Cleaning brush for semiconductor manufacturing process

Abstract

A cleaning brush for a semiconductor manufacturing process is provided. The cleaning brush includes a core and a brush member. The core includes a circumferential portion and a closed end portion. The circumferential portion surrounds an axis of rotation of the cleaning brush and defines an inlet opening for receiving a fluid. The closed end portion is connected to an end of the circumferential portion opposite the inlet opening along the axis of rotation. At least one elongate conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels therethrough in fluid communication with the elongate conduit, the outlet channels inclined outwardly toward the closed end portion. The brush member is connected to an outer surface of the circumferential portion and covers all of the outlet channels.

Description

Technical Field

[0001] The present disclosure generally relates to a cleaning brush for removing residues from a semiconductor substrate in a semiconductor manufacturing process. In particular, the present disclosure relates to a cleaning brush in a post-CMP cleaning process. Background Art

[0002] Integrated circuits can be formed on semiconductor substrates, specifically silicon wafers, by sequentially depositing conductive, semiconductive, and insulating layers on the wafer. Circuitry features can be etched after each layer is deposited. After depositing and etching a series of layers, the topmost surface of the substrate becomes increasingly non-planar. The non-planar surface can cause problems in the photolithography step of the integrated circuit manufacturing process.

[0003] In order to remove and / or polish specific surfaces of microelectronic device wafers, a chemical mechanical polishing (CMP) process, also known as chemical mechanical planarization, is performed on semiconductor substrates. The CMP process refers to a method of removing solid layers by chemical mechanical polishing performed for surface planarization and defining metal interconnect patterns. In a typical CMP operation, a rotating polishing pad that receives a chemically active slurry is used to polish the outermost surface of the substrate. The substrate is positioned on the polishing pad and held in place by a retaining ring. The substrate and retaining ring are typically mounted on a carrier or polishing head. A controlled force is applied to the substrate by the carrier head to hold the substrate against the polishing pad. Moving the polishing pad across the surface of the substrate causes chemical and mechanical removal of material from the surface of the substrate.

[0004] After polishing, contaminants including slurry particles, organic residues and / or metallic impurities may be present on the wafer surface and must be removed. If not removed, such contaminants may lead to various defects (e.g., scratches, corrosion pits, etc.) in subsequent processing steps, thereby causing a reduction in the product yield of the integrated circuit. Therefore, there is a need for a system and method for effectively removing contaminants from a semiconductor substrate after a CMP process that solves the above problems. Summary of the invention

[0005] Briefly, the present disclosure provides a cleaning brush comprising a core and a brush member. The core comprises: a circumferential portion that surrounds the rotation axis of the cleaning brush and defines an inlet opening for receiving a fluid; and a closed end portion that is connected to the end of the circumferential portion opposite to the inlet opening along the rotation axis. At least one elongated conduit is defined within the core and is in fluid communication with the inlet opening, and the circumferential portion comprises a plurality of outlet channels passing therethrough to be in fluid communication with the elongated conduit, the outlet channels being inclined outwardly toward the closed end portion. The brush member is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels.

[0006] In another aspect, the present disclosure provides a cleaning brush comprising a core and a brush member. The core comprises: a circumferential portion which surrounds the rotation axis of the cleaning brush and defines an inlet opening for receiving a fluid; and a closed end portion which is connected to the end of the circumferential portion opposite to the inlet opening along the rotation axis. At least one elongated conduit is defined within the core and is in fluid communication with the inlet opening, and the circumferential portion comprises a plurality of outlet channels passing therethrough to be in fluid communication with the elongated conduit. In addition, the first zone, the second zone, and the third zone of the core are defined sequentially along a direction from the inlet opening to the closed end portion, and the total flow rate (per unit length of the core) of the elongated conduits and the outlet channels within the respective first zone, the second zone, and the third zone gradually decreases. The brush member is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels.

[0007] In yet another aspect, the present disclosure provides a CMP (chemical mechanical planarization) apparatus comprising a CMP module and a post-CMP cleaning module. The CMP module is configured to perform a CMP process on a semiconductor wafer. The post-CMP cleaning module is positioned downstream of the CMP module and comprises a core and a brush material surrounding the core and is configured to perform a cleaning process on the semiconductor wafer. An inlet opening, an elongated conduit, and a plurality of outlet channels are arranged in the core to guide a liquid flowing into the core through the inlet opening to pass through the elongated conduit and the outlet channel to the brush material. At least the following three parameters of the first and second of the outlet channels spaced at different distances from the inlet opening are different to exhibit a preferential flow distribution or a target flow distribution of the liquid in the core: (a) a width of the outlet channel; (b) a cross-sectional shape of the outlet channel; and (c) an inclination angle of the outlet channel relative to the length direction of the core. BRIEF DESCRIPTION OF THE DRAWINGS

[0008] In the following detailed description, embodiments are described for illustrative purposes only, as various changes and modifications will become apparent to those skilled in the art from the following detailed description. The same reference numbers used in different figures indicate similar or identical items.

[0009] Figure 1 is a front perspective view of a post-CMP cleaning module according to at least one example embodiment.

[0010] Figure 2 is a right side perspective view of a post-CMP cleaning module according to at least one example embodiment.

[0011] Figure 3 is a longitudinal perspective cross-sectional view of a cleaning brush according to a first exemplary embodiment.

[0012] Figure 4When the brush parts cover the outer surface of the core Figure 3 Magnified view of area M1.

[0013] Figure 4A is along Figure 3 A transverse perspective cross-sectional view of the outlet passage taken along line 4A.

[0014] Figure 4B is along Figure 3 A transverse perspective cross-sectional view of the outlet passage taken along line 4B.

[0015] Figure 4C is along Figure 3 A transverse perspective cross-sectional view of the outlet passage taken along line 4C.

[0016] Figure 4D is along Figure 3 Line 4D is a transverse perspective cross-sectional view of the outlet channel.

[0017] Figure 4E Variations of the configuration of the outlet channels of the core are shown according to some embodiments.

[0018] Figure 5 yes Figure 3 Simulation results of the hydraulic pressure distribution in the core.

[0019] Figure 6 is a longitudinal perspective cross-sectional view of a core according to a second exemplary embodiment.

[0020] Figure 7 is along Figure 6 A transverse perspective cross-sectional view of the core taken along line AA.

[0021] Figure 8 is along Figure 6 A transverse perspective cross-sectional view of the core taken along line BB.

[0022] Fig. 9 is along Figure 6 A transverse perspective cross-sectional view of the core taken along line CC.

[0023] Fig.10 is a longitudinal perspective cross-sectional view of a core according to a third exemplary embodiment.

[0024] Fig.11 When the brush parts cover the outer surface of the core Fig.10 Magnified view of area M2.

[0025] Fig.12 illustrate Figure 3 , 6 10 and 11 are simulation results of the outlet flow rates along the length direction of the core of the first, second and third exemplary embodiments.

[0026] Fig.13 is a longitudinal perspective cross-sectional view of a core according to a fourth exemplary embodiment.

[0027] Fig.14 is a longitudinal perspective cross-sectional view of a core according to a fifth exemplary embodiment.

[0028] Fig.15 is a block diagram of a CMP module and a processing tool for another semiconductor process following a CMP process, according to some embodiments. DETAILED DESCRIPTION

[0029] In the following detailed description, reference is made to the accompanying drawings that form part of the description. In the drawings, similar symbols generally identify similar components unless the context indicates otherwise. In addition, unless otherwise stated, the description of each consecutive figure may refer to the features from one or more of the previous figures to provide a clearer background and more substantial explanation of the current exemplary embodiment. In addition, the exemplary embodiments described in the "Specific Implementation", the drawings and the claims do not wish to limit. Other embodiments may be utilized and other changes may be made without departing from the spirit or scope of the objectives presented herein. It should be readily understood that the aspects of the present disclosure generally described herein and illustrated in the drawings may be arranged, substituted, combined, separated and designed in various different configurations, all of which are clearly within the scope of consideration herein.

[0030] For ease of description, spatially relative terms such as "below," "beneath," "below," "above," "over," "on," and the like may be used herein to describe the relationship of one element or feature to another element or feature as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may be interpreted accordingly.

[0031] As used herein, terms such as "first", "second", and "third" describe various elements, components, regions, layers, and / or sections, which should not be limited by these terms. These terms may be used only to distinguish elements, components, regions, layers, or sections from one another. Unless the context clearly indicates, terms such as "first", "second", and "third" used herein do not imply a sequence or order.

[0032] As used herein, the terms "approximately," "substantially," "substantially," and "about" are used to describe and illustrate small variations. When used in conjunction with an event or context, the terms may refer to instances where the event or context occurred exactly as well as instances where the event or context occurred approximately.

[0033] Embodiments of the present disclosure provide a brush design with improved performance, including consistent and uniform fluid distribution across the entire length of the brush. This uniform fluid distribution results in consistent and reduced cleaning time and improved and uniform cleaning performance of the brush itself or the substrate being cleaned by the brush, compared to a brush having uniformly spaced discharge outlets extending perpendicularly relative to the axis of rotation.

[0034] In one exemplary embodiment, the brush of the present invention is used in a CMP (chemical mechanical planarization) system to remove contaminants, such as slurry particles, organic residues, and / or metal impurities, that adhere to the substrate during the CMP process. However, it should be understood that the present disclosure is not limited to CMP systems, and the brushes of various embodiments disclosed herein are applicable to other substrate processing tools in the field of semiconductor manufacturing. For example, the brush can be used to clean semiconductor wafers after a chemical etching process, an epitaxial growth process, etc.

[0035] According to at least one exemplary embodiment, Figure 1 is a front perspective view of the post-CMP cleaning module 1, and Figure 2 is a right perspective view of the post-CMP cleaning module 1. According to some embodiments of the present disclosure, the post-CMP cleaning module 1 includes a pair of cleaning brushes 10 and a plurality of rollers 3. The two cleaning brushes 10 are configured to clean the top and bottom surfaces of the semiconductor wafer 5. The rollers 3 are configured to abut against the edge of the semiconductor wafer 5 and rotate the semiconductor wafer 5 in a vertical direction. During the cleaning process, the two cleaning brushes 10 are driven to rotate around the rotation axes R1 and R2, and a predetermined external force is applied to the cleaning brushes 10 so that the surface of the cleaning brushes 10 is in close contact with the surface of the semiconductor wafer 5. At the same time, the rollers 3 can rotate around the rotation axis R3 to drive the semiconductor wafer 5 to rotate.

[0036] In some embodiments, Figure 1 As shown in FIG. 1 , the cleaning brush 10 includes a core 20 and a brush member 40. Figure 2 , the brush member 40 surrounds the core 20 and includes a plurality of nodules 41 arranged along the entire length of the brush member 40. The length L0 of the brush member 40 may be greater than the diameter W0 of the semiconductor wafer 5, and the brush member 40 may be positioned across the semiconductor wafer 5 during the cleaning process so that both the central portion of the semiconductor wafer 5 and the peripheral portion of the semiconductor wafer 5 are cleaned with the nodules 41 of the brush member 40. However, it should be understood that many variations and modifications may be made to the embodiments of the present disclosure. In some other embodiments, the length of the brush member 40 is less than the diameter W0 of the semiconductor wafer 5, and a plurality of brush members 40 are used to clean the top and bottom surfaces of the semiconductor wafer 5.

[0037] In some embodiments, Figure 2, the post-CMP cleaning module 1 further includes a liquid tank 2 and a liquid line 4. A cleaning liquid 6 (e.g., surfactant and / or deionized water) is supplied from the liquid source 2 to the inlet port 29 of the cleaning brush 10 via the liquid line 4. The cleaning liquid 2 flows along the core 20 and passes through a plurality of holes (as shown in FIG. Figure 3 and 4 Detailed description) is evenly distributed on the entire surface of the semiconductor wafer 5, such as by Figure 1 As indicated by the arrow 6 shown in FIG.

[0038] Hereinafter, a detailed structure of the core 20 of the cleaning brush 1 according to an exemplary embodiment will be described.

[0039] Figure 3 1 is a longitudinal perspective cross-sectional view of a cleaning brush 1 according to a first exemplary embodiment. For description, Figure 3 4. The brush member 40 of the cleaning brush 1 is not shown in FIG. In one illustrative embodiment, the core 20 has a first end 21 and a second end 22 opposite to the first end 21 along the longitudinal direction L of the core 20. The core 20 includes a circumferential portion 23 forming a hollow cylindrical shape around the rotation axis R1 of the core 20. The elongated conduit 26 is defined by an inner surface 231 of the circumferential portion 23. The elongated conduit 26 allows the cleaning liquid to flow along the longitudinal direction L of the core 20. The elongated conduit 26 may have a circular cross section and its center is aligned with the rotation axis R1 of the core 20. Alternatively, the elongated conduit 26 may have a polygonal cross section and the edges are arranged in mirror symmetry with respect to the rotation axis R1 of the core 20.

[0040] An inlet opening 25 is formed at the first end 21 for allowing cleaning liquid to enter the elongated conduit 26. A single inlet port (eg Figure 2 25 to facilitate joining of the fluid line 4 to the inlet opening 25. The inlet port 29 may be joined to the core 20 by heat energy, fusion, adhesive, or snapping into the inlet opening 25. Using this arrangement, the core 20 may be used in a variety of process tools having different drive ends and / or fluid inlets while using a single mold to manufacture the core 20 and without changing the end fittings.

[0041] The core 20 further includes a closed end portion 24 connected to the circumferential portion 23 at the second end 22 of the core 20. The second end 22 of the core 20 is sealed or closed by the closed end portion 24 and thus does not allow the cleaning liquid to pass through the second end 22 of the core 20. However, it should be understood that many changes and modifications can be made to the embodiments of the present disclosure. In some other embodiments, both the first end 21 and the second end 22 of the core 20 are open and the cleaning liquid is supplied to the core 20 through both ends of the core. Alternatively, the cleaning liquid enters the core 20 via an opening formed at the first end of the core 20 and leaves the core 20 via another opening formed at the second end of the core 20.

[0042] A plurality of outlet passages 30 are formed in the circumferential portion 23 of the core 20 and are configured to discharge cleaning liquid from the elongated conduits 26 to the brush members 40 ( Figure 1 and 2 ). Each of the outlet channels 30 passes through the circumferential portion 23 of the core 20 and extends from the inner surface 231 of the circumferential portion 23 to the outer surface 232. Several groups of outlet channels 30 are arranged in sequence along the longitudinal direction L of the core 20 at a constant pitch or at a variable pitch. The outlet channels 30 of each group are arranged around the rotation axis R1 of the core 20. According to an exemplary embodiment of the present disclosure, 144 outlet channels 30 are formed in the circumferential portion 23 of the core 20, and every 6 outlet channels 30 are grouped together. For example, Figure 3 As shown in , the groups G0 , G1 , G2 and GN each consist of 6 outlet channels 30 arranged around the rotation axis R1 of the core 20 .

[0043] Figure 4 When the brush member 40 covers the outer surface 232 of the core 20 Figure 3 23. In some embodiments, each of the outlet passages 30 has an upstream section 31 and two or more downstream sections, such as a first downstream section 32 and a second downstream section 33. The upstream section 31 extends from the inner surface 231 of the core 20 and terminates at a distal end 313. The end of the upstream section 31 formed at the inner surface 231 of the core 20 defines an inlet hole 311 of the outlet passage 30. The distal end 313 is away from and not connected to the outer surface 232 of the core 20.

[0044] In some embodiments, the upstream section 31 of the outlet passage 30 is directed toward the closed end portion 24 ( Figure 3 ) tilts outward. Specifically, Figure 4 As shown in FIG. 1 , the inner wall 315 of the upstream section 31 is inclined at an inclination angle A1 relative to the inner surface 231 of the circumferential portion 23. The inclination angle A1 may be in the range of about 20° to about 80°, preferably in the range of about 30° to about 60°. In an exemplary embodiment, the inclination angle A1 is about 45°. Figure 4 As shown in FIG. 1 , due to the inclined arrangement, the inlet hole 311 of the outlet channel 30 has an elliptical shape. The purpose of making the outlet channel 30 inclined toward the closed end portion (i.e., aligned with the flow direction) is to reduce the resistance of the fluid to flow in the core 20, so that more flow leaves the outlet channel 30 than if the outlet channel is perpendicular to the flow direction.

[0045] In some embodiments, the inclination angle A1 of the outlet channel 30 near the closed end portion 24 becomes steeper than the inclination angle A1 of the outlet channel 30 near the inlet opening 25. For example, the outlet channel 30 in the group G0 closest to the inlet opening 25 is inclined at a first angle relative to the inner surface 231 of the circumferential portion 23, and the outlet channel 30 in the group GN closest to the closed end portion 24 is inclined at a second angle relative to the inner surface 231 of the circumferential portion 23. The second angle is greater than the first angle. In one exemplary embodiment, although Figure 3 It is not illustrated in FIG, but the first angle is about 20° and the second angle is about 80°. Using this arrangement, the uniformity of the fluid distribution in the core 20 can be further improved.

[0046] The first downstream section 32 and the second downstream section 33 of the outlet passage 30 are connected to the upstream section 31 at their inner ends 321 and 331. The first downstream section 32 and the second downstream section 33 extend from the inner ends 321 and 331 in a direction perpendicular to the outer surface 232 of the core 20, respectively, and terminate at outlet holes 322 and 332 formed at the outer surface 232 of the core 20. In some embodiments, the inner end 321 of the first downstream section 32 intersects with the midpoint of the upstream section 31, and the inner end 331 of the second downstream section 33 intersects with the distal end 313 of the upstream section 31.

[0047] In some embodiments, the outlet channel 30 has a variable cross-section along its length. For example, the width of the upstream section 31 of the outlet channel 30 tapers along its extension direction. Figure 4 , the upstream section 31 has a first width W11 at the inlet hole 311 and a second width W12 at the distal end 313, and the first width W11 and the second width W12 are perpendicular to the extension axis E1 of the upstream section 31. The second width W12 is smaller than the first width W11. In another exemplary embodiment, the width W13 of the downstream section 32 and the width W14 of the second downstream section 33 are smaller than the width W11 or W12 of the upstream section 31. The width W13 of the downstream section 32 and the width W14 of the second downstream section 33 may be different. For example, the width W13 of the downstream section 32 may be narrower than the width W14 of the second downstream section 33.

[0048] It should be understood that the width of the outlet channel 30 and the number of outlet channels 30 can vary and should not be limited to the above embodiments. In some embodiments, for better uniformity of fluid distribution, Murray's law is applied to the width D ( Figure 3 ), the first width W11 of the upstream section 31 and the width W13 or the width W14 of the downstream sections 32 and 33. For example, the widths D, W11, W13 and W14 satisfy the following equations (1) and (2):

[0049]

[0050]

[0051] wherein k is the total number of upstream segments 31 , i is the total number of downstream segments 32 , and j is the total number of downstream segments 33 .

[0052] In some embodiments, the cross-sectional shape of the upstream section of the outlet passage is different from the cross-sectional shape of the downstream section. Figure 4A and 4B As shown in Figure 3 ) may have a circular shape and the downstream section 32 in the corresponding outlet channel may have a rectangular shape. In some embodiments, the outlet channels 30 in different groups may have different cross-sectional shapes. For example, Figure 4C and 4D As shown in Figure 3 ) may have a rectangular shape and a downstream section 32 of the corresponding outlet channel 30 may have an elliptical shape. That is, the outlet channels 30 in the group GN have a shape different from that of the outlet channels 30 in the group G1.

[0053] In some embodiments, the geometry, shape, and size of the outlet passage 30 may be selectively varied along the length of the core 20 as long as uniform pressurization is achieved. The cross-sectional shape of the outlet passage 30 may be selected from a regular shape (e.g. Figures 4A to 4D ), irregular shapes and / or non-prismatic shapes (e.g. Figure 4E In addition, in the case where the outlet channel has a rectangular shape, a ratio of the width to the length of the rectangular channel can be derived that meets the flow requirements and the pressurization target of the post-CMP cleaning process.

[0054] In some embodiments, the outlet channels 30 in two adjacent groups are arranged in a staggered manner. Figure 3 , the first group G1 of outlet channels 30 is positioned adjacent to the second group G2 of outlet channels 30. The outlet channels 30 in the first group G1 are offset from the outlet channels 30 in the second group G2. However, the present disclosure should not be limited to the above embodiment. The outlet channels 30 in two adjacent groups may be aligned with each other along the longitudinal direction L of the core 20.

[0055] The core 20 may be made of any chemically inert polymeric material, such as polymers, copolymers, other materials used in CMP cleaning processes, and the like. In some embodiments, the core 20 is manufactured by a three-dimensional printing technique, and the material used for the core 20 may be, for example, acrylonitrile-butadiene-styrene (ABS) or polycarbonate. In some embodiments, despite providing a high ratio of open surface area in the core 20, the core 20 still has sufficient stiffness, and one of ordinary skill in the art of CMP is able to select the stiffness to achieve the desired cleaning results, depending on the composition of the semiconductor substrate, contaminants, or a combination thereof.

[0056] The brush member 40 is formed on the outer surface 232 of the core 20 and covers all the outlet holes 322 and 332 of the outlet channel 30. In an exemplary embodiment, the brush member 40 is made of or includes polyvinyl alcohol (PVA) or other suitable materials, which are applied to the outer surface 232 of the core 20 in liquid form and then cured. During the formation of the brush member 40, a portion 43 of the material of the brush member 40 can flow into and seal the first downstream section 32 and the second downstream section 33 of the outlet channel 30, such as Figure 4 . Due to the small width of the first downstream section 32 and the second downstream section 33 of the outlet channel 30, the first downstream section 32 and the second downstream section 33 are partially filled with the material of the brush member 40, and the upstream section 31 is free of the material of the brush member 40. However, it should be understood that many variations and modifications can be made to the disclosed embodiments. In some other embodiments, the first downstream section 32 and the second downstream section 33 are completely filled with the material of the brush member 40, and the upstream section 31 is partially filled with the material of the brush member 40.

[0057] Figure 5 yes Figure 3 20. When a cleaning liquid flow is supplied into the core 20 via an inlet opening 25 formed at a first end 21 of the core 20, a simulation is performed to obtain a pressure distribution across the entire length of the core 20. In accordance with Murray's law, the biomimetic design of the core 20 ensures a minimum pressure drop of the fluid along the length of the core 20 and exhibits an extraordinary uniformity of pressure distribution of the fluid within the elongated conduit 26 of the core 20. Therefore, the pressure of the fluid leaving the outlet channel 30 is substantially uniform, and a large area of ​​the brush member 40 covering the outlet channel is fully flushed with the cleaning liquid, thereby improving the cleaning efficiency of the brush member 40 or the semiconductor wafer cleaned by the cleaning brush 1. Compared to a conventional core including an outlet channel extending perpendicularly relative to the axis of rotation across its entire length, the embodiments of the present disclosure exhibit a larger outlet flow rate at the proximal end of the core and a smaller outlet flow rate at the distal end of the core.

[0058] The configuration of the core of the cleaning brush 1 surrounded by the brush member 40 should not be limited to the above-described embodiment. Some exemplary embodiments of the core will be described below.

[0059] Figure 6 2 is a longitudinal perspective cross-sectional view of a core 20a according to a second exemplary embodiment. In an illustrative embodiment, the core 20a has a first end 21a and a second end 22a opposite to the first end 21a along the longitudinal direction L of the core 20a. Several inlet openings (e.g., a first inlet opening 251a, a second inlet opening 252a, and a third inlet opening 253a) are defined at the first end 21a of the core 20a for allowing cleaning liquid to enter different conduits in the core. The first inlet opening 251a, the second inlet opening 252a, and the third inlet opening 253a are arranged adjacent to each other and concentrically arranged relative to the rotation axis R1 of the core 20a. The first inlet opening 251a, the second inlet opening 252a, and the third inlet opening 253a may have the same width in the radial direction of the core 20a.

[0060] In some embodiments, the core 20a includes a plurality of separate structures that are telescopic with respect to each other. In an exemplary embodiment, the core 20a includes a first component 201a, a second component 202a, and a third component 203a. The first component 201a, the second component 202a, and the third component 203a include a first sub-segment wall 234a, a second sub-segment wall 235a, and a third sub-segment wall 236a, respectively. The first sub-segment wall 234a, the second sub-segment wall 235a, and the third sub-segment wall 236a each have an annular shape and are sequentially arranged from the first end 21a to the second end 22a of the core 20a along the longitudinal direction L to cooperate to construct the brush component 40 ( Figure 1 ) of the circumferential portion 23 of the core 20.

[0061] In addition, the first component 201a, the second component 202a and the third component 203a respectively include a first fluid guiding portion 237a, a second fluid guiding portion 238a and a third fluid guiding portion 239a for defining a plurality of elongated conduits in the core 20a. Specifically, the first fluid guiding portion 237a is connected to the inner surface of the first sub-segment wall 234a and extends from the distal end of the first sub-segment wall 234a adjacent to the second sub-segment wall 235a to the first inlet opening 251a. The first elongated conduit 261a is defined between the first sub-segment wall 234a and the first fluid guiding portion 237a and is in fluid communication with the first inlet opening 251a.

[0062] The second fluid guide portion 238a is connected to the inner surface of the second sub-segment wall 235a and extends from the distal end of the second sub-segment wall 235a adjacent to the third sub-segment wall 236a to the second inlet opening 252a. The upstream of the second elongated conduit 262a is defined between the first fluid guide portion 237a and the second fluid guide portion 238a, and the downstream of the second elongated conduit 262a is defined between the second fluid guide portion 238a and the second sub-segment wall 235a. The second elongated conduit 262a is in fluid communication with the second inlet opening 252a.

[0063] The third fluid guiding portion 239a is connected to the inner surface of the third sub-segment wall 236a and extends from the distal end of the third sub-segment wall 236a adjacent to the second end 22a of the core 20a to the third inlet opening 253a. The upstream of the third elongated conduit 263a is defined between the second fluid guiding portion 238a and the third fluid guiding portion 239a, and the downstream of the third elongated conduit 263a is defined between the third fluid guiding portion 239a and the third sub-segment wall 236a. The third fluid guiding portion 239a is in fluid communication with the third inlet opening 253a. The closed end portion 24a of the core 20a is defined by a portion of the third fluid guiding portion 239a connected to the third sub-segment wall 236a. The first fluid guiding portion 237a, the second fluid guiding portion 238a, and the third fluid guiding portion 239a may be formed into a streamlined shape (such as Figure 6 ) to reduce the fluid impedance in the core 20a.

[0064] A plurality of outlet channels 30a are formed at the first sub-segment wall 234a, the second sub-segment wall 235a and the third sub-segment wall 236a and are configured to discharge the cleaning liquid from the first elongated conduit 261a, the second elongated conduit 262a and the third elongated conduit 263a to the brush member surrounding the core 20a. Each of the outlet channels 30a passes through the circumferential portion 23a of the core 20a and extends from the inner surface 231a of the circumferential portion 23a to the outer surface 232a.

[0065] Several groups of outlet channels 30a are arranged at a fixed or variable pitch along the longitudinal direction L of the core 20a, and the outlet channels 30a in each group are arranged around the rotation axis R1 of the core 20a. Figure 7 , 8 9 shows the arrangement of the outlet passage 30a in each of the first component 201a, the second component 202a and the third component 203a, Figure 7 , 8 and 9 displays respectively along Figure 6 A transverse perspective cross-sectional view of the core 20a is obtained along lines AA, BB and CC. In one exemplary embodiment, as Figure 7 , 8As shown in FIGS. 9 and 10 , each of the groups of outlet channels arranged around the rotation axis R1 consists of four outlet channels 30a formed in the first sub-segment wall 234a, the second sub-segment wall 235a and the third sub-segment wall 236a. Figure 7 , both ends of the outlet channel 30a form an inlet hole 31a and an outlet hole 32a on the inner surface 231a and the outlet surface 232a of the core 23a. In some embodiments, a flange 39a is formed at the outlet hole 32a and surrounds the outlet hole 32a.

[0066] refer to Figure 6 , in some embodiments, the outlet channel 30a is tilted outward toward the closed end portion 24a. Specifically, the outlet channels 30a formed at the first sub-segment wall 234a each extend along the extension axis E2 and are tilted at an angle of inclination A2 relative to the inner surface 231a of the circumferential portion 23a. The outlet channels 30a formed at the second sub-segment wall 235a each extend along the extension axis E3 and are tilted at an angle of inclination A3 relative to the inner surface 231a of the circumferential portion 23a. The outlet channels 30a formed at the third sub-segment wall 236a each extend along the extension axis E3 and are tilted at an angle of inclination A3 relative to the inner surface 231a of the circumferential portion 23a. The inclination angles A2, A3, and A4 may be in the range of about 20° to about 90°, preferably in the range of about 30° to about 60°. In an exemplary embodiment, the inclination angles A2, A3, and A4 are about 45°. The purpose of slanting outlet passage 30a toward the closed end portion (ie, aligned with the flow direction) is to reduce resistance to flow in core 20a so that more flow exits outlet passage 30a than if the outlet passage was perpendicular to the flow direction.

[0067] In some embodiments, the inclination angle of the outlet channel 30a near the closed end portion 24a becomes steeper than the inclination angle of the outlet channel 30a near the inlet openings 251a, 252a, and 253a. For example, the inclination angle A4 of the outlet channel 30a formed at the third sub-segment wall 236a is greater than the inclination angle A3 of the outlet channel 30a formed at the second sub-segment wall 235a, and the inclination angle A3 of the outlet channel 30a is greater than the inclination angle A2 of the outlet channel 30a formed at the first sub-segment wall 234a. In an exemplary embodiment, although Figure 6 Although not illustrated in FIG. 2 , the inclination angle A2 is about 20°, the inclination angle A3 is about 45°, and the inclination angle A4 is about 90°. With this arrangement, the uniformity of the fluid distribution in the core 20a can be further improved.

[0068] In some embodiments, the outlet passage 30a has a variable cross-section along its length. Figure 7, the outlet channel 30a has a spindle-shaped cross-section, wherein the width of the middle section of the outlet channel 30 is greater than the width of the inlet hole 31a or the width of the outlet hole 32a. It should be understood that the width of the outlet channel 30a and the number of outlet channels 30a can vary and should not be limited to the above-described embodiments. The geometry, shape, and size of the outlet channel 30a can be selectively varied along the length of the core 20a as long as uniform pressurization can be obtained. In the case where the outlet channel has a rectangular shape, a ratio of the width to the length of the rectangular channel can be derived that meets the flow requirements and pressurization targets of the post-CMP cleaning process.

[0069] In some embodiments, the first zone Z1, the second zone Z2, and the third zone Z3 of the core 20a are defined in sequence along the direction from the inlet openings 251a, 252a, and 253a to the closed end portion 24a. The first zone Z1 corresponds to the segment of the core 20a in which the outlet channel 30a of the first sub-segment wall 234a is located. The second zone Z2 corresponds to the segment of the core 20a in which the outlet channel 30a of the second sub-segment wall 235a is located. The third zone Z3 corresponds to the segment of the core 20a in which the outlet channel 30a of the third sub-segment wall 236a is located.

[0070] In some embodiments, the total flow rate (per unit length) of the elongated conduits and outlet channels in the corresponding first zone Z1, second zone Z2, and third zone Z3 gradually decreases. Figure 7 As shown in FIG. 1 , the core 20a in the first zone Z1 includes four outlet channels 30a and three elongated conduits 261a, 262a, and 263a. The core 20a in the second zone Z2 includes four outlet channels 30a and two elongated conduits 262a and 263a. The core 20a in the third zone Z3 includes four outlet channels 30a and one elongated conduit 263a. Therefore, the total flow rate (per unit length) of the elongated conduits in the first zone Z1 is greater than that in the second zone Z2, and the total flow rate (per unit length) of the elongated conduits in the second zone Z2 is greater than that in the third zone Z3.

[0071] The core 20a may be made of any chemically inert polymeric material, such as polymers, copolymers, other materials used in CMP cleaning processes, and the like. In some embodiments, the core 20a is manufactured by 3-dimensional printing technology, and the material used for the core 20a may be, for example, acrylonitrile butadiene styrene (ABS) or polycarbonate. In some embodiments, although the core 20a includes several layers that are telescoped with each other, the core 20a still has sufficient stiffness to maintain cleaning uniformity.

[0072] Fig.102 is a longitudinal perspective cross-sectional view of a core 20b according to a third exemplary embodiment. In one illustrative embodiment, the core 20b has a first end 21b and a second end 22b opposite to the first end 21b along the longitudinal direction L of the core 20b. The core 20b includes a circumferential portion 23b forming a hollow cylindrical shape around the rotation axis R1 of the core 20b. The elongated conduit 26b is defined by the inner surface 231b of the circumferential portion 23b. The elongated conduit 26b allows the cleaning liquid to flow along the longitudinal direction L of the core 20b.

[0073] An inlet opening 25b is formed at the first end 21b for allowing a cleaning liquid to enter the elongated conduit 26b. The core 20b further includes a closed end portion 24b connected to the circumferential portion 23b at the second end 22b of the core 20b. The second end 22b of the core 20b is sealed by the closed end portion 24b and thus does not allow a cleaning liquid to pass through the second end 22b of the core 20b. A flange 28b may be formed at an outer surface of the closed end portion 24b for connecting the core 20b to a tool spindle (not shown).

[0074] A plurality of outlet passages 30b are formed in the circumferential portion 23b of the core 20b and are configured to discharge cleaning liquid from the elongated conduits 26b to the brush members 40 ( Figure 1 and 2 ). Each of the outlet channels 30b passes through the circumferential portion 23b of the core 20b and extends from the inner surface 231b of the circumferential portion 23b to the outer surface 232b. Several groups of outlet channels 30b are arranged in sequence along the longitudinal direction L of the core 20b at a constant pitch or at a variable pitch. The outlet channels 30b in each group are arranged around the rotation axis R1 of the core 20b. According to an exemplary embodiment of the present disclosure, each of the groups (e.g., groups G1, G2, and G3) consists of four outlet channels 30b arranged around the rotation axis R1 of the core 20b ( Fig.10 Only three exit channels for each group are shown).

[0075] In some embodiments, the inner surface 231b of the circumferential portion 23b tapers from the inlet opening 25b to the closed end portion 24b along the longitudinal direction L of the core 20b. Therefore, the thickness of the circumferential portion 23b gradually increases in the direction away from the inlet opening 25b, and the outlet channels 30b arranged along the longitudinal direction L have gradually increasing flow rates. For example, the outlet channels 30b of group G3 have a flow rate greater than the flow rate of the outlet channels 30b of group G2. In addition, the outlet channels 30b of group G2 have a flow rate greater than the flow rate of the outlet channels 30b of group G1. Fig.10 In the shown embodiment, the groups G1 , G2 and G3 are three groups of outlet channels arranged in sequence along the longitudinal direction of the core 20 b .

[0076] Fig.11 When the brush member 40b covers the outer surface 232b of the core 20b Fig.10 2. In some embodiments, each of the outlet passages 30b has an upstream section 31b and a downstream section 32b. The upstream section 31b extends from the inner surface 231b of the core 20b and is connected to the downstream section 32b. The end of the upstream section 31b formed at the inner surface 231b of the core 20b defines the inlet hole 311b of the outlet passage 30b. The downstream section 32b extends from the outer surface 232b of the core 20b and is connected to the upstream section 31b. The end of the downstream section 32b formed at the outer surface 232b of the core 20b defines the outlet hole 322b of the outlet passage 30b.

[0077] In some embodiments, the outlet passage 30b has a varying cross-section along its length. Fig.11 As shown in FIG. 1 , the upstream section 31b includes a rounded corner or chamfer that tapers outward and has an inner wall that is inclined relative to the inner surface 231b of the circumferential portion 23b. The downstream section 32b is perpendicular to the outer surface 232b of the circumferential portion 23b. Therefore, the first width W31 of the inlet hole 311b is greater than the second width W32 of the outlet hole 322b.

[0078] It should be understood that the width of the outlet channel 30b and the number of the outlet channels 30b can vary and should not be limited to the above embodiments. In addition, the geometry, shape and size of the outlet channels 30b can be selectively varied along the length of the core 20b as long as uniform pressurization can be obtained.

[0079] The core 20b may be made of any chemically inert polymeric material, such as polymers, copolymers, other materials used in CMP cleaning processes, and the like, and may be formed using an injection molding process. Fig.11 , the brush member 40b is formed on the outer surface 232b of the core 20b and covers all the outlet holes 322b of the outlet channel 30b. In an exemplary embodiment, the brush member 40b is applied to the outer surface 232b of the core 20b in liquid form and then solidified. During the formation of the brush member 40b, the material of the brush member 40b fills the entire volume of the outlet channel 30b. In some embodiments, the brush member 40 includes polyvinyl alcohol (PVA) or other suitable materials. In some embodiments, although the circumferential portion of the core 20b has a varying thickness, the core 20b still has sufficient stiffness to maintain cleaning uniformity.

[0080] In some embodiments, Fig.10As shown in FIG. 2 , because the elongated conduits 26b taper along the longitudinal direction L of the core 20b, the flow rate (per unit length) of the elongated conduits 26b of the core 20b gradually decreases. In some embodiments, the first zone Z1, the second zone Z2, and the third zone Z3 of the core 20b are defined in sequence along the direction from the inlet opening 25b to the closed end portion 24b. The first zone Z1, the second zone Z2, and the third zone Z3 have equal distances along the longitudinal direction L of the core 20b, and each includes three groups of outlet channels 30b spaced at a constant pitch from each other. By the flow gradient along the length of the core 20b, more outlet flows can be discharged in the upper half of the core and thus uniform fluid distribution can be achieved.

[0081] Fig.12 is a graph of the outlet flow rate of cleaning liquid from a core as a function of the distance of the outlet channel from the inlet opening according to an embodiment of the present disclosure. Fig.12 As can be seen, core 20 exhibits a constant (stable within + / - 5 ml / min) outlet flow rate along its length. Core 20a exhibits an outlet flow rate that varies between about 145 (ml / min) and about 180 (ml / min) in the upper half of its length and reaches a stable outlet flow rate in the lower half of its length. Although core 20b exhibits an outlet flow rate that varies between about 95 (ml / min) and about 180 (ml / min) in the upper half of its length, it exhibits a stable outlet flow rate that varies between about 180 (ml / min) and about 205 (ml / min) in the lower half of its length. In contrast, core 20a exhibits an outlet flow rate that varies between about 145 (ml / min) and about 180 (ml / min) in the upper half of its length. Fig.12 Shown as a dashed line in FIG. 3 , a conventional core exhibits an unacceptable increase in flow toward its dead end.

[0082] Fig.13 2 is a longitudinal perspective cross-sectional view of a core 20c according to a fourth exemplary embodiment. In one illustrative embodiment, the core 20c has a first end 21c and a second end 22c opposite to the first end 21c along the longitudinal direction L of the core 20c. The core 20c includes a circumferential portion 23c forming a hollow cylindrical shape around the rotation axis R1 of the core 20c. The elongated conduit 26c is defined by the inner surface 231c of the circumferential portion 23c. The elongated conduit 26c allows the cleaning liquid to flow along the longitudinal direction L of the core 20c.

[0083] An inlet opening 25c is formed at the first end 21c for allowing a cleaning liquid to enter the elongated conduit 26c. The core 20c further includes a closed end portion 24c connected to the circumferential portion 23c at the second end 22c of the core 20c. The second end 22c of the core 20c is sealed by the closed end portion 24c and does not allow a cleaning liquid to pass through the second end 22c of the core 20c. A flange 28c may be formed at an outer surface of the closed end portion 24c to connect the core 20c to a tool spindle (not shown).

[0084] A plurality of outlet passages 30c are formed in the circumferential portion 23c of the core 20c and are configured to discharge cleaning liquid from the elongated conduits 26c to the brush members 40 ( Figure 1 and 2 ). Each of the outlet channels 30c passes through the circumferential portion 23c of the core 20c and extends from the inner surface 231c of the circumferential portion 23c to the outer surface 232c. Several groups of outlet channels 30c are arranged along the longitudinal direction L of the core 20c, and the outlet channels 30c in each group are arranged around the rotation axis R1 of the core 20c. According to an exemplary embodiment of the present disclosure, each of the groups consists of four outlet channels 30c arranged around the rotation axis R1 of the core 20c ( Fig.13 Only three exit channels for each group are shown).

[0085] In some embodiments, some outlet passages 30c have a varying cross-section along their length, but some outlet passages 30c have a uniform cross-sectional shape. Fig.13 As shown in FIG. 1 , one of the outlet passages 30c has an upstream section 31c and a downstream section 32c. The upstream section 31c extends from the inner surface 231c of the core 20c and is connected to the downstream section 32c. The downstream section 32c extends from the outer surface 232c of the core 20c and is connected to the upstream section 31b. The upstream section 31c includes a fillet inclined relative to the inner surface 231c of the circumferential portion 23c, and the downstream section 32c is perpendicular to the outer surface 232c of the circumferential portion 23c.

[0086] In some embodiments, the first zone Z1, the second zone Z2, and the third zone Z3 of the core 20c are defined in sequence along the direction from the inlet opening 25c to the closed end portion 24c. The first zone Z1, the second zone Z2, and the third zone Z3 each include a plurality of groups of outlet channels 30c spaced at a constant pitch from each other. Specifically, the outlet channels 30c in the first zone Z1 are spaced at a first pitch P1, the outlet channels 30c in the second zone Z2 are spaced at a second pitch P2, and the outlet channels 30c in the third zone Z3 are spaced at a third pitch P3.

[0087] In one exemplary embodiment, the first pitch P1, the second pitch P2, and the third pitch P3 are different from each other. For example, the pitch P2 of the outlet channel 30c in the second zone Z2 is greater than the pitch P1 of the outlet channel 30c in the first zone Z1. In addition, the pitch P3 of the outlet channel 30c in the third zone Z3 is greater than the pitch P2 of the outlet channel 30c in the second zone Z2. Therefore, the total flow rate of the elongated conduits 26c and the outlet channels 30c in the zone Z1 is greater than that in the zone Z2 per unit length of the core 20c, because the number of outlet channels 30c in the zone Z1 is greater than the number of outlet channels 30c in the zone Z2. In addition, the total flow rate of the elongated conduits 26c and the outlet channels 30c in the zone Z2 is greater than that in the zone Z3 per unit length of the core 20c, because the number of outlet channels 30c in the zone Z2 is greater than the number of outlet channels 30c in the zone Z3. In one exemplary embodiment, the ratio of the pitches P1, P2, and P3 is about 1:2:4.

[0088] It should be understood that the width of the outlet channel 30c and the number of outlet channels 30c can vary and should not be limited to the above-described embodiments. In addition, the geometry, shape, and size of the outlet channels 30c can be selectively varied along the length of the core 20c as long as uniform pressurization can be achieved. For example, the outlet channels 30c in zone Z1, zone Z2, and zone Z3 have widths W41, W42, and W43, respectively. In one exemplary embodiment, although Fig.13 It is not illustrated, but width W43 is greater than width W42 and width W42 may be greater than width W41.

[0089] Fig.14 2 is a longitudinal perspective cross-sectional view of a core 20d according to a fifth exemplary embodiment. In one illustrative embodiment, the core 20d has a first end 21d and a second end 22d opposite to the first end 21d along the longitudinal direction L of the core 20d. The core 20d includes a circumferential portion 23d forming a hollow cylindrical shape around the rotation axis R1 of the core 20d. The elongated conduit 26d is defined by an inner surface 231d of the circumferential portion 23d. The elongated conduit 26d allows the cleaning liquid to flow along the longitudinal direction L of the core 20d.

[0090] An inlet opening 25d is formed at the first end 21d for allowing a cleaning liquid to enter the elongated conduit 26d. The core 20d further includes a closed end portion 24d connected to the circumferential portion 23d at the second end 22d of the core 20d. The second end 22d of the core 20d is sealed by the closed end portion 24d and thus does not allow a cleaning liquid to pass through the second end 22d of the core 20d. A flange 28d may be formed at an outer surface of the closed end portion 24d for connecting the core 20d to a tool spindle (not shown).

[0091] A plurality of outlet passages 30d are formed in the circumferential portion 23d of the core 20d and are configured to discharge cleaning liquid from the elongated conduits 26d to the brush members 40 ( Figure 1 and 2 ). Each of the outlet channels 30d passes through the circumferential portion 23d of the core 20d and extends from the inner surface 231d of the circumferential portion 23d to the outer surface 232d. Both ends of the outlet channel 30d form an inlet hole 31d and an outlet hole 32d on the inner surface 231d and the outlet surface 232d of the core 23d. Several groups of outlet channels 30d are arranged along the longitudinal direction L of the core 20d at a fixed or variable pitch, and the outlet channels 30d in each group are arranged around the rotation axis R1 of the core 20d. According to an exemplary embodiment of the present disclosure, each of the groups consists of four outlet channels 30d arranged around the rotation axis R1 of the core 20d ( Fig.14 Only three exit channels for each group are shown).

[0092] In some embodiments, the outlet channel 30d is inclined outward toward the closed end portion 24d. Specifically, the outlet channel 30d closest to the inlet opening 25d extends along an extension axis E5 and is inclined relative to the inner surface 231d of the circumferential portion 23d. The extension axis E5 forms an inclination angle A5 relative to the rotation axis R1. The outlet channel 30d closest to the closed end portion 24d extends along an extension axis E6 and is inclined relative to the inner surface 231d of the circumferential portion 23d. The extension axis E6 forms an inclination angle A6 relative to the rotation axis R1. The inclination angles A5 and A6 may be in the range of about 20° to about 90°, preferably in the range of about 30° to about 60°. In an exemplary embodiment, the inclination angles A5 and A6 are about 45°. Fig.14 As shown in FIG. 2 , due to the inclined arrangement, the inlet hole 31d of the outlet channel 30d has an elliptical shape. The purpose of making the outlet channel 30d inclined toward the closed end portion (i.e., aligned with the flow direction) is to reduce the resistance of the fluid to flow in the core 20d, so that more flow leaves the outlet channel 30d compared to when the outlet channel is perpendicular to the flow direction.

[0093] In some embodiments, the inclination angle of the outlet passage 30d near the closed end portion 24d becomes steeper than the inclination angle of the outlet passage 30d near the inlet opening 25d. For example, the inclination angle A6 may be greater than the inclination angle A5. In an exemplary embodiment, although Fig.14 It is not illustrated in FIG. 2 , but the inclination angle A5 is about 20° and the inclination angle A6 is about 90°. With this arrangement, the uniformity of the fluid distribution in the core 20d can be further improved.

[0094] It should be understood that the width of the outlet channel 30d and the number of outlet channels 30d can vary and should not be limited to the above-described embodiments. In addition, the geometry, shape and size of the outlet channels 30d can be selectively varied along the length of the core 20d as long as uniform pressurization can be obtained. For example, the outlet channel 30d closest to the inlet opening 25d has a width W51, and the outlet channel 30d closest to the closed end portion 24d has a width W52. The width W51 can be greater than the width W52.

[0095] Fig.15 is a block diagram of a CMP module 7 and a processing device 9 for a subsequent process after a CMP process according to some embodiments. In some embodiments, the CMP module 7 includes a CMP module and a post-CMP cleaning module known in the art, such as Figure 1 . The post-CMP cleaning module 1 is positioned downstream of the CMP module 7 to receive the wafer from the CMP module. The processing equipment 9 may be any processing tool for performing a suitable process on the semiconductor wafer after the CMP process. For example, the processing equipment 9 may be a tool for forming a film on the semiconductor wafer by CVD, PVD, ALD, or any other suitable method.

[0096] In operation, a CMP process is performed on a semiconductor wafer by the CMP module 7, and then the wafer is cleaned in the post-CMP cleaning module 1. In some embodiments, before loading the wafer into the post-CMP cleaning module 1, a cleaning liquid is supplied to the core of any embodiment of the present disclosure to rinse the brush member 40 to remove particles thereon. After cleaning the brush member 40, the wafer is loaded into the post-CMP cleaning module 1 for the post-CMP cleaning process. In the post-CMP cleaning process, a cleaning liquid is supplied to the core to rinse the brush member 40, and the cleaning brush 10 is rotated to clean the surface of the wafer by the brush member 40. After completing the post-CMP cleaning process, the wafer is removed from the post-CMP cleaning module 1, and a cleaning liquid is supplied to the core again to rinse the brush member 40 to remove particles attached to the brush member during the post-CMP cleaning process. The wafer may be further processed in the processing equipment 9.

[0097] In the post-CMP cleaning module 1, because its core has excellent uniform fluid distribution along the length of the core, the post-CMP cleaning module 1 exhibits higher particle removal efficiency across the length of the brush member and across the entire surface of the semiconductor wafer compared to conventional cleaning modules. Therefore, the period required to clean the brush member or the wafer can be reduced, which leads to reduced water consumption and an environmentally friendly manufacturing process. In addition, by thoroughly cleaning the brush member before and after the cleaning process, the defect count on the wafer used to monitor the condition of the brush member can be controlled. Therefore, the life of the cleaning brush can be extended and the manufacturing cost can be reduced. In addition, because the contaminants are fully removed from the semiconductor wafer, the product yield of the semiconductor wafer can be improved.

[0098] The following examples, identified by letters and numbers, are intended to further illustrate the present disclosure but should not be construed as unduly limiting the present disclosure.

[0099] A1. A cleaning brush comprising:

[0100] A core comprising:

[0101] a circumferential portion surrounding the axis of rotation of the cleaning brush and defining an inlet opening for receiving a fluid; and

[0102] a closed end portion connected to an end of the circumferential portion opposite to the inlet opening along the rotation axis,

[0103] wherein at least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels therethrough in fluid communication with the elongated conduit, the outlet channels sloping outwardly toward the closed end portion; and

[0104] A brush member is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels.

[0105] A2. According to the cleaning brush of embodiment A1, the outlet channel is inclined toward the closed end portion at an inclination angle ranging from about 20° to about 90°.

[0106] A3. According to the cleaning brush of embodiment A2, the plurality of outlet channels include a first outlet channel and a second outlet channel positioned closer to the closed end portion than the first outlet channel, wherein the inclination angle of the second outlet channel is greater than the inclination angle of the first outlet channel.

[0107] A4. A cleaning brush according to embodiments A1 to A3, wherein each of the outlet channels comprises: an upstream section connected to the inner surface of the circumferential portion; and at least one downstream section connecting the upstream section to the outer surface of the circumferential portion, wherein the upstream section is inclined relative to the inner surface of the circumferential portion and the downstream section is perpendicular to the outer surface of the circumferential portion.

[0108] A5. The cleaning brush according to embodiment A4, wherein each of the outlet channels includes two downstream sections diverging from the upstream section and extending to the outer surface of the circumferential portion, and the width of the two downstream sections is smaller than the width of the upstream section.

[0109] A6. According to the cleaning brush of embodiment A4, the width (D) of the elongated conduit, the width (W11) of the upstream section of one of the outlet channels, and the width (W13) of the downstream section satisfy the following equations (1) and (2):

[0110]

[0111] Where k is the total number of the upstream segments, and i is the total number of the downstream segments.

[0112] A7. A cleaning brush according to embodiments A1 to A6, wherein each of the outlet channels comprises: an upstream section connected to the inner surface of the circumferential portion; and at least one downstream section connecting the upstream section to the outer surface of the circumferential portion, wherein the cross-sectional shape of the upstream section is different from the cross-sectional shape of the downstream section.

[0113] A8. A cleaning brush according to embodiments A1 to A7, wherein the multiple outlet channels include a first outlet channel and a second outlet channel positioned farther away from the inlet opening than the first outlet channel, and the cross-sectional shape or size of the first outlet channel is different from the cross-sectional shape or size of the second outlet channel.

[0114] A9. The cleaning brush of embodiments A1-A8, wherein the circumferential portion comprises a fillet or chamfer at an intersection of at least one of the outlet channels and the elongated conduit.

[0115] B1. A cleaning brush, comprising:

[0116] A core comprising:

[0117] a circumferential portion surrounding the axis of rotation of the cleaning brush and defining an inlet opening for receiving a fluid; and

[0118] a closed end portion connected to an end of the circumferential portion opposite to the inlet opening along the rotation axis,

[0119] wherein at least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels therethrough in fluid communication with the elongated conduit,

[0120] wherein a first zone, a second zone, and a third zone of the core are defined sequentially along a direction from the inlet opening to the closed end portion, and a total flow rate (per unit length of the core) of the elongated conduit and the outlet channel within the respective first zone, second zone, and third zone gradually decreases; and

[0121] A brush member is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels.

[0122] B2. A cleaning brush according to embodiment B1, wherein the at least one inlet opening includes first, second and third inlet openings arranged adjacent to each other and concentrically arranged relative to the rotation axis of the cleaning brush, and the at least one slender conduit includes first, second and third slender conduits, wherein the first, second and third slender conduits are each fluidically connected to at least one of the outlet channels of the core, and the outlet flow rate of the outlet channel connected to the first slender conduit is different from the outlet flow rate of the outlet channel connected to the second or third slender conduits to provide preferential flow or target flow in different positions of the core.

[0123] B3. The cleaning brush according to embodiment B2, wherein the distance between two adjacent outlet channels gradually increases or gradually decreases in a direction away from the inlet opening.

[0124] B4. The cleaning brush of embodiment B3, wherein the distance between the first two outlet channels closest to the inlet opening is the smallest, and the distance between the last two of the outlet channels farthest from the inlet opening is the largest.

[0125] B5. A cleaning brush according to embodiment B1, wherein the thickness of the circumferential portion gradually increases in a direction away from the inlet opening so that the outlet channel located close to the closed end portion has a maximum length in a radial direction of the core perpendicular to the rotation axis.

[0126] C1. A CMP (chemical mechanical planarization) apparatus, comprising:

[0127] a CMP module configured to perform a CMP process on a semiconductor wafer;

[0128] a post-CMP cleaning module positioned downstream of the CMP module and comprising a core and a brush material surrounding the core and configured to perform a cleaning process on the semiconductor wafer,

[0129] wherein an inlet opening, an elongated conduit, and a plurality of outlet channels are arranged in the core to guide liquid flowing into the core through the inlet opening to the brush material through the elongated conduit and the outlet channels, wherein at least one of the following parameters of a first and a second of the outlet channels spaced at different distances from the inlet opening are different to exhibit a preferential flow distribution or a target flow distribution of the liquid in the core:

[0130] the width of the outlet passage;

[0131] the cross-sectional shape of the outlet passage; and

[0132] The outlet channel has an inclination angle relative to the length direction of the core.

[0133] C2. The cleaning brush of embodiment C1, wherein the second outlet channel is positioned further away from the inlet opening than the first outlet channel, and the width of the second outlet channel is smaller than the width of the first outlet channel.

[0134] C3. The cleaning brush of embodiments C1-C2, wherein the second outlet channel is positioned further away from the inlet opening than the first outlet channel, and the inclination angle of the second outlet channel is greater than the inclination angle of the first outlet channel.

[0135] C4. A cleaning brush according to embodiments C1 to C3, wherein the first outlet channel and the second outlet channel are the first two outlet channels closest to the inlet opening, the distance between the first channel and the second outlet channel is the smallest, and the distance between the two of the outlet channels farthest from the inlet opening is the largest.

[0136] C5. The cleaning brush of embodiments C1 to C4, wherein either the first channel or the second outlet channel has a varying cross-sectional area along its length.

[0137] C6. The cleaning brush of embodiments C1 to C5, wherein the width (D) of the elongated conduit, the width (W) of one of the outlet channels satisfies the following equation, where n is the total number of the outlet channels:

[0138]

[0139] where k is the total number of outlet channels.

[0140] The examples disclosed in this application are to be considered in all respects as illustrative and not restrictive. The scope of the invention is indicated by the appended claims rather than the above description; and all changes within the equivalent meaning and range of the claims are intended to be embraced therein.

[0141] The terms used in this specification are intended to describe specific embodiments rather than to limit them. Unless otherwise expressly indicated, the terms "a", "an" and "the" also include plural forms. The term "comprising" used in this specification specifically refers to the presence of the stated features, integers, steps, operations, elements and / or components, but does not exclude the presence or addition of one or more other features, integers, steps, operations, elements and / or components.

[0142] With respect to the above description, it should be understood that changes may be made in detail without departing from the scope of the present disclosure, especially with respect to the construction materials employed and the shapes, sizes and arrangements of parts. This specification and described embodiments are intended to be exemplary only, and the true scope and spirit of the present disclosure is indicated by the appended claims.

Claims

1. A cleaning brush, comprising: A core comprising: a circumferential portion surrounding the axis of rotation of the cleaning brush and defining an inlet opening for receiving a fluid; and a closed end portion connected to an end of the circumferential portion opposite to the inlet opening along the rotation axis, wherein at least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels therethrough in fluid communication with the elongated conduit, the outlet channels sloping outwardly toward the closed end portion; and A brush member is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels. 2 . The cleaning brush according to claim 1 , wherein the outlet channel is inclined toward the closed end portion at an inclination angle ranging from about 20° to about 90°.

3. The cleaning brush according to claim 2, wherein the plurality of outlet channels include a first outlet channel and a second outlet channel located closer to the closed end portion than the first outlet channel, wherein the inclination angle of the second outlet channel is greater than the inclination angle of the first outlet channel.

4. The cleaning brush of claim 1 , wherein each of the outlet channels comprises: an upstream section connected to the inner surface of the circumferential portion; and At least one downstream segment connects the upstream segment to the outer surface of the circumferential portion, wherein the upstream segment is inclined relative to the inner surface of the circumferential portion and the downstream segment is perpendicular to the outer surface of the circumferential portion. 5 . The cleaning brush according to claim 4 , wherein each of the outlet channels includes two downstream sections diverging from the upstream section and extending to the outer surface of the circumferential portion, and a width of the two downstream sections is smaller than a width of the upstream section.

6. The cleaning brush according to claim 4, wherein the width (D) of the elongated conduit, the width (W11) of the upstream section of one of the outlet channels, and the width (W13) of the downstream section satisfy the following equations (1) and (2): Where k is the total number of the upstream segments, and i is the total number of the downstream segments.

7. The cleaning brush of claim 1, wherein each of the outlet channels comprises: an upstream section connected to the inner surface of the circumferential portion; and At least one downstream segment connects the upstream segment to the outer surface of the circumferential portion, wherein a cross-sectional shape of the upstream segment is different from a cross-sectional shape of the downstream segment.

8. The cleaning brush of claim 1, wherein the plurality of outlet channels include a first outlet channel and a second outlet channel positioned farther from the inlet opening than the first outlet channel, and a cross-sectional shape or size of the first outlet channel is different from a cross-sectional shape or size of the second outlet channel.

9. The cleaning brush of claim 1, wherein the circumferential portion includes a radius or chamfer at an intersection of at least one of the outlet channels and the elongated conduit.

10. A cleaning brush comprising: A core comprising: a circumferential portion surrounding the axis of rotation of the cleaning brush and defining an inlet opening for receiving a fluid; and a closed end portion connected to an end of the circumferential portion opposite to the inlet opening along the rotation axis, wherein at least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels therethrough in fluid communication with the elongated conduit, wherein a first zone, a second zone, and a third zone of the core are defined in sequence along a direction from the inlet opening to the closed end portion, and a total flow rate per unit length of the core of the elongated conduit and the outlet channel in the respective first zone, second zone, and third zone gradually decreases; and A brush member is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels.

11. The cleaning brush of claim 10, wherein the at least one inlet opening comprises first, second and third inlet openings arranged adjacent to each other and concentrically arranged relative to the rotation axis of the cleaning brush, and the at least one elongated conduit comprises first, second and third elongated conduits, The first, second and third elongated conduits are each fluidically connected to at least one of the outlet channels of the core, and an outlet flow rate of the outlet channel connected to the first elongated conduit is different from an outlet flow rate of the outlet channel connected to the second or third elongated conduit to provide preferential flow or target flow in different positions of the core. 12 . The cleaning brush according to claim 11 , wherein a distance between two adjacent outlet channels gradually increases or gradually decreases in a direction away from the inlet opening.

13. The cleaning brush of claim 12, wherein the distance between the first two outlet channels closest to the inlet opening is the smallest, and the distance between the last two of the outlet channels farthest from the inlet opening is the largest.

14. The cleaning brush according to claim 10, wherein the thickness of the circumferential portion gradually increases in a direction away from the inlet opening so that the outlet channel located close to the closed end portion has a maximum length in a radial direction of the core perpendicular to the rotation axis.

15. A CMP (chemical mechanical planarization) device, comprising: a CMP module configured to perform a CMP process on a semiconductor wafer; a post-CMP cleaning module positioned downstream of the CMP module and comprising a core and a brush material surrounding the core and configured to perform a cleaning process on the semiconductor wafer, wherein an inlet opening, an elongated conduit, and a plurality of outlet channels are arranged in the core to guide liquid flowing into the core through the inlet opening to the brush material through the elongated conduit and the outlet channels, wherein at least one of the following parameters of a first and a second of the outlet channels spaced at different distances from the inlet opening are different to exhibit a preferential flow distribution or a target flow distribution of the liquid in the core: the width of the outlet passage; the cross-sectional shape of the outlet passage; and The outlet channel has an inclination angle relative to the length direction of the core.

16. The CMP apparatus of claim 15, wherein the second outlet channel is located further away from the inlet opening than the first outlet channel, and the width of the second outlet channel is less than the width of the first outlet channel.

17. The CMP apparatus of claim 15, wherein the second outlet channel is positioned farther from the inlet opening than the first outlet channel, and the inclination angle of the second outlet channel is greater than the inclination angle of the first outlet channel.

18. The CMP apparatus of claim 15, wherein the first outlet channel and the second outlet channel are the first two outlet channels closest to the inlet opening, the distance between the first channel and the second outlet channel is the smallest, and the distance between two of the outlet channels farthest from the inlet opening is the largest.

19. The CMP apparatus of claim 15, wherein either the first channel or the second outlet channel has a varying cross-sectional area along its length.

20. The CMP apparatus of claim 15, wherein the width (D) of the elongated conduit, the width (W) of one of the outlet channels satisfies the following equation, where n is the total number of the outlet channels: where k is the total number of outlet channels.

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