Graph segmentation method and system of mask defect inspection machine

Abstract

The invention discloses a pattern segmentation method and system for a mask defect inspection machine, and the method comprises the steps: S1, presetting a design drawing file when a mask manufacturing process is carried out to an AOI process, and enabling the design drawing file to comprise a whole image of a mask; s2, judging the graphic design complexity and the shape arrangement complexity of the design drawing document file according to a preset rule; s3, according to the graphic typesetting information of the design drawing document file obtained in the step S2, changing the segmentation direction of the TDI for the graphic according to the obtained result, and passing through the SCAN area with the graphic with the minimum data volume; s4, according to the graph complexity and the shape arrangement information of the graph file obtained in the step S2, changing the segmentation direction of the TDI for the graph according to the obtained result, and performing segmentation in a relatively regular graph direction with a large area proportion; according to the method, the graphs in the SCAN are controlled, and the complex graphs are properly segmented to match TDI scanning, so that the AOI scanning duration is effectively shortened, the false drop rate is reduced, the time cost is saved, and the production efficiency is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of mask defect detection, and in particular to a pattern segmentation method and system of a mask defect inspection machine. Background Art

[0002] In the mass production of microelectronic products, the photomask (also known as a mask, mask, or photo mask) is a crucial precision pattern transfer template. It is a coated glass substrate containing a precise electronic circuit image, and the micro-nanoscale circuit pattern is engraved on the substrate through high-precision photolithography.

[0003] As an inspection device based on optical principles and machine vision technology, the automatic optical inspection machine (AOI) is widely used in the defect detection of photomasks in the electronics manufacturing industry. Its working principle is to automatically scan the inspected object through a high-resolution camera, capture the image and compare it with the preset standard image data to detect various defects, thereby realizing the monitoring and quality control of the production process.

[0004] However, as the photomask is used in different industries, the images depicted on its surface vary in terms of graphic complexity, size, and graphic spacing. For more sophisticated graphic designs, the larger the amount of image data, the higher the production accuracy requirements, and the more stringent the requirements for AOI detection capabilities.

[0005] In the AOI process, the defects are scanned and photographed by the TDI linear camera, and the data is transmitted to the DPU (data processor) for processing. Currently, there are two main problems when performing AOI inspection on such high-specification photomasks:

[0006] 1. The amount of high-precision image data is too large, resulting in slow DPU processing speed, which in turn makes the scanning time too long, affecting production efficiency.

[0007] 2. Since the accuracy often fluctuates during production, when there is a deviation between the actual scanned product and the preset standard image data, it is easy for AOI to mistakenly detect false defects (misjudged defects, not product defects that really need to be controlled), thus affecting the accuracy of detection.

[0008] In summary, the existing photomask defect detection technology has the problems of slow processing speed and affected detection accuracy when facing high-precision photomasks, and an effective solution is urgently needed to optimize this detection process. Summary of the invention

[0009] The purpose of the present invention is to provide a graphic segmentation method and system for a mask defect inspection machine, which can effectively reduce the AOI scanning time and reduce the false detection rate by controlling the graphic scanning direction in SCAN and performing appropriate segmentation on more complex graphics to match the scanning characteristics of TDI, thereby saving time and cost and improving production efficiency.

[0010] The present invention is achieved through the following technical solutions:

[0011] A pattern segmentation method for a mask defect inspection machine comprises the steps of:

[0012] S1. When the mask production process reaches the AOI process, a design drawing file is pre-set, and the design drawing file contains the entire image of the mask;

[0013] S2. Determine the complexity of the graphic design and shape arrangement of the design drawing file according to preset rules;

[0014] S3. According to step S2, the graphic layout information of the design drawing file is obtained, and the segmentation direction of the graphic by TDI is changed according to the obtained result, so that the graphic with the minimum data volume passes through the SCAN area, which can reduce the amount of data processed by the DPU per unit time and thus achieve the effect of speed improvement;

[0015] S4. According to step S2, the graphic complexity and shape arrangement information of the drawing file are obtained, and the segmentation direction of the TDI for the graphic is changed according to the obtained result, and the graphic is segmented in a relatively regular and large area direction. The light reflected back by this type of graphic is more uniform, and the graphic rules also make it easier for the AF focus curve to capture the characteristic value. A good AF focus state reduces the AOI false detection rate.

[0016] A further optimization scheme is that the preset rule determination steps are as follows:

[0017] S21. The graphic design complexity of the design drawing file includes simple graphic design and complex graphic design;

[0018] Among them, common regular geometric figures such as opaque squares, smooth horizontal and vertical lines, circles with diameters in millimeters, and regular polygons with side lengths in millimeters are determined as the simple graphic designs;

[0019] Among them, regular geometric figures such as light-transmitting square holes, horizontal and vertical lines with tiny fluctuations of a few microns, oblique lines, corners, arcs, sharp corners and irregular polygons are determined to be the complex graphic designs;

[0020] S22. The complexity of the shape arrangement of the design drawing file includes simple arrangement and complex arrangement;

[0021] Wherein, the simple arrangement is to form an array with the simple graphic design and the graphic spacing after the graphic array is greater than 100 microns, and there is no overlap between the graphics;

[0022] The complex arrangement needs to satisfy any of the following points:

[0023] a. Array with complex graphics;

[0024] b. The pattern spacing after the pattern array is less than 100 microns;

[0025] c. There is overlap between graphics;

[0026] d. Multiple pattern arrays and the pattern spacing after various pattern arrays is less than 3 microns.

[0027] A further optimization scheme is that step S3 specifically includes the following steps:

[0028] S31. Establish a coordinate system with the center point of the design drawing as the origin, with the X axis to the right as the positive direction and the Y axis upward as the positive direction;

[0029] S32. The design drawing is opened in the conversion software in GDSII format, and the graphic data-intensive area is found and the difficulty of the mask graphic layout is determined according to the determination rules, and the simple area and the complex area are divided, and the regional coordinates are recorded;

[0030] S33. Confirm the bandwidth and scanning direction of TDI and set the strip SCAN range;

[0031] S34. According to the complexity of the graphic arrangement determined by the analysis, a direction with a simple arrangement and a small number of graphic arrays is found, the design drawing is rotated in the direction with the origin as the rotation point, and the parallel lens is used to perform graphic segmentation in the direction as the scanning direction;

[0032] S35. When the design drawing is rotated, the mask product is synchronously rotated to match the design drawing and then scanned.

[0033] A further optimization scheme is that the scanning direction is parallel to the positive direction of the X-axis or Y-axis of the coordinate system.

[0034] A further optimization scheme is to record the bandwidth of TDI as W, the area of ​​the area is recorded by the coordinates of the two vertices A (X1, Y1) and B (X2, Y2) at the opposite corners of the figure, the movement distance of the parallel lens is the length of the area in the X direction, recorded as L = |X1-X2|, and the strip SCAN range is set to L*W.

[0035] A further optimization scheme is that step S4 specifically includes the following steps:

[0036] S41. Establish a coordinate system with the center point of the design drawing as the origin, with the X axis to the right as the positive direction and the Y axis upward as the positive direction;

[0037] S42. The design file is opened in the conversion software in GDSII format, and the graphic data-intensive area is found and analyzed according to the determination rules to determine the complexity of the mask graphic design and the complexity of the shape arrangement, and the simple area and the complex area are divided, and the regional coordinates are recorded;

[0038] S43. Confirm the bandwidth and scanning direction of TDI and set the strip SCAN range;

[0039] S44. Based on the complexity of the graphic design determined by the analysis, if it is a simple graphic design, the simple graphic design and arrangement direction are placed in parallel with the lens scanning direction for graphic segmentation; if it is a complex graphic design, it is necessary to determine the components of the complex graphic, and the parallel lens scanning direction is firstly used to segment the graphic in a relatively regular and large area ratio graphic direction, and the design files in this step are rotated around the origin;

[0040] S45. When the design drawing is rotated, the mask product is synchronously rotated to match the design drawing and then scanned.

[0041] A further optimization scheme is that the scanning direction is parallel to the positive direction of the X-axis or Y-axis of the coordinate system.

[0042] A further optimization scheme is to record the bandwidth of TDI as W, the area of ​​the area is recorded by the coordinates of the two vertices A (X1, Y1) and B (X2, Y2) at the opposite corners of the figure, the movement distance of the parallel lens is the length of the area in the X direction, recorded as L = |X1-X2|, and the strip SCAN range is set to L*W.

[0043] Based on the above-mentioned pattern segmentation method of a mask defect inspection machine, this solution provides a pattern segmentation system of a mask defect inspection machine, including:

[0044] A storage module, wherein the storage module stores a design drawing file containing the entire image of the mask;

[0045] A judgment module, wherein the judgment module judges the graphic design complexity and shape arrangement complexity of the design drawing file according to preset rules;

[0046] The graphic segmentation module receives the judgment information of the design drawing file from the judgment module, finds the graphic-dense area, and after confirming the bandwidth and scanning direction of TDI and setting the strip SCAN range, rotates the design drawing file with its own center point as the rotation point, and places the graphic with the smallest data volume, more regular shape and larger area ratio in the scanning direction of TDI. The mask product is synchronously rotated and scanned according to the rotation direction of the rotating graphic.

[0047] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0048] The present invention is based on the scanning principle and influencing factors of TDI linear camera.

[0049] The present invention can effectively reduce AOI scanning time and false detection rate, save time cost and improve production efficiency by determining the complexity of graphic design and shape arrangement, and optimizing processing speed and graphic segmentation operation of AOI detection determination. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] The drawings described herein are used to provide a further understanding of the embodiments of the present invention, constitute a part of this application, and do not constitute a limitation of the embodiments of the present invention. In the drawings:

[0051] Figure 1 This is a schematic diagram of the scanning principle and process of the TDI camera;

[0052] Figure 2 A schematic diagram of scanning a photomask product;

[0053] Figure 3 This is a schematic diagram of scanning and focusing of the TDI camera;

[0054] Figure 4 Schematic diagram of the process of the present invention;

[0055] Figure 5 A schematic diagram of the time optimization of the present invention;

[0056] Figure 6 Flowchart optimized for invention time;

[0057] Figure 7 The schematic diagram of the present invention for optimizing the false detection rate;

[0058] Figure 8 Flow chart for optimizing false detection rate of the present invention. DETAILED DESCRIPTION

[0059] In order to make the objectives, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with embodiments and drawings. The exemplary embodiments of the present invention and their description are only used to explain the present invention and are not intended to limit the present invention.

[0060] When the mask production process reaches the AOI process, the design drawing file needs to be preset first. The design drawing file contains the entire image of the mask, which is composed of various graphics and lines. After the preset is completed, the AOI scan begins. The product and the design file need to be compared, and the grayscale value (brightness intensity) returned by the scanning lens is used for logical judgment, and finally a defect file is generated. The entire process is preset drawing file → TDI linear camera takes a picture of the product in real time → the picture data is transmitted to DPU → DPU processes, transforms and compares → generates a defect file.

[0061] Among them, Figure 1 The TDI linear camera shown in the figure divides the entire image into multiple strips. Each strip records a part of the image and is processed in the DPU to be converted into a complete image. Each strip has a fixed bandwidth, which represents the width range of a scan of the TDI camera. Together with the set movement distance, the scanning area of ​​a strip is called SCAN, as shown in Figure 2 As shown, the motion trajectory of the TDI linear camera during scanning is usually parallel to the horizontal or vertical direction relative to the product. For high-precision image files, the data volume is too large and the processing speed is slow, resulting in a long scanning time.

[0062] At the same time, when scanning, the TDI linear camera needs to perform AF (auto focus) to scan, and it is real-time focusing, and it needs to focus and take pictures continuously during the movement. AF (auto focus) is very sensitive to light intensity. When the camera light source passes through the graphics, the sensor receives the reflected or transmitted light, and transmits it to the computer as an electrical signal to calculate the gray value, which is used as the defect judgment standard. AF (auto focus) will generate an AF focus curve based on the arrangement of the graphics in the scanned graphics area. For example, Figure 3 As shown, this curve is affected not only by the intensity of light supplied by the light source but also by the shape of the graphic. It will change according to the shape of the graphic. The state of AF (auto focus) determines whether defects will be missed or misdetected during scanning.

[0063] Example 1

[0064] Based on the scanning principle and influencing factors of the TDI linear camera, this embodiment 1 provides a pattern segmentation method for a mask defect inspection machine, such as Figure 4 - Figure 8As shown in the figure, by controlling the graphics in SCAN, the more complex graphics are appropriately segmented to match the scanning characteristics of TDI, so as to achieve the purpose of optimizing scanning. The implementation steps are as follows:

[0065] S1. When the mask production process reaches the AOI process, a design drawing file is pre-set, and the design drawing file contains the entire image of the mask;

[0066] S2. Determine the complexity of the graphic design and shape arrangement of the design drawing file according to the preset rules;

[0067] Among them, according to the actual production situation of AOI process, the following judgment rules are established:

[0068] S21. The graphic design complexity of the design drawing file includes simple graphic design and complex graphic design;

[0069] Among them, common regular geometric shapes such as squares (opaque), smooth horizontal and vertical lines, circles with diameters in millimeters, regular polygons with side lengths in millimeters, etc. are determined to be simple graphic designs;

[0070] Among them, regular geometric figures such as square holes (light-transmitting), horizontal and vertical lines with tiny fluctuations of a few microns, oblique lines, corners, arcs, sharp corners and irregular polygons are determined as complex graphic designs;

[0071] S22. The complexity of the shape arrangement of the design drawing file includes simple arrangement and complex arrangement;

[0072] Among them, the simple arrangement is to array with simple graphic design and the graphic spacing after the graphic array is greater than 100 microns, and there is no overlap between the graphics;

[0073] Among them, the complex arrangement needs to meet any of the following points:

[0074] a. Array with complex graphics;

[0075] b. The pattern spacing after the pattern array is less than 100 microns;

[0076] c. There is overlap between graphics;

[0077] d. Multiple pattern arrays and the pattern spacing after various pattern arrays is less than 3 microns.

[0078] S3. Figure 5 As shown, according to the graphic layout information of the design drawing file obtained in step S2, the segmentation direction of the graphics by TDI is changed, and the graphics with the smallest amount of data pass through the SCAN area, which can reduce the amount of data processed by the DPU per unit time and thus achieve the effect of speed improvement;

[0079] like Figure 6 The specific steps are as follows:

[0080] S31. Set the origin of the design drawing. Usually, the coordinate system is established with the center point as the origin. The coordinate system takes the X axis to the right as the positive direction and the Y axis upward as the positive direction;

[0081] S32. The design drawing is opened in the conversion software in GDSII format, and the graphic data-intensive area is found and the difficulty of the mask pattern layout is determined according to the determination rules, and the simple area and the complex area are divided, and the area coordinates are recorded. The area coordinates are recorded by the coordinates of the two vertices of the diagonal angle of the graphic A (X1, Y1) and B (X2, Y2);

[0082] S33. Confirm the bandwidth and scanning direction of TDI and set the strip SCAN range;

[0083] The bandwidth of TDI is recorded as W. The W value is generally related to the lens hardware configuration and the entrance pupil size of the optical system. Taking the aperture diaphragm as an example, a 1mm aperture diaphragm lens can only scan a 1mm width when moving a strip. This is the bandwidth W = 1mm.

[0084] The scanning direction is parallel to the positive direction of the X-axis or Y-axis of the coordinate system. Usually, a lens movement distance is set. When scanning an area, it is the length of the area in the X direction, expressed as L=|X1-X2|, and the strip SCAN range is set to L*W.

[0085] S34. According to the complexity of the graphic arrangement determined by the analysis, find the direction with a simple arrangement and a small number of graphic arrays (the direction with the smallest amount of data), design the drawing to rotate in this direction with the origin as the rotation point, and use the parallel lens as the scanning direction to perform graphic segmentation;

[0086] S35. When the design drawing is rotated, the mask product is synchronously rotated to match the design drawing and then scanned, so that the amount of data processed by the DPU per unit time is reduced by half, thereby achieving the effect of speed improvement.

[0087] S4. Figure 7 As shown in FIG. 1 , since the state of AF (auto focus) determines whether defects will be missed or misdetected during scanning, according to the graphic complexity and shape arrangement information of the image file obtained in step S2, the segmentation direction of the TDI for the graphic is changed, and the graphic direction with a relatively regular shape and a large area is used for segmentation. The light reflected back by such graphics is more uniform, and the graphic regularity also enables the AF focus curve to better capture the feature value. A good AF focus state reduces the AOI misdetection rate. The specific steps are as follows: Figure 8 As shown:

[0088] S41. Establish a coordinate system with the center point of the design drawing as the origin, with the X axis to the right as the positive direction and the Y axis upward as the positive direction;

[0089] S42. The design file is opened in the conversion software in GDSII format, and the graphic data-intensive area is found. The complexity of the mask graphic design and the complexity of the shape arrangement are analyzed and determined according to the judgment rules, and the simple area and the complex area are divided, and the area coordinates are recorded. The area coordinates are recorded by the coordinates of the two vertices of the diagonal angle of the graphic A (X1, Y1) and B (X2, Y2);

[0090] S43. Confirm the bandwidth and scanning direction of TDI and set the strip SCAN range;

[0091] The bandwidth of TDI is recorded as W. The W value is generally related to the lens hardware configuration and the entrance pupil size of the optical system. Taking the aperture diaphragm as an example, a 1mm aperture diaphragm lens can only scan a 1mm width when moving a strip. This is the bandwidth W = 1mm.

[0092] The scanning direction is parallel to the positive direction of the X-axis or Y-axis of the coordinate system. Usually, a lens movement distance is set. When scanning an area, it is the length of the area in the X direction, expressed as L=|X1-X2|, and the strip SCAN range is set to L*W.

[0093] S44. Based on the complexity of the graphic design determined by the analysis, if it is a simple graphic design, the simple graphic design and arrangement direction are placed in parallel with the lens scanning direction for graphic segmentation; if it is a complex graphic design, it is necessary to determine the components of the complex graphic, and the parallel lens scanning direction is firstly used to segment the graphic in a relatively regular and large area ratio graphic direction to ensure that the AF light and focus state are stable to scan the complex graphic part. In this step, the design files are rotated with the origin as the center;

[0094] S45. When the design drawing is rotated, the mask product is synchronously rotated to match the design drawing and then scanned.

[0095] This embodiment is applicable to the AOI scanning process for products with design files for detection and judgment, but only products with precise design files can achieve significant improvements. The more roughly made products are, the worse the effect will be or even ineffective.

[0096] At the same time, this embodiment is only improved from the perspective of design files in conjunction with the characteristics of the AOI scanning camera. It is an optimization based on the camera characteristics and does not change the software and hardware parameters. Therefore, in other implementation methods, if you want to achieve the same effect, you can also change the configuration parameters of the camera hardware to control the detection capability or modify the logical parameters of the software judgment defect in the computer software algorithm.

[0097] Example 2

[0098] This embodiment 2 is based on a pattern segmentation method of a mask defect inspection machine in embodiment 1, and provides a pattern segmentation system of a mask defect inspection machine, including:

[0099] A storage module, in which a design drawing file containing the entire image of the mask is stored;

[0100] A judgment module, which judges the graphic design complexity and shape arrangement complexity of the design drawing file according to preset rules;

[0101] Graphic segmentation module: The graphic segmentation module receives the judgment information of the design drawing file from the judgment module, finds the graphic-dense area, and after confirming the bandwidth and scanning direction of TDI and setting the strip SCAN range, rotates the design drawing file with its own center point as the rotation point, and places the graphics with the smallest data volume, more regular shape and larger area ratio in the scanning direction of TDI. The mask product rotates and scans synchronously according to the rotation direction of the rotating graphics. By controlling the graphics in the SCAN, the more complex graphics are appropriately segmented to match the TDI scan, effectively reducing the AOI scanning time and the false detection rate, saving time and cost, and improving production efficiency.

[0102] The specific implementation methods described above further illustrate the objectives, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above description is only a specific implementation method of the present invention and is not intended to limit the scope of protection of the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A pattern segmentation method for a mask defect inspection machine, characterized in that: Includes steps: S1. When the mask production process reaches the AOI process, a design drawing file is pre-set, and the design drawing file contains the entire image of the mask; S2. Determine the complexity of the graphic design and shape arrangement of the design drawing file according to preset rules; S3. According to step S2, the graphic layout information of the design drawing file is obtained, and the segmentation direction of the graphic for TDI is changed according to the obtained result, so that the graphic with the minimum amount of data passes through the SCAN area; S4. According to step S2, the graphic complexity and shape arrangement information of the drawing file are obtained, and the segmentation direction of the graphic by TDI is changed according to the obtained result, so as to segment the graphic in a relatively regular direction with a large area.

2. The pattern segmentation method of a mask defect inspection machine according to claim 1, characterized in that: The steps of determining the preset rules are as follows: S21. The graphic design complexity of the design drawing file includes simple graphic design and complex graphic design; Among them, common regular geometric figures such as opaque squares, smooth horizontal and vertical lines, circles with diameters in millimeters, and regular polygons with side lengths in millimeters are determined as the simple graphic designs; Among them, regular geometric figures such as light-transmitting square holes, horizontal and vertical lines with slight undulations, oblique lines, corners, arcs, sharp corners and irregular polygons are determined as the complex graphic designs; S22. The complexity of the shape arrangement of the design drawing file includes simple arrangement and complex arrangement; Wherein, the simple arrangement is to form an array with the simple graphic design and the graphic spacing after the graphic array is greater than 100 microns, and there is no overlap between the graphics; The complex arrangement needs to satisfy any of the following points: a. Array with complex graphics; b. The pattern spacing after the pattern array is less than 100 microns; c. There is overlap between graphics; d. Multiple pattern arrays and the pattern spacing after various pattern arrays is less than 3 microns.

3. The pattern segmentation method of a mask defect inspection machine according to claim 1, characterized in that: The step S3 specifically includes the following steps: S31. Establish a coordinate system with the center point of the design drawing as the origin, with the X axis to the right as the positive direction and the Y axis upward as the positive direction; S32. The design drawing is opened in the conversion software in GDSII format, and the graphic data-intensive area is found and the difficulty of the mask graphic layout is determined according to the determination rules, and the simple area and the complex area are divided, and the regional coordinates are recorded; S33. Confirm the bandwidth and scanning direction of TDI and set the strip SCAN range; S34. According to the complexity of the graphic arrangement determined by the analysis, a direction with a simple arrangement and a small number of graphic arrays is found, the design drawing is rotated in the direction with the origin as the rotation point, and the parallel lens is used to perform graphic segmentation in the direction as the scanning direction; S35. When the design drawing is rotated, the mask product is synchronously rotated to match the design drawing and then scanned.

4. The pattern segmentation method of a mask defect inspection machine according to claim 3, characterized in that: The scanning direction is parallel to the positive direction of the X-axis or Y-axis of the coordinate system.

5. The pattern segmentation method of a mask defect inspection machine according to claim 3, characterized in that: The bandwidth of TDI is denoted as W, and the area coordinates are recorded by the coordinates of the two vertices A (X1, Y1) and B (X2, Y2) at the diagonal corners of the figure to record the area of ​​the area. The movement distance of the parallel lens is the length of the area in the X direction, denoted as L = |X1-X2|, and the strip SCAN range is set to L*W.

6. The pattern segmentation method of a mask defect inspection machine according to claim 1, characterized in that: The step S4 specifically includes the following steps: S41. Establish a coordinate system with the center point of the design drawing as the origin, with the X axis to the right as the positive direction and the Y axis upward as the positive direction; S42. The design file is opened in the conversion software in GDSII format, and the graphic data-intensive area is found and analyzed according to the determination rules to determine the complexity of the mask graphic design and the complexity of the shape arrangement, and the simple area and the complex area are divided, and the regional coordinates are recorded; S43. Confirm the bandwidth and scanning direction of TDI and set the strip SCAN range; S44. Based on the complexity of the graphic design determined by the analysis, if it is a simple graphic design, the graphic design and arrangement direction are placed parallel to the lens scanning direction for graphic segmentation; If it is a complex graphic design, it is necessary to determine the components of the complex graphic. The parallel lens scanning direction first divides the graphic in a relatively regular and large area-occupying graphic direction. In this step, the design file is rotated around the origin. S45. When the design drawing is rotated, the mask product is synchronously rotated to match the design drawing and then scanned.

7. The pattern segmentation method of a mask defect inspection machine according to claim 6, characterized in that: The scanning direction is parallel to the positive direction of the X-axis or Y-axis of the coordinate system.

8. The pattern segmentation method of a mask defect inspection machine according to claim 6, characterized in that: The bandwidth of TDI is denoted as W, and the area coordinates are recorded by the coordinates of the two vertices A (X1, Y1) and B (X2, Y2) at the diagonal corners of the figure to record the area of ​​the area. The movement distance of the parallel lens is the length of the area in the X direction, denoted as L = |X1-X2|, and the strip SCAN range is set to L*W.

9. A pattern segmentation system for a mask defect inspection machine, applied to any one of the pattern segmentation methods for a mask defect inspection machine in claims 1-8, characterized in that: include: A storage module, wherein the storage module stores a design drawing file containing the entire image of the mask; A judgment module, wherein the judgment module judges the graphic design complexity and shape arrangement complexity of the design drawing file according to preset rules; The graphic segmentation module receives the judgment information of the design drawing file from the judgment module, finds the graphic-dense area, and after confirming the bandwidth and scanning direction of TDI and setting the strip SCAN range, rotates the design drawing file, and places the graphic with the smallest data volume, more regular shape and larger area ratio in the scanning direction of TDI. The mask product is synchronously rotated and scanned according to the rotation direction of the rotating graphic.

10. The pattern segmentation system of a mask defect inspection machine according to claim 9, characterized in that , the design drawing file rotates with its own center point as the rotation point.

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