Laser processing system and method and computer readable storage medium

The integration of a beam deflector in the laser processing system addresses the misalignment issue by allowing precise control of the laser position, ensuring accurate alignment of engraved formats through controlled deflection, thereby improving the precision of laser engraving.

CN119115185APending Publication Date: 2024-12-13HUAWEI TECH CO LTD
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Patent Information

Application Number
CN202310700024.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2023-06-13
Publication Date
2024-12-13

AI Technical Summary

Technical Problem

Existing laser processing systems experience misalignment of engraved formats in the second direction due to the inability to precisely control the rotating mirror angle at specific moments, leading to inconsistencies in the corresponding relationship between the rotating mirror angle and the workpiece stage position.

Method used

Incorporating a beam deflector into the laser processing system to adjust the laser position in the second direction, allowing the controller to precisely control the deflection of the beam deflector to align the starting position of the target format with the first format by determining the necessary deflection angle based on the misalignment amount and the corresponding relationships between the rotating mirror angle and workpiece stage position.

Benefits of technology

The solution effectively eliminates or reduces misalignment between formats in the second direction by aligning the starting positions of target formats with the first formats, ensuring accurate and precise laser engraving.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention provides a laser processing system and method and a computer readable storage medium, and belongs to the technical field of optics. The laser processing system comprises a controller, a laser, a light beam deflection assembly and a workpiece table. The light beam deflection assembly is located on an emergent light path of the laser and used for outputting laser to the workpiece table. The workpiece table is used for bearing workpieces and can drive the workpieces to move in the first direction and the second direction which are perpendicular to each other. The light beam deflection assembly comprises a light beam deflector and a rotating mirror, the rotating mirror is used for achieving scanning of the laser in the first direction, and the light beam deflector is used for adjusting the position of the laser in the second direction. As the laser processing system is provided with the light beam deflector used for adjusting the position of the laser in the second direction, the initial position of the target breadth in the second direction can be adjusted by controlling deflection of the light beam deflector before the target breadth is inscribed on the workpiece, and therefore the target breadth is inscribed on the workpiece. The technical problem that the target breadth and the breadth machined before are staggered in the second direction is solved.
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Description

Technical Field

[0001] The present disclosure relates to the field of optical technology, and in particular to a laser processing system, method and computer-readable storage medium. Background Art

[0002] The laser processing system in the related art includes a laser, a rotating mirror and a workpiece stage. The workpiece stage is used to carry the workpiece and can drive the workpiece to move in a first direction and a second direction perpendicular to each other. The rotating mirror is used to reflect the laser light emitted by the laser to the workpiece stage, and when the rotating mirror rotates, the laser light output by the rotating mirror will scan in the first direction.

[0003] When the laser processing system processes the area to be engraved on the workpiece, the rotating mirror rotates to scan the laser in the first direction of the workpiece, and at the same time, the workpiece stage drives the workpiece to move in the second direction, so that the laser writes a strip-shaped format in the area to be engraved. In addition, when the area to be engraved is large, after engraving a strip, the workpiece stage can also drive the workpiece to move in the first direction to change lines and continue to process another strip until the area to be engraved is completed.

[0004] In practical applications, it is found that different formats often have misalignment in the second direction. Summary of the invention

[0005] The present disclosure provides a laser processing system, method and computer-readable storage medium. The laser processing system has a rotating mirror for realizing laser scanning in a first direction and a beam deflector for adjusting the position of the laser in a second direction. In this way, before writing a target format on a workpiece, the starting position of the target format in the second direction can be adjusted by controlling the deflection of the beam deflector. The technical solutions of the laser processing system, method and computer-readable storage medium are as follows:

[0006] In a first aspect, the present disclosure provides a laser processing system, which includes a controller, a laser, a beam deflection assembly, and a workpiece stage. The beam deflection assembly is located on the output light path of the laser, and the beam deflection assembly is used to output laser light to the workpiece stage. The workpiece stage is used to carry a workpiece and can drive the workpiece to move along a first direction and a second direction, wherein the first direction and the second direction are perpendicular. The beam deflection assembly includes a beam deflector and a rotating mirror, wherein the rotating mirror is used to realize scanning of the laser output by the beam deflection assembly in a first direction, and the beam deflector is used to adjust the position of the laser output by the beam deflection assembly in a second direction. The controller is configured to: before engraving a target format on the workpiece, adjust the starting position of the target format in the second direction by controlling the deflection of the beam deflector.

[0007] The controller is connected to the laser, beam deflector, rotating mirror and workpiece stage in communication, such as electrical connection or wireless connection, to control these components. The laser is a laser source, which can be a writing laser for generating modulated writing laser.

[0008] The beam deflection assembly is used to change the direction and characteristics of the laser output by the laser and then output the laser to the workpiece stage. The beam deflection assembly includes a beam deflector and a rotating mirror, and may also include a corresponding lens group and the like.

[0009] The rotating mirror may be a polyhedron rotating mirror, which is used to reflect the laser light, and during the rotating mirror rotation process, the laser light output to the workpiece stage can be scanned in the first direction. During the process of writing the format, the rotating mirror is always in a rotating state.

[0010] The beam deflector is used to adjust the position of the laser output to the workpiece stage in the second direction by deflection. During the process of writing the format, the beam deflector is maintained at a specific deflection angle without deflection. In addition, unlike the control logic of the rotating mirror, the controller can control the deflection angle of the beam deflector at a specific moment. In a possible implementation, the beam deflector uses a galvanometer, an acousto-optic deflector, or a piezoelectric deflection mirror.

[0011] The workpiece table carries the workpiece and can drive the workpiece to move along the first direction and the second direction. The workpiece table can be a two-axis workpiece table or a workpiece table with more axes, or a workpiece table with a structure such as a robotic arm.

[0012] The technical solution provided by the present disclosure adds a beam deflector for adjusting the position of the laser in the second direction in the beam deflection assembly of the laser processing system, so that before writing the target format, the starting position of the target format in the second direction can be adjusted by controlling the deflection of the beam deflector, thereby adjusting the position of the target format in the second direction to a position that meets the requirements.

[0013] In a possible implementation, the controller is configured to adjust a starting position of the target format in the second direction toward a starting position of the first format in the second direction by controlling the deflection of the beam deflector.

[0014] The first format is a format processed before the target format, and the first format and the target format are arranged along a first direction.

[0015] In this way, there can be no misalignment between the first format and the target format in the second direction, or the misalignment amount in the second direction can be reduced.

[0016] In a possible implementation, the controller is configured to adjust the starting position of the target format in the second direction to be flush with the starting position of the first format in the second direction by controlling the deflection of the beam deflector.

[0017] In a possible implementation manner, the first frame and the target frame belong to the same area to be written, and the first frame is the first frame of the area to be written.

[0018] In a possible implementation manner, the first frame and the target frame belong to the same area to be inscribed, and the first frame is the previous frame of the target frame.

[0019] In a possible implementation, the work stage has a trigger position in the second direction, wherein when the position of the work stage in the second direction reaches or exceeds the trigger position and the rotating mirror angle at which the rotating mirror is located is the target trigger angle, the laser is triggered to output laser light. The controller is configured to adjust the starting position of the target format in the second direction by controlling the deflection of the beam deflector before the position of the work stage in the second direction reaches the trigger position.

[0020] The technical solution provided by the present disclosure controls the deflection of the beam deflector before the position of the workpiece stage in the second direction reaches the trigger position, thereby ensuring that the beam deflector has completed the deflection when writing the target format begins.

[0021] In a possible implementation, when adjusting the starting position of the target format in the second direction toward the starting position of the first format in the second direction, the controller is configured to: detect a first correspondence between a rotating mirror angle of the rotating mirror and a position of the workpiece stage in the second direction. Based on the first correspondence and the second correspondence, determine a target deflection angle to be deflected by the beam deflector, and control the beam deflector to deflect the target deflection angle.

[0022] The second corresponding relationship is the corresponding relationship between the rotating mirror angle and the position of the workpiece stage in the second direction in the processing flow of the first format. The first corresponding relationship is detected in the processing flow of the target format and before the position of the workpiece stage in the second direction reaches the trigger position.

[0023] In a possible implementation, when determining the target deflection angle to be deflected by the beam deflector based on the first correspondence and the second correspondence, the controller is configured to: determine the misalignment amount to be adjusted in the second direction of the target format based on the first correspondence and the second correspondence. Determine the target deflection angle to be deflected by the beam deflector based on the misalignment amount.

[0024] The misalignment amount may be understood as the misalignment amount that would occur between the target frame and the first frame in the second direction if the beam deflector is not deflected.

[0025] In a possible implementation, the first corresponding relationship includes, in the processing flow of the target format, when the position of the workpiece stage in the second direction is the angle detection position, the first rotating mirror angle of the rotating mirror. The second corresponding relationship includes, in the processing flow of the first format, when the position of the workpiece stage in the second direction is the angle detection position, the second rotating mirror angle of the rotating mirror.

[0026] The angle detection position is located before the trigger position.

[0027] In a possible implementation, when the position of the workpiece stage in the second direction is the angle detection position, the workpiece stage is in a uniform speed moving state in the second direction.

[0028] In a possible implementation, the angle detection position is a position where the workpiece stage starts to move at a uniform speed in the second direction.

[0029] In a possible implementation, when determining the target deflection angle that the beam deflector needs to deflect based on the first corresponding relationship and the second corresponding relationship, the controller is configured to: determine the lag angle of the first rotating mirror angle relative to the second rotating mirror angle. Determine the lag time corresponding to the lag angle. Multiply the lag time by the moving speed of the workpiece stage in the second direction to obtain the misalignment amount of the target format that needs to be adjusted in the second direction. Based on the misalignment amount, determine the target deflection angle that the beam deflector needs to deflect.

[0030] The hysteresis angle can be understood as follows: when the rotating mirror is at a first rotating mirror angle, the rotating mirror rotates another angle and the rotating mirror is at a second rotating mirror angle, which is the hysteresis angle. The hysteresis time refers to the time required for the rotating mirror to rotate to the hysteresis angle.

[0031] In addition, since the lag angle of the first rotating mirror angle relative to the second rotating mirror angle is calculated, it is actually assumed that the target format lags behind the first format, but in fact the target format may be ahead of the first format. Therefore, in order to avoid the possibility of error in the amount of misalignment determined based on the lag angle, the position of the workpiece stage in the second direction corresponding to the target trigger angle of the target format can be set to be behind the position of the workpiece stage in the second direction corresponding to the target trigger angle of the first format.

[0032] In a possible implementation, the target trigger angle of the first format is the first trigger angle of the rotating mirror after the workpiece stage reaches the trigger position in the second direction. The position of the workpiece stage in the second direction corresponding to the first trigger angle is the first position. The target trigger angle of the target format is the first trigger angle of the rotating mirror after the workpiece stage reaches the first position in the second direction. It can be seen that through this setting, the target format can always lag behind the first format (if the beam deflector does not deflect), and the misalignment corresponds to the calculated lag angle.

[0033] In a possible implementation, the rotation axis of the beam deflector is perpendicular to the first direction, so that when the beam deflector is deflected, the position of the laser output by the beam deflection assembly changes in the second direction, while the position in the first direction remains unchanged.

[0034] In a possible implementation, the rotation axis of the rotating mirror is perpendicular to the second direction, so that it can be ensured that when the rotating mirror is deflected, the laser output by the beam deflection assembly scans in the first direction and the position in the second direction remains unchanged.

[0035] In one possible implementation, the beam deflector is located on the optical path between the laser and the rotating mirror, and the laser light emitted by the laser first enters the beam deflector, is then reflected by the beam deflector to the rotating mirror, and is then reflected by the rotating mirror to the workpiece stage.

[0036] In a possible implementation, the laser light output by the laser is perpendicular to the rotation axis of the beam deflector.

[0037] In a possible implementation, the beam deflection assembly further includes a first lens group, which is located on the optical path between the beam deflector and the rotating mirror, and is used to make the exit point of the beam deflector and the incident point of the rotating mirror in a conjugate relationship.

[0038] Among them, the exit point of the beam deflector and the incident point of the rotating mirror are in a conjugate relationship, which means that when the rotating mirror angle remains unchanged, the beam deflector is deflected to any deflection angle, and the laser emitted from the beam deflector will be incident on the same incident point of the rotating mirror. The only difference is the incident angle.

[0039] In a possible implementation, the beam deflection assembly further includes a second lens group and a first objective lens, and the second lens group and the first objective lens are arranged in sequence along the output light path of the rotating mirror.

[0040] In one possible implementation, the second lens group is used to make the exit point of the rotating mirror and the incident point of the first objective lens conjugate to each other, or it can be understood that when the rotating mirror is rotated to any rotating mirror angle, the laser emitted from the rotating mirror will be incident on the same incident point of the first objective lens, and the only difference is the incident angle.

[0041] In one possible implementation, when adjusting the starting position of the target format in the second direction, the controller is configured to: determine the misalignment amount of the target format that needs to be adjusted in the second direction, determine the target deflection angle that the beam deflector needs to be deflected based on the misalignment amount, the focal length of each lens of the first lens group, the focal length of each lens of the second lens group, and the focal length and magnification of the tube lens of the first objective lens, and control the beam deflector to deflect the target deflection angle.

[0042] In a possible implementation, the rotating mirror is located on the optical path between the laser and the beam deflector. The laser light emitted by the laser is first incident on the rotating mirror, then reflected by the rotating mirror to the beam deflector, and then reflected by the beam deflector to the workpiece stage.

[0043] In a possible implementation, the laser light output by the laser is perpendicular to the rotation axis of the rotating mirror.

[0044] In a possible implementation, the beam deflection assembly further includes a third lens group, which is located on the optical path between the rotating mirror and the beam deflector, and is used to make the exit point of the rotating mirror and the incident point of the beam deflector in a conjugate relationship.

[0045] Among them, the exit point of the rotating mirror and the incident point of the beam deflector are in a conjugate relationship, which means that when the deflection angle of the beam deflector remains unchanged, when the rotating mirror is rotated to any rotation angle, the laser emitted from the rotating mirror will be incident on the same incident point of the beam deflector, and the only difference is the incident angle.

[0046] In a possible implementation, the beam deflection assembly further includes a fourth lens group and a second objective lens, and the fourth lens group and the second objective lens are arranged in sequence along an exit light path of the beam deflector.

[0047] In one possible implementation, the fourth lens group is used to make the exit point of the beam deflector and the incident point of the second objective lens conjugate to each other, or it can be understood that when the beam deflector is deflected to any deflection angle, the laser emitted from the beam deflector will be incident on the same incident point of the second objective lens, and the only difference is the incident angle.

[0048] In one possible implementation, when adjusting the starting position of the target format in the second direction, the controller is configured to: determine the misalignment amount of the target format that needs to be adjusted in the second direction, determine the target deflection angle that the beam deflector needs to be deflected based on the misalignment amount, the focal length of each lens of the third lens group, the focal length of each lens of the fourth lens group, and the focal length and magnification of the tube lens of the second objective lens, and control the beam deflector to deflect the target deflection angle.

[0049] In a second aspect, the present disclosure provides a laser processing method, which is applied to a controller of a laser processing system as described in any one of the first aspects, and the method includes: before engraving a target format on a workpiece, adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector.

[0050] In a possible implementation, the adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector includes:

[0051] By controlling the deflection of the beam deflector, the starting position of the target format in the second direction is adjusted toward the starting position of the first format in the second direction;

[0052] The first format is a format processed before the target format, and the first format and the target format are arranged along the first direction.

[0053] In a possible implementation, the workpiece stage has a trigger position in the second direction, wherein when the position of the workpiece stage in the second direction reaches or exceeds the trigger position and the rotating mirror angle of the rotating mirror is a target rotating mirror angle, the laser is triggered to output laser light;

[0054] The controller is configured to adjust the starting position of the target format in the second direction by controlling the deflection of the beam deflector before the position of the workpiece stage in the second direction reaches the trigger position.

[0055] In a possible implementation, controlling the beam deflector to deflect so as to adjust the starting position of the target format in the second direction toward the starting position of the first format in the second direction includes:

[0056] Detecting a first corresponding relationship between a rotating mirror angle of the rotating mirror and a position of the workpiece stage in the second direction;

[0057] Based on the first corresponding relationship and the second corresponding relationship, determining a target deflection angle of the beam deflector to be deflected, wherein the second corresponding relationship is a corresponding relationship between a rotation angle of the rotating mirror and a position of the workpiece stage in the second direction in a processing flow of the first format;

[0058] The beam deflector is controlled to deflect the target deflection angle.

[0059] In a possible implementation, determining a target deflection angle to be deflected by the beam deflector based on the first corresponding relationship and the second corresponding relationship includes:

[0060] Based on the first corresponding relationship and the second corresponding relationship, determining the misalignment amount of the target width that needs to be adjusted in the second direction;

[0061] Based on the misalignment amount, a target deflection angle of the beam deflector to be deflected is determined.

[0062] In a possible implementation, the first corresponding relationship includes, in the processing flow of the target format, when the position of the workpiece stage in the second direction is an angle detection position, a first rotating mirror angle at which the rotating mirror is located;

[0063] The second corresponding relationship includes, in the processing flow of the first format, when the position of the workpiece stage in the second direction is the angle detection position, the second rotating mirror angle at which the rotating mirror is located;

[0064] Wherein, the angle detection position is located before the trigger position.

[0065] In a possible implementation, determining a target deflection angle to be deflected by the beam deflector based on the first corresponding relationship and the second corresponding relationship includes:

[0066] determining a lag angle of the first rotating mirror angle relative to the second rotating mirror angle;

[0067] Determine a lag time corresponding to the lag angle;

[0068] Multiplying the lag time by the moving speed of the workpiece stage in the second direction to obtain the misalignment amount of the target width that needs to be adjusted in the second direction;

[0069] Based on the misalignment amount, a target deflection angle of the beam deflector to be deflected is determined.

[0070] In a possible implementation, when the beam deflection assembly includes a first lens group, a second lens group, and a first objective lens, adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector includes:

[0071] Determining the misalignment amount of the target width that needs to be adjusted in the second direction;

[0072] Determining a target deflection angle of the beam deflector based on the misalignment amount, the focal length of each lens of the first lens group, the focal length of each lens of the second lens group, and the focal length and magnification of the tube lens of the first objective lens;

[0073] The beam deflector is controlled to deflect the target deflection angle.

[0074] In a possible implementation, when the beam deflection assembly includes a third lens group, a fourth lens group, and a second objective lens, adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector includes:

[0075] Determining the misalignment amount of the target width that needs to be adjusted in the second direction;

[0076] Determining a target deflection angle of the beam deflector to be deflected based on the misalignment amount, the focal length of each lens of the third lens group, the focal length of each lens of the fourth lens group, and the focal length and magnification of the tube lens of the second objective lens;

[0077] The beam deflector is controlled to deflect the target deflection angle.

[0078] In a third aspect, the present disclosure provides a laser processing device, which is applied to a controller of a laser processing system as described in any one of the first aspects, and includes:

[0079] The control module is used to adjust the starting position of the target format in the second direction by controlling the deflection of the beam deflector before writing the target format on the workpiece.

[0080] In a possible implementation, the control module is used to execute the laser processing method as described in any one of the second aspects.

[0081] In a fourth aspect, the present disclosure provides a computer-readable storage medium, wherein at least one instruction is stored in the computer-readable storage medium, and the at least one instruction is loaded and executed by a controller to implement the laser processing method as described in any one of the second aspects.

[0082] In a fifth aspect, the present disclosure provides a computer program product, comprising at least one instruction, wherein the at least one instruction is executed by a controller so that the controller implements the laser processing method as described in any one of the second aspects.

[0083] In a sixth aspect, the present disclosure provides a chip, comprising a controller, wherein the controller is used to call and execute instructions stored in a memory from the memory, so that a laser processing system equipped with the chip executes the laser processing method described in any one of the second aspects above.

[0084] In the seventh aspect, the present disclosure provides another chip, which includes: an input interface, an output interface, a controller and a memory, wherein the input interface, the output interface, the controller and the memory are connected through an internal connection path, and the controller is used to execute the code in the memory. When the code is executed, the controller is used to execute the laser processing method described in any one of the second aspects above. BRIEF DESCRIPTION OF THE DRAWINGS

[0085] Figure 1 is a schematic diagram of a laser processing system in a related technology provided by an embodiment of the present disclosure;

[0086] Figure 2 is a schematic diagram of an area to be written provided by an embodiment of the present disclosure;

[0087] Figure 3 is a schematic diagram of another area to be written provided by an embodiment of the present disclosure;

[0088] Figure 4 is a schematic diagram of a method for detecting a rotating mirror angle of a rotating mirror provided by an embodiment of the present disclosure;

[0089] Figure 5 is a schematic diagram of a detection signal of an angle detection module provided in an embodiment of the present disclosure;

[0090] Figure 6 is a schematic diagram of a rotating mirror angle corresponding to different formats provided by an embodiment of the present disclosure;

[0091] Figure 7 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0092] Figure 8 is a schematic diagram of a rotating mirror angle corresponding to different formats provided by an embodiment of the present disclosure;

[0093] Fig. 9 is a schematic diagram of a rotating mirror angle corresponding to different formats provided by an embodiment of the present disclosure;

[0094] Fig.10 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0095] Fig.11 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0096] Fig.12 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0097] Fig.13 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0098] Fig.14 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0099] Fig.15 is a schematic diagram of an optical path between a beam deflector and a rotating mirror provided by an embodiment of the present disclosure;

[0100] Fig.16 is a schematic diagram of an optical path between a rotating mirror and a workpiece stage provided in an embodiment of the present disclosure;

[0101] Fig.17 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0102] Fig.18 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0103] Fig.19 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0104] Fig. 20 is a schematic diagram of a laser processing system provided by an embodiment of the present disclosure;

[0105] Fig.21 is a schematic diagram of an optical path between a beam deflector and a workpiece stage provided by an embodiment of the present disclosure;

[0106] Fig. 22 It is a schematic diagram of a laser processing system provided in an embodiment of the present disclosure.

[0107] Legend

[0108] 1. Controller, 11. Control card, 12. Workpiece table controller, 13. Computer;

[0109] 2. Laser;

[0110] 3. beam deflection assembly, 31. beam deflector, 32. rotating mirror, 33. first lens group, 331. first scanning lens, 332. first field lens, 34. second lens group, 341. second scanning lens, 342. second field lens, 35. first objective lens, 36. third lens group, 361. third scanning lens, 362. third field lens, 37. fourth lens group, 371. fourth scanning lens, 372. fourth field lens, 38. second objective lens;

[0111] 4. Workpiece table;

[0112] 5. Angle detection module;

[0113] 6. Position detection module;

[0114] 7. workpiece, 70. format, 71. first format, 72. second format, 73. third format, 74. fourth format;

[0115] Y0, starting position, Y1, trigger position, Y2, angle detection position. DETAILED DESCRIPTION

[0116] Laser processing technology is widely used in various industries, such as masks in the semiconductor industry, various micro-electro-mechanical system (MEMS) devices, and various precision diffraction optical components. Among various laser processing technologies, optical scanning technology is a technology that can effectively improve processing efficiency.

[0117] Next, a laser processing system using optical scanning technology is introduced.

[0118] like Figure 1As shown, the laser processing system includes a controller 1, a laser 2, a rotating mirror 32 and a workpiece stage 4. The workpiece stage 4 is used to carry a workpiece 7, and the workpiece stage 4 is a dual-axis workpiece stage that can drive the workpiece 7 to move in a first direction and a second direction that are perpendicular to each other. The rotating mirror 32 is used to reflect the laser light emitted by the laser 2 to the workpiece stage 4, and when the rotating mirror 32 rotates, the laser light output by the rotating mirror 32 will scan in the first direction.

[0119] like Figure 1 He Ru Figure 2 As shown, the laser processing system is used to write a format on the area to be written on the workpiece 7. During processing, the rotating mirror 32 rotates to make the laser scan in the first direction of the workpiece 7, and at the same time, the workpiece stage 4 drives the workpiece 7 to move in the second direction, so that the laser writes a strip-shaped format 70 on the workpiece 7. In addition, when the area to be written is large, after a strip-shaped format 70 is processed, the workpiece stage 4 drives the workpiece 7 to move in the first direction to change lines and continue to process another strip-shaped format 70 until the area to be written is completed.

[0120] like Figure 2 As shown, in an ideal state, the plurality of strip-shaped webs 70 are aligned in the second direction, and the plurality of strip-shaped webs 70 are spliced ​​into a large web. Figure 3 As shown, it is found in actual applications that different formats 70 are often misaligned in the second direction.

[0121] Next, combined with the control logic of the laser processing system, the causes of misalignment are analyzed:

[0122] The fundamental reason for the misalignment is the control characteristics of the rotating mirror 32. The rotation of the rotating mirror 32 is achieved by pulse width modulation (PWM) speed control method. The controller 1 can only control the speed and rotation of the rotating mirror 32, but cannot directly control the rotating mirror angle of the rotating mirror 32 at a specific moment. Therefore, when using the rotating mirror 32, an additional angle detection module 5 is required to detect the rotating mirror angle of the rotating mirror 32 in real time.

[0123] For example, Figure 4 As shown, a detection laser beam is emitted to the rotating mirror 32, and the detection laser beam is reflected by the rotating mirror 32 to form a fan-shaped scanning area, in which an angle detection module 5 (such as a power detector) is placed. Figure 5 As shown, when the reflected light scans the sensing surface of the angle detection module 5, the angle detection module 5 will generate a pulse signal, and the periodic rotation of the rotating mirror 32 will cause the angle detection module 5 to output a pulse signal string with a fixed period, and this pulse signal string can feedback the rotating mirror angle of the rotating mirror 32. Figure 5As shown, for the rotating mirror 32 having six surfaces, the angle detection module 5 outputs a pulse signal every 60°.

[0124] Generally speaking, the laser 2 of the laser processing system needs to meet two conditions for outputting laser. The first condition is that the position of the workpiece stage 4 in the second direction reaches or exceeds the trigger position Y1. The second condition is that the rotating mirror angle of the rotating mirror 32 is a specific trigger angle, wherein the trigger angle can be Figure 5 The angle corresponding to the rising edge of the pulse signal in, for example, Figure 5 When the above two conditions are met, the laser 2 will output laser light immediately, or after a certain delay, it will output laser light.

[0125] like Figure 6 , which shows the corresponding relationship between the rotating mirror angle of the rotating mirror 32 and the position of the workpiece stage 4 in the second direction in the processing flow of each format 70.

[0126] In the processing flow of the first format 71, the work stage 4 starts to move from the starting point Y0 along the second direction, and the rotating mirror 32 rotates. When the position of the work stage 4 in the second direction reaches the trigger position Y1, the first condition mentioned above is satisfied. Since the rotating mirror angle of the rotating mirror 32 is 50° at this time, the rotating mirror 32 needs to rotate another 10° to rotate to the trigger angle, thereby satisfying the second condition. At this time, the position of the work stage 4 in the second direction is y1.

[0127] In the processing flow of the second format 72, the workpiece stage 4 starts to move from the starting point Y0 along the second direction, and the rotating mirror 32 rotates. When the position of the workpiece stage 4 in the second direction reaches the trigger position Y1, the first condition mentioned above is satisfied. Since the rotating mirror angle of the rotating mirror 32 is 8° at this time, the rotating mirror 32 needs to rotate 52° to rotate to the trigger angle, thereby satisfying the second condition. At this time, the position of the workpiece stage 4 in the second direction is y2.

[0128] Since y2 and y1 are not at the same position, the first frame 71 and the second frame 72 are misaligned in the second direction, the misalignment amount is equal to y2-y1, and the second frame 72 lags behind the first frame 71, as shown in FIG. Figure 3 shown.

[0129] In the processing flow of the third frame 73, the workpiece stage 4 starts to move from the starting point Y0 along the second direction, and the rotating mirror 32 rotates. When the position of the workpiece stage 4 in the second direction reaches the trigger position Y1, the first condition is satisfied. Since the rotating mirror angle of the rotating mirror 32 is 58° at this time, the rotating mirror 32 needs to rotate another 2° to rotate to the trigger angle, thereby satisfying the second condition. At this time, the position of the workpiece stage 4 in the second direction is y3.

[0130] Since y3 and y1 are not at the same position, the first frame 71 and the third frame 73 are misaligned in the second direction, the misalignment amount is equal to y1-y3, and the third frame 73 is ahead of the first frame 71, as shown in FIG. Figure 3 shown.

[0131] In the processing flow of the fourth frame 74, the workpiece stage 4 starts to move from the starting point Y0 along the second direction, and the rotating mirror 32 rotates. When the position of the workpiece stage 4 in the second direction reaches the trigger position Y1, the first condition is satisfied. Since the rotating mirror angle of the rotating mirror 32 is 44° at this time, the rotating mirror 32 needs to rotate 16° to the trigger angle, thereby satisfying the second condition. At this time, the position of the workpiece stage 4 in the second direction is y4.

[0132] Since y4 and y1 are not at the same position, the first frame 71 and the fourth frame 74 are misaligned in the second direction, the misalignment amount is equal to y4-y1, and the fourth frame 74 lags behind the first frame 71, as shown in FIG. Figure 3 shown.

[0133] It can be seen from the above content that, when processing different formats 70 , the corresponding relationship between the rotating mirror angle of the rotating mirror 32 and the position of the workpiece stage 4 in the second direction is inconsistent, so that different formats 70 will be misaligned in the second direction.

[0134] In view of the above technical problems, the present disclosure provides a laser processing system, such as Figure 7 and Figure 10-Figure 20 As shown, the laser processing system includes a controller 1, a laser 2, a beam deflection assembly 3 and a workpiece stage 4. The beam deflection assembly 3 is located on the output light path of the laser 2, and the beam deflection assembly 3 is used to output laser to the workpiece stage 4. The workpiece stage 4 is used to carry the workpiece 7, and can drive the workpiece 7 to move along a first direction and a second direction, wherein the first direction and the second direction are perpendicular. The beam deflection assembly 3 includes a beam deflector 31 and a rotating mirror 32, wherein the rotating mirror 32 is used to realize the scanning of the laser output by the beam deflection assembly 3 in the first direction, and the beam deflector 31 is used to adjust the position of the laser output by the beam deflection assembly 3 in the second direction. The controller 1 is configured to: before writing the target format on the workpiece 7, adjust the starting position of the target format in the second direction by controlling the deflection of the beam deflector 31.

[0135] The controller 1 is connected to the laser 2, the beam deflector 31, the rotating mirror 32 and the workpiece stage 4 in communication, such as by electrical connection or wireless connection, to control these components.

[0136] The laser 2 is a laser source and may be a writing laser for generating modulated writing laser.

[0137] The beam deflection assembly 3 is used to change the direction and characteristics of the laser output by the laser 2 and then output the laser to the workpiece stage 4. The beam deflection assembly 3 includes a beam deflector 31 and a rotating mirror 32, and may also include a corresponding lens group and the like.

[0138] The rotating mirror 32 may be a polyhedron rotating mirror, which is used to reflect laser light, and during the rotation of the rotating mirror 32, the laser light output to the workpiece stage 4 can be scanned in the first direction. During the process of writing the format 70, the rotating mirror 32 is always in a rotating state.

[0139] The beam deflector 31 is used to adjust the position of the laser output to the workpiece stage 4 in the second direction by deflection. During the process of writing the format 70, the beam deflector 31 is maintained at a specific deflection angle and does not deflect. In addition, unlike the control logic of the rotating mirror 32, the controller 1 can control the deflection angle of the beam deflector 31 at a specific moment. In some examples, the beam deflector 31 is a galvanometer, an acousto-optic deflector, or a piezoelectric deflection mirror.

[0140] The workpiece stage 4 carries the workpiece 7 and can drive the workpiece 7 to move along the first direction and the second direction. The workpiece stage 4 can be a two-axis workpiece stage or a workpiece stage with more axes, or a workpiece stage with a structure such as a robot arm. The workpiece 7 can be any workpiece that can be processed by a laser processing system, for example, it can be a sample of a wafer and various substrates coated with a film, etc.

[0141] The laser processing system provided by the embodiment of the present disclosure adds a beam deflector 31 for adjusting the position of the laser in the second direction in the beam deflection assembly 3 of the laser processing system, so that before processing the target format, the starting position of the target format in the second direction can be adjusted by controlling the deflection of the beam deflector 31, thereby adjusting the position of the target format in the second direction to a position that meets the requirements.

[0142] In some examples, the laser processing system provided by the embodiments of the present disclosure can solve the technical problem of the misalignment of the different formats 70 in the second direction. The controller 1 is configured to adjust the starting position of the target format in the second direction toward the starting position of the first format in the second direction by controlling the deflection of the beam deflector 31, so that the starting position of the target format is aligned with the starting position of the first format in the second direction, or to reduce the misalignment of the starting position of the target format and the starting position of the first format in the second direction.

[0143] The first web may be any web processed before the target web, and the first web and the target web are arranged along a first direction. Figure 3 The third frame 73 in the target frame can be Figure 3 The first frame 71 or the second frame 72 in the embodiment.

[0144] In some examples, the first frame is the first frame of the area to be written, and the target frame can be any frame in the area to be written except the first frame. Figure 3 The first frame 71 in the image, then the target frame can be Figure 3 The second frame 72, the third frame 73 or the fourth frame 74 in the embodiment.

[0145] Of course, the laser processing system provided in the embodiment of the present disclosure can also be used only to adjust the starting position of the target format to a certain target position, and not to be aligned with other formats 70. The embodiment of the present disclosure does not limit the specific application scenario of the laser processing system.

[0146] Next, the control logic of the controller 1 controlling the beam deflector 31 to deflect so as to adjust the starting position of the target format in the second direction toward the starting position of the first format in the second direction is exemplarily described:

[0147] From the above analysis of the cause of the misalignment, it can be concluded that the cause of the misalignment is that the corresponding relationship between the rotation angle of the rotating mirror 32 and the position of the work stage 4 in the second direction is inconsistent when processing different formats 70. Therefore, in theory, according to the difference in the corresponding relationship between the rotation angle of the rotating mirror 32 and the position of the work stage 4 in the second direction when processing different formats 70, the misalignment amount can be determined, and the target deflection angle required for the beam deflector 31 to be deflected can be determined based on the misalignment amount.

[0148] In some examples, when adjusting the starting position of the target format in the second direction toward the starting position of the first format in the second direction, the controller 1 is configured to: detect a first correspondence between the rotation angle of the rotating mirror 32 and the position of the work stage 4 in the second direction. Based on the first correspondence and the second correspondence, determine the target deflection angle to be deflected by the beam deflector 31, wherein the second correspondence is the correspondence between the rotation angle of the rotating mirror 32 and the position of the work stage 4 in the second direction in the processing flow of the first format. Control the beam deflector 31 to deflect the target deflection angle.

[0149] In some examples, the controller 1 is configured to determine the amount of misalignment of the target width that needs to be adjusted in the second direction based on the first corresponding relationship and the second corresponding relationship, and determine the target deflection angle of the beam deflector 31 that needs to be deflected based on the misalignment.

[0150] In addition, it can be concluded from the above description that the work stage 4 has a trigger position Y1 in the second direction. When the position of the work stage 4 in the second direction reaches or exceeds the trigger position Y1, and the rotating mirror angle of the rotating mirror 32 is the target trigger angle (such as after reaching the trigger position Y1, the rotating mirror 32 rotates to the trigger angle for the first time), the laser 2 is triggered to output laser. Then the controller 1 is configured to adjust the starting position of the target format in the second direction by controlling the deflection of the beam deflector 31 before the position of the work stage 4 in the second direction reaches the trigger position. In addition, during the process of writing the target format, the beam deflector 31 needs to be maintained at the angle after deflection.

[0151] Correspondingly, the first corresponding relationship should also be detected and obtained before the position of the workpiece stage 4 in the second direction reaches the target position.

[0152] Below, an exemplary description is given of an implementation method for determining a target deflection angle to be deflected by the beam deflector 31 based on the first corresponding relationship and the second corresponding relationship:

[0153] (1) In some examples, the first corresponding relationship includes, in the processing flow of the target format, when the position of the workpiece stage 4 in the second direction is the angle detection position Y2, the first rotating mirror angle A1 at which the rotating mirror 32 is located. The angle detection position Y2 is located before the trigger position Y1. The second corresponding relationship includes, in the processing flow of the first format, when the position of the workpiece stage 4 in the second direction is the trigger position Y1, the fourth rotating mirror angle B2 at which the rotating mirror 32 is located.

[0154] When determining the target deflection angle of the beam deflector 31 to be deflected based on the first corresponding relationship and the second corresponding relationship, the controller 1 can first calculate the third corresponding relationship based on the first corresponding relationship. The third corresponding relationship includes a third rotating mirror angle B1 at which the rotating mirror 32 is located when the position of the workpiece stage 4 in the second direction is the trigger position Y1 in the processing flow of the target format. The third rotating mirror angle B1 is a calculated value.

[0155] like Figure 8 As shown, it is assumed that the first frame 71 is the first frame, and the fourth mirror angle B2 is 50°. It is assumed that the second frame 72, the third frame 73 and the fourth frame 74 are all target frames, and the corresponding first mirror angles A1 are 5°, 55° and 41° respectively.

[0156] After the first rotating mirror angle A1 is detected, the third rotating mirror angle B1 may be calculated using the following method.

[0157] First, the time t1 required for the workpiece stage 4 to move from the angle detection position Y2 to the trigger position Y1 in the second direction is determined, wherein: V yis the moving speed of the workpiece stage 4 in the second direction.

[0158] Then, the angle C of the rotating mirror 32 during the period t1 is determined, wherein C=360°·R·t1, and R is the rotation speed of the rotating mirror 32, with the unit of r / s, or revolutions per second.

[0159] Finally, the mirror angle after the mirror 32 rotates by angle C is determined, and the mirror angle is the third mirror angle B1, where B1=(A1+C)mod D, mod represents the modulus operation, and D is the angle corresponding to each face of the mirror 32, which can also be expressed as N is the number of surfaces included in the rotating mirror 32 .

[0160] Combining the above derivation process, we can get A1 and B1 satisfy the formula:

[0161] After calculating the third corresponding relationship, the controller 1 may use the following method to determine the misalignment between the target format and the first format:

[0162] First, determine the deviation angle E between the fourth mirror angle B2 and the third mirror angle B1, where E = B1 - B2. When B1 is greater than B2, it means that compared with the mirror 32 starting to rotate from the fourth mirror angle B2, the mirror 32 rotates from the third mirror angle B1 to a smaller mirror angle, that is, it can reach the trigger angle, and the target frame will be ahead of the first frame.

[0163] For example, from Figure 8 It can be seen that the third rotating mirror angle B1 corresponding to the third frame 73 is 58°, which is greater than the fourth rotating mirror angle B2 (50°), E=8°, and it can be seen that the position y3 of the workpiece stage 4 in the second direction corresponding to the triggering angle of the third frame 73 is located before y1.

[0164] When B1 is smaller than B2, it means that compared with the rotation of the rotating mirror 32 from the fourth rotating mirror angle B2, the rotating mirror 32 needs to rotate a larger angle from the third rotating mirror angle B1 to reach the trigger angle, and the target frame will lag behind the first frame.

[0165] For example, from Figure 8 It can be seen that the third rotating mirror angle B1 corresponding to the second frame 72 is 8°, which is smaller than the fourth rotating mirror angle (50°), E=-42°, and it can be seen that the position y2 of the workpiece stage 4 in the second direction corresponding to the trigger angle of the second frame 72 is located behind y1. The third rotating mirror angle B1 corresponding to the fourth frame is 44°, which is smaller than the fourth rotating mirror angle (50°), E=-6°, and it can be seen that the position y4 of the workpiece stage 4 in the second direction corresponding to the trigger angle of the fourth frame 74 is located behind y1.

[0166] It can be seen from the above description that the positive or negative value of E can also characterize the direction of the misalignment. When E is positive, the target frame is ahead of the first frame, and when E is negative, the target frame lags behind the first frame.

[0167] Then, the deviation time t2 corresponding to the deviation angle E is determined, wherein the deviation time t2 refers to the time required for the rotating mirror 32 to rotate the deviation angle E.

[0168] Then, the deviation time t2 is multiplied by the moving speed V of the workpiece stage 4 in the second direction. y , and obtain the offset Δy that the target width needs to adjust in the second direction, where Δy = V y ·t2.

[0169] Combining the above derivation process, we can get:

[0170]

[0171] After determining the misalignment Δy, the target deflection angle of the beam deflector 31 can be determined according to the misalignment Δy and the optical path characteristics of the laser processing system. In addition, the direction in which the beam deflector 31 needs to be deflected can also be determined according to the positive or negative value of the misalignment Δy.

[0172] The implementation method of determining the target deflection angle that the beam deflector 31 needs to be deflected by according to the misalignment amount Δy will be exemplarily described below.

[0173] (2) In some examples, the first corresponding relationship and the second corresponding relationship are both detected before the position of the workpiece stage 4 in the second direction reaches the trigger position Y1. The misalignment amount Δy can be determined directly based on the deviation between the first corresponding relationship and the second corresponding relationship.

[0174] In some examples, such as Fig. 9 As shown, the first corresponding relationship includes, in the processing flow of the target format, when the position of the workpiece stage 4 in the second direction is the angle detection position Y2, the first rotating mirror angle A1 of the rotating mirror 32. The second corresponding relationship includes, in the processing flow of the first format, when the position of the workpiece stage 4 in the second direction is the angle detection position Y2, the second rotating mirror angle A2 of the rotating mirror 32.

[0175] like Fig. 9 As shown, it is assumed that the first frame 71 is the first frame, and the second mirror angle A2 is 47°. It is assumed that the second frame 72, the third frame 73 and the fourth frame 74 are all target frames, and the corresponding first mirror angles A1 are 5°, 55° and 41° respectively.

[0176] When determining the target deflection angle of the beam deflector 31 to be deflected based on the first corresponding relationship and the second corresponding relationship, the controller 1 is configured as follows:

[0177] First, the lag angle F of the first rotating mirror angle A1 relative to the second rotating mirror angle A2 is determined. The rotating mirror angle after the rotating mirror 32 rotates from the first rotating mirror angle A1 to the lag angle F is the second rotating mirror angle A2.

[0178] When A1 is less than A2, A1+F=A2, then F=A2-A1; when A1 is greater than A2, A1 needs to rotate (D-A1) to D first, and then rotate A2 to reach the second mirror angle A2, that is,

[0179] For example, Fig. 9 As shown, the first mirror angle A1 of the second frame 72 is 5°, which is less than the second mirror angle A2 (47°), so F = 47°-5° = 42°. The first mirror angle A1 of the third frame 73 is 55°, which is greater than the second mirror angle A2 (47°), so F = 60°-55°+47° = 52°. The first mirror angle A1 of the fourth frame 74 is 41°, which is less than the second mirror angle A2 (47°), so F = 47°-41° = 6°.

[0180] Then, the lag time t3 corresponding to the lag angle F is determined, wherein the lag time t3 refers to the time required for the rotating mirror 32 to rotate the lag angle F.

[0181] Finally, the lag time t3 is multiplied by the moving speed V of the workpiece stage 4 in the second direction. y , and obtain the offset Δy that the target width needs to adjust in the second direction, where Δy = V y ·t3.

[0182] From the above derivation process, we can get: And, when A1 is less than A2, When A1 is greater than A2, In addition, the offset amount Δy is a positive value, and the offset amount Δy refers to the lag of the target width relative to the first width.

[0183] In addition, since the lag angle F of the first rotating mirror angle A1 relative to the second rotating mirror angle A2 is calculated, it is actually assumed that the target format lags behind the first format. However, in actual applications, the target format may be ahead of the first format, for example, Figure 3 and Figure 8 The third frame 73 in the image is obviously ahead of the first frame 71.

[0184] In order to solve this technical problem, the triggering conditions of laser 2 can be changed as follows:

[0185] The triggering condition of the first frame 71 (the first frame) remains unchanged, while the triggering condition of the frames after the first frame 71 includes two conditions changed to: the first condition is that the position of the workpiece stage 4 in the second direction reaches or exceeds y1, wherein y1 is the position of the workpiece stage 4 in the second direction when the triggering condition is met during the processing of the first frame 71; the second condition remains unchanged, that is, the mirror angle of the rotating mirror 32 is still a specific triggering angle. In this way, it can be ensured that the target frames lag behind the first frame. For example, Figure 8 and Fig. 9 As shown, after adopting the new trigger condition, y3 changes from being located before y1 to being located after y1.

[0186] In some examples, when the position of the work stage 4 in the second direction is the angle detection position Y2, the work stage 4 is in a uniform moving state in the second direction. In this way, the lag angle F of the first rotating mirror angle A1 relative to the second rotating mirror angle A2 will not change later, making the determined misalignment amount Δy more accurate.

[0187] In some examples, the angle detection position Y2 is the position where the workpiece stage 4 starts to move at a uniform speed in the second direction. In this way, not only can the determined misalignment amount Δy be more accurate, but also the maximum processing time can be reserved for the controller 1 to calculate the misalignment amount Δy and control the deflection of the beam deflector 31.

[0188] After determining the misalignment Δy, the target deflection angle of the beam deflector 31 can be determined according to the optical path characteristics of the laser processing system. The determination of the target deflection angle of the beam deflector 31 according to the misalignment Δy will be described below as an example.

[0189] The structure of the beam deflection assembly 3 is described in more detail below:

[0190] In some examples, such as Fig.10 As shown, in order to achieve that when the rotating mirror 32 rotates, the laser output by the beam deflection assembly 3 scans in the first direction, the rotation axis of the rotating mirror 32 can be perpendicular to the first direction.

[0191] Furthermore, in some examples, such as Fig.10 As shown, the rotation axis of the rotating mirror 32 is parallel to the second direction. Fig.17 As shown, the rotation axis of the rotating mirror 32 may not be parallel to the second direction, and the embodiment of the present disclosure is not limited to this.

[0192] Accordingly, in order to achieve that when the beam deflector 31 is deflected, the laser output by the beam deflection assembly 3 changes position in the second direction, the rotation axis of the beam deflector 31 may be perpendicular to the second direction.

[0193] Furthermore, in some examples, the rotation axis of the beam deflector 31 is also perpendicular to the first direction.

[0194] It should be noted that the rotation axis of the rotating mirror 32 may not be perpendicular to the first direction (such as the angle with the first direction is 89°), and the rotation axis of the beam deflector 31 may not be perpendicular to the second direction (such as the angle with the second direction is 89°). In this case, the rotating mirror 32 and the beam deflector 31 may be provided with corresponding lens groups to correct the optical path, so that the rotating mirror 32 and the beam deflector 31 can still achieve the adjustment of the position of the laser in the first direction and the second direction.

[0195] The embodiment of the present disclosure does not limit the relative position relationship between the beam deflector 31 and the rotating mirror 32. The following is an exemplary description of each of them:

[0196] (1) In some examples, such as Figure 7-Figure 10 and Fig.11 As shown, the beam deflector 31 is located on the optical path between the laser 2 and the rotating mirror 32 , and the laser light emitted by the laser 2 is reflected by the beam deflector 31 to the rotating mirror 32 , and then reflected by the rotating mirror 32 to the workpiece stage 4 .

[0197] In some examples, such as Figure 12-14 As shown, the beam deflection assembly 3 further includes a first lens group 33 , which is located on the optical path between the beam deflector 31 and the rotating mirror 32 .

[0198] In some examples, the first lens group 33 is used to make the exit point of the beam deflector 31 and the incident point of the rotating mirror 32 in a conjugate relationship. The exit point of the beam deflector 31 and the incident point of the rotating mirror 32 are in a conjugate relationship. It can also be understood that when the rotating mirror angle of the rotating mirror 32 is constant, no matter which deflection angle the beam deflector 31 is at, the light emitted from the beam deflector 31 is incident on the same incident point of the rotating mirror 32, and the only difference is the different incident angles. In addition, the greater the deflection amount of the beam deflector 31, the greater the change in the incident angle.

[0199] In some examples, such as Figure 12-14 As shown, the first lens group 33 includes a first scanning lens 331 and a first field lens 332 , and the first scanning lens 331 and the first field lens 332 are arranged in sequence along the outgoing light path of the beam deflector 31 .

[0200] In some examples, such as Fig.15As shown, the distance between the first scanning lens 331 and the beam deflector 31 is f1, the distance between the first scanning lens 331 and the first field mirror 332 is f1+f2, and the distance between the first field mirror 332 and the rotating mirror 32 is f2. Among them, f1 is the focal length of the first scanning lens 331, and f2 is the focal length of the first field mirror 332.

[0201] In some examples, such as Figure 12-14 As shown, the beam deflection assembly 3 further includes a second lens group 34 and a first objective lens 35 , and the second lens group 34 and the first objective lens 35 are arranged in sequence along the outgoing light path of the rotating mirror 32 .

[0202] In some examples, the second lens group 34 is used to make the exit point of the rotating mirror 32 and the incident point of the first objective lens 35 in a conjugate relationship, and the first objective lens 35 is used to focus the laser beam. Among them, the exit point of the rotating mirror 32 and the incident point of the first objective lens 35 are in a conjugate relationship, and it can also be understood that no matter which rotating mirror angle the rotating mirror 32 is at, the light emitted from the rotating mirror 32 is incident on the same incident point of the first objective lens 35, and the only difference is the incident angle.

[0203] In some examples, such as Figure 12-14 As shown, the second lens group 34 includes a second scanning lens 341 and a second field lens 342 , and the second scanning lens 341 and the second field lens 342 are arranged in sequence along the outgoing light path of the rotating mirror 32 .

[0204] In some examples, such as Fig.16 As shown, the distance between the second scanning lens 341 and the rotating mirror 32 is f3, the distance between the second scanning lens 341 and the second field lens 342 is f3+f4, and the distance between the second field lens 342 and the first objective lens 35 is f4. Among them, f3 is the focal length of the second scanning lens 341, and f4 is the focal length of the second field lens 342.

[0205] In the laser processing system provided by the embodiment of the present disclosure, the beam deflector 31 and the first lens group 33 constitute a misalignment correction module. When the beam deflector 31 is deflected by a deflection angle, the incident angle to the rotating mirror 32 will change. Then, after passing through the second lens group 34, the landing point of the focused light spot will shift in the second direction.

[0206] In addition, for the laser processing system having the above-mentioned first lens group 33, second lens group 34 and first objective lens 35, after determining the misalignment amount Δy that needs to be adjusted for the target format in the second direction, the target deflection angle of the beam deflector 31 can be calculated based on the misalignment amount Δy and relevant parameters of the first lens group 33, relevant parameters of the second lens group 34 and relevant parameters of the first objective lens 35.

[0207] Among them, the relevant parameters of the first lens group 33, the second lens group 34 and the first objective lens 35 may include the focal length of each lens included in the first lens group 33, the focal length of each lens included in the second lens group 34, and the focal length f5 and magnification M1 of the tube lens of the first objective lens 35.

[0208] For example, Fig.15 and Fig.16 As shown, it can be calculated that when the beam deflector 31 is deflected at an angle of α (the angle of the laser reflected by the beam deflector 31 changes by 2α), the displacement of the target format in the second direction is After the misalignment amount Δy is determined, the target deflection angle that the beam deflector 31 needs to deflect can be calculated by substituting it into the formula.

[0209] (2) Fig.17 and Fig.18 As shown, the rotating mirror 32 is located on the optical path between the laser 2 and the beam deflector 31 , and the laser light emitted by the laser 2 is reflected by the rotating mirror 32 to the beam deflector 31 , and then reflected by the beam deflector 31 to the workpiece stage 4 .

[0210] In some examples, such as Fig.19 and Fig. 20 As shown, the beam deflection assembly 3 further includes a third lens group 36 , which is located on the optical path between the rotating mirror 32 and the beam deflector 31 .

[0211] In some examples, the third lens group 36 is used to make the exit point of the rotating mirror 32 and the incident point of the beam deflector 31 in a conjugate relationship. The exit point of the rotating mirror 32 and the incident point of the beam deflector 31 are in a conjugate relationship, which can also be understood as, under the premise that the deflection angle of the beam deflector 31 remains unchanged, no matter which rotating mirror angle the rotating mirror 32 is at, the laser emitted from the rotating mirror 32 is incident on the same incident point of the beam deflector 31, and the only difference is the different incident angles.

[0212] In some examples, such as Fig.19 and Fig. 20 As shown, the third lens group 36 includes a third scanning lens 361 and a third field lens 362 , and the third scanning lens 361 and the third field lens 362 are arranged in sequence along the outgoing light path of the rotating mirror 32 .

[0213] In some examples, such as Fig. 20 As shown, the distance between the rotating mirror 32 and the third scanning lens 361 is f6, the distance between the third scanning lens 361 and the third field mirror 362 is f6+f7, and the distance between the third field mirror 362 and the beam deflector 31 is f7.

[0214] Wherein, f6 is the focal length of the third scanning lens 361 , and f7 is the focal length of the third field lens 362 .

[0215] In some examples, such as Fig.19 and Fig. 20 As shown, the beam deflection assembly 3 further includes a fourth lens group 37 and a second objective lens 38 , and the fourth lens group 37 and the second objective lens 38 are arranged in sequence along the outgoing light path of the beam deflector 31 .

[0216] In some examples, the fourth lens group 37 is used to make the exit point of the beam deflector 31 and the incident point of the second objective lens 38 in a conjugate relationship, and the second objective lens 38 is used to focus the laser beam. Among them, the exit point of the beam deflector 31 and the incident point of the second objective lens 38 are in a conjugate relationship, and it can also be understood that no matter which deflection angle the beam deflector 31 is at, the laser emitted from the beam deflector 31 is incident on the same incident point of the second objective lens 38, and the only difference is that the incident angle is different.

[0217] In some examples, such as Fig.21 As shown, the fourth lens group 37 includes a fourth scanning lens 371 and a fourth field lens 372 , and the fourth scanning lens 371 and the fourth field lens 372 are arranged in sequence along the outgoing light path of the beam deflector 31 .

[0218] In some examples, such as Fig.21 As shown, the distance between the beam deflector 31 and the fourth scanning lens 371 is f8, the distance between the fourth scanning lens 371 and the fourth field lens 372 is f8+f9, and the distance between the fourth field lens 372 and the second objective lens 38 is f9.

[0219] Wherein, f8 is the focal length of the fourth scanning lens 371 , and f9 is the focal length of the fourth field lens 372 .

[0220] In the laser processing system provided by the embodiment of the present disclosure, the beam deflector 31 and the fourth lens group 37 constitute a misalignment correction module. When the beam deflector 31 is deflected by a deflection angle, the incident angle to the second objective lens 38 will change. Subsequently, after passing through the second objective lens 38, the landing point of the focused light spot will shift in the second direction.

[0221] In addition, for the laser processing system having the above-mentioned third lens group 36, fourth lens group 37 and second objective lens 38, after determining the misalignment amount Δy that needs to be adjusted for the target format in the second direction, the target deflection angle required for the beam deflector 31 to be deflected can be calculated based on the misalignment amount Δy and relevant parameters of the third lens group 36, fourth lens group 37 and second objective lens 38.

[0222] Among them, the relevant parameters of the third lens group 36, the fourth lens group 37 and the second objective lens 38 may include the focal length of each lens included in the third lens group 36, the focal length of each lens included in the fourth lens group 37, and the focal length f10 and magnification M2 of the tube lens of the second objective lens 38.

[0223] For example, Fig.21 As shown, it can be calculated that when the beam deflector 31 is deflected at an angle of α (the angle of the laser reflected by the beam deflector 31 is deflected 2α), the displacement of the target format in the second direction is After the misalignment amount Δy is determined, it can be substituted into the formula to calculate the target deflection angle that the beam deflector 31 needs to deflect.

[0224] In addition, the laser processing system provided by the embodiment of the present disclosure further includes an angle detection module 5 and a position detection module 6 . The angle detection module 5 is used to detect the rotation angle of the rotation mirror 32 , and the position detection module 6 is used to detect the position of the workpiece stage 4 .

[0225] In some examples, the angle detection module 5 is a circular grating. In other examples, the angle detection module 5 is a power detector and uses Figure 4 The illustrated technical solution detects the rotation mirror angle of the rotation mirror 32 .

[0226] In some examples, when the workpiece stage 4 is a two-axis workpiece stage or a multi-axis workpiece stage, the position detection module 6 is used to detect the real-time position of each axis to determine the position of the workpiece stage 4 or the workpiece 7. The position detection module 6 may adopt a grating ruler structure.

[0227] The angle detection module 5 and the position detection module 6 in the embodiment of the present disclosure constitute a misalignment detection module, which is used to provide data for determining the misalignment amount between the target format and the first format.

[0228] In some examples, such as Fig. 22 As shown, the laser processing system includes a control card 11, a workpiece stage controller 12 and a computer 13. The control card 11 is connected to various components in the laser processing system, used to issue control instructions to various parts, and connected to the computer 13, so that the operator can set the control card 11 through the computer 13. The workpiece stage controller 12 is used to control the movement of the workpiece stage 4. The computer 13 is used as the host computer of the laser processing system to facilitate the operation of the operator.

[0229] The controller 1 in the embodiment of the present disclosure may include any one, any two or all of the control card 11, the workpiece stage controller 12 and the computer 13. In some examples, the controller 1 may be the control card 11.

[0230] Next, combine Fig. 22 , a more detailed and exemplary description of the processing flow of the laser processing system is given:

[0231] Start the processing flow of the first frame (such as the first frame 71):

[0232] The control card 11 sends a PWM signal to control the rotating mirror 32 to move at a uniform speed.

[0233] The writing data is transmitted from the computer 13 to the control card 11 .

[0234] The workpiece stage controller 12 sets the workpiece stage 4 to move along the second direction starting from a stationary starting point Y0 .

[0235] The control card 11 collects the mirror angle of the rotating mirror 32 detected by the angle detection module 5 and the position of the workpiece stage 4 in the second direction detected by the position detection module 6, and when the workpiece stage 4 in the second direction reaches the angle detection position Y2, the second mirror angle A2 at this time is recorded.

[0236] Afterwards, when the work stage 4 passes through the trigger position Y1 along the second direction and the rotating mirror 32 rotates to the trigger angle (assuming that the position of the work stage 4 in the second direction is y1 at this time), the laser 2 is triggered to output laser.

[0237] When the laser (or writing data) corresponding to the first format is outputted, the work stage 4 is controlled to stop moving in the second direction first, and then returns to the starting point Y0. Thereafter, the work stage 4 is controlled to change lines along the first direction to the line where the target format is located.

[0238] Start the processing flow of the target format (such as the format after the first format 71):

[0239] The workpiece stage controller 12 sets the workpiece stage 4 to move along the second direction starting from a stationary starting point Y0 .

[0240] The control card 11 collects the mirror angle of the rotating mirror 32 detected by the angle detection module 5 and the position of the workpiece stage 4 in the second direction detected by the position detection module 6, and when the position of the workpiece stage 4 in the second direction reaches the angle detection position Y2, the first rotating mirror angle A1 at this time is recorded.

[0241] During the period when the workpiece stage 4 moves from the angle detection position Y2 to the trigger position Y1 along the second direction, the control card 11 calculates the misalignment Δy between the target format and the first format in the second direction according to the lag angle F of the first rotating mirror angle A1 relative to the second rotating mirror angle A2, and then determines the target deflection angle that the beam deflector 31 needs to deflect according to the misalignment Δy and the optical path characteristics of the laser processing system, and controls the beam deflector 31 to deflect the target deflection angle.

[0242] Afterwards, the workpiece stage 4 passes through y1 along the second direction, and when the rotating mirror 32 rotates to the triggering angle, the laser 2 is triggered to output laser.

[0243] When the laser (or writing data) corresponding to the target format is output, the workpiece stage 4 is controlled to stop moving in the second direction first, and then return to the starting point Y0. At the same time, the workpiece stage 4 is controlled to change lines along the first direction to the line where another format is located, and the processing flow of the next format is started.

[0244] It can be seen that the laser processing system provided in the embodiment of the present disclosure calculates the misalignment Δy between the target format and the first format based on the data detected by the angle detection module 5 and the position detection module 6, and then uses the beam deflector 31 and the corresponding lens group to adjust the position of the target format in the second direction, thereby achieving misalignment-free splicing between different formats and still being able to give full play to the advantage of the fast processing speed of the rotating mirror 32.

[0245] The embodiment of the present disclosure also provides a laser processing method, which is applied to the above-mentioned laser processing system, for example, applied to the controller 1, and the method includes: before writing the target format on the workpiece 7, adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector 31.

[0246] In some examples, for a scenario where the target format and the first format need to be adjusted to be flush in the second direction, the method includes: controlling the beam deflector 31 to deflect to adjust the starting position of the target format in the second direction toward the starting position of the first format in the second direction.

[0247] The first format is a format processed before the target format, and the first format and the target format are arranged along a first direction.

[0248] In some examples, the work stage 4 has a trigger position in the second direction, wherein when the position of the work stage 4 in the second direction reaches or exceeds the trigger position and the rotating mirror angle of the rotating mirror 32 is the target trigger angle, the laser 2 is triggered to output laser. For this trigger mechanism, the method includes: before the position of the work stage 4 in the second direction reaches the trigger position, the starting position of the target format in the second direction is adjusted by controlling the deflection of the beam deflector 31.

[0249] In some examples, the starting position of the target format in the second direction is adjusted toward the starting position of the first format in the second direction by controlling the deflection of the beam deflector 31, including: detecting a first correspondence between the rotation angle of the rotating mirror 32 and the position of the work stage 4 in the second direction. Based on the first correspondence and the second correspondence, the target deflection angle to which the beam deflector 31 needs to be deflected is determined, wherein the second correspondence is the correspondence between the rotation angle of the rotating mirror 32 and the position of the work stage 4 in the second direction in the processing flow of the first format. The beam deflector 31 is controlled to deflect the target deflection angle.

[0250] In some examples, based on the first correspondence and the second correspondence, the target deflection angle of the beam deflector 31 to be deflected is determined, including: based on the first correspondence and the second correspondence, determining the misalignment amount of the target format to be adjusted in the second direction; based on the misalignment amount, determining the target deflection angle of the beam deflector 31 to be deflected.

[0251] In some examples, the first corresponding relationship includes, in the processing flow of the target format, when the position of the work stage 4 in the second direction is the angle detection position, the first rotating mirror angle of the rotating mirror 32. The second corresponding relationship includes, in the processing flow of the first format, when the position of the work stage 4 in the second direction is the angle detection position, the second rotating mirror angle of the rotating mirror 32.

[0252] The angle detection position is located before the trigger position.

[0253] In some examples, based on the first corresponding relationship and the second corresponding relationship, the target deflection angle of the beam deflector 31 to be deflected is determined, including: determining a lag angle of the first rotating mirror angle relative to the second rotating mirror angle, determining a lag time corresponding to the lag angle, multiplying the lag time by the moving speed of the workpiece stage 4 in the second direction, obtaining the misalignment amount that needs to be adjusted for the target format in the second direction, and determining the target deflection angle of the beam deflector 31 based on the misalignment amount.

[0254] In some examples, when the beam deflection assembly 3 includes a first lens group 33, a second lens group 34 and a first objective lens 35, after determining the amount of misalignment of the target format that needs to be adjusted in the second direction, the method further includes: determining the target deflection angle to which the beam deflector 31 needs to be deflected based on the misalignment, the focal length of each lens of the first lens group 33, the focal length of each lens of the second lens group 34, and the focal length and magnification of the tube lens of the first objective lens 35, and controlling the beam deflector 31 to deflect the target deflection angle.

[0255] In some examples, when the beam deflection assembly 3 includes a third lens group 36, a fourth lens group 37, and a second objective lens 38, after determining the amount of misalignment of the target format that needs to be adjusted in the second direction, the method further includes: determining the target deflection angle to which the beam deflector 31 needs to be deflected based on the misalignment amount, the focal length of each lens of the third lens group 36, the focal length of each lens of the fourth lens group 37, and the focal length and magnification of the tube lens of the second objective lens 38, and controlling the beam deflector 31 to deflect the target deflection angle.

[0256] It should be noted that the method provided in the above embodiment belongs to the same concept as the laser processing system. The specific implementation process is detailed in the relevant embodiments of the laser processing system and will not be repeated here.

[0257] The disclosed embodiment also provides a laser processing device, which is applied to a controller 1 of a laser processing system, and includes: a control module for adjusting the starting position of the target format in the second direction by controlling the deflection of a beam deflector before writing the target format on a workpiece.

[0258] In some examples, the control module is used to execute and implement the above-mentioned laser processing method.

[0259] The embodiment of the present disclosure also provides a computer-readable storage medium, in which at least one instruction is stored. The at least one instruction is loaded and executed by a controller to implement the above-mentioned laser processing method.

[0260] The embodiment of the present disclosure also provides a computer program product, which includes at least one instruction, and the at least one instruction is executed by a controller so that the controller implements the above-mentioned laser processing method.

[0261] The embodiment of the present disclosure also provides a chip, which includes a controller, and the controller is used to call and execute instructions stored in the memory from the memory, so that a laser processing system equipped with the chip executes the above-mentioned laser processing method.

[0262] The embodiment of the present disclosure also provides another chip, which includes: an input interface, an output interface, a controller and a memory. The input interface, the output interface, the controller and the memory are connected through an internal connection path. The controller is used to execute the code in the memory. When the code is executed, the controller is used to execute the above-mentioned laser processing method.

[0263] In the above embodiments, it can be implemented in whole or in part by software, hardware, firmware or any combination thereof. When implemented using software, it can be implemented in whole or in part in the form of a computer program product. The computer program product includes one or more computer instructions. When the computer program instructions are loaded and executed on a computer (electronic control unit), the process or function described in the embodiment of the present disclosure is generated in whole or in part. The computer instructions can be stored in a computer-readable storage medium, or transmitted from one computer-readable storage medium to another computer-readable storage medium. For example, the computer instructions can be transmitted from a website site, computer, server or data center to another website site, computer, server or data center by wired (e.g., coaxial cable, optical fiber, digital subscriber line) or wireless (e.g., infrared, wireless, microwave, etc.) mode. The computer-readable storage medium can be any available medium that a computer can access or a data storage device such as a server or data center that includes one or more available media integration. The available medium can be a magnetic medium, (e.g., a floppy disk, a hard disk, a tape), an optical medium (e.g., a DVD), or a semiconductor medium (e.g., a solid-state hard disk Solid State Disk), etc.

[0264] In order to clearly illustrate the interchangeability of hardware and software, the steps and components of each embodiment have been generally described in the above description according to function. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. A person of ordinary skill in the art may use different methods to implement the described functions for each specific application, but such implementation should not be considered beyond the scope of this disclosure.

[0265] The computer program code for implementing the method of the disclosed embodiment can be written in one or more programming languages. These computer program codes can be provided to a general-purpose computer, a special-purpose computer or other programmable controller so that the program code, when executed by the computer or other programmable controller, causes the function / operation specified in the flow chart and / or block diagram to be implemented. The program code can be executed completely on a computer, partially on a computer, as an independent software package, partially on a computer and partially on a remote computer or completely on a remote computer or server.

[0266] In the context of the embodiments of the present disclosure, computer program codes or related data may be carried by any appropriate carrier to enable a device, apparatus or controller to perform the various processes and operations described above. Examples of carriers include signals, computer readable media, etc. Examples of signals may include electrical, optical, radio, acoustic or other forms of propagation signals, such as carrier waves, infrared signals, etc.

[0267] Those skilled in the art can clearly understand that, for the convenience and brevity of description, the specific working processes of the systems, devices and modules described above can refer to the corresponding processes in the aforementioned method embodiments and will not be repeated here.

[0268] In the several embodiments provided in the present disclosure, it should be understood that the disclosed systems, devices and methods can be implemented in other ways. For example, the device embodiments described above are only schematic. For example, the division of the modules is only a logical function division. There may be other division methods in actual implementation, such as multiple modules or components can be combined or integrated into another system, or some features can be ignored or not executed. In addition, the mutual coupling or direct coupling or communication connection shown or discussed can be an indirect coupling or communication connection through some interfaces, devices or modules, or it can be an electrical, mechanical or other form of connection.

[0269] The modules described as separate components may or may not be physically separated, and the components shown as modules may or may not be physical modules, that is, they may be located in one place or distributed on multiple network modules. Some or all of the modules may be selected according to actual needs to achieve the purpose of the embodiments of the present disclosure.

[0270] In addition, each functional module in each embodiment of the present disclosure may be integrated into one processing module, or each module may exist physically separately, or two or more modules may be integrated into one module. The above integrated modules may be implemented in the form of hardware or in the form of software functional modules.

[0271] In the present disclosure, the terms "first", "second", etc. are used to distinguish between identical or similar items with substantially the same effects and functions. It should be understood that there is no logical or temporal dependency between "first", "second", and "nth", nor is there a limit on the quantity and execution order. It should also be understood that although the following description uses the terms first, second, etc. to describe various elements, these elements should not be limited by the terms. These terms are only used to distinguish one element from another element.

[0272] It should also be understood that in the various embodiments of the present disclosure, the size of the serial number of each process does not mean the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present disclosure.

[0273] The term "at least one" in the present disclosure means one or more, and the term "plurality" in the present disclosure means two or more.

[0274] It should be understood that the terms used in the description of the various examples herein are only for describing specific examples and are not intended to be limiting. As used in the description of the various examples and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.

[0275] It should also be understood that the term “comprise” (also known as “includes,” “including,” “comprises” and / or “comprising”) when used in this specification specifies the presence of stated features, integers, steps, operations, elements, and / or components, but does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0276] It should also be understood that, depending on the context, the phrase “if it is determined that…” or “if [stated condition or event] is detected” may be interpreted to mean “upon determining that…” or “in response to determining that…” or “upon detecting [stated condition or event]” or “in response to detecting [stated condition or event]”.

[0277] It should be understood that determining B based on A does not mean determining B only based on A. B can also be determined based on A and / or other information.

[0278] It should also be understood that the references to "one embodiment", "an embodiment", "some examples", "a possible implementation" throughout the specification mean that specific features, structures or characteristics related to the embodiment or implementation are included in at least one embodiment of the present disclosure. Therefore, "in one embodiment" or "in an embodiment", "in some examples", "a possible implementation" appearing throughout the specification do not necessarily refer to the same embodiment. In addition, these specific features, structures or characteristics may be combined in one or more embodiments in any suitable manner.

[0279] The above description is only an optional embodiment of the present disclosure and is not intended to limit the present disclosure. Any modifications, equivalent substitutions, improvements, etc. made within the principles of the present disclosure shall be included in the protection scope of the present disclosure.

[0280] The above description is only an optional embodiment of the present disclosure and is not intended to limit the present disclosure. Any modifications, equivalent substitutions, improvements, etc. made within the principles of the present disclosure shall be included in the protection scope of the present disclosure.

Claims

1. A laser processing system, characterized in that: It comprises a controller (1), a laser (2), a beam deflection component (3) and a workpiece stage (4); The beam deflection component (3) is located on the output light path of the laser (2), and the beam deflection component (3) is used to output laser light to the workpiece stage (4); The workpiece platform (4) is used to carry a workpiece (7) and is capable of driving the workpiece (7) to move along a first direction and a second direction, wherein the first direction and the second direction are perpendicular; The beam deflection assembly (3) comprises a beam deflector (31) and a rotating mirror (32), wherein the rotating mirror (32) is used to realize scanning of the laser output by the beam deflection assembly (3) in the first direction, and the beam deflector (31) is used to adjust the position of the laser output by the beam deflection assembly (3) in the second direction; The controller (1) is configured to adjust the starting position of the target format in the second direction by controlling the deflection of the beam deflector (31) before writing the target format on the workpiece (7).

2. The laser processing system according to claim 1, characterized in that: When adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector (31), the controller (1) is configured to: By controlling the deflection of the beam deflector (31), the starting position of the target format in the second direction is adjusted toward the starting position of the first format in the second direction; The first format is a format processed before the target format, and the first format and the target format are arranged along the first direction.

3. The laser processing system according to claim 2, characterized in that: The workpiece stage (4) has a trigger position in the second direction, wherein when the position of the workpiece stage (4) in the second direction reaches or exceeds the trigger position and the rotating mirror angle of the rotating mirror (32) is a target trigger angle, the laser (2) is triggered to output laser light; The controller (1) is configured to adjust the starting position of the target format in the second direction by controlling the deflection of the beam deflector (31) before the position of the workpiece stage (4) in the second direction reaches the trigger position.

4. The laser processing system according to claim 2 or 3, characterized in that: When the starting position of the target frame in the second direction is adjusted toward the starting position of the first frame in the second direction by controlling the deflection of the beam deflector (31), the controller (1) is configured to: Detecting a first corresponding relationship between a rotating mirror angle of the rotating mirror (32) and a position of the workpiece platform (4) in the second direction; Based on the first corresponding relationship and the second corresponding relationship, a target deflection angle of the beam deflector (31) to be deflected is determined, wherein the second corresponding relationship is a corresponding relationship between a rotation angle of the rotating mirror (32) and a position of the workpiece stage (4) in the second direction in a processing flow of the first format; The beam deflector (31) is controlled to deflect to the target deflection angle.

5. The laser processing system according to claim 4, characterized in that: When determining the target deflection angle of the beam deflector (31) to be deflected based on the first corresponding relationship and the second corresponding relationship, the controller (1) is configured to: Based on the first corresponding relationship and the second corresponding relationship, determining the misalignment amount of the target width that needs to be adjusted in the second direction; Based on the misalignment amount, a target deflection angle at which the beam deflector (31) needs to be deflected is determined.

6. The laser processing system according to claim 4 or 5, characterized in that: The first corresponding relationship includes, in the processing flow of the target format, when the position of the workpiece platform (4) in the second direction is an angle detection position, a first rotating mirror angle at which the rotating mirror (32) is located; The second corresponding relationship includes, in the processing flow of the first format, when the position of the workpiece platform (4) in the second direction is the angle detection position, the second rotating mirror angle of the rotating mirror (32).

7. The laser processing system according to claim 6, characterized in that: When determining the target deflection angle of the beam deflector (31) to be deflected based on the first corresponding relationship and the second corresponding relationship, the controller (1) is configured to: determining a lag angle of the first rotating mirror angle relative to the second rotating mirror angle; Determine a lag time corresponding to the lag angle; Multiplying the lag time by the moving speed of the workpiece platform (4) in the second direction to obtain the offset amount of the target width that needs to be adjusted in the second direction; Based on the misalignment amount, a target deflection angle at which the beam deflector (31) needs to be deflected is determined.

8. The laser processing system according to any one of claims 1 to 7, characterized in that: The rotation axis of the beam deflector (31) is perpendicular to the first direction, and the rotation axis of the rotating mirror (32) is perpendicular to the second direction.

9. The laser processing system according to any one of claims 1 to 8, characterized in that: The beam deflector (31) is located on the optical path between the laser (2) and the rotating mirror (32).

10. The laser processing system according to claim 9, characterized in that: The beam deflection assembly (3) further comprises a first lens group (33), wherein the first lens group (33) is located on the optical path between the beam deflector (31) and the rotating mirror (32); The first lens group (33) is used to make the exit point of the light beam deflector (31) and the incident point of the rotating mirror (32) present a conjugate relationship.

11. The laser processing system according to claim 10, characterized in that: The light beam deflection assembly (3) further comprises a second lens group (34) and a first objective lens (35), wherein the second lens group (34) and the first objective lens (35) are arranged in sequence along the exit light path of the rotating mirror (32); When adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector (31), the controller (1) is configured to: Determining the misalignment amount of the target width that needs to be adjusted in the second direction; Determining a target deflection angle of the beam deflector (31) to be deflected based on the misalignment amount, the focal length of each lens of the first lens group (33), the focal length of each lens of the second lens group (34), and the focal length and magnification of the tube lens of the first objective lens (35); The beam deflector (31) is controlled to deflect to the target deflection angle.

12. The laser processing system according to any one of claims 1 to 8, characterized in that: The rotating mirror (32) is located on the optical path between the laser (2) and the beam deflector (31).

13. The laser processing system according to claim 12, characterized in that: The beam deflection assembly (3) further comprises a third lens group (36), wherein the third lens group (36) is located on the optical path between the rotating mirror (32) and the beam deflector (31); The third lens group (36) is used to make the exit point of the rotating mirror (32) and the incident point of the beam deflector (31) present a conjugate relationship.

14. The laser processing system according to claim 13, characterized in that: The beam deflection assembly (3) further comprises a fourth lens group (37) and a second objective lens (38), wherein the fourth lens group (37) and the second objective lens (38) are arranged in sequence along the exit light path of the beam deflector (31); When adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector (31), the controller (1) is configured to: Determining the misalignment amount of the target width that needs to be adjusted in the second direction; Determining a target deflection angle of the beam deflector (31) to be deflected based on the misalignment amount, the focal length of each lens of the third lens group (36), the focal length of each lens of the fourth lens group (37), and the focal length and magnification of the tube lens of the second objective lens (38); The beam deflector (31) is controlled to deflect to the target deflection angle.

15. A laser processing method, characterized in that: The method is applied to a controller (1) of a laser processing system according to any one of claims 1 to 14, and the method comprises: Before writing a target format on a workpiece (7), the starting position of the target format in the second direction is adjusted by controlling the deflection of the beam deflector (31).

16. The method according to claim 15, characterized in that The step of adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector (31) comprises: By controlling the deflection of the beam deflector (31), the starting position of the target format in the second direction is adjusted toward the starting position of the first format in the second direction; The first format is a format processed before the target format, and the first format and the target format are arranged along the first direction.

17. The method according to claim 16, characterized in that The workpiece stage (4) has a trigger position in the second direction, wherein when the position of the workpiece stage (4) in the second direction reaches or exceeds the trigger position and the rotating mirror angle of the rotating mirror (32) is a target trigger angle, the laser (2) is triggered to output laser light; The step of adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector (31) comprises: Before the position of the workpiece stage (4) in the second direction reaches the trigger position, the starting position of the target format in the second direction is adjusted by controlling the deflection of the beam deflector (31).

18. The method according to claim 16 or 17, characterized in that The step of controlling the beam deflector (31) to deflect so as to adjust the starting position of the target format in the second direction toward the starting position of the first format in the second direction comprises: Detecting a first corresponding relationship between a rotating mirror angle of the rotating mirror (32) and a position of the workpiece platform (4) in the second direction; Based on the first corresponding relationship and the second corresponding relationship, a target deflection angle of the beam deflector (31) to be deflected is determined, wherein the second corresponding relationship is a corresponding relationship between a rotation angle of the rotating mirror (32) and a position of the workpiece stage (4) in the second direction in a processing flow of the first format; The beam deflector (31) is controlled to deflect to the target deflection angle.

19. The method according to claim 18, characterized in that The step of determining a target deflection angle at which the beam deflector (31) needs to be deflected based on the first corresponding relationship and the second corresponding relationship comprises: Based on the first corresponding relationship and the second corresponding relationship, determining the misalignment amount of the target width that needs to be adjusted in the second direction; Based on the misalignment amount, a target deflection angle at which the beam deflector (31) needs to be deflected is determined.

20. The method according to claim 18 or 19, characterized in that The first corresponding relationship includes, in the processing flow of the target format, when the position of the workpiece platform (4) in the second direction is an angle detection position, a first rotating mirror angle at which the rotating mirror (32) is located; The second corresponding relationship includes, in the processing flow of the first format, when the position of the workpiece platform (4) in the second direction is the angle detection position, the second rotating mirror angle of the rotating mirror (32).

21. The method according to claim 20, characterized in that The step of determining a target deflection angle at which the beam deflector (31) needs to be deflected based on the first corresponding relationship and the second corresponding relationship comprises: determining a lag angle of the first rotating mirror angle relative to the second rotating mirror angle; Determine a lag time corresponding to the lag angle; Multiplying the lag time by the moving speed of the workpiece platform (4) in the second direction to obtain the offset amount of the target width that needs to be adjusted in the second direction; Based on the misalignment amount, a target deflection angle at which the beam deflector (31) needs to be deflected is determined.

22. The method according to any one of claims 15 to 21, characterized in that: When the beam deflection assembly (3) comprises a first lens group (33), a second lens group (34) and a first objective lens (35), the method of adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector (31) comprises: Determining the misalignment amount of the target width that needs to be adjusted in the second direction; Determining a target deflection angle of the beam deflector (31) to be deflected based on the misalignment amount, the focal length of each lens of the first lens group (33), the focal length of each lens of the second lens group (34), and the focal length and magnification of the tube lens of the first objective lens (35); The beam deflector (31) is controlled to deflect to the target deflection angle.

23. The method according to any one of claims 15 to 21, characterized in that: When the beam deflection assembly (3) comprises a third lens group (36), a fourth lens group (37) and a second objective lens (38), the step of adjusting the starting position of the target format in the second direction by controlling the deflection of the beam deflector (31) comprises: Determining the misalignment amount of the target width that needs to be adjusted in the second direction; Determining a target deflection angle of the beam deflector (31) to be deflected based on the misalignment amount, the focal length of each lens of the third lens group (36), the focal length of each lens of the fourth lens group (37), and the focal length and magnification of the tube lens of the second objective lens (38); The beam deflector (31) is controlled to deflect to the target deflection angle.

24. A computer-readable storage medium, characterized in that: At least one instruction is stored in the computer-readable storage medium, and the at least one instruction is loaded and executed by the controller to implement the method according to any one of claims 15-23.

Citation Information

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