Adjustable positioning device for reaction cavity and use method of adjustable positioning device

Abstract

The invention provides an adjustable positioning device for a reaction cavity and a use method of the adjustable positioning device. The device comprises an upper cover and a reaction cavity arranged in an upper cavity in a sleeved mode, and the upper cover is arranged on the bottom face of the upper cavity and communicated with the upper cavity; the first groove and the second groove are oppositely arranged to bear the check block; the first groove is formed in the inner ring surface of the upper cover, and the second groove is formed in the outer ring surface of the reaction cavity; a preset gap is formed between the inner ring face of the first groove and the outer ring face of the second groove. The number of the check blocks is at least two, and the check blocks move along the first groove and the second groove; the adjusting hole corresponds to the check block, is formed in the upper surface of the upper cover, communicates with the first groove and extends in the radial direction, and an adjusting piece is placed in the adjusting hole; the adjusting piece is used for adjusting the check block in the radial direction, and the adjusting piece corresponds to the check block and is connected with the check block; a maintenance window is formed in the upper cavity; and a positioning hole. By improving the structure of the reaction cavity and adding the peripheral stop blocks, maintenance personnel can quickly open the cavity to maintain the interior of the process cavity by adjusting the position of the calipers, so that the PM time is shortened.

Description

Technical Field

[0001] The present invention belongs to the technical field of semiconductor equipment, and in particular relates to an adjustable positioning device for a reaction chamber and a use method thereof. Background Art

[0002] In semiconductor manufacturing equipment, etching can only be performed when the wafer is in the process chamber. A typical etching process chamber mainly includes a reaction chamber, a vacuum and pressure control system, a radio frequency system, an electrostatic chuck and a silicon wafer temperature control system, a gas flow control system, an etching endpoint detection system, a conveying system, and system software. ICP (inductively coupled plasma) etching is to place one or more sets of coils connected to a radio frequency power supply on or around the reaction chamber, and the reaction chamber is generally placed and fixed above the process chamber. Semiconductor equipment requires regular preventive maintenance (PM).

[0003] During PM, the reaction chamber needs to be dismantled to maintain the inside of the process chamber. The specific steps are: dismantling the upper chamber, dismantling the adapter 6 between the reaction chamber and the process chamber, removing the reaction chamber, and maintaining the inside of the process chamber. That is, it is necessary to open the reaction chamber shell (upper chamber) and dismantle the reaction chamber separately, which takes a long time, so the PM time will also be longer. Summary of the invention

[0004] The purpose of the present invention is to provide an adjustable positioning device for a reaction chamber and a method for using the same. The device can shorten the time required for opening the process chamber PM by improving the reaction chamber installation structure and adding an adjustable fixing and limiting structure. The technical solution adopted is as follows:

[0005] An adjustable positioning device for a reaction chamber, comprising an upper cover 1 and a reaction chamber 2 sleeved in the upper chamber, wherein the upper cover 1 is arranged on the bottom surface of the upper chamber and communicates with the upper chamber, and further comprising:

[0006] The first groove 11 and the second groove 21 are arranged opposite to each other to receive the stopper 4; the first groove 11 is formed on the inner ring surface of the upper cover 1, and the second groove 21 is formed on the outer ring surface of the reaction chamber 2; a preset gap is formed between the inner ring surface of the first groove 11 and the outer ring surface of the second groove 21;

[0007] The stopper 4 is used to connect the upper cover 1 and the reaction chamber 2, and the number of the stopper 4 is at least 2; the stopper 4 can move along the first groove 11 and the second groove 21;

[0008] The adjusting hole 12 is arranged corresponding to the stopper 4, is opened on the upper surface of the upper cover 1 and communicates with the first groove 11, extends in the radial direction, and the adjusting member 5 is placed therein;

[0009] The adjusting member 5 is used to adjust the stopper 4 in radial direction, and is arranged corresponding to the stopper 4 and connected to the stopper 4; a maintenance window is provided on the upper cavity;

[0010] And a positioning hole 13 is provided on the upper cover 1 for receiving and positioning a screw. When the screw is matched with the mounting hole on the corresponding stopper 4, the upper cover 1, the reaction chamber 2 and the corresponding stopper 4 are connected as one.

[0011] Preferably, the stopper 4 includes a metal block 41 and a non-metal block 42 connected to the metal block 41 ; the metal block 41 is arranged toward the first slot 11 and has the mounting hole thereon, and the non-metal block 42 is arranged toward the second slot 22 .

[0012] Preferably, the non-metal block 42 is ULTEM 1000.

[0013] Preferably, the dovetail groove on the metal block 41 and the dovetail tenon on the non-metal block 42 are adapted to each other.

[0014] Preferably, the adjusting member 5 is threadedly connected to the stopper 4 .

[0015] Preferably, the upper cover 1 is connected to the process chamber 3 via a transition piece 6 .

[0016] Preferably, a hinge structure is provided between the outer wall of the upper chamber and the outer wall of the process chamber.

[0017] A method for using an adjustable positioning device for a reaction chamber, based on the adjustable positioning device for a reaction chamber, when the process chamber 3 needs to be maintained, specifically includes:

[0018] Step 1, connecting the upper cover 1 and the reaction chamber 2, specifically comprising:

[0019] Step 1A, moving the adjusting member 5 in the radial direction, and the adjusting member 5 drives the stopper 4 to move along the first groove 21;

[0020] When a portion of the stopper 4 is located in the first slot 11 and the other portion is located in the second slot 21, a screw is placed in the corresponding positioning hole 13 and screwed into the corresponding stopper 4;

[0021] Step 1B, repeat step 1A until all the stoppers 4 are fixed;

[0022] Step 2: remove the upper chamber, and the reaction chamber 2 moves synchronously with the upper chamber and the upper cover 1.

[0023] Preferably, the process further includes steps when the reaction chamber 2 needs to be maintained, specifically including:

[0024] The adjusting member 5 is moved radially, and the adjusting member 5 drives the stopper 4 to move along the first groove 21;

[0025] When the stopper 4 is separated from the second groove 21;

[0026] When all the stoppers 4 are separated from the second groove 21, the upper chamber is removed and the reaction chamber 2 remains stationary.

[0027] Compared with the prior art, the advantages of the present invention are:

[0028] 1. When the process chamber needs to be maintained: When removing the upper chamber, the reaction chamber can be removed together.

[0029] 2. When the reaction chamber needs to be maintained: During the removal of the upper chamber, the reaction chamber remains stationary. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 A cross-sectional view of a semiconductor process equipment in one direction;

[0031] Figure 2 A cross-sectional view of the semiconductor process equipment in another direction;

[0032] Figure 3 A state diagram of an adjustable positioning device for a reaction chamber when maintenance of the process chamber is required;

[0033] Figure 4 A state diagram of the adjustable positioning device for the reaction chamber when the reaction chamber needs to be maintained;

[0034] Figure 5 is a cross-sectional view of a non-end surface of the stopper;

[0035] Figure 6 This is a structural diagram of the stopper.

[0036] Among them, 1-upper cover, 11-number one slot, 12-adjustment hole, 13-positioning hole;

[0037] 2-reaction chamber, 21-slot No. 2,

[0038] 3-process chamber, 31-film transfer port, 4-stopper, 41-metal block, 42-non-metal block, 5-adjustment part,

[0039] 6-Adapter. DETAILED DESCRIPTION

[0040] The following will be described in more detail with reference to the schematic diagram of the adjustable positioning device for the reaction chamber of the present invention and the method of using the same, wherein the preferred embodiment of the present invention is shown, and it should be understood that the present invention described herein can be modified by a person skilled in the art, and still achieve the advantageous effects of the present invention. Therefore, the following description should be understood as being widely known to a person skilled in the art, and not as a limitation of the present invention.

[0041] The utility model discloses an adjustable positioning device for a reaction chamber, namely, fixed blocks are added around the reaction chamber.

[0042] The present invention takes into account that PM maintenance of equipment must be quick and rapid, and conventional installation methods are time-consuming and labor-intensive. Therefore, by adding limiting calipers (blocks 4) around, maintenance personnel can quickly open the cavity to maintain the inside of the process cavity by adjusting the position of the calipers, thereby shortening the PM time.

[0043] The present invention can be used to fix the reaction chamber on the inductively coupled plasma equipment in the field of etching equipment, and is mainly used for opening the PM chamber. When the upper chamber is opened, the reaction chamber can be opened together, and there is no need to open the upper chamber and then disassemble the reaction chamber separately.

[0044] like Figures 1 to 6 , an adjustable positioning device for a reaction chamber, the device specifically comprises: an upper cover 1, a reaction chamber 2 sleeved in the upper chamber, the upper cover 1 is arranged on the bottom surface of the upper chamber and communicates with the upper chamber, and also comprises:

[0045] The first groove 11 and the second groove 21 are arranged opposite to each other to receive the stopper 4; the first groove 11 is provided on the inner ring surface of the upper cover 1, and the second groove 21 is provided on the outer ring surface of the reaction chamber 2; a preset gap is formed between the inner ring surface of the first groove 11 and the outer ring surface of the second groove 21;

[0046] The stopper 4 is used to connect the upper cover 1 and the reaction chamber 2, and the number of the stopper 4 is at least 2; the stopper 4 can move along the first groove 11 and the second groove 21, that is, there are small gaps between the stopper 4 and the first groove 11 and the second groove 21.

[0047] Among them, the number of blocks 4 is designed for the following reasons:

[0048] Since there is a gap between the non-metallic block 42 and the second groove 21, if there is only one stopper, the reaction chamber is prone to shaking when the upper chamber drives the reaction chamber to move together.

[0049] Therefore, the number of blocks 4 is increased along the circumference, and a plurality of blocks 4 together form a ring to surround the reaction chamber 2, thereby increasing the stability of the reaction chamber 2 and ensuring that the reaction chamber moves smoothly with the upper chamber.

[0050] In this embodiment, the number of baffles 4 is 4, which are evenly distributed along the circumference. In other embodiments, the number of baffles 4 is 3 or 5-N.

[0051] The adjusting hole 12 is arranged corresponding to the stopper 4, is opened on the upper surface of the upper cover 1 and communicates with the first groove 11, extends in the radial direction, and the adjusting member 5 is placed therein;

[0052] like Figure 1 As shown, the adjustment hole 12 is shown; the adjustment hole 12 is Figure 2 Not shown in .

[0053] An adjusting member 5, used for adjusting the stopper 4 in radial direction, which is arranged corresponding to the stopper 4 and connected to the stopper 4;

[0054] A maintenance window is arranged on the side of the upper cavity, a shielding door is arranged on the maintenance window, and the shielding door is hinged to the outer wall of the upper cavity.

[0055] And a positioning hole 13 is provided on the upper cover 1 for receiving (placing) a screw. When the screw is matched with the mounting hole on the corresponding stopper 4, the upper cover 1, the reaction chamber 2 and the corresponding stopper 4 are connected as one.

[0056] That is, the positioning hole 13 is a through hole and a light hole, and the mounting hole on the stopper 4 is a threaded hole.

[0057] The screw passes through the positioning hole 13, the end face of the screw covers the positioning hole 13 and presses against the upper surface of the upper cover 1, and the screw is threadedly connected with the mounting hole on the stopper 4. At this time, the upper cover 1, the reaction chamber 2 and the corresponding stopper 4 are connected as a whole.

[0058] The reason why the positioning hole 13 is a bare hole is that if the positioning hole 13 is a threaded hole, the mounting hole on the stopper 4 is also a threaded hole, and the mounting accuracy cannot be achieved, that is, the process of screwing the screw into the positioning hole 13 and the mounting hole in turn cannot proceed smoothly.

[0059] The upper cover 1 is connected to the bottom surface of the upper cavity through fasteners.

[0060] like Figures 5-6 As shown, the stopper 4 includes a metal block 41 and a non-metal block 42 connected to the metal block 41 ; the metal block 41 is arranged toward the first slot 11 and has a mounting hole thereon, and the non-metal block 42 is arranged toward the second slot 22 .

[0061] The dovetail groove on the metal block 41 is matched with the dovetail tenon on the non-metal block 42 .

[0062] That is, when the process chamber 3 needs to be maintained, the metal block 41 is used to be fastened and fixed to the upper cover, and the non-metal block 42 is used to contact with the reaction chamber to fix the reaction chamber.

[0063] When the process chamber needs to be maintained, the non-metal block 42 can prevent the opening and closing of the chamber and the expansion of the reaction chamber wall by metal, which may cause damage to the reaction chamber. That is, the block 4 is a metal structure as a whole, and when the reaction chamber 3 moves synchronously with the upper chamber, the phenomenon of metal collision with the reaction chamber may occur.

[0064] like Figure 6 As shown, the adjusting member 5 is threadedly connected to the stopper 4. The second threaded hole on the metal block 41 is used to connect the adjusting member 5, and the remaining two threaded holes are mounting holes for threading with the fasteners (screws) in the positioning holes 13.

[0065] It is known from the prior art that the upper cover is connected to the process chamber 3 via the adapter 6. Specifically, the adapter 6 is detachably disposed on the process chamber 3 and is adsorbed on the upper cover.

[0066] In this embodiment, a hinge structure is provided between the outer wall of the upper chamber and the outer wall of the process chamber. Therefore, in the manual flip-covering mode, "removing the upper chamber" means turning the upper chamber around the hinge axis in the hinge structure to one side and opening it.

[0067] Installation method of the adjustable positioning device for the reaction chamber:

[0068] Step 1: Install the stopper 4 in the first slot 21.

[0069] Specifically, the stopper 4 is assembled in advance and then put into the first slot 21 .

[0070] Assembly method of stopper 4: Push non-metal block 42 from one end of metal block 41 toward the other end of metal block 42 along the circumferential direction. Figure 6 As indicated by the arrow in .

[0071] When the non-metal block 42 moves along the circumference, the dovetail tenon on it fits with the dovetail groove in the metal block 41 .

[0072] Step 2: Install the adjusting member 5.

[0073] Step 3: Install the reaction chamber 2.

[0074] If it is necessary to open the reaction chamber with the reaction chamber, it is only necessary to open the shielding door on the side of the upper chamber, adjust the adjusting piece on the upper cover, so that the stopper 4 is embedded in the reaction chamber and fixed, and then the reaction chamber can be opened.

[0075] On the contrary, the reaction chamber can be retained on the process chamber, and only the upper chamber can be removed.

[0076] Working principle of the adjustable positioning device for the reaction chamber:

[0077] (1) When the process chamber 3 needs to be maintained, it specifically includes:

[0078] Step 1, connecting the upper cover 1 and the reaction chamber 2, specifically comprising:

[0079] Step 1A, moving the adjusting member 5 in the radial direction, and the adjusting member 5 drives the stopper 4 to move along the first groove 21;

[0080] When a part of the stopper 4 is located in the first groove 11 and another part is located in the second groove 21, as shown in FIG. Figure 3 shown.

[0081] At this time, place the screw in the corresponding positioning hole 13 and screw it into the corresponding stopper 4;

[0082] Step 1B, repeat step 1A until all the stoppers 4 are fixed;

[0083] Step 2: remove the upper chamber, and the reaction chamber 2 moves synchronously with the upper chamber and the upper cover 1.

[0084] Step 3: Remove adapter 6.

[0085] (2) When the reaction chamber 2 needs to be maintained, it specifically includes:

[0086] The adjusting member 5 is moved radially, and the adjusting member 5 drives the stopper 4 to move along the first groove 21;

[0087] When the stopper 4 is separated from the second groove 21, as shown in FIG. Figure 4 shown.

[0088] When all the stoppers 4 are separated from the second groove 21, the upper chamber is removed and the reaction chamber 2 remains stationary.

[0089] Figures 3-4 In the figure, the non-end surface portion of the stopper 4 is shown.

[0090] In addition, there are two main ways of opening the cavity in existing equipment: motor vertical lifting and manual backward flipping.

[0091] The motor vertical lifting type often uses a hook to hang the reaction chamber to achieve rapid chamber opening;

[0092] Most of the flip-top chambers require the reaction chamber to be removed separately after flipping the cover.

[0093] This invention can be applied to both motor lifting type and manual flip type.

[0094] Among them, when the motor is lifted, before removing the upper cavity, the hinge shaft on the hinge structure needs to be removed first.

[0095] The above is only a preferred embodiment of the present invention and does not limit the present invention in any way. Any technician in the relevant technical field, without departing from the scope of the technical solution of the present invention, makes any form of equivalent replacement or modification to the technical solution and technical content disclosed in the present invention, which does not depart from the content of the technical solution of the present invention and still falls within the protection scope of the present invention.

Claims

1. An adjustable positioning device for a reaction chamber, comprising an upper cover (1) and a reaction chamber (2) sleeved in the upper chamber, wherein the upper cover (1) is arranged on the bottom surface of the upper chamber and communicates with the upper chamber, characterized in that: Also includes: The first groove (11) and the second groove (21) are arranged opposite to each other to receive the stopper (4); the first groove (11) is provided on the inner ring surface of the upper cover (1), and the second groove (21) is provided on the outer ring surface of the reaction chamber (2); a preset gap is formed between the inner ring surface of the first groove (11) and the outer ring surface of the second groove (21); The stopper (4) is used to connect the upper cover (1) and the reaction chamber (2), and the number of the stopper (4) is at least 2; the stopper (4) can move along the first groove (11) and the second groove (21); An adjustment hole (12) is arranged corresponding to the stopper (4), is opened on the upper surface of the upper cover (1) and is connected to the first groove (11), extends in the radial direction, and an adjustment member (5) is placed therein; The adjusting member (5) is used to adjust the stopper (4) in the radial direction, and is arranged corresponding to the stopper (4) and connected to the stopper (4); a maintenance window is provided on the upper cavity; and a positioning hole (13) which is provided on the upper cover (1) and is used to receive a screw. When the screw is matched with the mounting hole on the corresponding stopper (4), the upper cover (1), the reaction chamber (2) and the corresponding stopper (4) are connected as one.

2. The adjustable positioning device for a reaction chamber according to claim 1, characterized in that: The stopper (4) comprises a metal block (41) and a non-metal block (42) connected to the metal block (41); the metal block (41) is arranged toward the first slot (11) and has the mounting hole formed thereon, and the non-metal block (42) is arranged toward the second slot (22).

3. The adjustable positioning device for a reaction chamber according to claim 2, characterized in that: The non-metallic block (42) is ULTEM 1000.

4. The adjustable positioning device for a reaction chamber according to claim 2, characterized in that: The dovetail groove on the metal block (41) is matched with the dovetail tenon on the non-metal block (42).

5. The adjustable positioning device for a reaction chamber according to claim 1, characterized in that: The adjusting member (5) is threadedly connected to the stopper (4).

6. The adjustable positioning device for a reaction chamber according to claim 1, characterized in that: The upper cover (1) is connected to the process chamber (3) via a transition piece (6).

7. The adjustable positioning device for a reaction chamber according to claim 6, characterized in that: A hinge structure is arranged between the outer wall of the upper chamber and the outer wall of the process chamber.

8. A method for using an adjustable positioning device for a reaction chamber, based on the adjustable positioning device for a reaction chamber according to any one of claims 1 to 7, characterized in that: When the process chamber (3) needs to be maintained, the steps specifically include: Step 1, connecting the upper cover (1) and the reaction chamber (2), specifically comprising: Step 1A, moving the adjusting member (5) in the radial direction, the adjusting member (5) drives the stopper (4) to move along the first groove (21); When a portion of the stopper (4) is located in the first groove (11) and the other portion is located in the second groove (21), a screw is placed in the corresponding positioning hole (13) and screwed into the corresponding stopper (4); Step 1B, repeat step 1A until all the stoppers (4) are fixed; Step 2: Remove the upper chamber, and the reaction chamber (2) moves synchronously with the upper chamber and the upper cover (1).

9. The method for using the adjustable positioning device for a cavity according to claim 8, characterized in that: The method also includes steps for when the reaction chamber (2) needs to be maintained, specifically including: The adjusting member (5) is moved radially, and the adjusting member (5) drives the stopper (4) to move along the first groove (21); When the stopper (4) is separated from the second groove (21); When all the stoppers (4) are separated from the second groove (21), the upper chamber is removed and the reaction chamber (2) remains stationary.

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