Metal film preparation method based on transparent medium constraint

Abstract

The invention discloses a metal film preparation method based on transparent medium constraint. The method comprises the steps that 1, a transparent medium coated with metal powder is prepared; 2, micro-texture anchor points are constructed on the surface of the metal base material; 3, applying negative pressure to the transparent medium coated with the metal powder obtained in the step 1 to be tightly attached to the surface of the metal base material with the micro-texture anchor points in the step 2, enabling pulse laser to act on the upper surface of the transparent medium, and enabling the transparent medium to restrain plasma generated by the metal powder under the action of the pulse laser between the transparent medium and the metal base material, and by virtue of the extremely cold effect of the metal base material, removing the transparent medium after the effect is finished, and preparing the metal film on the surface of the metal base material. The preparation method is simple, efficient, low in cost and wide in application range, and has a great industrial application prospect.

Description

Technical Field

[0001] The invention relates to the technical field of preparing metal thin films, and in particular to a method for preparing a metal thin film based on transparent medium constraints. Background Art

[0002] In order to meet the reliable use of specific metal substrates in different working conditions, a micron-level metal film with unique composition, structure and properties can be constructed on its surface to give it the required physical and chemical properties, such as higher strength or hardness, excellent resistance to high-temperature oxidation, wear resistance and corrosion resistance, conductivity or shape memory different from the matrix, etc., thereby greatly expanding the application scope of metal substrates in military, civilian and other fields.

[0003] The current methods for preparing metal films include magnetron sputtering deposition, vacuum evaporation coating, electrochemical deposition and thermal spraying.

[0004] The basic principle of magnetron sputtering deposition is to add a high voltage between the cathode and the anode, and use the electrons to collide with argon atoms in the process of accelerating to the substrate under the action of the electric field, ionizing a large number of argon ions and electrons, and the electrons fly to the substrate. Argon ions are accelerated to bombard the target material under the action of the electric field, sputtering a large number of target atoms, and neutral target atoms (or molecules) are deposited on the substrate to form a film. The characteristics of this technology are high film formation rate, low substrate temperature, and good film adhesion. By changing the process parameters and target composition, the composition and properties of the film can be flexibly controlled. The prepared metal film has uniform composition, good density and performance, high deposition rate, good bonding strength with the substrate, and nitride film can be obtained by introducing reaction gas. Because the target atoms are bombarded by argon ions and sputtered and deposited on the substrate surface in a wide area, this technology has low target utilization, high cost, and many process parameters. The relationship between film process parameters and film properties is very complicated, which is not suitable for large-scale production. In addition, the thickness of the prepared metal film is limited, which also limits its application to a certain extent.

[0005] Vacuum evaporation technology uses electric heating to heat the evaporated material so that it evaporates and deposits on the surface of the substrate. The substrate is generally not heated, and the thickness of the film is controlled by the weight of the heated material. The equipment is relatively simple and easy to operate. The prepared film has high purity, fast film formation speed, simple film growth mechanism, and is easy to control and simulate. Since this technology requires heating the evaporated material to evaporate and deposit it on the surface of the substrate, this technology must use electron beam evaporation for metals or metal films with high evaporation melting points, which makes the film preparation process more complicated. In addition, since it is evaporation deposition, this method is not easy to produce a film with a crystalline structure, and the deposited film has poor adhesion to the substrate. The resulting film is generally thicker at the center and thinner around.

[0006] Electrochemical deposition refers to a technology that forms a metal film on the surface of the substrate at the cathode by causing the current to migrate through positive and negative ions in an electrolyte solution under the action of an external electric field and undergo redox reactions on the electrode to gain and lose electrons. The film can be uniformly deposited on a substrate with a complex structure. By controlling the process parameters, the thickness and composition of the film can be easily controlled. The technology is simple, easy to operate, and has low economic cost. However, in the actual application of this technology, the factors affecting the film are quite complex, including substrate type, temperature, solvent, solution and pH concentration, solute concentration, electrode surface state, and other factors. Among them, parameters such as current and voltage are prone to fluctuations, resulting in poor uniformity of the deposited layer.

[0007] Thermal spraying technology is a material forming method that uses flames, arcs, plasma jets and other heat sources to instantly heat powdered (or wire, rod) materials to a molten or semi-molten state, and accelerates the material particles, impacting the substrate, flattening, rapidly cooling, solidifying and depositing on the substrate surface to form a covering layer. The bonding between the coating and the substrate in this technology is mainly mechanical. Due to the inconsistent shrinkage of the coating and the substrate during cooling, tensile stress is easily generated in the coating, which makes the coating easy to peel off, crack and have pores. In addition, this technology has low utilization rate of metal films and low thermal efficiency.

[0008] In summary, the above methods have the problems of low preparation efficiency, high cost, complicated operation process, difficulty in controlling the quality of metal films, and difficulty in achieving large-area preparation. Summary of the invention

[0009] The present invention aims to solve the problems of low preparation efficiency, high cost, complicated operation process, difficult quality control, and difficulty in large-area preparation in the current metal film preparation method, and provides a metal film preparation method based on transparent medium constraint.

[0010] The technical solution adopted by the present invention is:

[0011] A method for preparing a metal film based on transparent medium confinement, the steps comprising:

[0012] Step 1: preparing a transparent medium coated with metal powder;

[0013] Step 2: constructing micro-textured anchor points on the surface of the metal substrate;

[0014] Step 3: The transparent medium obtained in step 1 is placed tightly against the surface of the metal substrate in step 2, and a pulsed laser is applied to the upper surface of the transparent medium. After the action is completed, the transparent medium is removed to obtain a metal film on the surface of the metal substrate.

[0015] Furthermore, the step 1 further comprises the following steps:

[0016] Step 1.1: Prepare a transparent medium: weigh the film-forming main agent and the curing agent respectively, stir them evenly, solidify them, and ripen them to obtain a transparent medium;

[0017] Step 1.2: Spin-coat the metal powder onto one side of the transparent medium. The spin-coating method includes but is not limited to a clockwise uniform coating method.

[0018] Furthermore, in step 1.1, the mass ratio of the main film-forming agent to the curing agent is 10:1-5:1, the curing temperature is 25-80°C, the curing time is 3-8h, the aging temperature is 90°C, and the aging time is 1h.

[0019] Furthermore, in step 1.2, the metal powder is 50-200 μm and the coating amount is 1 mg / cm 2 -15mg / cm 2 .

[0020] Furthermore, the transparent medium includes any one of a high-transmittance acrylic film, a modified PE film or a PP film.

[0021] Further, the step 2 specifically comprises the following steps:

[0022] A fiber laser is used to construct micro-textures on the surface of a metal substrate, and a reciprocating scanning method is used to construct micro-textures with texture morphology on the metal surface.

[0023] Furthermore, the fiber laser has a scanning speed of 5000-15000 mm / s, a scanning frequency of 20-45 kHz, and a laser power of 10-60 W.

[0024] Furthermore, the metal substrate includes any one of stainless steel, titanium, aluminum and copper.

[0025] Furthermore, the step 3 specifically includes the following steps: the close-fitting method uses a vacuum pump to continuously extract the air between the transparent medium and the metal substrate to make the two fit together under negative pressure; the pulse laser scanning step length is 0.5-2.0mm, the scanning speed is 1000-10000mm / s, the pulse laser energy is 10-100W, and the overlap rate is 30%-80%.

[0026] In order to achieve the above technical objectives, the technical solution provided by the present invention is:

[0027] The present invention has the following beneficial effects:

[0028] 1. Compared with vacuum evaporation technology which requires high vacuum and heating and has high requirements on equipment, magnetron sputtering and electrochemical deposition technology which have more process parameters and complicated operation, the operation process of the present invention is simple, high vacuum is not required, the required equipment is relatively simple, it can be carried out at low temperature, and it has strong controllability.

[0029] 2. Compared with magnetron sputtering, vacuum evaporation technology, etc., which excites the target material into atoms / molecules or evaporated materials to deposit on the surface of the substrate, the utilization rate of the target material is low and the cost is high. The thermal spraying technology accelerates the molten or semi-molten powder (or wire, rod) material to impact the substrate surface, resulting in large losses and low utilization rate of metal materials. The metal powder used in the present invention can be evenly applied to the inside of the high-transmittance film. Under the action of the pulsed laser, the metal powder is instantly converted into plasma. Due to the limitation of the high-transmittance film, the plasma is confined by the transparent medium between the high-transmittance film and the metal substrate, thereby avoiding the escape of plasma and ultimately improving the utilization rate of the metal powder.

[0030] 3. The current, voltage and other parameters in the electrochemical deposition technology are prone to fluctuations, resulting in poor uniformity of the deposited layer; the thermal spraying technology accelerates the molten or semi-molten powder (or wire, rod) material to impact the substrate surface, and the thickness of the metal film is difficult to accurately control. The present invention is based on a high-transmittance film transparent medium confined plasma method, which can effectively control the amount of plasma between the film and the substrate by regulating the mass of the metal film powder coated on the inner side of the high-transmittance film, thereby achieving simple and controllable thickness of the metal film.

[0031] 4. Compared with vacuum evaporation technology and thermal spraying technology, which have higher requirements on the melting point of metal powders, electrochemical deposition has certain requirements on the chemical activity of metal powders. The present invention uses pulsed laser to act on metal powders to generate plasma, which is universal for metal powders.

[0032] 5. Compared with the thermal spraying technology, the bonding between the coating and the substrate is mainly mechanical bonding, and the coating is easy to peel off, crack and pore. The metal film of the present invention has uniform composition, good density and performance, and high bonding strength with the substrate.

[0033] 6. Compared with electrochemical deposition, which has stricter requirements on the type of substrate, the metal films prepared on different substrates are quite different. The present invention has a wide selectivity for metal substrates and can construct metal films on the surfaces of various metal substrates. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1 This is a schematic diagram of the metal film preparation process;

[0035] Figure 2 This is an optical morphology image of the metal film prepared in Example 1;

[0036] Figure 3 Scanning electron microscope (a) and energy spectrum element distribution data diagram (b) of the metal film prepared in Example 1 DETAILED DESCRIPTION

[0037] The technical solution of the present invention is described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0038] like Figure 1 As shown, a method for preparing a metal film based on transparent medium confinement,

[0039] Step 1: Prepare a transparent medium coated with metal powder.

[0040] Specifically, the step 1 further includes the following steps:

[0041] Step 1.1: Prepare a transparent medium: Weigh the main film-forming agent and the curing agent respectively, stir them evenly, and then solidify and mature them to obtain a transparent medium.

[0042] Among them, the mass ratio of the film-forming main agent to the curing agent is 10:1-5:1. The film-forming main agent can be Dow Corning-184. Domestic PDMS prepolymers and the like can be used as materials for forming polymer transparent films. Different main agents correspond to different curing agents, and they are commercial products; the curing temperature is 25-80°C, the curing time is 3-8h, the aging temperature is 90°C, and the aging time is 1h.

[0043] Step 1.2: Spin-coat the metal powder on the inside of the transparent medium.

[0044] Among them, the metal powder is 50-200μm. The general metal powder particle size is above 50 microns. If it exceeds 200 microns, the granularity will be very strong, which will affect the laser cladding effect; the coating amount is 1mg / cm 2 -15mg / cm 2 , metal powders can be selected from multi-component or single-component metal powders such as CoCrNi, NiAlMo, MoS2, Nb, etc.,

[0045] In addition, the transparent medium has a high damage threshold and high permeability, and in addition to being prepared by the above method, also includes any one of a high-transmittance acrylic film, a modified PE film or a PP film.

[0046] Step 2: Constructing micro-textured anchor points on the surface of the metal substrate.

[0047] Specifically, the specific steps include: using a fiber laser to construct a micro-texture on the surface of a metal substrate, and using reciprocating scanning to construct a micro-texture with a texture morphology on the metal surface; in addition to using a fiber laser to construct a micro-texture on the surface of the metal substrate to improve the bonding strength of the metal film layer, methods such as chemical etching and electrochemical etching are used.

[0048] The optical fiber laser has a scanning speed of 5000-15000 mm / s, a scanning frequency of 20-45 kHz, and a laser power of 10-60 W; and the metal substrate includes any one of stainless steel, titanium, aluminum, and copper.

[0049] Step 3: Apply negative pressure to the transparent medium coated with metal powder obtained in step 1 and press it against the surface of the metal substrate with micro-texture anchor points in step 2. Pulse laser acts on the upper surface of the transparent medium. The transparent medium confines the plasma generated by the metal powder under the action of the pulse laser between the transparent medium and the metal substrate. With the help of the extreme cold effect of the metal substrate, the transparent medium is removed after the effect ends, and a metal film is obtained on the surface of the metal substrate.

[0050] Specifically, the specific steps include: using a vacuum pump to continuously extract the air between the transparent medium and the metal substrate to make the two fit together under negative pressure. The negative pressure method can also be selected from mechanical pressure fitting, magnetron fitting and other methods; the pulse laser scanning step length is 0.5-2.0mm, the scanning speed is 1000-10000mm / s, the pulse laser energy is 10-100W, and the overlap rate is 30%-80%.

[0051] Example 1

[0052] Step 1: Prepare a transparent medium coated with metal powder.

[0053] Specifically, the step 1 further includes the following steps:

[0054] Step 1.1: Prepare a transparent medium: Weigh the main film-forming agent and the curing agent respectively, stir them evenly, and then solidify and mature them to obtain a transparent medium.

[0055] Specifically, 15 g of the film-forming main agent and 1.5 g of the curing agent were stirred at 800 rpm for 5 min using a mechanical stirrer, and then the evenly stirred mixture was spin-coated on a round-bottom mold with a diameter of 90 mm. The mold was then placed in a ventilated oven and cured at 80°C for 3 h. The oven was then heated to 90°C to mature the silicone for 1 h to obtain a transparent medium.

[0056] Step 1.2: Spin the metal powder evenly on the inside of the transparent medium in a clockwise direction.

[0057] Specifically, 64 mg of metal powder (metal film: AlCoCrFeNi2.1, average particle size of about 50 μm) was spin-coated uniformly on the inner side of the transparent medium in a clockwise direction.

[0058] Step 2: Constructing micro-textured anchor points on the surface of the metal substrate.

[0059] Specifically, the specific steps include: selecting titanium metal as the metal substrate, cleaning it with ethanol and water, and then placing it on an operating table, selecting an area, adjusting the fiber laser scanning speed to 10000 mm / s, the scanning frequency to 30 kHz, and the scanning power to 30 W, using a reciprocating cycle to scan the metal surface to construct a micro-texture with a texture morphology.

[0060] Step 3: Apply negative pressure to the transparent medium coated with metal powder obtained in step 1 and press it against the surface of the metal substrate with micro-texture anchor points in step 2. Pulse laser acts on the upper surface of the transparent medium. The transparent medium confines the plasma generated by the metal powder under the action of the pulse laser between the transparent medium and the metal substrate. With the help of the extreme cold effect of the metal substrate, the transparent medium is removed after the effect ends, and a metal film is obtained on the surface of the metal substrate.

[0061] Specifically, the transparent medium coated with metal powder obtained in step 1 is cut into a disc with a diameter of 6 cm, which is placed on the surface of the metal titanium after micro-texturing treatment, and the transparent medium and the metal titanium are pressed tightly by a tooling, and then the air between the transparent medium and the surface of the metal titanium is continuously extracted by a vacuum pump to form a negative pressure therebetween to achieve a tight fit; then the pulse laser scanning step length is adjusted to 0.5 mm, the scanning speed is 1000 mm / s, the pulse laser energy is 30 W, the overlap rate is 80%, and the light beam acts on the surface of the transparent medium above the metal substrate. After the scanning is completed, the transparent medium is removed, and finally a metal film is obtained on the surface of the metal titanium.

[0062] Example 2

[0063] Step 1: Prepare a transparent medium coated with metal powder.

[0064] Specifically, the step 1 further includes the following steps:

[0065] Step 1.1: Prepare a transparent medium: Weigh the main film-forming agent and the curing agent respectively, stir them evenly, and then solidify and mature them to obtain a transparent medium.

[0066] Specifically, 15 g of the film-forming main agent and 3 g of the curing agent were stirred at 400 rpm for 10 min using a mechanical stirrer, and then the evenly stirred mixture was spin-coated on a round-bottom mold with a diameter of 90 mm. The mold was then placed in a ventilated oven and cured at 25°C for 8 h. The oven was then heated to 90°C to mature the silicone for 1 h to obtain a transparent medium.

[0067] Step 1.2: Spin the metal powder evenly on the inside of the transparent medium in a clockwise direction.

[0068] Specifically, 960 mg of metal powder (metal film: AlCoFeNi2.1, average particle size of about 200 μm) was spin-coated evenly on the inner side of the transparent medium in a clockwise direction.

[0069] Step 2: Constructing micro-textured anchor points on the surface of the metal substrate.

[0070] Specifically, the specific steps include: selecting titanium metal as the metal substrate, cleaning it with ethanol and water, and then placing it on an operating table, selecting an area, adjusting the fiber laser scanning speed to 5000 mm / s, the scanning frequency to 30 kHz, and the scanning power to 30 W, using a reciprocating cycle to scan the metal surface to construct a micro-texture with a texture morphology.

[0071] Step 3: Apply negative pressure to the transparent medium coated with metal powder obtained in step 1 and press it against the surface of the metal substrate with micro-texture anchor points in step 2. Pulse laser acts on the upper surface of the transparent medium. The transparent medium confines the plasma generated by the metal powder under the action of the pulse laser between the transparent medium and the metal substrate. With the help of the extreme cold effect of the metal substrate, the transparent medium is removed after the effect ends, and a metal film is obtained on the surface of the metal substrate.

[0072] Specifically, the transparent medium coated with metal powder obtained in step 1 is cut into a disc with a diameter of 6 cm, and the disc is placed on the surface of the metal titanium after micro-texturing treatment. The transparent medium and the metal titanium are pressed tightly by a tooling, and then the air between the transparent medium and the surface of the metal titanium is continuously extracted by a vacuum pump to form a negative pressure therebetween to achieve a tight fit; then the pulse laser scanning step length is adjusted to 2.0 mm, the scanning speed is 10000 mm / s, the pulse laser energy is 100 W, the overlap rate is 30%, and the light beam acts on the surface of the transparent medium above the metal substrate. After the scanning is completed, the transparent medium is removed, and finally a metal film is obtained on the surface of the metal titanium.

[0073] Example 3

[0074] Step 1: Prepare a transparent medium coated with metal powder.

[0075] Specifically, the step 1 further includes the following steps:

[0076] Step 1.1: Prepare a transparent medium: Weigh the main film-forming agent and the curing agent respectively, stir them evenly, and then solidify and mature them to obtain a transparent medium.

[0077] Specifically, 16 g of the film-forming main agent and 2 g of the curing agent were stirred at 600 rpm for 8 min using a mechanical stirrer, and then the evenly stirred mixture was spin-coated on a round-bottom mold with a diameter of 90 mm. The mold was then placed in a ventilated oven and cured at 50°C for 5 h. The oven was then heated to 90°C to mature the silica gel for 1 h to obtain a transparent medium.

[0078] Step 1.2: Spin the metal powder evenly on the inside of the transparent medium in a clockwise direction.

[0079] Specifically, 640 mg of metal powder (metal film: FeCoNiCrMo0.5, average particle size of about 100 μm) was spin-coated uniformly on the inner side of the transparent medium in a clockwise direction.

[0080] Step 2: Constructing micro-textured anchor points on the surface of the metal substrate.

[0081] Specifically, the specific steps include: selecting titanium metal as the metal substrate, cleaning it with ethanol and water, and then placing it on an operating table, selecting an area, adjusting the fiber laser scanning speed to 15000 mm / s, the scanning frequency to 45 kHz, and the scanning power to 10 W, and using a reciprocating cycle to scan the metal surface to construct a micro-texture with a texture morphology.

[0082] Step 3: Apply negative pressure to the transparent medium coated with metal powder obtained in step 1 and press it against the surface of the metal substrate with micro-texture anchor points in step 2. Pulse laser acts on the upper surface of the transparent medium. The transparent medium confines the plasma generated by the metal powder under the action of the pulse laser between the transparent medium and the metal substrate. With the help of the extreme cold effect of the metal substrate, the transparent medium is removed after the effect ends, and a metal film is obtained on the surface of the metal substrate.

[0083] Specifically, the transparent medium coated with metal powder obtained in step 1 is cut into a disc with a diameter of 6 cm, which is placed on the surface of the metal titanium after micro-texturing treatment, and the transparent medium and the metal titanium are pressed tightly by a tooling, and then the air between the transparent medium and the surface of the metal titanium is continuously extracted by a vacuum pump to form a negative pressure therebetween to achieve a tight fit; then the pulse laser scanning step length is adjusted to 1.0 mm, the scanning speed is 5000 mm / s, the pulse laser energy is 50 W, the overlap rate is 60%, and the light beam acts on the surface of the transparent medium above the metal substrate. After the scanning is completed, the transparent medium is removed, and finally a metal film is obtained on the surface of the metal titanium.

[0084] Example 4

[0085] Step 1: Prepare a transparent medium coated with metal powder.

[0086] Specifically, the step 1 further includes the following steps:

[0087] Step 1.1: Prepare a transparent medium: Weigh the main film-forming agent and the curing agent respectively, stir them evenly, and then solidify and mature them to obtain a transparent medium.

[0088] Specifically, 18 g of the film-forming main agent and 3 g of the curing agent were stirred at 600 rpm for 8 min using a mechanical stirrer, and then the evenly stirred mixture was spin-coated on a round-bottom mold with a diameter of 90 mm. The mold was then placed in a ventilated oven and cured at 60°C for 4 h. The oven was then heated to 90°C to mature the silica gel for 1 h to obtain a transparent medium.

[0089] Step 1.2: Spin the metal powder evenly on the inside of the transparent medium in a clockwise direction.

[0090] Specifically, 500 mg of metal powder (Nb, with an average particle size of about 150 μm) was spin-coated uniformly on the inner side of the transparent medium in a clockwise direction.

[0091] Step 2: Constructing micro-textured anchor points on the surface of the metal substrate.

[0092] Specifically, the specific steps include: selecting titanium metal as the metal substrate, cleaning it with ethanol and water, and then placing it on an operating table, selecting an area, adjusting the fiber laser scanning speed to 12000 mm / s, the scanning frequency to 35 kHz, and the scanning power to 20 W, using a reciprocating cycle to scan the metal surface to construct a micro-texture with a texture morphology.

[0093] Step 3: Apply negative pressure to the transparent medium coated with metal powder obtained in step 1 and press it against the surface of the metal substrate with micro-texture anchor points in step 2. Pulse laser acts on the upper surface of the transparent medium. The transparent medium confines the plasma generated by the metal powder under the action of the pulse laser between the transparent medium and the metal substrate. With the help of the extreme cold effect of the metal substrate, the transparent medium is removed after the effect ends, and a metal film is obtained on the surface of the metal substrate.

[0094] Specifically, the transparent medium coated with metal powder obtained in step 1 is cut into a disc with a diameter of 6 cm, which is placed on the surface of the metal titanium after micro-texturing treatment, and the transparent medium and the metal titanium are pressed tightly by a tooling, and then the air between the transparent medium and the surface of the metal titanium is continuously extracted by a vacuum pump to form a negative pressure therebetween to achieve a tight fit; then the pulse laser scanning step length is adjusted to 1.0 mm, the scanning speed is 5000 mm / s, the pulse laser energy is 50 W, the overlap rate is 60%, and the light beam acts on the surface of the transparent medium above the metal substrate. After the scanning is completed, the transparent medium is removed, and finally a metal film is obtained on the surface of the metal titanium.

[0095] Figure 2 This is an optical morphology image of a metal film prepared on a titanium surface by using a transparent medium to confine the metal film in Example 1. The metal films prepared in other examples have similar results. Figure 1 In the experiment, the metal film was evenly spread on the surface of the substrate and the film was dense. Figure 3 a) and element spectrum ( Figure 3 b) Analysis shows that a dense metal film has been formed on the surface of the substrate. The metal film is evenly distributed with five elements, Fe, Co, Al, Cr, and Ni. The metal substrate element Ti can also be intuitively seen from the element energy spectrum distribution diagram.

[0096] In summary, the invented metal film preparation technology based on transparent medium constraint can effectively solve the problems of low efficiency, complicated process, difficult operation and high cost in the traditional metal film preparation process. The present invention can efficiently and conveniently form a layer of high-quality metal film on a metal substrate quickly and has a wide range of applicability. By constructing different metal films, it can give the surface of the metal substrate a variety of excellent physical and chemical properties, expand its application scenarios, and improve its stability and reliability in working conditions. It has a significant driving significance for the industrial production and application of metal films.

[0097] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

[0098] The above specific implementation methods are detailed descriptions of the present invention. It cannot be determined that the specific implementation methods of the present invention are limited to these descriptions. For ordinary technicians in the technical field to which the present invention belongs, several simple deductions and substitutions can be made without departing from the concept of the present invention, which should be regarded as belonging to the protection scope of the present invention.

Claims

1. A method for preparing a metal film based on transparent medium confinement, characterized in that: Step 1: preparing a transparent medium coated with metal powder; Step 2: constructing micro-textured anchor points on the surface of the metal substrate; Step 3: The transparent medium obtained in step 1 is placed tightly against the surface of the metal substrate in step 2, and a pulsed laser is applied to the upper surface of the transparent medium. After the action is completed, the transparent medium is removed to obtain a metal film on the surface of the metal substrate.

2. The method for preparing a metal thin film based on transparent medium confinement according to claim 1, characterized in that: The step 1 further comprises the following steps: Step 1.1: Prepare a transparent medium: weigh the film-forming main agent and the curing agent respectively, stir them evenly, solidify them, and ripen them to obtain a transparent medium; Step 1.2: Spin-coat the metal powder onto one side of the transparent medium.

3. A method for preparing a metal film based on transparent medium confinement according to claim 2, characterized in that: In the step 1.1, the mass ratio of the film-forming main agent to the curing agent is 10:1-5:1, the curing temperature is 25-80°C, the curing time is 3-8h, the aging temperature is 90°C, and the aging time is 1h.

4. A method for preparing a metal film based on transparent medium confinement according to claim 2, characterized in that: In step 1.2, the metal powder is 50-200 μm and the coating amount is 1 mg / cm 2 -15mg / cm 2 .

5. The method for preparing a metal film based on transparent medium confinement according to claim 1, characterized in that: The transparent medium includes any one of a high-transmittance acrylic film, a modified PE film or a PP film.

6. The method for preparing a metal film based on transparent medium confinement according to claim 1, characterized in that: Described step 2, specific steps comprise: A fiber laser is used to construct micro-textures on the surface of a metal substrate, and a reciprocating scanning method is used to construct micro-textures with texture morphology on the metal surface.

7. The method for preparing a metal film based on transparent medium confinement according to claim 6, characterized in that: The fiber laser has a scanning speed of 5000-15000 mm / s, a scanning frequency of 20-45 kHz, and a laser power of 10-60 W.

8. The method for preparing a metal film based on transparent medium confinement according to claim 1, characterized in that: The metal substrate includes any one of stainless steel, titanium, aluminum and copper.

9. The method for preparing a metal film based on transparent medium confinement according to claim 1, characterized in that: The specific steps of step 3 include: the close-fitting method uses a vacuum pump to continuously extract the air between the transparent medium and the metal substrate to make the two fit together under negative pressure; the pulse laser scanning step length is 0.5-2.0mm, the scanning speed is 1000-10000mm / s, the pulse laser energy is 10-100W, and the overlap rate is 30%-80%.

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