Optical filter for material light aging test and plating method and application thereof

Abstract

The invention relates to an optical filter for a material light aging test, and relates to the technical field of optical filters, the optical filter comprises a substrate material, the thickness of the substrate material is 2mm, a film layer is arranged on the substrate material, the film layer is formed by alternately stacking high-refractive-index materials and low-refractive-index materials, the film system structure of the film layer is (HL) 7, H is the high-refractive-index material, and H is the low-refractive-index material. L is a low-refractive-index material, and 7 is the number of times of alternate stacking of the high-refractive-index material and the low-refractive-index material. The optical filter provided by the invention can effectively filter out spectrums less than 290nm, and corrects the light transmittance in a range of 600-1200nm at the same time.

Description

Technical Field

[0001] The present application relates to the technical field of optical filters, and in particular to an optical filter for material light aging testing, and a plating method and application thereof. Background Art

[0002] Optical filters are an optical component widely used in the field of scientific research. They can control and adjust light by selectively filtering out certain wavelengths in the spectrum, thus playing a key role in various optical applications.

[0003] Xenon arc lamp is a commonly used light source for accelerated UV aging test of materials. The power and the proportion of UVB, UVA1, UVA2, VIS and NIR must meet the requirements of international standards. Usually, the light source for accelerated UV aging test of materials is xenon arc lamp, which is widely used because its UV distribution characteristics are very close to the solar spectrum. Summary of the invention

[0004] In order to cut off the spectrum below 290nm while ensuring the proportion of each spectrum within 290-800nm, the present application provides a filter for material light aging test and a coating method and application thereof.

[0005] In the first aspect, the present application provides a filter for material light aging test, which adopts the following technical solution:

[0006] A filter for material light aging test, comprising a substrate material, the thickness of the substrate material is 2 mm, a film layer is arranged on the substrate material, the film layer is formed by alternately stacking high refractive index and low refractive index materials, and the film system structure of the film layer is (HL) 7 , where H is a high refractive index material, L is a low refractive index material, and 7 is the number of times the high refractive index and low refractive index materials are alternately stacked together;

[0007] The film has 14 layers in total, and the thicknesses of the first to fourteenth layers of the film are as follows:

[0008] The thickness of the first layer is 18.08±5nm;

[0009] The thickness of the second layer is 24.32±5nm;

[0010] The thickness of the third layer is 90.40±5nm;

[0011] The thickness of the fourth layer is 121.58±5nm;

[0012] The thickness of the fifth layer is 90.4±5nm;

[0013] The thickness of the sixth layer is 121.58±5nm;

[0014] The thickness of the seventh layer is 90.4±5nm;

[0015] The eighth layer has a thickness of 121.58±5 nm;

[0016] The thickness of the ninth layer is 90.4±5nm;

[0017] The thickness of the tenth layer is 121.58±5nm;

[0018] The thickness of the eleventh layer is 90.4±5nm;

[0019] The thickness of the twelfth layer is 121.58±5nm;

[0020] The thickness of the thirteenth layer is 90.4±5nm;

[0021] The thickness of the fourteenth layer is 60.79±5 nm.

[0022] By adopting the above technical solution, a film layer is formed by alternately stacking a high refractive index material and a low refractive index material, and the film layer thickness is within the thickness range of the present application. Under the premise of not increasing the film layer thickness, the spectrum of less than 290nm can be effectively filtered out, while ensuring the proportion of each spectrum segment within 290-800nm. Moreover, the thickness of the initial stacked film layer and the thickness of the final stacked film layer are both lower than the thickness of the intermediate stacked film layer. The film layer that can be formed is more stable and not easily affected by the external environment and peeled off, thereby ensuring its filtering effect.

[0023] Optionally, the substrate is a quartz substrate.

[0024] Optionally, the high refractive index material is HFO2, the low refractive index material is SiO2, and the film materials of the first to fourteenth layers of the film layer are HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO2.

[0025] By adopting the above technical solution, the film layer formed by alternately stacking HFO2 and SiO2 has good bonding strength with the substrate, ensuring the filtering effect of the filter and making the filtered light close to the standard solar ultraviolet spectrum.

[0026] In a second aspect, the present application provides a method for plating a filter for a material light aging test, which adopts the following technical solution:

[0027] A coating method for a filter for a material light aging test, using an electron gun heating method to evaporate the coating material; the vacuum degree reaches 3×10 -3 Pa.

[0028] By adopting the above technical solution, a stable film layer with good bonding effect is obtained, so that the filter meets the filtering requirements of international standards.

[0029] In a third aspect, the present application provides an application of a filter for a material light aging test, using the following technical solution:

[0030] An application of a filter for material light aging test, using a xenon arc lamp as a solar ultraviolet accelerated aging test light source, the filter's spectral transmittance in the 250-1100nm band can meet the following requirements:

[0031] The average transmittance T in the 250-270nm band is less than 2%; the average transmittance T in the 290-600nm band is 92% with an allowable deviation of ±3%; the average transmittance T in the 730nm band is 11% with an allowable deviation of ±2%; the average transmittance T in the 880nm band is 92% with an allowable deviation of ±2%, the average transmittance T in the 960nm band is 72% with an allowable deviation of ±2%. The average transmittance T in the 1100nm band is 92% with an allowable deviation of ±2%.

[0032] By adopting the above technical solution, the relative spectral intensity distribution of the xenon arc light source can be made so that the light filtered by the filter is close to the standard solar ultraviolet spectrum. Using the filter with the filtering characteristics of the present application, 290-800nm ​​is defined as 100%, 290<λ≤320 can account for 0.6±0.2%, 320<λ≤360 can account for 4.2±0.5%; 360<λ≤400 can account for 6.2±1.0%, indicating that the proportion of the 290-400nm band can be better retained, better meeting the basic conditions of the test.

[0033] In summary, the present application includes at least one of the following beneficial technical effects:

[0034] 1. The present application adopts a film layer formed by alternately stacking high refractive index materials and low refractive index materials, and the film layer thickness is within the thickness range of the present application, which can effectively filter out the spectrum <290nm, while ensuring the proportion of each spectrum within 290-800nm;

[0035] 2. Using the filter with the filtering characteristics of the present application, 290-800nm ​​is defined as 100%, 290<λ≤320 can reach 0.6±0.2%, 320<λ≤360 can reach 4.2±0.5%; 360<λ≤400 can reach 6.2±1.0%, indicating that the proportion of the 290-400nm band can be better retained, better meeting the basic conditions of the experiment. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 1 This is a spectrum design diagram of the filter when the present application uses a xenon arc lamp as the test light source. DETAILED DESCRIPTION

[0037] The present application is further described in detail below with reference to the embodiments.

[0038] Example 1

[0039] A filter for material light aging test, comprising a substrate material, the thickness of the substrate material is 2 mm, and the substrate is a quartz substrate;

[0040] The substrate material is provided with a film layer, which is formed by alternating stacking of high refractive index and low refractive index materials. The film structure of the film layer is (HL) 7 , where H is a high refractive index material, L is a low refractive index material, and 7 is the number of times the high refractive index and low refractive index materials are alternately stacked together, where the high refractive index material is HFO2 and the low refractive index material is SiO2;

[0041] There are 14 film layers in total, and the coating materials and thicknesses of the first to fourteenth layers of the film layers are shown below.

[0042]

[0043]

[0044] The thickness errors of the above coating materials are all within 5nm.

[0045] A method for plating a filter for a material light aging test comprises the following steps:

[0046] The coating material is evaporated by electron gun heating; the vacuum degree is 3×10 -3 Pa.

[0047] Application Example 1

[0048] The invention discloses an application of a filter for material light aging test, using a xenon arc lamp as a light source for solar ultraviolet accelerated aging test, and testing the spectral transmittance of the filter prepared in Example 1 in the 250-1100nm band.

[0049] Performance testing

[0050] 1. According to the xenon arc light source specified in the international standard IS04892-2 and ASTM G155, the spectral transmittance of the filter in application example 1 was measured. The test results are as follows: Figure 1 shown.

[0051] Combination Figure 1 It can be concluded that the filter can meet the following requirements: the average transmittance T in the 250-270nm band is less than 2%; the average transmittance T in the 290-600nm band is T=92% with an allowable deviation of ±3%; the average transmittance T in the 730nm band is T=11% with an allowable deviation of ±2%; the average transmittance T in the 880nm band is T=92% with an allowable deviation of ±2%, the average transmittance T in the 960nm band is T=72% with an allowable deviation of ±2%; the average transmittance T in the 1100nm band is T=92% with an allowable deviation of ±2%.

[0052] 2. The spectral relative irradiance of the filter prepared in Example 1 was tested by artificial weathering test of ISO4892-2 (method A). The relative irradiance refers to the proportion of spectral energy of different bands after transmission. The light energy after transmission = the light energy before transmission * transmittance.

[0053] The test results are shown in Table 1.

[0054] Table 1 ISO 4892-2 Artificial Weathering (Method A) Spectral Relative Irradiance

[0055]

[0056]

[0057] It can be seen from Table 1 that, with respect to the relative irradiance of the optical filter of Example 1, 290-800nm ​​is defined as 100%, 290<λ≤320 accounts for 0.6±0.2%, 320<λ≤360 accounts for 4.2±0.5%; 360<λ≤400 accounts for 6.2±1.0%, indicating that the proportion of the 290-400nm band can be better retained, and the basic conditions of the experiment can be better met.

[0058] 3. Using standard sunlight as a reference, the spectrum share of the filter prepared in Example 1 was tested according to the test conditions specified in ASTM G155.

[0059] The test results are shown in Table 2.

[0060] Table 2 Spectral ratio of the filter obtained in Example 1

[0061]

[0062] It can be seen from Table 2 that the filter of Example 1 of the present application filters different bands to a ratio close to that of sunlight. According to the relative spectral intensity distribution of the xenon arc lamp light source, a matching filter is designed so that the ultraviolet light after passing through the filter is close to the standard solar spectrum.

[0063] Combination Figure 1 It can be concluded from Tables 1-2 that the optical filter made in Example 1 of the present application is a film layer formed by alternately stacking a high refractive index material and a low refractive index material, and the film layer thickness is within the thickness range of the present application. Without increasing the film layer thickness, it can effectively filter out the spectrum <290nm, while ensuring the proportion of each spectrum segment within 290-800nm, and the thickness of the initial stacked film layer and the thickness of the final stacked film layer are both lower than the thickness of the intermediate stacked film layer, so that the film layer that can be formed is more stable and not easily affected by the external environment and peeled off, thereby ensuring its filtering effect.

[0064] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. A filter for material light aging test, characterized in that: The substrate material comprises a substrate material having a thickness of 2 mm, a film layer is arranged on the substrate material, the film layer is formed by alternately stacking high refractive index materials and low refractive index materials, and the film system structure of the film layer is (HL) 7 , where H is a high refractive index material, L is a low refractive index material, and 7 is the number of times the high refractive index and low refractive index materials are alternately stacked together; The film has 14 layers in total, and the thicknesses of the first to fourteenth layers of the film are as follows: The thickness of the first layer is 18.08±5nm; The thickness of the second layer is 24.32±5nm; The thickness of the third layer is 90.40±5nm; The thickness of the fourth layer is 121.58±5nm; The thickness of the fifth layer is 90.4±5nm; The thickness of the sixth layer is 121.58±5nm; The thickness of the seventh layer is 90.4±5nm; The eighth layer has a thickness of 121.58±5 nm; The thickness of the ninth layer is 90.4±5nm; The thickness of the tenth layer is 121.58±5nm; The thickness of the eleventh layer is 90.4±5nm; The thickness of the twelfth layer is 121.58±5nm; The thickness of the thirteenth layer is 90.4±5nm; The thickness of the fourteenth layer is 60.79±5 nm.

2. The optical filter for material light aging test according to claim 1, characterized in that: The substrate is a quartz substrate.

3. The optical filter for material light aging test according to claim 2, characterized in that: The high refractive index material is HFO2, the low refractive index material is SiO2, and the film materials of the first to fourteenth layers of the film are HFO2, respectively. 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO2.

4. A method for plating a filter for a material light aging test according to any one of claims 1 to 3, characterized in that: The coating material is evaporated by electron gun heating; the vacuum degree reaches 3×10 -3 Pa.

5. An application of the optical filter for material light aging test according to any one of claims 1 to 3, characterized in that: A xenon arc lamp is used as the light source for the solar ultraviolet accelerated aging test. The spectral transmittance of the filter in the 250-1100nm band can meet the following requirements: The average transmittance T in the 250-270nm band is less than 2%; the average transmittance T in the 290-600nm band is 92% with a tolerance of ±3%; the average transmittance T in the 730nm band is 11% with a tolerance of ±2%; the average transmittance T in the 880nm band is 92% with a tolerance of ±2%, the average transmittance T in the 960nm band is 72% with a tolerance of ±2%. The average transmittance T in the 1100nm band is 92% with a tolerance of ±2%.

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