Etching pull basket and etching method

Abstract

The invention relates to the technical field of semiconductors, in particular to an etching pull basket and an etching method, and the etching pull basket comprises a shell (1); a pull basket (2) is arranged in the shell (1); a limiting structure and a driving roller (4) are respectively arranged on the pull basket (2); a rocker (5) is arranged on the shell (1); a gear structure is arranged on the pull basket (2); the gear structure is respectively connected with the rocker (5) and the driving roller (4); a wafer is arranged in the pull basket (2); the rocker is manually shaken at a constant speed to drive the gear structure to rotate, so that the driving roller is driven to rotate, and the wafer in the pull basket can be ensured to rotate at a constant speed, so that the wafer is efficiently and fully etched; and meanwhile, a worker can be prevented from being in direct contact with the wafer and the liquid medicine, so that the production safety of the worker is ensured, and the product can be prevented from being polluted.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to an etching pull basket and an etching method. Background Art

[0002] Wet etching: Using acidic solutions, such as hydrofluoric acid (HF) solution, can effectively remove the oxide layer on the silicon surface; silicon electrode products need to be etched, and the company uses liquid etching to remove surface impurities to prevent surface impurities from reacting with plasma gas to release a large amount of heat energy during the operation of the electrode, causing the product to be scrapped; the current wet etching liquid tank is too large, and etching a single product will cause a waste of liquid; etching products requires operators to flip the product to control the full reaction with the liquid, and there is a certain risk of liquid infiltration to the operators; fingerprints and oily substances are inevitable on the operator's work gloves, and the fingerprints will be imprinted on the product during the rotation process. After etching, it is difficult to remove, resulting in defects.

[0003] After searching, the applicant found that the Chinese patent document with publication number 116190282A disclosed an etching device, a method for detecting etching uniformity and a method for uniformly etching a wafer on May 30, 2023. The etching device includes an etching chamber, and the etching chamber is provided with a first air inlet channel, a second air inlet channel and an air outlet channel. The outlet ends of the first air inlet channel and the second air inlet channel are higher than the wafer, and the air outlet channel is lower than the wafer. The process gas is input through the first air inlet channel and the auxiliary gas is input through the second air inlet channel, so as to improve the uniformity of wafer etching; the method for detecting etching uniformity determines nine test points on the surface of the wafer, detects the etching rates of the nine test points, and then calculates the etching uniformity of the wafer through a formula, thereby confirming the etching condition of the wafer; the method for uniformly etching the wafer promotes the reaction of the wafer edge by the reaction gas and hinders the reaction of the wafer edge by the inert gas, thereby improving the uniformity of wafer etching; the device also cannot solve the above-mentioned technical problems.

[0004] Therefore, in order to improve or solve at least one of the above problems, it is necessary to provide an etching basket and etching method that can achieve efficient etching of a single product and prevent workers from directly contacting the etching solution. Summary of the invention

[0005] The object of the present invention is to provide an etching basket and an etching method which can realize efficient etching of a single product and avoid direct contact of workers with etching liquid.

[0006] In order to solve the above technical problems, the technical solution adopted by the present invention is: an etching pull-out basket, comprising a shell; a pull-out basket is arranged in the shell; a limiting structure and a driving roller are respectively arranged on the pull-out basket; a rocker is arranged on the shell; a gear structure is arranged on the pull-out basket; the gear structure is respectively connected to the rocker and the driving roller; and a wafer is arranged in the pull-out basket.

[0007] The pull-out basket includes a first baffle and a second baffle; a fixing rod is provided between the first baffle and the second baffle; the limiting structure and the driving roller are both provided between the first baffle and the second baffle; and the gear structure is provided on one side of the second baffle.

[0008] The rocker includes a first connecting shaft; a mounting hole is provided on the shell; the first connecting shaft passes through the mounting hole and is connected to a first gear; the gear structure includes a second gear, a third gear and a driving gear; the second gear is meshed with the first gear; the third gear is respectively meshed with the second gear and the driving gear; the driving gear is connected to the driving roller.

[0009] The bottoms of the first baffle plate and the second baffle plate are both provided with a slot; both ends of the driving roller are provided with a second connecting shaft; the second connecting shaft extends from the slot and is connected to a fourth gear; the fourth gear is meshed with the driving gear.

[0010] The bottom of the first baffle plate and the bottom of the second baffle plate are both provided with a clearance groove; the driving gear is arranged in the clearance groove; the driving gear includes a first driving gear and a second driving gear; a connecting shaft is provided between the first driving gear and the second driving gear; the first driving gear is meshed with the third gear; the second driving gear is meshed with the fourth gear.

[0011] Both sides of the first baffle plate and the second baffle plate are provided with limiting grooves; the limiting structure includes a limiting roller; both ends of the limiting roller are respectively provided with limiting rods; the limiting rods are arranged in the limiting grooves.

[0012] The first baffle plate and the second baffle plate are both provided with mounting grooves; the limiting grooves are respectively provided on both sides of the mounting grooves, and the limiting grooves are arranged obliquely.

[0013] A connecting groove is provided on the top of the first baffle plate and the second baffle plate.

[0014] An etching method for etching a pull-out basket, the etching method comprising the following steps:

[0015] 1) adjusting the relative position between the limiting rollers on both sides of the first baffle and the second baffle;

[0016] 2) adding liquid medicine into the pull basket; placing the wafer into the pull basket;

[0017] 3) Rotate the rocker at a constant speed for one minute; and take out the wafer.

[0018] The beneficial effects of this application are:

[0019] 1. The structure of the pull-out basket in the shell of the present application can realize wet etching of a single product, greatly avoiding the waste of liquid medicine.

[0020] 2. The present application drives the gear structure to rotate by manually cranking the joystick at a constant speed, thereby driving the drive roller to rotate, which can ensure that the wafers in the pull basket rotate at a constant speed, so that the wafers are efficiently and fully etched; at the same time, it can prevent workers from directly contacting the wafers and chemical solutions, ensuring the production safety of the workers while avoiding product contamination. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The specific embodiments of the present invention are further described in detail below in conjunction with the accompanying drawings, wherein:

[0022] Figure 1 This is a schematic diagram of the structure of the etching pull basket and etching method.

[0023] Figure 2 This is a schematic diagram of the installation state of the rocker of the etching pull basket and etching method.

[0024] Figure 3 This is a structural schematic diagram of the etching pull-out basket and the pull-out basket of the etching method.

[0025] Figure 4 This is a schematic diagram of the installation status of the driving roller of the etching pull basket and etching method.

[0026] The marks in the above figure are:

[0027] The markings in the figure are:

[0028] 1. Shell, 101, connection groove,

[0029] 2. Pull-out basket, 201, fixed rod,

[0030] 3. Limit roller, 301, limit rod,

[0031] 4. Driving roller, 401. Second connecting shaft,

[0032] 5. Rocker, 501, first connecting axis,

[0033] 6. First baffle, 601, second baffle, 602, card slot, 603, clearance slot,

[0034] 7, first gear, 701, second gear, 702, third gear, 703, driving gear, 704, fourth gear,

[0035] 8. First driving gear, 801, second driving gear, 802, connecting shaft,

[0036] 9. Limiting groove, 901. Installation groove. DETAILED DESCRIPTION

[0037] The specific implementation methods of the present invention are further explained in detail below by describing the embodiments with reference to the accompanying drawings, with the aim of helping those skilled in the art to have a more complete, accurate and in-depth understanding of the inventive concept and technical solution of the present invention and facilitating their implementation.

[0038] Figure 1 The etching pull-up basket shown includes a shell 1; a pull-up basket 2 is arranged in the shell 1; a limiting structure and a driving roller 4 are respectively arranged on the pull-up basket 2; a rocker 5 is arranged on the shell 1; a gear structure is arranged on the pull-up basket 2; the gear structure is respectively connected to the rocker 5 and the driving roller 4; a wafer is arranged in the pull-up basket 2.

[0039] The limiting structure can limit the position of a single wafer and can fix wafers of different sizes in the pull basket 2; the driving roller 4 is connected to the rocker 5 through a gear structure; the rocker 5 is manually shaken at a uniform speed to drive the gear structure to rotate, thereby driving the driving roller 4 to rotate, which can ensure that the wafers in the pull basket 2 rotate at a uniform speed, so that the wafers are efficiently and fully etched; at the same time, it can prevent the staff from directly contacting the wafers and the chemical solution, ensuring the production safety of the staff while preventing the product from being contaminated; the shell 1 is a container for placing the chemical solution. Because the thickness of the wafer generally does not exceed 50mm, the shell 1 is generally designed to be oblong in shape to save the chemical solution.

[0040] The pull-out basket 2 includes a first baffle 6 and a second baffle 601 ; a fixing rod 201 is disposed between the first baffle 6 and the second baffle 601 ; a limiting structure and a driving roller 4 are disposed between the first baffle 6 and the second baffle 601 ; and a gear structure is disposed on one side of the second baffle 601 .

[0041] The first baffle 6 and the second baffle 601 have the same structure and are connected by a plurality of fixed rods 201; the driving roller 4 is movably connected between the first baffle 6 and the second baffle 601 and is arranged at the bottom of both; the wafer is installed between the first baffle 6 and the second baffle 601, and the wafer is arranged on the driving roller 4 and rolls at a uniform speed along with the driving roller 4.

[0042] The rocker 5 includes a first connecting shaft 501; a mounting hole is provided on the shell 1; the first connecting shaft 501 passes through the mounting hole and is connected to the first gear 7; the gear structure includes a second gear 701, a third gear 702 and a driving gear 703; the second gear 701 is meshed with the first gear 7; the third gear 702 is respectively meshed with the second gear 701 and the driving gear 703; the driving gear 703 is connected to the driving roller 4.

[0043] The first connecting shaft 501 is fixedly connected to one side of the rocker 5; the first connecting shaft 501 extends into the interior of the shell 1 from the mounting hole; the first gear 7 is fixedly connected to the other side of the first connecting shaft 501; the second gear 701 and the third gear 702 have the same specifications; the first gear 7 drives the second gear 701 to rotate; the second gear 701 drives the third gear 702 to rotate; the third gear 702 drives the driving gear 703 to rotate; the driving gear 703 drives the driving roller 4 to rotate.

[0044] The bottom of the first baffle 6 and the second baffle 601 are both provided with a slot 602 ; both ends of the driving roller 4 are provided with a second connecting shaft 401 ; the second connecting shaft 401 extends from the slot 602 and is connected to a fourth gear 704 ; the fourth gear 704 is meshed with the driving gear 703 .

[0045] The second connecting shaft 401 is movably connected in the slot 602, so that the driving roller 4 can rotate flexibly between the first baffle 6 and the second baffle 601; both ends of the driving roller 4 are fixedly connected with the fourth gear 704; the driving gear 703 rotates to drive the driving roller 4 to rotate.

[0046] The bottom of the first baffle 6 and the second baffle 601 are both provided with a clearance groove 603; the driving gear 703 is arranged in the clearance groove 603; the driving gear 703 includes a first driving gear 8 and a second driving gear 801; a connecting shaft 802 is provided between the first driving gear 8 and the second driving gear 801; the first driving gear 8 is meshed with the third gear 702; the second driving gear 801 is meshed with the fourth gear 704.

[0047] The clearance groove 603 is arranged at the bottom of the first baffle plate 6 and the second baffle plate 601, and the driving gear 703 is arranged in the clearance groove 603 and at the bottom of the driving roller 4; the third gear 702 drives the first driving gear 8 to rotate; the first driving gear 8 drives the second driving gear 801 to rotate through the connecting shaft 802; the second driving gear 801 drives the fourth gear 704 to rotate.

[0048] Limiting grooves 9 are provided on both sides of the first baffle plate 6 and the second baffle plate 601 ; the limiting structure comprises a limiting roller 3 ; limiting rods 301 are provided at both ends of the limiting roller 3 ; and the limiting rods 301 are arranged in the limiting grooves 9 .

[0049] The limiting groove 9 is a waist-shaped groove; the limiting rod 301 is inserted into the limiting groove 9, so that the limiting roller 3 is arranged between the first baffle 6 and the second baffle 601, and can slide along the limiting groove 9, so as to adapt to wafers of different specifications; when the wafer is installed in the pull basket 2, the bottom of the wafer is pressed against the driving roller 4; the two sides of the wafer are respectively limited by the limiting roller 3, so that the wafer can be stably fixed in the pull basket 2.

[0050] The first baffle plate 6 and the second baffle plate 601 are both provided with a mounting groove 901 ; the limiting grooves 9 are respectively provided on both sides of the mounting groove 901 , and the limiting grooves 9 are arranged obliquely.

[0051] The mounting groove 901 and the limiting groove 9 are both through grooves; the limiting grooves 9 on both sides of the mounting groove 901 are both inclined; when the limiting roller 3 slides upward along the limiting groove 9, the distance between the two limiting rollers 3 increases; when the limiting roller 3 slides downward along the limiting groove 9, the distance between the two limiting rollers 3 decreases.

[0052] A connecting groove 101 is provided at the top of the first baffle plate 6 and the second baffle plate 601 .

[0053] The connecting groove 101 is a through groove, and its cross section is elliptical; the connecting groove 101 is convenient for the staff to hold, and can realize the quick installation and disassembly of the pull-out basket 2 in the shell 1.

[0054] An etching method for etching a pull-out basket, the etching method comprising the following steps:

[0055] 1) Adjust the relative position between the limiting rollers 3 on both sides of the first baffle 6 and the second baffle 601;

[0056] 2) Adding liquid medicine into the pull basket 2; placing the wafer into the pull basket 2;

[0057] 3) Turn the joystick at a constant speed for one minute; remove the wafer.

[0058] Step 1) After the pull-out basket 2 is stably installed in the housing 1, adjust the distance corresponding to the size of the wafer so that the wafer can be placed in the pull-out basket 2; Step 2) Add etching liquid such as hydrofluoric acid (HF) solution into the pull-out basket 2, and then put the wafer into the pull-out basket 2 for stable fixation; Step 3) Start shaking the joystick 5 to make the wafer rotate at a constant speed for one minute, so that the wafer is fully in contact with the liquid to react, and the etching work can be completed.

[0059] The specific workflow of the present invention is as follows:

[0060] 1) Adjust the relative position between the limiting rollers 3 on both sides of the first baffle 6 and the second baffle 601;

[0061] 2) Adding liquid medicine into the pull basket 2; placing the wafer into the pull basket 2;

[0062] 3) Turn the joystick at a constant speed for one minute; remove the wafer.

[0063] The present invention is described above by way of example in conjunction with the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-mentioned methods. As long as various non-substantial improvements are made using the method concept and technical solution of the present invention; or the above concept and technical solution of the present invention are directly applied to other occasions without improvement, they are all within the protection scope of the present invention.

Claims

1. An etching pull basket, characterized in that: The invention comprises a shell (1); a pull-out basket (2) is arranged in the shell (1); a limit structure and a driving roller (4) are respectively arranged on the pull-out basket (2); a rocker (5) is arranged on the shell (1); a gear structure is arranged on the pull-out basket (2); the gear structure is respectively connected to the rocker (5) and the driving roller (4); and a wafer is arranged in the pull-out basket (2).

2. An etching pull-out basket according to claim 1, characterized in that: The pull-out basket (2) comprises a first baffle (6) and a second baffle (601); a fixing rod (201) is provided between the first baffle (6) and the second baffle (601); the limiting structure and the driving roller (4) are both provided between the first baffle (6) and the second baffle (601); and the gear structure is provided on one side of the second baffle (601).

3. An etching pull-out basket according to claim 2, characterized in that: The rocker (5) comprises a first connecting shaft (501); a mounting hole is provided on the housing (1); the first connecting shaft (501) passes through the mounting hole and is connected to a first gear (7); the gear structure comprises a second gear (701), a third gear (702) and a driving gear (703); the second gear (701) is meshed with the first gear (7); the third gear (702) is respectively meshed with the second gear (701) and the driving gear (703); the driving gear (703) is connected to the driving roller (4).

4. An etching pull-out basket according to claim 3, characterized in that: The bottoms of the first baffle plate (6) and the second baffle plate (601) are both provided with a slot (602); both ends of the driving roller (4) are provided with a second connecting shaft (401); the second connecting shaft (401) extends from the slot (602) and is connected to a fourth gear (704); the fourth gear (704) is meshed with the driving gear (703).

5. An etching pull-out basket according to claim 4, characterized in that: The bottoms of the first baffle plate (6) and the second baffle plate (601) are both provided with a clearance groove (603); the driving gear (703) is arranged in the clearance groove (603); the driving gear (703) comprises a first driving gear (8) and a second driving gear (801); a connecting shaft (802) is provided between the first driving gear (8) and the second driving gear (801); the first driving gear (8) is meshed with the third gear (702); and the second driving gear (801) is meshed with the fourth gear (704).

6. An etching pull-out basket according to any one of claims 2 to 5, characterized in that: Limiting grooves (9) are provided on both sides of the first baffle plate (6) and the second baffle plate (601); the limiting structure comprises a limiting roller (3); limiting rods (301) are provided at both ends of the limiting roller (3); and the limiting rods (301) are arranged in the limiting grooves (9).

7. An etching pull-out basket according to claim 6, characterized in that: The first baffle plate (6) and the second baffle plate (601) are both provided with a mounting groove (901); the limiting grooves (9) are respectively provided on both sides of the mounting groove (901), and the limiting grooves (9) are arranged obliquely.

8. An etching pull-out basket according to claim 7, characterized in that: A connecting groove (101) is provided at the top of the first baffle plate (6) and the second baffle plate (601).

9. An etching method for etching a pull-out basket according to any one of claims 1 to 8, characterized in that: The etching method comprises the following steps: 1) adjusting the relative position between the limiting rollers (3) on both sides of the first baffle (6) and the second baffle (601); 2) adding a liquid medicine into the pull basket (2); placing the wafer in the pull basket (2); 3) Rotate the rocker (5) at a constant speed for one minute; and take out the wafer.

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