The processed TC4 titanium alloy was subjected to single-sided laser etching at a moving speed of 120 mm / s (other parameters were default) to obtain a TC4 titanium alloy-based photothermal interface material. An interface evaporator was fabricated using this material, and its evaporation performance was tested. The mass change with illumination time was recorded using an electronic balance connected to a computer, and the evaporation rate based on the titanium alloy interface evaporator was quantitatively analyzed. Figure 5 As shown in the figure, the evaporation rate over 1 hour under sunlight is approximately 1.45 kg / m³. -2 h -1 This indicates that the TC4 titanium alloy-based photothermal interface material of the present invention has a high evaporation rate.

Claims

1. An interfacial evaporator, characterized in that, The material includes a light absorption layer, which is a TC4 titanium alloy-based photothermal interface material. The TC4 titanium alloy-based photothermal interface material is obtained by forming a micro-nano mesh array structure on the surface of the TC4 titanium alloy using nanosecond laser etching. The micro-nano mesh array structure has protruding microcavities and recessed microgrooves. It also includes a water supply channel and a heat insulation layer. The heat insulation layer is placed on the liquid to be evaporated, and the TC4 titanium alloy-based photothermal interface material is placed on the heat insulation layer with the surface of the micro-nano mesh array structure facing the sun. One end of the water supply channel is in contact with the liquid to be evaporated, and the other end is in contact with the surface of the micro-nano mesh array structure of the TC4 titanium alloy-based photothermal interface material. The nanosecond laser etching is a two-stage etching process, with the specific parameters as follows: First laser etching process: The laser beam is perpendicularly irradiated on the surface of TC4 titanium alloy, with a power of 100W, a scanning speed of 90mm / s~150mm / s, a line spacing of 0.05mm~0.15mm, a ring spacing of 0.01mm, a frequency of 30KHz, and a processing angle of 0°. Second laser etching process: The laser beam is perpendicularly irradiated on the surface of TC4 titanium alloy with a power of 100W, a scanning speed of 90mm / s~150mm / s, a line spacing of 0.05mm~0.15mm, a ring spacing of 0.01mm, a frequency of 30KHz, and a processing angle of 90°.

2. The interface evaporator according to claim 1, characterized in that, The water supply channel is made of filter paper, and the heat insulation layer is made of sponge.

3. An interface evaporator according to claim 1, characterized in that, Before nanosecond laser etching, the surface of TC4 titanium alloy was cleaned by ultrasonic cleaning with acetone and ethanol solution.

Citation Information

Patent Citations

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