A gas guide device for chemical vapor deposition furnace

Abstract

The present application relates to the technical field of chemical vapor deposition, and discloses a gas guide device for a chemical vapor deposition furnace, which is mainly composed of a dispersion mechanism and a power mechanism. The dispersion mechanism is fixedly arranged at the inner top of the furnace body, and the dispersion mechanism includes a dispersion pipeline, a fixed pipe, a fixing part and a fixed film. The power mechanism is fixedly arranged in the middle of the top of the furnace body, and the power mechanism is fixedly connected to the dispersion mechanism. When the fixed pipe discharges gas, the power mechanism can be used to drive the fixing part to move up and down in the fixed pipe, so as to realize the change of the fixed cavity space of the fixed pipe. When the fixed cavity is compressed by the fixed part, the raw gas moved into the fixed cavity and discharged from the gas outlet is pushed instantaneously, which effectively increases the instantaneous impact force of the airflow. Therefore, the fixed pipe can reciprocately change the airflow velocity, so that the instantaneous impact force effectively impacts the sediment that may be accumulated at the gas outlet, and realizes the effective cleaning of the sediment at the gas outlet.

Description

Technical Field

[0001] The present application relates to the technical field of chemical vapor deposition, and in particular to a gas guide device for a chemical vapor deposition furnace. Background Art

[0002] Chemical vapor deposition (CVD) is a gas phase reaction process at high temperature. It generates thin films by introducing one or more gas phase compounds or single substances containing thin film elements into the chemical vapor deposition furnace, thereby chemically reacting on the substrate surface. Therefore, it is widely used in industrial production, especially in the manufacture of heat-resistant materials, high-purity metals, powder synthesis and semiconductor thin films. At present, chemical vapor deposition furnaces generally use gas guide devices for gas intake operation.

[0003] However, there are still certain defects in the use of chemical vapor deposition furnaces: during the reaction process, since the gas guide device is located inside the furnace body and is in a high-temperature environment, when the raw gas is discharged through the gas outlet of the gas guide device, because the raw gas just discharged is in a high-temperature environment, reaction precipitation will occur. After long-term use, there will be accumulated sediment at the gas outlet of the gas guide device, which will cause the gas outlet to be blocked, thereby affecting the normal use of the gas guide device. Summary of the invention

[0004] The present application proposes a gas guide device for a chemical vapor deposition furnace, which has the advantages of effectively reducing the possibility of blockage of the gas outlet of the gas guide device and increasing the service life of the gas guide device, and is used to solve the problem that the gas outlet of the gas guide device is easily blocked.

[0005] To achieve the above-mentioned purpose, the present application adopts the following technical solution: a gas guide device for a chemical vapor deposition furnace, comprising:

[0006] A deposition furnace mechanism, the deposition furnace mechanism comprising a furnace body, for providing environmental conditions for a CVD reaction;

[0007] An exhaust mechanism, the exhaust mechanism comprising an exhaust pipe, a dispersion mechanism and a power mechanism, the exhaust pipe being fixedly connected to the furnace body and used for introducing raw material gas into the furnace body;

[0008] A dispersion mechanism, the dispersion mechanism is fixedly arranged at the top of the furnace body, and is used for fully distributing the raw material gas. The dispersion mechanism includes a dispersion pipe, a fixed pipe, a fixed part and a fixed film. One side of the dispersion pipe is fixedly connected with one end of the exhaust pipe. The top of the dispersion pipe is fixedly connected with the top of the furnace body, and the bottom of the dispersion pipe is fixedly connected with the fixed pipe. A fixed cavity is provided inside the fixed pipe, and an air outlet is provided on the middle side wall of the fixed pipe. The lower end of the fixed pipe is movably connected with the fixed part, and the top edge of the fixed part is fixedly connected with the bottom edge of the fixed pipe through the fixed film.

[0009] A power mechanism is fixedly arranged at the middle of the top end of the furnace body, and the power mechanism is fixedly connected to the dispersion mechanism to provide a power source for the change of the dispersion mechanism.

[0010] Furthermore, the deposition furnace mechanism further comprises:

[0011] A sealing door, wherein a sealing hole is provided on one side wall of the furnace body, and one end of the sealing door is movably connected to the sealing hole of the furnace body;

[0012] A gas outlet piece, the bottom end of the furnace body is fixedly connected to the gas outlet piece;

[0013] A deposition platform, wherein the deposition platform is fixedly arranged at the inner bottom end of the furnace body;

[0014] A substrate is fixedly arranged on the top of the deposition platform.

[0015] Furthermore, it also includes:

[0016] A mixing box mechanism, wherein a mixing box mechanism is provided on one side of the outside of the deposition furnace mechanism, and is used to fully mix a plurality of raw material gases;

[0017] A cooling mechanism is fixedly arranged below the dispersion mechanism to cool the raw material gas just discharged from the dispersion mechanism.

[0018] Further, the mixing box mechanism comprises:

[0019] A box body, the top end of which is fixedly connected to the other end of the exhaust pipe;

[0020] An air inlet component is fixedly connected to the side wall of the lower half of the box body, and there are a plurality of air inlet components.

[0021] Furthermore, the exhaust mechanism further comprises:

[0022] An air pump, wherein the air pump is fixedly arranged on the exhaust pipe;

[0023] An exhaust valve is fixedly arranged inside the exhaust pipe.

[0024] Furthermore, the dispersion pipe is annular in shape and is located directly above the substrate. The number of the fixed pipes is several and the fixed pipes are evenly arranged around the dispersion pipe. The number of the air outlets of the fixed pipe is three and they are evenly arranged around the fixed pipe. The upper half of the fixing part is truncated cone-shaped and the fixing part will not block the air outlet of the fixed pipe. The fixed membrane is made of high-temperature resistant rubber material that can be vertically extended and retracted.

[0025] Furthermore, the power mechanism comprises:

[0026] A hydraulic press, the hydraulic press is fixedly arranged at the middle of the top end of the furnace body;

[0027] A hydraulic rod, one end of which passes through the furnace body and is movably connected to the bottom end of the hydraulic press, and the other end of the hydraulic rod is provided with a plurality of branches, and the branches of the hydraulic rod are respectively movably connected to the bottom end of the fixing member.

[0028] Furthermore, the cooling mechanism comprises:

[0029] A cooling pipe, wherein the shape of the cooling pipe is composed of two straight rods and a circular ring, and the straight rods of the cooling pipe are fixedly sleeved with the two side walls of the furnace body, and the circular ring of the cooling pipe is fixedly connected with the bottom end of the dispersion pipe, and a cooling cavity is opened inside the cooling pipe, and one end of the cooling cavity of the cooling pipe is a water inlet, and the other end of the cooling cavity of the cooling pipe is a water outlet;

[0030] A limiting mechanism is fixedly arranged at the bottom end of the cooling pipe, and the limiting mechanism surrounds the outside of the fixed pipe. The limiting mechanism corresponds to the fixed pipe one by one, and is used to timely cool down the raw gas discharged from the fixed pipe.

[0031] Furthermore, the limiting mechanism includes:

[0032] A limit piece, a limit cavity is provided at the top of the limit piece, and the limit cavity of the limit piece is fixedly connected with the cooling cavity of the cooling pipe, the limit piece is spirally arranged, and the spiral degree of the limit piece is greater than or equal to 180 degrees, the limit pieces are three in number, and are evenly arranged around the fixed pipe, a spiral groove is provided at the top of the limit piece, and the inner wall surface of the limit piece is lower than the outer wall surface of the limit piece, the outer wall surfaces of two adjacent limit pieces are in contact, and the position of the limit piece corresponds one-to-one to the air outlet of the fixed pipe;

[0033] A partition plate, wherein the partition plate is fixedly sleeved in the limiting cavity of the limiting member, and the limiting member divides the limiting cavity into an inner cavity and an outer cavity through the partition plate, and the bottom end of the inner cavity is connected with the bottom end of the outer cavity;

[0034] A buffer capsule is fixedly connected to the outer wall of the limiter in the spiral groove, and there are a number of buffer capsules. The buffer capsule is made of high-temperature resistant rubber material, and a transverse spring is fixedly connected to the inner wall of the buffer capsule;

[0035] A water pipe, wherein the bottom end of the buffer bag is fixedly connected to one end of the water pipe, and the other end of the water pipe is fixedly connected to the limiting cavity of the limiting member.

[0036] Furthermore, the cooling mechanism also includes:

[0037] A water inlet valve, a water inlet valve is fixedly provided at the bottom end of the cooling pipe, and the water inlet valve is arranged at the top end of the inner cavity of the limiter, the water inlet valve is a one-way valve, and the water flow direction of the water inlet valve is from the cooling pipe to the limiter;

[0038] A water outlet valve is fixedly provided at the bottom end of the cooling pipe, and the water outlet valve is arranged at the top end of the outer cavity of the limiter. The water outlet valve is a one-way valve, and the water flow direction of the water outlet valve is from the limiter to the cooling pipe;

[0039] The collecting member, the bottom end of the limiting member is fixedly connected to the top end of the collecting member, and the top end of the collecting member is provided with a collecting groove.

[0040] This application has the following beneficial effects:

[0041] The present application provides a gas guide device for a chemical vapor deposition furnace. A dispersion mechanism is arranged in the furnace body, and the dispersion mechanism consists of a dispersion pipe, a fixed pipe, a fixing part, a fixed membrane and a power mechanism. Raw material gas is introduced into the dispersion mechanism through the exhaust mechanism, and the raw material gas is evenly distributed in the furnace body through the dispersion pipe and the fixed pipe. When the fixed pipe discharges gas, the power mechanism can be used to drive the fixing part to move up and down in the fixed pipe, so as to change the fixed cavity space of the fixed pipe. When the fixed cavity is compressed by the fixed part, the raw material gas moved into the fixed cavity and discharged from the air outlet is pushed instantaneously, which effectively increases the instantaneous impact force of the airflow. As a result, the fixed pipe can reciprocately change the airflow velocity, so that the instantaneous impact force effectively impacts the sediment that may be accumulated at the air outlet, thereby effectively cleaning the sediment at the air outlet and avoiding the air outlet having a long-term and gently moving airflow, thereby reducing the possibility of the sediment blocking the air outlet of the fixed pipe.

[0042] A cooling mechanism is arranged on the outside of the fixed tube, and the cooling mechanism is composed of a cooling pipe, a water inlet valve, a water outlet valve and a limiting mechanism. The cooling pipe is used to pass flowing coolant into the limiting mechanism, so that the raw material gas discharged from the fixed tube is effectively cooled down. Since CVD needs to react under certain high temperature conditions, if the temperature is lower than a certain value, the raw material gas will not precipitate, thereby effectively preventing the raw material gas from reacting and depositing at the gas outlet of the fixed tube, thereby improving the service life of the gas guide device. At the same time, the spiral setting of the limiting member and the spiral groove at the top of the limiting member can effectively guide the gas obliquely downward in a spiral direction, thereby improving the uniformity of the raw material gas discharge toward the substrate.

[0043] A buffer bag is arranged on the spiral groove of the limit piece, and the buffer bag is connected with the limit cavity in the limit piece through a water pipe. When working, the buffer bag is filled with coolant and expands, which effectively increases the contact area between the raw gas and the coolant, and further reduces the temperature of the raw gas when it is discharged. At the same time, the buffer bag and the coolant therein effectively buffer the raw gas discharged from the gas outlet, and fully improve the protection of the limit piece. In addition, in the process of the raw gas passing through the gas outlet and the spiral groove, the raw gas is fully in contact with the buffer bag, so that the precipitate carried in the raw gas is attached to the surface of the buffer bag, and the precipitate is collected. When not working, the buffer bag is not filled with coolant and shrinks, so that the precipitate attached to the surface of the buffer bag is shaken off until it is stored in the collecting piece, and the precipitate is further collected. BRIEF DESCRIPTION OF THE DRAWINGS

[0044] The accompanying drawings, which constitute a part of the specification, illustrate embodiments disclosed in the present application and, together with the description, serve to explain the principles disclosed in the present application.

[0045] The present application can be more clearly understood from the following detailed description with reference to the accompanying drawings, in which:

[0046] Figure 1 It is the overall three-dimensional structure diagram of the present invention;

[0047] Figure 2 It is a three-dimensional structural diagram of the overall section of the present invention;

[0048] Figure 3 It is a three-dimensional structural diagram of the exhaust mechanism and the cooling mechanism in the present invention;

[0049] Figure 4 It is a three-dimensional structural diagram of the exhaust mechanism and the cooling mechanism located at the cross section of the exhaust pipe in the present invention;

[0050] Figure 5 It is a cross-sectional three-dimensional structural diagram of the exhaust mechanism and the cooling mechanism in the present invention;

[0051] Figure 6 It is a three-dimensional composition of the exhaust mechanism in the present invention;

[0052] Figure 7 It is a cross-sectional three-dimensional structural diagram of the exhaust mechanism in the present invention;

[0053] Figure 8 It is a three-dimensional structural diagram of the cooling mechanism in the present invention;

[0054] Fig. 9 It is a three-dimensional structural diagram of the cooling pipeline, the water inlet valve and the water outlet valve in the present invention;

[0055] Fig.10It is a three-dimensional structural diagram of the collecting member, the limiting mechanism, the fixing tube, the fixing member, and the fixing membrane in the present invention;

[0056] Fig.11 It is a three-dimensional structural diagram of the limiting member, the fixing tube, the fixing member and the fixing membrane located at the cross section of the collecting member in the present invention;

[0057] Fig.12 It is a three-dimensional structural diagram of the limiting mechanism and the collecting member in the present invention;

[0058] Fig.13 It is a three-dimensional structural diagram of a limiting member located on the cross section of the collecting member in the present invention;

[0059] Fig.14 It is a three-dimensional structural diagram of the limiting member and the partition plate in the present invention;

[0060] Fig.15 A three-dimensional structural diagram of a set of limit members and a partition plate in the present invention;

[0061] Fig.16 It is a three-dimensional structural diagram of the limiter, the water inlet valve and the water outlet valve in the present invention;

[0062] Fig.17 It is a cross-sectional structural diagram of the buffer bag and the water pipe in the present invention.

[0063] In the figure: 1. deposition furnace mechanism; 11. furnace body; 12. sealing door; 13. air outlet; 14. deposition table; 15. substrate; 2. mixing box mechanism; 21. box body; 22. air inlet; 3. exhaust mechanism; 31. exhaust pipe; 32. air pump; 33. exhaust valve; 4. dispersion mechanism; 41. dispersion pipeline; 42. fixed pipe; 43. fixed part; 44. fixed membrane; 5. power mechanism; 51. hydraulic press; 52. hydraulic rod; 6. cooling mechanism; 61. cooling pipeline; 62. water inlet valve; 63. water outlet valve; 64. collecting part; 7. limiting mechanism; 71. limiting part; 72. partition plate; 73. buffer bag; 74. water pipe. DETAILED DESCRIPTION

[0064] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application. Embodiment 1

[0065] A gas guide device for a chemical vapor deposition furnace, comprising:

[0066] See also Figure 1-Figure 2The deposition furnace mechanism 1 is used to provide environmental conditions for the CVD reaction. The deposition furnace mechanism 1 includes a furnace body 11, a sealing door 12, a gas outlet 13, a deposition platform 14 and a substrate 15. A heating device is arranged inside the furnace body 11 to effectively maintain the temperature inside the furnace body 11. A sealing hole is opened on one side wall of the furnace body 11, and one end of the sealing door 12 is movably connected to the sealing hole of the furnace body 11. The staff can open the furnace body 11 through the sealing door 12 to place the workpiece on the substrate 15 or take out the workpiece placed on the substrate 15. The bottom end of the furnace body 11 is fixedly connected with the gas outlet 13, and the waste gas generated after the reaction can be discharged from the furnace body 11 through the gas outlet 13. The deposition platform 14 is fixedly arranged at the bottom end of the furnace body 11, and the substrate 15 is fixedly arranged on the top of the deposition platform 14, so that the raw material gas discharged into the furnace body 11 can react chemically on the substrate 15 under the action of high temperature to form a thin film.

[0067] See also Figure 1-Figure 2 A mixing box mechanism 2 is provided on the external side of the deposition furnace mechanism 1 for fully mixing a plurality of raw material gases. The mixing box mechanism 2 comprises a box body 21 and an air inlet 22. The top end of the box body 21 is fixedly connected with the other end of the exhaust pipe 31, and the raw material gas in the box body 21 can be discharged into the exhaust pipe 31. The lower half side wall of the box body 21 is fixedly connected with the air inlet 22, and the number of the air inlet 22 is several, and several raw material gases can be discharged into the box body 21 at the same time to achieve full mixing of the raw material gases.

[0068] See also Figure 1-Figure 7 , the exhaust mechanism 3 includes an exhaust pipe 31, an air pump 32, an exhaust valve 33, a dispersion mechanism 4 and a power mechanism 5. The exhaust pipe 31 is fixedly connected to the furnace body 11 and is used to introduce raw gas into the furnace body 11. The air pump 32 is fixedly arranged on the exhaust pipe 31 and can provide power for the unidirectional movement of the raw gas in the exhaust pipe 31. The exhaust valve 33 is fixedly arranged inside the exhaust pipe 31 to ensure the stability and unidirectionality of the movement of the raw gas in the exhaust pipe 31.

[0069] See also Figure 2-Figure 7 , the dispersion mechanism 4 is fixedly arranged at the top of the furnace body 11, and is used to fully distribute the raw material gas. The dispersion mechanism 4 includes a dispersion pipeline 41, a fixed pipe 42, a fixed member 43 and a fixed film 44. Please refer to Figure 3 One side of the dispersion pipe 41 is fixedly connected to one end of the exhaust pipe 31, and the raw material gas in the exhaust pipe 31 can be discharged into the dispersion pipe 41, so as to achieve uniform dispersion of the raw material gas in the dispersion pipe 41. The dispersion pipe 41 is annular in shape, and the dispersion pipe 41 is located directly above the substrate 15, which can provide conditions for uniform distribution of the raw material gas on the substrate 15. Please refer to Figure 6-Figure 7The top of the dispersion pipe 41 is fixedly connected to the top of the interior of the furnace body 11, and the bottom of the dispersion pipe 41 is fixedly connected with a fixed pipe 42. There are several fixed pipes 42, and the fixed pipes 42 are evenly arranged around the dispersion pipe 41. The use of the fixed pipe 42 further ensures the uniform distribution of the raw material gas. A fixed cavity is opened inside the fixed pipe 42, and an air outlet is opened on the middle side wall of the fixed pipe 42, which can discharge the raw material gas in the dispersion pipe 41 into the fixed cavity of the fixed pipe 42, and then discharge it from the air outlet of the fixed pipe 42. The number of air outlets of the fixed pipe 42 is three, and they are evenly arranged around the fixed pipe 42. The air outlet is used to effectively realize the uniform discharge of the raw material gas in the fixed pipe 42. The lower end of the fixed pipe 42 is movably connected with the fixing part 43. The upper half of the fixing part 43 is truncated cone-shaped, and the fixing part 43 will not block the air outlet of the fixed pipe 42. The shape setting of the fixing part 43 can effectively promote The raw gas in the fixed cavity moves toward the outlet position to fully realize the discharge of the raw gas. The top edge of the fixing part 43 and the bottom edge of the fixed tube 42 are fixedly connected by a fixed membrane 44, and the fixed membrane 44 is a high-temperature resistant rubber material that can be vertically extended and retracted, which effectively ensures the sealing between the fixed tube 42 and the fixing part 43, and prevents the raw gas in the fixed tube 42 from escaping from the lower end of the fixed tube 42. In summary, when the fixing part 43 moves upward, the fixed membrane 44 is compressed, and the fixed cavity space in the fixed tube 42 is compressed synchronously, thereby effectively promoting the gas in the fixed cavity to escape from the outlet and enhancing the instantaneous speed of the gas flow through the outlet. When the fixing part 43 moves downward, the fixed membrane 44 is stretched, and the fixed cavity space in the fixed tube 42 is expanded synchronously, thereby reducing the instantaneous speed of the gas flow through the outlet, thereby realizing the continuous change of the gas flow speed discharged from the fixed tube 42, and effectively reducing the deposition of the reaction.

[0070] See also Figure 1-Figure 7 , power mechanism 5, a power mechanism 5 is fixedly arranged in the middle of the top of the furnace body 11, and the power mechanism 5 is fixedly connected to the dispersion mechanism 4, which is used to provide a power source for the change of the dispersion mechanism 4, and the power mechanism 5 includes a hydraulic press 51 and a hydraulic rod 52, the hydraulic press 51 is fixedly arranged in the middle of the top of the furnace body 11, one end of the hydraulic rod 52 passes through the furnace body 11 and is movably connected to the bottom end of the hydraulic press 51, and the other end of the hydraulic rod 52 is provided with a plurality of branches, and the branches of the hydraulic rod 52 are respectively movably engaged with the bottom end of the fixing member 43, and the hydraulic press 51 can drive the hydraulic rod 52 to move up and down, thereby synchronously driving the fixing member 43 to move up and down, thereby realizing the change of the fixed cavity space of the fixed tube 42. Embodiment 2

[0071] Based on the first embodiment, a gas guide device for a chemical vapor deposition furnace further includes:

[0072] See also Figure 1-Figure 5 , Figure 8-Figure 17A cooling mechanism 6 is fixedly provided below the dispersion mechanism 4, and is used to cool the raw material gas just discharged from the dispersion mechanism 4, so as to reduce the possibility of reaction and deposition of the raw material gas near the gas outlet of the dispersion mechanism 4. The cooling mechanism 6 includes:

[0073] See also Figure 3-Figure 5 , Figure 8-Figure 9 , cooling pipe 61, the shape of the cooling pipe 61 consists of two straight rods and a circular ring, and the straight rods of the cooling pipe 61 are fixedly sleeved with the two side walls of the furnace body 11, the circular ring of the cooling pipe 61 is fixedly connected to the bottom end of the dispersion pipe 41, and a cooling cavity is opened inside the cooling pipe 61, and one end of the cooling cavity of the cooling pipe 61 is a water inlet, and the other end of the cooling cavity of the cooling pipe 61 is a water outlet, so that water is taken in through the water inlet of the cooling pipe 61 and water is discharged through the water outlet, so that the coolant flows in the cooling pipe 61, thereby providing a function for cooling the raw gas.

[0074] See also Figure 10-Figure 17 , limiting mechanism 7, a limiting mechanism 7 is fixedly arranged at the bottom end of the cooling pipe 61, and the limiting mechanism 7 surrounds the outside of the fixed pipe 42, the limiting mechanism 7 corresponds to the fixed pipe 42 one by one, and is used to timely cool down the raw gas discharged from the fixed pipe 42, the limiting mechanism 7 includes a limiting member 71 and a partition plate 72, a limiting cavity is provided at the top of the limiting member 71, and the limiting cavity of the limiting member 71 is fixedly connected with the cooling cavity of the cooling pipe 61, that is, the flow of the coolant in the cooling pipe 61 and the limiting member 71 is realized, the limiting member 71 is spirally arranged, and the spiral degree of the limiting member 71 is greater than or equal to 180 degrees, the limiting members 71 are three in number, and are evenly arranged around the fixed pipe 42, and the three limiting members 71 are used to effectively surround the fixed pipe 42, so that the raw gas discharged from the gas outlet of the fixed pipe 42 can be timely and fully cooled down by the limiting member 71, thereby In order to reduce the possibility of reaction and precipitation of the raw gas in the area of ​​the fixed tube 42, a partition plate 72 is fixedly sleeved in the limiting cavity of the limiting member 71, and the limiting member 71 divides the limiting cavity into an inner cavity and an outer cavity through the partition plate 72, and the bottom end of the inner cavity is connected to the bottom end of the outer cavity, effectively setting the movement path of the coolant in the limiting member 71, that is, it moves in the inner cavity first and then moves in the outer cavity, further ensuring that the coolant fully cools the raw gas, and a spiral groove is opened at the top of the limiting member 71, and the inner wall of the limiting member 71 is lower than the outer wall of the limiting member 71, the outer walls of two adjacent limiting members 71 are in contact, and the position of the limiting member 71 corresponds one by one to the gas outlet of the fixed tube 42, so that the raw gas discharged from the gas outlet can move in the spiral groove of the limiting member 71 and be discharged from the bottom end of the limiting member 71, thereby realizing the spiral and uniform downward discharge of the raw gas.

[0075] See also Fig. 9 , Fig.16, a water inlet valve 62, a water inlet valve 62 is fixedly provided at the bottom end of the cooling pipe 61, and the water inlet valve 62 is arranged at the top end of the inner cavity of the limiter 71, the water inlet valve 62 is a one-way valve, and the water flow direction of the water inlet valve 62 is from the cooling pipe 61 to the limiter 71.

[0076] See also Fig. 9 , Fig.16 , a water outlet valve 63, a water outlet valve 63 is fixedly provided at the bottom end of the cooling pipe 61, and the water outlet valve 63 is arranged at the top end of the outer cavity of the limiter 71, the water outlet valve 63 is a one-way valve, and the water flow direction of the water outlet valve 63 is from the limiter 71 to the cooling pipe 61. By setting the water inlet valve 62 and the water outlet valve 63, the flow path of the coolant in the limiter 71 can be effectively limited, the unidirectional movement of the coolant can be ensured, and sufficient cooling of the raw gas can be achieved. Embodiment 3

[0077] Based on Example 2, please refer to Figure 8-Figure 17 , the limiting mechanism 7 also includes:

[0078] The buffer capsule 73 is fixedly connected to the outer wall of the limit piece 71 in the spiral groove, and the number of the buffer capsules 73 is several. The buffer capsule 73 is made of high-temperature resistant rubber material, and the inner wall of the buffer capsule 73 is fixedly connected to a transverse spring. When the buffer capsule 73 is filled with coolant, the buffer capsule 73 is fully expanded and the transverse spring is stretched. At this time, the buffer capsule 73 is in full contact with the moving raw gas, further realizing the cooling of the raw gas. When the buffer capsule 73 is not filled with coolant, the transverse spring is compressed. At this time, the buffer capsule 73 contracts and wrinkles are generated, thereby effectively shaking the sediment attached to the buffer capsule 73 and dropping it onto the spiral groove of the limit piece 71.

[0079] The water pipe 74, the bottom end of the buffer capsule 73 is fixedly connected to one end of the water pipe 74, and the other end of the water pipe 74 is fixedly connected to the limiting cavity of the limiting member 71, so that the coolant can move in the limiting member 71 and the buffer capsule 73 through the water pipe 74, thereby realizing the change of the shape of the buffer capsule 73 and realizing the function of the buffer capsule 73 in this state.

[0080] See also Figure 8 , Figure 10-12 , the cooling mechanism 6 also includes:

[0081] The collecting member 64 and the bottom end of the limiting member 71 are fixedly connected to the top of the collecting member 64 . A collecting groove is provided at the top of the collecting member 64 , which can effectively collect the precipitate impurities from the spiral groove of the limiting member 71 , thereby effectively preventing the precipitate impurities from affecting the film forming effect on the substrate 15 .

[0082] The working principle of the method of the present invention is as follows:

[0083] When the gas guide device is working, firstly, several raw materials are filled into the box 21 through the air inlet 22 and fully mixed, and then discharged into the dispersion pipe 41 through the exhaust pipe 31, and then the raw materials are evenly distributed in the dispersion pipe 41 and discharged into the fixed cavity of the fixed pipe 42, and finally the raw materials are discharged from the gas outlet of the fixed pipe 42 and react under high temperature conditions. In the process of continuous discharge of the raw materials, the hydraulic press 51 controls the hydraulic rod 52 to move up and down reciprocatingly. When the hydraulic rod 52 moves down, it effectively drives the fixed part 43 to move down, so that the space in the fixed cavity of the fixed pipe 42 is increased, so that part of the raw materials are stored in the fixed cavity, and the raw materials are effectively realized. The speed of discharging the gas from the outlet is slowed down. When the hydraulic rod 52 moves upward, it effectively drives the fixing part 43 to move upward, thereby reducing the space in the fixed cavity of the fixed tube 42, so that the raw gas moved into the fixed cavity is instantly pushed out of the outlet, effectively increasing the instantaneous impact force of the airflow, so that the instantaneous impact force can fully impact the sediment that may accumulate at the outlet, thereby achieving effective cleaning of the sediment near the outlet. The reciprocating movement of the hydraulic rod 52 can drive the fixed tube 42 to reciprocate and change the airflow velocity, thereby effectively avoiding the outlet from having a long-term and gently moving airflow, reducing the possibility of sediment being deposited at the outlet of the fixed tube 42, and extending the service life of the air guide device.

[0084] At the same time, the raw gas discharged from the outlet will be introduced into the spiral groove of the limiter 71, and discharged to the substrate 15 from the bottom of the limiter 71, effectively realizing the oblique downward spiral diversion of the raw gas, thereby improving the uniformity of the raw gas discharge in the direction of the substrate 15. In the process of the movement of the raw gas, the coolant in the limiter 71 and the buffer bag 73 can effectively cool down the raw gas in time. Because CVD needs to react under certain high temperature conditions, if the temperature is lower than a certain value, the raw gas will not precipitate. Therefore, the cooling operation of the limiter 7 can prevent the raw gas from reacting and depositing at the outlet of the fixed tube 42, further extending the service life of the gas guide device.

[0085] When the air guide device is not working, there is no coolant in the buffer bag 73, and the buffer bag 73 is in a contracted state due to the action of the transverse spring. In the process of wrinkling the buffer bag 73, the sediment impurities that may be attached to the wall of the buffer bag 73 can be shaken off and discharged into the collecting member 64 through the spiral groove of the limiting member 71, thereby effectively realizing the full collection of the sediment impurities.

Claims

1. A gas guide device for a chemical vapor deposition furnace, characterized in that: include: A deposition furnace mechanism (1), the deposition furnace mechanism (1) comprising a furnace body (11); An exhaust mechanism (3), the exhaust mechanism (3) comprising an exhaust pipe (31), a dispersion mechanism (4) and a power mechanism (5), the exhaust pipe (31) being fixedly connected to the furnace body (11) and used for introducing raw material gas into the furnace body (11); The dispersion mechanism (4) is fixedly arranged at the top of the furnace body (11), and comprises a dispersion pipe (41), a fixed pipe (42), a fixed part (43) and a fixed membrane (44); one side of the dispersion pipe (41) is fixedly connected to one end of the exhaust pipe (31), and the bottom end of the dispersion pipe (41) is fixedly connected to the fixed pipe (42); a fixed cavity is provided inside the fixed pipe (42), and an air outlet is provided on a middle side wall of the fixed pipe (42); the lower end of the fixed pipe (42) is movably sleeved with the fixed part (43), and the top edge of the fixed part (43) and the bottom edge of the fixed pipe (42) are fixedly connected via the fixed membrane (44); The power mechanism (5) is fixedly arranged at the middle of the top end of the furnace body (11), and the power mechanism (5) is fixedly connected to the dispersion mechanism (4) to provide a power source for the change of the dispersion mechanism (4); A cooling mechanism (6), wherein a cooling mechanism (6) is fixedly arranged below the dispersion mechanism (4) and is used to cool the raw material gas just discharged from the dispersion mechanism (4); The cooling mechanism (6) comprises: A cooling pipe (61), wherein the cooling pipe (61) is composed of two straight rods and a circular ring, and the straight rods of the cooling pipe (61) are fixedly sleeved with the wall surfaces on both sides of the furnace body (11), and the circular ring of the cooling pipe (61) is fixedly connected with the bottom end of the dispersion pipe (41), and a cooling cavity is provided inside the cooling pipe (61), and one end of the cooling cavity of the cooling pipe (61) is a water inlet, and the other end of the cooling cavity of the cooling pipe (61) is a water outlet; A limiting mechanism (7), wherein the bottom end of the cooling pipe (61) is fixedly provided with the limiting mechanism (7), and the limiting mechanism (7) surrounds the outside of the fixed pipe (42), and the limiting mechanism (7) corresponds to the fixed pipe (42) in a one-to-one manner; The limiting mechanism (7) comprises: A limiting member (71), wherein a limiting cavity is provided at the top end of the limiting member (71), and the limiting cavity is fixedly connected to the cooling cavity of the cooling pipe (61), the limiting member (71) is spirally arranged, and the spiral degree of the limiting member (71) is ≥180 degrees, the number of the limiting members (71) is three, and they are evenly arranged around the fixed pipe (42), the top end of the limiting member (71) is provided with a spiral groove, and the inner wall surface of the limiting member (71) is lower than the outer wall surface of the limiting member (71), the outer wall surfaces of two adjacent limiting members (71) are in contact, and the position of the limiting member (71) corresponds one-to-one to the air outlet of the fixed pipe (42); a partition plate (72), wherein the partition plate (72) is fixedly sleeved in the limiting cavity of the limiting member (71), and the limiting member (71) divides the limiting cavity into an inner cavity and an outer cavity through the partition plate (72), and the bottom end of the inner cavity is connected to the bottom end of the outer cavity; A buffer capsule (73), wherein the outer wall surface of the limiting member (71) in the spiral groove is fixedly connected to the buffer capsule (73), and the number of the buffer capsules (73) is a plurality, the buffer capsule (73) is made of high-temperature resistant rubber material, and the inner wall of the buffer capsule (73) is fixedly connected to a transverse spring; A water pipe (74), wherein the bottom end of the buffer capsule (73) is fixedly connected to one end of the water pipe (74), and the other end of the water pipe (74) is fixedly connected to the limiting cavity of the limiting member (71).

2. The gas guide device for a chemical vapor deposition furnace according to claim 1, characterized in that: The deposition furnace mechanism (1) further comprises: A sealing door (12), wherein a sealing hole is provided on a side wall of the furnace body (11), and one end of the sealing door (12) is movably connected to the sealing hole of the furnace body (11); A gas outlet member (13), wherein the bottom end of the furnace body (11) is fixedly connected to the gas outlet member (13); A deposition platform (14), wherein the deposition platform (14) is fixedly arranged at the inner bottom end of the furnace body (11); A substrate (15) is fixedly arranged on the top of the deposition platform (14).

3. The gas guide device for a chemical vapor deposition furnace according to claim 2, characterized in that: The air guide device also includes: A mixing box mechanism (2) is provided on one side of the outside of the deposition furnace mechanism (1) and is used to fully mix a plurality of raw material gases.

4. The gas guide device for a chemical vapor deposition furnace according to claim 3, characterized in that: The mixing box mechanism (2) comprises: A box body (21), wherein the top end of the box body (21) is fixedly connected to the other end of the exhaust pipe (31); An air intake member (22), wherein the lower half side wall of the box body (21) is fixedly connected to the air intake member (22), and the number of the air intake members (22) is several.

5. The gas guide device for a chemical vapor deposition furnace according to claim 4, characterized in that: The exhaust mechanism (3) further comprises: An air pump (32), the air pump (32) being fixedly disposed on the exhaust pipe (31); An exhaust valve (33), wherein the exhaust pipe (31) is fixedly provided with an exhaust valve (33).

6. The gas guide device for a chemical vapor deposition furnace according to claim 5, characterized in that: The dispersion pipe (41) is annular in shape and is located directly above the substrate (15). The number of the fixed pipes (42) is a plurality and the fixed pipes (42) are evenly arranged around the dispersion pipe (41). The number of the air outlets of the fixed pipe (42) is three and they are evenly arranged around the fixed pipe (42). The upper half of the fixing member (43) is truncated in shape and the fixing member (43) does not block the air outlet of the fixed pipe (42). The fixing membrane (44) is made of a high temperature resistant rubber material that can be vertically extended and retracted.

7. The gas guide device for a chemical vapor deposition furnace according to claim 6, characterized in that: The power mechanism (5) comprises: A hydraulic press (51), wherein the hydraulic press (51) is fixedly arranged at the middle of the top end of the furnace body (11); A hydraulic rod (52), one end of which passes through the furnace body (11) and is movably connected to the bottom end of the hydraulic press (51), and the other end of the hydraulic rod (52) is provided with a plurality of branches, and the branches of the hydraulic rod (52) are respectively movably engaged with the bottom end of the fixing member (43).

8. The gas guide device for a chemical vapor deposition furnace according to claim 7, characterized in that: The cooling mechanism (6) further comprises: A water inlet valve (62), wherein the bottom end of the cooling pipe (61) is fixedly provided with the water inlet valve (62), and the water inlet valve (62) is arranged at the top end of the inner cavity of the limiting member (71), the water inlet valve (62) is a one-way valve, and the water flow direction of the water inlet valve (62) is from the cooling pipe (61) to the limiting member (71); A water outlet valve (63), wherein the bottom end of the cooling pipe (61) is fixedly provided with the water outlet valve (63), and the water outlet valve (63) is arranged at the top end of the outer cavity of the limiting member (71), the water outlet valve (63) is a one-way valve, and the water flow direction of the water outlet valve (63) is from the limiting member (71) to the cooling pipe (61); The collecting member (64) has a bottom end of the limiting member (71) fixedly connected to a top end of the collecting member (64), and a collecting groove is provided at the top end of the collecting member (64).

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