A photorheological polishing liquid reflux jet polishing device and polishing method thereof

Abstract

The present invention belongs to the technical field of abrasive jet polishing, and discloses a photorheological polishing liquid reflux jet polishing device and a polishing method thereof, including a platform system, a polishing system and a polishing liquid circulation system, wherein the platform system includes a processing platform, the polishing system includes a jet nozzle, and the polishing liquid circulation system includes a reflux uniform illumination container, a jet uniform illumination container, a visible light source, an ultraviolet light source and a pipeline assembly. The present invention solves the problem of low polishing efficiency and high cost of medium and large curved surface parts. The reflux jet nozzle designed by the present invention applies jet polishing to medium and large curved surfaces, and realizes the recovery of polishing liquid. The polishing liquid adopts a photorheological reversible mechanism, and the photosensitive colloid that initially appears in strips undergoes a photoisomerization reaction under the irradiation of ultraviolet light and appears in a flocculent state, which binds the abrasive particles into agglomerates, effectively improving the polishing quality and efficiency.

Description

Technical Field

[0001] The invention relates to the technical field of abrasive jet polishing, in particular to a photorheological polishing liquid reflux jet polishing device and a polishing method thereof. Background Art

[0002] With the development of science and technology, high-precision equipment has higher and higher requirements for key components. Traditional turning, milling and grinding can hardly meet the processing difficulty and high surface quality of some parts. Therefore, it is urgently required to develop special processing equipment and methods for some new materials and new configurations of parts. In the fields of aerospace, shipbuilding and steam turbines, there is a large demand for medium and large curved parts, and key parts have very high surface quality requirements. For example: the processing of aerospace engine blades, the processing of ship propeller blades, the large shaft surface of steam turbines and the processing of steam turbine blades all require extremely high surface roughness and shape accuracy.

[0003] For the surface polishing of the above-mentioned medium and large curved parts, the main processing methods currently used are grinding, electrochemical polishing, abrasive jet polishing and magnetorheological polishing. Although the above-mentioned polishing methods can realize the polishing of curved parts, considering the shape characteristics of the workpiece, quality requirements, production efficiency and cost, grinding is difficult to polish curved parts, electrochemistry depends on material properties, jet polishing has good surface quality, but depends on equipment, and magnetorheological polishing has good quality, but the efficiency of single-point polishing is low. Based on the current situation, in view of the characteristics of curved parts, combined with the advantages of good quality and high efficiency of jet polishing, the applicant proposes a photorheological polishing liquid reflux jet polishing device and its polishing method for medium and large curved parts. The polishing device and its polishing method have good applicability and can polish most medium and large curved parts with different curvatures and configurations. The jet polishing efficiency is high, which reduces the processing cost of curved parts. Summary of the invention

[0004] The object of the present invention is to provide a photorheological polishing liquid reflux jet polishing device and a polishing method thereof to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] A photorheological polishing liquid reflux jet polishing device, comprising:

[0007] A platform system, the platform system comprising a processing platform, the processing platform is used to position the curved surface parts;

[0008] A polishing system, the polishing system comprising a jet nozzle, the jet nozzle is used to perform jet polishing on the curved surface parts on the processing platform; and

[0009] A polishing liquid circulation system, the polishing liquid circulation system includes a reflux irradiation container, a jet irradiation container, a visible light source, an ultraviolet light source and a pipeline assembly, the pipeline assembly is used to transport the photorheological polishing liquid on the platform system and / or the polishing system to the reflux irradiation container and the jet irradiation container in turn, and then return from the jet irradiation container to the jet nozzle, the visible light source is used to irradiate the photorheological polishing liquid in the reflux irradiation container so that the photorheological polishing liquid loses its restraint on the abrasive particles, and the ultraviolet light source is used to irradiate the jet irradiation container. The photorheological polishing liquid in the container is irradiated so that the photorheological polishing liquid can re-bind the abrasive particles into agglomerates. At least the portion of the reflux and evenly irradiated container corresponding to the visible light source is a transparent structure, and at least the portion of the jet and evenly irradiated container corresponding to the ultraviolet light source is a transparent structure. The pipeline assembly includes a reflux pump and a jet pump. The reflux pump is used to transport the photorheological polishing liquid refluxed from the platform system and / or the polishing system to the reflux and evenly irradiated container, and the jet pump is used to transport the photorheological polishing liquid irradiated by the visible light source to the jet and evenly irradiated container.

[0010] Furthermore, the polishing liquid circulation system also includes an agitator, a reflux viscosity sensor and a jet viscosity sensor. The agitator stirs the photorheological polishing liquid, the pipeline assembly is used to transport the photorheological polishing liquid in the reflux equalization container to the agitator, and then transport the photorheological polishing liquid in the agitator to the jet equalization container, the reflux viscosity sensor is used to detect the viscosity of the photorheological polishing liquid output from the reflux equalization container, and the jet viscosity sensor is used to detect the viscosity of the photorheological polishing liquid output from the jet equalization container.

[0011] Furthermore, the ultraviolet light source is a three-level ultraviolet lamp, and its output wavelength has three gears of 185nm, 254nm and 365nm, and the wavelength range of the visible light source is 380-780nm.

[0012] Furthermore, the jet nozzle includes a nozzle body, the bottom of the nozzle body has a ring-shaped injection port, a reflux channel is arranged in the nozzle body, the lower end of the reflux channel is located in the middle of the injection port, the lower end of the reflux channel has a reflux inlet, the outlet of the reflux channel is connected to the polishing liquid circulation system, and the reflux inlet of the reflux channel sucks the photorheological polishing liquid ejected from the injection port into the reflux channel under the suction action of the reflux pump.

[0013] Furthermore, a reflux base is provided at the lower end of the reflux channel, and the reflux base has a reflux cavity, which is connected to the reflux inlet of the reflux channel, and a drainage cavity is formed between the reflux base and the nozzle body, and the drainage cavity guides the photorheological polishing liquid ejected from the injection port into the reflux cavity.

[0014] Furthermore, the nozzle body includes a nozzle shell assembly and a nozzle inner ring, the nozzle inner ring and the reflux channel are both arranged in the nozzle shell assembly, the nozzle inner ring is sleeved outside the reflux channel and forms an annular cavity with the nozzle shell assembly, the lower end of the annular cavity forms an injection port, the injection port is an inverted cone annular cavity structure, the reflux base is located at the lower end of the nozzle inner ring, and a drainage cavity is formed between the two.

[0015] Furthermore, the inner ring of the nozzle is threadedly matched with the return channel, and the size of the injection port can be adjusted by rotating the inner ring of the nozzle on the return channel.

[0016] Furthermore, the nozzle housing assembly has an upper cavity and a lower cavity on the nozzle, the upper cavity on the nozzle and the lower cavity on the nozzle are connected by holes and grooves of the ring cloth, the upper end of the upper cavity on the nozzle is provided with an inlet, the lower part of the nozzle inner ring and the reflux channel are located in the lower cavity of the nozzle, the upper end of the reflux channel extends into the upper cavity on the nozzle, and a guide head is arranged at the upper end of the reflux channel, and the guide head is located just below the inlet to disperse the photorheological polishing liquid.

[0017] Further, the processing platform includes a platform base and a reflow pool arranged on the platform base, a support plate is arranged in the reflow pool, a plurality of through holes are arranged on the support plate, the through holes are communicated with the inner cavity of the reflow pool, and the inner cavity of the reflow pool is connected with the polishing liquid circulation system;

[0018] The platform system also includes a plurality of automatic push rods arranged on the support plate, and a suction cup is arranged at the output end of the automatic push rod, and the automatic push rod fixes the curved surface parts through the suction cup;

[0019] The polishing system also includes an industrial robot arm, and the jet nozzle is arranged on the industrial robot arm.

[0020] The present invention also provides a polishing method of the photorheological polishing liquid reflux jet polishing device as described above, comprising:

[0021] Positioning of curved parts through platform system;

[0022] Polishing the curved surface parts on the platform system through the polishing system;

[0023] The photorheological polishing liquid of the platform system and / or polishing system is recovered through the polishing liquid circulation system. In the polishing liquid circulation system, the photorheological polishing liquid is first irradiated by a visible light source to make the photorheological polishing liquid lose its restraint on the abrasive particles. Then, the photorheological polishing liquid is irradiated by an ultraviolet light source to make the photorheological polishing liquid restrain the abrasive particles into clusters again. The polishing liquid circulation system transports the photorheological polishing liquid irradiated by the ultraviolet light source to the polishing system for reuse, thus forming a cycle.

[0024] Compared with the prior art, the present invention has the following beneficial effects:

[0025] 1) The problem of low polishing efficiency, high polishing cost and high difficulty of medium and large curved surface parts has been solved. The invented jet nozzle tool takes advantage of the high efficiency of jet polishing and is applied to the surface polishing of curved surface parts, which improves the polishing efficiency. In addition, the jet nozzle does not require too many peripheral equipment, which reduces the polishing cost and difficulty.

[0026] 2) Good adaptability to curved parts. The jet nozzle designed by the present invention is small in size and has good adaptability to the curvature and size of the part surface. It can be used with an industrial robot arm to polish most curved parts and flat parts;

[0027] 3) The polishing surface is uniform. The nozzle of the invented jet nozzle is circular, the pressure at each angle is consistent, and the amount of polishing material removed is consistent, which is conducive to the iteration of the polishing trajectory;

[0028] 4) Save polishing liquid; the invented jet nozzle adopts internal reflux mode, which has high reflux efficiency and avoids a large amount of polishing liquid splashing;

[0029] 5) The polishing liquid removes material evenly. The photorheological polishing liquid used has a good binding effect on the abrasive particles, forming abrasive particle clusters. When impacting the material surface, the removal amount is even, and it has the effect of suspending the abrasive particles, which is conducive to stirring;

[0030] 6) The polishing liquid circulation system is closed-loop and highly efficient. The polishing liquid circulation system does not require manual intervention during operation and records the changes in polishing liquid viscosity in real time. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 It is a structural schematic diagram of a photorheological polishing liquid reflux jet polishing device of the present invention.

[0032] Figure 2 It is a side structural schematic diagram of a photorheological polishing liquid reflux jet polishing device of the present invention, and the protective frame is not shown in the figure.

[0033] Figure 3 The present invention is a schematic diagram of the structure of a polishing liquid circulation system in a photorheological polishing liquid reflux jet polishing device.

[0034] Figure 4 The present invention is a schematic diagram of the exploded structure of a jet nozzle in a photorheological polishing liquid reflux jet polishing device.

[0035] Figure 5 It is a schematic diagram of the longitudinal cross-sectional structure of a jet nozzle in a photorheological polishing liquid reflux jet polishing device of the present invention.

[0036] Figure 6 It is a schematic diagram of the structure of a platform system in a photorheological polishing liquid reflux jet polishing device of the present invention.

[0037] Figure 7 It is a schematic diagram of the top view of the curved surface part in the present invention.

[0038] Figure 8 It is a side view structural schematic diagram of the curved surface part in the present invention.

[0039] In the figure: 1-jet nozzle, 101-nozzle top cover, 102-guide head, 103-buffer tank, 1030-hole groove, 104-nozzle return pipe, 1041-return inlet, 105-nozzle inner ring, 106-nozzle outer ring, 107-return base, 1071-return cavity, 108-nozzle outlet pipe, 109-injection port, 110-drainage cavity, 111-annular cavity, 112-nozzle head cavity, 113-nozzle lower cavity, 114-inlet, 2-curved parts , 3-protective frame, 4-platform system, 401-electric push rod, 402-suction cup, 403-reflux pool, 404-platform base, 405-support plate, 4051-through hole, 5-agitator, 6-reflux uniform illumination container, 7-ultraviolet light source, 8-jet pump, 9-reflux pump, 10-visible light source, 11-reflux viscosity sensor, 12-jet viscosity sensor, 13-industrial computer, 14-industrial robot arm, 1041-adapter flange, 15-jet uniform illumination container. DETAILED DESCRIPTION

[0040] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0041] See also Figure 1-Figure 8A photorheological polishing liquid reflux jet polishing device includes a platform system 4, a polishing system and a polishing liquid circulation system. The platform system 4 includes a processing platform, and the processing platform is used to position a curved surface part 2. The polishing system includes a jet nozzle 1, and the jet nozzle 1 is used to perform jet polishing on the curved surface part 2 on the processing platform. The polishing liquid circulation system includes a reflux evenly irradiated container 6, a jet evenly irradiated container 15, a visible light source 10, an ultraviolet light source 7 and a pipeline assembly. The pipeline assembly is used to transport the photorheological polishing liquid on the platform system 4 and the polishing system to the reflux evenly irradiated container 6 and the jet evenly irradiated container 15 in turn, and then return to the jet nozzle 1 from the jet evenly irradiated container 15. The visible light source 10 is located at the lower end of the reflux evenly irradiated container 6, and is used to irradiate the photorheological polishing liquid in the reflux evenly irradiated container 6, so that the photorheological polishing liquid loses its restraint on the abrasive particles. The ultraviolet light source 7 is located at the lower end of the jet evenly irradiated container 15, and is used to irradiate the photorheological polishing liquid in the jet evenly irradiated container 15, so that The photorheological polishing liquid re-binds the abrasive particles into agglomerates. The reflux evenly irradiated container 6 and the jet evenly irradiated container 15 are both flat containers, so that the photorheological polishing liquid can be more evenly irradiated with light. At least the portion of the reflux evenly irradiated container 6 corresponding to the visible light source 10 is a transparent structure, and at least the portion of the jet evenly irradiated container 15 corresponding to the ultraviolet light source 7 is a transparent structure. The pipeline assembly includes a reflux pump 9 and a jet pump 8, both of which are preferably rotor pumps. The reflux pump 9 is used to transport the photorheological polishing liquid refluxed from the platform system 4 and the polishing system to the reflux evenly irradiated container 6, and the jet pump 8 is used to transport the photorheological polishing liquid irradiated by the visible light source 10 to the jet evenly irradiated container 15.

[0042] Among them, the ultraviolet light source 7 is preferably a three-level ultraviolet lamp, and its output wavelength has three gears of 185nm, 254nm and 365nm. The ultraviolet light source 7 can emit light evenly, and the light emission size can cover the jet uniform illumination container 15. The visible light source 10 is preferably a full-spectrum visible light source, and its wavelength is adjustable from 380 to 780nm. The visible light source 10 can emit light evenly, and the light emission size can cover the reflux uniform illumination container 6.

[0043] Continue reading Figure 1 and Figure 2 In one embodiment of the present invention, the polishing system further comprises an industrial robot arm 14, which is preferably a six-axis industrial robot arm, and the jet nozzle 1 is mounted on the industrial robot arm 14 through an adapter flange 1401. The photorheological polishing liquid reflux jet polishing device of the present invention further comprises an industrial computer 13, and the industrial robot arm 14 is connected to and controlled by the industrial computer 13.

[0044] Continue reading Figure 2 and Figure 6In one embodiment of the present invention, the processing platform is located in front of the industrial robot arm 14, which includes a platform base 404 and a reflow pool 403 arranged on the platform base 404, a support plate 405 is arranged on the upper end of the reflow pool 403, a protective frame 3 is arranged around the upper end of the reflow pool, the support plate 405 is covered with through holes 4051, and the through holes 4051 are connected to the inner cavity of the reflow pool 403. The inner cavity of the reflow pool 403 is connected to the reflux pump 9 of the polishing liquid circulation system through a pipeline. During processing, the photorheological polishing liquid flowing out of the jet nozzle 1 flows into the inner cavity of the reflow pool 403 from the top of the reflow pool 403 through the through holes 4051.

[0045] Continue reading Figure 2 and Figure 6 In one embodiment of the present invention, the platform system 4 further includes a plurality of automatic push rods 401 disposed on a support plate 405 , and a suction cup 402 is disposed at the output end of the automatic push rod 401 , and the automatic push rod 401 fixes the curved surface part 2 by adsorbing the suction cup 402 .

[0046] Specifically, there are 4 automatic push rods 401, each of which has a suction cup 402, and the suction cups 402 are connected to the four corners of the curved surface part 2 to support the curved surface part 2. The automatic push rod 401 is preferably an electric push rod, and a pneumatic push rod or a hydraulic push rod can also be used.

[0047] During polishing, the curved part 2 is fixed on the processing platform by four suction cups 402 and an automatic push rod 401, and the photorheological polishing liquid is polished in the form of a jet through the jet nozzle 1, and the photorheological polishing liquid splashed out of the jet nozzle 1 flows into the reflux pool 403 below.

[0048] Continue reading Figure 1 and Figure 3 In one embodiment of the present invention, the polishing liquid circulation system further includes an agitator 5, a reflux viscosity sensor 11 and a jet viscosity sensor 12. The agitator 5 is preferably an electric agitator, which stirs the photorheological polishing liquid. The inlet of the agitator 5 is connected to the outlet of the reflux equalization container 6 through a pipeline, the outlet of the agitator 5 is connected to the inlet of the jet pump 8 through a pipeline, the outlet of the jet pump 8 is connected to the jet equalization container 15 through a pipeline, and the outlet of the jet equalization container 15 is connected to the inlet 114 of the jet nozzle 1 through a pipeline. The pipeline assembly is used to transport the polishing liquid in the reflux equalization container 6 to the agitator 5, and then transport the photorheological polishing liquid in the agitator 5 to the jet equalization container 15. The reflux viscosity sensor 11 is arranged on the pipeline between the reflux equalization container 6 and the agitator 5, and the reflux viscosity sensor 11 is used to detect the viscosity of the photorheological polishing liquid output from the reflux equalization container 6. The jet viscosity sensor 12 is disposed on the pipeline between the jet uniformization container 15 and the jet nozzle 1 . The jet viscosity sensor 12 is used to detect the viscosity of the photorheological polishing liquid output from the jet uniformization container 15 .

[0049] The specific circulation process of the polishing liquid circulation system is as follows: the polishing liquid used on the jet nozzle 1 and the processing platform is pumped by the reflux pump 9 to the reflux equalization container 6, and then passes through the reflux viscosity sensor 11 and the agitator 5 in succession. Under the pumping action of the jet pump 8, the polishing liquid is then transported from the agitator 5 to the jet equalization container 15, and then passes through the jet viscosity sensor 12, and finally enters the jet nozzle 1 to form a circulation.

[0050] Continue reading Figure 4 and Figure 5 In one embodiment of the present invention, the jet nozzle 1 includes a nozzle body, a ring-shaped injection port 109 is provided at the bottom of the nozzle body, a reflux channel is arranged in the nozzle body, a reflux inlet 1041 is provided at the lower end of the reflux channel, and the reflux inlet 1041 is located in the middle of the injection port 109. The outlet of the reflux channel is connected to the polishing liquid circulation system, and the reflux inlet of the reflux channel sucks the photorheological polishing liquid ejected from the injection port 109 into the reflux channel under the suction action of the reflux pump 9.

[0051] Further reading Figure 4 and Figure 5 In one embodiment of the present invention, a reflux base 107 is provided at the lower end of the reflux channel. The reflux base 107 is a conical container structure, which has a reflux cavity 1071 with an open upper end. The reflux cavity 1071 is connected to the reflux inlet 1041 of the reflux channel, and a drainage cavity 110 is formed between the reflux base 107 and the nozzle body. The drainage cavity 110 is a conical annular cavity structure. The drainage cavity 110 guides the photorheological polishing liquid ejected from the injection port 109 into the reflux cavity 1071.

[0052] Further reading Figure 4 and Figure 5 In one embodiment of the present invention, the nozzle body includes a nozzle shell assembly and a nozzle inner ring 105. The nozzle inner ring 105 and the reflux channel are both arranged in the nozzle shell assembly. The nozzle inner ring 105 is sleeved outside the reflux channel and forms an annular cavity 111 with the nozzle shell assembly. The lower end of the annular cavity 111 forms an injection port 109. The injection port 109 is a 45-degree inverted cone annular cavity structure. The reflux base 107 is located at the lower end of the nozzle inner ring 105, and a drainage cavity 110 is formed between the two.

[0053] Further reading Figure 4 and Figure 5In one embodiment of the present invention, the reflux channel includes a horizontally arranged nozzle outlet pipe 108 and a vertically arranged nozzle return pipe 104, which are connected and communicated to form an L-shaped structure. One end of the nozzle outlet pipe 108 passes through the nozzle housing assembly and is connected to the reflux pump 9 of the polishing liquid circulation system through a pipeline. The nozzle return pipe 104 is located at the axial position of the jet nozzle 1, and the nozzle inner ring 105 is threadedly sleeved on the nozzle return pipe 104. The nozzle inner ring 105 adjusts the size of the injection port 109 by rotating on the reflux channel. The reflux base 107 is threadedly arranged at the bottom of the nozzle return pipe 104, and the reflux inlet 1041 is evenly distributed on the lower end pipe wall of the nozzle return pipe 104.

[0054] Further reading Figure 4 and Figure 5 In one embodiment of the present invention, the nozzle housing assembly includes a nozzle top cover 101, a buffer pool 103 and a nozzle outer ring 106 connected in sequence from top to bottom. The nozzle top cover 101 is installed on the upper part of the buffer pool 103 by six screws, and the nozzle outer ring 106 is installed on the bottom of the buffer pool 103 by threads. A nozzle upper cavity 112 is formed between the nozzle top cover 101 and the buffer pool 103. An inlet 114 connected to the nozzle upper cavity 112 is provided in the center of the nozzle top cover 101. A nozzle is formed between the buffer pool 103 and the nozzle outer ring 106. The lower cavity 113, the upper cavity 112 of the nozzle and the lower cavity 113 of the nozzle are connected through a plurality of holes and grooves 1030 arranged on the buffer tank 103. The lower part of the nozzle inner ring 105 and the nozzle return pipe 104 are located in the lower cavity 113 of the nozzle. The upper end of the nozzle return pipe 104 extends into the upper cavity 112 of the nozzle and is connected to the nozzle outlet pipe 108. The top of the nozzle return pipe 104 is screwed with a guide head 102, which is located at the lower end of the flow inlet 114. The upper surface of the guide head 102 is a conical surface for dispersing the photorheological polishing liquid.

[0055] Among them, the bottom of the nozzle outer ring 106 is flush with the bottom of the reflux base 107, and the bottom position of the nozzle inner ring 105 is slightly higher than the bottom positions of the nozzle outer ring 106 and the reflux base 107, so that a ring-shaped connection is formed between the lower end of the injection port 109 and the lower end of the drainage chamber 110. When the jet nozzle 1 processes the curved part 2, the gap between the nozzle outer ring 106 and the reflux base 107 and the curved part 2 is extremely small, and the photorheological polishing liquid converges at the connection, which makes it easy for the photorheological polishing liquid to be drawn away through the drainage chamber 110.

[0056] During polishing, the photorheological polishing liquid enters from the flow inlet 114 of the nozzle top cover 101, and is dispersed and fills the entire buffer pool 103 under the action of the guide head 102 just below the flow inlet 114, and then enters the annular cavity 111 of the nozzle lower cavity 113 through the hole groove 1030 at the bottom of the buffer pool 103. The nozzle inner ring 105 can be adjusted on the nozzle return pipe 104 through a thread, and the size of the injection port 109 of the nozzle inner ring 105 and the nozzle outer ring 106 is adjusted to control the jet speed. The photorheological polishing liquid in the annular cavity 111 is ejected through the injection port 109 at an angle of 45 degrees to polish the surface of the curved part 2. After impacting the curved part 2, it converges to the center of the nozzle, enters the interior of the reflux base 107 under the guidance of the reflux base 107, and is drawn out from the four reflux inlets 1041 at the bottom of the nozzle return pipe 104 under the suction of the reflux pump 9.

[0057] When the photorheological polishing liquid reflux jet polishing device is working, the photorheological polishing liquid is sprayed out from the injection port 109 of the jet nozzle 1, and after polishing the curved surface part 2 below, it converges to the center of the nozzle, and enters the nozzle reflux pipe 104 under the guidance of the reflux base 107. Part of the splashed photorheological polishing liquid flows into the inner cavity of the reflux pool 403. The photorheological polishing liquid that flows back to the reflux equalization container 6 appears in strips under the irradiation of visible light and loses the restraint on the abrasive particles. The agitator 5 stirs the refluxed photorheological polishing liquid, and the stirred photorheological polishing liquid enters the jet equalization container 15 through the jet pump, and appears in flocculent form under the irradiation of ultraviolet light, and the abrasive particles are re-bound into agglomerates, and then enters the jet nozzle 1 to polish the curved surface part 2 below. The jet nozzle 1 realizes complete polishing of the curved surface part 2 under the drive of the industrial robot arm 14.

[0058] like Figure 7 and Figure 8 As shown, the surface of the curved part 2 is a curved surface to be polished. The polishing effect is best when the radius of curvature of the curved surface is greater than half a meter, and medium to large sizes are preferred.

[0059] The photorheological polishing liquid is composed of photosensitive colloid, abrasive and distilled water in a ratio of 3:3:4, which are added into the stirrer 5 one by one and stirred evenly. The photosensitive colloid will undergo photoisomerization reaction under ultraviolet light, and the physical form will change from strips to flocs, which has good wrapping and binding properties for the abrasive. The wrapped abrasive agglomerates can improve the efficiency and quality of polishing. The photorheological polishing liquid is in a suspended state, which is conducive to the uniform distribution of the abrasive. Under visible light illumination, the reverse reaction of photoisomerization occurs, and the physical form changes from flocs to strips, and the abrasive loses its binding.

[0060] The photosensitive colloid is composed of a surfactant and a photosensitive counter ion. The surfactant is propylene diols and the photosensitive counter ion is chlorocinnamic acid containing an azobenzene group. The physical form of the photosensitive colloid gradually isomerizes and becomes flocculent under the irradiation of ultraviolet light with wavelengths of 365nm, 254nm and 185nm. The photosensitive colloid undergoes a reversible change under the irradiation of visible light with a wavelength of 380nm-780nm, and the physical form gradually becomes strip-like.

[0061] The abrasive particles are aluminum oxide, silicon carbide, boron nitride and silicon dioxide, etc., which are selected according to the hardness of the workpiece material. The abrasive particle size is 500nm-10nm, which is selected according to the polishing requirements.

[0062] The present invention also provides a polishing method for a photorheological polishing liquid reflux jet polishing device as described above, comprising: positioning the curved part 2 through the platform system 4. Polishing the curved part 2 on the platform system 4 through the polishing system. Recovering the photorheological polishing liquid of the platform system 4 and the polishing system through the polishing liquid circulation system. In the polishing liquid circulation system, the photorheological polishing liquid is first irradiated by a visible light source 10 so that the photorheological polishing liquid loses its binding on the abrasive particles. Then, the photorheological polishing liquid is irradiated by an ultraviolet light source 7 so that the photorheological polishing liquid binds the abrasive particles into agglomerates again. The polishing liquid circulation system transports the photorheological polishing liquid irradiated by the ultraviolet light source 7 to the polishing system for reuse, forming a cycle. The specific steps are as follows:

[0063] Step 1: Install all equipment, adjust the polishing gap between the jet nozzle 1 and the curved part 2 to 1 mm, prepare the photorheological polishing liquid and pour it into the agitator 5, start all equipment, and the photorheological polishing liquid begins to circulate.

[0064] Step 2: The jet viscosity sensor 12 displays the viscosity of the photorheological polishing fluid in real time. The gear of the ultraviolet light source 7 is adjusted according to the amount of material removal to be polished. The output wavelengths are 185nm, 254nm and 365nm. The shorter the ultraviolet wavelength, the greater the photoisomerization reaction of the photorheological polishing fluid, the greater the viscosity, and the greater the amount of material removal.

[0065] Step three, the reflux viscosity sensor 11 displays the viscosity of the reflux photorheological polishing fluid in real time, and adjusts the wavelength of the visible light source 10 according to the viscosity of the photorheological polishing fluid. The adjustable wavelength range is 380-780nm. The longer the visible light wavelength, the smaller the viscosity of the photorheological polishing fluid, and the photosensitive colloid is separated from the abrasive particles. The viscosity is preferably less than 0.01Pa.s.

[0066] Step four, repeatedly measure the amount of workpiece material removed and the surface roughness of the single-point jet nozzle 1 within a certain period of time, adjust the rotation speed of the jet pump 8 to control the injection rate of the photorheological polishing liquid, and obtain the material removal mathematical model of the jet nozzle 1. The convolution of the material removal model and the polishing time can theoretically obtain the material removal amount of a single point, and the material removal amount of a single point can be used to calculate the path speed of the polishing trajectory.

[0067] Step 5: Establish a polishing trajectory of the model according to the curved surface part 2, calculate the trajectory speed according to the material removal model, and input it into the robot arm industrial computer 13. The industrial robot arm 14 can drive the jet nozzle 1 to polish the curved surface part 2.

[0068] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A photorheological polishing liquid reflux jet polishing device, characterized in that: include: A platform system (4), the platform system (4) comprising a processing platform, the processing platform being used to position the curved surface part (2); A polishing system, the polishing system comprising a jet nozzle (1), the jet nozzle (1) being used to perform jet polishing on a curved surface part (2) on a processing platform; as well as A polishing liquid circulation system, the polishing liquid circulation system comprising a reflux irradiation container (6), a jet irradiation container (15), a visible light source (10), an ultraviolet light source (7) and a pipeline assembly, the pipeline assembly being used to transport the photorheological polishing liquid on the platform system (4) and / or the polishing system to the reflux irradiation container (6) and the jet irradiation container (15) in turn, and then return from the jet irradiation container (15) to the jet nozzle (1), the visible light source (10) being used to irradiate the photorheological polishing liquid in the reflux irradiation container (6) so that the photorheological polishing liquid loses its binding on the abrasive particles, the ultraviolet light source (7) being used to irradiate the photorheological polishing liquid in the jet irradiation container (15) The photorheological polishing liquid in the device (15) is irradiated so that the photorheological polishing liquid re-binds the abrasive particles into agglomerates, at least a portion of the reflux irradiation container (6) corresponding to the visible light source (10) is a transparent structure, and at least a portion of the jet irradiation container (15) corresponding to the ultraviolet light source (7) is a transparent structure, and the pipeline assembly comprises a reflux pump (9) and a jet pump (8), the reflux pump (9) is used to transport the photorheological polishing liquid refluxed from the platform system (4) and / or the polishing system to the reflux irradiation container (6), and the jet pump (8) is used to transport the photorheological polishing liquid irradiated by the visible light source (10) to the jet irradiation container (15).

2. A photorheological polishing liquid reflux jet polishing device according to claim 1, characterized in that: The polishing liquid circulation system also includes a stirrer (5), a reflux viscosity sensor (11) and a jet viscosity sensor (12); the stirrer (5) stirs the photorheological polishing liquid; the pipeline assembly is used to transport the photorheological polishing liquid in the reflux equalization container (6) to the stirrer (5), and then transport the photorheological polishing liquid in the stirrer (5) to the jet equalization container (15); the reflux viscosity sensor (11) is used to detect the viscosity of the photorheological polishing liquid output from the reflux equalization container (6); and the jet viscosity sensor (12) is used to detect the viscosity of the photorheological polishing liquid output from the jet equalization container (15).

3. The photorheological polishing liquid reflux jet polishing device according to claim 1, characterized in that: The ultraviolet light source (7) is a three-level ultraviolet lamp, and its output wavelength has three levels of 185nm, 254nm and 365nm. The wavelength range of the visible light source (10) is 380-780nm.

4. The photorheological polishing liquid reflux jet polishing device according to claim 1, characterized in that: The jet nozzle (1) comprises a nozzle body, the bottom of the nozzle body has an annular injection port (109), a reflux channel is arranged in the nozzle body, the lower end of the reflux channel is located in the middle of the injection port (109), the lower end of the reflux channel has a reflux inlet (1041), the outlet of the reflux channel is connected to the polishing liquid circulation system, and the reflux inlet (1041) of the reflux channel sucks the photorheological polishing liquid ejected from the injection port (109) into the reflux channel under the suction action of a reflux pump (9).

5. A photorheological polishing liquid reflux jet polishing device according to claim 4, characterized in that: A reflux base (107) is provided at the lower end of the reflux channel, the reflux base (107) having a reflux cavity (1071), the reflux cavity (1071) being in communication with a reflux inlet (1041) of the reflux channel, and a drainage cavity (110) is formed between the reflux base (107) and the nozzle body, the drainage cavity (110) guiding the photorheological polishing liquid ejected from the ejection port (109) into the reflux cavity (1071).

6. A photorheological polishing liquid reflux jet polishing device according to claim 5, characterized in that: The nozzle body comprises a nozzle housing assembly and a nozzle inner ring (105); the nozzle inner ring (105) and the reflux channel are both arranged in the nozzle housing assembly; the nozzle inner ring (105) is sleeved outside the reflux channel and forms an annular cavity (111) with the nozzle housing assembly; the lower end of the annular cavity (111) forms an injection port (109); the injection port (109) is an inverted cone-shaped annular cavity structure; the reflux base (107) is located at the lower end of the nozzle inner ring (105); and a drainage cavity (110) is formed between the two.

7. A photorheological polishing liquid reflux jet polishing device according to claim 6, characterized in that: The nozzle inner ring (105) is threadedly engaged with the return channel, and the nozzle inner ring (105) is rotated on the return channel to adjust the size of the injection port (109).

8. The photorheological polishing liquid reflux jet polishing device according to claim 6, characterized in that: The nozzle housing assembly comprises an upper nozzle cavity (112) and a lower nozzle cavity (113). The upper nozzle cavity (112) and the lower nozzle cavity (113) are connected via a ring-shaped hole groove (1030). The upper end of the upper nozzle cavity (112) comprises an inlet (114). The lower part of the nozzle inner ring (105) and the reflux channel are located in the lower nozzle cavity (113). The upper end of the reflux channel extends into the upper nozzle cavity (112). A flow guide (102) is arranged at the upper end of the reflux channel. The flow guide (102) is located just below the inlet (114) and is used to disperse the photorheological polishing liquid.

9. The photorheological polishing liquid reflux jet polishing device according to claim 1, characterized in that: The processing platform comprises a platform base (404) and a reflow pool (403) arranged on the platform base (404); a support plate (405) is arranged in the reflow pool (403); a plurality of through holes (4051) are arranged on the support plate (405); the through holes (4051) are communicated with the inner cavity of the reflow pool (403); and the inner cavity of the reflow pool (403) is connected to a polishing liquid circulation system; The platform system (4) further comprises a plurality of automatic push rods (401) arranged on the support plate (405), wherein a suction cup (402) is arranged at the output end of the automatic push rod (401), and the automatic push rod (401) fixes the curved surface part (2) via the suction cup (402); The polishing system further comprises an industrial robot arm (14), and the jet nozzle (1) is arranged on the industrial robot arm (14).

10. A polishing method using a photorheological polishing liquid reflux jet polishing device as claimed in any one of claims 1 to 9, characterized in that: include: Positioning the curved surface part (2) by means of a platform system (4); Polishing the curved surface part (2) on the platform system (4) by means of a polishing system; The photorheological polishing liquid of the platform system (4) and / or the polishing system is recovered through the polishing liquid circulation system. In the polishing liquid circulation system, the photorheological polishing liquid is first irradiated by a visible light source (10) so that the photorheological polishing liquid loses its binding force on the abrasive particles. The photorheological polishing liquid is then irradiated by an ultraviolet light source (7) so that the photorheological polishing liquid binds the abrasive particles into agglomerates again. The polishing liquid circulation system transports the photorheological polishing liquid irradiated by the ultraviolet light source (7) to the polishing system for reuse, thereby forming a cycle.

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