Spinning uniform evaporation system

Abstract

The invention relates to the field of evaporation equipment, in particular to a spinning uniform evaporation system, which comprises a cabin body, a substrate frame and a substrate table, and further comprises a revolution and rotation module, an evaporation module and a control module, which are arranged in the cabin body, and the revolution and rotation module comprises a revolution driving mechanism and a rotation driving mechanism which are used for driving the substrate frame; the evaporation material regulation and control module comprises a heating module, an evaporation conduction cavity, a gas concentration detector and an electromagnetic valve and is used for regulating and controlling the diffusion time of the evaporation material; the height adjusting module comprises a main hydraulic lifting rod and an auxiliary hydraulic lifting rod and is used for achieving height adjustment of the substrate frame relative to the evaporation source. The substrate frame rotates while revolving, so that an evaporation material is more uniformly distributed on the surface of the substrate; and the design of the evaporation conduction cavity of the slender cavity is combined with the gas release structure controlled by the electromagnetic valve, so that the evaporation material can be uniformly distributed and deposited on the substrate at a stable rate, and the consistency of the overall film thickness is improved.

Description

Technical Field

[0001] The invention relates to the field of evaporation equipment, and in particular to a spin uniform evaporation system. Background Art

[0002] Traditional evaporation equipment usually adopts a fixed substrate rack design, which only has a large range of revolution, but lacks the self-rotation of the substrate rack, so that the rotation speed of the inner and outer sides of the substrate rack is different during the evaporation process. Therefore, it is easy to cause uneven film thickness, especially in the area of ​​the substrate close to the rotation center and edge area of ​​the substrate, the film thickness difference is significant, affecting the performance and quality of the final product. The uneven film thickness directly affects the overall performance of the material, which will cause fluctuations in the optical, electronic and other properties of the final product, making it difficult to meet high-standard application requirements. At the same time, in the evaporation process of traditional evaporation equipment, the diffusion process of the evaporated material is uncontrollable, which can easily lead to uneven and unstable diffusion of the evaporated material, and then cause uneven evaporation.

[0003] Therefore, a new evaporation equipment design is urgently needed to improve the uniformity of film thickness and meet the requirements of high-performance applications. Summary of the invention

[0004] The purpose of the present invention is to overcome the deficiencies of the prior art and to provide a spin uniform evaporation system that can improve the uniformity of film thickness.

[0005] In order to achieve the above object, the technical solution specifically adopted by the present invention is as follows:

[0006] A spin uniform evaporation system includes a cabin, a substrate rack and a substrate stage, and also includes:

[0007] A revolution and rotation module, comprising a revolution driving mechanism and a rotation driving mechanism for driving the substrate rack;

[0008] The evaporation material control module includes a heating module, an evaporation conduction chamber, a gas concentration detector and a solenoid valve, which are used to control the diffusion time of the evaporation material;

[0009] The height adjustment module includes a main hydraulic lifting rod and an auxiliary hydraulic lifting rod, which are used to adjust the height of the substrate rack relative to the evaporation source.

[0010] Furthermore, the revolution driving mechanism includes a hydraulically adjustable rotating disk and a revolution driving motor. The revolution driving motor drives the hydraulically adjustable rotating disk to drive the substrate table to revolve, thereby driving the substrate rack to revolve.

[0011] Furthermore, the substrate stage is installed below the hydraulic adjustment rotating disk through a main hydraulic lifting rod and an auxiliary hydraulic lifting rod, and the height of the substrate rack relative to the evaporation source can be adjusted by adjusting the main hydraulic lifting rod and the auxiliary hydraulic lifting rod.

[0012] Furthermore, the self-rotation driving mechanism includes a self-rotation driving motor, a rotating support shaft, an autonomous rotating driven gear, a hydraulically adjustable rotating disk and an autonomous rotating driving gear. The autonomous rotating driven gear is installed on the upper top surface of the substrate rack. The end of the rotating shaft passes through the substrate table and the autonomous rotating driving gear is installed by fastening bolts. The autonomous rotating driven gear and the substrate rack are sequentially installed under the substrate table through the rotating support shaft. The autonomous rotating driving gear is meshed with the autonomous rotating driven gear. When the self-rotation driving motor rotates, the autonomous rotating driven gear is driven to rotate through the autonomous rotating driving gear, thereby driving the substrate rack to rotate.

[0013] Furthermore, the heating module is used to achieve heating of the evaporation material, and includes a molybdenum boat, a molybdenum boat heat conduction rod, and a molybdenum boat replacement operation door.

[0014] Furthermore, the evaporation conduction chamber is arranged above the heating module, a gas concentration detector is arranged inside, and an opening and closing structure controlled by a solenoid valve is arranged at the top.

[0015] Furthermore, it also includes a single chip microcomputer, the input end of the single chip microcomputer is connected to the gas concentration detector, and the output end is connected to the solenoid valve. When the gas concentration reaches a certain condition, the solenoid valve controls the opening and closing structure to open, allowing the evaporated gas to be released to the substrate surface.

[0016] Furthermore, the cavity of the evaporation conduction cavity is an elongated rectangular structure, and when the gas is released, the internal pressure is higher than the external cabin pressure.

[0017] The present invention has the following characteristics and beneficial effects:

[0018] 1) Film thickness uniformity is greatly improved:

[0019] The substrate holder's self-rotation design allows the substrate holder to rotate while revolving, significantly improving the unevenness of film thickness during the evaporation process. The slender evaporation conduction chamber design combined with the solenoid valve-controlled gas release structure ensures that the evaporated material can be deposited on the substrate at a stable rate and evenly distributed, thereby improving the overall film thickness consistency.

[0020] 2) Precise control of the evaporation process:

[0021] Through the opening and closing structure controlled by the solenoid valve, the present invention can accurately release gas when the evaporation material reaches the ideal vaporization state, avoiding material waste or uneven evaporation caused by premature or late release. This precise control further ensures the controllability and stability of the evaporation process.

[0022] 3) Flexible height adjustment:

[0023] Through the design of the main hydraulic lifting rod and the auxiliary hydraulic balancing rod, the present invention realizes the height adjustment of the substrate rack relative to the evaporation source, further optimizes the evaporation process, and ensures the uniformity of film thickness and the improvement of overall efficiency.

[0024] 4) Improved product quality stability:

[0025] The innovative design of the present invention improves the consistency of product quality, especially in the fields of optics, electronics, etc. where high film thickness precision is required, and can effectively improve product performance and stability. Uniform film thickness not only improves optical performance, but also ensures the reliability of electrical performance in electronic component manufacturing.

[0026] 5) Wide applicability:

[0027] The present invention can be widely used in various manufacturing industries that require high-quality thin film materials, especially in high-precision fields such as semiconductors, optical coatings, and display screen production. Its flexible design allows it to adapt to substrates of different sizes and materials to meet different production needs. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Other features, objects and advantages of the present invention will become more apparent from the detailed description of non-limiting embodiments made with reference to the following drawings:

[0029] Figure 1 A schematic structural diagram of a spin uniform evaporation system according to an embodiment of the present invention;

[0030] Figure 2 It is a schematic diagram of the three-dimensional structure of the revolution and rotation module in an embodiment of the present invention;

[0031] Figure 3 for Figure 2 A front view of

[0032] Figure 4 It is a schematic diagram of a local structure of an embodiment of the present invention;

[0033] Figure 5 It is a partial structural schematic diagram of the evaporation material control module in an embodiment of the present invention;

[0034] In the figure: 1. Evaporation chamber; 11. Revolution drive motor; 12. Main hydraulic lifting rod; 13. Rotation drive motor; 14. Substrate table; 15. Rotation support shaft; 16. Autonomous rotation driven gear; 17. Substrate rack; 18. Fastening bolts; 19. Auxiliary hydraulic lifting rod; 110. Hydraulic adjustment rotating disk; 111. Autonomous rotation drive gear; 31. Molybdenum boat heat energy conduction rod; 32. Molybdenum boat; 33. Molybdenum boat replacement operation door; 34. Evaporation conduction chamber; 35. Solenoid valve. DETAILED DESCRIPTION

[0035] The present invention is described in detail below in conjunction with specific embodiments. The following embodiments will help those skilled in the art to further understand the present invention, but are not intended to limit the present invention in any form. It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other.

[0036] In order to solve the problems of uneven evaporation film thickness, low evaporation efficiency and unstable product quality in the prior art, an embodiment of the present invention provides a spin uniform evaporation system, which adds a small range rotation of the substrate frame on the basis of the traditional revolution. Specifically, Figure 1 As shown, a revolution and rotation module is installed in the cabin 1 of the evaporation system, including a revolution drive mechanism and a rotation drive mechanism for driving the substrate rack 17, so that the substrate rack can not only revolve around the evaporation source in a large range, but also each substrate rack can rotate itself. Figure 2 and Figure 3 As shown, the revolution driving mechanism includes a hydraulically adjustable rotating disk 110 and a revolution driving motor 11. The revolution driving motor 11 drives the hydraulically adjustable rotating disk 110 to drive the substrate table 14 to revolve, thereby driving the substrate frame 17 to revolve; the self-rotation driving mechanism includes a self-rotation driving motor 13, a rotating support shaft 15, an autonomous rotating driven gear 16, a hydraulically adjustable rotating disk 110 and an autonomous rotating driving gear 111. The autonomous rotating driven gear 16 is installed on the upper top surface of the substrate frame 17. The end of the rotating shaft passes through the substrate table 14 and the autonomous rotating driving gear 111 is installed by a fastening bolt 18. The autonomous rotating driven gear 16 and the substrate frame 17 are sequentially installed below the substrate table 14 through the rotating support shaft 15. The autonomous rotating driving gear 111 is meshed with the autonomous rotating driven gear 16. When the self-rotation driving motor 13 rotates, the autonomous rotating driven gear 16 is driven to rotate through the autonomous rotating driving gear 111, thereby driving the substrate frame 17 to rotate. The combination of rotation and revolution ensures that the evaporated material is evenly distributed in every corner of the substrate, avoiding the phenomenon that the film thickness is thick near the rotation center and thin at the edges.

[0037] In order to further improve the uniformity of evaporation, the present invention introduces a slender cavity in the design of the evaporation source. The internal pressure of the cavity is higher than the external cabin pressure, so that the evaporated material can diffuse upward evenly. At the same time, an opening and closing structure controlled by a solenoid valve is also set at the top of the small evaporation chamber. There is a gas concentration detector in the small evaporation chamber. When the gas concentration reaches a certain condition, the solenoid valve opens, allowing the evaporated gas to be evenly released to the surface of the substrate. The control of the solenoid valve is synchronized with the heating process. When the powder is fully heated and first converted into liquid and then into gas, when the gas concentration reaches a certain condition, the solenoid valve automatically opens to release the gas, ensuring a stable supply of evaporation materials and accurately controlling the timing of gas release. Through this design, the material distribution during the evaporation process is more uniform, avoiding the uneven evaporation caused by premature or late release. This design avoids the phenomenon of concentrated evaporation materials in the central area in traditional designs by increasing the fluidity and distribution range of the evaporator. Specifically, an evaporation material control module is installed in the cabin of the evaporation system, and the evaporation material control module includes a heating module, an evaporation conduction chamber 34, a gas concentration detector, an electromagnetic valve 35 and a single-chip microcomputer. The cavity of the evaporation conduction chamber 34 is an elongated rectangular structure, which is arranged above the heating module, and has a gas concentration detector inside. An opening and closing structure controlled by the electromagnetic valve 35 is arranged on the top. The input end of the single-chip microcomputer is connected to the gas concentration detector, and the output end is connected to the electromagnetic valve 35. When the gas concentration reaches a certain condition, the electromagnetic valve 35 controls the opening and closing structure to open, allowing the evaporated gas to be released to the substrate surface.

[0038] In addition, the present invention also introduces a main hydraulic lift rod and a secondary hydraulic lift rod to adjust the height of the substrate rack relative to the evaporation source. Specifically, the substrate stage 14 is installed below the hydraulic adjustment rotating disk 110 through the main hydraulic lift rod 12 and the secondary hydraulic lift rod. The height of the substrate rack relative to the evaporation source can be adjusted by adjusting the main hydraulic lift rod 12 and the secondary hydraulic lift rod, thereby further optimizing the evaporation process and improving the overall efficiency and film thickness uniformity.

[0039] In this embodiment, a conventional heating module is used, which is used to heat the evaporation material and includes a molybdenum boat 32 , a molybdenum boat heat conduction rod 31 and a molybdenum boat replacement operation door 33 .

[0040] When this specific implementation is used, it includes the following steps:

[0041] (1) placing a substrate in a substrate rack 17 and loading the material to be evaporated into a molybdenum boat 32;

[0042] (2) The revolution drive motor 11 and the rotation drive motor 13 are started simultaneously. The revolution drive motor 11 drives the hydraulic adjustment rotating disk 110 to drive the substrate stage 14 to revolve, thereby driving the substrate holder 17 to revolve. At the same time, the rotation drive motor 13 drives the autonomous rotation drive gear 111 to drive the autonomous rotation driven gear 16 to rotate, thereby driving the substrate holder 17 to rotate.

[0043] (3) Start the molybdenum boat 32 to fully heat the material to be evaporated. The evaporated material is first converted into liquid and then into gas due to the powder, and diffuses into the evaporation conduction chamber 34. When the gas concentration in the evaporation conduction chamber 34 reaches a certain condition, the solenoid valve automatically opens to release the gas. At this time, the internal pressure of the evaporation conduction chamber 34 is higher than the external chamber pressure, so that the evaporated material can diffuse upward evenly.

[0044] The above shows and describes the basic principles, main features and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited by the above embodiments. The above embodiments and descriptions are only preferred examples of the present invention and are not intended to limit the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. A spin uniform evaporation system, comprising a cabin, a substrate rack and a substrate stage, characterized in that: Also included are the following installed in the cabin: A revolution and rotation module, comprising a revolution driving mechanism and a rotation driving mechanism for driving the substrate rack; The evaporation material control module includes a heating module, an evaporation conduction chamber, a gas concentration detector and a solenoid valve, which are used to control the diffusion time of the evaporation material; The height adjustment module includes a main hydraulic lifting rod and an auxiliary hydraulic lifting rod, which are used to adjust the height of the substrate rack relative to the evaporation source.

2. A spin uniform evaporation system as claimed in claim 1, characterized in that: The revolution driving mechanism includes a hydraulic adjustment rotating disk and a revolution driving motor. The revolution driving motor drives the substrate table to revolve by driving the hydraulic adjustment rotating disk, thereby driving the substrate rack to revolve.

3. A spin uniform evaporation system as claimed in claim 1, characterized in that: The substrate stage is installed below the hydraulic adjustment rotating disk through a main hydraulic lifting rod and an auxiliary hydraulic lifting rod.

4. A spin uniform evaporation system as claimed in claim 1, characterized in that: The self-rotation driving mechanism includes a self-rotation driving motor, a rotating support shaft, an autonomous rotating driven gear, a hydraulically adjustable rotating disk and an autonomous rotating driving gear. The autonomous rotating driven gear is installed on the upper top surface of the substrate rack. The end of the rotating shaft passes through the substrate table and the autonomous rotating driving gear is installed by fastening bolts. The autonomous rotating driven gear and the substrate rack are sequentially installed below the substrate table through the rotating support shaft. The autonomous rotating driving gear is meshed with the autonomous rotating driven gear. When the self-rotation driving motor rotates, the autonomous rotating driven gear is driven to rotate through the autonomous rotating driving gear, thereby driving the substrate rack to rotate.

5. The spin uniform evaporation system according to claim 1, characterized in that: The heating module is used to achieve heating of the evaporation material, and includes a molybdenum boat, a molybdenum boat heat energy conduction rod, and a molybdenum boat replacement operation door.

6. A spin uniform evaporation system as claimed in claim 1, characterized in that: The evaporation conduction chamber is arranged above the heating module, a gas concentration detector is arranged inside, and an opening and closing structure controlled by a solenoid valve is arranged at the top.

7. A spin uniform evaporation system as claimed in claim 6, characterized in that: It also includes a single chip microcomputer, the input end of the single chip microcomputer is connected to the gas concentration detector, and the output end is connected to the electromagnetic valve. When the gas concentration reaches a certain condition, the electromagnetic valve controls the opening and closing structure to open, allowing the evaporated gas to be released to the substrate surface.

8. The spin uniform evaporation system according to claim 1, characterized in that: The cavity of the evaporation conduction cavity is an elongated rectangular structure, and when the gas is released, the internal pressure is higher than the external cabin pressure.

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