Cleaning brush for semiconductor manufacturing processes

Abstract

A cleaning brush for semiconductor manufacturing processes is provided. The cleaning brush includes a core and brush components. The core includes a circumferential portion and a closed-end portion. The circumferential portion surrounds an axis of rotation of the cleaning brush and defines an inlet opening for receiving fluid. The closed-end portion is connected to an end of the circumferential portion opposite the inlet opening along the axis of rotation. At least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels passing through it and in fluid communication with the elongated conduit, the outlet channels being inclined outward toward the closed-end portion. The brush components are connected to the outer surface of the circumferential portion and cover all the outlet channels.

Description

Technical Field

[0001] This disclosure generally relates to a cleaning brush for removing residues from a semiconductor substrate during semiconductor manufacturing processes. More specifically, this disclosure relates to a cleaning brush used in a post-CMP cleaning process. Background Technology

[0002] Integrated circuits are formed on a semiconductor substrate (specifically, a silicon wafer) by sequentially depositing conductive, semiconducting, and insulating layers onto a wafer. Circuit features can be etched after each layer is deposited. After a series of layers are deposited and etched, the uppermost surface of the substrate becomes increasingly uneven. This unevenness can cause problems in the photolithography steps of the integrated circuit manufacturing process.

[0003] Chemical mechanical polishing (CMP), also known as chemical mechanical planarization, is performed on semiconductor substrates to remove and / or polish specific surfaces of microelectronic device wafers. CMP refers to the method of removing solid layers through chemical mechanical polishing for surface planarization and defining metal interconnect patterns. In a typical CMP operation, a rotating polishing pad that receives a chemically active slurry is used to polish the outermost surface of the substrate. The substrate is positioned on the polishing pad and held in place by retaining rings. The substrate and retaining rings are typically mounted on a carrier or polishing head. A controlled force is applied to the substrate by the carrier head to keep the substrate in close contact with the polishing pad. Moving the polishing pad across the surface of the substrate causes chemical and mechanical removal of material from the substrate surface.

[0004] After polishing, contaminants containing slurry particles, organic residues, and / or metallic impurities may remain on the wafer surface and must be removed. If not removed, these contaminants can lead to various defects in subsequent processing steps (e.g., scratches, etch pits, etc.), thereby reducing the yield of integrated circuits. Therefore, a system and method are needed to effectively remove contaminants from semiconductor substrates after CMP processes to address these issues. Summary of the Invention

[0005] In summary, this disclosure provides a cleaning brush comprising a core and brush components. The core includes: a circumferential portion surrounding an axis of rotation of the cleaning brush and defining an inlet opening for receiving fluid; and a closed-end portion connected to an end of the circumferential portion opposite the inlet opening along the axis of rotation. At least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels passing through it and in fluid communication with the elongated conduit, the outlet channels being inclined outward toward the closed-end portion. The brush components are connected to the outer surface of the circumferential portion and cover all of the plurality of outlet channels.

[0006] In another aspect, this disclosure provides a cleaning brush comprising a core and brush components. The core includes: a circumferential portion surrounding an axis of rotation of the cleaning brush and defining an inlet opening for receiving fluid; and a closed-end portion connected to an end of the circumferential portion opposite the inlet opening along the axis of rotation. At least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels passing through it and in fluid communication with the elongated conduit. Furthermore, a first, second, and third region of the core are sequentially defined along a direction from the inlet opening to the closed-end portion, and the total flow rate (per unit length of the core) of the elongated conduit and the outlet channels within the respective first, second, and third regions gradually decreases. The brush components are connected to the outer surface of the circumferential portion and cover all of the plurality of outlet channels.

[0007] In another aspect, this disclosure provides a CMP (Chemical Mechanical Planarization) apparatus comprising a CMP module and a post-CMP cleaning module. The CMP module is configured to perform a CMP process on a semiconductor wafer. The post-CMP cleaning module is positioned downstream of the CMP module and includes a core and a brush material surrounding the core, and is configured to perform a cleaning process on the semiconductor wafer. An inlet opening, an elongated conduit, and a plurality of outlet channels are arranged in the core to guide liquid flowing into the core via the inlet opening through the elongated conduit and the outlet channels to the brush material. At least three parameters of a first and a second of the outlet channels spaced at different distances from the inlet opening differ to represent a preferred or target flow distribution of the liquid in the core: (a) the width of the outlet channel; (b) the cross-sectional shape of the outlet channel; and (c) the tilt angle of the outlet channel relative to the length direction of the core. Attached Figure Description

[0008] In the following detailed description, the embodiments are described for illustrative purposes only, as various changes and modifications will become apparent to those skilled in the art from the following detailed description. The same reference numerals used in different figures indicate similar or identical items.

[0009] Figure 1 This is a front perspective view of a CMP post-cleaning module according to at least one exemplary embodiment.

[0010] Figure 2 This is a right perspective view of the CMP post-cleaning module according to at least one exemplary embodiment.

[0011] Figure 3 This is a longitudinal perspective cross-sectional view of a cleaning brush according to a first exemplary embodiment.

[0012] Figure 4When brushing the outer surface of the core of the component Figure 3 A magnified view of region M1.

[0013] Figure 4A It is along Figure 3 The transverse perspective section of the exit channel obtained from line 4A.

[0014] Figure 4B It is along Figure 3 The transverse perspective section of the exit channel obtained from line 4B.

[0015] Figure 4C It is along Figure 3 The transverse perspective section of the exit channel obtained from line 4C.

[0016] Figure 4D It is along Figure 3 The lateral perspective cross-section of the exit channel obtained by Line 4D.

[0017] Figure 4E The diagram illustrates varying configurations of the chip's exit channels according to some embodiments.

[0018] Figure 5 yes Figure 3 Simulation results of hydraulic pressure distribution in the core.

[0019] Figure 6 It is a longitudinal perspective cross-sectional view of the core according to the second exemplary embodiment.

[0020] Figure 7 It is along Figure 6 The transverse perspective section of the core obtained by line AA.

[0021] Figure 8 It is along Figure 6 The transverse perspective cross-section of the core obtained by line BB.

[0022] Figure 9 It is along Figure 6 The transverse perspective cross-section of the core obtained by the CC line.

[0023] Figure 10 This is a longitudinal perspective cross-sectional view of the core according to the third exemplary embodiment.

[0024] Figure 11 When brushing the outer surface of the core of the component Figure 10 A magnified view of region M2.

[0025] Figure 12 illustrate Figure 3 , 6 Simulation results of the outlet flow rate along the length direction of the core in the first, second and third exemplary embodiments of 10.

[0026] Figure 13 This is a longitudinal perspective cross-sectional view of the core according to the fourth exemplary embodiment.

[0027] Figure 14 This is a longitudinal perspective cross-sectional view of the core according to the fifth exemplary embodiment.

[0028] Figure 15 This is a block diagram of a CMP module and a processing tool for another semiconductor process following the CMP process, according to some embodiments. Detailed Implementation

[0029] In the following detailed description, reference is made to the accompanying drawings that form part of the description. In the drawings, similar symbols generally identify similar components unless the context otherwise indicates. Furthermore, unless otherwise stated, the description of each successive drawing may refer to features from one or more of the preceding drawings to provide a clearer background and a more substantial explanation of the current exemplary embodiment. Moreover, the exemplary embodiments described in the "Detailed Description," the drawings, and the claims are not intended to be limiting. Other embodiments and changes may be utilized without departing from the spirit or scope of the objectives presented herein. It should be readily understood that the aspects of this disclosure generally described herein and illustrated in the drawings can be arranged, substituted, combined, separated, and designed in various different configurations, all of which are clearly within the scope of consideration herein.

[0030] For ease of description, spatial relative terms such as “below,” “under,” “down,” “above,” “on,” “above,” “on,” and the like are used herein to describe the relationship between one element or feature and another, as illustrated in the figures. In addition to the orientations depicted in the figures, spatial relative terms are intended to cover different orientations of the device during use or operation. The device may be oriented in other ways (rotated 90 degrees or otherwise) and thus the spatial relative descriptive terms used herein may also be interpreted.

[0031] As used herein, terms such as “first,” “second,” and “third” describe various elements, components, regions, layers, and / or sections, which should not be limited to these terms. These terms may be used only to distinguish elements, components, regions, layers, or sections from one another. Unless the context clearly indicates otherwise, the terms such as “first,” “second,” and “third” used herein do not imply a sequence or order.

[0032] As used herein, the terms “approximately,” “substantially,” “basically,” and “about” are used to describe and explain minor variations. When used in conjunction with an event or situation, the terms may refer to examples in which the event or situation occurred precisely or examples in which the event or situation occurred approximately.

[0033] Embodiments of this disclosure provide a brush design with improved performance, comprising a consistent and uniform fluid distribution across the entire length of the brush. Compared to a brush with uniformly spaced discharge outlets extending perpendicularly to the axis of rotation, this uniform fluid distribution results in consistent and reduced cleaning time and improved and uniform cleaning performance for the brush itself or the substrate cleaned by the brush.

[0034] In one exemplary embodiment, the brush of the present invention is used in a CMP (Chemical Mechanical Planarization) system to remove contaminants, such as slurry particles, organic residues, and / or metallic impurities, that have adhered to the substrate during a CMP process. However, it should be understood that this disclosure is not limited to CMP systems, and the brushes of the various embodiments disclosed herein are applicable to other substrate handling tools in the semiconductor manufacturing field. For example, the brush can be used to clean semiconductor wafers after chemical etching processes, epitaxial growth processes, etc.

[0035] According to at least one exemplary embodiment, Figure 1 This is a front perspective view of CMP post-cleaning module 1, and Figure 2 This is a right perspective view of the CMP post-cleaning module 1. According to some embodiments of this disclosure, the CMP post-cleaning module 1 includes a pair of cleaning brushes 10 and a plurality of rollers 3. The two cleaning brushes 10 are configured to clean the top and bottom surfaces of the semiconductor wafer 5. The rollers 3 are configured to abut the edges of the semiconductor wafer 5 and rotate the semiconductor wafer 5 in a vertical direction. During the cleaning process, the two cleaning brushes 10 are driven to rotate about rotation axes R1 and R2, and a predetermined external force is applied to the cleaning brushes 10 such that the surfaces of the cleaning brushes 10 are in close contact with the surfaces of the semiconductor wafer 5. Simultaneously, the rollers 3 can rotate about rotation axis R3 to drive the semiconductor wafer 5 to rotate.

[0036] In some embodiments, such as Figure 1 As shown, the cleaning brush 10 includes a core 20 and a brush component 40. (As shown...) Figure 2 As shown, the brush member 40 surrounds the core 20 and includes a plurality of nodules 41 arranged along the entire length of the brush member 40. The length L0 of the brush member 40 may be greater than the diameter W0 of the semiconductor wafer 5, and the brush member 40 may be positioned across the semiconductor wafer 5 during the cleaning process such that both the central portion and the peripheral portion of the semiconductor wafer 5 are cleaned with the nodules 41 of the brush member 40. However, it should be understood that many variations and modifications can be made to the embodiments of this disclosure. In some other embodiments, the length of the brush member 40 is less than the diameter W0 of the semiconductor wafer 5, and a plurality of brush members 40 are used to clean the top and bottom surfaces of the semiconductor wafer 5.

[0037] In some embodiments, such as Figure 2As shown, the post-CMP cleaning module 1 further includes a liquid tank 2 and a liquid line 4. Cleaning liquid 6 (e.g., surfactants and / or deionized water) is supplied from the liquid source 2 via the liquid line 4 to the inlet port 29 of the cleaning brush 10. The cleaning liquid 6 flows along the core 20 and through a plurality of holes formed on the core 20 (as shown in the reference). Figure 3 and 4 (Detailed description) Uniformly distributed across the entire surface of semiconductor wafer 5, such as by Figure 1 As indicated by arrow 6 shown in the image.

[0038] The detailed structure of the core 20 of a cleaning brush 10 according to an exemplary embodiment will be described below.

[0039] Figure 3 This is a longitudinal perspective cross-sectional view of the cleaning brush 10 according to a first exemplary embodiment. For the purpose of description, Figure 3 The brush component 40 of the cleaning brush 10 is not shown. In one illustrative embodiment, the core 20 has a first end 21 and a second end 22 opposite to the first end 21 along the longitudinal direction L of the core 20. The core 20 includes a circumferential portion 23 forming a hollow cylindrical shape about a rotation axis R1 of the core 20. An elongated conduit 26 is defined by the inner surface 231 of the circumferential portion 23. The elongated conduit 26 allows cleaning liquid to flow along the longitudinal direction L of the core 20. The elongated conduit 26 may have a circular cross-section and its center aligned with the rotation axis R1 of the core 20. Alternatively, the elongated conduit 26 may have a polygonal cross-section and its edges arranged in a mirror-symmetric manner with respect to the rotation axis R1 of the core 20.

[0040] An inlet opening 25 is formed at the first end 21 to allow cleaning fluid to enter the elongated conduit 26. A separate inlet port (e.g.) Figure 2 The inlet port 29 shown is connected to the inlet opening 25 to facilitate the engagement of the fluid line 4 to the inlet opening 25. The inlet port 29 can be engaged to the core 20 by heat, fusion, adhesive, or snap-fit ​​into the inlet opening 25. Using this arrangement, the core 20 can be used in various process tools with different drive ends and / or fluid inlets, while using a single mold to manufacture the core 20 without changing the end fittings.

[0041] The core 20 further includes a closed end portion 24 connected at its second end 22 to the circumferential portion 23. The second end 22 of the core 20 is sealed or closed by the closed end portion 24 and therefore does not allow cleaning fluid to pass through the second end 22 of the core 20. However, it should be understood that many variations and modifications can be made to the embodiments of this disclosure. In some other embodiments, both the first end 21 and the second end 22 of the core 20 are open, and cleaning fluid is supplied to the core 20 through both ends. Alternatively, the cleaning fluid enters the core 20 through an opening formed at the first end of the core 20 and exits the core 20 through another opening formed at the second end of the core 20.

[0042] Several outlet channels 30 are formed in the circumferential portion 23 of the core 20 and configured to allow cleaning liquid to be discharged from the elongated conduit 26 to the brush component 40 surrounding the core 20. Figure 1 and 2 Each of the outlet channels 30 passes through the circumferential portion 23 of the core 20 and extends from the inner surface 231 of the circumferential portion 23 to the outer surface 232. Several groups of outlet channels 30 are arranged sequentially along the longitudinal direction L of the core 20 with a constant pitch or a variable pitch. The outlet channels 30 in each group are arranged about the rotation axis R1 of the core 20. According to an exemplary embodiment of this disclosure, 144 outlet channels 30 are formed in the circumferential portion 23 of the core 20, and six outlet channels 30 are grouped together. For example, as... Figure 3 As shown, the system consists of six outlet channels 30 arranged freely around the rotation axis R1 of the core 20, comprising groups G0, G1, G2, and GN.

[0043] Figure 4 When brushing component 40 covers the outer surface 232 of core 20 Figure 3 The image shows an enlarged view of region M1 of core 20. In some embodiments, each of the outlet channels 30 has an upstream segment 31 and two or more downstream segments, such as a first downstream segment 32 and a second downstream segment 33. The upstream segment 31 extends from the inner surface 231 of core 20 and terminates at a distal end 313. The end of the upstream segment 31 formed at the inner surface 231 of core 20 defines an inlet aperture 311 of the outlet channel 30. The distal end 313 is located away from and not connected to the outer surface 232 of core 20.

[0044] In some embodiments, the upstream section 31 of the outlet channel 30 faces the closed portion 24 ( Figure 3 ) tilting outwards. Specifically, such as Figure 4 As shown, the inner wall 315 of the upstream section 31 is inclined at an angle A1 relative to the inner surface 231 of the circumferential portion 23. The inclination angle A1 can range from about 20° to about 80°, preferably from about 30° to about 60°. In one exemplary embodiment, the inclination angle A1 is about 45°. Figure 4 As shown, due to its inclined arrangement, the inlet orifice 311 of the outlet channel 30 has an elliptical shape. The purpose of tilting the outlet channel 30 toward the closed end portion (i.e., aligning it with the flow direction) is to reduce the resistance to fluid flow in the core 20, so that more flow rate leaves the outlet channel 30 compared to when the outlet channel is perpendicular to the flow direction.

[0045] In some embodiments, the inclination angle A1 of the outlet channel 30 near the closed portion 24 becomes steeper than the inclination angle A1 of the outlet channel 30 near the inlet opening 25. For example, the outlet channels 30 in the group G0 closest to the inlet opening 25 are inclined at a first angle relative to the inner surface 231 of the circumferential portion 23, and the outlet channels 30 in the group GN closest to the closed portion 24 are inclined at a second angle relative to the inner surface 231 of the circumferential portion 23. The second angle is greater than the first angle. In one exemplary embodiment, although Figure 3 Not specified, but the first angle is approximately 20° and the second angle is approximately 80°. Using this arrangement, the uniformity of fluid distribution in the core 20 can be further improved.

[0046] The first downstream section 32 and the second downstream section 33 of the outlet channel 30 are connected to the upstream section 31 at their inner ends 321 and 331, respectively. The first downstream section 32 and the second downstream section 33 extend from their inner ends 321 and 331 in a direction perpendicular to the outer surface 232 of the core 20, and terminate at outlet holes 322 and 332 formed on the outer surface 232 of the core 20. In some embodiments, the inner end 321 of the first downstream section 32 intersects the midpoint of the upstream section 31, and the inner end 331 of the second downstream section 33 intersects the distal end 313 of the upstream section 31.

[0047] In some embodiments, the outlet channel 30 has a variable cross-section along its length. For example, the width of the upstream section 31 of the outlet channel 30 tapers along its extending direction. Specifically, as Figure 4 As shown, the upstream section 31 has a first width W11 at the inlet 311 and a second width W12 at the distal end 313, and the first width W11 and the second width W12 are perpendicular to the extension axis E1 of the upstream section 31. The second width W12 is smaller than the first width W11. In another exemplary embodiment, the width W13 of the downstream section 32 and the width W14 of the second downstream section 33 are smaller than the width W11 or W12 of the upstream section 31. The width W13 of the downstream section 32 and the width W14 of the second downstream section 33 may be different. For example, the width W13 of the downstream section 32 may be narrower than the width W14 of the second downstream section 33.

[0048] It should be understood that the width and number of outlet channels 30 are variable and should not be limited to the above embodiments. In some embodiments, for better uniformity of fluid distribution, Murray's law is applied to the width D of the elongated conduit 26. Figure 3 The design of the first width W11 of the upstream section 31 and the width W13 or width W14 of the downstream sections 32 and 33. For example, the widths D, W11, W13 and W14 satisfy the following equations (1) and (2):

[0049]

[0050]

[0051] Where k is the total number of upstream segment 31, i is the total number of downstream segment 32, and j is the total number of downstream segment 33.

[0052] In some embodiments, the cross-sectional shape of the upstream section of the outlet channel differs from the cross-sectional shape of the downstream section. For example, as... Figure 4A and 4B As shown in the figure, group G1 ( Figure 3 The upstream section 31 of the outlet channel 30 in the outlet channel may have a circular shape, and the corresponding downstream section 32 in the outlet channel may have a rectangular shape. In some embodiments, the outlet channels 30 in different groups may have different cross-sectional shapes. For example, as Figure 4C and 4D As shown in the figure, group GN ( Figure 3 The upstream section 31 of the outlet channel 30 in group GN may have a rectangular shape and the corresponding downstream section 32 of the outlet channel 30 may have an elliptical shape. That is, the outlet channel 30 in group GN has a different shape than the outlet channel 30 in group G1.

[0053] In some embodiments, the geometry, shape, and size of the outlet channel 30 can be selectively varied along the length of the core 20, as long as uniform pressurization can be achieved. The cross-sectional shape of the outlet channel 30 can be selected from a regular shape (e.g., Figures 4A to 4D The shapes shown), irregular shapes and / or non-prismatic shapes (e.g.) Figure 4E The S-shape, U-shape, droplet shape, or any other suitable shape shown in the diagram. Furthermore, in cases where the outlet channel has a rectangular shape, the width-to-length ratio of the rectangular channel can be derived to meet the flow requirements and pressurization targets of the post-CMP cleaning process.

[0054] In some embodiments, the exit passages 30 in two adjacent groups are arranged in an alternating manner. For example, as Figure 3 As shown, the first group G1 of outlet channels 30 is positioned adjacent to the second group G2 of outlet channels 30. The outlet channels 30 in the first group G1 are offset from the outlet channels 30 in the second group G2. However, this disclosure should not be limited to the above embodiment. The outlet channels 30 in the two adjacent groups may be aligned with each other along the longitudinal direction L of the core 20.

[0055] Core 20 may be made of any chemically inert polymeric material, such as polymers, copolymers, other materials used in CMP cleaning processes, and the like. In some embodiments, core 20 is manufactured using 3D printing technology, and the material used for core 20 may be, for example, acrylonitrile-butadiene-styrene (ABS) or polycarbonate. In some embodiments, despite providing a high ratio of open surface area in core 20, core 20 still possesses sufficient stiffness, and those skilled in the art of CMP can select the stiffness to achieve the desired cleaning results, depending on the composition of the semiconductor substrate, contaminants, or combinations thereof.

[0056] Brush component 40 is formed on the outer surface 232 of core 20 and covers all outlet holes 322 and 332 of outlet channel 30. In an exemplary embodiment, brush component 40 is made of or contains polyvinyl alcohol (PVA) or other suitable material, which is applied in liquid form to the outer surface 232 of core 20 and then cured. During the formation of brush component 40, a portion 43 of the material of brush component 40 may flow into and seal the first downstream section 32 and the second downstream section 33 of outlet channel 30, such as... Figure 4 As shown in the diagram. Due to the narrow width of the first downstream section 32 and the second downstream section 33 of the outlet channel 30, the first downstream section 32 and the second downstream section 33 are partially filled with the material of the brush component 40, while the upstream section 31 is not filled with the material of the brush component 40. However, it should be understood that many variations and modifications can be made to the embodiments of this disclosure. In some other embodiments, the first downstream section 32 and the second downstream section 33 are completely filled with the material of the brush component 40, and the upstream section 31 is partially filled with the material of the brush component 40.

[0057] Figure 5 yes Figure 3 The simulation results show the hydraulic pressure distribution in the core 20. The simulation was performed to obtain the pressure distribution across the entire length of the core 20 as cleaning fluid is supplied to the core 20 through an inlet opening 25 formed at the first end 21 of the core 20. According to Murray's law, the biomimetic design of the core 20 ensures minimal pressure drop of the fluid along the length of the core 20 and exhibits exceptional uniformity of pressure distribution of the fluid within the elongated conduit 26 of the core 20. Therefore, the pressure of the fluid exiting the outlet channel 30 is substantially uniform, and a large area of ​​the brush member 40 covering the outlet channel is thoroughly rinsed by the cleaning fluid, thereby improving the cleaning efficiency of the brush member 40 or the semiconductor wafer cleaned by the cleaning brush 10. Compared to conventional cores containing an outlet channel extending perpendicularly to the axis of rotation across its entire length, the embodiments of this disclosure exhibit a larger outlet flow rate at the proximal end of the core and a smaller outlet flow rate at the distal end of the core.

[0058] The configuration of the core of the cleaning brush 10, which is surrounded by the brush component 40, should not be limited to the embodiments described above. Some exemplary embodiments of the core will be described below.

[0059] Figure 6 This is a longitudinal perspective sectional view of core 20a according to a second exemplary embodiment. In one illustrative embodiment, core 20a has a first end 21a and a second end 22a opposite to the first end 21a along the longitudinal direction L of core 20a. A plurality of inlet openings (e.g., a first inlet opening 251a, a second inlet opening 252a, and a third inlet opening 253a) are defined at the first end 21a of core 20a to allow cleaning fluid to enter different conduits within the core. The first inlet opening 251a, the second inlet opening 252a, and the third inlet opening 253a are arranged adjacent to each other and concentrically with respect to the axis of rotation R1 of core 20a. The first inlet opening 251a, the second inlet opening 252a, and the third inlet opening 253a may have the same width along the radial direction of core 20a.

[0060] In some embodiments, core 20a includes a plurality of separate structures that extend and retract from each other. In one exemplary embodiment, core 20a includes a first component 201a, a second component 202a, and a third component 203a. The first component 201a, the second component 202a, and the third component 203a each include a first sub-segment wall 234a, a second sub-segment wall 235a, and a third sub-segment wall 236a. The first sub-segment wall 234a, the second sub-segment wall 235a, and the third sub-segment wall 236a are each annular and sequentially arranged along the longitudinal direction L from a first end 21a to a second end 22a of core 20a to cooperatively construct a brush component 40 thereon. Figure 1 The circumferential portion 23 of the core 20.

[0061] Furthermore, the first component 201a, the second component 202a, and the third component 203a respectively include a first fluid guiding portion 237a, a second fluid guiding portion 238a, and a third fluid guiding portion 239a for defining a plurality of elongated conduits in the core 20a. Specifically, the first fluid guiding portion 237a is connected to the inner surface of the first sub-segment wall 234a and extends from the distal end of the first sub-segment wall 234a adjacent to the second sub-segment wall 235a to the first inlet opening 251a. The first elongated conduit 261a is defined between the first sub-segment wall 234a and the first fluid guiding portion 237a and is in fluid communication with the first inlet opening 251a.

[0062] The second fluid guiding portion 238a is connected to the inner surface of the second sub-segment wall 235a and extends from the distal end of the second sub-segment wall 235a adjacent to the third sub-segment wall 236a to the second inlet opening 252a. The upstream of the second elongated conduit 262a is defined between the first fluid guiding portion 237a and the second fluid guiding portion 238a, and the downstream of the second elongated conduit 262a is defined between the second fluid guiding portion 238a and the second sub-segment wall 235a. The second elongated conduit 262a is in fluid communication with the second inlet opening 252a.

[0063] The third fluid guiding portion 239a is connected to the inner surface of the third sub-segment wall 236a and extends from the distal end of the third sub-segment wall 236a adjacent to the second end 22a of the core 20a to the third inlet opening 253a. The upstream of the third elongated conduit 263a is defined between the second fluid guiding portion 238a and the third fluid guiding portion 239a, and the downstream of the third elongated conduit 263a is defined between the third fluid guiding portion 239a and the third sub-segment wall 236a. The third fluid guiding portion 239a is in fluid communication with the third inlet opening 253a. The closed end portion 24a of the core 20a is defined by the portion of the third fluid guiding portion 239a connected to the third sub-segment wall 236a. The first fluid guiding portion 237a, the second fluid guiding portion 238a, and the third fluid guiding portion 239a may be formed in a streamlined shape (e.g., Figure 6 (As shown in the figure) to reduce the fluid resistance in core 20a.

[0064] Several outlet channels 30a are formed at the first sub-segment wall 234a, the second sub-segment wall 235a, and the third sub-segment wall 236a and are configured to allow cleaning liquid to be discharged from the first elongated conduit 261a, the second elongated conduit 262a, and the third elongated conduit 263a to the brush component surrounding the core 20a. Each of the outlet channels 30a passes through the circumferential portion 23a of the core 20a and extends from the inner surface 231a of the circumferential portion 23a to the outer surface 232a.

[0065] Several groups of outlet channels 30a are arranged along the longitudinal direction L of core 20a with a fixed or variable pitch, and the outlet channels 30a in each group are arranged around the rotation axis R1 of core 20a. Figure 7 , 8 And 9 shows the arrangement of the exit channels 30a in each of the first component 201a, the second component 202a and the third component 203a. Figure 7 , 8 and 9 displays respectively along Figure 6 The transverse perspective cross-sectional view of core 20a obtained from lines AA, BB, and CC. In an exemplary embodiment, as... Figure 7 , 8As shown in Figure 9, each of the groups of outlet channels arranged around the rotation axis R1 consists of four outlet channels 30a formed in the first sub-section wall 234a, the second sub-section wall 235a, and the third sub-section wall 236a. Figure 7 As shown, the two ends of the outlet channel 30a form an inlet hole 31a and an outlet hole 32a on the inner surface 231a and the outer surface 232a of the circumferential portion 23a, respectively. In some embodiments, a flange 39a is formed at the outlet hole 32a and surrounds the outlet hole 32a.

[0066] refer to Figure 6 In some embodiments, the outlet channels 30a are inclined outward toward the closed end portion 24a. Specifically, the outlet channels 30a formed at the first sub-segment wall 234a each extend along the extension axis E2 and are inclined at an angle A2 relative to the inner surface 231a of the circumferential portion 23a. The outlet channels 30a formed at the second sub-segment wall 235a each extend along the extension axis E3 and are inclined at an angle A3 relative to the inner surface 231a of the circumferential portion 23a. The outlet channels 30a formed at the third sub-segment wall 236a each extend along the extension axis E4 and are inclined at an angle A4 relative to the inner surface 231a of the circumferential portion 23a. The inclination angles A2, A3, and A4 can be in the range of about 20° to about 90°, preferably in the range of about 30° to about 60°. In an exemplary embodiment, the inclination angles A2, A3, and A4 are about 45°. The purpose of tilting the outlet channel 30a toward the closed end (i.e., aligning it with the flow direction) is to reduce the flow resistance in the core 20a, so that more flow leaves the outlet channel 30a compared to when the outlet channel is perpendicular to the flow direction.

[0067] In some embodiments, the inclination angle of the outlet channel 30a near the closed end portion 24a becomes steeper than the inclination angle of the outlet channel 30a near the inlet openings 251a, 252a, and 253a. For example, the inclination angle A4 of the outlet channel 30a formed at the third sub-segment wall 236a is greater than the inclination angle A3 of the outlet channel 30a formed at the second sub-segment wall 235a, and the inclination angle A3 of the outlet channel 30a is greater than the inclination angle A2 of the outlet channel 30a formed at the first sub-segment wall 234a. In an exemplary embodiment, although Figure 6 It is not specified, but the tilt angle A2 is approximately 20°, the tilt angle A3 is approximately 45°, and the tilt angle A4 is approximately 90°. Using this arrangement, the uniformity of fluid distribution in core 20a can be further improved.

[0068] In some embodiments, the outlet channel 30a has a varying cross-section along its length. In one exemplary embodiment, such as Figure 7As shown, the outlet channel 30a has a spindle-shaped cross-section, wherein the width of the middle section of the outlet channel 30a is greater than the width of the inlet orifice 31a or the outlet orifice 32a. It should be understood that the width and number of outlet channels 30a are variable and not limited to the above embodiment. The geometry, shape, and size of the outlet channel 30a can be selectively varied along the length of the core 20a, as long as uniform pressurization is achieved. In the case where the outlet channel has a rectangular shape, the width-to-length ratio of the rectangular channel can be derived, which satisfies the flow requirements and pressurization targets of the post-CMP cleaning process.

[0069] In some embodiments, the first region Z1, the second region Z2, and the third region Z3 of the core 20a are defined sequentially along a direction from the inlet openings 251a, 252a, and 253a to the closed portion 24a. The first region Z1 corresponds to the segment of the core 20a in which the outlet channel 30a, in which the first sub-segment wall 234a is located, is located. The second region Z2 corresponds to the segment of the core 20a in which the outlet channel 30a, in which the second sub-segment wall 235a is located, is located. The third region Z3 corresponds to the segment of the core 20a in which the outlet channel 30a, in which the third sub-segment wall 236a is located, is located.

[0070] In some embodiments, the total flow rate (per unit length) of the elongated conduit and outlet channel within the corresponding first zone Z1, second zone Z2, and third zone Z3 gradually decreases. Specifically, as Figure 7 As shown, the core 20a in zone Z1 includes four outlet channels 30a and three elongated conduits 261a, 262a, and 263a. The core 20a in zone Z2 includes four outlet channels 30a and two elongated conduits 262a and 263a. The core 20a in zone Z3 includes four outlet channels 30a and one elongated conduit 263a. Therefore, the total flow rate (per unit length) of the elongated conduits in zone Z1 is greater than that in zone Z2, and the total flow rate (per unit length) of the elongated conduits in zone Z2 is greater than that in zone Z3.

[0071] Core 20a may be made of any chemically inert polymeric material, such as polymers, copolymers, other materials used in CMP cleaning processes, and the like. In some embodiments, core 20a is manufactured using 3D printing technology, and the material used for core 20a may be, for example, acrylonitrile-butadiene-styrene (ABS) or polycarbonate. In some embodiments, although core 20a comprises several layers that expand and contract with each other, core 20a still has sufficient stiffness to maintain cleaning uniformity.

[0072] Figure 10This is a longitudinal perspective cross-sectional view of core 20b according to a third exemplary embodiment. In one illustrative embodiment, core 20b has a first end 21b and a second end 22b opposite to the first end 21b along the longitudinal direction L of core 20b. Core 20b includes a circumferential portion 23b forming a hollow cylindrical shape about a rotation axis R1 of core 20b. An elongated conduit 26b is defined by the inner surface 231b of the circumferential portion 23b. The elongated conduit 26b allows cleaning fluid to flow along the longitudinal direction L of core 20b.

[0073] An inlet opening 25b is formed at the first end 21b to allow cleaning fluid to enter the elongated conduit 26b. The core 20b further includes a closed end portion 24b connected at its second end 22b to the circumferential portion 23b. The second end 22b of the core 20b is sealed by the closed end portion 24b and therefore does not allow cleaning fluid to pass through it. A flange 28b is formed on the outer surface of the closed end portion 24b for connecting the core 20b to a tool mandrel (not shown).

[0074] Several outlet channels 30b are formed in the circumferential portion 23b of the core 20b and configured to allow cleaning liquid to be discharged from the elongated conduit 26b to the brush component 40 surrounding the core 20b. Figure 1 and 2 Each of the outlet channels 30b passes through the circumferential portion 23b of the core 20b and extends from the inner surface 231b of the circumferential portion 23b to the outer surface 232b. Several groups of outlet channels 30b are arranged sequentially along the longitudinal direction L of the core 20b with a constant pitch or a variable pitch. The outlet channels 30b in each group are arranged about the rotation axis R1 of the core 20b. According to an exemplary embodiment of this disclosure, each of the groups (e.g., groups G1, G2, and G3) consists of four outlet channels 30b arranged about the rotation axis R1 of the core 20b. Figure 10 Only three exit channels for each group are shown in the image.

[0075] In some embodiments, the inner surface 231b of the circumferential portion 23b tapers from the inlet opening 25b to the closed portion 24b along the longitudinal direction L of the core 20b. Therefore, the thickness of the circumferential portion 23b gradually increases in the direction away from the inlet opening 25b, and the outlet channel 30b arranged along the longitudinal direction L has a gradually increasing flow rate. For example, the outlet channel 30b of group G3 has a flow rate greater than that of the outlet channel 30b of group G2. Additionally, the outlet channel 30b of group G2 has a flow rate greater than that of the outlet channel 30b of group G1. Figure 10 In the illustrated embodiment, groups G1, G2 and G3 are three groups of outlet channels arranged sequentially along the longitudinal direction of core 20b.

[0076] Figure 11 When brushing component 40b covers the outer surface 232b of core 20b. Figure 10 The image shows an enlarged view of region M2 of core 20b. In some embodiments, each of the outlet channels 30b has an upstream segment 31b and a downstream segment 32b. The upstream segment 31b extends from the inner surface 231b of core 20b and is connected to the downstream segment 32b. The end of the upstream segment 31b formed at the inner surface 231b of core 20b defines an inlet orifice 311b of the outlet channel 30b. The downstream segment 32b extends from the outer surface 232b of core 20b and is connected to the upstream segment 31b. The end of the downstream segment 32b formed at the outer surface 232b of core 20b defines an outlet orifice 322b of the outlet channel 30b.

[0077] In some embodiments, the outlet channel 30b has a variable cross-section along its length. For example, as... Figure 11 As shown, the upstream section 31b includes outwardly tapering fillets or chamfers and has an inner wall inclined relative to the inner surface 231b of the circumferential portion 23b. The downstream section 32b is perpendicular to the outer surface 232b of the circumferential portion 23b. Therefore, the first width W31 of the inlet orifice 311b is greater than the second width W32 of the outlet orifice 322b.

[0078] It should be understood that the width and number of outlet channels 30b are variable and should not be limited to the above embodiments. Furthermore, the geometry, shape, and size of the outlet channels 30b can be selectively varied along the length of the core 20b, as long as uniform pressurization can be achieved.

[0079] Core 20b can be made of any chemically inert polymeric material, such as polymers, copolymers, other materials used in CMP cleaning processes, and the like, and can be formed using an injection molding process. In some embodiments, such as Figure 11 As shown, the brush component 40b is formed on the outer surface 232b of the core 20b and covers all the outlet holes 322b of the outlet channel 30b. In one exemplary embodiment, the brush component 40b is applied to the outer surface 232b of the core 20b in liquid form and then cured. During the formation of the brush component 40b, the material of the brush component 40b fills the entire volume of the outlet channel 30b. In some embodiments, the brush component 40b comprises polyvinyl alcohol (PVA) or other suitable materials. In some embodiments, although the circumferential portion of the core 20b has varying thickness, the core 20b still has sufficient stiffness to maintain uniform cleaning.

[0080] In some embodiments, such as Figure 10As shown, because the elongated conduit 26b tapers along the longitudinal direction L of the core 20b, the flow rate (per unit length) of the elongated conduit 26b of the core 20b gradually decreases. In some embodiments, the first region Z1, the second region Z2, and the third region Z3 of the core 20b are sequentially defined along the direction from the inlet opening 25b to the closed portion 24b. The first region Z1, the second region Z2, and the third region Z3 are equidistant along the longitudinal direction L of the core 20b and each contains three groups of outlet channels 30b spaced at constant pitch from each other. Through the flow rate gradient along the length of the core 20b, more outlet flow can be discharged in the upper half of the core, and thus a uniform fluid distribution can be achieved.

[0081] Figure 12 This is an outlet flow rate diagram of the cleaning fluid from the core, varying according to the distance between the outlet channel and the inlet opening, based on embodiments of this disclosure. Figure 12 It can be seen that core 20 exhibits a constant (stable within + / - 5 ml / min) outlet flow rate along its length. Core 20a exhibits an outlet flow rate that varies between approximately 145 (ml / min) and approximately 180 (ml / min) in the upper half of its length and reaches a stable outlet flow rate in the lower half of its length. Although core 20b exhibits an outlet flow rate that varies between approximately 95 (ml / min) and approximately 180 (ml / min) in the upper half of its length, it exhibits a stable outlet flow rate that varies between approximately 180 (ml / min) and approximately 205 (ml / min) in the lower half of its length. In comparison, as... Figure 12 The dashed line in the middle represents an unacceptable increase in flow toward its closed end in a conventional core.

[0082] Figure 13 This is a longitudinal perspective sectional view of core 20c according to a fourth exemplary embodiment. In one illustrative embodiment, core 20c has a first end 21c and a second end 22c opposite to the first end 21c along the longitudinal direction L of core 20c. Core 20c includes a circumferential portion 23c forming a hollow cylindrical shape about a rotation axis R1 of core 20c. An elongated conduit 26c is defined by the inner surface 231c of the circumferential portion 23c. The elongated conduit 26c allows cleaning fluid to flow along the longitudinal direction L of core 20c.

[0083] An inlet opening 25c is formed at the first end 21c to allow cleaning fluid to enter the elongated conduit 26c. The core 20c further includes a closed end portion 24c connected at its second end 22c to the circumferential portion 23c. The second end 22c of the core 20c is sealed by the closed end portion 24c and does not allow cleaning fluid to pass through it. A flange 28c may be formed on the outer surface of the closed end portion 24c to connect the core 20c to a tool mandrel (not shown).

[0084] Several outlet channels 30c are formed in the circumferential portion 23c of the core 20c and configured to allow cleaning liquid to be discharged from the elongated conduit 26c to the brush component 40 surrounding the core 20c. Figure 1 and 2 Each of the outlet channels 30c passes through the circumferential portion 23c of the core 20c and extends from the inner surface 231c of the circumferential portion 23c to the outer surface 232c. Several groups of outlet channels 30c are arranged along the longitudinal direction L of the core 20c, and the outlet channels 30c in each group are arranged about the rotation axis R1 of the core 20c. According to an exemplary embodiment of this disclosure, each of the groups consists of four outlet channels 30c arranged about the rotation axis R1 of the core 20c. Figure 13 Only three exit channels for each group are shown in the image.

[0085] In some embodiments, some outlet channels 30c have varying cross-sections along their length, while others have a uniform cross-sectional shape. For example, as... Figure 13 As shown, one of the outlet channels 30c has an upstream section 31c and a downstream section 32c. The upstream section 31c extends from the inner surface 231c of the core 20c and is connected to the downstream section 32c. The downstream section 32c extends from the outer surface 232c of the core 20c and is connected to the upstream section 31c. The upstream section 31c includes a rounded corner that is inclined relative to the inner surface 231c of the circumferential portion 23c, and the downstream section 32c is perpendicular to the outer surface 232c of the circumferential portion 23c.

[0086] In some embodiments, the first region Z1, the second region Z2, and the third region Z3 of the core 20c are defined sequentially along a direction from the inlet opening 25c to the closed portion 24c. Each of the first region Z1, the second region Z2, and the third region Z3 includes multiple groups of outlet channels 30c spaced apart from each other by a constant pitch. Specifically, the outlet channels 30c in the first region Z1 are spaced apart by a first pitch P1, the outlet channels 30c in the second region Z2 are spaced apart by a second pitch P2, and the outlet channels 30c in the third region Z3 are spaced apart by a third pitch P3.

[0087] In one exemplary embodiment, the first pitch P1, the second pitch P2, and the third pitch P3 are different from each other. For example, the pitch P2 of the outlet channel 30c in the second zone Z2 is greater than the pitch P1 of the outlet channel 30c in the first zone Z1. Furthermore, the pitch P3 of the outlet channel 30c in the third zone Z3 is greater than the pitch P2 of the outlet channel 30c in the second zone Z2. Therefore, per unit length of the core 20c, the total flow rate of the elongated conduit 26c and the outlet channel 30c in zone Z1 is greater than that in zone Z2 because the number of outlet channels 30c in zone Z1 is greater than the number of outlet channels 30c in zone Z2. Additionally, per unit length of the core 20c, the total flow rate of the elongated conduit 26c and the outlet channel 30c in zone Z2 is greater than that in zone Z3 because the number of outlet channels 30c in zone Z2 is greater than the number of outlet channels 30c in zone Z3. In one exemplary embodiment, the ratio of pitches P1, P2, and P3 is approximately 1:2:4.

[0088] It should be understood that the width and number of outlet channels 30c are variable and not limited to the above embodiments. Furthermore, the geometry, shape, and size of the outlet channels 30c can be selectively varied along the length of the core 20c, as long as uniform pressurization is achieved. For example, the outlet channels 30c in zones Z1, Z2, and Z3 have widths W41, W42, and W43, respectively. In one exemplary embodiment, although... Figure 13 It is not specified, but the width W43 is greater than the width W42 and the width W42 can be greater than the width W41.

[0089] Figure 14 This is a longitudinal perspective cross-sectional view of core 20d according to a fifth exemplary embodiment. In one illustrative embodiment, core 20d has a first end 21d and a second end 22d opposite to the first end 21d along the longitudinal direction L of core 20d. Core 20d includes a circumferential portion 23d forming a hollow cylindrical shape about a rotation axis R1 of core 20d. An elongated conduit 26d is defined by the inner surface 231d of the circumferential portion 23d. The elongated conduit 26d allows cleaning fluid to flow along the longitudinal direction L of core 20d.

[0090] An inlet opening 25d is formed at the first end 21d to allow cleaning fluid to enter the elongated conduit 26d. The core 20d further includes a closed end portion 24d connected at its second end 22d to the circumferential portion 23d. The second end 22d of the core 20d is sealed by the closed end portion 24d and therefore does not allow cleaning fluid to pass through it. A flange 28d is formed on the outer surface of the closed end portion 24d for connecting the core 20d to a tool mandrel (not shown).

[0091] Several outlet channels 30d are formed in the circumferential portion 23d of the core 20d and configured to allow cleaning liquid to be discharged from the elongated conduit 26d to the brush component 40 surrounding the core 20d. Figure 1 and 2 Each of the outlet channels 30d passes through the circumferential portion 23d of the core 20d and extends from the inner surface 231d of the circumferential portion 23d to the outer surface 232d. The two ends of the outlet channel 30d form an inlet hole 31d and an outlet hole 32d on the inner surface 231d and the outer surface 232d of the circumferential portion 23d, respectively. Several groups of outlet channels 30d are arranged with a fixed or variable pitch along the longitudinal direction L of the core 20d, and the outlet channels 30d in each group are arranged about the rotation axis R1 of the core 20d. According to an exemplary embodiment of this disclosure, each of the groups consists of four outlet channels 30d arranged about the rotation axis R1 of the core 20d. Figure 14 Only three exit channels for each group are shown in the image.

[0092] In some embodiments, the outlet channel 30d is inclined outward toward the closed portion 24d. Specifically, the outlet channel 30d closest to the inlet opening 25d extends along the extension axis E5 and is inclined relative to the inner surface 231d of the circumferential portion 23d. The extension axis E5 forms an inclination angle A5 relative to the rotation axis R1. The outlet channel 30d closest to the closed portion 24d extends along the extension axis E6 and is inclined relative to the inner surface 231d of the circumferential portion 23d. The extension axis E6 forms an inclination angle A6 relative to the rotation axis R1. Inclination angles A5 and A6 can range from about 20° to about 90°, preferably from about 30° to about 60°. In an exemplary embodiment, inclination angles A5 and A6 are about 45°. Figure 14 As shown, due to its inclined arrangement, the inlet orifice 31d of the outlet channel 30d has an elliptical shape. The purpose of tilting the outlet channel 30d toward the closed end portion (i.e., aligning it with the flow direction) is to reduce the resistance to fluid flow in the core 20d, so that more flow rate leaves the outlet channel 30d compared to when the outlet channel is perpendicular to the flow direction.

[0093] In some embodiments, the inclination angle of the outlet channel 30d near the closed portion 24d becomes steeper than the inclination angle of the outlet channel 30d near the inlet opening 25d. For example, the inclination angle A6 may be greater than the inclination angle A5. In an exemplary embodiment, although Figure 14 It is not specified, but the tilt angle A5 is approximately 20° and the tilt angle A6 is approximately 90°. Using this arrangement, the uniformity of fluid distribution in core 20d can be further improved.

[0094] It should be understood that the width and number of outlet channels 30d are variable and not limited to the above embodiments. Furthermore, the geometry, shape, and size of the outlet channels 30d can be selectively varied along the length of the core 20d, as long as uniform pressurization is achieved. For example, the outlet channel 30d closest to the inlet opening 25d has a width W51, and the outlet channel 30d closest to the closed end portion 24d has a width W52. Width W51 can be greater than width W52.

[0095] Figure 15 This is a block diagram of a CMP module 7 and a processing apparatus 9 for subsequent processes after the CMP process, according to some embodiments. In some embodiments, the CMP module 7 includes a CMP module 8 and a post-CMP cleaning module known in the art, for example... Figure 1 The CMP post-cleaning module 1 is depicted in the diagram. The CMP post-cleaning module 1 is positioned downstream of the CMP module 7 to receive the wafer from the CMP module. The processing apparatus 9 can be any processing tool used to perform a suitable process on the semiconductor wafer after the CMP process. For example, the processing apparatus 9 can be a tool for forming a film on the semiconductor wafer by CVD, PVD, ALD, or any other suitable method.

[0096] In operation, a CMP process is performed on the semiconductor wafer by the CMP module 7, followed by cleaning of the wafer in the CMP post-cleaning module 1. In some embodiments, before loading the wafer into the CMP post-cleaning module 1, a cleaning liquid is supplied to the core of any embodiment of the present disclosure to rinse the brush members 40 to remove particles thereon. After cleaning the brush members 40, the wafer is loaded into the CMP post-cleaning module 1 for a CMP post-cleaning process. In the CMP post-cleaning process, a cleaning liquid is supplied to the core to rinse the brush members 40, and the cleaning brush 10 is rotated to clean the surface of the wafer through the brush members 40. After the CMP post-cleaning process is completed, the wafer is removed from the CMP post-cleaning module 1, and a cleaning liquid is again supplied to the core to rinse the brush members 40 to remove particles that adhered to the brush members during the CMP post-cleaning process. The wafer may be further processed in the processing apparatus 9.

[0097] In the CMP post-cleaning module 1, due to its core's excellent and uniform fluid distribution along its length, it exhibits higher particle removal efficiency across the brush component length and the entire surface of the semiconductor wafer compared to conventional cleaning modules. Therefore, the time required to clean the brush component or wafer can be reduced, resulting in reduced water consumption and an environmentally friendly manufacturing process. Furthermore, by thoroughly cleaning the brush component before and after the cleaning process, the defect count on the wafer used to monitor the condition of the brush component can be controlled. This extends the lifespan of the cleaning brush and reduces manufacturing costs. Moreover, because contaminants are fully removed from the semiconductor wafer, the product yield of the semiconductor wafer can be improved.

[0098] The following embodiments, indicated by letters and numbers, are intended to further illustrate this disclosure, but should not be construed as unduly limiting this disclosure.

[0099] A1. A cleaning brush comprising:

[0100] The chip includes:

[0101] The circumferential portion surrounds the axis of rotation of the cleaning brush and defines an inlet opening for receiving fluid; and

[0102] The closed end portion is connected to the end of the circumferential portion opposite the inlet opening along the axis of rotation.

[0103] At least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels passing through it in fluid communication with the elongated conduit, the outlet channels being inclined outward toward the closed portion; and

[0104] A brush component, which is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels.

[0105] A2. The cleaning brush according to embodiment A1, wherein the outlet channel is inclined at an angle ranging from about 20° to about 90° toward the closed end portion.

[0106] A3. The cleaning brush according to embodiment A2, wherein the plurality of outlet channels includes a first outlet channel and a second outlet channel positioned closer to the closed portion than the first outlet channel, wherein the tilt angle of the second outlet channel is greater than the tilt angle of the first outlet channel.

[0107] A4. The cleaning brush according to embodiments A1 to A3, wherein each of the outlet channels comprises: an upstream section connected to an inner surface of the circumferential portion; and at least one downstream section connecting the upstream section to the outer surface of the circumferential portion, wherein the upstream section is inclined relative to the inner surface of the circumferential portion and the downstream section is perpendicular to the outer surface of the circumferential portion.

[0108] A5. The cleaning brush according to embodiment A4, wherein each of the outlet channels includes two downstream segments that branch off from the upstream segment and extend to the outer surface of the circumferential portion, and the width of the two downstream segments is less than the width of the upstream segment.

[0109] A6. According to the cleaning brush of embodiment A4, the width (D) of the elongated conduit, the width (W11) of the upstream section of the outlet channel, and the width (W13) of the downstream section satisfy the following equations (1) and (2):

[0110]

[0111] Where k is the total number of upstream segments and i is the total number of downstream segments.

[0112] A7. The cleaning brush according to embodiments A1 to A6, wherein each of the outlet channels comprises: an upstream section connected to the inner surface of the circumferential portion; and at least one downstream section connecting the upstream section to the outer surface of the circumferential portion, wherein the cross-sectional shape of the upstream section is different from the cross-sectional shape of the downstream section.

[0113] A8. The cleaning brush according to embodiments A1 to A7, wherein the plurality of outlet channels include a first outlet channel and a second outlet channel positioned further away from the inlet opening than the first outlet channel, and the cross-sectional shape or size of the first outlet channel is different from the cross-sectional shape or size of the second outlet channel.

[0114] A9. The cleaning brush according to embodiments A1 to A8, wherein the circumferential portion includes a rounded or chamfered corner at the intersection of at least one of the outlet channels and the elongated conduit.

[0115] B1. A cleaning brush comprising:

[0116] The chip includes:

[0117] The circumferential portion surrounds the axis of rotation of the cleaning brush and defines an inlet opening for receiving fluid; and

[0118] The closed end portion is connected to the end of the circumferential portion opposite the inlet opening along the axis of rotation.

[0119] At least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels passing through it and in fluid communication with the elongated conduit.

[0120] The first, second, and third regions of the core are sequentially defined along the direction from the inlet opening to the closed portion, and the total flow rate (per unit length of the core) of the elongated conduit and the outlet channel within the corresponding first, second, and third regions gradually decreases; and

[0121] A brush component, which is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels.

[0122] B2. The cleaning brush according to embodiment B1, wherein the at least one inlet opening includes first, second, and third inlet openings arranged adjacent to each other and concentrically arranged relative to the axis of rotation of the cleaning brush, and the at least one elongated conduit includes first, second, and third elongated conduits, wherein each of the first, second, and third elongated conduits is in fluid communication with at least one of the outlet channels of the core, and the outlet flow rate of the outlet channel connected to the first elongated conduit is different from the outlet flow rate of the outlet channel connected to the second or third elongated conduit to provide preferred or target flow at different locations of the core.

[0123] B3. The cleaning brush according to embodiment B2, wherein the distance between two adjacent outlet channels gradually increases or decreases in a direction away from the inlet opening.

[0124] B4. The cleaning brush according to embodiment B3, wherein the distance between the first two outlet channels closest to the inlet opening is the smallest, and the distance between the last two outlet channels furthest from the inlet opening is the largest.

[0125] B5. The cleaning brush according to embodiment B1, wherein the thickness of the circumferential portion gradually increases in the direction away from the inlet opening, such that the outlet channel positioned close to the closed end portion has a maximum length in the radial direction of the core perpendicular to the axis of rotation.

[0126] C1. A CMP (Chemical Mechanical Planarization) apparatus, comprising:

[0127] CMP module, which is configured to perform CMP process on semiconductor wafers;

[0128] A post-CMP cleaning module, positioned downstream of the CMP module, includes a core and brush material surrounding the core and is configured to perform a cleaning process on the semiconductor wafer.

[0129] An inlet opening, a slender conduit, and multiple outlet channels are arranged within the core to guide liquid flowing into the core via the inlet opening through the slender conduit and outlet channels to the brush material. At least one of the following parameters differs for a first and a second of the outlet channels spaced at different distances from the inlet opening to represent a preferred or target flow distribution of the liquid within the core:

[0130] The width of the outlet channel;

[0131] The cross-sectional shape of the outlet channel; and

[0132] The angle of inclination of the outlet channel relative to the length direction of the core.

[0133] C2. The CMP device according to embodiment C1, wherein the second exit channel is positioned further away from the inlet opening than the first exit channel, and the width of the second exit channel is smaller than the width of the first exit channel.

[0134] C3. The CMP device according to embodiments C1 to C2, wherein the second outlet channel is positioned further away from the inlet opening than the first outlet channel, and the tilt angle of the second outlet channel is greater than the tilt angle of the first outlet channel.

[0135] C4. The CMP device according to embodiments C1 to C3, wherein the first outlet channel and the second outlet channel are the two outlet channels closest to the inlet opening, the distance between the first channel and the second outlet channel is the smallest, and the distance between the two outlet channels furthest from the inlet opening is the largest.

[0136] C5. The CMP device according to embodiments C1 to C4, wherein either the first channel or the second outlet channel has a variable cross-sectional area along its length.

[0137] C6. The CMP apparatus according to embodiments C1 to C5, wherein the width (D) of the elongated conduit and the width (W) of one of the outlet channels satisfy the following equation, where n is the total number of the outlet channels:

[0138]

[0139] Where k is the total number of the exit channels.

[0140] The examples disclosed in this application are to be regarded in all respects as illustrative rather than limiting. The scope of the invention is indicated by the appended claims rather than the foregoing description; and all modifications within the equivalent meaning and scope of the claims are intended to be included therein.

[0141] The terminology used in this specification is intended to describe particular embodiments and not to be limiting. Unless otherwise expressly indicated, the terms "a" and "described" also include plural forms. The term "comprising" as used in this specification specifically means the presence of the stated features, integers, steps, operations, elements, and / or components, but does not exclude the presence or addition of one or more other features, integers, steps, operations, elements, and / or components.

[0142] Regarding the above description, it should be understood that detailed changes may be made without departing from the scope of this disclosure, particularly concerning the construction materials used and the shape, size, and arrangement of parts. This specification and the described embodiments are for illustrative purposes only, and the true scope and spirit of this disclosure are indicated by the appended claims.

Claims

1. A cleaning brush, comprising: The chip includes: The circumferential portion surrounds the axis of rotation of the cleaning brush and defines an inlet opening for receiving fluid; and The closed end portion is connected to the end of the circumferential portion opposite the inlet opening along the axis of rotation. At least one elongated conduit is defined within the core and in fluid communication with the inlet opening, and the circumferential portion includes a plurality of outlet channels passing through it in fluid communication with the elongated conduit, the outlet channels being inclined outward toward the closed portion; and A brush component, which is connected to the outer surface of the circumferential portion and covers all of the plurality of outlet channels. Each of the aforementioned outlet channels comprises: The upstream section, which is connected to the inner surface of the circumferential portion; and At least one downstream section connects the upstream section to the outer surface of the circumferential portion, wherein the upstream section is inclined relative to the inner surface of the circumferential portion and the downstream section is perpendicular to the outer surface of the circumferential portion.

2. The cleaning brush of claim 1, wherein the outlet channel is inclined at an angle ranging from 20º to 90º toward the closed end portion.

3. The cleaning brush of claim 2, wherein the plurality of outlet channels includes a first outlet channel and a second outlet channel positioned closer to the closed portion than the first outlet channel, wherein the tilt angle of the second outlet channel is greater than the tilt angle of the first outlet channel.

4. The cleaning brush of claim 1, wherein each of the outlet channels comprises two downstream segments that branch off from the upstream segment and extend to the outer surface of the circumferential portion, and the width of the two downstream segments is less than the width of the upstream segment.

5. The cleaning brush according to claim 1, wherein the width (D) of the elongated conduit, the width (W11) of the upstream section of one of the outlet channels, and the width (W13) of the downstream section satisfy the following equations (1) and (2): Where k is the total number of upstream segments and i is the total number of downstream segments.

6. The cleaning brush of claim 1, wherein each of the outlet channels comprises: The upstream section, which is connected to the inner surface of the circumferential portion; and At least one downstream segment connects the upstream segment to the outer surface of the circumferential portion, wherein the cross-sectional shape of the upstream segment is different from the cross-sectional shape of the downstream segment.

7. The cleaning brush of claim 1, wherein the plurality of outlet channels includes a first outlet channel and a second outlet channel positioned further away from the inlet opening than the first outlet channel, and the cross-sectional shape or size of the first outlet channel is different from the cross-sectional shape or size of the second outlet channel.

8. The cleaning brush of claim 1, wherein the circumferential portion includes a rounded or chamfered corner at the intersection of at least one of the outlet channels and the elongated conduit.

9. A CMP (chemical mechanical planarization) apparatus, comprising: CMP module, which is configured to perform CMP process on semiconductor wafers; A post-CMP cleaning module, positioned downstream of the CMP module, includes a cleaning brush as described in claim 1.

10. The CMP apparatus of claim 9, wherein the plurality of outlet channels includes a first outlet channel and a second outlet channel, wherein the second outlet channel is positioned further away from the inlet opening than the first outlet channel, and the width of the second outlet channel is smaller than the width of the first outlet channel.

11. The CMP apparatus of claim 9, wherein the plurality of outlet channels includes a first outlet channel and a second outlet channel, wherein the second outlet channel is positioned further away from the inlet opening than the first outlet channel, and the tilt angle of the second outlet channel is greater than the tilt angle of the first outlet channel.

12. The CMP apparatus of claim 9, wherein the plurality of outlet channels includes a first outlet channel and a second outlet channel, wherein the first outlet channel and the second outlet channel are the two outlet channels closest to the inlet opening, the distance between the first outlet channel and the second outlet channel is the smallest, and the distance between the two outlet channels furthest from the inlet opening is the largest.

13. The CMP apparatus of claim 9, wherein the plurality of outlet channels comprises a first outlet channel and a second outlet channel, wherein either the first outlet channel or the second outlet channel has a variable cross-sectional area along its length.

14. The CMP apparatus of claim 9, wherein the width (D) of the elongated conduit and the width (W) of one of the plurality of outlet channels satisfy the following equation, where n is the total number of the outlet channels: Where k is the total number of the exit channels.

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