Double-injection-plane magnetic control injection electron gun

Abstract

The invention provides a double-injection-plane magnetic control injection electron gun. The double-injection-plane magnetic control injection electron gun comprises a focusing electrode, two strip-shaped cathodes, an anode and a magnetic field generation assembly. The focusing electrode comprises two inclined surfaces which extend in the Z-axis direction and are oppositely and obliquely arranged, the two strip-shaped cathodes are respectively arranged on the inclined surfaces of the focusing electrode in parallel, clockwise or anticlockwise rotating inclination is introduced on the inclined surfaces, and the cathodes are configured to respectively escape electrons after being heated; an electric field is formed between the anode and the two strip-shaped cathodes, so that escaped electrons are accelerated to form electron beams; the electron beam rotates under the action of the magnetic field generated by the magnetic field generation assembly so as to form two strip-shaped electron beams, and the included angle between the section, on the XY plane, of the motion trail of the two strip-shaped electron beams and the ZX plane is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of microwave and millimeter wave electric vacuum devices, and in particular to a double-injection planar magnetron injection electron gun. Background Art

[0002] The millimeter wave frequency band refers to electromagnetic waves with a frequency between 30GHz and 300GHz and a wavelength of 1mm to 10mm. Due to its unique spectral position, millimeter waves have the characteristics of wide bandwidth and short wavelength. Wide bandwidth means large information capacity, which can increase the transmission capacity in communication. At the same time, the frequency resources are also abundant, which can greatly improve the ability of electronic anti-interference. Short wavelength can improve resolution. Compared with infrared and visible light, millimeter waves have low resolution, but better transmission, are not easily affected by small particles such as dust and smoke, have all-weather characteristics, and are easier to miniaturize than microwaves. These characteristics make the related technologies have a wide range of uses in modern military, medical, instrumentation and other fields.

[0003] With the development of radar and satellite communications, the performance of traditional circular electron beam devices can no longer meet the demand and is difficult to improve. The ribbon electron beam has become the future development trend due to its high power and high frequency characteristics. At the same time, relevant studies have shown that the cyclotron electron beam can improve the gain and bandwidth of the interactive system more than the linear electron beam. Compared with the circular electron beam, the ribbon electron beam can increase the total input current, thereby improving the output power, gain and other indicators of the device.

[0004] The magnetron injection electron gun in the related technology produces a band-shaped cyclotron electron beam, which requires the use of a parallel focusing magnetic field uniformly distributed in space. However, the design and manufacture of the magnetic field configuration of the coil that produces the parallel focusing magnetic field is relatively difficult. In comparison, the cylindrical axisymmetric magnetic field produced by the superconducting coil is easier to design, calculate and manufacture. However, the cylindrical axisymmetric magnetic field produced by the superconducting coil will cause the cross-section of the electron beam in the XY plane to undergo obvious rotational distortion relative to the XZ plane. Summary of the invention

[0005] In view of this, the present disclosure provides a dual-injection planar magnetron injection electron gun, which can reduce the angle between the cross section of the motion trajectory of the two strip-shaped electron beams on the XY plane and the ZX plane.

[0006] As one aspect of the embodiments of the present disclosure, a double-injection planar magnetron injection electron gun is provided, which includes a focusing pole, two strip cathodes, an anode and a magnetic field generating assembly. The focusing pole includes two inclined planes extending in the Z-axis direction and tilted toward each other; two strip cathodes are respectively mounted on the inclined planes of the focusing pole in parallel with each other, and a clockwise or counterclockwise rotation tilt is introduced on the inclined planes, and the cathodes are configured to respectively escape electrons after being heated; an electric field is formed between the anode and the two strip cathodes to accelerate the escaped electrons to form an electron beam; the electron beam rotates under the action of the magnetic field generated by the magnetic field generating assembly to form two strip electron beams, and reduce the angle between the cross section of the motion trajectory of the two strip electron beams on the XY plane and the ZX plane.

[0007] According to an embodiment of the present disclosure, a cavity extending in the Z-axis direction is formed in the anode, and the cavity is divided into a first region, a second region, and a third region in the Z-axis direction. The magnetic field strength of the magnetic field gradually increases in the first region to adjust the electron beam; the magnetic field strength remains substantially unchanged in the second region, so that the band-shaped electron beam formed by the electron beam interacts with the electromagnetic wave; the magnetic field strength gradually decreases in the third region to collect the band-shaped electron beam that has exchanged energy with the electromagnetic wave after passing through the second region.

[0008] According to an embodiment of the present disclosure, the first region includes an electron emission region and an adiabatic compression region. The electron emission region is suitable for accommodating the focusing electrode and the two strip cathodes; the magnetic field strength of the magnetic field gradually increases in the adiabatic compression region in the traveling direction of the electrons, so as to perform adiabatic compression on the electrons in the electron beam from the electron emission region, so that the speed of the electrons in the Z-axis direction is reduced and the speed in the lateral direction is increased.

[0009] According to an embodiment of the present disclosure, the second region is an interaction region, which is suitable for allowing the band-shaped electron beam that reaches a stable state after passing through the adiabatic compression region to interact with the electromagnetic wave.

[0010] According to an embodiment of the present disclosure, in the above-mentioned interaction region, the above-mentioned magnetic field and the electric field directed toward the inside of the above-mentioned band electron beam due to the space charge effect form a Lorentz force, so that the edges of the above-mentioned band electron beam relative to each other in the XY plane are subjected to the Y-direction Lorentz force and twisted and rotated relative to the above-mentioned ZX plane; wherein the inclination direction of the two above-mentioned strip cathodes relative to the above-mentioned ZX plane is opposite to the direction of the above-mentioned twisting rotation, so as to reduce the above-mentioned angle.

[0011] According to an embodiment of the present disclosure, the above-mentioned interaction zone is provided with a resonant cavity having a wave output end; wherein, the above-mentioned electromagnetic wave is excited to generate the above-mentioned electromagnetic wave in the above-mentioned resonant cavity, and the above-mentioned electromagnetic wave interacts with the above-mentioned band electron beam in the above-mentioned resonant cavity, and the above-mentioned electromagnetic wave is amplified and output from the above-mentioned wave output end.

[0012] According to an embodiment of the present disclosure, the magnetic field generating assembly includes a superconducting coil, which is spatially spaced from the anode and arranged at the periphery of the anode, and is suitable for providing a cylindrical axisymmetric magnetic field whose axial direction is parallel to the Z-axis direction.

[0013] According to an embodiment of the present disclosure, the above-mentioned dual-injection planar magnetron injection electron gun also includes a modulation component, which is spatially isolated from the two above-mentioned strip cathodes, the above-mentioned focusing electrode and the above-mentioned anode, and is located between the two above-mentioned strip cathodes and the above-mentioned anode, and is used to adjust the speed and direction of the two above-mentioned strip electron beams.

[0014] According to an embodiment of the present disclosure, the modulation component includes two modulation anodes, which are suitable for modulating the speed and direction of the two strip-shaped electron beams respectively.

[0015] According to an embodiment of the present disclosure, the two strip cathodes are in any one of a rectangular, a racetrack, and an elliptical shape.

[0016] According to the dual-injection planar magnetron injection electron gun of the embodiment of the present disclosure, two strip cathodes are installed parallel to each other on the inclined plane of the focusing pole and tilted relative to the ZX plane and the XY plane, so that the electron beam rotates under the action of the magnetic field to form two strip electron beams, and the angle between the cross section of the motion trajectory of the two strip electron beams on the XY plane and the ZX plane is reduced, so that the strip electron beam entering the interaction zone is incident as parallel to the ZX plane as possible, thereby improving the incident quality of the strip electron beam and placing the strip electron beam in the best interaction position, thereby improving the efficiency of the injection-wave interaction with the electromagnetic wave. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The above and other objects, features and advantages of the present disclosure will become more apparent through the following description of the embodiments of the present disclosure with reference to the accompanying drawings, in which:

[0018] Figure 1 A partial cross-sectional view of an electron gun in the related art is schematically shown;

[0019] Figure 2 A partial perspective view of an electron gun in the related art is schematically shown;

[0020] Figure 3 A force analysis diagram of the motion trajectory of a strip electron beam of an electron gun in the related art on an XY plane is schematically shown;

[0021] Figure 4 A theoretical cross-sectional diagram on an XY plane is schematically shown of a motion trajectory of a strip electron beam of an electron gun in the related art;

[0022] Figure 5 A cross-sectional view schematically shows the motion trajectory of a strip electron beam of an electron gun in the related art on an XY plane;

[0023] Figure 6 A partial cross-sectional view of a double-injection planar magnetron injection electron gun according to an embodiment of the present disclosure is schematically shown;

[0024] Figure 7 A cross-sectional view of a double-injection planar magnetron injection electron gun according to an embodiment of the present disclosure is schematically shown;

[0025] Figure 8 Schematically shows Figure 7 A partial enlarged view of part A of the double-injection planar magnetron injection electron gun shown;

[0026] Fig. 9 A partial stereoscopic diagram of a double-injection planar magnetron injection electron gun according to an embodiment of the present disclosure is schematically shown;

[0027] Fig.10 A magnetic field strength curve diagram in the Z-axis direction according to an embodiment of the present disclosure is schematically shown; and

[0028] Fig.11 A cross-sectional view of the motion trajectories of two strip-shaped electron beams in an interaction region on an XY plane according to an embodiment of the present disclosure is schematically shown.

[0029] Description of reference numerals:

[0030] 1. Focusing pole;

[0031] 2. Strip cathode;

[0032] 3. Anode;

[0033] 4. The first area;

[0034] 41. Electron emission region;

[0035] 42. Adiabatic compression zone;

[0036] 5. Second area;

[0037] 6. The third area;

[0038] 7. Modulation components;

[0039] 71. Modulate the anode;

[0040] 8. Cavity;

[0041] 9. Cathode. DETAILED DESCRIPTION

[0042] In order to make the objectives, technical solutions and advantages of the present disclosure more clearly understood, the present disclosure is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings.

[0043] The terms used herein are only for describing specific embodiments and are not intended to limit the present disclosure. The terms "comprise", "include", etc. used herein indicate the existence of the features, steps, operations and / or components, but do not exclude the existence or addition of one or more other features, steps, operations or components.

[0044] All terms used herein, including technical and scientific terms, have the meanings commonly understood by those skilled in the art, unless otherwise defined. It should be noted that the terms used herein should be interpreted as having a meaning consistent with the context of this specification, and should not be interpreted in an idealized or overly rigid manner.

[0045] When using expressions such as "at least one of A, B, and C, etc.", it should generally be interpreted as the meaning of the expression generally understood by those skilled in the art. For example, "a system having at least one of A, B, and C" should include but not be limited to a system having A alone, B alone, C alone, A and B, A and C, B and C, and / or A, B, C, etc. When using expressions such as "at least one of A, B, or C, etc.", it should generally be interpreted as the meaning of the expression generally understood by those skilled in the art. For example, "a system having at least one of A, B, or C" should include but not be limited to a system having A alone, B alone, C alone, A and B, A and C, B and C, and / or A, B, C, etc.

[0046] It should also be noted that the directional terms mentioned in the embodiments, such as "upper", "lower", "front", "back", "left", "right", "X", "Y", "Z", etc., are only reference directions of the drawings and are not intended to limit the scope of protection of the present disclosure. Throughout the drawings, the same elements are represented by the same or similar reference numerals. Conventional structures or configurations will be omitted when they may cause confusion in the understanding of the present disclosure.

[0047] Figure 1 A partial cross-sectional view of an electron gun in the related art is schematically shown. Figure 2 A partial perspective view of an electron gun in the related art is schematically shown.

[0048] In the process of implementing the present disclosure, it is found that Figure 1 and Figure 2As shown, the short sides (that is, Figure 2 The straight line where the midpoints of the two sides (which are roughly located in the left and right directions in the viewing angle shown) are located is installed parallel to the XZ plane. Figure 2 As shown, the electrons in the magnetron injection electron gun are emitted from the rectangular hot cathode 9 under the combined action of high temperature and the anode. The emitted electron beam forms a spiral electron beam of cyclotron motion under the compression of the magnetic field. The electron beam produces a clustering phenomenon in the angular direction of the cyclotron motion under the relativistic effect, and enters the interaction zone with a certain transverse and longitudinal speed ratio and speed dispersion to perform injection-wave interaction. The energy carried by the electrons is transferred to the electromagnetic wave, thereby amplifying the energy of the electromagnetic wave.

[0049] Figure 3 The force analysis diagram of the motion trajectory of the strip electron beam of the electron gun in the related art on the XY plane is schematically shown. Figure 4 The figure schematically shows a theoretical cross-sectional view of the motion trajectory of a strip electron beam of an electron gun in the related art on the XY plane. Figure 5 The cross-sectional view on the XY plane schematically shows the motion trajectory of a strip-shaped electron beam of an electron gun in the related art.

[0050] like Figure 3 As shown in the figure, under the cylindrical axisymmetric magnetic field generated by the superconducting coil, the edge of the strip electron beam has an electric field E pointing to the inside of the electron beam due to the space charge effect, which causes the strip electron beam to generate a drift velocity Vd when moving in the magnetic field. A spatial drift in the E×B direction occurs on both sides, causing the strip cyclotron electron beam to twist and rotate, thus producing the following Figure 4 and Figure 5 The electron beam shown is tilted relative to the XZ plane. This will greatly affect the quality of the incident electron beam, resulting in a decrease in the interaction efficiency in the subsequent beam-wave interaction process.

[0051] Figure 6 A partial cross-sectional view of a double-injection planar magnetron injection electron gun according to an embodiment of the present disclosure is schematically shown. Figure 7 The cross-sectional view of a double-injection planar magnetron injection electron gun according to an embodiment of the present disclosure is schematically shown. Figure 8 Schematically shows Figure 7 The enlarged view of part A of the double-injection planar magnetron injection electron gun is shown. Fig. 9 A partial perspective view of a double-injection planar magnetron injection electron gun according to an embodiment of the present disclosure is schematically shown.

[0052] As one aspect of the embodiments of the present disclosure, a double-injection planar magnetron injection electron gun is provided. Figures 6 to 9As shown, the double-injection planar magnetron injection electron gun includes a focusing pole 1, two strip cathodes 2, an anode 3 and a magnetic field generating assembly. The focusing pole 1 includes two inclined planes extending in the Z-axis direction and tilted toward each other. The two strip cathodes 2 are respectively mounted on the inclined planes of the focusing pole 1 in parallel with each other, and a clockwise or counterclockwise tilt is introduced on the inclined planes. The cathodes are configured to respectively escape electrons after being heated. An electric field is formed between the anode 3 and the two strip cathodes 2 to accelerate the escaped electrons to form an electron beam. The electron beam rotates under the action of the magnetic field generated by the magnetic field generating assembly to form two strip electron beams, and reduce the angle between the cross section of the motion trajectory of the two strip electron beams on the XY plane and the ZX plane.

[0053] According to the double-injection planar magnetron injection electron gun of the embodiment of the present disclosure, two strip cathodes 2 are respectively mounted on the inclined plane of the focusing pole 1 in parallel with each other and tilted relative to both the ZX plane and the XY plane, and the short side (i.e. Fig. 9 The straight line where the midpoint of the two sides (which are roughly located in the left and right directions in the viewing angle shown) is located is equivalent to the inclination of the XY plane, so that the electron beam has a velocity component perpendicular to the Z-axis direction when it is emitted, and then the electron beam rotates under the action of the magnetic field to form two strip-shaped electron beams, and reduces the angle between the cross-section of the motion trajectory of the two strip-shaped electron beams on the XY plane and the ZX plane, so that the strip-shaped electron beam entering the interaction zone is incident as parallel to the ZX plane as possible, thereby improving the incident quality of the strip-shaped electron beam, and placing the strip-shaped electron beam in the best interaction position, thereby improving the efficiency of beam-wave interaction with electromagnetic waves.

[0054] According to the embodiment of the present disclosure, the two inclined surfaces of the focusing pole 1 that are inclined toward each other guide the electron beam to a specific direction and perform preliminary focusing.

[0055] According to the embodiments of the present disclosure, Figures 6 to 9 As shown, the double-injection planar magnetron injection electron gun further includes a modulation component 7. The modulation component 7 is spatially isolated from the two strip cathodes 2, the focusing electrode 1 and the anode 3, and is located between the two strip cathodes 2 and the anode 3, and is used to adjust the speed and direction of the two ribbon electron beams.

[0056] According to the embodiment of the present disclosure, the parameters of the two ribbon electron beams are adjusted by the modulation component 7, thereby improving the stability of the device and enabling it to maintain good performance under different working conditions.

[0057] According to the embodiments of the present disclosure, Figures 6 to 9 As shown, the modulation assembly 7 includes two modulation anodes 71, which are suitable for modulating the speed and direction of two ribbon-shaped electron beams respectively.

[0058] According to an embodiment of the present disclosure, electrons are accelerated when passing through the space between the focusing electrode and the modulation anode 71 , and the voltage of the modulation anode 71 determines the emission speed of the ribbon electron beam.

[0059] According to an embodiment of the present disclosure, the anode voltage is modulated to a certain percentage of the anode control voltage, and various parameters of the finally formed ribbon electron beam are adjusted to obtain a ribbon electron beam that meets the requirements.

[0060] According to an embodiment of the present disclosure, the shapes of the two strip cathodes 2 may be any one of a rectangular shape, a racetrack shape, and an elliptical shape.

[0061] According to the embodiment of the present disclosure, the electric field is generated by the voltage difference between the cathode 2 and the anode 3 in the double-injection planar magnetron injection electron gun, and the direction is from the anode 3 (positive electrode) to the cathode (negative electrode). The main function of the electric field is to accelerate electrons, so that the electrons move from the cathode to the anode 3 to form an electron beam.

[0062] According to an embodiment of the present disclosure, a magnetic field is generated by a magnetic field generating assembly located around a double-injection planar magnetron injection electron gun, and the direction of the magnetic field is parallel to the traveling direction of the electron beam. The magnetic field is used to control the shape and trajectory of the electron beam, and to focus or deflect the electron beam by applying a Lorentz force perpendicular to the traveling direction.

[0063] Fig.10 The figure schematically shows a magnetic field strength curve in the Z-axis direction according to an embodiment of the present disclosure.

[0064] like Fig.10 As shown, the horizontal axis represents the distance in the Z-axis direction, the horizontal axis represents the magnetic field intensity, and the position marked with "1" in the figure is the position where the strip cathode 2 is located.

[0065] According to the embodiments of the present disclosure, Figure 6 and Fig.10 As shown, a cavity 8 extending in the Z-axis direction is formed in the anode 3, and the cavity 8 is divided into a first region 4, a second region 5 and a third region 6 in the Z-axis direction. The magnetic field strength of the magnetic field gradually increases in the first region 4 to adjust the electron beam. The magnetic field strength remains approximately constant in the second region 5, so that the band-shaped electron beam formed by the electron beam interacts with the electromagnetic wave. The magnetic field strength gradually decreases in the third region 6 to collect the band-shaped electron beam that has exchanged energy with the electromagnetic wave after passing through the second region 5.

[0066] According to the embodiment of the present disclosure, the magnetic field strength of the first region 4 is gradually increased, and the speed of the electron beam can be adjusted to adiabatically compress the electron beam in the first region 4 to form a band-shaped electron beam with a certain transverse and longitudinal speed ratio and speed dispersion.

[0067] According to the embodiment of the present disclosure, the magnetic field strength of the second region 5 remains substantially unchanged, so that the band-shaped electron beam formed in the first region 4 can reach the interaction region in a stable state, thereby ensuring the stability of the beam-wave interaction.

[0068] According to the embodiment of the present disclosure, the magnetic field strength of the third region 6 gradually decreases, the electron beam diverges, and under the action of the collecting electrode, the band-shaped electron beam that has exchanged energy with the electromagnetic wave after passing through the second region 5 is intercepted and recovered by the tube wall.

[0069] According to the embodiments of the present disclosure, Figure 6 As shown, the first region 4 includes an electron emission region 41 and an adiabatic compression region 42. The electron emission region 41 is suitable for accommodating a focusing electrode 1, two modulation anodes 7 (to be described in detail later) and two strip cathodes 2. The magnetic field strength of the magnetic field gradually increases in the adiabatic compression region 42 in the traveling direction of the electrons, so as to adiabatically compress the electrons in the electron beam from the electron emission region 41, so that the speed of the electrons in the Z-axis direction is reduced and the speed in the transverse direction (that is, the X-axis direction) is increased.

[0070] According to an embodiment of the present disclosure, the electrons in the electron beam are adiabatically compressed by a magnetic field in the adiabatic compression zone 42, so that the speed of the electrons in the Z-axis direction is reduced, the speed in the lateral direction (that is, the X-axis direction) is increased, and the cyclotron radius of the electrons is reduced to adjust the motion parameters and spatial distribution of the electron beam.

[0071] According to the embodiments of the present disclosure, Figure 6 As shown, the second region 5 is an interaction region, which is suitable for allowing the band electron beam that reaches a stable state after adiabatic compression to interact with the electromagnetic wave.

[0072] According to the embodiment of the present disclosure, in the interaction region, the magnetic field and the electric field directed to the inside of the strip electron beam due to the space charge effect form a Lorentz force, so that the edges of the strip electron beam opposite to each other in the XY plane are subjected to the Lorentz force in the Y direction and twist and rotate relative to the ZX plane. Wherein, the inclination direction of the two strip cathodes 2 relative to the ZX plane is opposite to the direction of twist and rotation, so as to reduce the angle between the cross section of the motion trajectory of the two strip electron beams on the XY plane and the ZX plane, so that the cross section of the motion trajectory of the two strip electron beams on the XY plane is as parallel to the ZX plane as possible.

[0073] According to an embodiment of the present disclosure, electrons are ejected from the cathode at an inclined surface, and the cathode has an inclination angle with the ZX plane. When the electrons are ejected under the action of the electric field, there are speeds parallel to the Z-axis direction and speeds perpendicular to the Z-axis direction, so that the electrons appear in a spiral forward motion state. In the process of the electrons moving forward, they are affected by the Lorentz force formed by the Z-direction magnetic field and the electric field pointing to the inside of the electron beam, so that the electrons are twisted and rotated by the Lorentz force in the Y direction. The strip cathode 2 is tilted in the opposite direction of the twisting rotation, thereby offsetting the twisting rotation generated in this way, so that the strip electron beam is as parallel to the ZX plane as possible when it reaches the interaction area.

[0074] According to the embodiments of the present disclosure, before entering the interaction zone, as the magnetic field increases, the electron beam gradually reaches a stable state under the action of adiabatic compression, and finally enters the interaction zone in a stable state, so the inclination angle in the interaction zone remains basically unchanged. After passing the interaction zone, the magnetic field decreases, the band-shaped electron beam diverges, and the inclination angle continues to increase.

[0075] According to the embodiments of the present disclosure, electrons are emitted from the strip hot cathode under the combined action of high temperature and the anode 3, and the emitted electron beam undergoes an adiabatic compression process to produce a planar cyclotron band electron beam. At the same time, the strip cathode 2 is arranged on the inclined plane of the focusing pole 1 and tilted relative to the ZX plane, that is, the strip cathode 2 rotates clockwise or counterclockwise around the center of the strip cathode 2 on the inclined plane of the focusing pole, and tilts, so that the inclination angle of the strip cathode 2 offsets the rotational distortion generated by the band electron beam in the cylindrical axisymmetric magnetic field, thereby reducing the rotation angle of the band electron beam in the ZX plane caused by the axisymmetric focusing magnetic field, and then a high-quality band electron beam is generated to enter the beam-wave interaction region.

[0076] According to an embodiment of the present disclosure, the interaction region is provided with a resonant cavity having a wave output end, wherein electromagnetic waves are generated by excitation in the resonant cavity, and the electromagnetic waves interact with the band electron beam in the resonant cavity, and the electromagnetic waves are amplified and output from the wave output end.

[0077] According to an embodiment of the present disclosure, the magnetic field generating assembly includes a superconducting coil. The superconducting coil is spatially spaced from the anode 3 and arranged at the periphery of the anode 3, and is suitable for providing a cylindrical axisymmetric magnetic field whose axial direction is parallel to the Z-axis direction.

[0078] According to the embodiment of the present disclosure, the electron beam emitted by the strip cathode 2 forms a spiral electron beam of cyclotron motion under the compression of the magnetic field, and the electron beam entering the interaction region generates a clustering phenomenon in the angular direction of the cyclotron motion under the relativistic effect, and performs a beam-wave interaction in the high-frequency system, so that the energy carried by the electron is transferred to the electromagnetic wave, and the energy of the electromagnetic wave is amplified. Compared with the traditional planar magnetron injection electron gun, the double-injection planar magnetron injection electron gun with a cathode that is tilted and rotates clockwise or counterclockwise on the inclined plane of the focusing pole can adapt to the cylindrical axisymmetric magnetic field generated by the superconducting coil, and form parallel double electron beams in a certain area of ​​the cylindrical axisymmetric magnetic field, without specially designing and manufacturing a more complex rectangular magnetic field coil.

[0079] Fig.11 A cross-sectional view of the motion trajectories of two strip-shaped electron beams in an interaction region on an XY plane according to an embodiment of the present disclosure is schematically shown.

[0080] In an exemplary embodiment, the anode voltage is 60 kV, the modulated anode voltage is 15 kV, the cathode voltage is 0 V, the current is 5 A, and the cathode emission surface tilt angle is 9°. The cross-sectional diagram of the motion trajectories of the two strip electron beams in the interaction region on the XY plane is obtained through simulation software simulation. Fig.11 As shown. Fig.11 As shown, placing an inclined cathode relative to the ZX plane can effectively reduce the rotation angle of the band electron beam in the interaction region relative to the ZX plane.

[0081] The embodiments of the present disclosure are described above. However, these embodiments are only for illustrative purposes and are not intended to limit the scope of the present disclosure. Although the embodiments are described above separately, this does not mean that the measures in the various embodiments cannot be used in combination to advantage. The scope of the present disclosure is defined by the attached claims and their equivalents. Without departing from the scope of the present disclosure, those skilled in the art may make a variety of substitutions and modifications, which should all fall within the scope of the present disclosure.

Claims

1. A double-injection planar magnetron injection electron gun, characterized in that: include: A focusing pole, comprising two inclined surfaces extending in the Z-axis direction and arranged to be inclined toward each other; Two strip cathodes are respectively mounted parallel to each other on the inclined surface of the focusing electrode, and a clockwise or counterclockwise tilt is introduced on the inclined surface, and the cathodes are configured to respectively emit electrons after being heated; an anode, forming an electric field with the two strip cathodes to accelerate the escaped electrons to form an electron beam; as well as A magnetic field generating component, wherein the electron beam rotates under the action of the magnetic field generated by the magnetic field generating component to form two strip-shaped electron beams and reduce the angle between the cross section of the motion trajectory of the two strip-shaped electron beams on the XY plane and the ZX plane.

2. The double-injection planar magnetron injection electron gun according to claim 1, characterized in that: A cavity extending in the Z-axis direction is formed in the anode, and the cavity is divided into: a first region, wherein the magnetic field strength of the magnetic field gradually increases in the first region to adjust the electron beam; a second region, wherein the magnetic field strength remains substantially constant in the second region, so that the band-shaped electron beam formed by the electron beam interacts with the electromagnetic wave; as well as In the third region, the magnetic field strength gradually decreases in the third region, so as to collect the band-shaped electron beams that have exchanged energy with the electromagnetic waves after passing through the second region.

3. The double-injection planar magnetron injection electron gun according to claim 2, characterized in that: The first area includes: an electron emission region, adapted to accommodate the focusing electrode and the two strip cathodes; and An adiabatic compression zone, wherein the magnetic field strength of the magnetic field gradually increases in the traveling direction of the electrons in the adiabatic compression zone, so as to perform an adiabatic compression effect on the electrons in the electron beam from the electron emission zone, thereby reducing the speed of the electrons in the Z-axis direction and increasing the speed in the lateral direction.

4. The double-injection planar magnetron injection electron gun according to claim 2, characterized in that: The second area is The interaction zone is suitable for allowing the band-shaped electron beam that reaches a stable state after passing through the adiabatic compression zone to interact with the electromagnetic wave.

5. The double-injection planar magnetron injection electron gun according to claim 4, characterized in that: In the interaction region, the magnetic field and the electric field directed toward the inside of the strip electron beam due to the space charge effect form a Lorentz force, so that the edges of the strip electron beam opposite to each other in the XY plane are subjected to the Y-direction Lorentz force and twist and rotate relative to the ZX plane; Wherein, the inclination direction of the two strip cathodes relative to the ZX plane is opposite to the twisting rotation direction, so as to reduce the angle.

6. The double-injection planar magnetron injection electron gun according to claim 4, characterized in that: The interaction zone is provided with a resonant cavity having a wave output end; The electromagnetic wave is generated by excitation in the resonant cavity, and the electromagnetic wave interacts with the band electron beam in the resonant cavity, and the electromagnetic wave is amplified and then output from the wave output end.

7. The double-injection planar magnetron injection electron gun according to any one of claims 1 to 6, characterized in that: The magnetic field generating assembly comprises: The superconducting coil is spatially spaced from the anode and arranged at the periphery of the anode, and is suitable for providing a cylindrical axisymmetric magnetic field whose axial direction is parallel to the Z-axis direction.

8. The double-injection planar magnetron injection electron gun according to claim 1, characterized in that: Also includes: The modulation component is spatially isolated from the two strip cathodes, the focusing electrode and the anode, and is located between the two strip cathodes and the anode, and is used for adjusting the speed and direction of the two beams of the ribbon electron beams.

9. The double-injection planar magnetron injection electron gun according to claim 8, characterized in that: The modulation component comprises two modulation anodes, which are suitable for respectively modulating the speed and direction of the two strip-shaped electron beams.

10. The double-injection planar magnetron injection electron gun according to any one of claims 1 to 6, characterized in that: The two strip cathodes may be in any one of a rectangular, a racetrack, and an elliptical shape.

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