Fixed self-connection and distributed gas homogenizing system structure and method for PECVD (Plasma Enhanced Chemical Vapor Deposition)
By designing a fixed self-connection and distributed uniform gas system structure in PECVD equipment, the problems of frequent disassembly and uneven gas distribution of gas are solved, and a safer and more uniform gas distribution and higher system are achieved reliability.
Patent Information
- Application Number
- CN202411599416.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-11
- Publication Date
- 2025-02-14
AI Technical Summary
In existing PECVD equipment, the gas supply pipeline needs to be frequently disassembled and installed when the upper chamber cover is opened and closed, which increases safety risks and the gas distribution is uneven, affecting the uniformity of thin film deposition.
Design a fixed self-connected and distributed uniform gas system structure for PECVD. By setting a special gas passage between the lower chamber and the upper chamber cover, uniform distribution of gas is achieved, and a self-connected gas sealing device is used to reduce disassembly and assemble frequency.
It reduces safety risks during operation, improves uniformity of gas distribution, reduces costs and risks caused by disassembly and assembly, and ensures the sealing and reliability of the entire system.
Smart Images
Figure CN119433517A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the field of semiconductor manufacturing, and in particular to a structure and method of a fixed self-connected and distributed gas homogenizing system for PECVD. Background Art
[0002] Glow discharge generates plasma, which is the core reaction mechanism of PECVD equipment. PECVD technology uses low-temperature plasma as an energy source, places the coated substrate on the glow discharge cathode in a low-pressure environment, and introduces an appropriate amount of reaction gas. Under the action of glow discharge, the gas undergoes a series of chemical and plasma reactions to form a solid film on the sample surface.
[0003] In the prior art, the gas usually enters from the center point of the upper cavity and is then preliminarily dispersed through a simple preliminary gas homogenization device so that the gas can diffuse as far as possible when entering the gas homogenization cavity. However, the existing gas supply pipeline must be manually disconnected when the upper cover of the cavity is opened. New seals need to be used after each reconnection, and leak detection needs to be re-performed. The operation of the special gas pipeline increases the safety risk. In the existing gas homogenization structure, although the uniformity of the gas is formed by the combination of a primary gas homogenization structure in the middle position and a microporous gas homogenization plate, the gas distribution is not uniform during the dynamic process. In principle, a uniform film cannot be deposited in places where the electric field is unevenly distributed. Summary of the invention
[0004] The technical problem to be solved by the present invention is to solve one or more technical problems existing in the prior art and at least provide a beneficial choice or create conditions.
[0005] The solution of the present invention to its technical problem is: a fixed self-connected and distributed gas uniforming system structure for PECVD, which includes a lower cavity, an upper cavity cover and a gas uniforming component, the top of the lower cavity is provided with an opening, the lower cavity is provided with a first gas channel, the air inlet end of the first gas channel is used to be connected to a special gas pipeline; the upper cavity cover is arranged at the opening, so that the upper cavity cover can open or close the opening, the upper cavity cover is provided with a second gas channel, the air inlet end of the second gas channel is connected to the air outlet end of the first gas channel, so that the first gas channel and the second gas channel form a special gas passage, the special gas passage is used to allow gas to enter the gas uniforming component, the gas uniforming component is arranged below the upper cavity cover, the air inlet end of the gas uniforming component is connected to the air outlet end of the second gas channel, and the gas uniforming component is used to allow gas to be evenly distributed into the internal space of the lower cavity.
[0006] The beneficial effects of the present invention are as follows: by converting the connection of the gas delivery pipeline with the upper chamber cover of the PECVD equipment into a connection with the fixed lower chamber below, the problem of frequent disassembly and assembly of the special gas system during the removal of the upper chamber cover is avoided. The safety risks during operation are reduced, and the tangible and intangible costs caused by disassembly and assembly are reduced. Secondly, by changing the gas feeding method, the gas feeding and local dispersion method are changed to uniform distribution in the overall space, which greatly improves the uniformity of gas distribution. Combined with the microporous structure of the second gas homogenizing plate, it has a positive effect on the gas distribution of the overall reaction gas space. Finally, in actual production operation, a detachable first gas homogenizing plate is designed, and the first gas homogenizing plate can be designed to have pores with different distribution densities, variable pore diameters and other structures, thereby improving the flexibility of gas uniformity adjustment. This design enables the system to better adapt to different production needs and further optimizes the uniformity of gas distribution.
[0007] As a further improvement of the above technical solution, a first air inlet is provided on the side of the lower cavity, and a first air outlet is provided on the top surface of the side wall of the lower cavity. A self-connecting gas sealing device is provided at the first air outlet. The first gas channel connects the self-connecting gas sealing device with the first air inlet, and the first air inlet is connected to the special gas pipeline. The self-connecting gas sealing device is used to connect with the upper cavity cover.
[0008] As a further improvement of the above technical solution, the trouble of frequently disassembling and assembling the special gas system during the removal of the upper cavity cover is avoided. The safety risk of operation is reduced, and the tangible and intangible costs added during the disassembly and assembly process are also reduced. Through the self-connecting gas sealing device, it is achieved that when the upper cavity cover is in a closed state, it is automatically connected to the gas sealing device to form a closed special gas channel. During the disassembly process, the gas sealing device can be automatically disconnected from the cavity cover, thereby ensuring the sealing and safety of the entire system.
[0009] As a further improvement of the above technical solution, the bottom surface of the upper cavity cover is provided with a second air inlet and a second air outlet, the second gas channel connects the second air inlet and the second air outlet, the second air inlet is used to be connected to the self-connecting gas sealing device, and the second air outlet is connected to the air inlet end of the gas uniformizing component.
[0010] As a further improved beneficial effect of the above technical solution, by connecting the upper chamber cover with the self-connecting gas sealing device, it is ensured that the gas can be smoothly and efficiently transmitted from the special gas pipeline to the inside of the cavity. The smoothness of the transmission process greatly reduces the resistance and potential leakage risk during the gas flow, thereby improving the stability and safety of the entire system. By connecting the second gas outlet to the gas inlet end of the gas homogenizing component, the uniform distribution effect of the gas in the cavity is further improved. It ensures that the concentration of gas in each area inside the cavity is consistent, thereby avoiding insufficient or uneven reactions caused by local uneven concentrations. This improvement ensures the efficient operation of the entire system, improves the accuracy and repeatability of the reaction, and thus brings higher reliability and stability to the entire process.
[0011] As a further improvement of the above technical solution, the self-connecting gas sealing device includes a sliding seal, a spring washer, a fixed seal and a limiting block. The fixed seal is arranged at the outlet end of the first gas channel, the sliding seal sleeve is arranged on the fixed seal, the spring washer is arranged on the fixed seal, one end of the spring washer is connected to the fixed seal, and the other end of the spring washer is connected to the sliding seal. The limiting block is arranged at the top of the first gas outlet, and the limiting block is used to limit the sliding seal. The sliding seal and the fixed seal are provided with vents extending along the axial direction of the first gas outlet so that the gas in the first gas channel can be discharged through the first gas outlet.
[0012] As a further improved beneficial effect of the above technical solution, when the upper cavity cover is opened, due to the action of the spring washer, the sliding seal will abut against the limiting block, so that the end of the sliding seal protrudes from the top surface of the side wall of the lower cavity, providing a good preset condition for the sealing after the upper cavity cover is closed. When the upper cavity cover is closed, the upper cavity cover is pressed on the lower cavity by its own gravity, and the sliding seal moves toward the fixed seal after overcoming the elastic force of the spring until the sliding seal fully abuts against the bottom surface of the upper cavity cover. This process ensures the sealed connection between the first gas channel and the second gas channel, thereby forming a special gas channel. This special gas channel not only ensures the smooth flow of gas, but also greatly improves the sealing performance and reliability of the system.
[0013] As a further improvement of the above technical solution, the self-connecting gas sealing device also includes a first sealing ring, a second sealing ring and a third sealing ring, one end of the first sealing ring is abutted against the bottom surface of the fixed seal, the other side of the first sealing ring is abutted against the air outlet end of the first gas channel, the first sealing ring is used to seal the fixed seal and the first gas channel, the second sealing ring is sleeved on the outer side surface of the fixed seal, the outer side surface of the second sealing ring is abutted against the inner side surface of the sliding seal, the second sealing ring is used to seal the fixed seal and the sliding seal, the third sealing ring is arranged on the top surface of the sliding seal, the third sealing ring is abutted against the bottom surface of the upper cavity cover when the upper cavity cover is closed, and the third sealing ring is used to seal the sliding seal and the second air inlet.
[0014] As a further improvement of the above technical solution, through this improvement, the self-connecting gas sealing device further improves the sealing performance on the original basis, ensures the sealing effect of the gas during the transmission process, thereby improving the stability and reliability of the entire system. This improvement can not only reduce the safety hazards caused by gas leakage, but also extend the service life of the equipment and reduce maintenance costs.
[0015] As a further improvement of the above technical solution, a fourth sealing ring is provided on the outer wall of the lower cavity, and the first air inlet is correspondingly located in the fourth sealing ring, and the fourth sealing ring is used to seal the first air inlet and the special gas pipeline.
[0016] As a beneficial effect of further improvement of the above technical solution, through the setting of the fourth sealing ring, the sealing performance between the first air inlet and the special gas pipeline is significantly improved. The system is more stable during operation, and will not have performance fluctuations due to gas leakage. It can also effectively prevent the leakage of harmful gases and reduce pollution to the environment.
[0017] As a further improvement of the above technical solution, the gas uniformizing component includes a first gas uniformizing main channel, a second gas uniformizing main channel, a first gas uniformizing secondary channel, a second gas uniformizing secondary channel, multiple gas uniformizing sub-channels, a first gas uniformizing plate and a second gas uniformizing plate, the first gas uniformizing main channel, the first gas uniformizing main channel and the second gas outlet are connected by a pipeline, the second gas uniformizing main channel and the second gas outlet are connected by a pipeline, the air inlet end of the first gas uniformizing secondary channel is connected to the air outlet end of the first gas uniformizing main channel, the air inlet end of the second gas uniformizing secondary channel is connected to the air outlet end of the second gas uniformizing main channel, one end of all the gas uniformizing sub-channels is connected to the air outlet end of the first gas uniformizing secondary channel, the other end of all the gas uniformizing sub-channels is connected to the air outlet end of the second gas uniformizing secondary channel, and all the gas uniformizing sub-channels are provided with a first gas uniformizing plate detachably connected to the gas uniforming sub-channel.
[0018] As a further improved beneficial effect of the above technical solution, the gas enters the gas-uniform component from the second gas outlet, is evenly distributed to the two main channels, then evenly enters the secondary channel from the main channel, flows evenly from the first gas-uniform secondary channel to the second gas-uniform secondary channel, and then achieves a finer gas distribution through multiple sub-channels, thereby improving the gas's uniform distribution capability, reducing turbulence and dead zones in the gas flow, and thus improving the overall gas processing efficiency. All gas-uniform sub-channels are provided with a first gas-uniform plate that is detachably connected to the gas-uniform sub-channel, and the gas-uniform plate can be easily installed or replaced as needed to meet different gas distribution requirements. It also has good scalability and flexibility, and can be adjusted and optimized according to different application scenarios.
[0019] As a further improvement of the above technical solution, a plurality of small holes are arranged on the first air equalizing plate, and the small holes penetrate the thickness of the first air equalizing plate, and the small holes on the edge area and corner area of the first air equalizing plate are denser than the small holes on the central area of the first air equalizing plate.
[0020] As a further improvement of the above technical solution, the density of small holes in the edge area and corner area of the first uniform gas plate is increased, so that the flow resistance of the gas in these areas is reduced, thereby avoiding the accumulation or retention of gas in these areas. At the same time, the density of small holes in the central area is relatively low, which can ensure the uniform diffusion of gas in the central area and avoid excessive concentration of gas in the central area, which not only improves the uniformity of gas flow, but also optimizes the overall efficiency of gas flow.
[0021] As a further improvement of the above technical solution, a plurality of diffusion holes are provided on the second air uniformizing plate, and the diffusion holes are evenly distributed on the second air uniformizing plate, and the width of the diffusion holes gradually increases from the top of the diffusion holes to the bottom of the diffusion holes.
[0022] As a beneficial effect of further improvement of the above technical solution, the gas is blown in from above the second air uniforming plate and blown out from the bottom through the diffusion holes. Due to the uniform distribution and gradually expanding design of the diffusion holes, the gas can be more evenly distributed in the target area when blown out from the bottom of the diffusion holes, thereby improving the gas utilization and diffusion effect.
[0023] A method for a fixed self-connected and distributed gas homogenization system for PECVD, comprising: Step 1: a first air inlet is arranged on the side of the lower cavity, a first air outlet is arranged on the top surface of the side wall of the lower cavity, the first air inlet and the first air outlet are communicated with each other through a first gas channel, and the first air inlet is connected to a special gas pipeline; Step 2: a second air inlet and a second air outlet are provided on the bottom surface of the upper chamber cover, wherein the second air inlet and the second air outlet are communicated with each other through a second gas channel, and the second air outlet is connected to a gas homogenizing component; Step three, a self-connecting gas sealing device is provided at the first gas outlet, and the upper cavity cover is pressed onto the lower cavity body by its own gravity, and the self-connecting gas sealing device connects the first gas channel and the second gas channel, so that a special gas passage is formed between the first gas channel, the self-connecting gas sealing device and the second gas channel; Step 4: A gas uniforming channel and a gas uniforming plate are provided on the gas uniforming assembly so that the special gas is transported to the entire lower cavity space through the gas uniforming pipeline and the gas uniforming plate.
[0024] As a beneficial effect of the above technical solution, the safety, convenience and efficiency of the operation are improved by avoiding directly connecting the special gas pipeline to the upper chamber cover that needs to be moved. This method not only improves maintenance efficiency, but also saves maintenance costs. It solves the problem of gas entering the upper chamber directly from the special gas pipeline, so that the maintenance process of the upper chamber can be carried out quickly, thereby saving maintenance time. In addition, by optimizing the gas distribution, the special gas can be evenly delivered to the entire lower chamber space, ensuring the consistency of the reaction environment in the chamber, thereby improving deposition uniformity and product quality. BRIEF DESCRIPTION OF THE DRAWINGS
[0025] Figure 1 It is a schematic diagram of the structure of the present invention; Figure 2 It is a structural schematic diagram of the connection between the lower cavity body and the upper cavity cover; Figure 3 is a schematic diagram of the structure of a self-connecting gas sealing device; Figure 4 It is a structural schematic diagram of the gas homogenizing component.
[0026] In the accompanying drawings: 1-lower cavity, 2-upper cavity cover, 3-gas uniforming assembly, 101-first gas channel, 102-first air inlet, 103-first air outlet, 201-second gas channel, 202-second air inlet, 203-second air outlet, 301-first gas uniforming main channel, 302-second gas uniforming main channel, 303-first gas uniforming secondary channel, 304-second gas uniforming secondary channel, 305-gas uniforming sub-channel, 306-first gas uniforming plate, 307-second gas uniforming plate, 308-small hole, 309-diffusion hole, 4-self-connecting gas sealing device, 401-sliding seal, 402-spring washer, 403-fixed seal, 404-limiting block, 405-first sealing ring, 406-second sealing ring, 407-third sealing ring, 408-fourth sealing ring. DETAILED DESCRIPTION
[0027] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the above briefly describes the drawings required for use in the description of the embodiments. Obviously, the drawings described are only part of the embodiments of the present invention, not all of the embodiments, and those skilled in the art can also obtain other design solutions and drawings based on these drawings without creative work.
[0028] The following will clearly and completely describe the concept, specific structure and technical effects of the present invention in combination with the embodiments and drawings, so as to fully understand the purpose, characteristics and effects of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, other embodiments obtained by technicians in this field without creative work are all within the scope of protection of the present invention. In addition, all the connection / connection relationships mentioned in the text do not refer to the direct connection of components, but refer to the formation of a better connection structure by adding or reducing connection accessories according to the specific implementation situation. The various technical features in the present invention can be combined interchangeably without conflicting with each other.
[0029] Glow discharge generates plasma, which is the core reaction mechanism of PECVD equipment. PECVD technology uses low-temperature plasma as an energy source, places the coated substrate on the glow discharge cathode in a low-pressure environment, and introduces an appropriate amount of reaction gas. Under the action of glow discharge, the gas undergoes a series of chemical and plasma reactions to form a solid film on the sample surface.
[0030] In the prior art, the gas usually enters from the center point of the upper cavity and is then preliminarily dispersed through a simple preliminary gas homogenization device so that the gas can diffuse as far as possible when entering the gas homogenization cavity. However, the existing gas supply pipeline must be manually disconnected when the upper cover of the cavity is opened. New seals need to be used after each reconnection, and leak detection needs to be re-performed. The operation of the special gas pipeline increases the safety risk. In the existing gas homogenization structure, although the uniformity of the gas is formed by the combination of a primary gas homogenization structure in the middle position and a microporous gas homogenization plate, the gas distribution is not uniform during the dynamic process. In principle, a uniform film cannot be deposited in places where the electric field is unevenly distributed.
[0031] To this end, a fixed self-connected and distributed gas homogenization system structure for PECVD is described in detail. Figure 1 to Figure 4, which includes a lower cavity 1, an upper cavity cover 2 and a gas uniforming component 3, the lower cavity 1 is provided with an opening at the top, a first gas channel 101 is provided inside the lower cavity 1, and the air inlet end of the first gas channel 101 is used to be connected to the special gas pipeline; the upper cavity cover 2 is covered at the opening, so that the upper cavity cover 2 can open or close the opening, a second gas channel 201 is provided inside the upper cavity cover 2, the air inlet end of the second gas channel 201 is connected to the air outlet end of the first gas channel 101, so that the first gas channel 101 and the second gas channel 201 form a special gas passage, the special gas passage is used to allow gas to enter the gas uniforming component 3, the gas uniforming component 3 is arranged below the upper cavity cover 2, the air inlet end of the gas uniforming component 3 is connected to the air outlet end of the second gas channel 201, and the gas uniforming component 3 is used to allow gas to pass into the internal space of the lower cavity 1 in a uniformly distributed manner.
[0032] By changing the connection between the gas delivery pipeline and the upper chamber cover 2 of the PECVD equipment and connecting it to the lower chamber 1 fixed below, the problem of frequent disassembly and assembly of the special gas system during the removal of the upper chamber cover 2 is avoided. The safety risks during operation are reduced, and the tangible and intangible costs caused by disassembly and assembly are reduced. Secondly, by changing the gas feeding method, the gas feeding and local dispersion method are changed to uniform distribution in the overall space, which greatly improves the uniformity of gas distribution. Combined with the microporous structure of the second gas homogenizing plate 307, it has a positive effect on the gas distribution of the overall reaction gas space. Finally, in actual production operation, a detachable first gas homogenizing plate 306 is designed. The first gas homogenizing plate 306 can be designed to have pores with different distribution densities, variable pore diameters and other structures, thereby improving the flexibility of gas uniformity adjustment. This design enables the system to better adapt to different production needs and further optimizes the uniformity of gas distribution.
[0033] When the internal maintenance or care of the reaction chamber needs to separate the upper cover of the chamber from the lower chamber 1, it is necessary to manually disconnect the special gas pipeline at a specific connection point before performing the separation operation of the chamber. Therefore, in one embodiment, a first air inlet 102 is provided on the side of the lower chamber 1, and a first air outlet 103 is provided on the top surface of the side wall of the lower chamber 1. A self-connecting gas sealing device 4 is provided at the first air outlet 103, and the first gas channel 101 connects the self-connecting gas sealing device 4 with the first air inlet 102, and the first air inlet 102 is connected to the special gas pipeline, and the self-connecting gas sealing device 4 is used to connect with the upper chamber cover 2. It avoids the trouble of frequently disassembling and assembling the special gas system during the removal of the upper chamber cover 2. It reduces the safety risk of the operation and also reduces the tangible and intangible costs increased during the disassembly and assembly process. Through the self-connecting gas sealing device 4, it is realized that when the upper chamber cover 2 is in a closed state, it is automatically connected to the gas sealing device and forms a closed special gas channel. During the disassembly process, the gas sealing device can be automatically disconnected from the cavity cover, thereby ensuring the sealing and safety of the entire system.
[0034] Potential safety hazards caused by gas leakage. Therefore, in one embodiment, the bottom surface of the upper cavity cover 2 is provided with a second air inlet 202 and a second air outlet 203, the second gas channel 201 connects the second air inlet 202 and the second air outlet 203, the second air inlet 202 is used to connect with the self-connecting gas sealing device 4, and the second air outlet 203 is connected with the air inlet end of the gas leveling component 3. By connecting the upper cavity cover 2 with the self-connecting gas sealing device 4, it is ensured that the gas can be smoothly and efficiently transmitted from the special gas pipeline to the inside of the cavity, and the smoothness of the transmission process greatly reduces the resistance and potential leakage risk during the gas flow, thereby improving the stability and safety of the entire system. By connecting the second air outlet 203 to the air inlet end of the gas leveling component 3, the uniform distribution effect of the gas in the cavity is further improved. It ensures that the concentration of the gas in each area inside the cavity is consistent, thereby avoiding the phenomenon of insufficient or uneven reaction caused by uneven local concentration. This improvement ensures the efficient operation of the entire system and improves the accuracy and repeatability of the reaction, thereby bringing higher reliability and stability to the entire process.
[0035] The connection between the first gas channel 101 and the second gas channel 201 needs to be attached when the chamber cover is sealed, and disconnected when the upper chamber cover is separated. Therefore, in one embodiment, the self-connecting gas sealing device 4 includes a sliding seal 401, a spring washer 402, a fixed seal 403 and a limiting block 404, the fixed seal 403 is arranged at the gas outlet end of the first gas channel 101, the sliding seal 401 is sleeved on the fixed seal 403, the spring washer 402 is sleeved on the fixed seal 403, one end of the spring washer 402 is connected to the fixed seal 403, and the other end of the spring washer 402 is connected to the sliding seal 401, the limiting block 404 is arranged at the top of the first gas outlet 103, the limiting block 404 is used to limit the sliding seal 401, the sliding seal 401 and the fixed seal 403 are provided with ventilation holes extending along the axial direction of the first gas outlet 103, so that the gas in the first gas channel 101 can be discharged through the first gas outlet 103. When the upper chamber cover 2 is opened, due to the action of the spring washer 402, the sliding seal 401 will abut against the limiting block 404, so that the end of the sliding seal 401 protrudes from the top surface of the side wall of the lower chamber 1, providing a good preset condition for the sealing after the upper chamber cover 2 is closed. When the upper chamber cover 2 is closed, the upper chamber cover 2 is pressed on the lower chamber 1 by its own gravity, and the sliding seal 401 moves toward the fixed seal 403 after overcoming the elastic force of the spring until the sliding seal 401 fully abuts against the bottom surface of the upper chamber cover 2. This process ensures the sealed connection between the first gas channel 101 and the second gas channel 201, thereby forming a special gas channel. This special gas channel not only ensures the smooth flow of gas, but also greatly improves the sealing performance and reliability of the system.
[0036] The sealing performance of the device must meet the standard to ensure that the system can operate stably in various working environments and avoid leakage, contamination or other potential problems caused by poor sealing. Therefore, during the design and manufacturing process, the sealing performance of the device must be strictly tested and optimized to ensure its reliability and safety in actual applications. Therefore, in one embodiment, the self-connecting gas sealing device 4 also includes a first sealing ring 405, a second sealing ring 406 and a third sealing ring 407, one end of the first sealing ring 405 is abutted against the bottom surface of the fixed seal 403, the other side of the first sealing ring 405 is abutted against the gas outlet end of the first gas channel 101, the first sealing ring 405 is used to seal the fixed seal 403 and the first gas channel 101, the second sealing ring 406 is sleeved on the outer side surface of the fixed seal 403, the outer side surface of the second sealing ring 406 is abutted against the inner side surface of the sliding seal 401, the second sealing ring 406 is used to seal the fixed seal 403 and the sliding seal 401, the third sealing ring 407 is arranged on the top surface of the sliding seal 401, the third sealing ring 407 is abutted against the bottom surface of the upper chamber cover 2 when the upper chamber cover 2 is closed, and the third sealing ring 407 is used to seal the sliding seal 401 and the second air inlet 202. Through this improvement, the self-connecting gas sealing device 4 further improves the sealing performance on the original basis, ensures the sealing effect of the gas during the transmission process, and thus improves the stability and reliability of the entire system. This improvement can not only reduce the safety hazards caused by gas leakage, but also extend the service life of the equipment and reduce maintenance costs.
[0037] Gas may leak out from the gap between the first air inlet 102 and the special gas pipeline. Therefore, in one embodiment, a fourth sealing ring 408 is provided on the outer wall of the lower cavity 1, and the first air inlet 102 is correspondingly located in the fourth sealing ring 408, and the fourth sealing ring 408 is used to seal the first air inlet 102 and the special gas pipeline. By setting the fourth sealing ring 408, the sealing performance between the first air inlet 102 and the special gas pipeline is significantly improved, the system is more stable during operation, and there will be no performance fluctuations due to gas leakage. It can also effectively prevent the leakage of harmful gases and reduce pollution to the environment.
[0038] Since the gas enters from directly above the gas uniformizing plate, this will cause the coating around the gas uniformizing plate to be slower than the coating in the middle area. At the same time, in order to ensure the vacuum environment in the chamber, the gas inside the chamber is generally extracted through the edge first. Therefore, in one embodiment, the gas uniformizing component 3 includes a first gas uniformizing main channel 301, a second gas uniformizing main channel 302, a first gas uniformizing secondary channel 303, a second gas uniformizing secondary channel 304, a plurality of gas uniformizing sub-channels 305, a first gas uniformizing plate 306 and a second gas uniformizing plate 307, the first gas uniformizing main channel 301, the first gas uniformizing main channel 301 is connected to the second gas outlet 203 by a pipe, the second gas uniformizing main channel 302 is connected to the second gas outlet 203 by a pipe, the first gas uniformizing secondary channel The gas inlet end of the gas-uniform component 303 is connected to the gas outlet end of the first gas-uniform main channel 301, the gas inlet end of the second gas-uniform secondary channel 304 is connected to the gas outlet end of the second gas-uniform main channel 302, one end of all the gas-uniform sub-channels 305 is connected to the gas outlet end of the first gas-uniform secondary channel 303, the other end of all the gas-uniform sub-channels 305 is connected to the gas outlet end of the second gas-uniform secondary channel 304, and all the gas-uniform sub-channels 305 are provided with a first gas-uniform plate 306 detachably connected to the gas-uniform sub-channel 305. The gas enters the gas-uniform component 3 from the second gas outlet 203, is evenly distributed to the two main channels, and then evenly enters the secondary channels from the main channels, flows evenly from the first gas-uniform secondary channel 303 to the second gas-uniform secondary channel 304, and then achieves a finer gas distribution through multiple sub-channels, thereby improving the uniform distribution capability of the gas, reducing turbulence and dead zones in the gas flow, and thus improving the overall gas processing efficiency. All the gas homogenizing sub-channels 305 are provided with a first gas homogenizing plate 306 detachably connected to the gas homogenizing sub-channels 305. The gas homogenizing plate can be easily installed or replaced as needed to adapt to different gas distribution requirements. It also has good scalability and flexibility and can be adjusted and optimized according to different application scenarios.
[0039] From the perspective of the gas uniformity structure, the gas uniformity formed by the primary uniformity structure in the middle position and the structure of the microporous uniformity plate is not evenly distributed during the dynamic process. Therefore, in one embodiment, a plurality of small holes 308 are arranged on the first uniformity plate 306, and the small holes 308 run through the thickness of the first uniformity plate 306, and the small holes 308 on the edge area and the corner area of the first uniformity plate 306 are denser than the small holes 308 on the central area of the first uniformity plate 306. The density of the small holes 308 in the edge area and the corner area of the first uniformity plate 306 is increased, so that the flow resistance of the gas in these areas is reduced, thereby avoiding the accumulation or retention of the gas in these areas. At the same time, the density of the small holes 308 in the central area is relatively low, which can ensure the uniform diffusion of the gas in the central area, avoid excessive concentration of the gas in the central area, not only improve the uniformity of the gas flow, but also optimize the overall efficiency of the gas flow.
[0040] During the PECVD process, the distribution space of the discharge product is determined by the distribution of the electric field. If the electric field is unevenly distributed, the grown film cannot be uniform. In principle, a uniform film cannot be deposited in places where the electric field is unevenly distributed. Therefore, in one embodiment, a plurality of diffusion holes 309 are provided on the second gas homogenizing plate 307. The diffusion holes 309 are evenly distributed on the second gas homogenizing plate 307. The width of the diffusion holes 309 gradually increases from the top of the diffusion holes 309 to the bottom of the diffusion holes 309. The gas is blown in from the top of the second gas homogenizing plate 307 and blown out from the bottom through the diffusion holes 309. Due to the uniform distribution and gradually expanding design of the diffusion holes 309, the gas can be more evenly distributed in the target area when it is blown out from the bottom of the diffusion holes 309, thereby improving the utilization rate and diffusion effect of the gas.
[0041] A method for a fixed self-connected and distributed gas homogenization system for PECVD, comprising: Step 1: a first air inlet 102 is provided on the side of the lower cavity 1, a first air outlet 103 is provided on the top surface of the side wall of the lower cavity 1, the first air inlet 102 and the first air outlet 103 are communicated with each other through a first gas channel 101, and the first air inlet 102 is connected to a special gas pipeline; Step 2: a second air inlet 202 and a second air outlet 203 are provided on the bottom surface of the upper chamber cover 2, wherein the second air inlet 202 and the second air outlet 203 are connected through the second gas channel 201, and the second air outlet 203 is connected to the gas homogenizing component 3; Step three, a self-connecting gas sealing device 4 is provided at the first gas outlet 103, and the upper chamber cover 2 is pressed onto the lower chamber 1 by its own gravity, and the self-connecting gas sealing device 4 connects the first gas channel 101 and the second gas channel 201, so that a special gas passage is formed between the first gas channel 101, the self-connecting gas sealing device 4 and the second gas channel 201; Step 4: A gas uniforming channel and a gas uniforming plate are provided on the gas uniforming component 3, so that the special gas is transported to the entire lower cavity 1 space through the gas uniforming pipeline and the gas uniforming plate.
[0042] It avoids directly connecting the special gas pipeline to the upper chamber cover 2 that needs to be moved, improving the safety, convenience and efficiency of the operation. This method not only improves maintenance efficiency, but also saves maintenance costs. It solves the problem of gas entering the upper chamber directly from the special gas pipeline, so that the maintenance process of the upper chamber can be carried out quickly, thereby saving maintenance time. In addition, by optimizing the gas distribution, the special gas can be evenly delivered to the entire lower chamber 1 space, ensuring the consistency of the reaction environment in the chamber, thereby improving the deposition uniformity and product quality.
[0043] The preferred embodiments of the present invention are described in detail above, but the present invention is not limited to the embodiments. Those skilled in the art may make various equivalent modifications or substitutions without violating the spirit of the present invention. These equivalent modifications or substitutions are all included in the scope defined by the claims of this application.
Claims
1. A fixed self-connected and distributed gas homogenization system structure for PECVD, characterized in that: include: A lower cavity (1), wherein the top of the lower cavity (1) is provided with an opening, a first gas channel (101) is provided inside the lower cavity (1), and an air inlet end of the first gas channel (101) is used to be connected to a special gas pipeline; an upper chamber cover (2), the upper chamber cover (2) being arranged at the opening so that the upper chamber cover (2) can open or close the opening, a second gas channel (201) being arranged inside the upper chamber cover (2), an air inlet end of the second gas channel (201) being connected to an air outlet end of the first gas channel (101), so that the first gas channel (101) and the second gas channel (201) form a special gas channel, the special gas channel being used to allow gas to enter the gas homogenizing component (3); A gas leveling component (3), the gas leveling component (3) being arranged below the upper chamber cover (2), the gas inlet end of the gas leveling component (3) being connected to the gas outlet end of the second gas channel (201), the gas leveling component (3) being used to allow gas to be evenly distributed into the internal space of the lower chamber (1).
2. A fixed self-connected and distributed gas homogenizing system structure for PECVD according to claim 1, characterized in that: A first air inlet (102) is provided on the side of the lower cavity (1), a first air outlet (103) is provided on the top surface of the side wall of the lower cavity (1), a self-connecting gas sealing device (4) is provided at the first air outlet (103), the first gas channel (101) connects the self-connecting gas sealing device (4) with the first air inlet (102), the first air inlet (102) is connected to the special gas pipeline, and the self-connecting gas sealing device (4) is used to connect with the upper cavity cover (2).
3. A fixed self-connected and distributed gas homogenizing system structure for PECVD according to claim 2, characterized in that: The bottom surface of the upper chamber cover (2) is provided with a second air inlet (202) and a second air outlet (203); the second gas channel (201) is connected to the second air inlet (202) and the second air outlet (203); the second air inlet (202) is used to connect to the self-connecting gas sealing device (4); and the second air outlet (203) is connected to the air inlet end of the gas homogenizing component (3).
4. A fixed self-connected and distributed gas homogenizing system structure for PECVD according to claim 3, characterized in that: The self-connecting gas sealing device (4) comprises a sliding seal (401), a spring washer (402), a fixed seal (403) and a limiting block (404); the fixed seal (403) is arranged at the gas outlet end of the first gas channel (101); the sliding seal (401) is sleeved on the fixed seal (403); the spring washer (402) is sleeved on the fixed seal (403); one end of the spring washer (402) is connected to the fixed seal (403); The other end of the spring washer (402) is connected to the sliding seal (401), and the limiting block (404) is arranged at the top of the first air outlet (103). The limiting block (404) is used to limit the sliding seal (401). The sliding seal (401) and the fixed seal (403) are provided with ventilation holes extending along the axial direction of the first air outlet (103) so that the gas in the first gas channel (101) can be discharged through the first air outlet (103).
5. A fixed self-connected and distributed gas homogenizing system structure for PECVD according to claim 4, characterized in that: The self-connecting gas sealing device (4) further comprises a first sealing ring (405), a second sealing ring (406) and a third sealing ring (407), one end of the first sealing ring (405) abuts against the bottom surface of the fixed seal (403), the other side of the first sealing ring (405) abuts against the gas outlet end of the first gas channel (101), the first sealing ring (405) is used to seal the fixed seal (403) and the first gas channel (101), and the second sealing ring (406) is sleeved on the outer surface of the fixed seal (403). On the side, the outer side surface of the second sealing ring (406) abuts against the inner side surface of the sliding seal (401), and the second sealing ring (406) is used to seal the fixed seal (403) and the sliding seal (401). The third sealing ring (407) is arranged on the top surface of the sliding seal (401), and the third sealing ring (407) abuts against the bottom surface of the upper chamber cover (2) when the upper chamber cover (2) is closed. The third sealing ring (407) is used to seal the sliding seal (401) and the second air inlet (202).
6. A fixed self-connected and distributed gas homogenizing system structure for PECVD according to claim 2, characterized in that: A fourth sealing ring (408) is provided on the outer wall of the lower cavity (1), the first air inlet (102) is correspondingly located inside the fourth sealing ring (408), and the fourth sealing ring (408) is used to seal the first air inlet (102) and the special gas pipeline.
7. A fixed self-connected and distributed gas homogenizing system structure for PECVD according to claim 3, characterized in that: The gas homogenizing component (3) comprises a first gas homogenizing main channel (301), a second gas homogenizing main channel (302), a first gas homogenizing secondary channel (303), a second gas homogenizing secondary channel (304), a plurality of gas homogenizing sub-channels (305), a first gas homogenizing plate (306) and a second gas homogenizing plate (307); the first gas homogenizing main channel (301), the first gas homogenizing main channel (301) and the second gas outlet (203) are connected via a pipeline; the second gas homogenizing main channel (302) and the second gas outlet (203) are connected via a pipeline; the first gas homogenizing secondary channel (303) ) is connected to the air outlet end of the first air uniforming main channel (301), the air inlet end of the second air uniforming secondary channel (304) is connected to the air outlet end of the second air uniforming main channel (302), one end of all the air uniforming sub-channels (305) is connected to the air outlet end of the first air uniforming secondary channel (303), the other end of all the air uniforming sub-channels (305) is connected to the air outlet end of the second air uniforming secondary channel (304), and all the air uniforming sub-channels (305) are provided with a first air uniforming plate (306) detachably connected to the air uniforming sub-channels (305).
8. A fixed self-connected and distributed gas homogenizing system structure for PECVD according to claim 7, characterized in that: A plurality of small holes (308) are provided on the first air homogenizing plate (306), the small holes (308) running through the thickness of the first air homogenizing plate (306), and the small holes (308) on the edge region and the corner region of the first air homogenizing plate (306) are denser than the small holes (308) on the central region of the first air homogenizing plate (306).
9. A fixed self-connected and distributed gas homogenizing system structure for PECVD according to claim 7, characterized in that: The second air-distributing plate (307) is provided with a plurality of diffusion holes (309), the diffusion holes (309) being evenly distributed on the second air-distributing plate (307), and the width of the diffusion holes (309) gradually increasing from the top of the diffusion hole (309) to the bottom of the diffusion hole (309).
10. A method for a PECVD fixed self-connected and distributed gas homogenization system, characterized in that: include: Step 1: a first air inlet (102) is provided on the side of the lower cavity (1), a first air outlet (103) is provided on the top surface of the side wall of the lower cavity (1), the first air inlet (102) and the first air outlet (103) are communicated with each other through a first gas channel (101), and the first air inlet (102) is connected to a special gas pipeline; Step 2: a second air inlet (202) and a second air outlet (203) are provided on the bottom surface of the upper chamber cover (2), wherein the second air inlet (202) and the second air outlet (203) are connected via a second gas channel (201), and the second air outlet (203) is connected to the gas homogenizing component (3); Step three, a self-connecting gas sealing device (4) is provided at the first gas outlet (103), and the upper chamber cover (2) is pressed onto the lower chamber body (1) by its own gravity, and the self-connecting gas sealing device (4) connects the first gas channel (101) and the second gas channel (201), so that a special gas passage is formed between the first gas channel (101), the self-connecting gas sealing device (4) and the second gas channel (201); Step 4: A gas uniformity channel and a gas uniformity plate are arranged on the gas uniformity component (3), so that the special gas is transported to the entire lower cavity (1) space through the gas uniformity channel and the gas uniformity plate.