Film manufacturing system and film manufacturing method

Abstract

A system (1) for manufacturing a film (F) according to the present invention is provided with: a coating device (2) for forming a coating film on one surface (S1) of a substrate (S) by applying a coating liquid to the one surface (S1) of the substrate (S); and a drying device (3) for forming a coating film (C) on the one surface (S1) of the substrate (S) by drying the coating film. The drying device (3) is provided with a first drying part (31) and a second drying part (32); the first drying part (31) is used for supplying air to the coating film from one side of the base material (S); the second drying unit (32) is disposed on the downstream side of the first drying unit (31) in the conveyance direction of the substrate (S), and heats the coating film from one side of the substrate (S), while heating the substrate (S) from the other side of the substrate (S), said second drying unit (32) being stronger than the coating film.

Description

Technical Field

[0001] The present invention relates to a film manufacturing system and a film manufacturing method. Background Art

[0002] Conventionally, there is known a method for producing a film in which a coating liquid is applied to a substrate and air is blown toward the coating film to dry the coating film (for example, see Patent Document 1).

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Publication No. 2021-34139 Summary of the invention

[0006] Problems to be solved by the invention

[0007] The present invention provides a film production system and a film production method capable of improving the adhesion of a film to a substrate.

[0008] Solutions to the problem

[0009] The present invention [1] includes a film manufacturing system, which is a film manufacturing system for manufacturing a substrate and a coating arranged on one side of the substrate, wherein the manufacturing system comprises: a coating device for applying a coating liquid to the above-mentioned one side of the substrate to form a coating film on the above-mentioned one side of the substrate, and a drying device for drying the above-mentioned coating film to form the above-mentioned coating film on the above-mentioned one side of the substrate, the above-mentioned drying device having a first drying section and a second drying section, the first drying section blowing air toward the above-mentioned coating film from at least one side of the above-mentioned substrate, the second drying section being arranged on the downstream side of the above-mentioned first drying section in the conveying direction of the above-mentioned substrate, and heating the above-mentioned coating film from the above-mentioned one side of the above-mentioned substrate while heating the above-mentioned substrate from the other side of the above-mentioned substrate more strongly than the above-mentioned coating film.

[0010] According to such a configuration, in the first drying section, air is blown toward the coating film from the side of the substrate, thereby drying the surface of the coating film without drying the inside of the coating film.

[0011] Next, in the second drying section, the substrate is heated more strongly than the coating film.

[0012] Thus, the coating film is dried while reacting with the substrate, thereby obtaining a coating film that has reacted with the substrate.

[0013] As a result, the adhesion of the film to the substrate can be improved.

[0014] The present invention [2] includes a film manufacturing system of the above-mentioned [1], wherein the above-mentioned first drying section has a support roller arranged on the above-mentioned other side of the above-mentioned substrate and supporting the above-mentioned substrate, and the above-mentioned first drying section sends heated air from the above-mentioned one side of the above-mentioned substrate toward the above-mentioned coating film at a first wind speed, and sends heated air from the above-mentioned other side of the above-mentioned substrate toward the above-mentioned substrate at a second wind speed lower than the above-mentioned first wind speed.

[0015] According to such a configuration, in the first drying section, the wind speed of the heated air from the other side of the substrate (the second wind speed) is lower than the wind speed of the heated air from the one side of the substrate (the first wind speed).

[0016] Therefore, the temperature of the substrate can be prevented from being excessively increased by the heated air from the other side of the substrate, thereby preventing the coating film from drying inside, and the surface of the coating film can be dried by the heated air from one side of the substrate.

[0017] The present invention [3] includes a film manufacturing system of the above-mentioned [2], wherein the above-mentioned second drying section supplies heated air from the above-mentioned one side of the above-mentioned substrate toward the above-mentioned coating film at a third wind speed, and supplies heated air from the above-mentioned other side of the above-mentioned substrate toward the above-mentioned substrate at a fourth wind speed faster than the above-mentioned third wind speed.

[0018] According to such a configuration, in the second drying section, the wind speed (fourth wind speed) of the heated air from the other side of the substrate is faster than the wind speed (third wind speed) of the heated air from the one side of the substrate.

[0019] Therefore, the temperature of the substrate can be increased by the heated air from the other side of the substrate, so that the coating film can react with the substrate and the coating film can be dried to the inside.

[0020] Thereby, a film that has reacted with the substrate can be obtained, and the adhesion of the film to the substrate can be improved.

[0021] The present invention [4] includes the film production system of [3] above, wherein the first wind speed is 15 m / sec or less, and the fourth wind speed is 5 m / sec or more.

[0022] The present invention [5] includes a film manufacturing system of the above-mentioned [4], wherein the total of the above-mentioned first wind speed and the above-mentioned second wind speed is less than 15 m / s, the ratio of the above-mentioned first wind speed to the above-mentioned second wind speed is greater than 1.5, the total of the above-mentioned third wind speed and the above-mentioned fourth wind speed is less than 15 m / s, and the ratio of the above-mentioned fourth wind speed to the above-mentioned third wind speed is greater than 1.4.

[0023] The present invention [6] includes a film manufacturing system of the above-mentioned [1], wherein the above-mentioned first drying section has a first area and a second area, the above-mentioned second area is arranged on the downstream side of the above-mentioned first area in the conveying direction of the above-mentioned substrate, and the above-mentioned second drying section has a third area and a fourth area, the above-mentioned third area is arranged on the downstream side of the above-mentioned second area in the conveying direction of the above-mentioned substrate, and the above-mentioned fourth area is arranged on the downstream side of the above-mentioned third area in the conveying direction of the above-mentioned substrate, the temperature of the heated air in the above-mentioned second area is higher than the temperature of the heated air in the above-mentioned first area, and the temperature of the heated air in the above-mentioned fourth area is lower than the temperature of the heated air in the above-mentioned third area.

[0024] The present invention [7] includes a method for manufacturing a film, which is a method for manufacturing the above-mentioned film using the film manufacturing system of any one of the above-mentioned [1] to [6], and the method includes: a coating step of forming a coating film on the above-mentioned substrate using the above-mentioned coating device; and a drying step of drying the above-mentioned coating film using the above-mentioned drying device.

[0025] Effects of the Invention

[0026] According to the film manufacturing system and the film manufacturing method of the present invention, it is possible to improve the adhesion of the film to the substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 is a cross-sectional view of the membrane.

[0028] Figure 2 This is a schematic diagram of the membrane manufacturing system.

[0029] Figure 3 Yes Figure 2 An explanatory diagram for explaining the drying device shown.

[0030] Explanation of symbols

[0031] 1. Film manufacturing system

[0032] 2Coating device

[0033] 3 Drying device

[0034] 311st Drying Section

[0035] 31A Area 1

[0036] 31B Area 2

[0037] 32 2nd Drying Section

[0038] 32A Area 3

[0039] 32B Area 4

[0040] 311 support roller

[0041] S-Base

[0042] C membrane DETAILED DESCRIPTION

[0043] 1. Membrane

[0044] First, the film F will be described. Figure 1 As shown, the film F includes a substrate S and a coating C.

[0045] The substrate S has a sheet shape. The substrate S has one surface S1 and the other surface S2 in the thickness direction of the substrate S. The substrate S is formed of a thermoplastic resin.

[0046] Examples of the thermoplastic resin include acrylic resins, polyolefin resins, cyclic polyolefin resins, polyester resins, polycarbonate resins, polystyrene resins, polyamide resins, polyimide resins, and acetate resins. Examples of the acetate resin include cellulose diacetate and cellulose triacetate.

[0047] The substrate S may contain additives. Examples of the additives include antioxidants, stabilizers, reinforcing materials, ultraviolet absorbers, flame retardants, antistatic agents, colorants, fillers, plasticizers, lubricants, and fillers.

[0048] The film C is disposed on one surface S1 of the substrate S. The film C covers one surface S1 of the substrate S. Examples of the function of the film C include anti-glare property, anti-reflection property, and scratch resistance.

[0049] The film C contains a resin. Examples of the resin include thermosetting resins and thermoplastic resins. Examples of the thermosetting resin include urethane resins and epoxy resins. Examples of the thermoplastic resin include acrylic resins, urethane acrylic resins, and polyester resins.

[0050] The film C may contain particles. Examples of particles include oxides, carbonates, silicates, silicate minerals, and phosphates. Examples of oxides include silicon oxide (silicon dioxide), titanium oxide (titania), aluminum oxide (alumina), and zirconium oxide (zirconium dioxide). Examples of carbonates include calcium carbonate. Examples of silicates include calcium silicate, aluminum silicate, and magnesium silicate. Examples of silicate minerals include talc and kaolin. Examples of phosphates include calcium phosphate.

[0051] When the film F is an antiglare optical film, the “surface roughness” of the film C is, for example, 0.040 or more, preferably 0.050 or more, for example, 0.095 or less, preferably 0.080 or less.

[0052] 2. Membrane manufacturing system

[0053] Next, the film F production system 1 will be described.

[0054] The system 1 for manufacturing the membrane F manufactures the membrane F. Figure 2 As shown, a film F production system 1 includes a coating device 2 and a drying device 3 .

[0055] (1) Coating device

[0056] The coating device 2 applies the coating liquid to one side S1 of the substrate S to form a coating film on the one side S1 of the substrate S. That is, the method for manufacturing the film F includes a coating step. It should be noted that the one side S1 of the substrate S may also be subjected to a surface treatment such as a corona treatment or a plasma treatment before the coating step.

[0057] The viscosity of the coating liquid is 100 mPa·s or less, preferably 50 mPa·s or less, more preferably 10 mPa·s or less, for example 1 mPa·s or more. When the viscosity of the coating liquid is below the upper limit, when the coating liquid is applied in a manner to a thickness of 50 μm or less, uniform film thickness in the width direction can be achieved.

[0058] The surface tension of the coating liquid is, for example, 30 mN / m or more, preferably 35 mN / m or more, and for example, 60 mN / m or less, preferably 55 mN / m or less.

[0059] The solid content concentration of the coating liquid is adjusted so that the viscosity of the coating liquid is below the above upper limit. The solid content concentration of the coating liquid is, for example, 10% by mass or more, preferably 20% by mass or more, more preferably 30% by mass or more, more preferably 40% by mass or more, for example, 50% by mass or less, preferably 45% by mass or less.

[0060] The coating liquid contains a resin component and a solvent. The coating liquid contains the above-mentioned particles and additives as needed. The resin component may be the above-mentioned resin or a precursor of the above-mentioned resin.

[0061] Specifically, the coating liquid contains a polyfunctional oligomer, a polyfunctional monomer, a hydroxyl monomer, a photopolymerization initiator, the above-mentioned particles, a surface tension adjuster, and a thickener. The polyfunctional oligomer, the polyfunctional monomer, and the hydroxyl monomer are resin components (precursors of the resin), and the photopolymerization initiator, the surface tension adjuster, and the thickener are additives.

[0062] The polyfunctional oligomer has a plurality of ethylenically unsaturated groups. Examples of the ethylenically unsaturated group include an acryloyl group, a methacryloyl group, and a vinyl group.

[0063] The weight average molecular weight of the polyfunctional oligomer is, for example, 300 or more, preferably 400 or more, and for example, 5000 or less, preferably 3000 or less.

[0064] The functional group equivalent of the polyfunctional oligomer is, for example, 1 or more, preferably 2 or more, and for example, 6 or less, preferably 5 or less.

[0065] As a polyfunctional oligomer, a urethane acrylate and an erythritol type acrylate are mentioned, for example.

[0066] The ratio of the polyfunctional oligomer in the coating liquid is, for example, 20 mass % or more, preferably 30 mass % or more, and for example, 70 mass % or less, preferably 50 mass % or less.

[0067] The polyfunctional monomer has a plurality of ethylenically unsaturated groups. Examples of the ethylenically unsaturated group include an acryloyl group, a methacryloyl group, and a vinyl group.

[0068] As a polyfunctional monomer, the condensation product of pentaerythritol and acrylic acid is mentioned, for example.

[0069] The ratio of the polyfunctional monomer in the coating liquid is, for example, 20 mass % or more, preferably 30 mass % or more, and for example, 70 mass % or less, preferably 50 mass % or less.

[0070] The hydroxyl monomer has one ethylenically unsaturated group and one hydroxyl group. Examples of the hydroxyl monomer include 4-hydroxybutyl acrylate and 2-hydroxyethyl acrylate.

[0071] The photopolymerization initiator causes free radical polymerization of the polyfunctional oligomer, polyfunctional monomer, and hydroxyl monomer by ultraviolet irradiation. Examples of the photopolymerization initiator include benzophenone-based photopolymerization initiators, phosphine oxide-based photopolymerization initiators, oxime ester-based photopolymerization initiators, and cationic photopolymerization initiators.

[0072] The surface tension adjuster adjusts the surface tension of the coating liquid. Examples of the surface tension adjuster include cationic surfactants, anionic surfactants, nonionic surfactants, silicone-based leveling agents, and fluorine-based leveling agents.

[0073] The thickener adjusts the viscosity of the coating liquid and examples of the thickener include synthetic inorganic polymers, synthetic organic polymers, and natural organic polymers.

[0074] (2) Drying device

[0075] The drying device 3 dries the coating film on the substrate S. That is, the method for manufacturing the film F includes a drying step. By drying the coating film, a film C can be formed on the substrate S, thereby obtaining the above-mentioned film F. It should be noted that, as required, the film C can also be subjected to ultraviolet curing treatment or thermal curing treatment.

[0076] like Figure 3 As shown, the drying device 3 includes a first drying section 31 and a second drying section 32 .

[0077] (2-1) 1st Drying Section

[0078] The first drying section 31 blows heated air at a first wind speed toward the coating film from at least one side of the substrate S. Thus, the first drying section 31 dries the surface of the coating film.

[0079] The first wind speed is, for example, 1 m / sec or more, preferably 2 m / sec or more, and for example, 20 m / sec or less, preferably 15 m / sec or less, and more preferably 5 m / sec or less.

[0080] The first drying section 31 preferably heats the substrate S more weakly than the coating film. Thus, the first drying section 31 does not dry the inside of the coating film. That is, when the substrate S passes through the first drying section 31, the solvent of the coating liquid remains at the interface between the substrate S and the coating film. It should be noted that the first drying section 31 may not heat the substrate S. In addition, the first drying section 31 may heat the substrate S more strongly than the coating film to such an extent that the solvent of the coating liquid remains at the interface between the substrate S and the coating film.

[0081] When the first drying section 31 heats the substrate S weaker than the coating film, for example, heated air having the same temperature as the temperature of the heated air directed from one side of the substrate S toward the coating film is blown toward the substrate S from the other side of the substrate S at a second wind speed slower than the first wind speed. That is, the first drying section 31 blows heated air toward the substrate S from the other side of the substrate S at a second wind speed lower than the first wind speed. Thus, the first drying section 31 heats the substrate S to such an extent that the inside of the coating film is not dried. By preheating the substrate S by the first drying section 31 before the substrate S enters the second drying section 32, it is possible to improve the adhesion between the substrate S and the coating C.

[0082] It should be noted that, when the first drying section 31 heats the substrate S weaker than the coating film, for example, heated air having a temperature lower than the temperature of the heated air directed from one side of the substrate S toward the coating film may be blown toward the substrate S from the other side of the substrate S at a second wind speed that is the same as the first wind speed. In addition, when the first drying section 31 does not heat the substrate S, heated air is not blown toward the substrate S from the other side of the substrate S.

[0083] The second wind speed is, for example, 0.5 m / sec or more, preferably 1 m / sec or more, and for example, 5 m / sec or less, preferably 2 m / sec or less.

[0084] The total of the first wind speed and the second wind speed is, for example, 2 m / sec or more, preferably 3 m / sec or more, for example, 30 m / sec or less, preferably 15 m / sec or less, preferably 10 m / sec or less.

[0085] The ratio of the first wind speed to the second wind speed (first wind speed / second wind speed) is, for example, 0.1 or more, preferably 1.2 or more, more preferably 1.5 or more, and for example, 5 or less, preferably 3 or less.

[0086] The drying time in the first drying section 31 is, for example, 40 seconds or more, preferably 55 seconds or more, and for example, 80 seconds or less, preferably 65 seconds or less.

[0087] The first drying section 31 includes a first region 31A and a second region 31B.

[0088] The first region 31A is disposed at an upstream end portion of the first drying unit 31 in the conveyance direction of the substrate S.

[0089] The temperature (first temperature) of the heated air in the first area 31A is lower than the boiling point of the solvent of the coating liquid. When the boiling point of the solvent of the coating liquid is 110°C, the first temperature is, for example, 45°C or more, preferably 50°C or more, for example, less than 80°C, preferably 75°C or less.

[0090] The second region 31B is disposed on the downstream side of the first region 31A in the conveyance direction of the substrate S. The second region 31B is disposed between the first region 31A and the second drying unit 32 in the conveyance direction of the substrate S.

[0091] The temperature (second temperature) of the heated air in the second region 31B is higher than the first temperature and lower than the boiling point of the solvent of the coating liquid. When the boiling point of the solvent of the coating liquid is 110° C., the second temperature is, for example, 85° C. or higher, preferably 90° C. or higher, for example, 105° C. or lower, preferably 100° C. or lower.

[0092] The first drying section 31 includes a plurality of support rollers 311 , a plurality of one-side nozzles 312A, 312B, and 312C, and a plurality of other-side nozzles 313A and 313B.

[0093] The plurality of support rollers 311 are disposed on the other side of the substrate S. The plurality of support rollers 311 are arranged at intervals from each other in the conveying direction of the substrate S. The plurality of support rollers 311 support the substrate S.

[0094] The one-side nozzles 312A, 312B, and 312C are arranged on one side of the substrate S. The one-side nozzle 312A is arranged in the first region 31A. The one-side nozzle 312A blows heated air of a first temperature from one side of the substrate S toward the coating film at a first wind speed. The one-side nozzles 312B and 312C are arranged in the second region 31B. The one-side nozzles 312B and 312C blow heated air of a second temperature from one side of the substrate S toward the coating film at a first wind speed.

[0095] The other side nozzles 313A and 313B are arranged on the other side of the substrate S. The other side nozzles 313A and 313B are arranged in the second region 31B. The other side nozzles 313A and 313B blow heated air of the second temperature toward the substrate S from the other side of the substrate S at the second wind speed.

[0096] It should be noted that the number and arrangement of the plurality of support rollers 311 , the one-side nozzles 312A, 312B, and 312C, and the other-side nozzles 313A and 313B are not limited.

[0097] (2-2) Second Drying Section

[0098] The second drying section 32 is disposed downstream of the first drying section 31 in the conveying direction of the substrate S. The second drying section 32 heats the coating film from one side of the substrate S. Thus, the second drying section 32 maintains the temperature of the coating film heated by the first drying section 31 .

[0099] In order to heat the coating film, the second drying section 32 blows heated air from the side of the substrate S toward the coating film at a third wind speed.

[0100] The third wind speed is, for example, 1 m / second or more, preferably 2 m / second or more, and for example, 10 m / second or less, preferably 5 m / second or less.

[0101] In addition, the second drying unit 32 heats the substrate S more strongly than the coating film from the other side of the substrate S. Thus, the resin component of the coating film reacts with the substrate S and the solvent evaporates, thereby drying the coating film.

[0102] In order to heat the substrate S more strongly than the coating film, the second drying section 32, for example, sends heated air from the other side of the substrate S toward the substrate S at a fourth wind speed faster than the third wind speed. In this case, the second drying section 32 may send heated air of the same temperature as the temperature of the heated air from one side of the substrate S toward the coating film from the other side of the substrate S toward the substrate S, or may send heated air of a temperature higher than the temperature of the heated air from one side of the substrate S toward the coating film. That is, when the second drying section 32 sends heated air from the other side of the substrate S toward the substrate S at a fourth wind speed faster than the third wind speed, it sends heated air of a temperature higher than the temperature of the heated air from one side of the substrate S toward the coating film.

[0103] It should be noted that in order to heat the substrate S more strongly than the coating film, the second drying section 32 can also supply heated air with a temperature higher than the temperature of the heated air from one side of the substrate S toward the coating film from the other side of the substrate S at a fourth wind speed that is the same as the third wind speed.

[0104] The fourth wind speed is, for example, 2 m / sec or more, preferably 5 m / sec or more, and for example, 10 m / sec or less, preferably 7 m / sec or less.

[0105] The total of the third wind speed and the fourth wind speed is, for example, 3 m / sec or more, preferably 5 m / sec or more, and for example, 15 m / sec or less, preferably 12 m / sec or less.

[0106] The ratio of the fourth wind speed to the third wind speed (fourth wind speed / third wind speed) is, for example, 1.0 or more, preferably 1.1 or more, preferably 1.4 or more, and for example, 2 or less, preferably 1.6 or less.

[0107] The drying time in the second drying section 32 is, for example, 30 seconds or more, preferably 35 seconds or more, and for example, 50 seconds or less, preferably 45 seconds or less.

[0108] The second drying section 32 includes a third region 32A and a fourth region 32B.

[0109] The third region 32A is disposed on the downstream side of the second region 31B in the conveyance direction of the substrate S. The third region 32A is disposed between the first drying unit 31 and the fourth region 32B in the conveyance direction of the substrate S.

[0110] The temperature of the heated air in the third area 32A (third temperature) is equal to or lower than the boiling point of the solvent of the coating liquid. When the boiling point of the solvent of the coating liquid is 110° C., the third temperature is, for example, 85° C. or higher, preferably 90° C. or higher, and, for example, 110° C. or lower, preferably 105° C. or lower.

[0111] The fourth region 32B is arranged downstream of the third region 32A in the conveyance direction of the substrate S. The fourth region 32B is arranged on the opposite side of the first drying unit 31 with respect to the third region 32A in the conveyance direction of the substrate S.

[0112] The temperature of the heated air in the fourth region 32B (the fourth temperature) is lower than the third temperature and lower than the boiling point of the solvent of the coating liquid. When the boiling point of the solvent of the coating liquid is 110° C., the fourth temperature is, for example, 45° C. or higher, preferably 50° C. or higher, and for example, 75° C. or lower, preferably 70° C. or lower.

[0113] The second drying section 31 does not have a support roller. The second drying section 31 floats the substrate S and dries the coating film by blowing air from the other side of the substrate S. The second drying section 31 has a plurality of one side nozzles 321A, 321B, and 321C and a plurality of other side nozzles 322A, 322B, 322C, and 322D.

[0114] The one-side nozzles 321A, 321B, and 321C are arranged on one side of the substrate S. The one-side nozzles 321A and 321B are arranged in the third region 32A. The one-side nozzles 321A and 321B blow heated air of the third temperature from the one side of the substrate S toward the coating film at the third wind speed. The one-side nozzle 321C is arranged in the fourth region 32B. The one-side nozzle 321C blows heated air of the fourth temperature from the one side of the substrate S toward the coating film at the third wind speed.

[0115] The other side nozzles 322A, 322B, 322C, and 322D are arranged on the other side of the substrate S. The other side nozzles 322A, 322B, and 322C are arranged in the third region 32A. The other side nozzles 322A, 322B, and 322C blow heated air of the third temperature from the other side of the substrate S toward the coating film at the fourth wind speed. The other side nozzle 322D is arranged in the fourth region 32B. The other side nozzle 322D blows heated air of the fourth temperature from the other side of the substrate S toward the coating film at the fourth wind speed.

[0116] It should be noted that the number and arrangement of the one-side nozzles 321A, 321B, and 321C and the other-side nozzles 322A, 322B, 322C, and 322D are not limited.

[0117] 4. Effects

[0118] (1) According to the manufacturing system 1 of the membrane F, Figure 3 As shown, the drying device 3 includes a first drying section that supplies air from one side of the substrate S toward the coating film; and a second drying section that is arranged on the downstream side compared to the first drying section 31 in the conveying direction of the substrate S, and heats the coating film from one side of the substrate S while heating the substrate S from the other side of the substrate S more strongly than the coating film.

[0119] Therefore, in the first drying section 31 , air is blown toward the coating film from the side of the substrate S, thereby drying the surface of the coating film without drying the inside of the coating film.

[0120] Next, in the second drying section 32 , the substrate S is heated more strongly than the coating film.

[0121] Thus, the coating film is dried while reacting with the substrate S, and a coating film C having reacted with the substrate S is obtained.

[0122] As a result, the adhesion between the film C and the substrate S can be improved.

[0123] (2) According to the film F manufacturing system 1, in the first drying section 31, the wind speed of the heated air from the other side of the substrate S (the second wind speed) is lower than the wind speed of the heated air from one side of the substrate S (the first wind speed).

[0124] Therefore, the heated air from the other side of the substrate S can suppress an excessive temperature rise of the substrate S, thereby suppressing drying of the coating film to the inside, and the heated air from one side of the substrate S can dry the surface of the coating film.

[0125] (3) According to the film F manufacturing system 1, in the second drying section 32, the wind speed of the heated air from the other side of the substrate S (the fourth wind speed) is faster than the wind speed of the heated air from the one side of the substrate S (the third wind speed).

[0126] Therefore, the temperature of the substrate S can be increased by the heated air from the other side of the substrate S, so that the coating film can be dried to the inside while reacting with the substrate S.

[0127] Thereby, a film that has reacted with the substrate S can be obtained, and the adhesion of the film to the substrate S can be improved.

[0128] Example

[0129] Next, the present invention is described based on examples and comparative examples. The present invention is not limited by the following examples. In addition, the specific numerical values ​​of the physical property values, parameters, etc. used in the following description can be replaced by the upper limit values ​​(numerical values ​​defined in the form of "below", "less than") or lower limit values ​​(numerical values ​​defined in the form of "above", "greater than") of the physical property values, parameters, etc. corresponding to them recorded in the above-mentioned "Specific Implementation Methods" part.

[0130] 1. Preparation of coating liquid

[0131] The following materials were mixed in toluene to obtain a coating liquid. The obtained coating liquid had a solid content of 42% by mass and a viscosity of 6 mPa·s.

[0132] Multifunctional oligomers:

[0133] NK oligomer UA-53H-80BK (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) 50 parts by mass

[0134] Multifunctional monomers:

[0135] Viscoat #300 (manufactured by Osaka Organic Chemical Industry Co., Ltd.) 50 parts by mass

[0136] Hydroxyl monomer:

[0137] 4-Hydroxybutyl acrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd.) 20 parts by mass

[0138] Photopolymerization initiator:

[0139] Omnirad907 (manufactured by IGM Resin Co., Ltd.) 5 parts by mass

[0140] Surface tension modifier

[0141] GRANDIC PC4100 (manufactured by DIC Corporation) 1 part by mass

[0142] Silica particles

[0143] Techpolymer SSX-103DXE (manufactured by Sekisui Chemicals Co., Ltd.) 0.5 parts by mass

[0144] Tackifier

[0145] Smecton-SAN solution (manufactured by Nitto Denko Corporation) 1.5 parts by mass

[0146] 2. Fabrication of membranes

[0147] The coating liquid was applied to one surface of a substrate (material: acrylic film) at a substrate conveying speed of 30 m / min and dried under the drying conditions shown in Table 1 to obtain films of Examples and Comparative Examples having a coating of acrylic urethane resin on one surface of the substrate.

[0148] 3. Evaluation

[0149] (1) Surface roughness

[0150] The arithmetic mean roughness of the obtained film was measured using a surface roughness meter (product name: ET4000A, manufactured by Kosaka Laboratory Co., Ltd.) The results are shown in Table 1. When the "surface roughness" is 0.040 or more and 0.095 or less, it is suitable for anti-glare optical film use.

[0151] (2) Adhesion

[0152] The adhesion of the coating (adhesion to the substrate) of the obtained film was evaluated using an ultraviolet fading meter U48H (manufactured by Suga Test Co., Ltd.).

[0153] Specifically, five test pieces were cut out from the films of the embodiments and comparative examples, respectively. Different "removal times" (removal times from the fading instrument) were set for the five test pieces, respectively. The "removal times" were 48 hours, 96 hours, 144 hours, 192 hours, and 240 hours, and the five test pieces corresponded to any of the above "removal times".

[0154] All test pieces were placed in the discoloration apparatus under the following conditions, and when each "removal time" had passed, the test piece corresponding to the "removal time" was removed from the discoloration apparatus.

[0155] A cutter was used to cut grid-like cuts at intervals of 1 mm in length and width on the film surface of the removed test piece. No. 31B tape (manufactured by Nitto Denko Corporation) was affixed to the film with the grid-like cuts. The tape was then peeled off to check whether the film with the grid-like cuts had peeled off.

[0156] For each of the Examples and Comparative Examples, the "removal time" of the test piece at which the film peeling first occurred is shown as the adhesion in Table 1. The longer the "removal time" until the film peeling is, the more excellent the adhesion is.

[0157] (Conditions of the fader)

[0158] Temperature inside the layer: 40℃

[0159] Humidity in the layer: 20%RH

[0160] Light: (wavelength) 300nm~700nm, (illuminance) 500W / m 2

[0161]

[0162] It should be noted that the above invention is provided as an exemplary embodiment of the present invention, but it is only an example and is not to be interpreted as limiting. It is clear to those skilled in the art that the modified examples of the present invention are included in the attached claims.

[0163] Industrial Applicability

[0164] The film production system and film production method of the present invention can be used for production of films such as anti-glare optical films.

Claims

1. A film manufacturing system, comprising: a substrate and a film disposed on one side of the substrate; The manufacturing system has: a coating device for applying a coating liquid to the one side of the substrate to form a coating film on the one side of the substrate; and a drying device for drying the coating film to form the film on the one side of the substrate, The drying device comprises a first drying section and a second drying section, The first drying section supplies air toward the coating film from at least one side of the substrate; The second drying section is disposed downstream of the first drying section in the conveying direction of the substrate, and heats the coating film from the one side of the substrate while heating the substrate more strongly than the coating film from the other side of the substrate.

2. The film manufacturing system according to claim 1, wherein: The first drying section includes a support roller that is disposed on the other side of the substrate and supports the substrate. The first drying section blows heated air from the one side of the substrate toward the coating film at a first wind speed, and blows heated air from the other side of the substrate toward the substrate at a second wind speed that is lower than the first wind speed.

3. The film manufacturing system according to claim 2, wherein: The second drying section blows heated air from the one side of the substrate toward the coating film at a third wind speed, and blows heated air from the other side of the substrate toward the substrate at a fourth wind speed faster than the third wind speed.

4. The film manufacturing system according to claim 3, wherein: The first wind speed is below 15 m / s, The fourth wind speed is greater than or equal to 5 m / s.

5. The film manufacturing system according to claim 4, wherein: The total of the first wind speed and the second wind speed is 15 m / s or less, The ratio of the first wind speed to the second wind speed is greater than 1.

5. The sum of the third wind speed and the fourth wind speed is 15 m / s or less, A ratio of the fourth wind speed to the third wind speed is 1.4 or more.

6. The film manufacturing system according to claim 1, wherein: The first drying section includes a first area and a second area, wherein the second area is arranged downstream of the first area in the conveying direction of the substrate. The second drying section includes a third area and a fourth area, the third area is arranged on the downstream side of the second area in the conveying direction of the substrate, and the fourth area is arranged on the downstream side of the third area in the conveying direction of the substrate. The temperature of the heated air in the second region is higher than the temperature of the heated air in the first region. The temperature of the heated air in the fourth region is lower than the temperature of the heated air in the third region.

7. A method for producing a film, comprising producing the film using the film production system according to any one of claims 1 to 6, The method includes: A coating step of forming the coating film on the substrate using the coating device; and A drying step of drying the coating film using the drying device.

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