Precursor evaporation device and plasma coating equipment

Abstract

The invention relates to the technical field of plasma coating, and particularly provides a precursor evaporation device and plasma coating equipment, the precursor evaporation device comprises a vaporizer, the vaporizer is internally provided with a gas inlet pipeline, a liquid inlet pipeline, a confluence pipeline and a Laval nozzle, the input end of the Laval nozzle is connected with the gas inlet pipeline, and the output end of the Laval nozzle is connected with the liquid inlet pipeline; an inlet of the confluence pipeline is respectively connected with the output end of the Laval nozzle and the liquid inlet pipeline, and the confluence pipeline is a bent pipeline; the carrier gas supply assembly is connected with the gas inlet pipeline and used for supplying carrier gas; the liquid supply assembly is connected with the liquid inlet pipeline and used for supplying precursor liquid; the heating assembly is mounted on the vaporizer and used for heating the carrier gas and the precursor liquid in the vaporizer; the spraying pipe is mounted on the vaporizer and is communicated with the outlet of the confluence pipeline; according to the device, the condition that the precursor material is condensed into jelly in the runner of the precursor evaporation device due to insufficient evaporation of the precursor material can be avoided as much as possible.

Description

Technical Field

[0001] The present application relates to the technical field of plasma coating, and in particular to a precursor evaporation device and a plasma coating equipment. Background Art

[0002] Plasma coating technology is widely used in the fields of automobile manufacturing and material surface performance improvement. Plasma coating technology requires the use of a precursor evaporator to convert liquid precursor materials into precursor vapor by heating and evaporation. Since the flow channel in the precursor evaporator is short, the related technology may result in insufficient evaporation of the precursor material by the precursor evaporator, which causes the precursor material to condense into a colloid in the flow channel of the precursor evaporator (the pipeline in the vaporizer connected to its ejection pipe). The colloid will adhere to the flow channel of the precursor evaporator, thereby causing the flow channel in the precursor evaporator to be blocked.

[0003] There is no effective technical solution to the above problems. It should be noted that the above information disclosed in this section is only used to understand the background of the present invention, and therefore may contain information that does not constitute prior art. Summary of the invention

[0004] The purpose of the present application is to provide a precursor evaporation device and a plasma coating device, which can avoid as much as possible the situation where the precursor material condenses into a gel in the flow channel of the precursor evaporation device due to insufficient evaporation of the precursor material.

[0005] In a first aspect, the present application provides a precursor evaporation device, comprising: A carburetor, which has an air inlet pipeline, a liquid inlet pipeline, a confluence pipeline and a Laval nozzle, wherein the input end of the Laval nozzle is connected to the air inlet pipeline, the inlet of the confluence pipeline is respectively connected to the output end of the Laval nozzle and the liquid inlet pipeline, and the confluence pipeline is a curved pipeline; A carrier gas supply assembly, connected to the air inlet pipeline, for supplying carrier gas; A liquid supply assembly, connected to the liquid inlet pipeline, for supplying precursor liquid; A heating assembly, mounted on the vaporizer, for heating carrier gas and precursor liquid in the vaporizer; The ejection pipe is installed on the carburetor and is connected with the outlet of the confluence pipeline.

[0006] A precursor evaporation device provided in the present application can effectively improve the evaporation rate of the precursor liquid by cooperating with a liquid inlet pipeline, an air inlet pipeline and a Laval nozzle, and prolong the heating time of the precursor liquid by setting the confluence pipeline as a curved pipeline. Therefore, the present application can make the precursor material fully evaporate in the flow channel of the precursor evaporation device, thereby avoiding as much as possible the situation where the precursor material condenses into a colloid in the flow channel of the precursor evaporation device due to insufficient evaporation of the precursor material, and further avoiding as much as possible the situation where the flow channel in the precursor evaporation device is blocked due to the adhesion of the colloid in the flow channel of the precursor evaporation device.

[0007] Optionally, the vaporizer also has a buffer bin, the outlet of the confluence pipe is connected to the top surface of the buffer bin, the inlet of the blowout pipe is connected to the buffer bin, the outlet of the confluence pipe is offset from the inlet of the blowout pipe, and the height of the inlet of the blowout pipe is greater than the height of the bottom of the buffer bin.

[0008] Since the outlet of the confluence pipeline of the technical solution is misaligned with the inlet of the blowout pipe, the technical solution can effectively prevent the precursor liquid in the confluence pipeline from flowing directly into the blowout pipe, thereby effectively preventing the precursor material from condensing into a colloid in the blowout pipe and causing the blowout pipe to be blocked due to insufficiently evaporated precursor material entering the blowout pipe. Since the height of the inlet of the blowout pipe of the technical solution is greater than the height of the bottom of the buffer bin, and the mass and density of the precursor liquid and impurity particles are greater than the mass and density of the precursor vapor, that is, the precursor liquid and impurity particles will settle to the bottom of the buffer bin, and only the precursor vapor can flow into the blowout pipe, the technical solution can further prevent the blowout pipe from being blocked due to the precursor liquid and impurity particles flowing into the blowout pipe.

[0009] Optionally, an observation port facing the buffer bin is provided on the vaporizer, and an observation window covering the observation port is fixed on the vaporizer.

[0010] Since the vaporizer of the technical solution is provided with an observation port facing the buffer bin, and an observation window covering the observation port is fixed on the vaporizer, the technical solution can directly observe the internal conditions of the buffer bin through the observation window, thereby effectively improving the convenience of knowing the internal conditions of the buffer bin. It should be understood that since the technical solution can observe the internal conditions of the buffer bin in real time through the observation window, the technical solution can promptly discover abnormalities in the buffer bin and handle the abnormalities in a timely manner.

[0011] Optionally, the observation window can be detachably fixed to the carburetor.

[0012] Optionally, the precursor evaporation device further comprises a ceramic sleeve, which is fixed on the vaporizer and sleeved outside the ejection pipe.

[0013] Since the ceramic sleeve of this technical solution is fixed on the vaporizer and is sleeved on the outside of the ejection pipe, this technical solution can avoid the high-temperature burning of the ejection pipe by the plasma flame, thereby effectively avoiding the carbonization of the precursor material with a high carbon content and the perforation failure of the ejection pipe due to the high-temperature burning of the ejection pipe by the plasma flame, thereby effectively avoiding the blockage of the ejection pipe due to the carbonization of the precursor material and effectively extending the service life of the ejection pipe.

[0014] Optionally, the heating assembly includes a first heating element and a second heating element, and both the first heating element and the second heating element can be detachably mounted on the vaporizer.

[0015] This technical solution is equivalent to using two heating elements to heat the precursor liquid and the carrier gas at the same time. Therefore, this technical solution can effectively improve the heating efficiency of the heating component, thereby effectively avoiding the situation where insufficient evaporation of the precursor material occurs due to insufficient heat provided by a single heating element.

[0016] Optionally, the length of the first heating element is smaller than the length of the second heating element, and the installation height of the top of the first heating element is the same as the installation height of the top of the second heating element.

[0017] Since the length of the first heating element in the technical solution is smaller than that of the second heating element, the installation height of the first heating element is the same as that of the second heating element, that is, the temperature of the upper part of the vaporizer is higher than that of the lower part of the vaporizer, that is, there is a temperature difference between the upper part and the lower part of the vaporizer. Therefore, the precursor material and the carrier gas will flow toward the lower part of the vaporizer under the action of the temperature difference. That is, the technical solution guides the precursor material and the carrier gas by making the length of the first heating element smaller than that of the second heating element, thereby effectively avoiding the pressure instability in the vaporizer due to the backflow of the precursor material and the carrier gas, and the unstable pressure of the precursor vapor ejected from the precursor evaporation device.

[0018] Optionally, the vaporizer further includes a cleaning pipeline, which is connected to the input end of the Laval nozzle. The precursor evaporation device also includes a sealing component, which is detachably mounted on the cleaning pipeline.

[0019] Since the vaporizer of the technical solution also has a cleaning pipeline connected to the input end of the Laval nozzle, and the output end of the Laval nozzle is connected to the confluence pipeline, the technical solution can use the cleaning pipeline to clean the Laval nozzle and the confluence pipeline to remove crystals or impurities adhered in the confluence pipeline, thereby effectively extending the service life of the Laval nozzle and the confluence pipeline. Moreover, since the technical solution uses a sealing component to seal the cleaning pipeline when the precursor evaporation device performs precursor evaporation, the technical solution can effectively avoid the leakage of carrier gas from the cleaning pipeline, thereby effectively avoiding the reduction of the evaporation effect and evaporation efficiency of the precursor evaporation device due to the leakage of carrier gas.

[0020] Optionally, the side of the vaporizer has a plurality of temperature measuring holes arranged at different positions facing the confluence pipeline, and the precursor evaporation device also includes a plurality of temperature measuring components, and a temperature measuring component is fixed in each temperature measuring hole.

[0021] In a second aspect, the present application further provides a plasma coating device, which includes the precursor evaporation device provided in the first aspect above.

[0022] The present application provides a plasma coating device that can effectively improve the evaporation rate of the precursor liquid by cooperating with a liquid inlet pipeline, an air inlet pipeline and a Laval nozzle, and prolong the heating time of the precursor liquid by setting the confluence pipeline as a curved pipeline. Therefore, the present application can make the precursor material fully evaporate in the flow channel of the precursor evaporation device, thereby avoiding as much as possible the situation where the precursor material condenses into a colloid in the flow channel of the precursor evaporation device due to insufficient evaporation of the precursor material, and further avoiding as much as possible the situation where the flow channel in the precursor evaporation device is blocked due to the adhesion of the colloid in the flow channel of the precursor evaporation device.

[0023] From the above, it can be seen that the precursor evaporation device and precursor evaporation device provided by the present application can effectively improve the evaporation rate of the precursor liquid by cooperating with the liquid inlet pipeline, the air inlet pipeline and the Laval nozzle, and prolong the heating time of the precursor liquid by setting the confluence pipeline as a curved pipeline. Therefore, the present application can make the precursor material fully evaporate in the flow channel of the precursor evaporation device, thereby avoiding as much as possible the situation that the precursor material condenses into a colloid in the flow channel of the precursor evaporation device due to insufficient evaporation of the precursor material, and further avoiding as much as possible the situation that the flow channel in the precursor evaporation device is blocked due to the adhesion of the colloid in the flow channel of the precursor evaporation device. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 A schematic structural diagram of a precursor evaporation device provided in an embodiment of the present application.

[0025] Figure 2 A schematic diagram of the explosion structure of a precursor evaporation device provided in an embodiment of the present application.

[0026] Figure 3 A schematic cross-sectional structure diagram of a precursor evaporation device provided in an embodiment of the present application.

[0027] Figure numerals: 1. vaporizer; 2. air inlet pipe; 3. liquid inlet pipe; 4. confluence pipe; 5. Laval nozzle; 6. air inlet; 7. liquid inlet; 8. heating component; 81. first heating element; 82. second heating element; 9. ejection pipe; 10. buffer chamber; 11. observation port; 12. observation window; 13. ceramic sleeve; 14. cleaning pipe; 15. sealing component; 16. temperature measuring component. DETAILED DESCRIPTION

[0028] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application claimed for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the present application.

[0029] It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. At the same time, in the description of this application, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0030] First, as Figure 1-Figure 3 As shown, the present application provides a precursor evaporation device, which includes: A carburetor 1, which has an air inlet pipeline 2, a liquid inlet pipeline 3, a confluence pipeline 4 and a Laval nozzle 5, wherein the input end of the Laval nozzle 5 is connected to the air inlet pipeline 2, the inlet of the confluence pipeline 4 is respectively connected to the output end of the Laval nozzle 5 and the liquid inlet pipeline 3, and the confluence pipeline 4 is a curved pipeline; A carrier gas supply assembly, connected to the air inlet pipeline 2, for supplying carrier gas; A liquid supply assembly, connected to the liquid inlet pipeline 3, for supplying precursor liquid; A heating assembly 8, mounted on the vaporizer 1, for heating the carrier gas and the precursor liquid in the vaporizer 1; The ejection pipe 9 is installed on the carburetor 1 and communicated with the outlet of the confluence pipe 4 .

[0031] Among them, this embodiment provides a precursor evaporation device, which can convert the precursor liquid into precursor vapor (equivalent to converting the precursor material from liquid to gas). The vaporizer 1 of this embodiment has an air inlet pipeline 2, a liquid inlet pipeline 3, a confluence pipeline 4 and a Laval nozzle 5. The air inlet pipeline 2 is used to transport the carrier gas, and the liquid inlet pipeline 3 is used to transport the precursor liquid. The Laval nozzle 5 is a nozzle designed based on the Bernoulli principle and the smooth flow principle. The cross-sectional area of ​​the input end of the Laval nozzle 5 is different from the cross-sectional area of ​​the output end of the Laval nozzle 5. The Laval nozzle 5 can increase the flow rate of the fluid entering it. Since the input end of the Laval nozzle 5 of this embodiment is different from the input end, the Laval nozzle 5 has a different cross-sectional area from the output end. The embodiment is equivalent to using the Laval nozzle 5 to increase the flow rate of the carrier gas. The inlet of the confluence pipeline 4 of the embodiment is respectively connected to the output end of the Laval nozzle 5 and the liquid inlet pipeline 3. The confluence pipeline 4 of the embodiment can be used to mix the precursor liquid and the carrier gas. The confluence pipeline 4 of the embodiment can be a curved pipeline such as a spiral tube or a serpentine tube. It should be understood that since the precursor liquid will be blown away by the carrier gas in the confluence pipeline 4, the surface area of ​​the precursor liquid can be effectively increased. The carrier gas supply assembly of the embodiment can be a carrier gas production assembly or a carrier gas storage assembly that can supply carrier gas, and the carrier gas supply assembly is preferably connected to the air inlet pipeline 2 through the air inlet 6 of the vaporizer 1. The liquid supply assembly of the embodiment can be a precursor liquid production assembly or a precursor liquid storage assembly that can supply precursor liquid, and the liquid supply assembly is preferably connected to the liquid inlet pipeline 3 through the liquid inlet 7 of the vaporizer 1. The heating component 8 of this embodiment can be a component capable of heating an object, such as a resistance heating component 8 or an electromagnetic heating component 8. The heating component 8 is installed in the vaporizer 1. The heating component 8 can heat the carrier gas and the precursor liquid in the vaporizer 1, that is, the heating component 8 can heat the carrier gas and / or the precursor liquid in the air inlet pipeline 2, the liquid inlet pipeline 3, the confluence pipeline 4 and the Laval nozzle 5. The ejection pipe 9 of this embodiment is installed on the vaporizer 1. The ejection pipe 9 is connected to the outlet of the confluence pipeline 4. The precursor vapor (the fully evaporated precursor liquid) can be ejected out of the precursor evaporation device by the ejection pipe 9.It should be understood that, since this embodiment can increase the surface area of ​​the precursor liquid by using the carrier gas to blow the precursor liquid away, this embodiment can also increase the flow rate of the carrier gas around the precursor liquid by using the Laval nozzle 5, and the evaporation rate of the liquid is positively correlated with the surface area of ​​the liquid and the flow rate of the gas around the liquid, therefore, this embodiment can effectively improve the evaporation rate of the precursor liquid through the cooperation of the liquid inlet pipeline 3, the air inlet pipeline 2 and the Laval nozzle 5, and since the confluence pipeline 4 of this embodiment is a curved pipeline, this embodiment can effectively prolong the flow time of the precursor liquid and the carrier gas in the confluence pipeline 4, thereby effectively prolonging the heating time of the precursor liquid and the carrier gas, that is, this embodiment ensures that the precursor liquid is fully evaporated by increasing the evaporation rate of the precursor liquid and prolonging the heating time of the precursor liquid.

[0032] A precursor evaporation device provided in the present application can effectively improve the evaporation rate of the precursor liquid by cooperating with the liquid inlet pipeline 3, the air inlet pipeline 2 and the Laval nozzle 5, and prolong the heating time of the precursor liquid by setting the confluence pipeline 4 as a curved pipeline. Therefore, the present application can make the precursor material fully evaporate in the flow channel of the precursor evaporation device, thereby avoiding as much as possible the situation that the precursor material condenses into a colloid in the flow channel of the precursor evaporation device due to insufficient evaporation of the precursor material, and further avoiding as much as possible the situation that the flow channel in the precursor evaporation device is blocked due to the adhesion of the colloid in the flow channel of the precursor evaporation device.

[0033] In some preferred embodiments, the vaporizer 1 further includes a buffer bin 10, the outlet of the confluence pipe 4 is connected to the top surface of the buffer bin 10, the inlet of the blowout pipe 9 is connected to the buffer bin 10, the outlet of the confluence pipe 4 and the inlet of the blowout pipe 9 are offset, and the height of the inlet of the blowout pipe 9 is greater than the height of the bottom of the buffer bin 10. The vaporizer 1 of this embodiment also has a buffer bin 10. Since the outlet of the confluence pipe 4 of this embodiment is misaligned with the inlet of the ejection pipe 9, this embodiment can effectively prevent the precursor liquid (precursor material that is not fully evaporated) in the confluence pipe 4 from directly flowing into the ejection pipe 9, thereby effectively preventing the precursor material that is not fully evaporated from entering the ejection pipe 9 and causing the precursor material to condense into a colloid in the ejection pipe 9, thereby preventing the ejection pipe 9 from being blocked. Since the height of the inlet of the ejection pipe 9 of this embodiment is greater than the height of the bottom of the buffer bin 10, and the mass and density of the precursor liquid and impurity particles are greater than the mass and density of the precursor vapor, that is, the precursor liquid and impurity particles will settle to the bottom of the buffer bin 10, and only the precursor vapor can flow into the ejection pipe 9. Therefore, this embodiment can further prevent the ejection pipe 9 from being blocked due to the precursor liquid and impurity particles flowing into the ejection pipe 9.

[0034] In some preferred embodiments, the vaporizer 1 is provided with an observation port 11 facing the buffer bin 10, and an observation window 12 covering the observation port 11 is fixed on the vaporizer 1. Since the vaporizer 1 of this embodiment is provided with an observation port 11 facing the buffer bin 10, and the vaporizer 1 is provided with an observation window 12 covering the observation port 11, the embodiment can directly observe the internal conditions of the buffer bin 10 through the observation window 12, thereby effectively improving the convenience of knowing the internal conditions of the buffer bin 10. It should be understood that since the embodiment can observe the internal conditions of the buffer bin 10 in real time through the observation window 12, the embodiment can promptly discover the abnormality in the buffer bin 10 and handle the abnormality in time.

[0035] In some preferred embodiments, the observation window 12 is detachably fixed to the vaporizer 1. Since the observation window 12 of this embodiment is detachably fixed to the vaporizer 1, that is, the observation window 12 can be removed first and then the buffer bin 10 can be cleaned, so the embodiment can effectively reduce the difficulty of cleaning the buffer bin 10, and the embodiment can replace the observation window 12 by removing the old observation window 12 and then fixing the new observation window 12 on the vaporizer 1.

[0036] In some preferred embodiments, the precursor evaporation device further includes a ceramic sleeve 13, which is fixed on the vaporizer 1 and sleeved outside the ejection pipe 9. The ceramic sleeve 13 of this embodiment has the characteristics of high temperature resistance and corrosion resistance. Since the ceramic sleeve 13 of this embodiment is fixed on the vaporizer 1 and sleeved outside the ejection pipe 9, this embodiment can avoid the situation where the plasma flame burns the ejection pipe 9 at high temperature, thereby effectively avoiding the situation where the precursor material with a high carbon content is carbonized and the ejection pipe 9 is perforated and fails due to the high temperature burning of the ejection pipe 9 by the plasma flame, thereby effectively avoiding the situation where the ejection pipe 9 is blocked due to the carbonization of the precursor material and effectively extending the service life of the ejection pipe 9. Preferably, the ceramic sleeve 13 of this embodiment only covers the area where the ejection pipe 9 may contact the plasma flame, that is, the ceramic sleeve 13 of this embodiment only covers the local area of ​​the ejection pipe 9, that is, this embodiment is equivalent to reducing the use of the ceramic sleeve 13, so this embodiment can effectively reduce the production cost of the precursor evaporation device.

[0037] In some preferred embodiments, the heating assembly 8 includes a first heating element 81 and a second heating element 82, and the first heating element 81 and the second heating element 82 can be detachably mounted on the vaporizer 1. The heating assembly 8 of this embodiment includes a first heating element 81 and a second heating element 82, that is, this embodiment is equivalent to using two heating elements to heat the precursor liquid and the carrier gas at the same time, so this embodiment can effectively improve the heating efficiency of the heating assembly 8, thereby effectively avoiding the situation where the precursor material is not fully evaporated due to insufficient heat provided by a single heating element. Since the first heating element 81 and the second heating element 82 of this embodiment can be detachably mounted on the vaporizer 1, this embodiment can effectively improve the convenience of replacing and maintaining the first heating element 81 and the second heating element 82.

[0038] In some preferred embodiments, the length of the first heating element 81 is smaller than the length of the second heating element 82, and the installation height of the top of the first heating element 81 is the same as the installation height of the top of the second heating element 82. Since the length of the first heating element 81 of this embodiment is smaller than the length of the second heating element 82, and the installation height of the top of the first heating element 81 is the same as the installation height of the top of the second heating element 82, that is, the temperature of the upper part of the vaporizer 1 is higher than the temperature of the lower part of the vaporizer 1, that is, there is a temperature difference between the upper part and the lower part of the vaporizer 1, so the precursor material and the carrier gas will flow toward the lower part of the vaporizer 1 under the action of the temperature difference, that is, this embodiment guides the precursor material and the carrier gas by making the length of the first heating element 81 smaller than the length of the second heating element 82, thereby effectively avoiding the situation where the pressure in the vaporizer 1 is unstable due to the backflow of the precursor material and the carrier gas, and the pressure of the precursor vapor ejected from the precursor evaporation device is unstable.

[0039] In some preferred embodiments, the vaporizer 1 further comprises a cleaning pipeline 14, which is connected to the input end of the Laval nozzle 5, and the precursor evaporation device further comprises a sealing assembly 15, which is detachably mounted on the cleaning pipeline 14. The sealing assembly 15 of this embodiment is preferably a headless screw. Since the vaporizer 1 of this embodiment further comprises a cleaning pipeline 14 connected to the input end of the Laval nozzle 5, and the output end of the Laval nozzle 5 is connected to the confluence pipeline 4, this embodiment can use the cleaning pipeline 14 to clean the Laval nozzle 5 and the confluence pipeline 4 to remove crystals or impurities adhered to the confluence pipeline 4, thereby effectively extending the service life of the Laval nozzle 5 and the confluence pipeline 4. Moreover, since this embodiment uses the sealing assembly 15 to seal the cleaning pipeline 14 when the precursor evaporation device is performing precursor evaporation, this embodiment can effectively avoid the situation where the carrier gas leaks from the cleaning pipeline 14, thereby effectively avoiding the situation where the evaporation effect and evaporation efficiency of the precursor evaporation device are reduced due to the leakage of the carrier gas.

[0040] In some preferred embodiments, the side of the vaporizer 1 has a plurality of temperature measuring holes arranged at different positions facing the confluence pipe 4, and the precursor evaporation device further comprises a plurality of temperature measuring components 16, and a temperature measuring component 16 is fixed in each temperature measuring hole. The temperature measuring component 16 of this embodiment is preferably a thermocouple, and this embodiment is equivalent to performing multi-point temperature measurement on the confluence pipe 4. This embodiment preferably performs PID control on the heating component 8 according to the temperature information collected by the temperature measuring component 16. The temperature measuring component 16 of this embodiment is preferably fixed by a headless screw (refer to Figure 2 a) in the figure is fixed in the temperature measuring hole, and the headless screw is perpendicular to the temperature measuring component 16.

[0041] From the above, it can be seen that the precursor evaporation device provided by the present application can effectively improve the evaporation rate of the precursor liquid by cooperating with the liquid inlet pipeline 3, the air inlet pipeline 2 and the Laval nozzle 5, and prolong the heating time of the precursor liquid by setting the confluence pipeline 4 as a curved pipeline. Therefore, the present application can make the precursor material fully evaporate in the flow channel of the precursor evaporation device, thereby avoiding as much as possible the situation that the precursor material condenses into a colloid in the flow channel of the precursor evaporation device due to insufficient evaporation of the precursor material, and further avoiding as much as possible the situation that the flow channel in the precursor evaporation device is blocked due to the colloid adhering to the flow channel of the precursor evaporation device and crystallizing.

[0042] In a second aspect, the present application further provides a plasma coating device, which includes the precursor evaporation device provided in the first aspect above.

[0043] An embodiment of the present application provides a plasma coating device, which includes the precursor evaporation device provided by the first aspect above. The principle of the plasma coating device provided by this embodiment is the same as the principle of the precursor evaporation device provided by the first aspect above, and will not be discussed in detail here.

[0044] From the above, it can be seen that the precursor evaporation device and plasma coating equipment provided by the present application can effectively improve the evaporation rate of the precursor liquid through the cooperation of the liquid inlet pipeline 3, the air inlet pipeline 2 and the Laval nozzle 5, and prolong the heating time of the precursor liquid by setting the confluence pipeline 4 as a curved pipeline. Therefore, the present application can make the precursor material fully evaporate in the flow channel of the precursor evaporation device, thereby avoiding as much as possible the situation that the precursor material condenses into a colloid in the flow channel of the precursor evaporation device due to insufficient evaporation of the precursor material, and further avoiding as much as possible the situation that the flow channel in the precursor evaporation device is blocked due to the adhesion of the colloid in the flow channel of the precursor evaporation device.

[0045] In the embodiments provided in the present application, it should be understood that, herein, relational terms such as first and second, etc. are merely used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations.

[0046] The above description is only an embodiment of the present application and is not intended to limit the protection scope of the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A precursor evaporation device, characterized in that: The precursor evaporation device comprises: A carburetor, which has an air inlet pipeline, a liquid inlet pipeline, a confluence pipeline and a Laval nozzle, wherein the input end of the Laval nozzle is connected to the air inlet pipeline, the inlet of the confluence pipeline is respectively connected to the output end of the Laval nozzle and the liquid inlet pipeline, and the confluence pipeline is a curved pipeline; A carrier gas supply assembly, connected to the air inlet pipeline, for supplying carrier gas; A liquid supply assembly, connected to the liquid inlet pipeline, for supplying precursor liquid; A heating assembly, mounted on the vaporizer, for heating the carrier gas and the precursor liquid in the vaporizer; The ejection pipe is installed on the carburetor and is communicated with the outlet of the confluence pipeline.

2. The precursor evaporation device according to claim 1, characterized in that: The vaporizer also has a buffer bin, the outlet of the confluence pipe is connected to the top surface of the buffer bin, the inlet of the blowout pipe is connected to the buffer bin, the outlet of the confluence pipe is offset from the inlet of the blowout pipe, and the height of the inlet of the blowout pipe is greater than the height of the bottom of the buffer bin.

3. The precursor evaporation device according to claim 2, characterized in that: The vaporizer is provided with an observation port facing the buffer bin, and the vaporizer is fixed with an observation window covering the observation port.

4. The precursor evaporation device according to claim 3, characterized in that: The observation window is detachably fixed on the vaporizer.

5. The precursor evaporation device according to claim 1, characterized in that: The precursor evaporation device further comprises a ceramic sleeve, which is fixed on the vaporizer and sleeved outside the ejection pipe.

6. The precursor evaporation device according to claim 1, characterized in that: The heating assembly comprises a first heating element and a second heating element, and both the first heating element and the second heating element can be detachably mounted on the vaporizer.

7. The precursor evaporation device according to claim 6, characterized in that: The length of the first heating element is smaller than that of the second heating element, and the installation height of the top of the first heating element is the same as the installation height of the top of the second heating element.

8. The precursor evaporation device according to claim 7, characterized in that: The vaporizer also has a cleaning pipeline, which is connected to the input end of the Laval nozzle. The precursor evaporation device also includes a sealing component, which is detachably mounted on the cleaning pipeline.

9. The precursor evaporation device according to claim 1, characterized in that: The side surface of the vaporizer has a plurality of temperature measuring holes arranged at different positions facing the confluence pipeline. The precursor evaporation device also includes a plurality of temperature measuring components, and one temperature measuring component is fixed in each of the temperature measuring holes.

10. A plasma coating device, characterized in that: The plasma coating equipment comprises the precursor evaporation device as described in any one of claims 1-9.

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