A heating unit device for photoresist baking process
By introducing automatic cleaning and flatness detection mechanisms into the heating unit device of the photoresist baking process, the heating module and the top rod are solved, and the baking quality and efficiency are improved.
Patent Information
- Application Number
- CN202411759626.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-03
- Publication Date
- 2025-04-29
- Estimated Expiration
- 2044-12-03
AI Technical Summary
The heating unit device of the existing photoresist baking process is prone to the adhesion of impurities on the top of the heating module and the top rod, resulting in incomplete fit between the substrate and the heating module, resulting in uneven heating and aggregation of impurities in the adsorption holes, affecting the baking quality.
A heating unit device for photoresist baking process is designed, including an automatic cleaning mechanism and a flatness detection system. Through the push mechanism and detection assembly, the cleaning block and the first T-shaped guide can automatically clean the top of the heating module and the top rod, and detect the flatness of the heating module through the distance sensor to ensure the fit of the substrate to the heating module.
Automatic cleaning of the heating module and the top rod and flatness detection of the heating module are realized, ensuring a good fit between the substrate and the heating module, and improving the quality and efficiency of the baking process.
Smart Images

Figure CN119225129B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of wafer processing, in particular to a heating unit device for a photoresist baking process. Background Art
[0002] In the semiconductor industry or flat panel liquid crystal display industry, the processed substrate needs to go through a complex process. In this complex and lengthy process, the various complex circuit structures designed by the chip are transferred to the substrate through the photolithography process (adhesion enhancement, glue coating, baking, cooling, exposure, etc.). In the process of realizing the transfer of this complex logic circuit, the photoresist in the photolithography process plays an important role. Photoresist is a photosensitive substance, which contains a large amount of organic solvents, photosensitive chemicals and other liquids. In the photolithography process, it is an extremely important step to process and bake the coated photoresist. In this heating and baking process, the heating module on the photoresist baking machine is used to bake the above-mentioned organic solvents and other solvents to make them volatilize. The heating module is provided with multiple ejector pins and multiple adsorption holes. The ejector pins are used to lift the substrate when taking and placing materials, and the adsorption holes are used to adsorb the substrate during baking.
[0003] However, when the heating unit device of the existing photoresist baking process is in use, impurities are easily adhered to the top of the heating module and the top rod, resulting in the substrate not being able to fully fit with the heating module after being placed, resulting in uneven heating. At the same time, the flatness of the surface of the heating module will also affect the fitting effect between the substrate and the heating module, and impurities are also easily accumulated in the adsorption holes, affecting its adsorption effect on the substrate. When the substrate is not fully fitted with the heating module, it is not easy to be discovered, thereby affecting the quality of baking. Summary of the invention
[0004] The object of the present invention is to provide a heating unit device for a photoresist baking process to solve the problems raised in the above background technology.
[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a heating unit device for a photoresist baking process, comprising a photoresist baking machine arranged on the top of a bottom plate, the photoresist baking machine comprising a box body and a heating module arranged on the top of the box body, and the top of the heating module is provided with a plurality of ejector rods and a plurality of adsorption holes, the top of the bottom plate is connected to a sealing cover through a lifting module, and the top of the sealing cover is fixedly connected to an exhaust fan, the top of the bottom plate is fixedly connected to a support plate, the side wall of the support plate is fixedly connected to a cylinder, and the telescopic end of the cylinder is fixedly connected to a bracket;
[0006] The top of the box body is provided with a strip-shaped opening, and a guide rod is fixedly connected in the strip-shaped opening, a sliding block is slidably connected to the side wall of the guide rod, a return spring is sleeved on the side wall of the guide rod, and a mounting plate is fixedly connected to the side wall of the sliding block, a cleaning block is fixedly connected to the side wall of the mounting plate, and a plurality of first T-shaped guide rods are arranged through the top of the mounting plate, each of the first T-shaped guide rods is connected to the bottom of the mounting plate through a telescopic mechanism, and a detection component for detecting the movement of the first T-shaped guide rod is arranged on the side wall of the sliding block;
[0007] A fixed tube is fixedly connected to the bottom of the heating module, and a movable disk is connected to the fixed tube via a first reset mechanism, a plurality of first movable rods arranged in an array are fixedly connected to the top of the movable disk, and a pressure sensor is fixedly inserted into the side wall of the fixed tube, a movable ring is connected to the box body via a second reset mechanism, and the top rod is fixed to the top of the movable ring, an exhaust mechanism for exhausting air from the fixed tube is provided at the bottom of the box body, and the movement of the sliding block is driven by the first pushing mechanism, the movement of the first movable rod is driven by the second pushing mechanism, and the movement of the movable ring is driven by the third pushing mechanism.
[0008] Preferably, the detection component includes an L-shaped plate fixedly connected to the side wall of the mounting plate, and the side wall of the L-shaped plate is fixedly connected to an L-shaped block, the side wall of the L-shaped block is fixedly inserted with a distance sensor, and the side wall of the L-shaped plate is inserted with two symmetrically arranged sliding rods, the two ends of the sliding rod are respectively fixedly connected with a first moving block and a second moving block, and the side wall of each sliding rod is sleeved with a first spring, the top of the mounting plate is fixedly connected with a first support block and a second support block, and the side wall of the first support block is fixedly connected with a pull rope, the other end of the pull rope passes through the side wall of the second support block and is fixed to the side wall of the first moving block, the side wall of each of the first T-shaped guide rods is fixedly connected with a fixing ring, and the fixing ring is fixedly sleeved on the side wall of the pull rope.
[0009] Preferably, the vacuum mechanism includes an L-shaped bracket fixedly connected to the bottom of the box, and the side wall of the L-shaped bracket is fixedly connected to a cylinder, a piston is slidably connected in the cylinder, the upper end of the piston is fixedly connected to a connecting rod, and the upper end of the connecting rod is fixed to the bottom of the movable ring, and an air pipe is fixedly connected between the cylinder and the fixed pipe.
[0010] Preferably, the first pushing mechanism includes a first movable plate, and the first movable plate is connected to the side wall of the box body through a third reset mechanism, a first inclined surface is provided on the top of the first movable plate, and a pushing block is fixedly connected to the bottom of the first movable plate, and the pushing block includes a second inclined surface, and the inner side wall of the box body is connected to the second movable plate through a movable module.
[0011] Preferably, the first reset mechanism includes two symmetrically arranged second moving rods inserted at the bottom of the fixed tube, and the upper end of each second moving rod is fixedly connected with a connecting block, the connecting block is fixed to the side wall of the moving disk, and the side wall of each second moving rod is sleeved with a second spring.
[0012] Preferably, the second pushing mechanism includes a third movable plate inserted in the side wall of the box body, and the third movable plate includes a third inclined surface and a fourth inclined surface, and the side wall of the sliding block is fixedly connected to a connecting frame, and the connecting frame is fixed to the side wall of the third movable plate.
[0013] Preferably, the third pushing mechanism includes a pushing plate fixedly connected to the bottom of the moving ring, and the pushing plate includes a fifth inclined surface.
[0014] Preferably, the second reset mechanism includes two symmetrically arranged sleeve rods fixedly connected to the bottom of the box body, and the side wall of each sleeve rod is sleeved with a sleeve, the upper end of the sleeve is fixed to the bottom of the movable ring, and the side wall of each sleeve is sleeved with a third spring.
[0015] Preferably, the third reset mechanism includes two symmetrically arranged second T-shaped guide rods fixedly connected to the bottom of the first movable plate, and the side walls of the second T-shaped guide rods are sleeved with connecting plates, the connecting plates are fixed to the inner side walls of the box body, and the side walls of each second T-shaped guide rod are sleeved with a fourth spring.
[0016] Preferably, the telescopic mechanism comprises a circular ring fixedly sleeved on the side wall of each first T-shaped guide rod, the side wall of each first T-shaped guide rod is sleeved with a fifth spring, and both ends of the fifth spring are respectively fixed to the circular ring and the mounting plate.
[0017] Compared with the prior art, the present invention has the following beneficial effects:
[0018] (1) The heating unit device of the photoresist baking process is provided with a first pushing mechanism and a detection component. When the baking process is performed, the substrate to be heated is first placed on the bracket by an external transfer robot. Then, the second moving plate is driven by the moving module to move in a direction close to the pushing plate. When the second moving plate abuts against the second inclined surface, the pushing block and the first moving plate can be pushed to move upward. At the same time, the fourth spring is compressed. When the first moving plate moves upward, the first inclined surface abuts against the bottom of the sliding block, thereby pushing the sliding block to move to the other side along the strip opening. At the same time, the cleaning block and the first T-shaped guide rod are driven to move synchronously. The cleaning block can automatically clean the top of the heating module and the top rod. At the same time, the first T-shaped guide rod can slide on the top of the heating module. When there is a pit or a protrusion on the top of the heating module, the first T-shaped guide rod will move in the vertical direction and pull the pull rope through the fixed ring, so that the first moving block and the second moving block move close to each other. When the second movable plate continues to move, when the second movable plate abuts against the fifth inclined surface, the movable ring and the push rod can be pushed to move upward. At the same time, the third spring is stretched, and the second movable plate slides at the bottom of the pushing block. After cleaning is completed, the second movable plate stops moving. At this time, the cylinder drives the bracket and the substrate to be heated to the top of the push rod. Then, the cylinder moves the bracket to reset. Then, the moving module makes the second movable plate move away from the pushing plate and disengage from the pushing plate, while the second movable plate still slides at the bottom of the pushing block. At this time, the push rod and the movable ring can move downward under the action of the third spring, and make the substrate fit with the top of the heating module.
[0019] (2) The heating unit device of the photoresist baking process is provided with an exhaust mechanism and a first reset mechanism, etc. When the cleaning block cleans the heating module and the top of the ejector rod, when the sliding block moves, the cleaning block is driven to move by the mounting plate, and the third movable plate is driven to move synchronously by the connecting frame. When the lower end of the second movable rod slides along the third inclined surface to the top of the third movable plate, the movable plate and the first movable rod can be pushed to move upward. At the same time, the second spring is compressed. At this time, the first movable rod is moved upward along the adsorption hole, which can not only push the impurities in the adsorption hole upward to automatically clean it, but also seal the top of the adsorption hole to prevent the cleaning block from During cleaning, impurities fall into the adsorption holes, thereby ensuring the subsequent adsorption effect on the substrate. After the cleaning block finishes cleaning, the lower end of the second moving rod slides downward along the fourth inclined surface. At this time, the moving plate and the first moving rod can move downward and reset under the action of the second spring, and keep the bottom of the adsorption hole connected. When the second moving plate abuts against the fifth inclined surface, the moving ring is pushed to move upward. At the same time, the piston is driven upward by the connecting rod, so that the air temporarily stored in the cylinder can be squeezed into the fixed tube. Then, the substrate is placed on the top of the push rod, and the bracket is moved and reset by the cylinder. Then, the second moving plate is moved away from the pushing plate and separated from the pushing plate through the moving module. The second movable plate is still sliding at the bottom of the pushing block. At this time, the push rod and the movable ring can move downward under the action of the third spring, and make the substrate fit with the top of the heating module. Moreover, when the movable ring moves downward, the piston is pushed downward by the connecting rod. At this time, the air in the fixed tube can enter the cylinder for temporary storage, so that negative pressure is generated in the fixed tube, so that the substrate can be adsorbed through the adsorption hole. Moreover, the pressure in the fixed tube is detected by the pressure sensor. If the pressure sensor detects that the pressure in the fixed tube becomes larger, it means that the substrate and the heating module are not completely fitted. Therefore, the fitting state of the substrate and the heating module can be detected during heating and baking to ensure the quality of heating and baking. After the heating and baking is completed, the second movable plate is driven by the moving module to move in the direction close to the pushing plate, and the moving ring and the push rod are driven to move upward, so as to lift the baked substrate upward. At the same time, the air temporarily stored in the cylinder can be squeezed into the fixed tube, so that the fixed tube is no longer in a negative pressure state. Then, the baked substrate is removed from the top of the push rod through the bracket. Finally, the second movable plate is driven by the moving module to move and reset. At this time, the push rod and the moving ring can move downward and reset under the action of the third spring, the first movable plate can move downward and reset under the action of the fourth spring, the sliding block can move and reset under the action of the reset spring, and drive the mounting plate and the cleaning block to move and reset. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 It is a schematic diagram of the overall structure of the present invention;
[0021] Figure 2 It is a partial cross-sectional structural schematic diagram of the box body and the heating module in the present invention;
[0022] Figure 3 It is a partial cross-sectional structural schematic diagram of the box body in another viewing angle of the present invention;
[0023] Figure 4 It is a schematic diagram of the positions of the air extraction mechanism and the second pushing mechanism in the present invention;
[0024] Figure 5 for Figure 1 A schematic diagram of the enlarged structure at A in the middle;
[0025] Figure 6 for Figure 2 A schematic diagram of the enlarged structure at B in the middle;
[0026] Figure 7 for Figure 3 Schematic diagram of the enlarged structure at C in the middle;
[0027] Figure 8 for Figure 4 Schematic diagram of the enlarged structure at D in the middle;
[0028] Fig. 9 for Figure 5 Schematic diagram of the enlarged structure at E in the middle;
[0029] Fig.10 for Figure 5 The enlarged structural diagram at F in the middle;
[0030] Fig.11 for Figure 8 Schematic diagram of the enlarged structure at G in the middle.
[0031] In the figure: 1, bottom plate; 201, first support block; 202, second support block; 203, fixing ring; 204, pull rope; 205, L-shaped plate; 206, first moving block; 207, first spring; 208, L-shaped block; 209, distance sensor; 210, sliding rod; 211, second moving block; 301, L-shaped bracket; 302, cylinder; 303, connecting rod; 304, piston; 305, air pipe; 401, connecting block; 402, second moving rod; 403, second spring; 501, first moving plate; 502, first inclined plane; 503, pushing block; 504, second inclined plane; 505, moving module; 506, second moving plate; 601, connecting frame; 602, third moving plate; 603, third inclined plane; 604, The fourth inclined plane; 701, the push plate; 702, the fifth inclined plane; 801, the connecting plate; 802, the second T-shaped guide rod; 803, the fourth spring; 901, the sleeve; 902, the sleeve rod; 903, the third spring; 1001, the ring; 1002, the fifth spring; 11, the box body; 1101, the heating module; 1102, the push rod; 1103, the adsorption hole; 12, the lifting module; 13, the sealing cover; 14, the exhaust fan; 15, the support plate; 16, the cylinder; 17, the bracket; 18, the strip opening; 19, the sliding block; 20, the mounting plate; 21, the cleaning block; 22, the first T-shaped guide rod; 23, the fixed tube; 24, the moving disk; 25, the moving ring; 26, the pressure sensor; 27, the first moving rod; 28, the guide rod; 29, the reset spring. DETAILED DESCRIPTION
[0032] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0033] See also Figure 1-Figure 11 The present invention provides a technical solution: a heating unit device for a photoresist baking process, comprising a photoresist baking machine arranged on the top of a base plate 1, the photoresist baking machine comprising a box body 11 and a heating module 1101 arranged on the top of the box body 11, and the top of the heating module 1101 is provided with a plurality of push rods 1102 and a plurality of adsorption holes 1103, the top of the base plate 1 is connected to a sealing cover 13 through a lifting module 12, and the top of the sealing cover 13 is fixedly connected to an exhaust fan 14, the top of the base plate 1 is fixedly connected to a support plate 15, the side wall of the support plate 15 is fixedly connected to a cylinder 16, and the telescopic end of the cylinder 16 is fixedly connected to a bracket 17.
[0034] A strip opening 18 is provided at the top of the box body 11, and a guide rod 28 is fixedly connected in the strip opening 18, a sliding block 19 is slidably connected to the side wall of the guide rod 28, a return spring 29 is sleeved on the side wall of the guide rod 28, and a mounting plate 20 is fixedly connected to the side wall of the sliding block 19, a cleaning block 21 is fixedly connected to the side wall of the mounting plate 20, and a plurality of first T-shaped guide rods 22 are arranged through the top of the mounting plate 20, each of the first T-shaped guide rods 22 is connected to the bottom of the mounting plate 20 through the telescopic mechanism 10, and a detection component 2 for detecting the movement of the first T-shaped guide rod 22 is provided on the side wall of the sliding block 19.
[0035] The bottom of the heating module 1101 is fixedly connected with a fixed tube 23, and a movable disk 24 is connected to the fixed tube 23 through a first reset mechanism 4, and a plurality of first movable rods 27 arranged in an array are fixedly connected to the top of the movable disk 24, and a pressure sensor 26 is fixedly inserted into the side wall of the fixed tube 23, and a movable ring 25 is connected to the box body 11 through a second reset mechanism 9, and the top rod 1102 is fixed to the top of the movable ring 25, and an exhaust mechanism 3 for exhausting the fixed tube 23 is provided at the bottom of the box body 11, and the movement of the sliding block 19 is pushed by the first pushing mechanism 5, and the movement of the first movable rod 27 is pushed by the second pushing mechanism 6. The movement of the movable ring 25 is driven by the third pushing mechanism 7. Before the substrate is placed on the heating module 1101, the top of the heating module 1101 and the push rod 1102 can be automatically cleaned. At the same time, the impurities in the adsorption hole 1103 can be pushed upward and automatically cleaned. In addition, the flatness of the heating module 1101 can be automatically detected to ensure the fitting effect between the substrate and the heating module 1101, thereby ensuring the efficiency and quality of heating and baking. After the substrate is placed on the heating module 1101, the fitting state of the substrate and the heating module 1101 can be detected to ensure the quality of heating and baking.
[0036] The detection assembly 2 includes an L-shaped plate 205 fixedly connected to the side wall of the mounting plate 20, and the side wall of the L-shaped plate 205 is fixedly connected to an L-shaped block 208, and the side wall of the L-shaped block 208 is fixedly inserted with a distance sensor 209, and the side wall of the L-shaped plate 205 is inserted with two symmetrically arranged sliding rods 210, and the two ends of the sliding rods 210 are respectively fixedly connected to a first moving block 206 and a second moving block 211, and the side wall of each sliding rod 210 is sleeved with a first spring 207, and the top of the mounting plate 20 The first support block 201 and the second support block 202 are fixedly connected, and the side wall of the first support block 201 is fixedly connected with a pull rope 204, the other end of the pull rope 204 passes through the side wall of the second support block 202 and is fixed to the side wall of the first moving block 206, and the side wall of each first T-shaped guide rod 22 is fixedly connected with a fixing ring 203, and the fixing ring 203 is fixedly sleeved on the side wall of the pull rope 204. When the baking process is performed, the substrate to be heated is first placed on the bracket 1 by an external transfer robot. 7, then, the sliding block 19 is pushed to move to the other side along the strip opening 18 through the first pushing mechanism 5, and at the same time, the cleaning block 21 and the first T-shaped guide rod 22 are driven to move synchronously, and the cleaning block 21 can automatically clean the top of the heating module 1101 and the top rod 1102. At the same time, the first T-shaped guide rod 22 can slide on the top of the heating module 1101. When there are pits or protrusions on the top of the heating module 1101, the first T-shaped guide rod 22 will move in the vertical direction and pull the pull rope 204 through the fixing ring 203, so that the first moving block 206 and the second moving block 211 move in the direction close to the second supporting block 202. At the same time, the first spring 207 is compressed. At this time, the movement of the second moving block 211 is observed through the distance sensor 209, so that the flatness of the heating module 1101 can be automatically detected before heating and baking, to ensure the fit between the substrate and the heating module 1101, thereby ensuring the quality of heating and baking.
[0037] The air extraction mechanism 3 includes an L-shaped bracket 301 fixedly connected to the bottom of the box body 11, and the side wall of the L-shaped bracket 301 is fixedly connected to a cylinder 302, a piston 304 is slidably connected in the cylinder 302, the upper end of the piston 304 is fixedly connected to a connecting rod 303, and the upper end of the connecting rod 303 is fixed to the bottom of the moving ring 25, and an air pipe 305 is fixedly connected between the cylinder 302 and the fixed pipe 23. When the moving ring 25 moves downward, the piston 304 is pushed downward by the connecting rod 303, and at this time, the fixed ring 25 can be moved downward. The air in the tube 23 enters the cylinder 302 for temporary storage, so that negative pressure is generated in the fixed tube 23, so that the substrate can be adsorbed through the adsorption hole 1103. When the movable ring 25 moves upward, the piston 304 is driven to move upward through the connecting rod 303, so that the air temporarily stored in the cylinder 302 can be squeezed into the fixed tube 23, so that the fixed tube 23 is no longer in a negative pressure state, thereby facilitating the removal of the baked substrate. There is no need to use a negative pressure fan, etc., to achieve automatic adsorption and release of the substrate, which is more convenient and quick to use.
[0038] The first pushing mechanism 5 includes a first movable plate 501, and the first movable plate 501 is connected to the side wall of the box body 11 through the third reset mechanism 8. A first inclined surface 502 is arranged on the top of the first movable plate 501, and a pushing block 503 is fixedly connected to the bottom of the first movable plate 501, and the pushing block 503 includes a second inclined surface 504. The inner wall of the box body 11 is connected to the second movable plate 506 through a moving module 505. The second movable plate 506 is driven by the moving module 505 to move toward the direction close to the pushing plate 701. When the second movable plate 506 abuts against the second inclined surface 504, the pushing block 503 and the first movable plate 501 can be pushed to move upward. When the first movable plate 501 moves upward, the first inclined surface 502 abuts against the bottom of the sliding block 19, thereby pushing the sliding block 19 to move to the other side along the strip opening 18.
[0039] The first reset mechanism 4 includes two symmetrically arranged second moving rods 402 inserted at the bottom of the fixed tube 23, and the upper end of each second moving rod 402 is fixedly connected with a connecting block 401, and the connecting block 401 is fixed to the side wall of the moving disk 24. The side wall of each second moving rod 402 is sleeved with a second spring 403, which guides and resets the movement of the moving disk 24.
[0040] The second pushing mechanism 6 includes a third movable plate 602 inserted into the side wall of the box body 11, and the third movable plate 602 includes a third inclined surface 603 and a fourth inclined surface 604. The side wall of the sliding block 19 is fixedly connected with a connecting frame 601, and the connecting frame 601 is fixed to the side wall of the third movable plate 602. The cleaning block 21 is driven to move through the mounting plate 20, and the third movable plate 602 is driven to move synchronously through the connecting frame 601. When the lower end of the second moving rod 402 slides along the third inclined surface 603 to the top of the third moving plate 602, it can push the movable disk 24 and the first moving rod 27 to move upward. At the same time, the second spring 403 is compressed. At this time, moving the first moving rod 27 upward along the adsorption hole 1103 can not only push out the impurities in the adsorption hole 1103 upward and automatically clean it, but also seal the top of the adsorption hole 1103 to prevent impurities from falling into the adsorption hole 1103 when the cleaning block 21 is cleaning, thereby ensuring the subsequent adsorption effect on the substrate. After the cleaning block 21 completes the cleaning, the lower end of the second moving rod 402 slides downward along the fourth inclined surface 604. At this time, the moving plate 24 and the first moving rod 27 can move downward and reset under the action of the second spring 403, and keep the bottom of the adsorption hole 1103 connected.
[0041] The third pushing mechanism 7 includes a pushing plate 701 fixedly connected to the bottom of the moving ring 25, and the pushing plate 701 includes a fifth inclined surface 702. When the second moving plate 506 abuts against the fifth inclined surface 702, the moving ring 25 and the push rod 1102 can be pushed to move upward.
[0042] The second reset mechanism 9 includes two symmetrically arranged sleeve rods 902 fixedly connected to the bottom of the box body 11, and the side wall of each sleeve rod 902 is sleeved with a sleeve 901, the upper end of the sleeve 901 is fixed to the bottom of the movable ring 25, and the side wall of each sleeve 901 is sleeved with a third spring 903, which guides and resets the movement of the movable ring 25.
[0043] The third reset mechanism 8 includes two symmetrically arranged second T-shaped guide rods 802 fixedly connected to the bottom of the first movable plate 501, and the side walls of the second T-shaped guide rods 802 are sleeved with connecting plates 801, and the connecting plates 801 are fixed to the inner side walls of the box body 11, and the side walls of each second T-shaped guide rod 802 are sleeved with fourth springs 803, which play a guiding and reset role for the movement of the first movable plate 501.
[0044] The telescopic mechanism 10 includes a circular ring 1001 fixedly sleeved on the side wall of each first T-shaped guide rod 22. The side wall of each first T-shaped guide rod 22 is sleeved with a fifth spring 1002, and the two ends of the fifth spring 1002 are respectively fixed to the circular ring 1001 and the mounting plate 20, which guides and resets the movement of the first T-shaped guide rod 22.
[0045] Working principle: When in use, when performing the baking process, the substrate to be heated is first placed on the bracket 17 by an external transfer robot, and then the second movable plate 506 is driven by the moving module 505 to move in the direction close to the push plate 701. When the second movable plate 506 abuts against the second inclined surface 504, the push block 503 and the first movable plate 501 can be pushed to move upward. At the same time, the fourth spring 803 is compressed. When the first movable plate 501 moves upward, the first inclined surface 502 abuts against the bottom of the sliding block 19, thereby pushing the sliding block 19 to move to the other side along the strip opening 18. At the same time, the cleaning block 21 and the first T-shaped guide rod 22 are driven to move synchronously, and the cleaning block 21 can automatically clean the top of the heating module 1101 and the top rod 1102.
[0046] When the cleaning block 21 cleans the heating module 1101 and the top of the push rod 1102, when the sliding block 19 moves, the cleaning block 21 is moved by the mounting plate 20, and the third movable plate 602 is moved synchronously by the connecting frame 601. When the lower end of the second movable rod 402 slides along the third inclined surface 603 to the top of the third movable plate 602, the movable disk 24 and the first movable rod 27 can be pushed to move upward. At the same time, the second spring 403 is compressed. At this time, the first movable rod 27 is moved upward along the adsorption hole 1103, which can not only push the impurities in the adsorption hole 1103 upward and automatically clean it, but also seal the top of the adsorption hole 1103 to prevent impurities from falling into the adsorption hole 1103 when the cleaning block 21 is cleaning, thereby ensuring the subsequent adsorption effect on the substrate.
[0047] After cleaning the block 21 to be cleaned, the lower end of the second moving rod 402 slides downward along the fourth inclined surface 604. At this time, the moving plate 24 and the first moving rod 27 can move downward and reset under the action of the second spring 403, and keep the bottom of the adsorption hole 1103 connected.
[0048] At the same time, when the mounting plate 20 moves, it drives multiple first T-shaped guide rods 22 to slide on the top of the heating module 1101. When there are pits or protrusions on the top of the heating module 1101, the first T-shaped guide rod 22 will move in the vertical direction and pull the pull rope 204 through the fixed ring 203, so that the first moving block 206 and the second moving block 211 move toward the direction close to the second support block 202. At the same time, the first spring 207 is compressed. At this time, the movement of the second moving block 211 is observed by the distance sensor 209, so that the flatness of the heating module 1101 can be automatically detected before heating and baking, so as to ensure the fit between the substrate and the heating module 1101, thereby ensuring the quality of heating and baking.
[0049] When the second movable plate 506 continues to move, when the second movable plate 506 abuts against the fifth inclined surface 702, it can push the movable ring 25 and the push rod 1102 to move upward. At the same time, the third spring 903 is stretched, and the second movable plate 506 slides at the bottom of the pushing block 503. When the movable ring 25 moves upward, the piston 304 is driven to move upward through the connecting rod 303, so that the air temporarily stored in the cylinder 302 can be squeezed into the fixed tube 23. After cleaning is completed, the second movable plate 506 stops moving.
[0050] Next, the substrate is placed on the top of the top rod 1102, and the bracket 17 is moved and reset by the cylinder 16. Then, the sealing cover 13 is moved downward by the lifting module 12 and the top of the box body 11 is covered. At the same time, the exhaust fan 14 is started to perform exhaust operation and purification treatment is performed through external processing equipment to remove volatiles in time.
[0051] Then, the second movable plate 506 is moved away from the pushing plate 701 and separated from the pushing plate 701 through the moving module 505, while the second movable plate 506 is still sliding at the bottom of the pushing block 503. At this time, the top rod 1102 and the moving ring 25 can move downward under the action of the third spring 903, and make the substrate fit with the top of the heating module 1101. Moreover, when the moving ring 25 moves downward, the piston 304 is pushed downward by the connecting rod 303. At this time, the air in the fixed tube 23 can enter the cylinder 302 for temporary storage, so that negative pressure is generated in the fixed tube 23, so that the substrate can be adsorbed through the adsorption hole 1103. Moreover, the pressure in the fixed tube 23 is detected by the pressure sensor 26. If the pressure sensor 26 detects that the pressure in the fixed tube 23 becomes larger, it means that the substrate and the heating module 1101 are not completely fitted. Therefore, during heating and baking, the fitting state of the substrate and the heating module 1101 can be detected to ensure the quality of heating and baking.
[0052] After the heating and baking is completed, the second movable plate 506 is driven by the moving module 505 to move towards the direction close to the pushing plate 701, and the movable ring 25 and the push rod 1102 are driven to move upward, so as to lift the baked substrate upward. At the same time, the air temporarily stored in the cylinder 302 can be squeezed into the fixed tube 23, so that the fixed tube 23 is no longer in a negative pressure state. Then, the baked substrate is removed from the top of the push rod 1102 through the bracket 17.
[0053] Finally, the second movable plate 506 is driven to move and reset through the moving module 505. At this time, the top rod 1102 and the movable ring 25 can move downward and reset under the action of the third spring 903, the first movable plate 501 can move downward and reset under the action of the fourth spring 803, and the sliding block 19 can move and reset under the action of the reset spring 29, and drive the mounting plate 20 and the cleaning block 21 to move and reset.
Claims
1. A heating unit device for a photoresist baking process, comprising a base plate (1) and a photoresist baking machine arranged on the top of the base plate (1), the photoresist baking machine comprising a box body (11) and a heating module (1101) arranged on the top of the box body (11), and the top of the heating module (1101) is provided with a plurality of push rods (1102) and a plurality of adsorption holes (1103), the top of the base plate (1) is connected to a sealing cover (13) via a lifting module (12), and the top of the sealing cover (13) is fixedly connected to an exhaust fan (14), the top of the base plate (1) is fixedly connected to a support plate (15), the side wall of the support plate (15) is fixedly connected to a cylinder (16), and the telescopic end of the cylinder (16) is fixedly connected to a bracket (17), characterized in that: Also includes: A fixed tube (23) is fixed to the bottom of the heating module (1101), and a pressure sensor (26) is fixedly inserted into the side wall of the fixed tube (23); A first reset mechanism is disposed in the fixed tube (23), and a movable disk (24) is connected to the first reset mechanism, and is used to guide and reset the movement of the movable disk (24); A first moving rod (27) is fixed to the top of the moving plate (24), so that the upper end of the first moving rod (27) can be inserted into the adsorption hole (1103); An air extraction mechanism, disposed in the box body (11), and used to extract air from the fixed pipe (23); A detection mechanism, arranged above the box body (11), and used for detecting the flatness of the heating module (1101); The detection mechanism includes: A plurality of telescopic mechanisms are arranged at the bottom of the mounting plate (20), and each of the telescopic mechanisms is connected to a first T-shaped guide rod (22) for resetting the first T-shaped guide rod (22), wherein the first T-shaped guide rod (22) is arranged to penetrate the top of the mounting plate (20); a detection component, arranged on a side wall of the sliding block (19), and used for detecting the movement of the first T-shaped guide rod (22); The detection component comprises: An L-shaped block (208) is fixed to the side wall of the sliding block (19) via an L-shaped plate (205), and a distance sensor (209) is fixedly inserted into the side wall of the L-shaped block (208); Two sliding rods (210) are inserted into the side wall of the L-shaped plate (205), one end of the sliding rod (210) is fixedly connected to the first moving block (206), and the other end of the sliding rod (210) is fixedly connected to the second moving block (211); Two first springs (207) are sleeved on the side walls of the two sliding rods (210), and two ends of the first springs (207) are respectively fixed to the L-shaped plate (205) and the side wall of the second moving block (211); A pull rope (204) is arranged above the mounting plate (20), and one end of the pull rope (204) is fixed to the side wall of the first moving block (206), and the other end of the pull rope (204) is fixed above the mounting plate (20) via a second supporting block (202); A second support block (202) is sleeved on a side wall of the pull rope (204) and fixed above the mounting plate (20); A plurality of fixing rings (203) are sleeved on the side wall of the pull rope (204) and fixed to the top of the first T-shaped guide rod (22).
2. The heating unit device for a photoresist baking process according to claim 1, characterized in that: Also includes: A cleaning mechanism, arranged on the top of the box body (11), enabling the cleaning mechanism to slide on the top of the heating module (1101), and used for sliding on the top of the heating module (1101); The cleaning mechanism comprises: A moving mechanism, the moving mechanism being connected to a sliding block (19) and being used to move the sliding block (19); The cleaning block (21) is fixed to the side wall of the sliding block (19) via a mounting plate (20).
3. The heating unit device for a photoresist baking process according to claim 1, characterized in that: The air extraction mechanism comprises: A second reset mechanism is arranged at the bottom of the box body (11), and a moving ring (25) is connected to the second reset mechanism, and is used to guide and reset the movement of the moving ring (25); A third pushing mechanism, arranged at the bottom of the moving ring (25), and used for pushing the moving ring (25) to move upwards; A cylinder (302) is disposed below the movable ring (25) and fixed to the inner wall of the box (11) via an L-shaped bracket (301), and the cylinder (302) is connected to the fixed pipe (23) via an air pipe (305); The piston (304) is inserted into the cylinder (302) and fixed to the bottom of the moving ring (25) via a connecting rod (303).
4. The heating unit device for a photoresist baking process according to claim 2, characterized in that: The moving mechanism comprises: A strip-shaped opening (18) is provided at the top of the box body (11) and penetrates the top of the box body (11); A guide rod (28) is fixed to two opposite side walls of the strip-shaped opening (18), and a sliding block (19) is sleeved on the side walls of the guide rod (28) and slides in the strip-shaped opening (18); A return spring (29) is sleeved on the side wall of the guide rod (28), and two ends of the return spring (29) are respectively fixed to the side wall of the strip opening (18) and the sliding block (19); The first pushing mechanism is arranged in the box body (11) and is used to push the sliding block (19) to move.
5. The heating unit device for a photoresist baking process according to claim 4, characterized in that: The first driving mechanism comprises: A third reset mechanism is arranged below the sliding block (19), and the third reset mechanism is connected to a first movable plate (501) for resetting the first movable plate (501), and a first inclined surface (502) is arranged on the top of the first movable plate (501); A pushing block (503) is fixed to the bottom of the first movable plate (501), and a second inclined surface (504) is provided at the bottom of the pushing block (503); The second movable plate (506) is disposed below the pushing block (503) and is connected to the inner wall of the box body (11) through a movable module (505).
6. The heating unit device for a photoresist baking process according to claim 2, characterized in that: The first reset mechanism comprises: Two second moving rods (402) are inserted into the bottom of the fixed tube (23), and the upper end of each second moving rod (402) is fixed to the side wall of the moving plate (24) through a connecting block (401); Two second springs (403) are sleeved on the two second moving rods (402), and two ends of the second springs (403) are respectively fixed to the bottom of the connecting block (401) and the bottom of the fixing tube (23); The second pushing mechanism is arranged on the side wall of the box body (11) and is used to push the second moving rod (402) to move upwards.
7. The heating unit device for a photoresist baking process according to claim 6, characterized in that: The second driving mechanism comprises: The third movable plate (602) is inserted into the side wall of the box body (11) and fixed to the side wall of the sliding block (19) through a connecting frame (601). The third movable plate (602) comprises a third inclined surface (603) and a fourth inclined surface (604).
8. The heating unit device for a photoresist baking process according to claim 3, characterized in that: The third driving mechanism comprises: The pushing plate (701) is fixed to the bottom of the moving ring (25), and the pushing plate (701) includes a fifth inclined surface (702).
9. The heating unit device for a photoresist baking process according to claim 3, characterized in that: The second reset mechanism comprises: Two sleeve rods (902) are fixed to the bottom of the box body (11); a sleeve (901) is sleeved on the side wall of each sleeve rod (902); and the upper end of the sleeve (901) is fixed to the bottom of the moving ring (25); The third spring (903) is sleeved on the side walls of the sleeve (901) and the sleeve rod (902), and two ends of the third spring (903) are respectively fixed to the bottom of the box body (11) and the bottom of the moving ring (25).
10. The heating unit device for a photoresist baking process according to claim 5, characterized in that: The third reset mechanism comprises: A connecting plate (801) is disposed below the first movable plate (501) and fixed to the inner wall of the box body (11); Two second T-shaped guide rods (802) are fixed to the bottom of the first movable plate (501) and are arranged to penetrate the first movable plate (501); The two fourth springs (803) are sleeved on the side walls of the two second T-shaped guide rods (802), and the two ends of the fourth springs (803) are respectively fixed to the bottom of the connecting plate (801) and the bottom of the second T-shaped guide rod (802).
11. The heating unit device for a photoresist baking process according to claim 1, characterized in that: Each of the telescopic mechanisms comprises: A circular ring (1001) is disposed below the mounting plate (20) and is fixedly sleeved on the side wall of the first T-shaped guide rod (22); The fifth spring (1002) is sleeved on the side wall of the first T-shaped guide rod (22), and two ends of the fifth spring (1002) are respectively fixed to the top of the ring (1001) and the bottom of the mounting plate (20).
Citation Information
Patent Citations
Photoresist pre-baking method and apparatus, and photoetching equipment
CN106125520A
Wafer uniform glue baking machine
CN114100970A