Device and method for detecting dynamic performance of motion platform and photoetching equipment

Abstract

The invention provides a detection device and a detection method for dynamic performance of a motion table and photoetching equipment, the detection device comprises an illumination unit, a grating mask, an objective lens, a transmission slit and a detection unit which are arranged in sequence, the grating mask is arranged on a mask table, the transmission slit and the detection unit are arranged on a workpiece table, and when the mask table and / or the workpiece table move, the objective lens is arranged in the transmission slit. The imaging on the transmission slit and the transmission slit are relatively fixed, and the detection unit is used for detecting the signal change of the detection light spot passing through the transmission slit so as to detect the dynamic performance of the mask table and / or the workpiece table. According to the method, the dynamic performance of the moving table of the photoetching machine is detected by using relatively common parts and parts in the photoetching equipment, the parts are relatively simple to configure, the corresponding detection method is relatively simple, convenient and efficient, and additional consumables do not need to be consumed in the detection process.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to a motion table dynamic performance detection device, detection method and photolithography equipment. Background Art

[0002] As integrated circuits develop rapidly towards large-scale and high-integration, the precision requirements for lithography equipment are becoming higher and higher. Among them, the dynamic performance of the motion stage, as the moving part for loading substrates and masks in lithography equipment, will directly affect the exposure accuracy and efficiency, so it is very important to improve the dynamic performance of the motion stage.

[0003] Taking the step-and-scan lithography equipment as an example, its moving stage includes a mask stage above the objective lens and a workpiece stage below the objective lens, which are respectively used to load the mask and the substrate to be photolithography, and the scanning exposure is completed by utilizing the synchronous relative movement of the mask and the substrate. Therefore, its dynamic performance includes not only the dynamic performance of the workpiece stage (used to carry the wafer), but also the dynamic performance of the mask stage (used to carry the mask) and the synchronous relative movement (coordinated motion) of the two.

[0004] However, the existing method of detecting the dynamic performance of the above-mentioned motion platform by photolithography on the recording medium not only has low accuracy, but also affects efficiency. Summary of the invention

[0005] The object of the present invention is to provide a motion stage dynamic performance detection device, detection method and lithography equipment to improve the accuracy and efficiency of the motion stage dynamic performance detection.

[0006] In order to solve the above technical problems, the present invention provides a dynamic performance detection device for a moving stage, wherein the moving stage includes a mask stage and / or a workpiece stage, and the dynamic performance detection device for the moving stage includes an illumination unit, a grating mask, an objective lens, a transmission slit and a detection unit arranged in sequence, the grating mask is arranged on the mask stage, the transmission slit and the detection unit are arranged on the workpiece stage, and when the mask stage and / or the workpiece stage moves, the light emitted by the illumination unit passes through the grating mask and the objective lens and is projected onto the transmission slit, and the image is in a relatively fixed position with the transmission slit, and the detection unit detects the signal change of the detection light spot passing through the transmission slit to detect the dynamic performance of the moving stage.

[0007] Optionally, the transmission slit includes a transmission grating, p:p'=1:k, p is the grating period of the grating mask, p' is the grating period of the transmission grating, and k is the magnification of the objective lens.

[0008] Optionally, it also includes a light modulation unit, the modulation frequency of which matches the motion state and motion speed of the motion platform.

[0009] Optionally, when the mask stage moves horizontally at a speed v and the workpiece stage is fixed, the modulation frequency f of the light modulation unit is v / p, where p is the grating period of the grating mask.

[0010] Optionally, when the workpiece stage moves horizontally at a speed v' and the mask stage is fixed, the modulation frequency f of the light modulation unit is = v' / p', where p' is the grating period of the transmission grating.

[0011] Optionally, a phase-locked amplifier unit is further included, which outputs a reference signal to the detection unit, wherein the frequency of the reference signal is the same as the frequency of the modulation frequency, and a phase-locked amplification method is used to amplify the signal changes detected by the detection unit using the reference signal to detect the dynamic performance of the mask stage or the workpiece stage.

[0012] Optionally, a spatial filter is also included, which is arranged between the grating mask and the transmission slit to increase the spatial frequency.

[0013] Optionally, a rectification and filtering unit is further included, which is connected to the detection unit signal and is used to extract the component reflecting the motion performance of the motion platform from the signal of the detection light spot.

[0014] Optionally, when the mask stage and the workpiece stage move together in the horizontal direction, v:v'=1:k, v is the movement speed of the grating mask, v' is the movement speed of the transmission slit, and k is the magnification of the objective lens.

[0015] Optionally, two groups of light modulation units are included, and the polarization directions of the two groups of light modulation units are orthogonal, so as to simultaneously obtain two groups of complementary detection light spots.

[0016] Optionally, the light modulation unit adopts a photoelastic modulation method, including a polarizer arranged between the illumination unit and the mask grating, a photoelastic modulator arranged between the polarizer and the mask grating, and an analyzer arranged between the transmission slit and the detection unit.

[0017] Optionally, the grating line direction of the grating mask is the same as the opening direction of the transmission slit, and the grating line direction of the grating mask is perpendicular to the movement direction of the mask stage and / or the workpiece stage, and is used to detect the performance of the mask stage and / or the workpiece stage in its movement direction; or, the grating line direction of the grating mask is parallel to the movement direction of the mask stage and / or the workpiece stage, and is used to detect the movement performance of the mask stage and / or the workpiece stage perpendicular to its movement direction.

[0018] According to another aspect of the present invention, a method for detecting dynamic performance of a motion stage is also provided, wherein the motion stage includes a mask stage and / or a workpiece stage, and the detection method includes:

[0019] Obtaining a detection light spot, when the mask stage and / or the workpiece stage moves, the grating image of the light beam projected on the transmission slit through the grating mask and the transmission mark of the transmission slit are in a relatively fixed position, and the image on the detection unit after passing through the transmission slit is used as the detection light spot;

[0020] A component of the detection light spot that reflects the motion performance of the mask stage and / or the workpiece stage is obtained.

[0021] Optionally, when the moving stage moves, the transmission slit is aligned with a side edge of the grating imaging to form a first detection light spot, and a signal of the first detection light spot is obtained;

[0022] The transmission slit is aligned with an edge of an opposite side of the grating imaging to form a second detection light spot, and a signal of the second detection light spot is obtained;

[0023] The signal of the first detection light spot is subtracted from the signal of the second detection light spot to obtain the dynamic performance of the motion stage.

[0024] Based on another aspect of the present invention, a lithography device is also provided, including a moving stage and a moving stage dynamic performance detection device, the moving stage including a mask stage and / or a workpiece stage, the moving stage dynamic performance detection device including an illumination unit, a grating mask, an objective lens, a transmission slit and a detection unit arranged in sequence, the grating mask is arranged on the mask stage, the transmission slit and the detection unit are arranged on the workpiece stage, when the mask stage and / or the workpiece stage moves, the light emitted by the illumination unit passes through the light modulation unit, the grating mask and the objective lens, and the image projected onto the transmission slit is in a relatively fixed position with the transmission slit, and the signal change of the light spot passing through the transmission slit is detected by the detection unit to detect the dynamic performance of the mask stage and / or the workpiece stage.

[0025] Optionally, a light modulation unit is also included, which is arranged between the lighting unit and the grating mask.

[0026] In summary, the dynamic performance detection device of the motion stage provided by the present invention includes an illumination unit, a grating mask, an objective lens, a transmission slit and a detection unit which are arranged in sequence, and a mask grating is arranged on the mask stage, and a transmission slit and a detection unit are arranged on the workpiece stage. When the mask stage and / or the workpiece stage moves, the image of the light emitted by the illumination unit projected onto the transmission slit after passing through the grating mask and the objective lens is in a relatively fixed position with the transmission slit, and the detection unit is used to measure the signal of the detection spot formed by passing through the transmission slit to detect the dynamic performance of the mask stage and / or the workpiece stage. Compared with the detection method using recording medium photolithography dot in the related method, the detection device of the present invention can use more common components and components in the photolithography equipment to realize dynamic performance detection including the workpiece stage and the mask stage, the component configuration is relatively simple, and the corresponding detection method is relatively simple and efficient, and no additional consumables are required during the detection process. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Those skilled in the art should understand that the drawings are provided for a better understanding of the present invention and do not constitute any limitation to the present invention.

[0028] Figure 1 Schematic diagram of the dynamic performance detection device for the sports platform provided in Example 1

[0029] Figure 2 is a schematic diagram of grating imaging and transmission slits provided in Example 1;

[0030] Figure 3 A schematic diagram of a motion platform dynamic performance detection device provided in Example 2;

[0031] Figure 4a is a schematic diagram of photoelastic modulation provided by Example 2;

[0032] Figure 4b is a schematic diagram of another photoelastic modulation provided by the second embodiment;

[0033] Figure 5a A schematic diagram of detecting the dynamic performance of a mask stage provided in Example 3;

[0034] Figure 5b A schematic diagram of another method for detecting the dynamic performance of a workpiece platform provided in Embodiment 3;

[0035] Figure 6 A schematic diagram of the coordinated motion of the detection mask stage and the workpiece stage provided in the fourth embodiment;

[0036] Figure 7a A schematic diagram of detecting the dynamic performance of the mask stage perpendicular to its movement direction provided in Embodiment 5;

[0037] Figure 7bA schematic diagram of detecting the dynamic performance of a workpiece platform perpendicular to its moving direction provided in Embodiment 5;

[0038] Figure 7c This is a schematic diagram of detecting the dynamic performance of the mask stage and the workpiece stage perpendicular to their coordinated motion direction provided in Example 5.

[0039] In the attached figure:

[0040] 10-illumination unit; 20-light modulation unit; 20a-first light modulation unit; 20b-second light modulation unit; 21-polarizer; 21a-first polarizer; 21b-second polarizer; 22-photoelastic modulator; 22a-first photoelastic modulator; 22b-second photoelastic modulator; 23-compensator; 23a-first compensator; 23b-second compensator; 24-polarizer; 24a-first polarizer; 24b-second polarizer; 30-mask stage; 31-grating mask; 32-grating imaging; 40-objective lens; 50-workpiece stage; 51-transmission slit; 511-transmission mark; 51a-first transmission slit; 51b-second transmission slit; 52-detection unit; 52a-first detection unit; 52b-second detection unit. DETAILED DESCRIPTION

[0041] In order to make the purpose, advantages and features of the present invention clearer, the present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be noted that the drawings are all in a very simplified form and are not drawn to scale, and are only used to conveniently and clearly assist in explaining the purpose of the embodiments of the present invention. In addition, the structure shown in the drawings is often a part of the actual structure. In particular, the emphasis of each drawing is different, and sometimes different scales are used.

[0042] It should be understood that when an element or layer is referred to as "on...", "connected to" other elements or layers, it can be directly on other elements or layers, connected to other elements or layers, or there can be intervening elements or layers. On the contrary, when an element is referred to as "directly on...", "directly connected to" other elements or layers, there is no intervening element or layer. Although the terms first, second, third, etc. can be used to describe various elements, components, regions, layers and / or parts, these elements, components, regions, layers and / or parts should not be limited by these terms. These terms are only used to distinguish an element, component, region, layer or part from another element, component, region, layer or part. Therefore, without departing from the teachings of the present invention, the first element, component, region, layer or part discussed below can be expressed as a second element, component, region, layer or part. Spatial relationship terms such as "under...", "below", "below", "above...", "above", "above", etc., can be used here for the convenience of description to describe the relationship between an element or feature shown in the figure and other elements or features. It should be understood that, in addition to the orientation shown in the figure, the spatial relationship terms are intended to include different orientations of the devices in use and operation. For example, if the device in the accompanying drawings is turned over, then, the elements or features described as "under...", "below", "below" will be oriented to be "on" other elements or features. The device can be oriented in other ways (rotated 90 degrees or other orientations) and the spatial descriptors used here are interpreted accordingly. The purpose of the terms used here is only to describe specific embodiments and is not intended to be a limitation of the present invention. When used here, the singular forms of "one", "one" and "said / the" are also intended to include plural forms, unless the context clearly indicates another way. It should also be understood that the term "including" is used to determine the existence of features, steps, operations, elements and / or parts, but does not exclude the existence or addition of one or more other features, steps, operations, elements, parts and / or groups. When used here, the term "and / or" includes any and all combinations of the relevant listed items.

[0043] Embodiment 1

[0044] Embodiment 1 provides a device for detecting dynamic performance of a sports platform.

[0045] Figure 1 This is a schematic diagram of the sports platform dynamic performance detection device provided in Example 1.

[0046] like Figure 1As shown, the detection device provided in this embodiment can be used to detect the dynamic performance of a moving stage, which includes a mask stage 30 and / or a workpiece stage 50. The moving stage dynamic performance detection device includes an illumination unit 10, a grating mask 31, an objective lens 40, a transmission slit 51 and a detection unit 52 which are arranged in sequence. The grating mask 31 is arranged on the mask stage 30, and the transmission slit 51 and the detection unit 52 are arranged on the workpiece stage 50. When the mask stage 30 and / or the workpiece stage 50 moves, the light emitted by the illumination unit 10 passes through the grating mask 31 and the objective lens 40, and the image projected on the transmission slit 51 is in a relatively fixed position with the transmission slit 51, and the detection unit 52 detects the signal change of the detection light spot passing through the transmission slit 51 to detect the dynamic performance of the mask stage 30 and / or the workpiece stage 50.

[0047] The lighting unit 10 may include a light source and a light path shaping lens group arranged in sequence, for providing a nearly collimated incident light beam for the detection device. In one example, the lighting unit 10 may be arranged above the mask stage 30 and opposite to the objective lens 40, and may use a broad spectrum light source.

[0048] Please continue to refer to Figure 1 , a grating mask 31 may be provided on the mask stage 30 for forming a grating pattern; an objective lens 40 is provided between the mask stage 30 and the work stage 50 for projecting a grating image onto the work stage 50; a transmission slit 51 and a detection unit 52 are provided on the work stage 50 (or in the work stage 50), and the opening direction (opening extension direction, long side direction) of the transmission slit 51 may be parallel to the grating line direction of the grating mask 31, so that when the grating image projected by the objective lens 40 is projected onto the transmission slit 51, at least part of it passes through the transmission slit 51 and forms a detection spot on the detection unit 52; the detection unit 52 may include a photoelectric sensor, such as a surface array sensor or a line scan sensor, and the detection unit 52 is used to obtain the signal change of the detection spot to obtain the dynamic performance of the motion stage. Among them, the objective lens 40 may use the projection objective lens 40 of the lithography machine to simplify the setting; the transmission slit 51 may preferably be a transmission grating, and the mask stage 30 and the work stage 50 may each be provided with a moving part to realize the horizontal four-degree-of-freedom movement of both. The four-degree-of-freedom movement of the mask stage 30 and the workpiece stage 50 in the horizontal direction can be divided into the X direction and the Y direction, where the X direction is perpendicular to the Y direction. In this embodiment and the following embodiments, the uniform horizontal movement of the mask stage 30 and / or the workpiece stage 50 along the X direction is taken as an example, and the direction perpendicular to its movement is the Y direction.

[0049] Taking the case where a transmission grating is used as the transmission slit 51 and a projection objective lens of a lithography machine is used as the objective lens 40 as an example, the grating period of the transmission grating, the grating period of the grating mask 31 and the magnification of the objective lens 40 may be in the following relationship:

[0050] p:p'=1:k

[0051] Wherein, p' is the grating period of the transmission grating, p is the grating period of the grating mask 31, and k is the magnification of the objective lens 40. K may be, for example, -0.25 (or 0.25), and the image after the objective lens 40 is reduced by 4 times, that is, the grating period p of the grating mask 31 is four times the grating period p' of the transmission grating, so that the grating image 32 formed (projected) on the plane of the transmission grating after being reduced by four times by the grating mask 31 and the objective lens 40 has the same size as the transmission mark 511 (its opening pattern) of the transmission grating, so that each detection spot formed on the detection unit 52 through the transmission grating has the same pattern as much as possible.

[0052] In this embodiment, when the mask stage 30 and / or the work stage 50 moves horizontally (e.g., in the X direction), the grating line direction (opening extension direction) of the transmission grating (or mask grating 31) is parallel to the horizontal movement direction of the mask stage 30 and / or the work stage 50, so that the grating image 32 and the transmission mark 511 of the transmission grating are relatively fixed as much as possible in a direction perpendicular to the movement direction (e.g., in the Y direction). Figure 2 If the mask stage 30 and / or the work stage 50 deviates in a direction perpendicular to the direction of movement (e.g., the Y direction), the relative position of the grating image 32 and the transmission mark 511 will change, thereby affecting the detection spot. Therefore, the motion performance of the mask stage 30 and / or the work stage 50 can be detected by detecting the signal change of the detection spot of the grating image 32 passing through the transmission grating on the detection unit 52. Please continue to refer to Figure 2 The transmission mark 511 of the transmission grating (for example, the center of the opening) can also be aligned with one side (in the long side direction) of the grating imaging 32, or the grating imaging 32 is projected onto one side (in the long side direction) of the transmission mark 511, so that the relative position change between the two is converted into a light intensity change of the detection spot, which is convenient for setting the detection unit 52.

[0053] For details, please refer to Figure 7a As shown, the mask stage 30 moves horizontally to the left (X direction), the workpiece stage 50 is fixed, and the grating lines of the mask grating 31 and the transmission grating both extend along the X direction, that is, the grating imaging 32 extends along the X direction, which is used to detect the dynamic performance of the mask stage 30 in the Y direction when it moves in the X direction.

[0054] Please refer to Figure 7b As shown, the workpiece stage 50 moves horizontally to the left (X direction), the mask stage 30 is fixed, and the grating lines of the mask grating 31 and the transmission grating both extend along the X direction, that is, the grating imaging 32 extends along the X direction, which is used to detect the dynamic performance of the workpiece stage 50 in the Y direction when it moves in the X direction.

[0055] Please refer to Figure 7cAs shown, the mask stage 30 and the workpiece stage 50 move in coordination in the X direction, that is, the mask stage 30 moves horizontally to the left, and the workpiece stage 50 moves horizontally to the right (X direction). The grating lines of the mask grating 31 and the transmission grating both extend along the X direction, that is, the grating imaging 32 extends along the X direction, which is used to detect the dynamic performance of the mask stage 30 in the Y direction when it moves in the X direction.

[0056] In particular, please refer to Figure 6 , in this embodiment, it can also be used to detect the dynamic performance of the coordinated motion of the mask stage 30 and the work stage 50 in the horizontal direction. When the mask stage 30 and the work stage 50 are in coordinated motion in the horizontal direction, the mask stage 30 and the work stage 50 are synchronously moving in the horizontal direction, and the speed and direction of the image (grating image 32) formed by the mask stage 30 on the work stage 50 and the work stage 50 (transmission mark 511) are the same and are in a relatively fixed position as much as possible. The grating line direction of the transmission grating (or mask grating 31) is orthogonal to the horizontal motion direction of the mask stage 30 or the work stage 50. If the matching degree (coordination degree) of the mask stage 30 and / or the work stage 50 changes (deteriorates) during the coordinated motion of the two, the relative position of the grating image 32 and the transmission mark 511 will change, thereby affecting the detection spot, so that the motion performance of the coordinated motion of the mask stage 30 and the work stage 50 can be detected by detecting the signal change of the detection spot.

[0057] Embodiment 2

[0058] Embodiment 2 provides a device for detecting dynamic performance of a sports platform.

[0059] Figure 3 This is a schematic diagram of the motion platform dynamic performance detection device provided in Example 2.

[0060] like Figure 3 As shown, the detection device provided in this embodiment can be used to detect the dynamic performance of a moving stage, which includes a mask stage 30 and / or a workpiece stage 50. The moving stage dynamic performance detection device includes an illumination unit 10, a light modulation unit 20, a grating mask 31, an objective lens 40, a transmission slit 51 and a detection unit 52 which are arranged in sequence. The grating mask 31 is arranged on the mask stage 30, and the transmission slit 51 and the detection unit 52 are arranged on the workpiece stage 50. When the mask stage 30 or the workpiece stage 50 moves, the opening state and the modulation frequency of the light modulation unit 20 match the movement state and the movement speed of the moving stage, so that the image of the light emitted by the illumination unit 10 projected on the transmission slit 51 after passing through the light modulation unit 20, the grating mask 31 and the objective lens 40 is in a relatively fixed position with the transmission slit 51, and the signal change of the detection light spot passing through the transmission slit 51 is detected by the detection unit 52 to detect the dynamic performance of the mask stage 30 and / or the workpiece stage 50.

[0061] Compared with the detection device of the first embodiment, the motion stage dynamic performance detection device provided in the second embodiment is further provided with a light modulation unit 20. It can be understood that if the light modulation unit 20 provided in the second embodiment is set to the off state, the light emitted by the illumination unit 10 passes through the light modulation unit 20 (not modulated), the grating mask 31, the objective lens 40, the transmission slit 51 and the detection unit 52 in sequence, so that the detection device provided in the second embodiment can have the same detection function as the detection device provided in the first embodiment, that is, it is used to detect the dynamic performance of the mask stage 30 and / or the work stage 50 perpendicular to its horizontal direction and to detect the dynamic performance of the mask stage 30 and the work stage 50 in their coordinated motion direction. The detection device provided in this embodiment can be used to detect the dynamic performance of the mask stage 30 or the work stage 50 in its horizontal direction by matching the modulation frequency of the light modulation unit 20 with the motion state and motion speed of the motion stage when the light modulation unit 20 is in the on state.

[0062] The arrangement of the illumination unit 10, the grating mask 31, the objective lens 40, the transmission slit 51 and the detection unit 52 may refer to the first embodiment. The light modulation unit 20 may be arranged between the illumination unit 10 and the mask stage 30, and is used to periodically modulate the incident light beam according to the modulation signal (so that the light passes periodically).

[0063] In one example, the light modulation unit 20 can adopt a mechanical modulation method, which is arranged between the lighting unit 10 and the mask stage 30, and realizes light modulation by periodically blocking (or transmitting) the light beam. For example, it can be an openable and closable light barrier, an optical chopper, etc.

[0064] In another example, see Figure 4a The light modulation unit 20 may adopt a photoelastic modulation method, and may include a polarizer 21, a photoelastic modulator 22, and an analyzer 24. The polarizer 21 and the photoelastic modulator 22 may be disposed between the illumination unit 10 and the mask stage 30, and the analyzer 24 may be disposed in front of the detection unit 52 (behind the transmission slit 51). Specifically, taking the use of piezoelectric crystals for photoelastic modulation as an example, the light modulation unit 20 may include a polarizer 21, a photoelastic modulator 22, a compensator 23, and an analyzer 24 disposed in sequence. The polarization direction (transmission direction) of the polarizer 21 can be 0°, the fast axis and slow axis of the photoelastic modulator 22 can be respectively ±45°, the compensator 23 can be, for example, a 1 / 4 wave plate, and the polarization direction of the analyzer 24 can be 0° or 90°. By inputting a modulation signal into the photoelastic modulator 22 so that the polarization state of the light passing through the photoelastic modulator 22 is periodically switched between 0° (linear polarization), circular polarization, 90° (linear polarization) and circular polarization, periodic light modulation can be achieved after passing through the compensator 23 and the analyzer 24.

[0065] In this embodiment, the opening direction (opening extension direction, long side direction) of the transmission slit 51 can be parallel to the grating line direction of the grating mask 31, and the grating line direction of the transmission grating (or mask grating 31) is orthogonal to the horizontal movement direction of the mask stage 30 or the work stage 50. By matching the modulation frequency of the light modulation unit 20 with the motion state and motion rate of the motion stage, the light modulation unit 20 makes the mask stage 30 (or work stage 50) move (step) a distance of a grating period of the mask grating 31 (or transmission grating) at the moment of each modulation, so that the grating imaging 32 and the transmission mark 511 are always in a relatively fixed position as much as possible (the same relative position as when the two are stationary). Of course, only when the mask stage 30 has ideal motion performance can the above two be always in a relatively fixed position. However, in practice, if it is difficult for the mask stage 30 to have ideal motion performance, the grating imaging 32 and the transmission mark 511 are not always in a relatively fixed position (compared with when they are stationary). Therefore, the motion performance of the mask stage can be detected by detecting the relative position change of the grating imaging 32 relative to the transmission mark 511.

[0066] In addition, compared with measuring twice to obtain the signals of the first detection light spot and the second detection light spot respectively, in this embodiment, two sets of light modulation units 20 with perpendicular polarization directions can be provided to simultaneously obtain two sets of complementary detection light spots to optimize the signal-to-noise ratio. Figure 4b The detection device includes a first light modulation unit 20a and a second light modulation unit 20b which are arranged in parallel. The first light modulation unit 20a may have a first polarizer 21a, a first photoelastic modulator 22a, a first compensator 23a and a first analyzer 24a. The second light modulation unit 20b may have a second polarizer 21b, a second photoelastic modulator 22b, a second compensator 23b and a second analyzer 24b. The polarization directions of the first polarizer 21a and the second polarizer 21b are perpendicular. The first photoelastic modulator 22a is the same as the second photoelastic modulator 22b and is modulated by the same adjustment signal. The first compensator 23a may be the same as the second compensator 23b. The polarization directions of the first analyzer 24a and the second analyzer 24b are the same and are perpendicular or parallel to the polarization direction of the first polarizer 21a (or the second polarizer 21b). Furthermore, the first transmission slit 51a and the first detection unit 52a, the second transmission slit 51b and the second detection unit 52b may be provided accordingly, so as to detect two groups of detection light spots at the same time. Figure 4b In the scheme shown, the same components therein may also be optimized, for example, two groups of light modulation units 20 may share a photoelastic modulator, a compensator, a polarizer, and / or a transmission slit, etc., but this embodiment is not limited thereto.

[0067] Embodiment 3

[0068] Embodiment 3 provides a method for detecting the dynamic performance of a sports platform.

[0069] This embodiment may adopt the motion stage dynamic performance detection device provided in the first embodiment to detect the dynamic performance of the mask stage 30 or the workpiece stage 50 in the horizontal motion direction.

[0070] In an example of the present embodiment, the mask stage 30 (the work stage 50 and the objective lens 40 are fixed) moves at a speed v in a uniform horizontal direction (e.g., X direction), the grating line direction of the grating mask 31 is the same as the opening direction (grating line direction) of the transmission slit 51 (e.g., a transmission grating), and the grating line directions of both are perpendicular to the movement direction of the mask stage 30 (e.g., Y direction), and the optical modulation unit 20 for detecting the performance of the mask stage 30 or the work stage 50 in its movement direction is in an on state and its modulation frequency f can be:

[0071] f=v / p

[0072] Wherein, p is the grating period of the grating mask 31, f is the modulation frequency of the light modulation unit 20, and v is the horizontal movement speed of the mask stage 30. At each instant when the light modulation unit 20 is modulated at the above frequency f, the mask stage 30 is similar to moving (stepping) a distance of a grating period of the mask grating 31, and according to the relationship between the mask grating 31 and the transmission grating, it is equivalent to the grating imaging 32 moving (stepping) a distance of a grating period p' of the transmission grating on the transmission grating plane, so that the grating imaging 32 and the transmission mark 511 are always in a relatively fixed position (the same as the relative position when the two are stationary). Of course, only when the mask stage 30 has an ideal motion performance can the above two be always in a relatively fixed position, but in practice, if the mask stage 30 is difficult to have an ideal motion performance, the grating imaging 32 and the transmission mark 511 are not always in a relatively fixed position (compared with the stationary state), so that the motion performance of the mask stage can be detected by detecting the relative position change of the grating imaging 32 relative to the transmission mark 511.

[0073] Please refer to Figure 5a , the mask stage 30 moves horizontally to the left, and the grating imaging 32 moves horizontally to the right. The transmission mark 511 of the transmission grating can be, for example, aligned with the left side of the grating imaging 32. If the actual position of the grating imaging 32 is slightly behind the preset position, the light intensity detected by the detection unit 52 will be slightly greater than the preset light intensity. If the actual position of the grating imaging 32 is slightly ahead of the preset position, the light intensity detected by the detection unit 52 will be slightly less than the preset light intensity. By recording the change of light intensity over time by the detection unit 52, not only the actual moving speed of the mask stage 30 can be detected, but also the stability of the mask stage 30 during movement, that is, the dynamic stability, can be detected.

[0074] Please refer to Figure 5bIn other examples of this embodiment, if the mask stage 30 is fixed and the workpiece stage 50 is moving horizontally to the right at a constant speed, it can be used to detect the motion performance of the workpiece stage 50. The light modulation unit 20 is in an on state and its modulation frequency is f, so that the grating imaging 32 and the transmission mark 511 are always in a relatively fixed position,

[0075] f=v' / p'

[0076] Wherein, p' is the grating period of the transmission grating, f is the modulation frequency of the light modulation unit 20, and v' is the horizontal motion speed of the workpiece stage 50. The detection principle and detection method are similar to those of detecting the motion performance of the mask stage 30, and will not be described in detail here.

[0077] Please refer to Figure 4a , using Figure 4a Taking the photoelastic modulation method shown in FIG. 1 and the horizontal movement of the mask stage 30 as an example, the intensity of the outgoing light passing through the polarizer 21 (polarization direction is, for example, 0°) is recorded as 1, and its Jones matrix can be The Jones matrix of the outgoing light after passing through the photoelastic modulator 22 can be expressed as Modulation depth of the photoelastic modulator 22 The compensator 23 can be a 1 / 4 wave plate, that is, the compensation phase is The optical signal after passing through the polarizer 24 (polarization direction is, for example, 90°) can be That is, the light intensity can be For periodic gratings, only the fundamental sinusoidal frequency light component can be considered, and its fundamental sinusoidal frequency light component can be

[0078]

[0079] When the optical modulation is turned on, the above modulated sinusoidal fundamental frequency optical component can be

[0080]

[0081] Wherein, f is the modulation frequency, p is the grating period of the grating mask 31, and v is the horizontal movement speed of the mask stage 30. In this embodiment, since the modulation frequency f, the grating period p, and the horizontal movement speed v exist: f = v / p, it is substituted into the modulated sinusoidal fundamental frequency light component, and the slowly varying component including the speed v is extracted from it.

[0082]

[0083] Among them, ε is a fixed constant, which only reflects The Fourier decomposition characteristics of the fundamental frequency are used to measure the dynamic performance of the mask stage 30, that is, the horizontal motion speed v and its changes. It should be understood that the modulated sinusoidal fundamental frequency light component may include a slowly varying component and a rapidly changing component. The frequency of the rapidly changing component is the same as or higher than the modulation frequency and can be used to reflect changes related to light modulation, while the slowly varying component directly reflects the changes in the horizontal motion speed v.

[0084] In one example, a rectification and filtering unit may be further provided after the detection unit 52, and the rectification and filtering unit may be used to filter out the fast-changing components in the detection spot light intensity signal and only retain the slowly-changing components therein, so as to optimize the calculation process.

[0085] In other examples, a phase-locked amplifier unit may be provided in the motion stage dynamic performance detection device. The phase-locked amplifier unit outputs a reference signal to the detection unit 52. The frequency of the reference signal is the same as the frequency of the modulation frequency. The reference signal is used to perform a phase-locked amplification method on the signal detected by the detection unit 52 to obtain a fast-changing component. The fast-changing component in the detection signal is then filtered out to obtain a slowly changing component for detecting the dynamic performance of the mask stage 30 or the workpiece stage 50.

[0086] In addition, a spatial filter may be provided between the mask stage 30 (mask grating 31) and the transmission slit 51 (work stage 50) to improve the spatial resolution of the detection spot. In a preferred example, the spatial filter may be provided in the objective lens 40 to improve the spatial resolution. Of course, after the spatial filter is provided, the grating period of the transmission grating may be reduced so that after the spatial filter affects the size of the grating imaging 32, the grating imaging 32 and the transmission mark 511 have the same pattern (spot width and tooth pitch of adjacent spots).

[0087] Embodiment 4

[0088] Embodiment 4 provides a method for detecting the dynamic performance of a sports platform.

[0089] This embodiment can use the motion stage dynamic performance detection device provided in the first or second embodiment to detect the dynamic performance of the coordinated motion of the mask stage 30 and the work stage 50 in the horizontal direction. When the mask stage 30 and the work stage 50 are in coordinated motion in the horizontal direction, the mask stage 30 and the work stage 50 move synchronously in the horizontal direction and the image of the mask stage 30 on the work stage 50 is the same as the speed and direction of the work stage 50 and remains relatively still.

[0090] In this embodiment, the transmission slit 51 can be a transmission grating, and the grating line direction of the transmission slit 51 is the same as the grating line direction of the grating mask 31. Moreover, the light modulation unit is in a closed state or the light modulation unit is not set, that is, the light emitted by the illumination unit 10 is not modulated and directly passes through the mask grating 31, the objective lens 40 and the transmission grating to form a detection spot on the detection unit 52.

[0091] In a specific example, if Figure 6 As shown, taking the case where the magnification of the objective lens 40 is negative and the objective lens 40 is fixed as an example, the horizontal movement direction of the mask stage 30 is opposite to the horizontal movement direction of the work stage 50, and the grating line direction of the mask grating 31 is parallel to the grating line direction of the transmission grating and is perpendicular to the movement direction of both. The coordinated movement (synchronous movement) of the two makes the grating image 32 and the transmission mark 511 relatively static (in a relatively fixed position), that is, v:v'=1:k, v is the horizontal movement speed v of the mask stage 30, v' is the horizontal movement speed of the work stage 50, and k is the magnification of the objective lens 40. If the actual horizontal movement speed of the mask stage 30 does not meet the preset v and / or the actual horizontal movement speed of the work stage 50 does not meet the preset v', the relative position of the grating image 32 and the transmission mark 511 will change (compared to the relative position when the two are static, that is, the preset position), and the detection unit 52 detects the dynamic performance of the mask stage 30 and the work stage 50 when they move horizontally in coordination by obtaining the signal change of the detection spot. In the process of forming the detection spot in this embodiment, light modulation is not used, so that the signal change obtained by the detection unit 52 can directly reflect the dynamic performance of the mask stage 30 and the workpiece stage 50 in the movement direction when they move in coordination.

[0092] Of course, in other examples, if the objective lens 40 and the mask stage 30 move horizontally synchronously and have the same movement direction and speed, the horizontal movement direction of the mask stage 30 may be the same as the horizontal movement direction of the workpiece stage 50. The specific detection method is the same as the aforementioned example and will not be repeated here.

[0093] Embodiment 5

[0094] Embodiment 5 provides a method for detecting the dynamic performance of a sports platform.

[0095] This embodiment may use the moving stage dynamic performance detection device provided in the first or second embodiment to detect the dynamic performance of the mask stage 30 and / or the workpiece stage 50 in a direction perpendicular to the moving direction thereof.

[0096] In this embodiment, the transmission slit 51 may be a transmission grating, and the grating direction of the transmission slit 51 is the same as the grating direction of the grating mask 31. Moreover, the light modulation unit is in a closed state or the light modulation unit is not set, that is, the light emitted by the illumination unit 10 is directly transmitted through the mask grating 31, the objective lens 40 and the transmission grating without modulation to form a detection spot on the detection unit 52. It should be particularly noted that when the mask stage 30 and / or the work stage 50 moves in a horizontal direction, the grating direction of the grating mask 31 (or the transmission grating) is parallel to the movement direction of the mask stage 30 or the work stage 50, and the transmission mark 511 is aligned with one side (longer side, grating direction) edge of the grating image 32, so that the light intensity of the detection spot formed by the transmission mark 511 is directly related to the performance of the moving stage perpendicular to the movement direction (such as offset), and has nothing to do with the performance of the moving stage in the movement direction (such as speed, stability, etc.), thereby detecting the dynamic performance of the mask stage 30 and / or the work stage 50 perpendicular to its movement direction. Moreover, in the process of forming the detection spot in this embodiment, light modulation is not used, so that the signal change obtained by the detection unit 52 can directly reflect the dynamic performance of the mask stage 30 and / or the workpiece stage 50 perpendicular to the movement direction thereof.

[0097] In one example, if Figure 7a As shown, the mask stage 30 moves horizontally to the left (X direction), the workpiece stage 50 is fixed, and the grating lines of the mask grating 31 and the transmission grating both extend along the X direction, that is, the grating imaging 32 extends along the X direction, which is used to detect the dynamic performance of the mask stage 30 in the Y direction when it moves in the X direction.

[0098] In another example, if Figure 7b As shown, the workpiece stage 50 moves horizontally to the left (X direction), the mask stage 30 is fixed, and the grating lines of the mask grating 31 and the transmission grating both extend along the X direction, that is, the grating imaging 32 extends along the X direction, which is used to detect the dynamic performance of the workpiece stage 50 in the Y direction when it moves in the X direction.

[0099] In other examples, such as Figure 7c As shown, the mask stage 30 and the work stage 50 move in coordination in the X direction, that is, the mask stage 30 moves horizontally to the left, and the work stage 50 moves horizontally to the right (X direction), and the grating lines of the mask grating 31 and the transmission grating extend along the X direction, that is, the grating imaging 32 extends along the X direction, which is used to detect the dynamic performance of the mask stage 30 in the Y direction when it moves in the X direction. In addition, when the mask stage 30 and the work stage 50 move in coordination in the X direction, v:v'=1:k, v is the horizontal motion speed v of the mask stage 30, v' is the horizontal motion speed of the work stage 50, and k is the magnification of the objective lens 40.

[0100] Embodiment 6

[0101] Embodiment 6 provides a lithography device.

[0102] The lithography equipment provided in this embodiment includes a moving stage and a dynamic performance detection device for the moving stage. The moving stage includes a mask stage and / or a workpiece stage. The dynamic performance detection device for the moving stage includes an illumination unit, a light modulation unit, a grating mask, an objective lens, a transmission slit and a detection unit arranged in sequence. The grating mask is arranged on the mask stage, and the transmission slit and the detection unit are arranged on the workpiece stage. When the mask stage and / or the workpiece stage moves, the opening state and modulation frequency of the light modulation unit match the movement state and movement speed of the moving stage, so that the image of the light emitted by the illumination unit projected onto the transmission slit after passing through the light modulation unit, the grating mask and the objective lens is in a relatively fixed position with the transmission slit, and the signal change of the light spot passing through the transmission slit is detected by the detection unit to detect the dynamic performance of the mask stage and / or the workpiece stage.

[0103] Embodiment 7

[0104] Embodiment 7 provides a lithography device.

[0105] The lithography equipment provided in this embodiment includes a moving stage and a dynamic performance detection device for the moving stage. The moving stage includes a mask stage and / or a workpiece stage. The dynamic performance detection device for the moving stage includes an illumination unit, a grating mask, an objective lens, a transmission slit and a detection unit arranged in sequence. The grating mask is arranged on the mask stage, and the transmission slit and the detection unit are arranged on the workpiece stage. When the mask stage and the workpiece stage move synchronously, the light emitted by the illumination unit passes through the grating mask and the objective lens and is projected onto the transmission slit. The image is in a relatively fixed position with the transmission slit, and the detection unit detects the signal change of the light spot passing through the transmission slit to detect the dynamic performance of the mask stage and the workpiece stage.

[0106] In summary, the dynamic performance detection device of the motion stage provided by the present invention includes an illumination unit, a grating mask, an objective lens, a transmission slit and a detection unit which are arranged in sequence, and a mask grating is arranged on the mask stage, and a transmission slit and a detection unit are arranged on the workpiece stage. When the mask stage and / or the workpiece stage moves, the image of the light emitted by the illumination unit projected onto the transmission slit after passing through the grating mask and the objective lens is in a relatively fixed position with the transmission slit, and the detection unit is used to measure the signal of the detection spot formed by passing through the transmission slit to detect the dynamic performance of the mask stage and / or the workpiece stage. Compared with the detection method using recording medium photolithography dot in the related method, the detection device of the present invention can use more common components and components in the photolithography equipment to realize dynamic performance detection including the workpiece stage and the mask stage, the component configuration is relatively simple, and the corresponding detection method is relatively simple and efficient, and no additional consumables are required during the detection process.

[0107] The above description is only a description of the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention. Any changes or modifications made by a person skilled in the art in the field of the present invention based on the above disclosure shall fall within the scope of protection of the claims.

Claims

1. A dynamic performance detection device for a motion stage, wherein the motion stage comprises a mask stage and / or a workpiece stage, characterized in that: The invention comprises an illumination unit, a grating mask, an objective lens, a transmission slit and a detection unit which are arranged in sequence, wherein the grating mask is arranged on the mask stage, and the transmission slit and the detection unit are arranged on the workpiece stage. When the mask stage and / or the workpiece stage moves, the image of the light emitted by the illumination unit projected onto the transmission slit after passing through the grating mask and the objective lens is in a relatively fixed position with the transmission slit, and the signal change of the detection light spot passing through the transmission slit is detected by the detection unit to detect the dynamic performance of the moving stage.

2. The dynamic performance detection device of the sports table according to claim 1, characterized in that: The transmission slit comprises a transmission grating, p:p'=1:k, p is the grating period of the grating mask, p' is the grating period of the transmission grating, and k is the magnification of the objective lens.

3. The dynamic performance detection device of the sports table according to claim 2, characterized in that: It also includes a light modulation unit, the modulation frequency of which matches the motion state and motion speed of the motion platform.

4. The dynamic performance detection device of the sports table according to claim 3, characterized in that: When the mask stage moves horizontally at a speed v and the workpiece stage is fixed, the modulation frequency f of the light modulation unit is v / p, where p is the grating period of the grating mask.

5. The dynamic performance detection device of the sports table according to claim 3, characterized in that: When the workpiece stage moves horizontally at a speed v' and the mask stage is fixed, the modulation frequency f of the light modulation unit is = v' / p', where p' is the grating period of the transmission grating.

6. The sports table dynamic performance detection device according to claim 4 or 5, characterized in that: It also includes a phase-locked amplifier unit, which outputs a reference signal to the detection unit. The frequency of the reference signal is the same as the frequency of the modulation frequency. The reference signal is used to detect the dynamic performance of the mask stage or the workpiece stage by adopting a phase-locked amplification method on the signal change detected by the detection unit.

7. The dynamic performance detection device of the sports table according to claim 4 or 5, characterized in that: It also includes a spatial filter, which is arranged between the grating mask and the transmission slit and is used to increase the spatial frequency.

8. The dynamic performance detection device of the sports table according to claim 4 or 5, characterized in that: It also includes a rectification and filtering unit, which is connected to the detection unit signal and is used to extract the component reflecting the motion performance of the motion platform from the signal of the detection light spot.

9. The dynamic performance detection device of the sports platform according to claim 2, characterized in that: When the mask stage and the workpiece stage move together in the horizontal direction, v:v'=1:k, v is the movement speed of the grating mask, v' is the movement speed of the transmission slit, and k is the magnification of the objective lens.

10. The dynamic performance detection device of the sports platform according to claim 3, characterized in that: It comprises two groups of light modulation units, and the polarization directions of the two groups of light modulation units are orthogonal, so as to obtain two groups of complementary detection light spots at the same time.

11. The sports table dynamic performance detection device according to claim 3 or 10, characterized in that: The light modulation unit adopts a photoelastic modulation method, including a polarizer arranged between the illumination unit and the mask grating, a photoelastic modulator arranged between the polarizer and the mask grating, and an analyzer arranged between the transmission slit and the detection unit.

12. The dynamic performance detection device of the sports platform according to claim 1, characterized in that: The grating line direction of the grating mask is the same as the opening direction of the transmission slit, and the grating line direction of the grating mask is perpendicular to the movement direction of the mask stage and / or the workpiece stage, and is used to detect the performance of the mask stage and / or the workpiece stage in its movement direction; alternatively, the grating line direction of the grating mask is parallel to the movement direction of the mask stage and / or the workpiece stage, and is used to detect the movement performance of the mask stage and / or the workpiece stage perpendicular to its movement direction.

13. A method for detecting dynamic performance of a motion stage, wherein the motion stage comprises a mask stage and / or a workpiece stage, characterized in that: The detection method comprises: Obtaining a detection light spot, when the mask stage and / or the workpiece stage moves, the grating image of the light beam projected on the transmission slit through the grating mask and the transmission mark of the transmission slit are in a relatively fixed position, and the image on the detection unit after passing through the transmission slit is used as the detection light spot; A component of the detection light spot that reflects the motion performance of the mask stage and / or the workpiece stage is obtained.

14. The method for detecting the dynamic performance of a sports platform according to claim 13, characterized in that: When the moving stage moves, the transmission slit is aligned with a side edge of the grating imaging to form a first detection light spot, and a signal of the first detection light spot is obtained; The transmission slit is aligned with an edge of an opposite side of the grating imaging to form a second detection light spot, and a signal of the second detection light spot is obtained; The signal of the first detection light spot is subtracted from the signal of the second detection light spot to obtain the dynamic performance of the motion stage.

15. A lithography apparatus, characterized in that: The invention comprises a moving stage and a dynamic performance detection device for the moving stage, wherein the moving stage comprises a mask stage and / or a workpiece stage, and the dynamic performance detection device for the moving stage comprises an illumination unit, a grating mask, an objective lens, a transmission slit and a detection unit which are arranged in sequence, wherein the grating mask is arranged on the mask stage, and the transmission slit and the detection unit are arranged on the workpiece stage. When the mask stage and / or the workpiece stage moves, the light emitted by the illumination unit passes through the light modulation unit, the grating mask and the objective lens, and the image projected on the transmission slit is in a relatively fixed position with the transmission slit, and the signal change of the light spot passing through the transmission slit is detected by the detection unit to detect the dynamic performance of the mask stage and / or the workpiece stage.

16. The lithographic apparatus according to claim 15, characterized in that It also includes a light modulation unit, which is arranged between the illumination unit and the grating mask.

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