Display device and method of manufacturing same

Abstract

Provided are a display device and a method of manufacturing the same, the display device including: a light emitting element on a base layer and including a first electrode, a second electrode, and a light emitting portion electrically connected between the first electrode and the second electrode; a pixel defining layer on the base layer; a barrier layer on the pixel defining layer; and an electrode on the barrier layer, in which the first electrode includes a 11th electrode and a 11th electrode, the pixel defining layer is between the 11th electrode and the 11th electrode, the light emitting portion includes a first light emitting portion electrically connected to the 11th electrode and a second light emitting portion electrically connected to the 11th electrode, and the electrode and the barrier layer are between the first light emitting portion and the second light emitting portion in a plan view.

Description

[0001] This application claims priority to and the benefit of Korean Patent Application No. 10-2023-0087874 filed in the Korean Intellectual Property Office on July 6, 2023, the disclosure of which is incorporated herein by reference in its entirety. Technical Field

[0002] Aspects of some embodiments of the present disclosure relate to a display device and a method of manufacturing the display device. Background Art

[0003] As information technology develops, the importance of display devices that provide a connection medium between users and information has increased. Such a display device may include a light emitting element, and may include sub-pixels that are adjacent to each other and include the light emitting element.

[0004] It is desirable to distinguish the electric signals supplied to each of the sub-pixels adjacent to each other. For example, due to leakage current (lateral leakage) generated between the sub-pixels, there is a risk that the electric signals may be mixed up.

[0005] The above information disclosed in this background section is only for enhancement of understanding of the background technology and therefore the information discussed in this background section does not necessarily constitute prior art. Summary of the invention

[0006] Aspects of some embodiments include a display device capable of reducing risks such as leakage current and a method of manufacturing the display device.

[0007] Aspects of some embodiments include a display device capable of preventing or reducing damage to a configuration in the display device and a method of manufacturing the display device.

[0008] Aspects of some embodiments include a display device capable of achieving relatively high-resolution display performance and a method of manufacturing the display device.

[0009] According to some embodiments of the present disclosure, a display device may include: a light-emitting element on a substrate layer and including a first electrode, a second electrode, and a light-emitting portion electrically connected between the first electrode and the second electrode; a pixel defining layer on the substrate layer; a barrier layer on the pixel defining layer; and an electrode on the barrier layer. According to some embodiments, the first electrode may include a 1_1 electrode and a 1_2 electrode. According to some embodiments, the pixel defining layer may be between the 1_1 electrode and the 1_2 electrode. According to some embodiments, the light-emitting portion may include a first light-emitting portion electrically connected to the 1_1 electrode and a second light-emitting portion electrically connected to the 1_2 electrode. According to some embodiments, in a plan view, the electrode and the barrier layer may be between the first light-emitting portion and the second light-emitting portion.

[0010] According to some embodiments, the electrode, the barrier layer, and the pixel defining layer may overlap one another in a plan view.

[0011] According to some embodiments, a lower surface of the blocking layer may contact the pixel defining layer. According to some embodiments, an upper surface of the blocking layer may contact the electrode.

[0012] According to some embodiments, the electrode may have a first thermal conductivity. According to some embodiments, the barrier layer may have a second thermal conductivity that is less than the first thermal conductivity.

[0013] According to some embodiments, the first thermal conductivity and the second thermal conductivity may have a ratio in the range of 3.4 to 3600.

[0014] According to some embodiments, the electrode may include at least one of the group consisting of molybdenum (Mo), copper (Cu), aluminum (Al), tungsten (W), gold (Au), and silver (Ag). According to some embodiments, the barrier layer may include titanium (Ti), lead (Pb), aluminum oxide (AlO x )、polyimide、silicon oxide(SiO x ) and silicon nitride (SiN x ) of the group.

[0015] According to some embodiments, in a plan view, the electrode and the barrier layer may be between the 1_1th electrode and the 1_2th electrode.

[0016] According to some embodiments, the electrode and the barrier layer may be spaced apart from the first light emitting portion and the second light emitting portion in a direction along which the first light emitting portion and the second light emitting portion are spaced apart from each other.

[0017] According to some embodiments, a gap may be formed between the blocking layer and the light emitting part. According to some embodiments, the second electrode and the pixel defining layer may contact each other in the gap.

[0018] According to some embodiments, side surfaces of each of the electrode and the barrier layer may form side surfaces that are discontinuous with each other at locations adjacent to each other.

[0019] According to some embodiments, the display device may include a display area and a non-display area surrounding at least a portion of the display area, and the display device may further include a pulse input line electrically connected to the electrode. According to some embodiments, the pulse input line may be in the non-display area.

[0020] According to some embodiments, a side surface of each of the electrode and the barrier layer may form an intermediate angle with an upper surface of the pixel defining layer. According to some embodiments, the intermediate angle may be in a range of 15 degrees to 60 degrees.

[0021] According to some embodiments, the barrier layer may include a barrier protrusion that does not overlap the electrode in a plan view.

[0022] According to some embodiments, the barrier layer may include a groove in which at least a portion of the electrode is positioned. According to some embodiments, the barrier layer may cover at least a portion of a side surface of the electrode.

[0023] According to some embodiments, the electrode may include an electrode protrusion that does not overlap the barrier layer in a plan view.

[0024] According to some embodiments, the second electrode may be on a side surface of the electrode, the first light emitting portion, and the second light emitting portion.

[0025] According to some embodiments of the present disclosure, a display device may include a first sub-pixel forming a first sub-pixel region and a second sub-pixel forming a second sub-pixel region, and an electrode blocking structure between the first sub-pixel region and the second sub-pixel region. According to some embodiments, the electrode blocking structure may include a barrier layer having a first thermal conductivity and an electrode contacting an upper surface of the barrier layer and having a second thermal conductivity greater than the first thermal conductivity.

[0026] According to some embodiments of the present disclosure, a method of manufacturing a display device may include: patterning a first electrode, the first electrode including a 1_1 electrode and a 1_2 electrode on a base layer; patterning a pixel defining layer, the pixel defining layer between the 1_1 electrode and the 1_2 electrode; forming an electrode blocking structure including a blocking layer and an electrode on the pixel defining layer; forming a base light emitting portion to cover the electrode blocking structure and the first electrode; and removing at least a portion of the base light emitting portion by providing a pulse input to the electrode blocking structure. According to some embodiments, the electrode may have a thermal conductivity greater than that of the blocking layer.

[0027] According to some embodiments, the removing step may include dissipating Joule heat from the electrode, and providing the first light emitting portion and the second light emitting portion spaced apart from each other.

[0028] According to some embodiments, the step of removing may include exposing a portion of the pixel defining layer. According to some embodiments, the method may further include forming a second electrode. According to some embodiments, the step of forming the second electrode may include contacting the pixel defining layer and the second electrode.

[0029] According to some embodiments of the present disclosure, a display device capable of reducing risks such as leakage current and a method of manufacturing the display device may be provided.

[0030] According to some embodiments of the present disclosure, a display device capable of preventing or reducing damage to a configuration in the display device and a method of manufacturing the display device may be provided.

[0031] According to some embodiments of the present disclosure, a display device capable of achieving relatively high-resolution display performance and a method of manufacturing the display device may be provided. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] The above and other aspects of some embodiments of the present disclosure will become more apparent by describing aspects of some embodiments of the present disclosure in more detail with reference to the accompanying drawings, in which: Figure 1 is a schematic plan view showing a display device according to some embodiments; Figure 2 is a schematic cross-sectional view showing a display device according to some embodiments; Figure 3 is a schematic cross-sectional view showing a light emitting element according to some embodiments; Figure 4 is a schematic block diagram showing an electrical connection structure for a light emitting element according to some embodiments; Figure 5 as well as Figures 7 to 10 is a schematic cross-sectional view showing a display device according to some embodiments; Figure 6 According to some embodiments Figure 1 A schematic enlarged view of the EA1 region of FIG. 1 ; and Figures 11 to 13 2 is a schematic cross-sectional view illustrating each process operation of a method of manufacturing a display device according to some embodiments. DETAILED DESCRIPTION

[0033] The disclosure can be modified in various ways and have various forms. Therefore, specific embodiments will be shown in the drawings and will be described in detail in the specification. However, it should be understood that the disclosure is not intended to be limited to the specific forms disclosed, and the disclosure includes all modifications, equivalents and replacements within the spirit and technical scope of the disclosure.

[0034] The terms "first", "second", etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another component. For example, a first component may be referred to as a second component, and similarly, a second component may also be referred to as a first component without departing from the scope of the disclosure. In the following description, unless the context clearly indicates otherwise, a singular expression includes a plural expression.

[0035] It should be understood that, in the present application, the terms "including", "having" and the like are used to illustrate the existence of features, quantities, steps, operations, components, parts or combinations thereof described in the specification, but do not exclude the possibility of pre-existence or addition of one or more other features, quantities, steps, operations, components, parts or combinations thereof. In addition, when a portion of a layer, region, plate, etc. is referred to as "on" another portion, it includes not only the case where the portion is "directly on" the other portion, but also the case where another portion is between the portion and the other portion. In addition, in the present specification, when a portion of a layer, region, plate, etc. is formed on another portion, the formation direction is not limited to the upper direction, but includes forming the portion on the side surface or in the lower direction. On the contrary, when a portion of a layer, region, plate, etc. is formed "below" another portion, this includes not only the case where the portion is "directly below" the other portion, but also the case where another portion is between the portion and the other portion.

[0036] The present invention relates to a display device and a method of manufacturing the same. Hereinafter, a display device and a method of manufacturing the same according to some embodiments are described with reference to the accompanying drawings.

[0037] Figure 1 is a schematic plan view showing a display device according to some embodiments.

[0038] The display device DD is configured to emit light. The display device DD includes a light emitting element LD (refer to Figure 2 According to some embodiments, the display device DD may be provided in various forms. For example, the display device DD may be applied to a smart phone, a laptop computer, a tablet personal computer (PC), a wearable device (e.g., a head-mounted device, a smart watch, smart glasses, etc.), a television, an infotainment system for a vehicle, and various other embodiments.

[0039] Reference Figure 1 , the display device DD may include a base layer BSL and pixels PXL positioned on the base layer BSL. As will be appreciated by those skilled in the art, the display device DD may have any suitable number of pixels PXL depending on the design and size of the display device DD. The display device DD may also include a driving circuit unit (e.g., a scan driver and a data driver), lines, and pads (also referred to as "pads" or "pads") for driving the pixels PXL.

[0040] The display device DD may include a display area DA and a non-display area NDA. The non-display area NDA may mean an area other than the display area DA. The non-display area NDA may surround at least a portion of the display area DA. According to some embodiments, the non-display area NDA may surround the entire display area DA (e.g., positioned outside the periphery or occupied area of ​​the entire display area DA).

[0041] The base layer BSL may form a base member of the display device DD. The base layer BSL may be a rigid substrate (or film) or a flexible substrate (or film). For example, the base layer BSL may be a rigid substrate formed of glass or tempered glass, a flexible substrate (or film) of a plastic or metal material, or at least one insulating layer. The material and / or physical properties of the base layer BSL are not particularly limited. According to some embodiments, the base layer BSL may be transparent or substantially transparent. Here, "substantially transparent" may mean that light can be transmitted at one transmittance or more transmittance levels. According to some embodiments, the base layer BSL may be translucent or opaque. In addition, according to some embodiments, the base layer BSL may include a reflective material.

[0042] The display area DA may refer to an area where the pixels PXL are located. The non-display area NDA may refer to an area where the pixels PXL are not located. A driving circuit unit, lines, and pads connected to the pixels PXL of the display area DA may be located in the non-display area NDA.

[0043] According to some embodiments, the pixels PXL (or sub-pixels SPX) may be arranged in various structures. For example, the pixels PXL (or sub-pixels SPX) may be arranged in stripes (eg, S stripes) or PENTILE ® Arrangement structure and the like. According to some embodiments, the sizes between the sub-pixels SPX may be partially different, and the sub-pixels SPX may have various shapes. For example, the sub-pixels SPX may have a quadrilateral shape or a hexagonal shape in a plan view. However, the embodiments according to the present disclosure are not necessarily limited thereto.

[0044] According to some embodiments, the pixel PXL includes a light emitting element LD (refer to Figure 2 ). The pixel PXL (or sub-pixel SPX) may include a first sub-pixel SPX1, a second sub-pixel SPX2, and a third sub-pixel SPX3. At least one of the first sub-pixel SPX1, the second sub-pixel SPX2, and the third sub-pixel SPX3 may form one pixel unit PXU configured to emit light of various colors.

[0045] For example, each of the first subpixel SPX1, the second subpixel SPX2, and the third subpixel SPX3 may emit light of one color. For example, the first subpixel SPX1 may be a red pixel that emits red (e.g., the first color) light, the second subpixel SPX2 may be a green pixel that emits green (e.g., the second color) light, and the third subpixel SPX3 may be a blue pixel that emits blue (e.g., the third color) light. The colors, types, and / or quantities of the first subpixel SPX1, the second subpixel SPX2, and the third subpixel SPX3 constituting each pixel unit PXU are not limited to specific examples.

[0046] Figure 2 is a schematic cross-sectional view showing further details of a display device according to some embodiments. Figure 3 is a schematic cross-sectional view illustrating a light emitting element according to some embodiments.

[0047] Reference Figure 2 and Figure 3 , the display device DD may include a pixel circuit layer PCL and a light emitting element layer LEL.

[0048] The pixel circuit layer PCL may include a pixel circuit PXC (refer to Figure 4 The pixel circuit layer PCL may include a base layer BSL, a conductive layer for forming the pixel circuit PXC, and an insulating layer positioned between the conductive layers.

[0049] According to some embodiments, the pixel circuit PXC may include a thin film transistor, and may be electrically connected to the light emitting element LD to provide an electrical signal for causing the light emitting element LD to emit light.

[0050] The light emitting element layer LEL may be positioned on the pixel circuit layer PCL. According to some embodiments, the light emitting element layer LEL may include a light emitting element LD, a pixel defining layer PDL, and an encapsulation layer TFE.

[0051] The light emitting element LD may be positioned on the pixel circuit layer PCL. According to some embodiments, the light emitting element LD may include a first electrode ELT1, a light emitting portion EL, and a second electrode ELT2. According to some embodiments, the light emitting portion EL may be positioned in a region defined by the pixel defining layer PDL. One surface of the light emitting portion EL may be electrically connected to the first electrode ELT1, and the other surface of the light emitting portion EL may be electrically connected to the second electrode ELT2.

[0052] The first electrode ELT1 may be an anode electrode ANO for the light emitting portion EL, and the second electrode ELT2 may be a cathode electrode CAT for the light emitting portion EL. According to some embodiments, the first electrode ELT1 and the second electrode ELT2 may include a conductive material. For example, the conductive material may include one or more of the group consisting of gold (Au), silver (Ag), aluminum (Al), molybdenum (Mo), chromium (Cr), titanium (Ti), nickel (Ni), neodymium (Nd), copper (Cu), and platinum (Pt). Optionally, according to some embodiments, the conductive material may include silver nanowires (AgNW), indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), antimony zinc oxide (AZO), indium tin zinc oxide (ITZO), zinc oxide (ZnO), tin oxide (SnO 2 ), one or more of the group consisting of carbon nanotubes and graphene. However, the embodiments according to the present disclosure are not necessarily limited thereto.

[0053] Meanwhile, according to some embodiments, the second electrode ELT2 may be manufactured by depositing a material in the entire surface of the display area DA. Therefore, power supplied to the second electrode ELT2 may be provided to each of the sub-pixels SPX. At this time, according to some embodiments, the second electrode ELT2 includes a metal material having a relatively low resistance, so that the influence of the resistance of the second electrode ELT2 is relatively reduced. Therefore, according to some embodiments, the second electrode ELT2 may include silver (Ag) or magnesium (Mg) without including aluminum (Al).

[0054] The light emitting portion EL may have a multi-layer thin film structure including a light generating layer (e.g., a light emitting layer EML). The light emitting portion EL may include an organic material. The light emitting portion EL may include a hole injection layer HIL for injecting holes, a hole transport layer HTL having excellent hole transport properties and for increasing the chance of recombination of holes and electrons by suppressing the movement of electrons that are not recombined in the light emitting layer EML, a light emitting layer EML that emits light by recombining the injected electrons and holes, an electron transport layer ETL for stably transporting electrons to the light emitting layer EML, and an electron injection layer EIL for injecting electrons. The light emitting portion EL may emit light based on an electrical signal provided from an anode electrode ANO (e.g., a first electrode ELT1) and a cathode electrode CAT (e.g., a second electrode ELT2).

[0055] The pixel defining layer PDL may be positioned on the pixel circuit layer PCL to define a position where the light emitting portion EL is disposed. According to some embodiments, the pixel defining layer PDL may include an inorganic material. For example, the pixel defining layer PDL may include silicon oxide (SiO x ) and silicon nitride (SiN x According to some embodiments, the pixel defining layer PDL may include silicon oxide (SiOx ) layer and includes silicon nitride (SiN x ) is a multilayer structure in which layers are stacked. However, the embodiments of the present disclosure are not limited thereto. According to some embodiments, the pixel defining layer PDL may include an organic material. For example, the pixel defining layer PDL may include one or more of the group consisting of acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0056] The encapsulation layer TFE may be positioned on the light emitting element LD (eg, the second electrode ELT2). The encapsulation layer TFE may compensate for the step difference generated by the light emitting element LD and the pixel defining layer PDL. The encapsulation layer TFE may include a plurality of insulating layers covering the light emitting element LD. According to some embodiments, the encapsulation layer TFE may have a structure in which inorganic layers and organic layers are alternately stacked. According to some embodiments, the encapsulation layer TFE may be a thin film encapsulation layer.

[0057] According to some embodiments, the light emitting element layer LEL may further include an electrode blocking structure ES (see FIG. 1 ) positioned between the light emitting parts EL (eg, between the first electrodes ELT1) of each of the adjacent sub-pixels SPX different from each other. Figure 5 ). Further details of the electrode blocking structure ES are described later.

[0058] Figure 4 is a schematic block diagram showing an electrical connection structure for a light emitting element according to some embodiments. For example, Figure 4 An electrical connection structure including a pixel circuit PXC corresponding to each sub-pixel SPX may be shown.

[0059] Reference Figure 4 , the sub-pixel SPX may include a pixel circuit PXC configured to drive the light emitting element LD.

[0060] The pixel circuit PXC may include one or more circuit elements. For example, the pixel circuit PXC may include a transistor and a storage capacitor. For example, the pixel circuit PXC may include a driving transistor, a switching transistor, and a storage capacitor. However, the embodiments according to the present disclosure are not necessarily limited thereto, and the pixel circuit PXC may also include additional circuit elements.

[0061] The pixel circuit PXC may be electrically connected to the scan line SL and the data line DL. According to some embodiments, the scan line SL may supply a scan signal to the pixel circuit PXC and may be electrically connected to a gate electrode of a switching transistor of the pixel circuit PXC. The light emitting element LD may be configured to emit light corresponding to a data signal provided from the data line DL.

[0062] The pixel circuit PXC may be electrically connected to the first power line PL1 and the second power line PL2. For example, the first electrode ELT1 of the light emitting element LD may be electrically connected to the pixel circuit PXC and the first power line PL1, and the second electrode ELT2 of the light emitting element LD may be electrically connected to the second power line PL2. The first power line PL1 and the second power line PL2 may be positioned on the base layer BSL.

[0063] The power of the first power line PL1 and the power of the second power line PL2 may have different potentials. For example, the power of the first power line PL1 may be a high potential pixel power that receives power from the first voltage potential VDD, and the power of the second power line PL2 may be a low potential pixel power that receives power from the second voltage potential VSS. The potential difference between the power of the first power line PL1 and the power of the second power line PL2 may be set to a threshold voltage of the light emitting element LD or higher.

[0064] The first power line PL1 may be electrically connected to the pixel circuit PXC (eg, the driving transistor). The second power line PL2 may be electrically connected to the cathode electrode (eg, the second electrode ELT2 ) of the light emitting element LD.

[0065] According to some embodiments, the second power line PL2 may be electrically connected to the second electrode ELT2. For example, the second electrode ELT2 may receive power through the second power line PL2 positioned in the non-display area NDA. For example, the second electrode ELT2 in the display area DA may be adjacent to the second power line PL2, and an area where the display area DA and the non-display area NDA are adjacent to each other is placed between the second electrode ELT2 and the second power line PL2. The second electrode ELT2 adjacent to the outside of the display area DA may be electrically connected to the second power line PL2 in the non-display area NDA. As described above, since the second electrodes ELT2 in the display area DA are electrically connected to each other, the power provided by the second power line PL2 may be applied to the entire display area DA.

[0066] Each light emitting element LD may be connected between the first power line PL1 and the second power line PL2 in the forward direction to form each effective light source. These effective light sources may be gathered to construct the light emitting element LD of the sub-pixel SPX.

[0067] The light emitting element LD may emit light having a brightness corresponding to the driving current supplied by the pixel circuit PXC. During each frame period, the pixel circuit PXC may supply a driving current corresponding to the data signal to the light emitting element LD. The light emitting element LD may emit light having a brightness corresponding to the current flowing therethrough.

[0068] Reference Figures 5 to 10A display device DD including an electrode blocking structure ES according to some embodiments is described. For ease of description, contents that may overlap with the above contents are briefly described or not repeated.

[0069] Figure 5 as well as Figures 7 to 10 is a schematic cross-sectional view illustrating a display device according to some embodiments. Figure 5 as well as Figures 7 to 10 A cross-sectional structure including an electrode blocking structure ES according to some embodiments is shown. Figure 6 yes Figure 1 Schematic enlargement of the EA1 region. Figure 6 A connection structure on a plane between the electrode blocking structure ES and the pulse input line PIL is schematically shown.

[0070] First, refer to Figure 5 and Figure 6 , a display device DD including an electrode blocking structure ES according to some embodiments is described. For the convenience of description, contents that may overlap with the above contents are briefly described or not repeated.

[0071] Reference Figure 5 and Figure 6 , the light emitting element layer LEL may include an electrode blocking structure ES positioned between adjacent sub-pixels SPX (e.g., adjacent sub-pixel regions SPXA). For ease of description, the disclosure is based on a description of an embodiment in which the adjacent sub-pixels SPX are the first sub-pixel SPX1 and the second sub-pixel SPX2. The technical features described below may also be defined in the region between the first sub-pixel SPX1 and the third sub-pixel SPX3, and may also be defined in the region between the second sub-pixel SPX2 and the third sub-pixel SPX3.

[0072] According to some embodiments, the light emitting portion EL may include a first light emitting portion EL1 included in the first subpixel SPX1 (eg, positioned in the first subpixel region SPXA1 ) and a second light emitting portion EL2 included in the second subpixel SPX2 (eg, positioned in the second subpixel region SPXA2 ).

[0073] According to some embodiments, the first electrode ELT1 may include a 1_1th electrode ELT1_1 included in the first subpixel SPX1 (eg, positioned in the first subpixel area SPXA1) and a 1_2th electrode ELT1_2 included in the second subpixel SPX2 (eg, positioned in the second subpixel area SPXA2).

[0074] According to some embodiments, the second electrode ELT2 may be arranged across the first sub-pixel region SPXA1 and the second sub-pixel region SPXA2. For example, a portion of the second electrode ELT2 may be electrically connected to the first light emitting portion EL1, and another portion of the second electrode ELT2 may be electrically connected to the second light emitting portion EL2.

[0075] According to some embodiments, the second electrode ELT2 may be deposited after the light emitting portion EL is patterned, and thus at least a portion of the second electrode ELT2 may be positioned on the pixel defining layer PDL in a region in the gap G. As shown in FIG.

[0076] According to some embodiments, the pixel defining layer PDL may be positioned between the first sub-pixel SPX1 and the second sub-pixel SPX2 For example, the pixel defining layer PDL may be positioned between the first sub-pixel area SPXA1 and the second sub-pixel area SPXA2.

[0077] The electrode blocking structure ES may include a blocking layer BAR and an electrode JHE. The electrode blocking structure ES may be positioned between the first sub-pixel SPX1 and the second sub-pixel SPX2. The electrode blocking structure ES may be positioned between the first sub-pixel area SPXA1 and the second sub-pixel area SPXA2.

[0078] The electrode blocking structure ES may be positioned on the pixel defining layer PDL. The electrode blocking structure ES may overlap the pixel defining layer PDL in a plan view.

[0079] The electrode blocking structure ES may be positioned between the 1_1st electrode ELT1_1 and the 1_2nd electrode ELT1_2 in a plan view. The electrode blocking structure ES may not overlap with the 1_1st electrode ELT1_1 and the 1_2nd electrode ELT1_2 in a plan view. For example, the electrode blocking structure ES may be spaced apart from the 1_1st electrode ELT1_1 in a direction along which the 1_1st electrode ELT1_1 and the 1_2nd electrode ELT1_2 are spaced apart from each other in a plan view. The electrode blocking structure ES may be spaced apart from the 1_2nd electrode ELT1_2 in a direction along which the 1_1st electrode ELT1_1 and the 1_2nd electrode ELT1_2 are spaced apart from each other in a plan view.

[0080] The electrode blocking structure ES may be positioned between the first light emitting portion EL1 and the second light emitting portion EL2 in a plan view.

[0081] The electrode blocking structure ES may not overlap with the first light emitting portion EL1 and the second light emitting portion EL2 in a plan view. For example, the electrode blocking structure ES may be spaced apart from the first light emitting portion EL1 in a direction along which the first light emitting portion EL1 and the second light emitting portion EL2 are spaced apart from each other in a plan view. The electrode blocking structure ES may be spaced apart from the second light emitting portion EL2 in a direction along which the first light emitting portion EL1 and the second light emitting portion EL2 are spaced apart from each other in a plan view. Since the first light emitting portion EL1 and the second light emitting portion EL2 are spaced apart from each other, the risk of leakage current between adjacent sub-pixels SPX may be reduced.

[0082] According to some embodiments, the electrode barrier structure ES may be spaced apart from the light emitting portion EL, and a gap G may be disposed between the electrode barrier structure ES and the light emitting portion EL. The gap G may include a first gap G1 and a second gap G2. For example, the first gap G1 may separate the electrode barrier structure ES from the first light emitting portion EL1. The second gap G2 may separate the electrode barrier structure ES from the second light emitting portion EL2.

[0083] The gap G may have a structure formed by heat energy emitted from the electrode blocking structure ES by removing an organic material deposited in a region corresponding to the gap G. According to some embodiments, the pixel defining layer PDL and the second electrode ELT2 may contact each other in the gap G.

[0084] For example, the electrode blocking structure ES (e.g., the electrode JHE) may be electrically connected to the pulse input line PIL. The electrode blocking structure ES may be provided with (e.g., applied with) a pulse input from the pulse input line PIL. When the pulse input is applied to the electrode JHE, energy based on the pulse input may be emitted from the electrode JHE. At this time, the organic material layer positioned in the region adjacent to the electrode JHE may be removed. For example, in the deposition of the base light emitting portion BEL (refer to Fig.11 ) Thereafter, a portion of the base light emitting portion BEL adjacent to the electrode JHE can be removed by heat emitted from the electrode JHE, and thus a first light emitting portion EL1 and a second light emitting portion EL2 can be provided.

[0085] According to some embodiments, the pulse input line PIL may be positioned in the non-display area NDA. The pulse input line PIL may be electrically connected to the electrode blocking structure ES in an area where the non-display area NDA and the display area DA are adjacent to each other. The electrode blocking structure ES may be positioned on the pixel defining layer PDL and may be arranged (e.g., positioned) to extend throughout the display area DA. Therefore, the pulse input line PIL may be provided to the electrode JHE distributed throughout the display area DA. However, embodiments according to the present disclosure are not necessarily limited thereto, and at least a portion of the pulse input line PIL may be positioned in the display area DA.

[0086] The blocking layer BAR may be positioned on the pixel defining layer PDL. The blocking layer BAR may be positioned between the electrode JHE and the pixel defining layer PDL. The blocking layer BAR may overlap the electrode JHE and the pixel defining layer PDL in a plan view.

[0087] The blocking layer BAR may not overlap the light emitting part EL in a plan view. The blocking layer BAR may be spaced apart from the first and second light emitting parts EL1 and EL2 with first and second gaps G1 and G2 interposed therebetween, respectively.

[0088] According to some embodiments, a side surface of the blocking layer BAR may contact the second electrode ELT2. An upper surface of the blocking layer BAR may contact the electrode JHE. A lower surface of the blocking layer BAR may contact the pixel defining layer PDL.

[0089] The barrier layer BAR may be a protective layer (e.g., a barrier structure) for preventing or reducing damage to another structure positioned directly below the electrode JHE. The barrier layer BAR may separate the electrode JHE from the pixel defining layer PDL. Therefore, the risk that the material properties of the pixel defining layer PDL may be degraded or the life of the light emitting element LD may be reduced, which may occur when the electrode JHE for heat application contacts the pixel defining layer PDL, can be reduced.

[0090] The electrode JHE may be positioned on the barrier layer BAR. For example, the electrode JHE may overlap the barrier layer BAR in a plan view. According to some embodiments, the electrode JHE may contact the second electrode ELT2. According to some embodiments, the electrode JHE may be electrically connected to the second electrode ELT2.

[0091] According to some embodiments, the side surfaces of the electrode JHE and the barrier layer BAR may form uneven side surfaces. For example, the side surfaces of each of the electrode JHE and the barrier layer BAR may form discontinuous surfaces at positions adjacent to each other.

[0092] According to some embodiments, the electrode JHE may have a thickness thicker than that of the barrier layer BAR. In this case, the heat application range applied by the electrode JHE in the lateral direction can be expanded, so the light emitting portion EL can be formed more finely. However, the embodiments according to the present disclosure are not limited thereto. According to some embodiments, the electrode JHE may have a thickness equal to or less than that of the barrier layer BAR.

[0093] As described above, the electrode JHE may have a structure that removes the organic material layer using thermal energy. For example, the electrode JHE may provide a heat source generated by Joule heat H (refer to Fig.12According to some embodiments, the Joule heat H may generate an ambient temperature of about 400° C. or higher.

[0094] The electrode JHE and the barrier layer BAR may have different thermal conductivities. For example, the electrode JHE may have a first thermal conductivity, and the barrier layer BAR may have a second thermal conductivity that is smaller than the first thermal conductivity. According to some embodiments, the ratio of the first thermal conductivity to the second thermal conductivity may be 3.4 to 3600. When the first thermal conductivity and the second thermal conductivity satisfy the above ratio, the Joule heat H may be limited based on the formation structure / position of the electrode JHE, and the risk of the Joule heat H diffusing in a random direction may be reduced.

[0095] Therefore, the electrode blocking structure ES may form a conductive structure having relatively high thermal conductivity and receiving pulse input at an upper side, and may form a structure configured to block at least a portion of heat transfer according to pulse input according to relatively low thermal conductivity at a lower side.

[0096] For example, the blocking layer BAR may be positioned below the electrode JHE, so the Joule heat H may diffuse along the region where the electrode JHE is formed, not along the lower portion. For example, the Joule heat H may diffuse from a region defined at the relatively upper side, so the organic material layer may be removed.

[0097] In this case, it is possible to prevent the gap G from being formed too large. When the size of the gap G is relatively reduced, a separation area where light is not emitted between the sub-pixel areas SPXA can be reduced, and thus display quality can be relatively improved.

[0098] That is, after forming the base light emitting portion BEL, a portion of the base light emitting portion BEL may need to be removed without being excessively removed, thereby forming the light emitting portion EL for each of the sub-pixels SPX. According to some embodiments, since the electrode JHE dissipates heat from the relatively upper side, the gap G can be reduced, and thus a display device DD with relatively improved display quality can be provided.

[0099] In addition, because the blocking layer BAR is positioned below the electrode JHE, the risk of damage to other structures due to heat diffusion to the lower portion can be prevented or reduced. For example, when the pixel defining layer PDL experimentally includes an organic material or a material that is relatively easily affected by heat among inorganic materials, the corresponding layer may be damaged by the Joule heat H.

[0100] However, according to some embodiments, by specifically forming a blocking layer BAR having a thermal conductivity lower than that of the electrode JHE, even if the pixel defining layer PDL includes an organic material or a material that is relatively easily affected by heat among inorganic materials, the risk of damage to the corresponding layer due to Joule heat H can be reduced.

[0101] According to some embodiments, the electrode JHE may include one of materials having a thermal conductivity greater than that of a material included in the barrier layer BAR. For example, the electrode JHE may include one or more of the group consisting of molybdenum (Mo) (thermal conductivity: about 138 W / m °C), copper (Cu) (thermal conductivity: about 386 W / m °C), aluminum (Al) (thermal conductivity: about 204 W / m °C), tungsten (W) (thermal conductivity: about 174 W / m °C), gold (Au) (thermal conductivity: about 316 W / m °C), and silver (Ag) (thermal conductivity: about 427 W / m °C).

[0102] According to some embodiments, the barrier layer BAR may include one of materials having a thermal conductivity smaller than that of a material included in the electrode JHE. For example, the barrier layer BAR may include titanium (Ti) (thermal conductivity: about 22 W / m°C), lead (Pb) (thermal conductivity: about 36 W / m°C), aluminum oxide (AlO x ) (thermal conductivity: about 39.5W / m ℃), polyimide (thermal conductivity: about 0.12W / m ℃), silicon oxide (SiO x ) (thermal conductivity: about 1.1W / m ℃) and silicon nitride (SiN x ) (thermal conductivity: about 20 W / m ℃) group or more.

[0103] Next, refer to Figure 7 A display device DD including an electrode blocking structure ES according to some embodiments is described. Compared with one or more embodiments described above, the differences are mainly described. For ease of description, the contents that may overlap with the above contents are briefly described or not repeated.

[0104] The display device DD according to some embodiments is different from the display device DD according to the above-described embodiments in that the electrode blocking structure ES forms an intermediate angle ANG with respect to the upper surface of the pixel defining layer PDL.

[0105] For example, the barrier layer BAR may form an interval angle ANG with respect to the upper surface of the pixel defining layer PDL. The electrode JHE may form an interval angle ANG with respect to the upper surface of the pixel defining layer PDL.

[0106] According to some embodiments, a side surface of the electrode blocking structure ES (eg, a surface facing the light emitting portion EL) may form an intermediate angle ANG with an upper surface of the pixel defining layer PDL.

[0107] According to some embodiments, the intermediate angle ANG may be 75 degrees or less. According to some embodiments, the intermediate angle ANG may be in the range of 15 degrees to 60 degrees. According to some embodiments, the intermediate angle ANG may be in the range of 45 degrees to 60 degrees. However, embodiments according to the present disclosure are not limited thereto.

[0108] Next, refer to Figure 8 A display device DD including an electrode blocking structure ES according to some embodiments is described. Compared with one or more embodiments described above, the differences are mainly described. For ease of description, the contents that may overlap with the above contents are briefly described or not repeated.

[0109] The display device DD according to some embodiments is different from the display device DD according to the above-described embodiments in that the electrode JHE has a width narrower than that of the blocking layer BAR.

[0110] According to some embodiments, in a plan view, the electrode JHE may be entirely included in the blocking layer BAR. For example, the blocking layer BAR may include a blocking protrusion BTA that does not overlap the electrode JHE in a plan view. The blocking protrusion BTA may include a first blocking protrusion BTA1 and a second blocking protrusion BTA2.

[0111] The first barrier protrusion BTA1 may protrude toward the first light emitting portion EL1. The first barrier protrusion BTA1 may be directly adjacent to the first gap G1. The second barrier protrusion BTA2 may protrude toward the second light emitting portion EL2. The second barrier protrusion BTA2 may be directly adjacent to the second gap G2.

[0112] According to some embodiments, since the blocking protrusion BTA is formed, the risk of the Joule heat H formed by the electrode JHE being applied to the lower portion may be further prevented or reduced.

[0113] Next, refer to Fig. 9 A display device DD including an electrode blocking structure ES according to some embodiments is described. Compared with one or more embodiments described above, the differences are mainly described. For ease of description, the contents that may overlap with the above contents are briefly described or not repeated.

[0114] The display device DD according to some embodiments is different from the display device DD according to the above-described embodiments in that a portion of the electrode JHE is positioned in the groove GR formed by the barrier layer BAR.

[0115] According to some embodiments, the blocking layer BAR may include a groove GR at least partially inserted therein. The electrode JHE may be positioned in the groove GR, and thus the blocking layer BAR may cover the side surface of the electrode JHE. For example, a portion of the blocking layer BAR may cover the lower portion of the side surface of the electrode JHE, and may expose the upper portion of the side surface of the electrode JHE. According to some embodiments, the blocking layer BAR may entirely cover the lower surface of the electrode JHE.

[0116] According to some embodiments, since the barrier layer BAR covers the lower surface of the electrode JHE and at least a portion of the lower portion of the side surface of the electrode JHE, the risk of Joule heat H formed by the electrode JHE being applied to the lower portion may be further prevented or reduced.

[0117] Next, refer to Fig.10 A display device DD including an electrode blocking structure ES according to some embodiments is described. Compared with one or more embodiments described above, the differences are mainly described. For ease of description, the contents that may overlap with the above contents are briefly described or not repeated.

[0118] The display device DD according to some embodiments is different from the display device DD according to the above-described embodiments in that the electrode JHE has a width wider than that of the blocking layer BAR.

[0119] According to some embodiments, in a plan view, the barrier layer BAR may be entirely included in the electrode JHE. For example, the electrode JHE may include an electrode protrusion ETA that does not overlap the barrier layer BAR in a plan view. The electrode protrusion ETA may include a first electrode protrusion ETA1 and a second electrode protrusion ETA2.

[0120] The first electrode protrusion ETA1 may protrude toward the first light emitting portion EL1. The first electrode protrusion ETA1 may be directly adjacent to the first gap G1. The second electrode protrusion ETA2 may protrude toward the second light emitting portion EL2. The second electrode protrusion ETA2 may be directly adjacent to the second gap G2.

[0121] According to some embodiments, since the electrode protrusion ETA is formed, the base light emitting portion BEL can be removed more finely, and since the diffusion reliability of the Joule heat H is ensured, the light emitting portion EL can be patterned more narrowly. In addition, since the size of the pixel defining layer PDL is reduced, the size of the gap G can be reduced, and thus a display device DD with relatively high resolution can be manufactured.

[0122] Reference Figures 11 to 13 A method of manufacturing a display device DD including an electrode blocking structure ES according to some embodiments is described. For ease of description, contents that may overlap with the above contents are briefly described or not repeated.

[0123] Figures 11 to 13 is a schematic cross-sectional view showing each process operation of a method for manufacturing a display device according to some embodiments. For ease of description, Figures 11 to 13 Based on the reference in the above embodiment Figure 5 The cross-sectional structure described is shown in the embodiment, and the structural features described may also be applicable to other embodiments.

[0124] Reference Fig.11, a method of manufacturing a display device DD according to some embodiments may include manufacturing a pixel circuit layer PCL including a base layer BSL and patterning a first electrode ELT1, a pixel defining layer PDL, a blocking layer BAR, an electrode JHE, and a base light emitting portion BEL on the pixel circuit layer PCL.

[0125] A conductive layer or an insulating layer may be formed on the base layer BSL based on a typical process for manufacturing a semiconductor device. For example, a conductive layer or an insulating layer may be formed on the base layer BSL by a photolithography process, and a conductive layer or an insulating layer may be deposited on the base layer BSL by various methods (sputtering, chemical vapor deposition, etc.). The embodiments according to the present disclosure are not necessarily limited to specific examples.

[0126] In this operation, the conductive layer for forming the pixel circuit PXC on the base layer BSL may be patterned.

[0127] In this operation, the 1_1st electrode ELT1_1 and the 1_2nd electrode ELT1_2 spaced apart from each other may be patterned to form the anode electrode ANO of each of the sub-pixels SPX different from each other on the pixel circuit layer PCL.

[0128] In this operation, the pixel defining layer PDL may be patterned to cover an end portion of the 1_1th electrode ELT1_1 and an end portion of the 1_2th electrode ELT1_2 .

[0129] According to some embodiments, the electrode blocking structure ES may be patterned before forming (e.g., depositing) the base light emitting portion BEL. For example, the blocking layer BAR may be patterned directly on the pixel defining layer PDL, and the electrode JHE may be patterned directly on the blocking layer BAR. Therefore, the lower surface of the blocking layer BAR may contact the pixel defining layer PDL, and the upper surface of the blocking layer BAR may contact the electrode JHE.

[0130] According to some embodiments, in order to pattern the electrode blocking structure ES, a barrier material layer for forming the barrier layer BAR may be deposited, and an electrode material layer for forming the electrode JHE may be deposited. According to some embodiments, the barrier material layer and the electrode material layer may be etched simultaneously, or may be etched in separate processes.

[0131] The base light emitting portion BEL may be a layer for forming each of the light emitting portions EL when a subsequent process is performed by including an organic material. The base light emitting portion BEL may be deposited on the entire surface to cover the 1_1 electrode ELT1_1, the 1_2 electrode ELT1_2, the pixel defining layer PDL, the side surface of the barrier layer BAR, and the electrode JHE. Therefore, when the present operation is performed, the organic material layer on the 1_1 electrode ELT1_1 and the organic material layer on the 1_2 electrode ELT1_2 may maintain a state in which the organic material layer on the 1_1 electrode ELT1_1 and the organic material layer on the 1_2 electrode ELT1_2 are connected to each other.

[0132] According to some embodiments, an operation of electrically connecting the electrode JHE and the pulse input line PIL to each other may be performed.

[0133] Reference Fig.12 , the method of manufacturing the display device DD according to some embodiments may include removing at least a portion of the base light emitting portion BEL.

[0134] In this operation, a pulse input may be applied to the electrode JHE through the pulse input line PIL, and Joule heat H may be emitted from the electrode JHE. According to some embodiments, the Joule heat H may include first Joule heat H1 radiated in a side surface direction of the electrode JHE and second Joule heat H2 radiated in an upper side direction of the electrode JHE.

[0135] According to some embodiments, when the first Joule heat H1 is emitted, at least a portion of the base light emitting portion BEL formed in the side surface direction of the electrode JHE may be removed. Therefore, a first light emitting portion EL1 may be provided, and a first gap G1 directly adjacent to the first light emitting portion EL1 may be formed. A second light emitting portion EL2 may be provided, and a second gap G2 directly adjacent to the second light emitting portion EL2 may be formed.

[0136] According to some embodiments, a barrier layer BAR having relatively low thermal conductivity may be formed under the electrode JHE, so the first Joule heat H1 may be diffused preferentially in the side surface direction. That is, the risk of the first Joule heat H1 diffusing to the lower portion of the electrode JHE may be reduced, thereby reducing the risk of a structure positioned at the lower portion (such as a pixel defining layer PDL) being damaged.

[0137] According to some embodiments, when the second Joule heat H2 is emitted, at least a portion of the base light emitting portion BEL formed on the upper side of the electrode JHE may be removed. Therefore, since the base light emitting portion BEL positioned above the electrode JHE is removed, the first light emitting portion EL1 and the second light emitting portion EL2 may be finely separated. At the same time, a barrier layer BAR having a relatively low thermal conductivity may be formed under the electrode JHE, so that the Joule heat H may be relatively mainly diffused in the upper direction. Therefore, while the gap G is relatively reduced, the first light emitting portion EL1 and the second light emitting portion EL2 may be separated with relatively high reliability.

[0138] In this operation, since the gap G is formed, a portion of the pixel defining layer PDL may be exposed.

[0139] Reference Fig.13 , the method of manufacturing the display device DD according to some embodiments may include forming the second electrode ELT2.

[0140] According to some embodiments, the second electrode ELT2 may be deposited on the entire surface. Therefore, a portion of the second electrode ELT2 may be electrically connected to the first light emitting portion EL1, another portion of the second electrode ELT2 may be electrically connected to the second light emitting portion EL2, and another portion of the second electrode ELT2 may be connected to the electrode JHE.

[0141] In the present operation, the pixel defining layer PDL and the second electrode ELT2 may contact each other through a portion of the pixel defining layer PDL exposed by the gap G. As shown in FIG.

[0142] Thereafter, according to some embodiments, an encapsulation layer TFE may be positioned on the second electrode ELT2 , and a display device DD according to some embodiments may be provided.

[0143] As described above, although the disclosure has been described with reference to the above-described embodiments, those skilled in the art or those having common knowledge in the art will understand that various modifications and changes may be made to the disclosure without departing from the spirit and technical field of the disclosure described in the claims to be described and their equivalents.

[0144] Therefore, the disclosed technical scope should not be limited to the contents described in the specific embodiments of the specification, but should be defined by the appended claims and their equivalents.

Claims

1. A display device, comprising: a light emitting element on the base layer and including a first electrode, a second electrode and a light emitting portion electrically connected between the first electrode and the second electrode; A pixel defining layer, on the substrate layer; a blocking layer, on the pixel defining layer; as well as an electrode, on the barrier layer, Wherein, the first electrode includes a 1_1 electrode and a 1_2 electrode, The pixel defining layer is between the 1_1st electrode and the 1_2nd electrode, The light emitting portion includes a first light emitting portion electrically connected to the 1_1 electrode and a second light emitting portion electrically connected to the 1_2 electrode, and In a plan view, the electrode and the barrier layer are between the first light emitting portion and the second light emitting portion.

2. The display device according to claim 1, wherein: The electrode, the barrier layer, and the pixel defining layer overlap one another in a plan view.

3. The display device according to claim 2, wherein: The lower surface of the barrier layer contacts the pixel defining layer, and An upper surface of the barrier layer contacts the electrode.

4. The display device according to claim 1, wherein: The electrode has a first thermal conductivity, and The barrier layer has a second thermal conductivity that is less than the first thermal conductivity.

5. The display device according to claim 4, wherein: The first thermal conductivity and the second thermal conductivity have a ratio in a range of 3.4 to 3600.

6. The display device according to claim 4, wherein: The electrode comprises at least one of molybdenum, copper, aluminum, tungsten, gold and silver, and The barrier layer includes at least one of titanium, lead, aluminum oxide, polyimide, silicon oxide, and silicon nitride.

7. The display device according to claim 1, wherein: In a plan view, the electrode and the barrier layer are between the 1_1st electrode and the 1_2nd electrode.

8. The display device according to claim 1, wherein: The electrode and the blocking layer are spaced apart from the first and second light emitting portions in a direction in which the first and second light emitting portions are spaced apart from each other.

9. The display device according to claim 8, wherein: A gap is formed between the blocking layer and the light emitting portion, and In the gap, the second electrode and the pixel defining layer contact each other.

10. The display device according to claim 1, wherein: The side surfaces of each of the electrode and the barrier layer form side surfaces that are discontinuous with each other at positions adjacent to each other.

11. The display device according to claim 1, comprising a display area and a non-display area surrounding at least a portion of the display area; The display device further includes a pulse input line electrically connected to the electrode, in, The pulse input line is in the non-display area.

12. The display device according to claim 1, wherein: A side surface of each of the electrode and the barrier layer forms an intermediate angle with an upper surface of the pixel defining layer, and The intermediate angle is in the range of 15 degrees to 60 degrees.

13. The display device according to claim 1, wherein: The barrier layer includes a barrier protrusion that does not overlap the electrode in a plan view.

14. The display device according to claim 1, wherein: The barrier layer includes a recess in which at least a portion of the electrode is positioned, and The barrier layer covers at least a portion of a side surface of the electrode.

15. The display device according to claim 1, wherein: The electrode includes an electrode protrusion that does not overlap the barrier layer in a plan view.

16. The display device according to claim 1, wherein: The second electrode is on a side surface of the electrode, the first light emitting portion, and the second light emitting portion.

17. A display device, comprising: a first sub-pixel and a second sub-pixel, wherein the first sub-pixel forms a first sub-pixel region, and the second sub-pixel forms a second sub-pixel region; as well as an electrode blocking structure, between the first sub-pixel region and the second sub-pixel region, The electrode blocking structure includes a blocking layer and an electrode, the blocking layer has a first thermal conductivity, and the electrode contacts an upper surface of the blocking layer and has a second thermal conductivity greater than the first thermal conductivity.

18. A method for manufacturing a display device, the method comprising the following steps: patterning a first electrode, wherein the first electrode comprises a 1_1st electrode and a 1_2nd electrode on a base layer; patterning a pixel defining layer, wherein the pixel defining layer is between the 1_1st electrode and the 1_2nd electrode; forming an electrode blocking structure on the pixel defining layer, wherein the electrode blocking structure comprises a blocking layer and an electrode; forming a substrate light emitting portion to cover the electrode blocking structure and the first electrode; as well as removing at least a portion of the substrate light emitting portion by providing a pulse input to the electrode blocking structure, The electrode has a thermal conductivity greater than that of the barrier layer.

19. The method according to claim 18, wherein: The step of removing at least a portion of the substrate light emitting portion comprises: dissipating Joule heat from the electrode; and A first light emitting portion and a second light emitting portion spaced apart from each other are provided.

20. The method according to claim 18, wherein: The step of removing at least a portion of the base light emitting portion includes exposing a portion of the pixel defining layer, and The method further includes forming a second electrode; and The step of forming the second electrode includes contacting the pixel defining layer and the second electrode.

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