Lithography machine calibration mechanism

Abstract

The invention provides a calibration mechanism of a photoetching machine. The calibration mechanism comprises an adjusting bottom plate, an adjusting top plate, a supporting ball, a first adjusting screw, a second adjusting screw, a tension spring assembly, a lifting block and a supporting plate for placing a standard plate, the adjusting top plate is located above the adjusting bottom plate, the supporting ball is clamped between the adjusting bottom plate and the adjusting top plate, a first threaded hole and a second threaded hole are formed in the adjusting top plate, and a first limiting groove and a second limiting groove are formed in the positions, corresponding to the first threaded hole and the second threaded hole, of the adjusting bottom plate; the first adjusting screw penetrates through the first threaded hole and abuts against the first limiting groove, the second adjusting screw penetrates through the second threaded hole and abuts against the second limiting groove, and the adjusting top plate is connected with the adjusting bottom plate through the tension spring assembly. The lifting block is installed on the adjusting top plate in a lifting mode in the direction perpendicular to the adjusting top plate, and the supporting plate is rotatably installed on the lifting block in the direction perpendicular to the adjusting top plate. And the standard plate can be quickly and accurately adjusted to the focal plane of the lens of the photoetching machine.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor manufacturing, and in particular to a photolithography machine calibration mechanism. Background Art

[0002] During operation, the lithography machine will be affected by factors such as equipment movement, temperature changes of the equipment and the environment, causing the focal length of the lithography machine lens to change, that is, the lithography machine lens drifts, which in turn affects the lithography quality.

[0003] By calibrating the lithography machine lens regularly, the impact of lens drift on the lithography quality can be reduced. In the process of calibrating the lithography machine lens, a standard plate located at the focal plane of the lens is generally used as a reference to test the drift of the lens compared to the originally set standard position, and then compensate the lens according to the drift. For this reason, in the process of calibrating the lithography machine lens, a lithography machine calibration mechanism that can adjust the standard plate is urgently needed, so that the standard plate can be adjusted to the focal plane of the lithography machine lens quickly and accurately. Summary of the invention

[0004] 1. Technical issues to be resolved

[0005] In view of the problems existing in the above technologies, the present invention solves the problems to a certain extent. To this end, the present invention aims to provide a photolithography machine calibration mechanism, which can quickly and accurately adjust the standard plate to the focal plane of the photolithography machine lens.

[0006] (II) Technical solution

[0007] In order to achieve the above object, the main technical solutions adopted by the present invention include:

[0008] The present invention provides a photolithography machine calibration mechanism, comprising an adjustment bottom plate, an adjustment top plate, a support ball, a first adjustment screw, a second adjustment screw, a tension spring assembly, a lifting block and a support plate for placing a standard plate;

[0009] The adjusting top plate is located above the adjusting bottom plate, and the supporting ball is clamped in a fixed position between the adjusting bottom plate and the adjusting top plate, and a first threaded hole and a second threaded hole are opened on the adjusting top plate, and a first limiting groove is arranged at a position of the adjusting bottom plate corresponding to the first threaded hole, and a second limiting groove is arranged at a position of the adjusting bottom plate corresponding to the second threaded hole, the first adjusting screw is passed through the first threaded hole and abuts against the first limiting groove, and the second adjusting screw is passed through the second threaded hole and abuts against the second limiting groove, and the adjusting top plate is connected to the adjusting bottom plate through a tension spring assembly; the first adjusting screw, the second adjusting screw and the supporting ball are distributed in a triangular shape, and the distance between the first adjusting screw and the supporting ball is equal to the distance between the second adjusting screw and the supporting ball; the first adjusting screw and the second adjusting screw are screwed to adjust the top plate to perform a pitching action around the supporting ball; the lifting block is installed on the adjusting top plate in a liftable manner along a direction perpendicular to the adjusting top plate, and the supporting plate is rotatably installed on the lifting block in a direction perpendicular to the adjusting top plate.

[0010] Optionally, the calibration mechanism of the lithography machine also includes a self-centering locking screw, a mounting hole is opened on the adjustment top plate, and a threaded groove is provided at a position corresponding to the mounting hole of the adjustment bottom plate, and the self-centering locking screw can be passed through the mounting hole and threadedly connected to the threaded groove; the mounting hole has an annular step surface, and the self-centering locking screw has an annular limiting surface. The self-centering locking screw is passed through the mounting hole, and the limiting surface and the step surface are abutted against each other in the up and down directions to prevent the self-centering locking screw from continuing to move downward along the mounting hole; the limiting surface and the step surface are curved surfaces on a sphere with matching shapes.

[0011] Optionally, the self-centering locking screw is located on a side of the first adjusting screw and the second adjusting screw away from the supporting ball.

[0012] Optionally, the first adjusting screw, the second adjusting screw and the supporting ball are distributed in a right triangle.

[0013] Optionally, the first adjusting screw and the second adjusting screw each include a screwing portion, a stud and a limiting portion connected in sequence from top to bottom, the screwing portion is cylindrical, the diameter of the screwing portion is larger than the diameter of the stud, the limiting portion is spherical, and the shapes of the first limiting groove and the second limiting groove are both adapted to the shape of the limiting portion.

[0014] Optionally, the tension spring assembly includes a first tension spring, a second tension spring and a third tension spring, the first tension spring and the second tension spring are both located on a straight line where the first adjusting screw and the second adjusting screw are located, and the triangular shape formed by the first tension spring, the second tension spring and the third tension spring is the same as the triangular shape formed by the first adjusting screw, the second adjusting screw and the support ball.

[0015] Optionally, an installation shaft is provided on the adjusting top plate, the installation shaft has a first shaft section and a second shaft section connected in sequence from top to bottom, the diameter of the first shaft section is smaller than the diameter of the second shaft section, and a thread is provided on the outer surface of the second shaft section; an axial hole is provided on the lifting block, the axial hole has a first hole portion and a second hole portion connected in sequence from top to bottom, the diameter of the first hole portion is smaller than the diameter of the second hole portion, and a thread is provided on the inner surface of the second hole portion; the installation shaft is inserted into the axial hole, the second hole portion is threadedly connected to the second shaft section, and the first shaft section is inserted into the first hole portion to form a clearance fit.

[0016] Optionally, the lifting block has a rotating shaft, a slot is provided on the support plate, and the rotating shaft is inserted into the slot to form a clearance fit.

[0017] Optionally, a first set screw and a second set screw are passed through the support plate in a direction perpendicular to the rotation axis, and the first set screw and the second set screw are vertically arranged; the first set screw and the second set screw are screwed to lock and fix the support plate on the lifting block.

[0018] (III) Beneficial effects

[0019] The beneficial effects of the present invention are:

[0020] The photolithography machine calibration device provided by the present invention forms a three-point support between the adjustment top plate and the adjustment bottom plate through the first adjustment screw, the second adjustment screw and the support ball, and at the same time, a tension spring assembly is arranged between the adjustment top plate and the adjustment bottom plate to tighten the adjustment top plate and the adjustment bottom plate, so that the tension spring assembly is tightened while the adjustment screw and the support ball are tightened, and the tension of the tension spring and the support force of the adjustment screw are coupled to connect the adjustment top plate and the adjustment bottom plate together; the pitch adjustment of the standard plate can be achieved by screwing the first adjustment screw and the second adjustment screw, the up and down lifting adjustment of the standard plate can be achieved by the lifting block, and the rotation adjustment of the standard plate can be achieved by rotating the support plate, so that the standard plate can be quickly and accurately adjusted to the focal plane of the photolithography machine lens. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The present invention is described with the aid of the following drawings:

[0022] Figure 1 It is a cross-sectional schematic diagram of a photolithography machine calibration device according to a specific embodiment of the present invention;

[0023] Figure 2 A cross-sectional schematic diagram of an adjustable top plate according to a specific embodiment of the present invention;

[0024] Figure 3 A schematic top view of an adjustment base plate according to a specific embodiment of the present invention;

[0025] Figure 4It is a schematic side view of a self-centering locking screw according to a specific embodiment of the present invention.

[0026] [Reference Signs]

[0027] 1: Adjust the bottom plate;

[0028] 11: first limiting groove; 12: second limiting groove; 13: first insert; 14: thread groove;

[0029] 2: Adjust the top plate;

[0030] 21: first threaded hole; 23: second insert; 24: mounting hole; 25: step surface; 26: mounting shaft; 27: first shaft section; 28: second shaft section;

[0031] 3: Support ball;

[0032] 4: First adjusting screw;

[0033] 41: screwing part; 42: stud; 43: limiting part; 45: third tension spring;

[0034] 6: lifting block;

[0035] 61: Rotation axis;

[0036] 7: Support plate;

[0037] 71: first set screw;

[0038] 8: Self-centering locking screw;

[0039] 81: limit surface;

[0040] 9: Standard board. DETAILED DESCRIPTION

[0041] In order to better explain the present invention and facilitate understanding, the present invention is described in detail below in conjunction with the accompanying drawings through specific implementation methods. It should be noted that the directional terms such as "upper" and "lower" mentioned herein are used in conjunction with the accompanying drawings. Figure 1 The orientation is used as a reference.

[0042] like Figures 1 to 4 As shown, the present invention provides a photolithography machine calibration device, which includes an adjustment base plate 1, an adjustment top plate 2, a support ball 3, a first adjustment screw 4, a second adjustment screw, a tension spring assembly, a lifting block 6 and a support plate 7 for placing a standard plate 9.

[0043] Among them, the adjusting top plate 2 is located above the adjusting bottom plate 1, and the supporting ball 3 is clamped in a fixed position between the adjusting bottom plate 1 and the adjusting top plate 2. A first threaded hole 21 and a second threaded hole are opened on the adjusting top plate 2. A first limiting groove 11 is arranged at a position of the adjusting bottom plate 1 corresponding to the first threaded hole 21, and a second limiting groove 12 is arranged at a position of the adjusting bottom plate 1 corresponding to the second threaded hole. The first adjusting screw 4 is passed through the first threaded hole 21 and abuts against the first limiting groove 11, and the second adjusting screw is passed through the second threaded hole and abuts against the second limiting groove 12. The adjusting top plate 2 is connected to the adjusting bottom plate 1 through a tension spring assembly; the first adjusting screw 4, the second adjusting screw and the supporting ball 3 are distributed in a triangle, and the distance between the first adjusting screw 4 and the supporting ball 3 is equal to the distance between the second adjusting screw and the supporting ball 3; screwing the first adjusting screw 4 and the second adjusting screw adjusts the top plate 2 to perform a pitching motion around the supporting ball 3.

[0044] The lifting block 6 is installed on the adjustable top plate 2 in a manner that it can be lifted and lowered in a direction perpendicular to the adjustable top plate 2 , and the support plate 7 is installed on the lifting block 6 in a manner that it can be rotatably mounted around a direction perpendicular to the adjustable top plate 2 .

[0045] The lithography machine calibration device configured in this way forms a three-point support between the adjusting top plate 2 and the adjusting bottom plate 1 through the first adjusting screw 4, the second adjusting screw and the supporting ball 3. At the same time, a tension spring assembly is arranged between the adjusting top plate 2 and the adjusting bottom plate 1 to tighten the adjusting top plate 2 and the adjusting bottom plate 1. In this way, the tension spring assembly is tightened while the adjusting screw and the supporting ball 3 are tightened. The tension of the tension spring and the supporting force of the adjusting screw are coupled to connect the adjusting top plate 2 and the adjusting bottom plate 1 together. The pitch adjustment of the standard plate 9 can be achieved by screwing the first adjusting screw 4 and the second adjusting screw, and the up and down lifting adjustment of the standard plate 9 can be achieved by the lifting block 6. The rotation adjustment of the standard plate 9 can be achieved by rotating the supporting plate 7, so that the standard plate 9 can be quickly and accurately adjusted to the focal plane of the lithography machine lens.

[0046] In this embodiment, the standard plate 9 may be a mask or a wafer.

[0047] Preferably, the first adjusting screw 4, the second adjusting screw and the supporting ball 3 are distributed in a right triangle, so that the pitch adjustment of the standard plate 9 is more convenient, which is conducive to adjusting the standard plate 9 to the focal plane of the lithography machine lens more quickly.

[0048] Preferably, a first curved groove in the shape of a spherical crown is opened at the position of the adjusting bottom plate 1 corresponding to the supporting ball 3, and a second curved groove in the shape of a spherical crown is opened at the position of the adjusting top plate 2 corresponding to the supporting ball 3, the bottom of the supporting ball 3 is placed in the first curved groove, and the top of the supporting ball 3 is placed in the second curved groove.

[0049] Further preferably, in this embodiment, a first insert 13 is clamped at the position of the adjusting bottom plate 1 corresponding to the supporting ball 3, and a second insert 23 is clamped at the position of the adjusting top plate 2 corresponding to the supporting ball 3. A first curved groove is formed on the first insert 13, and a second curved groove is formed on the second insert 23. In this way, inserts of different materials can be selected to contact the supporting ball 3 to increase the contact strength.

[0050] Preferably, the first adjusting screw 4 and the second adjusting screw each include a screwing portion 41, a stud 42 and a stopper 43 connected in sequence from top to bottom, the screwing portion 41 is cylindrical, the diameter of the screwing portion 41 is larger than the diameter of the stud 42, the stopper 43 is spherical, and the shapes of the first stopper groove 11 and the second stopper groove 12 are both adapted to the shape of the stopper 43. In this way, it is convenient to screw the adjusting screw, and the spherical stopper 43 is easy to match with the stopper groove.

[0051] Further, in this embodiment, the diameter of the limiting portion 43 is smaller than the diameter of the stud 42 , and the limiting portion 43 is clearance-matched with the limiting groove (including the first limiting groove 11 and the second limiting groove 12 ).

[0052] Preferably, the tension spring assembly includes a first tension spring, a second tension spring and a third tension spring 45, the first tension spring and the second tension spring are both located on the straight line where the first adjustment screw 4 and the second adjustment screw are located, and the triangle shape formed by the first tension spring, the second tension spring and the third tension spring 45 is the same as the triangle shape formed by the first adjustment screw 4, the second adjustment screw and the support ball 3; the first end of the first tension spring, the first end of the second tension spring and the first end of the third tension spring 45 are all connected to the adjustment bottom plate 1, and the second end of the first tension spring, the second end of the second tension spring and the second end of the third tension spring 45 are all connected to the adjustment top plate 2. In this way, the tension of the tension spring and the support force of the adjustment screw are more strongly coupled to each other.

[0053] Preferably, the photolithography machine calibration mechanism also includes a self-centering locking screw 8, a mounting hole 24 is provided on the adjustment top plate 2, a threaded groove 14 is provided at a position corresponding to the mounting hole 24 of the adjustment bottom plate 1, the self-centering locking screw 8 can be inserted into the mounting hole 24 and threadedly connected to the threaded groove 14; the mounting hole 24 has an annular step surface 25, the self-centering locking screw 8 has an annular limiting surface 81, the self-centering locking screw 8 is inserted into the mounting hole 24, the limiting surface 81 abuts against the step surface 25 in the up and down direction, and prevents the self-centering locking screw 8 from continuing to move downward along the mounting hole 24; the limiting surface 81 and the step surface 25 are curved surfaces on a sphere with matching shapes. In this way, after the pitch adjustment, the self-centering locking screw 8 is used to realize the locking and fixing of the adjustment top plate 2 at a specific pitch angle, and because the limiting surface 81 and the step surface 25 are in contact in a spherical manner, a self-centering effect can be achieved without causing a locking error.

[0054] Furthermore, in the present embodiment, there are two self-centering locking screws 8 , and both of the two self-centering locking screws 8 are located on a side of the adjusting screw (including the first adjusting screw 4 and the second adjusting screw) away from the supporting ball 3 .

[0055] Preferably, the adjusting top plate 2 is provided with a mounting shaft 26, the mounting shaft 26 has a first shaft section 27 and a second shaft section 28 connected sequentially from top to bottom, the diameter of the first shaft section 27 is smaller than the diameter of the second shaft section 28, and a thread is provided on the outer surface of the second shaft section 28; the lifting block 6 is provided with an axial hole, the axial hole has a first hole portion and a second hole portion connected sequentially from top to bottom, the diameter of the first hole portion is smaller than the diameter of the second hole portion, and a thread is provided on the inner surface of the second hole portion; the mounting shaft 26 is inserted into the axial hole, the second hole portion is threadedly connected with the second shaft section 28, and the first shaft section 27 is inserted into the first hole portion to form a clearance fit. In this way, by rotating the lifting block 6, the rotary motion can be converted into up and down linear motion through the screw transmission, so as to realize the lifting and lowering adjustment of the standard plate 9; the first shaft section 27 forms an axial hole fit with the first hole portion, and in the process of lifting and lowering the standard plate 9, the lifting block 6 can be prevented from tilting due to the thread gap.

[0056] Further preferably, the second hole portion and the second shaft segment 28 are connected by a fine thread with a pitch of 0.4 to 0.6 mm. Specifically, in this embodiment, the second hole portion and the second shaft segment 28 are connected by a fine thread with a pitch of 0.5 mm. In this way, the lifting distance per 10° rotation is 0.013 mm, which can meet the adjustment accuracy of the lifting accuracy of 0.02 mm.

[0057] Preferably, the lifting block 6 has a rotating shaft 61, and a slot is provided on the support plate 7, and the rotating shaft 61 is inserted into the slot to form a clearance fit. In this way, the support plate 7 can rotate around the rotating shaft 61, that is, the rotation adjustment of the standard plate 9 can be achieved.

[0058] Further preferably, the rotating shaft 61 and the slotted hole form a clearance fit of 0.01-0.03 mm. Specifically, in this embodiment, the rotating shaft 61 and the slotted hole form a clearance fit of 0.02 mm.

[0059] Further preferably, two setscrews are provided on the support plate 7 in a direction perpendicular to the rotation axis 61, namely, a first setscrew 71 and a second setscrew, and the first setscrew 71 and the second setscrew are vertically arranged; the first setscrew 71 and the second setscrew are screwed to lock and fix the support plate 7 on the lifting block 6. In this way, after the standard plate 9 is rotated and adjusted, the support plate 7 can be locked and fixed by the first setscrew 71 and the second setscrew.

[0060] The working principle of the lithography machine calibration device provided by the present invention is: first, the pitch adjustment of the adjustment top plate 2 is performed by adjusting the first adjustment screw 4 and the second adjustment screw in sequence, and then the lifting block 6 is rotated to convert the rotational motion into a linear lifting motion through threaded transmission to perform lifting adjustment, and finally the rotation adjustment is achieved by rotating the support plate 7.

[0061] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0062] In the present invention, unless otherwise clearly specified and limited, when a first feature is “on” or “below” a second feature, it may be that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, when a first feature is “above”, “above” or “above” a second feature, it may be that the first feature is directly above or obliquely above the second feature, or it may simply mean that the first feature is higher in level than the second feature. When a first feature is “below”, “below” or “below” a second feature, it may be that the first feature is directly below or obliquely below the second feature, or it may simply mean that the first feature is lower in level than the second feature.

[0063] In the description of this specification, the description of the terms "one embodiment", "some embodiments", "embodiment", "example", "specific example" or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, unless they are contradictory.

[0064] Although the embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations of the present invention. A person skilled in the art may alter, modify, replace and modify the above embodiments within the scope of the present invention.

Claims

1. A photolithography machine calibration mechanism, characterized in that: It comprises an adjusting bottom plate (1), an adjusting top plate (2), a supporting ball (3), a first adjusting screw (4), a second adjusting screw, a tension spring assembly, a lifting block (6) and a supporting plate (7) for placing a standard plate (9); The adjusting top plate (2) is located above the adjusting bottom plate (1), the supporting ball (3) is clamped at a fixed position between the adjusting bottom plate (1) and the adjusting top plate (2), a first threaded hole (21) and a second threaded hole are opened on the adjusting top plate (2), a first limiting groove (11) is arranged at a position of the adjusting bottom plate (1) corresponding to the first threaded hole (21), a second limiting groove (12) is arranged at a position of the adjusting bottom plate (1) corresponding to the second threaded hole, a first adjusting screw (4) is passed through the first threaded hole (21) and abuts against the first limiting groove (12), The first adjusting screw (4), the second adjusting screw (4) and the supporting ball (3) are arranged in a triangular shape, and the distance between the first adjusting screw (4) and the supporting ball (3) is equal to the distance between the second adjusting screw and the supporting ball (3); the first adjusting screw (4) and the second adjusting screw are screwed to adjust the top plate (2) to perform a pitching movement around the supporting ball (3); The lifting block (6) is installed on the adjustable top plate (2) in a manner that it can be lifted and lowered in a direction perpendicular to the adjustable top plate (2), and the support plate (7) is installed on the lifting block (6) in a manner that it can be rotated around a direction perpendicular to the adjustable top plate (2).

2. The photolithography machine calibration mechanism according to claim 1, characterized in that: It also includes a self-centering locking screw (8), a mounting hole (24) is opened on the adjustment top plate (2), a thread groove (14) is arranged at a position of the adjustment bottom plate (1) corresponding to the mounting hole (24), and the self-centering locking screw (8) can be inserted into the mounting hole (24) and threadedly connected to the thread groove (14); The mounting hole (24) has an annular step surface (25), the self-centering locking screw (8) has an annular limiting surface (81), the self-centering locking screw (8) is inserted into the mounting hole (24), the limiting surface (81) and the step surface (25) abut against each other in the up-down direction, thereby preventing the self-centering locking screw (8) from continuing to move downward along the mounting hole (24); the limiting surface (81) and the step surface (25) are curved surfaces on a sphere with matching shapes.

3. The photolithography machine calibration mechanism according to claim 2, characterized in that: The self-centering locking screw (8) is located on a side of the first adjusting screw (4) and the second adjusting screw that is away from the supporting ball (3).

4. The photolithography machine calibration mechanism according to claim 1, characterized in that: The first adjusting screw (4), the second adjusting screw and the supporting ball (3) are distributed in a right triangle.

5. The photolithography machine calibration mechanism according to claim 1, characterized in that: The first adjusting screw (4) and the second adjusting screw both comprise a screwing portion (41), a stud (42) and a limiting portion (43) which are sequentially connected from top to bottom; the screwing portion (41) is cylindrical, the diameter of the screwing portion (41) is larger than the diameter of the stud (42); the limiting portion (43) is spherical, and the shapes of the first limiting groove (11) and the second limiting groove (12) are both adapted to the shape of the limiting portion (43).

6. The photolithography machine calibration mechanism according to claim 1, characterized in that: The tension spring assembly comprises a first tension spring, a second tension spring and a third tension spring (45), the first tension spring and the second tension spring are both located on a straight line where the first adjusting screw (4) and the second adjusting screw are located, and the triangular shape formed by the first tension spring, the second tension spring and the third tension spring (45) is the same as the triangular shape formed by the first adjusting screw (4), the second adjusting screw and the supporting ball (3).

7. The photolithography machine calibration mechanism according to claim 1, characterized in that: The adjusting top plate (2) is provided with a mounting shaft (26), the mounting shaft (26) having a first shaft section (27) and a second shaft section (28) which are sequentially connected from top to bottom, the diameter of the first shaft section (27) is smaller than the diameter of the second shaft section (28), and a thread is provided on the outer surface of the second shaft section (28); The lifting block (6) is provided with an axial hole, the axial hole having a first hole portion and a second hole portion connected in sequence from top to bottom, the diameter of the first hole portion is smaller than the diameter of the second hole portion, and a thread is provided on the inner surface of the second hole portion; The mounting shaft (26) is inserted into the shaft hole, the second hole portion is threadedly connected with the second shaft section (28), and the first shaft section (27) is inserted into the first hole portion to form a clearance fit.

8. The photolithography machine calibration mechanism according to claim 1, characterized in that: The lifting block (6) has a rotating shaft (61), and a slot hole is provided on the support plate (7), and the rotating shaft (61) is inserted into the slot hole to form a clearance fit.

9. The photolithography machine calibration mechanism according to claim 8, characterized in that: A first set screw (71) and a second set screw are provided on the support plate (7) in a direction perpendicular to the rotation axis (61), and the first set screw (71) and the second set screw are arranged vertically; the first set screw (71) and the second set screw are screwed to lock and fix the support plate (7) on the lifting block (6).

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