Microenvironment control architecture of photoetching machine

Abstract

A microenvironment control architecture for a lithography machine is provided. The microenvironment control architecture of the photoetching machine comprises a main controller; the temperature control sub closed-loop architecture is used for realizing temperature control by the main controller based on the state of the temperature controller; the infrastructure control sub closed-loop architecture is used for controlling the operation of the infrastructure and monitoring the operation state of the infrastructure in real time by connecting the main controller with the infrastructure and a corresponding sensor; and the safety control sub closed-loop architecture is used for carrying out equipment safety double guarantee by the main controller through a safety controller based on a safety-related sensor. In this way, microenvironment control is achieved through the main controller and a plurality of sub closed-loop control architectures related to the sub-devices, and the closed-loop control performance of the whole machine is improved.

Description

Technical Field

[0001] The present application relates to the technical field of photolithography machines, and more specifically, to a microenvironment control architecture of a photolithography machine. Background Art

[0002] The photolithography machine is an important equipment in the semiconductor manufacturing process. Its function is to accurately transfer the circuit pattern in the mask plate (also known as the mask plate) to a silicon wafer or other substrate according to the predetermined size and position through the exposure process.

[0003] The existing lithography machines are basically independently controlled when controlling the microenvironment (including related functions such as starting and stopping), that is, they rely on the IO (input and output) signals of a single PLC (programmable logic circuit) to process the alarm information of each part and control related equipment. Therefore, when an abnormality occurs during the startup process, the error information cannot be automatically processed, and it is in a pause state, requiring manual intervention; in addition, the stop process does not consider the order of each sub-device, and the program will not make a judgment on the completion of the stop after the stop, but a comprehensive judgment by humans, which is a semi-automatic control state; in addition, when a fault occurs, the related equipment will be directly cut off, which is very likely to cause equipment damage.

[0004] That is, the existing microenvironment control solution of the lithography machine does not fully consider the safety of the equipment itself while achieving simple control of the microenvironment. There is no communication between the PLC and other control devices, and the status of each sub-device cannot be obtained in real time, thus failing to achieve closed-loop precise control.

[0005] Therefore, it is desirable to provide an improved microenvironment control solution for a lithography machine. Summary of the invention

[0006] An embodiment of the present application provides a microenvironment control architecture for a lithography machine, which implements microenvironment control through a main controller and multiple sub-closed-loop control architectures related to sub-devices, thereby improving the closed-loop control performance of the entire machine.

[0007] According to one aspect of the present application, a microenvironment control architecture of a lithography machine is provided, comprising: a main controller; a temperature control sub-closed-loop architecture, for the main controller to implement temperature control based on the state of a temperature controller; a basic equipment control sub-closed-loop architecture, for the main controller to connect with basic equipment and corresponding sensors to control the operation of the basic equipment and monitor the operating status of the basic equipment in real time; and a safety control sub-closed-loop architecture, for the main controller to perform double protection of equipment safety based on safety-related sensors through a safety controller.

[0008] In the microenvironment control architecture of the above-mentioned lithography machine, the main controller is further connected to a host computer, and reports the operating status of each sub-closed-loop control architecture of the microenvironment control architecture to the host computer.

[0009] In the microenvironment control architecture of the above-mentioned lithography machine, the main controller receives the temperature data and alarm information autonomously reported by the temperature controller, and receives the safe operation status autonomously reported by the safety controller.

[0010] In the microenvironment control architecture of the above-mentioned lithography machine, before the lithography machine system is started, the main controller performs gas and cooling water pressure detection through the pressure sensor of the basic equipment control sub-closed-loop architecture.

[0011] In the microenvironment control architecture of the above-mentioned lithography machine, after the lithography machine system is started, the main controller detects the cooling water flow through the flow detector of the basic equipment control sub-closed-loop architecture, and in response to the cooling water flow being less than a predetermined threshold, it delays for a predetermined time to execute the stop logic to stop the startup process, and closes the cooling water valve in the basic equipment.

[0012] In the microenvironment control architecture of the above-mentioned lithography machine, in response to the normal cooling water flow, the main controller starts the air-conditioning system in the basic equipment through the basic equipment control sub-closed-loop architecture, including: when starting the main blower of the air-conditioning system, the main controller performs a main blower start-up detection through the wind speed sensor of the basic equipment control sub-closed-loop architecture; after detecting that the main blower starts normally, the compressor of the air-conditioning system is started after a predetermined compressor start-up time is delayed, and the main controller performs a compressor start-up detection through the pressure sensor of the basic equipment control sub-closed-loop architecture; when the main controller detects that the air inlet temperature of the air-conditioning system is lower than a predetermined low temperature threshold through the temperature control sub-closed-loop architecture, the main heater of the air-conditioning system is started; and, after the main heater operates normally, the main controller performs temperature control operations through the temperature control sub-closed-loop architecture.

[0013] In the microenvironment control architecture of the above-mentioned lithography machine, the main controller starts the air-conditioning system in the basic equipment through the basic equipment control sub-closed-loop architecture, further including: cutting off the power supply when the temperature detection sensor of the safety control sub-closed-loop architecture detects that the real-time temperature value is higher than the predetermined high temperature threshold; and when the temperature sensor of the temperature control sub-closed-loop architecture detects that the equipment environment temperature of the air-conditioning system still does not reach the target temperature after the predetermined air-conditioning temperature control time, the main controller and / or the safety control sub-closed-loop architecture issues an alarm.

[0014] In the microenvironment control architecture of the above-mentioned lithography machine, the main controller starts the objective lens liquid cooling temperature control system in the basic equipment through the basic equipment control sub-closed-loop architecture, including: after opening the coolant solenoid valve of the objective lens liquid cooling temperature control system, delaying the start time of the magnetic pump to start the electronic cooling plate and the magnetic pump; and, in response to the main controller detecting that the magnetic pump is overloaded through the liquid level sensor of the basic equipment control sub-closed-loop architecture or detecting that the circulation liquid flow is lower than a predetermined threshold through the flow sensor, shutting down the magnetic pump and the objective lens liquid cooling temperature control system.

[0015] In the microenvironment control architecture of the above-mentioned lithography machine, the main controller starts the objective lens liquid cooling temperature control system in the basic equipment through the basic equipment control sub-closed-loop architecture, further including: when the temperature sensor of the temperature control sub-closed-loop architecture detects that the equipment environment temperature of the objective lens liquid cooling temperature control system still does not reach the target temperature after the predetermined objective lens liquid cooling temperature control time, the main controller and / or the safety control sub-closed-loop architecture will issue an alarm.

[0016] In the microenvironment control architecture of the above-mentioned lithography machine, the main controller starts the mercury lamp exhaust system in the basic equipment through the basic equipment control sub-closed loop architecture, including: after starting the exhaust fan of the mercury lamp exhaust system, the main controller detects the wind speed of the exhaust fan through the wind speed sensor of the basic equipment control sub-closed loop.

[0017] In the microenvironment control architecture of the above-mentioned lithography machine, the main controller starts the objective lens cooling system in the basic equipment through the basic equipment control sub-closed loop architecture, including: after starting the air blowing solenoid valve of the objective lens cooling system, the main controller performs air blowing solenoid valve flow detection through the flow sensor of the basic equipment control sub-closed loop.

[0018] In the microenvironment control architecture of the above-mentioned lithography machine, in response to the main controller detecting that the temperature control of the temperature controller of the temperature control sub-closed-loop architecture is normal, the power supply of the mercury lamp in the basic equipment is started, and the lamp chamber blowing solenoid valve in the basic equipment is opened; and, in response to the main controller detecting that the blowing pressure is normal through the pressure sensor of the basic equipment control sub-closed-loop architecture, the main controller lights the mercury lamp through the basic equipment control sub-closed-loop architecture.

[0019] In the microenvironment control architecture of the above-mentioned lithography machine, in the stop logic: the main controller controls the heater of the air-conditioning system to stop, and when the temperature sensor of the environmental control sub-closed-loop architecture detects that the ambient temperature is lower than the target temperature, stops the compressor and the main blower of the air-conditioning system, and detects whether the wind speed is zero through the wind speed sensor; the main controller controls the heating rod of the objective lens liquid cooling temperature control system to stop, and when the temperature sensor of the environmental control sub-closed-loop architecture detects that the ambient temperature is lower than the target temperature plus a margin, turns off the magnetic pump and the electronic cooling plate of the objective lens liquid cooling temperature control system, and detects whether the pipeline flow is lower than the flow threshold through the wind speed sensor, and closes the solenoid valve in response to the pipeline flow being lower than the flow threshold; and the main controller delays the closing of the objective lens system and the cooling water valve.

[0020] The microenvironment control architecture of the lithography machine provided in the embodiment of the present application can realize microenvironment control through multiple sub-closed-loop control architectures related to the main controller and sub-devices to improve the closed-loop control performance of the entire machine. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] By reading the detailed description of the preferred specific embodiments below, various other advantages and benefits of the present application will become clear to those of ordinary skill in the art. The drawings in the specification are only used for the purpose of illustrating the preferred embodiments and are not considered to be limitations of the present application. Obviously, the drawings described below are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings without creative work. Moreover, the same reference numerals are used to represent the same components throughout the drawings.

[0022] Figure 1 The figure illustrates a schematic flow chart of the microenvironment control architecture of the lithography machine according to an embodiment of the present application.

[0023] Figure 2 The diagram illustrates an example of a large closed-loop control architecture of a microenvironment control architecture of a lithography machine according to an embodiment of the present application.

[0024] Figure 3 The figure shows a schematic diagram of the startup control principle of the microenvironment control architecture of the lithography machine according to an embodiment of the present application.

[0025] Figure 4 The figure shows a schematic diagram of the stop control principle of the microenvironment control architecture of the lithography machine according to an embodiment of the present application. DETAILED DESCRIPTION

[0026] Below, the exemplary embodiments according to the present application will be described in detail with reference to the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application, and it should be understood that the present application is not limited to the exemplary embodiments described here.

[0027] Figure 1 The figure illustrates a schematic flow chart of the microenvironment control architecture of the lithography machine according to an embodiment of the present application.

[0028] like Figure 1 As shown, the microenvironment control architecture of the lithography machine according to the embodiment of the present application includes multiple sub-closed-loop control architectures related to the main controller, namely, the temperature control sub-closed-loop architecture, the basic equipment control sub-closed-loop architecture and the safety control sub-closed-loop architecture. In the embodiment of the present application, the main controller can be implemented as a programmable logic circuit (PLC), for example.

[0029] Specifically, the temperature control sub-closed loop architecture is used by the main controller to achieve temperature control based on the state of the thermostat. Here, the main controller obtains the state of the thermostat by communicating with the thermostat, including the hardware state of the thermostat itself, the temperature control state, etc., to perform temperature control. Here, the thermostat can be further connected to a temperature sensor to achieve real-time reading of the controlled temperature, and connected to a temperature control device to obtain the operating status of each temperature control channel.

[0030] The basic equipment control sub-closed loop architecture is used to connect the main controller with the basic equipment and the corresponding sensors to control the operation of the basic equipment and monitor the operation status of the basic equipment in real time. Here, the basic equipment includes, for example, a blower, a compressor, a heater, etc., and correspondingly, the sensors include a wind speed sensor, a pressure sensor, a flow sensor, etc. In this way, when a single or multiple basic equipments are abnormal, the basic equipment control sub-closed loop architecture can perform hierarchical sub-closed loop processing.

[0031] The safety control sub-closed loop architecture is used for the main controller to provide double protection for equipment safety based on safety-related sensors through the safety controller. For example, the safety-related sensors may include liquid leakage detection sensors, temperature detection sensors, door lock detection sensors, etc., so that the safety controller can shut down the corresponding equipment or cut off the dangerous power supply of the whole machine according to the alarms and alarm levels at different locations to ensure the safety of the equipment. That is, when the temperature control sub-closed loop architecture obtains the temperature state of the entire equipment for temperature control, the temperature control sub-closed loop architecture can further obtain alarms such as over-temperature or water leakage for safety protection.

[0032] Therefore, according to the embodiment of the present application, the microenvironment control architecture of the lithography machine includes: a main controller; a temperature control sub-closed-loop architecture, which is used by the main controller to realize temperature control based on the state of the temperature controller; a basic equipment control sub-closed-loop architecture, which is used by the main controller to connect with the basic equipment and corresponding sensors to control the operation of the basic equipment and monitor the operating status of the basic equipment in real time; and, a safety control sub-closed-loop architecture, which is used by the main controller to perform double protection of equipment safety based on safety-related sensors through a safety controller.

[0033] In addition, the main controller and the safety controller can be further connected to the host computer, so as to report the operating status of the main controller and the microenvironment through active communication with the host computer, so as to realize the whole large closed-loop control, that is, the overall safe operation of the controlled equipment during the start or stop of the equipment. Here, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, the main controller can be used as the main station and the host computer can be used as the server to effectively reduce the communication load of the host computer. For the compressor, after configuring the communication parameters, the host computer only needs to read the status information reported by the main controller at the agreed address, and the one-to-many polling of the host computer is changed to one-to-one reporting of the main controller, which significantly reduces the communication time and significantly improves the business efficiency. Otherwise, when the host computer actively polls the main controller, the rotation time may be too long due to too many lower sub-devices, and the status of the lower sub-devices cannot be obtained in time, which affects the business efficiency.

[0034] Therefore, the PLC can reduce the communication load caused by the upper computer polling the lower computer by actively establishing communication with the upper computer, such as Modbus TCP communication, and can report the operating status of the micro-environment sub-closed-loop architecture to the upper computer in a timely manner, so that the upper computer can synchronously obtain the operating status of the micro-environment. In addition, through TCP communication, a heartbeat signal can be added to the operating status, so that the upper computer can more directly determine whether the communication is established.

[0035] Moreover, in the embodiment of the present application, the main controller receives the temperature data and alarm information reported autonomously from the temperature controller, and receives the operating status reported autonomously from the safety controller, etc., which can also reduce the communication load of the PLC itself and improve communication efficiency.

[0036] In addition, the safety controller can also actively report the safe operation status to the host computer, thereby improving the overall system closed-loop control capability of the microenvironment control architecture of the lithography machine.

[0037] Therefore, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, the main controller is further connected to the host computer and reports the operating status of each sub-closed-loop control architecture of the microenvironment control architecture to the host computer.

[0038] In addition, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, the main controller receives the temperature data and alarm information reported autonomously from the temperature controller, and receives the safe operation status reported autonomously from the safety controller.

[0039] In addition, the host computer can further communicate with the uninterruptible power supply (UPS) in real time to obtain the power supply status of the whole machine and perform corresponding control. For example, after detecting that the UPS enters the battery mode, the current device status can be saved so that the equipment maintenance personnel can obtain the current log during maintenance, so as to quickly find and solve the problem.

[0040] In addition, the main controller may be further connected to an alarm device, for example, the alarm device is a human-machine interface (HMI) for giving an alarm to an operator.

[0041] Therefore, the microenvironment control architecture of the lithography machine according to the embodiment of the present application can realize a large closed-loop control composed of multiple sub-closed-loop controls, such as Figure 2 Here, Figure 2 The diagram illustrates an example of a large closed-loop control architecture of a microenvironment control architecture of a lithography machine according to an embodiment of the present application.

[0042] That is, the large closed-loop control architecture of the microenvironment control architecture of the lithography machine may include: a host computer 1, a main controller (PLC) 2, a safety controller 3, a leakage detection sensor 4, a temperature detection sensor 5, a door lock detection sensor 6, a UPS 7, basic equipment 8, a thermostat 9, a temperature sensor 10, a temperature control device 11, a sensor 12 (including sensors of wind speed, flow, pressure, liquid level, etc.), an HMI 13, an audible and visual alarm 14 and other components.

[0043] Among them, the host computer 1 is connected to the safety controller 3, UPS 7 and the main controller (PLC) 2, the safety controller 3 is connected to the leakage detection sensor 4, the temperature detection sensor 5, the door lock detection sensor 6, and the sound and light alarm 14, the thermostat 9 is connected to the temperature sensor 10 and the temperature control device 11, and the main controller (PLC) is connected to the host computer 1, the safety controller 3, the basic equipment 8, the thermostat 9, the sensor 12 and the HMI 13 to realize the entire large closed-loop control.

[0044] Figure 3 The figure shows a schematic diagram of the startup control principle of the microenvironment control architecture of the lithography machine according to an embodiment of the present application. Figure 3 As shown, the logic and safety detection at the startup of the microenvironment control architecture of the lithography machine according to the embodiment of the present application includes:

[0045] 1. Before the system is started, the main controller (PLC) 2 detects the positive and negative pressures of the gas and the pressure of the factory cooling water through the pressure sensor. When an abnormality occurs, the alarm information is displayed through the HMI 13 and reported to the host computer 1 simultaneously. Here, the main controller 2 or the host computer 1 can simultaneously control the safety controller 3 to send out an audible and visual alarm to remind the operator to intervene and check; if it is normal, proceed to the next step.

[0046] That is, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, before the lithography machine system is started, the main controller performs gas and cooling water pressure detection through the pressure sensor of the basic equipment control sub-closed-loop architecture.

[0047] 2. After the system is started, the plant cooling water valve (belonging to the basic equipment 8) is opened, and the system detects whether the flow is abnormal through the flow sensor, and triggers an alarm signal when it is abnormal. Among them, when the flow is too high, the operator can be reminded to pay attention to the plant water supply through the interface of HMI 13, which will not affect the startup process; when the flow is too low, the startup process is stopped for a certain period of time, the plant cooling water valve is closed, the stop logic is executed, and the personnel are reminded to check the plant water supply main valve. After confirming that it has returned to normal, the equipment can be restarted.

[0048] Here, compared with the traditional cooling water flow detection, which only alarms the flow rate, the specific value cannot be obtained, resulting in the alarm signal being triggered when it is only higher than or greater than 0.1 liters / minute, causing the equipment to shut down. In the embodiment of the present application, by directly obtaining the specific value of the flow rate, the flow rate high and low thresholds and alarm delay can be independently set and displayed in real time, which improves controllability and operability. In addition, the data setting authority can be increased by setting a security account to prevent on-site operators from making mistakes.

[0049] That is, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, after the lithography machine system is started, the main controller detects the cooling water flow through the flow detector of the basic equipment control sub-closed-loop architecture, and in response to the cooling water flow being less than a predetermined threshold value, the main controller executes the stop logic for a predetermined delay time to stop the startup process, and closes the cooling water valve in the basic equipment.

[0050] 3. After the cooling water flow is normal, the air conditioning system, LLTC system, mercury lamp exhaust system and objective lens cooling system are started at the same time:

[0051] 3.1. The main blower of the air-conditioning system (belonging to the basic equipment 8) is started, and the main controller (PLC) 2 performs wind speed detection and hardware fault detection of each air outlet. In case of abnormality, the main controller (PLC) 2 actively shuts down the corresponding equipment, executes the stop logic, and displays through the HMI 13 interface and the host computer 1 controls the safety controller 3 to issue an audible and visual alarm to remind the operator to intervene and check; after the main blower starts normally, for example, the compressor (belonging to the basic equipment 8) is started with a delay of 5 seconds, the main controller (PLC) 2 performs high and low pressure and hardware fault detection of the compressor (belonging to the basic equipment 8). In case of abnormality, the main controller (PLC) 2 actively shuts down the corresponding equipment, executes the stop logic, and displays through the HMI 13 interface and the host computer 1 controls the safety controller 3 to issue an audible and visual alarm to remind the operator to intervene and check.

[0052] When the temperature at the air inlet of the whole machine is lower than the target temperature, for example, 21°C, measured by the temperature sensor, the main heater (belonging to the basic device 8) is started. In the event of an abnormality, the main controller (PLC) 2 actively shuts down the main heater and informs the host computer 1, while executing the stop logic, and displays the HMI 13 interface and the host computer 1 controls the safety controller 3 to issue an audible and visual alarm to remind the operator to intervene and check; during this period, the safety controller 3 continuously obtains the real-time temperature value to determine whether the vicinity of the equipment is overheated. If the temperature exceeds 80°C, for example, it is assumed that there is a possibility of fire, and the dangerous power supply of the whole machine will be cut off; after the main heater operates normally, the main controller (PLC) 2 starts to perform temperature control actions. For example, after 40 minutes, if the ambient temperature of the equipment still does not reach the target temperature as measured by the temperature sensor, the HMI 13 interface is displayed and the host computer 1 controls the safety controller 3 to issue an audible and visual alarm to remind the operator to intervene and check; after the ambient temperature is normal, the air conditioning system is started, and the main controller (PLC) 2 will still monitor the status of each sub-device.

[0053] Here, if there is only equipment overload detection but no actual wind speed feedback at the output end, the equipment operation effect cannot be guaranteed. Therefore, in the embodiment of the present application, by directly obtaining the specific values ​​of the wind speed at each outlet, the wind speed high and low thresholds and alarm delays at different locations can be independently set and displayed in real time, which improves controllability and operability. In addition, the data setting authority can be increased by setting a security account to prevent on-site operators from making mistakes.

[0054] That is, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, in response to the normal cooling water flow, the main controller starts the air-conditioning system in the basic equipment through the basic equipment control sub-closed-loop architecture, including: when starting the main blower of the air-conditioning system, the main controller performs a main blower start-up detection through the wind speed sensor of the basic equipment control sub-closed-loop architecture; after detecting that the main blower starts normally, the compressor of the air-conditioning system is started after a predetermined compressor start-up time is delayed, and the main controller performs a compressor start-up detection through the pressure sensor of the basic equipment control sub-closed-loop architecture; when the main controller detects that the air inlet temperature of the air-conditioning system is lower than a predetermined low temperature threshold through the temperature control sub-closed-loop architecture, the main heater of the air-conditioning system is started; and, after the main heater operates normally, the main controller performs temperature control operations through the temperature control sub-closed-loop architecture.

[0055] Furthermore, in the microenvironment control architecture of the above-mentioned lithography machine, the main controller starts the air-conditioning system in the basic equipment through the basic equipment control sub-closed-loop architecture, further including: cutting off the power supply when the temperature detection sensor of the safety control sub-closed-loop architecture detects that the real-time temperature value is higher than a predetermined high temperature threshold; and when the temperature sensor of the temperature control sub-closed-loop architecture detects that the equipment environment temperature of the air-conditioning system still does not reach the target temperature after the predetermined air-conditioning temperature control time, the main controller and / or the safety control sub-closed-loop architecture issues an alarm.

[0056] 3.2. The coolant solenoid valve (belonging to the basic equipment 8) of the objective lens liquid temperature control (LLTC) system is opened, and the electronic cooling plate (belonging to the basic equipment 8) and the magnetic pump (belonging to the basic equipment 8) are started after a delay of 1 second. If the liquid level sensor detects that the magnetic pump is overloaded, the magnetic pump is turned off, and the LLTC system is turned off; when the flow sensor detects that the flow rate of the circulating liquid circuit is too high, the personnel are reminded to pay attention, and when it is too low, it indicates that the LLTC pipeline or the magnetic pump is abnormal, the magnetic pump is turned off, and the LLTC system is turned off; if the liquid level sensor detects that the liquid level in the cooling tank is lower than 40%, the operator is reminded to add it after the end of the day's work.

[0057] After the equipment of the LLTC system is started normally, the temperature control action continues. For example, if the temperature of the whole machine still does not reach the target temperature after 30 minutes, the HMI 13 interface display and the upper computer 1 control the safety controller 3 to issue an audible and visual alarm to remind the operator to intervene and check; and after the temperature of the LLTC system is normal and the LLTC system startup is completed, the main controller (PLC) 2 will still monitor the status of each sub-device.

[0058] That is, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, the main controller starts the LLTC system in the basic equipment through the basic equipment control sub-closed-loop architecture, including: after opening the coolant solenoid valve of the LLTC system, delaying the start time of the magnetic pump to start the electronic cooling plate and the magnetic pump; in response to the main controller detecting that the magnetic pump is overloaded through the liquid level sensor of the basic equipment control sub-closed-loop architecture or detecting that the circulation liquid flow is lower than a predetermined threshold through the flow sensor, the magnetic pump and the LLTC system are turned off.

[0059] Furthermore, in the microenvironment control architecture of the above-mentioned lithography machine, the main controller starts the LLTC system in the basic equipment through the basic equipment control sub-closed-loop architecture, further including: when the temperature sensor of the temperature control sub-closed-loop architecture detects that the equipment environment temperature of the LLTC system still does not reach the target temperature after a predetermined LLTC temperature control time, the main controller and / or the safety control sub-closed-loop architecture issues an alarm.

[0060] 3.3. The mercury lamp exhaust system is started. After the exhaust fan (belonging to the basic equipment 8) is started, the main controller (PLC) 2 performs wind speed and fault detection. When an abnormality occurs, the HMI 13 interface is displayed and the upper computer 1 controls the safety controller 3 to issue an audible and visual alarm. When there is no abnormality, the mercury lamp exhaust system is started.

[0061] That is, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, the main controller starts the mercury lamp exhaust system in the basic equipment through the basic equipment control sub-closed loop architecture, including: after starting the exhaust fan of the mercury lamp exhaust system, the main controller detects the wind speed of the exhaust fan through the wind speed sensor of the basic equipment control sub-closed loop.

[0062] 3.4. The objective lens cooling system is started, the air blowing solenoid valve (belonging to the basic equipment 8) is opened, and when the flow detection is abnormal, if it is too high, it is necessary to remind personnel to pay attention to the exposure effect and the temperature near the objective lens; if it is too low, it is necessary to remind personnel to pay attention to whether the solenoid valve (belonging to the basic equipment 8) is damaged.

[0063] That is, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, the main controller starts the objective lens cooling system in the basic equipment through the basic equipment control sub-closed loop architecture, including: after starting the air blowing solenoid valve of the objective lens cooling system, the main controller performs air blowing solenoid valve flow detection through the flow sensor of the basic equipment control sub-closed loop.

[0064] 4. After the temperature control of the main controller (PLC) 2 is normal, HMI 13 prompts to start the power supply of the mercury lamp, and at the same time, the air blowing solenoid valve (belonging to the basic equipment 8) of the lamp chamber is opened. When the air blowing pressure detection is abnormal, the main controller (PLC) 2 will cut off the power supply of the mercury lamp (belonging to the basic equipment 8), and remind personnel not to perform the lighting operation, and check whether the air blowing solenoid valve (belonging to the basic equipment 8) is damaged; after the pressure detection is normal, the operation lights up the mercury lamp (belonging to the basic equipment 8), the mercury lamp starts timing, and synchronously feeds back to the host computer, and the system startup is completed at this time.

[0065] That is, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, in response to the main controller detecting that the temperature control of the temperature controller of the temperature control sub-closed-loop architecture is normal, the mercury lamp power supply in the basic equipment is started, and the lamp chamber blowing solenoid valve in the basic equipment is opened; and, in response to the main controller detecting that the blowing pressure is normal through the pressure sensor of the basic equipment control sub-closed-loop architecture, the main controller lights the mercury lamp through the basic equipment control sub-closed-loop architecture.

[0066] Therefore, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, during the microenvironment startup process, the status of each sub-device can be continuously obtained to ensure that each sub-device is gradually started according to the preset program based on feedback, and during normal operation, the wind temperature, wind speed, air volume, etc. can be adjusted in real time according to the temperature and wind speed at different locations to maximize the temperature control requirements of the corresponding locations.

[0067] Figure 4 The figure shows a schematic diagram of the stop control principle of the microenvironment control architecture of the lithography machine according to the embodiment of the present application. Figure 4 As shown, the stop logic of the microenvironment control architecture of the lithography machine is as follows:

[0068] 1. After receiving a stop command, for example, after detecting that the stop button is pressed, the main controller (PLC) 2 controls the heater of the air conditioning system to stop, and when the main controller (PLC) 2 obtains that the ambient temperature is lower than the target temperature, for example, 21°C, it controls the compressor and the main blower to stop, and detects whether the wind speed is 0. If the temperature rises repeatedly within a predetermined time, for example, within 10 minutes, the cooling system can be restarted until it is completely cooled down.

[0069] 2. The LLTC system stops, the heating rod stops, and the main controller (PLC) 2 measures that the circulating fluid temperature is lower than the target temperature plus a margin, for example, 22°C. The main controller (PLC) 2 turns off the magnetic pump and electronic cooling fins, and detects whether the pipeline flow is lower than the flow threshold, for example, 0.2 L / min. If so, the solenoid valve is closed.

[0070] 3. The objective lens system and factory cooling water valves are closed with a delay by the main controller (PLC) 2 to ensure the heat dissipation effect.

[0071] That is, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, in the stop logic: the main controller controls the heater of the air-conditioning system to stop, and when the temperature sensor of the environmental control sub-closed-loop architecture detects that the ambient temperature is lower than the target temperature, stops the compressor and the main blower of the air-conditioning system, and detects whether the wind speed is zero through the wind speed sensor; the main controller controls the heating rod of the LLTC system to stop, and when the temperature sensor of the environmental control sub-closed-loop architecture detects that the ambient temperature is lower than the target temperature plus a margin, turns off the magnetic pump and the electronic cooling plate of the LLTC system, detects whether the pipeline flow is lower than the flow threshold through the wind speed sensor, and closes the solenoid valve in response to the pipeline flow being lower than the flow threshold; and the main controller delays the closing of the objective lens system and the factory cooling water valve.

[0072] Therefore, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, when the business execution is completed without temperature control requirements, each sub-device can be gradually stopped according to safety requirements.

[0073] Moreover, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, the alarm processing program can be automatically entered when an abnormality occurs, and different processing methods can be implemented according to different alarm types to ensure that the problem will not be over-processed, thereby affecting business efficiency.

[0074] To summarize, in the microenvironment control architecture of the lithography machine according to the embodiment of the present application, a closed-loop control of the stable and safe operation of the microenvironment is achieved through the connection of the digital input / output (DIO) signals between the main controller and the sub-devices and the main controller itself; the main controller actively establishes communication with the host computer to reduce the communication load of the host computer and improve the business efficiency of the entire machine; the temperature controller and the safety controller actively communicate with the main controller to obtain real-time temperature values ​​to implement different processing methods for different temperature alarms and reduce the number of direct system shutdowns; during the system shutdown process, the power supply of the equipment is not cut off at will, but it is gradually stopped according to a preset program to reduce damage to the equipment hardware.

[0075] The basic principles of the present application are described above in conjunction with specific embodiments. However, it should be noted that the advantages, strengths, effects, etc. mentioned in the present application are only examples and not limitations, and it cannot be considered that these advantages, strengths, effects, etc. are required by each embodiment of the present application. In addition, the specific details disclosed above are only for the purpose of illustration and ease of understanding, not for limitation, and the above details do not limit the present application to being implemented by adopting the above specific details.

[0076] The block diagrams of the devices, apparatuses, equipment, and systems involved in this application are only illustrative examples and are not intended to require or imply that they must be connected, arranged, and configured in the manner shown in the block diagram. As will be appreciated by those skilled in the art, these devices, apparatuses, equipment, and systems can be connected, arranged, and configured in any manner. Words such as "including", "comprising", "having", etc. are open words, referring to "including but not limited to", and can be used interchangeably with them. The words "or" and "and" used here refer to the words "and / or" and can be used interchangeably with them, unless the context clearly indicates otherwise. The words "such as" used here refer to the phrase "such as but not limited to", and can be used interchangeably with them.

[0077] It should also be noted that in the apparatus, device and method of the present application, each component or each step can be decomposed and / or recombined. Such decomposition and / or recombination should be regarded as equivalent solutions of the present application.

[0078] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use the present application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein may be applied to other aspects without departing from the scope of the present application. Therefore, the present application is not intended to be limited to the aspects shown herein, but rather to the widest scope consistent with the principles and novel features disclosed herein.

[0079] The above description has been given for the purpose of illustration and description. In addition, this description is not intended to limit the embodiments of the present application to the forms disclosed herein. Although multiple example aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, changes, additions and sub-combinations thereof.

Claims

1. A microenvironment control architecture for a lithography machine, comprising: Main controller; A temperature control sub-closed loop architecture, for achieving temperature control by the main controller based on the state of the thermostat; A basic equipment control sub-closed loop architecture, which is used for connecting the main controller with the basic equipment and corresponding sensors to control the operation of the basic equipment and monitor the operating status of the basic equipment in real time; as well as, The safety control sub-closed loop architecture is used for the main controller to provide double protection for equipment safety based on safety-related sensors through the safety controller.

2. The microenvironment control architecture of the lithography machine as claimed in claim 1, wherein: The main controller is further connected to the host computer and reports the operating status of each sub-closed-loop control architecture of the micro-environment control architecture to the host computer.

3. The microenvironment control architecture of the lithography machine as claimed in claim 1, wherein: The main controller receives the temperature data and alarm information reported autonomously by the thermostat, and receives the safety operation status reported autonomously by the safety controller.

4. The microenvironment control architecture of the lithography machine as claimed in claim 1, wherein: Before the lithography machine system is started, the main controller detects the gas and cooling water pressures through the pressure sensors of the basic equipment control sub-closed-loop architecture.

5. The microenvironment control architecture of the lithography machine as claimed in claim 4, wherein: After the lithography machine system is started, the main controller detects the cooling water flow through the flow detector of the basic equipment control sub-closed-loop architecture, and in response to the cooling water flow being less than a predetermined threshold, executes the stop logic for a predetermined time to stop the startup process, and closes the cooling water valve in the basic equipment.

6. The microenvironment control architecture of the lithography machine as claimed in claim 5, wherein: In response to the cooling water flow being normal, the main controller starts the air conditioning system in the basic equipment through the basic equipment control sub-closed loop architecture, including: In case of starting the main blower of the air conditioning system, the main controller performs main blower start detection through the wind speed sensor of the basic equipment control sub-closed loop architecture; After detecting that the main blower starts normally, the compressor of the air-conditioning system is started after a predetermined compressor start time is delayed, and the main controller performs compressor start detection through the pressure sensor of the basic equipment control sub-closed loop architecture; When the main controller detects through the temperature control sub-closed loop architecture that the air inlet temperature of the air conditioning system is lower than a predetermined low temperature threshold, the main heater of the air conditioning system is started; and After the main heater operates normally, the main controller performs temperature control operation through the temperature control sub-closed loop architecture.

7. The microenvironment control architecture of the lithography machine as claimed in claim 6, wherein: The main controller starts the air conditioning system in the basic equipment through the basic equipment control sub-closed loop architecture, further comprising: When the temperature detection sensor of the safety control sub-closed loop architecture detects that the real-time temperature value is higher than a predetermined high temperature threshold, power is cut off; and, When the temperature sensor of the temperature control sub-closed-loop architecture detects that the equipment environment temperature of the air-conditioning system still fails to reach the target temperature after the predetermined air-conditioning temperature control time, the main controller and / or the safety control sub-closed-loop architecture issues an alarm.

8. The microenvironment control architecture of the lithography machine as claimed in claim 7, wherein: The main controller starts the objective lens liquid cooling temperature control system in the basic device through the basic device control sub-closed loop architecture, including: After the cooling liquid solenoid valve of the objective lens liquid cooling temperature control system is turned on, the start time of the magnetic pump is delayed to start the electronic cooling plate and the magnetic pump; and In response to the main controller detecting that the magnetic pump is overloaded through the liquid level sensor of the basic device control sub-closed-loop architecture or detecting that the circulation liquid flow is lower than a predetermined threshold through the flow sensor, the magnetic pump and the objective lens liquid cooling temperature control system are turned off.

9. The microenvironment control architecture of the lithography machine as claimed in claim 8, wherein: The main controller starts the objective lens liquid cooling temperature control system in the basic device through the basic device control sub-closed loop architecture, further comprising: When the temperature sensor of the temperature control sub-closed-loop architecture detects that the equipment environment temperature of the objective lens liquid cooling temperature control system still fails to reach the target temperature after the predetermined objective lens liquid cooling temperature control time, the main controller and / or the safety control sub-closed-loop architecture issues an alarm.

10. The microenvironment control architecture of the lithography machine as claimed in claim 9, wherein: The main controller starts the mercury lamp exhaust system in the basic equipment through the basic equipment control sub-closed loop architecture, including: After starting the exhaust fan of the mercury lamp exhaust system, the main controller detects the wind speed of the exhaust fan through the wind speed sensor of the basic equipment control sub-closed loop.

11. The microenvironment control architecture of a lithography machine as claimed in claim 10, wherein: The main controller starts the objective lens cooling system in the basic device through the basic device control sub-closed loop architecture, including: After starting the air blowing solenoid valve of the objective lens cooling system, the main controller detects the flow rate of the air blowing solenoid valve through the flow sensor of the basic equipment control sub-closed loop.

12. The microenvironment control architecture of a lithography machine as claimed in claim 11, wherein: In response to the main controller controlling the temperature of the temperature controller through the temperature control sub-closed loop architecture being normal, starting the power supply of the mercury lamp in the basic device and opening the lamp chamber air blowing solenoid valve in the basic device; as well as, In response to the main controller detecting that the blowing pressure is normal through the pressure sensor of the basic device control sub-closed-loop architecture, the main controller lights the mercury lamp through the basic device control sub-closed-loop architecture.

13. The microenvironment control architecture of a lithography machine as claimed in claim 1, wherein: In the stop logic: The main controller controls the heater of the air conditioning system to stop, and when the temperature sensor of the environmental control sub-closed loop architecture detects that the ambient temperature is lower than the target temperature, stops the compressor and the main blower of the air conditioning system, and detects whether the wind speed is zero through the wind speed sensor; The main controller controls the heating rod of the objective lens liquid cooling temperature control system to stop, and when the temperature sensor of the environmental control sub-closed loop architecture detects that the temperature is lower than the target temperature plus a margin, the magnetic pump and the electronic cooling plate of the objective lens liquid cooling temperature control system are turned off, and the wind speed sensor is used to detect whether the pipeline flow is lower than the flow threshold, and the solenoid valve is closed in response to the pipeline flow being lower than the flow threshold; and The main controller delays closing of the objective lens system and the cooling water valve.

Images