Adjustment device, adjustment method, and manufacturing method

Abstract

An adjustment device (10) is provided with: a container (12) having a liquid inflow part (18) and a liquid outflow part (20); and a porous filter (14) for supplying the liquid from the liquid inflow part (18) to the liquid outflow part (20) via the pores. Solid metal particles are captured in the pores. The porous filter (14) makes the resistivity value of the liquid passing through the pores larger than the resistivity value of the liquid before passing through the pores.

Description

Technical Field

[0001] The present invention relates to adjusting the resistivity value of a liquid containing metal ions. Background Art

[0002] Conventionally, it is known that there are various fields in which liquids with low metal ion content are sought.

[0003] For example, Japanese Patent Application Laid-Open No. 2013-132735 discloses a wire electrical discharge machine that uses an ion exchange resin to maintain the resistivity value of a machining fluid above a predetermined value, thereby reducing the ion concentration in the machining fluid. Ion exchange resins are not limited to wire electrical discharge machines, but are used in various fields. For example, ion exchange resins are used in semiconductor manufacturing, alcohol manufacturing, pharmaceutical manufacturing, pure water treatment, sewage treatment, power generation treatment, removal of calcium and the like in boilers, refined sugar treatment, and the like.

[0004] In addition, for example, Japanese Patent Application Publication No. 2019-98225 discloses a water purification system that insolubilizes metal ions in water and removes the insoluble metal components from the water by filtration.

[0005] For example, Japanese Patent Application Laid-Open No. 2005-213200 discloses a removal device that removes metal compounds in a surfactant by connecting an ion exchange resin-filled column and a functional filter unit via a structural member made of a specific material.

[0006] In addition, for example, Japanese Patent Application Laid-Open No. 2006-95391 discloses a wastewater treatment apparatus for treating wastewater containing metal ions. Summary of the invention

[0007] However, in the case of Japanese Patent Publication No. 2013-132735 or Japanese Patent Publication No. 2005-213200, it is necessary to replace the ion exchange resin. In addition, in the case of Japanese Patent Publication No. 2019-98225, an insolubilizer is required to insolubilize the metal ions. Therefore, there is a tendency that the operating cost for adjusting the resistivity value of the metal ions increases. Therefore, it is required to reduce the metal ion concentration of the liquid without using an ion exchange resin or an insolubilizer.

[0008] The object of the present invention is to solve the above-mentioned problems.

[0009] A first embodiment of the present invention is an adjustment device for adjusting the resistivity value of a liquid that does not contain solid metal objects but contains metal ions, wherein the adjustment device comprises: a container having a liquid inlet and a liquid outflow; a porous filter that is accommodated in the container and supplies the liquid from the liquid inlet to the liquid outflow via pores to capture solid metal particles in the pores, wherein the porous filter makes the resistivity value of the liquid after passing through the pores greater than the resistivity value of the liquid before passing through the pores.

[0010] The second aspect of the present invention is an adjustment method for adjusting the resistivity value of a liquid that does not contain solid metal objects but contains metal ions, wherein the resistivity value of the liquid after passing through the pores is made greater than the resistivity value of the liquid before passing through the pores by allowing the liquid to flow through the pores of a porous filter that captures solid metal particles.

[0011] A third aspect of the present invention is a method for manufacturing an adjustment device that adjusts the resistivity value of a liquid that does not contain solid metal objects but contains metal ions, wherein the method comprises: a recovery step (P1) of recovering a filter from a machine tool, the filter removing machining chips generated by machining of a machining object by the machine tool; and a housing step (P2) of housing the filter in a container having an inlet and an outlet for the liquid.

[0012] According to the above aspect, the metal ion concentration of the liquid can be reduced without using an ion exchange resin or an insolubilizer. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is a schematic diagram showing the structure of the adjustment device according to the embodiment.

[0014] Figure 2 1 is a flowchart showing the flow of a method for manufacturing an adjustment device.

[0015] Figure 3 It is a schematic diagram showing the structure of an adjustment device according to a modified example.

[0016] Figure 4 This is a flowchart showing the flow of the adjustment method according to the modification example. DETAILED DESCRIPTION

[0017] [Implementation Method]

[0018] Figure 1 1 is a schematic diagram showing the structure of the adjustment device 10 according to the embodiment. The adjustment device 10 includes a container 12 and a porous filter 14 .

[0019] The container 12 is a container that accommodates the porous filter 14. The container 12 includes a container body 16, a liquid inflow portion 18, and a liquid outflow portion 20.

[0020] The container body 16 has a filter housing space FS inside. The filter housing space FS is a space capable of housing the porous filter 14. The container body 16 may also have an opening and closing cover for housing the porous filter 14 in the filter housing space FS. In addition, the container body 16 may also be separable into a plurality of pieces in order to house the porous filter 14 in the filter housing space FS.

[0021] The liquid inlet portion 18 is connected to the filter housing space FS. The liquid inlet portion 18 has a water inlet hole 18-1 and a water inlet pipe 18-2. The water inlet hole 18-1 is a hole that penetrates the container body 16 from the outer wall of the container body 16 to the inner wall of the container body 16. The water inlet pipe 18-2 is a conduit that covers the outside of the water inlet hole 18-1 and extends outward from the outer wall surface of the container body 16. The water inlet pipe 18-2 can be formed integrally with the container body 16, or can be joined to the container body 16 by a joining component. In addition, the water inlet pipe 18-2 can also be removed.

[0022] The liquid outflow portion 20 is connected to the filter housing space FS. The liquid outflow portion 20 has a water outlet hole 20-1 and a water outlet pipe 20-2. The water outlet hole 20-1 is a hole that penetrates the container body 16 from the outer wall of the container body 16 to the inner wall of the container body 16. The water outlet pipe 20-2 is a conduit that covers the outer side of the water outlet hole 20-1 and extends outward from the outer wall surface of the container body 16. The water outlet pipe 20-2 can be formed integrally with the container body 16, or can be joined to the container body 16 by a joining component. In addition, the water outlet pipe 20-2 can also be removed.

[0023] The porous filter 14 is a porous body with pores. Examples of the porous body include filter paper and filter cloth. Solid metal particles are captured in the pores. The metal particles include at least one of iron, aluminum, copper, zinc, superhard alloy, tungsten, molybdenum, carbon, titanium, silicon, manganese, chromium, phosphorus, sulfur and nickel. The metal particles may also be machining chips generated by the machining of the object by a machine tool. In the case where the metal particles are machining chips, the porous filter 14 may also be a filter used in the past to remove machining chips generated by the machining of the object by a machine tool.

[0024] The machine tool is a wire EDM, a die-slot EDM, a fine-hole EDM or a cutting machine. A wire EDM is a device that processes an object by generating an electric discharge between a wire electrode and the object. A die-slot EDM is a device that processes an object by generating an electric discharge between a die-slot electrode and the object. A fine-hole EDM is a device that processes an object by generating an electric discharge between the electrode and the object while rotating a rod electrode having a circular cross section. A cutting machine is a device that processes an object using a tool.

[0025] The porous filter 14 supplies liquid from the liquid inlet 18 to the liquid outflow part 20 through the pores. When the liquid supplied to the liquid inlet 18 does not contain solid metal but contains metal ions, the resistivity value of the liquid after passing through the pores of the porous filter 14 is greater than the resistivity value of the liquid before passing through the pores.

[0026] The adjustment method of the adjustment device 10 causes a liquid containing no solid metal material but metal ions to flow through the pores of the porous filter 14 that captures solid metal particles, thereby increasing the resistivity value of the liquid.

[0027] The inventors have found that when clean water is passed through the pores of a porous body that has captured machining chips, the resistivity of the clean water increases. Machining chips are solid metal particles generated by machining an object by a machine tool. Clean water is a liquid from which machining chips have been removed from a machining fluid, and does not contain solid metal objects but contains metal ions.

[0028] As described above, in this embodiment, a porous filter 14 is provided that captures solid metal particles in the pores. The porous filter 14 increases the resistivity of a liquid that does not contain solid metal but contains metal ions after passing through the pores compared to before passing through the pores. Thus, the metal ion concentration of the liquid can be reduced without using an ion exchange resin or an insolubilizer.

[0029] Figure 2 : is a flowchart showing the process of a method for manufacturing the adjustment device 10. Figure 2 The flow of the manufacturing method is shown when a filter conventionally used to remove machining chips generated by machining an object by a machine tool is used as the porous filter 14. The manufacturing method of the adjustment device 10 includes a recovery step P1 and a storage step P2.

[0030] The recovery step P1 is a step of recovering a filter from a machine tool. The filter is arranged in a flow path where a machining fluid containing machining chips, namely wastewater, flows. The filter recovered in the recovery step P1 is a filter that has been used once (through which wastewater flows).

[0031] The housing step P2 is a step of housing the filter in the container 12. For example, when the container body 16 has an opening and closing cover, the filter is housed in the filter housing space FS of the container body 16 via the opening and closing cover. In addition, for example, when the container body 16 can be separated into multiple pieces, the multiple pieces are combined so that the filter is housed in the filter housing space FS.

[0032] According to the above-described manufacturing method, it is possible to manufacture the adjusting device 10 for reducing the metal ion concentration of the liquid without using an ion exchange resin or an insolubilizer. In addition, the filter can be recycled as the porous filter 14 .

[0033] The adjustment device 10 of this embodiment can be set in various devices that seek liquids with low metal ion content. For example, the adjustment device 10 is set in the necessary parts of the above-mentioned wire discharge machine, water purification system or removal device. Taking the wire discharge machine as an example, the installation method of the adjustment device 10 is described.

[0034] In the in-line electrical discharge machine, there is a pipeline that guides the machining fluid from the clean water tank to the machining tank. The clean water tank is a tank that stores the machining fluid, i.e., clean water, from which machining chips have been removed. The machining tank is a tank that stores the machining fluid used to immerse the machining object. In the case where the adjustment device 10 is provided in the above-mentioned pipeline, for example, the pipeline is divided into an upstream portion and a downstream portion. The end portion (downstream end portion) of the upstream portion is connected to the liquid inlet portion 18 of the adjustment device 10. On the other hand, the downstream portion (upstream end portion) is connected to the liquid outflow portion 20 of the adjustment device 10.

[0035] When the adjustment device 10 is provided in this way, the porous filter 14 makes the resistivity of the clean water supplied to the machining tank higher than the resistivity of the clean water supplied from the clean water tank. Therefore, the metal ion concentration in the machining fluid stored in the machining tank can be reduced without using an ion exchange resin.

[0036] In addition, the reciprocal of the resistivity value [Ωm] is the conductivity [S / m], and there is a correlation between the resistivity value [Ωm] and the conductivity [S / m]. Therefore, the resistivity value [Ωm] can be replaced by the conductivity [S / m]. When the resistivity value [Ωm] is replaced by the conductivity [S / m], the magnitude relationship of the values ​​is reversed. For example, "increasing the resistivity value [Ωm]" is synonymous with "decreasing the conductivity [S / m]".

[0037] [Variation]

[0038] The above-mentioned embodiment may be modified as follows.

[0039] Figure 3 FIG. 1 is a schematic diagram showing the structure of an adjustment device 10 according to a modified example. Figure 3In the embodiment, the same reference numerals are given to the same structures as those described in the embodiment. In addition, in this modification, the description overlapping with the embodiment is omitted.

[0040] In this modification, a bypass line 22 , a switch 24 , a resistivity meter 26 , and a controller 28 are newly provided.

[0041] The bypass line 22 is a line that bypasses the porous filter 14 and is connected to the liquid inflow portion 18 and the liquid outflow portion 20 .

[0042] The switch 24 is a device that switches the supply destination of the liquid to either the bypass line 22 or the porous filter 14. The switch 24 may be a three-way valve or two on-off valves. When the switch 24 is a three-way valve, the three-way valve is provided at the connection portion CP between the bypass line 22 and the water inlet line 18-2 of the liquid inlet portion 18 (see Figure 3 When the switch 24 is composed of two on-off valves, one of the two on-off valves is disposed in the water inlet pipe 18-2 upstream of the connection portion CP, and the other of the two on-off valves is disposed in the bypass pipe 22 near the connection portion CP.

[0043] The resistivity meter 26 measures the resistivity value of the liquid supplied to the liquid inlet 18. The resistivity meter 26 may be provided at the liquid inlet 18 or at a liquid supply source. For example, when the adjustment device 10 is provided at an electrical discharge machine (wire electrical discharge machine, die-casting electrical discharge machine, or fine-hole electrical discharge machine), the liquid supply source is a clean water tank.

[0044] The controller 28 controls the switch 24. The controller 28 has a processor such as a CPU or an MPU and one or more memories such as a ROM, a RAM, and a hard disk. The controller 28 compares the resistivity value of the liquid measured by the resistivity meter 26 with a predetermined threshold value. When the resistivity value is lower than the predetermined threshold value, the controller 28 controls the switch 24 to switch the supply destination of the liquid to the porous filter 14. On the other hand, when the resistivity value is higher than the predetermined threshold value, the controller 28 controls the switch 24 to switch the supply destination of the liquid to the bypass line 22.

[0045] The adjustment method of the adjustment device 10 according to this modification is performed as follows. Figure 4 : is a flowchart showing the flow of the adjustment method of the modification example. The adjustment method of the modification example includes a supply step P11, a measurement step P12, and a switching step P13.

[0046] The supply step P11 is a step of supplying a liquid containing no solid metal material but metal ions to the switch 24. In this step, for example, an on-off valve provided in a pipe leading from a liquid supply source to the liquid inlet 18 of the adjustment device 10 is opened.

[0047] The measuring step P12 is a step of measuring the resistivity value of the liquid supplied to the liquid inlet 18. The resistivity value is measured by a resistivity meter 26 provided at the liquid inlet 18 or a liquid supply source or the like.

[0048] The switching process P13 is a process of switching the supply destination of the liquid to either the bypass line 22 or the porous filter 14 based on the measurement result. The switching of the supply destination of the liquid is performed by the controller 28. In this process, when the resistance value is lower than a predetermined threshold value, the supply destination of the liquid is switched to the porous filter 14. On the other hand, when the resistivity value is higher than a predetermined threshold value, the supply destination of the liquid is switched to the bypass line 22.

[0049] Each of the supply step P11 , the measurement step P12 , and the switching step P13 continues from the start of adjustment of the resistivity value of the liquid to the end of the adjustment.

[0050] According to the above-described present modification, liquid can be supplied to the porous filter 14 only when necessary. Therefore, compared with the case where liquid is constantly supplied to the porous filter 14, the life of the porous filter 14 can be increased.

[0051] The resistivity meter 26 of this modification can also be replaced by a conductivity meter. The conductivity meter measures the conductivity of the liquid supplied to the liquid inlet 18. In the case where the resistivity meter 26 is replaced by the conductivity meter, the controller 28 compares the conductivity of the liquid measured by the conductivity meter with a predetermined threshold value. In the case where the conductivity exceeds the predetermined threshold value, the controller 28 controls the switch 24 to switch the supply destination of the liquid to the porous filter 14. On the other hand, in the case where the conductivity is below the predetermined threshold value, the controller 28 controls the switch 24 to switch the supply destination of the liquid to the bypass line 22.

[0052] 〔invention〕

[0053] The invention and effects that can be grasped from the above description are described below.

[0054] (1) The present invention is an adjustment device (10) for adjusting the resistivity value of a liquid containing no solid metal but containing metal ions, wherein the adjustment device (10) comprises: a container (12) having a liquid inlet (18) and a liquid outlet (20); and a porous filter (14) accommodated in the container, supplying the liquid from the liquid inlet to the liquid outlet via pores, capturing solid metal particles in the pores, and the porous filter making the resistivity value of the liquid after passing through the pores greater than the resistivity value of the liquid before passing through the pores.

[0055] This makes it possible to reduce the metal ion concentration of the liquid without using an ion exchange resin or an insolubilizer.

[0056] (2) According to the adjustment device of the present invention, the metal particles may include at least one of iron, aluminum, copper, zinc, superhard alloy, tungsten, molybdenum, carbon, titanium, silicon, manganese, chromium, phosphorus, sulfur and nickel. In this way, the resistivity value of the liquid containing no solid metal but metal ions can be appropriately increased.

[0057] (3) According to the adjustment device of the present invention, the metal particles may be machining chips generated by machining an object on a machine tool. This can appropriately increase the resistivity value of a liquid containing no solid metal object but metal ions.

[0058] (4) According to the adjustment device of the present invention, the porous filter may be a filter that has been used in the past as a filter for removing machining chips generated by machining an object by a machine tool. This allows the filter to be recycled.

[0059] (5) The adjustment device according to the present invention may also include: a bypass line (22) that bypasses the porous filter and is connected to the liquid inlet and the liquid outflow; a switch (24) that switches the supply destination of the liquid to either the bypass line or the porous filter; a resistivity meter (26) that measures the resistivity value of the liquid supplied to the liquid inlet; and a controller (28) that controls the switch to switch the supply destination of the liquid to the porous filter when the resistivity value of the liquid is lower than a predetermined threshold value, and controls the switch to switch the supply destination of the liquid to the bypass line when the resistivity value of the liquid is higher than the predetermined threshold value. Thus, the liquid can be supplied to the porous filter only when needed. Therefore, compared with the case where the liquid is always supplied to the porous filter, the life of the porous filter can be increased.

[0060] (6) The present invention is a method for adjusting the resistivity of a liquid that does not contain solid metal but contains metal ions, by allowing the liquid to flow through the pores of a porous filter that captures solid metal particles, so that the resistivity of the liquid after passing through the pores is greater than the resistivity of the liquid before passing through the pores.

[0061] This makes it possible to reduce the metal ion concentration of the liquid without using an ion exchange resin or an insolubilizer.

[0062] (7) The adjustment method according to the present invention may also include: a measuring step (P12) of measuring the resistivity value of the liquid supplied to the porous filter; a switching step (P13) of switching the supply destination of the liquid to either a bypass line that bypasses the porous filter or the porous filter based on the measurement result, wherein in the switching step, when the resistivity value of the liquid is lower than a predetermined threshold value, the supply destination of the liquid is switched to the porous filter, and when the resistivity value of the liquid is higher than the predetermined threshold value, the supply destination of the liquid is switched to the bypass line. Thus, the liquid can be supplied to the porous filter only when needed. Therefore, compared with the case where the liquid is always supplied to the porous filter, the life of the porous filter can be increased.

[0063] (8) The present invention is a method for manufacturing an adjustment device, wherein the adjustment device adjusts the resistivity value of a liquid that does not contain solid metal objects but contains metal ions, and the manufacturing method comprises: a recovery step (P1), wherein a filter is recovered from a machine tool, wherein the filter removes processing chips generated by the machine tool processing an object to be processed; and a housing step (P2), wherein the filter is housed in a container having an inlet and an outlet for the liquid.

[0064] This makes it possible to reduce the metal ion concentration of the liquid without using an ion exchange resin or an insolubilizer. In addition, the filter can be recycled.

[0065] In addition, the present invention is not limited to the above disclosure, and various structures can be adopted without departing from the gist of the present invention.

[0066] Description of Reference Numerals

[0067] 10...adjustment device, 12...container,

[0068] 14 ... porous filter, 16 ... container body,

[0069] 18 ... liquid inflow portion, 20 ... liquid outflow portion,

[0070] 22...Bypass pipe, 24...Switch,

[0071] 26…resistivity meter, 28…controller.

Claims

1. An adjusting device (10) for adjusting the resistivity value of a liquid containing no solid metal but containing metal ions, characterized in that: The adjusting device (10) comprises: A container (12) having a liquid inlet (18) and a liquid outlet (20); a porous filter (14) which is accommodated in the container and supplies the liquid from the liquid inlet to the liquid outlet through pores; Solid metal particles are captured in the pores. The porous filter makes the resistivity value of the liquid after passing through the pores greater than the resistivity value of the liquid before passing through the pores.

2. The adjustment device according to claim 1, characterized in that The metal particles include at least one of iron, aluminum, copper, zinc, superhard alloy, tungsten, molybdenum, carbon, titanium, silicon, manganese, chromium, phosphorus, sulfur and nickel.

3. The adjustment device according to claim 1 or 2, characterized in that: The metal particles are machining chips generated by machining an object with a machine tool.

4. The adjustment device according to any one of claims 1 to 3, characterized in that: The porous filter is a filter that has been conventionally used as a filter for removing machining chips generated by machining an object to be machined with a machine tool.

5. The adjustment device according to any one of claims 1 to 4, characterized in that: The adjusting device comprises: a bypass line (22) which bypasses the porous filter and is connected to the liquid inlet and the liquid outlet; a switch (24) for switching a supply destination of the liquid to either the bypass line or the porous filter; a resistivity meter (26) for measuring a resistivity value of the liquid supplied to the liquid inlet; as well as A controller (28) controls the switch to switch the supply destination of the liquid to the porous filter when the resistivity value of the liquid is lower than a predetermined threshold value, and controls the switch to switch the supply destination of the liquid to the bypass line when the resistivity value of the liquid is higher than the predetermined threshold value.

6. A method for adjusting the resistivity of a liquid containing no solid metal but containing metal ions, characterized in that: By allowing the liquid to flow through the pores of the porous filter that captures the solid metal particles, the resistivity value of the liquid after passing through the pores is made larger than the resistivity value of the liquid before passing through the pores.

7. The adjustment method according to claim 6, characterized in that: The adjustment method comprises: a measuring step (P12) of measuring a resistivity value of the liquid supplied to the porous filter; and a switching step (P13) of switching the supply destination of the liquid to either a bypass line bypassing the porous filter or the porous filter based on the measurement result, In the switching process, when the resistivity value of the liquid is lower than a predetermined threshold value, the supply destination of the liquid is switched to the porous filter, and when the resistivity value of the liquid is higher than the predetermined threshold value, the supply destination of the liquid is switched to the bypass line.

8. A method for manufacturing an adjusting device for adjusting the resistivity value of a liquid containing no solid metal and containing metal ions, characterized in that: The manufacturing method comprises: a recovery step (P1) of recovering a filter from a machine tool, the filter removing machining chips generated by machining an object by the machine tool; and The accommodating step (P2) is to accommodate the filter in a container having an inlet and an outlet for the liquid.

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