362 results about "Electron acceleration" patented technology

An ultraviolet emitter display apparatus and method for making the display is disclosed. The device includes a substrate layer, a pixel electronics layer positioned above the substrate layer, the pixel electronics layer including electronics to drive the ultraviolet emission display. Ultraviolet (UV) emitters may be located above the pixel electronics layer, where the UV emitters may comprise a layer of UV light emitting diodes (LEDs) or a combination of an electron acceleration layer and a UV emission layer. The design further includes a phosphor layer comprising a plurality of phosphor elements, either white phosphor elements in combination with color filters or color phosphor elements.

Method and system for producing a neutral beam source is described. The neutral beam source comprises a plasma generation system for forming a first plasma in a first plasma region, a plasma heating system for heating electrons from the first plasma region in a second plasma region to form a second plasma, and a neutralizer grid for neutralizing ion species from the second plasma in the second plasma region. Furthermore, the neutral beam source comprises an electron acceleration member configured to accelerate the electrons from the first plasma region into the second plasma region. Further yet, the neutral beam source comprises a pumping system that enables use of the neutral beam source for semiconductor processing applications, such as etching processes.

The present invention provides a III-nitride compound semiconductor light emitting device comprising an active layer (30) which emits light and is interposed between a lower contact layer (20) made of n-GaN and an upper contact layer (40) made of p-GaN, in which a sequential stack of a lattice mismatch-reducing layer L3 made of In_xGa_1-xN, an electron supply layer L4 made of n-GaN or n-Al_yGa_1-yN and a crystal restoration layer L5 made of In_zGa_1-zN is interposed between the lower contact layer and the active layer, and further comprising an electron acceleration layer L1 made of n-GaN or undoped GaN and a heterojunction electron barrier-removing layer L2, thereby the lattice mismatch between the lower contact layer (20) and the active layer (30) can be reduced.

The invention relates to a pulse electronic accelerator nano-pico ampere electron beam flow measuring system, relating to an electronic accelerator pulse electron beam flow measuring system, in particular to the nano-pico (10-10A/cm2) micro beam flow measurement of millisecond pulse, belonging to the electron radiation environment ground simulation and test field. The pulse electronic accelerator nano-pico ampere electron beam flow measuring system is composed of a novel inclined-bottom faraday cup, three coaxial cables and a nano-pico level current amplifier. The measurement result can be obtained by oscilloscope or data acquisition card. The inclined-bottom faraday cup electron collection system resolves the collection efficiency problem of high energy electrons (MeV), to improve collection efficiency. The adopted three coaxial cables can reduce the interference of electromagnetic field. The nano-pico ampere level current amplifier resolves the stable current linear amplification problem under electron radiation, and converts weak current signals to voltage signals, thus being convenient for data acquisition of oscilloscope or data acquisition card. The invention resolves the measurement problem of nano-pico ampere pulse electron beam flow, to confirm the accuracy, real-time property and easy use of measurement.

A heat exchanger (1) includes: a heat sink (3) which is in contact with a heating element (2); and an electron emitting element (4) which is provided so as to be separated from the heat sink (3) by a space and which provides electrons to the heat sink (3) via air in the space. The electron emitting element (4) includes: an electrode substrate (7); a thin-film electrode (9); a power supply (10) which applies a voltage between the electrode substrate (7) and the thin-film electrode (8); and an electron acceleration layer (8) which accelerates the electrons inside itself in response to the voltage applied by the power supply (10) so that the electrons are emitted from the thin-film electrode (9). The electron acceleration layer (8) is made at least partially of an insulating material. As a result, the heat exchanger (1) has a heat exchange capability which can be maintained and improved independently of a structure in which electric field concentration tends to occur.

A system for delivery of low-pressure dopant gas to a high-voltage ion source in the doping of semiconductor substrates, in which undesired ionization of the gas is suppressed prior to entry into the high-voltage ion source, by modulating electron energy upstream of the high-voltage ion source so that electron acceleration effects are reduced to below a level supporting an electronic ionization cascade. The gas delivery system in a specific application includes a gas flow passage, a voltage generator electrically coupled with at least a portion of the gas flow passage to impose an electric field thereon, and an obstructive structure that is deployed to modulate acceleration length of electrons of the low-pressure gas in relation to ionization potential of the gas, to suppress ionization in the gas flow passage.

An electron emitting element includes an electrode substrate, a thin-film electrode, and an electron acceleration layer provided between them. The electron acceleration layer includes a fine particle layer containing insulating fine particles, which is provided on a side of the electrode substrate, and a deposition of conductive fine particles, which is provided on a surface of the fine particle layer. In the electron acceleration layer, a conductive path is formed in advance, and the deposition has a physical recess which is an exit of the conductive path and which serves as an electron emitting section. Electrons are emitted via the electron emitting section. With the arrangement, it is possible to realize an electron emitting element which prevents that an electrode on an electron emission side gradually wears off along with electron emission and which can maintain an electron emission characteristic for a long period.

The present invention provides an electron emitting element which has good energy efficiency and which is capable of controlling a value of current flowing in an electron acceleration layer and an amount of emitted electrons by adjusting a resistance value of the electron acceleration layer and an amount of generated ballistic electrons. An electron emitting element 1 includes an electron acceleration layer 4 including a fine particle layer containing insulating fine particles. In the electron emitting element 1,

An electron emitting element of the present invention includes an electron acceleration layer provided between an electrode substrate and a thin-film electrode, which electron acceleration layer includes (a) conductive fine particles and (b) insulating fine particles having an average particle diameter greater than that of the conductive fine particles. The electron emitting element satisfies the following relational expression: 0.3x+3.9≦y≦75, where x (nm) is an average particle diameter of the insulating fine particles, and y (nm) is a thickness of the thin-film electrode 3.

Such a configuration allows modification of the thickness of the thin-film electrode with respect to the size of the insulating particles, thereby ensuring electrical conduction and allowing sufficient current to flow inside the element. As a result, stable emission of ballistic electrons from the thin-film electrode is possible.

This invention provides one electron line speeder with multiple gear energy adjusting, which comprises electron gun, speeding structure, microwave power source, isolator and magnetic exciting power, wherein, the speeding structure has two parts separately connected to power align machine through isolator and to get micro wave power from microwave power source; the two sections of speeding structure are connected by magnetic iron in certain microwave phase; through changing magnetic iron sensor intensity to change electron beam track length.

The invention relates to a beam transmission and conversion technology, and discloses a method for producing partially coherent Airy beams. The method comprises the following steps that: a laser device emits a fully coherent gauss beam, and a convex lens and a rotary frosted glass sheet regulate the coherence of the gauss beam to get a partially coherent gauss beam; and after being collimated by a second convex lens, the partially coherent gauss beam is subjected to beam intensity distribution shaping by a gauss amplitude filter, a spatial light modulator to which a phase information graph is loaded modulates the phase of the partially coherent gauss beam, and a first-stage diffracted beam is captured through a circular aperture diaphragm, thus obtaining the partially coherent Airy beam. The method produces the partially coherent Airy beam by directly using the gauss beam, and is scientific in principle and easy to realize; and the device for implementing the method is simple in structure, easy to regulate, excellent in stability and low in production cost. The beam provided by the method can be practically used in the fields of optical particle cleaning, biomedical therapy, particulate trapping, electron acceleration, and the like.

The invention relates to a system and method for in-situ testing of internal electric charge and electric field distribution of a dielectric material and belongs to the field of measurement. The system comprises a vacuum tank, a top electrode, a solenoid valve, a vacuum-pumping system, a direct-current high-voltage power supply, a testing signal line, an industrial personal computer, an oscilloscope, a shielding flange, a high-voltage nanosecond pulse generator, a space charge detector main machine and an electron accelerator. The method comprises the steps of enabling high-energy electrons to pass through electrode holes to be filled onto the surface of a sample through the electron accelerator, recording tested wave forms through the oscilloscope and the industrial personal computer, and performing data processing to calibrated wave forms recorded by the industrial personal computer and tested wave forms to obtain the electric charge distribution in the sample. The system and the method can perform in-situ monitoring to the internal electric charge and the electric field distribution produced by produced by a space high-energy electron jetting-in space material simulated on the ground. Errors caused by measurement of the sample subjected to irradiation are avoided, and a test signal is not interfered.

An electron accelerator that generates a photon beam with an energy of more than 0.5 MeV by means of an electron beam charging a target has a vacuum chamber with an intake opening and an exit opening, and an electron source at the input side. The target is arranged outside the vacuum chamber in the region of the exit opening in a housing in which a window is present that is permeable to photons and that is arranged opposite the exit opening in the beam direction of the electron beam. The target is permeated by at least one cooling channel.

The invention relates to a thin-wall crosslink low smoke cable for ships communication or control signal and a preparation method thereof. The cable structure is that the outer layer of a multi-strandconductor is an insulating layer, the outer layer of the insulating layer is a shielding layer, the outer layer of the shielding layer is a lapped covering, the outer layer of the lapped covering isarmor, and the outer layer of the armor is a sheathed layer. The preparation method is as follows: a line-cable stranding machine strands tin plated copper wire as a conductor; an extruder is utilizedto manufacture the insulating layer outside the conductor, the insulating layer is subjected to irradiation and crosslinking by an electron accelerator; a cable former is ustilized to strand insulated wires together; the shielding layer and the armor are braided by utilizing a braiding machine; and the sheathed layer is manufactured by the extruder, and the sheathed layer is subjected to irradiation and crosslinking by the electron accelerator. The thin-wall crosslink low smoke cable has the advantages of small outside diameter, light weight, ageing resistance, tear resistance, heat oil resistance, high flame retardancy, low smoke, no halogen, low toxicity and good ability of keeping excellent electrical performance and mechanical property in hostile environment, wherein the weight of thethin-wall crosslink low smoke cable is 30%-45% lighter than that of common cables.

The invention provides measuring equipment of an electron accelerator output beam parameter. The measuring equipment comprises: an electron absorption board (8) and a plurality of electron absorption rods (7), wherein the each electron absorption rod is insulated with other components. The electron absorption rods possess a same rectangular section which is parallel to the electron absorption board. A length direction is parallel to the width direction of an accelerator scanning output window (11). Side surfaces with the same width of the electron absorption rods are vertical to an electron ray direction which is located in a position of the electron absorption rods. The electron absorption board and each electron absorption rod are connected to a current measurement device through leads respectively. Compared to the prior art, by using the measuring equipment of the invention, the electron beam energy measurement is integrated with the scanning uniformity measurement. Therefore, amounts of the accelerator output beam, a spectral distribution situation, the scanning uniformity can be simultaneously determined. The equipment and the apparatus needed by electron beam output parameter measurement can be simplified. In the prior art, the different apparatuses are needed by the electron beam energy measurement and the electron beam scanning uniformity measurement. By using the measuring equipment of the invention, the above problem can be solved.

An electron radiation apparatus is provided. The electron radiation apparatus includes a beat-wave laser system generating a laser beat wave, an electron emitter emitting a density-modulated electron current induced by the laser beat wave, an electron accelerator accelerating the density-modulated electron current and generating a periodically bunched electron beam, and a radiation device receiving the periodically bunched electron beam and generating an electron radiation with a radiation frequency matched to one of the harmonics of the bunching frequency of the periodically bunched electron beam.

The invention discloses a device for treating waste water by an electron beam irradiation method, which comprises a waste water collecting pool, an irradiation preparing pool, an irradiation treating pool, and a clear water pool which are communicated by water conveying pipes orderly; an electron accelerator is disposed right above the irradiation treating pool; each water conveying pipe is equipped with a water pump; a sinking-mode irradiation flowing water trough is disposed in the center of a pool cover of the irradiation treating pool; uniformly-arranged flowing water trough water inlets are disposed at the bottom surface of the irradiation flowing water trough; waste water to be treated spews upwards and flows into the irradiation flowing water trough from the flowing water trough water inlets; water-distributing pipelines are disposed below the irradiation flowing water trough; flowing water trough water outlets are uniformly arranged at the trough bottom of the irradiation treating pool; the flowing water trough water outlets are communicated with the irradiation treating pool; switch valves are mounted on the flowing water trough water outlets; when the switch valves are open, water treated by the electron beam irradiation method flows into the irradiation treating pool. The invention has high treatment efficiency for industrial organic waste water, can effectively solve the problem of industrial water pollution, has a simple structure, is safe and reliable, and has low treatment cost.

The invention discloses a method for handling high current pulsed electron beams (HCPEB) on the surface of a hard alloy cutter, belonging to the technical field of handling the surfaces of materials. The method is characterized by comprising the following steps: cleaning the surface of the hard alloy cutter, fixing the hard alloy cutter on a worktable, and vacuumizing to a pre-working value. According to modification requirements of a cutter to be handled, the working parameters of the HCPEB (High Current Pulsed Electron Beam) is selected and include electron accelerating voltage, pulse lasting time, energy density, pulse interval time, handling times and the like. Finally, the HCPEB is operated to carry out processing and handling on the parts needed to be handled on the surface of the hard alloy cutter. After handling is finished, the vacuum exhaust is carried out to take out the cutter. The method has the beneficial effects of improving the surface performance and the service life of the hard alloy cutter, overcoming the problems of complicated process, poor binding force of a coating and a substrate, high cost and the like existing in the prior art, and being simple in handling process and stable for quality control. The handled surface tissues of the cutter are uniform and refined, and the modified layer is deep.